TW373250B - Cutting into plurality of drawing sketch field to produce high precision electric load beam sketch data method - Google Patents
Cutting into plurality of drawing sketch field to produce high precision electric load beam sketch data methodInfo
- Publication number
- TW373250B TW373250B TW086116236A TW86116236A TW373250B TW 373250 B TW373250 B TW 373250B TW 086116236 A TW086116236 A TW 086116236A TW 86116236 A TW86116236 A TW 86116236A TW 373250 B TW373250 B TW 373250B
- Authority
- TW
- Taiwan
- Prior art keywords
- image
- sketch
- data
- basic image
- electric load
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
- H01J37/3026—Patterning strategy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31761—Patterning strategy
- H01J2237/31762—Computer and memory organisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31761—Patterning strategy
- H01J2237/31764—Dividing into sub-patterns
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electron Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32708396 | 1996-12-06 | ||
JP13494797A JPH10223526A (ja) | 1996-12-06 | 1997-05-26 | 荷電ビーム描画データ作成装置および方法ならびに荷電ビーム描画データ作成方法をコンピュータに実行させるためのプログラムを記録した機械可読な記憶媒体 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW373250B true TW373250B (en) | 1999-11-01 |
Family
ID=26468930
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086116236A TW373250B (en) | 1996-12-06 | 1997-10-29 | Cutting into plurality of drawing sketch field to produce high precision electric load beam sketch data method |
Country Status (4)
Country | Link |
---|---|
US (1) | US6088520A (zh) |
JP (1) | JPH10223526A (zh) |
KR (1) | KR100258170B1 (zh) |
TW (1) | TW373250B (zh) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000020564A (ja) * | 1998-06-29 | 2000-01-21 | Mitsubishi Electric Corp | レイアウトパターンデータ補正装置、レイアウトパターンデータ補正方法、その補正方法を用いた半導体装置の製造方法、および、半導体装置の製造プログラムを記録した記録媒体 |
US7320104B2 (en) | 2000-02-12 | 2008-01-15 | Adobe Systems Incorporated | Text grid creation tools |
US7071941B2 (en) * | 2000-02-12 | 2006-07-04 | Adobe Systems Incorporated | Method for calculating CJK emboxes in fonts |
US7305617B2 (en) * | 2000-02-12 | 2007-12-04 | Adobe Systems Incorporated | Method for aligning text to baseline grids and to CJK character grids |
US6993709B1 (en) * | 2000-02-12 | 2006-01-31 | Adobe Systems Incorporated | Smart corner move snapping |
US6622295B1 (en) * | 2000-07-05 | 2003-09-16 | Dupont Photomasks, Inc. | Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
JP4101491B2 (ja) * | 2000-09-25 | 2008-06-18 | アドビ システムズ, インコーポレイテッド | 合成フォント編集装置、合成フォント編集プログラム及びそれを記録した記録媒体 |
US7168037B2 (en) * | 2000-09-25 | 2007-01-23 | Adobe Systems Incorporated | Text composition spacing amount setting device with icon indicators |
US6928611B2 (en) * | 2000-09-25 | 2005-08-09 | Adobe Systems Incorporated | Setting text composition spacing amount |
US7296227B2 (en) | 2001-02-12 | 2007-11-13 | Adobe Systems Incorporated | Determining line leading in accordance with traditional Japanese practices |
JP2003045780A (ja) * | 2001-07-30 | 2003-02-14 | Nec Corp | マスク描画データの作成方法 |
US7167274B2 (en) * | 2001-09-28 | 2007-01-23 | Adobe Systems Incorporated | Line leading from an arbitrary point |
US7039862B2 (en) | 2002-05-10 | 2006-05-02 | Adobe Systems Incorporated | Text spacing adjustment |
US7123261B2 (en) * | 2002-12-26 | 2006-10-17 | Adobe Systems Incorporated | Coordinating grid tracking and mojikumi spacing of Japanese text |
US20040125107A1 (en) * | 2002-12-26 | 2004-07-01 | Mccully Nathaniel M. | Coordinating grid tracking and mojikumi spacing of Japanese text |
US7594171B2 (en) | 2004-10-01 | 2009-09-22 | Adobe Systems Incorporated | Rule-based text layout |
JP4566772B2 (ja) * | 2005-02-14 | 2010-10-20 | キヤノン株式会社 | 画像処理装置、画像処理方法、及びプログラム |
JP4877959B2 (ja) * | 2006-09-25 | 2012-02-15 | 富士通セミコンダクター株式会社 | 電子線露光用データ作成方法、電子線露光方法、半導体装置の製造方法及び電子線露光装置 |
JP5068549B2 (ja) * | 2007-01-23 | 2012-11-07 | 株式会社ニューフレアテクノロジー | 描画データの作成方法及びレイアウトデータファイルの作成方法 |
JP5309930B2 (ja) * | 2008-11-28 | 2013-10-09 | 大日本印刷株式会社 | 描画データ作成プログラム、描画データ作成方法、描画データ作成装置、描画システム |
JP5403603B2 (ja) * | 2009-05-28 | 2014-01-29 | 株式会社ニューフレアテクノロジー | 描画装置の描画エラー検証方法及び描画装置の描画エラー検証用データの作成装置 |
JP2018170448A (ja) * | 2017-03-30 | 2018-11-01 | 株式会社ニューフレアテクノロジー | 描画データ作成方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5366847A (en) * | 1992-02-24 | 1994-11-22 | Trw Inc. | Method and apparatus for optimizing semiconductor exposure process |
EP0608657A1 (en) * | 1993-01-29 | 1994-08-03 | International Business Machines Corporation | Apparatus and method for preparing shape data for proximity correction |
US5481472A (en) * | 1993-05-18 | 1996-01-02 | International Business Machines Corporation | Method and apparatus for automatically recognizing repeated shapes for data compaction |
JP3549282B2 (ja) * | 1995-04-28 | 2004-08-04 | 株式会社ルネサステクノロジ | 荷電ビーム描画データ作成方法およびその作成装置 |
JP3334441B2 (ja) * | 1995-08-01 | 2002-10-15 | ソニー株式会社 | フォトマスク描画用パターンデータ補正方法と補正装置 |
US5740068A (en) * | 1996-05-30 | 1998-04-14 | International Business Machines Corporation | Fidelity enhancement of lithographic and reactive-ion-etched images by optical proximity correction |
-
1997
- 1997-05-26 JP JP13494797A patent/JPH10223526A/ja active Pending
- 1997-10-29 TW TW086116236A patent/TW373250B/zh not_active IP Right Cessation
- 1997-11-13 US US08/971,132 patent/US6088520A/en not_active Expired - Lifetime
- 1997-11-18 KR KR1019970060877A patent/KR100258170B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH10223526A (ja) | 1998-08-21 |
KR19980063588A (ko) | 1998-10-07 |
KR100258170B1 (ko) | 2000-06-01 |
US6088520A (en) | 2000-07-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |