TW432643B - Low pin-count chip package structure and its manufacturing method - Google Patents

Low pin-count chip package structure and its manufacturing method Download PDF

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Publication number
TW432643B
TW432643B TW089100504A TW89100504A TW432643B TW 432643 B TW432643 B TW 432643B TW 089100504 A TW089100504 A TW 089100504A TW 89100504 A TW89100504 A TW 89100504A TW 432643 B TW432643 B TW 432643B
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TW
Taiwan
Prior art keywords
layer
connection pads
cover
metal
nickel
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TW089100504A
Other languages
Chinese (zh)
Inventor
Kyujin Jung
Kun-A Kang
Hyung-Jun Park
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Advanced Semiconductor Eng
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Priority to TW089100504A priority Critical patent/TW432643B/en
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Publication of TW432643B publication Critical patent/TW432643B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

A low pin-count chip package structure and its manufacturing method is provided. It comprises a chip stand that loads a semiconductor chip and plural connection pads connected the chip. An encapsulation body covers the chip, chip seat and plural connection pads with the bottom surface of chip seat and connection pads being exposed. The feature of this invention is that the chip seat and connection pads have concave cross-section toward interior. This structure can lengthen the time of moisture diffusing into the package and enhance the fixing of the chip seat and connection pads in the encapsulation body. The manufacturing of this low pin-count chip package is also described.

Description

「鼷4326 4 3 五、發明說明(l) 發明領域: 本發明係有關於半導體晶片封裝構造,特別有關一種 低接腳數半導體晶片封裝構造(l〇w-pin-count chip package )及其製造方法。 先前技術: 第一囷係為根據中華民國公告第34830 6號專利「具樹 脂封裝體之元件及其製造方法」一較佳實施例之低接腳數 半導體晶片封裝構造100,其包含一晶片110包覆於一封膠 體120内。該晶片110之正面具有複數個晶片銲墊ll〇a電性 連接至複數個連接墊130。該晶片110之背面係以一導電膠 層112裸露於該封膠體120。該複數個連接墊130係環繞該 晶片110而設並且裸露於該封膠體120之下表面用以電性連 接至外部。由於該封膠體120並未包覆該複數個連接墊130 裸露之下表面,因此其無法穩固地固定該複數個連接墊 130 ° 該複數個連接墊1 3 0 —般係以導電性佳的金屬(例如銅 )製成,但封膠體1 2 0是以絕緣材質(例如環氧化合物塑 料)製成。因此,該複數個連接墊130與封膠體120間的結 合力相當弱,並且其間的熱膨脹係數差異很大。當該習用 封裝構造受到溫度變化時,在連接墊與封膠體間的介面就 會因熱膨脹係數不一致(CTE mismatch)導致應力產生,而 該應力更會導致該金屬/塑膠介面產生層裂 (delamination)之現象。當該金屬/塑膠介面產生層裂 時,週遭的水分就會經由該封膠體滲透積聚到該層裂之區"鼷 4326 4 3 V. Description of the Invention (l) Field of the Invention: The present invention relates to a semiconductor wafer package structure, and more particularly to a low-pin-count chip package structure (l0w-pin-count chip package) and its manufacturing. Method: The first technique is a low-pin-count semiconductor chip package structure 100 according to a preferred embodiment of the “Resin-Packaged Component and Manufacturing Method” according to the Republic of China Publication No. 34830 6. The wafer 110 is enclosed in a colloid 120. The front surface of the chip 110 has a plurality of wafer pads 110a electrically connected to the plurality of connection pads 130. The back surface of the chip 110 is exposed to the encapsulant 120 with a conductive adhesive layer 112. The plurality of connection pads 130 are arranged around the chip 110 and are exposed on the lower surface of the encapsulant 120 for electrical connection to the outside. Since the sealing compound 120 does not cover the exposed lower surfaces of the plurality of connection pads 130, it cannot securely fix the plurality of connection pads 130 ° the plurality of connection pads 1 3 0-generally made of a metal with good conductivity (Such as copper), but the encapsulant 1 2 0 is made of an insulating material (such as epoxy compound plastic). Therefore, the bonding force between the plurality of connection pads 130 and the sealant 120 is relatively weak, and the thermal expansion coefficients between them are greatly different. When the conventional package structure is subjected to temperature changes, the interface between the connection pad and the sealing compound will cause stress due to CTE mismatch, and the stress will cause delamination of the metal / plastic interface. Phenomenon. When the metal / plastic interface is spalled, the surrounding water will permeate and accumulate to the spalled area through the sealant.

第4頁 PM 326 4 3 五、發明說明(2) 蜮 > 而-I求分積聚在封膠體中,則遇到溫度快遠增加 時’積聚的水分會瞬間蒸發並且膨脹,因而在該層裂之區 域產生一溫濕應力(hygrothermal stress)而導致附近之 封膠體爆裂(popcorn) »該封膠體之爆裂現象常見於當前 述之習用裝置藉由紅外線轄射迴鮮(IR reflow)焊接至基 板時。 此外’由於該封膠體1 2 0只密封該晶片1 1 〇之一邊,因 此來自空氣之濕氣及/或離子污染可以從封膠體與晶片之 接縫渗入而影響晶片可靠度(reHabiHty),換言之,大 幅降低晶片運作壽命。隨著半導體工業趨向於將電子裝置 封裝於越來越小之封裝構造,該現象也就越來越關鍵。 發明概要: 本發明因此提供一種低接腳數半導體晶片封裝構造, 其可克服或至少改善前述之先前技術的問題。 因此’第一方面’本發明提供一種低接腳數半導體晶 片封裝構造(low-pin-count chip package),其包含一晶 片承座用以承載一半導體晶片,以及複數個連接墊電性連 接至該半導體晶月。一封膠體覆蓋於該半導體晶片、晶片 承座以及複數個連接墊之上使得該晶片承座以及連接墊之 下表面裸露於該封膠體。本發明之特徵在於該晶片承座以 及複數個連接墊具有向内凹入之剖面,藉此延長水氣滲入 封裝構造的路徑以及時間,並且加強固定該晶片承座以及 複數個連接墊於封膠體内。 根據第二方面,本發明另提供一種製造該低接腳數半Page 4 PM 326 4 3 V. Description of the invention (2) 蜮 > And -I finds and accumulates in the sealant, then when the temperature increases rapidly, the accumulated moisture will evaporate and expand instantly, so in this layer The cracked area generates a hygrothermal stress that causes the nearby sealing colloid to pop (the popcorn of the sealing colloid is common when the conventional device is soldered to the substrate by IR reflow) Time. In addition, since the sealing compound 120 seals only one side of the wafer 110, moisture and / or ionic contamination from the air can penetrate from the joint between the sealing compound and the wafer and affect the reliability of the wafer (in other words, reHabiHty), in other words , Greatly reducing the operating life of the chip. As the semiconductor industry tends to package electronic devices in smaller and smaller packaging structures, this phenomenon is becoming increasingly critical. SUMMARY OF THE INVENTION The present invention therefore provides a low-pin-count semiconductor chip package structure that overcomes or at least improves the aforementioned problems of the prior art. Therefore, the "first aspect" of the present invention provides a low-pin-count chip package structure, which includes a chip holder for carrying a semiconductor chip, and a plurality of connection pads electrically connected to the chip pad. The semiconductor crystal moon. A piece of colloid covers the semiconductor wafer, the wafer holder, and the plurality of connection pads so that the lower surfaces of the wafer holder and the connection pad are exposed to the sealing gel. The invention is characterized in that the wafer holder and the plurality of connection pads have inwardly recessed cross-sections, thereby prolonging the path and time for water vapor to penetrate into the packaging structure, and strengthening and fixing the wafer holder and the plurality of connection pads to the sealing body. Inside. According to a second aspect, the present invention further provides a method for manufacturing the low pin number half.

•432643 五、發明說明(3) 導逋晶);封裝構造之方法。該方法包會下列步驟:(a)提 供一承載片;(b)層壓一金屬層於該承載片;(c)半蚀刻= (half-etching)該金屬層藉以在預先設定位置形成複數個 凹部;(d)形成一光阻層於該金屬層上;(e)半除去 (half-removing)該光阻層只留下在該複數個凹部中的光 阻;(f)形成一金屬覆蓋層於該金屬層未為光I1且覆蓋之表 面;(g) 去除在該複數個凹部中的光阻;(h) 蝕刻該金屬 層藉以形成具有向内凹入剖面之晶片承座以及複數個連接 墊;(i)固定一半導體晶片於該承載片上;(j)電性連接 該半導體晶片至該複數個連接墊;(k)形成一封膠體覆蓋 於該半導體晶片以及連接墊之上,其中該向内凹入之剖面 幫助將該複數個連接墊固定於封膠體内;(1)移除該承載 片;及(m)形成一金屬薄鍍層於該晶片承座以及複數個連 接墊之下表面。 圖示說明: 為了讓本發明之上述和其他目的、特徵、和優點能更 明顯特徵’下文特舉本發明較佳實施例,並配合所附圖 示,作詳細說明如下。 第1圖:根據中華民國公告第34830 6號專利「具樹脂 封裝艘之元件及其製造方法」一較佳實施例之低接腳數半 導體晶片封裝構造之剖面圖; 第2圖:根據本發明第一較佳實施例之一低接腳數半 導體晶片封裝構造之剖面圊; 第3圖至第1 〇圖:其揭示一種製造根據本發明第一• 432643 V. Description of the invention (3) Guiding crystal); the method of packaging structure. The method includes the following steps: (a) providing a carrier sheet; (b) laminating a metal layer on the carrier sheet; (c) half-etching = (half-etching) the metal layer to form a plurality of predetermined positions Recesses; (d) forming a photoresist layer on the metal layer; (e) half-removing the photoresist layer leaving only the photoresist in the plurality of recesses; (f) forming a metal cover Layer on the surface covered by the metal layer that is not light I1; (g) removing the photoresist in the plurality of recesses; (h) etching the metal layer to form a wafer holder with an inwardly concave section and a plurality of recesses Connection pads; (i) fixing a semiconductor wafer on the carrier sheet; (j) electrically connecting the semiconductor wafer to the plurality of connection pads; (k) forming a gel covering the semiconductor wafer and the connection pads, wherein The inwardly recessed cross-section helps to secure the plurality of connection pads in the sealant; (1) remove the carrier sheet; and (m) form a thin metal plating layer under the wafer holder and the plurality of connection pads surface. Illustrative illustrations: In order to make the above and other objects, features, and advantages of the present invention more obvious, the preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings. FIG. 1: A cross-sectional view of a low-pin-count semiconductor chip package structure according to a preferred embodiment of the “Resin-Packed Ship and Its Manufacturing Method” patent No. 34830 6; FIG. 2: According to the present invention Cross-section 低 of a low-pin-count semiconductor chip package structure according to one of the first preferred embodiments; FIGS. 3 to 10: FIG.

p f4 326 4 3p f4 326 4 3

五、發明說明(4) 較往貧施例之伋接腳數半導體晶片封裝構 第1 1圖:根據本發明第二較佳實施 接 半導體晶片封裝構造之剖面圖;及 低接腳數 其揭示一種製造根據本發明第 半導體晶片封裝構造之方法a 第1 2圖至第1 5圖 二較佳實施例之低接腳數 圖號說明: 100 低接腳數半導艘晶 片封裝構造 110 晶片 110a 晶片銲墊 112 120 封膠體 130 連接墊 200 低接腳數半導體晶 片封裝構造 210 晶片 210a 晶片鲜塾 212 220 封膠體 230 連接墊 232 240 鎳層 250 金(或鈀) 層 252 鎳層 254 金(或鈀) 層 260 承載片 270 金屬層 272 280 光阻層 導電膠層 連接線 晶片承座V. Description of the invention (4) A semiconductor chip package structure with a lower pin count than the poorer embodiment. Figure 11: A cross-sectional view of a semiconductor chip package structure according to a second preferred embodiment of the present invention; A method for manufacturing a semiconductor chip package structure according to the present invention a. Figure 12 to Figure 15. Figure 2 low pin number drawing preferred embodiment description: 100 low pin number semi-conductor wafer package structure 110 chip 110a Wafer pads 112 120 Sealant 130 Connection pad 200 Low pin number semiconductor wafer package structure 210 Wafer 210a Wafer wafer 212 220 Sealant 230 Connection pad 232 240 Nickel layer 250 Gold (or palladium) layer 252 Nickel layer 254 Gold (or Palladium) layer 260 carrier sheet 270 metal layer 272 280 photoresist layer conductive adhesive layer connecting wire wafer holder

3 0 0 低接腳數半導體晶片封裝構造 發明說明: 第二圖揭示根據本發明第一較佳實施例之一 半導體晶片封裝構造2〇〇,其包含一晶片210藉由-一導電膠 層或不導電膠層例如環氧膠(未示於圖中)固定於一晶片 承座2 32。該晶片210之正面具有複數個晶月銲墊2'1〇a阳其 經由複數條連接線(bonding Wire s)212電性連接至複數個 連接墊230。該複數個連接墊23〇係設於該晶片承座232之3 0 0 Low pin count semiconductor chip package structure invention description: The second figure shows a semiconductor chip package structure 200 according to one of the first preferred embodiments of the present invention, which includes a chip 210 through a conductive adhesive layer or A non-conductive adhesive layer such as an epoxy adhesive (not shown in the figure) is fixed on a wafer holder 2 32. The front surface of the chip 210 has a plurality of wafer pads 2′10a, which are electrically connected to a plurality of connection pads 230 via a plurality of bonding wires 212. The plurality of connection pads 23 are provided on the wafer holder 232.

第7頁 「馨4 3 2 6 4 3 五、發明說明(5) 遇邊。該晶片承座232以及複數個連接墊23 0係裸露於該封 膠髏220之底部,並且都具有向内凹入之剖面,藉此延長 水氣滲入該封裝構造2 0 0的路徑以及時間,並且加強固定 該晶片承座232以及複數個連接墊230於封膠體220内之預 先設定位置。一封膠體覆蓋於該半導體晶片210以及複數 個連接墊230之上。 該晶片承座232以及複數個連接墊230較佳設有一金屬 覆蓋層使其與連接線212可形成良好之接合(bond)。該金 屬覆蓋層一般係包含一層鎳240覆蓋於該晶片承座232以及 複數個連接墊230之上表面以及側面靠近上表面之部分, 以及一層金(或鈀)250覆蓋於該鎳層240。該晶片承座 232以及複數個連接墊230之下表面具有一金屬薄鍍層 (flash) »該金屬薄鍍層較佳係包含一層鎳252覆蓋於該晶 片承座232以及複數個連接墊23 0之下表面以及一層金(或 鈀)254覆蓋於該鎳層。該金屬薄鍍層可以保護該晶片承 座232以及複數個連接塾230不受腐姓(corrosion)或污 染。 該封裝構造2 0 0係可以類似於其他無外引腳裝置 (leadless device)之方式安裝於一基板,例如一印刷電 路板。該印刷電路板可先以錫膏網版印刷(screen print) 成對應於該封裝構造200底部之連接墊230之圖案 (pattern)。然後將該封裝構造200對正置於該印刷電路板 上利用習知的表面接著技術加以回銲即可。可以理解的 是’該封裝構造200底部所裸露之連接墊230亦可先印上錫Page 7 "Xin 4 3 2 6 4 3 V. Description of the invention (5) Edge is encountered. The chip holder 232 and a plurality of connection pads 23 0 are exposed on the bottom of the sealing skull 220 and all have inward recesses. The cross section of the chip is used to extend the path and time for water and gas to penetrate the package structure 2000, and to strengthen and fix the chip holder 232 and the plurality of connection pads 230 in a predetermined position in the sealing compound 220. One gel covers The semiconductor wafer 210 and the plurality of connection pads 230 are disposed on the wafer holder 232 and the plurality of connection pads 230. A metal covering layer is preferably provided to form a good bond with the connection line 212. The metal covering layer Generally, it includes a layer of nickel 240 covering the wafer holder 232 and a plurality of connection pads 230 on the upper surface and a portion of the side close to the upper surface, and a layer of gold (or palladium) 250 covering the nickel layer 240. The wafer holder 232 And the lower surface of the plurality of connection pads 230 has a thin metal plate (flash) »The thin metal plated layer preferably includes a layer of nickel 252 covering the chip holder 232 and the lower surface of the plurality of connection pads 230 and a layer of gold (Or palladium) 254 covers the nickel layer. The thin metal plating layer can protect the wafer holder 232 and the plurality of connection 塾 230 from corrosion or pollution. The package structure 2 0 0 series can be similar to other non- The leadless device is mounted on a substrate, such as a printed circuit board. The printed circuit board can be screen printed with solder paste to correspond to the connection pad 230 at the bottom of the package structure 200. A pattern. Then the package structure 200 is placed on the printed circuit board and re-soldered using a conventional surface bonding technique. It can be understood that 'the connection pad 230 exposed at the bottom of the package structure 200 is also May be printed on tin

——f 4 32B ^ 3__— 五、發明說明(6) f(solder paste),再安裝至基板。 第三圖至第十圖揭示一種根據本發明第一較佳實施例 之製造該低接聊數半導體晶片封裝構造200之方法。 第三圖揭示一承載片260以及一金屬層270 (例如一銅 箔)層壓(lamina ting)於其上。具體言之,該承載片260 較佳為具有一矽樹脂(silicones)膠層之聚醯亞胺 (polyimide)或聚酯(polyester)膠帶。該金屬層270係以 習用之方法(例如熱壓合法)層壓(laminating)於該承載 片260。該承載片260係用以在整個製程中支撐該半導體晶 片210以製造該低接腳數半導體晶片封裝構造2〇〇。 請參照第四圖,該金屬層27 0係以半蝕刻 (half-etching)的方式在預先設定位置形成複數個凹部。 在該半蝕刻製程中沒有被侵蝕的複數個凸部272最後將會 形成該晶片承座232以及複數個連接墊230。在本實施例 中,該金屬層270之厚度約為5~20密爾(mil),而每一個凹 部之蝕刻深度約為2-8密爾(mil )—其視該金屬層270之厚 度而定。值得注意的是,這裡所指的半蝕刻製程,並非只 是表示經由蝕刻精確地去除該金屬層270厚度的一半,而 是包括經由局部蝕刻以去除該金屬層270厚度的一部分。 請參照第五圖,一光阻層2 8 0利用習知的技術(例如印 刷(printing))形成於該金屬層270上》該光阻層280主要 係由樹脂混合物以及光活性物質(photoactive material) 組成,該光活性物質使得該光阻層280光可定義 (photode f i nab 1e)。——F 4 32B ^ 3 __— 5. Description of the invention (6) f (solder paste), and then install it on the substrate. 3 to 10 illustrate a method for manufacturing the low-contact-count semiconductor chip package structure 200 according to the first preferred embodiment of the present invention. The third figure discloses a carrier sheet 260 and a metal layer 270 (e.g., a copper foil) laminated thereon. Specifically, the carrier sheet 260 is preferably a polyimide or polyester tape having a silicone resin layer. The metal layer 270 is laminated on the carrier sheet 260 by a conventional method (for example, a hot pressing method). The carrier wafer 260 is used to support the semiconductor wafer 210 during the entire manufacturing process to manufacture the low-pin-count semiconductor wafer package structure 200. Referring to the fourth figure, the metal layer 270 is formed by a plurality of recesses at a predetermined position in a half-etching manner. The plurality of protrusions 272 not eroded during the half-etching process will eventually form the wafer holder 232 and the plurality of connection pads 230. In this embodiment, the thickness of the metal layer 270 is about 5-20 mils, and the etching depth of each recess is about 2-8 mils—depending on the thickness of the metal layer 270, set. It is worth noting that the half-etching process referred to here does not only mean that half of the thickness of the metal layer 270 is accurately removed by etching, but also includes that a portion of the thickness of the metal layer 270 is removed by partial etching. Referring to the fifth figure, a photoresist layer 280 is formed on the metal layer 270 by a conventional technique (such as printing). The photoresist layer 280 is mainly composed of a resin mixture and a photoactive material. ), The photoactive material makes the photoresist layer 280 photodefinable (photode fi nab 1e).

第9頁 f K4326 4 ______ 五、發明說明(7) 請參照第六圖’該光阻層28 0被以習知的方法「半除去 (half-removing)」而只留下在該複數個凹部中的先阻。 值得注意的是,該光阻層280較佳係被「半除去 (half-removing) j而使該複數個凸部272稍微突出於剩餘 之光阻,藉此所有的凸部272大致係裸露於剩餘之光阻, 並且每一凹部之表面係幾乎完全為該剩餘之光阻所覆蓋。 可以理解的是’該光阻層28 0亦可被「半除去 (half-removing)」而使該複數個凸部272與光阻層280齊 平 〇 請參照第七圖,該包含一層鎳240以及一層金(或鈀) 250之金屬覆蓋層係利用習知的電鍍技術形成於該裸露之 凸部272 »該鎳層240係先電鍍於該凸部272,然後該金 (或鈀)層250再電鍍於該鎳層240上。若第六圖之光阻層 280係被「半除去(half-removing)」而與該複數個凸部 272齊平’則該金屬覆蓋層只形成在該複數個凸部272之上 表面。較佳地,該光阻層280係被「半除去 (half-removing)」而使該複數個凸部272突出於光阻層 280 ’藉此該金屬復蓋層不只形成在該複數個凸部272之上 表面’最佳亦同時形成在侧面靠近上表面之部分。 請參照第八圖,將該光阻層280以習知方法去除。 請參照第九圖’該晶片承座232以及複數個連接墊230 係藉由姓刻該金屬層27〇上未受金屬覆蓋層保護之複數個 凹部(參照第八圖)而形成β因此’藉由對触刻溶液濃 度、钮刻時間之適當控制,該晶片承座2 3 2以及複數個連Page 9 f K4326 4 ______ 5. Description of the invention (7) Please refer to the sixth figure, 'The photoresist layer 280 is "half-removing" in a conventional manner and is left only in the plurality of recesses. The first obstruction in. It is worth noting that the photoresist layer 280 is preferably "half-removed" so that the plurality of convex portions 272 slightly protrude from the remaining photoresist, whereby all the convex portions 272 are substantially exposed on The remaining photoresist, and the surface of each recess is almost completely covered by the remaining photoresist. It can be understood that 'the photoresist layer 280 can also be "half-removed" to make the complex number Each convex portion 272 is flush with the photoresist layer 280. Please refer to the seventh figure. The metal cover layer including a layer of nickel 240 and a layer of gold (or palladium) 250 is formed on the exposed convex portion 272 using a conventional plating technique. »The nickel layer 240 is first plated on the convex portion 272, and then the gold (or palladium) layer 250 is plated on the nickel layer 240. If the photoresist layer 280 of the sixth figure is "half-removed" and is flush with the plurality of convex portions 272 ', the metal cover layer is formed only on the upper surface of the plurality of convex portions 272. Preferably, the photoresist layer 280 is “half-removed” so that the plurality of convex portions 272 protrude from the photoresist layer 280 ′, so that the metal covering layer is not only formed on the plurality of convex portions. The 272 upper surface is preferably formed at the same time as the side surface close to the upper surface. Referring to FIG. 8, the photoresist layer 280 is removed by a conventional method. Please refer to the ninth figure, 'The chip holder 232 and the plurality of connection pads 230 are formed by indenting a plurality of recesses (refer to the eighth figure) on the metal layer 27, which are not protected by a metal cover layer. By appropriate control of the concentration of the etching solution and the buttoning time, the wafer holder 2 3 2 and a plurality of

第10頁 Γ ·4 326 4 3 五、發明說明(8) 接塾230皆可得-向内凹入之剖面。此外,形成在該晶片 承座232以及複數個連接墊230側面一部分的金屬覆蓋層係 有助於改善等向性蝕刻(isotropic etching)常發生的底 切現象(undercut)。由於該金屬覆蓋層亦塗覆在用以電性 連接至半導趙晶片210的複數個連接墊230上,因此其必須 選用與習用連接線(bonding wire)結合力佳者。 請參照第十圖,該半導體晶片2 1 0之背面係利用一膠層 例如導電或不導電之環氧膠(未示於圖中)固接於該晶片 承座232。該複數條連接線(bonding wire)212係利用習知 的打線技術連接至在該晶片210之複數個晶片銲墊2l〇a以 及該複數個連接墊23 0。然後,該封膠體22〇係利用習知的 塑勝模塑法(例如傳遞模塑法(transfer molding))形成 在該承載片260、該半導體晶片21〇以及複數個連接墊230 之上。在硬化(curing)製程中,該塑料(B]〇lding compoimd)會收縮並且會對該晶片承座2 3 2以及連接墊23〇 施以機械應力。因此,該晶片承座232以及連接墊23〇 硬化後之塑料固定在位置上。 最後,進行一分隔步驟將該承載片26()移除,並且電鍍 一金屬薄鍍層於該晶片承座232以及複數個連接墊23()之下 表面,以製得如第二圓所示之低接腳數 造2〇〇。具體m分隔步耗指直接㈣承^^26= 除。並且在剝除後,該晶片承座232以及 仍然如預期嵌在該封膠體22〇内。 W逆接蛩 較佳地,該金屬薄錄I_ 0n _ _ 艰增係包含一層鎳2 5 2覆蓋於該晶片Page 10 Γ · 4 326 4 3 V. Description of the invention (8) All joints 230 can be obtained-a concave section inward. In addition, a metal cover layer formed on a part of the side surface of the wafer holder 232 and the plurality of connection pads 230 helps to improve the undercut that often occurs in isotropic etching. Since the metal cover layer is also coated on the plurality of connection pads 230 for electrically connecting to the semiconductor chip 210, it must be selected with a good bonding force with a conventional bonding wire. Referring to the tenth figure, the back surface of the semiconductor wafer 210 is fixed to the wafer holder 232 with an adhesive layer such as a conductive or non-conductive epoxy adhesive (not shown). The plurality of bonding wires 212 are connected to the plurality of wafer pads 210a on the chip 210 and the plurality of connection pads 230 using a conventional bonding technique. Then, the sealing compound 22 is formed on the carrier sheet 260, the semiconductor wafer 21, and the plurality of connection pads 230 by a conventional plastic molding method (for example, transfer molding). During the curing process, the plastic (B) olding compoimd will shrink and apply mechanical stress to the wafer holder 2 3 2 and the connection pad 23. Therefore, the hardened plastic of the wafer holder 232 and the connection pad 23 is fixed in position. Finally, a separation step is performed to remove the carrier sheet 26 (), and a thin metal plating layer is plated on the lower surface of the wafer holder 232 and the plurality of connection pads 23 (), so as to make the second circle Low pin count makes 200. The specific m-separated step cost refers to direct support ^^ 26 = division. And after peeling off, the wafer holder 232 and still be embedded in the sealing compound 22 as expected. W reverse connection. Preferably, the metal thin film I_ 0n _ _ contains a layer of nickel 2 5 2 to cover the wafer.

% 第11苜 14326 4 3 五、發明說明(9) 承座232以及複數個連接墊23〇之下表面,以及一層金(或 纪)254覆蓋於該錄層252。該金屬薄錄層可以保護該晶片 承座232以及複數個連接墊23〇之裸露部分不受腐蝕 (corrosion) ’藉此確保散熱效率以及該晶片承座232以及 複數個連接墊230之錫球連接可靠度(s〇lder_j〇int reliability)。 第十一圖揭示根據本發明第二較佳實施例之一低接腳 數半導體晶片封裝構造300,其包含一晶片21〇密封於一封 膠體220中。除了該晶片承座232被省略並且該膠層(未示 於圖中)係直接裸露於該封膠體220之外,該封裝構造3〇〇 大致係與第二圖之封裝構造2 〇〇相同。 第十二囷至第十五圈係揭示一種製造根據本發明第二 較佳實施例之低接腳數半導體晶片封裝構造3〇〇之方法。 請參照第十二圖’一金屬層2 7 0 (例如一銅箔)以習用 之方法(例如熱壓合法)層壓(laminating)於一承載片 260 ’並且該金屬層270係以半蚀刻(half-etching)的方式 在預先設定位置形成複數個凹部。在該半蝕刻製程中沒有 被侵蝕的複數個凸部2 72最後將會形成該複數個連接墊 2 30 ° 請參照第十三圖,一光阻層28 0形成於該金屬層2 70上 並且被以習知的方法「半除去(half-removing)」而只留 下在該複數個凹部中的光阻。值得注意的是,所有的凸部 272大致係裸露於剩餘之光阻,並且每一凹部之表面係幾 乎完全為該剩餘之光阻所覆蓋。% Article 11 14326 4 3 V. Description of the invention (9) The lower surface of the socket 232 and the plurality of connection pads 23, and a layer of gold (or period) 254 covers the recording layer 252. The thin metal recording layer can protect the exposed portions of the wafer socket 232 and the plurality of connection pads 23 from corrosion. This ensures heat dissipation efficiency and solder ball connection of the wafer socket 232 and the plurality of connection pads 230. Reliability (solder_jint reliability). FIG. 11 illustrates a low-pin-count semiconductor chip package structure 300 according to a second preferred embodiment of the present invention, which includes a chip 21 sealed in a gel body 220. Except that the wafer holder 232 is omitted and the adhesive layer (not shown in the figure) is directly exposed on the sealing compound 220, the package structure 300 is substantially the same as the package structure 2000 of the second figure. The twelfth to fifteenth circles disclose a method of manufacturing a low-pin-count semiconductor chip package structure 300 according to the second preferred embodiment of the present invention. Please refer to the twelfth figure 'a metal layer 270 (such as a copper foil) is laminated on a carrier sheet 260' by a conventional method (such as hot pressing), and the metal layer 270 is semi-etched ( half-etching) to form a plurality of recesses at a predetermined position. In the half-etching process, the plurality of convex portions 2 72 that are not eroded will finally form the plurality of connection pads 2 30 ° Please refer to the thirteenth figure, a photoresist layer 28 0 is formed on the metal layer 2 70 and The photoresist, which is "half-removing" in a conventional manner, is left only in the plurality of recesses. It is worth noting that all the convex portions 272 are barely exposed to the remaining photoresist, and the surface of each concave portion is almost completely covered by the remaining photoresist.

第12頁 墨43264 3 五、發明說明(ίο) 請參照第十四圖7將該包含一層鎳2 4 0以及一層金(或 飽)250之金屬覆蓋層形成於該裸露之凸部272 (參照第十 三圖),並且去除該光阻層280。 請參照第十五圖,該複數個連接墊230係藉由蝕刻該金 屬層270上未受金屬覆蓋層保護之複數個凹部(參照第十 四圓)而形成。因此’當蝕刻製程完成後,該複數個連接 塾230具有向内凹入之剖面。然後,將該半導想晶片21〇係 利用一膠層(未示於圊中)固接於該承載片26〇,並且經 由複數條連接線(bonding wire )2】2電性連接至該複數個 連接墊230 » 最後’將該封膠體220係利用習知的塑膠模塑法形成在 該半導體晶片210以及複數個連接墊230之上;進行一分隔 步驟將該承載片260移除;並且電鍍一金屬薄鐘層於該複 數個連接墊23 0之下表面’以製得如第十一圖所示之低接 腳數半導體晶片封裝構造3 〇 〇。 在本發明中,該晶片承座以及複數個連接墊具有向内 =入之剖面’藉此增長水氣滲入路徑,因而延長水氣滲入 、'裝構“中機能區域之時間。此外’該向内凹入之剖面可 =幫助將該晶片承座以及複數個連接墊保持在位置上藉 此加強固定該晶片承座以及複數個連接墊於封膠體内。 雖然本發明已以前述較佳實施例揭示,然其並非用以 =發明,任何熟習此技藝者’在不脫離 當可作各種之更…改,因此本發明之= 圍當視後附之申請專利範圍所界定者為準。 第13頁Page 12 Ink 43264 3 V. Description of the Invention (ίο) Please refer to FIG. 14 and FIG. 7 to form the metal covering layer containing a layer of nickel 2 4 0 and a layer of gold (or saturated) 250 on the exposed convex portion 272 (see (Figure 13), and the photoresist layer 280 is removed. Referring to the fifteenth figure, the plurality of connection pads 230 are formed by etching a plurality of recesses (refer to the fourteenth circle) on the metal layer 270 which are not protected by the metal covering layer. Therefore, when the etching process is completed, the plurality of connection 塾 230 has a cross-section recessed inward. Then, the semiconductor wafer 21 is fixed to the carrier sheet 26 with an adhesive layer (not shown in the figure), and is electrically connected to the plurality of wires via a plurality of bonding wires 2] 2. Connection pads 230 »Finally, the sealant 220 is formed on the semiconductor wafer 210 and the plurality of connection pads 230 by a conventional plastic molding method; a separation step is performed to remove the carrier sheet 260; and electroplating A thin metal clock layer is formed on the lower surface of the plurality of connection pads 230 to obtain a low-pin-count semiconductor chip package structure 300 as shown in FIG. 11. In the present invention, the wafer holder and the plurality of connection pads have an inward = inward cross section, thereby increasing the water vapor infiltration path, thereby extending the time for the water vapor infiltration and the functional area in the “structure”. In addition, the direction The recessed profile can help to hold the wafer holder and the plurality of connection pads in position, thereby strengthening and fixing the wafer holder and the plurality of connection pads in the sealing body. Although the present invention has been described in the foregoing preferred embodiment, It is revealed, but it is not used to = invention, any person skilled in this art can make various changes without departing from it. Therefore, the value of the invention = will be determined by the scope of the attached patent application. page

Claims (1)

'^4 32 6 4 3 六、申請專利範圍 1種低接腳數半導體晶月封裝構造,其係包含: —半導體晶片; 複數個連接墊設於該半導艎晶片之週邊,其中該複數 個連接墊具有向内凹入之剖面; 一金屬覆蓋層大致形成於該複數個連接墊之上表面; 該半導體晶片具有複數個晶片銲墊電性連接至該複數 個連接墊; 一封膠體覆蓋於該半導體晶片以及連接墊之上使得該 連接墊之下表面裸露於該封膠體;及 一金屬薄鍍層(flash)設於該複數個連接墊裸露於該 封膠體之下表面, 其中該向内凹入之剖面幫助將該複數個連接墊固定於 封膠體内。 2 、依申請專利範圍第1項之低接腳數半導體晶片封裝構 造,其中該金屬薄鍍層係包含一層鎳復蓋於該複數個連接 墊之下表面以及一層金或鈀覆蓋於該鎳層。 3 、依申請專利範圍第1項之低接腳數半導體晶片封裝構 造,其中該金屬覆蓋層大致形成於該複數個連接塾之上表 面以及側面靠近上表面之部分。 4、依申請專利範圍第3項之低接腳數半導體晶片封裝構 造,其中該金屬覆蓋層係包含一層鎳覆蓋於該複數個連接'^ 4 32 6 4 3 VI. Patent application scope 1 kind of low pin number semiconductor wafer package structure, which includes:-semiconductor wafer; a plurality of connection pads are arranged around the semiconductor chip, wherein the plurality of The connection pad has an inwardly recessed cross-section; a metal cover layer is formed substantially on the upper surface of the plurality of connection pads; the semiconductor wafer has a plurality of wafer pads electrically connected to the plurality of connection pads; The semiconductor wafer and the connection pad are exposed so that the lower surface of the connection pad is exposed to the sealing compound; and a thin metal plating (flash) is provided on the plurality of connection pads exposed to the lower surface of the sealing compound, wherein the inward recess The cut-in section helps to fix the plurality of connection pads in the sealing body. 2. The low-pin-count semiconductor chip package structure according to item 1 of the patent application scope, wherein the thin metal plating layer includes a layer of nickel covering the lower surface of the plurality of connection pads and a layer of gold or palladium covering the nickel layer. 3. The low-pin-count semiconductor chip package structure according to item 1 of the scope of the patent application, wherein the metal cover layer is formed approximately on the surface of the plurality of connection ridges and a portion of the side close to the upper surface. 4. The low-pin-count semiconductor chip package structure according to item 3 of the patent application scope, wherein the metal cover layer includes a layer of nickel to cover the plurality of connections 第14頁Page 14 r 39 R 4 3_ 六、申請專利範圍 墊之上表面以及侧面靠近上表面之部分,以及一層金或鈀 覆蓋於該鎳層。 5 、一種製造低接腳數半導體晶片封裝構造之方法,其包 含下列步驟: 提供一承載片; 層壓一金屬層於該承載片; 半餘刻(half-etching)該金屬層藉以在預先設定位置 形成複數個凹部; 形成一光阻層於該金屬層上; 半除去(half_removing)該光阻層只留下在該複數個 凹部中的光阻; 形成一金屬覆蓋層於該金屬層未為光阻覆蓋之表面; 去除在該複數個凹部中的光阻; 蝕刻該金屬層藉以形成複數個具有向内凹入剖面之連 接墊; 固定一半導體晶另於該承載片上; 電性連接該半導體晶片至該複數個連接墊; 形成一封膠體覆蓋於該半導體晶片以及連接墊之上, 其中該向内凹入之剖面幫助將該複數個連接墊固定於封膠 體内; 移除該承載片;及 形成一金屬薄鍍層於該複數個連接墊裸露於該封膠體 之下表面。r 39 R 4 3_ 6. Scope of patent application The upper surface of the pad and the part close to the upper surface of the side, and a layer of gold or palladium covers the nickel layer. 5. A method for manufacturing a low-pin-count semiconductor chip package structure, comprising the following steps: providing a carrier sheet; laminating a metal layer on the carrier sheet; half-etching the metal layer in a preset A plurality of recesses are formed at positions; a photoresist layer is formed on the metal layer; half_removing the photoresist layer leaves only the photoresist in the plurality of recesses; forming a metal cover layer where the metal layer is not A photoresist-covered surface; removing the photoresist in the plurality of recesses; etching the metal layer to form a plurality of connection pads having an inwardly recessed cross-section; fixing a semiconductor crystal on the carrier sheet; electrically connecting the semiconductor Forming a chip to cover the plurality of connection pads; forming a gel covering the semiconductor wafer and the connection pads, wherein the inwardly recessed cross-section helps to fix the plurality of connection pads in the sealant; removing the carrier sheet; And forming a thin metal plating layer on the plurality of connection pads to be exposed on the lower surface of the sealing compound. 第15頁 驟4 3 2 6 4 3 六、申請專利範圍 6 、依申請專利範圍第5項之製造低接腳數半導體晶片封 裝構造之方法,其中該金属薄艘層係包含一層錄覆蓋於該 複數個連接墊之下表面以及一層金或鈀覆蓋於該鎳層。 7 、依申請專利範圍第5項之製造低接腳數半導體晶片封 裝構造之方法,其中該承載片係為一具有矽樹脂 (silicones)膠層之聚醯亞胺(polyimide)膠帶。 8 、依申請專利範圍第5項之製造低接腳數半導體晶片封 裝構造之方法,其中該承載片係為一具有矽樹脂 (silicones)膠層之聚酯(p〇iyester)膠帶。 9 、依申請專利範圍第5項之製造低接腳數半導體晶片封 裝構造之方法’其中該金屬覆蓋層係包含一層鎳覆蓋於該 金屬層未為光阻覆蓋之表面以及一層金或鈀覆蓋於該鎳 層。 1 0、一種低接腳數半導體晶片封裝構造,其係包含: 一晶片承座以及複數個連接墊設於該晶片承座之週 邊’其中該晶片承座以及複數個連接墊具有向内凹入之剖 面; 一金屬覆蓋層大致形成於該晶片承座以及複數個連 接墊之上表面;Page 15 Step 4 3 2 6 4 3 VI. Patent Application Range 6: A method for manufacturing a low-pin-count semiconductor chip package structure in accordance with item 5 of the patent application range, wherein the metal thin ship layer includes a layer covering the The lower surface of the plurality of connection pads and a layer of gold or palladium cover the nickel layer. 7. The method for manufacturing a low-pin-count semiconductor wafer packaging structure according to item 5 of the scope of the patent application, wherein the carrier sheet is a polyimide tape having a silicone resin adhesive layer. 8. The method for manufacturing a low-pin-count semiconductor wafer packaging structure according to item 5 of the scope of the patent application, wherein the carrier sheet is a polyester ester tape having a silicone resin layer. 9. A method for manufacturing a low-pin-count semiconductor chip package structure according to item 5 of the scope of the patent application, wherein the metal cover layer includes a layer of nickel over the surface of the metal layer that is not covered with photoresist and a layer of gold or palladium over The nickel layer. 10. A low-pin-count semiconductor wafer package structure, comprising: a wafer socket and a plurality of connection pads disposed on the periphery of the wafer socket, wherein the wafer socket and the plurality of connection pads have inward recesses. A cross section; a metal cover layer is formed substantially on the wafer holder and the upper surface of the plurality of connection pads; J 第16頁 驟4 32 6 4 3J P.16 Step 4 32 6 4 3 六、申請專利範圍 一丰導體晶;ΐ設於該晶ji承座並且電性連接至該複 數個連接墊; 一封膠體覆蓋於該半導體晶片以及連接墊之上使得 該晶片承座以及連接墊之下表面裸露於該封膠體;及 一金屬薄鍍層設於該晶片承座以及連接墊裸露於該 封膠體之下表面, ' 其中該向内凹入之剖面幫助將該晶片承座以及複數 個連接墊固定於封膠體内。 封承鎳 片片該 晶晶於 體該蓋 導於覆 半蓋鈀 數覆或 腳鎳金 接層層 低二 之含及 項包以 ο係面 1層表 第鍍下 圍薄之 範屬墊 利金接 專該連 請中個 申其數 依,複 、造及 -—*構以。 1裝座層 封複 片及 晶以 體座。 導承分 半片部 數晶之 腳該面 接於表 低成上 之形近 項致靠 ο大面 1^1 層側 第蓋及 圍覆以 範屬面 利金表 專該上 請中之 申其墊 依,接 、造連 2構個 1裝數 封承 片片部 晶晶之 體該面 導於表 半蓋上 數覆近 腳鎳靠 接層面 低一側。 之含及層 項包以鎳 2係面該 1層表於 第蓋上蓋 圍覆之覆 範屬墊鈀 利金接或 專該連金 請中個層 申其數一 依,複及 、造及以 3構以, 1裝座分 4 IX 其 法 方 之 造 構 裝 封 片 晶 體 導 半 數 腳 接 低 造 製 種Sixth, the scope of patent application is a Fengfeng conductor crystal; it is arranged on the crystal socket and is electrically connected to the plurality of connection pads; a colloid covers the semiconductor wafer and the connection pad so that the wafer seat and the connection pad The lower surface is exposed to the sealing compound; and a thin metal plating layer is provided on the chip holder and the connection pad is exposed to the lower surface of the sealing compound, wherein the inwardly concave section helps the chip holder and a plurality of The connection pad is fixed in the sealing body. Sealed nickel sheet, the crystal body, the cover is guided by a half-covered palladium cover, or a foot nickel-gold connection layer, the second lower layer is included, and the surface is coated with a thin layer of a standard pad. Lijin then specifically asked the applicants to apply for it, restore, build, and --- * construct. 1 Mounting layer Sealing film and crystal base. The guide is divided into half pieces, and the surface is connected to the bottom of the table. The surface is close to the large surface 1 ^ 1 layer side cover and the cover is covered by a normal face gold watch. The padding, connecting, and making up of 2 pieces of 1 piece of several pieces of the supporting piece of the crystal body of the body is guided on the surface of the cover half of the foot close to the lower side of the nickel abutment layer. The content and layer items are covered with nickel 2 series. The 1-layer surface is covered by the top cover. It is a pad of palladium or gold. Please contact the middle layer to apply for it. It consists of 3 structures, 1 seat and 4 IX. 第17頁 膠43264 3 六、申請專利範圍 包舍下列步驟: 提供一承載片; 層壓一金屬層於該承載片; 半蝕刻(ha 1 f - e t ch i ng )該金屬層藉以在預先設定位 置形成複數個凹部; 形成一光阻層於該金屬層上; 半除去(half-removing)該光阻層只留下在該複數 個凹部中的光阻; 形成一金屬覆蓋層於該金屬層未為光阻覆蓋之表 面; 去除在該複數個凹部中的光阻; #刻該金屬層藉以形成具有向内凹入剖面之晶片承 座以及複數個連接墊; 固定一半導體晶片於該承載片上; 電性連接該半導體晶片至該複數個連接墊; 形成一封膠體覆蓋於該半導體晶片以及連接墊之 上,其中該向内凹入之剖面幫助將該複數個連接墊固定於 封膠體内; 移除該承載片;及 形成一金屬薄鍍層於該晶片承座以及複數個連接墊 之下表面。Page 17 glue 43264 3 6. The scope of the patent application covers the following steps: providing a carrier sheet; laminating a metal layer on the carrier sheet; semi-etching (ha 1 f-et ch i ng) the metal layer to be preset Forming a plurality of recesses at a position; forming a photoresist layer on the metal layer; half-removing the photoresist layer leaving only the photoresist in the plurality of recesses; forming a metal cover layer on the metal layer The surface not covered by the photoresist; removing the photoresist in the plurality of recesses; #etching the metal layer to form a wafer holder with an inwardly concave cross section and a plurality of connection pads; fixing a semiconductor wafer on the carrier sheet ; Electrically connecting the semiconductor wafer to the plurality of connection pads; forming a gel covering the semiconductor wafer and the connection pads, wherein the inwardly recessed cross-section helps to fix the plurality of connection pads in the sealing body; Removing the carrier sheet; and forming a thin metal plating layer on the wafer holder and the lower surface of the plurality of connection pads. 第18頁 P4 326 4 3_ 六、申請專利範圍 於該晶;i承座以及複數個連接墊之下表面以及一層金或鈀 覆蓋於該鎳層。 1 6 、依申請專利範圍第1 4項之製造低接腳數半導體晶 片封裝構造之方法,其中該承載片係為一具有矽樹脂 (silicones)膠層之聚醯亞胺(polyimide)勝帶。 晶 體 導脂 半樹 數矽 腳有 接具。 低一帶 造為勝 製係r) 之片te 項載es 4 承ly 1 該PO 第中i( 圍其 範’ 利法 專方 請之 申造 依構 、裝 7封 1 片 聚 之 膠 \ly 5 6 η ο 日卵蓋 體覆 導鎳 半層 數一 腳含 接包 低係 造層 製蓋 之覆 項属 4金 1該 第中 圍其 絕, 利法 專方 請之 申造 依構 、裝 8封 1 片 該 於 蓋 晷 鈀 或 金 層 - 及 以 面 表 之 蓋 阻 光 為 未 層 屬 金 該 於 層 鎳 第19頁Page 18 P4 326 4 3_ VI. The scope of patent application is on the crystal; the lower surface of the i seat and the plurality of connection pads and a layer of gold or palladium cover the nickel layer. 16. The method for manufacturing a low-pin-count semiconductor wafer packaging structure according to item 14 of the scope of patent application, wherein the carrier sheet is a polyimide tape with a silicon resin layer. Crystal lipid-conducting half-tree silicon feet have adapters. The lower area is the winning system r) The film te contains es 4 Cheng ly 1 The PO in the middle of the i (around its scope '), the application of the law requested by the special party, 7 pieces of 1 piece of plastic glue. 5 6 η ο The cover of the Japanese egg cover is covered with half a layer of nickel, and the covering item with a low-layer formation cover is 4 gold, which is the most important. Pack of 8 seals and 1 sheet of palladium or gold layer on the cover-and cover the surface with light blocking as unlayered gold. The layer of nickel page 19
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI409920B (en) * 2011-06-01 2013-09-21 Powertech Technology Inc Leadless leadframe type chip package preventing die pad from delamination
TWI485828B (en) * 2010-11-11 2015-05-21 Advanced Semiconductor Eng Advanced quad flat non-leaded package structure and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI485828B (en) * 2010-11-11 2015-05-21 Advanced Semiconductor Eng Advanced quad flat non-leaded package structure and manufacturing method thereof
TWI409920B (en) * 2011-06-01 2013-09-21 Powertech Technology Inc Leadless leadframe type chip package preventing die pad from delamination

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