TW311182B - - Google Patents

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TW311182B
TW311182B TW083110968A TW83110968A TW311182B TW 311182 B TW311182 B TW 311182B TW 083110968 A TW083110968 A TW 083110968A TW 83110968 A TW83110968 A TW 83110968A TW 311182 B TW311182 B TW 311182B
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TW
Taiwan
Prior art keywords
lighting
light
item
lighting equipment
light beam
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TW083110968A
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Chinese (zh)
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Zeiss Stiftung
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70066Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70075Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70091Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70141Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/702Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Dot-Matrix Printers And Others (AREA)
  • Microscoopes, Condenser (AREA)

Description

S11182 五、發明説明(ί ) 用於投影微石版印刷曝光裝置的照明設備 本發明係用於微石版印刷曝光裝置的一種可選擇不同照明方式的照明設備。 EP 0 486 316, EP 0 496 891,EP 0 500 393 及 US 5 208 629 皆有提及這種帶有 2 或4道光束,對稱斜向照明的照明設備’以上各項專利皆具有調節裝置:在EP 〇 486 316中的四種照明可藉可調式光導管(圖12、)或透鏡(圖17 )或透鏡陣列(圖 35 )加以調節,圖38則顯示不同的透鏡光柵在具有2道、4道光束及傳統式單—光 束的轉塔上安裝情形(這一項在EP 0 496 891的申請專利範圍13中亦有提及),依 據申請專利範圍第I2項’四極照明的角度及距離皆可調整’在申請專利範圍第14項 中,有一顯現不同照明方式的可切換式光電濾光鏡,在EP 0 500 3%的圖16中亦有' 一用於不同照明方式的轉塔。 上面提及的EP專利文件皆將單一的聚光鏡收集自一光源的光線,藉已知的裝置 分爲1,2或4道光束,以獲得所需數目的第二光源。 只有EP 0 500 393提及另一種可能的方式,即設置2個燈(圖12 )其光斑點仍 然爲圓球或正方形,UP 5 208 629圖80示提出4個部分環形第二光源的構想,但並 未提及其製造及調節。 EP 0 297 161以2個相向而立的聚光鏡收集一光源發出的光線,並經反射鏡將收 集到的光線導引至光瞳平面,但並無調整的可能性及異於傳統照明的地方,其裝置中 有一玻璃棒以及一特殊的,可直接安置於網線上的玻璃棒出口處的濾光鏡。 經濟部中央標準局員工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁) 在上面提及的專利文件沒有一份文件提及曝光時掃描的可能性(只有在US專利 文件中的申請專利範圍16及62曾提及一旋轉的斜向照明一具有一旋轉的光斑)。 這種方式在 S.T. Yang et al. SPIE 丨264 (1"〇)477·485 頁及 US 3 77〇 34〇 關於相干 性(雷射)照明及任意成像中亦有提及。 EP 0 266 203中用於微石片印刷的照明設備具有將一光源發出的光線分割爲多道 光束。模擬掃描及相互疊加的特徵(槪念、申請專利範圍第1項)此特徵可降低相干 性造成的干擾(比較申請專利範圍2 )藉幾何光束分離可使光線分割’損失的能量降 -4- 本紙張尺度適用中國國家標準(CNS ) A4規格(2丨0;<297公釐) A7 B7 ύ11182 一 __ 五、發明説明(3.) 繼電器鏡組(41-44) 第一折線式反射鏡(511 -514) 第二折線式反射鏡(521 -524) 伺服驅動裝置(541-544) 控制器(100) 聚束反射鏡(6) 玻璃棒⑺ 入口面(71) 網狀遮蔽系統⑻ 調節物(81) 光瞳平面P(93) 中間遮蔽系統(91) 光線折射器(93) 網線(10) 圖 2 :光柵(311,331) 掃描鏡(531,533) 中間成像系統(9) 圖 3 :光斑(201-204) 在圖la及]b中的光源(1)爲一水銀燈,它發出的光線由四個涵蓋大空間角度範圍 的聚光鏡(21-24)加以收集,因此大部分的光線都被導引至4個光導^(31-34) ’光導 管(3丨-34)構成橫截面轉換器,其出口面的形狀爲環塊形(如圖1c所示)爲了使出口 面的光強度更加均勻,光導管(31-34)可以由均勻混合的單一纖維組成’其入口斷面亦 可與光線分佈相配合。 另一種方式是以具有光線擴張鏡組及三稜鏡的雷射裝置來照亮光導管(31 -34),此 處使用的雷射可以一種紫外線放射的Excimer雷射。 光導管(31-34)的出口面各連接一單元的繼電器鏡組(41-44)。第一折線式反射鏡 (511 -514)及第二折線式反射鏡(521 -524),這些單元及與其連接的光導管(31 -34)的終端 可由伺服驅動裝置(541-544)作徑向及方向的調節,控制器(1〇〇)可控制伺服驅動裝置 (541-544)。 經由聚束反射鏡(6)可將來自4個折線式反射鏡(521-524)的光線反射至玻璃棒(7) -6- 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) (請先閱讀背面之注意事項再填寫本頁) %S11182 V. Description of the invention (ί) Illumination equipment for projection microlithography exposure apparatus The present invention is a kind of illumination equipment for microlithography exposure apparatus which can select different lighting modes. EP 0 486 316, EP 0 496 891, EP 0 500 393 and US 5 208 629 all mention this kind of lighting equipment with 2 or 4 beams and symmetric oblique illumination. The above patents have adjustment devices: The four types of illumination in EP 〇486 316 can be adjusted by an adjustable light pipe (Figure 12,) or a lens (Figure 17) or a lens array (Figure 35). Figure 38 shows that different lens gratings have 2 channels, 4 beams and the installation of the traditional single-beam turret (this item is also mentioned in the patent application scope 13 of EP 0 496 891), according to the angle and distance of the quadrupole illumination of item I2 of the patent application scope All can be adjusted 'In the 14th item of the patent application, there is a switchable photoelectric filter that shows different lighting methods, and there is also a turret for different lighting methods in Figure 16 of EP 0 500 3%. The above-mentioned EP patent documents all collect light from a single light source by a single condenser, and divide it into 1, 2 or 4 light beams by a known device to obtain a desired number of second light sources. Only EP 0 500 393 mentions another possible way, namely setting 2 lamps (Figure 12) whose light spots are still spheres or squares. UP 5 208 629 Figure 80 shows the idea of four partial ring-shaped second light sources. But it did not mention its manufacture and adjustment. EP 0 297 161 collects light from a light source with two opposed condensers, and guides the collected light to the pupil plane through the reflector, but there is no possibility of adjustment and it is different from traditional lighting. The device has a glass rod and a special filter that can be directly placed at the exit of the glass rod on the network cable. Printed by the Employee Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs (please read the precautions on the back before filling out this page) None of the patent documents mentioned above mentions the possibility of scanning during exposure (only in the US patent documents Patent applications 16 and 62 mentioned a rotating oblique illumination with a rotating light spot). This method is also mentioned in S.T. Yang et al. SPIE 丨 264 (1 " 〇) page 477 · 485 and US 3 77〇 34〇 about coherent (laser) illumination and arbitrary imaging. The lighting device used for printing of microliths in EP 0 266 203 has the function of dividing the light emitted by a light source into multiple beams. Simulated scanning and superimposed features (paraphrases, patent application item 1) This feature can reduce the interference caused by coherence (compare patent application scope 2) The energy lost by the beam splitting can be reduced by geometric beam separation -4- This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (2 丨 0; < 297mm) A7 B7 ύ11182 a __ 5. Invention description (3.) Relay mirror set (41-44) first line reflection Mirror (511 -514) Second fold mirror (521 -524) Servo drive (541-544) Controller (100) Beam reflector (6) Glass rod ⑺ Entrance face (71) Mesh shading system ⑻ Adjuster (81) Pupil plane P (93) Intermediate shading system (91) Ray refractor (93) Network cable (10) Figure 2: Grating (311,331) Scanning mirror (531,533) Intermediate imaging system (9) Figure 3: Light spot (201-204) The light source (1) in Figures 1a and 1b is a mercury lamp. The light emitted by it is collected by four condensers (21-24) covering a large spatial angle, so most of the light is It is guided to 4 light guides ^ (31-34) 'Light pipe (3 丨 -34) constitutes a cross-sectional converter, and the shape of its exit face is a ring block shape ( FIG. 1c) to the outlet face of the light intensity is more uniform, the light guide (31-34) may consist of single fibers uniformly mixed 'which cooperate with the inlet cross section of the light distribution may also. Another way is to illuminate the light pipe (31-34) with a laser device with a light-expanding lens set and Samara. The laser used here can be an Excimer laser with ultraviolet radiation. The outlet face of the light pipe (31-34) is connected with a unit of relay mirror group (41-44). The first folding mirror (511 -514) and the second folding mirror (521 -524), the terminals of these units and the light pipes (31 -34) connected to them can be adjusted by the servo drive (541-544) For the adjustment of direction and direction, the controller (100) can control the servo drive device (541-544). Through the condenser mirror (6), the light from the four fold-type mirrors (521-524) can be reflected to the glass rod (7)-6-The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X 297 %) (Please read the notes on the back before filling this page)%

、1T 經濟部中央樣準局員工消費合作社印裝 ^-1182 五、發明説明(1) 到很低(圖4ad )。 . 本發明的目的係製造—種用於微石版印刷曝光裝置的照明設備,可選擇許多不同 的照明方式及傳統式照明具有可調節的相干性係數σ,環孔徑照明及源自2或4個方 向的對稱斜向照明’此設備的適用性廣泛,光源利用效益高,不需更換構件即可進行 許多改變,且成像品質良好。 具有申請專利範圍第1項中各項特徵的照明設備可達成上目的,這種設備一方面 不必在閘板、轉塔或類似裝置中裝設選擇性很小,或更換費事的可換式光學元件,另 —方面在所有不同的照明方式中皆可善用光源。 申請專利範圍2-9皆爲具有優點的實施方式,光束的環塊狀即可經由純粹作徑向 調節,除了一精確的環孔徑照明外,亦可在狹窄位置形成典型照明,或以一小的“中 央掩蔽”,部分在光瞳平面重疊的光束及在其它位置形成對稱斜向照明。後面這一項 雖然通常係以圓形狀的第二光源形成,但其形狀並無任何關係,比較US 5 208 629 中部分環狀的第二光源。 亦可採用與一分光鏡結合的雷射作爲光源。 圖式之簡單說明: 底下配合圖形作進一步的說明: 圖la :依據本發明之照明設備的實施例(側視圖) 圖lb :圖la之實施例的上視圖 圖lc :圖la及lb之光導管出口面的斷面圖 圖2 :另一實施例的示意圖 圖3 :在第二成像系統之光瞳平面的第二光源 a)傳統式 ‘ 職孔徑 c)四極 符號說明: 圖1 :光源(1) 聚光鏡(21-24) 光導管(31-34) -5- 本紙張尺度適用中國國家標準(CNS > A4規格(210X 297公釐) (請先閱讀背面之注意事項再填寫本頁)1. Printed by the 1T Employee Consumer Cooperative of the Central Prototype Bureau of the Ministry of Economy ^ -1182 V. Description of invention (1) Very low (Figure 4ad). The purpose of the present invention is to manufacture a kind of lighting equipment for microlithographic printing exposure device, which can choose many different lighting methods and traditional lighting with adjustable coherence coefficient σ, ring aperture lighting and 2 or 4 Directional symmetrical oblique illumination 'This device has wide applicability, high efficiency of light source utilization, many changes can be made without replacing components, and the imaging quality is good. The lighting equipment with the characteristics of item 1 of the patent application scope can achieve the above purpose. On the one hand, such equipment does not need to be installed in the gate, turret or similar devices with little selectivity, or replaceable. Optical components, on the other hand, can make good use of light sources in all different lighting methods. The patent application scopes 2-9 are all embodiments with advantages. The ring shape of the beam can be adjusted purely radially. In addition to an accurate ring aperture illumination, it can also form typical illumination in a narrow position, or a small The "central masking" partially overlaps the beam in the pupil plane and forms symmetric oblique illumination at other positions. The latter item is usually formed by a second light source with a round shape, but its shape does not matter. Compare the partially ring-shaped second light source in US 5 208 629. A laser combined with a dichroic mirror can also be used as the light source. Brief description of the drawings: The following is further explained with the graphics: Figure la: an embodiment of a lighting device according to the present invention (side view) Figure lb: top view of the embodiment of Figure la Figure lc: light of Figures la and lb Cross-sectional view of the exit surface of the catheter. Figure 2: Schematic diagram of another embodiment. Figure 3: Second light source in the pupil plane of the second imaging system a) Conventional type 'aperture A. c) Description of quadrupole symbols: Figure 1: Light source ( 1) Condenser lens (21-24) Light pipe (31-34) -5- This paper size is applicable to Chinese national standards (CNS & A4 specifications (210X 297 mm) (please read the precautions on the back before filling this page)

T 經濟部中央標準局貝工消费合作社印裝 經濟部中央樣準局貝工消费合作社印製 S11182_ 五、發明説明(々.) 的入口面(71),此入口面(71X5於照明設備的一個光瞳平面P內,且這四個單元可各 依伺服驅動裝置(541-544)^置各照亮入口面的1/4面積’由4個聚光鏡(21-2句聚集的 4道光束藉此方式組成一有效的第二光源。 玻璃棒(7 )的出口面有一場平面F,按照本發明的方式,在此場平面內設 有一網狀遮蔽系統(8 )(即一可調節的光柵),藉調節物(81 )可按需要調節 網狀遮蔽系統。 將網狀遮蔽系統(8 )設置於此位置,相較於目前應用的方法,可節省爲網 狀遮蔽系統額外設一場平面的花費。 接下來的中間成像系統爲一具有一光瞳平面P ( 93 )的鏡頭(9 ),在光瞳 平面之前有一中間遮蔽系統(91 ),之後有一由平面鏡構成的光線折射器(93 ), 鏡頭後接著在場平面F內待照亮的網線(10 )。 接下來的投影物鏡及待照明的封絨紙皆爲已知之裝置,故在圖形中未予繪 出。 投影物鏡的孔徑大小及成像比例尺及/或其光瞳的大小,對照設備的幾何尺寸 有決定性的影響,並可確定所需的孔徑大小的範圍。 圖2顯示設置於玻璃棒(7 )之前的構件組的另一種實施例光源(1 )及聚光 鏡(2^3 )與上例相同',光導管(31,33 )爲固定、不易彎曲之物體,如:玻璃 棒。在其終端設有光柵(311,331 ),其後再接著光學透鏡組(41,43 )。 掃瞄鏡(531,533 )可繞玻璃棒(7 )的光學中心軸轉動,並可繞其與製圖平 面垂直的中心軸翻轉,扇形聚束反射鏡(6 )的功用是在玻璃棒(7 )的入口面(71) 成像。 經由輕巧,容易安裝的掃瞄鏡(531,533 )對於快速掃瞄特別有利,圖中並未 繪出掃瞄鏡的驅動單元,因此單元爲一現有的已知技術。 可比照圖la及lb的方式在圖中所示,用來生成2個第二光源的2個構件組, 本紙張尺度適用中國國家標準(CNS ) A4規格(2 (0X297公釐) - n ml m* .1 I ^^1 ί - - lil- --- --- ml、一seJ (請先閱讀背面之注意事項再填寫本頁) 知、 A7 B7 經濟部中央橾準局員工消費合作社印製 五、發明説明(5 ) 加裝2個繞光學中心軸轉動的構件組,第二光源的形狀可依需要設定,並經由光 導管(31,33 )的形狀生成。 本發明中,依據圖1及圖2製成或再加上其它許多變化,製成的照明裝置的 重要共同特徵爲:可在中間成像系統(9 )的光瞳平面(93 )生成許多不同形狀 及尺寸的第二光源,且由在各1/4圓面積(或在2個部分系統中的每個半圓)結合 生成,及在光導管(31-34 )出口生成的光束的形狀(尤其是環塊狀)與經由控制 器(100 )可任意調節其徑向及方位,上述之調節亦可在曝光時爲之(掃瞄)。 按照上述方式,無需更換或改造任何構件,即可獲得許多不同的照明方式, 這種照明設備適用於許多曝光程序,尤其是藉試驗方式找出最佳方案的曝光程 序。 圖3a-c即爲例子’圖中顯示光瞳平面(93 )內的光束,並註明考慮成像比例, 相對於投影物鏡之光瞳半徑的相對半徑σ,σ亦稱爲照明的相干性度。 圖3a所示爲一具有相當小的相對半徑((7=0.3 )及“中央遮蔽”爲〇.1的典形 照明方式,中央遮蔽是必要的,以便安置校準及量測光路。 第二光源由4個1M圓組成,其上各有相對內半徑cr =0· 1及相對外半徑σ =0.3 的環塊狀光斑(201-204 ),並以方位角90。形成與光導管(31-34 )終端相 應形狀的圖像,無掃瞄動作即可直接形成傳統的照明方式,收集許多發自光源的 光線,且不會有不必要的漸隱現象。 圖3b所示的與3a —樣,亦爲一環孔徑照明方式,圖3b中的光斑(201-204 ) 沿著徑向被往外推並依方位被掃瞄,也就是說,在曝光期間,掃瞄過其所在的1/4 圓,因此可形成環孔徑照明,其方位均勻性可由掃瞄動作加以影響。 吾人很快即可看出’結合圖3a及3b的照明方式,即可獲得一具有較大之σ値 (如:0.5~0.7)的典型照明方式,(在曝光時間內結合徑向調節及方位掃瞄)。 同樣的,也可獲得內外徑相差較大的環孔徑照明。 圖3c中的四極照明即爲對稱斜向照明的一例,其最簡單的形式是由圖3b中的 環孔徑照明去除方位移動而得,通常此類照明需在靠近邊緣處具有光斑(最大σ -8- 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公着) tm ^1.^1 mV ml nn* ϋΒ·^ 一/ -¾ 、T {請先閎讀背面之注意事項再填寫本頁) A7 B7 五、發明説明(6.) =〇.9 )在四極照明中,光斑的精確形狀並不顯著(比較:US 5208629 ),四極光 斑的尺寸和方位可在曝光期間藉徑向及方位移動與實際需要相配合。 値得一提的是’有可能實現無光線損失的雙極照明,其2組相鄰的2個光斑 (201,202 )及(2〇3,2〇4 )各自移動方位至1/4圓的邊緣並結合在一起。 圖中所示之光斑(201-204 )形狀,爲具有優點的實施例,光斑形狀可依使用 者的需要任意變化,光斑的形狀亦可藉設置額外的隔板[尤其是具有光柵(3Π-341 )的隔板]力口以變化(雖然這樣作會造成光線的損失)^ 環塊形狀特別能夠配合照明設備的幾何形狀,因爲它在第二光源的平均半徑 (同時也是環塊的平均半徑)下’可在光斑形成完全均句的徑向光線分佈,即使 是在其它位置,其光線分佈也比具有被掃瞄的圓形光斑(不十分小的圓形光斑) 均勻,如此,亦有實現一無掃瞄的典型照明。 本發明中作爲光線混合裝置的玻璃棒(7 )比蜂窩狀聚光鏡要好,因其狹窄 的斷面可形成緊密的構造形式’比較圖2 :掃瞄鏡(531,533 )設置於玻璃棒(7 ) 旁邊。 當網狀遮蔽系統(8 )不是如一般方式設置於專爲它製作的額外中間場平面, 而是直接設匱於玻璃棒(7)後的場平面時,這種緊密性對提高品質亦有幫助。 控制徑向及方位移動的調節驅動裝置(541-544 )的控制器(100 )係採用已 知技術製作的控制器並與整個系統結合爲一體,以及依各網線的結構化,使用可 以最佳過程生成第二光源的程式設定加以控制。 ---------1 、表-- (请先閱讀背面之注意事項再填寫本頁) 、·ιτ 經濟部中央搮準局貝工消费合作社印裝 本紙佚尺度適用中國國家標準(CNS ) Α4规格(210Χ297公釐)T The Ministry of Economic Affairs Central Standards Bureau Beigong Consumer Cooperative printed the Ministry of Economic Affairs Central Sample Bureau Beigong Consumer Cooperative printed S11182_ V. Invention description (々.) The entrance face (71), this entrance face (71X5 is one of the lighting equipment In the pupil plane P, and these four units can be set according to the servo drive device (541-544) ^ illuminate the 1/4 area of the entrance surface by 4 condensing mirrors (21-2 sentence 4 beams collected by In this way, an effective second light source is formed. The exit surface of the glass rod (7) has a field plane F. According to the method of the present invention, a meshed shading system (8) (ie an adjustable grating) is provided in this field plane ), Through the adjustment object (81), the mesh shielding system can be adjusted as needed. Setting the mesh shielding system (8) at this position, compared with the currently applied method, can save an extra field for the mesh shielding system. The next intermediate imaging system is a lens (9) with a pupil plane P (93), with an intermediate shielding system (91) in front of the pupil plane, and a light refractor (93) composed of a plane mirror , After the camera, stay in the field plane F Bright screen cable (10). The next projection objective and the cover paper to be illuminated are known devices, so they are not drawn in the figure. The aperture size and imaging scale of the projection objective and / or its pupil The size has a decisive influence on the geometric size of the device, and can determine the range of the required aperture size. Figure 2 shows another embodiment of the component group placed before the glass rod (7). The light source (1) and the condenser (2 ^ 3) Same as the above example, the light pipe (31, 33) is a fixed, non-flexible object, such as a glass rod. At its terminal is provided with a grating (311, 331), followed by the optical lens group (41 , 43). The scanning mirror (531, 533) can rotate around the optical central axis of the glass rod (7), and can be turned around its central axis perpendicular to the drawing plane. The function of the fan-shaped spot mirror (6) is in The entrance surface (71) of the glass rod (7) is imaged. The scanning mirror (531, 533), which is light and easy to install, is particularly advantageous for fast scanning. The driving unit of the scanning mirror is not drawn in the figure, so the unit is An existing known technology. Comparing the methods of Figures la and lb As shown in the figure, 2 component groups used to generate 2 second light sources, this paper scale is applicable to China National Standard (CNS) A4 specification (2 (0X297mm)-n ml m * .1 I ^^ 1 ί--lil- --- --- ml, a seJ (please read the precautions on the back and then fill out this page), A7 B7 Printed by the Consumer Cooperative of the Central Bureau of Economic Affairs of the Ministry of Economic Affairs V. Invention Instructions (5) Add two component groups that rotate around the optical center axis, and the shape of the second light source can be set as required, and generated through the shape of the light pipe (31, 33). In the present invention, it is made or remade according to FIGS. In addition to many other changes, the important common feature of the fabricated lighting device is that it can generate many second light sources of different shapes and sizes in the pupil plane (93) of the intermediate imaging system (9), and by The circular area (or each semicircle in the two-part system) is combined to generate, and the shape of the light beam (especially ring block) generated at the exit of the light pipe (31-34) can be arbitrarily adjusted via the controller (100) The radial and azimuth, the above adjustments can also be done during exposure (scanning). In this way, many different lighting methods can be obtained without replacing or modifying any components. This kind of lighting equipment is suitable for many exposure procedures, especially the one that finds the best solution by experiment. Figures 3a-c are examples. The figure shows the light beam in the pupil plane (93), and note that considering the imaging ratio, the relative radius σ relative to the pupil radius of the projection objective is also called the degree of illumination coherence. Figure 3a shows a typical lighting method with a relatively small relative radius ((7 = 0.3)) and a "central shading" of 0.1. The central shading is necessary in order to position the calibration and measurement light path. Second light source It consists of four 1M circles, each with a ring-shaped spot (201-204) with a relative inner radius cr = 0.1 and a relative outer radius σ = 0.3, and formed with a light pipe (31- 34) The image of the corresponding shape of the terminal can form a traditional lighting method without scanning action, and collect a lot of light from the light source without unnecessary fading. Figure 3b shows the same as 3a , Which is also a ring-aperture illumination method. The light spot (201-204) in Figure 3b is pushed outward in the radial direction and scanned according to the azimuth, that is, during the exposure period, the 1/4 circle where it is scanned is scanned Therefore, ring aperture illumination can be formed, and the azimuth uniformity can be influenced by the scanning action. We can quickly see that the combination of the illumination modes of Figures 3a and 3b can obtain a larger σ value (such as: 0.5 ~ 0.7) typical lighting method, (combined with radial adjustment and azimuth scanning during exposure time) Similarly, ring aperture illumination with a large difference between inner and outer diameters can also be obtained. The quadrupole illumination in Figure 3c is an example of symmetric oblique illumination, and the simplest form is obtained by removing the azimuth movement from the ring aperture illumination in Figure 3b. , Usually this kind of lighting needs to have a light spot near the edge (maximum σ -8- this paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 public) tm ^ 1. ^ 1 mV ml nn * ϋΒ · ^ 1 / -¾, T (please read the precautions on the back before filling in this page) A7 B7 5. Description of the invention (6.) = 〇.9) In quadrupole illumination, the precise shape of the light spot is not significant (comparison: US 5208629 ), The size and orientation of the quadrupole spot can be matched with actual needs by radial and azimuth movement during exposure. It is worth mentioning that 'it is possible to achieve bipolar illumination without light loss, its two adjacent 2 spots (201,202) and (2〇3,2〇4) each move the azimuth to the edge of 1/4 circle And combined together. The shape of the light spot (201-204) shown in the figure is an advantageous embodiment. The shape of the light spot can be arbitrarily changed according to the needs of the user. The shape of the light spot can also be provided by an additional spacer [especially with a grating (3Π- 341) 's partition] The force mouth changes (although doing so will cause loss of light) ^ The shape of the ring block is particularly suitable for the geometry of the lighting device, because it is the average radius of the second light source (also the average radius of the ring block ) Xia 'can form a completely uniform radial light distribution in the light spot, even at other positions, its light distribution is more uniform than that with a scanned circular spot (not very small circular spot), so, there are also Achieve typical lighting without scanning. The glass rod (7) used as the light mixing device in the present invention is better than the honeycomb condenser lens, because of its narrow cross-section, a compact structure can be formed.'Comparative Figure 2: The scanning mirror (531,533) is placed next to the glass rod (7) . When the mesh shading system (8) is not set in an additional intermediate field plane specially made for it as in the usual way, but is directly set in the field plane behind the glass rod (7), this compactness also has the effect of improving the quality help. The controller (100) of the adjusting drive device (541-544) controlling the radial and azimuth movement is a controller made by known technology and integrated with the entire system, and according to the structure of each network cable, the use can be the most The process of generating the second light source in the best process is controlled. --------- 1 、 Table-(please read the precautions on the back before filling in this page) 、 · ιτ The printed standards of the Beigong Consumer Cooperative of the Central Bureau of Economic Affairs of the Ministry of Economic Affairs are applicable to the Chinese national standards ( CNS) Α4 specification (210Χ297mm)

Claims (1)

申請專利範圍(r 2 A8 B8 C8 用於微石版印刷曝光裝置的照明設備,可選擇不同的照明方式及傳統式照 明,具有可調節的相干性係數(σ),環孔徑照明及源自2或4個方向的對 稱斜向照明: a、具有一光源(1); 具有裝置(21-24)分別自2或4個空間角度範圍收集自光源(1)放射出 的光束; 具有裝置(31-34)使被聚集的光束漸隱或成形; 具有反射鏡裝置(511-514,521-524,531,533,6,)使光束在 與待成像的網線(10)的網線平面共軛的光瞳平面(93)的扇形區域上成 像; e '具有調節裝置(541-544)使光束在光瞳平面(93)的成像可作徑向及方位 的調節; a至d以串列方式排列,b至d中之每一個則以平行方式出現二次或四次 ,e作用在c或d上。 如申請專利範圍第1項的照明設備,其中裝置(21-24)爲聚集光束的裝置, 或裝置(31-34)〔即光導管(31-34)〕爲使被聚集的光束成形或漸隱的裝置 b d 經濟部中央標準局員工消费合作社印褽 3 '如申請專利範圍第2項的照明設備,其中調節裝置(541-544)可調節光導管 (31-34)的出口。 4、如申請專利範圍第1項的照明設備,其中調節裝置(541-544)可調節部分反 射裝置(511-533)。 5 '如申請專利範圍第1項的照明設備,其中在反射鏡裝置(511-533,6)及網 線平面(10)之間設置一玻璃棒⑺。 6 '如申請專利範圍第5項的照明設備,其中在靠近玻璃棒(7)之出口端(72)設 置一可變的遮蔽系統(8)。 7、 如申請專利範圍第1項的照明設備,其中光束在光瞳平面(93)的成像尺寸 ,係以無掃描移動即適用於對稱斜向照明或傳統式照明(相干性係數σ = o.l或更大)爲準。 8、 如申請專利範圍第1項的照明設備,其具有改變光束在光瞳平面的成像尺 寸的裝置。 9、 如申請專利範圍第1項的照明設備,其具有改變光束形狀的裝置。 10、 如申請專利範圍第1項的照明設備,其爲:光束係以環塊狀發出。 11、 如申請專利範圍1的照明設備,其以雷射作爲光源且具有分開收集源自分 1^11 nn nn ml t ! · --1 i .n m I - - ^^1,一 ^ I i·— I m ^^^1 L (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐〉 A8 B8 C8 D8 六、申請專利範圍(D 光器之光束的裝置。 12、如申請專利範圍第1項的照明設備,其中在每一曝光過程中,生成一特定 照明方式的調節裝置(541-544)會執行一掃描移動,而在光瞳平面(93)形 成一系列光束圖像。 裝 訂 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央標準局員工消費合作社印製 -11- 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐)Patent application scope (r 2 A8 B8 C8 lighting equipment for microlithography exposure device, can choose different lighting methods and traditional lighting, with adjustable coherence coefficient (σ), ring aperture lighting and from 2 or Symmetric oblique illumination in 4 directions: a. With a light source (1); with a device (21-24) collecting light beams emitted from the light source (1) from 2 or 4 spatial angle ranges; with a device (31- 34) Fading or shaping the focused light beam; having a mirror device (511-514, 521-524, 531, 533, 6,) to make the light beam conjugate with the wire plane of the wire (10) to be imaged Imaging on the fan-shaped area of the pupil plane (93); e 'has an adjustment device (541-544) so that the imaging of the beam on the pupil plane (93) can be adjusted in radial and azimuth; a to d are in tandem Arrangement, each of b to d appears two or four times in parallel, and e acts on c or d. As in the lighting equipment of claim 1, the device (21-24) is for condensing the light beam The device, or device (31-34) [that is, the light pipe (31-34)] is a device bd for shaping or fading the focused beam The Ministry of Central Standards Bureau staff consumer cooperatives printed 3 'such as the lighting equipment of the second patent application scope, in which the adjustment device (541-544) can adjust the export of the light pipe (31-34). 4. If the patent application scope is 1st The lighting device of item 1, wherein the adjusting device (541-544) can adjust the partial reflecting device (511-533). 5 'The lighting device as claimed in item 1 of the patent scope, wherein the reflector device (511-533, 6) and A glass rod ⑺ is arranged between the network cable planes (10). 6 'The lighting equipment as claimed in item 5 of the patent application, wherein a variable shielding system (8) is provided near the exit end (72) of the glass rod (7) ) 7. Lighting equipment as claimed in item 1 of the patent application, in which the imaging size of the light beam in the pupil plane (93) is suitable for symmetric oblique illumination or traditional illumination without scanning movement (coherence coefficient σ = ol or greater) shall prevail. 8. The lighting equipment as claimed in item 1 of the patent scope, which has a device for changing the imaging size of the light beam in the pupil plane. 9. The lighting equipment as claimed in item 1 of the patent scope, which has A device that changes the shape of the light beam. The lighting equipment of item 1 is: the light beam is emitted in the shape of a ring. 11. For the lighting equipment of patent application scope 1, it uses laser light as the light source and has a separate collection from 1 ^ 11 nn nn ml t! ·- -1 i .nm I--^^ 1 , 一 ^ I i · — I m ^^^ 1 L (please read the precautions on the back before filling in this page) This paper scale is applicable to China National Standard (CNS) A4 specifications (210X297mm> A8 B8 C8 D8 六 、 Apply for patent scope (D light beam device. 12. The lighting device as claimed in item 1 of the patent scope, in which during each exposure process, an adjustment device (541-544) that generates a specific lighting method performs a scanning movement, and forms a pupil plane (93) Series beam image. Binding (please read the precautions on the back before filling in this page) Printed by the Staff Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs -11- This paper scale is applicable to China National Standard (CNS) A4 (210X297mm)
TW083110968A 1993-12-13 1994-11-25 TW311182B (en)

Applications Claiming Priority (1)

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DE4342424A DE4342424A1 (en) 1993-12-13 1993-12-13 Illuminator for projection micro-lithography illumination installation

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DE19520563A1 (en) * 1995-06-06 1996-12-12 Zeiss Carl Fa Illumination device for a projection microlithography device
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
DE19548805A1 (en) 1995-12-27 1997-07-03 Zeiss Carl Fa REMA lens for microlithography projection exposure systems
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
DE10132988B4 (en) * 2001-07-06 2005-07-28 Carl Zeiss Smt Ag Projection exposure system
DE10251087A1 (en) * 2002-10-29 2004-05-19 Carl Zeiss Smt Ag Illumination device for a microlithography projection exposure system

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EP0266203B1 (en) * 1986-10-30 1994-07-06 Canon Kabushiki Kaisha An illumination device
NL8801348A (en) * 1988-05-26 1989-12-18 Philips Nv EXPOSURE SYSTEM.
US5305054A (en) * 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices

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KR950019951A (en) 1995-07-24
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KR950019950A (en) 1995-07-24
DE59407337D1 (en) 1999-01-07

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