TW583479B - Active matrix liquid crystal display device and liquid crystal material - Google Patents

Active matrix liquid crystal display device and liquid crystal material Download PDF

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Publication number
TW583479B
TW583479B TW090113607A TW90113607A TW583479B TW 583479 B TW583479 B TW 583479B TW 090113607 A TW090113607 A TW 090113607A TW 90113607 A TW90113607 A TW 90113607A TW 583479 B TW583479 B TW 583479B
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Taiwan
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liquid crystal
display device
film
electrode
crystal display
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TW090113607A
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Chinese (zh)
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Yasushi Iwakabe
Masuyuki Ohta
Shigeru Matsuyama
Hitoshi Oaku
Katsumi Kondo
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Hitachi Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/52Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
    • C09K19/58Dopants or charge transfer agents
    • C09K19/582Electrically active dopants, e.g. charge transfer agents
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/134309Electrodes characterised by their geometrical arrangement
    • G02F1/134363Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition

Abstract

An active matrix liquid crystal display device is provided, in which an after image remaining after removing an application of a direct current voltage is suppressed. The active matrix liquid crystal display device has a liquid crystal layer containing a liquid crystal molecule having negative dielectric anisotropy and a dopant having a dissociative group.

Description

7C 347 Μ ________________Β7 五、發明説明(1 ) 竣明所丨勸之技術領域 (請先閱讀背面之注意事項-S-填寫本莧) 本發明係有關液晶顯不裝置中之所謂面內轉換方式之 主動矩陣型液晶顯示裝置。 先行技術 液晶顯示裝置,係於一對基板間夾置液晶層,於其液 晶分子施加.電場變化液晶之配向方向,藉以產生液晶層之 光學變化,利用該變化以作顯示。 以往的主動矩陣型液晶顯示裝置,係將施加於液晶之 電場的方向設定爲大致垂直於夾置液晶之基板面,可以利 用液晶層的光旋光性作顯示之扭轉向列(τ N )顯示方式 爲代表。 經濟郎^曰毯时產苟貨工七费合阼良 另一方面,使用梳型電極,施加於液晶之電場方向大 致與基板面平行,利用液晶之複折射性作顯示之面內轉換 方式(I P S )的液晶顯示裝置,已見提議於日本專利特 公昭6 3 - 2 1 9 0 7號公報,美國專利第 4345249 號,W〇 91/10936,特開平 6-160878號公報等。 \ 較之以往的T N方式,面內轉換方式有視角寬,負載 電容低等之優點,係取代T N方式的新型主動矩陣液晶顯 示裝置,近年來快速進步中之技術。 I P S 方式,如由 M.〇h-e,M.Yoneya,and K.Kondo, J.Applied Physics, 1 997,Vol.82,Νο·4,5 2 8 - 5 3 5 可知,較之 正介電各向異性之液晶,具負介電各向異性之液晶可實現 崖-__- ---- ---------- — -- --------------- ->-〇···>··,»*· · * 一 . ------ 1 ' --- --- ^^^適用中國國家標隼(〇、〇八4規格(2丨0:<297公漦) ^ 583479 B7___ 五、發明説明(2 ) (請先閱讀背面之注意事項再填寫本頁) 更完全的面內轉換。而,具負介電各向異性Z液晶’相對 於液晶分子長軸方向之介電率,與其垂直的短軸方向之介 電率較大,而,具有正介電率各向異性之液晶,相對於液 晶分子的長軸方向之介電率,與其垂直的短軸方向之介電 率較小。 完全的面內轉換之實現,係指包含半色調的液晶顯示 裝置之更加完全的視角擴大。因此,ί P S方式中,所用 之液晶基於上述觀點,係以具負的介電各向異性之液晶爲 佳。 上述I P S方式中,係使用設置在上述成對基板之一 的表面內之條紋狀不透明金屬梳型電極。 然而近來,有對改良穿透率及開口率之I p s的一種 提議,係取代不透明金屬電極,用I τ〇(銦錫氧化物) 等透明導電物質形成梳型電極,且採用負介電率各向異性 之液晶材料,則即使是形成於梳型電極之邊緣部份的電場 也能夠將存在於透明梳型電池上方之液晶全予定向變化。 經濟部智祛財產局貨工消費合作社印贤 有關上述提議之文獻有例如,S.H.Lee, S.L Lee and H.Y.Kim Asia Display, 1998,ρρ.371-374,及 S.H.Lee,S.L.Lee, Η.Y.Kim and T.Y.Eom,SID Digest, 1 999, ρρ·202-205 0 上述文獻中報告有,組合介電率各向異性爲負之液晶 材料與短間距透明梳型電極的I P S方式,可具近乎Τ N 方式之穿透率而依然維持相當於I P S方式之寬視角特性 ^紙ifc尺度適用中國國幻洛隼(CKS ) Λ4:«_ί格(2 10 X 297公漦) ~ - 5- 經濟部智祛財產局員工消资合作社印焚 583479 A7 _________________ B7 五、發明説明(3 ) 發明所欲解決之課題·用以解決課題之手段 液晶顯示裝置中,於液晶層施加重疊有直流電壓之液 晶驅動電壓波形時,已知在去除直流電壓後液晶層中仍殘 留有直流電壓(直流偏移電壓)。 如松本正〜編著之「液晶顯示技術」,產業圖書股份 有限公司發行(1 9 9 6 ),第2章第7〇至7 3頁所討 論,主動矩陣型液晶顯示裝置在通常的液晶驅動中,以重 疊直流電壓之驅動電壓波形施加於液晶層,發生於液晶顯 示裝置之主動驅動元件的構造上以作灰度顯示等時,直流 電壓的重疊現象仍難以完全防止。此一現象乃係以往的 T N方式及I P s方式之共通現象。 上述的殘留直流電壓無論在T N方式或I P S方式, 都會影響液晶顯示裝置之亮度,於施加及未施加直流電壓 的部份之間,或所施加之直流電壓強度不同的部份之間產 生亮度差。 因此,例如以通常之驅動條件長期顯示文字、圖形時 ,顯示消除後,會發生先前所顯示之文字、圖形的暫時顯 示之現象。 其結果即有損於顯示之均勻性。如此之現象在液晶顯 示裝置中稱爲「殘像」,雖在出現後隨著時間強度變弱終 於消失,到人眼無法看出有時需3 〇分鐘以上。 至於施加直流電壓時,在液晶層殘留有直流偏移電壓 之機制,在信學技報E I D 9 6 - 8 9 ( 1 9 9 7 -〇1 ) 之第2 9至3 4頁,提議有以習知之τ N方式爲例,藉液 $浪尺度適用中剛i家標準(一™㈧八视 (請先閱讀背面之注意事項再填寫本頁)7C 347 Μ ________________B7 V. Description of the invention (1) The technical field advised by Chuangming (please read the note on the back-S-Fill this 苋) The present invention relates to the so-called in-plane conversion method in the liquid crystal display device. Active matrix type liquid crystal display device. The prior art liquid crystal display device is a liquid crystal layer sandwiched between a pair of substrates, and the liquid crystal molecules are applied to it. The electric field changes the alignment direction of the liquid crystal, thereby generating an optical change of the liquid crystal layer, and using the change for display. Conventional active-matrix liquid crystal display devices set the direction of the electric field applied to the liquid crystal to be approximately perpendicular to the substrate surface sandwiching the liquid crystal, and can use the optical rotation of the liquid crystal layer as a twisted nematic (τ N) display mode for display. to represent. Jiujilang ^ Said that the production and delivery workers in the blanket are cost-effective. On the other hand, using comb-shaped electrodes, the direction of the electric field applied to the liquid crystal is approximately parallel to the substrate surface, and the birefringence of the liquid crystal is used for in-plane conversion ( IPS) liquid crystal display devices have been proposed in Japanese Patent Publication No. 6 3-2 1907, US Patent No. 4345249, WO91 / 10936, Japanese Patent Application Laid-Open No. 6-160878, and the like. Compared with the previous T N method, the in-plane conversion method has the advantages of wide viewing angle and low load capacitance. It is a new type of active matrix liquid crystal display device that replaces the T N method. The technology is rapidly progressing in recent years. IPS method, as shown by M.〇he, M. Yoneya, and K. Kondo, J. Applied Physics, 1 997, Vol. 82, No. 4, 5 2 8-5 3 5 Anisotropic liquid crystals, liquid crystals with negative dielectric anisotropy can achieve -__- ---- ------------------------- --> -〇 ·· > ··, »* · · * I. ------ 1 '--- --- ^^^ Applicable to Chinese national standard 隼 (〇 、 〇 八 4 Specifications (2 丨 0: < 297 Gong) ^ 583479 B7___ V. Description of the invention (2) (Please read the precautions on the back before filling this page) More complete in-plane conversion. And, with negative dielectric anisotropy The dielectric rate of the anisotropic Z liquid crystal with respect to the long axis direction of the liquid crystal molecules is larger than that of the short axis direction perpendicular to the liquid crystal molecules, and the liquid crystal with positive dielectric anisotropy is relative to the long axis direction of the liquid crystal molecules. The dielectric constant is smaller in the direction of the minor axis perpendicular to it. The realization of complete in-plane conversion means that the viewing angle of a liquid crystal display device including halftone is expanded more completely. Therefore, in the PS method, the Based on the above viewpoint, the liquid crystal is based on a negative dielectric anisotropy. A liquid crystal having better properties is preferred. In the above-mentioned IPS method, a stripe-shaped opaque metal comb-type electrode provided in the surface of one of the paired substrates is used. However, recently, there is a method of improving I ps of transmittance and aperture ratio. It is proposed that instead of opaque metal electrodes, a comb-type electrode is formed of a transparent conductive material such as I τ〇 (indium tin oxide), and a liquid crystal material with negative dielectric anisotropy is used, even if it is formed on the edge of the comb-type electrode Part of the electric field can also orient the liquid crystal existing on the top of the transparent comb-type battery. Yin Xian, a goods-consumer consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, related to the above proposals, for example, SHLee, SL Lee and HYKim Asia Display, 1998, ρρ. 371-374, and SHLee, SLLee, Η.Y.Kim and TYEom, SID Digest, 1 999, ρρ · 202-205 0 It is reported in the above literature that the combined dielectric constants have different directions The IPS method with a negative anisotropy liquid crystal material and a short-pitch transparent comb electrode can have a penetration rate close to the TN method and still maintain a wide viewing angle characteristic equivalent to the IPS method. (CKS) Λ4: «_ί 格 (2 10 X 297 Gong) ~-5- Employees' Cooperatives of the Intellectual Property Office of the Ministry of Economic Affairs, India 583479 A7 _________________ B7 V. Description of the Invention (3) Problems to be solved by the invention · In a liquid crystal display device, when a liquid crystal driving voltage waveform superimposed with a DC voltage is applied to a liquid crystal layer, it is known that a DC voltage (DC offset voltage) remains in the liquid crystal layer after the DC voltage is removed. As discussed in "Liquid Crystal Display Technology" edited by Masamoto Matsumoto, published by Sangyo Books Co., Ltd. (1996), Chapter 2, pages 70 to 73, active matrix liquid crystal display devices are used in ordinary liquid crystal drives. When the driving voltage waveform of the superimposed DC voltage is applied to the liquid crystal layer and occurs on the structure of the active driving element of the liquid crystal display device for grayscale display, etc., the superimposed phenomenon of the DC voltage is still difficult to completely prevent. This phenomenon is a common phenomenon of the previous T N method and I P s method. Regardless of the above-mentioned residual DC voltage in the TN mode or the IPS mode, the brightness of the liquid crystal display device will be affected, and a brightness difference will occur between the applied and unapplied DC voltage parts or the parts with different DC voltage strengths. . Therefore, for example, when characters and graphics are displayed for a long period of time under normal driving conditions, the temporary display of previously displayed characters and graphics may occur after the display is eliminated. As a result, the uniformity of the display is impaired. Such a phenomenon is called "afterimage" in a liquid crystal display device. Although the intensity becomes weaker with time after the appearance and eventually disappears, it may take more than 30 minutes for the human eye to see it. As for the mechanism of the DC offset voltage remaining in the liquid crystal layer when a DC voltage is applied, pages 29 to 34 of the letter EID 9 6-8 9 (1 9 7-〇 1) are proposed. The known τ N method is used as an example. The borrowing liquid wave scale is applicable to the standard of Zhonggang i (one ™ eight eyesight (please read the precautions on the back before filling this page)

-6- 583479 A7 __ B7 五、發明説明(4 ) 晶層中離子之行爲作說明之模型。 根據該模型,液晶層中殘留直流電壓之原因,推測係 充電於配向膜之直流電壓,及離子之吸附於液晶定向用之 配向膜。於是,結論即,數分鐘左右之直流電壓的殘留乃 起因於配向膜的充電及鬆弛,而其以上之很長時間的直流 電壓之殘留乃起因於離子之吸附於配向膜。 較之T N方式,I P S方式的殘像發生較多。T N方 式中,像素電極與對向電極之間僅有液晶定向控制層及液 晶層存在,電場依序作用於像素電極、液晶定向控制層、 液晶層、液晶定向控制層、對向電極。 另一方面,I P S方式中,像素電極與對向電極之間 除液晶層及液晶定向控制層以外有絕緣膜,電場依序作用 於像素電極、液晶定向控制層、液晶層、液晶定向控制層 、絕緣層、對向電極。 (請先閲讀背面之注意事項再填寫本頁) 訂 留弛 殘鬆 壓及 電電 流充 直有 之均 膜膜 向緣 配絕 慮及 考膜 須向 僅配 中因 式則 方 , N中 T式 ,方 之 S ^三口 P 易 I 而 像 殘 生 發 於 易 更 係 應 式 經濟部智祛財產局a(工消費合作社印製 層 , 緣時 絕層 置緣 配絕 上有 極夾 電間 向之 對極 或電 極向 電對 素與 像極<、、 8 有素 也像 中的 方式場 N方電 τ N 加 之 T 施 較 當 孔 開 膜 緣 絕 份 β, 咅 之 上 極 電 向 對 及 極 電 素 。 像 像於 殘若 生 ’ 發是 於但 易 亦 晶像弛 液_鬆 、貝其 0 I S 著1 i— Iril 11¾ 素^充像Ϊ 2 於、膜 場B向 電1¾配 加控因 施向於 序定對 依 晶 ,液 定 之 的 、 象 層。 現 晶制留 液控殘 、 予之 層可壓 制即電 控生流 向發直 適 I度 尺 Μ i本 |準 標 :家 國-6- 583479 A7 __ B7 V. Description of the invention (4) Model for explaining the behavior of ions in the crystal layer. According to this model, the cause of the residual DC voltage in the liquid crystal layer is presumed to be the DC voltage charged in the alignment film, and the alignment film used for the orientation of the ions to the liquid crystal. Therefore, the conclusion is that the residual of the DC voltage for several minutes is caused by the charging and relaxation of the alignment film, and the residual of the DC voltage for a long time above is caused by the adsorption of ions on the alignment film. Compared with the T N method, the I P S method has more afterimages. In the T N method, only the liquid crystal alignment control layer and the liquid crystal layer exist between the pixel electrode and the counter electrode, and the electric field acts on the pixel electrode, the liquid crystal alignment control layer, the liquid crystal layer, the liquid crystal alignment control layer, and the counter electrode in order. On the other hand, in the IPS method, an insulating film is provided between the pixel electrode and the counter electrode in addition to the liquid crystal layer and the liquid crystal alignment control layer. An electric field acts on the pixel electrode, the liquid crystal alignment control layer, the liquid crystal layer, the liquid crystal alignment control layer, Insulating layer, counter electrode. (Please read the precautions on the back before filling this page) Order the uniform film with the residual loose pressure and electric current. The film must be matched to the edge and the test film must only be equipped with the medium factor rule. N in T Fang Zhi S ^ Three mouths P Yi I and like the residual health issued by Yi Geng Ying Department of the Ministry of Economic Affairs Intellectual Property Bureau a (printing layer of industrial and consumer cooperatives, when the insulation layer is placed on the edge, there must be a pole-to-earth direction). The pair of electrodes or electrodes are opposite to the pair of electrodes and the image electrode < ,, 8 and the element is also in the same way as the field N square electricity τ N plus T. When the hole opening film edge is absolute β, Image like Yu Ruosheng's hair is like but Yi Yijing like relaxation fluid_ 松 、 贝 其 0 IS 着 1 i—Iril 11¾ Element ^ charge image Ϊ 2 and film field B is added to electricity 1¾ The controlling factor is applied to the ordering pair of crystals, the liquid layer, and the image layer. The crystal layer retains the liquid to control the residual, and the layer can be suppressed, that is, the electrical control of the flow of the hair is straight. country

格 •"1 ί ,/ iNS 公 583479 經濟部智慧財產局®工消赀合作社印奴 μ 五、發明説明(5 ) ,特開平7 - 1 5 9 7 8 6號公報提議,藉配向膜及液晶 之介電率及比電阻的最適化之控制方法。爲使配向膜及絕 緣層之充電及鬆弛及早減降殘像,液晶的低比電阻比係爲 有效。 液晶的低比電阻化可藉能降低液晶之比電阻的物質之 添加來達成。例如,特開平1 1 一 3 0 2 6 5 2號公報提 議,於液晶中添加氧化性化合物即可調整液晶之比電阻。 然而,使用介電率各向異性爲正的液晶材料之I p S 方式及正介電率各向異性液晶材料與短間距梳形電極組合 之ί P S方式中,使用含上述之氧化性化合物之液晶時, 殘像不成問題。 但是,使用介電率各向異性爲負之液晶材料的I P S 方式及負介電率各向異性液晶材料與短間距梳形電極組合 之I P S方式中,即使使用上述氧化性化合物,殘像之發 生仍完全不得改善。 上述氧化性化合物具有類似於正介電率各向異性液晶 材料之分子構造。即,分子長軸方向之二末端之一係由烷 基、烷氧基之類的無極性或極性非常低的基以外之極性基 所成。 亦即,係由諸如氰基、含氟基之高極性基所成,於分 子長軸方向有強於短軸方向之極化。 又,正介電率各向異性之液晶分子,在分子短軸方向 及分子長軸方向也都有極化。如此,正介電率各向異性液 晶材料及如此之氧化性化合物,其分子軸方向以及極化方 本紙ifc尺度適用中國國家&孪(CNS )八4規格(210X 297公焓)格 " 1 ί, / iNS company 583479 Intellectual Property Office of the Ministry of Economic Affairs® Industrial Consumption Cooperative Cooperative Indu μ 5. Description of the Invention (5), Japanese Patent Application Laid-Open No. 7-1 5 9 7 8 6 proposes to borrow the orientation film and Optimal control method for dielectric constant and specific resistance of liquid crystal. In order to charge and relax the alignment film and the insulating layer and reduce the afterimage early, the low specific resistance ratio of the liquid crystal is effective. The lower specific resistance of the liquid crystal can be achieved by the addition of a substance capable of reducing the specific resistance of the liquid crystal. For example, Japanese Patent Application Laid-Open No. 1 1 to 3 0 2 6 5 2 proposes that the specific resistance of a liquid crystal can be adjusted by adding an oxidizing compound to the liquid crystal. However, in the I p S method using a liquid crystal material with a positive dielectric anisotropy and the PS method using a combination of a positive dielectric anisotropy liquid crystal material and a short-pitch comb electrode, the above-mentioned oxidizing compound is used. In liquid crystal, afterimages are not a problem. However, in the IPS method using a liquid crystal material having a negative dielectric anisotropy and the IPS method using a combination of a negative dielectric anisotropic liquid crystal material and a short-pitch comb electrode, even if the above-mentioned oxidizing compound is used, afterimages occur Still no improvement at all. The oxidizing compound has a molecular structure similar to that of a positive dielectric anisotropic liquid crystal material. That is, one of the two ends in the long axis direction of the molecule is formed by a polar group other than a non-polar or very low-polar group such as an alkyl group or an alkoxy group. That is, it is made of a highly polar group such as a cyano group or a fluorine-containing group, and has a stronger polarization in the long axis direction than in the short axis direction. In addition, liquid crystal molecules with positive dielectric anisotropy are polarized both in the short axis direction and in the long axis direction. In this way, the positive dielectric anisotropic liquid crystal material and such oxidizing compounds have their molecular axis directions and polarization directions. The paper's ifc scale is applicable to the Chinese National & Twin (CNS) 8-4 specification (210X 297 enthalpy).

·-·· (請先閱讀背面之注意事項存填寫本畜C·-·· (Please read the precautions on the back and fill in this animal C

-8- 583479 k.l _____ B7 五、發明说明(6 ) 向均成一·致。此應係可有效鬆弛殘留之直流電壓的原因。 然而,介電率各向異性爲負之液晶材料中,分子長軸 方向二末端係由諳如烷基、烷氧基之無極性或極性非常低 的基所成,並且分子短軸方向之一側因係由氰基、含氟基 之類的高極性基所成,則分子短軸方向有強於分子長軸方 向之極化。 如此,介電率各向異性爲負之液晶材料與具有類似於 正介電率各向異性液晶材料之分子構造的氧化性化合物, 分子軸方向與極化方向並非一致。此應係殘留直流電壓無 法有效鬆弛之原因。 本發明係爲解決上述諸課題,其目的在提供,使用負 介電率各向異性之液晶材料的I p S方式及組合負介電率 各向異性之液晶材料與短間距透明梳形電極的I P S方式 中,不易發生施加直流電壓後殘留的顯示之不均狀態,亦 即殘像的I P S方式主動矩陣型液晶顯示裝置。 又,本發明係在提供,即使使用正介電率各向異性之 液晶材料時,以解離性摻質之添加,電極形狀之改變可使 殘像不易發生之I p s方式主動矩陣型液晶顯示裝置。 爲解決上述課題,本發明之液晶顯示裝置具有,一對 基板,夾置於上述一對基板之液晶層,配置於上述一對基 t反與i:述液晶層之間的用以規定上述液晶層之液晶分子的 定向方向之配向膜,及施加電壓於上述液晶層之像素電極 和對向電極,上述液晶層之液晶分子具負的誘電率異方性 ,並且該液晶層中混有具解離基之摻質。 本紙张尺度適用中國國家標準(C.NS ) Λ,丨规格(2丨οχ”7公狻) (請先閱讀背面之注意事項再填寫本頁)-8- 583479 k.l _____ B7 V. Description of the invention (6) Uniformity and uniformity. This should be the reason that can effectively relax the residual DC voltage. However, in a liquid crystal material with negative dielectric anisotropy, the two ends of the long axis direction of the molecule are formed by non-polar or very low polarity groups such as alkyl and alkoxy groups, and one of the short axis directions of the molecule The side factors are formed by highly polar groups such as cyano and fluorine-containing groups, so the short axis direction of the molecule has stronger polarization than the long axis direction of the molecule. In this way, the liquid crystal material with a negative dielectric anisotropy and the oxidizing compound having a molecular structure similar to that of a positive dielectric anisotropic liquid crystal material do not have the same molecular axis direction and polarization direction. This should be the reason that the residual DC voltage cannot effectively relax. The present invention is to solve the above-mentioned problems, and an object thereof is to provide an I p S method using a liquid crystal material with negative dielectric anisotropy and a combination of a liquid crystal material with negative dielectric anisotropy and a short-pitch transparent comb electrode. In the IPS method, an uneven display state that is difficult to occur after a DC voltage is applied, that is, an IPS method active matrix liquid crystal display device with an afterimage. In addition, the present invention provides an I ps-type active matrix liquid crystal display device in which even if a liquid crystal material with positive dielectric anisotropy is used, dissociative dopant is added, and the shape of the electrode is changed so that an afterimage cannot easily occur. . In order to solve the above problems, the liquid crystal display device of the present invention includes a pair of substrates, a liquid crystal layer sandwiched between the pair of substrates, and disposed between the pair of bases t and i: the liquid crystal layer to define the liquid crystal. Alignment film of the orientation direction of the liquid crystal molecules of the layer, and a pixel electrode and a counter electrode that are applied with voltage to the liquid crystal layer, the liquid crystal molecules of the liquid crystal layer have a negative anisotropy of electric induction, and the liquid crystal layer is mixed with dissociation Based on the dopants. The size of this paper applies to the Chinese National Standard (C.NS) Λ, 丨 specifications (2 丨 οχ ”7 cm) (Please read the precautions on the back before filling this page)

W 訂 經濟部智毡財產局员工消费合作社印製 583479 A7 ________ B7 _ 五、發明説明(7 ) 利用該液晶顯示裝置,因負介電率各向異性之液晶材 料含具有解離基之摻質,可提供殘像減降之液晶顯示裝置 〇 (請先閱讀背面之注意事項#填商本f ) 乂,包含至少其一係透明之一對基板5形成於該一對 基板之相向面上的液晶定向控制層,該一對基板間與該液 晶定向控制層(配向膜)接觸配置之由負介電率各向異性 之液晶組成物所成的液晶層,經絕緣膜形成於該一對基板 之一的像素電極和對向電極,及連接於該像素電極和對向 電極之主動元件的主動矩陣型液晶顯示裝置中,上述液晶 層僅於分子短軸方向具有解離基,且含分子軸方向二末端 爲烷基或烷氧基之摻質。 利用該液晶顯示裝置,負介電率各向異性之液晶材料 及僅於分子短軸方向具有解離基之摻質的分子軸方向與極 化方向可成一致。 因此,可高效鬆弛殘留之直流電壓,能提供殘像減降 之液晶顯示裝置。 經濟部智毡財產局㈣工消費合作社印製 而,在此具有解離基之摻質,係指酸性解離物質或鹼 性解離物質,在極性溶劑中自動解離產生Η㊉離子,或與水 反應產生〇Η Θ離子之物質。 具體而言,指羧酸(含酐)、酰胺、胺、醇等物質。 添加如此之物質於液晶中,則液晶的離子濃度上升,比電 阻下降。 像尜電極和對向電極係以I Τ〇等透明電極爲之,像 素電極和對向電極之間以透明絕緣膜確保電之絕緣爲佳。 紙tfU(度適用中國國家標cNs ) Α4規格(2丨Οχ 297公您了 -10 - 583479 A7 _________ B7 五、發明説明(8 ) (讀先間讀背而之注意事項存填寫本頁) 例如,像素電極可用短間距透明梳形電極,對向電極可以 滿佈電極爲之。又,透明絕緣膜可由例如I Z〇、氮化砂 、氧化鈦、氧化矽、及此等之混合物構成。 摻質若具以下結構即可提供能有效鬆弛殘留直流電壓 ,殘像低減之液晶顯示元件。具下述構造之摻質,有類似 於負介電率各向異性之液晶材料的分子結構。 亦即,分子長軸方向之二末端係由烷基、烷氧基之類 的無極性或極性非常弱的基以外之極性基所成。 又,因分子短軸方向有解離基,於分子短軸方向有相 當強的極化。 負介電率各向異性之液晶分子,亦係於分子短軸方向 有超越分子長軸方向之極化。 負介電率各向異性之液晶材料與具下述結構之摻質均 係分子軸方向與極化方向一致。 因此可有效鬆弛殘留之直流電壓。 經濟部智祛財產局員工消赀合作社印製 γW Order printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 583479 A7 ________ B7 _ V. Description of the invention (7) Using this liquid crystal display device, because the liquid crystal material with negative dielectric anisotropy contains dopants with dissociative groups, A liquid crystal display device capable of providing afterimage reduction (please read the precautions on the back #filler book f) 乂, including at least one transparent pair of substrates 5 formed on the opposite sides of the pair of substrates. An alignment control layer. A liquid crystal layer made of a liquid crystal composition having a negative dielectric anisotropy, which is arranged in contact with the liquid crystal alignment control layer (alignment film) between the pair of substrates, is formed on the pair of substrates via an insulating film. In a pixel electrode and a counter electrode, and an active matrix type liquid crystal display device connected to the pixel electrode and the counter electrode's active element, the liquid crystal layer has a dissociation group only in a short axis direction of the molecule, and contains a molecular axis direction. Doped with alkyl or alkoxy. With this liquid crystal display device, the direction of the molecular axis and the direction of polarization of the liquid crystal material with negative dielectric anisotropy and a dopant having a dissociating group only in the direction of the short axis of the molecule can be aligned. Therefore, it is possible to efficiently relax the residual DC voltage and provide a liquid crystal display device with reduced afterimage. Printed by the Maternity Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The dopants with dissociative groups here refer to acidic dissociated substances or alkaline dissociated substances, which are automatically dissociated in polar solvents to generate thallium ions, or react with water to produce them.物质 Θ Substance. Specifically, it refers to a substance such as a carboxylic acid (containing an anhydride), an amide, an amine, or an alcohol. When such a substance is added to the liquid crystal, the ion concentration of the liquid crystal increases and the specific resistance decreases. The image electrodes and the counter electrodes are made of transparent electrodes such as ITO, and a transparent insulating film is preferably used between the pixel electrodes and the counter electrodes to ensure electrical insulation. Paper tfU (degree applicable to Chinese national standard cNs) Α4 specification (2 丨 〇χ 297 public you -10-583479 A7 _________ B7 V. Description of the invention (8) (read the precautions before reading the back and fill in this page) For example The pixel electrode can be a short-pitch transparent comb electrode, and the counter electrode can be full of electrodes. In addition, the transparent insulating film can be made of, for example, IZ0, nitrided sand, titanium oxide, silicon oxide, and mixtures thereof. The following structure can provide a liquid crystal display element that can effectively relax the residual DC voltage and reduce the afterimage. The dopants with the following structure have a molecular structure similar to a liquid crystal material with negative dielectric anisotropy. That is, The two ends in the long axis direction of the molecule are formed by polar groups other than non-polar or very weakly polar groups such as alkyl groups and alkoxy groups. In addition, there is a dissociative group in the short axis direction of the molecule and there is a short axis direction in the molecule. Quite strong polarization. Liquid crystal molecules with negative dielectric anisotropy are also polarized in the direction of the short axis of the molecule beyond the direction of the long axis of the molecule. Liquid crystal materials with negative dielectric anisotropy and the following structure Homogeneous Axis direction coincides with the polarization direction can be effectively relaxed residual DC voltage of the economic unit chi remove destructive Riches Property Office employee cooperative printed γ

Η 〇 〇 Η Ν 〇 Η Ν Η 〇 R Η Ν γ 氫 種 1 任 之 2 R ΝΗ 〇 〇 Η Ν 〇 Η Ν Η 〇 R Η Ν γ hydrogen species 1 of any 2 R Ν

Ν C Η 〇 〇Ν C Η 〇 〇

Η Ν 〇 C 適 尺 i张 U」本 s Ν c 準 標 I家 離 公 583479 A7 B7 五、發明説明(9 ) Ν Η 2 , 一 〇 Η 之 任 種 Υ •ν ••氫 - F - C Ν 、 C 〇〇 Η 一 C 〇 Ν Η Ν Η 2 ^ — 〇 Η 之 任 一 種 Υ 4 :氫 F C Ν C 〇〇 Η 一 C 〇 Ν Η Ν Ν Η 2 , 一 〇 Η ‘ 之 任 一 種 X 1 : :單 鍵 % — C 〇 — 〇 —、 一 〇 一 C 〇 — C 〇 C Η 2 一 s 一 C Η 9 - 一 1 C〇~ -C : Η 2 〇 — 、 〇 C H 2 一 - — C Η ο — C Η 2 一 一 C Η 二 C Η -之任 種 X 2 · σα 早 鍵 — C 〇 — 〇 —、 — 〇 一 C 〇 — C 〇 c Η 2 一 — C Η 2 — -C〇- -C Η 〇 〇 一 〇 C H 2 一 _ C Η ο 一 C Η 2 一 -C Η 二 C Η —之任 (請先閱讀背面之注意事項再填寫本頁) 一種 A ! : ·單鍵、苯基、環己基之任一種 A 2 :單鍵、苯基、環己基之任一種 R i :烷基或烷氧基之任一種 R 2 :烷基或烷氧基之任一種 經濟部智总財產局員工消費合作社印製 又,摻質若具下述結構則可提供能更有效鬆弛殘留之 直流電壓,殘像低減之液晶顯示元件。具下述結構之摻質 具類似於介電率各向異性更爲負之液晶材料的分子結構。 也就是說,分子長軸方向之二末端係由烷基、烷氧基之類 的無極性或極性非常低之基以外的極性基所成。 而,本說明書中單鍵係指其間無該基。以Xi爲例,當 X !係單鍵時係指成爲苯環-A i - R i之情形。 本紙张尺度適用中國國家標準(cns ) λ4彳) -12- 583479 A7 B7____ 五、發明説明(1〇) 又,因僅於分子短軸方向之一側係由尚解離性之基或 高極性基所成,分子短軸方向有強於分子長軸方向之極化 。負的液晶材料亦因係僅於分子短軸方向之一側由氰基、 含氟基之類的高極性基所成,分子短軸方向之極化強於分 子長軸方向。 介電率各向異性爲負之液晶材料與具下述結構之摻質 均係分子軸方向與極化方向一致。因此可有效鬆驰殘留之 直流電壓。 r2——a2—x2Η Ν 〇C suitable size U Zhang "this s Ν c quasi standard I family from the public 583479 A7 B7 V. Description of the invention (9) Ν Η 2, any one of the Η Υ • ν • • hydrogen-F-C Ν, C 〇〇Η-C 〇Ν Η Ν Η 2 ^ — 〇 Η any one of 4: hydrogen FC Ν C 〇〇 Η C 〇Ν Ν Ν Η 2, 〇 Η any one of X 1 :: Single bond% — C 〇— 〇—, 〇1 C 〇—C 〇C Η 2 s -C Η 9--1 C〇 ~ -C: Η 2 〇—, 〇CH 2 -1--C Η ο — C Η 2-one C Η two C Η-any one of X 2 · σα early bonds — C 〇— 〇—, — 〇1 C 〇— C 〇c Η 2 a—C Η 2 — -C〇 --C Η 〇〇〇〇CH 2 1_ C Η ο 1 C Η 2 1 -C Η 2 C Η —Ran (Please read the precautions on the back before filling this page) A kind of A!: · Single key, Either phenyl or cyclohexyl A 2: Single bond, phenyl or cyclohexyl R i: Alkyl or alkoxy R 2: Alkyl Printed by the Consumer Cooperative of the Intellectual Property Office of the Ministry of Economic Affairs or the alkoxy group. If the dopant has the following structure, it can provide a liquid crystal display element that can more effectively relax the residual DC voltage and reduce the residual image. The dopant having the following structure has a molecular structure similar to that of a liquid crystal material with a more negative dielectric anisotropy. In other words, the two ends in the long axis direction of the molecule are formed by a polar group other than a non-polar or very low-polar group such as an alkyl group or an alkoxy group. In this specification, a single bond means that there is no such group in between. Taking Xi as an example, when X! Is a single bond, it refers to the case of becoming a benzene ring -A i-R i. This paper scale applies the Chinese national standard (cns) λ4 彳) -12- 583479 A7 B7____ 5. Description of the invention (1) In addition, only one side of the short axis of the molecule is based on a dissociable or highly polar group. As a result, the short axis of the molecule has a stronger polarization than the long axis of the molecule. The negative liquid crystal material is also formed by a highly polar group such as a cyano group or a fluorine-containing group only on one side of the short axis direction of the molecule. The short axis polarization of the molecule is stronger than the long axis direction of the molecule. Both the liquid crystal material with negative dielectric anisotropy and the dopant having the following structure have the same molecular axis direction and polarization direction. Therefore, it can effectively relax the residual DC voltage. r2——a2—x2

C 〇 N ΗC 〇 N Η

A-j R (請先閲讀背面之注意事項再填寫本頁j γ C〇〇Η、 〇 Η、 Ν Η R、— Ν R 2之任一種 Υ :氫、F、 CN、 C〇〇H、 一 C〇NH、 :驶齊郎暂祛时產^7M工消贫合汴社印製 —N H 2、一〇H之任一種 Xi:單鍵、一 C〇一〇一、一0 一 C〇—、 -C 0 C Η 〇C Η 2 種 X 2 : 鍵 C 〇 C Η ‘2 — 〇C Η 2 C 〇 一、-C Η 2 Ο - C Η C Η = C Η —之任 一c〇一〇一、一〇一c〇一、 一 C. Η 2 — C 〇 一、-c Η 2 0 ' C Η C Η c Η = C Η —之任 ( CNS ) A4/JUiv- ( 2I0X ) -13- 經濟部智祛財產局㈢工消赀合作社印製 583479 A7 -----------B7 五、發明説明(杓) _ 〜種 A i :單鍵、苯基、環己基之任一種 A2:單鍵、苯基、環己基之任一種 R i :氫、烷基或烷氧基之任一種 R 2 .氫、烷基或烷氧基之任一種 液曰曰β ί爹質含量以1 〇〇p p ni ( 1 X 1〇一 4重量% )以上,1 0 0 〇 P P m以下爲佳。於液晶加入非液晶則 作爲液晶之特性(液晶性)劣化,非液晶加入過度時呈顯 液曰S之溫度範圍變窄。本發明因液晶中上述摻質含量使之 在1 0 0 p p m以上,1 0〇〇P p m以下,將液晶的液 晶性之下降壓抑在主動矩陣型液晶顯示裝置的構成上之容 許範圍內,同時能減降殘像,可提供具備優良液晶特性, 殘像低減之液晶顯示裝置。 液晶之比電阻若在1 · 〇 X 1 Q 9歐姆·公分以上 1 . Ο X 1 0 1 2歐姆·公分以下,則可提供殘像減降之液 晶顯示裝置。此時,比電阻高於1 · 0 x 1 0 1 2歐姆·公 分之液晶,不見有減降殘像之明顯效果,而比電阻低於 1 · Ο X 1 0 9歐姆·公分之液晶則無法保持高顯示品質。 液晶定向控制層,即配向膜,其膜厚在2 0奈米至 3〇0奈米。配向膜之膜厚在2 〇奈米以下時,因形成於 該配向膜下之I T〇膜或I Z〇膜的表面凹凸達1 〇至 2 0奈米,配向膜之均勻性變差而發生顯示不勻,形成配 向膜時產生該配向膜之印刷不勻。又,配向膜之膜厚在 3〇0奈米以上時配向膜之乾燥不勻,會出現顯示斑紋。 本紙悵尺度適州中國國家標準(CNS )〜!规格(2丨0 :>< 公凝) (請先閲讀背面之注意事項再填寫本頁)Aj R (Please read the notes on the back before filling in this page j γ C〇〇Η, 〇Η, Ν Η R,-Ν R 2 any of Υ: hydrogen, F, CN, C〇〇H, -C 〇NH,: Qiqilang temporarily removes the current production ^ 7M printed by the poverty alleviation cooperatives—NH 2, any one of Xi: single bond, one C001, one 0 one C0—, -C 0 C Η 〇C Η 2 kinds of X2: bond C 〇C Η '2-〇C Η 2 C 〇 一, -C Η 2 〇-C Η C Η = C Η-any one of 〇〇〇 One, one, one, one, one, one, one, C. Η 2 — C 〇 one, -c Η 2 0 'C Η C Η c Η = C Η — ren (CNS) A4 / JUiv- (2I0X) -13- Printed by the Ministry of Economic Affairs, Intellectual Property Management Bureau, Labor and Consumer Cooperatives, 583479 A7 ----------- B7 V. Description of Invention (杓) _ ~ Kind A i: Single bond, phenyl, cyclohexyl A2: any one of single bond, phenyl, cyclohexyl, R i: any one of hydrogen, alkyl or alkoxy R 2. Any liquid of hydrogen, alkyl or alkoxy It is preferably more than 100 pp ni (1 × 104 weight%) and less than 100 ppm. When a non-liquid crystal is added to a liquid crystal, it has the characteristics of a liquid crystal. (Liquid crystallinity) is deteriorated, and the temperature range of S is narrowed when non-liquid crystal is added too much. The present invention makes the content of the dopant in the liquid crystal to be above 100 ppm and below 1000 pm. The decrease in liquid crystallinity is suppressed within the allowable range of the structure of the active matrix liquid crystal display device, and at the same time, the afterimage can be reduced, and a liquid crystal display device having excellent liquid crystal characteristics and reduced afterimage can be provided. If the specific resistance of the liquid crystal is within 1 · 〇X 1 Q 9 ohm · cm or more 1. 〇 X 1 0 1 2 ohm · cm or less, you can provide a liquid crystal display device with reduced afterimage. At this time, the specific resistance is higher than 1 · 0 x 1 0 1 2 ohm · Liquid crystals of centimeters have no obvious effect of reducing afterimages, while the specific resistance is lower than 1 · 〇 X 1 0 9 ohms · Liquid crystals of centimeters cannot maintain high display quality. Liquid crystal alignment control layer, that is, alignment film, its film The thickness is from 20 nm to 300 nm. When the film thickness of the alignment film is less than 200 nm, the surface roughness of the IT0 film or the IZ0 film formed under the alignment film is 10 to 20 Nanometer, the uniformity of the alignment film deteriorates, and display unevenness occurs, forming The printing unevenness of the alignment film occurs when the film is oriented. Moreover, when the film thickness of the alignment film is more than 300 nm, the unevenness of the drying of the alignment film may cause streaks to appear. The paper size is suitable for China National Standards (CNS) ~! Specifications (2 丨 0: > < Gong Ning) (Please read the precautions on the back before filling this page)

-1Δ - 583479 經濟部智慧財產局員工消贫合作社印製 Λ7 B7 五、發明説明(12) 絕緣膜之膜厚在〇 · 1至4微米。絕緣膜之膜厚在 〇.1微米以下則膜之絕緣性變差,在4微米以上則殘像 多。 具負介電率各向異性之液晶,可闱含分子內具二氟苯 結構之液晶分子的液晶及含分子內具二氰基苯結構之液晶 分子之液晶。 又,兼含分子內具二氟苯結構之液晶分子及分子內具 二氰基苯結構之液晶分子的液晶亦可。又,具負介電率各 向異性之液晶,可用含分子內有單氰基環己烷結構之液晶 分子的液晶。 又,兼含分子內具二氟苯結構之液晶分子及分子內具 卓氰基環己院構造之液晶分子亦可。 又再,使用正介電率各向異性之液晶時,亦可添加解 離性之摻質,並作像素電極和對向電極之構造的調整以抑 制殘像之發生。 一手段係,取一對基板,夾置於上述一對基板之液晶 層,配置於上述一對基板與上述液晶層之間的規定上述液 晶層之液晶分子的定向方向之配向膜,及施加電壓於上述 液晶層之像素電極和對向電極,使上述液晶層之液晶分子 爲正介電率各向異性,於該液晶層中含具有解離基之摻質 而構成。 又,於負介電率各向異性液晶組成物質,在1〇〇 P P m以上1 〇 0 0 p p m以下之範圍添加僅於分子短軸 方向具解離基,而上述分子短軸方向之二末端係烷基或烷 本紙浪尺度適用中囵國家標準(CNS ) (1>·先Kif背1i..r)i意事項再填寫本頁)-1Δ-583479 Printed by the Anti-Poverty Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Λ7 B7 V. Description of the invention (12) The thickness of the insulating film is between 0.1 and 4 microns. If the thickness of the insulating film is less than 0.1 micron, the insulation of the film is deteriorated, and if the thickness is more than 4 micron, the residual image is large. Liquid crystals with negative dielectric anisotropy can be liquid crystals containing liquid crystal molecules with a difluorobenzene structure in the molecule and liquid crystals containing liquid crystal molecules with a dicyanobenzene structure in the molecule. Liquid crystal molecules having a liquid crystal molecule having a difluorobenzene structure in the molecule and a liquid crystal molecule having a dicyanobenzene structure in the molecule may be used. Further, as the liquid crystal having negative dielectric anisotropy, a liquid crystal containing liquid crystal molecules having a monocyanocyclohexane structure in the molecule can be used. Also, liquid crystal molecules having a difluorobenzene structure in the molecule and liquid crystal molecules having a cyanocyclohexane structure in the molecule may be included. Furthermore, when using a liquid crystal with positive dielectric anisotropy, a dissociative dopant may be added and the structure of the pixel electrode and the counter electrode may be adjusted to suppress the occurrence of afterimages. One method is to take a pair of substrates, sandwich the liquid crystal layer of the pair of substrates, arrange an alignment film between the pair of substrates and the liquid crystal layer, and define an alignment direction of liquid crystal molecules of the liquid crystal layer, and apply a voltage The pixel electrode and the counter electrode of the liquid crystal layer are configured such that the liquid crystal molecules of the liquid crystal layer have a positive dielectric anisotropy, and the liquid crystal layer includes a dopant having a dissociative group. In addition, to the negative dielectric anisotropic liquid crystal composition, a dissociative group is added only in the direction of the short axis of the molecule in a range of 100 ppm to 1,000 ppm, and the two ends of the short axis direction of the molecule are added. Standards for alkyl or alkane paper are applicable to China National Standards (CNS) (1 > · Kif back 1i..r), and then fill out this page)

583479 A7 B7 五、發明説明(13) 氧基之摻質爲其特徵之液晶組成物質亦爲有效。 圖面之簡單說明 第1圖 主動矩陣型彩色液晶顯示裝置之液晶顯示部 的一像素及其周邊之構造例的俯視圖。 第2圖 第1圖之沿Π - π線之剖視圖。 第3圖 第1圖之沿DI -瓜線的薄膜電晶體T F T之 剖視圖。 第4圖 第1圖之沿IV - IV線的儲存電容器C s t g 形成部之剖視圖。 第5圖 電場施加方向與平磨方向及偏光板穿透軸之 關係的說明圖。 第6圖 用以說明顯示面板之矩陣周邊部之構造的俯 視圖。 第7圖 左側係閘極信號端子,右側係無外部連接端 子之面板邊緣部份之說明圖。 第8圖 呈示閘極端子G T Μ與閘極配線G L之連接 部附近之構造的一例之俯視圖及剖視圖。 第9圖 呈示汲極端子D Τ Μ與汲極信號線D L之連 接部附近之構造的一例之俯視圖及剖視圖。 第1 0圖 呈示對向電極端子C Τ Μ與公用匯流線 C Β及公用電壓信號線C L之連接部附近的構造之一例的 俯視圖及剖視圖。 第1 1圖 包含主動矩陣型彩色液晶顯示裝置之矩陣 本紙ifc尺度適用t國國家標準(CNS )八4規格(2Ι0Χ 297公f ) (請先閲讀背面之注意事項再填寫本頁 、1Τ 經濟部智慧財產局Μ工消赀合作社印製 583479 經濟郎皙.¾財產局工消资合作社印奴 A7 ___B7 五、發明説明(14) 部及其周邊之電路圖。 第12圖 本發明之主動矩陣型彩色液晶顯示裝置之 驅動波形之說明圖。 第1 3圖 呈示液晶顯示面板構裝上驅動電路之狀態 的俯視圖。 第1 4圖基板S U B 1側之製造步驟說明_。 第1 5圖 基板SUB 1側之第1 4圖的後續步驟之 說明圖。 第1 6圖 呈示主動矩陣型彩色液晶顯示裝置之液晶 顯示部的另一實施例之一像素的俯視圖。 第1 7圖 呈示主動矩陣型彩色液晶顯示裝置之液晶 顯示部的另一實施例之一像素的俯視圖。 第1 8圖 呈示主動矩陣型彩色液晶顯示裝置之液晶 顯示部的另一實施例之一像素的俯視圖。 第1 9圖 呈示主動矩陣型彩色液晶顯示裝置之液晶 顯示部的另一實施例之一像素的俯視圖。 第2 0圖 呈示主動矩陣型彩色液晶顯示裝置之液晶 顯示部的另一實施例之一像素的俯視圖。 第2 1圖 呈示主動矩陣型彩色液晶顯示裝置之液晶 顯示部的另一實施例之一像素的俯視圖。 發明之貫施形態·發明效果 以下參照圖面說明本發明之實施形態。在此說明適用 本發明於主動矩陣方式之彩色液晶顯示裝置之實施例。而 本紙浪尺度遙用中國國'豕標準(CNS ) Λ4規格(2丨0X 297公發) (請先閱讀背面之注意事項再填寫本頁)583479 A7 B7 V. Description of the invention (13) Liquid crystal composition substances characterized by dopants of oxygen groups are also effective. Brief Description of the Drawings Fig. 1 is a plan view of a structure example of one pixel and its surroundings of a liquid crystal display portion of an active matrix color liquid crystal display device. Figure 2 Figure 1 is a sectional view taken along the line Π-π. Fig. 3 Fig. 1 is a cross-sectional view of the thin film transistor T F T along the DI-melon line. FIG. 4 is a cross-sectional view of the storage capacitor C s t g forming portion along the line IV-IV in FIG. 1. Fig. 5 is an explanatory diagram of the relationship between the electric field application direction, the flat grinding direction, and the polarization axis of the polarizing plate. Fig. 6 is a plan view for explaining a structure of a matrix peripheral portion of a display panel. Figure 7 The left side is the gate signal terminal, and the right side is the explanatory diagram of the edge of the panel without external connection terminals. Fig. 8 is a plan view and a cross-sectional view showing an example of a structure in the vicinity of a connection portion between the gate electrode terminal G T M and the gate wiring G L. Fig. 9 is a plan view and a cross-sectional view showing an example of a structure near a connection portion between the drain terminal D TIM and the drain signal line D L. FIG. 10 is a plan view and a cross-sectional view showing an example of a structure near a connection portion of the counter electrode terminal C T M and the common bus line C B and the common voltage signal line C L. Figure 11 The matrix paper containing the active matrix color liquid crystal display device ifc standard is applicable to the national standard (CNS) 8 4 specifications (2Ι0χ 297 male f) (Please read the precautions on the back before filling out this page, 1T Ministry of Economy Printed by M Intellectual Property Cooperative of the Intellectual Property Bureau, 583479 Economic Langxi. ¾ Industrial Property Cooperative, Consumer Cooperative, Indo A7 ___B7 V. Circuit diagram of the (14) part of the invention and its surroundings. Figure 12 Active matrix color of the present invention The explanatory diagram of the driving waveforms of the liquid crystal display device. Figs. 13 and 13 are top views showing a state in which the driving circuit is mounted on the liquid crystal display panel. Fig. 14 shows the manufacturing steps of the substrate SUB 1 side. Fig. 15 shows the substrate SUB 1 side. FIG. 14 is an explanatory diagram of the subsequent steps of FIG. 14. FIG. 16 is a plan view showing a pixel of another embodiment of a liquid crystal display portion of an active matrix color liquid crystal display device. FIG. 17 is a view showing an active matrix color liquid crystal display. A top view of a pixel, which is another embodiment of the liquid crystal display portion of the device. FIG. 18 shows another embodiment of the liquid crystal display portion of the active matrix type color liquid crystal display device. A top view of a pixel. Fig. 19 shows a top view of a pixel in another embodiment of a liquid crystal display portion of an active matrix color liquid crystal display device. Fig. 20 shows another of a liquid crystal display portion of an active matrix color liquid crystal display device. A top view of a pixel in one embodiment. FIG. 21 shows a top view of a pixel in another embodiment of a liquid crystal display portion of an active matrix color liquid crystal display device. Embodiments and Effects of the Invention The present invention will be described below with reference to the drawings. The implementation form. Here is an example of the application of the present invention to an active matrix color liquid crystal display device. The paper scale is remotely used in China's standard (CNS) Λ4 specification (2 丨 0X 297) (please first (Read the notes on the back and fill out this page)

-17- 583479 經濟部智慧財產局Μ工消赀合作社印製 A7 __________ B7 五、發明説明(15) 以下之圖中,具同一機能之部份將給予同一符號,不重複 說明。 〔實施例1〕 矩陣部(像素部)之平面構造 第1圖係呈示本發明之主動矩陣型液晶顯示裝置之一 像素及其周邊之俯視圖。以下係用薄膜電晶體(T F T ) 作爲主動矩陣元件,以所謂薄膜電晶體型液晶顯示裝置作 說明。 如第1圖所示,各像素係配置在閘極信號線(掃瞄信 號線或水平信號線)G L,公用電壓信號線(對向電極配 線)C L,及相鄰的二根汲極信號線(映像信號線或垂直 信號線)D L之交叉區域內(四根信號線所圍成之區域內 )° 所有這些信號線均係以不透明金屬電極形成。閘極信 號線G L、公用電壓信號線c L在第1圖中左右延伸,於 上下方向配置有多數根。映像信號線D L係於上下方向延 伸,於左右方向配置有多數根^ 像素電極P X係以I T〇透明導電膜形成,經通孔電 連接於薄膜電晶體T F T (之源極電極S D 1 )。對向電 極C T亦由I T〇形成,與公用電壓信號線C L電連接。 而S D 2爲汲極電極,A S爲半導體層。 像素電極PX係構成梳狀,各於第1圖中呈上下方向 之細長電極。對向電極CT係由滿佈透明電極所成,藉產 本紙ifc尺度適中國國家標準(CNS )八4·規^格(210:<297公錄) (請先間讀背而之注意事項再填寫本頁)-17- 583479 Printed by Intellectual Property Cooperative of Intellectual Property Bureau, Ministry of Economic Affairs A7 __________ B7 V. Description of Invention (15) In the following figures, the parts with the same function will be given the same symbol, and will not be repeated. [Embodiment 1] Planar structure of matrix section (pixel section) FIG. 1 is a plan view showing a pixel and its surroundings, one of the active matrix type liquid crystal display devices of the present invention. In the following, a thin film transistor (T F T) is used as an active matrix element, and a so-called thin film transistor type liquid crystal display device will be described. As shown in Fig. 1, each pixel is arranged on a gate signal line (scanning signal line or horizontal signal line) GL, a common voltage signal line (counter electrode wiring) CL, and two adjacent drain signal lines. (Image signal line or vertical signal line) In the intersection area of DL (in the area surrounded by four signal lines) ° All these signal lines are formed by opaque metal electrodes. The gate signal line G L and the common voltage signal line c L extend left and right in the first figure, and a plurality of them are arranged in the vertical direction. The image signal line D L extends in the up and down direction, and a plurality of pixel electrodes P X are arranged in the left and right direction. The pixel electrode P X is formed of a transparent conductive film I T0 and is electrically connected to the thin film transistor T F T (the source electrode S D 1) through a via. The counter electrode C T is also formed of I T0 and is electrically connected to the common voltage signal line C L. S D 2 is a drain electrode, and AS is a semiconductor layer. The pixel electrodes PX are slender electrodes each having a comb-like shape, each of which is vertically oriented in the first figure. The counter electrode CT is made of transparent electrodes. The size of the ifc on the paper is in accordance with Chinese National Standards (CNS) 8 · 4 ^ (210: < 297). (Please read the precautions first.) (Fill in this page again)

-18 - 583479 A7 B7 ^_ —--------一 ~' 一 五、發明説明(16) 生於各像素電極P X與對向電極C T之間的電場控制液晶 組成物L C之光學狀態,控制顯示。 (請先閱讀背面之注意事項再填寫本頁) 閘極信號線G L係用以傳輸閘極信號至各像素之薄膜 電晶體T F. T,汲極信號線D L係用以經薄膜電晶體 T F T (之汲極電極S D 2 )供給汲極信號電壓於各像素 之像素電極,公用電壓信號線C L係用以供給公用電壓於 各像素之對向電極C T。 上述之以金屬電極形成之公用電壓信號線C L係形成 爲圍在汲極信號線D L之旁邊,兼作防止因汲極電極之電 位所發生的電場之影響所產生的汲極線旁之不必要漏光之 遮光層。 梳形像素電極P X之電極寬W及電極間隔L ,依所用 之液晶材料而異。此乃由於達到最大穿透率之電場強度因 液晶材料而異,電極間隔係因應液晶材料而設定,以於依 所用的汲極信號驅動電路(信號側驅動器)之耐壓而設定 的is航電壓之最大振幅的範圍,獲致最大穿透率。 經濟部智慧財產局a;工消f合作社印製 像素電極之寬係設定在1至1 5微米,考慮開口率及 電極Z生產力,本實施例中係設定爲4微米。又,電極間 隔L係設定爲1至1 〇微米,爲使驅動電壓在1 〇伏特以 下,本發明係設定在4微米以下。 矩陣部(像素部)之剖面構造 第2圖係沿第1圖之π 一 n剖線的剖視圖,第3圖係 沿第1圖之ΓΠ - ΙΠ剖線之薄膜電晶體τ ρ T之剖視圖,第 本紙张尺度適用中國國家榡準(CNS ) /\4規格-- L -19- 583479 :理齊郎皆铋时凌工消赀合泎社印製 A7 _____B7五、發明説明(17) 4圖係沿第1圖之IV - IV剖線的儲存電容器c s t g形成 部之剖視圖。 如第2至4圖所示,以液晶組成物層(以下或簡稱液 1¾ ) L C為準,於下部透明玻璃基板s u B 1側形成薄膜 電晶體T F T、儲存電容器C s t g及電極群,上部透明 玻璃基板S U B 2側形成有彩色濾光片F I L、遮光用黑 矩陣圖案B Μ。 又,透明玻璃基板S U Β 1、S U Β 2之各內側(液 晶L C側)表面設有控制液晶之初期定向的液晶定向控制 層,即配向膜〇R 1 1、〇R 1 2。透明玻璃基板 S U Β 1、 S U Β 2之各外側表面設有偏光板p〇l 1、 Ρ 〇 L 2。 如桌2至4圖所不,本實施例中係滿佈I 丁〇之對向 電極C Τ與閘極信號線G L同層,梳形I Τ〇之像素電極 Ρ X乃形成於形成在信號線D L上之保護絕緣膜P S V上 之構造。 因此,剖視圖中Ρ X及C Τ係夾在閘極絕緣膜G I與 保護絕緣膜P S V之間,此即形成爲儲存電容器C s t g ο 公用信號線C L係與對向電極C 丁於同一層內接觸。 閘極絕緣膜G I及保護絕緣膜p S V可用S 1〇2或 S i、· N y 形成。 又,第2圖之像素電極和對向電極之構造以外,如第 2〇圖所示,亦可使像素電極ρ X爲滿佈I T〇,將具梳 (讀先閱讀背面之注意事項再填寫本頁) •嘗 、\一5 ¥ 本纸烺尺度適用中國國家標準(CNS ) Λ4規格(2Ι0Χ 297公废) -20- 583479 B7 · 五、發明説明(18) 形電極部之對向電極CT經保護絕緣膜P SV 2配置於像 素電極P X上層。 (請先閱讀背面之注意事項再填寫本頁) T F T基板 以下詳細說明下側透明玻璃基板S U B 1側(T F T 基板)之構造。-18-583479 A7 B7 ^ _ —-------- 一 ~ '15. Explanation of the invention (16) The electric field generated between each pixel electrode PX and the counter electrode CT controls the optics of the liquid crystal composition LC Status, control display. (Please read the precautions on the back before filling this page) Gate signal line GL is a thin film transistor T F. T used to transmit the gate signal to each pixel, and drain signal line DL is used to pass a thin film transistor TFT The (drain electrode SD 2) supplies a drain signal voltage to the pixel electrode of each pixel, and the common voltage signal line CL is used to supply a common voltage to the counter electrode CT of each pixel. The above-mentioned common voltage signal line CL formed by a metal electrode is formed to surround the drain signal line DL, and also serves to prevent unnecessary light leakage near the drain line due to the influence of the electric field generated by the potential of the drain electrode. Its shading layer. The electrode width W and the electrode interval L of the comb-shaped pixel electrode P X depend on the liquid crystal material used. This is because the electric field strength that achieves the maximum transmittance varies depending on the liquid crystal material. The electrode interval is set according to the liquid crystal material, so it is set according to the withstand voltage of the used drain signal drive circuit (signal side driver). The maximum amplitude range results in the maximum transmission. Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs a; Industrial Consumers Cooperative F. The width of the pixel electrode is set to 1 to 15 micrometers. In consideration of the aperture ratio and electrode Z productivity, it is set to 4 micrometers in this embodiment. In addition, the electrode interval L is set to 1 to 10 micrometers, and in order to make the driving voltage be 10 volts or less, the present invention is set to 4 micrometers or less. Cross-sectional structure of the matrix portion (pixel portion) FIG. 2 is a cross-sectional view taken along the π-n cross-section of FIG. 1 and FIG. 3 is a cross-sectional view of the thin-film transistor τ ρ T taken along the ΓΠ-ΙΠ line of FIG. 1. This paper size applies to China National Standards (CNS) / \ 4 specifications-L -19- 583479: Printed on A7 _____B7 printed by Liqi Langji Bi Shi Ling Industrial Co., Ltd. V. Description of invention (17) 4 photos It is a sectional view of the storage capacitor cstg forming portion taken along the line IV-IV in FIG. 1. As shown in Figures 2 to 4, the thin film transistor TFT, storage capacitor C stg, and electrode group are formed on the lower transparent glass substrate su B 1 side based on the liquid crystal composition layer (hereinafter referred to as liquid 1¾) LC, and the upper part is transparent. A color filter FIL and a black matrix pattern BM for light shielding are formed on the glass substrate SUB 2 side. In addition, a liquid crystal alignment control layer that controls the initial alignment of the liquid crystal, that is, alignment films OR 1 1 and OR 12 is provided on each inner (liquid crystal LC side) surface of the transparent glass substrates S U B 1 and S U B 2. The transparent glass substrates S U B 1 and S U B 2 are provided with polarizing plates p01 and P2 on each outer surface. As shown in Tables 2 to 4, in this embodiment, the counter electrode C T covered with I D 0 is on the same layer as the gate signal line GL, and the pixel electrode P X of comb I T0 is formed on the signal Structure on protective insulation film PSV on line DL. Therefore, in the cross-sectional view, P X and C T are sandwiched between the gate insulating film GI and the protective insulating film PSV, which is formed as a storage capacitor C stg ο the common signal line CL is in contact with the counter electrode C D in the same layer . The gate insulating film G I and the protective insulating film p S V may be formed of S 102 or S i, · N y. In addition to the structure of the pixel electrode and the counter electrode in FIG. 2, as shown in FIG. 20, the pixel electrode ρ X may be filled with IT0. (This page) • Taste, \ 一 5 ¥ The size of this paper is applicable to the Chinese National Standard (CNS) Λ4 specification (2Ι0χ 297 public waste) -20- 583479 B7 · V. Description of the invention (18) Counter electrode CT The protective insulating film P SV 2 is disposed on the pixel electrode PX. (Please read the precautions on the back before filling in this page) T F T Substrate The structure of the lower transparent glass substrate S U B 1 side (T F T substrate) is explained in detail below.

薄膜電晶體T F T 第3圖係薄膜電晶體部份之剖視圖。薄膜電晶體 T F T係,於閘極電極G 丁施加正的偏壓時,源極-汲極 間之通道電阻變小,偏壓爲零時,通道電阻變大。 如第3圖所示,薄膜電晶體T F T有閘極電極G T , 絕緣膜G I , i型(原有,intrinsic,未摻雜決定導電型之 摻質)非晶質矽(S i )所成之i型半導體層A S , —對 電極(源極電極SD1、汲極電極SD2)。 而源極電極S D 1和汲極電極S D 2 ,由於本來就以 其間之偏壓極性決定,而本液晶顯示裝置之電路係於動作 中極性反轉,故應理解爲源極電極S D 1與汲極電極 S D 2在動作中互換。然而,以下之說明中爲方便起見, 係以其一爲源極電極另一爲汲極電極固定呈現。 閘極電極G 丁 閘極電極GT係形成爲與閘極信號線GL連接,閘極 信號線G L之一部份係構成爲閘極電極G T。閘極電極 本纸悵尺度適用中國國家標準(CNS ) Λ4現格(2丨OX 297公览) -21 - 5^3479 A7 B7 五、發明説明(19) G T係薄膜電晶體T F T之超出主動區域之部份。 本實施例中,閘極電極G T係以單層之導電膜g丨形 成。該導電膜g 1可用例如,濺鍍形成之鉻-鉬合金( U it — Μ 〇 )膜,但不限於此。又,形成不同金屬的二^ 亦可。Thin film transistor T F T Figure 3 is a sectional view of a thin film transistor. In the thin film transistor T F T, when a positive bias voltage is applied to the gate electrode G, the channel resistance between the source and the drain becomes smaller. When the bias voltage is zero, the channel resistance becomes larger. As shown in Figure 3, the thin-film transistor TFT has a gate electrode GT, an insulating film GI, and an i-type (original, intrinsic, undoped dopant that determines the conductivity type) amorphous silicon (S i). i-type semiconductor layer AS, a counter electrode (source electrode SD1, drain electrode SD2). The source electrode SD 1 and the drain electrode SD 2 are originally determined by the bias polarity therebetween, and the circuit of the liquid crystal display device is reversed in polarity during operation, so it should be understood that the source electrode SD 1 and the drain electrode The electrode SD 2 is interchanged during operation. However, in the following description, for convenience, one of them is a source electrode and the other is a drain electrode. Gate electrode G D The gate electrode GT is formed to be connected to the gate signal line GL, and a part of the gate signal line G L is configured as a gate electrode GT. The size of the gate electrode is in accordance with the Chinese National Standard (CNS). Λ4 is now available (2 丨 OX 297) -21-5 ^ 3479 A7 B7 V. Description of the invention (19) Outside the active area of the GT thin film transistor TFT Part of it. In this embodiment, the gate electrode G T is formed of a single-layered conductive film g 丨. The conductive film g 1 can be, for example, a chromium-molybdenum alloy (U it-Mo) film formed by sputtering, but is not limited thereto. It is also possible to form two metals of different metals.

閘極信號線G L 閘極信號線G L係以導電膜g 1構成。該閘極信號線 G L之導電膜g 1係與閘極電極G T之導電膜g 1的同一 製造步驟形成,且ί糸構成爲一體。 該閘極信號線G L係用以從外部電路供給閘極電壓 V G於閘極電極G Τ。本實施例中,導電膜g 1可用例如 ,以濺鍍形成之鉻—鉬合金(C r — Μ 〇 )膜。· 又,閘極信號線G L及閘極電極G Τ之材質不限於鉻 -鉬合金,亦可係例如,用以降低電阻之鋁或鋁合金,其 係包覆於鉻-鉬成雙層構造。Gate signal line G L The gate signal line G L is composed of a conductive film g 1. The conductive film g 1 of the gate signal line G L is formed in the same manufacturing step as the conductive film g 1 of the gate electrode G T and is integrally formed. The gate signal line G L is used to supply a gate voltage V G to the gate electrode G T from an external circuit. In this embodiment, the conductive film g 1 may be, for example, a chromium-molybdenum alloy (C r-Mo) film formed by sputtering. · Also, the material of the gate signal line GL and the gate electrode G T is not limited to a chromium-molybdenum alloy, but may also be, for example, aluminum or an aluminum alloy for reducing resistance, which is covered with a double-layer structure of chromium-molybdenum .

公用電壓信號線C L 公用電壓信號線C L係以導電膜g 1構成。該公用電 壓信號C L之導電膜g 1係與閘極電極G T、閘極信號線 G L及對向電極之導電膜g 1於同一製造步驟形成,且係 與對向電極C T形成爲一體。 藉該公用電壓信號線CL,可從外部電路供給公用電 壓V c 〇 m於對向電極c T。 本紙张尺度適用中國國家標準(CNS ) /W規格(210 X 297公旋) (請先閲讀背面之注意事項再填寫本頁) ·# ,νά -22- 583479 A7 五、發明説明(20) 又,公用電壓信號線CL之材質不僅限於鉻-鉬合金 ,亦可係爲降低電阻以鋁或鋁合金包覆於鉻-鉬成雙層構 造。The common voltage signal line C L The common voltage signal line C L is composed of a conductive film g 1. The conductive film g 1 of the common voltage signal C L is formed in the same manufacturing step as the gate electrode G T, the gate signal line G L, and the conductive film g 1 of the counter electrode, and is integrally formed with the counter electrode C T. By the common voltage signal line CL, a common voltage V c 0 m can be supplied from an external circuit to the counter electrode c T. This paper size applies the Chinese National Standard (CNS) / W specifications (210 X 297 revolutions) (Please read the precautions on the back before filling out this page) · #, νά -22- 583479 A7 V. Description of the invention (20) The material of the common voltage signal line CL is not limited to a chromium-molybdenum alloy, but also can be coated with aluminum or an aluminum alloy to form a double-layer structure in order to reduce the resistance.

絕緣膜G I 絕緣膜GI係於薄膜電晶體TFT中,用以一倂於閘 極電極G T及半導體層A S施以電場之閘極絕緣膜。絕緣 膜G I係形成於閘極電極G T及閘極信號線G L之上層。 絕緣膜G I可選用例如,以等離子體C V D形成之氮 化矽膜,而形成1 0 0奈米至4微米之厚度(本實施係約 3 5〇奈米)。 又,絕緣膜G I亦用作閘極信號線G L及公用電壓信 .號線C L與汲極信號線D L之層間絕緣膜,賦予其電絕緣 作用。Insulating film G I The insulating film GI is a thin film transistor TFT, which is a gate insulating film applied to the gate electrode G T and the semiconductor layer AS to apply an electric field. The insulating film G I is formed on the gate electrode G T and the gate signal line G L. The insulating film G I can be, for example, a silicon nitride film formed by plasma C V D to form a thickness of 100 nanometers to 4 micrometers (about 350 nanometers in this embodiment). In addition, the insulating film G I is also used as an interlayer insulating film of the gate signal line G L and the common voltage signal line C L and the drain signal line D L to give it an electrical insulation effect.

i型半導體層A S 1型半導體層A S係以晶質矽半導體形成1 5奈米至 2 5 0奈米之厚度(本實施例中係1 2 0奈米左右)。層 d 0係經電阻接觸用之磷(P )摻雜之N ( + )型非晶質 半導體層,下側有1型半導體層A S存在,上側則僅有導 電層d 1留存。 1型半導體層A S及d 0層亦設於閘極信號線G L及 公用電壓信號線C L與汲極信號線D L之交叉部(Cross-over部)的二者間。該交叉部之i型半導體層A S減少交 本紙张尺度適用中國國家標準(CNS ) Λ4規格(2丨0>< 297公釐) (請先閱讀背而之注意事項界填itT本頁)The i-type semiconductor layer A S is formed by a crystalline silicon semiconductor to a thickness of 15 nm to 250 nm (in this embodiment, it is about 120 nm). The layer d 0 is an N (+) -type amorphous semiconductor layer doped with phosphorus (P) for resistance contact, and a type 1 semiconductor layer AS exists on the lower side, and only the conductive layer d 1 remains on the upper side. The type 1 semiconductor layers A S and d 0 are also provided between the gate signal line G L and the intersection (cross-over portion) of the common voltage signal line C L and the drain signal line D L. The i-type semiconductor layer A S at this intersection reduces the paper size. The paper size applies the Chinese National Standard (CNS) Λ4 specification (2 丨 0 > < 297 mm). (Please read the precautions below and fill in itT page)

-23 - 583479 !έ 丨才 ί ί •ί :ν Α7 ____Β7__ 五、發明説明(21) 叉部之閘極信號線G L及對向電壓信號線C L與汲極信號 線D L之短路。 源極電極S D 1、汲極電極S D 2係各由與N ( + ) 型半導體d 〇接觸之導電膜d 1構成。因C r 一 Μ 〇膜具 低應力,可形成相對較厚之膜,有助於配線之低電阻化。 又,C r 一 Μ ◦膜亦與Ν ( + )型半導體層d 〇具良好的 接合性。-23-583479! You 丨 Cai ί ί: ν Α7 ____ Β7__ 5. Description of the invention (21) The gate signal line G L of the fork and the opposite voltage signal line C L and the drain signal line D L are short-circuited. The source electrode S D 1 and the drain electrode S D 2 are each composed of a conductive film d 1 that is in contact with the N (+) type semiconductor d 0. Because the C r-Mo film has low stress, it can form a relatively thick film, which helps to reduce the resistance of the wiring. In addition, the C r -M ◦ film also has good adhesion to the N (+) -type semiconductor layer d 0.

汲極信號線D L 汲極信號線D L係與源極電極S D 1、汲極電極 S D 2構成於同層。又,汲極信號線D L係與汲極電極 SD2形成爲一體。 本實施例中,導電膜d 1係用濺鍍形成之鉻-鉬合金 (Cr— Mo)膜,厚度50奈米至300奈米(本實施 例爲250奈米左右)Mo膜因爲應力低,可形 成較厚之膜,有助於配線之低電阻化。 又,Cr一Mo膜亦與N(+)型半導體層d〇具良 好的接合性。導電膜d 1除C r - Μ 〇膜以外亦可用其它 高熔點金屬(Μ 〇、T i、T a、W )膜,高熔點金屬砂 化物(Μ 〇 S i 2、Τ ί S i 2、T a S i 2、W S i 2 )膜 ,又亦可與鋁等形成層合構造。 儲存電容器C s t g 形成儲存電容器C s t g之導電膜I TO 2,係形成 本紙ί艮尺度適用中國國家標準(CNS )八4规格(2丨〇X 297公澄) (請先閱讀背面之注意事項再填寫本頁) -24- 9 47 3 8 5 經濟部智財產局a;工消费合作社印製 A7 B7 五、發明説明(22) 以與形成對向電極CT之導電膜IT〇1重疊。該重疊, 如由第2圖可知,於像素電極ΡΧ與對向電極CT之間構 成儲存電容器(靜電容元件)C s t g。 該儲存電容器C s t g之介電膜係由保護膜p s V及 使用作薄膜電晶體T F T之閘極絕緣膜的絕緣膜G I所構 成。如第4圖所示,平面上儲存電容器C s t g係形成爲 像素內之像素電極P X與對向電極C T之重疊部份。Drain signal line D L The drain signal line D L is formed on the same layer as the source electrode S D 1 and the drain electrode S D 2. The drain signal line D L is integrally formed with the drain electrode SD2. In this embodiment, the conductive film d 1 is a chromium-molybdenum alloy (Cr-Mo) film formed by sputtering. The thickness of the Mo film is 50 nm to 300 nm (about 250 nm in this embodiment). The Mo film has low stress. A thicker film can be formed to help reduce the resistance of the wiring. In addition, the Cr-Mo film also has good adhesion to the N (+) type semiconductor layer do. In addition to the Cr-M0 film, the conductive film d1 can also use other high-melting-point metal (M0, Ti, Ta, and W) films, and high-melting metal sand compounds (M0S2, T2S1, T2). T a S i 2, WS i 2) film can also form a laminated structure with aluminum. The storage capacitor C stg forms the conductive film I TO 2 of the storage capacitor C stg, which forms the paper. The standard is applicable to the Chinese National Standard (CNS) 8 4 specifications (2 丨 〇X 297). (Please read the precautions on the back first. (Fill in this page) -24- 9 47 3 8 5 Intellectual Property Bureau of the Ministry of Economic Affairs a; Industrial and Consumer Cooperatives printed A7 B7 V. Description of the invention (22) It overlaps with the conductive film IT〇1 forming the counter electrode CT. This overlap, as can be seen from FIG. 2, constitutes a storage capacitor (static capacitance element) C s t g between the pixel electrode PX and the counter electrode CT. The dielectric film of the storage capacitor C s t g is composed of a protective film p s V and an insulating film G I used as a gate insulating film of the thin film transistor T F T. As shown in FIG. 4, the storage capacitor Cstg on the plane is formed as an overlapping portion of the pixel electrode PX and the counter electrode CT in the pixel.

保護膜P S V 薄膜電晶體丁 FT上設有保護膜PSV。保護膜 P s V主要係爲保護薄膜電晶體T F T之免於受潮等而設 ,係使用高透明度且耐濕性良好之膜。 保護膜P S V係由例如,以等離子體C V D裝置形成 之氧化矽膜、氮化矽膜所成,膜厚在0 · 1微米以上,1 微米以下。保護膜P S V係部份去除以使外部連接端子 DTM、 GTM外露。 保護膜P S V與絕緣膜G I之厚度的關係爲,考慮保 護效果時宜使前者較厚,考慮電晶體之相互傳導g m則後 者宜薄。 又,保護膜P S V亦可具聚酰亞胺等之有機膜的2微 米以上、3微米以下的較厚膜之層合構造。Protective film PSV Thin film transistor FT is provided with a protective film PSV. The protective film P s V is mainly designed to protect the thin film transistor T F T from moisture and the like. It is a film with high transparency and good moisture resistance. The protective film P S V is made of, for example, a silicon oxide film or a silicon nitride film formed by a plasma C V D device, and has a film thickness of 0.1 μm or more and 1 μm or less. The protective film PS V is partially removed to expose the external connection terminals DTM and GTM. The relationship between the protective film P S V and the thickness of the insulating film G I is that the former should be made thicker when the protection effect is considered, and the latter should be made thin when the mutual conductivity g of the transistor is considered. The protective film P S V may have a layered structure of a thick film having an organic film such as polyimide of 2 μm to 3 μm.

像素電極P X 像素電極PX係以透明導電體IT〇形成,與同以 本紙张尺度適用中國國家標苹(CKS )八4規格(210 X 297公炝) " ~ -25- (請先閱讀背面之注意事項再填寫本頁)Pixel electrode PX Pixel electrode PX is formed by a transparent electrical conductor IT0, which is compatible with the Chinese National Standard Apple (CKS) 8 4 specification (210 X 297 cm) on the same paper scale " ~ -25- (Please read the back first (Notes to fill out this page)

583479 A7 B7 五、發明説明(23) 請 先 閱 讀 背 1¾ 之 注 意 事 項 再. 填 寫 本 頁 I T ◦形成之對向電極CT之間形成儲存電容器。本實施 例係以用I ΊΓ ◦作透明導電體作說明,但用銦-鋅-氧化 物(I Z〇)可得同樣之效果自不待言。583479 A7 B7 V. Description of the invention (23) Please read the notes on the back 1¾ and then. Fill out this page I T ◦ The storage capacitors are formed between the counter electrodes CT formed. In this embodiment, I ΊΓ ◦ is used as a transparent conductor for illustration, but it is needless to say that the same effect can be obtained by using indium-zinc-oxide (I Z0).

對向電極C T 對向電極c T係以I T 0形成,與公用電壓信號線 c L連接於同層。對向電極C T係構成爲施加有公闱電壓 V c 〇 m 〇 本實施例中,公用電壓V c 〇 m係設爲施加於汲極信 號D L之最低階驅動電壓V d m i η與最高階驅動電壓 V d m a X之中間直流電位,扣除薄膜電晶體元件T F 丁 於關機狀態所產生之饋通電壓△ V s之程度的較低電位。 本實施例係以用I T〇作透明導電體作說明,但用銦 一鋅-氧化物(I Z〇)亦可得同樣效果自不待言。 彩色濾光片基板 其次,回到第1、 2圖,詳細說明上側透明玻璃基板 經濟部智Μ)財產局a;工消赀合作社印製 S U B 2側(彩色濾光片基板)之構造。 遮光膜B Μ 於上部透明玻璃基板S U Β 2側,如第1圖中之粗線 所示的Β Μ邊界線,從不欲之間隙部(像素電極ρ X與對 向電極C Τ以外之間隙)射出穿透光於顯示面側,不使對 比等下降而形成遮光膜Β Μ (所謂黑矩陣)。 本紙张尺度適用中國國家標準(CNS ) Λ4規格(210X 297公犮) -26- A7 B7 ^— ____—- 一 ,丨,丨· 五、發明説明(24) 遮光膜Β Μ亦有不使外部光或背光不射入i型半導體 層之作用。亦即,將薄膜電晶體TFT之i型半導體層 A S以上下之遮光膜Β Μ及大些的閛極電極G T (第3圖 )包夾,而使外部之自然光、背光無法抵達。 第1圖所示之遮光膜Β Μ係僅呈示附屬於一像素者, 而實際上係在每一像素均有形成,開口在內側。又,該圖 案~例。 梳形電極末端等之電場方向雜亂部份,因爲該部份之 顯示與像素內之影像資訊——對應,且黑時爲黑,白時爲 白,可利用作顯示之一部份。 其中,遮光膜Β Μ對光非具遮蔽性不可。特別是,像 素電極Ρ X與對向電極C Τ間之間隙,爲抑制汲極信號線 方向之串訊(縱向模糊),光學濃度須在3以上。 \ 遮光膜Β Μ可用C r等之導電金屬形成,但係以使用 對象素電極Ρ X與對向電極C T間之電場不造成影響之高 絕緣性膜形成爲佳。 經濟部智丛財產局員工消贤合作社印鉍 本實施例中係將黑色有機顏料混入阻劑材料,形成 1 · 2微米左右之厚度。爲提升對光之遮蔽性,亦可在絕 緣性不對液晶組成物層內之電場造成影響而能維持在1 〇 S 歐姆·公分以上之範圍,將碳黑、鈦氧化物(· 丁 i x〇y ) 混入。 又,因遮光膜Β Μ係分割出各行之有效顯示區域,具 有使各行之像素的輪廓淸晰之作用。遮光膜]g Μ之周邊部 均/成相框状,其圖条係與第1 |量|所示之矩陣部之圖案連 本紙佐尺度適用中國國家標準(CNS ) Α^Γ(」()><297公炝) -27 - 583479 A7 _________B7 五、發明説明(25) 續形成。 f請先閱讀背面之注意寧項,存本頁) 周邊部之遮光膜BM延長至密封部sl (參照第7圖 )之外側,以防止個人電腦等之構裝機所引起的反射光等 Z漏出光侵入矩陣部,並且防止背光源等之光外漏於顯示 區域外。 另· 一方面,該遮光膜B M·距基板s U B 2之邊緣留有 約0 · 3毫米至1 · 0毫米左右,避開基板S u B 2之裁 切區域。Counter electrode C T The counter electrode c T is formed by I T 0 and is connected to the same layer as the common voltage signal line c L. The counter electrode CT is configured so that a common voltage V c 〇m is applied. In this embodiment, the common voltage V c om is set to the lowest-order driving voltage V dmi η and the highest-order driving voltage applied to the drain signal DL. The intermediate DC potential of V dma X is a lower potential to the extent that the feed-through voltage Δ V s generated by the thin-film transistor element TF D is turned off. This embodiment is described using I T0 as a transparent conductor, but it is needless to say that the same effect can be obtained by using indium-zinc-oxide (I Z0). Color filter substrate Next, return to Figures 1 and 2 to explain the structure of the transparent glass substrate on the upper side, the Ministry of Economic Affairs, Intellectual Property Office, Property Bureau a, and the S U B 2 side (color filter substrate). The light-shielding film B Μ is located on the upper transparent glass substrate SU Β 2 side, as shown by the thick line BM boundary line in Fig. 1, and the gap portion (the gap other than the pixel electrode ρ X and the counter electrode C T) is never desired. ) The penetrating light is emitted to the display surface side to form a light-shielding film BM (so-called black matrix) without lowering contrast and the like. This paper size applies the Chinese National Standard (CNS) Λ4 specification (210X 297 cm) -26- A7 B7 ^ — ____—- I. 丨, 丨 · V. Description of the invention (24) The light-shielding film BM does not make the outside The light or backlight does not enter the i-type semiconductor layer. That is, the light-shielding film BM above and below the i-type semiconductor layer AS of the thin-film transistor TFT and the larger electrode G T (Fig. 3) are sandwiched so that the external natural light and backlight cannot reach. The light-shielding film BM shown in FIG. 1 shows only those attached to one pixel, but in fact, it is formed at each pixel, and the opening is on the inside. The pattern is an example. The direction of the electric field of the comb-shaped electrode is chaotic, because the display of this part corresponds to the image information in the pixel, and it is black when it is black and white when it is white. It can be used as part of the display. Among them, the light-shielding film BM cannot be shielded from light. In particular, the gap between the pixel electrode P X and the counter electrode C T must be at least 3 in order to suppress crosstalk (longitudinal blurring) in the direction of the drain signal line. \ The light-shielding film BM can be formed of a conductive metal such as Cr, but it is better to form an insulating film that does not affect the electric field between the pixel electrode PX and the counter electrode CT. Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs, Xiaoxian Cooperative, printed bismuth. In this example, a black organic pigment was mixed into the resist material to form a thickness of about 1.2 microns. In order to improve the shielding property against light, the carbon black and titanium oxide (· ding ix〇y) can be maintained in a range of 10 ohm · cm or more without affecting the electric field in the liquid crystal composition layer. ) Mix in. In addition, since the light-shielding film BM divides the effective display area of each line, it has the effect of making the outline of the pixels of each line clear. Light-shielding film] The peripheral parts of gM are framed into a frame shape, and the bars are the same as the pattern of the matrix part shown in the first | amount | even the paper and the scale are applicable to the Chinese National Standard (CNS) Α ^ Γ ("() > < 297 public money) -27-583479 A7 _________B7 V. Description of Invention (25) Continued to form. f Please read the caution on the back first, save this page) The light shielding film BM in the peripheral part is extended to the outside of the sealing part sl (refer to Figure 7) to prevent the leakage of reflected light, etc. caused by the mounting machine of a personal computer, etc. Light intrudes into the matrix portion and prevents light from a backlight or the like from leaking out of the display area. On the other hand, the light shielding film B M is left about 0.3 mm to 1.0 mm from the edge of the substrate s U B 2 to avoid the cutting area of the substrate S u B 2.

彩色濾光片F I L 彩色濾光片F I L係於像素的對向位置重複形成紅、 綠、藍之線條。彩色濾光片F I L係形成爲與遮光膜B Μ 部份重疊。 彩色濾光片F I L可如下形成。首先,於上部透明玻 璃基板S U Β 2之表面形成壓克力系樹脂等之著色基材, 以光微影技術去除紅色濾光片形成區域以外之著色基材。 經濟部智慧財產局肖工消费合作社印焚 然後以紅色顏料將著色基材著色,施以固化處理,形 成紅色濾光片R。其次,施以同樣步驟,依序形成綠色濾 光片G、藍光濾光片Β。而著色亦可用染料。 頂塗膜〇C . 頂塗膜〇C係爲防止彩色濾光片F I L之色料往液晶 組成物層L C之洩漏,及使彩色濾光片F I L、遮光膜 Β Μ之高低平坦化而設。 本紙张尺度適用中國國家標準(CNS )八4規格(2丨0 X 297公漦) -28- 583479 A7 ^ 五、發明説明(26) 頂塗膜〇C係由例如,壓克力樹脂、環氧樹脂等之透 明樹脂材料所形成。又,亦可使用流動性良好之聚酰亞胺 等之有機膜作爲頂塗膜。 液晶層及偏光板 其次說明液晶層、配向膜、偏光板等。 液晶層 液晶係用介電率各向異性△ ε爲負,其値爲4 . 0, 折射率各向異性△ η爲0 . 1 0 0 ( 5 8 9奈米,2 0 °C )之分子內具二氟苯結構之液晶分子向列型液晶。 經濟部智楚財產局员工消货合作社印奴 此外,亦可係含分子內有二氰基苯結構之液晶分子的 液晶,含分子內有二氟苯結構之液晶分子的液晶及含分子 內有二氰基苯結構之液晶分子的液.晶,含分子內有單氰基 运己ί完結構之液晶分子的液晶,或兼含分子內有二氟苯結 構之液晶分子及分子內有單氰基環己烷結構之液晶分子的 液晶。液晶不限於上述組成物,僅須介電率各向異性爲負 之液晶即可。 液晶組成物層之厚度(間隙)爲3 · 0微米,阻尼 △ η · d爲0 · 3 0微米。係使下述之配向膜與偏光板組合 ,液晶分子從初期定向方向往電場方向旋轉4 5。時可得 最大穿透率,可得在可見光之範圍內幾無波長依賴性的穿 透光。 又,液晶組成物層之厚度(間隙)係以施以垂直定向 本紙張尺度適用中國國家標準(CRS ) A4规格(2丨0X 297公^7 ' ' 583479 A7 _ B7 五、發明説明(27) 處理之聚合物珠粒控制。藉此,黑顯示時珠粒周圍之液晶 分子的定向安定化,可得良好黑階,對比提升。 又,液晶之比電阻係選用1 · Ο X 1 0 1 歐姆·公分 以上1 . 0 X 1 0 1 2歐姆·公分以下者(本實施例爲 5 . 2 X 1 〇 1 1歐姆·公分)。以本方式,即使液晶之電 阻低亦可充分保持充電於像素電極與對向電極間之電壓。 其下限爲;[.〇 X 1 〇 9歐姆·公分,較佳者爲1 . 〇 X 1 0 1 ^歐姆·公分。此乃藉由將像素電極和對向電極形 成於同一基板上。又,若電阻過高,則因製程中導入之靜 電不易鬆弛,故宜在1 . Ο X 1 0 1 3歐姆·公分以下,較 佳者爲1 . Ο X 1 0 1 2歐姆·公分以下。 配向膜 配向膜〇R I係用聚酰亞胺。初期定向方向 R D R係使之與上下基板互相平行。賦予初期定向方向之 方法,以平磨爲最普遍,此外有斜向蒸鍍。 經濟部智慧財產局员工消f合作社印製 初期定向方向R D R與施加電場方向E D R之關係如 第5圖所示。本實施例中,初期定向方向R D R係相對於 水平方向約7 5 ° 。又,使用負介電率各向異性的本實施 例之構造中,初期定向方向R D R與施加電場方向E D R 所成之角度須在4 5 °以上,不及9 0。。配向膜之厚度在 2 0奈沐至3 0 〇奈米(本實施例爲]Qq奈米左右)。 偏光板 本紙張尺度適用中國國家標筚(CNS ) Λ4規格(210 X 297公浼) 583479 A7 ____B7 __ 五、發明説明(28) 偏光板P〇L 1、P〇L 2係用導電性偏光板,上側 偏光板P〇L 1之偏光穿透軸μ A X 1係與初期定向方向 R D R —致,下側偏光板p〇l 2之偏光穿透軸M A X 2 係與其直交。第5圖示其關係。 藉此,伴隨施加於本發明之像素的電壓(像素電極 PX與對向電極CT間之電壓)的增加,可得穿透率上升 之常閉特性。即,無電壓之施加時可作優質之黑顯示。 而,本實施例中因偏光板具導電性可對付外來靜電 所致之顯示不良及Ε Μ I 。至於導電性,若僅爲對付靜電 之影響,表單電阻宜在1 〇 3歐姆/□以下,爲對付Ε Μ I 則宜在1 0 4歐姆/□以下。又,玻璃基板的液晶組成物之 夾置面的背光(粘合偏光板之面)亦可設有導電層。 矩陣周邊之構造 經濟部智总財產局肖工消t合作社印鉍 第6圖係呈示包含上下玻璃基板SUB 1、SUB 2 之顯示面板P N L之矩陣(A R )周邊之重要部份的俯視 圖。又,第7 A圖係呈示連接掃瞄電路之外部連接端子 G T Μ附近之剖面,而第7 B圖係呈示無外部連接端子時 密封部附近之剖面的圖。 該面板之製造中,若爲小尺寸則爲提升產量係於一片 玻璃基板同時加工多數個元件再予分割,若爲大尺寸,因 共用製造設備,任何品種尺寸均已標準化之玻璃基板於加 工後裁成合於各品種之大小。 無論何者均係經一連串步驟後將玻璃裁切。第6、 7 本紙张尺度適州中國國家標準(CNS ) Λ4規格(210X29*7公浼) 583479 A7 ____B7 五、發明説明(29) 圖示後者之例,第6、7圖均呈示裁切後之上下基板 S U B 1、 S U B 2。第6圖之L N表二基板裁切前之邊 緣。 無論何者,完成狀態係,上側基板s U B 2之大小限 於下側基板S U B 1之較內側,以使外部連接端子群了 g 、T d及端子C 丁 Μ之存在部份(第6圖之上側及左側) 的此等端子外露。 端子群T g、T d,各因下述掃瞄電路連接端子 G 丁 Μ、汲極fg號電路接續端子d T Μ及此等之接出配線 部多數統合於搭載有積體電路晶片C Η I (參照第1 3圖 )之捲帶載具封裝Τ C Ρ (參照第1 3圖)之單元而得名 〇 各群之從矩陣部至外接端子部之接出配線係往二端傾 斜。此係爲使顯示面板P N L之端子D 丁 Μ、 G 丁 Μ合於 封裝T C Ρ之排列間距及各封裝丁 C ρ之連接端子間距。 又,對向電極端子C Τ Μ係爲從外部電路施予公用電 壓於對向電極C Τ之端子。矩陣部之公用霞壓信號線◦ l ,係由掃瞄電路端子G Τ Μ之相反側(第6圖之右側)接 出,將各公用電壓信號線統合於公用匯流線C Β,連接到 對向電極端子C Τ Μ。 透明玻璃基板S U Β 1、 S U Β 2之間沿其邊緣,除 液晶封入口 I N J以外,形成密封圖案s L以能將液晶 L C封合。密封材係由例如環氧樹脂所成。配向膜 0 R I 1、〇R I 2之層係形成於密封圖案s L之內側。 削7 麵緖W CNS ) Λ视;IM 2丨GX297公赴) * —~ (請先Μ讀背面之注意事項Jim寫本頁 經濟部智毪財產局肖工消费合作社印製 ---、1]------绍---------------- 583479 A7 ——___ B7__ 五、發明説明(30) 偏光板POL 1、P〇L2係各構成於下部透明玻璃基板 U B 1,上部透明玻璃基板S U B 2之外側表面。液晶 L c係封入於設定液晶分子之方向的下部配向膜 Q R I 1及上部配向膜〇R I 2之間以密封圖案 S L的分割區域。下部配向膜〇R I 1係形成於下部透明 坡璃基板SUB 1側之保護膜p SV之上部。 該液晶顯不裝置係於下部透明玻璃基板s u B 1側, 上部透明玻璃基板S U B 2側個別堆疊諸層,於基板 S ϋ B 2側形成密封圖案S L ,將下部透明玻璃基板 S U Β 1與上部透明玻璃基板s U Β 2疊合。再由密封材 s L之開口部I N j注入液晶,以環氧樹脂等封合注入口 1 N J,裁切上下基板而組裝。 閘極端子部 第8圖係從矩陣之閘極信號線g L至外部連接端子 G Τ Μ之連接構造的說明圖。第8 a圖係俯視圖,第8 Β 圖呈示第8 A圖的B — B線之剖面。 經濟部智站財產局貨工消費合作社印焚 而,第8圖係對應於第6圖之左下方附近,斜配線之 部份爲方便係示爲一直線。圖中C r 一 Μ 〇層g 1爲易於 判別係晝上斜線。 閘極端子G Τ Μ,係以用於保護其c r 一 μ 〇層g 1 ,尤以其表面,並提升與丁 C P (捲帶載具封裝)之連接 的可靠性之透明導電層I T〇1構成。 該透明導電層I T〇1係用透明導電層I τ〇。如第 木纸^1度適州中國國家標準(〇奶)八4规格(210>< 297公沒·) 583479 A7 B7 五、發明説明(31) 8 B圖所示,絕緣膜G I及保護膜P S V係形成於同圖之 右側,位於左端之端+部G T Μ從絕縁G I及保護fe P S V外露而能與外部電路作電接觸。 第8圖係僅示一對的閘極線G L及閘極端子G T Μ, 實際上係構成有如此之對,上下多數並排的端子群τ g ( 參照第1 0圖),閘極端子G T Μ之圖不左端,係以製程 中延長超出基板之裁切區域的短路配線S Η g (圖未示) 短路。以該短路配線S H g短路,係用以防止製程中配向 膜〇R I 1之平磨時等之靜電破壞。 汲極端子D T Μ 第9圖係說明從汲極信號線D L至其外部連接端子 DTM的連接構造之說明圖。第9Α圖示其平面,第9Β 圖示第9 Α圖之Β - Β剖切線之剖面。而第9圖係對應於 第6圖之右上附近,爲方便圖之方向已變,右端方向係相 當於基板S U Β 1之上端部。 經濟部智慈財產局貨工消赀合作社印製 外部連接汲極端子D T Μ係排列於上下方向,汲極端 子D Τ Μ如第1 3圖所示構成端子群T d (加字省略), 其更延長而超過基板S U Β 1之裁切線。該汲極端子 D Τ Μ在製程中係延長超越基板之裁切區域,製程中爲防 靜電破壞全部互以短路配線S H d (圖未示)短路。 汲極連接端子D Τ Μ係以透明導電層I T〇1形成, 於保護膜P SV之去除部份連接於汲極信號線DL。該透 明導電膜I TO 1係與閘極端子GTM同樣用透明導電膜 本紙张尺度適別中國國家標準(CNS ) Λ4現格(210X 297公炝) 583479 A7 B7 五、發明説明(32) I TO。從矩陣部至汲極端子部DTM之接出配線,係與 汲極信號線DL同級之層d1所構成。 (請先閱讀背而之注意事頊一 本頁 對向電極端子C T Μ 第10圖係從公周電壓信號線CL至其外部連接端子 CTM之連接構造的說明圖。第10A圖示平面,第 1 0B圖示第1 0A圖之B — B剖切線的剖面。面第]_〇 圖係對應於第6圖之左上附近。 各公用電壓信號線C L係統合於公用匯流線C B接出 於對向電極端子C T Μ。公用匯流線C B係於導電層g 1 上層合以導電層g 3 (圖未示),以透明導電層I T〇1 、-0 將彼等作電連接之構造。 此乃爲降低公用匯流線C B之電阻,使公用電壓能從 外部電路充分供給於各公用電壓信號線C L。本構造之特 徵爲:無須另加導電層即可降低公用匯流線之電阻。 經濟部智怂財/1局肖工消骨合作钍印奴 對向電極端子C T Μ,係構成導電層g 1上疊合有透 明導電層I T〇1 。該透明導電膜I T〇1係用與其它端 子同之透明導電膜I T〇。 藉由透明導電層I T〇1,因耐久性佳,被覆於導電 層g 1可保護其表面以防止電蝕等。 又,透明導電層IT01與導電層gl及導電層dl 之連接,係以形成穿經保護膜P s V及絕緣膜G I之通孔 而獲致導通。 Η. n'r Ρ /1>· m lb Ι.\Ί ΙΛΊ ( ) A -d-ili' ·}κ ( n\() V ?Q7A ΰτ ) 583479 A / B7 五、發明説明(33) 顯示裝置全體等效電路 顯示在矩陣部之等效電路及其周邊電路之接線圖示於 第11圖。該圖既係電路圖,亦對應實際之幾何配置繪製 〇 多數之像素係形成二維排列的陣列。第1 1圖中,X 指汲極信號線D L,加字G、B及R係各對應於綠、藍及 紅像素而賦與。Y指閘極信號線G L,加字1、2、 3 ··· …e n d係依掃瞄時序之順序賦與。 閘極信號線Y (加字省略)係連接於垂直掃瞄電路V ,汲極信號線X (加字省略)係連接於汲極信號驅動電路 。S U P係包含爲從一電壓源獲得多數經分壓安定化之電 壓源的電壓電路,及轉換來自主機(高階運算處理裝置) 之C R T (陰極射線管)用顯示資訊爲T F ΊΓ液晶顯示裝 置用之顯示資訊的電路。 請 閲 讀 背 之 意 事Color filter F I L The color filter F I L repeatedly forms red, green, and blue lines at the opposite positions of the pixels. The color filter F I L is formed so as to partially overlap the light-shielding film B M. The color filter F I L can be formed as follows. First, a colored base material such as an acrylic resin is formed on the surface of the upper transparent glass substrate SUB2, and the colored base material outside the area where the red filter is formed is removed by a photolithography technique. It is printed by Xiao Gong Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs, and then the colored substrate is colored with a red pigment and cured to form a red filter R. Next, the same steps are performed to sequentially form a green filter G and a blue filter B. And dyeing can be used for coloring. Top coating film OC. The top coating film OC is designed to prevent the color material of the color filter F I L from leaking to the liquid crystal composition layer LC, and to flatten the height of the color filter F I L and the light shielding film BM. This paper size is applicable to China National Standard (CNS) 8-4 specifications (2 丨 0 X 297 cm) -28- 583479 A7 ^ V. Description of the invention (26) Top coating film 0C is made of, for example, acrylic resin, ring It is made of transparent resin material such as oxygen resin. Alternatively, an organic film such as polyimide having good fluidity may be used as the top coat film. Liquid crystal layer and polarizing plate Next, a liquid crystal layer, an alignment film, a polarizing plate, and the like will be described. The liquid crystal layer liquid crystal system uses a molecule with a dielectric anisotropy Δ ε of negative, whose 値 is 4.0, and a refractive index anisotropy Δ η of 0.1 0 0 (589 nm, 20 ° C). Liquid crystal molecular nematic liquid crystal with difluorobenzene structure inside. In addition, it can be a liquid crystal containing liquid crystal molecules with a dicyanobenzene structure in the molecule, and a liquid crystal containing liquid crystal molecules with a difluorobenzene structure in the molecule. Liquid crystals of liquid crystal molecules with a dicyanobenzene structure, liquid crystals containing liquid crystal molecules with a monocyano group in the molecule, or liquid crystal molecules with a difluorobenzene structure in the molecule and monocyanine in the molecule Liquid crystal molecules of liquid crystal molecules with a cyclohexane structure. The liquid crystal is not limited to the above composition, and only liquid crystal having a negative dielectric anisotropy may be used. The thickness (gap) of the liquid crystal composition layer is 3.0 micrometers, and the damping Δ η · d is 0.3 micrometers. The following alignment film is combined with the polarizing plate, and the liquid crystal molecules are rotated from the initial orientation direction to the electric field direction by 45. The maximum transmittance can be obtained at this time, and almost no wavelength-dependent transmission in the visible range can be obtained. In addition, the thickness (gap) of the liquid crystal composition layer is applied in a vertical orientation. The paper size applies the Chinese National Standard (CRS) A4 specification (2 丨 0X 297 mm ^ 7 '' 583479 A7 _ B7 V. Description of the invention (27) Controlled polymer beads. With this, the orientation of the liquid crystal molecules around the beads during black display can be stabilized to obtain a good black level, and the contrast can be improved. In addition, the specific resistance of the liquid crystal is 1 · 〇 X 1 0 1 ohm · Above 1.0 cm 1 × 2 1 ohm · Below cm (5.2 X 1 〇1 1 ohm · cm in this embodiment). In this way, even if the resistance of the liquid crystal is low, the pixel can be fully charged. The voltage between the electrode and the counter electrode. Its lower limit is: [.〇X 1 〇9 ohm · cm, more preferably 1. 〇X 1 0 1 ^ ohm · cm. This is achieved by the pixel electrode and the counter electrode. The electrodes are formed on the same substrate. If the resistance is too high, the static electricity introduced during the process is not easy to relax, so it should be 1. OX X 1 0 1 or less, more preferably 1. OX X 1 0 1 2 ohm · cm or less. Alignment film Alignment film ORI polyimide. Initial orientation The RDR is made parallel to the upper and lower substrates. The method of giving the initial orientation direction is the most common method of flat grinding, and there is oblique vapor deposition. The employee of the Intellectual Property Bureau of the Ministry of Economic Affairs has printed the initial orientation direction RDR and the direction of the applied electric field The relationship between EDRs is shown in Fig. 5. In this embodiment, the initial orientation direction RDR is about 75 ° with respect to the horizontal direction. In addition, in the structure of this embodiment using negative dielectric anisotropy, the initial orientation direction The angle formed by the RDR and the applied electric field direction EDR must be above 45 ° and less than 90 °. The thickness of the alignment film is from 20nm to 300nm (in this embodiment, it is about Qqnm). Polarized light The paper size of the paper is applicable to the Chinese National Standard (CNS) Λ4 specification (210 X 297 cm) 583479 A7 ____B7 __ V. Description of the invention (28) Polarizing plates P0L 1, P0L 2 are conductive polarizing plates, The polarizing light transmission axis μ AX 1 of the upper polarizing plate POL 1 is aligned with the initial orientation direction RDR, and the polarizing light transmitting axis MAX 2 of the lower polarizing plate P0l 2 is orthogonal to it. The fifth relationship is shown. With this, the image applied to the present invention When the voltage (voltage between the pixel electrode PX and the counter electrode CT) is increased, a normally-closed characteristic with increased transmittance can be obtained. That is, high-quality black display can be performed when no voltage is applied. However, in this embodiment, because The polarizing plate has conductivity to cope with poor display caused by external static electricity and ΕΜΙ. As for conductivity, if it is only to deal with the influence of static electricity, the form resistance should be below 103 ohms / □, and it is appropriate to deal with ΕΜΙ Below 104 ohms / □. In addition, the backlight (the surface to which the polarizing plate is adhered) on the sandwiched surface of the liquid crystal composition of the glass substrate may be provided with a conductive layer. Structure around the matrix Xiao Gongxiao, Co., Ltd. of the Ministry of Economy, Intellectual Property, and Cooperative Co., Ltd. Printed Bismuth Figure 6 is a plan view showing important parts around the matrix (AR) of the display panel P N L including the upper and lower glass substrates SUB 1 and SUB 2. Fig. 7A shows a cross-section near the external connection terminal G T M connected to the scanning circuit, and Fig. 7 B shows a cross-section near the seal portion when there is no external connection terminal. In the manufacture of this panel, if the size is small, it is to increase the output. It is processed on a glass substrate at the same time to process many components and then divided. If the size is large, because of the shared manufacturing equipment, any type of glass substrate has been standardized after processing. Cut to fit the size of each variety. In either case, the glass is cut after a series of steps. Sections 6 and 7 of this paper are in accordance with the China National Standards (CNS) Λ4 specification (210X29 * 7mm) 583479 A7 ____B7 V. Description of the Invention (29) The latter is shown as an example. Figures 6 and 7 are shown after cutting Upper and lower substrates SUB 1, SUB 2. LN in Fig. 6 is the edge of the substrate before cutting. Regardless of the completion state, the size of the upper substrate s UB 2 is limited to the inner side of the lower substrate SUB 1 so that the external connection terminal group includes g, T d, and terminals C and M (the upper side of FIG. 6). And on the left). The terminal groups T g and T d are each integrated with the integrated circuit chip C 因 due to the following scanning circuit connection terminals G and M, the drain fg circuit connection terminal d T M, and the output wiring sections. The unit of tape carrier package T C P (refer to FIG. 13) of I (refer to FIG. 13) is named 〇 The wiring from each matrix group to the external terminal part is inclined toward the two ends. This is to combine the terminals D D and G D of the display panel P N L with the arrangement pitch of the package T C P and the connection terminal pitch of each package D C ρ. The counter electrode terminal CT is a terminal that applies a common voltage to the counter electrode CT from an external circuit. The common voltage signal line of the matrix part ◦ l is connected from the opposite side (right side of Fig. 6) of the scanning circuit terminal G T M. The common voltage signal lines are integrated with the common bus line C Β and connected to the pair. To the electrode terminal C TM. Between the transparent glass substrates S U B 1 and S U B 2 along their edges, a sealing pattern s L is formed to seal the liquid crystal LC, except for the liquid crystal sealing inlet I N J. The sealing material is made of, for example, epoxy resin. The layers of the alignment films 0 R I 1 and 0 I I 2 are formed inside the seal pattern s L. Cut 7 facets W CNS) Δ view; IM 2 丨 GX297 go to the public) *-~ (Please read the note on the back first Jim write this page printed by Xiao Gong Consumer Cooperative, Intellectual Property Bureau of the Ministry of Economy ---, 1 ] ------ Shao ---------------- 583479 A7 ——___ B7__ V. Description of the invention (30) Polarizing plates POL 1, P0L2 are each formed in the lower part The transparent glass substrate UB1 and the outer surface of the upper transparent glass substrate SUB2. The liquid crystal L c is enclosed between the lower alignment film QRI 1 and the upper alignment film ORI 2 which set the direction of the liquid crystal molecules to seal the divided area of the pattern SL. The lower alignment film ORI 1 is formed above the protective film p SV on the lower transparent sloped glass substrate SUB 1. The liquid crystal display device is attached to the lower transparent glass substrate su B 1 side, and the upper transparent glass substrate SUB 2 side is individually stacked. These layers form a sealing pattern SL on the substrate S ϋ B 2 side, and the lower transparent glass substrate SU Β 1 and the upper transparent glass substrate s U Β 2 are stacked. Then, the liquid crystal is injected from the opening IN j of the sealing material s L to The injection port is sealed with 1 NJ of epoxy resin, etc., and the upper and lower substrates are cut and assembled. The explanatory diagram of the connection structure of the gate signal line g L to the external connection terminal G T M. Fig. 8a is a top view, and Fig. 8B shows a cross section of line B-B in Fig. 8A. The cargo and consumer cooperatives are printed. Figure 8 corresponds to the lower left corner of Figure 6. The oblique wiring is shown as a straight line for convenience. In the figure, C r -M 0 layer g 1 is easy to identify. Slash. The gate electrode G T M is a transparent conductive layer IT used to protect its cr-μ layer g 1, especially its surface, and to improve the reliability of the connection with Ding CP (Tape Carrier Packaging). 〇1 constitution. The transparent conductive layer IT〇1 is a transparent conductive layer I τ〇. Such as the first wood paper ^ 1 degree Shizhou Chinese National Standard (〇 milk) 8 4 specifications (210 > < 297 public ·) 583479 A7 B7 V. Description of the invention (31) 8 As shown in Figure B, the insulating film GI and protective film PSV are formed on the right side of the same figure, and the left end + GT Μ is exposed from the insulating GI and the protective PSV. The external circuit is in electrical contact. Figure 8 shows only a pair of the gate line GL and the gate terminal GT Μ, which actually constitutes For this pair, there are a large number of terminal groups τ g side by side (refer to Fig. 10). The gate terminal GT Μ is not at the left end. It is a short-circuit wiring S Η g that extends beyond the cutting area of the substrate during the manufacturing process. (Shown) short-circuit. The short-circuit with the short-circuit wiring SH g is used to prevent static damage during the flat grinding of the alignment film ORI 1 during the manufacturing process. Drain Terminal D T M FIG. 9 is an explanatory diagram illustrating a connection structure from the drain signal line D L to its external connection terminal DTM. Figure 9A illustrates its plane, and Figure 9B illustrates a cross section taken along line B-B of Figure 9A. The ninth figure corresponds to the upper right vicinity of the sixth figure. For convenience, the direction of the figure has changed, and the right direction corresponds to the upper end of the substrate SUB1. The externally connected drain terminal DT Μ printed by the goods and workers' cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is arranged in the up-down direction, and the drain terminal D T Μ constitutes a terminal group T d as shown in FIG. It is longer than the cutting line of the substrate SU Β1. The drain terminal D T M is extended beyond the cutting area of the substrate during the manufacturing process. In order to prevent electrostatic damage during the manufacturing process, all of them are short-circuited with short-circuit wiring S H d (not shown). The drain connection terminal D T M is formed with a transparent conductive layer I T〇1 and is connected to the drain signal line DL at a removed portion of the protective film PSV. The transparent conductive film I TO 1 is the same as the gate electrode GTM. The transparent conductive film is used. The paper size is in line with the Chinese National Standard (CNS). Λ4 is standard (210X 297 cm). 583479 A7 B7 5. Description of the invention (32) I TO . The connection wiring from the matrix portion to the drain terminal portion DTM is constituted by a layer d1 at the same level as the drain signal line DL. (Please read the cautions on the back first. The counter electrode terminal CT Μ on this page. Figure 10 is an explanatory diagram of the connection structure from the common voltage signal line CL to its external connection terminal CTM. Figure 10A 1 0B illustrates the cross section of the B-B cutting line in FIG. 10A. The first figure] _〇 corresponds to the upper left near the sixth figure. Each common voltage signal line CL system is connected to the common bus line CB and is connected to the opposite side. To the electrode terminal CT M. The common bus line CB is laminated on the conductive layer g 1 with a conductive layer g 3 (not shown), and the transparent conductive layers IT0 1 and -0 are used to electrically connect them. This is In order to reduce the resistance of the common bus line CB, the common voltage can be fully supplied to each common voltage signal line CL from an external circuit. The feature of this structure is that the resistance of the common bus line can be reduced without the need of an additional conductive layer. Cai / 1 Bureau Xiao Gong eliminates bones and cooperates with the seal electrode counter electrode CT M, which constitutes the conductive layer g 1 with a transparent conductive layer IT01 superimposed. The transparent conductive film IT01 is the same as other terminals Transparent conductive film IT〇. The transparent conductive layer IT〇1 is durable It is better to cover the conductive layer g1 to protect the surface from electric erosion, etc. In addition, the connection between the transparent conductive layer IT01 and the conductive layer gl and the conductive layer dl is to form a layer that passes through the protective film Ps V and the insulating film GI. Through the hole to achieve conduction. Η. N'r Ρ / 1 &·; m lb Ι. \ Ί ΙΛΊ () A -d-ili '·} κ (n \ () V? Q7A ΰτ) 583479 A / B7 Description of the invention (33) The entire equivalent circuit of the display device is shown in the matrix section of the equivalent circuit and its peripheral circuit wiring diagram in Figure 11. This figure is both a circuit diagram and the actual geometric configuration drawing. Most pixels It forms a two-dimensional array. In Fig. 11, X refers to the drain signal line DL, and the words G, B, and R are assigned corresponding to the green, blue, and red pixels. Y refers to the gate signal line GL The plus words 1, 2, 3, ... end are assigned in the order of the scan timing. The gate signal line Y (the plus word is omitted) is connected to the vertical scanning circuit V, and the drain signal line X (the plus word) (Omitted) is connected to the drain signal drive circuit. SUP is a voltage circuit for obtaining a majority of the divided voltage-stabilized voltage source from a voltage source and converting The circuit for displaying information for the C R T (cathode ray tube) from the host computer (high-order arithmetic processing device) is the display information for the T F ΊΓ liquid crystal display device. Please read the meaning of the back

碩 % 本裝 頁 I 訂 經濟部智祛財產局貞工消赀合作社印製 驅動方法 第1 2圖示本實施例之液晶顯示裝置的驅動波形。閘 極信號V G於每一掃瞄期間成開機層次,否則爲關機層次 。汲極信號電壓V D係以欲加於液晶層的電壓之二倍的幅 度於每一畫 極反轉,並傳導至一像素而施加 在此,汲極信號電壓V D係逐列反轉極性,亦逐行反 轉極性。藉此,極性反轉之像素成上下左右相鄰之構造( 批次反轉驅動),可減少閃爍、串訊(模糊)之發生。 本紙ft尺度適州中國國家標準(CNS )八4規格(2)0X 297公犮) 583479 A7 B7 五、發明说明(34) 又,公用電壓Vc係設定爲比汲極信號電壓之極性反 轉的中心電壓低一定量之電壓。此乃用以修正薄膜電晶體 TFT從開機變爲關機時所產生之饋通電壓,而能以直流 成分少的交流電壓V L C施加於液晶(以直流施加於液晶 ,則殘像、劣化等遽增之故)。 面板P N L及驅動電路基板P C B 1 第1 3圖係呈示將汲極信號驅動電路Η及垂直掃瞄電 路V連接於第6圖等所示之顯示面板P N L之狀態的俯視 圖。 C Η I係驅動顯示面板P N L之驅動I C晶片(下側 5個係垂直掃瞄電路側之驅動I C晶片,左邊1 〇個係汲 極信號驅動電路側之驅動I C晶片)。 T C Ρ係驅動用I C晶片C Η I以捲帶自動接合法( T A Β )構裝之捲帶載具封裝,P C Β 1係構裝有上述 T C P、電容器等之驅動電路基板,分割成汲極信號驅動 電路用及閘極信號驅動電路用二部份。 經濟部智站財產局員工消货合作社印繁 F G P係框架地線墊,其於密封殻體s H D切出槽口 而設之彈簧狀碎片係以焊錫固定。F C係下側之驅動電路 基板P C Β 1及左側之驅動電路基板p c Β 1所用之電連 接之扁平電纜。 扁平電纜F C係使用如第1 3圖所示之以多數導線( 磷青銅材料鍍錫者)夾層於條狀聚乙烯層及聚乙烯醇層而 成者。 本纸张尺度適用中國國家標隼(CNS ) Α4規格(2ΙΟΧ 297公犮) 583479 A7 B7 五、發明説明(·35) 製造方法 其次參照第14、 15圖說明上述液晶顯示裝置之基 板s U B 1側之製造方法。第1 4、 1 5圖中,中央係步 驟簡稱,左側係第3圖所示之薄膜電晶體τft部份,右 側爲第8圖所示之閘極端子附近之剖面形狀所見的加工流 程。 步驟Α至步驟F係依各微影處理區分,各步驟之任一 剖面圖均示微影處理後加工終止,光阻劑經去除之階段。 而,微影處理指從光阻劑之塗布,使用光罩作選擇曝 光後至其顯影的一連串操作。以下爲免重複,參照第1 4 圖說明步驟A至步驟C:,參照第1 5圖說明步驟D至步驟 F 〇Master% This page Page I Order Printed by the Ministry of Economic Affairs, Intellectual Property Office, Zhengong Consumers Cooperative, Driving method Chapter 12 shows the driving waveforms of the liquid crystal display device of this embodiment. The gate signal V G is turned on during each scan, otherwise it is turned off. The drain signal voltage VD is inverted at each pixel with an amplitude twice as high as the voltage to be applied to the liquid crystal layer, and is transmitted to one pixel to be applied here. Reverse polarity line by line. As a result, the pixels with polarity inversion are adjacent to each other (batch inversion driving), which can reduce the occurrence of flicker and crosstalk (blurring). The paper ft scale is the state China Standard (CNS) 8-4 specification (2) 0X 297 male) 583479 A7 B7 V. Description of the invention (34) In addition, the common voltage Vc is set to be reversed from the polarity of the drain signal voltage The center voltage is lower by a certain amount of voltage. This is to correct the feed-through voltage generated when the thin-film transistor TFT changes from power-on to power-off, and can be applied to the liquid crystal with an AC voltage VLC with a small DC component. The reason). The panel P N L and the driving circuit substrate P C B 1 are views in plan view showing a state where the drain signal driving circuit Η and the vertical scanning circuit V are connected to the display panel P N L shown in FIG. 6 and the like. C Η I is a driving IC chip driving the display panel P N L (the bottom 5 are driving IC chips on the vertical scanning circuit side, and the left 10 are driving IC chips on the drain signal driving circuit side). TC P series drive IC chip C Η I is a tape carrier package constructed by the tape and tape automatic bonding method (TA Β). PC Β 1 is a drive circuit substrate with TCP, capacitors, etc., divided into drains. There are two parts for signal driving circuit and gate signal driving circuit. The staff of the Zhizhan Property Bureau of the Ministry of Economic Affairs, the Consumer Goods Cooperatives Co., Ltd. F G P is a frame ground wire pad. The spring-shaped fragments cut out of the notch in the sealed housing s H D are fixed with solder. F C is an electrically connected flat cable used for the driving circuit substrate P C Β 1 on the lower side and the driving circuit substrate p c Β 1 on the left side. The flat cable F C is formed by sandwiching a plurality of wires (phosphor bronze tin-plated) with a strip-shaped polyethylene layer and a polyvinyl alcohol layer as shown in FIG. 13. This paper size is applicable to China National Standard (CNS) A4 specification (2ΙΟχ 297 cm) 583479 A7 B7 5. Description of the invention (· 35) Manufacturing method Secondly, the substrate s UB 1 side of the liquid crystal display device will be described with reference to Figures 14 and 15 Of manufacturing methods. In Figs. 14 and 15, the central step is abbreviated, and the left side is the thin film transistor τft shown in Fig. 3, and the right side is the processing flow seen in the cross-sectional shape near the gate terminal shown in Fig. 8. Steps A to F are distinguished according to each lithographic process, and any cross-sectional view of each step shows that the processing is terminated after the lithographic process and the photoresist is removed. However, lithographic processing refers to a series of operations from the application of a photoresist to the development of a photoresist using selective exposure. The following is to avoid repetition, and steps A to C are described with reference to Figure 14: and steps D to F are described with reference to Figure 15

(a )步驟A 經濟部智&財產局貨工消費合作社印製 於A N 6 3 5玻璃(商品名)所成之下部透明玻璃基 板S U B 1上,以濺鍍設置膜厚1 0 0埃之I T〇所成之 導電膜I 丁〇1。微影處理後,以Η B r溶液作導電膜 I 丁〇1的選擇性蝕刻。以之形成對向電極C 丁。(a) Step A Printed on the lower transparent glass substrate SUB 1 made of AN 6 3 5 glass (trade name) by the Goods & Consumers Cooperative of the Ministry of Economy and the Property Bureau, and set the film thickness to 100 angstroms by sputtering. The conductive film formed by IT0 is D01. After the lithography process, the ΗBr solution was used as the selective etching of the conductive film I but 〇1. This forms the counter electrode C D.

(13 )步驟B 其次,以丨賤鑛設直膜厚2 0 0奈米之C r所成的導電 膜g 1 。微影處理後利用硝酸姉銨作導電膜g 1之選擇性 蝕刻。藉此形成閘極電極,閘極信號線GL,公用電壓信 本紙悵尺度適用中國國家標羋(CNS ) Λ4現格(2丨〇><297公龄) 583479 A7 B7 五、發明説明(36) 號線C L,閘極端子G ΊΓ Μ,公用匯流線C B之第一導電 層,對向電極端子CTTM1之第一導電層,連接閘極端子 G 丁 Μ之匯流線S H g (圖未示)。在此,電極材料不限 於C r ,可用Μ ο、ΤΓ J:、T a、W等,亦可用這些之合 金。 . (c )步驟C ^ 於等離子體C V D裝置導入氨氣、矽烷氣、氮氣,設 置膜厚3 5 0奈米之氮化矽膜。於等離子體C V D裝置導 入矽烷氣、氫氣,設置膜厚1 2 0奈米之1型非晶質S i 膜後,於等離子體C V D裝置導入膦氣,設置膜厚3 0奈 米之N ( + )型非晶質S i膜。 微影處理後,用乾式蝕刻氣體S F 6,C C _1 4作N ( + )型非晶質S 1膜、i型非晶質S i膜之選擇性蝕刻, 形成i型半導體層A S之島。 (d )步驟D ; 經濟部智站財產局员工消贫合作社印製 以濺鍍形成膜厚3 0奈米之C r所成之導電膜d 1。 = 微影處理後將導電膜d 1以與步驟B同樣之液體作蝕刻, 形成汲極信號線D L,源極電極S D 1,汲極電極S D 2 ,公用匯流線C B 2之第一導電層,及將汲極端子D T Μ 短路之匯流線S H d (圖未示)。在此,電極材料不限於 C r ,可用Μ 〇、T i、T a、W等,亦可用這些之合金 本紙&尺度過州中园國家標準(CNS ) Λ4规格(210X297公兗) 583479 A7 B7 五、發明説明(37) 其次,於乾式蝕刻裝置導入C C 1 4,S F 6 ,蝕刻去 除N ( + )型非晶貿S i膜,選擇性去除源極與汲極間之 N ( + )型半導體層d〇。 導電Ife d 1以主型樣作圖案化後,以導電膜d 1爲遮 罩,去除N ( + )型半導體餍d〇。就是殘留在丨型半導 1¾層A .S上Z N ( + )型半導體層^ 〇之導電膜d 1以外 口 Mz/以自f」對培么除。此時,因n ( + )型半導體層d 〇 係蝕刻以去除其整個厚度,蝕刻時間可控制於多少蝕刻掉 1型半導體層A S之表面部份的程度。 (e )步驟£ 於等離子體C V D裝置導入氨氣、矽烷氣、氮氣,設 置膜厚〇 · 4微米之氮化S i膜。微影處理後以乾式蝕刻 氣體S F 6選擇性齡刻氮化S i膜,將保護膜p s v及絕緣 膜G I圖案化。(13) Step B Next, a conductive film g 1 made of C r with a film thickness of 200 nm is set with a base ore. After the photolithography process, the selective etching of the conductive film g 1 was performed using the ammonium nitrate nitrate. The gate electrode, the gate signal line GL, and the common voltage letter paper are used to form the Chinese national standard (CNS) Λ4 (2 丨 〇 > < 297 male) 583479 A7 B7 V. Description of the invention ( 36) Line CL, the gate terminal G ΊΓ Μ, the first conductive layer of the common bus line CB, the first conductive layer of the counter electrode terminal CTTM1, and the bus line SH g connected to the gate terminals G and M (not shown) ). Here, the electrode material is not limited to C r, and M o, T J :, T a, W, etc. may be used, and these alloys may also be used. (c) Step C ^ Ammonia, silane, and nitrogen are introduced into the plasma C V D device, and a silicon nitride film with a thickness of 350 nm is set. After introducing silane gas and hydrogen into the plasma CVD apparatus and setting a type 1 amorphous Si film with a film thickness of 120 nm, introduce a phosphine gas into the plasma CVD apparatus with a film thickness of 30 nm and N (+ ) Type amorphous Si film. After the lithography process, dry etching gases S F 6 and C C _1 4 are used for selective etching of the N (+) -type amorphous S 1 film and the i-type amorphous S i film to form an island of the i-type semiconductor layer AS. (d) Step D; printed by the poverty alleviation cooperative of the staff of the Zhizhan Property Bureau of the Ministry of Economic Affairs, a conductive film d 1 made of C r with a film thickness of 30 nm is formed by sputtering. = After the photolithography process, the conductive film d 1 is etched with the same liquid as in step B to form the first conductive layer of the drain signal line DL, the source electrode SD 1, the drain electrode SD 2, and the common bus line CB 2, And the bus line SH d (not shown) that short-circuits the drain terminal DT Μ. Here, the electrode material is not limited to C r, but can be used as M o, T i, T a, W, etc. These alloy papers & sizes have passed the National Park National Standard (CNS) Λ4 specification (210X297 cm) 583479 A7 B7 V. Description of the invention (37) Secondly, CC 1 4 and SF 6 are introduced into the dry etching device, and the N (+) type amorphous Si film is removed by etching, and the N (+) between the source and the drain is selectively removed. Type semiconductor layer do. After the conductive Ife d 1 is patterned in the main pattern, the conductive film d 1 is used as a mask to remove the N (+) type semiconductor 餍 d0. That is, the conductive film d 1 remaining on the Z-type (S) semiconductor layer ¾ layer A.S and the conductive film d 1 of the Z N (+)-type semiconductor layer ^ M is not divided by the "F" pair. At this time, since the n (+) type semiconductor layer do is etched to remove the entire thickness, the etching time can be controlled to how much the surface portion of the type 1 semiconductor layer AS is etched away. (e) Step: Introduce ammonia gas, silane gas, and nitrogen gas into the plasma C V D device, and set a nitride film Si with a thickness of 0.4 micrometers. After the photolithography process, the Si film is selectively etched with dry etching gas S F 6 to pattern the protective film p s v and the insulating film G I.

(f )步驟F 以i賤鍍設置膜厚1 2奈米之I 丁〇所成的導電膜 I T〇2 。微影處理後,以Η B r溶液作導電膜I τ〇2 之選擇性蝕刻。藉此形成像素電極P X。 解離性摻質 本實施例之特徵爲:主體液晶中添加有1 〇 〇 p p m 之2, 5-二甲基酚。主體液晶之比電阻爲 表紙悵尺度適用中國國家標準(CNS ) Λ4現格(2丨0/297公發) (讀先閱讀背而之注S事項 r本頁) 、\=0 經濟部智慈財產局員工消費合作社印製 -40 - A7 B7 i '發明説明(38) 1 · 9 x 1 Ο 1 3歐姆·公分,Ν I點Μ 7 加下述構造式之2, 5-二甲基酚後,成爲 5 · 2 X 1 0 1 1歐姆·公分。該液晶之Ν 液晶幾乎相同,爲7 0 · 4 Τ:。 °C。而添 點與添加前之(f) In step F, a conductive film I T〇2 having a film thickness of 12 nm and 12 nm is set by i-plating. After the lithography process, the ΗBr solution was used as the selective etching of the conductive film I τ〇2. Thereby, a pixel electrode P X is formed. Dissociative dopant This embodiment is characterized in that 1,000 p p m of 2,5-dimethylphenol is added to the host liquid crystal. The specific resistance of the main liquid crystal is the surface of the paper. The standard is applicable to the Chinese National Standard (CNS). Λ4 is now available (2 丨 0/297). (Read the note on the back and read the S-item page), \ = 0 Ministry of Economic Affairs Printed by the Consumer Affairs Cooperative of the Property Bureau -40-A7 B7 i 'Explanation of the invention (38) 1 · 9 x 1 Ο 1 3 ohm · cm, N I point M 7 plus 2,5-dimethylphenol of the following structural formula After that, it becomes 5 · 2 X 1 0 1 1 ohm · cm. The N-Liquid crystal of this liquid crystal is almost the same, which is 7 0 · 4T :. ° C. Adding points and adding before

OH H3cOH H3c

CH 3 (請先閱讀背而之注意平項,再^Γ本頁) —裝 太 . 2, 5 —二甲基酚 而,本實施例中之解離性摻質,係酸性解離物質或鹼 性解離物質,在極性溶劑中自動解離產生Η ®離乎,或與水 反應產生〇Η Θ離子之物質。 具體而言,指羧酸(含酐)、酰胺、胺、醇等物質。 於液晶中添加如此之物質則液晶中離子濃度上升,比電阻 下降。 評估本發明之實施例1的液晶顯示裝置之顯示品質時 ,可確認高品質之顯示,幾無殘像不良之發生可見。 〔實施例2〕 本發明有關之液晶顯示裝置的實施例2,除摻質之添 加量爲1 0 Ο Ο P p m以外與實施例1同。主體液晶之比 電阻爲1 . 9χ 1013歐姆·公分,NI點爲70 . 5t 本紙張尺度適扪中國國家標準(CMS ) /Μ说格( -5 線 經濟部智楚財產局工消赀合作社印焚 -41 583479 除所周配向 五、發明説明(39) 。添加2’ 5-二甲基酣後成5 . 2χ丄〇"歐姆.公分 口次液日日之N I點與添加則之液晶幾乎相同 爲了 〇 2 °C。 .本發明之實施例2的液晶顯示裝之顯示品質加以評估 丨玲,可確「|心局TO貝之藏不,同時幾無殘像不良之發生可見 〔實施例3〕 本發明有關之液晶顯示裝置之實施例3 之厚度爲5 0奈米以外,與實施例1同。 本發明有關之貫例3的液晶顯示裝置之顯示品質加 以評估時可確認高.品質之顯示,同時,幾無殘像不良之發 生可見。 〔實施例4.〕 本發明有關之液晶顯示裝置的實施例4 ,除所用配向 膜之厚度爲3 0 0奈米以外,與實施例1同。 本發明有關之實施例4·的液晶顯示裝置之顯示品質加 以評估時可確認高品質之顯示,同時,幾無殘像不良之發 生可見。 〔實施例5〕 本發明有關之液晶顯示裝置的實施例5,除像素電極 間距爲2微米外與實施例1同° 本·紙张尺度適用中國國家標準(CNS ) Λ4規格(210x 297公趁) ----------tII (請先閱讀背面之I事項_ 本買) 、11 經濟部智慈財產局员工消赀合作社印製 -42 - 583479 A7 B7 五、發明説明(40) 本發明有關之實施例5的液晶顯示裝置之顯示品質加 以評估時可確認高品質之顯示,同時,幾無殘像不良之發 生可見。 〔實施例6〕 本發明有關之液晶顯示裝置的實施例6,除用分子內 有單氛基環己烷結構之液晶分子向列型液晶外,與實施例 1同。主體液晶之比電阻爲3 · 5 X 1 0 1 2歐姆·公分, N I點爲7 1 . 5 °C。添加2,5 —二甲基酚後成 2. · 5 X 1 0 1 1歐姆·公分。該液晶之N I點與添加前之 液晶幾乎相同,爲7 1 · 2 °C。 本發明有關之實施例6的液晶顯示裝置之顯示品質加 以評估時可確認高品質之顯示,同時,幾無殘像不良的發 生可見。 〔實施例7〕 本發明有關之液晶顯示裝置的實施例8,除摻質係添 力口 5 0 0 p p m之2, 5 —二甲基苯胺以外與實施例1同CH 3 (please read the back item first, then pay attention to this page, and then ^ Γ this page) — Install too. 2, 5 — Dimethylphenol, and the dissociative dopant in this example is acidic dissociated substance or alkaline Dissociated substances, which are automatically dissociated in polar solvents to produce Η ® liu, or react with water to produce 0Η Θ ions. Specifically, it refers to a substance such as a carboxylic acid (containing an anhydride), an amide, an amine, or an alcohol. When such a substance is added to the liquid crystal, the ion concentration in the liquid crystal increases, and the specific resistance decreases. When the display quality of the liquid crystal display device of Example 1 of the present invention was evaluated, it was confirmed that a high-quality display can be seen with few occurrences of afterimage defects. [Embodiment 2] Embodiment 2 of the liquid crystal display device according to the present invention is the same as Embodiment 1 except that the amount of dopant added is 100 pm. The specific resistance of the main liquid crystal is 1.9 × 1013 ohm · cm, and the NI point is 70. 5t. The paper size is suitable for the Chinese National Standard (CMS) / M 格格 (-5 line printed by the Industrial and Commercial Cooperation Bureau of the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs). Fen-41 583479 Except the weekly orientation V. Description of the invention (39). After adding 2 '5-dimethylfluorene, it becomes 5. 2χ 丄 〇 " Ohm. The NI point of the liquid day and the addition of liquid crystal It is almost the same for 0 ° C.. The display quality of the liquid crystal display device according to Example 2 of the present invention is evaluated. It can be confirmed that "| the heart is not hidden, and at the same time, the occurrence of afterimage defects is visible. [Implementation Example 3] The thickness of Example 3 of the liquid crystal display device according to the present invention is other than 50 nm, which is the same as that of Example 1. The display quality of the liquid crystal display device of Example 3 related to the present invention can be confirmed to be high when evaluated. The display of quality, at the same time, almost no afterimage defects occur. [Example 4.] Example 4 of the liquid crystal display device related to the present invention, except that the thickness of the alignment film used is 300 nm, and the example 1 the same. The liquid crystal display device according to the fourth embodiment of the present invention When the display quality is evaluated, a high-quality display can be confirmed, and at the same time, few afterimage defects are visible. [Embodiment 5] Embodiment 5 of the liquid crystal display device according to the present invention, except that the pixel electrode pitch is 2 microns, Example 1 Same ° The paper size applies the Chinese National Standard (CNS) Λ4 specification (210x 297 hours) ---------- tII (Please read the item I on the back _ buy this), 11 Printed by the Consumer Goods Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-42-583479 A7 B7 V. Description of the invention (40) When the display quality of the liquid crystal display device according to Example 5 of the present invention is evaluated, a high-quality display can be confirmed, and [Embodiment 6] Embodiment 6 of the liquid crystal display device of the present invention is similar to the implementation of a liquid crystal molecular nematic liquid crystal having a mono-aeroyl cyclohexane structure in the molecule. Same as in Example 1. The specific resistance of the main liquid crystal is 3 · 5 X 1 0 1 2 ohm · cm, and the NI point is 7 1 · 5 ° C. After adding 2, 5-dimethylphenol, it becomes 2. · 5 X 1 0 1 1 ohm · cm. The NI point of this liquid crystal is almost the same as that of the liquid crystal before addition. 7 1 · 2 ° C. When the display quality of the liquid crystal display device according to Example 6 of the present invention is evaluated, a high-quality display can be confirmed, and at the same time, few occurrences of afterimage defects are visible. [Embodiment 7] The present invention is related to Example 8 of the liquid crystal display device is the same as Example 1 except that the dopant is 5,000 ppm of 2, 5-dimethylaniline.

。主體液晶之比.電阻爲1 . 9 X 1 0 1 3歐姆·公分,N I 點爲 7 0 . 5 °C。 加入2,. 5 —二甲基苯胺時成1 . 2 X 1 0 1 1歐姆· 公分。該液晶之N I幾乎與添加前之液晶相同,爲 7 0.lt。 本紙烺尺度適用中國國家標準(CNS ) A4規格(2丨0:< 297公楚) 請先閲讀背而之注f蒂項,再^^本頁) —裝· —訂 經濟部智慧財產局員工消货合作社印鉍 583479 A7 B7 經濟部智站財產局肖工消赀合作社印災. The ratio of the main liquid crystal. The resistance is 1.9 X 103 1 ohm · cm, and the N I point is 70.5 ° C. When adding 2, 5-dimethylaniline, it becomes 1.2 X 1 0 1 1 ohm · cm. The N I of this liquid crystal is almost the same as that of the liquid crystal before the addition, and is 70.lt. The size of this paper is applicable to China National Standard (CNS) A4 specification (2 丨 0: < 297 Gongchu) Please read the note on the back, and then ^^ this page) — Equipment · — Order Intellectual Property Bureau of the Ministry of Economic Affairs Employee Consumption Cooperative Co., Ltd. printed bismuth 583479 A7 B7 Ministry of Economic Affairs Zhizhan Property Bureau Xiao Gong Cooperative Cooperative Cooperative printed disaster

-44 - 583479 A7 五、發明説明(42) 施例9〕 除摻質係添 本發明有關之液晶顯示裝置的實施例 加 0 0 p p m之二鹽酸2, 5 ―乙氧基一 4 -嗎琳苯 胺外,與實施例1同。主體液晶之比電阻爲 1 · 9 X 1〇1 3歐姆·公分,N I點爲7 0 下述結構式之二鹽酸2, 5-二乙氧基-4一嗎啉苯胺後 成2 · 5χ 1011歐姆·公分。該液晶之NI點幾與添加 前之液晶同,爲7 0 . . 2 °C。-44-583479 A7 V. Description of the invention (42) Example 9] In addition to the dopant, the embodiment of the liquid crystal display device related to the present invention is added with 0 0 ppm of dihydrochloride 2, 5 -ethoxy-4 -morphine Except for aniline, it was the same as in Example 1. The specific resistance of the main liquid crystal is 1.9 × 10 3 ohm · cm, and the NI point is 70. Dihydrochloride 2,5-diethoxy-4 monomorpholine aniline with the following structural formula becomes 2 · 5χ 1011 Ohm cm. The NI point of this liquid crystal is the same as that of the liquid crystal before addition, which is 70 ° C. 2 ° C.

H3CH2COH3CH2CO

OCH2CH3 、ν'α 經濟部智^財產局肖工消費合作社印製 鹽酸2 , 5 —二乙氧基一 4 一嗎啉苯胺 本發明有關之實施例9的液晶顯示裝置之顯示品質加 以評估時可確認高品質之顯示,同時,幾無殘像不良的發 生可見。 本紙ft尺度適用中國國家標準(CNS ) Λ4规格(2丨0Χ297公龄) 583479 A7 五、發明説明(43) 〔實施例1〇〕 本發明有關之液晶顯示裝置的實施例10,除摻質是 添加9 0 0 p p. m之N — ( 2, 5 —二乙氧基—4 —硝基 苯基)嗎啉外與實施例1同。主體液晶之比電阻爲1 . 9 >< 1 0 1 3歐姆·公分,N I點爲7 0 . 5 t:。.添加下述結 構式之(2,5 乙氧基-4 -硝基苯基)嗎啉後成 8 · 9 X 1 0 1 〇 歐姆 液晶幾乎相同,爲7 ( 〇 公分。該液晶之N ‘ 2 °C。 點與添加前之 請 閲 讀 背 而 之 -注 :意 事 項 參 本 頁 h3ch2coOCH2CH3, ν'α Printed by the Ministry of Economic Affairs, Intellectual Property Bureau, Xiao Gong Consumer Cooperative, Hydrochloric acid 2, 5-diethoxy-4 monomorpholine aniline The display quality of the liquid crystal display device according to Example 9 of the present invention may be evaluated when A high-quality display was confirmed, and at the same time, few occurrences of afterimage defects were visible. The ft scale of this paper applies the Chinese National Standard (CNS) Λ4 specification (2 丨 0 × 297 males) 583479 A7 V. Description of the invention (43) [Example 10] Example 10 of the liquid crystal display device related to the present invention, except that the dopant is The same procedure as in Example 1 was performed except that 9-0 p p.m of N- (2,5-diethoxy-4-nitrophenyl) morpholine was added. The specific resistance of the main liquid crystal is 1.9 > < 103 1 ohm · cm, and the N I point is 70.5 t :. . Adding (2,5 ethoxy-4 -nitrophenyl) morpholine of the following structural formula to 8.9 X 1 0 1 0 ohm liquid crystal is almost the same, which is 7 (0 cm. N 'of the liquid crystal 2 ° C. Please read the back before points and additions-Note: Please refer to h3ch2co

OCH2CH3 經濟部智慧財產局8工消費合作社印製OCH2CH3 Printed by the 8th Industrial Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs

N 2 5 啉 馬 基 苯 基 2硝〇 - \N 4 I 基 氧 乙 質發 品之 示良 顯 不 之 像 置殘 裝無 示幾 顯時 晶同 液, 的示 ο 顯 1 之 例 質 施品 實高 之認 關確 有可 明。 發估。 本評見 以可 加生 本紙張尺度適用中國國家標準(CMS ) A4規格(210X297公犮) -46 - 公分,N I點爲7 0 583479 A7 B7 五、發明説明(44) 〔比較例1〕 本發明有關之液晶顯示裝置的比較例1,除摻質用2 一氰基一 3 -氟一 5 -(4 一正丙基—反一環己基)酚外 與實施例1同。主體液晶之比電阻爲1 . 9 X 1 0 1 3歐姆 C °添加1 〇〇〇p p nl之下 述結構式之2 _氰基—3 —氟—5 — ( 4 -正丙基一反一 環己基)酚後成3 . 3 X 1 0 1 1歐姆·公分。該液晶之 N I點與添加前之液晶幾乎相同,爲7 〇 . 4。(:。 請 先 間 讀 背 ιέ 之 、注 -意 事 項 參 本 頁N 2 5 phenanthrylphenyl 2 nitrate 〇- \ N 4 I based oxyethyl hair products showing good and bad appearance, leaving the equipment installed without showing a few times when the crystal is the same liquid, showing ο show 1 example of quality application The recognition of Gao is indeed clear. Make an estimate. In this review, the paper size applicable to the Chinese National Standard (CMS) A4 (210X297 cm) is -46-cm, and the NI point is 7 0 583479 A7 B7. 5. Description of the invention (44) [Comparative Example 1] Comparative Example 1 of the liquid crystal display device according to the present invention is the same as Example 1 except that the dopant is 2 -cyano-3 -fluoro-5-(4-n-propyl-trans-cyclohexyl) phenol. The specific resistance of the host liquid crystal is 1.9 X 1 0 1 3 ohm C ° 2 of the following structural formula added with 1 000 pp nl _cyano-3 -fluoro-5-(4 -n-propyl one trans one ring Hexyl) phenol becomes 3.3 X 1 0 1 1 ohm · cm. The N I point of the liquid crystal is almost the same as that of the liquid crystal before the addition, which is 70.4. (: Please read the back, note-note items on this page first

2 - 正丙基—反—環己基)酚 經濟部智慧財產局員工消骨合作社印一^ 本發明有關之比較例1的液晶顯示裝置之顯示品質加 以評估時可確認高品質之顯示,但有殘像不良發生。 〔比較例2〕 本發明有關之液晶顯示裝置的比較例2,除摻質係用 2 —氰基—3 -氟一 5 — (4 —正丙基—反—聯環己基) 酚以外,與實施例1同。主體液晶之比電阻爲 1 . 9 X 1 〇 1 3歐姆·公分,Ν I點爲7〇.5 °C。添加 本紙张尺度適用中國國家標隼(cNS ) A4规格(210X 297公犮) -47 - 583479 A7 ____ B7 _ 五、發明説明(45) 下述結構式之2 -氰基-3 -氟—5 - (4 —正丙基一反 —聯環己基)酚1〇〇p p m後,成5 . 5 X 1 0 1 2歐姆 •公分。該液晶之NI點幾乎與添加前之液晶相同,爲 7 〇· 3 °C 。2-N-propyl-trans-cyclohexyl) Phenol Cooperative of Employees, Intellectual Property Bureau, Ministry of Economics, Phenol Co., Ltd. ^ The high-quality display can be confirmed when the display quality of the liquid crystal display device of Comparative Example 1 related to the present invention is evaluated. Defective afterimages occur. [Comparative Example 2] Comparative Example 2 of the liquid crystal display device according to the present invention, except that the dopant system uses 2-cyano-3 -fluoro-5 (4-n-propyl-trans-bicyclohexyl) phenol, and Example 1 is the same. The specific resistance of the main liquid crystal is 1.9 X 103 ohm · cm, and the N I point is 70.5 ° C. The size of this paper is applicable to Chinese National Standard (CNS) A4 (210X 297 cm) -47-583479 A7 ____ B7 _ V. Description of the invention (45) 2 of the following structural formula -Cyano-3 -Fluoro-5 -(4-n-propyl-trans-bicyclohexyl) phenol at 1000 ppm was converted into 5.5 x 10 12 ohm • cm. The NI point of this liquid crystal is almost the same as that of the liquid crystal before the addition, which is 70.3 ° C.

c3h7 2 —氰基一 3 —氟一 5 -( 4 —正丙基—反—聯環己基)酚 本發明有關之比較例2的液晶顯示裝置的顯示品質加 以評估時,可確認高品質之顯示,但有殘像不良發生。 經濟部智Μ財產局肖工消費合作社印κ 第1 6圖示本發明其它實施例之像素的俯視圖。本實 施例中,像素電極P X及對向電極C T 1、C T 2係成鋸 齒狀排列。藉此,形成方向不同的再定向狀態之二區域( 分域),斜向之著色、色調反轉各予補償,可得更寬之視 角。 亦即,各電極於各走向呈鋸齒狀有多數個折屈部,以 其折屈部爲界一邊有相對於圖中縱方向R D R P的β之角 度,另一邊有180°— β之角度。 藉此,形成具不同於上述方向之二區域(分域),斜 向之著色、色調反轉各予補償,可得更寬之視角。 -4R - 本紙悵尺度述州中國國家標準(CNS ) Λ4规格(2ΙΟΧ 297公兗) 583479 A7 __ B7 ____ 五、發明説明(46) 縱方向R D R P示介電率各向異性爲正之液晶分子( Np液晶)之配向膜〇R I的初期定向方向,橫方向 R D R N示介電率各向異性爲負的液晶分子(Ν η液晶) 之配向膜〇R I的初期定向方向。本實施例之像素構造中 ,可用介電率各向異性爲正或負之任一種液晶分子。 而,第1 6圖的上述像素電極Ρ X及對向電極C Τ 1 、C Τ 2之間如同其它實施例,形成有閘極絕緣膜G I, 爲使電極間於各間旋轉液晶分子,產生有橫向電場。 閘極信號線G L、汲極信號線D L與其它實施例同。 從該汲極信號線D L起與閘極信號線G L重疊形成之電極 S D 2,與連接於像素電極Ρ X施加保持電壓之電極 S D 1之間配置有非晶質半導體層A S I,其發揮薄膜電 晶體T F T之機能。 而,薄膜電晶體丁 F T上設有保護膜P S V。保護膜 P S V主要係爲保護薄膜電晶體T F T免於受潮而形成, 係用透明性高且耐濕性良好者。 經濟部智总財產局肖工消贫合作社印製 保護膜P S V係由例如以等離子體C V D裝置形成之 氧化矽膜、氮化矽膜,或壓克力樹脂、聚酰亞胺等形成, 膜厚在0 . 1至3微米左右。 對向電壓信號線c L係與掃瞄信號線G L及對向電極 C T同一製造步驟形成,且構成可與對向電極作電連接。 經該對向電壓信號線C L,可由外部電路供給對向電壓 V c 〇 m於對向電極C 丁。 又,與影像信號線D L交叉之部份爲降低與影像信號 本紙張尺.度適用中國國家標準(CNS ) Λ料见格(2丨〇>: 297公棼) ·- 49 - 583479 ίκΊ Β7 五、發明説明(47) 線D L短路之槪率,係以二股細線,即使短路可藉雷射修 整分割者爲宜。 電極ST係以金屬膜(含金屬原子之層)形成,經通 孔ΤΗ 1連接至像素電極PX。又再,該電極S T須由外 部供給必要.電位,.無浮置電極的效果之故,於上述保護膜 PSV開設通孔TH1,連接於其它電極。 本實施例中,係將與像素電極P X —體成形之電極 ST,經上述保護膜PSV重疊於對向電極CT2上。 又,爲使像素電極P X即使通孔、電極S T於加工製 造上有變異也能保持接觸,於像素電極末端之與通孔 τ I-I 1接合之部份,與像素電極P X —體設置如第1 6圖 所示之大於像素電極P X的台座。 如此,本實施例即於保護膜P S V上形成電連接於像 素電極之電極S T。藉此,以像素電極P X及對向電極 c Τ 1、 C T 2與液晶之間終於形成的保護P S V或保護 膜P S V及絕緣膜G I爲介電體之電容器(保護膜電容器 ),經常有電極S T之充電,與電極S T具大致相等之直 流電位(交流時其直流成分係同電位)之電極即使在有異 物等漏出於液晶層時亦無充電電流之流通。 因此,漏出之電極附近亦不起電化學反應(電極反應 )。亦即,因於保護膜P S λΑ上形成電極S T,可抑制因 電極上之保護膜的缺陷所引起之往其它電極的保護膜電容 器之充電電流,可抑制點狀亮度不勻之發生。 本發明中特別設置有作爲陰極側之電極或配線之閘極 本紙张尺度適用中國國家標卑(CNS ) Λ4規.格(2丨ΟΧ297公漦) (請先閲讀背而之注意事項 ·寫 本頁) 經濟部智慧財產局貨工消費合作社印贤 583479 A7 B7 五、發明説明(48) 電極G T或掃瞄信號線G L。又再,將相對高於閘極電極 G T或掃瞄信號線G L之電位的電極或配線定義爲陽極側 之電極或配線,陽極側之電極或配線有源極電極S D 1、 汲極電極S D 2、影像信號線D L、像素電極P X、對向 電極CTl、 CT2,對向電壓信號線CL。 如上述,本實施例中,陽極側之電極或配線之一例的 電極S 丁係與像素電極P X電連接,而電極S T可連接於 陰極和陽極其一或二者所成之電極或配線。 又,第1 7、 1 8、 1 9圖係說明上述第1 6圖所說 明之像素的變化例之俯視圖。第1 7、 18、 1 9圖中, 像素電極P X及對向電極C T係各以透明電極(I T〇或 I Z〇)形成,且電極數、電極間隔、形成電極之層各有 不同。 這些圖有如第16圖,各電極群之各電極係形成爲各 走向有多數折屈部之鋸齒狀。以其折屈部爲界,一邊對影 像信號線D L方向有0之角度,另一邊有1 8 0 ° - Θ之 角度。 經濟部智慧財產局貞工消f合作社印製 藉此,可形成具不同於上述方向之再定向狀態的二區 域(分域),斜向著色、色調反轉各得補償,可得更寬之 視角。 第1 7圖係將像素電極與對向電極間之電場方向構成 與影像信號線D L交叉之方向。第1 7 A圖中,呈示像素 電極6個,對向電極C T於像素全區域形成滿佈狀之情形 本纸张尺度適用中國國家標導((:]^)八4規格(2丨0>< 297公犮) 583479 A7 B7 五、發明説明(49) 第1 7 A圖中,電極S T係與對向電極連接。黑矩陣 B Μ外延至圖中外側虛線,內延於圖中內側之虛線。 第1 7 Β圖則呈示像素電極6個,對向電極C 了與個 別設置之像素電極重疊,同時,其寬度係形成大於像素電 極之寬度的情況。與第1 7 Α圖比較,則電容元件 C s t g之電容可小至4 0 0法拉。 第1 8及1 9圖係將像素電極P X與對向電極C T間 之電場的方向構成沿影像信號線DL之方向。第18圖中 ,對向電極C T係幾乎形成於像素區域之全區。第1 8 A 及1 8 B圖中,電極寬度、電極個數、電極間隔係各不相 同。 具體言之,第18A圖之像素電極PX之寬度爲5微 米,而第1 8 B圖中像素電極之寬度係9微米。又,第 1 8 A圖中一像素內像素電極之個數爲3〇。 又,電極間隔在第1 8 A圖爲5微米,在第1 8 B圖 爲4微米。第1 8B圖相對於第1 8A圖其穿透率提高。 而,第1 8、 1 9圖均係像素電極之端部,在一像素內係 成S字形上下反轉。乃爲使像素電極與對向電極間之附加 電容器與掃瞄信號線G L方向一致之故。 第1 9 A圖中像素電極P X之寬度爲5微米,相鄰的 像素電極P X之間隔爲5微米,對向電極C T與個別設置 之像素電極重疊,同時,其寬度係形成爲大於像素電極 P X之寬度。 第1 9 B圖中,像素電極之寬度爲4微米,相鄰的像 本紙悵尺度適用中SS家標準(CNS )八4规格(21〇Χ 297公犮) (請先間讀背面之意事項!^^寫本¥o -裝 、v5 經濟部智慧財產局员工消費合作社印製 583479 A7 B7 五、發明説明(5〇) 素電極之間隔爲4微米,故開口率大於第1 9 A圖。而, 第19圖之像素構造係相對於第18圖之像素構造,附加 電容器可予減少。 藉以上各實施例,可提供不易產生殘像之I P S方式 的主動矩陣型液晶顯示裝置。 如以上說明,根據本發明可提供,以重疊有直流電壓 之液晶驅動電壓波形施加於液晶層時,其直流電壓去除後 液晶層中無直流電壓殘留,殘像受抑制之主動矩陣型液晶 顯示裝置。 經濟部智毯財產局肖工消赀合作社印製 本紙悵尺度適州中國國家標準(CNS ) Λ4规格(2丨OX297公釐) -53-c3h7 2 —Cyano-3—fluoro-5— (4-n-propyl-trans-bicyclohexyl) phenol When the display quality of the liquid crystal display device of Comparative Example 2 according to the present invention is evaluated, a high-quality display can be confirmed , But afterimage defects occur. Printed by Xiao Gong Consumer Cooperative, Intellectual Property Bureau of the Ministry of Economic Affairs, Chapter 16 illustrates a top view of a pixel in another embodiment of the present invention. In this embodiment, the pixel electrodes P X and the counter electrodes C T 1 and C T 2 are arranged in a zigzag pattern. Thereby, two areas (sub-domains) of the re-oriented state with different directions are formed. The oblique coloring and hue inversion are compensated respectively, and a wider viewing angle can be obtained. That is, each electrode has a plurality of flexures in a zigzag shape in each direction. With the flexures as a boundary, one side has an angle of β with respect to the longitudinal direction R D R P in the figure, and the other side has an angle of 180 °-β. As a result, a second area (subdomain) with a direction different from the above is formed, and the oblique coloring and hue inversion are compensated respectively, and a wider viewing angle can be obtained. -4R-This paper states the Chinese National Standard (CNS) of the paper, Λ4 specification (2ΙΟχ 297 cm) 583479 A7 __ B7 ____ 5. Description of the invention (46) RDRP in the vertical direction shows liquid crystal molecules with positive dielectric anisotropy (Np The orientation direction of the initial orientation of the alignment film ORI of the liquid crystal), and the transverse direction RDRN indicates the orientation direction of the initial orientation of the alignment film ORI of the liquid crystal molecules (N η liquid crystal) having a negative dielectric anisotropy. In the pixel structure of this embodiment, any one of liquid crystal molecules with a dielectric anisotropy of positive or negative can be used. In addition, as in the other embodiments, the pixel electrode P X and the counter electrodes C T 1 and C T 2 in FIG. 16 are formed with a gate insulating film GI. In order to rotate the liquid crystal molecules between the electrodes, There is a lateral electric field. The gate signal line G L and the drain signal line D L are the same as those of the other embodiments. An electrode SD 2 formed from the drain signal line DL and the gate signal line GL is overlapped, and an amorphous semiconductor layer ASI is disposed between the electrode SD 1 connected to the pixel electrode P X and a holding voltage applied thereto, which exerts thin film electricity. Function of crystal TFT. The thin film transistor D T is provided with a protective film P S V. The protective film P S V is mainly formed to protect the thin film transistor T F T from moisture, and is used for those with high transparency and good moisture resistance. The protective film PSV printed by Xiao Gong Anti-poverty Cooperative of the Ministry of Economic Affairs and Intellectual Property Bureau is formed of, for example, a silicon oxide film, a silicon nitride film, or an acrylic resin, polyimide, or the like formed by a plasma CVD device. Around 0.1 to 3 microns. The counter voltage signal line c L is formed in the same manufacturing step as the scanning signal line G L and the counter electrode C T, and is configured to be electrically connected to the counter electrode. Via the counter voltage signal line C L, a counter voltage V c 0 m can be supplied from the external circuit to the counter electrode C D. In addition, the part that intersects with the image signal line DL is to reduce the paper rule with the image signal. The degree applies to the Chinese National Standard (CNS). Λ material sees the grid (2 丨 〇 >: 297 gong) ·-49-583479 ίκΊ Β7 V. Description of the invention (47) The rate of short circuit of line DL is based on two thin wires, even if the short circuit can be divided by laser trimming. The electrode ST is formed of a metal film (a layer containing metal atoms), and is connected to the pixel electrode PX through the through hole T1. Furthermore, the electrode S T must be supplied with the necessary potential from the outside. Because of the effect of no floating electrode, a through hole TH1 is opened in the protective film PSV and connected to other electrodes. In this embodiment, the electrode ST formed integrally with the pixel electrode P X is superposed on the counter electrode CT2 via the protective film PSV. In addition, in order to keep the pixel electrode PX in contact with the through hole τ II 1 even if there are variations in the through hole and electrode ST in processing and manufacturing, the pixel electrode PX is integrally arranged with the pixel electrode PX as the first The pedestal shown in FIG. 6 is larger than the pixel electrode PX. Thus, in this embodiment, an electrode S T electrically connected to a pixel electrode is formed on the protective film PS V. Thereby, a capacitor (protective film capacitor) with a protective PSV or protective film PSV and an insulating film GI finally formed between the pixel electrode PX and the counter electrode c T1, CT 2 and the liquid crystal as a dielectric (protective film capacitor) often has an electrode ST For charging, an electrode having a DC potential substantially equal to that of the electrode ST (its DC component is the same potential in the case of AC), even when a foreign substance or the like leaks out of the liquid crystal layer, no charging current flows. Therefore, there is no electrochemical reaction (electrode reaction) near the leaked electrode. That is, since the electrode ST is formed on the protective film P S λA, the charging current to the protective film capacitors of other electrodes caused by the defect of the protective film on the electrode can be suppressed, and the occurrence of spot-shaped uneven brightness can be suppressed. In the present invention, a gate electrode as a cathode electrode or a wiring is specially provided. The paper size is applicable to Chinese National Standards (CNS) Λ4. Grid (2 丨 〇297297) (please read the precautions and write the book first) Page) Yinxian 583479 A7 B7, Goods and Consumers Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (48) Electrode GT or scanning signal line GL. Furthermore, an electrode or wiring that is relatively higher than the potential of the gate electrode GT or the scanning signal line GL is defined as the electrode or wiring on the anode side, and the electrode or wiring on the anode side is the source electrode SD 1 and the drain electrode SD 2 , The image signal line DL, the pixel electrode PX, the counter electrodes CT1, CT2, and the voltage signal line CL. As described above, in this embodiment, the electrode S1, which is an example of the electrode or wiring on the anode side, is electrically connected to the pixel electrode PX, and the electrode ST can be connected to the electrode or wiring formed by one or both of the cathode and the anode. Figs. 17, 18, and 19 are plan views illustrating a modification example of the pixels described in Fig. 16 described above. In Figs. 17, 18, and 19, the pixel electrode P X and the counter electrode C T are each formed of a transparent electrode (I T0 or I Z0), and the number of electrodes, the electrode interval, and the layer forming the electrode are different. These figures are like those in FIG. 16, and each electrode system of each electrode group is formed into a zigzag shape with a large number of bent portions in each direction. With its flexure as the boundary, one side has an angle of 0 to the direction of the image signal line D L and the other side has an angle of 180 °-Θ. Printed by the Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, this can form a two-region (sub-domain) with a reorientation state different from the above direction. The oblique coloring and hue reversal can each be compensated for a wider range. Perspective. Fig. 17 shows a direction in which the electric field direction between the pixel electrode and the counter electrode intersects the video signal line D L. In Figure 17A, there are 6 pixel electrodes, and the counter electrode CT forms a full cloth shape over the entire area of the pixel. This paper size applies the Chinese national standard ((:) ^) 8 4 specifications (2 丨 0 > & lt (297 mm) 583479 A7 B7 V. Description of the invention (49) In Figure 1A, the electrode ST is connected to the counter electrode. The black matrix B M is extended to the outer dashed line in the figure, and it is extended to the inner dashed line in the figure. Figure 17B shows 6 pixel electrodes, and the counter electrode C overlaps with the pixel electrode provided separately. At the same time, the width is larger than that of the pixel electrode. Compared with Figure 17A, the capacitance The capacitance of the element C stg can be as small as 400 Farads. Figures 18 and 19 show the direction of the electric field between the pixel electrode PX and the counter electrode CT along the direction of the image signal line DL. In Figure 18, the The counter electrode CT system is formed almost in the entire area of the pixel area. In Figs. 18A and 18B, the electrode width, the number of electrodes, and the electrode spacing are different. Specifically, the pixel electrode PX in Fig. 18A is different. The width is 5 microns, and the width of the pixel electrode in Figure 18B is 9 microns. Again, The number of pixel electrodes in one pixel in FIG. 18A is 30. The electrode interval is 5 micrometers in FIG. 18A and 4 micrometers in FIG. 18B. Compared to FIG. The transmittance of Figure 8A is improved. However, Figures 18 and 19 are the ends of the pixel electrodes, which are inverted in an S-shape in a pixel. It is an additional capacitor between the pixel electrode and the counter electrode. It is consistent with the direction of the scanning signal line GL. In Figure 19A, the width of the pixel electrode PX is 5 micrometers, and the interval between adjacent pixel electrodes PX is 5 micrometers. The counter electrode CT overlaps with the pixel electrode provided separately. At the same time, its width is formed to be larger than the width of the pixel electrode PX. In Fig. 19B, the width of the pixel electrode is 4 micrometers, and the size of the adjacent image paper is applicable to the SS home standard (CNS) standard 8 (21). Χ 297 犮) (Please read the notice on the back! ^^ Copy, v5, printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed 583479 A7 B7 V. Description of the invention (50) The interval between the element electrodes is 4 microns, so the aperture ratio is larger than that in Figure 19 A. However, the pixel structure in Figure 19 is The pixel structure of the figure can reduce the additional capacitors. With the above embodiments, an active matrix liquid crystal display device of the IPS mode that does not easily generate an afterimage can be provided. As explained above, according to the present invention, it is possible to provide a superimposed DC voltage When a liquid crystal driving voltage waveform is applied to a liquid crystal layer, after the DC voltage is removed, there is no DC voltage remaining in the liquid crystal layer, and an active matrix type liquid crystal display device in which an afterimage is suppressed. Standard Shizhou Chinese National Standard (CNS) Λ4 specification (2 丨 OX297 mm) -53-

Claims (1)

583479 公告本 ABCD 修正替換本 灸月ίΓ曰 申請專利範圍 1 . 一種主動矩陣型液晶顯示裝置,其特徵爲I 包括一對基板, 夾置於該一對基板之液晶層, 配置於該一對基板與液晶層之間的規定該液晶層之液 晶分子的定向方向之配向膜,及 施加電壓於該液晶層之像素電極與對向電極,而且其 中 · 上述液晶層之液晶分子具有負的誘電率異方性,同時 ,該液晶層中含具有解離基之摻質。 ’ 2 .如申請專利範圍第1項之主動矩陣型液晶顯示裝 置,其中上述像素電極或對向電極之至少任一電極,其電 極寬度在1至1 5微米,電極間隔爲1至1 0微米,且該 像素電極和對向電極之任一者係由透明電極構成。 _ 3 .如申請專利範圍第2項之主動矩陣型液晶顯示裝 置,其中上述透明電極含I Τ〇或I Ζ〇之任何一種。 4 .如申請專利範圍第1項之主動矩陣型液晶顯示裝 置,其中上述像素電極和對向電極係具有多數折屈部之鋸 齒狀。 5 .如申請專利範圍第4項之主動矩陣型液晶顯示裝 置,其中上述 形成矩陣狀之多數影像信號線及多數掃瞄信.號線的各 交叉部具備有薄膜電晶體, 該薄膜電晶體的個別形成之每一像素至少有一對上述 像素電極和對向電極,且係形成於與上述掃瞄信號線之延 本紙張尺度適用中國國家椋準(CNS ) Α4規格(210;< 297公釐) 請 先 閱 讀 背 ιέ 之 注 意 Ψ 項 乂再 頁 經濟部智慧財產局員工消費合作社印製 -54 - 583479 ABCD 、申請專利範圍 2 伸方向相同之方向。 6 .如申請專利範圍第1項之主動矩陣型液晶顯示裝 置,其中上述液晶組成物所含之上述摻質 僅於分子短軸方向具有解離基,同時,該分子短軸方 向之—*末端係院基或院氧基, 以1〇〇 p p m以上,1〇〇〇p p m以下之範圍含 於上述液晶層中。 7.如申請專利範圍第6項之主動矩陣型液晶顯示裝 置,其中上述摻質係下述結構之化合物 ’ (請先閱讀背面之注,意事項再瓦) R2—A2—583479 Announcement ABCD amends and replaces this month of moxibustion. Patent application scope 1. An active matrix liquid crystal display device, characterized in that I includes a pair of substrates, a liquid crystal layer sandwiched between the pair of substrates, and disposed on the pair of substrates An alignment film that defines the orientation direction of liquid crystal molecules of the liquid crystal layer and a liquid crystal layer, and a pixel electrode and a counter electrode that apply a voltage to the liquid crystal layer, and wherein the liquid crystal molecules of the liquid crystal layer have a negative induction difference At the same time, the liquid crystal layer contains a dopant having a dissociation group. '2. The active matrix liquid crystal display device according to item 1 of the patent application range, wherein at least one of the pixel electrode or the counter electrode has an electrode width of 1 to 15 micrometers and an electrode interval of 1 to 10 micrometers. And either of the pixel electrode and the counter electrode is made of a transparent electrode. _ 3. The active matrix liquid crystal display device according to item 2 of the scope of patent application, wherein the above-mentioned transparent electrode contains either I TO or I ZO. 4. The active matrix liquid crystal display device according to item 1 of the scope of patent application, wherein the pixel electrode and the counter electrode have a zigzag shape with a large number of flexures. 5. The active matrix liquid crystal display device according to item 4 of the scope of patent application, wherein most of the above-mentioned image signal lines and most scanning signals formed in a matrix form. Each intersection of the number lines is provided with a thin film transistor. Each pixel formed individually has at least one pair of the above-mentioned pixel electrode and a counter electrode, and is formed on the extension of the scanning signal line. The paper size is applicable to China National Standard (CNS) A4 specification (210; < 297 mm). ) Please read the note 乂 item 乂, and then the page printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs -54-583479 ABCD. The scope of patent application 2 extends in the same direction. 6. The active matrix liquid crystal display device according to item 1 of the scope of patent application, wherein the above-mentioned dopants contained in the liquid crystal composition have a dissociation group only in the short axis direction of the molecule, and at the same time, the-* terminal system The base or the oxygen group is contained in the liquid crystal layer in a range of 100 ppm or more and 1,000 ppm or less. 7. The active matrix liquid crystal display device according to item 6 of the scope of patent application, wherein the dopant is a compound of the following structure ′ (Please read the note on the back first, and then note the matter) R2—A2— X!——六厂心 、νό Y 1 : C Ο Ο Η . - C Ο Ν Η 2 . - Ν Η 2 . —Ν Η R、— Ν R 2 之任一種 Υ2:氫、F、 CN、 C〇〇H、 - C Ο N H —N H 2、一〇H之任一種 Y 3 :氫、F、 C N、 C 〇〇 H、 - C Ο N H —NH2、一〇H之任一種 Y 4 :氫、F、 C N、 C 〇〇 Η、 一 C 〇 N I-I —N H 2、一〇H之任一種 Xi: 單f建、一 C〇一〇一、一〇一C〇一、 表紙張尺度適用中國國家標準(CNS ) Α4現格(21 ΟΧ 297公釐) 〇Η 經濟部智慧財產局員工消費合作社印製 -55- 583479 ABCD 六、申請專利範圍 3 一 C 〇 C Η 2 —、 一 C. Η 2 — C 〇 一、一 C I-Ι 2 〇一、 —〇 C Η 2 —、 - C Η 2 - C Η 2 - . - C. Η 二 C. Η —之任 一種 鍵、一 c〇一〇一、一〇一c〇一、 一 C 〇 C Η 2 —、 一 C· Η 2 — C 〇 一、一 C Η 2 〇一、 —〇 C Η 2 -、— C Η 2 - C Η 2 —、— C· Η 二 C Η -之任 一種 Ai :單鍵、苯基、環己基之任一種 A 2 :單鍵、苯基、環己基之任一種 ‘ R i :烷基或烷氧基之任一種 R2 :烷基或烷氧基之任一種 8 .如申請專利範圍第6項之主動矩陣型液晶顯示裝 置,其中上述摻質係下述結構之化合物 (請先閱讀背面之注意事項.再本頁) 、τX! —— Liu Changxin, νό Y 1: C Ο Ο Η.-C Ο Ν Η 2.-Ν Η 2. —N Η R, — Ν R 2 Any of Υ2: hydrogen, F, CN, C 〇〇H,-C NH-NH 2, any one of Y3: hydrogen, F, CN, C 〇OH,-C NH-NH2, any of Y4: hydrogen, F, CN, C 〇〇Η,-C 〇N II-NH 2, 〇H any one of Xi: single f built,-C101, 101, 101, table paper size applicable to China Standard (CNS) Α4 is now available (21 〇 × 297 mm) 〇 印 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-55- 583479 ABCD VI. Application scope 3 1C 〇C Η 2 —, 1 C. Η 2 — C 〇1, —C I-Ι 2 〇1, —〇C Η 2 —,-C Η 2-C Η 2-.-C. Η 2 C. Η — any bond, a 〇〇〇 One, one, one, one, one, one, 〇C Η 2 —, one, C · Η 2 — C, one, one, C Η 2 〇1, —, 〇C-2-, — C Η 2-C Η 2 — , — C · Η two C Η-either Ai: single bond, phenyl, cyclohexyl A 2: Any one of single bond, phenyl, cyclohexyl 'R i: Any one of alkyl or alkoxy R 2: Any one of alkyl or alkoxy 8 Matrix type liquid crystal display device, in which the dopant is a compound of the following structure (please read the precautions on the back first, then this page), τ —闩1 經濟部智慧財產局員工消f合作社印製 丫 1 丫 2 Y 1 : C Ο Ο Η , - C Ο Ν Η 2 , - Ν Η 2 ,- 〇Η、 —Ν Η R、— Ν R 2 之任一種 Υ 2 :氫、F、 C Ν、 C 〇〇 Η、 一 C 〇 Ν Η、 —Ν Η 2、一〇Η之任一種 Χι:單鍵、一C〇一〇一、_〇一C〇一、 —C 〇 C H 2 _、 一 C H 2 — C.〇 一、一C. H 2 〇一、 本紙张尺度適用中國國家標準(CNS) Ad規格(2】ϋ:·< 297公釐) -56- 583479 ABJC3D ττ、申請專利範圍 4 —〇 C Η 2 —、 一 C Η 2 — C Η 2 —、 一 C H 二 C H —/任 一種 χ2:單鍵、一c〇一〇一、一〇一 c〇一、 一 C 〇 C Η 2 —、 一 C Η 2 — C 〇一、一C Η 2 〇 _一、 -〇 C Η 2 —、 - C Η 2 - C Η 2 - , — C. Η 二 C Η —之任 一種 A::單鍵、苯基、環己基之任一種 A 2 .早鍵、本基、環己基之任一種 R 1 :氫、烷基或烷氧基之任一種 · R 2 ·氣、纟兀基或院氧基之任一種。 9 · 一種主動矩陣型液晶顯示裝置,其特徵爲:· 包括一對基板, 夾置於該一對基板之液晶層, 規定配置於該一對基板與該液晶層之間的液晶分子之 定向方向的配向膜,及 施加電壓於該液晶層之像素電極和對向電極,並且其 中 經濟部智慧財產局員工消費合作社印製 上述液晶層之液晶分子具有正的介電率各向異性,同 時,該液晶層中含具有解離基之摻質。 1 0 ·如申請專利範圍第9項之主動矩陣型液晶顯示 裝直,其中上述像素電極和對向電極係具有多數折屈部之 鋸齒狀。 1 1 ·如申請專利範圍第1 〇項之主動矩陣型液晶顯 示裝置,其中 本紙張尺度通用中國國家標準(CNS ) Λ4規格(170x 297公瘦1 ~ --- -57 - 583479 ABCD 圍範利 專請 申 5 形成矩陣狀之多數影像信號線及多數掃瞄信號線之各 交叉部具備有上述薄膜電晶體, 個別形成於該父叉邰之每一像素形成至少一對上述之 像素電極和對向電極,且係形成於與上述影像信號之延伸 方向相同之方向。 12 ·如申請專利範圍第11項之主動矩陣型液晶顯 示裝置,其中上述像素電極和對向電極之任一含I T〇或 I Z〇之任何一種。 1 3 .如申請專利範圍第1或9項之主動矩陣型液晶 顯示裝置,其中包括 形成於上述一對‘基板之一基板的液晶側之上述掃瞄信 號線及上述對向電極,及施加對向電壓於該對向電極之對 向電壓信號線, 形成於該掃瞄信號線、該對向電極及該對向電壓信號· 線之上的聞極絕緣膜, 形成於該閘極絕緣膜上之上述像素電極,. 形成於該像素電極上之保護膜,及 形成於上述鈍化膜與上述液晶層之間的上述配向膜, 該液晶層之比電阻値在1 · Ο X 1 〇 9歐姆·公分以上 ,1 · Ο X 1 0 1 2歐姆·公分以下。 1 4 .如申請專利範園第1 3項之主動矩陣.型液晶顯 示裝置,其中包括 形成於上述一對基板之另一基板的液晶層側之彩色濾 光膜, 本紙张尺度適用中國國家標準(CNS ) Α4規格(21()Χ 297公资) 請 先 閱 讀 背 ιέ 之 、注 頁 經濟部智慧財產局員工消費合作社印製 -58 - 583479—Latch 1 Printed by the cooperative of employees of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 Cooperative Y 2 Y 1: C Ο Ο Η,-C Ο Ν Η 2,-Ν Η 2,-〇Η, —Ν Η R, — NR Any one of 2 Υ 2: hydrogen, F, C Ν, C 〇〇Η, -C 〇Ν —, -N Η 2,-〇 Χ Any one: single bond, -C〇101, _〇 -C〇1, -C 〇CH 2 _, -CH 2-C. 〇1, -C. H 2 〇1, This paper size applies the Chinese National Standard (CNS) Ad specifications (2) ϋ: · < 297 Mm) -56- 583479 ABJC3D ττ, patent application scope 4 — 0C Η 2 —, one C Η 2 — C Η 2 —, one CH two CH — / any kind of χ2: single bond, one c0101 〇 一一 〇〇 一, 一 C 〇C Η 2 —,-C Η 2 — C 〇 一,-C Η 2 〇_ 一, -〇C Η 2 —,-C Η 2-C Η 2-, — C. Η Di C Η — Any one of A :: Any one of single bond, phenyl, and cyclohexyl A 2. Any one of early bond, this group, and cyclohexyl R 1: hydrogen, alkyl, or alkoxy Either R 2, Qi, Carboxyl or Oxy. 9 · An active matrix liquid crystal display device, comprising: · A pair of substrates, a liquid crystal layer sandwiched between the pair of substrates, and an orientation direction of liquid crystal molecules arranged between the pair of substrates and the liquid crystal layer is specified The alignment film, the pixel electrode and the counter electrode that are applied with voltage to the liquid crystal layer, and the liquid crystal molecules printed on the liquid crystal layer by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs have positive dielectric anisotropy. At the same time, the The liquid crystal layer contains a dopant having a dissociation group. 10 · The active matrix liquid crystal display device of item 9 of the scope of patent application, in which the above-mentioned pixel electrode and the counter electrode have a zigzag shape with a large number of bending portions. 1 1 · As for the active matrix liquid crystal display device with the scope of patent application No. 10, the paper size is in accordance with the Chinese National Standard (CNS) Λ4 specification (170x 297 male thin 1 ~ --- -57-583479 ABCD) It is specifically requested that each of the plurality of image signal lines and the plurality of scanning signal lines forming a matrix be provided with the above-mentioned thin film transistors, and each pixel individually formed on the parent fork forms at least one pair of the above-mentioned pixel electrodes and pairs. The electrode is formed in the same direction as the extending direction of the above-mentioned image signal. 12 · The active matrix liquid crystal display device of item 11 in the scope of patent application, wherein either of the pixel electrode and the counter electrode contains IT0 or Any one of IZ〇. 1 3. The active matrix type liquid crystal display device according to item 1 or 9 of the patent application scope, which includes the scanning signal line and the pair of the above-mentioned scanning signal lines formed on the liquid crystal side of one of the substrates. A counter electrode and a counter voltage signal line for applying a counter voltage to the counter electrode are formed on the scanning signal line, the counter electrode, and the counter voltage signal · An above-the-line odor insulating film, the pixel electrode formed on the gate insulating film, a protective film formed on the pixel electrode, and the alignment film formed between the passivation film and the liquid crystal layer, The specific resistance of the liquid crystal layer is more than 1 · 0 X 1 0 9 ohm · cm, and 1 · 0 X 1 0 12 2 ohm · cm or less. 1 4. Such as the active matrix of the patent application park Item 13 A liquid crystal display device, which includes a color filter formed on the liquid crystal layer side of the other substrate of the above pair of substrates. This paper size applies to Chinese National Standard (CNS) A4 specifications (21 () × 297 public funds) Please read first Back, printed page Printed by Employee Consumption Cooperative of Intellectual Property Bureau, Ministry of Economy -58-583479 ABCD 6 圍範利 專請 中 該彩色濾光膜上形成矩陣狀之黑矩陣,及 形成於該黑矩陣上之頂塗膜, 該頂塗膜與上述液晶層之間形成有上述配向膜。 1 5 ·如申請專利範圍第1 3項之主動矩陣型液晶顯 不裝置,其中上述鈍化膜係〇 · 1微米以上,1微米以下 膜厚之氧化矽膜或氮化矽膜之無機膜,或2微米以上,3 微米以下之聚酰亞胺所成之有機膜。 1 6 ·如申5¾專利範圍第1或9項之主動矩陣型液晶 顯示裝置,其中上述配向膜之膜厚在2 0奈米至3 0· 0奈 米。 1 7 ·如申請專利範園第1 6項之主動矩陣型液晶顯 示裝置,其中上述配向膜係以聚酰亞胺爲主要成分。 ;L 8 .如申請專利範圍第1 5項之主動矩陣型液晶顯 示裝置,其中上述鈍化膜與上述配向膜之間形成有與上述. 像素電極、上述對向電極、上述掃瞄信號線、上述影像信 號線或上述對向電壓信號線之任一電連接的電禪。 1 9 ·如申請專利範圍第1 8項之主動矩陣型液晶顯 示裝置,其中使上述電極經通孔與上述像素電極、上述對 向電極、上述掃瞄信號線、上述影像信號線或上述對向電 壓信號線之任一電連接。 2〇· 一種液晶組成物質,其特徵爲:‘ 於介電率各向異性爲負之液晶組成物質,以1 ◦〇 P p m以上1〇0 0 P P m以下之範圍添加 僅於分子短軸方向具有解離基, 本紙張H適用中國國家標準(CNS ) A4規格(210X297^ ) -- -59 - (請先閱讀背面之技音孝項再一?寫本頁) .裝ABCD 6 Wai Fanli specially invited to form a matrix black matrix on the color filter film, and a top coating film formed on the black matrix, and the alignment film is formed between the top coating film and the liquid crystal layer. 1 5 · If the active matrix type liquid crystal display device of item 13 of the patent application scope, wherein the passivation film is an inorganic film of silicon oxide film or silicon nitride film with a thickness of 1 micrometer or more and 1 micrometer or less, or Organic film made of polyimide above 2 microns and below 3 microns. 16. The active matrix liquid crystal display device of item 1 or 9 of the patent application No. 5¾, wherein the film thickness of the alignment film is 20 nm to 30 · 0 nm. 17 • The active matrix liquid crystal display device according to item 16 of the patent application park, wherein the alignment film is made of polyimide as a main component. L 8. The active matrix type liquid crystal display device according to item 15 of the patent application range, wherein the passivation film and the alignment film are formed between the pixel electrode, the counter electrode, the scanning signal line, and the above. An electric signal line connected to any of the video signal line or the above-mentioned opposing voltage signal line. 19 · The active matrix liquid crystal display device according to item 18 of the scope of patent application, wherein the electrode is connected to the pixel electrode, the counter electrode, the scanning signal line, the image signal line, or the opposite through a through hole. Any electrical connection of the voltage signal line. 2〇 · A liquid crystal composition material, characterized in that: 'For a liquid crystal composition material having a negative dielectric anisotropy, it is added in the range of 1 ◦ ○ P pm to 1 0 0 PP m only in the direction of the short axis of the molecule. With a dissociation base, this paper H applies the Chinese National Standard (CNS) A4 specification (210X297 ^)--59-(Please read the technical sounds on the back and write another one? Write this page). 經濟部智慧財產局員工消費合作社印製 583479 ABCD 、申請專利範圍7 該分子短軸方向之二末端爲烷基或烷氧基之摻質。 2 1 .如申請專利範圍第2 0項之液晶組成物質,其 中上述摻質係下述結構之化合物,Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 583479 ABCD, patent application scope 7 The two ends of the molecule in the minor axis direction are doped with alkyl or alkoxy. 2 1. If the liquid crystal composition material of the scope of patent application No. 20, wherein the dopant is a compound of the following structure, A —R2 Y i : C 〇〇 Η、 一 C 〇 Ν Η 2、 一 Ν Ι-Ι 2、 一 〇 Η、 —Ν Η R、— Ν R 2 之任一種 Υ2:氫、F、 CN、 C〇〇H、 一C〇NH、 —N H 2、一〇H之任一種 Y3:氫、F、 CN、 C〇〇H、 一C〇NH、 —N H 2、一〇H之任一種 Y 4 ··氫、F、 C Ν、 C 〇〇 Η、 一 C 〇 Ν Η、 —Ν Η 2、一〇H之任一種 Χι :單鍵、一C〇一〇一、一〇一C〇一、 —C 0 C Η 2 — . 一 CH2 — C〇 一、—C Η 2 Ο — > —〇 C Η 2 —、 一 C Η 2 — C Η 2 —、 一 C Η = C Η —之任 一種 Χ2 :單鍵、一C〇一〇一、一〇一C〇一、 一 C0CH2 — 、 — C· Η 2 — C 0 — . — C Η 2 0 —, —〇 C I-I 2 —、 一 C Η 2 — C H 2 —、 一 C H = C H -之任 本紙张尺度適用中國國家標準(CNS ) Α4現格(210Χ297公釐) 請 先 閱 讀 背 ιέ 之 注 % 事 項A —R2 Y i: Any one of C 〇〇Η,-C 〇ΝΗ 2,-Ν Ι−Ι2, 〇Η, —Ν Η R, — Ν R 2 Υ2: hydrogen, F, CN, C 〇〇H, -CONH, -NH2, any of Y0H3: hydrogen, F, CN, COOH, -CONH, -NH2, any of Y0 · -Hydrogen, F, C N, C 〇〇Η, -C 〇Ν Η, -N Η 2, any one of 〇H: single bond, -C101, -101,- C 0 C Η 2 —. One CH2 — C〇1, —C Η 2 Ο — > —〇C Η 2 —, One C Η 2 — C Η 2 —, One C Η = C Η — Any of χ2 : Single bond, one C101, one 101C01, one C0CH2 —, — C · Η 2 — C 0 —. — C Η 2 0 —, —〇C II 2 —, one C Η 2 — CH 2 —, 1 CH = CH-Any of the paper sizes are applicable to the Chinese National Standard (CNS) A4 (210 × 297 mm). Please read the note below for% items 旁 經濟部智慧財產局員工消背合作社印製 -60- 583479 A8 B8 C8 D8 、申請專利範圍8 一種 Α ι . σ 口 • Ji[iL 鍵、苯 基、環 己基 之 任 一種 A 2 •単 鍵、苯 基、壌 己基 之 任 —·種 R ι :烷 基或烷 氧基之 任一 種 R 2 :烷 基或烷 氧基之 任一 種 〇 2 2 如申請專利範 圍第 2 〇 項之 中上述摻質係下述結構之化合物, R2—A2Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs of the People's Republic of China, -60-583479 A8 B8 C8 D8, patent application range 8 A ι. Σ Mouth • Ji [iL bond, phenyl, cyclohexyl any of A 2 • 単 bond Any of phenyl, hexahexyl— · R ι: Any one of alkyl or alkoxy R 2: Any one of alkyl or alkoxy 〇 2 2 As mentioned above in item 20 of the scope of patent application Compounds of the following structure, R2-A2 X—A—R, 丫 1 經濟部智慧財產局員工消費合作社印製 丫 2 Υ ι : C〇〇H、 一 C〇NH2、 - N H 2 , 一 〇H、 —N H R、— N R 2 之任一種 Y2:氫、F、 CN、 COO H, - CON Η, 一 N Η 2、一〇H之任一種 Χι :單鍵、一C〇一〇一、一〇一 C〇一、 一 C〇CH2 —、 - C· Η 2 - C 0 - , 一 CH2〇一、 —〇 C Η 2 —、 一 C. Η 2 — C Η 2 —、 一 C Η = C Η —之任 一種 Χ‘2··單鍵、一c〇一〇一、一〇一c〇一、. 一 C 〇 C H 2 — 、 一 C H 2 — C 〇 一、一 C H 2 〇一、 —〇 C H 2 —、 一 C H 2 — C. H 2 —、 一 C H 二 C H —之任 一種 本紙張尺度通用中國國家梂準(CNS ) A4坭格(2lOX;297公釐) -61 - 583479 ABCD 六、申請專利範圍9 Αι :單鍵、苯基、環己基之任一種 A2:單鍵、苯基、環己基之任一種 R i :氫、院基或院氧基之任一種 R2:氫、烷基或烷氧基之任一種。 2 3 .如申請專利範圍第2 0項之液晶組成物質,其 中上述液晶組成物質具有二氟苯結構、二氰基苯結構或單 氰基環己烷結構之任一種。 2 4 .如申請專利範圍第1 3項之主動矩陣型液晶顯 示裝置,其中上述鈍化膜係0 . 1微米以上,4微米以下 (請先閱讀背面之注意事項再θ本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) Λ4規格(2HJX 297公釐) -62 -X—A—R, y1 Printed by y2, employee cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs: 〇〇H, 〇NH2,-NH 2, 〇H, -NHR,-NR 2 Y2: hydrogen, F, CN, COO H, -CON Η, -N Η 2, -10H: single bond, -CO101, -101, CO1-, -COCH2- , -C · Η 2-C 0-, -CH2〇 一, -〇C Η 2-, -C. Η 2--C Η 2 —, -C Η = C Η — Any of X'2 ·· Single Bond, one c101, 101 one c01, .one C 〇CH 2 —, one CH 2 — C one, one CH 2 001, —0 CH 2 —, one CH 2 — C. Any of H 2 —, one CH and two CH — This paper size is in accordance with China National Standards (CNS) A4 grid (2lOX; 297 mm) -61-583479 ABCD VI. Patent application scope 9 Αι: single bond, benzene A2: a single bond, a cyclohexyl group, a single bond, a phenyl group, or a cyclohexyl group; R i: a hydrogen group, a ceryl group, or a ceryl group; R2: a hydrogen group, an alkyl group, or an alkoxy group. 2 3. The liquid crystal composition material according to claim 20 of the application scope, wherein the liquid crystal composition material has any one of a difluorobenzene structure, a dicyanobenzene structure, or a monocyanocyclohexane structure. 2 4. The active matrix liquid crystal display device according to item 13 of the patent application scope, in which the above passivation film is 0.1 micrometer or more and 4 micrometers or less (please read the precautions on the back first and then θ page). The paper size printed by the Bureau ’s Consumer Cooperatives applies the Chinese National Standard (CNS) Λ4 specification (2HJX 297 mm) -62-
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