TW432656B - Method for producing encapsulation structure of semiconductor chip - Google Patents

Method for producing encapsulation structure of semiconductor chip Download PDF

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Publication number
TW432656B
TW432656B TW88116144A TW88116144A TW432656B TW 432656 B TW432656 B TW 432656B TW 88116144 A TW88116144 A TW 88116144A TW 88116144 A TW88116144 A TW 88116144A TW 432656 B TW432656 B TW 432656B
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TW
Taiwan
Prior art keywords
flexible carrier
wafer
semiconductor wafer
layer
package structure
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Application number
TW88116144A
Other languages
Chinese (zh)
Inventor
Kao-Yu Hsu
Chun-Chi Lee
Original Assignee
Advanced Semiconductor Eng
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Priority to TW88116144A priority Critical patent/TW432656B/en
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Publication of TW432656B publication Critical patent/TW432656B/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • H01L2224/48228Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item the bond pad being disposed in a recess of the surface of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Abstract

A method for producing an encapsulation structure of a semiconductor chip is characterized in that the whole process uses a flexible film carrier (instead of a conventional lead frame or substrate) to support a semiconductor chip. The method comprises forming a plurality of through holes on the flexible film carrier; laminating a metal layer on the lower surface of the flexible film carrier; etching the metal layer to form a plurality of bonding pads corresponding to the plurality of through holes; forming a metal cover layer on the plurality of bonding pads not covered by the flexible film carrier; fastening a semiconductor chip on the upper surface of the flexible film carrier; electrically connecting the chip bonding pad of the semiconductor chip to the plurality of bonding pads; and forming an encapsulation covering the upper surface of the flexible film carrier and the semiconductor chip.

Description

r F432656 五、發明說明(1) 發明領域: 本發明係有關於一種半導體晶片封裝構造及其製造方 法。 先前技術: 第一圖係為根據中華民國公告第348306號專利「具樹 脂封裝體之元件及其製造方法」一較佳實施例之半導體晶 片封裝構造10,其包含一半導體晶片110以一膠潛固著於 一樹脂絕緣層122。該半導體晶片110具有複數個晶片鲜塾 110a用以電性連接其内部電路。樹脂絕緣層122具有複數 個貫穿孔(through hole) 122a設置在該半導艎晶片u〇之 週邊。樹脂絕緣層122之下表面設有複數個連接墊i40a β 該半導體晶片110之複數個晶片銲塾ll〇a係以複數條連接 線130連接至該複數個連接墊140a。該半導體晶片no、樹 脂絕緣層122之上表面以及複數條連接線130係為一封膠體 150包覆。該封裝構造10係可以類似於其他無外引腳裝置 (leadless device)之方式安裝於一基板,例如一印刷電 路板。 中華民國公告第348306號專利亦揭示該低接腳數半導 體晶片封裝構造1 0之製造方法,其主要係利用一金屬引線 架170來同步製造許多半導體晶片封裝構造1〇 (參照第二 圖)3該製造方法包含:(A)覆蓋一光阻層於該引線架 1 7 0表面,轉移所要之圖案,然後顯影使得該引線架1 70對 應於該複數個連接墊140a之區域係未被該光阻層覆蓋。 (B )將一金屬(例如金或鉑)電鍍在該引線架1 7 0未被該r F432656 V. Description of the invention (1) Field of the invention: The present invention relates to a semiconductor wafer package structure and a manufacturing method thereof. Prior art: The first figure is a semiconductor wafer package structure 10 according to a preferred embodiment of the "Resin-Packaged Component and Manufacturing Method" according to the Patent of the Republic of China No. 348306, which includes a semiconductor wafer 110 with an adhesive It is fixed on a resin insulating layer 122. The semiconductor wafer 110 has a plurality of wafers 110a for electrically connecting its internal circuits. The resin insulating layer 122 has a plurality of through holes 122a provided around the semiconductor wafer u0. A plurality of connection pads i40a are provided on the lower surface of the resin insulating layer 122. The plurality of wafer bonding pads 110a of the semiconductor wafer 110 are connected to the plurality of connection pads 140a by a plurality of connection lines 130. The semiconductor wafer no, the upper surface of the resin insulation layer 122, and the plurality of connection lines 130 are covered with a single gel 150. The package structure 10 can be mounted on a substrate, such as a printed circuit board, in a manner similar to other leadless devices. The Republic of China Patent No. 348306 also discloses the manufacturing method of the low pin number semiconductor chip package structure 10, which mainly uses a metal lead frame 170 to simultaneously manufacture many semiconductor chip package structures 10 (refer to the second figure) 3 The manufacturing method includes: (A) covering a photoresist layer on the surface of the lead frame 170, transferring a desired pattern, and developing so that the area of the lead frame 170 corresponding to the plurality of connection pads 140a is not exposed to the light Resistive layer coverage. (B) a metal (such as gold or platinum) is plated on the lead frame 170

第4頁 r 14 32 6 d 6 五、發明說明(2) 光阻層覆蓋的區域’而形成該複數個連接墊l4〇a e(C)除 去該光阻層。(D)形成一樹脂絕緣層122於該引線架170及 該複數個連接墊140a上。(E)在該樹脂絕緣層122上形成. 複數個貫穿孔122a對應於該該複數個連接墊i4〇a 0(F)利 用·^膠層固定該半導體晶片110之背面於該引線架丨上, 遠半導體晶片110之正面具有複數個晶片辉墊H〇a。((;) 電性連接該半導體晶片11 0之複數個晶片銲墊^ 〇 a至相對 應的複數個連接墊130。(1〇形成一封膠體12〇覆蓋在該半 導體晶片110上。最後再進行將該引線架17〇移除之分隔步 驟。如第二圖所示,該分隔步驟一般係利用一蝕刻劑選擇 性的溶解該引線架17〇而不致溶解該複數個連接墊i4〇a。 該低接腳數半導體晶片封裝構造1 〇之製造方法,由於 其係利用一金屬引線架170在整個製程中支撐一半導體晶 片,最後再以餘刻劑將其溶解去除,因此其製程複雜、價 昂且費時。 發明概要: 本發明之主要目的係提供一種半導體晶片封裝構造之 製造方法’其主要係利用一可撓性承載板(flexible film carrier)支撐一半導體晶片,藉此簡化製程並且節省成 本。 根據本發明之半導體晶片封裝構造之製造方法,其包 含下列步驟:在一可撓性承載板形成複數個貫穿孔;將— 金屬層層壓(laminating)於可撓性承載板之下表面;蝕刻 該金屬層而形成複數個連接墊,該每一連接墊之正面係有Page 4 r 14 32 6 d 6 V. Description of the invention (2) The area covered by the photoresist layer 'and forming the plurality of connection pads 140a e (C) to remove the photoresist layer. (D) A resin insulating layer 122 is formed on the lead frame 170 and the plurality of connection pads 140a. (E) is formed on the resin insulating layer 122. A plurality of through-holes 122a correspond to the plurality of connection pads i4〇a 0 (F). The back surface of the semiconductor wafer 110 is fixed on the lead frame with an adhesive layer. The far semiconductor wafer 110 has a plurality of wafer glow pads H0a on the front side. ((;) Electrically connect the plurality of wafer pads ^ 〇a of the semiconductor wafer 110 to the corresponding plurality of connection pads 130. (10 forms a gel 120 covering the semiconductor wafer 110. Finally, A separation step for removing the lead frame 17 is performed. As shown in the second figure, the separation step generally uses an etchant to selectively dissolve the lead frame 17 ° without dissolving the plurality of connection pads i40a. The manufacturing method of the low-pin-count semiconductor wafer package structure 10 uses a metal lead frame 170 to support a semiconductor wafer throughout the entire process, and finally dissolves and removes it with an etchant. Therefore, the manufacturing process is complicated and expensive. Summary of the invention: The main purpose of the present invention is to provide a manufacturing method of a semiconductor wafer package structure, which mainly uses a flexible film carrier to support a semiconductor wafer, thereby simplifying the manufacturing process and saving costs. A method for manufacturing a semiconductor chip package structure according to the present invention, comprising the following steps: forming a plurality of through holes on a flexible carrier board; - the metal layer is laminated (Laminating) below the surface of the flexible carrier plate; etching the metal layer to form a plurality of connection pads, each connecting the front of the pad with a line

第5頁Page 5

部分裸露於相對應之貫穿孔;在該複數個連接塾沒有可撓 性承載板覆蓋之表面形成一金屬覆蓋層;將一半導體晶片 固定於可撓性承載板上表面之晶片設置區域;將該半導趙· 晶片之晶片銲墊電性連接至該複數個連接墊之正面;形 一封膠體覆蓋在可撓性承载板之上表面以及半導體晶片之 上。 30 根據本發明之製造半導體晶片封裝構造之方法,由於 其係利用一可撓性承載板在整個製程中支揮一半導體曰、 片’而不需以蝕刻劑將金屬引線架溶解去除,因此其^程 簡單、成本較低且省時。 ' 圖示說明: 為了讓本發明之上述和其他目的、特徵、和優點能更 明顯特徵,下文特舉本發明較佳實施例,並配合所附1 示,作詳細說明如下。 第1圖:根據中華民國公告第3 48 3 0 6號專利「具樹脂 封裝體之元件及其製造方法」一較佳實施例之半導體晶片 封裝構造之剖面圖; 第2圈:第1圖之半導體晶片封裝構造之製造方法中 分隔步驟之剖面圖; 第3圖至第8圖·其揭示一種製造根據本發明之半導 體晶片封裝構造之方法;及 第9圖:根據本發明一較佳實施例之半導體晶片封裳 構造之剖面圖。 圖號說明:Partially exposed in the corresponding through-holes; forming a metal covering layer on the surfaces of the plurality of connection pads which are not covered by the flexible carrier board; fixing a semiconductor wafer to a wafer setting area on the surface of the flexible carrier board; The semiconductor wafer pads of the semiconductor chip are electrically connected to the front surfaces of the plurality of connection pads; a piece of gel covers the upper surface of the flexible carrier board and the semiconductor wafer. 30 According to the method for manufacturing a semiconductor chip package structure according to the present invention, since a flexible carrier board is used to support a semiconductor chip throughout the entire process, it is not necessary to dissolve and remove the metal lead frame with an etchant. The process is simple, low cost and time-saving. 'Illustration: In order to make the above and other objects, features, and advantages of the present invention more obvious, the following describes the preferred embodiment of the present invention in detail with the accompanying illustration, as follows. FIG. 1: A cross-sectional view of a semiconductor chip package structure according to a preferred embodiment of the “Resin Package Element and Manufacturing Method” according to the Republic of China Publication No. 3 48 3 0 6; A cross-sectional view of a separation step in a method of manufacturing a semiconductor wafer package structure; FIGS. 3 to 8 disclose a method of manufacturing a semiconductor wafer package structure according to the present invention; and FIG. 9: A preferred embodiment according to the present invention A cross-sectional view of a semiconductor wafer sealing structure. Figure number description:

第6頁 VMT· 14 32 6 5 6 五、發明說明(4) 10 晶片 11 銀膠 12 13 晶片銲墊 14 連接線 1 5 16 外腳部 17 内腳部 100 半導體晶片 封裝 構造 110 晶片 110a 晶片鲜塾 112 120 可撓性承載板 120a 貫穿孔 120b 晶片設置區 域 122 樹脂絕緣層 122a 貫穿孔 130 140 金屬層 140a連接墊 144 150 封膠體 170 金屬引線架 發明 說明: 晶片承座 封膠體 銀膠 連接線 金屬覆蓋層 第九圖揭示根據本發明一較佳實施例之半 裝構造100,其包含一半導趙晶片110以一膠層如03/封 112固著於一可撓性承載板120之上表面。該半導 : 1 1 0具有複數個晶片銲墊1 1 〇a用以電性連接其内部電%路。 可撓性承載板120具有複數個貫穿孔(thr〇ugh hQle) /μ 設置於該半導體晶片110之週邊。可撓性承載板丨2〇之下表 面設有複數個連接墊140a。該每一連接墊i4〇a之正面係有 部分裸露於相對應之貫穿孔120a。該每一連接墊14〇a未被 可撓性承載板120覆蓋之表面係具有一金屬覆蓋層144。該 半導體晶片11 0之複數個晶片銲墊1 1 〇a係以複數條連接線 130連接至該複數個連接墊140a之正面,其中該金屬覆蓋 層係用以增進連接線130與連接墊140a間之附著力。該半Page 6 VMT · 14 32 6 5 6 V. Description of the invention (4) 10 Wafer 11 Silver glue 12 13 Wafer pad 14 Connection line 1 5 16 Outer foot 17 Inner foot 100 Semiconductor chip package structure 110 Wafer 110a Wafer fresh塾 112 120 Flexible carrier plate 120a Through hole 120b Wafer setting area 122 Resin insulation layer 122a Through hole 130 140 Metal layer 140a Connecting pad 144 150 Sealant 170 Metal lead frame Description of the invention: Wafer socket sealing gel silver glue connection wire metal The ninth figure of the cover layer reveals a half-packed structure 100 according to a preferred embodiment of the present invention, which includes a half of the guide wafer 110 fixed to an upper surface of a flexible carrier plate 120 with an adhesive layer such as 03 / seal 112. The semi-conductor: 1 10 has a plurality of wafer pads 1 10a for electrically connecting its internal electrical circuits. The flexible carrier board 120 has a plurality of through holes (through hQle) / μ provided on the periphery of the semiconductor wafer 110. A plurality of connection pads 140a are provided on the lower surface of the flexible carrier plate 20. The front surface of each connection pad i4〇a is partially exposed in the corresponding through hole 120a. The surface of each connection pad 14a that is not covered by the flexible carrier plate 120 has a metal covering layer 144. The plurality of wafer pads 1 10a of the semiconductor wafer 110 are connected to the front side of the plurality of connection pads 140a by a plurality of connection lines 130, wherein the metal covering layer is used to promote the connection between the connection lines 130 and the connection pads 140a. Of adhesion. The half

第7頁 五'發明說明(5) 導體晶片110、可撓性承載板120之上表面以及複數條連接 線130係為一封膠體150包覆。 該封裝構造1 〇 〇係可以類似於其他無外引腳裝置 (leadless device)之方式安裝於一基板’例如一印刷電 路板。該印刷電路板可先以錫膏網版印刷(screen print) 成對應於該封裝構造100底部之連接墊14〇a之圖案 (pattern)。然後將該封裝構造對正置於該印刷電路板 上加以回銲即可。可以理解的是’該封裝構造底部之 連接墊130亦可先印上錫膏形成錫球後’再安裝至基板。 第三圖至第八圖係用以說明根據本發明之製造該半導 體晶片封裝構造100之方法。 第三圊揭示一可撓性承載板120 »可撓性承載板120可 為一樹脂薄片(r e s i n f i 1 m )。較佳地,可撓性承載板1 2 0 係以聚醢亞胺(polyimide)製成,使其具有較佳之承載板 特性,而完全符合各項信賴性測試。 請參照第四圖,複數個貫穿孔1 2 0 a形成在可撓性承載 板120上,其可利用習知的衝孔技術(punching technique)。在可撓性承載板120上複數個貫穿孔120a所 圍成之中間區域係為晶片設置區域1 2 0 b。 請參照第五圖,該金屬層1 4 0 (例如一銅箔)係以習用 之方法(例如熱壓合法)層壓(laminating)於可撓性承載 板1 20上。 請參照第六圖’該複數個連接塾1 2 0 a係以微影 (photolithography)以及蝕刻(etching)的方式形成,其P.7 Description of the invention (5) The upper surface of the conductor chip 110, the flexible carrier plate 120, and the plurality of connection lines 130 are covered with a piece of colloid 150. The package structure 100 can be mounted on a substrate 'such as a printed circuit board in a manner similar to other leadless devices. The printed circuit board may be first screen-printed with a solder paste into a pattern corresponding to the connection pad 14a at the bottom of the package structure 100. The package structure is then placed on the printed circuit board and re-soldered. It can be understood that 'the connection pad 130 at the bottom of the package structure can also be printed with solder paste to form a solder ball' before being mounted on the substrate. The third to eighth figures are for explaining a method of manufacturing the semiconductor chip package structure 100 according to the present invention. The third aspect discloses a flexible carrier plate 120 »The flexible carrier plate 120 may be a resin sheet (r e s i n f i 1 m). Preferably, the flexible carrier plate 120 is made of polyimide, so that it has better characteristics of the carrier plate and fully meets various reliability tests. Referring to the fourth figure, a plurality of through holes 1220a are formed in the flexible carrier plate 120, which can use a conventional punching technique. The intermediate region surrounded by the plurality of through-holes 120a in the flexible carrier plate 120 is a wafer setting region 1 2 0 b. Referring to the fifth figure, the metal layer 140 (for example, a copper foil) is laminated on the flexible supporting plate 120 by a conventional method (for example, a hot pressing method). Please refer to the sixth figure. The plurality of connections 塾 1 2 0 a are formed in a photolithography and etching manner.

第8頁Page 8

^步驟(A)塗佈一光阻層於該金屬層之表面上, Ϊ @ ί f ΐ圖案轉移’(C)利用#刻將金屬層未被光 阻保濩的邛乃除去而形成相對應之複數個連接墊12〇a , · (D)除去該光阻層。 請參照第七圖,該金屬覆蓋層144形成在該複數個連接 墊140 a,沒有可撓性承載板12〇覆蓋之表面β該金屬覆蓋層 144可以習用之電鍍方法形成於該複數個連接墊14〇&上, 例如先鍍上一層鎳(Ni),再鍍上一層金(Au)。由於該金屬 覆蓋層134係塗覆在用以電性連接至一半導體晶片的複數 個連接塾上,因此其必須選用與習用連接線(b〇nding w i re )材料結合力及導電性較佳者。 請參照第七圖’該晶片丨丨〇之背面係以一膠層例如銀膠 112固著於在可撓性承載板12〇上複數個貫穿孔12〇 &所圍住 之晶片設置區域120b。該複數條連接線(bonding w 1 re ) 1 3 0係利用習知的打線技術連接在該晶片π 〇之複數 個晶片銲墊11 0 a以及該複數個連接墊1 4 〇 a之間。 請參照第八圖,該封膠體1 5 〇係利用習知的塑膠模塑法 (例如傳遞模塑法(transfer molding))形成在該半導體 晶片110以及可撓性承載板120之上表面而製得該半導體晶 片封裝構造1 0 0。 根據本發明之製造半導體晶片封裝構造之方法,其係 利用一可撓性承載板在整個製程中支撐一半導體晶片,因 此不需要額外之分隔步驟;相反地,由於中華民國第 348306號專利主要係利用一金屬引線架來同步製造許多半^ Step (A) applies a photoresist layer on the surface of the metal layer, and Ϊ @ ί f ΐ pattern transfer '(C) uses # 刻 to remove the metal layer which is not protected by photoresist and forms a corresponding (D) removing the photoresist layer. Referring to the seventh figure, the metal covering layer 144 is formed on the plurality of connection pads 140a, and the surface not covered by the flexible carrier plate 120. The metal covering layer 144 can be formed on the plurality of connection pads by a conventional electroplating method. 14〇 &, for example, a layer of nickel (Ni) is plated first, and then a layer of gold (Au) is plated. Since the metal cover layer 134 is coated on a plurality of connection pads for electrically connecting to a semiconductor wafer, it must be selected with a material that has better bonding force and conductivity with a conventional connection wire (bonding wi re). . Please refer to the seventh figure. The back side of the wafer is fixed with an adhesive layer, such as silver glue 112, on the flexible carrier board 120. The through-holes 120 are surrounded by the wafer setting area 120b. . The plurality of bonding wires (bonding w 1 re) 1 3 0 are connected between the plurality of chip pads 11 0 a of the chip π and the plurality of connection pads 14 0 a by using a conventional bonding technology. Referring to FIG. 8, the sealing compound 150 is formed on the upper surface of the semiconductor wafer 110 and the flexible carrier plate 120 by a conventional plastic molding method (such as transfer molding). The semiconductor chip package structure 100 is obtained. According to the method for manufacturing a semiconductor wafer package structure according to the present invention, a flexible carrier board is used to support a semiconductor wafer during the entire process, so no additional separation step is required; on the contrary, since the Republic of China Patent No. 348306 mainly deals with Using a metal lead frame to simultaneously manufacture many halves

Γ 14 32 6 5 6 五、發明說明(7) 導體晶片封裝構造,因此其最後需進行一分隔步驟,即利 用一蝕刻劑選擇性的溶解該引線架。因而根據本發明之製 造方法簡單、價廉且省時。 雖然本發明已以前述較佳實施例揭示,然其並非用以 限定本發明,任何熟習此技藝者,在不脫離本發明之精神 和範圍内,當可作各種之更動與修改,因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。Γ 14 32 6 5 6 V. Description of the invention (7) The conductor chip package structure needs a separation step at the end, that is, the lead frame is selectively dissolved with an etchant. Therefore, the manufacturing method according to the present invention is simple, inexpensive, and time-saving. Although the present invention has been disclosed with the aforementioned preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. The scope of protection shall be determined by the scope of the attached patent application.

Claims (1)

M 32 6 5 6 六、申請專利範圍 1 、一種製造半導體晶片封裝構造之方法,其包含下列步 驟: 提供一可撓性承載板具有一上表面以及一下表面,可 撓性承載板上表面具有一晶片設置區域; 在可撓性承載板形成複數個貫穿孔於該晶片設置區域 之週邊; 層壓(laminating) —金屬層於可撓性承載板之下表 面; 蝕刻該金屬層而形成複數個連接墊,該每一連接墊之 正面係有部分裸露於相對應之貫穿孔; 形成一金屬覆蓋層於該複數個連接墊沒有可撓性承載 板覆蓋之表面; 固定一半導體晶片於可撓性承载板上表面之晶片設置 區域,該半導體晶片具有複數個晶片銲墊; 電性連接該半導體晶片之複數個晶片銲墊至該複數個 連接墊之正面; 形成一封膠體覆蓋在可撓性承載板之上表面以及半導 體晶片之上。 2 、依申請專利範圍第1項之製造半導體晶片封裝構造之 方法,其另包含印上錫膏於該複數個連接墊之背面。 之 造 構 裝 封 片 晶 體 導 半 造。 製箔 之銅 項一 1為 第係 圍層 範屬 利金 專該 請中 申其 依, 、法 3方M 32 6 5 6 VI. Patent application scope 1. A method for manufacturing a semiconductor chip package structure, comprising the following steps: providing a flexible carrier board with an upper surface and a lower surface, the surface of the flexible carrier board having a Wafer setting area; forming a plurality of through holes in the flexible carrier plate around the wafer setting area; laminating—a metal layer on the lower surface of the flexible carrier plate; etching the metal layer to form a plurality of connections Pads, the front side of each connection pad is partially exposed at the corresponding through hole; a metal cover is formed on the surface of the plurality of connection pads which is not covered by the flexible carrier plate; a semiconductor wafer is fixed on the flexible carrier A wafer setting area on the board surface, the semiconductor wafer has a plurality of wafer pads; electrically connecting the plurality of wafer pads of the semiconductor wafer to the front side of the plurality of connection pads; forming a colloid to cover the flexible carrier board On the top surface and on the semiconductor wafer. 2. The method for manufacturing a semiconductor chip package structure according to item 1 of the scope of patent application, which further includes printing solder paste on the back of the plurality of connection pads. The structure of the packaged cover lens is semi-conducted. Copper foil making item 1 is the first type of enclosing layer. Fan Lijin should apply for it in accordance with the law. 第11頁 f ¢4 326 5 6_ 六、申請專利範圍 4 、依申請專利範圍第1項之製造半導體晶片封裝構造之 方法,其中該金屬覆蓋層係包含一層鎳(Ni)覆蓋於該晶片 承座以及複數個連接墊沒有可撓性承載板覆蓋之表面,以 及一層金(Au)覆蓋於該鎳層之表面。 5 、依申請專利範圍第1項之製造半導體晶片封裝構造之 方法,其中可撓性承載板係為一樹脂薄片(resin fi lm)。 6 、申請專利範圍第1項之製造半導體晶片封裝構造之方 法,其中可撓性承載板係以聚酿亞胺(polyimide)製成。Page 11 f ¢ 4 326 5 6_ VI. Patent application scope 4: The method for manufacturing a semiconductor wafer package structure according to item 1 of the patent application scope, wherein the metal covering layer includes a layer of nickel (Ni) covering the wafer holder And the surface of the plurality of connection pads not covered by the flexible carrier plate, and a layer of gold (Au) covering the surface of the nickel layer. 5. The method for manufacturing a semiconductor wafer package structure according to item 1 of the scope of the patent application, wherein the flexible carrier board is a resin sheet (resin film). 6. The method for manufacturing a semiconductor wafer package structure according to item 1 of the patent application, wherein the flexible carrier board is made of polyimide. 第12頁 iP. 12 i
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