TWD200074S - 半導體製造裝置之隔熱組件用支柱 - Google Patents
半導體製造裝置之隔熱組件用支柱Info
- Publication number
- TWD200074S TWD200074S TW107302986F TW107302986F TWD200074S TW D200074 S TWD200074 S TW D200074S TW 107302986 F TW107302986 F TW 107302986F TW 107302986 F TW107302986 F TW 107302986F TW D200074 S TWD200074 S TW D200074S
- Authority
- TW
- Taiwan
- Prior art keywords
- heat
- manufacturing equipment
- semiconductor manufacturing
- thermal insulation
- insulation components
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000009413 insulation Methods 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 3
- 235000012431 wafers Nutrition 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2018-2488F JP1611561S (enrdf_load_stackoverflow) | 2018-02-07 | 2018-02-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD200074S true TWD200074S (zh) | 2019-10-01 |
Family
ID=63169008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107302986F TWD200074S (zh) | 2018-02-07 | 2018-05-28 | 半導體製造裝置之隔熱組件用支柱 |
Country Status (3)
Country | Link |
---|---|
US (1) | USD928106S1 (enrdf_load_stackoverflow) |
JP (1) | JP1611561S (enrdf_load_stackoverflow) |
TW (1) | TWD200074S (enrdf_load_stackoverflow) |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2776811A (en) * | 1953-09-02 | 1957-01-08 | Shaffer Paul | Adjustable post |
US2763818A (en) * | 1954-10-14 | 1956-09-18 | Westinghouse Electric Corp | Lighting arrester |
US3019367A (en) * | 1957-01-04 | 1962-01-30 | Ohio Brass Co | Lighting arrester and gap unit therefor |
US3282001A (en) * | 1963-05-06 | 1966-11-01 | United States Steel Corp | Base construction for supporting a column |
US3249719A (en) * | 1964-10-16 | 1966-05-03 | Joslyn Mfg & Supply Co | High voltage arrester cutout |
US3400301A (en) * | 1966-05-27 | 1968-09-03 | Joslyn Mfg & Supply Co | Lightning arrester in combination with an arrester disconnector containing explosivemeans |
US4152089A (en) * | 1977-07-07 | 1979-05-01 | Stannard George E | Method and apparatus for forming a cast-in-place support column |
JPS597584U (ja) * | 1982-07-06 | 1984-01-18 | 三菱電機株式会社 | 避雷装置 |
US4523054A (en) * | 1983-04-04 | 1985-06-11 | Interpace Corporation | Line-past insulator support system, method of assembly thereof, and clamp for use therein |
USD281199S (en) * | 1983-05-18 | 1985-10-29 | Prawl William F | Safety stand for use in association with hydraulic lift |
US4596906A (en) * | 1985-04-10 | 1986-06-24 | S&C Electric Company | Arrangement for providing independent rotary and linear drive outputs for high-voltage switches |
CA2184241C (en) * | 1996-08-27 | 2001-08-14 | Robert Theodore Belke | Structural support column with a telescopically adjustable head |
USD298915S (en) * | 1987-06-25 | 1988-12-13 | Rowley Var C | Vertically adjustable valve and pipe support |
USD354739S (en) * | 1993-06-30 | 1995-01-24 | Durham Rodney L | Underground storage unit for items sensitive to environmental conditions |
US6499916B2 (en) * | 1999-04-14 | 2002-12-31 | American Commercial Inc. | Compressible support column |
KR100360401B1 (ko) * | 2000-03-17 | 2002-11-13 | 삼성전자 주식회사 | 슬릿형 공정가스 인입부와 다공구조의 폐가스 배출부를포함하는 공정튜브 및 반도체 소자 제조장치 |
TW542218U (en) * | 2002-10-09 | 2003-07-11 | Foxsemicon Intergated Technolo | Substrate supporting rod and substrate cassette using the same |
USD544448S1 (en) * | 2004-07-30 | 2007-06-12 | The Lamson & Sessions Co. | Transition adapter for electrical conduit |
USD515521S1 (en) * | 2004-10-04 | 2006-02-21 | Emerson Electric Co. | Exterior of an electric machine housing |
US20060072288A1 (en) * | 2004-10-04 | 2006-04-06 | Stewart William P | Electric machine with power and control electronics integrated into the primary machine housing |
JP6476369B2 (ja) * | 2013-03-25 | 2019-03-06 | 株式会社Kokusai Electric | クリーニング方法、半導体装置の製造方法、基板処理装置及びプログラム |
USD770236S1 (en) * | 2014-08-14 | 2016-11-01 | Venkateswara Prasad Pattipati | Wine bottle holder |
SG11201705569PA (en) * | 2015-01-07 | 2017-08-30 | Hitachi Int Electric Inc | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium |
JP1564810S (enrdf_load_stackoverflow) | 2016-02-10 | 2016-12-05 | ||
US20170342562A1 (en) * | 2016-05-31 | 2017-11-30 | Lam Research Corporation | Vapor manifold with integrated vapor concentration sensor |
US10415206B1 (en) * | 2018-09-11 | 2019-09-17 | James Henry | Beam and base for supporting structures |
USD905541S1 (en) * | 2019-12-12 | 2020-12-22 | RS Transportation Trucking Inc. | Adjustable support-stand for chemical hoses |
-
2018
- 2018-02-07 JP JPD2018-2488F patent/JP1611561S/ja active Active
- 2018-05-28 TW TW107302986F patent/TWD200074S/zh unknown
- 2018-07-12 US US29/656,381 patent/USD928106S1/en active Active
Also Published As
Publication number | Publication date |
---|---|
USD928106S1 (en) | 2021-08-17 |
JP1611561S (enrdf_load_stackoverflow) | 2018-08-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWD183004S (zh) | 半導體製造裝置之隔熱組件 | |
JP2016051864A5 (enrdf_load_stackoverflow) | ||
TWD197466S (zh) | 基板處理裝置用隔熱板 | |
WO2011094143A3 (en) | Apparatus for controlling temperature uniformity of a showerhead | |
TWD183010S (zh) | 基板處理裝置用晶舟 | |
SG11201808114VA (en) | Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium | |
TW200943472A (en) | Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber | |
JP2013513239A5 (enrdf_load_stackoverflow) | ||
JP2015527486A5 (enrdf_load_stackoverflow) | ||
TW200411717A (en) | Method and apparatus for supporting semiconductor wafers | |
JP1700777S (ja) | 基板処理装置用ボート | |
JP2013140990A5 (enrdf_load_stackoverflow) | ||
CN103871837A (zh) | 改善晶圆翘曲度的方法 | |
JP2015109419A5 (enrdf_load_stackoverflow) | ||
TW201112333A (en) | Substrate processing apparatus | |
JP1678278S (ja) | 基板処理装置用ボート | |
TW201447212A (zh) | 支持構件及半導體製造裝置 | |
JP2014175509A5 (ja) | 半導体装置の製造方法、基板処理装置およびプログラム | |
CN105097940A (zh) | 薄膜晶体管阵列衬底结构及其制造方法 | |
TWD183005S (zh) | 半導體製造裝置之隔熱組件外罩 | |
TWD183008S (zh) | 基板處理裝置用加熱器 | |
TWD200074S (zh) | 半導體製造裝置之隔熱組件用支柱 | |
JP2009194374A5 (ja) | Soi基板の作製方法 | |
CN103898476A (zh) | 薄膜沉积装置及薄膜沉积方法 | |
JP2015204434A (ja) | サセプタ処理方法及びサセプタ処理用プレート |