TW594041B - Antireflection substrate in ultraviolet and vacuum ultraviolet region - Google Patents

Antireflection substrate in ultraviolet and vacuum ultraviolet region Download PDF

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Publication number
TW594041B
TW594041B TW089123296A TW89123296A TW594041B TW 594041 B TW594041 B TW 594041B TW 089123296 A TW089123296 A TW 089123296A TW 89123296 A TW89123296 A TW 89123296A TW 594041 B TW594041 B TW 594041B
Authority
TW
Taiwan
Prior art keywords
substrate
ultraviolet
antireflection
vacuum ultraviolet
vacuum
Prior art date
Application number
TW089123296A
Other languages
English (en)
Inventor
Satoru Takaki
Kaname Okada
Shinya Kikugawa
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of TW594041B publication Critical patent/TW594041B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)

Description

594041 Α8 Β8 C8 D8 六、申請專利範圍 真空紫外線區域之抗反射基體，其中前述基體之厚度爲 100/zm 至 500#m。 (請先聞讀背面之注意事項再填寫本頁) 6 ·如申請專利範圍第5項之紫外線及真空紫外線區 域之抗反射基體，其中與前述抗反射膜之基體連接的層爲 由氟化物所構成的層。 7 .如申請專利範圍第1〜3項中任一項之紫外線及 真空紫外線區域之抗反射基體，其中前述中心波長λ Q爲在 1 5 0 nm至2 0 0 nm之任一個波長。 8 ·如申請專利範圍第7項之紫外線及真空紫外線區 域之抗反射基體，其中前述中心波長係1 5 7 nm或 1 9 3 n m 〇 9 ·如申請專利範圍第1〜3項中任一項之紫外線及 真空紫外線區域之抗反射基體，其中在波長6 3 2 . 8 nm附近之反射率爲3.5%以下。 經濟部智慧財產局員工消費合作社印製 1 0 .如申請專利範圍第1〜3項中任一項之紫外線 及真空紫外線區域之抗反射基體，其中對於與前述中心波 長λ 〇相同波長之光之透光率之最大値與最小値之差爲1 % 以下。 1 1 · 一種半導體製造裝置用光學構件，係由如申請 專利範圍第1項至第10項中任一項之抗反射基體而成。 1 2 . —種低反射薄膜用基體，係由如申請專利範圍 第1項至第10項中任一項之抗反射基體而成。 3 本紙張尺度逋用中國國家揉準（CNS ) Α4規格（210X297公釐）
TW089123296A 1999-11-05 2000-11-04 Antireflection substrate in ultraviolet and vacuum ultraviolet region TW594041B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31537699 1999-11-05

Publications (1)

Publication Number Publication Date
TW594041B true TW594041B (en) 2004-06-21

Family

ID=18064673

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089123296A TW594041B (en) 1999-11-05 2000-11-04 Antireflection substrate in ultraviolet and vacuum ultraviolet region

Country Status (5)

Country Link
US (2) US6628456B2 (zh)
EP (1) EP1227344A4 (zh)
KR (1) KR100709045B1 (zh)
TW (1) TW594041B (zh)
WO (1) WO2001035125A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
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TWI800421B (zh) * 2022-06-30 2023-04-21 吳鳳學校財團法人吳鳳科技大學 可擴充帶寬的組合式帶通濾光片組

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EP1227344A4 (en) 1999-11-05 2005-08-31 Asahi Glass Co Ltd ANTI-REFLECTION BASE FOR UV AND VACUUM UV AREAS
DE10064143A1 (de) 2000-12-15 2002-06-20 Zeiss Carl Reflexionsminderungsbeschichtung für Ultraviolettlicht bei großen Einfallswinkeln
EP1394572B1 (en) 2001-05-09 2010-04-21 Hamamatsu Photonics K.K. Method of producing optical lens, and optical lens
CN100385261C (zh) 2001-05-09 2008-04-30 浜松光子学株式会社 光学透镜的制造方法
JP3711063B2 (ja) * 2001-11-08 2005-10-26 大日本印刷株式会社 防塵装置付きフォトマスク及びこれを用いた露光方法
JP4423119B2 (ja) * 2004-06-16 2010-03-03 キヤノン株式会社 反射防止膜及びそれを用いた光学素子
US7713632B2 (en) 2004-07-12 2010-05-11 Cardinal Cg Company Low-maintenance coatings
US7923114B2 (en) 2004-12-03 2011-04-12 Cardinal Cg Company Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
US8092660B2 (en) 2004-12-03 2012-01-10 Cardinal Cg Company Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films
US20060204766A1 (en) * 2005-03-14 2006-09-14 Jds Uniphase Corporation Anti-moisture and soil-repellent coatings
DE102005041938A1 (de) * 2005-09-03 2007-03-08 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
JP5129975B2 (ja) 2006-04-11 2013-01-30 日本板硝子株式会社 向上した低保守特性を有する光触媒コーティング
US7989094B2 (en) 2006-04-19 2011-08-02 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US7929115B2 (en) * 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
EP2066594B1 (en) 2007-09-14 2016-12-07 Cardinal CG Company Low-maintenance coatings, and methods for producing low-maintenance coatings
US8830141B2 (en) * 2009-04-02 2014-09-09 GM Global Technology Operations LLC Full-windshield head-up display enhancement: anti-reflective glass hard coat
KR101628367B1 (ko) * 2009-08-12 2016-06-08 엘지이노텍 주식회사 펠리 클 막
US9693799B2 (en) 2009-09-17 2017-07-04 Pilofocus, Inc. System and method for aligning hair follicle
WO2011035125A1 (en) 2009-09-17 2011-03-24 Wesley Carlos K Hair restoration surgery
US9314082B2 (en) 2009-09-17 2016-04-19 Pilofocus, Inc. System and method for extraction of hair follicle
SG11201402357TA (en) * 2011-10-17 2014-08-28 Carlos K Wesley Hair restoration
CN105268110B (zh) * 2014-06-19 2018-03-13 昆山科技大学 黄疸光疗装置
DE102015100091A1 (de) * 2015-01-07 2016-07-07 Rodenstock Gmbh Schichtsystem und optisches Element mit einem Schichtsystem
JP6789972B2 (ja) 2015-11-27 2020-11-25 Hoya株式会社 マスクブランク用基板、多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI800421B (zh) * 2022-06-30 2023-04-21 吳鳳學校財團法人吳鳳科技大學 可擴充帶寬的組合式帶通濾光片組

Also Published As

Publication number Publication date
WO2001035125A1 (fr) 2001-05-17
US6829084B2 (en) 2004-12-07
KR100709045B1 (ko) 2007-04-18
EP1227344A1 (en) 2002-07-31
US20030025991A1 (en) 2003-02-06
US6628456B2 (en) 2003-09-30
EP1227344A4 (en) 2005-08-31
KR20020060725A (ko) 2002-07-18
US20030214704A1 (en) 2003-11-20

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