TW530394B - Electrical device with metal plugs and method for making the same - Google Patents
Electrical device with metal plugs and method for making the same Download PDFInfo
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530394 五、發明說明(1) ' ---—^ 【發明領域】 本發明係w1 _種具有金屬检之電子裝置及其製造 方法’特別係有關於一種利用彈性塊增強金屬栓結構之電 子裝置及其製造方法。 【先前技術】 對於微小化與高密度化之電子裝置(或半導體裝置 ),如日日片尺寸封裝〔Chip Scale Package,CSP〕,复 内部電性連接方式係有打線接合及覆晶接合等,其中覆晶 接合方式係以凸塊(bumps )電性連接基板與晶片,而隨 著晶片的微小化,晶片間焊點之間距減小,凸塊高度也降 低,而增加填充材(underfi 1 ling material )形成之難' 度,使晶片與基板間產生之熱應力無法有效地被吸收,因 此,凸塊本身之結構應以能提高電性連接、焊接結合性與 熱應力吸收為佳。 〃 如第6圖所示,在美國專利第6,〇28,357號「具有凸塊 包覆柱體之半導體裝置」中,揭示一種半導體裝置,其係 在一電路+基板1之上表面形成一導電薄膜2,並在該導電薄 膜2上覆蓋一防焊層3,該防焊層3係具有開口,以使導電 薄膜2具有電極4 ’在電極4上以印刷方式形成一柱狀導電 膠5 ’該柱狀導電膠5係含有銅金屬粉末,固化該柱狀導電 膠5後,在防焊層3之開口上形成一焊料凸塊7A,該焊料凸 塊7A係包覆該柱狀導電膠5,該包覆有柱狀導電膠5之焊料 凸塊7A係以迴焊(ref l〇w )之方式形成半球狀,因此,可 預先決定焊料凸塊7A之形成高度,然而,該焊料凸塊7A之530394 V. Description of the invention (1) '---- ^ [Field of the invention] The present invention relates to an electronic device with metal detection and its manufacturing method w1. In particular, it relates to an electronic device using an elastic block to reinforce a metal plug structure. And its manufacturing method. [Previous technology] For miniaturized and high-density electronic devices (or semiconductor devices), such as Chip Scale Package (CSP), the internal electrical connection methods include wire bonding and flip-chip bonding. The flip-chip bonding method uses bumps to electrically connect the substrate and the wafer. As the wafer becomes smaller, the distance between the solder joints between the wafers decreases, the height of the bumps also decreases, and the filling material (underfi 1 ling) is increased. material), the thermal stress generated between the wafer and the substrate cannot be effectively absorbed. Therefore, the structure of the bump itself should be better to improve electrical connection, solder bonding and thermal stress absorption. 〃 As shown in Figure 6, in US Patent No. 6, 〇28,357 "Semiconductor Device with Bump-Covered Cylinder", a semiconductor device is disclosed, which forms a conductive surface on a circuit + substrate 1 Film 2 and cover the conductive film 2 with a solder resist layer 3, the solder resist layer 3 has openings so that the conductive film 2 has an electrode 4 'on the electrode 4 by printing to form a columnar conductive adhesive 5' The pillar-shaped conductive paste 5 contains copper metal powder. After the pillar-shaped conductive paste 5 is cured, a solder bump 7A is formed on the opening of the solder resist 3. The solder bump 7A covers the pillar-shaped conductive paste 5. The solder bump 7A covered with the columnar conductive adhesive 5 is formed in a hemispherical shape by means of reflow (ref l0w). Therefore, the formation height of the solder bump 7A can be determined in advance. However, the solder bump 7A is formed in advance. Of 7A
第5頁 530394 五、發明說明(2) "— - 材料係為錫鉛合金等,並不具有極佳之彈性,因此,無法 有效吸收產生在晶片、基板及焊料凸塊7A間之熱應力:/ 【發明目的及概要】 ^ " 本發明之主要目的在於提供一種具有增強金屬栓結構 之電子裝置,該電子裝置之複數個凸塊係具有金屬栓,每 一金屬栓之週邊係被彈性塊所包覆,以增強金屬栓之結 構,當該電子裝置表面接合至一外部電路板時,具彈^之 彈性塊會使金屬栓較不易產生崩裂,而發生短路^問題。 本發明之次一目的在於提供一種電子裝置之製造方 法,其係先在基板上形成一電性絕緣之彈性層,再蝕刻形 成多個具有通孔之彈性塊,並於通孔内形成金屬栓,因 此’可在一基板上大量製作具有增強金屬栓結構之凸塊。 依本發明之具有增強金屬栓結構之電子裝置,其係包 含有一基板及複數個凸塊,其中該基板係可為晶片了晶 圓、印刷電路板、肖£基板或薄膜,複數個凸塊係形成於 该基f之導接墊上,每一凸塊係包含有一彈性塊及一金屬 栓,彈性塊係為電性絕緣且具有高彈性之高分子有機物, 其係具有一通孔,該通孔係連通至對應之導接墊,較佳 地,該彈性塊之頂面係覆蓋一層導電材,而複數個金屬栓 知係由該些彈性塊之通孔而電性結合至對應之導接墊, 另一端係凸出於彈性塊之頂面。 ^依本發明之電子裝置之製造方法,其步驟係包含有: 提,一,板,如晶片、晶圓、印刷電路板、陶瓷基板或薄 膜等,該基板之表面係具有複數個導接墊;以印刷、旋塗Page 5 530394 5. Description of the invention (2) "--The material is tin-lead alloy, etc., does not have excellent elasticity, so it cannot effectively absorb the thermal stress generated between the wafer, substrate and solder bump 7A : / [Objective and summary of the invention] ^ " The main object of the present invention is to provide an electronic device with a reinforced metal plug structure. A plurality of bumps of the electronic device have metal plugs, and the periphery of each metal plug is elastic. The block is covered to strengthen the structure of the metal bolt. When the surface of the electronic device is bonded to an external circuit board, the elastic block with a spring will make the metal bolt less likely to crack and cause a short circuit problem. A second object of the present invention is to provide a method for manufacturing an electronic device, which first forms an electrically insulating elastic layer on a substrate, then etches to form a plurality of elastic blocks with through holes, and forms metal bolts in the through holes. Therefore, 'bumps with reinforced metal plug structures can be produced in large numbers on a substrate. An electronic device with a reinforced metal plug structure according to the present invention includes a substrate and a plurality of bumps, wherein the substrate may be a wafer, a printed circuit board, a substrate or a thin film, and a plurality of bumps Formed on the conductive pad of the base f, each of the bumps includes an elastic block and a metal plug. The elastic block is an electrically insulating and highly elastic high molecular organic substance, which has a through hole. The through hole system It is connected to the corresponding conductive pads. Preferably, the top surface of the elastic block is covered with a layer of conductive material, and the plurality of metal pins are electrically connected to the corresponding conductive pads through the through holes of the elastic blocks. The other end protrudes from the top surface of the elastic block. ^ The method for manufacturing an electronic device according to the present invention includes the steps of: lifting, a board, such as a wafer, a wafer, a printed circuit board, a ceramic substrate, or a thin film. The surface of the substrate has a plurality of conductive pads. ; Printing, spin coating
530394530394
ί膠等技術在基板之表面形成-電性絕緣之彈性 曰,並覆盍该些導接墊;餘刻該彈性層、^ ^ ^ 應導接塾之彈性塊,該些彈性塊係形;有=複= 至對應之導接墊,較佳地,可在彈性 、 以使複數個彈性塊頂面覆蓋一導電材.導電層, ^ ^ ^ ^ ♦尾材,形成金屬栓於彈性 免之通孔,該些金屬栓一端係電性結合至對應之導接墊, 另一端係凸出於彈性塊之頂面。 【發明詳細說明】 請參閱所附圖式,本發明將列舉以下之實施例說明: 依本發明之一具體實施例,如第5圖所示,具有增強 金屬栓結構之電子裝置係包含有一基板丨〇 基板Η表面Η之凸額,其巾該基㈣係可為^ (ctip )、晶圓(wafer)、印刷電路板(printed circuit board,PCB)、陶瓷基板(ceramic substrate)或薄膜 (th l n f 11 m ),在本實施例中,該基板j 〇係為一晶片, 而其表面11上係形成有複數個導接墊12 (c〇ntact pads ),如鋁墊(A1 pad)或銅墊(Cu pad)。 複數個凸塊20係包含有彈形塊2i及金屬栓23,該些彈 性塊2 1係形成於基板1 〇之導接墊丨2上,其係為一種電性絕 緣並具有南彈性之高分子有機物(〇rganic p〇iymer), 如聚亞醯胺(polyimide)、苯環丁烯(benez〇 cyclobutene)、聚丙稀酸脂(p〇iyacryiates)、橡膠 (rubber)或矽膠(siHc〇ne)等,該些彈性塊具有一 通孔2 2 ’該通孔2 2連通至對應之導接墊1 2,較佳地,在該Techniques such as glue are used to form the elasticity of the electrical insulation on the surface of the substrate, and cover the conductive pads; the elastic layer, ^ ^ should be connected to the elastic blocks of the 余, and these elastic blocks are shaped; There are = complex = to the corresponding conductive pads, preferably, a conductive material can be covered on the elastic surface so that the top surfaces of the plurality of elastic blocks. The conductive layer, ^ ^ ^ ^ ♦ tail material, forming a metal plug to avoid elasticity Through holes, one end of the metal bolts are electrically coupled to the corresponding conductive pads, and the other end is protruded from the top surface of the elastic block. [Detailed description of the invention] Please refer to the attached drawings. The present invention will enumerate the following embodiments: According to a specific embodiment of the present invention, as shown in FIG. 5, an electronic device having a reinforced metal plug structure includes a substrate.丨 〇 The amount of convexity on the surface of the substrate, the substrate can be ^ (ctip), wafer (wafer), printed circuit board (PCB), ceramic substrate (ceramic substrate) or film (th lnf 11 m). In this embodiment, the substrate j 0 is a wafer, and a plurality of conductive pads 12 (such as aluminum pads or copper pads) are formed on the surface 11. Cu pad. The plurality of bumps 20 includes a spring-shaped block 2i and a metal bolt 23, and the elastic blocks 21 are formed on the conductive pads 2 of the substrate 10, which is an electrical insulation and has a high elasticity. Molecular organics (〇rganic poiymer), such as polyimide, benzecyclobutene, polypropylene (rubber) or silicone (siHc〇ne) Etc., the elastic blocks have a through hole 2 2 ′, and the through hole 22 is connected to the corresponding lead pad 12.
530394530394
^彈性塊21之頂面係覆蓋一層導電材24,該導電材24係為 3 有錄(Ni )、金(Au )、銀(Ag )、銅(Cu )、鈀(pd )或錫鉛(Sn-Pb alloy)之複合金屬層(c〇mp〇site metal layers ),或是鎳、金、銀、銅、鈀、錫鉛、銀膠 或異方性導電膠(anisotropic c〇nductive adhesive^ The top surface of the elastic block 21 is covered with a layer of conductive material 24. The conductive material 24 is 3 Ni (Ni), gold (Au), silver (Ag), copper (Cu), palladium (pd), or tin-lead ( Sn-Pb alloy) composite metal layer (composite metal layers), or nickel, gold, silver, copper, palladium, tin-lead, silver glue or anisotropic conductive adhesive
),而在該些彈性塊21之通孔22内係形成有金屬栓23,該 金屬裎23係為鎳、金、銀、銅或把,該些金屬栓一端係 電性結合至對應之導接墊丨2,其另一端則係凸出於該彈性 塊21之頂面,因此,每一金屬栓23之週邊係被彈性塊21所 包覆’該具彈性之彈性塊21係可增強金屬栓23之結構,當 電子裝置必須表面接合至一外部電路板時,凸塊2 〇之彈性 塊2 1曰使金屬检2 3較不易產生崩裂,而防止短路等問題發 生’使電子裝置具有良好的電性連接,再者,凸塊2 〇之彈 性塊21係具有極佳之彈性,在電子裝置表面接合於外部電 路板後,結合界面因熱膨脹係數(CTE )不匹配所產生之 熱應力,係可由該些凸塊2 0之彈性塊2 1吸收,而防止位於 結合界面之凸塊20產生機械性熱疲勞(thermai fatigue 關於本發明之具有增強金屬栓結構之電子裝置之製造 方法詳述如下: 首先,如第1圖所示,提供一基板1 〇,如晶圓、晶 片、印刷電路板、陶瓷基板或薄膜…等,其表面1 1形成有 複數個導接墊1 2,該些導接墊1 2係可呈格狀陣列、中央或 周邊排列’再以印刷(printing)、旋塗(spin coating), And a metal plug 23 is formed in the through hole 22 of the elastic blocks 21, and the metal cymbal 23 is nickel, gold, silver, copper or a handle. One end of the metal plugs is electrically coupled to the corresponding guide. The other end of the pad 丨 2 is projected from the top surface of the elastic block 21. Therefore, the periphery of each metal bolt 23 is covered by the elastic block 21. The elastic block 21 can strengthen the metal. The structure of the pin 23, when the electronic device must be surface-bonded to an external circuit board, the elastic block 2 of the bump 2 0 makes the metal inspection 2 3 less likely to crack, and prevents problems such as short circuits from occurring. Furthermore, the elastic block 21 of the bump 20 has excellent elasticity. After the surface of the electronic device is bonded to the external circuit board, the thermal stress caused by the thermal expansion coefficient (CTE) mismatch at the bonding interface, It can be absorbed by the elastic blocks 21 of the bumps 20 to prevent mechanical fatigue of the bumps 20 located at the bonding interface. The method of manufacturing the electronic device with a reinforced metal plug structure according to the present invention is described in detail below. : First, as shown in Figure 1 As shown, a substrate 10 is provided, such as a wafer, a wafer, a printed circuit board, a ceramic substrate, or a thin film, etc., and a plurality of lead pads 12 are formed on the surface 11 of the lead pads. Array, central or peripheral arrangement ', and then printing, spin coating
第8頁 530394Page 8 530394
)或膠膜黏貼(film adhering)等技術在基板1〇之表面 11形成一電性絕緣之彈性層25,該彈性層25係覆 接墊12。 μ二导 产較佳地,再如第2圖所示,以無電極電鍍、印刷或黏 貼等方式在彈性層25上覆蓋一導電層26,以供增進表面接 合時之焊接結合性。) Or film adhering, etc., forms an electrically insulating elastic layer 25 on the surface 11 of the substrate 10, and the elastic layer 25 covers the pads 12. The μ-diode is preferably, as shown in FIG. 2, a conductive layer 26 is covered on the elastic layer 25 by means such as electrodeless plating, printing, or pasting, so as to improve the soldering bonding property when the surfaces are bonded.
之後,如第3圖所示,利用微影成像 〔photolithography〕與乾/溼蝕刻技術,蝕刻該彈性層 25與導電層26,而形成複數個對應導接墊12之彈性塊以曰, 且該些彈性塊21之頂面係覆蓋由導電層26形成之導電材 2 4 ’而該些彈性塊2 1係覆蓋對應之導接墊丨2,並形成有一 通孔2 2 ’该通孔2 2係連通至對應之導接墊1 2。Then, as shown in FIG. 3, the photolithography and dry / wet etching techniques are used to etch the elastic layer 25 and the conductive layer 26 to form a plurality of elastic blocks corresponding to the conductive pads 12, and the The top surfaces of the elastic blocks 21 are covered with the conductive material 2 4 ′ formed by the conductive layer 26, and the elastic blocks 21 are covered with the corresponding conductive pads 2, and a through hole 2 2 is formed. The through hole 2 2 It is connected to the corresponding lead pad 1 2.
,後’如第4圖所示,提供一導線架27 (lead f rame ),該導線架27係以半蝕刻或焊接結合等方式形成有複數 個金屬栓23,將該導線架27熱壓合至基板1〇之表面u上, =些金屬栓23係分別通過對應之彈性塊21之通孔22,其一 端可具有導電接合劑28,如金、錫鉛或導電膠,以電性結 二至基板1 0之導接墊1 2,較佳地,該導線架2 7之材料與導 電材2/之材料係不相同,以利於蝕刻移除該導線架27,當 移除該導線架27時’所形成的複數個金屬栓23係對位於彈 性塊2=1之通孔22,並電性結合至基板1〇之導接墊12。 ▲—最後’、如第5圖所示,蝕刻移除該導線架27後,即製 每凡成上述具有增強金屬栓23結構之電子裝置,該些金屬 才王23形成於對應之通孔22内,而其另一端係凸出於該彈性After that, as shown in FIG. 4, a lead frame 27 (lead frame) is provided. The lead frame 27 is formed by a plurality of metal bolts 23 by semi-etching or welding, and the lead frame 27 is thermally pressed. On the surface u of the substrate 10, some metal pins 23 pass through the through holes 22 of the corresponding elastic block 21, and one end thereof may have a conductive bonding agent 28, such as gold, tin-lead or conductive glue, to electrically bond the two. The lead pads 12 to the substrate 10, preferably, the material of the lead frame 27 is different from that of the conductive material 2 /, so as to facilitate the removal of the lead frame 27 by etching. When the lead frame 27 is removed, The plurality of metal bolts 23 formed at the time are paired with the through holes 22 located at the elastic block 2 = 1, and are electrically coupled to the conductive pads 12 of the substrate 10. ▲ —Finally, as shown in FIG. 5, after removing the lead frame 27 by etching, each electronic device having the structure of the reinforced metal plug 23 described above is manufactured, and the metal kings 23 are formed in the corresponding through holes 22 Inside, and the other end is protruding from the elasticity
第9頁 530394 五、發明說明(6) 塊21之頂面,每一金屬栓23之週邊係被彈性塊21所包覆, 而具有更為增強之結構,因電性絕緣之彈性塊2 1係能有效 吸收結合界面產生之熱應力,故在表面接合時,金屬栓2 3 不易產生崩裂。 故本發明之保護範圍當視後附之申請專利範圍所界定 者為準,任何熟知此項技藝者,在不脫離本發明之精神和 範圍内所作之任何變化與修改,均屬於本發明之保護範 圍。Page 9 530394 V. Description of the invention (6) On the top surface of the block 21, the periphery of each metal bolt 23 is covered by the elastic block 21, and has a more enhanced structure. The electrically insulating elastic block 2 1 Because it can effectively absorb the thermal stress generated at the bonding interface, the metal plug 2 3 is not easy to crack during surface bonding. Therefore, the protection scope of the present invention shall be determined by the scope of the appended patent application. Any changes and modifications made by those skilled in the art without departing from the spirit and scope of the present invention shall be protected by the present invention. range.
第10頁 530394 圖式簡單說明 【圖 式 說明 ] 第1 圖 :依 本發 明 ,形 成 有 彈 性 層 之 基 板 截 面 圖 9 第2 圖 ••依 本發 明 ,形 成 有 導 電 層 之 基 板 截 面 圖 9 第3 圖 :依 本發 明 ,形 成 有 複 數 個 具 通 孔 之 彈 性 塊 之 基板 截 面圖 第4 圖 :依 本發 明 ,壓 合 一 具 有 金 屬 栓 之 導 線 架 之 基 板截 面 圖, 第5 圖 ••依 本發 明 ,具 有 增 強 金 屬 栓 結 構 之 電 子 裝 置 之截 面圖;及 具有凸塊包覆柱體之 第6圖:美國專利第6, 028, 357號 半導體裝置」之截面圖。 【圖號說明】 1 電路基板 4 電極 10基板 11 表面 20凸塊 21 彈性塊 24 導電材 2 7導線架 2 導電薄膜 5 導電膠 12導接墊 22 通孔 2 5 彈性層 28 導電接合劑 3 防焊層 7A焊料凸塊 2 3金屬栓 26 導電層Page 10 530394 Brief Description of Drawings [Illustration of Drawings] Figure 1: Sectional view of a substrate with an elastic layer formed in accordance with the present invention. Figure 9 Figure 2 • Sectional view of a substrate with a conductive layer formed in accordance with the present invention. Figure: Sectional view of a substrate with a plurality of elastic blocks with through holes formed according to the present invention. Figure 4: Sectional view of a substrate crimped with a lead frame with metal bolts according to the present invention. Figure 5 •• According to the present invention , A cross-sectional view of an electronic device with a reinforced metal plug structure; and FIG. 6 a cross-sectional view of a semiconductor device having a bump-coated pillar: US Patent No. 6,028,357. [Illustration of drawing number] 1 circuit board 4 electrode 10 substrate 11 surface 20 bump 21 elastic block 24 conductive material 2 7 lead frame 2 conductive film 5 conductive adhesive 12 lead pad 22 through hole 2 5 elastic layer 28 conductive adhesive 3 prevent Solder layer 7A solder bump 2 3 metal plug 26 conductive layer
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CN118064833A (en) * | 2024-04-16 | 2024-05-24 | 杭州美迪凯光电科技股份有限公司 | Anisotropic conductive film coating structure and preparation method thereof |
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CN118064833A (en) * | 2024-04-16 | 2024-05-24 | 杭州美迪凯光电科技股份有限公司 | Anisotropic conductive film coating structure and preparation method thereof |
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