TWD219730S - 電漿處理裝置用離子遮蔽板 - Google Patents

電漿處理裝置用離子遮蔽板 Download PDF

Info

Publication number
TWD219730S
TWD219730S TW110305783F TW110305783F TWD219730S TW D219730 S TWD219730 S TW D219730S TW 110305783 F TW110305783 F TW 110305783F TW 110305783 F TW110305783 F TW 110305783F TW D219730 S TWD219730 S TW D219730S
Authority
TW
Taiwan
Prior art keywords
plasma processing
article
processing equipment
shielding plate
pass
Prior art date
Application number
TW110305783F
Other languages
English (en)
Chinese (zh)
Inventor
中谷侑亮
田中一海
山岡正作
園田靖
岩瀬拓
Original Assignee
日商日立全球先端科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日立全球先端科技股份有限公司 filed Critical 日商日立全球先端科技股份有限公司
Publication of TWD219730S publication Critical patent/TWD219730S/zh

Links

Images

TW110305783F 2021-04-26 2021-10-26 電漿處理裝置用離子遮蔽板 TWD219730S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-008852 2021-04-26
JPD2021-8852F JP1700629S (cs) 2021-04-26 2021-04-26

Publications (1)

Publication Number Publication Date
TWD219730S true TWD219730S (zh) 2022-07-01

Family

ID=78766249

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110305783F TWD219730S (zh) 2021-04-26 2021-10-26 電漿處理裝置用離子遮蔽板

Country Status (3)

Country Link
US (1) USD1008986S1 (cs)
JP (1) JP1700629S (cs)
TW (1) TWD219730S (cs)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1071103S1 (en) * 2022-04-11 2025-04-15 Applied Materials, Inc. Gas distribution plate
USD1085029S1 (en) * 2022-07-19 2025-07-22 Applied Materials, Inc. Gas distribution plate
USD1037778S1 (en) * 2022-07-19 2024-08-06 Applied Materials, Inc. Gas distribution plate
USD1052548S1 (en) * 2023-06-26 2024-11-26 Applied Materials, Inc. Gas diffuser

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD204229S (zh) 2018-10-25 2020-04-21 日商日立全球先端科技股份有限公司 電漿處理裝置用環

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA127551A (en) * 1909-12-18 1910-08-16 Leon Braquier Confection explosive shell
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD703160S1 (en) * 2011-01-27 2014-04-22 Hitachi High-Technologies Corporation Grounded electrode for a plasma processing apparatus
US10003873B2 (en) * 2011-09-06 2018-06-19 Kohler Co. Speaker and shower
US9573086B2 (en) * 2014-11-03 2017-02-21 Micah Corder Drain cover
JP1546801S (cs) * 2015-06-12 2016-03-28
TWD178425S (zh) * 2016-01-08 2016-09-21 Asm Ip Holding Bv 用於半導體製造設備的電極板
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
JP1584906S (cs) * 2017-01-31 2017-08-28
JP1598997S (cs) * 2017-08-31 2018-03-05
JP1598998S (cs) * 2017-08-31 2018-03-05
JP1598996S (cs) * 2017-08-31 2018-03-05
USD874617S1 (en) * 2018-02-12 2020-02-04 Chudun Chen Shower drain strainer
USD890298S1 (en) * 2018-05-04 2020-07-14 Kohler Mira Limited Shower head
USD877931S1 (en) * 2018-05-09 2020-03-10 Moleculight, Inc. Dispenser for a darkening drape
JP1624793S (cs) * 2018-07-24 2019-02-18
JP1624794S (cs) * 2018-07-24 2019-02-18
JP1624795S (cs) * 2018-07-24 2019-02-18
USD934993S1 (en) * 2019-05-09 2021-11-02 Fratelli Fantini S.P.A. Shower head
USD923744S1 (en) * 2020-01-08 2021-06-29 As America, Inc. Shower head
JP1678330S (cs) * 2020-05-27 2021-02-01
USD956271S1 (en) * 2021-02-19 2022-06-28 ZhiSheng Xu LED light panel with SMD light emitting diodes and DIP light emitting diodes

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD204229S (zh) 2018-10-25 2020-04-21 日商日立全球先端科技股份有限公司 電漿處理裝置用環

Also Published As

Publication number Publication date
USD1008986S1 (en) 2023-12-26
JP1700629S (cs) 2021-11-29

Similar Documents

Publication Publication Date Title
TWD212326S (zh) 電漿處理裝置用離子遮蔽板
TWD219730S (zh) 電漿處理裝置用離子遮蔽板
TWD199478S (zh) 半導體製造裝置用離子遮蔽板
TWD199479S (zh) 半導體製造裝置用離子遮蔽器
CN109643630A (zh) 用于等离子体处理腔室的等离子体屏
TWD204229S (zh) 電漿處理裝置用環
TWI773738B (zh) 具複數氣體注入區的電漿剝離器具
ATE453206T1 (de) Abgestufte obere elektrode für plasmabehandlungsgleichmässigkeit
TWD194248S (zh) Air jet board for plasma processing equipment
TWD202287S (zh) 半導體製造裝置用離子遮蔽板保持具
TWI467625B (zh) 電漿處理裝置
TW201923941A (zh) 晶圓處理系統
JP5932457B2 (ja) チャックテーブル及びチャックテーブルを備える加工装置
TW202221840A (zh) 吸附板
CN105225999B (zh) 一种承片台
US20040050420A1 (en) Method for detecting solvent leakage during manufacture of a semiconductor device
US20050016568A1 (en) Apparatus and method for cleaning of semiconductor device manufacturing equipment
TWD230584S (zh) 反應管
TWD227107S (zh) 用於半導體製程的氣體分佈板
TWD225952S (zh) 電漿處理裝置用上腔室
US20020036774A1 (en) Apparatus and method for handling and testing of wafers
TWD230582S (zh) 半導體製造裝置用分流器
KR101218555B1 (ko) 기판처리장치
CN207183208U (zh) 一种进气机构及预清洗腔室
US5875560A (en) Method and apparatus for aligning surfaces in close proximity