TW487221U - Drying apparatus for wafer - Google Patents
Drying apparatus for waferInfo
- Publication number
- TW487221U TW487221U TW90201115U TW90201115U TW487221U TW 487221 U TW487221 U TW 487221U TW 90201115 U TW90201115 U TW 90201115U TW 90201115 U TW90201115 U TW 90201115U TW 487221 U TW487221 U TW 487221U
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- drying apparatus
- drying
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW90201115U TW487221U (en) | 2001-01-19 | 2001-01-19 | Drying apparatus for wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW90201115U TW487221U (en) | 2001-01-19 | 2001-01-19 | Drying apparatus for wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
TW487221U true TW487221U (en) | 2002-05-11 |
Family
ID=21680724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW90201115U TW487221U (en) | 2001-01-19 | 2001-01-19 | Drying apparatus for wafer |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW487221U (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI683384B (en) * | 2019-01-25 | 2020-01-21 | 奇景光電股份有限公司 | Wafer drying apparatus |
CN111211043A (en) * | 2020-02-27 | 2020-05-29 | 至微半导体(上海)有限公司 | Drying method for improving wafer drying efficiency |
CN111312581A (en) * | 2020-02-27 | 2020-06-19 | 至微半导体(上海)有限公司 | Exhaust method capable of improving wafer drying efficiency |
CN111312580A (en) * | 2020-02-27 | 2020-06-19 | 至微半导体(上海)有限公司 | Micro-amplitude vibration method for high-aspect-ratio graphic wafer |
CN114427781A (en) * | 2020-10-29 | 2022-05-03 | 中国科学院微电子研究所 | Supercritical drying device and supercritical drying equipment |
CN117497461A (en) * | 2023-12-29 | 2024-02-02 | 无锡尚积半导体科技有限公司 | Wafer coating pretreatment device |
-
2001
- 2001-01-19 TW TW90201115U patent/TW487221U/en not_active IP Right Cessation
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI683384B (en) * | 2019-01-25 | 2020-01-21 | 奇景光電股份有限公司 | Wafer drying apparatus |
CN111211043A (en) * | 2020-02-27 | 2020-05-29 | 至微半导体(上海)有限公司 | Drying method for improving wafer drying efficiency |
CN111312581A (en) * | 2020-02-27 | 2020-06-19 | 至微半导体(上海)有限公司 | Exhaust method capable of improving wafer drying efficiency |
CN111312580A (en) * | 2020-02-27 | 2020-06-19 | 至微半导体(上海)有限公司 | Micro-amplitude vibration method for high-aspect-ratio graphic wafer |
CN111312581B (en) * | 2020-02-27 | 2022-07-15 | 至微半导体(上海)有限公司 | Exhaust method capable of improving wafer drying efficiency |
CN111312580B (en) * | 2020-02-27 | 2022-07-15 | 至微半导体(上海)有限公司 | Micro-amplitude vibration method for high aspect ratio graphic wafer |
CN111211043B (en) * | 2020-02-27 | 2022-10-18 | 至微半导体(上海)有限公司 | Drying method for improving wafer drying efficiency |
CN114427781A (en) * | 2020-10-29 | 2022-05-03 | 中国科学院微电子研究所 | Supercritical drying device and supercritical drying equipment |
CN117497461A (en) * | 2023-12-29 | 2024-02-02 | 无锡尚积半导体科技有限公司 | Wafer coating pretreatment device |
CN117497461B (en) * | 2023-12-29 | 2024-04-12 | 无锡尚积半导体科技有限公司 | Wafer coating pretreatment device |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4K | Issue of patent certificate for granted utility model filed before june 30, 2004 | ||
MM4K | Annulment or lapse of a utility model due to non-payment of fees |