WO2018193646A1 - Clean oven - Google Patents

Clean oven Download PDF

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Publication number
WO2018193646A1
WO2018193646A1 PCT/JP2017/032209 JP2017032209W WO2018193646A1 WO 2018193646 A1 WO2018193646 A1 WO 2018193646A1 JP 2017032209 W JP2017032209 W JP 2017032209W WO 2018193646 A1 WO2018193646 A1 WO 2018193646A1
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Prior art keywords
gas
seal member
filter
heat treatment
flow path
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PCT/JP2017/032209
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French (fr)
Japanese (ja)
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和珠 金光
雅樹 横山
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中外炉工業株式会社
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Publication of WO2018193646A1 publication Critical patent/WO2018193646A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F13/00—Details common to, or for air-conditioning, air-humidification, ventilation or use of air currents for screening
    • F24F13/28—Arrangement or mounting of filters

Definitions

  • the present invention relates to a clean oven used for drying and firing semiconductor components and precision materials.
  • Patent Document 1 a clean oven has been provided with a HEPA filter that removes fine dust (particles).
  • the HEPA filter is attached to the frame of the clean oven via a seal member (packing), but the seal member generates dust, thereby forming a heat treatment chamber of the clean oven.
  • the seal member generates dust, thereby forming a heat treatment chamber of the clean oven.
  • Patent Document 2 it is disclosed that particles can be extracted from the seal member by making it possible to extract gas from the space before and after the HEPA filter.
  • the gas since the gas is taken out from the space before and after the HEPA filter, the gas flow becomes complicated, and there is a problem in the gas takeout property.
  • an object of the present invention is to provide a clean oven capable of reducing the amount of particles brought into the heat treatment chamber while smoothing the gas flow.
  • the present invention is a clean oven that heats a workpiece by circulating gas
  • a heat treatment chamber in which a work to be heat treated is arranged, and has a gas inlet through which gas flows in and a gas outlet through which gas flows out;
  • a filter attached to the gas inlet via a seal member;
  • a guide plate that is positioned so as to surround the seal member on the downstream side of the gas flow with respect to the seal member, and guides the gas passing through the vicinity of the seal member to the circulation flow path via the gas outlet; It is characterized by having.
  • the gas passing through the vicinity of the seal member does not flow into the heat treatment chamber, and is guided to the circulation flow path by the guide plate via the gas outlet. It is possible to suppress particles caused by the generation of dust from flowing into the heat treatment chamber.
  • the present invention preferably further comprises the following configuration.
  • the guide plate is configured to allow gas passing in the vicinity of the seal member to pass through the side of the heat treatment chamber.
  • the filter is formed by collecting a plurality of filter pieces, Each of the filter pieces is attached to the gas inlet via a seal member, The guide plate is positioned so as to surround the seal member on the downstream side of the gas flow with respect to the seal member, and constitutes a collective flow path for collecting the gas passing through the vicinity of the seal member, The collecting channel communicates with the gas outlet.
  • the amount of heat of the gas can be imparted to the heat treatment chamber, The amount of heat of gas can be used effectively.
  • the guide plate since the guide plate constitutes a collecting channel that collects gases passing near the plurality of seal members, the structure of the guide plate can be rationalized.
  • a clean oven capable of reducing the amount of particles brought into the heat treatment chamber can be provided.
  • FIG. 3 is a view taken in the direction of arrow III in FIG. 2. It is an enlarged view of a filter part in case a filter is comprised by connecting two filter pieces.
  • FIG. 5 is a view taken in the direction of arrow V in FIG. 4.
  • FIG. 6 is a view similar to FIG. 5 when the filter is configured by connecting four filter pieces.
  • FIG. 1 is a schematic configuration diagram of a clean oven 10 according to an embodiment of the present invention.
  • the clean oven 10 includes a heat treatment chamber 2 in which a work W to be heat treated is disposed, and has a gas inlet 21 into which gas that has passed through the filter 4 flows in and a gas outlet 22 through which gas flows out.
  • the filter 4 attached to the internal frame 23 forming the gas inlet 21 via the seal member 3, the pre-filter space 5 in which the gas before passing through the filter 4 is present, and the gas flowing out from the gas outlet 22 is filtered.
  • a circulation flow path 6 to be sent to the front space 5.
  • the gas is a gas that fills the clean oven 10, and may be any gas such as air or nitrogen.
  • a glass substrate placed flat on a shelf-like cassette is schematically shown, but any kind of substrate may be used.
  • the gas flow is indicated by white arrows.
  • the clean oven 10 further includes a guide plate 7 that is positioned so as to surround the seal member 3 on the downstream side of the gas flow with respect to the seal member 3 and guides the gas passing through the vicinity of the seal member 3 to the gas outlet 22. ing.
  • the guide plate 7 is configured not to allow the gas passing through the vicinity of the seal member 3 to flow into the heat treatment chamber 2.
  • the guide plate 7 allows the gas passing through the vicinity of the seal member 3 to pass through the heat treatment chamber 2 via the guide flow path 8 formed on the side of the heat treatment chamber 2 from the downstream side of the gas flow of the seal member 3.
  • the gas outlet 22 is guided.
  • the seal member 3 is an O-ring member (packing) made of a rubber member such as nitrile rubber, silicon rubber, or fluorine rubber.
  • a HEPA filter is used as the filter 4.
  • the HEPA filter is a kind of air filter used for the purpose of removing dust, dust and the like from the air to obtain clean air, and has a predetermined particle collection rate and initial pressure loss.
  • FIG. 2 is an enlarged view of the filter 4 part, and FIG. As shown in FIGS. 2 and 3, the guide plate 7 is disposed on the outer peripheral portion of the filter 4 so as to surround the seal member 3 on the downstream side of the gas flow with respect to the seal member 3.
  • the filter 4 may be configured by connecting a plurality of filter pieces.
  • FIG. 4 is an enlarged view of the filter 4 portion when the filter 4 is configured by connecting two filter pieces 41
  • FIG. 5 is a view taken in the direction of arrow V in FIG.
  • FIG. 6 is a view similar to FIG. 5 when the filter 4 is configured by connecting four filter pieces 41.
  • the guide plate 7 is positioned so as to surround the plurality of seal members 3 between the filter pieces 41.
  • the guide plate 7 also forms a collective flow path 71 that collects gas passing in the vicinity of the plurality of seal members 3, and guides the gas from the collective flow path 71 to the gas outlet 22 through the guide flow path 8. It is supposed to be.
  • the guide channel 8 is located laterally outside the heat treatment chamber 2, and the circulation channel 6 is positioned below the guide channel 8.
  • the gas flow direction in the heat treatment chamber 2 and the gas flow direction in the guide flow path 8 are the same direction, and the gas flow direction in the guide flow path 8 and the gas flow direction in the circulation flow path 6 are opposite to each other.
  • An inlet 61 of the circulation channel 6 communicates with the gas outlet 22 of the heat treatment chamber 2, and an outlet 62 of the circulation channel 6 communicates with the inlet 51 of the pre-filter space 5.
  • the clean oven 10 operates as follows.
  • the door (not shown) of the clean oven 10 is opened and closed, and the workpiece W is placed at a predetermined position in the heat treatment chamber 2.
  • a heater and a fan (not shown) are operated, the gas heated by the heater passes through the filter 4 and is purified by the fan, passes through the gas inlet 21, and is sent to the heat treatment chamber 2. It is done.
  • the seal member 3 self-generates due to the heat of the gas, but particles due to the dust generated from the seal member 3 do not flow into the heat treatment chamber 2 by the guide plate 7, and are near the seal member 3.
  • the gas is guided to the guide channel 8.
  • the heated gas heats the workpiece W arranged in the heat treatment chamber 2.
  • the gas that has heated the workpiece W merges with the gas from the guide channel 8 at the gas outlet 22 and flows to the circulation channel 6.
  • the gas in the circulation channel 6 flows into the pre-filter space 5, passes through the filter 4, is purified again, and flows into the heat treatment chamber 2 through the gas inlet 21.
  • the guide plate 7 constitutes a collecting flow path 71 that collects gas passing in the vicinity of the plurality of seal members 3.
  • the structure of the guide plate 7 can be rationalized.
  • the filter 4 can suppress the inflow of particles into the heat treatment chamber 2 even when a plurality of filter pieces 41 are formed by using the collecting channel 71, for example, a plurality of regular filters are used.
  • a filter can be attached to the gas inlet 21 of the heat treatment chamber 2 having various sizes and shapes.
  • the filter 4 is a HEPA filter, but is not limited to a HEPA filter, and various filters can be applied.
  • the circulation flow path 6 is provided below the guide flow path 8, but the circulation flow path 6 is provided outside the heat treatment chamber 2, and the gas outlet 22 of the heat treatment chamber 2 and the filter front space 5 are provided. Any device that communicates with the inlet 51 may be used.

Abstract

A clean oven (10) which performs heat treatment of a workpiece (W) by circulating a gas is characterized by being provided with: a heat treatment chamber (2) in which the workpiece (W) to be heat treated is disposed, and which includes a gas inlet (21) through which the gas flows in and a gas outlet (22) through which the gas flows out; a filter (4) attached to the gas inlet (21) with a seal member (3) interposed therebetween; a circulating flow path (6) which sends the gas that has flowed out from the gas outlet (22) into a pre-filter space (5) in which the gas prior to passing through the filter (4) is present; and a guide plate (7) which is positioned in such a way as to surround the seal member (3) on the downstream side, in the direction of gas flow, of the seal member (3), and which guides the gas passing through in the vicinity of the seal member (3) to the circulating flow path (6).

Description

クリーンオーブンClean oven
　本発明は、半導体部品や精密材料等の乾燥や焼成等に使用されるクリーンオーブンに関するものである。 The present invention relates to a clean oven used for drying and firing semiconductor components and precision materials.
　従来、クリーンオーブンには、特許文献１に示されるように、微細なダスト（パーティクル）を取り除くＨＥＰＡフィルタが設けられている。 Conventionally, as shown in Patent Document 1, a clean oven has been provided with a HEPA filter that removes fine dust (particles).
　ここで、特許文献２に示されるように、ＨＥＰＡフィルタは、シール部材（パッキン）を介して、クリーンオーブンのフレームに取り付けられるが、シール部材が発塵し、それによって、クリーンオーブンの熱処理室にパーティクルが持ち込まれるという課題が存在する。 Here, as shown in Patent Document 2, the HEPA filter is attached to the frame of the clean oven via a seal member (packing), but the seal member generates dust, thereby forming a heat treatment chamber of the clean oven. There is a problem that particles are brought in.
特開２００５－１５６０８９号公報Japanese Patent Laid-Open No. 2005-156089 特開２００３－３０２０７８号公報JP 2003-302078 A
　そして、特許文献２では、ＨＥＰＡフィルタの前後の空間からガスを取り出し可能とすることによって、シール部材からのパーティクルを取り出すことが開示されている。しかし、ＨＥＰＡフィルタの前後の空間からガスを取り出すため、ガスの流れが複雑となり、ガスの取り出し性に課題がある。 In Patent Document 2, it is disclosed that particles can be extracted from the seal member by making it possible to extract gas from the space before and after the HEPA filter. However, since the gas is taken out from the space before and after the HEPA filter, the gas flow becomes complicated, and there is a problem in the gas takeout property.
　そこで、本発明では、ガスの流れを円滑にしながら、熱処理室内に持ち込まれるパーティクルの量を低減できるクリーンオーブンを提供することを目的とする。 Therefore, an object of the present invention is to provide a clean oven capable of reducing the amount of particles brought into the heat treatment chamber while smoothing the gas flow.
　本発明は、ガスを循環させてワークの熱処理を行うクリーンオーブンであって、
　熱処理されるワークが配置され、ガスが流入するガス入口と、ガスが流出するガス出口と、を有する熱処理室と、
　前記ガス入口にシール部材を介して取り付けられるフィルタと、
　前記ガス出口から流出したガスを、前記フィルタを通過する前のガスが存在するフィルタ前空間に送る循環流路と、
　前記シール部材に対してガス流れの下流側に前記シール部材を囲むように位置し、前記シール部材の近傍を通過するガスを前記ガス出口を介して前記循環流路に案内する案内板と、を備えていることを特徴とする。 The present invention is a clean oven that heats a workpiece by circulating gas,
A heat treatment chamber in which a work to be heat treated is arranged, and has a gas inlet through which gas flows in and a gas outlet through which gas flows out;
A filter attached to the gas inlet via a seal member;
A circulation flow path for sending the gas flowing out from the gas outlet to a pre-filter space where the gas before passing through the filter exists;
A guide plate that is positioned so as to surround the seal member on the downstream side of the gas flow with respect to the seal member, and guides the gas passing through the vicinity of the seal member to the circulation flow path via the gas outlet; It is characterized by having.
　前記構成によれば、シール部材の近傍を通過するガスは、熱処理室に流入せず、案内板によってガス出口を介して循環流路に案内されるので、ガスの流れを円滑にしながら、シール部材の発塵によるパーティクルが熱処理室に流入することを抑制できる。 According to the above configuration, the gas passing through the vicinity of the seal member does not flow into the heat treatment chamber, and is guided to the circulation flow path by the guide plate via the gas outlet. It is possible to suppress particles caused by the generation of dust from flowing into the heat treatment chamber.
　本発明は、さらに、次のような構成を備えるのが好ましい。
（１）前記案内板は、前記シール部材の近傍を通過するガスを前記熱処理室の側方を通過させるように構成されている。
（２）前記フィルタは、複数のフィルタ片が集まって形成されており、
　前記フィルタ片はそれぞれ、前記ガス入口にシール部材を介して取り付けられており、
　前記案内板は、前記シール部材に対してガス流れの下流側に前記シール部材を囲むように位置し、前記シール部材の近傍を通過するガスを集合させる集合流路を構成しており、
　前記集合流路は前記ガス出口に連通している。 The present invention preferably further comprises the following configuration.
(1) The guide plate is configured to allow gas passing in the vicinity of the seal member to pass through the side of the heat treatment chamber.
(2) The filter is formed by collecting a plurality of filter pieces,
Each of the filter pieces is attached to the gas inlet via a seal member,
The guide plate is positioned so as to surround the seal member on the downstream side of the gas flow with respect to the seal member, and constitutes a collective flow path for collecting the gas passing through the vicinity of the seal member,
The collecting channel communicates with the gas outlet.
　前記構成（１）によれば、シール部材の近傍を通過するガスは、熱処理室の側方を通過するようになっているので、当該ガスの熱量を熱処理室の加熱に付与することができ、ガスの熱量を有効活用することができる。 According to the configuration (1), since the gas passing in the vicinity of the seal member passes through the side of the heat treatment chamber, the amount of heat of the gas can be imparted to the heat treatment chamber, The amount of heat of gas can be used effectively.
　前記構成（２）によれば、案内板は、複数のシール部材の近傍を通過するガスを集合させる集合流路を構成しているので、案内板の構造を合理化することができる。 According to the configuration (2), since the guide plate constitutes a collecting channel that collects gases passing near the plurality of seal members, the structure of the guide plate can be rationalized.
　要するに、本発明によると、熱処理室内に持ち込まれるパーティクルの量を低減できるクリーンオーブンを提供することができる。 In short, according to the present invention, a clean oven capable of reducing the amount of particles brought into the heat treatment chamber can be provided.
本発明の実施形態に係るクリーンオーブンの概略構成図である。It is a schematic block diagram of the clean oven which concerns on embodiment of this invention. フィルタ部分の拡大図である。It is an enlarged view of a filter part. 図２のIII矢視図である。FIG. 3 is a view taken in the direction of arrow III in FIG. 2. フィルタが２つのフィルタ片が連結されて構成されている場合の、フィルタ部分の拡大図である。It is an enlarged view of a filter part in case a filter is comprised by connecting two filter pieces. 図４のＶ矢視図である。FIG. 5 is a view taken in the direction of arrow V in FIG. 4. フィルタが４つのフィルタ片が連結されて構成されている場合の、図５と同様の図である。FIG. 6 is a view similar to FIG. 5 when the filter is configured by connecting four filter pieces.
（全体構成）
　図１は、本発明の実施形態に係るクリーンオーブン１０の概略構成図である。図１に示されるように、クリーンオーブン１０は、熱処理されるワークＷが配置され、フィルタ４を通過したガスが流入するガス入口２１と、ガスが流出するガス出口２２と、を有する熱処理室２と、ガス入口２１を形成する内部フレーム２３にシール部材３を介して取り付けられるフィルタ４と、フィルタ４を通過する前のガスが存在するフィルタ前空間５と、ガス出口２２から流出したガスをフィルタ前空間５に送る循環流路６と、を備えている。なお、ガスは、クリーンオーブン１０内を満たす気体であり、空気や窒素等の他どのような気体でもよい。また、ここでは、ワークＷとして、棚状のカセットに平置きされたガラス基板が略図で示されているが、どのようなものでもよい。なお、図１において、ガスの流れは白抜き矢印で示されている。 (overall structure)
FIG. 1 is a schematic configuration diagram of a clean oven 10 according to an embodiment of the present invention. As shown in FIG. 1, the clean oven 10 includes a heat treatment chamber 2 in which a work W to be heat treated is disposed, and has a gas inlet 21 into which gas that has passed through the filter 4 flows in and a gas outlet 22 through which gas flows out. The filter 4 attached to the internal frame 23 forming the gas inlet 21 via the seal member 3, the pre-filter space 5 in which the gas before passing through the filter 4 is present, and the gas flowing out from the gas outlet 22 is filtered. And a circulation flow path 6 to be sent to the front space 5. The gas is a gas that fills the clean oven 10, and may be any gas such as air or nitrogen. In addition, here, as the workpiece W, a glass substrate placed flat on a shelf-like cassette is schematically shown, but any kind of substrate may be used. In FIG. 1, the gas flow is indicated by white arrows.
　クリーンオーブン１０は、さらに、シール部材３に対してガス流れの下流側にシール部材３を囲むように位置し、シール部材３の近傍を通過するガスをガス出口２２に案内する案内板７を備えている。案内板７は、シール部材３の近傍を通過するガスを熱処理室２に流入させないように構成されている。そして、案内板７は、シール部材３の近傍を通過するガスを、シール部材３のガス流れの下流側から、熱処理室２の側方に形成される案内流路８を介して、熱処理室２のガス出口２２に案内するようになっている。 The clean oven 10 further includes a guide plate 7 that is positioned so as to surround the seal member 3 on the downstream side of the gas flow with respect to the seal member 3 and guides the gas passing through the vicinity of the seal member 3 to the gas outlet 22. ing. The guide plate 7 is configured not to allow the gas passing through the vicinity of the seal member 3 to flow into the heat treatment chamber 2. The guide plate 7 allows the gas passing through the vicinity of the seal member 3 to pass through the heat treatment chamber 2 via the guide flow path 8 formed on the side of the heat treatment chamber 2 from the downstream side of the gas flow of the seal member 3. The gas outlet 22 is guided.
　シール部材３は、例えば、ニトリルゴム、シリコンゴム、フッ素ゴム等のゴム部材でできたＯリング部材（パッキン）である。フィルタ４は、例えば、ＨＥＰＡフィルタが使用される。ＨＥＰＡフィルタは、空気中からゴミ、塵埃等を取り除き、清浄空気にする目的で使用されるエアフィルタの一種であり、所定の粒子捕集率及び初期圧力損失が規定されている。 The seal member 3 is an O-ring member (packing) made of a rubber member such as nitrile rubber, silicon rubber, or fluorine rubber. For example, a HEPA filter is used as the filter 4. The HEPA filter is a kind of air filter used for the purpose of removing dust, dust and the like from the air to obtain clean air, and has a predetermined particle collection rate and initial pressure loss.
　図２は、フィルタ４部分の拡大図であり、図３は、図２のIII矢視図である。図２及び図３に示されるように、案内板７は、シール部材３に対してガス流れの下流側にシール部材３を囲むように、フィルタ４の外周部に配置されている。 FIG. 2 is an enlarged view of the filter 4 part, and FIG. As shown in FIGS. 2 and 3, the guide plate 7 is disposed on the outer peripheral portion of the filter 4 so as to surround the seal member 3 on the downstream side of the gas flow with respect to the seal member 3.
　なお、フィルタ４は、複数のフィルタ片が連結されて構成されてもよい。図４は、フィルタ４が２つのフィルタ片４１が連結されて構成されている場合の、フィルタ４部分の拡大図であり、図５は、図４のＶ矢視図である。図６は、フィルタ４が４つのフィルタ片４１が連結されて構成されている場合の、図５と同様の図である。図４～図６に示されるように、案内板７は、フィルタ片４１間の複数のシール部材３を囲むように位置している。案内板７はまた、複数のシール部材３の近傍を通過するガスを集合させる集合流路７１を形成しており、ガスを集合流路７１から案内流路８を介して、ガス出口２２に案内するようになっている。 The filter 4 may be configured by connecting a plurality of filter pieces. FIG. 4 is an enlarged view of the filter 4 portion when the filter 4 is configured by connecting two filter pieces 41, and FIG. 5 is a view taken in the direction of arrow V in FIG. FIG. 6 is a view similar to FIG. 5 when the filter 4 is configured by connecting four filter pieces 41. As shown in FIGS. 4 to 6, the guide plate 7 is positioned so as to surround the plurality of seal members 3 between the filter pieces 41. The guide plate 7 also forms a collective flow path 71 that collects gas passing in the vicinity of the plurality of seal members 3, and guides the gas from the collective flow path 71 to the gas outlet 22 through the guide flow path 8. It is supposed to be.
　案内流路８は、熱処理室２の側方外方に位置しており、循環流路６は、案内流路８の下方に位置している。熱処理室２のガス流れ方向と案内流路８のガス流れ方向とは同方向であり、案内流路８のガス流れ方向と循環流路６のガス流れ方向とは逆方向となっている。循環流路６の入口６１は、熱処理室２のガス出口２２に連通しており、循環流路６の出口６２はフィルタ前空間５の入口５１に連通している。 The guide channel 8 is located laterally outside the heat treatment chamber 2, and the circulation channel 6 is positioned below the guide channel 8. The gas flow direction in the heat treatment chamber 2 and the gas flow direction in the guide flow path 8 are the same direction, and the gas flow direction in the guide flow path 8 and the gas flow direction in the circulation flow path 6 are opposite to each other. An inlet 61 of the circulation channel 6 communicates with the gas outlet 22 of the heat treatment chamber 2, and an outlet 62 of the circulation channel 6 communicates with the inlet 51 of the pre-filter space 5.
　クリーンオーブン１０は、次のように作動するようになっている。 The clean oven 10 operates as follows.
　まず、クリーンオーブン１０の扉（図示せず）が開閉され、ワークＷが熱処理室２内の所定位置に配置される。そして、ヒータ及びファン（図示せず）を作動させると、ヒータで加熱されたガスは、ファンによって、フィルタ４を通過して清浄化された上で、ガス入口２１を通り、熱処理室２に送られる。ここで、シール部材３は、ガスの熱により自己発塵することも考えられるが、シール部材３からの発塵によるパーティクルは、案内板７によって熱処理室２に流入せず、シール部材３の近傍を通過するガスと一緒に、案内流路８に案内される。 First, the door (not shown) of the clean oven 10 is opened and closed, and the workpiece W is placed at a predetermined position in the heat treatment chamber 2. When a heater and a fan (not shown) are operated, the gas heated by the heater passes through the filter 4 and is purified by the fan, passes through the gas inlet 21, and is sent to the heat treatment chamber 2. It is done. Here, it is conceivable that the seal member 3 self-generates due to the heat of the gas, but particles due to the dust generated from the seal member 3 do not flow into the heat treatment chamber 2 by the guide plate 7, and are near the seal member 3. Along with the gas passing through the gas, the gas is guided to the guide channel 8.
　加熱されたガスは、熱処理室２において、配置されたワークＷを加熱する。ワークＷを加熱したガスは、ガス出口２２において、案内流路８からのガスと合流し、循環流路６に流れる。循環流路６内のガスは、フィルタ前空間５に流れ、再度、フィルタ４を通過して清浄化された上で、ガス入口２１を通って熱処理室２に流入する。 The heated gas heats the workpiece W arranged in the heat treatment chamber 2. The gas that has heated the workpiece W merges with the gas from the guide channel 8 at the gas outlet 22 and flows to the circulation channel 6. The gas in the circulation channel 6 flows into the pre-filter space 5, passes through the filter 4, is purified again, and flows into the heat treatment chamber 2 through the gas inlet 21.
　前記構成のクリーンオーブン１０によれば、次のような効果を発揮できる。 According to the clean oven 10 configured as described above, the following effects can be exhibited.
（１）シール部材３の近傍を通過するガスは、熱処理室２に流入せず、案内板７によってガス出口２２を介して循環流路６に案内されるので、ガスの流れを円滑にしながら、シール部材３の発塵によるパーティクルが熱処理室２に流入することを抑制できる。 (1) The gas that passes in the vicinity of the seal member 3 does not flow into the heat treatment chamber 2 and is guided to the circulation flow path 6 through the gas outlet 22 by the guide plate 7. It can suppress that the particle by dust generation of the sealing member 3 flows into the heat processing chamber 2. FIG.
（２）シール部材３の近傍を通過するガスは、熱処理室２の側方を通過するようになっているので、当該ガスの熱量を熱処理室２の加熱に付与することができ、ガスの熱量を有効活用することができる。 (2) Since the gas passing in the vicinity of the seal member 3 passes through the side of the heat treatment chamber 2, the amount of heat of the gas can be applied to the heating of the heat treatment chamber 2, and the amount of heat of the gas Can be used effectively.
（３）フィルタ４は、複数のフィルタ片４１が集まって形成されている場合、案内板７は、複数のシール部材３の近傍を通過するガスを集合させる集合流路７１を構成しているので、案内板７の構造を合理化することができる。 (3) When the filter 4 is formed by collecting a plurality of filter pieces 41, the guide plate 7 constitutes a collecting flow path 71 that collects gas passing in the vicinity of the plurality of seal members 3. The structure of the guide plate 7 can be rationalized.
（４）シール部材３の発塵によるパーティクルが熱処理室２に流入することを抑制できるので、半導体部品や精密材料等を歩留まりよく製造可能なクリーンオーブンを提供できる。 (4) Since particles due to dust generation from the seal member 3 can be prevented from flowing into the heat treatment chamber 2, it is possible to provide a clean oven capable of manufacturing semiconductor components, precision materials, and the like with a high yield.
（５）フィルタ４は、集合流路７１を用いることにより、複数のフィルタ片４１が集まって形成されても、パーティクルが熱処理室２に流入することを抑制できるので、例えば定形のフィルタを複数用いて、様々な寸法及び形状の熱処理室２のガス入口２１に対して、フィルタを取り付けることができる。 (5) Since the filter 4 can suppress the inflow of particles into the heat treatment chamber 2 even when a plurality of filter pieces 41 are formed by using the collecting channel 71, for example, a plurality of regular filters are used. A filter can be attached to the gas inlet 21 of the heat treatment chamber 2 having various sizes and shapes.
　上記実施形態では、フィルタ４はＨＥＰＡフィルタであるが、ＨＥＰＡフィルタに限定されず、様々なフィルタを適用できる。 In the above embodiment, the filter 4 is a HEPA filter, but is not limited to a HEPA filter, and various filters can be applied.
　上記実施形態では、循環流路６は案内流路８の下方に設けられているが、循環流路６は熱処理室２の外部に設けられ、熱処理室２のガス出口２２及びフィルタ前空間５の入口５１に連通するものであればよい。 In the above embodiment, the circulation flow path 6 is provided below the guide flow path 8, but the circulation flow path 6 is provided outside the heat treatment chamber 2, and the gas outlet 22 of the heat treatment chamber 2 and the filter front space 5 are provided. Any device that communicates with the inlet 51 may be used.
　特許請求の範囲に記載された本発明の精神及び範囲から逸脱することなく、各種変形及び変更を行うことも可能である。 Various modifications and changes can be made without departing from the spirit and scope of the present invention as set forth in the appended claims.
　本発明では、熱処理室内に持ち込まれるパーティクルの量を低減できるクリーンオーブンを提供できるので、産業上の利用価値が大である。 In the present invention, since a clean oven that can reduce the amount of particles brought into the heat treatment chamber can be provided, the industrial utility value is great.
２　熱処理室　
２１　ガス入口　２２　ガス出口　２３　内部フレーム　
３　シール部材　
４　フィルタ　４１　フィルタ片　
５　フィルタ前空間　５１　入口　
６　循環流路　６１　入口　６２　出口
７　案内板　
７１　集合流路　
８　案内流路　
１０　クリーンオーブン　
Ｗ　ワーク　 2 Heat treatment room
21 Gas inlet 22 Gas outlet 23 Internal frame
3 Seal member
4 Filter 41 Filter piece
5 Space in front of filter 51 Entrance
6 Circulating channel 61 Inlet 62 Outlet 7 Guide plate
71 Collective flow path
8 Guide channel
10 Clean oven
W Work

Claims (3)

  1. 　ガスを循環させてワークの熱処理を行うクリーンオーブンであって、
    　熱処理されるワークが配置され、ガスが流入するガス入口と、ガスが流出するガス出口と、を有する熱処理室と、
    　前記ガス入口にシール部材を介して取り付けられるフィルタと、
    　前記ガス出口から流出したガスを、前記フィルタを通過する前のガスが存在するフィルタ前空間に送る循環流路と、
    　前記シール部材に対してガス流れの下流側に前記シール部材を囲むように位置し、前記シール部材の近傍を通過するガスを前記ガス出口を介して前記循環流路に案内する案内板と、を備えていることを特徴とする、クリーンオーブン。
    A clean oven that heats the workpiece by circulating gas,
    A heat treatment chamber in which a work to be heat treated is arranged, and has a gas inlet through which gas flows in and a gas outlet through which gas flows out;
    A filter attached to the gas inlet via a seal member;
    A circulation flow path for sending the gas flowing out from the gas outlet to a pre-filter space where the gas before passing through the filter exists;
    A guide plate that is positioned so as to surround the seal member on the downstream side of the gas flow with respect to the seal member, and guides the gas passing through the vicinity of the seal member to the circulation flow path via the gas outlet; Clean oven characterized by having.
  2. 　前記案内板は、前記シール部材の近傍を通過するガスを前記熱処理室の側方を通過させるように構成されている、請求項１記載のクリーンオーブン。
    The clean oven according to claim 1, wherein the guide plate is configured to allow a gas passing in the vicinity of the seal member to pass through a side of the heat treatment chamber.
  3. 　前記フィルタは、複数のフィルタ片が集まって形成されており、
    　前記フィルタ片はそれぞれ、前記ガス入口にシール部材を介して取り付けられており、
    　前記案内板は、前記シール部材に対してガス流れの下流側に前記シール部材を囲むように位置し、前記シール部材の近傍を通過するガスを集合させる集合流路を構成しており、
    　前記集合流路は前記ガス出口に連通している、請求項１又は２に記載のクリーンオーブン。     The filter is formed by collecting a plurality of filter pieces,
    Each of the filter pieces is attached to the gas inlet via a seal member,
    The guide plate is positioned so as to surround the seal member on the downstream side of the gas flow with respect to the seal member, and constitutes a collective flow path for collecting the gas passing through the vicinity of the seal member,
    The clean oven according to claim 1 or 2, wherein the collecting flow path communicates with the gas outlet.
PCT/JP2017/032209 2017-04-20 2017-09-07 Clean oven WO2018193646A1 (en)

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Citations (5)

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JPS5813933Y2 (en) * 1979-03-15 1983-03-18 忍足 義見 Dust-free constant temperature bath
JP2000329472A (en) * 1999-05-21 2000-11-30 Tabai Espec Corp Heat treatment apparatus with special heat-resisting filter, and special heat-resisting filter
JP2003302078A (en) * 2002-04-11 2003-10-24 Espec Corp Heat processor having filter dust processing function
JP2004163014A (en) * 2002-11-14 2004-06-10 Koyo Thermo System Kk Clean oven
JP2007307445A (en) * 2006-05-16 2007-11-29 Espec Corp Air filter unit and thermal treatment apparatus equipped with the air filter unit

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004515918A (en) * 2000-12-04 2004-05-27 株式会社荏原製作所 Substrate processing apparatus and method
JP2010144939A (en) * 2008-12-16 2010-07-01 Tohoku Univ Circulation type substrate burning furnace

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5813933Y2 (en) * 1979-03-15 1983-03-18 忍足 義見 Dust-free constant temperature bath
JP2000329472A (en) * 1999-05-21 2000-11-30 Tabai Espec Corp Heat treatment apparatus with special heat-resisting filter, and special heat-resisting filter
JP2003302078A (en) * 2002-04-11 2003-10-24 Espec Corp Heat processor having filter dust processing function
JP2004163014A (en) * 2002-11-14 2004-06-10 Koyo Thermo System Kk Clean oven
JP2007307445A (en) * 2006-05-16 2007-11-29 Espec Corp Air filter unit and thermal treatment apparatus equipped with the air filter unit

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