TW338119B - Negative tone microlithographic resist composition - Google Patents

Negative tone microlithographic resist composition

Info

Publication number
TW338119B
TW338119B TW083104557A TW83104557A TW338119B TW 338119 B TW338119 B TW 338119B TW 083104557 A TW083104557 A TW 083104557A TW 83104557 A TW83104557 A TW 83104557A TW 338119 B TW338119 B TW 338119B
Authority
TW
Taiwan
Prior art keywords
resist composition
crosslinking agent
negative tone
polymer
reaction
Prior art date
Application number
TW083104557A
Other languages
English (en)
Inventor
R Brunsvold William
E Conley Willard
D Gelorme Jeffrey
L Linehan Leo
Sooriyakumaran Ratnam
Tai Tsong-Lin
L Wood Robert
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=21814865&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW338119(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of TW338119B publication Critical patent/TW338119B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B3/00—Dyes with an anthracene nucleus condensed with one or more carbocyclic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW083104557A 1993-02-26 1994-05-19 Negative tone microlithographic resist composition TW338119B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US2340193A 1993-02-26 1993-02-26

Publications (1)

Publication Number Publication Date
TW338119B true TW338119B (en) 1998-08-11

Family

ID=21814865

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083104557A TW338119B (en) 1993-02-26 1994-05-19 Negative tone microlithographic resist composition

Country Status (5)

Country Link
EP (1) EP0613050B1 (zh)
JP (1) JP2708363B2 (zh)
KR (1) KR940020179A (zh)
DE (1) DE69402232T2 (zh)
TW (1) TW338119B (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9700877D0 (en) * 1997-01-17 1997-03-05 Horsell Graphic Ind Ltd Lithographic plates
US6077641A (en) * 1997-01-17 2000-06-20 Kodak Polychrome Graphics Llc Lithographic plates
JP3810510B2 (ja) * 1997-03-26 2006-08-16 富士写真フイルム株式会社 ネガ型画像記録材料及び平版印刷版原版
TW419615B (en) * 1997-09-18 2001-01-21 Ibm Photo crosslinkable, aqueous base developable negative photoresist composition and method for use thereof
US6455228B1 (en) 1999-08-25 2002-09-24 Tokyo Ohka Kogyo Co., Ltd. Multilayered body for photolithographic patterning
TWI289238B (en) 2000-01-13 2007-11-01 Fujifilm Corp Negative resist compositions using for electronic irradiation
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
JP4645789B2 (ja) 2001-06-18 2011-03-09 Ｊｓｒ株式会社 ネガ型感放射線性樹脂組成物
WO2003045915A1 (fr) 2001-11-30 2003-06-05 Wako Pure Chemical Industries, Ltd. Compose de bisimide, generateur d'acide et composition de reserve contenant ledit compose, procede de formation de motif au moyen de ladite composition
US7426775B2 (en) 2003-12-17 2008-09-23 The Procter + Gamble Company Polymeric structures comprising a hydrophile/lipophile system
US7714065B2 (en) 2003-12-17 2010-05-11 The Procter & Gamble Company Polymeric structures comprising a hydrophile/lipophile system
JP4396849B2 (ja) 2005-01-21 2010-01-13 信越化学工業株式会社 ネガ型レジスト材料及びパターン形成方法
EP2109005A1 (en) * 2008-04-07 2009-10-14 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure
JP6369132B2 (ja) * 2013-06-28 2018-08-08 住友ベークライト株式会社 ネガ型感光性樹脂組成物、硬化膜、電子装置およびポリマー
JP6122754B2 (ja) 2013-09-30 2017-04-26 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び電子デバイスの製造方法
JP6209103B2 (ja) 2014-02-25 2017-10-04 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01293339A (ja) * 1988-05-23 1989-11-27 Tosoh Corp フォトレジスト組成物
JPH0215270A (ja) * 1988-07-04 1990-01-18 Tosoh Corp フォトレジスト組成物
EP0361907A3 (en) * 1988-09-29 1991-05-02 Hoechst Celanese Corporation Photoresist compositions for deep uv image reversal
DE3943413A1 (de) * 1989-12-30 1991-07-04 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefstrukturen
CA2034274A1 (en) * 1990-02-07 1991-08-08 James A. Bonham Polymers containing halomethyl-1,3,5-triazine moieties
EP0487794A1 (en) * 1990-11-27 1992-06-03 Sony Corporation Process for preparing resist patterns
JP3000740B2 (ja) * 1991-07-26 2000-01-17 日本ゼオン株式会社 レジスト組成物
EP0537524A1 (en) * 1991-10-17 1993-04-21 Shipley Company Inc. Radiation sensitive compositions and methods
US5296332A (en) * 1991-11-22 1994-03-22 International Business Machines Corporation Crosslinkable aqueous developable photoresist compositions and method for use thereof

Also Published As

Publication number Publication date
EP0613050B1 (en) 1997-03-26
EP0613050A2 (en) 1994-08-31
DE69402232D1 (de) 1997-04-30
KR940020179A (ko) 1994-09-15
JP2708363B2 (ja) 1998-02-04
EP0613050A3 (en) 1995-07-05
DE69402232T2 (de) 1997-09-18
JPH06301200A (ja) 1994-10-28

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