TWD175851S - 晶圓支撐環之部分 - Google Patents

晶圓支撐環之部分

Info

Publication number
TWD175851S
TWD175851S TW104304797F TW104304797F TWD175851S TW D175851 S TWD175851 S TW D175851S TW 104304797 F TW104304797 F TW 104304797F TW 104304797 F TW104304797 F TW 104304797F TW D175851 S TWD175851 S TW D175851S
Authority
TW
Taiwan
Prior art keywords
design
support ring
wafer
center
bump
Prior art date
Application number
TW104304797F
Other languages
English (en)
Inventor
Eric A Kirkland
Russ V Raschke
Jason T Steffens
Original Assignee
安堤格里斯公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 安堤格里斯公司 filed Critical 安堤格里斯公司
Publication of TWD175851S publication Critical patent/TWD175851S/zh

Links

Abstract

【物品用途】;本設計係關於一種晶圓支撐環之部分，本設計所依附之物品可用於支撐晶圓。;【設計說明】;本設計之特點在於晶圓支撐環上設置有凸塊，該凸塊包含一頂部(凸塊外側距支撐環中心較遠之部分)、一底部(凸塊內側距支撐環中心較近之部分)與兩側面。其中，頂部面積小於底部，兩者皆採用平滑流暢之弧形線條，不僅展現細緻之視覺美感，也使底部與頂部更加緊密貼合於支撐環；連接底部與頂部間之兩側面，具有一傾斜角度，使得本設計之整體造型乍看之下呈梯形形狀，不僅實用且饒富趣味，將對消費者產生印象深刻之視覺效果。;右側視圖因為與前視圖相對稱而省略。;局部放大立體圖顯示本設計之凸塊及周圍結構之形狀。;使用狀態參考圖顯示本設計所依附之晶圓支撐環撐持晶圓。;圖式所揭露之虛線部分，為本案不主張設計之部分。
TW104304797F 2015-03-02 2015-09-02 晶圓支撐環之部分 TWD175851S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/519,122 USD767234S1 (en) 2015-03-02 2015-03-02 Wafer support ring

Publications (1)

Publication Number Publication Date
TWD175851S true TWD175851S (zh) 2016-05-21

Family

ID=56895806

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104304797F TWD175851S (zh) 2015-03-02 2015-09-02 晶圓支撐環之部分

Country Status (2)

Country Link
US (1) USD767234S1 (zh)
TW (1) TWD175851S (zh)

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USD934315S1 (en) * 2020-03-20 2021-10-26 Applied Materials, Inc. Deposition ring for a substrate processing chamber
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USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
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Also Published As

Publication number Publication date
USD767234S1 (en) 2016-09-20

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