TW309511B - - Google Patents
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- Publication number
- TW309511B TW309511B TW081106772A TW81106772A TW309511B TW 309511 B TW309511 B TW 309511B TW 081106772 A TW081106772 A TW 081106772A TW 81106772 A TW81106772 A TW 81106772A TW 309511 B TW309511 B TW 309511B
- Authority
- TW
- Taiwan
- Prior art keywords
- quartz glass
- tube
- glass plate
- plate
- notch
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 137
- 239000011521 glass Substances 0.000 claims description 64
- 238000010438 heat treatment Methods 0.000 claims description 36
- 238000004519 manufacturing process Methods 0.000 claims description 25
- 238000011049 filling Methods 0.000 claims description 11
- 239000010453 quartz Substances 0.000 claims description 8
- 239000004575 stone Substances 0.000 claims description 7
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 210000003625 skull Anatomy 0.000 claims description 2
- 238000003466 welding Methods 0.000 claims description 2
- 238000005086 pumping Methods 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 13
- 239000012535 impurity Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 239000012530 fluid Substances 0.000 description 5
- 229910052770 Uranium Inorganic materials 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 206010011469 Crying Diseases 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 239000002574 poison Substances 0.000 description 3
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 235000013339 cereals Nutrition 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 244000144985 peep Species 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 210000000707 wrist Anatomy 0.000 description 2
- 241000283690 Bos taurus Species 0.000 description 1
- 241000270722 Crocodylidae Species 0.000 description 1
- 240000004244 Cucurbita moschata Species 0.000 description 1
- 235000009854 Cucurbita moschata Nutrition 0.000 description 1
- 235000009852 Cucurbita pepo Nutrition 0.000 description 1
- 241000287828 Gallus gallus Species 0.000 description 1
- 241000406668 Loxodonta cyclotis Species 0.000 description 1
- 241000282346 Meles meles Species 0.000 description 1
- 241000220317 Rosa Species 0.000 description 1
- 241000270295 Serpentes Species 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 241000209140 Triticum Species 0.000 description 1
- 235000021307 Triticum Nutrition 0.000 description 1
- -1 alumina and Si Chemical compound 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- LNNWVNGFPYWNQE-GMIGKAJZSA-N desomorphine Chemical compound C1C2=CC=C(O)C3=C2[C@]24CCN(C)[C@H]1[C@@H]2CCC[C@@H]4O3 LNNWVNGFPYWNQE-GMIGKAJZSA-N 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 238000004537 pulping Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 235000020354 squash Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/04—Re-forming tubes or rods
- C03B23/047—Re-forming tubes or rods by drawing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/02—Re-forming glass sheets
- C03B23/037—Re-forming glass sheets by drawing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/04—Re-forming tubes or rods
- C03B23/06—Re-forming tubes or rods by bending
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/08—Quartz
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/09—Tube
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP1992/000976 WO1994003404A1 (fr) | 1992-07-31 | 1992-07-31 | Plaque en verre de quartz de grandes dimensions et a haute purete, et procede et appareil de fabrication |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW309511B true TW309511B (enExample) | 1997-07-01 |
Family
ID=14042458
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW081106772A TW309511B (enExample) | 1992-07-31 | 1992-08-27 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5683483A (enExample) |
| EP (1) | EP0607433B2 (enExample) |
| JP (1) | JP2825977B2 (enExample) |
| KR (2) | KR940702469A (enExample) |
| DE (1) | DE69227521T3 (enExample) |
| TW (1) | TW309511B (enExample) |
| WO (1) | WO1994003404A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69629111T2 (de) * | 1995-04-28 | 2004-04-22 | Mitsubishi Chemical Corp. | Verfahren zur herstellung eines synthetischen quarzpulvers und geformtem quarzglas |
| US6143676A (en) * | 1997-05-20 | 2000-11-07 | Heraeus Quarzglas Gmbh | Synthetic silica glass used with uv-rays and method producing the same |
| US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
| US6782716B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
| US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| US6319634B1 (en) | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
| US6682859B2 (en) | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
| EP1088789A3 (en) * | 1999-09-28 | 2002-03-27 | Heraeus Quarzglas GmbH & Co. KG | Porous silica granule, its method of production and its use in a method for producing quartz glass |
| US7797966B2 (en) | 2000-12-29 | 2010-09-21 | Single Crystal Technologies, Inc. | Hot substrate deposition of fused silica |
| US20070059533A1 (en) | 2005-09-12 | 2007-03-15 | Burdette Steven R | Thermal reflow of glass and fused silica body |
| JP2010192679A (ja) * | 2009-02-18 | 2010-09-02 | Shinetsu Quartz Prod Co Ltd | 石英ガラス製ウエハー処理槽及びその製造方法 |
| RU2433090C1 (ru) * | 2010-05-19 | 2011-11-10 | Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") | Способ изготовления листового стекла из полого стеклянного цилиндра |
| CN102826751B (zh) * | 2012-09-17 | 2014-11-05 | 东海县圣达石英制品有限公司 | 一种低羟基黑色石英管及其制备方法 |
| CN107531544B (zh) * | 2015-04-24 | 2020-12-22 | 尼普洛株式会社 | 医用玻璃容器的制造方法和具有旋转装置的火焰喷射装置 |
| CN118084309B (zh) * | 2024-03-04 | 2025-11-28 | 浙江富乐德石英科技有限公司 | 一种圆弧形石英板的自动化生产设备及其加工方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1283333A (en) * | 1918-03-07 | 1918-10-29 | William G Shaw | Process for forming glass sheets. |
| GB257590A (enExample) * | 1925-08-27 | 1927-03-24 | Societe Anonyme Des Manufactures Des Glaces Et Produits Chimiques De St. Gobain, Chauny Et Cirey | |
| FR20600E (fr) * | 1970-07-22 | 1918-07-02 | Philippe Adolphe Cauet | Bras et avant-bras artificiels articulés et leur dispositif de commande |
| DE2443556C3 (de) † | 1974-09-11 | 1982-05-06 | Corning Ltd., Sunderland, Durham | Vorrichtung zum Biegen von Glas |
| DE3226451C2 (de) * | 1982-07-15 | 1984-09-27 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Verfahren zur Herstellung von schlierenfreien, blasenfreien und homogenen Quarzglasplatten und Vorrichtung zur Durchführung des Verfahrens |
| JPS62235223A (ja) * | 1986-04-03 | 1987-10-15 | Toshiba Ceramics Co Ltd | 高珪酸ガラス部材の製造方法および製造装置 |
| JPH0441148Y2 (enExample) † | 1986-12-15 | 1992-09-28 | ||
| EP0360864B1 (en) † | 1988-02-22 | 1993-10-27 | Nippon Electric Glass Company., Ltd. | Method of and apparatus for manufacturing thin glass plates |
-
1992
- 1992-07-31 JP JP6505171A patent/JP2825977B2/ja not_active Expired - Lifetime
- 1992-07-31 KR KR1019940701006A patent/KR940702469A/ko active Granted
- 1992-07-31 WO PCT/JP1992/000976 patent/WO1994003404A1/ja not_active Ceased
- 1992-07-31 KR KR1019940701006A patent/KR970009008B1/ko not_active Expired - Fee Related
- 1992-07-31 EP EP92916522A patent/EP0607433B2/en not_active Expired - Lifetime
- 1992-07-31 DE DE69227521T patent/DE69227521T3/de not_active Expired - Fee Related
- 1992-08-27 TW TW081106772A patent/TW309511B/zh active
-
1994
- 1994-07-31 US US08/211,455 patent/US5683483A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US5683483A (en) | 1997-11-04 |
| JP2825977B2 (ja) | 1998-11-18 |
| KR940702469A (ko) | 1994-08-20 |
| DE69227521T2 (de) | 1999-07-15 |
| KR970009008B1 (ko) | 1997-06-03 |
| EP0607433B1 (en) | 1998-11-04 |
| EP0607433B2 (en) | 2003-03-05 |
| DE69227521T3 (de) | 2003-12-24 |
| EP0607433A1 (en) | 1994-07-27 |
| DE69227521D1 (de) | 1998-12-10 |
| WO1994003404A1 (fr) | 1994-02-17 |
| EP0607433A4 (en) | 1995-03-01 |
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