TW369609B - Process for solid photographic device - Google Patents

Process for solid photographic device

Info

Publication number
TW369609B
TW369609B TW084103618A TW84103618A TW369609B TW 369609 B TW369609 B TW 369609B TW 084103618 A TW084103618 A TW 084103618A TW 84103618 A TW84103618 A TW 84103618A TW 369609 B TW369609 B TW 369609B
Authority
TW
Taiwan
Prior art keywords
dye
layers
filter
flat resin
acrylic resin
Prior art date
Application number
TW084103618A
Other languages
English (en)
Inventor
Tomoko Ohtagaki
Yoshikazu Sano
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Application granted granted Critical
Publication of TW369609B publication Critical patent/TW369609B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
    • H01L31/02164—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors for shielding light, e.g. light blocking layers, cold shields for infrared detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0232—Optical elements or arrangements associated with the device
    • H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Optical Filters (AREA)
TW084103618A 1994-03-25 1995-04-13 Process for solid photographic device TW369609B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5555194 1994-03-25

Publications (1)

Publication Number Publication Date
TW369609B true TW369609B (en) 1999-09-11

Family

ID=13001849

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084103618A TW369609B (en) 1994-03-25 1995-04-13 Process for solid photographic device

Country Status (4)

Country Link
US (1) US5534443A (zh)
EP (1) EP0678922A3 (zh)
KR (1) KR100193608B1 (zh)
TW (1) TW369609B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5766980A (en) * 1994-03-25 1998-06-16 Matsushita Electronics Corporation Method of manufacturing a solid state imaging device
KR0186195B1 (ko) * 1995-12-11 1999-05-01 문정환 컬러선형 전하결합소자 및 이의 구동방법
US6998595B2 (en) * 2001-03-08 2006-02-14 Xerox Corporation Color filter configuration for a silicon wafer to be diced into photosensitive chips
CN100449764C (zh) * 2003-11-18 2009-01-07 松下电器产业株式会社 光电探测器
US7701024B2 (en) * 2006-12-13 2010-04-20 Panasonic Corporation Solid-state imaging device, manufactoring method thereof and camera
US11946173B2 (en) 2020-05-20 2024-04-02 Glen Raven, Inc. Yarns and fabrics including modacrylic fibers

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL256837A (zh) * 1959-10-13 1900-01-01
JPS5544936B2 (zh) * 1973-03-20 1980-11-14
US4052379A (en) * 1975-12-18 1977-10-04 Eastman Kodak Company Dyes from trifluoromethyl-2-aminobenzothiazole diazo components
NL8105071A (nl) * 1981-11-10 1983-06-01 Philips Nv Kleurenbeeldopneeminrichting.
JPS6033506A (ja) * 1983-08-04 1985-02-20 Seiko Instr & Electronics Ltd カラ−固体撮像素子の製造方法
CA1293879C (en) * 1986-06-20 1992-01-07 Laurel Jean Pace Color filter arrays
JPS6430102A (en) * 1987-07-23 1989-02-01 Masayuki Hirafuji Botanical lighting equipment
JPH01130102A (ja) * 1987-11-17 1989-05-23 Nippon Kayaku Co Ltd 塗膜の染色法
JP2863422B2 (ja) * 1992-10-06 1999-03-03 松下電子工業株式会社 固体撮像装置およびその製造方法

Also Published As

Publication number Publication date
US5534443A (en) 1996-07-09
KR100193608B1 (ko) 1999-06-15
EP0678922A3 (en) 1997-04-09
EP0678922A2 (en) 1995-10-25

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees