TW445381B - Large scale polarizer and polarizer system employing it - Google Patents

Large scale polarizer and polarizer system employing it Download PDF

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Publication number
TW445381B
TW445381B TW87119854A TW87119854A TW445381B TW 445381 B TW445381 B TW 445381B TW 87119854 A TW87119854 A TW 87119854A TW 87119854 A TW87119854 A TW 87119854A TW 445381 B TW445381 B TW 445381B
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Taiwan
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light
polarizer
quartz substrate
patent application
quartz
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TW87119854A
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Chinese (zh)
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Jae-Beom Choi
Byung-Duck Song
Ki-Hyuk Yoon
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Lg Philips Lcd Co Ltd
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Abstract

A polarizer system, comprising: a light source for generating a light; a plurality of quartz substrate parts, each quartz substrate part having one or more quartz substrates, wherein the quartz substrate part partially polarizes the light; a polarizer holder supporting said plurality of quartz substrate parts; and a moving control part coupled to and moving said polarizer holder to uniformly irradiate an area underneath said plurality of quartz substrate parts and said polarizer holder.

Description

五、發明說明(1) 發明領域:V. Description of the invention (1) Field of invention:

本 疋關於—種偏光器及一種偏光系統,特別是關 於使用大尺寸的偏光器及偏光系統。 習知技術說明: 般而 σ ’液晶顯示器(Liquid Crystal Display Device ’簡稱LCD)是由上下兩層面對面的基板夾著填充物 液晶而成。上下兩層的基板分別有電極及在基板面有特定 欲顯示的圖案。在電極間有一個對準層(alignment layer·)以便可使液晶片植入一個傾角。 為了校準此—對準層,可以使用研磨法(rubbing method)光對準法(photo-alignment method)或類似方 法。 研磨法是在基板上置放對準物質,例如聚商^亞〗^ polyimide (PI),並使用摩擦布摩擦基板以在液晶植入—This article is about a kind of polarizer and a polarizing system, especially about using a large-sized polarizer and a polarizing system. Conventional technical description: Generally σ 'Liquid Crystal Display Device' (abbreviated as LCD) is formed by filling a liquid crystal between substrates facing the upper and lower layers. The upper and lower substrates have electrodes and a specific pattern to be displayed on the substrate surface. There is an alignment layer between the electrodes so that the LCD can be implanted at a tilt angle. To calibrate the alignment layer, a rubbing method photo-alignment method or the like can be used. The polishing method is to place an alignment material on the substrate, such as polyshang ^ Asia〗 ^ polyimide (PI), and rub the substrate with a rubbing cloth to implant in the liquid crystal—

個傾角。使用此法可以製造大尺寸的液晶顯示器且可非常 快速地校準此一對準層D 然而,在上述的摩擦過程中在對準層會有微溝 (microgrooves)的缺陷產生,這些微溝會造成光散射及光 相位隨機地失真(dist〇rti〇n)。更會有塵粒及靜電荷在此 —對準層上產生,以致於基板上的薄膜電晶體(thin filE transistor)會受到損害導致生產利益降低。Inclination. Using this method, a large-size liquid crystal display can be manufactured and the alignment layer D can be calibrated very quickly. However, during the above-mentioned friction process, microgrooves defects will be generated in the alignment layer. These microgrooves will cause Light scattering and light phase are randomly distorted (distortin). In addition, dust particles and electrostatic charges will be generated on the alignment layer, so that thin filE transistors on the substrate will be damaged, which will reduce production benefits.

d453 8 1 五 '發明說明(2) 另一種光對準法使用紫外線照射有光對準層的基板以 在液晶植入一個傾角。與摩擦法比較,此光對準法沒有塵 粒及靜電荷產生可避免生產利益降低的問題。而且\此光 對準法可同時地控制此一對準層上的傾角,及均勻地安置 液晶的分子。所以,光對準法有許多優點,包括防止光相 仇隨機地失真或微溝造成的光散射。 此時’一光起偏器將光偏振化以獲得線偏振或部分偏 振的紫外光。特別地’這光起偏器的特徵為儘可能的 大尺寸’為使用紫外線波段,以便有耐高溫及高透光率的 本領<= 然而’習用的偏光器尺寸較小’較難應 晶顯示器的光對準法製程中。同時,由认上v 人了及 J 了由於南分子 (polymer)的加入使得光偏振器有吸妆括 及耐高溫變差,及入射光的波長受到收二產生造成耐用性 發明概述: 本發明的目的是在大尺寸液晶顯 。 中提供大尺寸的偏光器以確保均句的光對準法製程 本發明的另一目的是提供—偏光 ”月 光器來簡化製程及簡化此偏光器的驅動,包含大尺寸的偏 本發明的其他目的及優點部分將系統。 及,部分將從本發明的實施中學習得知隨後的說明中提 利範圍中特別指出的元件及紐人中· ° °從隨附的申請專 本發明的目的及優點d453 8 1 5 'Explanation of the invention (2) Another light alignment method uses ultraviolet rays to irradiate a substrate with a light alignment layer to implant a tilt angle in the liquid crystal. Compared with the friction method, this light alignment method has no dust particles and electrostatic charges, which can avoid the problem of reduced production benefits. Moreover, this light alignment method can simultaneously control the inclination angle on this alignment layer, and evenly arrange the molecules of the liquid crystal. Therefore, the light alignment method has many advantages, including preventing light from being randomly distorted or light scattering caused by micro grooves. At this time, a 'light polarizer' polarizes the light to obtain linearly or partially polarized ultraviolet light. In particular, 'The characteristics of this optical polarizer are as large as possible' is the use of the ultraviolet wavelength band, so that it has the ability to withstand high temperature and high light transmittance < = However, 'the conventional polarizer is smaller in size' is more difficult to respond The light alignment method of the display is in process. At the same time, from the recognition of V and J, the durability of the optical polarizer due to the addition of the South polymer (polymer) and the deterioration of the high temperature resistance, and the wavelength of the incident light are reduced, resulting in durability. Summary of the invention: The purpose is to display on large LCDs. Provide a large-sized polarizer to ensure uniform light alignment process. Another object of the present invention is to provide-polarized "moonlight to simplify the process and drive the polarizer, including other large-sized polarizers. The purpose and advantages will be part of the system. And, part will be learned from the implementation of the present invention. Among the elements and newcomers specifically pointed out in the scope of the following description, the purpose and advantages of the present invention are from the attached application.

A 45381 五、發明說明(3) ;將被瞭解及 ! 為了達 由多數的石 |基板,及一 I多數的石英 本發明 |器包含:一 丨板部含有一 述多數的石 :英基板部的 包括前 I明,並不限 達成。 成這些本發明提及的目的,大尺寸的偏光器是 英基板部’每一基板部門含有一或多數的石英 偏光器的固定器組成,其中固定器支撐著上述 基板部。 的另、方面’一偏光振系統使用大尺寸的偏光 提供光的光源;一多數的石英基板部,每一基 或多數的石英基板;偏光器的固定器支撐著上 英基板’及導引上述光源的光到上述的多數石 裝置。 述的一般說明及隨後的詳細說明只是舉例說 制本發明所請求之申請專利範圍。 發明詳細說明 將以伴隨的參考圖式詳知4^0日^_&13 1固八4細說明本發明的較 儘可能在全部的參考圖式中以相πA权佐貫施例 多1口八〒以相冋的參考編號 同或類似的部分件。 机β瓜知不相 一般而言,使用於光對準法製 進-步使用於偏^ a 的先^紫外線’更 進灾便用於偏先的疋波長為28 011[11 是顯示石英與破瑪的光透射率與 =外線。圖Ϊ 1所示之光透射率特性,石H :波長的特性囷。從圖 如圖2所示—去植啐沾巫—上堝迥口糸外線的。 未偏.派的千仃先照射下,—w姑丄 射光成布魯斯特(Brewster θ )角, 成與入 6 ‘石夬基板部1透射光A 45381 V. Description of the invention (3); will be understood! In order to achieve the majority of the stone | substrate, and a majority of the quartz of the present invention, the device includes: a plate portion containing a majority of the stone: the British substrate portion Including the former I Ming, is not limited to reach. For the purposes mentioned in the present invention, a large-sized polarizer is composed of a holder having a substrate portion containing one or more quartz polarizers, and the holder supports the substrate portion. Another aspect of the 'a polarizing system uses a large-sized polarized light source to provide light; a majority of the quartz substrate, each base or most of the quartz substrate; the holder of the polarizer supports the upper substrate' and the guide The light from the light source reaches the above-mentioned majority stone device. The general description given below and the detailed description that follows are merely examples to illustrate the scope of the claimed patent application. Detailed description of the invention will be known in detail with the accompanying reference pattern 4 ^ 0 ^^ & 13 1 firm eight 4 detailed description of the present invention is as much as possible in all the reference patterns with the phase πA right to implement the example冋 Part numbers with the same or similar reference numbers. The machine β is not familiar. Generally speaking, it is used in the photo-alignment method to make a step forward ^ a ^ UV ′, and it is used for partial 先 疋. The wavelength is 28 011 [11 is showing quartz and broken The light transmittance of M is equal to the outside line. The light transmittance characteristics shown in Fig. Ϊ1, HH: wavelength characteristics 囷. From the figure, as shown in Figure 2—go to the plant, and touch the witch—on the outside of the pot. Unbiased. Pai's Chiba first irradiated, -w aunt, the light is transmitted to the Brewster θ angle, and the light is transmitted 6

第6頁 4 五、發明說明(4) !呈部分偏振而反射光呈線偏振。在圖2A中,符號Θ代表S 波’即是S狀態的偏光’ I s表示S偏振態的光強度。符號 ! t代表P波’即是p狀態的偏光,Ip表示p偏振態的光強 度。在圖2B與2C中,Θ表示石英基板部1的垂直法向量與 入射光之央角。 此時’布魯斯特(Brewster θΒ)角如下所描述。一未 |偏光照射石英基板部1下與入射光成布魯斯特(Brewster㊀ b)角時,反射光的電場向量振動方向與入射面垂直,是成 :線偏振態的。透射光是呈部分偏振態的^ ! 圖2β顯示透射石英基板部1起偏器之偏振度與入射角 ;特性圖’圖2C顯示反射自石英基板部1之偏振度與入射角 特性圖。 I 如圊2Β顯示,透射石英基板部1之光是部分偏振的, 其在布魯斯特角ΘB時,ρ偏振態的光強度Ip大於s偏振態 |的光強度1s。然而,如圖2C顯示,反射自石英基板部1之 |光是線偏振的,其在布魯斯特角06時,只有S偏振態的光 強度I s存在。Page 6 4 5. Description of the invention (4)! Partially polarized and reflected light is linearly polarized. In Fig. 2A, the symbol Θ represents the S-wave ', that is, the polarized light in the S state, and I s represents the light intensity in the S-polarized state. The symbol! T represents P-wave ', which is polarized light in the p-state, and Ip represents light intensity in the p-polarized state. In Figs. 2B and 2C, Θ represents the vertical normal vector of the quartz substrate portion 1 and the central angle of the incident light. The Brewster θB angle at this time is described below. When the polarized light irradiates the Brewster (b) angle of the incident light under the quartz substrate portion 1, the vibration direction of the electric field vector of the reflected light is perpendicular to the incident surface, and is linearly polarized. The transmitted light is partially polarized ^! Fig. 2β shows the polarization degree and incident angle of the polarizer of the transmission quartz substrate section 1; characteristic diagram 'Fig. 2C shows the polarization degree and incident angle characteristic diagram reflected from the quartz substrate section 1. I As shown in 圊 2B, the light transmitted through the quartz substrate portion 1 is partially polarized. At the Brewster angle ΘB, the light intensity Ip of the ρ polarization state is greater than the light intensity 1s of the s polarization state. However, as shown in FIG. 2C, the light reflected from the quartz substrate portion 1 is linearly polarized, and at the Brewster angle 06, only the light intensity Is of the S polarization state exists.

I 另一方面,如圖3A顯示’ 一未偏振的平行光照射下, 丨一多層的石英基板Π置放成與入射光成布魯斯特 ’ (Brewster ΘΒ)角’則不論透射經過或反射自石英基板部 1 1都是線偏振態的。在圖3Α中’符號τ代表Ρ波,即是Ρ狀 I態的偏光,ip表示ρ偏振態的光強度;符號Θ代表S波, 即疋S狀癌的偏光,I s表示s偏振態的光強度,㊀表示多 ;層的石英基板部11的垂直法向量與入射光之夾角。I On the other hand, as shown in FIG. 3A, under the illumination of an unpolarized parallel light, a multilayer quartz substrate is placed at a Brewster's angle (Brewster ΘB) with incident light, regardless of whether it is transmitted or reflected. The quartz substrate portions 11 are all linearly polarized. In FIG. 3A, the symbol τ represents P-wave, which is P-shaped polarized light, and ip represents the light intensity of ρ-polarized state; the symbol Θ represents S-wave, which is polarized light of 疋 S-shaped cancer, and I s represents s-polarized light. The light intensity, ㊀, indicates that the angle between the vertical normal vector of the layered quartz substrate portion 11 and the incident light is large.

445381 ----_ 五 '發明說明(5) 如圖3B顯示, 的,其在布魯斯特 ,。還有如圖3C顯 尺線偏振的,其在 先I s存在。 如前所述,當 射光可以變成線偏 以獲得線偏振或部 圖4 A是本發明 大尺寸偏光器 四方形’及偏光器 石英基板部1 5。 每一石英基板 女置與入射光成布 偏振化。偏光器的 表偏光器的固定器 與習知的偏光 數的石英基板部1 5 這可以應用到大尺 圖4B是圖4A中 沿著大尺寸的偏光 如圖4B顯示, 成與未偏振、平行 所以,入射光是垂 部15由一或多層 魯斯特(B r e w s t e 固定器13包含光 13在X軸與Y轴上 器比較,本發明 與偏光器的固定 寸的液晶顧示器 大尺寸的偏光器 器的切割線I - 11 石英基板部1 5由 入射光呈布魯斯 直固定器1 3的表 透射多層的石英基板部丨丨之光是線偏振 角ΘΒ時透射光只有P偏振態的光Ip存 示,反射自多層的石英基板部n之光也 布魯斯特角ΘΒ時反射光只有s偏振態的 石英基板部的層數超過某特定數後,透 振的。因此控制石英基板部的層數就可 分偏振的透射光。 一實施例的大尺寸偏光器10的平面圖。 1 0是由一或多片石英基板部i 5組成一個 的固疋益1 3开> 成一晶格結構來支持固定 石英基板部組成,當被 Γ ΘΒ)角,會將入射光 吸收物質。標誌a和b代 相鄰的間隔。 的大尺寸偏光器是由多 器1 3連接成晶格構造, 〇 的偏振特性圖,其顯示 之斷面。 偏光器的固定器13固定 特(Brewster ΘΒ)角。 面,因此,石英基板部 I麵445381 ----_ Five 'Explanation of the invention (5) As shown in Figure 3B, it is in Brewster. There is also linear polarization as shown in Fig. 3C, whose previous Is exists. As described above, when the incident light can be linearly polarized to obtain a linear polarization or part, Fig. 4A is a large-size polarizer of the present invention, "square" and the polarizer quartz substrate part 15. Each quartz substrate is polarized in line with the incident light. The polarizer's table polarizer holder and the conventional quartz plate number of polarized light 1 5 This can be applied to a large scale Figure 4B is the polarized light along the large size in Figure 4A as shown in Figure 4B, parallel to the unpolarized, parallel Therefore, the incident light is composed of one or more layers of Brewste holder 15 (Brewste holder 13 contains light 13 on the X-axis and Y-axis. Compared with the polarizer, the fixed-inch LCD monitor has a large size. The cutting line of the polarizer I-11 The quartz substrate portion 15 is a multi-layered quartz substrate portion transmitted by the incident light with the surface of a Bruce straight holder 1 3. The light is a linearly polarized angle ΘB, and the transmitted light is only P-polarized light. Ip shows that the light reflected from the multi-layered quartz substrate portion n is also transparent when the number of layers of the quartz substrate portion whose reflected light is only s-polarized at a Brewster angle ΘB exceeds a certain number. Therefore, the layers of the quartz substrate portion are controlled. The polarized transmitted light can be divided into several numbers. A plan view of the large-scale polarizer 10 of an embodiment. 10 is a solid crystal structure composed of one or more quartz substrate portions i 5 1 3 > into a lattice structure Supports fixed quartz substrate parts composition, when By Γ ΘΒ) angle, the incident light will absorb the material. Marks a and b are next to each other. The large-size polarizer is connected to a lattice structure by multipliers 13, and its polarization characteristic diagram is shown in section. The polarizer holder 13 fixes a Brewster ΘΒ angle. Surface, therefore, the quartz substrate portion I surface

第8頁 L 445381 五、發明說明(6) 星呈布魯斯特(Brewster Θ, 光中’被 被石英基 。此時, 接近100% ,藉控制 因此,如 使用超過 得部分偏 板部。 比較時, 用半永久 石英基板部1 5 板部1 5透射的 固定器13包括 的物質。 石英基板部1 5 欲藉光對準法 某一特定層數 光’石英基板 本發明的大尺 性物質,它的 反射的部 部分光輻 光级收物 的層數可 的特性獲 的多層的 部可使用 寸偏光器 耐用性較 1 5相對於固定器〗3的法向 角。 在未偏振的平行入射 分光會被固定器1 3吸收; 射在校準層50(參見圖5A) 質’且最好包括光吸收率 對在大尺寸偏光器10 以獲得所需求的偏振度。 得線偏光,石英基板部需 石央基板部。如果只欲獲 單層或任意層數的石英基 此外,與習知偏光器 未選擇吸收模態,可以選 好也沒有波長依賴性。 如圖4B顯示,對於大尺寸偏光器1〇,由於固定器^造丨 ,校準層50的位置對大尺寸偏光器的透射光不均勻。也就| 是在石英基板部15的中央部分照度較強,靠近固定器13的 照度較低;且入射光不會直接在固定器丨3下透射。 圖5A是使用圖4A中大尺寸的偏光器的一偏光系統的偏 振特性圖| 一束自燈源7射出的光被冷反射鏡6〗反射到小尺寸的| 偏光器20,再被複眼透鏡31聚焦’再透射另一小尺寸的偏i 光器40。光再經一反射鏡6 3反射到一準直透鏡3 〇,光經再; 準直與聚焦後變成未偏振的平行光。此未偏振的平行光入iPage 8 L 445381 V. Explanation of the invention (6) Brewster Θ (light in the light is covered by quartz. At this time, it is close to 100%. Therefore, if you use more than the partial plate part. The material included in the holder 13 transmitted through the semi-permanent quartz substrate portion 15 and the plate portion 15. The quartz substrate portion 1 5 is a large-scale substance of the present invention which requires a certain number of layers of light by the light alignment method. The reflective part of the part can be obtained by the number of layers of the radiation-level receiver. The multi-layer part can use a polarizer with a durability of 15 compared to the normal angle of the holder. 3. The beam is split at an unpolarized parallel incidence. It will be absorbed by the holder 1 3; it will be incident on the calibration layer 50 (see FIG. 5A) and preferably includes a light absorption ratio on the large-size polarizer 10 to obtain the required degree of polarization. To obtain linear polarization, the quartz substrate needs Shiyang substrate section. If you only want to obtain a single layer or any number of quartz-based substrates, and the conventional polarizer does not choose an absorption mode, you can choose it without wavelength dependence. As shown in Figure 4B, for the large-size polarizer 1 〇, due to fixed ^ 丨, the position of the calibration layer 50 is not uniform for the transmitted light of the large-sized polarizer. That is | is that the illuminance in the central portion of the quartz substrate portion 15 is strong, and the illuminance near the holder 13 is low; Transmit directly under the holder 丨 3. Fig. 5A is a polarization characteristic diagram of a polarizing system using the large-sized polarizer in Fig. 4A | A beam of light emitted from the light source 7 is reflected by the cold mirror 6 to a small size The polarizer 20 is focused by the fly-eye lens 31, and then transmits another small-sized polarizer 40. The light is reflected by a mirror 6 3 to a collimator lens 30, and the light is re-collimated; Into unpolarized parallel light. This unpolarized parallel light enters i

第9頁 t*· 44538 i 丨五、發明說明(7) 丨射一呈布魯斯特(Brewster θ&班 ;1。〇(參見圖6)的石英基:?大尺寸偏光器 I的光透射後經一光罩8f) 刀的光被反射,一部分 層5〇。 +罩8()再輪射在基座75上基板70上的校準 I器90a在X#移動= 二偏j系統包括一個移動控制 「軸移動大尺寸偏光器。雖= i 7〇件’例如反射鏡 '複眼透鏡等果可 的組成與元件。 禾品要可以代換其他 為了在對準層50 放置在與對準層5〇一特照明,大尺寸偏光器!。 固定器的位置決定到達隼°知佳。如圖4Β顯示,依 _是圖心:m!50的光是否均勻。 在光才m _ Μ 4的偏振特性圖。 在九衩準檯上’移動控制器9〇 定方向移動(例如圖4六中χ 尺寸偏先器在特 示,使在产X站轴)—特定距離’如_所 ° 向所有的位置的對準層5 0上比婼通的h 的照明。在圖5B中,曲旋抑矣户止、·旱層5〇上白獲付均勻 照明,虛線是在光對準扃 光對準過程中特定點上的 相鄰固定器的距離。' & #平均照明。標鍵'a是沿X轴 因此’光對準過程使 定器的距離是標認a,移' =,沿X轴相鄰固 回一次或多次在光校準檯/務私0 3使大尺寸偏光器1 0來 方式,沿Y轴相鄰固土 w其中。同樣 9〇b來回移動大尺寸偏 ^祆—b,另一移動控制器 丁侷先以±占(其中(?<<b)。Page 9 t * · 44538 i 丨 V. Description of the invention (7) 丨 A quartz base based on Brewster θ & 1.0 (see Figure 6): After the light of the large-size polarizer I is transmitted The light passing through a mask 8f) is reflected and a part of the layer 50. + Cover 8 () is then rotated on the base plate 70 on the base plate 70. The calibration device 90a moves at X # = the second-polarization system includes a movement control "axis-moving large-size polarizer. Although = 7 pieces' such as reflection Mirror's fly-eye lens and other components and components that can be used. Hepin should be able to replace the other in order to place the alignment layer 50 on the alignment layer 50 with special lighting, a large size polarizer !. The position of the fixer is determined to reach 隼° 知 佳. As shown in Figure 4B, according to _ is the center of the picture: whether the light of m! 50 is uniform. The polarization characteristics of the light m_M 4 in the light. For example, in Fig. 4, the χ-dimension anteriorizer is shown in particular, so that the specific distance 'as indicated by _ is ° to all positions of the alignment layer 50 than the illuminated h. In the figure In 5B, the Quxuan suppresses the household, and the dry layer 50 is uniformly illuminated. The dotted line is the distance between adjacent fixtures at a specific point during the light alignment process. '&Amp;# average Illumination. The key 'a' is along the X axis, so the 'light alignment process' causes the distance of the fixture to be identified by a, shift' =, fixed along the X axis adjacent to one or more times in the light The calibration table / service private 0 3 makes the large-sized polarizer 10 to the way, which is adjacent to the solid soil w along the Y axis. Similarly, the large-sized polarizer is moved back and forth 90 b. ± accounted for (where (? ≪ &b; b).

第10頁 ΑΛ53Β 五、發明說明(8) 於疋▲大尺寸偏光器如上述移動時’不 明會變成均勻的。 ^不均勻的照 雖然圖5B只顯示_中大尺寸偏光器沿χ 圖,同樣的,沿Υ軸的畚品圃定合 的载面 J戰面圖將會有相同的結杲。 圖6是根據本發明另 ^ 平面圖。 S另—實把例的一大尺寸的偏光器的 圖6中 大尺寸偏光器100含有一或多石英美板Jtp 105形成一三角形,此二魚报g央基板郤 ^ π益其g —角形基板部由固定器1〇3所支 撐。基板相5疋由—或多層的石英基板部所组成, 且石奂基板部聯結在一個方向上。 基於上述的—角形组成結構,大尺寸偏光器1〇〇可萨 沿X軸的掃瞎而得到均勻的照明。例如,雖然沿χ軸的掃: L的長度,整個面積上都均等地獲得石英基板部邊線的照 明效應(圊6中寬度為界的面積),同時因固定器1〇3未輕射 照明的區域也均勻覆蓋, 圖7疋根據本發明的另一實施例的一大尺寸的偏光器 的平面圖。 /一大尺寸偏光器110含有一或多石英基板部115形成— =行四邊形結構’及一支撐石英基板部;Π5的偏光器的固 定器113。石英基板部U5是由一或多層的石英基板部所組 成’且石央基板部聯結在~個方向上。 ^基於上述的平行四邊形組成結構,大尺寸偏光器丨】〇 可藉沿X軸的掃瞄而得到均勻的照明。例如,雖然沿X軸的 掃瞒L的長度’整個面積上都均等地獲得石英基板部邊線 五、發明說明(9) 的照明效應(圖6中寬度為W的面積),同時因固定器未輻射 照明的區域也均勻覆盘。此外,與圖6中三角形石英基板 部1 0 5比較’平行四邊形結構的石英基板部11 5較易於組 8是使用圖6與圖7中的大尺寸的偏光器的—偏光系 合0 圖 統 一束自燈源7射出的光被冷反射鏡61反射到小尺寸的 偏光器20,再被複眼透鏡31聚焦,再透射另一小尺寸的偏 光器40。光再經一反射鏡63反射到一準直透鏡3〇,光經 準直與聚焦後變成未偏振的平行光。此未偏振的平行光入 射一呈布魯斯特(Brewster ΘΒ)角置放的大尺寸偏光器 100(或110)(參見圖6及圖7)的石英基板部。一部分的光 反射’一部分的光透射後經一光罩8〇再輻射在基座75上美 :70上的校準層50。連接上—個移動控制器9〇且 : 大尺寸的偏光器。 抒助此 一 了 t的光被反射’一部分的光透射後再輻射校準層 上。在照明光對準層時,移動控制器9〇使得 ^ 器沿X軸移動(參見圖6及圖7 )。 寸偏光 在上述圖6及圖7的偏光系統 四邊形組成石英基板部結構,可 上用-角:或平行 向的運動而獲得均句的照明 二J轴或Υ軸-維方 定器的方向。因此,__堆方ha 向選擇垂直偏光器固 u此 維万向的運動可陪低鬼』@ p以& 數,所以,移動控制器的需求 — 上的二人 本。 κ数里不多可以降低製造成Page 10 ΑΛ53B V. Description of the invention (8) Yu 疋 ▲ When the large-sized polarizer is moved as described above, it is unknown that it will become uniform. ^ Non-uniform photos Although Fig. 5B only shows _ medium and large-sized polarizers along the χ diagram, similarly, the load bearing surface J of the fixed product along the Z axis will have the same result. FIG. 6 is another plan view according to the present invention. In another example, the large-scale polarizer 100 in FIG. 6 contains one or more quartz slabs Jtp 105 forming a triangle, but the two substrates have a g-substrate ^ π 益 其 g-angle The substrate portion is supported by the holder 103. The substrate phase 5 疋 is composed of—or a multi-layered quartz substrate portion, and the stone substrate portions are connected in one direction. Based on the above-mentioned angular-shaped composition structure, the large-sized polarizer 100 Kossa scans along the X axis to obtain uniform illumination. For example, although scanning along the χ axis: L length, the illumination effect of the edge of the quartz substrate portion (area bounded by the width in 圊 6) is equally obtained over the entire area, and because the fixture 10 is not light-lit, The area is also uniformly covered. FIG. 7 is a plan view of a large-size polarizer according to another embodiment of the present invention. / A large-size polarizer 110 includes one or more quartz substrate portions 115 formed-= a row quadrangular structure 'and a holder 113 for the polarizer that supports the quartz substrate portion. The quartz substrate portion U5 is composed of one or more quartz substrate portions', and the central stone substrate portion is connected in one of the directions. ^ Based on the above-mentioned parallelogram composition structure, a large-sized polarizer 丨】 〇 can be uniformly illuminated by scanning along the X axis. For example, although the length “L” along the X-axis is obtained equally over the entire area of the quartz substrate, the lighting effect of the invention description (9) (the area with the width W in FIG. 6), and The area illuminated by radiation is evenly covered. In addition, compared with the triangular quartz substrate portion 105 in FIG. 6, the quartz substrate portion 11 5 in a parallelogram structure is easier to set. 8 The large-sized polarizers in FIG. 6 and FIG. 7 are used. The light emitted from the light source 7 is reflected by the cold mirror 61 to the small-sized polarizer 20, focused by the fly-eye lens 31, and transmitted through another small-sized polarizer 40. The light is reflected by a mirror 63 to a collimating lens 30. After collimating and focusing, the light becomes unpolarized parallel light. This unpolarized parallel light enters a quartz substrate portion of a large-size polarizer 100 (or 110) (see Figs. 6 and 7) placed at a Brewster ΘB angle. A part of the light is reflected and a part of the light is transmitted through a mask 80 and then radiated on the base 75 to the calibration layer 50 on the substrate 70. Connected to a mobile controller 90 and: a large size polarizer. The light that helps this is reflected and a part of the light is transmitted and then radiated onto the calibration layer. When the illumination light is aligned with the layer, moving the controller 90 causes the device to move along the X axis (see FIG. 6 and FIG. 7). Inch polarized light In the above-mentioned polarizing system of Fig. 6 and Fig. 7, the quadrangle constitutes the structure of the quartz substrate, and can be used for -angle: or parallel movement to obtain uniform illumination. The direction of the two J-axis or Υ-dimensional squarer. Therefore, the vertical polarizer in the __ heap square has been selected. The motion of this dimension can be accompanied by low ghosts "@ p 以 & number, so the demand for mobile controllers-the two people above. Not many κ can reduce manufacturing

丨五、發明說明(10) ! 雖然圖5A及圖8的偏光系統中有一大尺寸偏光器及兩 丨個小尺寸偏光器在複眼透鏡前後,它們也可能依情況而使I i用一個、二個或全部的偏光器。偏光器的數量與位置是可| 彈性調整的。例如,當使用一個偏光器的案例時,偏光器I :可置放在圖5A及圖8中的10(100)、20或40。當使用二個偏 ( ;光器的案例時,偏光器可置放在圖5A及圖8中的1〇(1〇〇)及 iⅤ. Description of the invention (10)! Although there are a large-size polarizer and two small-size polarizers before and after the fly-eye lens in the polarizing systems of FIGS. 5A and 8, they may use one or two of I i depending on the situation. Or all polarizers. The number and position of polarizers can be adjusted elastically. For example, when using a polarizer case, the polarizer I: can be placed at 10 (100), 20, or 40 in FIGS. 5A and 8. When two polarizers are used, the polarizers can be placed at 10 (100) and i in Figure 5A and Figure 8.

; I I 20,20及40,或10(100)及40。當使用三個偏光器的案例 | ! . 丨時,偏光器可置放在囷5A及圖8中的10(100)、20及40。 I 對於熟練此種技藝之人而言,先前的描述說明是所揭 !露裝置的一較佳實施例,在不偏離本發明的精神及範圍 | 丨下,本發明可以有不同的變化及改良。 | 對於熟練此種技藝之人而言,本發明偏光器及偏光器 I系統尚有數種修改及變化型,是顯而易見。例如,本文較 I佳實施例說明中偏光器需要置放成布魯斯特(Brewster 丨丨ΘΒ)角,但不必就放置在布魯斯特(Brewster㊀。角上。 |再舉一例,偏光器的移動也不一定在X軸或γ軸,它可以在 I任何方向只要對準層可以均勻的照明。 I 對於熟悉此種技藝之人而言,從本發明所揭露的詳細 |說明及實施’將可輕易完成本發明的其他較佳實施例 1 明及實施例僅是舉例說明而已,真實的範圍及本 丨發明的精神將在隨後的申請專利範圍中界定。; I I 20, 20 and 40, or 10 (100) and 40. In the case of using three polarizers |!. 丨, the polarizers can be placed in 囷 5A and 10 (100), 20, and 40 in Figure 8. I For those skilled in this art, the previous description is the one disclosed! A preferred embodiment of the device, without departing from the spirit and scope of the invention | 丨, the invention can have different changes and improvements . For those skilled in this art, it is obvious that there are several modifications and variations of the polarizer and polarizer I system of the present invention. For example, in the description of the preferred embodiment in this article, the polarizer needs to be placed at the Brewster angle, but it does not need to be placed at the Brewster angle. | For another example, the polarizer is not moved. It must be in the X-axis or γ-axis, it can be uniformly illuminated in any direction as long as the alignment layer. I For those who are familiar with this technology, the detailed | description and implementation from the present invention will be easily completed The other preferred embodiments of the present invention 1 and the examples are merely examples, and the true scope and the spirit of the present invention will be defined in the scope of subsequent patent applications.

I II I

圃式簡單說明 圖式簡單說明 所附囷式與技術說明組虚太直& 、 明 的實施例並共同來解釋本發明的原理說明,說明本發 圖1是顯示石英與姑I 圖。 、興玻璃的先透射率與入射波長的特性 圖2A是一石英基板偏光器的偏振特性圖。 圖2B應是圖2A所示偏光器之偏振與人㈣特性圖 圖3A是一個二或多廣石英基板部偏光器的偏振特性 圖3B及3C是圖3A所示偏光器之偏振與入射角特性圖。 圖4A是根據本發明一實施例的一大尺寸的偏光器平面 圖。 圖4B是圖4A中大尺寸的偏光器的偏振特性圖。 圖5A是使用圖4A大尺寸的偏光器的一偏光系統。 圖5B是圖5A中的偏光系統的偏振特性圖。 i 圖式簡單說明 圖6是根據本發明一實施例的一大尺寸的偏光器的平 面圖。 圖7是根據本發明進一步實施例的一大尺寸的偏光器 的平面圖。 I 圖8是使用圖6或圖7中大尺寸的偏光器的一偏光系 統 〇 圖 號說明 1 石 英 基 板 7 燈 源 10 大 尺 寸 偏 光 器 11 有 多 層 的 石 英 基 板 13 光 起 偏 器 的 固 定 器 15 石 英 基 板 部 20 小 尺 寸 的 偏 光 器 30 準 直 透 鏡 1 31 複 眼 透 鏡 1 I 40 小 尺 寸 的 偏 光 器 50 校 準 層 1 i 61 冷 反 射 鏡 j 63 反 射 鏡 1Brief description of the garden style Brief description of the schematic style The attached formula and technical description group of virtual and straightforward & clear embodiments together explain the principle of the present invention, and explain the present invention. The characteristics of the first transmittance and incident wavelength of Xing glass Figure 2A is a polarization characteristic diagram of a quartz substrate polarizer. Fig. 2B should be the polarization and human characteristics of the polarizer shown in Fig. 2A. Fig. 3A is the polarization characteristic of a polarizer with two or more wide quartz substrates. Illustration. Fig. 4A is a plan view of a large-size polarizer according to an embodiment of the present invention. FIG. 4B is a polarization characteristic diagram of the large-sized polarizer in FIG. 4A. FIG. 5A is a polarizing system using the large-sized polarizer of FIG. 4A. FIG. 5B is a polarization characteristic diagram of the polarizing system in FIG. 5A. i Brief Description of Drawings Fig. 6 is a plan view of a large-size polarizer according to an embodiment of the present invention. Fig. 7 is a plan view of a large-size polarizer according to a further embodiment of the present invention. I FIG. 8 is a polarizing system using the large-sized polarizer in FIG. 6 or FIG. 7. Explanation of drawing numbers 1 Quartz substrate 7 Light source 10 Large-sized polarizer 11 Multi-layered quartz substrate 13 Fixer for optical polarizer 15 Quartz substrate part 20 Small polarizer 30 Collimator lens 1 31 Fly eye lens 1 I 40 Small polarizer 50 Calibration layer 1 i 61 Cold mirror j 63 Mirror 1

第15頁 4 45ύ〇 丨圖式簡單說明 ί 70 基板 75 基座 80 光罩 丨90a 移動控制器 90b 移動控制器 100 大尺寸偏光器 丨103 三角形石英基板部固定器 ' 105 | —或多層石英基板部 110 1 大尺寸的偏光 ! 113 偏光器的固定器 丨115 石英基板部Page 15 4 45ύ〇 丨 Schematic description ί 70 substrate 75 base 80 mask 丨 90a mobile controller 90b mobile controller 100 large polarizer 丨 103 triangular quartz substrate holder '105 | —or multilayer quartz substrate 110 1 large polarized light! 113 polarizer holder 丨 115 quartz substrate

第16頁Page 16

Claims (1)

#45381 六、申請專利範圍 I ί :ι. 一種偏光系統,包括: 一產生光的光源; ;—具有多數的石英基板部,每一基板部具有一個或一個以 上的石英基板,其中該石英基板部部份對該光偏振; 一支撐著上述的多數的石英基板部的偏光器的固定器;及 一耦合移動控制器,均勻移動偏光器的固定器使在其下的 丨 石英基板部、固定器產生均勻的照明。 i I 2.如申請專利範圍第1項所述之偏光系統,其中該石英基 板部為矩形結構。 I 3.如申請專利範圍第1項所述之偏光系統,其中該石英基 板部為三角形結構。. ; ! | ; 4. 如申請專利範圍第1項所述之偏光系統,其中該石英基 板部為平行四邊形結構。 ί I 5. 如申請專利範圍第1項所述之偏光系統,其中該石英基 板部有類似晶格結構。 ! : 6. 如申請專利範圍第1項所述之偏光系統,其中該偏光器 ! ! 丨的固定器包含光吸收物質。 7.如申請專利範圍第1項所述之偏光系統,其中該移動控# 45381 VI. Patent application scope I ί: ι. A polarizing system includes: a light source that generates light;-having a plurality of quartz substrate portions, each substrate portion having one or more quartz substrates, wherein the quartz substrate A portion of the polarized light is polarized; a holder of the polarizer that supports the above-mentioned majority of the quartz substrate portion; and a coupling controller that moves the holder of the polarizer uniformly so that the quartz substrate portion below it is fixed. The device produces uniform lighting. i I 2. The polarizing system according to item 1 of the scope of patent application, wherein the quartz substrate has a rectangular structure. I 3. The polarizing system according to item 1 of the scope of patent application, wherein the quartz substrate has a triangular structure. The polarizing system according to item 1 of the scope of patent application, wherein the quartz substrate has a parallelogram structure. ί I 5. The polarization system according to item 1 of the scope of patent application, wherein the quartz substrate has a lattice-like structure. !: 6. The polarizing system described in item 1 of the scope of patent application, wherein the holder of the polarizer!! 丨 contains a light absorbing substance. 7. The polarizing system according to item 1 of the scope of patent application, wherein the mobile control 第17頁 ,ΗΗΟ Ο ό ί :六、申請專利範圍 ~ ! i |制器使該偏光器的固定器在平行該偏光器的固定器平面的丨 丨方向作單向或來回振動。 丨8 ‘如申請專利範圍第丨項所述之偏光系統,其中該移動控 制器包括:一第一移動控制器使該偏光器的固定器在平行 該偏光器的固定器的平面第一方向運動; | 一第二移動控制器使該偏光器的固定器在平行該偏光器的 !固定器平面第二方向運動,此方向與上述該第一方向垂 I直。 i I 9.如申請專利範圍第丨項所述之偏光系統,其中該石英基 板部能將一入射光部分偏振化。 - t 丨1 0.如申請專利範圍第1項所述之偏光系統,其中該石英基丨 板部能將對綿性極光製造出附屬光。 | I 1 1 · 一種偏光系統,包含: i 一產生光的光源; I i 一透鏡; 一組或一組以上的多數的石英基板部,每一石英基板部具 | 有一或一層以上之石英基板; I 一組或一組以上的支撐著上述一組或一組以上之多數的石i |英基板部的偏光器的固定器’其中上述零或零組以上之該 ! 一組或一組以上之固定器是放置在該光源與該透鏡之間;Page 17, ΗΗΟ Ο ό ί: Sixth, the scope of patent application ~! I | The controller makes the holder of the polarizer vibrate unidirectionally or back and forth in the direction parallel to the plane of the holder of the polarizer.丨 8 The polarization system as described in item 丨 of the patent application range, wherein the movement controller includes: a first movement controller that moves the holder of the polarizer in a first direction parallel to a plane of the holder of the polarizer ; A second movement controller moves the holder of the polarizer in a second direction parallel to the! Fixer plane of the polarizer, and this direction is perpendicular to the first direction. i I 9. The polarizing system according to item 丨 of the patent application scope, wherein the quartz substrate portion can partially polarize an incident light. -t 丨 1 0. The polarizing system as described in item 1 of the scope of patent application, wherein the quartz-based plate portion can produce auxiliary light for a polar aurora. I 1 1 · A polarizing system, comprising: i a light source that generates light; I i a lens; one or more groups of most quartz substrate sections, each quartz substrate section having one or more quartz substrates ; I A group or a group of more than the above supporting one or more of the stone i | polarizer holder of the British substrate section 'where the zero or more of the above should be! One or more than one The holder is placed between the light source and the lens; 第18頁 1 4^538 六、申請專利範圍 以上之偏光器的 及其中上述零或零組以上之該一組或 固定器是放置在該透鏡之後。 1 2 ·—種 系統,包括 一產生 一透鏡 :一組或 I有一或 丨一 Μ或 i 一組以 丨該一組 丨透鏡之 丨且其中 I !固定器 丨一光準 ! 丨一大尺 光的光源; , 一組以上之多數的石英基板部,每一石英基板部具 一層以上之石英基板; 一組以上的偏光器的固定器支撐著相對應的一組或 上之多數的石英基板部,其中上述零或零組以上之 或一組以上的偏光器的固定器是放置在該光源與該 間, 亡述零或零組以上之該一組或—組以上的偏光器的 是放置在該透鏡之後; 直透鏡置於該透鏡之後;及 寸的偏光器置於該準直透鏡之後。 丨二利範圍第12項所述之偏光系統,其中該大尺 丨寸的偏先器匕括多數個石英基板。 ! i 14. 一種偏光系统,包括: i 一產生光的光源; | 一透鏡; 一組或一组以上夕之如,, ^ 夕數的石央基板部’每一石英基板部具P.18 1 4 ^ 538 6. The polarizers above the scope of the patent application and the one or more of the above zero or zero groups are placed behind the lens. 1 2 · A system, including a generation of a lens: a group or I have or 丨 an M or i group of 丨 the group of 丨 the lens and where I! Holder 丨 a light collimation! 丨 a large ruler Light source; a set of more than one quartz substrate section, each quartz substrate section having more than one layer of quartz substrate; a holder of more than one set of polarizers supporting a corresponding set of or most of the quartz substrates Where the fixtures of the above-mentioned zero or more or one or more sets of polarizers are placed between the light source and the space, or the one or more of the one or more sets of polarizers are placed Behind the lens; a straight lens is placed behind the lens; and an inch polarizer is placed behind the collimating lens. The polarizing system according to item 12 of the Erli range, wherein the large-sized polarizer includes a plurality of quartz substrates. i 14. A polarizing system, comprising: i a light source that generates light; | a lens; one or more groups, such as, ^ the number of stone central substrate sections ’each quartz substrate section has 第19頁 ^ 4453 8 1 i六、申請專利範圍 i有一或一個以上之石英基板;及 | 丨一組或一組以上之偏光器的固定器支撐相對應的一組或一 I |組以上之多數的石英基板部,其中上述零或零組以上之該| 丨一或一個以上之該偏光器的固定器是放置在該透鏡之後《 I ,1 5 •如申請專利範圍第1丨項所述之偏光系統,其中該石英 丨基板部對該光部份偏振。 16. 如申請專利範圍第11項所述之偏光系統,其中該石英丨 基板部對該光線性偏振。 17. 如申請專利範圍第1 2項所述之偏光系統,其中該石英 基板部對該光偏振。 丨 I 18. 如申請專利範圍第1 2項戶斤述之偏光系統,其中該石英| 基板部對該光線性偏振。 I I |19.如申請專利範圍第13項所述之偏光系統,其中該石英丨 i基板部部份對該光偏振。 | j I 20·如申請專利範圍第1 3項所述之偏光系統,其中該石英I 基板部對該光線性偏振。 丨 21.如申凊專利範圍第1 4項所述之偏光系統,其中該石英 基板部部份對該光偏振。 2 2.如申凊專利範圍第1 4項所述之偏光系統,其中該基板 部對該光線性偏振。 i 丨23.—種偏光系統,包括: ; 丨一產生光的光源; 丨 I 一多數的石英基板部,每一基板部具有一個或一個以上之1 |石英基板’其中該石英基板對光作線性偏光;Page 19 ^ 4453 8 1 i VI. The scope of patent application i has one or more quartz substrates; and | 丨 One or more sets of polarizer holders support a corresponding set or one | Most quartz substrates, where the above zero or more than one of the above | 丨 one or more of the polarizer's holder is placed behind the lens "I, 1 5 • As described in item 1 of the scope of patent application Polarizing system, wherein the quartz substrate portion polarizes the light portion. 16. The polarization system according to item 11 of the scope of patent application, wherein the quartz substrate portion polarizes the light. 17. The polarizing system according to item 12 of the scope of patent application, wherein the quartz substrate portion is polarized to the light.丨 I 18. According to the polarizing system described in Item 12 of the patent application, wherein the quartz | substrate portion polarizes the light. I I | 19. The polarizing system according to item 13 of the scope of the patent application, wherein the quartz-i substrate portion is polarized to the light. j I 20 · The polarizing system according to item 13 of the scope of patent application, wherein the quartz I substrate portion polarizes the light.丨 21. The polarizing system according to item 14 of the patent application range, wherein the quartz substrate portion is polarized to the light. 2 2. The polarizing system according to item 14 of the scope of patent application, wherein the substrate portion is polarized to the light. i 丨 23.—A kind of polarizing system, including: 丨 a light source that generates light; 丨 I a majority of the quartz substrate portion, each substrate portion has one or more of 1 | Quartz substrate 'wherein the quartz substrate faces light For linear polarization 第20頁 ^ 4 4 5 3s f 丨六、申請專利範圍 一支撐著上述的多數的石英基板部的偏光器的固定器;及 一移動控制器,耦合及均勻移動偏光器的固定器使在其下 i的石英基板部、固定器產生均勻的照明。Page 20 ^ 4 4 5 3s f 丨 VI. Patent application scope-a holder for a polarizer that supports most of the above-mentioned quartz substrates; and a movement controller that couples and evenly moves the holder for the polarizer. The quartz substrate portion of the lower part and the holder generate uniform illumination. 第21頁Page 21
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI616689B (en) * 2013-09-30 2018-03-01 Lg化學股份有限公司 Polarizing plate having locally depolarizied area and method for producing thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI616689B (en) * 2013-09-30 2018-03-01 Lg化學股份有限公司 Polarizing plate having locally depolarizied area and method for producing thereof
US10081141B2 (en) 2013-09-30 2018-09-25 Lg Chem, Ltd. Polarizing plate having local depolarization area and method for manufacturing same

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