TW466624B - Device and method for producing gas solution and cleaning device - Google Patents

Device and method for producing gas solution and cleaning device Download PDF

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Publication number
TW466624B
TW466624B TW089111515A TW89111515A TW466624B TW 466624 B TW466624 B TW 466624B TW 089111515 A TW089111515 A TW 089111515A TW 89111515 A TW89111515 A TW 89111515A TW 466624 B TW466624 B TW 466624B
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TW
Taiwan
Prior art keywords
gas
ozone
introducing pipe
solution
producing device
Prior art date
Application number
TW089111515A
Other languages
English (en)
Inventor
Nobuaki Haga
Kenichi Mitsumori
Yasuhiko Kasama
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Application granted granted Critical
Publication of TW466624B publication Critical patent/TW466624B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
    • B01F35/7174—Feed mechanisms characterised by the means for feeding the components to the mixer using pistons, plungers or syringes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23124—Diffusers consisting of flexible porous or perforated material, e.g. fabric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/2366—Parts; Accessories
    • B01F23/2368—Mixing receptacles, e.g. tanks, vessels or reactors, being completely closed, e.g. hermetically closed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B01F35/712—Feed mechanisms for feeding fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B01F35/714—Feed mechanisms for feeding predetermined amounts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
    • B01F35/71755—Feed mechanisms characterised by the means for feeding the components to the mixer using means for feeding components in a pulsating or intermittent manner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
    • B01F35/7176—Feed mechanisms characterised by the means for feeding the components to the mixer using pumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
    • B01F35/71805—Feed mechanisms characterised by the means for feeding the components to the mixer using valves, gates, orifices or openings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/75—Discharge mechanisms
    • B01F35/754—Discharge mechanisms characterised by the means for discharging the components from the mixer
    • B01F35/7544—Discharge mechanisms characterised by the means for discharging the components from the mixer using pumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
    • B01F2101/24—Mixing of ingredients for cleaning compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
    • B01F2101/58—Mixing semiconducting materials, e.g. during semiconductor or wafer manufacturing processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23124—Diffusers consisting of flexible porous or perforated material, e.g. fabric
    • B01F23/231244—Dissolving, hollow fiber membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
    • B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
    • B01F23/23761—Aerating, i.e. introducing oxygen containing gas in liquids
    • B01F23/237613—Ozone
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
    • B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
    • B01F23/23764—Hydrogen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
    • B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
    • B01F23/23765—Nitrogen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/0288—Ultra or megasonic jets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/42—Ozonizers

Landscapes

  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)

Description

466624 A8 B8 C8 D8 六、申請專利範圍 上述氣體貯存機構乃具有， 可以令貯存於該氣體貯存機構之氣體之向氣體導入路 排出之速度予以變化之速度可變機構者。 7 · —種溶氣水製造方法，主要係採用申請專利範圍 第1項所述之溶氣水製造裝置之溶氣水製造方法中，其特 徵爲： 以上述切換機構閉合上述氣體導入路而停止自上述氣 體供給源對上述氣體溶解機構之上述氣體之導入之狀態下 ，於上述氣體貯存機構暫時貯存規定量氣體之後，以上述 切換機構而開啓上述氣體導入路而將上述氣體貯存機構內 之貯存氣體排出於上述氣體溶解機構，在於該氣體溶解機 構而使上述氣體與溶媒接觸，由而將上述氣體溶解於上述 溶媒中者。 8 · —種溶氣水製造方法，主要係使用申請專利範圍 第3項所述之溶氣水製造裝置之溶氣水製造方法中，其特 徵爲： 以上述切換機構而閉合上述氣體導入路，停止自上述 氣體供給源之上述氣體溶解機構之上述氣體之導入之狀態 下，在於上述複數之氣體貯存機構中之至少一個氣體貯存 機構中暫時的貯存規定量之氣體，以上述切換機構開啓上 述氣體導入路之後，以上述切換控制機構而將貯存有上述 氣體之氣體貯存機構之至少一個氣體貯存機構內之貯存氣 體排出於上述氣體溶解機構，同時以上述切換·控制機構而 對於其地氣體貯存機構中之至少一個氣體貯存機構地暫時 ^氏張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） ΓΤΙ ： 一 (請先聞讀背面之注意Ϋ項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -rj. 466624 as B8 C8 D8 六、申請專利範圍 地貯存規定量之規定之操作一面適當的選擇氣體貯存機構 地，反複的予以實施，在於上述氣體溶解機構中，使上述 貯存氣體與溶媒互相接觸，以資將上述氣體溶解於上述溶 媒中者。 9 ·如申請專利範圍第7項或第8項所述之溶氣水製 造方法，其中當將上述氣體貯存機構之貯存氣體排出於上 述氣體溶解機構時，至少具有，以規定之流速將上述貯存 氣體流入於上述氣體溶解機構之第1排出操作，及以較上 述規定之流速爲慢之流速而將上述貯存氣體流入於上述氣 體溶解機構之第2排出操作者。 1 0 · —種洗淨裝置，具備有如申請專利範圍第1項 或第3項所述之溶氣水製造裝置，爲其特徵者。 (請先聞讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -4 -
TW089111515A 1999-07-05 2000-06-13 Device and method for producing gas solution and cleaning device TW466624B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19099899A JP3333149B2 (ja) 1999-07-05 1999-07-05 ガス溶解水製造装置およびガス溶解水製造方法ならびに洗浄装置

Publications (1)

Publication Number Publication Date
TW466624B true TW466624B (en) 2001-12-01

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ID=16267172

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089111515A TW466624B (en) 1999-07-05 2000-06-13 Device and method for producing gas solution and cleaning device

Country Status (4)

Country Link
US (1) US6325359B1 (zh)
JP (1) JP3333149B2 (zh)
KR (1) KR100337448B1 (zh)
TW (1) TW466624B (zh)

Cited By (1)

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Publication number Priority date Publication date Assignee Title
TWI421132B (zh) * 2006-03-13 2014-01-01 Kurita Water Ind Ltd 溶解氣體洗淨水之製法、製造裝置及洗淨裝置

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US6743301B2 (en) * 1999-12-24 2004-06-01 mFSI Ltd. Substrate treatment process and apparatus
JP4299974B2 (ja) * 2001-02-01 2009-07-22 株式会社東芝 放射線取扱い施設の構造部品の化学除染方法およびその装置
JP4942125B2 (ja) * 2001-07-26 2012-05-30 住友精密工業株式会社 オゾン処理システム
US7615030B2 (en) * 2003-10-06 2009-11-10 Active O, Llc Apparatus and method for administering a therapeutic agent into tissue
JP4579138B2 (ja) * 2005-11-11 2010-11-10 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP2011035300A (ja) * 2009-08-05 2011-02-17 Asahi Sunac Corp 洗浄装置、及び洗浄方法
JP5533312B2 (ja) * 2010-06-16 2014-06-25 澁谷工業株式会社 除染液供給装置
GB2496010B (en) * 2011-10-25 2017-12-13 Headmaster Ltd Producing or dispensing liquid products
KR101307245B1 (ko) * 2012-03-23 2013-09-11 주식회사 엠씨테크 급수밸브와 가스밸브가 연동 개폐되는 가스용해장치
US10960441B2 (en) 2018-10-24 2021-03-30 Richard E. Kohler Directed flow pressure washer system, method and apparatus
CN112588137B (zh) * 2020-12-22 2021-10-08 深圳市兆威机电股份有限公司 气液混合机构及具有其的雾化设备
CN113893772B (zh) * 2021-11-08 2023-10-31 理纯(上海)洁净技术有限公司 一种调控气体混合比例的多元气体混合配比装置

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US5971368A (en) * 1997-10-29 1999-10-26 Fsi International, Inc. System to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilized

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Publication number Priority date Publication date Assignee Title
TWI421132B (zh) * 2006-03-13 2014-01-01 Kurita Water Ind Ltd 溶解氣體洗淨水之製法、製造裝置及洗淨裝置

Also Published As

Publication number Publication date
KR20010049707A (ko) 2001-06-15
JP3333149B2 (ja) 2002-10-07
KR100337448B1 (ko) 2002-05-22
JP2001017844A (ja) 2001-01-23
US6325359B1 (en) 2001-12-04

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