TW268107B - - Google Patents

Info

Publication number
TW268107B
TW268107B TW082102615A TW82102615A TW268107B TW 268107 B TW268107 B TW 268107B TW 082102615 A TW082102615 A TW 082102615A TW 82102615 A TW82102615 A TW 82102615A TW 268107 B TW268107 B TW 268107B
Authority
TW
Taiwan
Application number
TW082102615A
Other languages
Chinese (zh)
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Application granted granted Critical
Publication of TW268107B publication Critical patent/TW268107B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/96—Esters of carbonic or haloformic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW082102615A 1992-04-10 1993-04-08 TW268107B (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9077092 1992-04-10
JP5005792A JPH0692909A (ja) 1992-04-10 1993-01-18 炭酸エステル環状化合物、その製造方法及びそれを用いてなるポジ型フォトレジスト組成物

Publications (1)

Publication Number Publication Date
TW268107B true TW268107B (pt) 1996-01-11

Family

ID=26339792

Family Applications (1)

Application Number Title Priority Date Filing Date
TW082102615A TW268107B (pt) 1992-04-10 1993-04-08

Country Status (8)

Country Link
US (2) US5397679A (pt)
EP (1) EP0569707B1 (pt)
JP (1) JPH0692909A (pt)
KR (1) KR930021602A (pt)
CA (1) CA2092783A1 (pt)
DE (1) DE69303973T2 (pt)
MX (1) MX9302019A (pt)
TW (1) TW268107B (pt)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6200725B1 (en) 1995-06-28 2001-03-13 Fujitsu Limited Chemically amplified resist compositions and process for the formation of resist patterns

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0537524A1 (en) 1991-10-17 1993-04-21 Shipley Company Inc. Radiation sensitive compositions and methods
KR100302651B1 (ko) * 1992-10-21 2001-11-22 무네유키 가코우 양성감광성조성물
US5876895A (en) * 1992-12-24 1999-03-02 Sumitomo Chemical Company, Limited Photosensitive resin composition for color filter
JPH06214395A (ja) * 1993-01-18 1994-08-05 Sumitomo Chem Co Ltd ポジ型フォトレジスト組成物
KR960015081A (ko) * 1993-07-15 1996-05-22 마쯔모또 에이이찌 화학증폭형 레지스트 조성물
JP3393915B2 (ja) * 1994-03-04 2003-04-07 住友化学工業株式会社 化学増幅型レジスト組成物
DE69525883T2 (de) * 1994-07-04 2002-10-31 Fuji Photo Film Co Ltd Positiv-photoresistzusammensetzung
JPH0934112A (ja) * 1995-05-12 1997-02-07 Sumitomo Chem Co Ltd フォトレジスト組成物
JP3382081B2 (ja) * 1995-06-01 2003-03-04 株式会社東芝 レジストおよびこれを用いたパターン形成方法
JPH0962005A (ja) * 1995-06-14 1997-03-07 Fuji Photo Film Co Ltd ネガ型感光性組成物
JPH09166871A (ja) 1995-12-15 1997-06-24 Sumitomo Chem Co Ltd フォトレジスト組成物
US5821345A (en) * 1996-03-12 1998-10-13 Shipley Company, L.L.C. Thermodynamically stable photoactive compound
JP3376222B2 (ja) * 1996-10-25 2003-02-10 クラリアント インターナショナル リミテッド 放射線感応性組成物
JP3353292B2 (ja) * 1999-03-29 2002-12-03 日本電気株式会社 化学増幅系レジスト
US8158329B2 (en) * 2008-12-11 2012-04-17 Sumitomo Chemical Company, Limited Compound and chemically amplified resist composition containing the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69027799T2 (de) * 1989-03-14 1997-01-23 Ibm Chemisch amplifizierter Photolack
JP2715327B2 (ja) * 1990-01-19 1998-02-18 富士写真フイルム株式会社 感光性樹脂組成物
JPH04230754A (ja) * 1990-05-24 1992-08-19 Sumitomo Chem Co Ltd ポジ型レジスト用組成物
EP0461388B1 (en) * 1990-05-24 1996-09-04 Sumitomo Chemical Company, Limited Positive resist composition
JP2961947B2 (ja) * 1990-06-05 1999-10-12 住友化学工業株式会社 ポジ型レジスト組成物
JPH0534914A (ja) * 1991-08-01 1993-02-12 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JP2655384B2 (ja) * 1991-11-08 1997-09-17 富士写真フイルム株式会社 ポジ型レジスト組成物
US5242734A (en) * 1991-11-19 1993-09-07 Rubin Richard J Information-conveying protective strip assembly

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6200725B1 (en) 1995-06-28 2001-03-13 Fujitsu Limited Chemically amplified resist compositions and process for the formation of resist patterns
US6329125B2 (en) 1995-06-28 2001-12-11 Fujitsu Limited Chemically amplified resist compositions and process for the formation of resist patterns

Also Published As

Publication number Publication date
JPH0692909A (ja) 1994-04-05
MX9302019A (es) 1994-06-30
EP0569707B1 (en) 1996-08-14
CA2092783A1 (en) 1993-10-11
DE69303973T2 (de) 1997-03-27
EP0569707A3 (pt) 1994-01-05
EP0569707A2 (en) 1993-11-18
US5397679A (en) 1995-03-14
DE69303973D1 (de) 1996-09-19
US5420331A (en) 1995-05-30
KR930021602A (ko) 1993-11-22

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