TW376332B - Magnet supporter for the foil mask - Google Patents

Magnet supporter for the foil mask

Info

Publication number
TW376332B
TW376332B TW087105880A TW87105880A TW376332B TW 376332 B TW376332 B TW 376332B TW 087105880 A TW087105880 A TW 087105880A TW 87105880 A TW87105880 A TW 87105880A TW 376332 B TW376332 B TW 376332B
Authority
TW
Taiwan
Prior art keywords
substrate
mask
foil
permanent magnets
carrier plate
Prior art date
Application number
TW087105880A
Other languages
English (en)
Inventor
Juergen Nader
Hans Wolf
Reiner Hinterschuster
Original Assignee
Applied Materials Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Gmbh & Co Kg filed Critical Applied Materials Gmbh & Co Kg
Application granted granted Critical
Publication of TW376332B publication Critical patent/TW376332B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
TW087105880A 1997-04-28 1998-04-17 Magnet supporter for the foil mask TW376332B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE29707686U DE29707686U1 (de) 1997-04-28 1997-04-28 Magnethalterung für Folienmasken

Publications (1)

Publication Number Publication Date
TW376332B true TW376332B (en) 1999-12-11

Family

ID=8039673

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087105880A TW376332B (en) 1997-04-28 1998-04-17 Magnet supporter for the foil mask

Country Status (3)

Country Link
JP (1) JPH10317139A (zh)
DE (1) DE29707686U1 (zh)
TW (1) TW376332B (zh)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19859172A1 (de) * 1998-12-21 2000-06-29 Uhp Corp Selektive Oberflächenbehandlung durch magnetische Maskenhalterung
TW490714B (en) * 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
KR100382491B1 (ko) 2000-11-28 2003-05-09 엘지전자 주식회사 유기 ｅｌ의 새도우 마스크
JP3651432B2 (ja) * 2001-09-25 2005-05-25 セイコーエプソン株式会社 マスク及びその製造方法並びにエレクトロルミネッセンス装置の製造方法
US6897164B2 (en) * 2002-02-14 2005-05-24 3M Innovative Properties Company Aperture masks for circuit fabrication
DE10232821B4 (de) * 2002-07-12 2006-06-14 Domorazek, Gottfried, Dr.-Ing.habil. Verfahren zum Herstellen von Sensoren zum elektrischen Messen der Füllstandshöhe sowie Einrichtung zum Herstellen solcher Sensoren
KR100463532B1 (ko) * 2002-10-22 2004-12-29 엘지전자 주식회사 대면적 풀-컬러 디스플레이 패널의 제작방법
DE102004034418B4 (de) * 2004-07-15 2009-06-25 Schott Ag Verfahren zur Herstellung struktuierter optischer Filterschichten auf Substraten
US20060011137A1 (en) * 2004-07-16 2006-01-19 Applied Materials, Inc. Shadow frame with mask panels
DE502005003731D1 (de) * 2005-04-20 2008-05-29 Applied Materials Gmbh & Co Kg Magnetische Maskenhalterung
JP4795842B2 (ja) * 2006-04-26 2011-10-19 日本冶金工業株式会社 蒸着用治具
JP5157700B2 (ja) * 2007-07-25 2013-03-06 セイコーエプソン株式会社 時計用文字板、時計用文字板の製造方法、および、時計
DE102008037387A1 (de) * 2008-09-24 2010-03-25 Aixtron Ag Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske
JP5941971B2 (ja) * 2014-12-10 2016-06-29 東京エレクトロン株式会社 リング状シールド部材及びリング状シールド部材を備えた基板載置台
WO2016109975A1 (en) * 2015-01-09 2016-07-14 Applied Materials,Inc. Method for coating thin metal substrates using pulsed or combustion coating processes
TWI705152B (zh) 2017-10-24 2020-09-21 日商愛發科股份有限公司 基板處理裝置、支持銷
US11756816B2 (en) 2019-07-26 2023-09-12 Applied Materials, Inc. Carrier FOUP and a method of placing a carrier
US11196360B2 (en) 2019-07-26 2021-12-07 Applied Materials, Inc. System and method for electrostatically chucking a substrate to a carrier
US10916464B1 (en) 2019-07-26 2021-02-09 Applied Materials, Inc. Method of pre aligning carrier, wafer and carrier-wafer combination for throughput efficiency

Also Published As

Publication number Publication date
JPH10317139A (ja) 1998-12-02
DE29707686U1 (de) 1997-06-26

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees