TW504427B - Composition, methods and devices for high temperature lead-free solder - Google Patents
Composition, methods and devices for high temperature lead-free solder Download PDFInfo
- Publication number
- TW504427B TW504427B TW090119045A TW90119045A TW504427B TW 504427 B TW504427 B TW 504427B TW 090119045 A TW090119045 A TW 090119045A TW 90119045 A TW90119045 A TW 90119045A TW 504427 B TW504427 B TW 504427B
- Authority
- TW
- Taiwan
- Prior art keywords
- composition
- scope
- patent application
- weight
- item
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
- B23K35/264—Bi as the principal constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/001—Interlayers, transition pieces for metallurgical bonding of workpieces
- B23K35/007—Interlayers, transition pieces for metallurgical bonding of workpieces at least one of the workpieces being of copper or another noble metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Die Bonding (AREA)
Abstract
Description
本發明範疇為不含鉛之焊劑。 兩、」日曰^黏接万法為採用高含錯悍劑來黏接積體 =導體晶粒於引腳(leadframe)中,以作為機械性之 :及提供晶粒與引腳間熱及電之傳導。雖然大部分高含 、Ά劑相對便苴’且顯示種種所期望之物理化學性質,但 t在晶粒的黏接及他種烊劑裏-鉛的用_ 3兄及職業健康的觀點審視所影響。因此,已著手進行各種 万法以使不含鉛晶粒黏接組合物代替含鉛焊劑。 例如,如美國專利第 5,15〇,195 ; 5,19539 ; 5,25〇,6〇〇 ; 5’399,907及5,386,000號所描述’其係使用了一種聚合黏著劑 (例如,環氧樹脂或氰酸酯樹脂)來黏接晶粒於基板上。聚 合黏著劑在低於200t之溫度下,通常能在相對短的時間 内固化,且如美國專利第5,612,4〇3號所示,在固化後甚 土旎保有結構上之撓性,以使黏接晶粒之積體電路能 附於撓性$基板上。然而,多數聚合黏著劑有樹脂滲出 之傾向’此現象可能引起並不想要的晶粒與基板間電 流接觸之減少’或甚至於使晶粒部分或完全的脫落。 為阻止至少某些樹脂滲出的問題,如米達尼(Mitan〇 等人在美國專利第5,982,041號中描述,可採用含矽酮之 晶粒黏接黏著劑。雖然此黏著劑能改善配線之連結,同 時也改善了樹脂密封劑與半導體晶片、基板、及/或引腳 間之結合,但對至少一些該種黏著劑之固化過程需要高能 7;"* 1 -— __- 4 _______ 本纸張尺度適财目S家標準(CNsTl4規格(210X 297公釐) ~ " 504427 A7 B7 五、發明説明(2 ) 量之輻射源,使得這種晶粒之黏接方法增加了明顯的成 本。 或者,如迪茲(Dietz)等人於美國專利第4,459,166號所示, 採用含有高鉛硼矽酸鹽玻璃之玻璃漿,藉以避免高能固化 過程。然而多數含高鉛硼矽酸鹽之玻璃漿需要425°C及更高 之溫度,以便耐久的固定晶粒於基板上。而且,玻璃漿當 在加熱與冷却間傾向於結晶,因而減少了黏接層的黏著 度。 — 另一解決之方法是採用高熔點焊劑來黏接晶粒於基板或 .引腳。焊接晶粒於基板具有種種優點,包括相對簡單之操 作法不用溶劑之塗佈,且於一些例子中其相對低廉。此項 技藝中已知有種種高溶點焊劑,然而它們全部或幾乎全部 有一或多項之缺點。例如,大部分金共熔合金(例如,八11-20% Sn,Au-3% Si,Au-12% Ge,及Au-25% Sb)相對昂貴且常受損 於不太理想的機械性質。或者,合金丁( Ag-10°/〇 Sb-65% Sn, 例如,奧森(Olsen)等人之美國專利第4,170,472號)可使用於 種種高熔巧焊劑之應用,然而合金丁具228°C之固相線溫 度,且亦受損於相對貧乏之機械效能。 雖然此項技藝中已知種種焊劑及晶粒黏接組合物之方法 及組合物,但其全部或幾乎全部仍有一或多項缺點’因此 仍然需要提供給焊劑(特別是不含鉛焊劑)已改善之組合物 及方法。 發明概要 本發明為關於一種焊劑之方法、組合物及裝置,此焊劑 _^_ 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)The scope of the present invention is a lead-free flux. Two, "said ^ bonding method is to use a high error containing agent to adhere to the product = conductor grains in the lead (leadframe) as a mechanical: and to provide heat between the die and the pin and Conduction of electricity. Although most of them are high in content, tinctures are relatively convenient and show various desired physicochemical properties, but t is used in the bonding of crystal grains and other tinctures-the use of lead _ 3 brothers and occupational health point of view influences. Therefore, various methods have been initiated to replace lead-containing solder with lead-free die-bonding compositions. For example, as described in U.S. Patent Nos. 5,15,195; 5,19,539; 5,25,600,600; 5,399,907, and 5,386,000, 'which uses a polymeric adhesive (e.g., epoxy resin or Cyanate resin) to adhere the crystal grains to the substrate. Polymeric adhesives can usually be cured in a relatively short time at a temperature below 200t, and as shown in US Patent No. 5,612,403, after curing, the soil retains structural flexibility so that The die-bonded integrated circuit can be attached to a flexible substrate. However, most polymeric adhesives have a tendency for resin to bleed out. This phenomenon may cause an undesired reduction of the current contact between the crystal grains and the substrate, or even cause the crystal grains to partially or completely fall off. To prevent at least some resins from oozing out, as described by Mitanoo et al. In U.S. Patent No. 5,982,041, a silicone-containing grain bonding adhesive may be used. Although this adhesive can improve the connection of the wiring At the same time, the combination of resin sealant with semiconductor wafers, substrates, and / or pins is also improved, but the curing process of at least some of these adhesives requires high energy 7; " * 1 -— __- 4 _______ This paper Zhang Shoucheng's family standard (CNsTl4 specification (210X 297 mm) ~ 504427 A7 B7 V. Description of the invention (2) The amount of radiation source makes the bonding method of the crystal grains increase the obvious cost. Alternatively, as shown in Dietz et al., U.S. Patent No. 4,459,166, glass frit containing high lead borosilicate glass is used to avoid the high energy curing process. However, most of the high lead borosilicate containing The glass paste needs a temperature of 425 ° C and higher in order to permanently fix the crystal grains on the substrate. Moreover, the glass paste tends to crystallize between heating and cooling, thereby reducing the adhesion of the adhesive layer. — Another solution The method is to adopt Use high melting point solder to bond the die to the substrate or pins. Soldering the die to the substrate has various advantages, including relatively simple operation without solvent coating, and in some examples it is relatively inexpensive. In this technique Various high melting point fluxes are known, but all or almost all of them have one or more disadvantages. For example, most gold eutectic alloys (eg, 8-11-20% Sn, Au-3% Si, Au-12% Ge , And Au-25% Sb) are relatively expensive and often impaired by less than ideal mechanical properties. Or, alloy butyl (Ag-10 ° / 〇Sb-65% Sn, for example, the United States of America Olsen) (Patent No. 4,170,472) can be used for a variety of high-flux applications, but alloy tins have a solidus temperature of 228 ° C and are also impaired by relatively poor mechanical performance. Although various are known in the art Method and composition of flux and die bonding composition, but all or almost all of them still have one or more disadvantages', so there is still a need to provide improved compositions and methods for fluxes (especially lead-free fluxes). SUMMARY OF THE INVENTION The invention relates to a method of flux Compositions and devices, which present paper _ ^ _ flux applied China National Standard Scale (CNS) A4 size (210 X 297 mm)
裝 訂Binding
五、發明説明( =量:Bi之,,其Ag含量為2重量%至18重量%, 於262 5t、’、’ 8重里%至82重量%。所涵蓋之合金具有不低 、太C广固相線溫度及^高於魏之液 二發。明-標的之態樣中,合金中之銀含量為2重量% 二重:::而叙為98重量%至93重量%,或者,銀含量 者,銀冬i土18重里0/0,而鉍為93重量%至82重量%,或 互。,.·各量為5重量%至9重量〇/〇,而鉍為95重量%至91重 二;所涵蓋之組合物尚可包括—具有氧親和性高於合金 心和性《化學元素,而此較佳之元素包括A!、Ba、 、、Ce、Cs、Hf、Li、Mg、Nd、P、Sc、Sr、Ti、 所涵盍之兀素濃度通常介於約1〇 ppm到約1〇〇〇 ppm 〇 本I月‘的之另-悲樣中,所涵蓋之坪劑具有至少9 、、之…、傳導率,且於放置沾濕儀一秒後量測顯示其沾Ag 又沾濕力(wetting f0rce)約〇·2 mN。所涵蓋之組合物可形成各 種形狀’包括線狀、帶狀、預鍀、球狀、或鱗鍵。 發明、標的之另一態樣中’一電子裝置包含了 一個半 導體晶粒’此晶粒藉由所涵蓋之組合物而連結於一表面, 其中特別涵蓋的半導體晶粒包括碎、鍺、及砰化鎵晶粒。 本發明尚®蓋把i少晶粒的一部分或者此裝置表面的一部 分之一以銀金屬化。特別佳之態樣中,該表面包含了一銀 金屬化的书腳。另一方面,所涵蓋的焊劑被用於區域陣列 (areaarray)電子封裝,其在半導體晶粒上形成多個凸塊 (bump),作為晶粒與封裝基板(通稱覆晶)或印刷電路板(通 本紙張尺度適财關家標準(CNS) A4規格(210X297公爱) -6« A7 B7 五、發明説明(4 稱晶片板)間之電流連結。或者,所涵蓋之焊劑可使用於 禾成-組¥劑球’以便連結封裝至―基板(通稱為球格式 降列(ban grid aray),因主題而有許多變化)或連結晶粒至基 板或印刷電路板。 本發明標的的另一態樣中,製造焊劑組合物的方法,具 有步騍,其中所提供鉍與銀的含量分別是9 8重量%至8 2 重量%以及2重量%至18重量%。次一步驟裏,銀和鉍在溫 度至少為960。。時熔解,以便形喊一種合金,該合金固相線 溫度不低於262.5t且液相線溫度不高於4〇〇t。所涵蓋之方 法尚包括視需要而添加具氧親和性高於合金之氧親和性之 化學元素。 k以下本盔明又較佳具體實施例及伴隨圖示的詳細說明 中’將更能顯示本發明之各項目的、特色、態樣、及優 _!示簡單說明 圖1為示範之電子裝置的圖式縱切面。 詳細說明 本發明者發現(尤其是對所期望的性質),所涵蓋之組; 物在各種晶粒黏接的應用裏,極具優勢而使㈣代替高: 錯焊劑。、特別是所涵蓋之組合物為不含錯合金,具有不^ 万;2。60(:《固相線溫度(而較佳地是不低於放沈)及不高方 400°C之液相線溫度。 ’所涵蓋之組合物為二元 其含銀量為2重量%至1 8 在本發明標的特別佳之態樣中 口金,遠一元合金可用於焊劑且V. Description of the invention (= Amount: Bi, its Ag content is 2% to 18% by weight, at 262 5t, ',' 8% to 82% by weight. The alloys covered are not low, too wide The solidus temperature and ^ are higher than that of Wei Zhiye Erfa. In the state of the Ming-standard, the silver content in the alloy is 2% by weight. Double: :: 98% to 93% by weight, or, silver For content, Yindong i soil 18 weights 0/0, and bismuth is 93% to 82% by weight, or each other. .. · Each amount is 5% to 9% 0/0, and bismuth is 95% to 91 doubles; the composition covered can still include—chemical elements with higher oxygen affinity than alloy hearts, and the preferred elements include A !, Ba,,, Ce, Cs, Hf, Li, Mg, The concentrations of Nd, P, Sc, Sr, Ti, and uranine are usually in the range of about 10 ppm to about 10,000 ppm. In another example of this month, the covered agents have At least 9,…, conductivity, and measured after placing the moisture meter for one second, it shows that it is wet with Ag and wetting f0rce (about 0.2 mN). The composition covered can be formed into various shapes' including Shaped, banded, pre-shaped, spherical, or scale bonds. In another aspect of the invention, the subject, 'An electronic device contains a semiconductor die,' which is connected to a surface by the composition covered Among them, the semiconductor crystal grains specifically covered include crushed, germanium, and gallium gallium crystal grains. The present invention also covers a part of the small crystal grains or one part of the surface of the device with silver metallization. Particularly preferred The surface contains a silver metallized book leg. On the other hand, the covered flux is used in an area array electronic package, which forms a plurality of bumps on the semiconductor die as the die. Current between package substrate (commonly referred to as flip chip) or printed circuit board (commonly known as paper size standard (CNS) A4 specification (210X297)) -6 «A7 B7 V. Description of the invention (4 called wafer board) Alternately, the fluxes covered can be used in the He-Group ¥ flux ball to connect the package to the substrate (commonly known as ban grid aray, there are many variations depending on the subject) or to connect the die to Substrate or printed circuit board. In another aspect of the invention, the method for manufacturing a flux composition has a step, wherein the content of bismuth and silver provided is 98 to 82% by weight and 2 to 18% by weight, respectively. The next step Here, silver and bismuth melt at a temperature of at least 960 ° C to shape an alloy whose solidus temperature is not lower than 262.5t and liquidus temperature is not higher than 400t. The methods covered are still Including the addition of chemical elements with oxygen affinity higher than the oxygen affinity of the alloy as needed. K The following detailed and preferred embodiments of the helmet and the detailed description accompanying the drawings will better show the various items of the present invention , Features, appearance, and excellent! Brief description Figure 1 is a schematic longitudinal section of an exemplary electronic device. Detailed description The inventors have discovered (especially for the desired properties) that the group covered; in the application of a variety of die bonding, it is extremely advantageous to replace 高 with high: mis-soldering flux. In particular, the composition covered is an alloy that does not contain the wrong alloy, and has a thickness of 2.60 (: "Solid Phase Temperature (and preferably not lower than sinking) and a liquid that is not high at 400 ° C. Phase line temperature. 'The composition covered is binary and its silver content is 2% by weight to 1 8. In the particularly preferred aspect of the present invention, gold, far yuan alloys can be used for flux and
1量%而含鉍量為98重量%至82重量%。在製備所涵蓋組 合物的万法中,將一適當重量(前述)純金屬置於堅固或耐 二、^合态中(例如石墨坩堝)在真空或惰性氣壓下(例如氮氣 或氦氣)加熱至960°C及l〇〇〇t:間直到形成液體溶液。攪拌並 =持其溫度使有足夠之時間以確保兩種金屬完全混合並熔 解。將此熔融之混合物快速的倒進模子冷却至周遭之溫度 而固化,再經由習用_出技術製造成線狀(其中包括加熱 材in到、190 C ),或製成帶狀一其方法是將長方形寬幅之 厚板退火至225-25(TC,然後在同溫度下熱捲。或者,帶條 可被擠出Μ而捲成較薄之〖寸。纟溶化之步驟亦可在空氣 中進行,/、要所形成之熔渣在混合物倒入模子之前被 除。 、四於本發明標的的另一態樣中(特別是需要較高的液相線 溫度時),其涵蓋之組合物可在合金裏包括Ag,其量為7 重f %至1 8重量%而鉍為9 3重量%至8 2重量%。在另一方 面,需要相對較低之液相線溫度時,其涵蓋之組合物可在 合金中包括Ag的量為2重量%至7重量%而鉍為9 8重量%至 93重量% '然而,最多數晶粒黏接應用上一般所採用之組 合物係在合金中,Ag之量為5重量。/。至⑺重量^/❶而…為” 重量%至9 0重量%。 應特別了解到所涵蓋之組合物可使用於當作不含鉛焊 劑,而此焊劑也完全不含以,以為已知不含鉛焊&中共 通之主要組分。並且,雖然依據本發明標的所涵蓋之最適 組合物為二元合金,但也應了解到其替代組合物可三 五 、發明説明( 一 四元、及更南元之合金。 親ΓΓ、’特別適合之替代組合物可包括—種或較多種具氧 性南於合金之氧親和性之化學元素 凡素包括A丨、以、^、以、^^之化予 ρ . ς c Le Cs Hf、h、Mg、Nd、 素之:二Tl、Y、及ΖΓ ’且尚涵蓋在合金中之此等元 別、'辰又力万?大、約10鹏與大約1000 PPm之間。雖不想與特 =理論或機轉連結,但可以注意的是較合金具較高^ ::兀素能減少金屬氧化物十已知金屬氧化物能增加橡 ^或^融焊劑之,面張力),因此,本發明所涵蓋的是當 減)金屬#ι化物的#時’通f將減少炫融焊劑之表 面張力,因而明顯的增加了焊劑之沾濕能力。 在另-例中,可添加-種或更多種之金屬來改善不含錯 焊劑之熱一機械性(例如,熱傳導率、熱膨脹係數、硬 度、糊狀領域、延展性等)。特収所涵蓋之金屬包括·· 銦、錫、#、鋅及鎳。然而,前面提到的金屬之外之各種 金屬也適合使用於本文技術中,只要此類金屬改善了至少 一項熱一機械性。因此,尚可涵蓋之金屬包括:銅、金、1% by weight and the bismuth content is 98% to 82% by weight. In the method for preparing the covered compositions, a suitable weight (as described above) of pure metal is placed in a strong or resistant binary state (such as a graphite crucible) and heated under vacuum or inert gas pressure (such as nitrogen or helium). To 960 ° C. and 1000 t: until a liquid solution is formed. Stir and hold at its temperature to allow sufficient time to ensure that the two metals are fully mixed and melted. This molten mixture is quickly poured into a mold to cool to the surrounding temperature to solidify, and then made into a linear shape (including heating materials in to, 190 C) by conventional technology, or made into a strip-like method. The rectangular wide plate is annealed to 225-25 ° C, and then hot rolled at the same temperature. Alternatively, the strip can be extruded and rolled into a thinner inch. The melting step can also be performed in air. // The slag to be formed is removed before the mixture is poured into the mold. 4. In another aspect of the subject of the present invention (especially when a higher liquidus temperature is required), the composition it covers may be Ag is included in the alloy in an amount of 7 wt% to 18 wt% and bismuth is 93 wt% to 82 wt%. On the other hand, when a relatively low liquidus temperature is required, it covers The composition may include Ag in the alloy in an amount of 2% to 7% by weight and bismuth in an amount of 98% to 93% by weight. However, the composition generally used in most grain bonding applications is in the alloy. , The amount of Ag is 5 weight% to ⑺ weight ^ / ❶ and ... is "weight% to 90 weight%. It is particularly understood that the covered composition can be used as a lead-free flux, and this flux is completely free of, and is considered to be the main component common to lead-free solder & The most suitable composition covered is a binary alloy, but it should also be understood that its alternative composition can be described in the invention (a quaternary, and more Nanyuan alloy. Pro-ΓΓ, 'particularly suitable alternative composition can include —One or more kinds of chemical elements with oxygen affinity that are lower than the oxygen affinity of the alloy. The elements include A ,,,,,,, and ^^, which are converted to ρ. Π c Le Cs Hf, h, Mg, Nd, No .: Two Tl, Y, and ZΓ ', which are still included in the alloy,' Chen Youliwan? Da, about 10 Peng and about 1000 PPm. Although not want to be connected with special = theory or mechanical transfer However, it can be noted that it is higher than the alloy ^ :: Wusu can reduce metal oxides. Known metal oxides can increase rubber ^ or ^ melting flux, surface tension), so what is covered by the present invention is减) Metal # ι 化 的 时时 通通 f will reduce the surface tension of the bright flux, so it is obvious Added the wettability of the flux. In another example, one or more metals can be added to improve the thermal-mechanical properties of the solder without the wrong flux (for example, thermal conductivity, thermal expansion coefficient, hardness, pasty field, Ductility, etc.). Metals covered by the special collection include ... Indium, tin, #, zinc, and nickel. However, various metals other than the aforementioned metals are also suitable for use in the technology herein, as long as such metals are improved At least one thermal-mechanical property. Therefore, the metals that can be covered include: copper, gold,
鍺、及坤。因此,特別涵蓋之金屬包括A %至18重量…其量為98重量%至8/重量;里= 素,其f為0·1重量%至5.0重量%。特別涵蓋之第三元素包 括至少 Au、Cu、Pt、Sb、In、Sn、Ni、Ge、&MZn 中之一。因此,隨著第三元素的特定量,應認知該種合金 具有不低於230 C之固相線溫度(較佳為不低於248。〇,最 佳則為不低於258°C),及不高於400艺之液相線溫度。此類 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公著) -9 - 504427 A7 B7 五、發明説明(7 ) 合金特別涵蓋之用途包括應用於晶粒之黏接(例如:黏接半 導體晶粒至基板上)。因此,本發明涵蓋一電子裝置,其 將包括一半導體晶粒經由一物質連結於一表面,此物質包 含之組合物含有涵蓋之三元(或更高元)合金。關於所涵蓋 的三元合金的生產,其具有描繪於上述之應用中相同考 慮。通常,所涵蓋的是第三元素以適當量添加於二元合金 或二元合金之組分中。 尚應了解的是:為改善一項或-更多物理一化學性質或熱 一機械性而添加化學元素或金屬可依任何順序進行,只要 合金中所有之組分是實質上完全(例如:每一組分至少9 5 %) 熔融,本發明所涵蓋的是:添加之順序不限於本發明的標 的。同樣的,應了解:雖然較佳是銀與鉍在熔解步驟前結 合,但是本發明亦涵蓋:銀與鉍可各自熔融,再將已熔融 之銀與鉍結合。進一步延長加熱步驟至高於銀的熔點溫 度,以便實質上確定組分的完全熔化及混合。應特別了解 到當包含一種或更多種添加元素時,所涵蓋的合金其固相 線溫度會降j氏。因此,具有添加元素之所涵蓋合金將具有 260-255°C、225-250°C、250-245°C、245-235°C,及甚至更低的固 相線溫度。 關於所涵蓋的合金之熱傳導率,依據本發明標的之組合 物具有不低於5 W/mk之熱傳導率,其較佳者為不低於9 W/mk,其最佳者為不低於1 5 W /mk。本發明尚涵蓋適合之 組合物包括具有沾濕力之合金,其沾銀之沾濕力高於0.1 mN,其較佳者為高於0.2 mN,而最佳者為高於0.3mN,此 _-10-_ 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)Germanium, and Kun. Therefore, the metals specifically covered include A% to 18% by weight ... the amount is 98% by weight to 8 /% by weight; lining = prime, and f is from 0.1% to 5.0% by weight. The third element specifically covered includes at least one of Au, Cu, Pt, Sb, In, Sn, Ni, Ge, & MZn. Therefore, with the specific amount of the third element, it should be recognized that the alloy has a solidus temperature of not less than 230 C (preferably not less than 248 °, and most preferably not less than 258 ° C), And no higher than the liquidus temperature of 400 arts. This paper size applies to the Chinese National Standard (CNS) A4 specification (210X 297) -9-504427 A7 B7 V. Description of the invention (7) The uses specifically covered by the alloy include the bonding of grains (for example: bonding Connect the semiconductor die to the substrate). Accordingly, the present invention encompasses an electronic device that will include a semiconductor die attached to a surface via a substance that contains a composition containing the ternary (or higher) alloy covered. Regarding the production of the covered ternary alloys, they have the same considerations as described in the applications described above. Generally, it is covered that the third element is added to the binary alloy or the components of the binary alloy in an appropriate amount. It should also be understood that the addition of chemical elements or metals to improve one or more physical-chemical properties or thermal-mechanical properties can be performed in any order, as long as all components in the alloy are substantially complete (for example: each One component is at least 95%) molten, and the present invention covers that the order of addition is not limited to the subject matter of the present invention. Similarly, it should be understood that although it is preferred that silver and bismuth be combined before the melting step, the present invention also covers that silver and bismuth can be melted separately, and the molten silver and bismuth can be combined. The heating step is further extended to a temperature above the melting point of silver to substantially determine complete melting and mixing of the components. In particular, it should be understood that when one or more additional elements are included, the solidus temperature of the alloys covered will decrease by j °. Therefore, covered alloys with added elements will have 260-255 ° C, 225-250 ° C, 250-245 ° C, 245-235 ° C, and even lower solidus temperatures. Regarding the thermal conductivity of the covered alloys, the subject composition according to the present invention has a thermal conductivity of not less than 5 W / mk, preferably it is not less than 9 W / mk, and the best is not less than 1 5 W / mk. The present invention also covers suitable compositions including alloys with wettability, the wettability of which is higher than 0.1 mN with silver, preferably higher than 0.2 mN, and most preferably higher than 0.3 mN. -10-_ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)
裝 訂Binding
^U4427 A7^ U4427 A7
裝 訂Binding
504427 A7 ____B7 五、發明説明(9 ) 大於260 C。特別佳之替代用途包括以所涵蓋之焊劑連結熱 交換器的組分,以其充當不熔之隔離球或電流/熱能間之 連結。 實施例 由於各種物質之熱膨脹係數不同,因此,·焊劑之連結常 遭受剪力負荷。因此,特別需要合金連結該等具低剪變模 數之物質,使之能因此具有良好的熱機械疲乏抗力。例 如’在晶粒黏接之應用上,具祗·剪變模數及好的熱機械疲 乏性有助於防止晶粒之碎裂,特別是在相對大的晶粒連結 在固體的支架上。 基於已知純金屬彈力模數,A g與B i顯示其部分固體的 可混合性,且A g - B i系統不含中間金屬性或中間相。本發 明所涵蓋的是:室溫下A g - B i合金之剪變模數為1 3 - 1 6 GPa(假定室溫之剪變模數具加成性,亦即:合於混合物規 則)。所涵蓋的合金,在室溫下之剪變模數為1 3 - 1 6 GPa, 與剪變模數是25 GPa的合金Au-25% Sb和Au-20% Sn比 較,特別熳秀(以相同之方法及相同之假設計算),與剪變 模數是2 1 GPa的丁合金(Ag-10% Sb-65% Sn)比較,也 是優秀的,合金丁的剪變模數測量值為22.3 GPa。 用A g - 8 9 % B i合金連結矽晶粒於引腳之測試裝配經15〇〇 次熱老化循環,並無跡象顯示破損,此更支持經計算及觀 察低剪變模數的A g - B i合金。 在測試裝配與其他晶粒黏接之應用裏,焊劑通常均被製 成薄片而放置於晶粒與基板之間而焊接。其後的加熱將溶504427 A7 ____B7 5. Description of the invention (9) is greater than 260 C. Particularly good alternative uses include joining the components of a heat exchanger with a covered flux, which serves as a non-melting isolation ball or a current / thermal energy connection. Example Since the thermal expansion coefficients of various substances are different, solder joints are often subjected to a shear load. Therefore, it is particularly necessary to alloy these low-shear modulus materials so that they can have good resistance to thermal mechanical fatigue. For example, in the application of die bonding, having 祗 · shear modulus and good thermo-mechanical fatigue can help prevent chip breakage, especially when relatively large particles are connected to a solid support. Based on the known elastic modulus of pure metal, Ag and Bi show the miscibility of some solids, and the Ag-Bi system does not contain intermediate metal or mesophase. The present invention covers: the shear modulus of the Ag-Bi alloy at room temperature is 1 3-1 6 GPa (assuming that the shear modulus at room temperature is additive, that is, the rule of mixture) . The alloys covered have a shear modulus of 1 3-1 6 GPa at room temperature, compared with alloys Au-25% Sb and Au-20% Sn with a shear modulus of 25 GPa, especially The same method and the same assumption calculation), compared with a butyl alloy (Ag-10% Sb-65% Sn) with a shear modulus of 2 1 GPa, it is also excellent. The measured value of the shear modulus of the alloy butyl is 22.3 GPa. The test assembly using A g-89% Bi alloy to connect the silicon crystal grains to the pins after 15,000 heat aging cycles showed no signs of damage. This supports the calculation and observation of A g with low shear modulus. -B i alloy. In the application of test assembly and other die bonding, the flux is usually made into a thin sheet and placed between the die and the substrate to be soldered. Subsequent heating will dissolve
五 發明説明Five invention description
線、综融、者h基板先加熱,再放置薄片、 用於區域陣列封裝時接頭。 產生許多一&周、人、、# + 7成《糊水、或其他形式以 焊劑可用於1=:;:^ 類似喷墨而印刷;==從固體,形式蒸發; 於製造接頭。— 、以產生绛劑凸塊陣列而用 ^ l "#i (flux) 4 ^#J ^( 球保持在適當位置直到它二將焊劑 :::使:! 一度’或二== 糊,#連接則可低於坪劑之炫點。使用助坪劑或谭劑 加熱而«ΙΓ球之封裝與區域陣列並列於基板上且經 曰黏接半f體晶粒於封裝或印刷電路板的較佳料,包括 槐’該產生凸塊是藉由透過罩幕印刷焊劑糊、透過 罩恭蒸發焊劑、或將焊劑€鍵至傳導塾之陣列上。依此技 街所產生之凸塊或管柱,可以有均句之組合物,因此當加 寺正個凸塊或官柱溶化形成接頭;或於半導體晶粒表面 的垂直方向不均勾,因此僅部分之突塊或管柱溶化。 到此,不含鉛焊劑的特別具體實施例及應用已經揭露, 然而’對於熟諸此技藝者應該是清楚明白,除了已描 504427 A7 B7 五 發明説明(11Wire, integrated, or h substrate is heated first, and then a thin sheet is placed to be used as a connector for area array packaging. Produce a lot of & week, person, # + 70% "paste, or other forms of solder can be used for 1 =:;: ^ similar to inkjet printing; == evaporation from solid, form; for manufacturing joints. — To create an array of tincture bumps, use ^ l "#i (flux) 4 ^ # J ^ (The ball is held in place until it is the second flux ::: make :! one degree 'or two == paste, #Connection can be lower than the dazzling point of the ping agent. Use ping agent or tan agent to heat and the package of «ΙΓ ball is aligned with the array of substrates on the substrate and the half-body die is bonded to the package or printed circuit board. The best materials include Huai'an. The bumps are generated by printing solder paste through the mask, evaporating the flux through the mask, or bonding the flux to the array of conductive ridges. According to this technology, the bumps or tubes are generated. Columns can have a homogeneous composition, so when a temple or a post melts to form a joint; or the vertical direction on the surface of the semiconductor crystal grains is uneven, so only some of the bumps or columns melt. Therefore, the specific embodiments and applications of lead-free solder have been disclosed, but 'for those skilled in the art, it should be clear, except that 504427 A7 B7 five invention descriptions have been described (11
之外,許多未悖離本發明概念之修改法亦是可能的 此,除了附屬申請專利範圍之核心部分,本發明標的口因 被限制的。再者,在說明書與申請專利範圍中,^、疋不 應以最廣義之方式解說,以求其與上下文諧嘀。有術語 或步驟,意即相關元素、組分、或步騾可呈現’,、二組分、 或與其他並不特別指示之元辛、 王’或使用, 京、,且分、或步騾結合。 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐) •14-In addition, many amendments that do not depart from the concept of the present invention are also possible. In addition to the core part of the scope of the attached patent application, the subject matter of the present invention is limited. Furthermore, in the scope of the description and patent application, ^ and 疋 should not be explained in the broadest way in order to harmonize with the context. There are terms or steps, which means that the related elements, components, or steps can be presented as ', two-component, or with other yuanxin, king' or not specifically indicated, or used, Beijing, and, or steps Combined. This paper size applies to China National Standard (CNS) A4 (210X 297 mm) • 14-
Claims (1)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32489101P | 2001-09-25 | 2001-09-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW504427B true TW504427B (en) | 2002-10-01 |
Family
ID=23265546
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW090119045A TW504427B (en) | 2001-09-25 | 2001-08-03 | Composition, methods and devices for high temperature lead-free solder |
TW091122745A TW586982B (en) | 2001-09-25 | 2002-10-02 | Improved compositions, methods and devices for high temperature lead-free solder |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW091122745A TW586982B (en) | 2001-09-25 | 2002-10-02 | Improved compositions, methods and devices for high temperature lead-free solder |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP1429884B1 (en) |
JP (1) | JP2005503926A (en) |
KR (1) | KR100700232B1 (en) |
CN (1) | CN1558960A (en) |
AU (1) | AU2002334686A1 (en) |
DE (1) | DE60212664T2 (en) |
TW (2) | TW504427B (en) |
WO (1) | WO2003026828A2 (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4639791B2 (en) * | 2004-12-20 | 2011-02-23 | パナソニック株式会社 | Solder material production method |
WO2007055308A1 (en) * | 2005-11-11 | 2007-05-18 | Senju Metal Industry Co., Ltd. | Soldering paste and solder joints |
WO2007075763A1 (en) * | 2005-12-19 | 2007-07-05 | Honeywell International, Inc. | Modified and doped solder alloys for electrical interconnects, methods of production and uses thereof |
CH696344A5 (en) * | 2006-02-22 | 2007-04-30 | Ses Soc En Solaire Sa | Weldable assembly of photovoltaic cells and film support with macro printed circuit uses film layer with holes corresponding with connection points on cells |
JP4822526B2 (en) * | 2006-09-15 | 2011-11-24 | 株式会社豊田中央研究所 | Zygote |
JP5383795B2 (en) * | 2009-04-22 | 2014-01-08 | パナソニック株式会社 | Semiconductor device |
US9211614B2 (en) * | 2010-06-16 | 2015-12-15 | Sumitomo Metal Mining Co., Ltd. | Bi—Al—Zn—based Pb-free solder alloy |
JP5464113B2 (en) * | 2010-10-04 | 2014-04-09 | 住友金属鉱山株式会社 | Pb-free solder alloy containing Ge |
CN104023902B (en) | 2011-12-27 | 2016-05-04 | 千住金属工业株式会社 | Sn-Cu series lead-free solder alloy |
KR101711411B1 (en) | 2013-01-28 | 2017-03-02 | 니혼한다가부시끼가이샤 | Solder alloy for die bonding |
KR20160003078A (en) | 2013-05-03 | 2016-01-08 | 허니웰 인터내셔날 인코포레이티드 | Lead frame construct for lead-free solder connections |
JP6020433B2 (en) * | 2013-12-09 | 2016-11-02 | 富士通株式会社 | Electronic equipment |
CN107151748B (en) * | 2016-03-02 | 2019-08-06 | 广州先艺电子科技有限公司 | A kind of method of smelting of gold-germanium alloy solder |
JP7010099B2 (en) * | 2018-03-20 | 2022-01-26 | 株式会社Gsユアサ | Negative electrode active material, negative electrode and non-aqueous electrolyte power storage element |
FR3087369B1 (en) * | 2018-10-19 | 2021-06-04 | Dehon Sa | SOLDERING ALLOY AND USE OF SUCH ALLOY |
WO2021123896A1 (en) * | 2019-12-20 | 2021-06-24 | Arcelormittal | Metal powder for additive manufacturing |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4709849A (en) * | 1985-11-27 | 1987-12-01 | Fry Metals, Inc. | Solder preform and methods employing the same |
JP3249774B2 (en) * | 1997-06-05 | 2002-01-21 | トヨタ自動車株式会社 | Sliding member |
JP3829475B2 (en) * | 1998-05-13 | 2006-10-04 | 株式会社村田製作所 | Solder composition for joining a Cu base material |
US6281096B1 (en) * | 1999-04-22 | 2001-08-28 | International Rectifier Corp. | Chip scale packaging process |
JP4338854B2 (en) * | 1999-11-25 | 2009-10-07 | 三井金属鉱業株式会社 | Tin-bismuth lead-free solder |
JP3671815B2 (en) * | 2000-06-12 | 2005-07-13 | 株式会社村田製作所 | Solder composition and soldered article |
-
2001
- 2001-08-03 TW TW090119045A patent/TW504427B/en active
-
2002
- 2002-09-25 WO PCT/US2002/030608 patent/WO2003026828A2/en active IP Right Grant
- 2002-09-25 JP JP2003530452A patent/JP2005503926A/en active Pending
- 2002-09-25 KR KR1020047004159A patent/KR100700232B1/en not_active IP Right Cessation
- 2002-09-25 AU AU2002334686A patent/AU2002334686A1/en not_active Abandoned
- 2002-09-25 CN CNA028188055A patent/CN1558960A/en active Pending
- 2002-09-25 DE DE60212664T patent/DE60212664T2/en not_active Expired - Lifetime
- 2002-09-25 EP EP02799642A patent/EP1429884B1/en not_active Expired - Fee Related
- 2002-10-02 TW TW091122745A patent/TW586982B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE60212664T2 (en) | 2007-06-21 |
WO2003026828A2 (en) | 2003-04-03 |
TW586982B (en) | 2004-05-11 |
EP1429884B1 (en) | 2006-06-21 |
EP1429884A4 (en) | 2004-10-20 |
JP2005503926A (en) | 2005-02-10 |
KR100700232B1 (en) | 2007-03-26 |
KR20040035863A (en) | 2004-04-29 |
WO2003026828A3 (en) | 2003-06-19 |
CN1558960A (en) | 2004-12-29 |
EP1429884A2 (en) | 2004-06-23 |
DE60212664D1 (en) | 2006-08-03 |
AU2002334686A1 (en) | 2003-04-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW504427B (en) | Composition, methods and devices for high temperature lead-free solder | |
EP1399600B1 (en) | Compositions, methods and devices for high temperature lead-free solder | |
JP4144415B2 (en) | Lead-free solder | |
JP4051893B2 (en) | Electronics | |
JP2002305213A (en) | Solder foil, semiconductor device, and electronic device | |
JP2001520585A (en) | Lead-free solder | |
US20080118761A1 (en) | Modified solder alloys for electrical interconnects, methods of production and uses thereof | |
US20070138442A1 (en) | Modified and doped solder alloys for electrical interconnects, methods of production and uses thereof | |
US7973412B2 (en) | Semiconductor device using lead-free solder as die bonding material and die bonding material not containing lead | |
US20230126663A1 (en) | Layer structure and chip package that includes the layer structure | |
JP5699472B2 (en) | Solder material, manufacturing method thereof, and manufacturing method of semiconductor device using the same | |
JP3919106B2 (en) | Metal core solder ball of Cu or Cu alloy ball | |
JP2001001180A (en) | Solder and electronic part using the solder | |
Zhang et al. | Assembly of lead-free bumped flip-chip with no-flow underfills | |
JP2005177842A (en) | Brazing material, manufacturing method of semiconductor device using the same and semiconductor device | |
JP2002086294A (en) | Solder alloy and electronic member having solder ball and solder bump | |
JP2009148832A (en) | Composition for high temperature lead-free solder, method and device | |
JP2001113387A (en) | Solder alloy | |
JP2005138174A (en) | Brazing filler metal, semiconductor equipment manufacturing method using the same, and semiconductor equipment | |
JP3705779B2 (en) | Power device, manufacturing method thereof, and tin-based solder material | |
JP3265300B2 (en) | Solder material for semiconductor device, semiconductor device using the same, and method of manufacturing the semiconductor device | |
JP2001138088A (en) | Solder alloy, solder ball and electric member having solder bump | |
JP2007075871A (en) | Brazing filler metal, semiconductor equipment manufacturing method using the same, and semiconductor equipment |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent |