TW371726B - Apparatus for bonding of pellicle liner - Google Patents
Apparatus for bonding of pellicle linerInfo
- Publication number
- TW371726B TW371726B TW088102782A TW88102782A TW371726B TW 371726 B TW371726 B TW 371726B TW 088102782 A TW088102782 A TW 088102782A TW 88102782 A TW88102782 A TW 88102782A TW 371726 B TW371726 B TW 371726B
- Authority
- TW
- Taiwan
- Prior art keywords
- pellicle
- bonding
- liner
- sensitive adhesive
- pellicle frame
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6269298A JPH11258779A (ja) | 1998-03-13 | 1998-03-13 | ペリクルライナー貼り合わせ装置及び方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW371726B true TW371726B (en) | 1999-10-11 |
Family
ID=13207609
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW088102782A TW371726B (en) | 1998-03-13 | 1999-02-24 | Apparatus for bonding of pellicle liner |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPH11258779A (zh) |
KR (1) | KR19990077808A (zh) |
TW (1) | TW371726B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107111224A (zh) * | 2014-11-17 | 2017-08-29 | Asml荷兰有限公司 | 设备 |
TWI609235B (zh) * | 2015-11-09 | 2017-12-21 | 艾斯邁科技股份有限公司 | 光罩檢測裝置及其方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100505283B1 (ko) * | 2001-10-31 | 2005-08-03 | 미쓰이 가가쿠 가부시키가이샤 | 펠리클 및 펠리클 부착 마스크의 제조 방법 |
KR100648244B1 (ko) * | 2005-09-09 | 2006-11-23 | 민경준 | 페리클 접착장치의 제어방법 |
JP5202557B2 (ja) * | 2010-03-05 | 2013-06-05 | 信越化学工業株式会社 | ペリクルハンドリング治具 |
JP2012103638A (ja) * | 2010-11-15 | 2012-05-31 | Shin Etsu Chem Co Ltd | ペリクルハンドリング治具 |
KR101317206B1 (ko) * | 2012-07-24 | 2013-10-10 | 민경준 | 페리클 자동 접착 장치 |
-
1998
- 1998-03-13 JP JP6269298A patent/JPH11258779A/ja active Pending
-
1999
- 1999-02-24 TW TW088102782A patent/TW371726B/zh not_active IP Right Cessation
- 1999-03-12 KR KR1019990008188A patent/KR19990077808A/ko not_active Application Discontinuation
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107111224A (zh) * | 2014-11-17 | 2017-08-29 | Asml荷兰有限公司 | 设备 |
US10969701B2 (en) | 2014-11-17 | 2021-04-06 | Asml Netherlands B.V. | Pellicle attachment apparatus |
CN107111224B (zh) * | 2014-11-17 | 2021-05-07 | Asml荷兰有限公司 | 表膜附接设备 |
US11003098B2 (en) | 2014-11-17 | 2021-05-11 | Asml Netherlands B.V | Pellicle attachment apparatus |
US11009803B2 (en) | 2014-11-17 | 2021-05-18 | Asml Netherlands B.V. | Mask assembly |
TWI609235B (zh) * | 2015-11-09 | 2017-12-21 | 艾斯邁科技股份有限公司 | 光罩檢測裝置及其方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH11258779A (ja) | 1999-09-24 |
KR19990077808A (ko) | 1999-10-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |