TWD219730S - 電漿處理裝置用離子遮蔽板 - Google Patents

電漿處理裝置用離子遮蔽板 Download PDF

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Publication number
TWD219730S
TWD219730S TW110305783F TW110305783F TWD219730S TW D219730 S TWD219730 S TW D219730S TW 110305783 F TW110305783 F TW 110305783F TW 110305783 F TW110305783 F TW 110305783F TW D219730 S TWD219730 S TW D219730S
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TW
Taiwan
Prior art keywords
plasma processing
article
processing equipment
shielding plate
pass
Prior art date
Application number
TW110305783F
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English (en)
Chinese (zh)
Inventor
中谷侑亮
田中一海
山岡正作
園田靖
岩瀬拓
Original Assignee
日商日立全球先端科技股份有限公司
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Publication of TWD219730S publication Critical patent/TWD219730S/zh

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TW110305783F 2021-04-26 2021-10-26 電漿處理裝置用離子遮蔽板 TWD219730S (zh)

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Application Number Priority Date Filing Date Title
JPD2021-8852F JP1700629S (fr) 2021-04-26 2021-04-26
JP2021-008852 2021-04-26

Publications (1)

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TWD219730S true TWD219730S (zh) 2022-07-01

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TW110305783F TWD219730S (zh) 2021-04-26 2021-10-26 電漿處理裝置用離子遮蔽板

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US (1) USD1008986S1 (fr)
JP (1) JP1700629S (fr)
TW (1) TWD219730S (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1037778S1 (en) * 2022-07-19 2024-08-06 Applied Materials, Inc. Gas distribution plate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD204229S (zh) 2018-10-25 2020-04-21 日商日立全球先端科技股份有限公司 電漿處理裝置用環

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CA127551A (fr) * 1909-12-18 1910-08-16 Leon Braquier Bombe a bombons
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD703160S1 (en) * 2011-01-27 2014-04-22 Hitachi High-Technologies Corporation Grounded electrode for a plasma processing apparatus
US10003873B2 (en) * 2011-09-06 2018-06-19 Kohler Co. Speaker and shower
US9573086B2 (en) * 2014-11-03 2017-02-21 Micah Corder Drain cover
JP1546801S (fr) * 2015-06-12 2016-03-28
TWD178425S (zh) * 2016-01-08 2016-09-21 Asm Ip Holding Bv 用於半導體製造設備的電極板
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
JP1584906S (fr) * 2017-01-31 2017-08-28
JP1598997S (fr) * 2017-08-31 2018-03-05
JP1598996S (fr) * 2017-08-31 2018-03-05
JP1598998S (fr) * 2017-08-31 2018-03-05
USD874617S1 (en) * 2018-02-12 2020-02-04 Chudun Chen Shower drain strainer
USD890298S1 (en) * 2018-05-04 2020-07-14 Kohler Mira Limited Shower head
USD877931S1 (en) * 2018-05-09 2020-03-10 Moleculight, Inc. Dispenser for a darkening drape
JP1624793S (fr) * 2018-07-24 2019-02-18
JP1624794S (fr) * 2018-07-24 2019-02-18
JP1624795S (fr) * 2018-07-24 2019-02-18
USD934993S1 (en) * 2019-05-09 2021-11-02 Fratelli Fantini S.P.A. Shower head
USD923744S1 (en) * 2020-01-08 2021-06-29 As America, Inc. Shower head
JP1678330S (fr) * 2020-05-27 2021-02-01
USD956271S1 (en) * 2021-02-19 2022-06-28 ZhiSheng Xu LED light panel with SMD light emitting diodes and DIP light emitting diodes

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD204229S (zh) 2018-10-25 2020-04-21 日商日立全球先端科技股份有限公司 電漿處理裝置用環

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Publication number Publication date
USD1008986S1 (en) 2023-12-26
JP1700629S (fr) 2021-11-29

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