TW372367B - Lateral PN digital x-ray image pixelated sensor - Google Patents

Lateral PN digital x-ray image pixelated sensor

Info

Publication number
TW372367B
TW372367B TW087108562A TW87108562A TW372367B TW 372367 B TW372367 B TW 372367B TW 087108562 A TW087108562 A TW 087108562A TW 87108562 A TW87108562 A TW 87108562A TW 372367 B TW372367 B TW 372367B
Authority
TW
Taiwan
Prior art keywords
junctions
wafer
digital
ray
ray image
Prior art date
Application number
TW087108562A
Other languages
Chinese (zh)
Inventor
Chung-Pin Liao
ren-zhao Wu
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Priority to TW087108562A priority Critical patent/TW372367B/en
Application granted granted Critical
Publication of TW372367B publication Critical patent/TW372367B/en

Links

Landscapes

  • Measurement Of Radiation (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

A kind of X-ray image pixelated sensor and the manufacturing method thereof. The column is defined by a set of PN junctions in the silicon wafer in which the PN junctions are totally extended on two surfaces of wafer. The PN junctions are formed by neutron transmutation doping which is applied in the P-type silicon with a mask so as to form a N-type column in a wide P-type material. By allocating the bias electrodes, it forms a space charge area which has smaller volume on the top for the entry of X-ray and larger volume at the bottom. In this way, the secondary electrons can be accumulated at the lower space charge area when X-ray passes the wafer. Most of the secondary electrons will pass a charge read-out circuit and convert to image display by digital method.
TW087108562A 1998-06-02 1998-06-02 Lateral PN digital x-ray image pixelated sensor TW372367B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW087108562A TW372367B (en) 1998-06-02 1998-06-02 Lateral PN digital x-ray image pixelated sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW087108562A TW372367B (en) 1998-06-02 1998-06-02 Lateral PN digital x-ray image pixelated sensor

Publications (1)

Publication Number Publication Date
TW372367B true TW372367B (en) 1999-10-21

Family

ID=57941642

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087108562A TW372367B (en) 1998-06-02 1998-06-02 Lateral PN digital x-ray image pixelated sensor

Country Status (1)

Country Link
TW (1) TW372367B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI734035B (en) * 2017-09-29 2021-07-21 荷蘭商Asml荷蘭公司 Semiconductor substrate, charged particle beam apparatus, and method for determining a charged particle signal

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI734035B (en) * 2017-09-29 2021-07-21 荷蘭商Asml荷蘭公司 Semiconductor substrate, charged particle beam apparatus, and method for determining a charged particle signal
US11222766B2 (en) 2017-09-29 2022-01-11 Asml Netherlands B.V. Multi-cell detector for charged particles
US11784024B2 (en) 2017-09-29 2023-10-10 Asml Netherlands B.V. Multi-cell detector for charged particles

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees