DE9409744U1 - Illumination device for an optical system with a reticle marking system - Google Patents

Illumination device for an optical system with a reticle marking system

Info

Publication number
DE9409744U1
DE9409744U1 DE9409744U DE9409744U DE9409744U1 DE 9409744 U1 DE9409744 U1 DE 9409744U1 DE 9409744 U DE9409744 U DE 9409744U DE 9409744 U DE9409744 U DE 9409744U DE 9409744 U1 DE9409744 U1 DE 9409744U1
Authority
DE
Germany
Prior art keywords
illumination device
optical system
reticle marking
reticle
marking system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE9409744U
Other languages
German (de)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Carl Zeiss AG
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE9409744U priority Critical patent/DE9409744U1/en
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Publication of DE9409744U1 publication Critical patent/DE9409744U1/en
Priority to DE59407337T priority patent/DE59407337D1/en
Priority to EP94116702A priority patent/EP0658810B1/en
Priority to EP94116703A priority patent/EP0658811B1/en
Priority to DE59406271T priority patent/DE59406271D1/en
Priority to KR1019940029833A priority patent/KR100333566B1/en
Priority to KR1019940029834A priority patent/KR100334147B1/en
Priority to TW083110967A priority patent/TW300282B/zh
Priority to US08/355,177 priority patent/US5572287A/en
Priority to US08/355,157 priority patent/US5646715A/en
Priority to JP33225494A priority patent/JP3485660B2/en
Priority to JP33225594A priority patent/JP3559330B2/en
Priority to US09/315,267 priority patent/US6285443B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Dot-Matrix Printers And Others (AREA)
  • Microscoopes, Condenser (AREA)
DE9409744U 1992-12-13 1994-06-17 Illumination device for an optical system with a reticle marking system Expired - Lifetime DE9409744U1 (en)

Priority Applications (13)

Application Number Priority Date Filing Date Title
DE9409744U DE9409744U1 (en) 1993-12-13 1994-06-17 Illumination device for an optical system with a reticle marking system
DE59407337T DE59407337D1 (en) 1993-12-13 1994-10-22 Illumination device for an optical system with a reticle masking system
EP94116702A EP0658810B1 (en) 1993-12-13 1994-10-22 Illumination device for an optical system with a reticle masking system
EP94116703A EP0658811B1 (en) 1993-12-13 1994-10-22 Illumination device for a microlithographic projection exposure apparatus
DE59406271T DE59406271D1 (en) 1993-12-13 1994-10-22 Illumination device for a projection microlithography exposure system
KR1019940029833A KR100333566B1 (en) 1993-12-13 1994-11-14 Projection-microlithography-lighting equipment
KR1019940029834A KR100334147B1 (en) 1993-12-13 1994-11-14 Lighting units for optical systems with reticle-masking system
TW083110967A TW300282B (en) 1993-12-13 1994-11-25
US08/355,157 US5646715A (en) 1993-06-17 1994-12-08 Illuminating arrangement for an optical system having a reticle masking unit
US08/355,177 US5572287A (en) 1992-12-13 1994-12-08 Illuminating arrangement for a projection microlithographic exposure apparatus
JP33225494A JP3485660B2 (en) 1993-12-13 1994-12-13 Illumination means of projection exposure apparatus for microlithography
JP33225594A JP3559330B2 (en) 1993-12-13 1994-12-13 Optical illumination means with reticle masking system
US09/315,267 US6285443B1 (en) 1993-12-13 1999-05-20 Illuminating arrangement for a projection microlithographic apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4342424A DE4342424A1 (en) 1993-12-13 1993-12-13 Illuminator for projection micro-lithography illumination installation
DE9409744U DE9409744U1 (en) 1993-12-13 1994-06-17 Illumination device for an optical system with a reticle marking system

Publications (1)

Publication Number Publication Date
DE9409744U1 true DE9409744U1 (en) 1994-09-15

Family

ID=6504852

Family Applications (4)

Application Number Title Priority Date Filing Date
DE4342424A Ceased DE4342424A1 (en) 1992-12-13 1993-12-13 Illuminator for projection micro-lithography illumination installation
DE9409744U Expired - Lifetime DE9409744U1 (en) 1992-12-13 1994-06-17 Illumination device for an optical system with a reticle marking system
DE59407337T Expired - Fee Related DE59407337D1 (en) 1993-12-13 1994-10-22 Illumination device for an optical system with a reticle masking system
DE59406271T Expired - Fee Related DE59406271D1 (en) 1993-12-13 1994-10-22 Illumination device for a projection microlithography exposure system

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE4342424A Ceased DE4342424A1 (en) 1992-12-13 1993-12-13 Illuminator for projection micro-lithography illumination installation

Family Applications After (2)

Application Number Title Priority Date Filing Date
DE59407337T Expired - Fee Related DE59407337D1 (en) 1993-12-13 1994-10-22 Illumination device for an optical system with a reticle masking system
DE59406271T Expired - Fee Related DE59406271D1 (en) 1993-12-13 1994-10-22 Illumination device for a projection microlithography exposure system

Country Status (3)

Country Link
KR (2) KR100333566B1 (en)
DE (4) DE4342424A1 (en)
TW (2) TW300282B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0747772A1 (en) * 1995-06-06 1996-12-11 Carl Zeiss Illumination device for a projection microlithography tool
EP0783137A2 (en) 1995-12-27 1997-07-09 Carl Zeiss REMA objective for microlithographic projection illumination
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10132988B4 (en) * 2001-07-06 2005-07-28 Carl Zeiss Smt Ag Projection exposure system
DE10251087A1 (en) * 2002-10-29 2004-05-19 Carl Zeiss Smt Ag Illumination device for a microlithography projection exposure system

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3750174T2 (en) * 1986-10-30 1994-11-17 Canon Kk Exposure device.
NL8801348A (en) * 1988-05-26 1989-12-18 Philips Nv EXPOSURE SYSTEM.
US5305054A (en) * 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
EP0747772A1 (en) * 1995-06-06 1996-12-11 Carl Zeiss Illumination device for a projection microlithography tool
EP0783137A2 (en) 1995-12-27 1997-07-09 Carl Zeiss REMA objective for microlithographic projection illumination
EP0783137A3 (en) * 1995-12-27 1999-10-27 Carl Zeiss REMA objective for microlithographic projection illumination
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
US7372634B2 (en) 1996-12-21 2008-05-13 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses

Also Published As

Publication number Publication date
KR950019951A (en) 1995-07-24
TW300282B (en) 1997-03-11
DE59406271D1 (en) 1998-07-23
DE4342424A1 (en) 1995-06-14
KR100334147B1 (en) 2002-11-23
TW311182B (en) 1997-07-21
DE59407337D1 (en) 1999-01-07
KR950019950A (en) 1995-07-24
KR100333566B1 (en) 2002-11-30

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