TW483295B - Apparatus and method for dry film removal washing - Google Patents

Apparatus and method for dry film removal washing Download PDF

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Publication number
TW483295B
TW483295B TW89124324A TW89124324A TW483295B TW 483295 B TW483295 B TW 483295B TW 89124324 A TW89124324 A TW 89124324A TW 89124324 A TW89124324 A TW 89124324A TW 483295 B TW483295 B TW 483295B
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Taiwan
Prior art keywords
substrate
dry film
item
dewashing
scope
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TW89124324A
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Chinese (zh)
Inventor
Jing-Hung Guo
Sheng-Jr Jang
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Phoenix Prec Technology Corp
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Publication of TW483295B publication Critical patent/TW483295B/en

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Abstract

This invention provides an apparatus and a method for dry film removal washing. A substrate is placed into an automatic material in/out device which has a pivot shaft connecting with a rotating belt, a support plate and a clamping plate. The rotating belt is used to close the support plate and the clamping plate to clamp the substrate through belt displacement and gravity, and move the automatic material in/out device to a soaking tank. The soaking tank is a container to hold reagent solution, and vapor heating and air agitation are employed to bring the reagent solution to a first temperature. The substrate is immersed in the solution for a period of time and then is washed with pressurized alkaline solution through nozzle to peel green paint off. The reagent solution on the substrate surface is removed and the residual green paint on the substrate surface is also removed. The substrate is dried. The dry film removal washing is completed after the substrate is removed from the opened automatic material in/out device through belt displacement and gravity.

Description

483295 經濟部智慧財產局員工消費合作社印製 A7 —--------------- 五、發明說明(/ ) 發明領域: 本發明係關於一種乾膜退洗設備及方法,特別是關於一 種利用出人料自動狀裝£以及可達成電路絲面綠漆退洗 之製程方法。 發明背景: 由^半導體產業之相關技術之快速提昇,使得積體電路 (1C)之每一製程步驟更加複雜,亦更顯示出每一製程之重要 性。 ,習用之乾膜退洗技術係利用人工推車運送基板,將基板 運送至/又/包槽後,一片一片地將基板放置入浸泡槽之藥液 中,操作人員可能會碰觸賴液,或是吸人基板及藥液化學 作用所產生之氣體,而危及身體安全。 進而一連串之高壓清洗步驟,操作人員一不慎就會危及 自身及廠房之安全,而清除藥液、清除基板殘留以及乾燥等 製程結賴Lx人,使雜作人貞之_藥液及 廢氣機率大增。而步驟間都以人力運送進行,缺乏效率,並 有下述缺點: 1. 各機臺之間係以人卫推車運送’雜之時間太多,機臺之 循環時間(Cycle time)太長。 2. >肖耗太多非必要人力。 3. 谷易造成人為工作誤差(Handingmiss),且浪費管理成 4·污染嚴重。 ' 5.高壓系統中人員有安全之憂慮。 本紙張尺度適用中國國家標準_(CNS)A4規格(21〇x 裝--- (請先閱讀背面之注意事項再填寫本頁) t^T· ;m- 2 483295 A7 B7 五、發明說明(>) 然,目前沒有一整合型設備可統合所有功能以提高效能。 發明之簡要說明: 本發明之主要目的係提供一種乾膜退洗設備,藉由一出 入料自動化裝置完成乾膜退洗之自動化方法及製程。 本發明之次要目的係提供一種乾膜退洗設備及方法,可 同時降低循環時間(Cycle time)、提昇管理效率,增加產能、 減少人手操作(Handing)之失誤及確保人員安全。 為達上述之目的,本發明係提供一種乾膜退洗設備,係 包括有·一迴轉帶,其係介於第一傳動輪以及第二傳動輪之 間作動力傳遞之機構;以及—自動供給出人料 有一樞軸與迴轉帶相連接,包括有一置板以及一 H用又 重力以提供適當開啟或閉合之功效,使一基板得到置放固定 夾持以及開啟取出。 經濟部智慧財產局員工消費合作社印製 •裝—— (請先閱讀背面之注意事項再填寫本頁) *本發明提供之-種乾膜退洗設備,亦可是包括有:一藥 又泡單70,其係至少設—浸泡槽,該浸泡槽為内部具有一 合置工間’可提供置放—藥液之容器,更設有—基板置於藥 液^且可_蒸汽加細及线勝,使絲液溫度加敎 至第一溫度;一藥液清除單元,其係將基板表面藥液中和及 清除;-殘留物清除單元,其係清除基板表面之殘留物,使 =表面雜淨潔;—賴單元,其係實縣除基板水分之 if ’ 轉帶’其係連接以上各單元之傳遞機構,使 疋放置各單元内,且能使基板移動於以上各單元間。 本發明更提供—魏膜退洗方法,將-基減置入-自 3 A7 B7 經 濟 部 智 慧 財 產 局 員 工 消 費 合 作 社 印 製 五、發明說明(> ) ίΐί出人料裝置’該自動供給出人料裝置係設有一樞軸該 轉帶相結合,更包括有-置板以及—夾板,利用 移動位置變換及重力因素’使置板及夾板相閉合以夾 二土板’移動該自動供給出人料裝置至—浸泡槽,浸泡槽 部具有—容置空間,可提供置放驗之容器,且可利 加熱以及空氣勝,使該驗溫度加触帛一溫度, 將基板次入藥液中一適當時間,將基板施以附有喷嘴之高壓 鹼液π洗’使綠漆加以剝離,清除基板表面之藥液後,再加 以清除基絲面之麵之綠漆,實絲板錢,_迴轉帶移動位置變換及重力因素,使得自動供給出入料裝置開啟取 出基板,以完成乾膜之退洗。 為使Μ審查委貞對於本解能有更進-步之瞭解與認 同,茲配合圖式作一詳細說明如後。 圖式之簡要說明: 圖一係本發明乾膜退洗方法實施例。 圖二係本發明迴轉帶及乾膜退洗設備實施例。 Α係本發明自動供給出人料機構開啟之基板置放較佳實 施例。 B係本發明自動供給出人料機構閉合夾絲板之較佳實 施例。 、C係本發明自祕給出入料機構開啟之基板取出前較佳 實施例。 圖三 圖 圖 圖四A係本發明浸泡槽製裎實施時之較佳實施例 -----------_ 裝--- (請先閱讀背面之注意事項再填寫本頁) 483295 A7 B7_ 五、發明說明((f) (請先閱讀背面之注意事項再填寫本頁) 圖四B係本發明浸泡槽製程結束時之較佳實施例。 圖號說明: 10〜自動供給出入料裝置 11〜吸嘴式收放機構 12〜置板 13〜夾板 14〜極轴 20〜浸泡槽 21〜副槽 22〜藥液 23〜容置空間 24〜控制管線 30〜南壓驗液清洗 40〜清除藥液 經濟部智慧財產局員工消費合作社印製 41〜高壓自來水清洗 42〜常壓自來水清洗 43〜酸液清洗 44〜常壓自來水清洗 50〜清除殘留 51〜溶劑浸泡 52〜常壓自來水清洗 53〜純水清洗 60〜乾燥 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 五、發明說明 61〜吸乾 62〜吹乾 63〜烘乾 70〜基板 80〜迴轉帶 81〜第一傳動輪 82〜第二傳動輪 發明之詳細說明: 咕參閱圖-所不,係為本發明乾膜退洗方法實施例。一 種乾膜退洗方法,其步軌財·· (a)清參閱如圖二所示,細-迴轉帶80,其係介於第 傳動輪81以及第二傳動輪幻之間作動力傳遞之機構, 將-基板70放置人—自動供給&人料裝置1Q,請參閱圖三 A所示,該自動供給出人料裝置1Q其係設有—樞軸14與迴 轉帶80相連接,包括有-置板12以及-失板13。 該自動供給出入料裝置1〇於入料狀態時係糊樞軸14 與迴轉帶80相連接,此時置板12以及失板13於分離之狀 態,其一中自動供給出入料裝置1〇更設有一吸嘴式收放機構 11 (圖三A未示),其係辨識吸取基板7〇,於基板7〇放置自 動供給出入料裝置10時加以中心定位,當迴轉帶8〇移動時, 請參閱圖二所示,該自動供給出人料裝置1G由於樞轴14传 固疋於迴轉帶80上,由於重力因素,使夾板^下落與置柄 12相閉合以夾持該基板7〇,請參閱圖三B所示。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱] A7 五、發明說明(L) (b) 移動該自祕給^料裝置 參閱圖四A所示,浸泡槽2〇仫盔&王/又浥槽州》月 係為内部具有一容置空間23, 可k供置放一藥液22之容器,且可Μ ^ 装--- (請先閱讀背面之注意事項再填寫本頁) ^ 且了利用瘵汽加熱以及空氣攪 使該減22溫度加熱至第—溫度,該浸泡槽2〇更包括 =副槽2i ’該_ 21係彻—控制管線%與浸泡槽如 目、、接’讀鶴液22麵且域魏22轉二溫度後送 回浸泡槽20,將基板7〇浸入藥液22中一適當時間,該適當 時間約為10至40分鐘’而本較佳實施例中,該適當時間為 25分鐘。 …請參閱圖四B所示,f製程結束時,藥液22係利用控 制管線24全部流回至副槽21,以便利浸泡槽2〇之清洗。 (c) 將基板70施以附有噴嘴之高壓鹼液清洗3〇,使基 板70外部之綠漆加以剝離,其中喷嘴係利用帶式過濾與濾心 過濾’以防止喷嘴阻塞,其中該高壓係約為4至7 kg/cm2, 而本較佳實施例中,5kg/cm2之高壓即可將綠漆大部份剝離。 (d) 清除基板70表面之藥液22,係將基板70作高壓自 來水清洗41後作常壓自來水清洗42,加以酸液清洗43以中 和藥液22,再施以常壓自來水清洗44。 經濟部智慧財產局員工消費合作社印製 其中該高壓係約為4至7 kg/cm2,常壓係約為3至 4kg/cm2,該酸液係利用約2%至5%之HjO4,施以低壓清 洗’該低壓約為2kg/cm2至3kg/cm2,而本較佳實施例中,高 壓自來水係為5kg/cm2之壓力,而常壓自來水係為3kg/cm2 之壓力,酸液清洗43係利用3%之ΗΘ〇4施以2kg/cm2之壓 力作中和藥液22之功效。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 五、發明說明(7) (e)清4基板70絲之殘留之綠漆,係將基板7〇施以 溶劑浸泡Μ後作常壓自來水清洗52,再施以純水清洗%。 其中該常壓係約為3至4kg/cm2,而本較佳實施例中, 常壓自來水係為3kg/cm2之壓力,而純水清洗53係為純水施 以常壓作最後清潔基板70之表面。 (0實施基板70乾燥60,係將基板70作吸乾61、吹乾 62以及烘乾63之處理,其中烘乾63係利用熱風吹乾基板7〇。 (g)明參閱圖二C所示,開啟自動供給出入料裝置1Q, 其自動供給出入料裝置10於出料之狀態,係轉至第二傳動輪 82之一側邊,由於樞軸14係與迴轉帶80相結合,故夾板13 由於重力因素與置板12相分離,此時基板係置放於夾板13 上,利用吸嘴式收放機構11 (圖三C未示),於開啟自動供 給出入料裝置10吸取基板70以防止基板70刮傷取出。 由上5兒明’本發明之一種乾膜退洗設備及方法與習知之不 同處在於,本發明係將現有之乾膜退洗作成自動化設計,其 優點在於: 1·自動化裝置可降低循環時間(CyCie time),大量減少作業時 間。 2·減少人力資源、作業成本之浪費,並降低污染。 3.提昇管理效率,增加產能。 4減少人手操作之失誤(Handing Missy。 5·步驟中多項係於高壓系統作業,利用自動化裝置可確保人 貝之安全。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 483295 A7 B7 五、發明說明(?) 以上說明充分顯示出本發明之目的及功效上均深富實施 之進步性,極具產業之彻價值,且為目前市面上所未見之 新創作’誠已符合專利法中所規定之發明專利要件,原依法 提出申請’謹請貴審查委員惠予審視,並賜准專利為禱。 以上所述係顧-較佳實施例詳細說明本發明,而非限 制本發明之範圍,而且熟知此類技藝人士皆能明瞭,適^ 作些微的改變及調整,仍將不失本發明之要義所在,^脫 離本發明之精神和範圍。 ---X I I I I I I I · 1 - (請先閲讀背面之注意事項再填寫本頁) % 經濟部智慧財產局員工消費合作社印製483295 Printed A7 by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs ----------------- V. Description of the Invention (/) Field of the Invention: The present invention relates to a dry film dewashing equipment and method In particular, it relates to a manufacturing method that uses automatic material loading and the washing-out of the green paint on the circuit wire surface. Background of the Invention: The rapid advancement of related technologies in the semiconductor industry makes each process step of the integrated circuit (1C) more complicated, and it also shows the importance of each process. The conventional dry film unwashing technology uses a manual cart to transport the substrate, and after the substrate is transported to the /// package tank, the substrate is placed in the chemical solution of the immersion tank one by one, and the operator may touch the liquid. Or inhale the gas generated by the chemical action of the substrate and the chemical liquid, which endangers the body safety. Furthermore, a series of high-pressure cleaning steps, the operator will endanger the safety of themselves and the plant if they are not careful, and the processes of removing chemical liquid, removing substrate residues, and drying rely on Lx people, making mixed people _ chemical liquid and waste gas. increase. The steps are carried by humans, which is inefficient and has the following disadvantages: 1. There is too much time to transport between various machines by human carts, and the cycle time of the machines is too long. . 2. > Xiao consumes too much unnecessary labor. 3. Gu Yi caused human working error (Handingmiss), and waste management became 4. Pollution is serious. '5. People have concerns about safety in high-pressure systems. This paper size applies to China National Standard (CNS) A4 specification (21〇x pack --- (Please read the precautions on the back before filling out this page) t ^ T ·; m- 2 483295 A7 B7 V. Description of the invention ( >) Of course, there is currently no integrated device that can integrate all functions to improve efficiency. Brief description of the invention: The main purpose of the present invention is to provide a dry film dewashing device, which completes the dry film dewashing by an automatic feeding and discharging device. Automation method and manufacturing process. A secondary object of the present invention is to provide a dry film dewashing equipment and method, which can simultaneously reduce cycle time, improve management efficiency, increase production capacity, reduce errors and ensure manual operation. Personnel safety. To achieve the above-mentioned object, the present invention provides a dry film dewashing device, which includes a revolving belt which is a mechanism for transmitting power between the first transmission wheel and the second transmission wheel; and —Automatically feeding and unloading materials. A pivot is connected to the revolving belt, which includes a plate and a gravitational force to provide proper opening or closing effect, so that a substrate can be placed, fixed and clamped. Open and take out. Printed and installed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-(Please read the precautions on the back before filling out this page) * This invention provides a dry film de-washing equipment, which can also include: a medicine Another bubble list 70, which is provided with at least-soaking tank, which has a built-in workshop 'can provide storage-medical liquid container, and more-the substrate is placed in the medical liquid ^ and steam can be added Thin and fine, increase the temperature of the silk liquid to the first temperature; a chemical liquid removal unit, which neutralizes and removes the chemical liquid on the surface of the substrate;-a residue removal unit, which removes the residue on the surface of the substrate, so that = The surface is clean and clean;-Lai unit, which is an if 'revolving belt' that removes the moisture of the substrate in the county. It is a transmission mechanism that connects the above units, so that the 疋 is placed in each unit, and the substrate can be moved between the above units. The present invention further provides a Wei film washing and washing method, which will be based on-A 3 B7 printed by the consumer property cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention Unloading device system There is a pivot combined with the rotating belt, and it also includes-set plate and-plywood, using the movement position transformation and gravity factors to 'close the set plate and plywood to clamp the two soil plates' to move the automatic feeding device to- The immersion tank has a accommodating space, which can provide a container for inspection, and can be heated and aired, so that the inspection temperature can be increased by one temperature, and the substrate is then put into the chemical solution for an appropriate time. The substrate is subjected to high pressure alkaline liquid π washing with a nozzle to peel the green paint. After removing the chemical liquid on the surface of the substrate, the green paint on the surface of the base silk surface is removed. And the gravity factor, so that the automatic feeding and discharging device is opened to take out the substrate, so as to complete the dry film unwashing. In order to allow the M review committee to further understand and agree with this solution, a detailed description is given below in conjunction with the drawings. Brief description of the drawings: FIG. 1 is an embodiment of the dry film dewashing method of the present invention. FIG. 2 is an embodiment of a rotary belt and a dry film dewashing device according to the present invention. A is a preferred embodiment of the substrate placement of the automatic feeding and discharging mechanism of the present invention. B is a preferred embodiment of the closed wire clamping plate of the automatic feeding and discharging mechanism of the present invention. And C are preferred embodiments of the present invention before taking out the substrate opened by the feeding mechanism. Figure 3, Figure 4 and Figure 4A are the preferred embodiments of the immersion tank of the present invention when it is implemented -----------_ Installation --- (Please read the precautions on the back before filling this page) 483295 A7 B7_ V. Description of the invention ((f) (Please read the notes on the back before filling out this page) Figure 4B is the preferred embodiment at the end of the immersion tank process of the present invention. Figure No. Description: 10 ~ Automatic feeding in and out Feeding device 11 ~ Nozzle type retracting mechanism 12 ~ Setting plate 13 ~ Plywood 14 ~ Polar shaft 20 ~ Soaking tank 21 ~ Sub tank 22 ~ Medicine solution 23 ~ Receiving space 24 ~ Control line 30 ~ South pressure test solution cleaning 40 ~ Removed by medicinal solution Intellectual Property Bureau of the Ministry of Economic Affairs, Printed by Consumer Cooperatives 41 ~ High-pressure tap water washing 42 ~ Atmospheric tap water washing 43 ~ Acid solution washing 44 ~ Atmospheric tap water washing 50 ~ Residue removal 51 ~ Solvent soaking 52 ~ Atmospheric tap water washing 53 ~ Pure water washing 60 ~ Drying This paper size is applicable to Chinese National Standard (CNS) A4 specification (210 X 297 mm) V. Description of the invention 61 ~ Drying 62 ~ Drying 63 ~ Drying 70 ~ Substrate 80 ~ Rotary belt 81 ~ first transmission wheel 82 ~ second transmission wheel Go refer to the figure-what is not, is an embodiment of the dry film dewashing method of the present invention. A dry film dewashing method, its steps are ... (a) Please refer to Figure 2, fine-rotary belt 80, which It is a mechanism for transmitting power between the first transmission wheel 81 and the second transmission wheel. The base plate 70 is placed on the person. The automatic supply & material device 1Q is shown in FIG. 3A. The feeding device 1Q is provided with a pivot 14 connected to the revolving belt 80, including a plate 12 and a lost plate 13. The automatic feeding and discharging device 10 fastens the pivot 14 and the rotation in the feeding state. The belt 80 is connected. At this time, the plate 12 and the lost plate 13 are in a separated state. One of the automatic feeding and discharging devices 10 is further provided with a nozzle type retracting mechanism 11 (not shown in Figure 3A), which is identified. Pick up the substrate 70, and position it at the center when the automatic feeding and discharging device 10 is placed on the substrate 70. When the revolving belt 80 moves, please refer to FIG. 2. The automatic feeding and discharging device 1G is fixed by the pivot 14. Clamped on the revolving belt 80, due to the gravity, the plywood ^ was dropped and closed with the handle 12 to clamp the substrate 7 Please refer to Figure 3B. This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 public love) A7 V. Description of the invention (L) (b) Move the self-secret feeding device Refer to Figure 4 As shown in A, the immersion tank 20 仫 helm & Wang / Yancaozhou is a container with a storage space 23 inside, which can be used to store a medicine solution 22, and can be installed ---- (Please read the precautions on the back before filling in this page) ^ And use the steam heating and air agitation to heat the minus 22 temperature to the first temperature, the immersion tank 20 includes the auxiliary tank 2i 'The _ 21 series Completely—Control the pipeline and the immersion tank, such as the head and the mouth, to connect the 22 sides of the reading crane fluid and the temperature of the Weiwei 22 to two degrees, then return to the immersion tank 20, and immerse the substrate 70 in the medicinal solution 22 for an appropriate time. The appropriate time is about 10 to 40 minutes', and in the preferred embodiment, the appropriate time is 25 minutes. … Please refer to FIG. 4B. At the end of the f process, the chemical solution 22 is completely returned to the auxiliary tank 21 by the control line 24 to facilitate the cleaning of the immersion tank 20. (c) The substrate 70 is subjected to high-pressure alkaline cleaning with a nozzle for 30 to peel off the green paint on the outside of the substrate 70. The nozzle is filtered using a belt filter and a filter to prevent the nozzle from being blocked. About 4 to 7 kg / cm2, and in the preferred embodiment, a high pressure of 5 kg / cm2 can peel off most of the green paint. (d) The chemical solution 22 on the surface of the substrate 70 is cleaned by cleaning the substrate 70 with high-pressure tap water 41 and then with normal pressure tap water 42, acid cleaning 43 to neutralize the chemical solution 22, and normal pressure tap water cleaning 44. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, where the high pressure system is about 4 to 7 kg / cm2, the atmospheric pressure system is about 3 to 4 kg / cm2, and the acid solution uses about 2% to 5% of HjO4. Low pressure cleaning 'The low pressure is about 2kg / cm2 to 3kg / cm2. In the preferred embodiment, the high pressure tap water system is a pressure of 5kg / cm2, and the normal pressure tap water system is a pressure of 3kg / cm2. The acid liquid cleaning system 43 Use 3% of ΗΘ〇4 to apply a pressure of 2kg / cm2 for the effect of neutralizing the medicinal solution 22. This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210 X 297 mm) V. Description of the invention (7) (e) The green paint remaining on 70 substrates of 4 substrates shall be soaked with solvent 70 After that, it was cleaned by tap water at normal pressure and then washed with pure water. The normal pressure system is about 3 to 4 kg / cm2, and in the preferred embodiment, the normal pressure tap water system is a pressure of 3 kg / cm2, and the pure water cleaning 53 system is pure water, and the normal pressure is used to finally clean the substrate 70. The surface. (0) Drying 60 of the substrate 70 is performed by subjecting the substrate 70 to suction drying 61, blow drying 62, and drying 63. The drying 63 is performed by drying the substrate 70 with hot air. (G) Refer to FIG. 2C for details. , Turn on the automatic feeding and discharging device 1Q, and its automatic feeding and discharging device 10 is in the state of discharging, and it is turned to one side of the second transmission wheel 82. Since the pivot 14 is combined with the turning belt 80, the splint 13 The gravity factor is separated from the holding plate 12 at this time, and the substrate is placed on the clamping plate 13 at this time. The suction-type retracting mechanism 11 (not shown in FIG. 3C) is used to open the automatic feeding and discharging device 10 to suck the substrate 70 to prevent The substrate 70 is scratched and taken out. From the above 5 ', the dry film de-washing equipment and method of the present invention is different from the conventional one in that the present invention is an automatic design of the existing dry film de-washing. The advantages are: 1 · The automation device can reduce the cycle time (CyCie time), greatly reduce the operating time. 2. Reduce the waste of human resources, operating costs, and reduce pollution. 3. Improve management efficiency and increase productivity. 4 Reduce manual operation errors (Handing Missy. 5 · Multiple systems in steps For high-pressure system operation, the safety of human shells can be ensured by the use of automatic equipment. The paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 483295 A7 B7 V. Description of the invention (?) The purpose and efficacy of the invention are both rich in the progressiveness of implementation, and have great industrial value, and it is a new creation that has not been seen on the market. 'It has already met the requirements of the invention patent stipulated in the Patent Law. The original application was made according to law. 'I would like to invite your reviewers to review and grant patents. The above is a detailed description of the present invention, rather than limiting the scope of the present invention, and those skilled in the art will understand, Appropriate changes and adjustments will still not lose the essence of the present invention, ^ departure from the spirit and scope of the present invention. --- XIIIIIII · 1-(Please read the precautions on the back before filling this page)% Economy Printed by the Ministry of Intellectual Property Bureau's Consumer Cooperative

Claims (1)

483295 經¾部智慧財產局員工消費合作社印製 A8 B8 C8 D8 申請專利範圍 ι·種乾膜退洗設備,係包括有·· -迴轉帶,其係介於第—傳動輪以及第二傳動輪之間作動 力傳遞之機構;以及 一自動供給出入料機構’其係設有一樞軸與迴轉帶相連 接,包括有-置板以及-夾板,_重力以提供適當開 啟或閉合之功效,使一基板得到置放固定失持以及 取出。 2.如申請專利範圍第1項職之賴退洗設備,其中該基板 係為外部設有綠漆以及電路佈局之電路板。 3·如申請專·圍第丨項所述之乾親洗設備,其中該自動 供給出人料機構更包括有—吸嘴式收放機構,該吸嘴式收 放機構可觸吸取基板,⑽止基板表_傷,且於入料 玫置加以中心定位。 4,一種乾膜退洗設備,係包括有: 藥液π泡單元’其係至少設—浸泡槽,該浸泡槽為内部 具有-容置空間,可提供置放一藥液之容器,更設有一 基,置於驗中,且可顧蒸汽加熱以及空紐摔,使 該藥液溫度加熱至第一溫度;丨 -藥液清除單元,其储基板表賴液巾和及清除; 殘留物清除單元,其係清除基板表面之殘留物,使基板 表面保持淨潔; -乾燥單元,其係實施去除基板水分之機構;以及 一迴轉帶’其係連接各單元之傳遞麟,使基板固定 ’ 豕標準(CNS)A4 規格(21〇 x 297 公f ) -------------裝--------訂---------線 (請先閱讀背面之注意事項再填寫本頁) Α8 Β8 C8 D8 7、專利範圍 5玫置各單元内,且此使基板移動於以上各單元間。 ,申請專概圍第4項所述之乾膜退洗設備,其中該基板 糸為外部設有綠漆以及電路佈局之電路板。 6 專纖圍第4項所述之乾膜退洗設備,其中該藥液 Γ:包單70更包括有—副槽,铜槽侧用—管線與浸泡槽 目連接’以提供藥液流通且加熱藥液至帛二溫度。 申請專利範圍第4項所述之乾膜退洗設備,其中更包括 -驗液β洗單元’其係介於藥液浸泡單元以及藥液清除單 元之間,利用喷嘴產生高壓處理基板表面。 8·如申晴專利範圍第7項所述之乾膜退洗設備,其中喷嘴係 利用帶式過濾與濾心過濾,以防止阻塞。 9. 如申。凊專利範圍第4項所述之乾膜退洗設備,其中藥液清 除單元,更包括有: 壓自來水清洗區,其係_噴嘴產生紐沖淨藥液; 吊S自來水清洗區,其係利用自來水將基板洗淨·,以及 一酸液清洗區,其係彻魏將驗巾和。 10. 如申明專利範圍第9項所述之乾膜退洗設備,其中喷嘴係 利用帶式過濾與渡心過濾,以防止阻塞。 11 ·如申:專利範圍第4項所述之乾膜退洗設備,其中殘留物 清除單元,更包括有: 又泡區’其係將基板表域留物清除; -常壓自來水清洗區,其係_自來水將基板洗淨;以及 -純水清洗區,其係糊純水清雜板表面。 I2·如申明專利範圍第4項所述之乾膜退洗設備,其中乾燥單 1 - -- -1 ml fllf· mu —m Mi I— m (請先閱讀背面之注意事項再填寫本頁) -裝· 訂 經濟部智总財是局員工消費合作社印製483295 A8 B8 C8 D8 printed by ¾ of the Intellectual Property Bureau ’s consumer cooperatives. Patent application scope. • Dry film de-washing equipment, including a rotating belt, which is between the first transmission wheel and the second transmission wheel. A mechanism for transmitting power between them; and an automatic supply / discharge mechanism, which is provided with a pivot shaft connected to the rotating belt, including a plate and a plywood, and gravity to provide proper opening or closing effects, so that The substrate was placed and lost and removed. 2. If the application for the first item of the scope of patent relies on the washing equipment, the substrate is a circuit board with green paint and circuit layout on the outside. 3. The dry hand-washing equipment as described in the application section, wherein the automatic feeding and discharging mechanism further includes a suction nozzle retractable mechanism, which can touch and suck the substrate. Stop the surface of the substrate, and place it at the center of the incoming material. 4. A dry film dewashing device, comprising: a medicinal solution π bubble unit, which is provided with at least an immersion tank, the immersion tank is provided with an accommodation space, and can provide a container for placing a medicinal solution, and more One base is placed in the test, and the temperature of the liquid medicine can be heated to the first temperature by taking into account the steam heating and empty button; 丨-the liquid medicine removing unit, whose storage substrate is covered by liquid towels and removed; the residue is removed A unit that removes residues on the surface of the substrate to keep the surface of the substrate clean;-a drying unit that implements a mechanism to remove moisture from the substrate; and a revolving belt 'which is connected to the transmission line of each unit to fix the substrate' 豕Standard (CNS) A4 specification (21〇x 297 male f) ------------- install -------- order --------- line (please first Read the notes on the back and fill in this page) Α8 Β8 C8 D8 7. The patent range 5 is placed in each unit, and this moves the substrate between the above units. , Apply for the dry film dewashing equipment described in item 4, wherein the substrate 糸 is a circuit board with a green paint and circuit layout on the outside. 6 The dry film dewashing equipment described in item 4 of the special fiber loop, wherein the chemical liquid Γ: the package 70 further includes—the auxiliary tank, the side of the copper tank—the pipeline is connected to the immersion tank 'to provide the circulation of the chemical liquid and Heat the medicinal solution to the second temperature. The dry film dewashing equipment described in item 4 of the scope of the patent application further includes-a test solution β washing unit 'which is located between the medicinal solution immersion unit and the medicinal solution removal unit, and uses a nozzle to generate a high-pressure treatment of the substrate surface. 8. The dry film de-washing equipment as described in item 7 of Shen Qing's patent scope, in which the nozzle is filtered by a belt filter and a filter to prevent clogging. 9. As applied.干 The dry film dewashing equipment described in item 4 of the patent scope, in which the medicinal solution removal unit further includes: a pressurized tap water cleaning zone, which is a nozzle that generates a new flushing medicinal solution; a hanging S tap water cleaning zone, which uses Wash the substrate with tap water, and an acid cleaning area, which is inspected by Che Wei. 10. The dry film dewashing equipment as described in Item 9 of the declared patent scope, in which the nozzles use a belt filter and a cross-flow filter to prevent clogging. 11 · As claimed: The dry film dewashing equipment described in item 4 of the patent scope, wherein the residue removal unit further includes: a bubble zone 'which removes residues from the surface area of the substrate;-a normal pressure tap water washing zone, It is _ tap water to wash the substrate; and-pure water cleaning area, which pastes pure water to clean the surface of the board. I2 · The dry film dewashing equipment as described in item 4 of the declared patent scope, in which the dry sheet 1---1 ml fllf · mu —m Mi I—m (please read the precautions on the back before filling this page) -Assembling and ordering printed by the Ministry of Economic Affairs, Zhizhancai, Bureau of Consumer Cooperatives 483295 A8 B8 C8 D8483295 A8 B8 C8 D8 經濟部智总財.4场員工消費合作社印¾ 元,更包括有: 一吸乾區,係吸取基板表面水分; 一吹乾區,係將基板表面施以冷風乾燥;以及 一烘乾區,係將基板表面施以熱風乾燥。 13· —種乾膜退洗方法,其步驟包括有: u)將一基板放置入一自動供給出入料裝置,該自動供給 出入料裝置設有-置板以及一夾板,使置板及央板相 閉合以夾持該基板; ⑻移動該自動供給出人料裝置至—浸泡槽,浸泡槽係為 内部具有-容置空間,可提供置放藥液之容器,且可 利用蒸汽加熱以及空氣攪拌,使該藥液溫度加熱至第 一溫度,將基板浸入藥液中一適當時間; (Ο將基板施以附有噴嘴之高壓鹼液清洗,使綠漆加以剝 離, (d) 清除基板表面之藥液; (e) 清除基板表面之殘留之綠漆; (0實施基板乾燥; (g)開啟自動供給出入料裝置,使基板開啟取出。 14·如申請專利範圍第13項所述之乾膜退洗方法,其中自動 供給出入料裝置更設有一吸嘴式收放機構,其係辨識吸取 基板’於基板放置自動供給出入料裝置加以中心定位,且 於開啟自動供給出入料裝置,便於吸取基板及防止基板刮 I5·如申凊專利範圍第13項所述之乾膜退洗方法,其中步驟 12 Μ氏張尺度適用中國國家標準(CNS) Α;格(2iGx297公菱 (請先閎讀背面之注意事項再填寫本頁) •裝 訂The Ministry of Economic Affairs ’total wealth is 4 yuan printed by employees' cooperatives. It also includes: a suction area, which absorbs the moisture on the surface of the substrate; a blow drying area, which applies cold air to the substrate surface; and a drying area, The substrate surface is dried with hot air. 13. · A dry film dewashing method, the steps include: u) placing a substrate into an automatic supply and output device, the automatic supply and output device is provided with a plate and a plywood, so that the plate and the central plate The phase is closed to clamp the substrate; ⑻ Move the automatic feeding and discharging device to an immersion tank. The immersion tank is provided with an accommodating space inside, which can provide a container for storing the liquid medicine, and can be heated by steam and air. , The temperature of the chemical solution is heated to the first temperature, and the substrate is immersed in the chemical solution for an appropriate time; (0) the substrate is cleaned with a high-pressure alkaline solution with a nozzle to peel off the green paint, (d) the surface of the substrate is removed Chemical solution; (e) Remove the remaining green paint on the surface of the substrate; (0) dry the substrate; (g) turn on the automatic supply and discharge device to open and take out the substrate. 14. Dry film as described in item 13 of the scope of patent application The unwashing method, in which the automatic feeding and discharging device is further provided with a nozzle type retracting mechanism, which recognizes and sucks the substrate 'on the substrate, the automatic feeding, feeding and feeding device is positioned centrally, and the automatic feeding, feeding and feeding device is opened when the substrate is placed. Easy to pick up the substrate and prevent the substrate from scratching I5. The dry film de-washing method as described in item 13 of the patent application scope, where the 12 MM scale is applicable to the Chinese National Standard (CNS) A; grid (2iGx297 male diamond (please first闳 Read the notes on the back and fill out this page) • Binding ^S295 A8 BS C8 D8 '------------------------------- 、申請專利範圍 (b) 之浸泡槽更包括有一副槽’該副槽係利用管線與浸 泡槽相連接,以提供藥液流通且加熱藥液至第二溫度後送 回浸泡槽,製程結束藥液係回副槽。 16.如申請專利範圍第13項所述之乾膜退洗方法,其中步驟 (c) 之喷嘴係利用帶式過濾與濾心過濾。 17·如申請專利範圍第13項所述之乾膜退洗方法,其中步驟 (d) 清除基板表面之藥液係將基板作高壓自來水清洗後 作幸壓自來水清洗,加以酸液清洗以令和藥液,再施以常 壓自來水清洗。 18·如申請專利範圍第13項所述之乾膜退洗方法,其中步驟 (e) 清除基板表面之殘留之綠漆係將基板施以溶劑浸泡 後作常壓自來水清洗,再施以純水清洗。 19·如申請專利範圍第13項所述之乾膜退洗方法,其中步驟 (f) 實施基板乾燥係將基板作吸乾、吹乾以及烘乾之處 理0 (請先閱讀背面之注意事項再填寫本頁) -裝· 、1T^ S295 A8 BS C8 D8 '------------------------------- The patent application scope (b) of the immersion tank also includes There is a secondary tank. The secondary tank is connected to the immersion tank by a pipeline to provide circulation of the chemical liquid and heat the chemical liquid to a second temperature before returning to the immersion tank. After the process, the chemical liquid system returns to the secondary tank. 16. The dry film dewashing method as described in item 13 of the scope of the patent application, wherein the nozzle in step (c) uses a belt filter and a core filter. 17. The dry film dewashing method as described in item 13 of the scope of the patent application, wherein the step (d) removes the chemical solution on the surface of the substrate by cleaning the substrate with high-pressure tap water and then cleaning with tap water. Liquid medicine, and then wash with normal pressure tap water. 18. The dry film dewashing method as described in item 13 of the scope of the patent application, wherein step (e) removes the remaining green paint on the surface of the substrate. The substrate is immersed in a solvent and then immersed in tap water at normal pressure, followed by pure water. Cleaning. 19. The dry film dewashing method as described in item 13 of the scope of patent application, wherein step (f) implementing the substrate drying process is to dry the substrate by suction, blow drying and drying. 0 (Please read the precautions on the back first. (Fill in this page)-Equipment, 1T 經濟部智葸財產局員工消費合作社印製Printed by the Employees' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs
TW89124324A 2000-11-17 2000-11-17 Apparatus and method for dry film removal washing TW483295B (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107960015A (en) * 2017-12-26 2018-04-24 出惠玲 One kind can the rotating circuit board drying unit of intelligent control
CN114007338A (en) * 2020-07-28 2022-02-01 珠海方正印刷电路板发展有限公司 Cleaning method and cleaning device for printed circuit board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107960015A (en) * 2017-12-26 2018-04-24 出惠玲 One kind can the rotating circuit board drying unit of intelligent control
CN114007338A (en) * 2020-07-28 2022-02-01 珠海方正印刷电路板发展有限公司 Cleaning method and cleaning device for printed circuit board

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