r.d〇c/〇〇8 434106-2 A7 B7 經濟部中央標率局員工消費合作社印製 五、發明説明（f ) 本發明是有關於一種化學機械硏磨 （Chemical-Mechanical Polishing ， CMP) 機臺， 且特別是有關於在硏 磨機臺中，負載器(Carrier)的改良。 在平坦化的過程中，化學機械硏磨法是唯一能提供大 型半導體積體電路（VLSI)，甚至超大型半導體積體電路 (Ultra-LSI，ULSI)製程，達到全面性平坦化（Global Planarization)的一種技術。 如第1A圖及第1B圖所示，傳統的化學機械硏磨機 臺包括一硏磨臺（polishing table) 1〇 ’在硏磨臺10上有 一硏磨塾（polishing pad ) 1 2。利用一'負載器14負載晶片 16，使晶片16表面朝下介於負載器和硏磨墊之間’並輸 入硏磨液（slurry ) 18進行硏磨° 第1C圖詳細繪出傳統的化學機械硏磨臺之負載器Η 之結構，在負載器14中間有一蓋子22，其具有一上表面 23。在蓋子22上方有一機械手臂20 ’其垂直於上表面23 之上方，與上表面23中心相咬合，機械手臂20係爲一中 空柱狀，用以移動及轉動負載器14 ’以進行硏磨。在蓋子 22下方有一硏磨頭24，其與蓋子22的周緣相接合，硏磨 頭24係用以吸附晶片，進行硏磨。此外，在硏磨頭24及 晶片16之間，通常裝設有一嵌入墊26 ( Insert fUm)用以 防止晶片刮傷。 由於目前CMP所使用之負載器在硏磨晶片時，硏磨 液容易滲入負載器的內部，等到硏磨液凝結後，造成硏磨 時的阻礙而影響產品的均勻度。爲了淸理負載器內凝固的 I---------1,------IT------ (請先閱讀背面之注意事項再填寫本頁) 43410φrd〇c / 〇〇8 434106-2 A7 B7 Printed by the Consumers Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. 5. Description of the Invention (f) The present invention relates to a chemical-mechanical polishing (CMP) machine. In particular, it is related to the improvement of the carrier in the honing machine table. In the process of planarization, the chemical mechanical honing method is the only method that can provide large-scale semiconductor integrated circuit (VLSI), and even ultra-large semiconductor integrated circuit (Ulsi-LSI) processes, to achieve global planarization. A technology. As shown in Figs. 1A and 1B, the conventional chemical mechanical honing machine table includes a polishing table 10 ', and a honing pad 12 is provided on the honing table 10. A loader 14 is used to load the wafer 16 so that the surface of the wafer 16 is facing downward between the loader and the honing pad, and honing fluid 18 is input for honing. FIG. 1C illustrates the traditional chemical machinery in detail The structure of the loader Η of the honing table has a cover 22 in the middle of the loader 14 and has an upper surface 23. Above the lid 22 is a robot arm 20 'which is perpendicular to the upper surface 23 and engages the center of the upper surface 23. The robot arm 20 is a hollow column shape for moving and rotating the loader 14' for honing. Below the cover 22, there is a honing head 24 which is engaged with the periphery of the cover 22. The honing head 24 is used to suck the wafer for honing. In addition, between the honing head 24 and the wafer 16, an insert fUm is usually installed to prevent the wafer from being scratched. As the loader currently used in CMP hones wafers, the honing liquid easily penetrates into the inside of the loader. After the honing liquid condenses, it will cause obstacles during honing and affect the uniformity of the product. In order to manage the solidified I --------- 1, ------ IT ------ (Please read the precautions on the back before filling this page) 43410φ
3986lwt'.doc/00S A7 B7 五、發明説明（*>) 硏磨液，必須將整組負載器拆下來淸理，平均每硏磨完約 2000片就必須淸理一次，而且淸理時必須要用刮刷的方式 淸理整個蓋子。並且，目前CMP所使用之負載器在淸理 組裝時相當費時，只組裝完一個就需費時一個多小時’容 易造成人力的浪費。而且，淸理過程中易造成硏磨液凝固 碎片的掉落和微粒的產生而造成晶圓廠環境的污染。 因此本發明的主要目的就是在提供一種改良的負載 器，在每次機臺硏磨完晶片後進行自動淸洗時’同時可以 將負載器內部的硏磨液沖洗掉，避免硏磨液的殘留。如此 一來可以避免硏磨液凝結在負載器內部，影響產品均勻 度，也可以降低負載器維護淸理的頻率，減少晶圓廠環境 的污染。 經濟部中央標準扃員工消費合作社印装 (請先閲讀背面之注項再填寫本頁) 根攄上述的主要目的，發明提出—種化學機械硏磨機 臺之負載器，包括：一蓋子，具有一上表面。其垂直於上 表面之上方有一機械手臂，與上表面中心相咬合’用以移 動及轉動負載器。在蓋子下方有一硏磨頭’與蓋子的周緣 相接合，用以吸附晶片，進行硏磨。在負載器內加裝給水 管、噴水管和噴水孔，在自動淸洗時淸洗負載器內殘留的 硏磨液。依序在蓋子的上表面加裝噴水孔。在機械手臂中 加裝給水管，一端連接於自動淸洗系統D以及加裝噴水管’ 一端連接於噴水孔，另一端連接於給水管的另一端。 爲讓本發明之上述和其他目的、特徵、和優點能更明 顯易懂，下文特舉一較佳實施例’並配合所附圖式’作詳 細說明如下： 4 341 06 i A7 3986，wfd〇C/°°8_B7_____ 五、發明説明（，） 圖式之簡單說明： 第1A圖和第1B圖係一俯視圖和一剖面圖’繪示出 一化學機械硏磨臺之整體結構； 第1C圖係一剖面圖，繪示出第1A圖及第1B圖中之 負載器部分； 第2A圖係一剖面圖，繪式出本發明之負載器部分的 結構；以及 第2B圖係一俯視圖，繪式出本發明之負載器部分的 結構。 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央標準局員工消費合作社印裝 圖式之標記說明 10 ： 硏磨臺 12 ： 硏磨墊 14 ： 負載器 16 ： 晶片 18 ： 硏磨液 20 ： 機械手臂 22 ： 蓋子 23 ： 上表面 24 ： 硏磨頭 26 ： 嵌入墊 28 ： 給水管 30 ： 噴水管 32 ： 噴水孔 鮫佳實施例 5 本紙張尺度適用中國國家標準（CNS)A4規格（210X297公釐） 經濟部中央梂準局負工消費合作社印製 谓⑽《 A7 B7 五、發明説明（仏） 第2A圖和第2B圖所示，分別爲根據本發明一較佳 實施例之化學機械硏磨機臺之負載器的剖面圖與俯視圖^ 請參照第2A圖和第2B圖，詳細繪出本發明的化學 機械硏磨臺之負載器14之結構，在負載器14中間有一蓋 子22，其具有一上表面23。在蓋子22上方有一機械手臂 20,其垂直於上表面23之上方，與上表面23中心相咬合， 機械手臂20係爲一中空柱狀，用以移動及轉動負載器14， 以進行硏磨。在蓋子22下方有一硏磨頭24，其與蓋子22 的周緣相接合，硏磨頭24係用以吸附晶片，進行硏磨。 此外，在硏磨頭24及晶片16之間，通常裝設有一嵌入墊 26 ( Insert film )用以防止晶片刮傷° 本發明於機械手臂20中，裝設有至少一給水管28， 在此實施例僅以一給水管28爲例。此給水管28係連接自 動淸洗裝置之給水系統，在每次機臺硏磨完晶片後進行自 動淸洗時，同時自動供水以進行負載器內部的淸洗。給水 管28比如由硬式材質所構成，例如不鏽鋼等，其亦可由 塑膠等軟式材質所構成。 另外，在蓋子22的上表面23裝設至少一噴水孔32， 在此實施例僅以4個噴水孔爲例。此噴水孔32係將水均 勻噴灑於負載器內部。 此外，再裝設至少一噴水管30，其主要係用於連接給 水管28與噴水孔32，連接的方式得視於需要做任何形式 的改變，並不侷限於管狀的形式。在此，本發明僅以4個 管狀的噴水管爲例。噴水管30的一端連接於蓋子22上的 6 (請先閱讀背面之注意事項再填寫本頁) 訂 線 本紙張尺度適用中國國家標準（CNS } Λ4规格（210X297公釐） 經濟部中央標準局負工消費合作社印製 434106， 39S6t\vi' doc/OOS A7 __________B7___ 五、發明説明（k) 噴水孔32 ’另一端連接於機械手臂2〇中的給水管28的另 一端。其中連接的方式，例如是噴水管30的一端水平穿 過機械手臂與給水管28連接’另一端在噴水孔32上 方約垂直90度轉彎連接於噴水孔32。噴水管3〇比如由硬 式材質所構成’例如不銹鋼等。 在此’每當進行自動淸洗時，自動淸洗系統會自動用 去離子水（Dei〇niZed water)淸洗硏磨頭24的底部，藉以去 除在硏磨後殘留的硏磨液18，且潤濕嵌入墊26，以利進 行下一;人硏磨。在自動淸洗的時候’部分的去離子水亦經 由給水管28、噴水管3〇和噴水孔32進行噴灑，以去除殘 留在盖子22和硏磨頭24之間空隙的硏磨液18。因此，可 大大減少硏磨液18在負載器內的殘留’減少維護淸洗的 頻率。 另外’此實施例僅以4個噴水管與噴水孔爲例，但本 發，並不限於此。本發明之裝置同樣適用於一個以上的噴 水巨與噴水孔，依據本發明之裝置可視情況需要’設置所 需要數目的噴水管與噴水孔。 由上述本發明較佳實施例可知，本發明於目前使用的 化學機械硏磨臺上之負載器，加裝給水管、噴水管和噴水 孔。利用每次硏磨完畢後進行自動淸洗同時’自動將負載 器內殘留的硏磨液淸洗乾淨，防止硏磨液在負載器內部凝 固，而影響產品均勻度。同時，可減少維護淸理的頻率， 降低不必要的人力浪費。 雖然本發明已以一較佳實施例揭露如上，然其並非用 _ 7 本紙浪尺度適财關家榡f } Α4ίί格（---- (請先閱讀背面之注意事項再填寫本頁)3986lwt'.doc / 00S A7 B7 V. Description of the invention (* >) Honing fluid, the entire set of loaders must be removed and processed. On average, about 2000 tablets must be processed once. The entire lid must be cleaned with a scraping brush. In addition, the loaders currently used in CMP are quite time-consuming for assembly and assembly, and it only takes more than an hour to assemble only one, which is easy to cause waste of manpower. In addition, during the processing, it is easy to cause the solidification of the honing fluid, the falling of debris and the generation of particles, which will cause pollution to the fab environment. Therefore, the main object of the present invention is to provide an improved loader, which can automatically wash out the honing fluid inside the loader at the same time when the automatic honing is performed after each machine honing wafers, so as to avoid the residue of the honing fluid. . In this way, the honing fluid can be prevented from condensing inside the loader, which affects the uniformity of the product. It can also reduce the frequency of loader maintenance management and reduce the pollution of the fab environment. Central Standard of the Ministry of Economic Affairs 印 Printed by employee consumer cooperatives (please read the note on the back before filling this page) Based on the above main purpose, the invention proposes a loader for a chemical mechanical honing machine, including: a cover, with One on the surface. There is a mechanical arm above the upper surface perpendicular to the upper surface, and it engages with the center of the upper surface to move and rotate the loader. Under the cover, a honing head 'is engaged with the peripheral edge of the cover to suck the wafer for honing. Install water supply pipe, water spray pipe and water spray hole in the loader to clean the honing fluid remaining in the loader during automatic cleaning. Install water spray holes in the upper surface of the cover in order. A water supply pipe is installed in the robot arm, one end is connected to the automatic cleaning system D and a water spray pipe is installed, one end is connected to the water spray hole, and the other end is connected to the other end of the water supply pipe. In order to make the above and other objects, features, and advantages of the present invention more comprehensible, a detailed description is given below with a preferred embodiment 'in conjunction with the accompanying drawings' as follows: 4 341 06 i A7 3986, wfd. C / °° 8_B7 _____ V. Brief description of the invention (,) Figures 1A and 1B are a top view and a cross-sectional view 'showing the overall structure of a chemical mechanical honing table; Figure 1C A cross-sectional view showing the loader part in FIG. 1A and FIG. 1B; FIG. 2A is a cross-sectional view showing the structure of the loader part of the present invention; and FIG. 2B is a top view. The structure of the loader part of the present invention is shown. (Please read the precautions on the back before filling out this page) Marking instructions for the printed drawings of the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 10: Honing table 12: Honing pad 14: Loader 16: Chip 18: Honing fluid 20: Robotic arm 22: Cover 23: Upper surface 24: Honing head 26: Embedded pad 28: Water supply pipe 30: Water spray pipe 32: Water spray hole 210X297 mm) Printed as "A7 B7" by the Central Bureau of Standards of the Ministry of Economic Affairs and Consumer Cooperatives. V. Description of the Invention (仏) Figures 2A and 2B show the chemistry according to a preferred embodiment of the present invention. Sectional view and top view of the loader of the mechanical honing machine table ^ Please refer to FIG. 2A and FIG. 2B for details of the structure of the loader 14 of the chemical mechanical honing machine of the present invention. A cover 22 is provided in the middle of the loader 14 It has an upper surface 23. Above the cover 22 is a robot arm 20 which is perpendicular to the upper surface 23 and engages the center of the upper surface 23. The robot arm 20 is a hollow column shape for moving and rotating the loader 14 for honing. Below the cover 22, there is a honing head 24, which is engaged with the periphery of the cover 22. The honing head 24 is used to suck the wafer for honing. In addition, an insert film 26 (insert film) is usually installed between the honing head 24 and the wafer 16 to prevent the wafer from being scratched. In the robot arm 20, at least one water supply pipe 28 is installed. The embodiment only uses a water supply pipe 28 as an example. This water supply pipe 28 is a water supply system connected to an automatic cleaning device. When the automatic cleaning is performed after each machine has been honing the wafer, water is automatically supplied to perform cleaning inside the loader. The water supply pipe 28 is made of, for example, a hard material such as stainless steel, or it may be made of a soft material such as plastic. In addition, the upper surface 23 of the cover 22 is provided with at least one water spray hole 32. In this embodiment, only four water spray holes are taken as an example. The water spray hole 32 sprays water evenly inside the loader. In addition, at least one water spray pipe 30 is installed, which is mainly used to connect the water supply pipe 28 and the water spray hole 32. The connection method depends on any need to be changed, and is not limited to the tubular form. Here, the present invention only uses four tubular water spray pipes as an example. One end of the water spray pipe 30 is connected to the 6 on the cover 22 (please read the precautions on the back before filling this page). The size of the paper is applicable to the Chinese national standard (CNS) Λ4 size (210X297 mm). Printed by the Industrial and Consumer Cooperatives 434106, 39S6t \ vi 'doc / OOS A7 __________B7___ V. Description of the invention (k) The other end of the water spray hole 32' is connected to the other end of the water supply pipe 28 in the robot arm 20. The connection method, for example, One end of the water spray pipe 30 is connected to the water supply pipe 28 through a mechanical arm horizontally. The other end is connected to the water spray hole 32 at a 90-degree angle above the water spray hole 32. The water spray pipe 30 is made of hard material, such as stainless steel. Here, whenever the automatic honing is performed, the automatic honing system will automatically wash the bottom of the honing head 24 with Deionized Water to remove the honing liquid 18 remaining after honing, and Wet the embedded pad 26 to facilitate the next step; human honing. During the automatic washing, the 'part of deionized water is also sprayed through the water supply pipe 28, the water spray pipe 30 and the water spray hole 32 to remove the residual Honing fluid 18 in the gap between the sub 22 and the honing head 24. Therefore, the residual honing fluid 18 in the loader can be greatly reduced 'reducing the frequency of maintenance and cleaning. In addition,' this embodiment uses only 4 water spray pipes The water spray hole is taken as an example, but the present invention is not limited to this. The device of the present invention is also applicable to more than one water spray hole and water spray hole. The device according to the present invention may be provided with as many water spray pipes and water spray holes as necessary. From the above-mentioned preferred embodiments of the present invention, it can be known that the loader on the currently used chemical mechanical honing table of the present invention is equipped with a water supply pipe, a water spray pipe and a water spray hole. The automatic honing is performed after each honing is completed. 'Automatically clean the honing fluid remaining in the loader to prevent the honing fluid from solidifying inside the loader and affect the uniformity of the product. At the same time, it can reduce the frequency of maintenance management and reduce unnecessary labor waste. Although this The invention has been disclosed as above with a preferred embodiment, but it is not used. _ 7 This paper wave scale is suitable for financial affairs 榡 f} Α4ίί 格 (---- (Please read the precautions on the back before filling this page)
、1T A7 B7 4 3 4 I ο 6 4, 1T A7 B7 4 3 4 I ο 6 4
3986tw f.doc/OOS 五、發明説明（4 ) 以限定本發明，任何熟習此技藝者，在不脫離本發明之精 神和範圍內，當可作各種之更動與潤飾，因此本發明之保 護範圍當視後附之申請專利範圍所界定者爲準。 V 1 訂 破 * (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準扃貝工消費合作社印製 本纸張尺度適用中國國家標隼（CNS ) Λ4規格（2l0x297公釐}3986tw f.doc / OOS V. Description of the invention (4) To limit the invention, anyone skilled in the art can make various modifications and retouches without departing from the spirit and scope of the invention, so the scope of protection of the invention It shall be subject to the definition in the appended patent application scope. V 1 order broken * (Please read the notes on the back before filling out this page) Printed by the Central Standard of the Ministry of Economic Affairs, Printed by the Cooper Consumer Cooperative, This paper size applies to the Chinese National Standard (CNS) Λ4 size (2l0x297 mm)