TW440918B - Exposure apparatus and optical system therefor - Google Patents

Exposure apparatus and optical system therefor Download PDF

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Publication number
TW440918B
TW440918B TW088112755A TW88112755A TW440918B TW 440918 B TW440918 B TW 440918B TW 088112755 A TW088112755 A TW 088112755A TW 88112755 A TW88112755 A TW 88112755A TW 440918 B TW440918 B TW 440918B
Authority
TW
Taiwan
Prior art keywords
gas
optical system
box
space
compartment
Prior art date
Application number
TW088112755A
Other languages
English (en)
Chinese (zh)
Inventor
Haruo Ozawa
Masayuki Murayama
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of TW440918B publication Critical patent/TW440918B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW088112755A 1997-12-08 1999-07-28 Exposure apparatus and optical system therefor TW440918B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP33710597 1997-12-08
JP10337591A JPH11233437A (ja) 1997-12-08 1998-11-27 露光装置用光学系および露光装置

Publications (1)

Publication Number Publication Date
TW440918B true TW440918B (en) 2001-06-16

Family

ID=26575673

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088112755A TW440918B (en) 1997-12-08 1999-07-28 Exposure apparatus and optical system therefor

Country Status (2)

Country Link
JP (1) JPH11233437A (ja)
TW (1) TW440918B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001023933A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Systeme optique de projection
EP1139138A4 (en) 1999-09-29 2006-03-08 Nikon Corp PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM
KR100551433B1 (ko) * 1999-11-23 2006-02-09 주식회사 하이닉스반도체 웨이퍼 노광용 스텝퍼의 조명계
WO2001081907A1 (fr) * 2000-03-31 2001-11-01 Nikon Corporation Procede et dispositif de mesure, et procede et dispositif d'exposition

Also Published As

Publication number Publication date
JPH11233437A (ja) 1999-08-27

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