TW539843B - Thermal treatment unit with removing capability of particles generated by filter - Google Patents

Abstract

A clean oven as a thermal treatment unit with removing capability of particles generated by a filter has a fan 4, the filter 3, a heat treating room 6 and a heater 9 according to an air circulating pass 5 as a general construction, and an air extracting hole provided at a clearance part produced between an inlet and outlet frames 1 and 7. an outside of a filter casing 31. and the oven casing. The particles generated by a packing 2 of the filter are sucked and discharged by the fan 4 and catched by the filter 3 preventing to be carried into the heat treating room 6.

Description

539843 V. Description of the invention ([Technical Field] The present invention relates to a type of photo-treatment of heat treatment, which is constructed to provide a gas circulation for heat treatment with a sealing member as a medium structure on the surname member--and 1. The person who passes the gas through the aforementioned filter and enters the heat treatment room after passing through the filter, especially as a kind of semi-conductive products such as W glass substrates used for high temperature: heat treatment under purified environmental conditions. The heat treatment is used to reduce the use of heat treatment. [Knowledge technology] The quality of semiconductor products such as liquid crystal glass substrates must be minimized due to the need to minimize the generation of micro-response & ^, ^ pressed particles. At that time, it was constructed such that a high-performance filter called a HEPA filter was passed through a constant-temperature tank called a dust-free oven, and the circulating air for heat treatment was supplied to the heat treatment chamber. As a result, as in the eighth As shown in the form of Fig. 1, in the conventional processing device, the heat treatment temperature usually reaches 300 C, and the heat treatment temperature is from a preheating temperature of about 100 ° to a temperature of about 300 ° C. 3001 during heating operation (Ti) and after heating up: The number of dust particles in fixed temperature operation (Ding 2) is limited to 100 or less, and the required cleanliness is met. The above 100 refers to the heat treatment room The number of particles in the volume of lcf (ft3K about 28 liters) is more than 0.5 μm. [Questions to be solved by the invention] However, recently, electronic parts production lines and dust-free ovens for testing and research For those who have produced a heat treatment temperature of up to 500 ° C, the paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297). 4 (Please read the precautions on the back before filling this page)

539843 A7 B7 V. Description of the invention (2 Solution: The dust-free oven is gradually unable to meet the cleanliness of the heat treatment room. That is, in order to shorten the process time with such a dust-free oven, the speed when the temperature rises is known 4 ~ 5t / min is increased to 8 ~ 10 which is twice of that. Since the heat treatment temperature itself is high temperature and the heating rate is also increased, as shown in the conventional dustless oven diagram in Figure 6, we can know that The temperature rises and rises too much privately 'At the position of the gasket 2 between the surrounding frame 31 of the transitional device 3 of the south performance and the entrance frame 1 of the dust-free oven, the thermal deformation of the two frames is different, and 2 As shown in the figure, the shearing force τ in the width direction and length direction (in the figure is the direction of the vertical paper surface) of the compression force will change the external force, resulting in compressive stress, shear stress and the accompanying forces. Deformation causes the pads, especially adhesives, to adhere to the glass fiber and other dust, and as shown by the arrow symbol A, the dust particles are brought into the heat treatment chamber 6 so that the total number of particles exceeds the target value. According to the inventor The experiment shows that, as shown in Figure 7, The temperature is 4HTC, and the sample air collected from the central part of the heat treatment room is heated up and the number of dust particles produced by the IV service is kept. The particle size is 0.3 and more than 100, which cannot be expected to be clean. Here, the present invention aims to provide a heat treatment device, that is, to solve the above-mentioned problems of the known technology, reduce the dust brought into the heat treatment room, and maintain the cleanliness of the heat treatment room in a good state. [Disclosure of the invention] In order to solve the above-mentioned problems, the present invention is constructed according to the first aspect of the invention; a heat treatment device for filtering a structural member with a sealing member as an intermediary filter and using a blower and a gas for heat treatment This particle is circulated (please read the precautions on the back before filling this page) This paper is suitable for the standard _ home standard A4 specifications (21 [297 / JJ7 539843 V. Description of the invention Second, the gas passes through the aforementioned filter and then enters For the heat treatment room, including: Yes .: The partition member is a mechanism in which the aforementioned heat treatment room will contain the gap gas formed by the aforementioned part of the gap formed on the side of the aforementioned heat treatment room. Those who get out the gas in the gap part, the second aspect of the invention is based on the above-mentioned aspect, the mechanism for sucking the gap gas is a mechanism for introducing the gap gas eight # ... The gas is introduced into the aforementioned circulation path. The third aspect of the invention is added to the above aspect, and the introduction gap reading mechanism can guide the gas to the suction side of the fan in the aforementioned circulation path. 刖 'L [Implementation Mode of the Invention] FIG. 1 shows a configuration example of a dust-free phase as a heat treatment device to which the present invention is applied. The dust-free oven 100 is constructed as follows, that is, in an inlet frame as a structural member 1. The filter 2 is used as the intermediary of the gasket 2 of the sealing member, and the gas is passed through the filter 3 through the circulation path with the blower 4 and the gas for heat treatment is passed into the heat treatment chamber 6. 7 and the mechanism for taking out the interstitial gas as the exhaust port 8 of the interstitial gas introduction mechanism. The heat treatment chamber 6 and the circulation path 5 are surrounded by a casing 101 forming the inner wall surface of the dead wall, and the circulation path 5 is provided with a heater 9 for rhyme processing. In addition, the dust-free oven of this example is used for high temperature, and the temperature can be raised to 500. 〇 者. There is also a cooler 1 for internal quenching (can be switched by throttling, not shown). The gas that is heated for heat treatment and circulating is corresponding to nitrogen condensed air. The paper size applies the Chinese National Standard (CNS) A4 specification ( 210X297 mm) flow. <Inside the object and heat treatment temperature, air and inert gas are used. The surrounding area is surrounded by the surrounding frame 31. The circulating gas does not pass through as indicated by the arrow. Except for the basin, it is sandwiched with the corresponding surroundings: frame 7, system The structure is as follows: == the gap portion 71 formed on the U-to-6 side is between the seal heat treatment chamber 6 and the portion of the circulating material on the inlet side = a gap portion is also generated on the heat treatment chamber 6 side, but, in this example, The gap gas content 7 is the entrance directly contacting this by the pad 2 ': = around, dust-free oven i. . The case two eight go ~ part around. The exit frame 7 is surrounded by a cutter. Although the state between the ㈣ portion and the heat treatment chamber 6 is in a state, the conduction portion becomes narrow. Further, the partition member need not be provided at the position of the exit ship shown in Fig. 1 'as long as it is a partition member including the approximate pad 2 and the member may be partitioned into a narrower member. Suction port 8, is the lead-in part of the interstitial gas take-out mechanism that can take out the gas in the interstitial part 71. In this example, after taking out the interstitial part of the gas, it is introduced into the circulation path 5 by the suction side of the blower 4. That is, in the dust-free oven ⑽ of this example, a part of the gap portion 71 is formed on the side of the partition m ', and this part faces the 吸入 where the blower 4 is sucked in. Therefore, when the clearance gas extraction and introduction mechanism is made as the simplest structure, It is a pump 539843 A7 formed by the opening alone _____B7 V. Description of the invention (5) ^ ~ ~ Gas port 8. (Please read the precautions on the back before filling in this page.) In order to adjust the size of this part, you can also set up a skateboard 81 with compaction function as indicated by double dashed lines. In such a configuration, the amount of the return gas to the suction side of the blower can be adjusted, and the dust particles generated by the liner 2 can be sucked in at a corresponding ratio with the smallest amount of gas. The above-mentioned dust-free oven 100 is operated as follows to exert its effect. In the heat treatment chamber 6, as shown by double dashed lines in the figure, a plurality of objects to be heat treated, that is, a substrate W made of a liquid crystal glass substrate or the like, is placed in an S box 200 having a frame structure, and then placed therein. Next, the blower 4 and the heater 9 are operated to circulate a gas such as adjusted air or a concentrated nitrogen-concentrated gas, and the circulation path control 5 passes through the filter 3 and passes through the heat treatment chamber 6. When the heat treatment is completed, the operation of the heater 9 is stopped and the cooler is operated. Φ The temperature in the thermal treatment chamber 6 in operation is usually controlled by a program. That is, as shown in FIG. 2 and FIG. 7, the operation is performed before the appropriate raising and lowering temperatures and temperature maintaining time are reached to reach 10 (about rc), and thus up to 400 C. Heat treatment temperature is increased, substrate W is heated to the heat treatment temperature after the temperature increase, and cooling is performed to a temperature of less than 20 ° C. After the heating gas is circulated in this way, a heat treatment device is configured when the temperature is increased and decreased. Each machine and component is different in shape and size, heat capacity and air condition, so the state of temperature change is also variable. Moreover, due to the selection of other components, suitable materials made of stainless-based materials are suitable. The material of each trowel is also quite different due to its different thermal expansion coefficient. This paper is applicable to China 539843 A7 B7

Fifth, the description of the invention (ό) &quot; &quot; B The degree is different, so the amount of deformation is different, and relative displacement occurs in each part. As a result, the 'part of the cushion 2' causes uneven deformation even between the inlet frame 1 and the peripheral frame 31 of the shutter 3 which are in contact with it. As described above, there is compressive force and shear on the cushion 2 The force application 'generates stresses and deformations corresponding to them', and its fine components are formed into dust particles by the pad 2 and scattered. At this time, in the device of this example, the air inlet 8 is provided for the gap portion 71, so the gas generated in the gap portion 71 is often heat-treated = 6 and flows to the suction side of the air flow path of the fan 5 of the circulation path. When there are dust particles, 'they pass out of the gap portion 71 through the exhaust port 8 by the gas flow, and are sent out by the blower 4', they pass through the filter 3 again. As a result, dust particles are captured by the transition device. And—without causing the gas to be discharged from the gap portion 71 to the heat treatment chamber side. —The second graph shows the results of measuring the dust particle generation state by performing the operation test of the dustless oven 100 as described above. The dust-free oven used in this test is the one with the following specifications. Substrate processing method; batch processing capacity; 20 pieces / 1 time

Maximum heat treatment temperature; 500 ° C

Heater output; 54.6W filter type; heat-resistant special filter pad material; size of inorganic fiber exhaust port 8; diameter 801Ήΐη X 4 dustless ovens, except for the point with exhaust port 8 and the first The results shown in Figure 7 are the same. According to the measurement results in Figures 2 and 7, in the normal structure without the suction port 8, dust particles with a particle size of 0.3 m or more are applicable to the national paper standard (CNS) A4 in the paper size standard ( 2K) &gt; &lt; 297 mm) 9 (Please read the precautions on the back before filling out this page) Order | 539843 A7 B7 V. Description of the invention (7 Wen Shifan and the temperature during cooling are significantly more than the average per lcf5 (H @ ， The particle size above 0.5〆m is also close to 50. Furthermore, there is a considerable number of particles above 10 / zm. In the device provided with the suction port 8 of this example of the present invention, even if it has The number of particles having a particle size of 0.3 "or more is also 50 or less, and the number of particles as a whole is reduced to one-half or less of the case of Fig. 7. Here, Fig. 2 and Fig. 7 In the operation shown in the figure, the cooling rate when the cooler 11 is used for rapid cooling without introducing the heating rate and outside air is about 8 (t / min, the conventional heating temperature shown in Figure 8 is about 6t: / Min 1.3 times or more, the condition that a large amount of dust particles are formed, but in the device of this example, As described above, the number of particles in the test chamber can be made to a relatively low value. Therefore, according to the device of FIG. 丨 applying the present invention, with a very simple structure, even a dust-free oven with a faster temperature rise and fall rate, It can reduce the amount of dust particles that can be brought into the heat treatment chamber 6, and maintain its cleanliness in a good state. Moreover, at ordinary heat treatment temperatures, it can reduce its cleanliness to a lower level with excess space. In the gap portion 71, the gap between the surrounding frame 31 and the outlet frame of the filter 3 is reduced. Therefore, although a so-called large-sized suction port 8 is provided, the flow rate of gas passing through it is only Approximately 2 to 4, such as ^ 4, is a very small amount of about 3 to 5% that is placed in% empty milk. Therefore, even if such a gas return system is set, it will not affect the dust-free oven. Figure 3 shows that it is not applicable Another form of the dust-free oven of the present invention. Compared with the form of FIG. 丨, the roasting of this example is different in that the blower 4 is arranged upstream of the position of the exhaust port 8 and the exhaust air is π 8 to the suction side. Guide to paper size (⑽μ secret ⑽

: 者 官 82. Even in this example, the same effect as that of the first figure can be obtained. Fig. 4 shows another aspect to which the present invention is applied. In this example, since the blower 4 leaves the suction port ^ shown in Figs. 1 and 3, the gas trapped in the gap 4 minutes 71 is difficult to return to the suction side of the fan 4 in the circulation path 5, so the upper casing The UH is provided with an air exhaust port 8 and a fan 84, so that the gas in the gap portion 71 is returned to the upstream side of the circulation. In this example, although the return blower 84 has: However, it is only necessary to have a small capacity, so the impact on the cost of the power consumption device is slight. Fig. 5 shows another example to which the present invention is applied. In this example, instead of returning the gas in the gap portion 71 to the circulation path 5 'again, the same upper device as in the device of Fig. 4 is used to guide the exhaust and the exhaust officer 12'. Make a dust-free oven or call from now on: release the officer and release it to the outside atmosphere. In addition, although a certain degree of positive pressure is usually formed in the heat treatment chamber 6, although the gas does not flow in from the outside, for more complete exhaust, an exhaust fan 13 may be provided as shown by a two-dot chain line in FIG. Similarly, the exhaust blower can also be a small-capacity one. The device according to this example is constructed to take in a volume that is equal to the amount released, as a circulating gas. Although it is a small amount, heat loss is still generated. However, for heat-treated objects such as liquid crystal glass substrates, the concentration of the sublimated body produced by the photoresist used in order to form a circuit on the base core or various solvents and the like must be changed frequently. Device, you can also use the exhaust gas from the exhaust port as part of the ventilation gas so that the 8 and the intersection of gas and gas (please read the precautions on the back before filling this page)

Order I This paper size is suitable for financial relations _ quasi (⑽⑽X297 公 幻 [Effect of the invention]: The present invention 'in the crepe-like invention, it is constructed as a structural member connected to a heat treatment device with a sealing member as a filter' Those who have a blower and let the heat treatment gas: the circulation path of the clothes pass through the passer and enter the heat treatment chamber. Among them, there are 3 &amp; sealing members and the gap generated on the heat treatment chamber side is separated by the heat treatment chamber. The open partition member can prevent free conduction of gas between the gap portion and the heat treatment chamber. Furthermore, since a gap gas-removal mechanism can be used to remove the gas in the gap portion, a small amount of gas can be obtained by this While entering the heat treatment chamber separated by the gap part by the partition structure, the gas in the gap part is taken out. That is, the gap part can be ventilated. In addition, since the gap part contains a sealing member, the heat treatment is performed. Clothing placement-running, after the operating state becomes the heating process or the cooling process, the structural components of the heat treatment and the structural materials of the converter are deformed, Various stresses and deformations are generated on the sealing member, so that dust particles of dust components are generated by the sealing member, and they enter the part. At this time, as described above, because the gap can be ventilated, the ventilation can be used to remove such dust. The granules are partially excluded from the gap. As a result, the cleanliness in the heat treatment chamber can be kept in a good state.: And 'Semiconductor products requiring a dust-free environment can be subjected to good heat treatment in an environment of allowable cleanliness. Since the gas is conducted, the gas can be passed again in the second aspect of the invention, and the gap gas is introduced into the gap gas introduction mechanism of the circulation path 539843

Description of the invention (10 Filtration, and then enter the heat treatment chamber. Replicated in a ,, eight ,,, etc., the filter can capture the dust particles from the lining. Moreover, the heat treatment chamber can be maintained to the path: the road μ Because the gas taken out from the gap is recovered, there is no heat loss, and it is not necessary to supply gas /, ',, and fruit' will not affect the thermal efficiency of the processing department Zhanle 4 ancient ... The structure can handle the dust particles generated by the gasket. In the third aspect of the invention, the above-mentioned gap gas introduction mechanism is made by u u so that the gas can be guided into the circulation path by the blower suction side, so The gas in the gap part can be returned to the circulation path by the suction force of the blower. As a result, the above-mentioned effect can be constructed, as long as a conduction port is provided in the gap part for conducting with the suction side of the blower, or it is provided for conducting An extremely simple constructor. [Simplified description of the drawing] Fig. 1 is an explanatory diagram showing an overall configuration example of a dust-free oven to which the heat treatment device of the present invention is applied. Fig. 2 is a diagram showing The following is an explanatory diagram of the measurement results of dust particles during the operation of the dust-free oven. ° Fig. 3 is an explanatory diagram showing another example of the overall structure of the above-mentioned dust-free oven. Fig. 4 is another example of the overall structure of the above-mentioned dust-free oven. Fig. 5 is an explanatory diagram showing another example of the entire structure of the above-mentioned dust-free oven. Fig. 6 is a diagram showing the entire structure example of a conventional high-temperature dust-free oven. The paper size is applicable to the Chinese National Standard (CNS) A4 specifications (210X297 male 13 (Please read the precautions on the back before filling this page)

539843 A7 B7 5. Explanation of the invention (Η) Illustrative drawing. Fig. 7 is an explanatory diagram showing the measurement results of dust particles in the above-mentioned dust-free oven during high temperature operation. Fig. 8 is an explanatory diagram showing the cleanliness of the test chamber during the operation of a conventional dust-free oven having a conventional heat treatment temperature. 14 (Please read the precautions on the back before filling this page) This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 539843 A7 B7 V. Description of the invention (i2 component number comparison 1_. · Entrance frame (structure Components) 2 ··· Gaskets (sealing components) 3. Filters 4. Fans 5. Circulation paths 6 ... Heat treatment chambers 7. Outlet frames (separating components) 8 ·· Exhaust ports (Gap gas extraction mechanism, gap gas introduction mechanism) 9 ... heater 10 .. cooler 11 ... exhaust port (gap gas extraction mechanism) 12 ... exhaust pipe (gap gas extraction mechanism) 13. .Exhaust blower (clearance gas take-out mechanism) 31 .. Peripheral frame 31a_ ·· Edge 71 .. Clearance portion 81 .. Slider 82, 83 ... tube (clearance gas take-out mechanism, clearance gas introduction mechanism) 84 ··· Blow-back blower (clearance gas take-out mechanism, clearance gas introduction mechanism) 100.. Dust-free oven (heat treatment device) 101... Housing 102... Shelf 200... (Please read the back first) (Please fill in this page on the subject of ^ 1 intention) 15 This paper size applies to Chinese National Standards (CNS) A4 specifications (210X297 mm)

Claims (1)

539843 VI. The scope of application for patents, special treatment and clothing, is constructed so that the structural member is a sealing member and the female filter is 'and' is passed by the filter with a blower and a hole for heat treatment. Those who make the aforementioned gas enter the heat treatment chamber include: 仏 ⑽ Fu Shi, which includes the first 4 in the opposite components, and the gap portion generated by the side of the maturation processing chamber side is separated by the knife by the heat treatment chamber; And, the interstitial gas take-out mechanism is a person who can take out the body. The gas in the gap part 2. If the heat treatment device body taking-out mechanism of item 1 of the patent application scope is a gap gas introduction mechanism capable of introducing the circulation path of the aforementioned gap part. For example, the heat treatment device body introduction mechanism in the scope of the patent application is the one that can introduce the aforementioned gas to the suction side of the aforementioned blower. ‘Where the gas of the interstitial gas is introduced into the aforementioned‘ where the interstitial gas is in the aforementioned still-loop path 3.