JP1741426S - bottom ring - Google Patents
bottom ringInfo
- Publication number
- JP1741426S JP1741426S JP2022021984F JP2022021984F JP1741426S JP 1741426 S JP1741426 S JP 1741426S JP 2022021984 F JP2022021984 F JP 2022021984F JP 2022021984 F JP2022021984 F JP 2022021984F JP 1741426 S JP1741426 S JP 1741426S
- Authority
- JP
- Japan
- Prior art keywords
- ring
- edge
- article
- cover
- outer circumference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Abstract
本願に係る物品(以下、「本物品」という。)は、プラスマ処理システムにおいて用いられる、エッジリング、カバーリング、ボトムリングおよびインナーリングを含むエッジリングシステムに含まれ、半導体基板の外周に配置されるエッジリングの外周に配置されるカバーリングの外周に配置されるボトムリングである。本物品は、「部分拡大図A」に示すように、平面側の内周に、エッジリングの底面の外周縁部およびカバーリングの底面を支持する突出部を備えている。An article according to the present application (hereinafter referred to as "the article") is included in an edge ring system including an edge ring, a cover ring, a bottom ring and an inner ring used in a plasma processing system, and is arranged around the periphery of a semiconductor substrate. The bottom ring is arranged on the outer circumference of the cover ring arranged on the outer circumference of the edge ring. As shown in the "partially enlarged view A", the article has, on the inner circumference of the plane side, a protrusion that supports the outer peripheral edge of the bottom surface of the edge ring and the bottom surface of the cover ring.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022021984F JP1741426S (en) | 2022-10-12 | 2022-10-12 | bottom ring |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022021984F JP1741426S (en) | 2022-10-12 | 2022-10-12 | bottom ring |
Publications (1)
Publication Number | Publication Date |
---|---|
JP1741426S true JP1741426S (en) | 2023-04-10 |
Family
ID=85802771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022021984F Active JP1741426S (en) | 2022-10-12 | 2022-10-12 | bottom ring |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP1741426S (en) |
-
2022
- 2022-10-12 JP JP2022021984F patent/JP1741426S/en active Active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWD217686S (en) | Deposition ring for a semiconductor processing chamber | |
JP2019027944A5 (en) | ||
JP1741426S (en) | bottom ring | |
JP1741427S (en) | inner ring | |
JP1741425S (en) | Covering | |
JP1741468S (en) | Covering | |
JP1741423S (en) | edge ring | |
JP1741424S (en) | edge ring | |
JP1754900S (en) | edge ring | |
JP1754901S (en) | edge ring | |
TWD208042S (en) | A vessel for plasma processing device | |
JP1748702S (en) | carrier ring | |
JP1722215S (en) | edge ring | |
JP1729675S (en) | edge ring | |
JP1729204S (en) | edge ring | |
JP1722214S (en) | edge ring | |
JP1722153S (en) | edge ring | |
JP1722002S (en) | Base for semiconductor processing equipment | |
JP1732655S (en) | confinement ring | |
JP2021141188A5 (en) | Plasma processing equipment | |
JP1729857S (en) | barrier seal ring | |
JP1746405S (en) | Susceptor cover | |
JP1741172S (en) | Susceptor cover | |
TWD221941S (en) | Reflector | |
TWM498386U (en) | Vacuum suction cup for solar cell |