TW365030B - Electronic coatings - Google Patents
Electronic coatingsInfo
- Publication number
- TW365030B TW365030B TW086113397A TW86113397A TW365030B TW 365030 B TW365030 B TW 365030B TW 086113397 A TW086113397 A TW 086113397A TW 86113397 A TW86113397 A TW 86113397A TW 365030 B TW365030 B TW 365030B
- Authority
- TW
- Taiwan
- Prior art keywords
- precursors
- silicon
- relates
- present
- electronic coatings
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/57—Protection from inspection, reverse engineering or tampering
- H01L23/573—Protection from inspection, reverse engineering or tampering using passive means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
- H01L23/49894—Materials of the insulating layers or coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Thermal Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/725,718 US5807611A (en) | 1996-10-04 | 1996-10-04 | Electronic coatings |
Publications (1)
Publication Number | Publication Date |
---|---|
TW365030B true TW365030B (en) | 1999-07-21 |
Family
ID=24915697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086113397A TW365030B (en) | 1996-10-04 | 1997-09-15 | Electronic coatings |
Country Status (5)
Country | Link |
---|---|
US (1) | US5807611A (zh) |
EP (1) | EP0834914A3 (zh) |
JP (1) | JPH10130532A (zh) |
KR (1) | KR19980032485A (zh) |
TW (1) | TW365030B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10043955A1 (de) * | 2000-09-06 | 2002-04-04 | Infineon Technologies Ag | Halbleiterchip mit einer Schutzabdeckung und zugehöriges Herstellungsverfahren |
DE10123232A1 (de) * | 2001-05-12 | 2002-11-21 | Infineon Technologies Ag | Halbleitermodul |
JP3916889B2 (ja) * | 2001-06-08 | 2007-05-23 | ソニー株式会社 | 半導体封止用樹脂組成物およびそれを用いた半導体装置 |
JP2005504698A (ja) * | 2001-09-07 | 2005-02-17 | ボーデン ケミカル インコーポレイテッド | 接着促進剤を用いた被覆光ファイバと、その製造方法及び使用方法 |
US7723162B2 (en) * | 2002-03-22 | 2010-05-25 | White Electronic Designs Corporation | Method for producing shock and tamper resistant microelectronic devices |
US20030194545A1 (en) * | 2002-04-11 | 2003-10-16 | Zesch James Charles | Systems and methods for filling voids and improving properties of porous thin films |
FR2872610B1 (fr) * | 2004-07-02 | 2007-06-08 | Commissariat Energie Atomique | Dispositif de securisation de composants |
DE102009000882B4 (de) * | 2009-02-16 | 2010-10-21 | Semikron Elektronik Gmbh & Co. Kg | Substrat zur Aufnahme mindestens eines Bauelements und Verfahren zur Herstellung eines Substrats |
FR3060600B1 (fr) * | 2016-12-20 | 2020-10-16 | Commissariat Energie Atomique | Revetement anti-erosion d'une piece mecanique et procede de traitement |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3615272A (en) * | 1968-11-04 | 1971-10-26 | Dow Corning | Condensed soluble hydrogensilsesquioxane resin |
JPS56150190A (en) * | 1980-01-16 | 1981-11-20 | Agency Of Ind Science & Technol | Preparation of composite material by thermite reaction |
US4340619A (en) * | 1981-01-15 | 1982-07-20 | Dow Corning Corporation | Process for the preparation of poly(disilyl)silazane polymers and the polymers therefrom |
JPS59178749A (ja) * | 1983-03-30 | 1984-10-11 | Fujitsu Ltd | 配線構造体 |
US4540803A (en) * | 1983-11-28 | 1985-09-10 | Dow Corning Corporation | Hydrosilazane polymers from [R3 Si]2 NH and HSiCl3 |
JPS63107122A (ja) * | 1986-10-24 | 1988-05-12 | Fujitsu Ltd | 凹凸基板の平坦化方法 |
US4753855A (en) * | 1986-12-04 | 1988-06-28 | Dow Corning Corporation | Multilayer ceramic coatings from metal oxides for protection of electronic devices |
US4910173A (en) * | 1989-04-14 | 1990-03-20 | Ethyl Corporation | Preceramic compositions and ceramic products |
US4999397A (en) * | 1989-07-28 | 1991-03-12 | Dow Corning Corporation | Metastable silane hydrolyzates and process for their preparation |
US5010159A (en) * | 1989-09-01 | 1991-04-23 | Dow Corning Corporation | Process for the synthesis of soluble, condensed hydridosilicon resins containing low levels of silanol |
US4973526A (en) * | 1990-02-15 | 1990-11-27 | Dow Corning Corporation | Method of forming ceramic coatings and resulting articles |
US5063267A (en) * | 1990-11-28 | 1991-11-05 | Dow Corning Corporation | Hydrogen silsesquioxane resin fractions and their use as coating materials |
JP3153367B2 (ja) * | 1992-11-24 | 2001-04-09 | ダウ・コ−ニング・コ−ポレ−ション | ポリハイドロジェンシルセスキオキサンの分子量分別方法 |
US5258334A (en) * | 1993-01-15 | 1993-11-02 | The U.S. Government As Represented By The Director, National Security Agency | Process of preventing visual access to a semiconductor device by applying an opaque ceramic coating to integrated circuit devices |
US5387480A (en) * | 1993-03-08 | 1995-02-07 | Dow Corning Corporation | High dielectric constant coatings |
US5492958A (en) * | 1993-03-08 | 1996-02-20 | Dow Corning Corporation | Metal containing ceramic coatings |
US5436083A (en) * | 1994-04-01 | 1995-07-25 | Dow Corning Corporation | Protective electronic coatings using filled polysilazanes |
US5436084A (en) * | 1994-04-05 | 1995-07-25 | Dow Corning Corporation | Electronic coatings using filled borosilazanes |
US5399441A (en) * | 1994-04-12 | 1995-03-21 | Dow Corning Corporation | Method of applying opaque coatings |
US5508238A (en) * | 1995-05-11 | 1996-04-16 | Dow Corning Corporation | Monolithic ceramic bodies using modified hydrogen silsesquioxane resin |
US5693701A (en) * | 1995-10-26 | 1997-12-02 | Dow Corning Corporation | Tamper-proof electronic coatings |
-
1996
- 1996-10-04 US US08/725,718 patent/US5807611A/en not_active Expired - Fee Related
-
1997
- 1997-09-15 TW TW086113397A patent/TW365030B/zh active
- 1997-09-19 EP EP97307291A patent/EP0834914A3/en not_active Withdrawn
- 1997-10-02 KR KR1019970050847A patent/KR19980032485A/ko not_active Application Discontinuation
- 1997-10-03 JP JP9271673A patent/JPH10130532A/ja not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
US5807611A (en) | 1998-09-15 |
KR19980032485A (ko) | 1998-07-25 |
JPH10130532A (ja) | 1998-05-19 |
EP0834914A2 (en) | 1998-04-08 |
EP0834914A3 (en) | 1999-01-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES2005469A6 (es) | Un metodo para formar sobre un sustrato un reestimiento ceramico o semejante a ceramico, en multicapa. | |
MY119917A (en) | Silica-soda-lime glass compositions and their applications | |
EP1249846A3 (en) | Polyalkylene oxide prorgens having hyper-branches and low dielectric-constant insulators using them | |
GB2360037B (en) | Insulator ceramic composition, multilayer ceramic substrate and ceramic electronic parts | |
PL332285A1 (en) | Transparent substrate coated with at least one thin layer | |
MXPA04003308A (es) | Toallita prehumedecida que contiene biguanida polimerica para tratar superficies. | |
TR200002575T2 (tr) | Fotokatelitik kaplamalı substrat | |
CA2373996A1 (en) | Process and solution for providing a conversion coating on a metallic surface i | |
TW365030B (en) | Electronic coatings | |
ES2010233A6 (es) | Revestimientos ceramicos, metodo para su produccion y dispositivos electronicos asi revestidos. . | |
IL137075A0 (en) | Silicon reactive oligomers and coating compositions made therefrom | |
EP1479659A3 (en) | Bond coating for silicon based substrates such as silicon nitride | |
EP1004559A3 (en) | Ceramic matrix composites | |
EP1394139A3 (en) | Protective overlayer for ceramics | |
JPS55104976A (en) | Silicon nitride substrate sintering composition and its use | |
EP1083600A3 (en) | Multilayered circuit substrate | |
GB0024638D0 (en) | Cementitious materials | |
GB9806065D0 (en) | Compositions for ceramic tiles | |
EP1070562A4 (en) | SINTERED DIAMOND TOOL AND METHOD FOR THE PRODUCTION THEREOF | |
AU2001281327A1 (en) | Boron nitride paste composition, boron nitride "shell" coated ceramic structure,and process of manufacturing | |
EP1096512A3 (en) | Thick-film resistor and ceramic circuit board | |
EP1142849A4 (en) | COMPOSITE SUBSTRATE WITH SILICON NITRIDE | |
AU3950300A (en) | Siliceous substrate with a silane layer and its manufacture | |
CA2251875A1 (en) | Aluminum nitride heater | |
EP1142852A3 (de) | Verbundkeramikmaterial mit gradierter thermochemischer Schutzschicht |