TW440918B - Exposure apparatus and optical system therefor - Google Patents
Exposure apparatus and optical system therefor Download PDFInfo
- Publication number
- TW440918B TW440918B TW088112755A TW88112755A TW440918B TW 440918 B TW440918 B TW 440918B TW 088112755 A TW088112755 A TW 088112755A TW 88112755 A TW88112755 A TW 88112755A TW 440918 B TW440918 B TW 440918B
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- optical system
- box
- space
- compartment
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33710597 | 1997-12-08 | ||
JP10337591A JPH11233437A (ja) | 1997-12-08 | 1998-11-27 | 露光装置用光学系および露光装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW440918B true TW440918B (en) | 2001-06-16 |
Family
ID=26575673
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW088112755A TW440918B (en) | 1997-12-08 | 1999-07-28 | Exposure apparatus and optical system therefor |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH11233437A (ja) |
TW (1) | TW440918B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001023933A1 (fr) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Systeme optique de projection |
EP1139138A4 (en) | 1999-09-29 | 2006-03-08 | Nikon Corp | PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM |
KR100551433B1 (ko) * | 1999-11-23 | 2006-02-09 | 주식회사 하이닉스반도체 | 웨이퍼 노광용 스텝퍼의 조명계 |
WO2001081907A1 (fr) * | 2000-03-31 | 2001-11-01 | Nikon Corporation | Procede et dispositif de mesure, et procede et dispositif d'exposition |
-
1998
- 1998-11-27 JP JP10337591A patent/JPH11233437A/ja active Pending
-
1999
- 1999-07-28 TW TW088112755A patent/TW440918B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH11233437A (ja) | 1999-08-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MM4A | Annulment or lapse of patent due to non-payment of fees |