KR101044473B1 - Apparatus for illuminating polarization - Google Patents

Abstract

The present invention relates to a polarization irradiation apparatus, the polarization irradiation apparatus according to the present invention is disposed adjacent to the linear lamp of the first row, the linear lamp of the first row and a plurality of quartz plates are stacked obliquely in the first direction. A second polarizing plate having a first polarizing plate, a second row linear lamp spaced apart from the linear lamps in the first row, and a second polarizing plate disposed adjacent to the linear lamps in the second row and having a plurality of quartz plates inclined in a second direction. It is configured to include, and by the optical compensation, even in a linear lamp system, it is relatively easy to improve the polarization degree and roughness uniformity, and to facilitate the configuration of the scanning equipment by the continuous conveyance of the glass substrate.

Description

Polarization Irradiation Device {APPARATUS FOR ILLUMINATING POLARIZATION}

1 is a schematic view showing the configuration of a light irradiation apparatus used in the optical alignment process according to the prior art.

Figure 2 is a schematic view showing a polarizing device consisting of a polarizing plate of a plurality of quartz plates are stacked in a linear lamp according to the prior art.

3 is a schematic diagram of a case where the exposure system according to the prior art is applied to a scanning system in which a glass substrate is continuously conveyed.

4 is a schematic view showing a polarization irradiation apparatus in which a polarizing plate in which a plurality of quartz plates are stacked on each linear lamp according to the present invention is disposed and disposed adjacent to first and second row linear lamps facing each other. A schematic diagram showing a state where the polarizing plates are arranged in directions opposite to each other.

FIG. 5 is a schematic view of a polarization irradiation apparatus in which polarizing plates in which a plurality of quartz plates are stacked on two first and second linear lamps according to the present invention are arranged opposite to each other; FIG.

FIG. 6 is a schematic view of a case where the quartz plate of the first polarizing plate and the quartz plate of the second polarizing plate according to the present invention are arranged to be symmetrical with respect to the normal direction of the linear lamp, and show a tilt angle of the first polarizing plate and the second polarizing plate. FIG. Giving schematic.

*** Explanation of symbols for main parts of drawing ***                 

220: first row linear lamp 223: first polarizing plate

230: second row linear lamp 233: second polarizing plate

240: quartz plate support 250: glass substrate transfer direction

260: light propagation direction θ,-θ: tilt angle

The present invention relates to a light irradiation apparatus, and more particularly, to a polarization irradiation apparatus using a laminated polarizing plate of different directions provided adjacent to a plurality of linear lamps facing each other.

In general, the liquid crystal display element is composed of a liquid crystal layer formed between the upper and lower substrates arranged opposite to each other by a spacer at predetermined intervals.

Here, the upper and lower substrates each have electrodes of a predetermined pattern on opposite surfaces thereof, and an alignment film for determining the alignment of the liquid crystal is formed on the electrodes.

A rubbing method, a photo-alignment method, and the like are mainly used as the alignment method for treating the alignment film.

Here, the rubbing method is a method of applying an alignment material such as polyimide (PI) to a substrate and then causing mechanical friction with a rubbing cloth to induce the alignment direction of the liquid crystal. It is a widely used method.

However, in the rubbing method, the shape of the microgrooves formed in the alignment layer is changed according to the frictional strength, so that the arrangement of the liquid crystal molecules is not constant. As a result, irregular phase distortion and light scattering ( light scattering) may occur to deteriorate the performance of the liquid crystal display.

In addition, dust and static electricity generated during the rubbing process may cause a decrease in yield, and when implementing multi-domain by pixel division, it is difficult to realize reliability and stability of the alignment layer by repeated photolithography process. Have

On the other hand, the photo-alignment method is a method of causing pretilt of the liquid crystal by irradiating ultraviolet rays on the substrate on which the photo-alignment film is applied, unlike the rubbing method, there is no fear of generating static electricity or dust, which can compensate for the decrease in yield. .

In addition, the liquid crystal molecules can be uniformly arranged over the entire alignment film, thereby preventing the occurrence of phase distortion and light scattering. In particular, there is an advantage that it is possible to practically implement a wide viewing angle liquid crystal display device by pixel division.

A conventional light irradiation apparatus used in the optical alignment process as described above will be described below with reference to FIG. 1.

1 is a schematic view showing the configuration of a light irradiation apparatus used in the optical alignment process according to the prior art.

Referring to FIG. 1, in the light irradiation apparatus according to the related art, a light source, that is, light 15 including ultraviolet light emitted from the lamp housing 10 is collected in a condenser (not shown), and the first planar mirror 20 is provided. Is reflected by the light incident on the condensing lens 30.                         

In addition, the light emitted from the condenser lens 30 is reflected by the second planar mirror 60 through the polarizing system 40 and the fly eye lens 50, and the reflected light 15 is curved. The light is reflected back through the mirror 80 and then reflected by the third planar mirror 110 through the first and second stages 90 and 100.

Light irradiating device that proceeds light in this order is the key equipment to implement the UV alignment. In addition, the conventional UV alignment equipment is an on-shot exposure system that irradiates the entire irradiation surface at the same time.

In addition, while the on-shot exposure system is easy to adjust the illuminance and polarization degree, as shown in FIG. 1, since the size of the equipment is large and a system for conveying the glass to the stage is required, the efficiency of the equipment is deteriorated.

In addition, due to the configuration of a complicated optical system, a decrease in light efficiency occurs, and when applied to large-area equipment, a problem in that installation space and productivity are deteriorated is expected.

Therefore, when the exposure system using the linear lamp is applied to the scanning system by glass transfer, there is an advantage that the size of the equipment and the simplification of the optical system can be realized.

However, linear UV lamps are easy to obtain a relatively uniform illuminance, but it is difficult to obtain a parallel light source.

Therefore, the proposed technique to solve this disadvantage is the case of applying a polarizing plate of the quartz plate laminated to the linear lamp system shown in FIG.

Figure 2 is a schematic diagram showing a polarizer composed of a polarizing plate of a plurality of quartz plates are stacked in a linear lamp system according to the prior art.                         

Figure 3 is a schematic diagram of applying a linear lamp system according to the prior art to the scanning system by the continuous conveyance of the glass substrate.

Referring to FIG. 2, the polarizer according to the related art includes a polarizing plate 123 having a plurality of quartz plates 123a inclined at a predetermined angle to obtain a polarized light source on the linear lamp 120.

Therefore, when the polarizing plate having the above configuration is applied to the exposure system, the polarization component is uneven due to the path difference (a, b, c) of the light generated from the linear lamp 120 and the incident angle of the quartz plate Different transmittance causes a problem that the illuminance uniformity of light is also lowered.

On the other hand, even when the polarizing plate having the above configuration is applied to the scanning system by the continuous transfer of the glass substrate shown in Fig. 3, it is easy to obtain a relatively uniform illuminance of the linear lamp, but it is difficult to obtain a parallel light source.

Accordingly, an object of the present invention is to provide a polarization irradiation apparatus capable of improving the polarization degree and illuminance uniformity of a polarized light source.

Polarization irradiation apparatus according to the present invention for achieving the above object is a linear lamp of the first row, the first polarizing plate is disposed adjacent to the linear lamp of the first row and a plurality of quartz plates are stacked obliquely in the first direction and And a second polarizing plate arranged to be spaced apart from the linear lamps of the first row and a second polarizing plate disposed to be adjacent to the linear lamps of the second row and having a plurality of quartz plates inclined in a second direction. It is characterized by.

Here, the inclination angle of the first polarizing plate in which the plurality of quartz plates are stacked obliquely in the first direction and the inclination angle of the second polarizing plate in which the plurality of quartz plates are obliquely stacked in the second direction are the same or different from each other. It is characterized by having a value.

In addition, the plurality of quartz plates constituting the first polarizing plate and the second polarizing plate may be fixed and supported by a quartz plate support.

The first polarizing plate and the second polarizing plate may be arranged to be symmetrical with respect to the light traveling direction of the linear lamp.

Hereinafter, a polarization irradiation apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

Figure 4 is a schematic diagram showing a polarization irradiation apparatus in which a polarizing plate of a plurality of quartz plates are stacked on each linear lamp according to the present invention, the polarizing plates disposed on the linear lamps facing each other are arranged in opposite directions It is a schematic diagram which shows the state.

FIG. 5 is a schematic view of a polarization exposure apparatus in which polarizers in which a plurality of quartz plates are stacked on two linear lamps according to the present invention are arranged opposite to each other.

FIG. 6 is a schematic view in which the first polarizing plate and the second polarizing plate according to the present invention are disposed to be symmetrical with respect to the light traveling direction of the linear lamp, and show a tilt angle of the first polarizing plate and the second polarizing plate. FIG.                     

4 and 5, the linear lamp system according to the present invention is composed of at least two linear lamp combinations, and to polarize the light from the linear lamp 220 and the linear lamp 220 in the first row. A first polarizing plate 223 composed of a plurality of quartz plates 223a stacked obliquely in a first direction, a linear lamp 230 in a second row, and a light emitted from the linear lamp 230 in a second direction. It consists of a second polarizing plate 233 composed of a plurality of quartz plates 233a stacked obliquely.

Here, the inclination angle of the first polarizing plate 223 composed of the linear lamp 220 of the first row and the plurality of quartz plates 223a that are inclinedly stacked to polarize the light emitted from the linear lamp 220, The inclination angles of the second polarizing plate 233 composed of the linear lamp 230 and the plurality of quartz plates 233a that are inclinedly stacked to polarize the light emitted from the linear lamp 230 may have the same value opposite to each other or may be different from each other. Has a value.

That is, in the polarization irradiation apparatus according to the present invention, the first polarizing plate 223 having a plurality of quartz plates inclined in the first direction is disposed in the first linear lamp 220 in the first row, and the second linear lamp is arranged in the first column. The second polarizing plate 233 in which a plurality of quartz plates are stacked obliquely in the second direction is disposed in the second column.

Here, the stacking directions of the first polarizing plate 223 in the first row and the second polarizing plate 233 in the second row are arranged to be opposite to each other. In addition, the first polarizing plate and the second polarizing plate are fixedly supported by the quartz plate supporter 240.

In addition, the polarizing device having the above configuration can be easily applied to a scanning system by continuous transport of a glass substrate.                     

Meanwhile, as shown in FIG. 6, the first polarizing plate 223 and the second polarizing plate 233 are disposed to be symmetrical with respect to the normal direction of the linear lamps 220 and 230, that is, the light traveling direction 260. .

When the first polarizing plate 220 and the second polarizing plate 230 are disposed in this manner, the first polarizing plate 220 and the second polarizing plate 230 are respectively θ and −θ in the normal direction of the linear lamp, that is, the light traveling direction. It has as many tilt angles.

Through the above configuration, since the stacking directions of the first polarizing plate and the second polarizing plate are arranged opposite to each other, the polarization degree and roughness unevenness generated in the first polarizing plate of the first row are compensated by the second polarizing plate of the second row.

That is, as shown in FIG. 4, when the first polarizing plate having the first inclination angle is applied to the linear lamps in the first row, path differences a ', b', and c 'occur, and these path differences are linear in the second row. The lamps are compensated by the path differences a, b, and c generated by applying a second polarizing plate having a second inclination angle equal to the first inclination angle and opposite to each other.

Therefore, the optical compensation makes it easy to improve the degree of polarization and illuminance uniformity even in a linear lamp system.

As described above, according to the polarization irradiation apparatus according to the present invention, in the two or more linear lamp systems, the stacking direction of the first polarizing plate in the first row and the second polarizing plate in the second row is arranged to be opposite to each other in the first row. The polarization degree and roughness nonuniformity generated in one polarizing plate are compensated for in the second polarizing plate of the second row.

Therefore, according to the present invention, the polarization degree and illuminance uniformity can be relatively improved even in the linear lamp system by such optical compensation, and the configuration of the scanning equipment by the continuous conveyance of the glass substrate becomes easy.

On the other hand, while described above with reference to a preferred embodiment of the present invention, those skilled in the art various modifications of the present invention without departing from the spirit and scope of the invention described in the claims below And can be changed.

Claims (5)

Linear lamps in a first row; A first polarizing plate disposed adjacent to the linear lamps in the first row and stacked obliquely in a first direction; A linear lamp in a second row spaced apart from the linear lamp in a first row; And And a second polarizing plate disposed adjacent to the linear lamps of the second row and stacked in an inclined direction in a second direction. And the first polarizing plate and the second polarizing plate are arranged to be symmetrical with respect to the light traveling direction of the linear lamp. The inclination angle of the first polarizing plate in which the plurality of quartz plates are inclined in the first direction and the inclination angle of the second polarizing plate in which the plurality of quartz plates are inclined in the second direction are opposite to each other. Polarizing device characterized in that it has a value or other value. The polarizing device of claim 1, wherein a plurality of quartz plates constituting the first polarizing plate and the second polarizing plate are fixed by a quartz plate support. delete The polarizing device of claim 1, wherein the first polarizing plate and the second polarizing plate are configured by stacking a plurality of quartz plates.

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