TW202406443A - Printed circuit and method thereof - Google Patents

Printed circuit and method thereof Download PDF

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TW202406443A
TW202406443A TW111128977A TW111128977A TW202406443A TW 202406443 A TW202406443 A TW 202406443A TW 111128977 A TW111128977 A TW 111128977A TW 111128977 A TW111128977 A TW 111128977A TW 202406443 A TW202406443 A TW 202406443A
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electronic component
conductive
liquid metal
metal composite
layer
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TW111128977A
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Chinese (zh)
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TWI822223B (en
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李成佳
陳伯元
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大陸商宏啟勝精密電子(秦皇島)有限公司
大陸商鵬鼎控股(深圳)股份有限公司
鵬鼎科技股份有限公司
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Priority claimed from CN202210890384.3A external-priority patent/CN117528896A/en
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Abstract

A printed circuit includes a first electronic component, a solidified liquid metal composite layer, a circuit structure and a second electronic component. The solidified liquid metal composite layer wraps the first electronic component and covers an upper surface and lateral surfaces of the first electronic component. The circuit structure surrounds the first electronic component and the solidified liquid metal composite layer. The second electronic component is disposed on the upper surface of the first electronic component and electrically connected to the first electronic component via the solidified liquid metal composite layer. A method of manufacturing a printed circuit is further provided.

Description

電路板及其製作方法Circuit board and method of making the same

本申請是有關於電路板及其製作方法。This application relates to circuit boards and methods of making them.

高密度和高可靠性為電路板發展的趨勢,因此,電子元件內埋技術越來越受到業界的青睞,不僅可以縮小體積,並且可以縮短線路長度,降低寄生電感,提高電路板的密度和電性連接效能。High density and high reliability are the development trends of circuit boards. Therefore, embedded electronic component technology is increasingly favored by the industry. It can not only reduce the size, but also shorten the line length, reduce parasitic inductance, and improve the density and electrical power of the circuit board. Sexual connection efficacy.

然而,隨著越來越密集的元件配置,如何提高電子元件的散熱效能、提升電性連接的品質及結構可靠度,是所欲解決的問題。However, with the increasingly dense component configuration, how to improve the heat dissipation efficiency of electronic components, improve the quality of electrical connections and structural reliability are problems that need to be solved.

根據本申請的一些實施例,一種電路板,包括第一電子元件、固化液態金屬複合層、線路結構、以及第二電子元件。第一電子元件具有上表面、相對於上表面的下表面、連接上表面以及下表面的多個側表面。固化液態金屬複合層包覆第一電子元件,並覆蓋於第一電子元件的上表面上以及側表面上。線路結構環繞第一電子元件以及固化液態金屬複合層。第二電子元件設置於第一電子元件的上表面上,並經由固化液態金屬複合層與第一電子元件電性連接。According to some embodiments of the present application, a circuit board includes a first electronic component, a solidified liquid metal composite layer, a circuit structure, and a second electronic component. The first electronic component has an upper surface, a lower surface opposite to the upper surface, and a plurality of side surfaces connecting the upper surface and the lower surface. The solidified liquid metal composite layer covers the first electronic component and covers the upper surface and side surfaces of the first electronic component. The circuit structure surrounds the first electronic component and the solidified liquid metal composite layer. The second electronic component is disposed on the upper surface of the first electronic component and is electrically connected to the first electronic component through the solidified liquid metal composite layer.

在一些實施例中,固化液態金屬複合層的材料包含液態金屬以及高分子聚合物。In some embodiments, the material of the solidified liquid metal composite layer includes liquid metal and high molecular polymer.

在一些實施例中,固化液態金屬複合層包含第一部分、第二部分以及第三部分。第一部分完全覆蓋第一電子元件的側表面並延伸覆蓋部分的上表面。第二部分設置於第一電子元件的上表面上並電性連接第一電子元件以及第二電子元件。第三部分設置於第一電子元件的下表面下,其中第一部分、第二部分、以及第三部分之間彼此間隔。In some embodiments, the solidified liquid metal composite layer includes a first portion, a second portion, and a third portion. The first portion completely covers the side surface of the first electronic component and extends to cover the upper surface of the portion. The second part is disposed on the upper surface of the first electronic component and electrically connects the first electronic component and the second electronic component. The third part is disposed under the lower surface of the first electronic component, wherein the first part, the second part and the third part are spaced apart from each other.

在一些實施例中,電路板更包含導電接合結構以及第三電子元件。導電接合結構設置於第一電子元件下。第三電子元件設置於第一電子元件下,並經由導電接合結構與第一電子元件電性連接。In some embodiments, the circuit board further includes a conductive bonding structure and a third electronic component. The conductive bonding structure is disposed under the first electronic component. The third electronic component is disposed under the first electronic component and is electrically connected to the first electronic component through the conductive bonding structure.

在一些實施例中,導電接合結構包含具有多個凹槽的第一導電件以及第二導電件。具有多個凹槽的第一導電件,包含固化液態金屬複合層的第三部分、設置於第三部分下並經由凹槽彼此間隔的多個導電墊層;以及設置於導電墊層下並延伸覆蓋凹槽的導電層。第二導電件包括豎向延伸的導電柱以及橫向延伸的接墊,其中接墊以第一表面接觸導電柱,並以相對於第一表面的第二表面接觸第三電子元件,其中導電柱插設於第一導電件的凹槽中。In some embodiments, the conductive bonding structure includes a first conductive member and a second conductive member having a plurality of grooves. A first conductive member having a plurality of grooves, including a third portion of the solidified liquid metal composite layer, a plurality of conductive pads disposed under the third portion and spaced apart from each other via the grooves; and a plurality of conductive pads disposed under and extending from the conductive pads. A conductive layer covering the grooves. The second conductive member includes vertically extending conductive posts and transversely extending pads, wherein the pads contact the conductive posts with a first surface, and contact the third electronic component with a second surface opposite to the first surface, wherein the conductive posts are inserted into disposed in the groove of the first conductive member.

根據本申請的一些實施例,一種製造電路板的方法,包括提供基板,其中基板包含基材以及設置於基材上的第一導電層;設置環繞基板的線路結構;設置第一電子元件於第一導電層上,其中第一電子元件具有上表面以及相對於上表面的下表面;填充液態金屬複合物於第一導電層上,直至液態金屬複合物的頂表面高於第一電子元件的上表面;固化液態金屬複合物;以及設置第二電子元件於固化液態金屬複合層上。According to some embodiments of the present application, a method of manufacturing a circuit board includes providing a substrate, wherein the substrate includes a base material and a first conductive layer disposed on the base material; arranging a circuit structure surrounding the substrate; arranging a first electronic component on the first conductive layer; on a conductive layer, wherein the first electronic component has an upper surface and a lower surface relative to the upper surface; filling the liquid metal composite on the first conductive layer until the top surface of the liquid metal composite is higher than the upper surface of the first electronic component surface; solidifying the liquid metal composite; and disposing a second electronic component on the solidified liquid metal composite layer.

在一些實施例中,形成固化液態金屬複合層的步驟之後,還包括:形成第一開口於上表面上的固化液態金屬複合層中;設置絕緣層於上表面上的固化液態金屬複合層上,並填滿第一開口;形成第二開口延伸至絕緣層,並暴露固化液態金屬複合層;將液態金屬複合物填滿第二開口,並覆蓋部分的絕緣層;以及固化填滿第二開口與覆蓋部分的絕緣層的液態金屬複合物。In some embodiments, after the step of forming the solidified liquid metal composite layer, it further includes: forming a first opening in the solidified liquid metal composite layer on the upper surface; disposing an insulating layer on the solidified liquid metal composite layer on the upper surface, and fill the first opening; form a second opening extending to the insulating layer and expose the solidified liquid metal composite layer; fill the second opening with the liquid metal composite and cover part of the insulating layer; and solidify and fill the second opening with the A liquid metal compound that covers part of the insulation.

在一些實施例中,方法更包含:設置固化液態金屬複合層的部分於第一電子元件的下表面下,從而連接第一導電層以及第一電子元件;移除基材;以及設置第三電子元件於第一電子元件下,使得第三電子元件經由導電接合結構與第一電子元件電性連接,其中導電接合結構包含固化液態金屬複合層的部分。In some embodiments, the method further includes: arranging a portion of the solidified liquid metal composite layer under the lower surface of the first electronic component to connect the first conductive layer and the first electronic component; removing the substrate; and arranging a third electron The component is under the first electronic component, so that the third electronic component is electrically connected to the first electronic component through the conductive joint structure, wherein the conductive joint structure includes a portion of the solidified liquid metal composite layer.

在一些實施例中,設置第三電子元件於第一電子元件下的步驟,包含:移除部分的第一導電層,以形成多個導電墊層於固化液態金屬複合層的部分下,並且導電墊層經由多個第一凹槽彼此間隔;設置第二導電層於導電墊層下並延伸共形地覆蓋第一凹槽,形成多個第二凹槽,使得第二導電層、導電墊層與固化液態金屬複合層的部分共同形成具有第二凹槽的第一導電件;提供第三電子元件以及設置於第三電子元件上的第二導電件,其中第二導電件包括豎向延伸的導電柱以及橫向延伸的接墊,接墊以第一表面接觸導電柱,並以相對於第一表面的第二表面接觸第三電子元件;以及設置第三電子元件於第一電子元件下,使得第二導電件的導電柱插設於第一導電件的第二凹槽中。In some embodiments, the step of arranging the third electronic component under the first electronic component includes: removing a portion of the first conductive layer to form a plurality of conductive pad layers under portions of the solidified liquid metal composite layer, and conducting electricity The pad layers are spaced apart from each other via a plurality of first grooves; a second conductive layer is disposed under the conductive pad layer and extends conformally to cover the first grooves, forming a plurality of second grooves, so that the second conductive layer and the conductive pad layer A first conductive member having a second groove is formed together with a portion of the solidified liquid metal composite layer; a third electronic component and a second conductive member disposed on the third electronic component are provided, wherein the second conductive member includes a vertically extending conductive pillars and laterally extending pads, the pads contact the conductive pillars with a first surface, and contact the third electronic component with a second surface opposite to the first surface; and dispose the third electronic component under the first electronic component, so that The conductive post of the second conductive member is inserted into the second groove of the first conductive member.

在一些實施例中,固化液態金屬複合物的步驟,包含以60°C至200°C的溫度加熱液態金屬複合物。In some embodiments, the step of solidifying the liquid metal composite includes heating the liquid metal composite at a temperature of 60°C to 200°C.

本申請的實施例提供電路板及其製造方法。經由使用固化液態金屬複合層的設置,對於電子元件 (例如第一電子元件)實現更好的電性連接的品質,提升電路板的結構可靠度以及電子元件的散熱效率。Embodiments of the present application provide circuit boards and manufacturing methods thereof. By using the solidified liquid metal composite layer, better electrical connection quality can be achieved for electronic components (such as the first electronic component), and the structural reliability of the circuit board and the heat dissipation efficiency of the electronic components can be improved.

當諸如層、膜、區域或基材的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,「電性連接」或「耦合」可為二元件間存在其它元件。When an element such as a layer, film, region or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or intervening elements Can and exist. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physical and/or electrical connection. Furthermore, "electrical connection" or "coupling" can mean the presence of other components between two components.

此外,諸如「下」或「底部」和「上」或「頂部」的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其他元件的「下」側的元件將被定向在其他元件的「上」側。因此,示例性術語「下」可以包括「下」和「上」的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件「下方」或「下方」的元件將被定向為在其它元件「上方」。因此,示例性術語「下面」或「下面」可以包括上方和下方的取向。Additionally, relative terms, such as "lower" or "bottom" and "upper" or "top," may be used herein to describe one element's relationship to another element as illustrated in the Figures. It will be understood that relative terms are intended to encompass different orientations of the device in addition to the orientation illustrated in the figures. For example, if the device in one of the figures is turned over, elements described as "below" other elements would then be oriented "above" the other elements. Thus, the exemplary term "lower" may include both "lower" and "upper" orientations, depending on the particular orientation of the drawing. Similarly, if the device in one of the figures is turned over, elements described as "below" or "beneath" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "below" or "lower" may include both superior and inferior orientations.

本文使用的「約」、「近似」、或「大致上」包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量 (即,測量系統的限制)。例如,「約」可以表示在所述值的一個或多個標準偏差內。As used herein, "about," "approximately," or "substantially" includes the stated value and an average within an acceptable range of deviations from the particular value as determined by one of ordinary skill in the art, taking into account the measurements in question and the A specific amount of error associated with a measurement (i.e., the limitations of the measurement system). For example, "about" may mean within one or more standard deviations of the stated value.

除非另有定義,本文使用的所有術語 (包括技術和科學術語)具有與本申請所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本申請的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be construed to have meanings consistent with their meanings in the context of the relevant art and the present application, and will not be construed as idealistic or excessive Formal meaning, unless expressly defined as such herein.

應注意的是,除非有額外說明,當以下實施例繪示或描述成一系列的操作或事件時,這些操作或事件的描述順序不應受到限制。例如,部分操作或事件可採取與本申請不同的順序、部分操作或事件可同時發生、部分操作或事件可以不須採用、及/或部分操作或事件可重複進行。並且,實際的工藝可能須各步驟之前、過程中、或之後進行額外的操作以完整形成電路板。因此,本申請可能將簡短地說明其中一些額外的操作。It should be noted that, unless otherwise specified, when the following embodiments are illustrated or described as a series of operations or events, the order of description of these operations or events should not be limited. For example, some operations or events may be performed in a different order than in this application, some operations or events may occur simultaneously, some operations or events may not be used, and/or some operations or events may be repeated. Furthermore, the actual process may require additional operations before, during, or after each step to completely form the circuit board. Therefore, this application may briefly describe some of these additional operations.

請參照第1A圖。首先,提供基板110,其中基板110包含基材112以及設置於基材112上的導電層114。Please refer to Figure 1A. First, a substrate 110 is provided, wherein the substrate 110 includes a base material 112 and a conductive layer 114 disposed on the base material 112 .

在一些實施例中,基材112的材料可包括液晶聚合物 (liquid crystal polymer,LCP)、雙順丁烯二酸醯亞胺樹脂 (bismaleimide-triazine,BT)、含有無機填充物的樹脂 (例如,ABF (Ajinomoto Build-up Film) 樹脂或環氧樹脂 (epoxy))、聚醯亞胺(polyimide,PI,例如熱塑性聚醯亞胺 (thermoplastic polyimide,TPI))、聚對苯二甲酸乙二醇酯 (polyethylene terephthalate,PET)、聚萘二甲酸乙二醇酯 (polythylene naphthalate,PEN)、聚氨酯 (polyurethane,PU,例如熱塑性聚氨酯 (thermoplastic polyurethane,TPU))、其它合適材料、上述的衍生物、或上述材料的任意組合。在一些實施例中,導電層114的材料為金、銀、銅、鎳、錫、其他合適的金屬、或上述材料的任意組合。In some embodiments, the material of the substrate 112 may include liquid crystal polymer (LCP), bismaleimide-triazine (BT), resin containing inorganic fillers (eg, , ABF (Ajinomoto Build-up Film) resin or epoxy resin (epoxy)), polyimide (PI, such as thermoplastic polyimide (TPI)), polyethylene terephthalate Polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyurethane (PU, such as thermoplastic polyurethane (TPU)), other suitable materials, derivatives of the above, or Any combination of the above materials. In some embodiments, the conductive layer 114 is made of gold, silver, copper, nickel, tin, other suitable metals, or any combination of the above materials.

接著,請參照第1B圖。移除部分的導電層114,以形成開口H0以及導電層114的保留部分114P於基材112上,並且經由開口H0,使得保留部分114P彼此間隔。在一些實施例中,移除部分的導電層114的步驟可包括撈型 (routing)、鑽孔 (例如雷射鑽孔或機械鑽孔)、蝕刻、剝離 (peeling)、其他合適的方法、或上述的組合。在一實施例中,經由蝕刻以移除部分的導電層114,其中採用的蝕刻劑對導電層114的蝕刻速率  (etching rate) 快於對基材112的蝕刻速率。因此,基材112基本上不受蝕刻的影響。Next, please refer to Figure 1B. A portion of the conductive layer 114 is removed to form an opening H0 and a remaining portion 114P of the conductive layer 114 on the substrate 112 , and the remaining portions 114P are spaced apart from each other via the opening H0 . In some embodiments, removing a portion of the conductive layer 114 may include routing, drilling (such as laser drilling or mechanical drilling), etching, peeling, other suitable methods, or A combination of the above. In one embodiment, a portion of the conductive layer 114 is removed through etching, wherein the etching rate of the conductive layer 114 using an etchant is faster than the etching rate of the substrate 112 . Therefore, the substrate 112 is substantially unaffected by etching.

接著,請參照第1C圖。設置絕緣層122於基材112上,並環繞保留部分114P。接著,設置線路結構CL於絕緣層122上,並同樣環繞保留部分114P。Next, please refer to Figure 1C. The insulating layer 122 is disposed on the base material 112 and surrounds the remaining portion 114P. Next, the circuit structure CL is disposed on the insulating layer 122 and also surrounds the remaining portion 114P.

在一些實施例中,絕緣層122的材料可包括高分子聚合物,例如環氧樹脂 (epoxy)、聚醯亞胺 (PI,例如熱塑性聚醯亞胺 (TPI))、聚對苯二甲酸乙二醇酯 (PET)、聚萘二甲酸乙二醇酯 (PEN)、聚氨酯 (PU,例如,熱塑性聚氨酯 (TPU))、其它合適材料、上述的衍生物、或上述材料的任意組合。In some embodiments, the material of the insulating layer 122 may include high molecular polymers, such as epoxy, polyimide (PI, such as thermoplastic polyimide (TPI)), polyethylene terephthalate Glycol ester (PET), polyethylene naphthalate (PEN), polyurethane (PU, for example, thermoplastic polyurethane (TPU)), other suitable materials, derivatives of the above, or any combination of the above materials.

在一些實施例中,絕緣層122以及線路結構CL兩者與保留部分114P經由開口H1相互間隔。在一些實施例中,線路結構CL為經由增層 (build-up) 所獲得的多層線路結構。舉例而言 (以下圖未示),可以先依序形成基材 (例如基材112)、導電層 (例如導電層114)、金屬層 (例如銅層),獲得第一線路結構之後,進一步地,再形成第二線路結構於第一線路結構上,並且第一線路結構以及第二線路結構之間經由絕緣層間隔,以此類推,從而形成多層線路結構。In some embodiments, both the insulating layer 122 and the line structure CL are spaced apart from the remaining portion 114P via the opening H1. In some embodiments, the circuit structure CL is a multi-layer circuit structure obtained through build-up. For example (not shown in the following figures), a base material (such as the base material 112), a conductive layer (such as the conductive layer 114), and a metal layer (such as a copper layer) can be formed in sequence. After obtaining the first circuit structure, further , and then form a second circuit structure on the first circuit structure, and the first circuit structure and the second circuit structure are separated by an insulating layer, and so on, thereby forming a multi-layer circuit structure.

接著,請參照第1D圖。設置填充層132於開口H0以及開口H1中。接著,設置第一電子元件E1於導電層114的保留部分114P上。在一些實施例中,填充層132的材料包括介電材料,例如光成像型介電材料 (photo imageable dielectric,PID)。Next, please refer to Figure 1D. The filling layer 132 is provided in the opening H0 and the opening H1. Next, the first electronic component E1 is disposed on the remaining portion 114P of the conductive layer 114 . In some embodiments, the material of the filling layer 132 includes a dielectric material, such as a photo imageable dielectric material (PID).

在一些實施例中,第一電子元件E1可以是被動元件 (例如電阻、電容與電感) 或主動元件 (例如電晶體)。或者,第一電子元件E1可包括主動元件與被動元件,例如具有主動元件與被動元件的積體電路 (integrated circuit,IC),但本申請不以此為限。In some embodiments, the first electronic component E1 may be a passive component (such as a resistor, a capacitor, and an inductor) or an active component (such as a transistor). Alternatively, the first electronic component E1 may include active components and passive components, such as an integrated circuit (IC) having active components and passive components, but the application is not limited thereto.

在一些實施例中,填充層132填滿所有的開口H0以及開口H1,並且填充層132的上表面132a與絕緣層122的上表面122a可齊平。在一些實施例中,第一電子元件E1可包含多個金屬墊M1,其中這些金屬墊M1可位於第一電子元件E1的上表面E1a上以及下表面E1b下。In some embodiments, the filling layer 132 fills all the openings H0 and H1 , and the upper surface 132 a of the filling layer 132 and the upper surface 122 a of the insulating layer 122 may be flush. In some embodiments, the first electronic component E1 may include a plurality of metal pads M1, wherein the metal pads M1 may be located on the upper surface E1a and below the lower surface E1b of the first electronic component E1.

設置於下表面E1b下的金屬墊M1能使第一電子元件E1的下表面E1b不與保留部分114P直接接觸,為下表面E1b以及保留部分114P之間留出空隙,並為後續的液態金屬複合物,保留出填充空間。在一些實施例中,第一電子元件E1與線路結構CL可電性連接 (圖未示)。此外,金屬墊M1的材料可為金、銀、銅、鎳、錫、其他合適的金屬、或上述材料的任意組合。The metal pad M1 disposed under the lower surface E1b can prevent the lower surface E1b of the first electronic component E1 from directly contacting the retained portion 114P, leaving a gap between the lower surface E1b and the retained portion 114P, and providing space for subsequent liquid metal compounding. objects, leaving space for filling. In some embodiments, the first electronic component E1 is electrically connected to the circuit structure CL (not shown). In addition, the material of the metal pad M1 may be gold, silver, copper, nickel, tin, other suitable metals, or any combination of the above materials.

接著,請參照第1E圖。填充液態金屬複合物於導電層114的保留部分114P上,直至液態金屬複合物的頂表面 (液面) 高於第一電子元件E1的上表面E1a。接著,固化液態金屬複合物,形成固化液態金屬複合層140。Next, please refer to Figure 1E. The liquid metal composite is filled on the remaining portion 114P of the conductive layer 114 until the top surface (liquid level) of the liquid metal composite is higher than the upper surface E1a of the first electronic component E1. Next, the liquid metal composite is solidified to form the solidified liquid metal composite layer 140 .

在一些實施例中,液態金屬複合物的材料包含液態金屬 (非結晶態的金屬,或稱金屬玻璃) 以及高分子聚合物。在一些實施例中,液態金屬複合物是經由在特定配比中混合單獨或是多種金屬顆粒與高分子聚合物,並以低溫熔煉的方式使添加物之間充分融合而得的呈流動態的金屬複合物,其中金屬顆粒呈非結晶態 (俗稱液態金屬)。在一些實施例中,液態金屬可以為銅或銅合金,高分子聚合物可以為凝膠、樹脂或其組合。In some embodiments, the material of the liquid metal composite includes liquid metal (amorphous metal, or metallic glass) and high molecular polymer. In some embodiments, the liquid metal composite is fluid and is obtained by mixing individual or multiple metal particles and polymers in a specific ratio, and using low-temperature smelting to fully fuse the additives. Metal composites in which metal particles are in an amorphous state (commonly known as liquid metal). In some embodiments, the liquid metal can be copper or copper alloy, and the high molecular polymer can be gel, resin or a combination thereof.

在一些實施例中,液態金屬複合物中還可以包括黏合劑或稀釋劑,以提高黏合性或流動性,或是還可進一步包括蠟粉、球形石墨、分散劑、發泡劑、或流平劑等,以提升金屬顆粒於液態金屬複合物中的分散性。In some embodiments, the liquid metal composite may also include a binder or diluent to improve adhesion or fluidity, or may further include wax powder, spherical graphite, dispersant, foaming agent, or leveling agent. Agents, etc., to improve the dispersion of metal particles in the liquid metal composite.

在一些實施例中,在填充液態金屬複合物於保留部分114P上的過程中,可用線路結構CL作為屏障,將液態金屬複合物填充於線路結構CL所環繞出的空間中,以使位於保留部分114P、填充層132以及絕緣層122上的液態金屬複合物能直接接觸第一電子元件E1的所有表面 (包含上表面E1a、下表面E1b以及側表面E1c) 以及線路結構CL的側壁CLs。在一些實施例中,液態金屬複合物覆蓋整個側表面E1c以及覆蓋未與金屬墊M1接觸的整個上表面E1a以及整個下表面E1b,從而包覆整個第一電子元件E1,並連接保留部分114P以及第一電子元件E1。In some embodiments, during the process of filling the liquid metal composite on the reserved portion 114P, the circuit structure CL can be used as a barrier, and the liquid metal composite is filled in the space surrounded by the circuit structure CL, so that the liquid metal composite located in the reserved portion 114P can be filled with the liquid metal composite in the space surrounded by the circuit structure CL. 114P, the liquid metal composite on the filling layer 132 and the insulating layer 122 can directly contact all surfaces of the first electronic component E1 (including the upper surface E1a, the lower surface E1b and the side surface E1c) and the sidewalls CLs of the circuit structure CL. In some embodiments, the liquid metal composite covers the entire side surface E1c and covers the entire upper surface E1a that is not in contact with the metal pad M1 and the entire lower surface E1b, thereby covering the entire first electronic component E1 and connecting the remaining portion 114P and The first electronic component E1.

之後,可固化液態金屬複合物。在形成固化液態金屬複合層140的步驟中,以60°C至200°C的溫度加熱液態金屬複合物 (例如60°C、100°C 、150°C、200°C或前述任意區間中的溫度),使得液態金屬複合物中的高分子聚合物完全固化而成固化液態金屬複合層140。在一些實施例中,可以經由階段性升溫烘烤的方式,固化液態金屬複合物,例如以每半小時升溫20°C的方式,烘烤液態金屬複合物,以使得液態金屬複合物均勻受熱,提升液態金屬複合物的固化效果。Afterwards, the liquid metal composite can be solidified. In the step of forming the solidified liquid metal composite layer 140, the liquid metal composite is heated at a temperature of 60°C to 200°C (for example, 60°C, 100°C, 150°C, 200°C or any of the foregoing ranges). temperature), so that the polymer in the liquid metal composite is completely solidified to form the solidified liquid metal composite layer 140. In some embodiments, the liquid metal composite can be solidified through staged heating and baking, for example, baking the liquid metal composite by raising the temperature by 20°C every half hour, so that the liquid metal composite is evenly heated. Improve the curing effect of liquid metal composites.

值得強調的是,固化液態金屬複合層140具有質輕堅固以及光亮的特性,並且相較於習知的金屬,具有較好的延展性、耐腐蚀性、以及抗磨性。It is worth emphasizing that the solidified liquid metal composite layer 140 is light, strong, and bright, and has better ductility, corrosion resistance, and wear resistance than conventional metals.

接著,請參照第1F圖。移除位於上表面E1a上的固化液態金屬複合層140的部分。接著,設置絕緣層124於固化液態金屬複合層140上,並在絕緣層124上進行增層,依序形成基材116以及導電層118於絕緣層124上。在一些實施例中,絕緣層124的材料可以與絕緣層122 (請參照第1C圖) 相同或相近,於此不另贅述。Next, please refer to Figure 1F. The portion of the solidified liquid metal composite layer 140 located on the upper surface E1a is removed. Next, the insulating layer 124 is placed on the solidified liquid metal composite layer 140, and layers are added on the insulating layer 124 to sequentially form the base material 116 and the conductive layer 118 on the insulating layer 124. In some embodiments, the material of the insulating layer 124 may be the same as or similar to the insulating layer 122 (please refer to FIG. 1C ), which will not be described again here.

在一些實施例中,移除位於上表面E1a上的固化液態金屬複合層140的部分的步驟包含形成開口H2於固化液態金屬複合層140中,使得保留下來的固化液態金屬複合層140的多個部分142與其他部分144可經由開口H2而彼此間隔。在一些實施方式中,可使用雷射移除位於上表面E1a上的固化液態金屬複合層140的部分而形成開口H2。In some embodiments, the step of removing the portion of the solidified liquid metal composite layer 140 located on the upper surface E1a includes forming openings H2 in the solidified liquid metal composite layer 140 such that a plurality of portions of the solidified liquid metal composite layer 140 remain. Portion 142 and other portions 144 may be spaced apart from each other via opening H2. In some embodiments, a laser may be used to remove a portion of the solidified liquid metal composite layer 140 on the upper surface E1a to form the opening H2.

在一些實施例中,設置絕緣層124於固化液態金屬複合層140上的步驟中,包含設置絕緣層124於固化液態金屬複合層140的部分142與其他部分144上,並填滿開口H2。In some embodiments, the step of disposing the insulating layer 124 on the solidified liquid metal composite layer 140 includes disposing the insulating layer 124 on the portion 142 and other portions 144 of the solidified liquid metal composite layer 140 and filling the opening H2.

接著,請參照第1G圖 (請輔助參照第1F圖)。移除位於保留部分114P下方的基材112。具體而言,移除保留部分114P下方的基材112的步驟包含移除整片基材112,從而暴露出絕緣層122、填充層132以及保留部分114P。Next, please refer to Figure 1G (please refer to Figure 1F for assistance). The substrate 112 underneath the remaining portion 114P is removed. Specifically, the step of removing the substrate 112 under the remaining portion 114P includes removing the entire substrate 112 , thereby exposing the insulating layer 122 , the filling layer 132 and the remaining portion 114P.

接著,請參照第1H圖。移除一部分的保留部分114P (請輔助參照第1G圖),以形成多個導電墊層CP於固化液態金屬複合層140的其他部分144下,並且導電墊層CP經由凹槽A0彼此間隔。接著,設置導電層150於多個導電墊層CP下並延伸覆蓋多個凹槽A0。Next, please refer to Figure 1H. A portion of the remaining portion 114P is removed (please refer to FIG. 1G for assistance) to form a plurality of conductive pad layers CP under other portions 144 of the solidified liquid metal composite layer 140, and the conductive pad layers CP are spaced apart from each other via the grooves A0. Next, the conductive layer 150 is disposed under the plurality of conductive pad layers CP and extends to cover the plurality of grooves A0.

在一些實施例中,導電層150的材料為金、銀、銅、鎳、錫、其他合適的金屬,或上述材料組合的合金。在一些實施例中,導電墊層CP與金屬墊M1使用相同材料,而金屬墊M1與導電層150的材料則不相同,例如導電墊層CP以及金屬墊M1的材料為銅,導電層150的材料為金。In some embodiments, the conductive layer 150 is made of gold, silver, copper, nickel, tin, other suitable metals, or alloys of combinations of the above materials. In some embodiments, the conductive pad layer CP and the metal pad M1 use the same material, but the metal pad M1 and the conductive layer 150 are made of different materials. For example, the conductive pad layer CP and the metal pad M1 are made of copper, and the conductive layer 150 is made of copper. The material is gold.

在一些實施例中,導電墊層CP直接接觸其他部分144的下表面144b,並且導電墊層CP的下表面CPb高於填充層132的下表面132b。在一些實施例中,導電層150自導電墊層CP沿凹槽A0共形設置,從而於凹槽A0處進一步形成凹槽A1。In some embodiments, the conductive pad layer CP directly contacts the lower surface 144b of the other portion 144, and the lower surface CPb of the conductive pad layer CP is higher than the lower surface 132b of the filling layer 132. In some embodiments, the conductive layer 150 is conformally disposed from the conductive pad layer CP along the groove A0, thereby further forming the groove A1 at the groove A0.

接著,請參照第1I圖。移除固化液態金屬複合層140的其他部分144上方的導電層118、基材116、以及絕緣層124,形成開口H3。另外,移除填充層132以及位於填充層132上方並與填充層132直接接觸的其他部分144 (請輔助參照第1H圖),形成開口H4,從而使得其他部分144經由開口H4分隔為完全覆蓋第一電子元件E1的側表面E1c並延伸覆蓋部分的上表面E1a的部分144A,以及設置於第一電子元件E1的下表面E1b下的部分144B。因此,部分144B、金屬墊M1、導電墊層CP以及導電層150共同形成具有凹槽A1的導電件CU1。Next, please refer to Figure 1I. The conductive layer 118, the substrate 116, and the insulating layer 124 above the other portions 144 of the solidified liquid metal composite layer 140 are removed to form opening H3. In addition, the filling layer 132 and other parts 144 located above the filling layer 132 and in direct contact with the filling layer 132 (please refer to FIG. 1H for assistance) are removed to form an opening H4, so that the other parts 144 are separated by the opening H4 to completely cover the first part. A portion 144A of the side surface E1c of an electronic component E1 extends to cover part of the upper surface E1a, and a portion 144B disposed under the lower surface E1b of the first electronic component E1. Therefore, the portion 144B, the metal pad M1, the conductive pad layer CP and the conductive layer 150 together form the conductive member CU1 having the groove A1.

在一些實施例中,固化液態金屬複合層140 (部分142、部分144A以及部分144B) 包覆至少80%以上的第一電子元件E1的表面積 (即,上表面E1a、下表面E1b、以及側表面E1c的表面積總和),可以更好地屏蔽以及保護第一電子元件E1。In some embodiments, the solidified liquid metal composite layer 140 (portion 142, portion 144A, and portion 144B) covers at least 80% of the surface area of the first electronic component E1 (i.e., the upper surface E1a, the lower surface E1b, and the side surfaces The total surface area of E1c) can better shield and protect the first electronic component E1.

在一些實施例中,使用雷射移除固化液態金屬複合層140的其他部分144上方的導電層118、基材116、以及絕緣層124,以及移除填充層132以及位於填充層132上方並與填充層132直接接觸的其他部分144。In some embodiments, a laser is used to remove the conductive layer 118 , the substrate 116 , and the insulating layer 124 over the other portions 144 of the solidified liquid metal composite layer 140 , and to remove the fill layer 132 and above and with the fill layer 132 . The filling layer 132 is in direct contact with other portions 144 .

接著,請參照第1J圖。設置金屬層ML於開口H3中,使得金屬層ML直接接觸部分144A,以及設置填充層134於導電層118上。金屬層ML連接固化液態金屬複合層140的部分144A,可以協助轉移第一電子元件E1的熱量,提升第一電子元件E1的散熱效果,並協助將第一電子元件E1與其他電路結構電性連接 (圖未示)。Next, please refer to Figure 1J. The metal layer ML is disposed in the opening H3 so that the metal layer ML directly contacts the portion 144A, and the filling layer 134 is disposed on the conductive layer 118 . The metal layer ML is connected to the portion 144A of the solidified liquid metal composite layer 140, which can assist in transferring the heat of the first electronic component E1, improve the heat dissipation effect of the first electronic component E1, and assist in electrically connecting the first electronic component E1 with other circuit structures. (not shown).

在一些實施例中,金屬層ML延伸設置於導電層118上。在一些實施例中,金屬層ML與填充層134之間經由間隙SP分隔,並未直接接觸。在一些實施例中,設置填充層134於導電層118上的步驟包含形成開口H4於導電層118中,以及設置填充層134填滿開口H4,使得填充層134與基材116直接接觸,並延伸覆蓋於導電層118上。在一些實施例中,在垂直方向 (Z軸) 上,開口H4基本上對齊開口H2,使得鄰接開口H4的導電層118之間在垂直方向 (Z軸)上,基本上對齊部分142,以提升後續開口設置以及線路連接的精準度。In some embodiments, the metal layer ML extends over the conductive layer 118 . In some embodiments, the metal layer ML and the filling layer 134 are separated by a gap SP and are not in direct contact. In some embodiments, the step of disposing the filling layer 134 on the conductive layer 118 includes forming an opening H4 in the conductive layer 118 and disposing the filling layer 134 to fill the opening H4 so that the filling layer 134 is in direct contact with the substrate 116 and extends Covered on the conductive layer 118. In some embodiments, the opening H4 is substantially aligned with the opening H2 in the vertical direction (Z-axis), such that the conductive layer 118 adjacent the opening H4 is substantially aligned with the portion 142 in the vertical direction (Z-axis) to lift Precision in subsequent opening settings and line connections.

接著,請參照第1K圖。形成開口H5,其中開口H5延伸至填充層134、導電層118、基材116、以及絕緣層124,暴露固化液態金屬複合層140的部分142。接著,將液態金屬複合物填滿開口H5,並覆蓋填充層134。接著,固化液態金屬複合物,形成固化液態金屬複合層140的部分146 (例如採用與第1E圖相近的固化方式),因此,部分146與部分142直接接觸。接著,設置金屬墊M2於第二電子元件E2的下表面E2b,並且以金屬墊M2與部分146直接接觸的方式,設置第二電子元件E2於部分146上,因此,第一電子元件E1與第二電子元件E2經由金屬墊M1、部分142、部分146以及金屬墊M2電性連接。Next, please refer to Figure 1K. Opening H5 is formed, wherein opening H5 extends to filling layer 134 , conductive layer 118 , substrate 116 , and insulating layer 124 , exposing portion 142 of solidified liquid metal composite layer 140 . Next, the liquid metal composite fills the opening H5 and covers the filling layer 134 . Next, the liquid metal composite is solidified to form the portion 146 of the solidified liquid metal composite layer 140 (for example, using a curing method similar to that shown in FIG. 1E ). Therefore, the portion 146 is in direct contact with the portion 142 . Next, a metal pad M2 is disposed on the lower surface E2b of the second electronic component E2, and the second electronic component E2 is disposed on the portion 146 in such a manner that the metal pad M2 is in direct contact with the portion 146. Therefore, the first electronic component E1 is in direct contact with the portion 146. The two electronic components E2 are electrically connected through the metal pad M1, the portion 142, the portion 146, and the metal pad M2.

值得強調的是,相較於習知形成導通孔的步驟中,至少需經孔洞前處理、孔洞表面金屬化、以及通孔電鍍或盲孔電鍍等流程,本申請直接填充液態金屬複合物於開口H5之中,再固化為固化液態金屬複合層140的部分146的方式,製造方法較為簡便,並且可簡化元件數量,從而提升封裝的精度以及密度。此外,本申請的固化液態金屬複合層140的材料,相較於習知的金屬,具有較好的延展性、耐腐蚀性、以及抗磨性。It is worth emphasizing that compared with the conventional steps of forming via holes, which require at least hole pre-processing, hole surface metallization, and through-hole electroplating or blind hole electroplating, this application directly fills the opening with a liquid metal compound. In H5, the method of solidifying the part 146 of the liquid metal composite layer 140 is relatively simple, and the number of components can be simplified, thereby improving the accuracy and density of packaging. In addition, the material of the solidified liquid metal composite layer 140 of the present application has better ductility, corrosion resistance, and wear resistance than conventional metals.

另一方面,相較於將部分142與習知金屬 (例如銅) 直接接觸的方式 (例如形成習知的導通孔於部分142上),本申請的部分142以及部分146直接接觸,經由相同材料的設計,可以實現較好的電性連接品質。On the other hand, compared to the method of directly contacting the part 142 with a conventional metal (such as copper) (for example, forming a conventional via hole on the part 142), the part 142 and the part 146 of the present application are in direct contact through the same material. The design can achieve better electrical connection quality.

在一些實施例中,形成固化液態金屬複合層140的部分146的步驟之後,包含移除一部分覆蓋於填充層134上的部分146,形成多個相互間隔的金屬柱146A,從而降低部分146與填充層134接觸的表面積,以降低寄生電容。在一些實施例中,金屬柱146A與金屬墊M2接觸的上表面146Aa沿垂直方向 (Z軸) 投影於X-Y橫截面的投影面積,大於金屬墊M2與部分146接觸的下表面M2b沿垂直方向 (Z軸) 投影於X-Y橫截面的投影面積,可提升對接的精準度以及操作的方便性,從而提升連接的可靠度。在一些實施例中,第二電子元件E2可以採用與第一電子元件E1相同或相近的元件,但本申請不以此為限。In some embodiments, the step of forming the portion 146 of the solidified liquid metal composite layer 140 includes removing a portion of the portion 146 covering the filling layer 134 to form a plurality of metal pillars 146A spaced apart from each other, thereby reducing the distance between the portion 146 and the filling layer 146 . Layer 134 contacts the surface area to reduce parasitic capacitance. In some embodiments, the projected area of the upper surface 146Aa of the metal pillar 146A in contact with the metal pad M2 along the vertical direction (Z axis) on the X-Y cross-section is larger than the lower surface M2b of the metal pad M2 in contact with the portion 146 along the vertical direction (Z-axis). Z axis) The projected area projected on the X-Y cross section can improve the accuracy of docking and the convenience of operation, thus improving the reliability of the connection. In some embodiments, the second electronic component E2 may be the same or similar component as the first electronic component E1, but the application is not limited thereto.

接著,請參照第1L圖。提供第三電子元件E3以及設置於第三電子元件E3上的導電件CU2。接著,設置第三電子元件E3於第一電子元件E1下,使得第三電子元件E3經由導電接合結構CS (導電件CU1以及導電件CU2) 與第一電子元件E1電性連接。Next, please refer to Figure 1L. A third electronic component E3 and a conductive element CU2 disposed on the third electronic component E3 are provided. Next, the third electronic component E3 is disposed under the first electronic component E1 so that the third electronic component E3 is electrically connected to the first electronic component E1 through the conductive bonding structure CS (conductive element CU1 and conductive element CU2).

在一些實施例中,導電件CU2包括豎向 (沿Z軸方向) 延伸的導電柱CU2A以及橫向 (沿Y軸方向) 延伸的接墊CU2B,接墊CU2B以第一表面CU2Ba (虛線處) 接觸導電柱CU2A,並以相對於第一表面CU2Ba的第二表面CU2Bb接觸第三電子元件E3。也就是,在Y-Z橫截面中,導電件CU2呈T字型。在一些實施例中,設置第三電子元件E3於第一電子元件E1下的步驟,包含使得導電件CU2的導電柱CU2A插設於導電件CU1的導電層150所形成的凹槽A1中。在一些實施例中,導電柱CU2A以及接墊CU2B為一體成型。In some embodiments, the conductive element CU2 includes a conductive pillar CU2A extending vertically (along the Z-axis direction) and a pad CU2B extending transversely (along the Y-axis direction). The pad CU2B is in contact with the first surface CU2Ba (dotted line) The conductive pillar CU2A contacts the third electronic component E3 with the second surface CU2Bb relative to the first surface CU2Ba. That is, in the Y-Z cross section, the conductive member CU2 has a T-shape. In some embodiments, the step of arranging the third electronic component E3 under the first electronic component E1 includes inserting the conductive post CU2A of the conductive component CU2 into the groove A1 formed by the conductive layer 150 of the conductive component CU1. In some embodiments, the conductive pillar CU2A and the pad CU2B are integrally formed.

值得注意的是,經由在Y-Z橫截面中導電件CU2呈T字型,以及導電柱CU2A插設於導電層150中的凹槽A1的設計,增加導電件CU2以及導電件CU1的接觸面積,並提升導電件CU1以及導電件CU2之間的結構穩定性,從而提升電流傳輸的效率以及封裝的可靠度。It is worth noting that through the design of the conductive element CU2 being T-shaped in the Y-Z cross section, and the conductive pillar CU2A being inserted into the groove A1 in the conductive layer 150, the contact area of the conductive element CU2 and the conductive element CU1 is increased, and The structural stability between the conductive part CU1 and the conductive part CU2 is improved, thereby improving the efficiency of current transmission and the reliability of the package.

在一些實施例中,導電件CU2以及導電層150之間經由導電材料160相互連接。在一些實施例中,導電材料160可為焊料、導電膏或導電膠體,其中導電膠體例如是異方性導電膠 (anisotropic conductive film,ACF)。In some embodiments, the conductive element CU2 and the conductive layer 150 are connected to each other via the conductive material 160 . In some embodiments, the conductive material 160 may be solder, conductive paste, or conductive colloid, where the conductive colloid is, for example, anisotropic conductive film (ACF).

接著,請參照第1M圖。設置絕緣層126A填滿第二電子元件E2以及導電層118之間的空間,以及設置絕緣層126B填滿第一電子元件E1以及第三電子元件E3之間的空間,完成電路板100。在一些實施例中,絕緣層126A或絕緣層126B的材料包括介電材料,例如光成像型介電材料。Next, please refer to Figure 1M. The insulating layer 126A is provided to fill the space between the second electronic component E2 and the conductive layer 118 , and the insulating layer 126B is provided to fill the space between the first electronic component E1 and the third electronic component E3 , thereby completing the circuit board 100 . In some embodiments, the material of the insulating layer 126A or the insulating layer 126B includes a dielectric material, such as a photo-imaging dielectric material.

具體而言,絕緣層126A與導電層118、填充層134、固化液態金屬複合層140的部分146、金屬墊M2以及第二電子元件E2可直接接觸,並包覆填充層134、部分146以及金屬墊M2,以及覆蓋導電層118的整個上表面118a。因此,填充層134、部分146、金屬墊M2、以及導電層118均不會裸露於外。Specifically, the insulating layer 126A can directly contact the conductive layer 118, the filling layer 134, the portion 146 of the solidified liquid metal composite layer 140, the metal pad M2 and the second electronic component E2, and covers the filling layer 134, the portion 146 and the metal pad M2, and covers the entire upper surface 118a of the conductive layer 118. Therefore, the filling layer 134, the portion 146, the metal pad M2, and the conductive layer 118 are not exposed to the outside.

另一方面,絕緣層126B則與第一電子元件E1、第三電子元件E3以及導電接合結構CS直接接觸,包覆整個導電接合結構CS,並且覆蓋第三電子元件E3的整個上表面E3a。因此,絕緣層126A以及絕緣層126B分別經由包覆第一電子元件E1以及導電層118之間的部件 (例如金屬墊M2),以及包覆第一電子元件E1以及第三電子元件E3之間的部件 (例如導電接合結構CS),避免部件裸露而受外力破壞或是外部環境 (例如水氣) 影響,從而以提升電路板100的結構可靠度。On the other hand, the insulating layer 126B is in direct contact with the first electronic component E1, the third electronic component E3, and the conductive joint structure CS, covering the entire conductive joint structure CS, and covering the entire upper surface E3a of the third electronic component E3. Therefore, the insulating layer 126A and the insulating layer 126B respectively cover the component (such as the metal pad M2) between the first electronic component E1 and the conductive layer 118, and cover the component between the first electronic component E1 and the third electronic component E3. Components (such as the conductive bonding structure CS) are prevented from being exposed and damaged by external forces or affected by the external environment (such as moisture), thereby improving the structural reliability of the circuit board 100 .

綜合以上,本申請的實施例提供電路板以及製造電路板的方法,經由使用固化液態金屬複合層,包覆第一電子元件的上表面以及側表面,可屏蔽、保護第一電子元件,並提升第一電子元件的散熱效率。此外,經由使用固化液態金屬複合層連接第一電子元件以及第二電子元件,取代習知的通孔電鍍與盲孔電鍍,可簡化工藝以及元件數量,提升封裝的精度以及密度。還值得一提的是,由於相較於習知金屬,固化液態金屬複合層具有較好的延展性、耐腐蚀性、以及抗磨性,因此,前述固化液態金屬複合層的應用,可同時提升電路板的結構可靠度。In summary, embodiments of the present application provide a circuit board and a method for manufacturing the circuit board. By using a solidified liquid metal composite layer to cover the upper surface and side surface of the first electronic component, the first electronic component can be shielded and protected, and improve the performance of the circuit board. The heat dissipation efficiency of the first electronic component. In addition, by using the solidified liquid metal composite layer to connect the first electronic component and the second electronic component, instead of conventional through-hole plating and blind hole plating, the process and the number of components can be simplified, and the accuracy and density of packaging can be improved. It is also worth mentioning that, compared with conventional metals, the solidified liquid metal composite layer has better ductility, corrosion resistance, and wear resistance. Therefore, the application of the aforementioned solidified liquid metal composite layer can simultaneously improve Structural reliability of circuit boards.

以上概略說明了本申請的數個實施例的特徵,使所屬技術領域內具有通常知識者對於本申請可更為容易理解。任何所屬技術領域內具有通常知識者應瞭解到本說明書可輕易作為其他結構或工藝的變更或設計基礎,以進行相同於本申請實施例的目的及/或獲得相同的優點。任何所屬技術領域內具有通常知識者亦可理解與上述等同的結構並未脫離本申請之精神及保護範圍內,且可在不脫離本申請之精神及範圍內,可作更動、替代與修改。The above has briefly described the features of several embodiments of the present application, making it easier for those with ordinary knowledge in the art to understand the present application. Anyone with ordinary skill in the art should understand that this description can be easily used as a basis for modification or design of other structures or processes to achieve the same purposes and/or obtain the same advantages as the embodiments of the present application. Anyone with ordinary skill in the art will also understand that structures equivalent to the above do not deviate from the spirit and scope of the present application, and that changes, substitutions and modifications can be made without departing from the spirit and scope of the present application.

100:電路板 110:基板 112:基材 114:導電層 114P:保留部分 116:基材 118:導電層 118a:上表面 122、124、126A、126B:絕緣層 122a:上表面 132、134:填充層 132a:上表面 132b:下表面 140:固化液態金屬複合層 142、144A、144B、146:部分 144:其他部分 144b:下表面 146A:金屬柱 146Aa:上表面 150:導電層 160:導電材料 E1:第一電子元件 E1a:上表面 E1b:下表面 E1c:側表面 E2:第二電子元件 E2b:下表面 E3:第三電子元件 E3a:上表面 A0、A1:凹槽 H0、H1、H2、H3、H4、H5:開口 M1、M2:金屬墊 M2b:下表面 CL:線路結構 CLs:側壁 CP:導電墊層 CPb:下表面 CS:導電接合結構 CU1、CU2:導電件 CU2A:導電柱 CU2B:接墊 CU2Ba:第一表面 CU2Bb:第二表面 ML:金屬層 SP:間隙 100:Circuit board 110:Substrate 112:Substrate 114: Conductive layer 114P:Reserved part 116:Substrate 118: Conductive layer 118a: Upper surface 122, 124, 126A, 126B: Insulation layer 122a: Upper surface 132, 134: filling layer 132a: Upper surface 132b: Lower surface 140: Solidified liquid metal composite layer 142, 144A, 144B, 146: Part 144:Other parts 144b: Lower surface 146A:Metal column 146Aa: Upper surface 150:Conductive layer 160: Conductive materials E1: The first electronic component E1a: upper surface E1b: lower surface E1c: side surface E2: Second electronic component E2b: lower surface E3: The third electronic component E3a: upper surface A0, A1: Groove H0, H1, H2, H3, H4, H5: opening M1, M2: metal pad M2b: lower surface CL: line structure CLs: side walls CP: conductive cushion CPb: lower surface CS: conductive bonding structure CU1, CU2: conductive parts CU2A: conductive pillar CU2B: pad CU2Ba: first surface CU2Bb: Second surface ML: metal layer SP: gap

閱讀以下實施方法時搭配附圖以清楚理解本申請的觀點。應注意的是,根據業界的標準做法,各種特徵並未按照比例繪製。事實上,為了能清楚地討論,各種特徵的尺寸可能任意地放大或縮小。再者,相同的附圖標記表示相同的元件。 第1A圖至第1M圖為依據本申請一些實施例繪示電路板在各個製造階段的截面圖。 When reading the following implementation methods, please refer to the accompanying drawings to clearly understand the concepts of this application. It should be noted that, consistent with standard industry practice, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily expanded or reduced for clarity of discussion. Again, the same reference numerals refer to the same elements. Figures 1A to 1M are cross-sectional views illustrating circuit boards at various manufacturing stages according to some embodiments of the present application.

國內寄存資訊 (請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊 (請依寄存國家、機構、日期、號碼順序註記) 無 Domestic storage information (please note in order of storage institution, date and number) without Overseas storage information (please note in order of storage country, institution, date, and number) without

100:電路板 100:Circuit board

116:基材 116:Substrate

118:導電層 118: Conductive layer

118a:上表面 118a: Upper surface

126A、126B:絕緣層 126A, 126B: Insulating layer

134:填充層 134:Filling layer

140:固化液態金屬複合層 140: Solidified liquid metal composite layer

146:部分 146:Part

E1:第一電子元件 E1: The first electronic component

E2:第二電子元件 E2: Second electronic component

E3:第三電子元件 E3: The third electronic component

E3a:上表面 E3a: upper surface

M2:金屬墊 M2: metal pad

CS:導電接合結構 CS: conductive bonding structure

Claims (10)

一種電路板,包括: 第一電子元件,具有上表面、相對於所述上表面的下表面、連接所述上表面以及所述下表面的多個側表面; 固化液態金屬複合層,包覆所述第一電子元件,並覆蓋於所述第一電子元件的所述上表面上以及所述側表面上; 線路結構,環繞所述第一電子元件以及所述固化液態金屬複合層;以及 第二電子元件,設置於所述第一電子元件的所述上表面上,並經由所述固化液態金屬複合層與所述第一電子元件電性連接。 A circuit board including: A first electronic component having an upper surface, a lower surface relative to the upper surface, and a plurality of side surfaces connecting the upper surface and the lower surface; A solidified liquid metal composite layer covers the first electronic component and covers the upper surface and the side surface of the first electronic component; a circuit structure surrounding the first electronic component and the solidified liquid metal composite layer; and A second electronic component is disposed on the upper surface of the first electronic component and is electrically connected to the first electronic component through the solidified liquid metal composite layer. 如請求項1所述的電路板,其中所述固化液態金屬複合層的材料包含液態金屬以及高分子聚合物。The circuit board according to claim 1, wherein the material of the solidified liquid metal composite layer includes liquid metal and high molecular polymer. 如請求項1所述的電路板,其中所述固化液態金屬複合層包含; 第一部分,完全覆蓋所述第一電子元件的所述側表面並延伸覆蓋部分的所述上表面; 第二部分,設置於所述第一電子元件的所述上表面上並電性連接所述第一電子元件以及所述第二電子元件;以及 第三部分,設置於所述第一電子元件的所述下表面下, 其中所述第一部分、所述第二部分、以及所述第三部分之間彼此間隔。 The circuit board of claim 1, wherein the solidified liquid metal composite layer includes; a first portion that completely covers the side surface of the first electronic component and extends to cover part of the upper surface; a second part disposed on the upper surface of the first electronic component and electrically connected to the first electronic component and the second electronic component; and a third part disposed under the lower surface of the first electronic component, The first part, the second part, and the third part are spaced apart from each other. 如請求項3所述的電路板,更包含: 導電接合結構,設置於所述第一電子元件下;以及 第三電子元件,設置於所述第一電子元件下,並經由所述導電接合結構與所述第一電子元件電性連接。 The circuit board as described in request item 3 further includes: a conductive bonding structure disposed under the first electronic component; and A third electronic component is disposed under the first electronic component and is electrically connected to the first electronic component via the conductive bonding structure. 如請求項4所述的電路板,其中所述導電接合結構包含: 具有多個凹槽的第一導電件,包含: 所述固化液態金屬複合層的所述第三部分; 設置於所述第三部分下並經由所述凹槽彼此間隔的多個導電墊層;以及 設置於所述導電墊層下並延伸覆蓋所述凹槽的導電層;以及 第二導電件,包括豎向延伸的導電柱以及橫向延伸的接墊,其中所述接墊以第一表面接觸所述導電柱,並以相對於所述第一表面的第二表面接觸所述第三電子元件, 其中所述導電柱插設於所述第一導電件的所述凹槽中。 The circuit board of claim 4, wherein the conductive bonding structure includes: A first conductive member having a plurality of grooves, including: said third portion of said solidified liquid metal composite layer; a plurality of conductive pad layers disposed under the third portion and spaced apart from each other via the groove; and a conductive layer disposed under the conductive pad layer and extending to cover the groove; and The second conductive member includes a vertically extending conductive post and a transversely extending pad, wherein the pad contacts the conductive post with a first surface and contacts the conductive post with a second surface relative to the first surface. Third electronic component, The conductive post is inserted into the groove of the first conductive member. 一種製造電路板的方法,包括: 提供基板,其中所述基板包含基材以及設置於所述基材上的第一導電層; 設置環繞所述基板的線路結構; 設置第一電子元件於所述第一導電層上,其中所述第一電子元件具有上表面以及相對於所述上表面的下表面; 填充液態金屬複合物於所述第一導電層上,直至所述液態金屬複合物的頂表面高於所述第一電子元件的所述上表面; 固化所述液態金屬複合物,形成固化液態金屬複合層;以及 設置第二電子元件於所述固化液態金屬複合層上。 A method of manufacturing a circuit board, comprising: A substrate is provided, wherein the substrate includes a base material and a first conductive layer disposed on the base material; Providing a circuit structure surrounding the substrate; disposing a first electronic component on the first conductive layer, wherein the first electronic component has an upper surface and a lower surface relative to the upper surface; Filling the liquid metal composite on the first conductive layer until the top surface of the liquid metal composite is higher than the upper surface of the first electronic component; solidifying the liquid metal composite to form a solidified liquid metal composite layer; and A second electronic component is disposed on the solidified liquid metal composite layer. 如請求項6所述的方法,其中形成所述固化液態金屬複合層的步驟之後,還包括: 形成第一開口於所述上表面上的所述固化液態金屬複合層中; 設置絕緣層於所述上表面上的所述固化液態金屬複合層上,並填滿所述第一開口; 形成第二開口延伸至所述絕緣層,並暴露所述固化液態金屬複合層; 將所述液態金屬複合物填滿所述第二開口,並覆蓋部分的所述絕緣層;以及 固化填滿所述第二開口與覆蓋部分的所述絕緣層的所述液態金屬複合物。 The method of claim 6, wherein after the step of forming the solidified liquid metal composite layer, it further includes: forming a first opening in the solidified liquid metal composite layer on the upper surface; disposing an insulating layer on the solidified liquid metal composite layer on the upper surface and filling the first opening; forming a second opening extending to the insulating layer and exposing the solidified liquid metal composite layer; Fill the second opening with the liquid metal composite and cover part of the insulating layer; and The liquid metal composite filling the second opening and covering the portion of the insulating layer is solidified. 如請求項6所述的方法,更包含: 設置所述固化液態金屬複合層的部分於所述第一電子元件的所述下表面下,從而連接所述第一導電層以及所述第一電子元件; 移除所述基材;以及 設置第三電子元件於所述第一電子元件下,使得所述第三電子元件經由導電接合結構與所述第一電子元件電性連接,其中所述導電接合結構包含所述固化液態金屬複合層的所述部分。 The method described in request item 6 further includes: disposing a portion of the solidified liquid metal composite layer under the lower surface of the first electronic component to connect the first conductive layer and the first electronic component; removing the substrate; and A third electronic component is disposed under the first electronic component so that the third electronic component is electrically connected to the first electronic component via a conductive joint structure, wherein the conductive joint structure includes the solidified liquid metal composite layer of said part. 如請求項8所述的方法,其中設置所述第三電子元件於所述第一電子元件下的步驟,包含: 移除部分的所述第一導電層,以形成多個導電墊層於所述固化液態金屬複合層的所述部分下,並且所述導電墊層經由多個第一凹槽彼此間隔; 設置第二導電層於所述導電墊層下並延伸共形地覆蓋所述第一凹槽,形成多個第二凹槽,使得所述第二導電層、所述導電墊層與所述固化液態金屬複合層的所述部分共同形成具有所述第二凹槽的第一導電件; 提供第三電子元件以及設置於所述第三電子元件上的第二導電件,其中所述第二導電件包括豎向延伸的導電柱以及橫向延伸的接墊,所述接墊以第一表面接觸所述導電柱,並以相對於所述第一表面的第二表面接觸所述第三電子元件;以及 設置所述第三電子元件於所述第一電子元件下,使得所述第二導電件的所述導電柱插設於所述第一導電件的所述第二凹槽中。 The method of claim 8, wherein the step of arranging the third electronic component under the first electronic component includes: removing a portion of the first conductive layer to form a plurality of conductive underlayers under the portion of the solidified liquid metal composite layer, and the conductive underlayers are spaced apart from each other via a plurality of first grooves; A second conductive layer is disposed under the conductive pad layer and extends to conformally cover the first groove to form a plurality of second grooves, so that the second conductive layer, the conductive pad layer and the cured said portions of the liquid metal composite layer collectively form a first conductive member having said second groove; A third electronic component and a second conductive member disposed on the third electronic component are provided, wherein the second conductive member includes vertically extending conductive pillars and transversely extending pads, and the pads are formed on a first surface contacting the conductive post and contacting the third electronic component with a second surface relative to the first surface; and The third electronic component is disposed under the first electronic component so that the conductive pillar of the second conductive component is inserted into the second groove of the first conductive component. 如請求項6所述的方法,其中固化所述液態金屬複合物的步驟,包含以60°C至200°C的溫度加熱所述液態金屬複合物。The method of claim 6, wherein the step of solidifying the liquid metal composite includes heating the liquid metal composite at a temperature of 60°C to 200°C.
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