TW432658B - Leadless semiconductor chip package structure - Google Patents

Leadless semiconductor chip package structure Download PDF

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Publication number
TW432658B
TW432658B TW88112494A TW88112494A TW432658B TW 432658 B TW432658 B TW 432658B TW 88112494 A TW88112494 A TW 88112494A TW 88112494 A TW88112494 A TW 88112494A TW 432658 B TW432658 B TW 432658B
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Taiwan
Prior art keywords
lead frame
name
semiconductor chip
republic
china
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TW88112494A
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Chinese (zh)
Inventor
Sai-Man Li
Chun-Hung Lin
Shin-Hua Chao
Su Tao
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Advanced Semiconductor Eng
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Priority to TW88112494A priority Critical patent/TW432658B/en
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Publication of TW432658B publication Critical patent/TW432658B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

A leadless semiconductor chip packaging structure comprises a lead frame for supporting a semiconductor chip. The lead frame comprises a chip bearing seat and a plurality of wires. The surface of the lead frame is installed with a cupric oxide cover layer, in which the lower surface of the lead frame and the inner end of the plurality of wires are exposed to the cupric oxide cover layer. The semiconductor chip is electrically connected to the inner end of the plurality of wires through a plurality of connection wires. The lead frame, the semiconductor chip and the plurality of connection wires are wrapped by an encapsulation so that the lower surface of the lead frame is exposed to the encapsulation. The cupric oxide cover layer is used to increase the bonding adhesion between the lead frame and the encapsulation.

Description

^432658 五、發明說明(1) 發明領域: 本發明係有關於一種半導體晶片封裝構造,特別有關於 一種無外引腳半導體晶片封裝構造(leadless semiconductor chip package),其導線架與封膠體間具 有較佳之結合附著力。 先前技術: 第一圖係為一習用半導體晶片封裝構造,其包含一導線 架(lead frame)用以承载一晶片1〇〇。該導線架包含複數 條導線具有外腳部(outer leads portion)l〇6以及内腳部 1 0 7。該晶片1 0 0係藉銀膠11 4黏著固定於一晶片承座1 u _ 其係以數個支樓肋條(未示於圚中)連接於該導線架《該 導線架之外腳部1 0 6係用以電性連接至一外部電路。該晶 片1 00具有複數個晶片銲墊1 1 7利用複數條連接線(bonding wire)115電性連接該導線架之内腳部1〇7。該晶月1〇〇、晶 片承座1 1 1、導線架之内腳部1 〇 7、以及複數條連接線1 1 5 係包覆於一封膠體1 1 6。該封膠體11 6係以絕緣材料例如莖_ 氧樹脂(epoxy)製成》 由於該封膠體1 1 6係完全環繞該晶片1 〇 〇,所以該晶片 100正常運作所產生的熱必須完全經由該封膠體116傳出, 而由於該封膠體1 1 6的絕緣特性,使得該晶片1 〇 〇的散熱會 受到阻礙,因此’在某些狀況下,其將在該習用半導體晶 片封裝構造内產生高溫而可能損傷或損壞該晶片10〇。 此外,該導線架一般係以導電良好之金屬例如銅製成, 但是該封膠體卻是以絕緣材質製成,導線架與封膠體間之^ 432658 V. Description of the invention (1) Field of the invention: The present invention relates to a semiconductor chip package structure, and more particularly to a leadless semiconductor chip package. The lead frame and the sealing compound have Better binding adhesion. Prior art: The first diagram is a conventional semiconductor chip package structure, which includes a lead frame for carrying a chip 100. The lead frame includes a plurality of leads having outer leads portion 106 and inner legs 107. The chip 1 0 0 is fixed and fixed to a chip holder 1 by silver glue 11 4 _ It is connected to the lead frame with several branch ribs (not shown in the middle) 1 0 6 is used to be electrically connected to an external circuit. The wafer 100 has a plurality of wafer pads 1 1 7 electrically connected to the inner leg portion 107 of the lead frame by a plurality of bonding wires 115. The crystal moon 100, the wafer holder 1 1 1, the inner leg portion 107 of the lead frame, and the plurality of connecting wires 1 1 5 are covered with a piece of gel 1 16. The sealing compound 11 6 is made of an insulating material such as an epoxy resin. Since the sealing compound 1 1 6 completely surrounds the wafer 100, the heat generated by the normal operation of the wafer 100 must completely pass through the wafer 100. The sealing compound 116 comes out, and due to the insulating properties of the sealing compound 116, the heat dissipation of the chip 1000 will be hindered, so 'under certain conditions, it will generate high temperature in the conventional semiconductor chip package structure. The wafer 100 may be damaged or damaged. In addition, the lead frame is generally made of a metal with good conductivity, such as copper, but the sealing compound is made of an insulating material.

第4頁 ΓΙΤ4326 5 8_ 五、發明說明(2) 結合附著力不佳,所以一有溫度變化就會因為熱膨脹係數 的不同而在該導線架與封膠體之介面產生應力而導致剝離 (delamination)。而當導線架與封膠體之介面產生剥離. 時,週遭的水分就會經由該封膠體滲透積聚到該剝離之區 域,而一旦水分積聚在封膠體中,則遇到溫度快速增加 時,積聚的水分會瞬間蒸發為水蒸汽而在該剝離之區域產. 生一内部壓力而撐破附近之封膠體,而導致在該習用封裝 構造中發生破裂(c r a c k )之現象,前述過程常見於紅外線;、 輻射迴銲(IR reflow)製程。 發明概要: 本發明之主要目的係提供一種無外引腳半導體晶片封裝 構造,其包含一導線架用以承載一晶片且該導線架以及晶 片係為一封膠體包覆,其中該導線架之下表面係裸露於該 封膠體以增加散熱效率並且該導線架之上表面係具有一氧 化銅(c u p r i c ο X i d e )覆蓋層以增加該導線架與封膠體間之 附著力。 根據本發明之無外引腳半導體晶片封裝構造主要係包含 一導線架、一半導體晶片以及一封膠體。該導線架包含一 晶片承座以及複數條導線。該導線架之表面係設有一氧化 銅(cupric oxide)覆蓋層,其中該導線架之下表面以及該 複數條導線之内端係裸露於該氧化銅覆蓋層。該半導體晶 片之正面係設有複數個晶片銲墊用以連接其内部電路,該 半導體晶片之背面係以一導電膠固設於該導線架之晶片承 座。該半導體晶片之複數個晶片銲墊係藉由複數條連接線Page 4 ΓΙΤ4326 5 8_ V. Description of the invention (2) The bonding adhesion is not good, so when there is a temperature change, stress will be generated on the interface between the lead frame and the sealing compound due to the difference in thermal expansion coefficient, which will cause delamination. When the interface between the lead frame and the sealing compound is peeled off, the surrounding moisture will permeate and accumulate to the peeled area through the sealing compound, and once the moisture accumulates in the sealing compound, when the temperature increases rapidly, the accumulated Moisture will instantly evaporate into water vapor and be generated in the peeled area. An internal pressure will break the nearby sealant, which will cause a crack in the conventional packaging structure. The aforementioned process is common in infrared rays; Radiation reflow (IR reflow) process. Summary of the invention: The main purpose of the present invention is to provide a semiconductor chip package structure without outer pins, which includes a lead frame for carrying a chip, and the lead frame and the chip are covered with a gel, wherein the lead frame is under the lead frame. The surface is exposed on the encapsulant to increase heat dissipation efficiency, and the top surface of the lead frame is provided with a cupric oxide X ide covering layer to increase the adhesion between the lead frame and the encapsulant. The outer-lead-free semiconductor chip package structure according to the present invention mainly includes a lead frame, a semiconductor chip, and a colloid. The lead frame includes a chip holder and a plurality of leads. A surface of the lead frame is provided with a cupric oxide covering layer, wherein the lower surface of the lead frame and the inner ends of the plurality of wires are exposed to the copper oxide covering layer. The front side of the semiconductor wafer is provided with a plurality of wafer bonding pads for connecting its internal circuits, and the back side of the semiconductor wafer is a wafer holder fixed to the lead frame with a conductive adhesive. The plurality of wafer pads of the semiconductor wafer are connected by a plurality of connecting wires.

4 326 5 8 五、發明說明(3) 與該複數條導 半導體晶片以 露於該封膠體 根據本發明 線架之下表面 運作所產生的 而可增進本發 表面係設有一 覆蓋層之表面 體介面之粘著 所以可以增加 機率並且防止 線(bond line 中。此外,該 的附著力而防 圖示說明: 為了讓本發 顯特徵,下文 作詳細說明如 線之内端連接。該封膠體係包覆該導線架, 及複數條連接線,使得該導線架之下表面裸 0 之無外引綱^半導體晶片封裝構造,由於其導 係裸露於該封膠體,因此該半導體晶片正常 熱可直接經由該導線架之晶片承座傳出,因 明封裝構造之散熱效率。此外,該導線架之 氧化鋼(cupric oxide)覆蓋層,因該氧化銅 係呈現粗糙狀,所以在氧化銅覆蓋層/封勝 機構除了化學鍵結外而尚有機械互鎖機構, 導線架與封膠體間之附著力藉以降低剝離之 週遭的水分直接經由導線架與封膠體之接人 )滲透積聚至無外引腳半導體晶片封裝構造α 氧化銅覆蓋層亦可增進導線架與導電勝 止其剝離。 間 ,之上述和其他目的、特徵 '和優點能更 第1圖 第2圖 第3圖 習 本 根 圊 特舉本發明較佳實施例’並配合所附圖示, 下。 、 用半導體晶片封裝構造之剖面圖; 發明第一較佳實施例之剖面圖; 據本發明第一較佳實施例之一導線架之上視 發明第一較佳實施例之下視圖;及4 326 5 8 V. Description of the invention (3) and the plurality of conductive semiconductor wafers are exposed by the sealing gel according to the operation of the lower surface of the wire frame of the present invention to enhance the surface of the hair. The adhesion of the interface can increase the probability and prevent the line (bond line. In addition, the adhesion prevents the illustration: In order to make this feature obvious, the following is a detailed description such as the connection of the inner end of the line. The sealing system The lead frame and a plurality of connecting wires are covered, so that the outer surface of the lead frame is barely exposed, and the semiconductor chip package structure is exposed. Since the lead system is exposed to the sealing compound, the normal heat of the semiconductor chip can be directly passed through. The chip holder of the lead frame is transmitted due to the heat dissipation efficiency of the package structure. In addition, the cupric oxide covering layer of the lead frame is rough because the copper oxide system is rough, so In addition to chemical bonding, the mechanism also has a mechanical interlocking mechanism. The adhesion between the lead frame and the sealing gel is used to reduce the moisture around the peeling directly through the lead frame and The colloidal access) built up to a non-permeable outer lead of the semiconductor chip package configuration α oxide layer can also enhance covering the copper lead frame and the conductive stopper wins peeling. In the meantime, the above and other objects, features, and advantages can be changed. Fig. 1 Fig. 2 Fig. 3 Fig. 3 Basically, the preferred embodiment of the present invention is given in conjunction with the accompanying drawings. A cross-sectional view of a semiconductor chip package structure; a cross-sectional view of a first preferred embodiment of the invention; a top view of a lead frame according to one of the first preferred embodiments of the invention; a bottom view of the first preferred embodiment of the invention; and

第6頁 酽4 32 6 5 8 五、發明說明(4) 第5圖:本發明第二較佳實施例之剖面圖。 圖號說明: 100 晶片1 06 外腳部1 0 7 内腳部 111 晶片承座1 1 4 銀膠1 1 5 連接線 116 封膠體117 晶片銲墊 2 0 0 無外引腳半導體晶片封裝構造 210 晶片212 銀膠2 20 導線架 220a 覆蓋層222 晶片承座222a 區域 2 24 導線2 2 4a 内端2 2 5 支撐肋條 2 30 金線2 3 2 金線2 4 0 封膠體 3 0 0 無外引腳半導體晶片封裝構造 3 2 0 導線架326 缺口 發明說明: 首先請參照第二圊至第四圖,其揭示根據本發明第一較 佳實施例之無外引腳半導體晶片封裝構造2 0 〇,其包含— 晶片210設於一導線架220。該導線架220 (參見第三圖) 包含一晶片承座222以及複數條導線224,該晶片承座222 係藉由數個支撑肋條(supporting bar)225連接於該導線 架2 2 0。該導線架220之表面係設有一氧化銅(cupric oxide)覆蓋層220a,其中該導線架220之下表面以及該複 數條導線2 24之内端224a係裸露於該氧化銅覆蓋層220a。 該半導體晶片210之正面係設有複數個晶片銲墊(未示於 圖中)用以連接其内部電路,該半導髖晶片210之背面係 以一導電膠例如銀膠2 1 2固設於該導線架2 2 0之晶片承座Page 6 酽 4 32 6 5 8 V. Description of the invention (4) Figure 5: A sectional view of the second preferred embodiment of the present invention. Description of drawing number: 100 chip 1 06 outer leg 1 0 7 inner leg 111 chip holder 1 1 4 silver glue 1 1 5 connecting wire 116 sealing compound 117 chip pad 2 0 0 semiconductor chip package structure without outer lead 210 Wafer 212 Silver glue 2 20 Lead frame 220a Cover layer 222 Wafer holder 222a Area 2 24 Wire 2 2 4a Inner end 2 2 5 Support ribs 2 30 Gold wire 2 3 2 Gold wire 2 4 0 Sealing body 3 0 0 No external lead Foot semiconductor chip package structure 3 2 0 Lead frame 326 notch Description of the invention: First, please refer to the second to fourth figures, which disclose the outer pin semiconductor chip package structure 2 0 according to the first preferred embodiment of the present invention. It includes-the chip 210 is disposed on a lead frame 220. The lead frame 220 (see FIG. 3) includes a wafer support 222 and a plurality of wires 224. The wafer support 222 is connected to the lead frame 2 2 0 through a plurality of supporting bars 225. A surface of the lead frame 220 is provided with a cupric oxide covering layer 220a, wherein the lower surface of the lead frame 220 and the inner ends 224a of the plurality of wires 2 24 are exposed on the copper oxide covering layer 220a. The front side of the semiconductor wafer 210 is provided with a plurality of wafer bonding pads (not shown in the figure) for connecting its internal circuits. The back side of the semiconductor hip chip 210 is fixed on the back with a conductive adhesive such as silver glue 2 1 2 Chip holder of the lead frame 2 2 0

Γ,432658 五、發明說明(5) 2 2 2。該半導體晶片2 1 〇之複數個晶片銲墊係藉由複數條連 接線例如金線2 3 0電性連接至該複數條導線2 24之内端 224a。該複數條導線224之内端224a較佳鍍有一層與習用 連接線(bonding wire)材料結合力佳的金屬(未示於圖中 )。s亥封膠體240係包覆該導線架220、半導體晶片21〇以 及複數條金線2 3 0 ’使得該導線架2 2 0之下表面(亦即指該 晶片承座2 2 2 '複數條導線2 2 4以及數個支撐肋條2 2 5之下 表面)係裸露於該封膠體2 4 0 (參照第四圖)。 請再參照第二圖’該晶片承座2 2 2較佳係有部分區域 222a裸露於該氧化銅覆蓋層22〇a。該晶片承座222之部分 區域2 2 2 a係以連接線例如金線2 3 2連接至該半導體晶片 2 1 0,以提供接地的功能。較佳地,該晶片承座2 2 2之部分 區域222a可鍍有一層與習用連接線材料結合力佳的金屬 (未示於第二圊中)。 第五圖係為根據本發明第二較佳實施例之無外引腳半導 體晶片封裝構造300,除了該導線架320之下表面設有數個 缺口(n〇tch) 3 2 6外,該封裝構造30 0係與第二圖之封裝構 造200相同。該導線架320下表面之缺口 326較佳係以蝕刻 方式形成於晶片承座2 2 2之周緣或該複數條導線2 2 4之内端 224a。當該封裝構造300進行封膠製程時,該導線架32〇下 表面之缺口 326係可供塑料(m〇iding compound)填入,藉 此當塑料固化(curing)後可以提供機械互鎖之功能而進一 步強化該導線架3 2 0與封膠體240間之結合力。此外,該缺 口 326之表面亦可具有一氧化銅覆蓋層用以增加其與封膠Γ, 432658 V. Description of the invention (5) 2 2 2 The plurality of wafer pads of the semiconductor wafer 21 are electrically connected to the inner end 224a of the plurality of wires 2 24 through a plurality of connection wires such as gold wires 2 30. The inner end 224a of the plurality of wires 224 is preferably plated with a metal (not shown in the figure) having a good bonding force with a conventional bonding wire material. The seal gel 240 covers the lead frame 220, the semiconductor wafer 21, and a plurality of gold wires 2 3 0 'so that the lower surface of the lead frame 2 2 0 (that is, the wafer holder 2 2 2' plural The wires 2 2 4 and the lower surfaces of the plurality of supporting ribs 2 2 5) are exposed to the sealing compound 2 4 0 (refer to the fourth figure). Please refer to the second figure again. The wafer holder 2 2 2 preferably has a partial area 222a exposed on the copper oxide cover layer 22a. The area 2 2 2 a of the wafer socket 222 is connected to the semiconductor wafer 2 1 0 by a connection wire such as a gold wire 2 3 2 to provide a ground function. Preferably, a part of the region 222a of the wafer holder 2 2 2 may be plated with a metal (not shown in the second frame) having a good binding force with a conventional connecting wire material. The fifth figure is an outer-lead-free semiconductor chip packaging structure 300 according to the second preferred embodiment of the present invention. The package structure is provided with a plurality of notches 3 2 6 on the lower surface of the lead frame 320. 300 is the same as the package structure 200 of the second figure. The notch 326 on the lower surface of the lead frame 320 is preferably formed by etching on the periphery of the wafer holder 2 2 2 or the inner end 224 a of the plurality of leads 2 2 4. When the encapsulation structure 300 is subjected to an encapsulation process, a gap 326 on the lower surface of the lead frame 32 can be filled by a plastic compound, thereby providing a mechanical interlocking function when the plastic is cured. The bonding force between the lead frame 3 2 0 and the sealing compound 240 is further strengthened. In addition, the surface of the notch 326 may also have a copper oxide cover layer to increase its contact with the sealant.

32 6 5 Ο 五、發明說明(6) 體間之附著力。 根據本發明實施例之導線架較佳係由銅或其合金製成。 此外該導線架亦可由鐵、鎳或其合金製成,然後鍍上一層 銅。根據本發明較佳實施例之導線架其氧化銅覆蓋層較佳 以陽極氧化(anodic oxidation)法塗饰:(A)先將該導線 架表面去油脂(degrease)、清潔、拋光(polish) ;(B)將 該導線架表面不要有氧化銅覆蓋層之區域(例如該導線架 之下表面以及該複數條導線之内端)以膠帶黏貼保護; (C)將已貼上保護膠帶之導線架作為陽極,在一鹼性溶液 (例如氫氧化鈉電解液)中加以電解,藉此形成一氧化銅 覆蓋層於該導線架沒有膠帶保護之表面。該氧化銅覆蓋層 的主要結晶構造為高密度群集之黑色針狀結晶。因此,該 氧化銅覆蓋層之表面係呈現黑色粗糙狀。根據本發明之導 線架,其複數條導線之内端以及該晶片承座用以接地之部 分區域可先以習用之方法鍵上一層與習用連接線(bonding w i r e )材料結合力佳的金屬(例如金或銀),貼上保護膠 帶,然後再經步驟(C)處理。可以理解的是,根據本發明 較佳實施例之導線架亦可進行步驟(A )以及(C )後,再將所 形成之氧化銅覆蓋層以習知的機械研磨法(mechanical abrasion)或{匕學触刻 >去(chemical etch)由該導線架表面 不要有氧化銅覆蓋層之區域(例如該導線架之下表面以及 該複數條導線之内端)移除。 根據本發明較佳實施例之導線架其氧化銅覆蓋層亦可以 化學氧化(chemical oxidation)法塗佈:步驟(A)以及(B)32 6 5 〇 5. Description of the invention (6) Adhesion between bodies. The lead frame according to the embodiment of the present invention is preferably made of copper or an alloy thereof. Alternatively, the lead frame may be made of iron, nickel, or an alloy thereof, and then plated with copper. According to a preferred embodiment of the present invention, the copper oxide coating of the lead frame is preferably anodized (anodic oxidation) method: (A) first degrease the surface of the lead frame, degrease, and polish (polish); (B) The area where the surface of the lead frame is not covered with copper oxide (such as the lower surface of the lead frame and the inner ends of the plurality of wires) is protected by adhesive tape; (C) The lead frame that has been pasted with protective tape As the anode, it is electrolyzed in an alkaline solution (such as sodium hydroxide electrolyte), thereby forming a copper oxide covering layer on the surface of the lead frame which is not protected by tape. The main crystal structure of the copper oxide coating is a high density cluster of black needle-like crystals. Therefore, the surface of the copper oxide cover layer is black and rough. According to the lead frame of the present invention, the inner end of the plurality of wires and a part of the chip holder used for grounding can be bonded to a layer of a metal with a good bonding force with a conventional bonding wire (eg Gold or silver), apply protective tape, and then go through step (C). It can be understood that the lead frame according to the preferred embodiment of the present invention can also be subjected to steps (A) and (C), and then the formed copper oxide covering layer can be subjected to conventional mechanical abrasion or { The chemical etch is removed from areas of the lead frame that do not have a copper oxide coating (such as the lower surface of the lead frame and the inner ends of the plurality of wires). The copper oxide covering layer of the lead frame according to the preferred embodiment of the present invention may also be coated by chemical oxidation method: steps (A) and (B)

第9頁 Γ 膠43 ? F: R ft_ 五、發明說明(7) 同前;(C ’)將已貼上保護膠帶之導線架浸於一化學氧化液 (例如3 %氯化鈉+ 1 %氫氧化鈉+ 1 %磷酸鈉)中,加熱至8 5 導常藉造 度製此覆ί膠 免覆 其正,構 密膠藉銅 封造避銅剝 於片出裝銅高封,化ΐ與構可化其 由晶傳封化由行入氧W架裝,氧止 ,體座明氧係進填在_線封中該防 造導承發一層造料加♦導U程,而 構半片本有蓋構塑增h由 製外力 裝該晶進設覆裝供而&經發銲此著 封此之增係銅封可能^接本迴。附 片因架而面化該係功 直至射題的 晶,線因表氧當隙之b-分聚輻問間 體體導,之該以縫鎖U水I線之之 導膠該出架於所的互0+的透外裂膠 半封由散線由,間械h遭參紅龜電 腳該經月導。成之機 週);如體導 4-者 引於接晶該層組晶供r止ne程殼與 外露直該,蓋晶結提MJPf防11製致架 無裸可由外覆結狀以©且d之導線 之係熱速此e)狀針可 並on溫加導 明面的快=id針色後1率;^高增進 發表生熱率OX色黑化機線在速增 本下產進效C黑該固ί之合以快可 據之所促熱ri之,料“離接所度亦 根架作可散up集時塑層剝之,溫層 線運此之C群程當蓋間體中因蓋Page 9 Γ Adhesive 43? F: R ft_ V. Description of the invention (7) Same as above; (C ') Immerse the lead frame with protective tape immersed in a chemical oxidation solution (for example, 3% sodium chloride + 1% Sodium hydroxide + 1% sodium phosphate), heated to 8 5 hours to make this coating glue to avoid covering its positive, dense plastic by copper seal to avoid copper peeling on the sheet out of the copper high seal, chemical conversion The structure can be chemically sealed by crystal transmission. It is loaded with oxygen, mounted on the oxygen, and the body is filled with oxygen. In the _line seal, the anti-construction guide sends a layer of material plus a U-guide, and the structure The half piece of the plastic structure with the cover is added by the external force to install the crystal into the cover and the & through the welding and sealing the increase of the copper seal is possible ^ this time. The attached sheet is used to surface the work of the system until the crystal of the problem, the wire is guided by the b-diversity radiation of the oxygen gap, and it should be guided by the glue that locks the U water I line. The external 0+ translucent split glue in the all-sealed half-sealed by the scattered line, and the mechanism h is guided by the electric tortoise of the red turtle. If the body guide 4 is connected to the crystal, this layer is used to prevent the shell and the outer shell from being exposed, the cover crystal junction MJPf prevents the 11 frame, and the frame can be naked. And the thermal speed of the wire of d. This e) needle can be combined with the temperature to increase the fastness of the guiding surface = 1 rate after the color of the needle; ^ Highly promotes the heat generation rate. OX color blackening machine wire is produced under rapid increase. The effect of C black and solid solids can be quickly promoted according to what can be promoted. It is expected that "the distance from the connection is also based on the plastic layer that can be scattered when the set is up. Incap

第10頁Page 10

Claims (1)

年"i.月 ^§112494 上各欄由本局填註) 漆ΛΛΙ案號:1卜, hk>/Year " i. Month ^ §112494 The above columns are filled by this Office) Lacquer ΛΛΙ Case No .: 1 Bu, hk > / 公告本 發明專利說明書 432658 中文 無外引腳半導體晶片封裝構造 發明名稱 英文 姓名 (中文) 1. 李世文 2. 林俊宏 3. 趙興華 4. 陶恕 發明人 姓名 (英文) 1. LI Sai Man 2. LIN Chun Hung 3. CHAO Shin Hua 4. TAO Su 國籍 1.中華民國2.中華民國3.中華民國4.中華民國 住、居所 1. 台南市東區崇信街97號13樓之3 2. 高雄市鼓山區華豐街72號9樓 3. 高雄市左營區和光街56巷63弄6號 4. 高雄市左營區崇實新村72~2號 姓名 (名稱) (中文) 1.日月光半導體製造股份有限公司 姓名 1. Advanced Semiconductor Engineering, Inc. (名稱) (英文) 國藉 1.中華民國 申請人 住、居所 (事務所) 1,高雄市楠梓加工出口區經三路26號 代表人 姓名 (中文) 1.張虔生 代表人 姓名 (英文) 1.Announcement of this invention patent specification 432658 Chinese non-lead semiconductor chip package construction invention name English name (Chinese) 1. Li Shiwen 2. Lin Junhong 3. Zhao Xinghua 4. Tao Shu inventor name (English) 1. LI Sai Man 2. LIN Chun Hung 3. CHAO Shin Hua 4. TAO Su Nationality 1. Republic of China 2. Republic of China 3. Republic of China 4. Residence and Domicile 1. 3rd Floor, No. 97, Chongxin Street, East District, Tainan City 2. Gushan, Kaohsiung City 9th Floor, No. 72, Huafeng Street, District 3. No. 6, Lane 63, Lane 56, Heguang Street, Zuoying District, Kaohsiung City 4. No. 72 ~ 2, Chongshi New Village, Zuoying District, Kaohsiung City Name (Name) (Chinese) 1. Sun Moon Semiconductor Manufacturing Co., Ltd. Name 1. Advanced Semiconductor Engineering, Inc. (Name) (English) National borrowing 1. Republic of China applicant residence, residence (office) 1, Kaohsiung Nanzi Processing Export Zone No. 26 Jingsan Road 26 Representative Name (Chinese) 1. Name of Zhang Qiansheng's Representative (English) 1. 苐丨頁苐 丨 Page
TW88112494A 1999-07-21 1999-07-21 Leadless semiconductor chip package structure TW432658B (en)

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