TW343292B - Blanks for forming black matrix-screen and color filter for liquid crystal display - Google Patents
Blanks for forming black matrix-screen and color filter for liquid crystal displayInfo
- Publication number
- TW343292B TW343292B TW084113709A TW84113709A TW343292B TW 343292 B TW343292 B TW 343292B TW 084113709 A TW084113709 A TW 084113709A TW 84113709 A TW84113709 A TW 84113709A TW 343292 B TW343292 B TW 343292B
- Authority
- TW
- Taiwan
- Prior art keywords
- screen
- black matrix
- blanks
- film
- liquid crystal
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33538394A JP3440346B2 (ja) | 1994-12-22 | 1994-12-22 | ブラックマトリックス用クロムブランクスおよび液晶デイスプレイ用カラーフイルター |
Publications (1)
Publication Number | Publication Date |
---|---|
TW343292B true TW343292B (en) | 1998-10-21 |
Family
ID=18287938
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW084113709A TW343292B (en) | 1994-12-22 | 1995-12-21 | Blanks for forming black matrix-screen and color filter for liquid crystal display |
Country Status (4)
Country | Link |
---|---|
US (1) | US5592317A (zh) |
JP (1) | JP3440346B2 (zh) |
KR (1) | KR100362459B1 (zh) |
TW (1) | TW343292B (zh) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100463854B1 (ko) * | 1996-07-19 | 2005-04-06 | 삼성전자주식회사 | 표시장치 |
US6071616A (en) * | 1996-12-05 | 2000-06-06 | Texas Instruments Incorporated | Opaque low reflecting coating aperture on glass |
US6157426A (en) * | 1998-02-13 | 2000-12-05 | Ois Optical Imaging Systems, Inc. | Liquid crystal display with SiOx Ny inclusive multilayer black matrix |
US6008872A (en) * | 1998-03-13 | 1999-12-28 | Ois Optical Imaging Systems, Inc. | High aperture liquid crystal display including thin film diodes, and method of making same |
US6452652B1 (en) * | 1998-06-12 | 2002-09-17 | National Semiconductor Corporation | Light absorbing thin film stack in a light valve structure |
KR100424853B1 (ko) * | 1998-07-31 | 2004-03-27 | 호야 가부시키가이샤 | 포토마스크 블랭크, 포토마스크, 이들의 제조방법 및미세패턴의 형성방법 |
CN1075762C (zh) * | 1998-12-30 | 2001-12-05 | 中国科学院感光化学研究所 | 一种变色薄膜的制备方法 |
US6344365B1 (en) * | 2000-05-26 | 2002-02-05 | Taiwan Semiconductor Manufacturing Company | Arc coating on mask quartz plate to avoid alignment error on stepper or scanner |
CA2364201A1 (en) * | 2001-12-03 | 2003-06-03 | Luxell Technologies, Inc. | Optical interference member for matrix displays |
CA2419121A1 (en) * | 2002-05-03 | 2003-11-03 | Luxell Technologies, Inc. | Dark layer for an electroluminescent device |
JP2004170554A (ja) * | 2002-11-18 | 2004-06-17 | Victor Co Of Japan Ltd | 反射型液晶表示装置 |
TWI322910B (en) * | 2003-04-23 | 2010-04-01 | Innolux Display Corp | Black matrix, color filter and liquid crystal display device with the same |
CN100403063C (zh) * | 2003-04-25 | 2008-07-16 | 鸿富锦精密工业(深圳)有限公司 | 黑色矩阵、彩色滤光片和液晶显示装置 |
KR20060008534A (ko) * | 2004-07-21 | 2006-01-27 | 삼성코닝 주식회사 | 신규 블랙 매트릭스, 그 제조방법 및 그를 이용한평판표시소자 및 전자파차폐 필터 |
KR20060046935A (ko) * | 2004-11-12 | 2006-05-18 | 삼성코닝 주식회사 | 신규 블랙 매트릭스, 그 제조방법 및 그를 이용한평판표시소자 및 전자파차폐 필터 |
WO2007039161A1 (en) * | 2005-09-27 | 2007-04-12 | Schott Ag | Mask blanc and photomasks having antireflective properties |
JP4509050B2 (ja) * | 2006-03-10 | 2010-07-21 | 信越化学工業株式会社 | フォトマスクブランク及びフォトマスク |
JP4883278B2 (ja) * | 2006-03-10 | 2012-02-22 | 信越化学工業株式会社 | フォトマスクブランク及びフォトマスクの製造方法 |
US8615663B2 (en) * | 2006-04-17 | 2013-12-24 | Broadcom Corporation | System and method for secure remote biometric authentication |
JP4737426B2 (ja) | 2006-04-21 | 2011-08-03 | 信越化学工業株式会社 | フォトマスクブランク |
TW200745630A (en) * | 2006-04-24 | 2007-12-16 | Asahi Glass Co Ltd | Blank, black matrix, and color filter |
KR101348605B1 (ko) * | 2006-12-21 | 2014-01-07 | 삼성디스플레이 주식회사 | 컬러 필터 기판 및 이를 포함하는 액정표시패널 |
JP5531702B2 (ja) * | 2010-03-23 | 2014-06-25 | 旭硝子株式会社 | 遮光膜付ガラス基板および液晶表示装置 |
JP5849719B2 (ja) * | 2012-01-23 | 2016-02-03 | 旭硝子株式会社 | 光吸収体及びこれを用いた撮像装置 |
JP5983020B2 (ja) * | 2012-05-18 | 2016-08-31 | セイコーエプソン株式会社 | 波長可変干渉フィルター、光学フィルターデバイス、光学モジュール、及び電子機器 |
US8974896B2 (en) * | 2013-03-08 | 2015-03-10 | Vapor Technologies, Inc. | Coated article with dark color |
KR102087195B1 (ko) * | 2013-09-05 | 2020-03-11 | 삼성디스플레이 주식회사 | 표시 장치용 박막 트랜지스터 표시판 및 표시판의 제조방법 |
JP6641687B2 (ja) * | 2014-12-01 | 2020-02-05 | 大日本印刷株式会社 | カラーフィルタの製造方法およびブラックマトリクス基板の製造方法 |
JP6641688B2 (ja) * | 2014-12-08 | 2020-02-05 | 大日本印刷株式会社 | カラーフィルタおよび表示装置 |
US10725332B2 (en) * | 2015-10-06 | 2020-07-28 | Lg Chem, Ltd. | Display device |
KR102007149B1 (ko) | 2016-11-24 | 2019-08-05 | 주식회사 삼양사 | 흑색 아조-금속 착물, 이를 포함하는 감광성 수지 조성물 및 이를 이용하여 제조된 경화막 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61272746A (ja) * | 1985-05-28 | 1986-12-03 | Asahi Glass Co Ltd | フオトマスクブランクおよびフオトマスク |
US5279911A (en) * | 1990-07-23 | 1994-01-18 | Mitsubishi Denki Kabushiki Kaisha | Photomask |
US5514499A (en) * | 1993-05-25 | 1996-05-07 | Kabushiki Kaisha Toshiba | Phase shifting mask comprising a multilayer structure and method of forming a pattern using the same |
US5415953A (en) * | 1994-02-14 | 1995-05-16 | E. I. Du Pont De Nemours And Company | Photomask blanks comprising transmissive embedded phase shifter |
-
1994
- 1994-12-22 JP JP33538394A patent/JP3440346B2/ja not_active Expired - Fee Related
-
1995
- 1995-12-20 KR KR1019950052438A patent/KR100362459B1/ko not_active IP Right Cessation
- 1995-12-21 US US08/576,138 patent/US5592317A/en not_active Expired - Lifetime
- 1995-12-21 TW TW084113709A patent/TW343292B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR960024571A (ko) | 1996-07-20 |
JPH08179301A (ja) | 1996-07-12 |
JP3440346B2 (ja) | 2003-08-25 |
US5592317A (en) | 1997-01-07 |
KR100362459B1 (ko) | 2003-03-04 |
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Legal Events
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MK4A | Expiration of patent term of an invention patent |