KR101211272B1 - Light irradation equipment - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light irradiation apparatus, and more particularly, to a light irradiation apparatus for light alignment treatment of an alignment layer of a liquid crystal display device and a manufacturing method thereof.

The present invention provides a line type light source and a polarizing element thereof so as to be applied to a large area in a light irradiation apparatus for irradiating polarized light to an alignment film on a substrate, thereby providing uniformity of light intensity distribution even on a large area substrate. It can ensure and the orientation alignment degree can be improved in the whole surface of a board | substrate.

Polarizing element, line type, polarization

Description

Light irradiation equipment

1 is a schematic view showing a conventional light irradiation apparatus.

2 is a plan view showing a conventional polarizer of FIG.

3 is a cross-sectional view of the conventional polarizer shown in FIG.

4 is a view showing a light irradiation apparatus according to a first embodiment of the present invention.

5 is a view showing a light irradiation apparatus as a second embodiment according to the present invention;

6 is a view showing light intensity distribution characteristics according to positions of a light irradiation apparatus and a polarizer according to a first embodiment of the present invention.

7 is a view showing light intensity distribution characteristics according to positions of a light irradiation apparatus and a polarizer according to a second embodiment of the present invention.

Fig. 8 is a view in which the number of quartz substrates is increased in the polarizing element of the light irradiation apparatus in the first embodiment of the present invention.

9 is a view of increasing the number of quartz substrates in the polarizing element of the light irradiation apparatus in the second embodiment of the present invention.

10 is a view showing a light irradiation apparatus and a graph showing light intensity distribution characteristics as a third embodiment according to the present invention.

11 is a view showing a light irradiation apparatus and a graph showing light intensity distribution characteristics as a fourth embodiment according to the present invention.

12 is a table showing a rubbing direction and an optical alignment direction of the alignment layer oriented using the light irradiation apparatus according to the present invention.

Description of the Related Art [0002]

200, 300: quartz substrate 201, 301: light source

211 and 311: polarizing elements 213 and 313: alignment layer

215, 315: substrate 222a, 222b, 322a, 322b: bonding surface

330: vibration control unit

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light irradiation apparatus, and more particularly, to a light irradiation apparatus for light alignment treatment of an alignment layer of a liquid crystal display device and a manufacturing method thereof.

In general, a liquid crystal display device arranges two substrates having electrodes formed on one side thereof so that the surfaces on which the two electrodes are formed face each other, injects a liquid crystal material between the two substrates, and then applies a voltage to the two electrodes. By moving the liquid crystal molecules by the generated electric field, the device expresses the image by the transmittance of light that varies accordingly.

Such a liquid crystal display device may be broadly divided into a liquid crystal panel displaying an image and a driving unit for applying a driving signal to the liquid crystal panel, wherein the liquid crystal panel includes first and second substrates bonded to each other with a predetermined space; It consists of a liquid crystal layer injected between the two substrates.

Herein, in the in-plane switching mode liquid crystal display device among the various modes of the liquid crystal display device, the first substrate includes a plurality of gate wires arranged in one direction at a predetermined interval, and the respective angles. A plurality of data wires arranged at regular intervals in a direction perpendicular to the gate wires, a plurality of pixel electrodes formed of a plurality of comb teeth in each pixel region defined by crossing the gate wires and the data wires, and signals of the gate wires The plurality of thin film transistors are switched to transmit the signals of the data lines to the pixel electrodes.

In the pixel area of the first substrate, a plurality of common electrodes alternately formed with the pixel electrode are formed.

The second substrate is provided with a black matrix layer for blocking light in portions other than the pixel region and a color filter layer for expressing color colors.

In addition, alignment films are formed on the first and second substrates.

The rubbing method etc. are used as an orientation method for processing the said orientation film.

The rubbing method is a method of applying an alignment material such as polyimide (PI) to a substrate and then causing mechanical friction with a rubbing cloth to induce an orientation direction. That's how it is.

However, the shape of the microgrooves formed in the alignment layer varies according to the frictional strength, so that the arrangement of the liquid crystal molecules is not uniform. Therefore, there is a concern that the performance of the liquid crystal display device may be degraded due to irregular phase distortion and light scattering. have.

In addition, dust and static electricity generated during the rubbing treatment cause a decrease in yield.

Recently, in order to solve the problem of the rubbing method, a method of manufacturing a liquid crystal alignment layer that does not include physical contact has been studied in various ways. Among them, a photo-alignment technique for producing a liquid crystal alignment film by irradiating polarized UV to a polymer film has been spotlighted.

Unlike the rubbing method, the optical alignment method does not generate dust and static electricity, and may solve the problem of yield reduction. In addition, since the liquid crystal molecules can be uniformly arranged and the alignment degree can be improved over the entire alignment film, problems of phase distortion and light scattering phenomenon can be prevented.

In order to align the alignment film of the liquid crystal display device using such a photo alignment method, a light irradiation apparatus capable of irradiating polarized light of a predetermined wavelength onto the alignment film is used.

1 is a schematic view showing a conventional light irradiation apparatus, Figure 2 is a plan view showing a conventional polarizer of Figure 1, Figure 3 is a cross-sectional view showing a conventional polarizer shown in Fig. It is a figure which shows the optical characteristic.

As shown in FIG. 1, light including ultraviolet rays emitted from the light source 101 is collected by the condensing mirror 103 and reflected by the first reflection mirror 105 to be fly eye lenses 107. Incident.

The light spread out from the fly's eye lens 107 is reflected by the second reflection mirror 109, is incident on the collimator lens 108, collimates, and is then incident on the polarizing element 111.

The polarizing element 111 is made of, for example, a quartz substrate 100 and unpolarized light is emitted from the polarizing element 111 to become polarized light.

The unpolarized light has a Brewster's angle (θ) and is incident on the polarizing element 111, where part of the light is reflected and the other part is transmitted and polarized to the alignment layer 113 formed on the substrate 115. Light is irradiated.

Here, the Brewster angle refers to the inclination angle of the horizontal line and the quartz substrate 100, and refers to the angle at which the difference between the amount of transmitted light and the amount of reflected light is greatest.

2 and 3, the polarizing element 111 includes a quartz substrate part 100 and a support 110 holding the quartz substrate part 100.

The support 110 is preferably made of a material having excellent light absorption, and the quartz substrate part 100 may be formed by stacking one or two or more quartz substrates.

The quartz substrate 100 is inclined to form a Brewster angle with respect to incident light that is unpolarized light, where a is a distance between the support 110 in the X and Y axes of the polarizing element 111. to be.

In addition, the illuminance of the light passing through the polarizer 111 may be uneven depending on the position on the alignment layer 113 due to the support 110.

That is, while the roughness is relatively high in the middle portion of the quartz substrate 100, the closer the support 110 is, the lower the illuminance is and the portion where the support 110 is present does not transmit incident light.

In such a conventional light irradiation apparatus, the light generated by the light source is reflected in a large amount while passing through several optical substrates, thereby generating light loss.

In addition, as the size of the liquid crystal panel increases, a large size of the light source is required, but it is difficult to apply a large area in terms of power consumption.

The present invention provides a line type light source and a polarizing element thereof so as to be applied to a large area in a light irradiation apparatus for irradiating polarized light to an alignment film on a substrate, thereby providing uniformity of light intensity distribution even on a large area substrate. It is an object to provide a light irradiation apparatus that can be secured.

In order to achieve the above object, a first embodiment of a light irradiation apparatus according to the present invention includes a light source for providing unpolarized light; And a polarizing element made of a plurality of quartz substrates that polarize the light provided from the light source, and the incidence surface of the light is obliquely cut and bonded to the light source.

The polarizing element is characterized in that the junction is made of a multi-layer staggered with each other.

The plurality of quartz substrates are inclined such that light incident from the light source is incident at Brewster's angle.

A vibration control unit for vibrating the polarizing element to a predetermined vibration width is characterized in that it further comprises.

The vibration controller may vibrate the polarizing element in a direction perpendicular to the moving direction of the substrate.

The light source is characterized by consisting of a line (line) type.

The plurality of quartz substrates are connected in series in the longitudinal direction of the light source.

In addition, a second embodiment according to the present invention to achieve the above object, and a light source for providing unpolarized light; And a polarizing device polarizing the light provided from the light source, wherein the bonding side surfaces of the plurality of quartz substrates are diagonally cut from the incidence plane of the light to the exit plane and connected to each other.

The oblique cut angle of the bonding side has an angle angle β (acute angle) with respect to the quartz substrate plane, and satisfies 0 ° <β <90 °.

EMBODIMENT OF THE INVENTION Hereinafter, the light irradiation apparatus which concerns on this invention is demonstrated concretely with reference to attached drawing.

4 is a view showing a light irradiation apparatus according to a first embodiment of the present invention.

As shown in FIG. 4, the light irradiation apparatus according to the present invention includes a line-type light source 201 and polarized light for emitting unpolarized light emitted from the light source 201 as polarized light. A device 211 is formed, and the polarizer 211 is formed by successively bonding at least two or more quartz substrates 200.

Here, the plurality of quartz substrates 200 may include a first quartz substrate, a second quartz substrate,... , The n-th quartz substrate, the array direction of the plurality of quartz substrates 200 are arranged in the same line as the longitudinal direction of the light source 201, the side surfaces are bonded to each other.

Therefore, the quartz substrate 200 is successively bonded to the large substrate 215 of M × N size so that the total length ℓ is at least the length (M or N) of one edge of the large substrate 215. By forming the substrate 215 in one direction, the substrate 215 may be moved and scanned to optically align the alignment layer 213 formed on the large substrate 215.

The quartz substrate 200 is inclined at a predetermined angle so that unpolarized light incident from the light source 201 is incident at a Brewster's angle and is supported by the support 210.

In addition, the quartz substrate 200 is joined to the upper and lower surfaces of the substrate which is the incident surface and the exit surface of the light by oblique lines ('/'), and the angle of the side bonding surface of the quartz substrate 200 is vertical. .

At this time, if the angle of the angled upper and lower planes of the first quartz substrate 200a is cut diagonally and bonded (or cut) is α (acute angle), 0 ° <α <90 ° is satisfied. In addition, the angle of the angle at which the joint surface of the second quartz substrate 200b bonded to the first quartz substrate 200a is cut diagonally is also equal to α (acute angle) as diagonal, and satisfies 0 ° <α <90 °. do.

As described above, the light incident on the surface of the quartz substrate 200 having the bonding surface 222a on the upper surface is deteriorated in the illuminance characteristic of the polarization by the bonding boundary portion S, but is firstly separated from the bonding boundary portion S. Since the bonding surface 222a of the quartz substrate 200a and the second quartz substrate 200b is diagonally cut and bonded to each other, the large-area alignment layer 213 is not suddenly degraded at the bonding boundary S. Can be uniformly photo-aligned.

That is, when the first and second quartz substrates 200a and 200b are not bonded by oblique lines but are vertically cut in the same direction as the incident direction of the light beams, the area of the junction boundary S through which the light beams transmit is minimized. However, since the light intensity characteristic of the light is drastically deteriorated, it may be non-uniformly aligned to the alignment layer. Therefore, when the upper and lower planes of the first and second quartz substrates 200a and 200b are bonded by diagonal cutting, the alignment layer There is an advantage that the photo-alignment process can be uniformly processed.

Although not shown, a condensing mirror may be further formed in the vicinity of the light source 201 to collect unpolarized light including emitted ultraviolet rays and to enter the polarizing element 211.

Further, the light irradiation apparatus according to the present invention may further include a plurality of mirrors or lens assemblies having various functions.

The polarized light transmitted through the polarizing element 211 is irradiated onto the substrate 215 with a predetermined polarization direction, and an alignment layer 213 is formed on the substrate 215 to be photo-aligned.

The alignment layer 213 may be any material as long as the material can be aligned by UV light. For example, the alignment layer 213 may be selected from polyvinyl cinnamate (PVCN), poly siloxane cinnamate (PSCN), poly imide (PI), and the like.

As described above, in order to optically align the alignment layer 213, polarized light having an extinction ratio of a predetermined value or more at a predetermined wavelength is required. This is determined according to the physical properties of the alignment film.

The extinction ratio is a ratio of the P-polarized component and the S-polarized component contained in the light. P-polarized light is transmitted and S-polarized light is reflected by the polarized light unpolarized by the polarizing element, thereby becoming partially polarized light having a desired extinction ratio.

The light irradiation apparatus according to the present invention may scan the entire surface of the substrate by moving the substrate 215 using a line-type lamp as the light source 201, or may use a plurality of the line-type light sources. You can also scan the front side simultaneously.

In addition, it may be laminated in multiple layers of the quartz substrate, in which case the light intensity distribution may be more uniform and good when the bonding boundary of each quartz substrate is laminated.

5 is a view showing a light irradiation apparatus as a second embodiment according to the present invention.

5 will be omitted with reference to the drawings shown in FIG.

As shown in FIG. 5, the light irradiation apparatus according to the present invention includes a plurality of quartz substrates 200, and includes a first quartz substrate, a second quartz substrate,. , The n-th quartz substrate, the array direction of the plurality of quartz substrates 200 are arranged in the same line as the longitudinal direction of the light source 201, the side surfaces are bonded to each other.

When the cross section of the bonding boundary S of the quartz substrate 200 is enlarged, the side surfaces are joined diagonally, and the side surfaces of the quartz substrate 200 are cut diagonally in the form of '/'.

At this time, if the angle of the angled side of the first quartz substrate 200a to be cut diagonally is β (acute angle), 0 ° <β <90 ° is satisfied. In addition, the angle of the inner side in which the side of the second quartz substrate 200b bonded to the first quartz substrate 200a is cut diagonally is also equal to β (acute angle) as a diagonal, and 0 ° <β <90 ° Satisfies.

Therefore, the incident light passes through the bonding surface 222b over a predetermined area having an area at the bonding boundary S of the quartz substrates 200a and 200b.

As described above, the light incident on the surface of the quartz substrate 200 having the oblique junction surface 222b is deteriorated by the illumination boundary of polarization by the junction boundary portion S, but the first surface is separated from the junction boundary portion S. Since the bonding surface 222b of the quartz substrate 200a and the second quartz substrate 200b is diagonally cut and bonded to each other, the large-area alignment layer may be formed since the light intensity characteristic of the quartz substrate 200a is not reduced rapidly. 213 can be uniformly photo-aligned.

According to the present invention, when the side surfaces of the first and second quartz substrates 200a and 200b are bonded by diagonally cutting, the alignment layer 213 may be uniformly photo-aligned.

The light irradiation apparatus according to the present invention may scan the entire surface of the substrate by moving the substrate 215 using a line-type lamp as the light source 201, or may use a plurality of the line-type light sources. You can also scan the front side simultaneously.

On the other hand, the present invention may form a light irradiation apparatus to which the first embodiment and the second embodiment are applied simultaneously, and cut and bond the upper and lower planes of the quartz substrate by diagonal lines, and diagonally downward from the bonding side of the quartz substrate. It can be cut and joined.

FIG. 6 is a view showing light intensity distribution characteristics according to positions of a light irradiation apparatus and a polarizer according to a first embodiment of the present invention.

As shown in FIG. 6, the light irradiation apparatus according to the present invention includes a line-type light source 201 and polarized light for emitting unpolarized light emitted from the light source 201 as polarized light. The element 211 is formed, and the polarizing element 211 is formed by bonding the first quartz substrate 200a and the second quartz substrate 200b to each other.

A line type light source 201 is disposed above the polarizer 211 formed as described above, and a substrate on which an alignment layer is formed is disposed below the polarizer 211.

In addition, the substrate moves in a specific direction, and since the movement direction of the substrate and the disposition directions of the line type light source 201 and the quartz substrate 220 are perpendicular to each other, the light source 201 and the polarizer 211. The alignment layer 213 is scanned over the entire surface by photonization.

The unpolarized parallel light rays provided from the line type light source 201 are incident on the polarizing element 211 and then emitted as polarized light and irradiated onto the substrate, and the quartz substrate 200 is non-polarized. Parallel rays are inclined at a predetermined angle so that they can be incident at Brewster's angle.

On the other hand, the surface where the first quartz substrate 200a and the second quartz substrate 200b are bonded to each other in the polarizing element 211 has an oblique bonding surface 222a to which upper and lower planes of the substrate are cut by oblique lines. The region where unpolarized light passes through the bonding surface 222a is called a junction boundary (mn region).

Accordingly, as shown in FIG. 6, when looking at the light intensity distribution according to the position of the substrate by the light irradiation apparatus, it is possible to see a distribution in which the light intensity is lowered at the m-n position, which is the junction boundary.

However, when the light intensity distribution has a value equal to or greater than the reference illuminance value a, the alignment layer is uniformly photo-aligned.

Here, the reference illuminance value a refers to the light illuminance value so as to have good characteristics such that the optical orientation characteristic does not deteriorate, and the light illuminance distribution is compared with the graph K in the case of having a vertical bonding surface in the vertical plane of the substrate. You can see a significant improvement.

As such, the bonding surface of the first quartz substrate 200a and the second quartz substrate 200b is diagonally cut at the junction boundary mn to form a large polarizing element, thereby uniformly orienting the large-area alignment layer. Can be processed, and the alignment alignment is thus improved.

7 is a view showing light intensity distribution characteristics according to positions of a light irradiation apparatus and a polarizer according to a second exemplary embodiment of the present invention.

As shown in FIG. 7, the light irradiation apparatus according to the present invention includes a line-type light source 201 and polarized light for emitting unpolarized light emitted from the light source 201 as polarized light. An element 211 is formed, and the polarizing element 211 is formed by diagonally joining side surfaces of the first quartz substrate 200a and the second quartz substrate 200b.

A line type light source 201 is disposed above the polarizer 211 formed as described above, and a substrate on which an alignment layer is formed is disposed below the polarizer 211.

In addition, the substrate moves in a specific direction, and since the movement direction of the substrate and the disposition directions of the line type light source 201 and the quartz substrate 220 are perpendicular to each other, the light source 201 and the polarizing element 211. As a result, the alignment layer 213 is scanned on the entire surface to perform photo alignment.

Unpolarized parallel light rays provided from the line type light source 201 are incident on the polarizing element 211 and then emitted as partially polarized light and irradiated onto the substrate, and the quartz substrate 200 is applied to the non-polarized light. The polarized parallel rays are tilted at an angle so that they can be incident at Brewster's angle.

The side surface of the polarizing element 211 where the first quartz substrate 200a and the second quartz substrate 200b are bonded is cut in an oblique line to have a bonding surface 222, and unpolarized light is bonded to the bonding surface 222. The region passing through is called a junction boundary (xy region).

Since the junction side portions of the first quartz substrate 200a and the second quartz substrate 200b are diagonally cut and bonded at the junction boundary (xy region) to form a large polarization element, the alignment layer of the large area is uniformly optically aligned. It can be seen that the light intensity distribution is considerably improved compared to the graph K in the case of having a vertical bonding surface in the upper and lower planes and side surfaces of the substrate.

8 is a diagram in which the number of quartz substrates is increased in the polarizing element of the light irradiation apparatus in the first embodiment of the present invention.

A polarizing element for emitting unpolarized light emitted from a light source as polarized light is formed by successive bonding of at least two or more quartz substrates.

Here, the first quartz substrate 200a, the second quartz substrate 200b, and the third quartz substrate 200c are referred to, and the array directions of the plurality of quartz substrates are arranged in the same direction as the length direction of the light source, so that the edges thereof are They are joined diagonally to each other.

On the other hand, when n quartz substrates are connected, (n-1) junction boundaries are formed in the polarizer.

Therefore, the quartz substrates are successively bonded to M × N sized large substrates so as to have a length (M or N) of at least one edge of the large sized substrate so as to move and scan the large substrates in one direction. The alignment film formed on the large substrate can be photo-aligned.

Here, a plurality of junction boundaries mn and m'-n 'are generated, and a junction surface 222a is formed in an oblique line in an upper and lower plane of the quartz substrate, and at the junction boundaries mn and m'-n'. Although the light intensity decreases a predetermined amount, when the light intensity has a reference illuminance value a or more, the alignment characteristic of the alignment layer may be uniformly formed.

9 is a view of increasing the number of quartz substrates in the polarizing element of the light irradiation apparatus in the second embodiment of the present invention.

A polarizing element for emitting unpolarized light emitted from a light source as polarized light is formed by successive bonding of at least two or more quartz substrates.

Here, a plurality of junction boundaries xy and x'-y 'are generated, and are bonded by cutting diagonally on the side of the quartz substrate, and light intensity is predetermined at the Z junction junctions xy and x'-y'. Although lowered, when the reference roughness value a or more, the alignment characteristics of the alignment layer may be uniformly formed.

10 is a view showing a light irradiation apparatus and a graph showing light intensity distribution characteristics as a third embodiment according to the present invention.

As shown in FIG. 10, the light irradiation apparatus according to the present invention includes a line-type light source 301 and polarized light for emitting unpolarized light emitted from the light source 301 as polarized light. The element 311 is formed, and the polarizing element 311 is formed by successively joining the first and second quartz substrates 300a and 300b.

Here, the polarizing element 311 is composed of at least two quartz substrates (300a, 300b) are arranged in a line in the same direction as the longitudinal direction of the light source 301, the side surfaces are bonded to each other, the upper and lower sides of the quartz substrate It is a structure which has the joining surface 322a which the plane cut | disconnected by diagonal line and joined.

The quartz substrates 300a and 300b are supported by a support (not shown) by being inclined at a predetermined angle so that unpolarized light incident from the light source 301 is incident at a Brewster's angle.

In addition, a vibration control unit 330 is connected to the polarizer 311 to cause vibration in the polarizer 311.

The vibration control unit 330 vibrates the polarizer 311 in a predetermined direction at a predetermined cycle, and the vibration width is (± z) up, down, left, or right.

In this case, the vibration direction of the polarization element 311 is preferably oscillated in a direction perpendicular to the moving direction of the substrate 315 on which the alignment layer 313 is formed, and the vibration direction of the polarization element 311 and the substrate 315. The moving direction of may be perpendicular to each other.

A process of photoaligning the alignment layer 313 on the substrate 315 using the light irradiation apparatus configured as described above is as follows.

First, the line type light source 301 and the polarization element 311 inclined at a predetermined angle are disposed at an initial point of the alignment layer 313 on the substrate 315.

In addition, non-polarized light irradiated from the light source 301 passes through the polarization element 311, and photoaligns the alignment layer 313 with the polarized light, wherein the vibration controller 330 performs the polarization element. By vibrating 311, the light intensity characteristic at the junction boundary (mn region) of the polarizer 311 may be further improved to uniformly align the alignment layer 313.

Looking at the light intensity distribution according to the position of the substrate 315 by the light irradiation apparatus, the light intensity is extended by ± z, which is an oscillation width, at the mn position, which is the junction boundary, and the light intensity is lowered between coordinates (mz, n + z). You can see that.

However, according to the third embodiment of the present invention, the amount of light illuminance at the junction boundary and the periphery for a predetermined time is compared with the case where the polarizing element 311 is not vibrated by vibrating with a predetermined vibration width (± z). By having a uniform and low drop width can improve the optical alignment characteristics of the alignment film. Here, the light intensity distribution has a value equal to or greater than the reference illuminance value a.

11 is a view showing a light irradiation apparatus and a graph showing light intensity distribution characteristics as a fourth embodiment according to the present invention.

11 will be omitted with reference to the drawings shown in FIG.

Referring to FIG. 11, the side surface of the quartz substrate has a joining surface 322b that is cut and bonded by diagonal lines.

It is further provided with a vibration control unit 330 connected to the polarizer 311 to cause vibration in the polarizer 311.

The vibration control unit 330 vibrates the polarizing element 311 in a predetermined direction in a predetermined cycle, and the vibration width is (± z) up or down or left and right.

In this case, the vibration direction of the polarization element 311 may vibrate in a direction perpendicular to the moving direction of the substrate 315 on which the alignment layer 313 is formed, and the vibration direction of the polarization element 311 and the substrate 315 may be reduced. The direction of movement may be perpendicular to each other.

The rubbing direction and the inclined direction of the quartz substrate may be perpendicular to each other.

Non-polarized light irradiated from the light source 301 passes through the polarization element 311 and photoaligns the alignment layer 313 with the polarized light, wherein the vibration controller 330 performs the polarization element 311. ) And further improve the light intensity characteristics at the junction boundary (xy region) of the polarizer 311 to uniformly align the alignment layer 313.

Looking at the light intensity distribution according to the position of the substrate 315 by the light irradiation apparatus, the light intensity is extended by ± z, which is an oscillation width, at the xy position, which is the junction boundary, and the light intensity is lowered between coordinates (xz, y + z). You can see that.

However, according to the fourth embodiment of the present invention, the amount of light illuminance at the junction boundary and the periphery for a predetermined time is compared with the case where the polarizing element 311 is not vibrated by vibrating with a predetermined vibration width (± z). By having a uniform and low drop width can improve the optical alignment characteristics of the alignment film. Here, the light intensity distribution has a value equal to or greater than the reference illuminance value a.

12 is a table showing a rubbing direction and a photo alignment direction of the alignment layer oriented using the light irradiation apparatus according to the present invention.

The light irradiation apparatus according to the present invention photoaligns the alignment film on the substrate, and the polarization used for the photoalignment treatment has a predetermined polarization direction.

In this case, the alignment layer may be photo-aligned by irradiating polarized light on the coated alignment layer, or may be subjected to secondary alignment by irradiating polarized light after performing a primary alignment treatment through a rubbing process.

The reason for performing the rubbing orientation and the optical alignment in the second order is that the contact rubbing process is easy to process, but it is difficult to finely control the orientation degree by various process variables related to rubbing, This is because the problem of deterioration of the orientation characteristic can be finely controlled by the non-contact optical alignment process and the orientation characteristic can be improved.

When the primary alignment treatment is performed through the rubbing process, the alignment layer has a rubbing direction in a first direction, and during the secondary alignment treatment, polarized light is irradiated in a second direction perpendicular to the first direction as the rubbing direction. do. At this time, the substrate is moved in a second direction perpendicular to the rubbing direction.

Such a substrate is not moved in a second direction that is always perpendicular to the rubbing direction, and the moving direction of the substrate is determined in consideration of the tilting direction of the quartz substrate and the rubbing direction.

Therefore, since the link ring of the main chain or side chain of the alignment layer is anisotropically decomposed by the polarized light, the alignment direction is determined in the same direction in the rubbing direction.

Although the present invention has been described in detail through specific examples, this is for explaining the present invention in detail, and the light irradiation apparatus and its manufacturing method according to the present invention are not limited thereto, and the technical scope of the present invention It is apparent that modifications and improvements are possible to those skilled in the art.

The present invention has a first effect of improving the production yield by photoaligning the alignment film while using a line type light source and scanning.

In addition, the present invention uses a polarizing element bonded to a plurality of quartz substrates, and by forming the bonding surface in an oblique line with respect to the substrate surface to improve the alignment characteristics by making the light intensity characteristics uniform with respect to the alignment film formed on the large-area substrate There is a second effect.

In addition, the present invention uses a polarizing element by bonding a plurality of quartz substrates with diagonally cut edges, and optically aligns the polarizing element with a predetermined oscillation width, thereby further improving light intensity characteristics with respect to the alignment film formed on the substrate in a large area. By making it uniform, there exists a 3rd effect which further improves an orientation characteristic.

Claims (11)

A light source for providing unpolarized light; And a polarizing element made of a plurality of quartz substrates for polarizing the light provided from the light source and having a junction boundary portion in which an incident surface of the light is diagonally cut and bonded. The polarizing element is formed by laminating the diagonally cut and bonded quartz substrates, wherein the junction boundaries of the stacked quartz substrates have a staggered structure. delete The method of claim 1, And the plurality of quartz substrates are inclined such that light incident from the light source is incident at Brewster's angle. The method of claim 1, And a vibration control unit for vibrating the polarizing element at a predetermined vibration width. The method of claim 1, The light source is a light irradiation apparatus, characterized in that made of a line (line) type. The method of claim 1, The plurality of quartz substrates are connected in series in the longitudinal direction of the light source. A light source for providing unpolarized light; And a polarizing device that polarizes the light provided from the light source, and wherein a junction side of the plurality of quartz substrates is diagonally cut from the incidence plane of the light to the exit plane and connected thereto. The polarizing element is formed by laminating the diagonally cut and bonded quartz substrates, wherein the junction boundaries of the stacked quartz substrates have a staggered structure. delete 8. The method of claim 7, And the quartz substrate is inclined such that light incident from the light source is incident at Brewster's angle. 8. The method of claim 7, An oblique cut angle of the joining side has an angle angle β (acute angle) with respect to the quartz substrate plane, and satisfies 0 ° <β <90 °. 8. The method of claim 7, And a vibration control unit for vibrating the polarizing element at a predetermined vibration width.

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