TW329340U - Aligner for alignment employing film mask - Google Patents

Aligner for alignment employing film mask

Info

Publication number
TW329340U
TW329340U TW086209914U TW86209914U TW329340U TW 329340 U TW329340 U TW 329340U TW 086209914 U TW086209914 U TW 086209914U TW 86209914 U TW86209914 U TW 86209914U TW 329340 U TW329340 U TW 329340U
Authority
TW
Taiwan
Prior art keywords
aligner
film mask
employing film
alignment employing
alignment
Prior art date
Application number
TW086209914U
Other languages
English (en)
Inventor
Minoru Tanaka
Akira Nagai
Original Assignee
Adtec Eng Co Ltd
Canon Componnents Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4298087A external-priority patent/JP2509134B2/ja
Priority claimed from JP4350226A external-priority patent/JPH0822571B2/ja
Priority claimed from JP5242220A external-priority patent/JPH0772552A/ja
Application filed by Adtec Eng Co Ltd, Canon Componnents Kk filed Critical Adtec Eng Co Ltd
Publication of TW329340U publication Critical patent/TW329340U/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0736—Methods for applying liquids, e.g. spraying
    • H05K2203/074—Features related to the fluid pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0008—Apparatus or processes for manufacturing printed circuits for aligning or positioning of tools relative to the circuit board

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW086209914U 1992-10-09 1993-09-25 Aligner for alignment employing film mask TW329340U (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP4298087A JP2509134B2 (ja) 1992-10-09 1992-10-09 プリント配線基板の露光方法及び装置
JP4350226A JPH0822571B2 (ja) 1992-12-04 1992-12-04 露光装置におけるフィルムの加圧装置
JP5242220A JPH0772552A (ja) 1993-09-03 1993-09-03 露光装置

Publications (1)

Publication Number Publication Date
TW329340U true TW329340U (en) 1998-04-01

Family

ID=27333020

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086209914U TW329340U (en) 1992-10-09 1993-09-25 Aligner for alignment employing film mask

Country Status (3)

Country Link
KR (2) KR100205199B1 (zh)
GB (1) GB2271430A (zh)
TW (1) TW329340U (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5970310A (en) * 1996-06-12 1999-10-19 Hitachi, Ltd. Method for manufacturing multilayer wiring board and wiring pattern forming apparatus
JP3678144B2 (ja) * 2000-12-22 2005-08-03 ウシオ電機株式会社 フィルム回路基板の周辺露光装置
JP2003029414A (ja) * 2001-07-19 2003-01-29 Adtec Engineeng Co Ltd 露光装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04225360A (ja) * 1990-12-26 1992-08-14 Adotetsuku Eng:Kk プリント配線基板の製造におけるフィルムマスクの密着方法及びその装置

Also Published As

Publication number Publication date
GB9319933D0 (en) 1993-11-17
KR0152425B1 (en) 1999-10-01
KR940010872A (ko) 1994-05-26
KR100205199B1 (ko) 1999-07-01
GB2271430A (en) 1994-04-13

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