TW287293B - Plasma processing system with reduced particle contamination - Google Patents

Plasma processing system with reduced particle contamination

Info

Publication number
TW287293B
TW287293B TW085101204A TW85101204A TW287293B TW 287293 B TW287293 B TW 287293B TW 085101204 A TW085101204 A TW 085101204A TW 85101204 A TW85101204 A TW 85101204A TW 287293 B TW287293 B TW 287293B
Authority
TW
Taiwan
Prior art keywords
substrate
plasma
power
bias
processing
Prior art date
Application number
TW085101204A
Other languages
English (en)
Inventor
D Lantsman Alexander
Original Assignee
Materials Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Materials Research Corp filed Critical Materials Research Corp
Application granted granted Critical
Publication of TW287293B publication Critical patent/TW287293B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
TW085101204A 1995-06-07 1996-01-31 Plasma processing system with reduced particle contamination TW287293B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/478,950 US5573597A (en) 1995-06-07 1995-06-07 Plasma processing system with reduced particle contamination

Publications (1)

Publication Number Publication Date
TW287293B true TW287293B (en) 1996-10-01

Family

ID=23902052

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085101204A TW287293B (en) 1995-06-07 1996-01-31 Plasma processing system with reduced particle contamination

Country Status (8)

Country Link
US (1) US5573597A (zh)
EP (1) EP0830708B1 (zh)
JP (1) JPH11509979A (zh)
KR (1) KR100277843B1 (zh)
AU (1) AU5853596A (zh)
DE (1) DE69605670T2 (zh)
TW (1) TW287293B (zh)
WO (1) WO1996041366A1 (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105185727A (zh) * 2014-06-10 2015-12-23 朗姆研究公司 用分子反应性清扫气体改善dc偏置的缺陷控制和稳定性
US9899195B2 (en) 2014-06-06 2018-02-20 Lam Research Corporation Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging
US10081869B2 (en) 2014-06-10 2018-09-25 Lam Research Corporation Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates

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US6245189B1 (en) * 1994-12-05 2001-06-12 Nordson Corporation High Throughput plasma treatment system
US5672242A (en) * 1996-01-31 1997-09-30 Integrated Device Technology, Inc. High selectivity nitride to oxide etch process
US5902494A (en) * 1996-02-09 1999-05-11 Applied Materials, Inc. Method and apparatus for reducing particle generation by limiting DC bias spike
US6465043B1 (en) * 1996-02-09 2002-10-15 Applied Materials, Inc. Method and apparatus for reducing particle contamination in a substrate processing chamber
US5858108A (en) * 1996-07-15 1999-01-12 Taiwan Semiconductor Manufacturing Company, Ltd Removal of particulate contamination in loadlocks
JP3220383B2 (ja) * 1996-07-23 2001-10-22 東京エレクトロン株式会社 プラズマ処理装置及びその方法
US5779807A (en) 1996-10-29 1998-07-14 Applied Materials, Inc. Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers
US6749717B1 (en) * 1997-02-04 2004-06-15 Micron Technology, Inc. Device for in-situ cleaning of an inductively-coupled plasma chambers
DE19713637C2 (de) * 1997-04-02 1999-02-18 Max Planck Gesellschaft Teilchenmanipulierung
JP4120974B2 (ja) * 1997-06-17 2008-07-16 キヤノンアネルバ株式会社 薄膜作製方法および薄膜作製装置
US6352049B1 (en) * 1998-02-09 2002-03-05 Applied Materials, Inc. Plasma assisted processing chamber with separate control of species density
DE19814871A1 (de) 1998-04-02 1999-10-07 Max Planck Gesellschaft Verfahren und Vorrichtung zur gezielten Teilchenmanipulierung und -deposition
JP4153606B2 (ja) * 1998-10-22 2008-09-24 東京エレクトロン株式会社 プラズマエッチング方法およびプラズマエッチング装置
US6972071B1 (en) 1999-07-13 2005-12-06 Nordson Corporation High-speed symmetrical plasma treatment system
US6290821B1 (en) 1999-07-15 2001-09-18 Seagate Technology Llc Sputter deposition utilizing pulsed cathode and substrate bias power
US6237527B1 (en) * 1999-08-06 2001-05-29 Axcelis Technologies, Inc. System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate
US6709522B1 (en) 2000-07-11 2004-03-23 Nordson Corporation Material handling system and methods for a multichamber plasma treatment system
US6841033B2 (en) * 2001-03-21 2005-01-11 Nordson Corporation Material handling system and method for a multi-workpiece plasma treatment system
JP3555084B2 (ja) 2001-06-11 2004-08-18 Ｎｅｃエレクトロニクス株式会社 半導体基板に対するプラズマ処理方法及び半導体基板のためのプラズマ処理装置
WO2004095502A2 (en) * 2003-03-31 2004-11-04 Tokyo Electron Limited Plasma processing system and method
US7276135B2 (en) * 2004-05-28 2007-10-02 Lam Research Corporation Vacuum plasma processor including control in response to DC bias voltage
US7988816B2 (en) 2004-06-21 2011-08-02 Tokyo Electron Limited Plasma processing apparatus and method
US7951262B2 (en) 2004-06-21 2011-05-31 Tokyo Electron Limited Plasma processing apparatus and method
JP4796965B2 (ja) * 2004-07-02 2011-10-19 株式会社アルバック エッチング方法及び装置
KR100672820B1 (ko) 2004-11-12 2007-01-22 삼성전자주식회사 플라즈마를 사용한 피처리체의 처리 방법
US11978611B2 (en) * 2009-05-01 2024-05-07 Advanced Energy Industries, Inc. Apparatus with switches to produce a waveform
US20110011534A1 (en) * 2009-07-17 2011-01-20 Rajinder Dhindsa Apparatus for adjusting an edge ring potential during substrate processing
EP2326151A1 (fr) * 2009-11-24 2011-05-25 AGC Glass Europe Procédé et dispositif de polarisation d'une électrode DBD
JP5397215B2 (ja) * 2009-12-25 2014-01-22 ソニー株式会社 半導体製造装置、半導体装置の製造方法、シミュレーション装置及びシミュレーションプログラム
JP6224958B2 (ja) * 2013-02-20 2017-11-01 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
US9875881B2 (en) * 2013-02-20 2018-01-23 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
US20180323045A1 (en) * 2017-05-02 2018-11-08 Tokyo Electron Limited Manufacturing methods to reduce surface particle impurities after a plasma process
US20200048770A1 (en) * 2018-08-07 2020-02-13 Lam Research Corporation Chemical vapor deposition tool for preventing or suppressing arcing
WO2020167744A1 (en) * 2019-02-11 2020-08-20 Applied Materials, Inc. Method for particle removal from wafers through plasma modification in pulsed pvd
CN114467164A (zh) * 2019-09-12 2022-05-10 应用材料公司 排斥网和沉积方法
US20220119952A1 (en) * 2020-10-20 2022-04-21 Applied Materials, Inc. Method of reducing defects in a multi-layer pecvd teos oxide film

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US4795880A (en) * 1986-09-11 1989-01-03 Hayes James A Low pressure chemical vapor deposition furnace plasma clean apparatus
US5367139A (en) * 1989-10-23 1994-11-22 International Business Machines Corporation Methods and apparatus for contamination control in plasma processing
JP2775345B2 (ja) * 1989-12-15 1998-07-16 キヤノン株式会社 プラズマ処理法及びプラズマ処理装置
US5294320A (en) * 1990-02-09 1994-03-15 Applied Materials, Inc. Apparatus for cleaning a shield in a physical vapor deposition chamber
US5332441A (en) * 1991-10-31 1994-07-26 International Business Machines Corporation Apparatus for gettering of particles during plasma processing
US5478429A (en) * 1993-01-20 1995-12-26 Tokyo Electron Limited Plasma process apparatus
US5449432A (en) * 1993-10-25 1995-09-12 Applied Materials, Inc. Method of treating a workpiece with a plasma and processing reactor having plasma igniter and inductive coupler for semiconductor fabrication

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9899195B2 (en) 2014-06-06 2018-02-20 Lam Research Corporation Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging
CN105185727A (zh) * 2014-06-10 2015-12-23 朗姆研究公司 用分子反应性清扫气体改善dc偏置的缺陷控制和稳定性
US10047438B2 (en) 2014-06-10 2018-08-14 Lam Research Corporation Defect control and stability of DC bias in RF plasma-based substrate processing systems using molecular reactive purge gas
US10081869B2 (en) 2014-06-10 2018-09-25 Lam Research Corporation Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates
CN105185727B (zh) * 2014-06-10 2018-12-04 朗姆研究公司 用分子反应性清扫气体改善dc偏置的缺陷控制和稳定性
TWI663284B (zh) * 2014-06-10 2019-06-21 美商蘭姆研究公司 使用分子反應性沖洗氣體以改善基於射頻電漿之基板處理系統中的直流偏壓之缺陷控制及安定性
CN110098100A (zh) * 2014-06-10 2019-08-06 朗姆研究公司 用分子反应性清扫气体改善dc偏置的缺陷控制和稳定性
US10704149B2 (en) 2014-06-10 2020-07-07 Lam Research Corporation Defect control and stability of DC bias in RF plasma-based substrate processing systems using molecular reactive purge gas

Also Published As

Publication number Publication date
US5573597A (en) 1996-11-12
AU5853596A (en) 1996-12-30
KR19990022731A (ko) 1999-03-25
EP0830708B1 (en) 1999-12-15
DE69605670T2 (de) 2000-07-13
WO1996041366A1 (en) 1996-12-19
JPH11509979A (ja) 1999-08-31
EP0830708A1 (en) 1998-03-25
KR100277843B1 (ko) 2001-02-01
DE69605670D1 (de) 2000-01-20

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