WO2021186629A1 - Circuit sheet, circuit board, and method for manufacturing circuit board - Google Patents

Circuit sheet, circuit board, and method for manufacturing circuit board Download PDF

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Publication number
WO2021186629A1
WO2021186629A1 PCT/JP2020/012054 JP2020012054W WO2021186629A1 WO 2021186629 A1 WO2021186629 A1 WO 2021186629A1 JP 2020012054 W JP2020012054 W JP 2020012054W WO 2021186629 A1 WO2021186629 A1 WO 2021186629A1
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WO
WIPO (PCT)
Prior art keywords
circuit
insulating layer
sheet
insulating
element mounting
Prior art date
Application number
PCT/JP2020/012054
Other languages
French (fr)
Japanese (ja)
Inventor
光生 戸川
大地 酒井
寿行 高岩
一司 皆川
岳人 野村
卓士 齋藤
加奈子 石原
富生 小川
健太郎 大倉
洋 別井
輝之 塚田
早苗 武田
朗宏 石毛
Original Assignee
昭和電工マテリアルズ株式会社
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Publication date
Application filed by 昭和電工マテリアルズ株式会社 filed Critical 昭和電工マテリアルズ株式会社
Priority to PCT/JP2020/012054 priority Critical patent/WO2021186629A1/en
Publication of WO2021186629A1 publication Critical patent/WO2021186629A1/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern

Definitions

  • This disclosure relates to a circuit sheet, a circuit board, and a method for manufacturing a circuit board.
  • a printed circuit board is generally manufactured by attaching a metal foil to the substrate, etching the printed circuit board, and processing the printed circuit board into a desired circuit shape.
  • the current capacity of the circuit board can be increased by increasing the cross-sectional area of the circuit (that is, increasing the thickness of the circuit).
  • Patent Document 1 As a method of manufacturing a circuit board corresponding to a large current, a method of using a circuit formed by processing a metal plate has been proposed (see, for example, Patent Document 1).
  • the circuit sheet manufactured by the above method heat treatment of the circuit sheet, crimping in the process of manufacturing the circuit board, etc. are performed, so that peeling is likely to occur between the side surface of the circuit and the insulating portion, and at the peeled portion. , The reliability may be impaired by trapping air bubbles or lowering the insulation resistance. Further, when the circuit sheet is sealed with a silicon gel or the like in a later step, air bubbles may be generated from the peeled portion on the side surface of the circuit, which may reduce the insulation resistance.
  • one aspect of the present disclosure is to provide a circuit sheet having excellent reliability, a circuit board including the circuit sheet, and a method for manufacturing the same.
  • ⁇ 1A> A circuit made of a conductor and an insulating portion provided in a space between the circuits are provided, and the side surface between the element mounting surface and the surface opposite to the element mounting surface in the circuit has a step.
  • ⁇ 2A> The circuit sheet according to ⁇ 1A>, wherein the step has a surface parallel to at least one of the element mounting surface and the surface opposite to the element mounting surface.
  • ⁇ 3A> The circuit sheet according to ⁇ 1A> or ⁇ 2A>, wherein the circuit has a region in which the cross-sectional shape of the circuit in the thickness direction of the circuit is substantially T-shaped.
  • ⁇ 4A> The circuit sheet according to any one of ⁇ 1A> to ⁇ 3A>, wherein the step is provided on the outer periphery of the circuit when viewed in the thickness direction of the circuit.
  • ⁇ 5A> When viewed in the thickness direction of the circuit, the step is provided inside the circuit, and the insulating portion provided in the space inside the circuit is located in the outer space of the circuit.
  • the circuit sheet according to any one of ⁇ 1A> to ⁇ 4A> which is connected to the insulating portion provided at two or more locations.
  • the surface roughness of the side surface is any one of ⁇ 1A> to ⁇ 5A>, which is larger than at least one of the surface roughness of the element mounting surface and the surface roughness of the surface opposite to the element mounting surface.
  • the circuit sheet described in. ⁇ 7A> The circuit sheet according to any one of ⁇ 1A> to ⁇ 6A>, an insulating layer arranged so as to be in contact with a surface opposite to the element mounting surface, and an insulating layer arranged so as to be in contact with the insulating layer.
  • ⁇ 8A> Lamination of the circuit sheet according to any one of ⁇ 1A> to ⁇ 6A>, an insulating layer arranged on the surface opposite to the element mounting surface, and a heat radiating member arranged in this order.
  • a method for manufacturing a circuit board which comprises a step of pressurizing a body in the thickness direction.
  • ⁇ 1B> An insulation composed of a conductor and having a first surface and a second surface located on the opposite side of the first surface and an insulation arranged so as to be in contact with the second surface of the circuit.
  • a layer and a heat radiating member arranged so as to be in contact with the insulating layer are provided in this order in the thickness direction.
  • a circuit board having a region in which the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface do not overlap in a plan view from the circuit side.
  • ⁇ 2B> The circuit board according to ⁇ 1B>, wherein the thickness of the circuit is more than 120 ⁇ m.
  • ⁇ 3B> The circuit board according to ⁇ 1B> or ⁇ 2B>, wherein the heat radiating member has a thickness of more than 120 ⁇ m.
  • ⁇ 4B> Any one of ⁇ 1B> to ⁇ 3B> in which the ratio of the thickness of the circuit to the thickness of the heat radiating member (circuit thickness / average thickness of the heat radiating member) is 0.2 to 25.
  • ⁇ 5B> The circuit board according to ⁇ 4B>, wherein the ratio of the thickness of the circuit to the thickness of the heat radiating member is 1 to 25.
  • ⁇ 6B> The circuit board according to any one of ⁇ 1B> to ⁇ 5B>, wherein the partial discharge start voltage of the insulating layer is 1.0 kV or more.
  • ⁇ 7B> The circuit board according to any one of ⁇ 1B> to ⁇ 6B>, wherein the dielectric breakdown voltage between the heat radiating member and the circuit is 1.5 kV or more.
  • ⁇ 8B> In a plan view from the circuit side, the entire outer peripheral edge portion of the first surface does not overlap with the outer peripheral edge portion of the second surface to any one of ⁇ 1B> to ⁇ 7B>. The circuit board described.
  • ⁇ 9B> The circuit board according to ⁇ 8B>, wherein the shortest distance between the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface is 0.01 mm or more and less than 1.0 mm.
  • ⁇ 10B> The circuit board according to any one of ⁇ 1B> to ⁇ 9B>, wherein the area of the surface of the heat radiating member on the insulating layer side is larger than the area of the second surface of the circuit.
  • ⁇ 11B> Provided in at least one of a circuit composed of a conductor and having a first surface and a second surface located on the opposite side of the first surface, a space between the circuits, and the periphery of the circuit.
  • the laminated body in which the circuit sheet according to ⁇ 11B>, the insulating layer arranged so as to be in contact with the second surface, and the heat radiating member are arranged in this order in the thickness direction is arranged in the thickness direction.
  • ⁇ 13B> A method for manufacturing a circuit board for manufacturing the circuit board according to any one of ⁇ 1B> to ⁇ 10B>.
  • the circuit, the insulating layer arranged so as to be in contact with the second surface of the circuit, and the heat radiating member arranged so as to be in contact with the insulating layer are laminated in this order in the thickness direction.
  • a method for manufacturing a circuit board which comprises a step of pressurizing a body in the thickness direction.
  • ⁇ 1C> In all combinations of two or more circuits made of conductors, which are independent of each other and adjacent to each other, the circuits are independent of each other when viewed from the element mounting surface of the circuit.
  • ⁇ 2C> The circuit sheet according to ⁇ 1C>, wherein the highly elastic member is the circuit.
  • ⁇ 3C> The circuit sheet according to ⁇ 1C> or ⁇ 2C>, further comprising an insulating portion provided at least a part between the two or more circuits.
  • ⁇ 4C> The circuit sheet according to ⁇ 3C>, wherein the insulating portion is provided so that the element mounting surface of the circuit and the surface opposite to the element mounting surface are exposed.
  • ⁇ 5C> The circuit sheet according to ⁇ 3C> or ⁇ 4C>, wherein the thickness of the insulating portion with respect to the thickness of the circuit is 0.9 or more.
  • ⁇ 6C> The method according to any one of ⁇ 1C> to ⁇ 5C>, which is arranged on the surface opposite to the element mounting surface of the circuit and further includes an insulating layer that holds the relative arrangement of the two or more circuits. Circuit sheet.
  • ⁇ 7C> The circuit sheet according to any one of ⁇ 1C> to ⁇ 5C>, the insulating layer arranged so as to be in contact with the surface opposite to the element mounting surface of the circuit sheet, and the insulating layer so as to be in contact with the insulating layer.
  • ⁇ 9C> The circuit sheet according to any one of ⁇ 1C> to ⁇ 5C>, the insulating layer arranged on the surface opposite to the element mounting surface of the circuit sheet, and the heat radiating member are arranged in this order.
  • a method of manufacturing a circuit board which comprises a step of pressurizing in a direction.
  • a circuit sheet comprising a circuit and an insulating portion provided in a space between the circuits, and the insulating portion is recessed on an element mounting surface.
  • the circuit is provided between the plurality of circuits so that at least a part of the element mounting surface on which the element is mounted and at least a part of the surface opposite to the element mounting surface are exposed. It has an insulating part that holds the relative positions of a plurality of circuits, and has.
  • a circuit sheet in which the surface of the insulating portion on the element mounting surface side is recessed with respect to the element mounting surface of the circuit.
  • ⁇ 3D> The circuit sheet according to ⁇ 1D> or ⁇ 2D>, wherein the surface opposite to the element mounting surface is flatter than the element mounting surface.
  • ⁇ 4D> The circuit sheet according to any one of ⁇ 1D> to ⁇ 3D>, wherein the surface opposite to the element mounting surface is a surface on which an insulating layer and a heat radiating member are arranged.
  • ⁇ 5D> The circuit sheet according to any one of ⁇ 1D> to ⁇ 4D>, which has a portion where the circuit and the insulating portion overlap in the thickness direction on a surface opposite to the element mounting surface.
  • ⁇ 6D> A step of filling an insulating material between the circuits with a protective film attached to one surface of the sheet-shaped circuit and a step of curing the insulating material are provided in this order.
  • the step of filling the insulating material and the step of curing the insulating material do not deform on the surface of the circuit opposite to the surface to which the protective film is attached due to volume shrinkage due to the curing of the insulating material.
  • the method for manufacturing a circuit sheet according to ⁇ 6D> which is performed in a state where the members are in contact with each other.
  • ⁇ 8D> The circuit sheet according to ⁇ 6D> or ⁇ 7D>, wherein the cured product of the insulating material obtained in the step of curing the insulating material is in a recessed state on the surface of the circuit to which the protective film is attached. Manufacturing method. ⁇ 9D> The circuit sheet according to any one of ⁇ 1D> to ⁇ 5D>, the insulating layer arranged so as to be in contact with the surface opposite to the element mounting surface of the circuit sheet, and the insulating layer so as to be in contact with the insulating layer.
  • the circuit sheet according to any one of ⁇ 1D> to ⁇ 5D>, the insulating layer arranged on the surface opposite to the element mounting surface of the circuit sheet, and the heat radiating member are arranged in this order. It has a step of pressurizing the laminated body in the state, A method for manufacturing a circuit board, wherein the pressurization is performed in a state where a cushion material deformable by the pressurization is arranged on an element mounting surface of the circuit sheet.
  • ⁇ 1E> A circuit and an insulating portion provided between the circuits are provided, and the surface roughness A of at least a part of the surface of the circuit in contact with the insulating portion is the surface roughness B of the element mounting surface of the circuit. Larger, circuit sheet. ⁇ 2E> Of the surfaces in contact with the insulating portion of the circuit, the surface roughness A of at least the portion connected to the surface opposite to the element mounting surface of the circuit is larger than the surface roughness B of the element mounting surface of the circuit.
  • ⁇ 3E> The circuit sheet according to ⁇ 1E> or ⁇ 2E>, wherein the surface roughness C of the surface opposite to the element mounting surface of the circuit is larger than the surface roughness B of the element mounting surface of the circuit.
  • ⁇ 4E> The circuit sheet according to any one of ⁇ 1E> to ⁇ 3E>, further comprising an insulating layer provided on a surface opposite to the element mounting surface of the circuit.
  • ⁇ 5E> The circuit sheet according to ⁇ 4E>, wherein the insulating portion and the insulating layer are different members.
  • ⁇ 6E> The circuit sheet according to ⁇ 4E>, wherein the insulating portion and the insulating layer are the same member.
  • ⁇ 7E> The circuit sheet according to any one of ⁇ 1E> to ⁇ 6E>, wherein the element mounting surface of the circuit is coated with a plated metal.
  • the surface roughness A expressed by the arithmetic mean roughness Ra is 0.3 ⁇ m or more, and the surface roughness B expressed by the arithmetic average roughness Ra is less than 0.3 ⁇ m, ⁇ 1E>.
  • ⁇ 9E> The circuit sheet according to any one of ⁇ 1E> to ⁇ 8E>, wherein the surface roughness A expressed by the arithmetic mean roughness Ra is 0.6 ⁇ m or more.
  • ⁇ 10E> A step of roughening the surface of the circuit with a protective member attached to one surface of the sheet-shaped circuit and a step of forming an insulating portion between the circuits are included in this order.
  • ⁇ 11E> The circuit sheet according to ⁇ 10E>, wherein the roughening is performed on a portion of the circuit in contact with the insulating portion and a surface of the circuit opposite to the surface to which the protective member is attached. Production method.
  • ⁇ 12E> The method for manufacturing a circuit sheet according to ⁇ 10E> or ⁇ 11E>, further comprising a step of arranging an insulating layer on a surface opposite to the surface to which the protective member of the circuit is attached.
  • ⁇ 13E> The method for manufacturing a circuit sheet according to ⁇ 12E>, wherein the step of arranging the insulating layer is performed after the step of forming the insulating portion.
  • ⁇ 14E> The method for manufacturing a circuit sheet according to ⁇ 12E>, wherein the step of arranging the insulating layer is performed at the same time as the step of forming the insulating portion.
  • ⁇ 15E> A circuit board having the circuit sheet according to any one of ⁇ 1E> to ⁇ 9E> and a heat radiating member arranged on a surface opposite to the element mounting surface of the circuit sheet.
  • ⁇ 16E> A laminated body in which the circuit sheet according to any one of ⁇ 1E> to ⁇ 9E> and the heat radiating member arranged on the surface opposite to the element mounting surface of the circuit sheet are arranged in this order.
  • a method of manufacturing a circuit board which comprises a step of pressurizing.
  • a circuit sheet with a case including a circuit sheet including a circuit and an insulating portion provided between the circuits, and a case arranged on a heating element mounting surface of the circuit sheet.
  • a plurality of circuits are provided, and the insulating portion is provided between the plurality of circuits. In the circuit, at least a part of a heating element mounting surface on which a heating element is mounted and the heating element mounting surface.
  • the circuit sheet with a case according to ⁇ 1F> or ⁇ 2F> which holds the relative positions of the plurality of circuits so that at least a part of the surface opposite to the one is exposed.
  • ⁇ 5F> A circuit board having the circuit package according to ⁇ 4F>, an insulating layer and a heat radiating member arranged on the side opposite to the heating element mounting surface of the circuit sheet.
  • ⁇ 6F> The circuit board according to ⁇ 5F>, wherein one surface of the circuit is in contact with the heating element and the other surface is in contact with the insulating layer.
  • ⁇ 7F> The step of forming a sealing portion in the portion of the circuit sheet with a case described in any one of ⁇ 1F> to ⁇ 3F> surrounded by the case.
  • a method for manufacturing a circuit board comprising a step of arranging an insulating layer and a heat radiating member on the surface opposite to the heating element mounting surface of the circuit sheet with a case.
  • ⁇ 8F> A method for manufacturing a circuit board, which includes the following steps (1) to (4). However, step (2) is performed before step (3) and step (4), and step (1) is performed before step (3).
  • Step of installing the case on the heating element mounting surface of the circuit sheet (2) Step of mounting the heating element on the circuit of the circuit sheet (3) Surrounded by the case on the heating element mounting surface of the circuit sheet Step of forming a sealing part in the portion (4) Step of arranging an insulating layer and a heat radiating member on the surface opposite to the heating element mounting surface of the circuit sheet.
  • a circuit board having a circuit, an insulating layer, and a base substrate having a surface larger than the element mounting surface of the circuit and having a surface on which the circuit is arranged via the insulating layer in this order. It is a manufacturing method of the circuit board to be manufactured. A laminate in which the circuit, the insulating layer, and the base substrate are arranged in this order is prepared, and a spacer member having substantially the same thickness as the total thickness of the circuit and the insulating layer is provided on the side surface of the circuit and the insulating layer.
  • a method for manufacturing a circuit board which comprises a step of pressurizing the laminate in a state of being arranged on the base substrate so as to be in contact with at least a part of the periphery of the circuit board.
  • ⁇ 2G> A method for manufacturing a circuit board that manufactures a circuit board having a circuit, an insulating layer, and a base board in this order.
  • a laminate in which the circuit, the insulating layer, and the base substrate are arranged in this order is prepared, and a spacer member having substantially the same thickness as the total thickness of the circuit, the insulating layer, and the base substrate is provided in the laminate.
  • a method for manufacturing a circuit board which comprises a step of pressurizing the laminated body in a state of being arranged on the same plane as the laminated body so as to be in contact with at least a part of the periphery of a side surface.
  • the method for manufacturing a circuit board according to ⁇ 1G> further comprising a step of aligning the circuit and the insulating layer on the base substrate using the spacer member before pressurizing the laminate.
  • ⁇ 4G> The circuit according to ⁇ 1G> or ⁇ 3G>, wherein in the pressurizing step, the spacer member is in contact with at least two regions around the spacer and is arranged so as to sandwich the circuit and the insulating layer. Substrate manufacturing method.
  • ⁇ 5G> The method for manufacturing a circuit board according to ⁇ 2G>, wherein in the pressurizing step, the spacer member is in contact with at least two regions around the spacer and is arranged so as to sandwich the laminate.
  • ⁇ 6G> Described in any one of ⁇ 1G> to ⁇ 5G>, wherein the thickness of the spacer member is equal to or less than the total thickness, and the difference between the thickness of the spacer member and the total thickness is 0 ⁇ m to 250 ⁇ m.
  • ⁇ 7G> The circuit has a circuit portion and a space other than the circuit portion, and an insulating portion is provided in at least a part of the space before being arranged on the insulating layer and the base substrate.
  • ⁇ 1H> The circuit, the insulating layer, and the heat radiating member are laminated in this order.
  • the average thickness of the circuit is 500 ⁇ m or more.
  • ⁇ 2H> The circuit board according to ⁇ 1H>, wherein the average thickness of the insulating layer exceeds 200 ⁇ m.
  • ⁇ 3H> The circuit board according to ⁇ 1H> or ⁇ 2H>, wherein the heat dissipation member has an average thickness of 100 ⁇ m or more.
  • ⁇ 4H> The circuit board according to any one of ⁇ 1H> to ⁇ 3H>, wherein the thermal conductivity of the insulating layer is 6 W / (m ⁇ K) or more.
  • ⁇ 5H> The circuit board according to any one of ⁇ 1H> to ⁇ 4H>, wherein the glass transition temperature of the insulating resin layer is 170 ° C. or higher.
  • ⁇ 6H> The circuit board according to any one of ⁇ 1H> to ⁇ 5H>, wherein the total average thickness of the circuit and the heat radiating member is 600 ⁇ m or more.
  • ⁇ 7H> The circuit according to any one of ⁇ 1H> to ⁇ 6H>, wherein the ratio of the average thickness of the circuit to the average thickness of the heat radiating member (circuit / heat radiating member) is 1.0 to 30. substrate.
  • ⁇ 8H> The circuit board according to any one of ⁇ 1H> to ⁇ 7H>, wherein the surface roughness (Ra) of the circuit on the side facing the insulating resin layer is 0.5 ⁇ m or more.
  • ⁇ 9H> The circuit board according to any one of ⁇ 1H> to ⁇ 8H>, wherein the surface roughness (Ra) of the circuit on the side opposite to the side facing the insulating resin layer is less than 0.2 ⁇ m.
  • ⁇ 10H> The circuit board according to any one of ⁇ 1H> to ⁇ 9H>, wherein the surface roughness (Ra) of the heat radiating member on the side facing the insulating resin layer is 0.5 ⁇ m or more.
  • ⁇ 11H> The circuit board according to any one of ⁇ 1H> to ⁇ 10H>, wherein the surface roughness (Ra) of the heat radiating member on the side opposite to the side facing the insulating resin layer is less than 0.2 ⁇ m. .. ⁇ 12H>
  • Ra surface roughness of the heat radiating member on the side opposite to the side facing the insulating resin layer
  • ⁇ 12H> One of ⁇ 1H> to ⁇ 11H> in which the surface area of the circuit opposite to the side facing the insulating resin layer is larger than the surface area of the circuit facing the insulating resin layer.
  • the circuit board described. ⁇ 13H> The circuit board according to any one of ⁇ 1H> to ⁇ 12H>, wherein the coefficient of thermal expansion of the circuit and the coefficient of thermal expansion of the heat radiating member are different.
  • ⁇ 14H> The circuit board according to any one of ⁇ 1H> to ⁇ 12H>, wherein the coefficient of thermal expansion of the circuit and the coefficient of thermal expansion of the heat radiating member are the same.
  • ⁇ 15H> The circuit board according to any one of ⁇ 1H> to ⁇ 14H>, wherein the breaking voltage between the circuit and the heat radiating member is 2.5 kV or more.
  • ⁇ 16H> The circuit board according to any one of ⁇ 1H> to ⁇ 15H>, wherein the partial discharge start voltage between the circuit and the heat radiating member is 2.5 kV or more.
  • ⁇ 17H> A semiconductor device including the circuit board according to any one of ⁇ 1H> to ⁇ 16H> and a semiconductor element.
  • the circuit is provided between the plurality of circuits so that at least a part of the element mounting surface on which the element is mounted and at least a part of the surface opposite to the element mounting surface are exposed. It has an insulating part that holds the relative positions of a plurality of circuits, and has.
  • ⁇ 2I> The circuit sheet according to ⁇ 1I>, wherein the maximum value of the distance between the surface of the insulating portion and the surface of the circuit opposite to the element mounting surface is 20 ⁇ m or less.
  • ⁇ 3I> Arranged so as to be in contact with the circuit sheet according to ⁇ 1I> or ⁇ 2I>, the surface of the insulating portion on the side opposite to the element mounting surface, and the surface of the circuit opposite to the element mounting surface.
  • a circuit board having an insulating layer to be formed and a heat radiating member arranged so as to be in contact with the insulating layer.
  • ⁇ 4I> Pressurize the laminated body in which the circuit sheet according to any one of ⁇ 1I> to ⁇ 3I>, the insulating layer arranged on the connection surface side, and the heat radiating member are arranged in this order.
  • ⁇ 1J> With multiple circuits The plurality of circuits are provided between the plurality of circuits so that at least a part of the heating element mounting surface and at least a part of the surface opposite to the heating element mounting surface are exposed in the circuit. Has an insulating part that holds the relative position of A circuit sheet in which the height variation of the surface opposite to the heating element mounting surface in the circuit is 40 ⁇ m or less per 10 mm in the plane direction.
  • ⁇ 2J> An insulating layer arranged so as to be in contact with the circuit sheet according to ⁇ 1J>, the surface of the insulating portion on the side opposite to the element mounting surface, and the surface of the circuit opposite to the element mounting surface.
  • ⁇ 3K> A step of pressurizing a laminate in which the circuit sheet according to ⁇ 1K> or ⁇ 2K>, the insulating layer arranged on the side opposite to the element mounting surface, and the heat radiating member are arranged in this order.
  • ⁇ 1L> With multiple circuits A holding portion provided on one surface side of the plurality of circuits for holding relative positions of the plurality of circuits, and a holding portion. A case provided on the holding portion and surrounding the plurality of circuits when viewed from one surface side of the circuit, and a case. Have, A circuit sheet with a case in which the other side of the plurality of circuits is exposed.
  • ⁇ 2L> The circuit sheet with a case according to ⁇ 1L>, wherein the holding portion is detachable from the plurality of circuits.
  • ⁇ 3L> The circuit sheet with a case according to ⁇ 2L>, wherein at least a part of one surface of the plurality of circuits is a heating element mounting surface on which a heating element is mounted.
  • ⁇ 4L> The circuit sheet with a case according to any one of ⁇ 1L> to ⁇ 3L>, the insulating layer arranged on the exposed other surface side of the circuit in the circuit sheet with a case, and the heat radiating member.
  • a method for manufacturing a circuit board which comprises a step of pressurizing a laminate in a state where the above are arranged in this order.
  • the holding portion can be separated from the plurality of circuits.
  • a circuit sheet having excellent reliability, a circuit board including the circuit sheet, and a method for manufacturing the same are provided.
  • FIG. 1A is a cross-sectional view taken along the line AA of FIG. 1A. It is an enlarged view of FIG. 1B. It is a schematic plan view of the specific example of the conventional circuit sheet when viewed from the element mounting surface.
  • FIG. 5 is a cross-sectional view taken along the line AA of FIG. 1D. It is sectional drawing which shows the schematic structure of the specific example 1 of the circuit board of this disclosure. It is a top view from the circuit side which shows the schematic structure of the specific example 1 of the circuit board of this disclosure. It is sectional drawing which shows the schematic structure of the specific example 2 of the circuit board of this disclosure.
  • circuit board 220 which is one Embodiment of the circuit board of this disclosure. It is a schematic block diagram of the circuit sheet of this disclosure. It is a schematic block diagram of the circuit sheet of this disclosure. It is a schematic block diagram of the circuit sheet of this disclosure. It is a schematic block diagram of the circuit sheet of this disclosure.
  • each component may contain a plurality of applicable substances.
  • the content or content of each component is the total content or content of the plurality of substances present in the composition unless otherwise specified. Means quantity.
  • the term "layer" is used not only when the area where the layer exists is observed, but also when it is formed only in a part of the area.
  • the term "laminated” means stacking layers or members, and two or more layers or members may be combined, or two or more layers or members may be removable.
  • the average thickness of the layer or member is a value given as an arithmetic mean value obtained by measuring the thickness of five points of the target layer or member. The thickness of the layer or member can be measured using a micrometer or the like.
  • inter-circuit includes a gap between a specific circuit and another circuit other than the specific circuit, and in one specific circuit.
  • the circuit sheet of the first embodiment of the present disclosure includes a circuit made of a conductor and an insulating portion provided in a space between the circuits, and the element mounting surface in the circuit is opposite to the element mounting surface.
  • the side surface between the surface and the surface has a step, and the step is covered with the insulating portion.
  • the side surface of the circuit has a step and the step is covered with an insulating portion
  • the area of the portion where the circuit and the insulating portion are in contact with each other becomes large, and the circuit and the insulating portion are separated from each other. Is less likely to occur. Therefore, in the circuit sheet of the present disclosure, when heat treatment of the circuit sheet, crimping in the process of manufacturing the circuit board, etc. are performed, peeling is unlikely to occur between the side surface of the circuit and the insulating portion, and the peeling portion is present. , Trapping of air bubbles and deterioration of insulation resistance are suppressed, and the reliability is excellent.
  • the insulation resistance of the circuit sheet deteriorates if air bubbles, voids, etc. are generated on or near the side surface of the circuit. , It is important to suppress the peeling from the insulating part. Even in such a case, the circuit sheet of the present disclosure can suitably suppress a decrease in insulation resistance and is excellent in reliability.
  • the circuit sheet When the circuit sheet is provided with a circuit having a large thickness, for example, a thick copper circuit, the circuit and the insulating portion are likely to be separated due to the weight of the circuit itself.
  • the circuit sheet of the present disclosure even when the thickness of the circuit is large, the area of the portion where the circuit and the insulating portion are in contact with each other is large, and the circuit and the insulating portion are unlikely to be separated from each other.
  • the circuit sheet of the present disclosure includes at least one circuit composed of conductors.
  • the material of the circuit is not particularly limited as long as it is a conductor, and examples thereof include metal.
  • the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity, the metal preferably contains copper.
  • the thickness of the circuit is not particularly limited and can be selected according to the application of the circuit sheet and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably 350 ⁇ m or more, and from the viewpoint of easily providing a step in the circuit, it is more preferably 400 ⁇ m or more. It is more preferably 500 ⁇ m or more from the viewpoint of easy holding, and particularly preferably 1000 ⁇ m or more from the viewpoint of securing a wide adhesive area between the circuit and the insulating portion and easily suppressing peeling. From the viewpoint of weight reduction and height reduction, the thickness of the circuit may be 5000 ⁇ m or less. It is preferably 3000 ⁇ m or less from the viewpoint that a step is easily provided in the circuit.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the thickness of the embedded part is also included in the thickness of the circuit.
  • the width of the circuit when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like.
  • the width of the circuit may be 100 ⁇ m to 100 mm.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the circuit can be obtained, for example, by processing a metal plate into a circuit state having a desired shape.
  • the processing method is not particularly limited, and can be performed by a known method such as punching, cutting, etching, and processing in which they are combined. It is preferable to form the circuit by cutting, etching, or the like from the viewpoint of improving the accuracy in circuit fabrication, the viewpoint that it is easy to process the step, and the like. Etching is more preferable from the viewpoint that the circuit is not easily deformed by machining stress when forming a step.
  • the etching method of the metal plate is not particularly limited. From the viewpoint of facilitating the production of the circuit sheet of the present disclosure, it is preferable to form the circuit by etching from both sides (that is, two main surfaces facing each other) of the metal plate. By processing from both sides, it is easy to form a step, and work efficiency is high. When etching from both sides of the metal plate, both sides may be etched at the same time, or both sides may be etched alternately.
  • the circuit may be roughened.
  • the surface in contact with the insulating layer is at least roughened, it is possible to obtain a state in which the circuit can be sufficiently adhered to the insulating layer while suppressing the generation of voids.
  • the adhesion due to the Van der Waals force can be improved by roughening the surface in contact with the insulating layer of the circuit to improve the pull-out force due to the anchor effect or increase the adhesion area.
  • the method of roughening the circuit is not particularly limited, and it may be performed by a physical method or a chemical method.
  • the physical method includes sanding, sandblasting, laser irradiation, milling and the like.
  • the chemical method include a magdamit treatment, a CZ treatment, a blackening treatment, an etching treatment, a plating treatment and the like.
  • the roughening treatment may be carried out by any one method or a combination of two or more. When two or more kinds are combined, the physical method and the chemical method may be combined, the chemical methods may be combined, or the physical methods may be combined.
  • the circuit sheet of the present disclosure includes an insulating portion provided in at least a part of the space between circuits.
  • the insulating material used for forming the insulating portion of the circuit sheet include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, and acrylic resin.
  • the resin contained in the insulating material may be one kind or two or more kinds.
  • the insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
  • the width of the insulating portion when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like.
  • the width of the insulating portion may be 100 ⁇ m to 100 mm.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the thickness of the insulating portion is not particularly limited and can be selected according to the application of the circuit sheet and the like.
  • the thickness of the insulating portion (thickness of the insulating portion / thickness of the circuit) with respect to the thickness of the circuit is preferably 0.5 or more from the viewpoint of ensuring sufficient insulating properties, and the insulating portion positions a plurality of circuits. From the viewpoint of preferably holding, 0.7 or more is more preferable, and from the viewpoint of reducing the pressure difference between the circuit and the insulating portion at the time of crimping in the process of manufacturing the circuit board, 0.9 or more is further preferable.
  • the thickness of the insulating portion / the thickness of the circuit is preferably 1.0 or less, more preferably 0.99 or less, from the viewpoint of workability of element mounting.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the circuit sheet of the present disclosure preferably has a surface in which a step on the side surface of the circuit is parallel to at least one of the element mounting surface and the surface opposite to the element mounting surface.
  • the width of the above-mentioned surface suppresses the separation between the circuit and the insulating portion. From the viewpoint of From the viewpoint, it is more preferably more than 500 ⁇ m.
  • the width of the above-mentioned surface is 5000 ⁇ m or less from the viewpoint of ensuring a balance between element mounting and heat dissipation in the case of a step in which the area of the surface opposite to the element mounting surface is smaller than the area of the element mounting surface.
  • the heat dissipation area can be secured by increasing the width as described above as much as possible.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above-mentioned value.
  • the circuit may have a region in which the cross-sectional shape of the circuit in the thickness direction of the circuit is a substantially convex shape, a substantially cross shape, a substantially T shape, or the like, and the thickness of the circuit. From the viewpoint of suppressing the shearing force generated at both ends in the direction, it is preferable to have a region having a substantially T-shape.
  • the cross section of the circuit may be a cross section in a direction parallel to the length direction of the circuit sheet. , The cross section may be parallel to the width direction of the circuit sheet.
  • the width of the cross section on the element mounting surface side may be larger, and the width of the cross section on the surface side opposite to the element mounting surface may be larger. It may be larger.
  • the width of the element mounting surface side and the surface side opposite to the element mounting surface whichever has the smaller cross-sectional width ( The ratio (width 2 / width 1) of the width (width 2) having a larger cross-sectional width to the width 1) is preferably 0.2 to less than 1, and preferably 0.5 to less than 1. More preferred.
  • the circuit sheet of the present disclosure preferably has a step on the outer circumference of the circuit, and more preferably on the entire outer circumference of the circuit.
  • a step may be provided on the inner circumference of the circuit, or may be provided on the entire inner circumference of the circuit. .. By providing the step on the entire inner circumference of the circuit, peeling on the side surface of the circuit can be suitably suppressed.
  • the insulating portion provided in the space inside the circuit is the space around the circuit. It is preferable to connect to the insulating portion provided in the above at two or more places. By connecting the insulating portion provided inside the circuit and the insulating portion provided outside the circuit at two or more points, the area of the portion where the circuit and the insulating portion are in contact with each other is preferably increased. Peeling between the circuit and the insulating portion is less likely to occur. In particular, the insulating portion provided inside the circuit is less likely to be separated from the circuit.
  • the portions where the circuit and the insulating portion are in contact with each other are opposed to each other among the two or more portions where the circuit and the insulating portion are in contact with each other.
  • the width of the insulating portion in the portion where the insulating portion provided inside the circuit and the insulating portion provided outside the circuit are connected is 500 ⁇ m or more from the viewpoint of suppressing separation between the circuit and the insulating portion. It is preferable, and it is more preferably 1000 ⁇ m or more from the viewpoint of easily securing the strength of the insulating portion in the above-mentioned connected portion.
  • the width of the insulating portion in the above-mentioned portion is preferably 5000 ⁇ m or less from the viewpoint of easily securing the heat dissipation area, the element mounting area, etc., and from the viewpoint of easily forming the insulating portion when the insulating portion is formed by transfer molding. It is more preferably 3000 ⁇ m or less.
  • the thickness of the insulating portion at the portion where the insulating portion provided inside the circuit and the insulating portion provided outside the circuit are connected is the separation between the circuit and the insulating portion with respect to the thickness of the insulating portion. It is preferably 10% or more from the viewpoint of suppressing the above, and more preferably 40% or more from the viewpoint of ensuring the strength of the insulating portion in the above-mentioned connected portion.
  • the thickness of the insulating portion in the above-mentioned portion is preferably 90% or less with respect to the thickness of the insulating portion from the viewpoint of ensuring the strength of the circuit, and is adhered to the above-mentioned connecting portion in the circuit.
  • the thickness of the insulating portion in the above-mentioned portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected locations may be used as the above-mentioned value.
  • the portion where the insulating portion provided inside the circuit and the insulating portion provided outside the circuit are connected may be provided on the element mounting surface side, and may be provided on the surface side opposite to the element mounting surface. It may have been.
  • the surface roughness of the side surface (hereinafter, also referred to as “surface roughness A”) is the surface roughness of the element mounting surface (hereinafter, also referred to as “surface roughness B”) and the element mounting surface. It is preferably larger than at least one of the surface roughness of the opposite surface (hereinafter, also referred to as “surface roughness C”), and more preferably larger than the surface roughness of the element mounting surface.
  • the surface roughness of the element mounting surface and the surface roughness of the surface opposite to the element mounting surface may be the same or different. From the viewpoint of suppressing peeling between the circuit and the insulating layer, the surface roughness of the surface opposite to the element mounting surface is preferably larger than the surface roughness of the element mounting surface of the circuit.
  • the surface roughness of the circuit may be expressed by the arithmetic mean roughness (Ra) defined by JIS B 0601 (2001).
  • the surface roughness A expressed in Ra is preferably 0.2 ⁇ m or more, and more preferably 0.5 ⁇ m or more from the viewpoint of stably ensuring the adhesive force between the circuit and the insulating portion. From the viewpoint of obtaining a strong adhesive force between the circuit and the insulating portion, it is more preferably 1.0 ⁇ m or more. From the viewpoint of avoiding local electric field concentration when a high voltage is applied, the surface roughness A expressed in Ra may be 10 ⁇ m or less.
  • the surface roughness B represented by Ra is preferably less than 0.4 ⁇ m, more preferably 0.3 ⁇ m or less, and further preferably 0.2 ⁇ m or less.
  • the surface roughness C when represented by Ra is preferably 0.2 ⁇ m or more, more preferably 0.5 ⁇ m or more, and further preferably 1.0 ⁇ m or more. From the viewpoint of avoiding local electric field concentration when a high voltage is applied, the surface roughness C expressed in Ra may be 10 ⁇ m or less.
  • the relative ratio of the surface roughness A and the surface roughness B when expressed in Ra is not particularly limited.
  • the surface roughness A may be more than 1 time to 100 times the surface roughness B.
  • FIG. 1D is a schematic plan view of a specific example of a conventional circuit sheet when viewed from the element mounting surface
  • FIG. 1E is a cross-sectional view taken along the line AA of FIG. 1D.
  • the circuit sheet 20 shown in FIGS. 1D and 1E includes a circuit 1 and an insulating portion 2 provided between the circuits 1.
  • the side surface of the circuit 1 between the element mounting surface and the surface opposite to the element mounting surface does not have a step. Therefore, heat treatment of the circuit sheet 20, crimping in the process of manufacturing the circuit board, and the like are likely to cause peeling between the side surface of the circuit 1 and the insulating portion 2, and air bubbles are trapped at the peeled portion.
  • the reliability of the circuit sheet 20 may be impaired due to a decrease in insulation resistance or the like.
  • FIG. 1A is a schematic plan view of a specific example of the circuit sheet of the present disclosure
  • FIG. 1B is a sectional view taken along line AA of FIG. 1A
  • FIG. 1C is an enlarged view of FIG. 1B.
  • the circuit sheet 10 shown in FIGS. 1A and 1B includes an insulating portion 2 provided between the circuit 1 and the circuit 1, and is located between the element mounting surface and the surface opposite to the element mounting surface in the circuit 1.
  • the side surface has a step 3. Therefore, the area of the portion where the circuit 1 and the insulating portion 2 are in contact with each other becomes large, and the circuit 1 and the insulating portion 2 are less likely to be separated from each other.
  • the circuit sheet 10 is excellent in reliability because it is suppressed from being damaged or the insulation resistance is lowered.
  • the step 3 is provided on the entire inner circumference of the circuit 1 and the entire outer circumference of the circuit 1.
  • the insulating portion 2 provided in the space inside the circuit 1 in the direction parallel to the element mounting surface and orthogonal to the line AA is an insulating portion provided in the space around the circuit 1. It is connected at 2 and 2 places.
  • the step 3 has a surface 3A parallel to the element mounting surface and the surface opposite to the element mounting surface.
  • the method for manufacturing the circuit sheet of the present disclosure is not particularly limited.
  • the method for manufacturing the circuit sheet of the present disclosure includes, for example, a step of filling a space formed by the circuit, which is arranged on a temporary base material, with an insulating material, and is necessary when the insulating material is a resin or the like. Accordingly, it may have a step of curing the filled insulating material.
  • Examples of the space formed by the circuits include spaces between circuits.
  • the circuit may be formed on the temporary substrate by arranging the metal on the temporary substrate and then performing etching, and etching from both sides of the metal plate (that is, two facing main surfaces). It is preferable to form a circuit by etching.
  • the temporary base material can temporarily fix the circuit before filling the space formed by the circuit arranged on the temporary base material with the insulating material, and can be removed from the circuit after filling with the insulating material.
  • the fact that the circuit is temporarily fixed means that the circuit maintains a relative positional relationship due to contact with the temporary base material, and does not necessarily mean that the circuit does not move completely. ..
  • Examples of the temporary base material include a resin film and the like.
  • Examples of the resin film that can be used as the temporary base material include a resin film having a support film and an adhesive layer formed on the support film.
  • the circuit board of the first embodiment of the present disclosure includes the circuit sheet of the first embodiment of the present disclosure described above, an insulating layer arranged so as to be in contact with a surface opposite to the element mounting surface of the circuit sheet, and the insulation. A heat radiating member arranged so as to be in contact with the layer is provided in this order.
  • the circuit sheet of the present disclosure can reduce the situation where a uniform pressure is not applied to the insulating layer because the circuit is peeled off from the insulating portion and tilted, or a gap is generated between the circuit and the insulating portion. ..
  • the thickness of the insulating layer of the manufactured circuit board is excellent in uniformity. As a result, the circuit board of the present disclosure tends to have high adhesive reliability and excellent heat dissipation, insulation and the like.
  • the types of the insulating layer and the heat radiating member used for the circuit board are not particularly limited, and can be selected from those generally used for the circuit board.
  • the preferred form of the insulating material used for forming the insulating layer may be the same as the preferred form of the insulating material used for forming the insulating portion.
  • the material of the heat radiating member is not particularly limited, and examples thereof include copper, aluminum, tungsten copper, copper alloys such as molybdenum copper, and nickel-plated copper.
  • the type of the heat radiating member is not particularly limited, and may be a member having a heat radiating function such as a heat spreader or a heat sink, a case having an air or water flow path, a metal foil, a filler resin composite, or the like.
  • the surface of the heat radiating member may be smooth, and may be roughened to improve the adhesiveness with the insulating layer.
  • the thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board. From the viewpoint of ensuring sufficient insulating properties, the thickness of the insulating layer is preferably 50 ⁇ m or more, and more preferably 100 ⁇ m or more from the viewpoint of unevenness followability when the circuit sheet has irregularities. From the viewpoint of absorbing the shearing force due to pressure, it is more preferably 150 ⁇ m or more.
  • the thickness of the insulating layer is preferably 400 ⁇ m or less, and from the viewpoint of less likely to generate shearing force due to pressure, it is more preferably 300 ⁇ m or less, and more preferably 250 ⁇ m or less. Is even more preferable.
  • the method for manufacturing the circuit board of the first embodiment of the present disclosure includes the circuit sheet of the first embodiment of the present disclosure described above, an insulating layer arranged on a surface opposite to the element mounting surface of the circuit sheet, and a heat radiating member. And, there is a step of pressurizing the laminated body in the state which arranged in this order in the thickness direction.
  • the method of pressurizing the laminate in the above method is not particularly limited, and can be selected from the methods generally performed in the circuit board manufacturing process.
  • the circuit board of the second embodiment of the present disclosure comprises a circuit composed of a conductor and having a first surface and a second surface located on a side opposite to the first surface, and the second surface of the circuit.
  • An insulating layer arranged so as to be in contact with a surface and a heat radiating member arranged so as to be in contact with the insulating layer are provided in this order in the thickness direction, and the first surface is viewed from the circuit side in a plan view. There is a region where the outer peripheral edge portion of the second surface and the outer peripheral edge portion of the second surface do not overlap.
  • the circuit board of the present disclosure has a region in which the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface do not overlap in a plan view from the circuit side.
  • the circuit board of the present disclosure is excellent in reliability.
  • the insulation resistance of the circuit board deteriorates if air bubbles, voids, etc. are generated in the outer peripheral edge of the circuit. It is important to suppress the peeling between the and the insulating layer. Even in such a case, the circuit board of the present disclosure can suitably suppress a decrease in insulation resistance and is excellent in reliability.
  • the first surface of the circuit When the first surface of the circuit is pressurized and the pressure on the second surface at the outer edge of the first surface of the circuit is distributed, it goes to the outer edge of the first surface of the circuit. Since the concentration of pressure is suppressed, the deformation of the circuit is suppressed in the vicinity of the outer peripheral edge portion of the first surface, and the damage of the insulating layer is also suppressed.
  • the circuit board when the circuit board includes a circuit having a large thickness, for example, a thick copper circuit, the springback force at the outer peripheral edge of the circuit when the pressurization of the circuit board is released is large, and the springback causes the outer peripheral edge of the circuit. Peeling is likely to occur between the portion and the insulating layer.
  • the circuit board of the present disclosure even when the thickness of the circuit is large, the springback force is suppressed, so that the circuit and the insulating layer are less likely to be separated, and the circuit board is excellent in reliability. ..
  • the circuit board of the present disclosure may be a circuit board in which a circuit, an insulating layer, and a heat radiating member are crimped in the thickness direction.
  • the circuit board of the present disclosure comprises a circuit composed of a conductor and having a first surface and a second surface located on the opposite side of the first surface.
  • the material of the circuit is not particularly limited as long as it is a conductor, and examples thereof include metal.
  • the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity, the metal preferably contains copper.
  • the circuit board may include a plurality of circuits.
  • the thickness of the circuit is not particularly limited and can be selected according to the application of the circuit board and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably more than 120 ⁇ m, more preferably more than 450 ⁇ m, further preferably 700 ⁇ m or more, and particularly preferably 1000 ⁇ m or more. From the viewpoint of weight reduction and height reduction, the thickness of the circuit may be 5000 ⁇ m or less, or 3000 ⁇ m or less. When the thickness of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value. When a part of the circuit is embedded in the insulating layer or the like, the thickness of the embedded part is also included in the thickness of the circuit.
  • the width of the circuit when observing the first surface of the circuit is not particularly limited, and may be selected according to the application of the circuit board and the like.
  • the width of the circuit may be 100 ⁇ m to 100 mm.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the first surface of the circuit may be an element mounting surface on which the element is mounted.
  • the circuit can be obtained, for example, by processing a metal plate into a circuit state having a desired shape.
  • the processing method is not particularly limited, and can be performed by a known method such as punching, cutting, etching, and processing in which they are combined.
  • the circuit When the circuit is manufactured by etching, the circuit may be formed by etching from both sides (that is, two main surfaces facing each other) of the metal plate. When etching from both sides of the metal plate, both sides may be etched at the same time, or both sides may be etched alternately.
  • the circuit may be roughened.
  • a circuit comes into contact with an insulating layer, which will be described later, during the manufacturing process of a circuit board, if the surface in contact with the insulating layer is at least roughened, it is in a state where it can be sufficiently adhered to the insulating layer while suppressing the generation of voids. be able to.
  • the adhesion due to the Van der Waals force can be improved by roughening the surface in contact with the insulating layer of the circuit to improve the pull-out force due to the anchor effect or increase the adhesion area.
  • the method of roughening the circuit is not particularly limited, and it may be performed by a physical method or a chemical method.
  • the physical method includes sanding, sandblasting, laser irradiation, milling and the like.
  • the chemical method include a magdamit treatment, a CZ treatment, a blackening treatment, an etching treatment, a plating treatment and the like.
  • the roughening treatment may be carried out by any one method or a combination of two or more. When two or more kinds are combined, the physical method and the chemical method may be combined, the chemical methods may be combined, or the physical methods may be combined.
  • the circuit board of the present disclosure may be provided with an insulating portion in at least one of the space between the circuits and the periphery of the circuit, and when a plurality of circuits are present, the insulating portion may be provided between the plurality of circuits. good.
  • the insulating material used for forming the insulating portion include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, and acrylic resin.
  • the resin contained in the insulating material may be one kind or two or more kinds.
  • the insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
  • the width of the insulating portion when observing the first surface of the circuit is not particularly limited, and may be selected according to the application of the circuit board and the like.
  • the width of the insulating portion may be 100 ⁇ m to 100 mm.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the thickness of the insulating portion is not particularly limited and can be selected according to the application of the circuit board and the like.
  • the thickness of the insulating portion (thickness of the insulating portion / thickness of the circuit) with respect to the thickness of the circuit is preferably 0.5 or more from the viewpoint of ensuring sufficient insulating properties, and the insulating portion positions a plurality of circuits. From the viewpoint of preferably holding, 0.7 or more is more preferable, and from the viewpoint of reducing the pressure difference between the circuit and the insulating portion at the time of crimping in the process of manufacturing the circuit board, 0.9 or more is further preferable.
  • the thickness of the insulating portion / the thickness of the circuit is preferably 1.0 or less, more preferably 0.99 or less, from the viewpoint of workability of element mounting.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the thickness of the circuit is larger than the thickness of the insulating portion, that is, when the thickness of the insulating portion / the thickness of the circuit is less than 1, the thickness of the circuit is equal to the thickness of the insulating portion.
  • the first surface of the circuit is pressurized, the pressure on the second surface at the outer peripheral edge of the first surface tends to be concentrated. Therefore, when pressurization is performed in the process of manufacturing the circuit board, when springback occurs, peeling is likely to occur between the side surface of the circuit and the insulating portion, and as a result, the insulation resistance of the circuit board is lowered. There is a risk that the circuit and the insulating part may be misaligned in the thickness direction of the circuit board.
  • the side surface of the circuit refers to a surface other than the first surface and the second surface of the circuit.
  • the circuit board of the present disclosure when the first surface of the circuit is pressurized, the pressure on the second surface at the outer peripheral edge of the first surface is dispersed, so that the circuit board is manufactured. Peeling is unlikely to occur between the side surface of the circuit and the insulating portion when pressurization is performed in the process or when springback occurs. Therefore, it is possible to suppress a decrease in insulation resistance due to peeling between the side surface of the circuit and the insulating portion, and a positional deviation between the circuit and the insulating portion in the thickness direction of the circuit board.
  • connection point between the side surface of the circuit and the first surface or the second surface may be angular or rounded.
  • the side surface of the circuit may be parallel to the thickness direction of the circuit board, or may be inclined so as to intersect the thickness direction of the circuit board.
  • the circuit board of the present disclosure it is sufficient that there is a region in which the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface do not overlap in a plan view from the circuit side.
  • the ratio of the region where the outer peripheral edge portion of the second surface overlaps with respect to the entire outer peripheral edge portion of the first surface is preferably 0% to 50%, that is, 0%, that is, the circuit side. It is more preferable that the entire outer peripheral edge portion of the first surface does not overlap with the outer peripheral edge portion of the second surface in a plan view from the above.
  • the shortest distance between the outer peripheral edge of the first surface and the outer peripheral edge of the second surface is It is preferably 0.01 mm or more and less than 1.0 mm, more preferably 0.02 mm to 0.5 mm, effectively suppresses springback, and reduces the amount of change even when springback occurs. From the viewpoint, it is more preferably 0.03 mm or more and less than 0.5 mm.
  • the surface roughness of the side surface (hereinafter, also referred to as “surface roughness A”) becomes the element mounting surface. It may be larger than at least one of the surface roughness of the first surface (hereinafter, also referred to as “surface roughness B”) and the surface roughness of the second surface (hereinafter, also referred to as “surface roughness C”). It is preferably larger than the surface roughness of the first surface.
  • the surface roughness of the first surface and the surface roughness of the second surface may be the same or different. From the viewpoint of suppressing peeling between the circuit and the insulating layer, the surface roughness of the second surface is preferably larger than the surface roughness of the first surface.
  • the surface roughness of the circuit may be expressed by the arithmetic mean roughness (Ra) defined by JIS B 0601 (2001).
  • the surface roughness A when expressed in Ra is preferably 0.2 ⁇ m or more, and is 0 from the viewpoint of stably ensuring the adhesive force between the side surface of the circuit and the insulating portion when the insulating portion is present. It is more preferably 0.4 ⁇ m or more, and further preferably 0.6 ⁇ m or more from the viewpoint of obtaining a strong adhesive force between the side surface of the circuit and the insulating portion when the insulating portion is present. From the viewpoint of avoiding local electric field concentration when a high voltage is applied, the surface roughness A expressed in Ra may be 10 ⁇ m or less.
  • the surface roughness B represented by Ra is preferably less than 0.4 ⁇ m, more preferably 0.3 ⁇ m or less, and further preferably 0.2 ⁇ m or less.
  • the surface roughness C when represented by Ra is preferably 0.2 ⁇ m or more, more preferably 0.4 ⁇ m or more, and further preferably 0.6 ⁇ m or more. From the viewpoint of avoiding local electric field concentration when a high voltage is applied, the surface roughness C expressed in Ra may be 10 ⁇ m or less.
  • the relative ratio of the surface roughness A and the surface roughness B when expressed in Ra is not particularly limited.
  • the surface roughness A may be more than 1 time to 100 times the surface roughness B.
  • the circuit board of the present disclosure is insulated from a circuit, a circuit sheet having an insulating portion in a space between the circuits and at least one of the periphery of the circuit, and an insulating layer arranged so as to be in contact with a second surface of the circuit.
  • a heat radiating member arranged so as to be in contact with the layer may be provided in this order in the thickness direction.
  • the method of manufacturing the circuit sheet is not particularly limited.
  • the method for manufacturing a circuit sheet includes, for example, a step of filling a space formed by the circuit, which is arranged on a temporary base material, with an insulating material, and when the insulating material is a resin or the like, if necessary, It may have a step of curing the filled insulating material.
  • Examples of the space formed by the circuits include spaces between circuits.
  • the circuit may be formed on the temporary substrate by arranging the metal on the temporary substrate and then performing etching, and etching from both sides of the metal plate (that is, two facing main surfaces). It is preferable to form a circuit by etching.
  • the temporary base material can temporarily fix the circuit before filling the space formed by the circuit arranged on the temporary base material with the insulating material, and can be removed from the circuit after filling with the insulating material.
  • the fact that the circuit is temporarily fixed means that the circuit maintains a relative positional relationship due to contact with the temporary base material, and does not necessarily mean that the circuit does not move completely. ..
  • Examples of the temporary base material include a resin film and the like.
  • Examples of the resin film that can be used as the temporary base material include a resin film having a support film and an adhesive layer formed on the support film.
  • the circuit board of the present disclosure includes an insulating layer arranged so as to be in contact with the second surface of the circuit.
  • the type of the insulating layer used for the circuit board is not particularly limited, and can be selected from those generally used for the circuit board.
  • the preferred form of the insulating material used for forming the insulating layer may be the same as the preferred form of the insulating material used for forming the insulating portion.
  • the thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board. From the viewpoint of ensuring sufficient insulation, the thickness of the insulating layer is preferably 50 ⁇ m or more, and when there are irregularities in the circuit, insulating portion, etc., it is 100 ⁇ m or more from the viewpoint of unevenness followability. More preferably, it is 150 ⁇ m or more from the viewpoint of absorbing the shearing force due to pressure.
  • the thickness of the insulating layer is preferably 400 ⁇ m or less, and from the viewpoint of less likely to generate shearing force due to pressure, it is more preferably 300 ⁇ m or less, and more preferably 250 ⁇ m or less. Is even more preferable.
  • the circuit board of the present disclosure includes a heat radiating member arranged so as to be in contact with the insulating layer.
  • the type of heat radiating member used for the circuit board is not particularly limited, and can be selected from those generally used for the circuit board.
  • the material of the heat radiating member is not particularly limited, and examples thereof include copper, aluminum, tungsten copper, copper alloys such as molybdenum copper, and nickel-plated copper.
  • the type of the heat radiating member is not particularly limited, and may be a member having a heat radiating function such as a heat spreader or a heat sink, a case having an air or water flow path, a metal foil, a filler resin composite, or the like.
  • the surface of the heat radiating member may be smooth, and may be roughened to improve the adhesiveness with the insulating layer.
  • the thickness of the heat radiating member is not particularly limited and can be selected according to the application of the circuit board and the like. From the viewpoint of heat dissipation, the thickness of the heat dissipation member is preferably more than 120 ⁇ m, more preferably 1000 ⁇ m, and 1500 ⁇ m or more from the viewpoint of securing a volume for heat diffusion and further improving heat dissipation. Is more preferable. From the viewpoint of miniaturization and low profile of the circuit board, the thickness of the heat radiating member is preferably 10,000 ⁇ m or less, and more preferably 3000 ⁇ m or less. When the thickness of the heat radiating member is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the ratio of the thickness of the circuit to the thickness of the heat radiating member is preferably 0.2 to 25, and more preferably 1 to 25.
  • the area (area B) of the surface of the heat radiating member on the insulating layer side is larger than the area (area A) of the second surface of the circuit.
  • the ratio of the area B of the heat radiating member to the area A of the circuit may be more than 1 and 30 or less, and is preferably 2 to 10.
  • the partial discharge start voltage of the insulating layer is preferably 1.0 kV or more, and more preferably 2.5 kV or more, from the viewpoint of insulation resistance.
  • the measurement of the partial discharge start voltage may be performed in accordance with the measurement standard IEC60664-1. Specifically, after connecting the circuit and the heat radiating member to the power supply, the entire circuit board is put into Fluorinert to measure the partial discharge start voltage. The measurement conditions are that the measurement start voltage is set to 0 (V), the voltage is gradually increased by 100 (V) and held for 1 second repeatedly, and the voltage when the amount of charge exceeds 10 (pC) is partially discharged. Let it be the starting voltage (kV).
  • the dielectric breakdown voltage between the heat radiating member and the circuit is preferably 1.5 kV or more, more preferably 2.5 kV or more, and further preferably 4 kV or more.
  • the dielectric breakdown voltage between the heat radiating member and the circuit may be measured as follows, for example. After connecting the circuit and the heat dissipation member to the power supply, the entire circuit board is placed in Fluorinert to measure the breakdown voltage. The measurement conditions are that the measurement start voltage is set to 0 (V), the voltage is gradually increased by 100 (V) and held for 1 second repeatedly, and the voltage when the current value exceeds 0.2 (mA) is set. It is assumed to be a breakdown voltage (kV).
  • the circuit sheet of the second embodiment of the present disclosure comprises a conductor, a first surface, and a space between the circuit and a circuit having a second surface located on the opposite side of the first surface.
  • An insulating portion provided on at least one of the periphery of the circuit is provided, and there is a region in which the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface do not overlap in a plan view. do.
  • the method 1 for manufacturing a circuit board of the second embodiment of the present disclosure includes the circuit sheet of the second embodiment of the present disclosure described above, an insulating layer arranged so as to be in contact with the second surface, a heat radiating member, and the like. It has a step of pressurizing the laminated body in the state which arranged in this order in the thickness direction in the thickness direction.
  • the method of pressurizing the laminate in the above manufacturing method 1 is not particularly limited, and can be selected from the methods generally performed in the circuit board manufacturing process.
  • the pressurizing step is preferably performed with a cushioning material that can be deformed by pressurization arranged on the first surface of the circuit.
  • a cushioning material that can be deformed by pressurization arranged on the first surface of the circuit.
  • cushioning material examples include fluororubber, Teflon (registered trademark), polyethylene terephthalate (PET), polyimide, polyamide, polyamideimide, polyethylene, non-woven fabric, non-woven paper, and their composite layers and laminated materials. ..
  • the method 2 for manufacturing a circuit board according to the second embodiment of the present disclosure is the method for manufacturing a circuit board for manufacturing the circuit board according to the second embodiment of the present disclosure described above, wherein the circuit and the second of the circuits are used.
  • a step of pressurizing a laminated body in a state where the insulating layer arranged so as to be in contact with a surface and the heat radiating member arranged so as to be in contact with the insulating layer are arranged in this order in the thickness direction.
  • the circuit board manufacturing method 1 of the present disclosure differs from the circuit board manufacturing method 1 described above in that a circuit is used instead of the circuit sheet.
  • FIG. 2D is a cross-sectional view showing a schematic configuration of a specific example of a conventional circuit board.
  • the circuit board 130 includes a circuit sheet 26 including a circuit 21 and an insulating portion 24, an insulating layer 12, and a heat radiating member 13 in this order in the thickness direction.
  • the insulating portion 24 is provided in the space between the circuits 21 and around the circuits 21.
  • the circuit board 130 when the first surface of the circuit 21 is pressurized, the pressure from the outer peripheral edge portion A of the first surface of the circuit 21 to the outer peripheral edge portion B of the second surface is not dispersed.
  • the pressurization of the circuit board 130 is released, the springback at the outer peripheral edge portion B of the second surface tends to cause peeling between the outer peripheral edge portion B of the circuit 21 and the insulating layer 12, and at the peeled portion, peeling occurs.
  • the reliability of the circuit board 130 may be impaired by trapping air bubbles or lowering the insulation resistance.
  • FIG. 2A is a cross-sectional view showing a schematic configuration of a specific example 1 of the circuit board of the present disclosure
  • FIG. 2B is a plan view from the circuit side showing the schematic configuration of the specific example 1 of the circuit board of the present disclosure.
  • FIG. 2A shows that the circuit board 110 including the circuit 11, the insulating layer 12, and the heat radiating member 13 is manufactured by pressurizing the laminated body including the circuit 11 and the heat radiating member 13 from the direction of the arrow Y using the cushion material 15. ing.
  • the heat radiating member 13 is omitted.
  • the circuit board 110 includes the circuit 11, the insulating layer 12, and the heat radiating member 13 in this order in the thickness direction (that is, the arrow X direction).
  • the entire outer peripheral edge portion A of the first surface does not overlap with the outer peripheral edge portion B of the second surface in a plan view from the circuit 11 side.
  • the circuit board 110 when the first surface of the circuit 11 is pressurized, the pressure from the outer peripheral edge portion A of the first surface of the circuit 11 to the second surface is dispersed. Therefore, when the pressurization of the circuit board 110 is released, springback at the outer peripheral edge portion B of the second surface is suppressed, and peeling between the outer peripheral edge portion B and the insulating layer 12 is unlikely to occur, and as a result, the result is
  • the circuit board 110 is excellent in reliability because it is possible to prevent the reliability from being impaired due to trapping air bubbles at the peeled portion or deterioration of the insulation resistance.
  • connection point between the side surface of the circuit 11 and the first surface is rounded, but may be angular.
  • the circuit board 110 may be provided with an insulating portion around the circuit 11 as in the specific example 2 of the circuit board described later.
  • FIG. 2C is a cross-sectional view showing a schematic configuration of a specific example 2 of the circuit board of the present disclosure.
  • the circuit board 120 includes a circuit sheet 16 including a circuit 11'and an insulating portion 14, an insulating layer 12, and a heat radiating member 13 in this order in the thickness direction.
  • Specific Example 2 of the circuit board is different from Specific Example 1 of the circuit board in that the cross-sectional shape of the circuit is convex downward and an insulating portion is provided around the circuit.
  • the entire outer peripheral edge portion A of the first surface does not overlap with the outer peripheral edge portion B of the second surface in a plan view from the circuit 11'side.
  • peeling is unlikely to occur between the outer peripheral edge of the circuit 11'and the insulating layer 12, and as a result, air bubbles are trapped at the peeled portion and the insulation resistance is lowered.
  • the circuit board 120 is excellent in reliability because it is suppressed that the reliability is impaired by the above.
  • the circuit sheet of the third embodiment of the present disclosure includes two or more circuits composed of conductors, and in all combinations of two circuits that are independent of each other and are adjacent to each other, the element mounting surface of the circuit.
  • the highly elastic member is located on a straight line in an arbitrary direction that is independent of each other, passes between two adjacent circuits, and is parallel to the element mounting surface.
  • circuit sheet of the present embodiment when viewed from the element mounting surface of the circuit, they are independent of each other, pass between two adjacent circuits, and are on a straight line in an arbitrary direction parallel to the element mounting surface. Highly elastic member is located.
  • the circuit and the highly elastic member are arranged as compared with the circuit sheet in which the highly elastic member does not exist on at least one straight line passing between two adjacent circuits and parallel to the element mounting surface. Deformation of the circuit sheet in the non-linear region is suppressed, and the occurrence of warpage is also suppressed.
  • the highly elastic member may be a circuit or may be the highly elastic member described in the fourth embodiment described later.
  • the circuit sheet of this embodiment includes two or more circuits made of conductors.
  • the material of the circuit is not particularly limited as long as it is a conductor, and examples thereof include metal.
  • the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity, the metal preferably contains copper.
  • the thickness of the circuit is not particularly limited and can be selected according to the application of the circuit sheet and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably 350 ⁇ m or more, and from the viewpoint of heat dissipation using the circuit itself, it is more preferably 500 ⁇ m or more, and the circuit is particularly used as a highly elastic member. In some cases, it is more preferably 1000 ⁇ m or more from the viewpoint of effectively suppressing the warp of the circuit sheet, the circuit board, and the like. From the viewpoint of weight reduction, height reduction, etc., the thickness of the circuit may be 5000 ⁇ m or less. From the viewpoint of circuit workability, it is preferably 3000 ⁇ m or less.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the thickness of the embedded part is also included in the thickness of the circuit.
  • the width of the circuit when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like.
  • the width of the circuit may be 100 ⁇ m to 100 mm.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the circuit can be obtained, for example, by processing a metal plate into a circuit state having a desired shape.
  • the processing method is not particularly limited, and can be performed by a known method such as punching, cutting, etching, or a combination thereof. From the viewpoint of improving the accuracy in circuit fabrication, it is preferable to form the circuit by etching.
  • the etching method of the metal plate is not particularly limited. From the viewpoint of suppressing the occurrence of the tapered portion of the circuit, it is preferable to form the circuit by etching from both sides (that is, two main surfaces facing each other) of the metal plate.
  • the circuit may be roughened.
  • the surface in contact with the insulating layer is at least roughened, it is possible to obtain a state in which the circuit can be sufficiently adhered to the insulating layer while suppressing the generation of voids.
  • the adhesion due to the Van der Waals force can be improved by roughening the surface in contact with the insulating layer of the circuit to improve the pull-out force due to the anchor effect or increase the adhesion area.
  • the method of roughening the circuit is not particularly limited, and it may be performed by a physical method or a chemical method.
  • the physical method includes sanding, sandblasting, laser irradiation, milling and the like.
  • the chemical method include a magdamit treatment, a CZ treatment, a blackening treatment, an etching treatment, a plating treatment and the like.
  • the roughening treatment may be carried out by any one method or a combination of two or more. When two or more kinds are combined, the physical method and the chemical method may be combined, the chemical methods may be combined, or the physical methods may be combined.
  • the circuit sheet of the present embodiment may include an insulating portion provided at least a part between two or more circuits.
  • the circuit sheet When the circuit sheet is provided with an insulating portion, it passes through the insulating portion provided between two or more circuits and is on a straight line in an arbitrary direction parallel to the element mounting surface when viewed from the element mounting surface of the circuit.
  • a highly elastic member may be located in.
  • the insulating material used for forming the insulating portion examples include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, and acrylic resin.
  • the resin contained in the insulating material may be one kind or two or more kinds.
  • the insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
  • the width of the insulating portion when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like.
  • the width of the insulating portion may be 100 ⁇ m to 100 mm.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the thickness of the insulating portion is not particularly limited and can be selected according to the application of the circuit sheet and the like.
  • the thickness of the insulating portion (thickness of the insulating portion / thickness of the circuit) with respect to the thickness of the circuit is preferably 0.05 or more from the viewpoint of maintaining the positional relationship of a plurality of circuits, and secures the strength of the circuit sheet. From the viewpoint of ease, 0.7 or more is more preferable, and from the viewpoint of ensuring symmetry in the thickness direction of the circuit sheet and easily reducing warpage, 0.9 or more is further preferable. Further, the thickness of the insulating portion / the thickness of the circuit is preferably 1.0 or less, more preferably 0.99 or less, from the viewpoint of workability of element mounting. When the thickness of the insulating portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the circuit sheet includes an insulating portion
  • the insulating portion is provided so that the element mounting surface of the circuit and the surface opposite to the element mounting surface are exposed.
  • the warp of the circuit sheet can be suitably suppressed.
  • the shortest distance between the side surface of a specific circuit and another circuit other than the specific circuit or a highly elastic member other than the circuit from the viewpoint of suitably suppressing the warp of the circuit sheet, the circuit board, or the like.
  • the distance is preferably 10 mm or less, and more preferably 5 mm or less from the viewpoint of miniaturization of the circuit sheet.
  • the shortest distance between a specific circuit and a side surface of another circuit other than the specific circuit or a highly elastic member other than the circuit is 500 ⁇ m or more. It is preferable, and it is more preferable that it is 1000 ⁇ m or more from the viewpoint of corresponding to a high voltage.
  • the circuit sheet of the fourth embodiment of the present disclosure includes at least one circuit made of a conductor, an insulating portion, and a member having a higher Young ratio than the insulating portion, and the circuit and the member having a higher Young ratio are included.
  • the insulating portion is provided in at least a part of the space formed by the arrangement, passes through the insulating portion provided in at least a part of the space when viewed from the element mounting surface of the circuit, and said.
  • At least one of the circuit and the member having a high young ratio (hereinafter, also referred to as “highly elastic member”) is located on a straight line in an arbitrary direction parallel to the element mounting surface.
  • the circuit and the height are on a straight line in an arbitrary direction that passes through an insulating portion provided in at least a part of the space and is parallel to the element mounting surface when viewed from the element mounting surface of the circuit.
  • At least one of the elastic members is located.
  • the insulating portion as compared with a circuit sheet in which the circuit and the highly elastic member do not exist on at least one straight line that passes through the insulating portion provided in at least a part of the space and is parallel to the element mounting surface. Deformation of the circuit sheet in the linear region is suppressed, and the occurrence of warpage is also suppressed.
  • the circuit sheet of this embodiment includes a highly elastic member rather than an insulating portion.
  • the circuit sheet may include only one highly elastic member, or may include two or more highly elastic members.
  • the material of the highly elastic member is not particularly limited as long as it has a higher Young's modulus than the insulating material, and examples thereof include metal.
  • examples of the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite.
  • the material of the highly elastic member may be the same as the material of the circuit. Further, the highly elastic member may be another circuit arranged between the circuits. There may be one or more different circuits.
  • the shape of the highly elastic member is not particularly limited, and examples thereof include a rectangular shape, a polygonal shape, an irregular shape, a circular shape, a cross shape, and an X shape.
  • the highly elastic member may have a structure in which two or more linear portions are provided and two or more linear portions intersect, specifically, a cross-shaped structure, an X-shaped structure, or the like. May have. Since the highly elastic member has this structure, the warp of the circuit sheet can be suitably suppressed even when the volume occupied by the insulating portion in the circuit sheet is relatively large.
  • the circuit sheet of the present embodiment includes a plurality of circuits, between the side surface of the specific circuit and another circuit other than the specific circuit or a highly elastic member from the viewpoint of suitably suppressing the warp of the circuit sheet or the circuit board.
  • the shortest distance is preferably 10 mm or less, and more preferably 5 mm or less from the viewpoint of miniaturization of the circuit sheet.
  • the shortest distance between a specific circuit and a side surface of another circuit other than the specific circuit or a highly elastic member is preferably 500 ⁇ m or more. From the viewpoint of supporting high voltage, it is more preferably 1000 ⁇ m or more.
  • the circuit sheet of the present embodiment may be further provided with an insulating layer which is arranged on the surface side opposite to the element mounting surface of the circuit and holds the relative arrangement of two or more circuits.
  • the preferable configuration of the insulating layer is the same as that described in the section of the circuit board described later.
  • the insulating layer may be provided with an adhesive layer on the surface on the circuit side from the viewpoint of ensuring adhesion to the circuit and preferably maintaining the relative arrangement of two or more circuits.
  • the circuit sheet of the present embodiment includes an insulating layer, the circuit sheet may or may not further include an insulating portion provided between two or more circuits.
  • a circuit board described later may be formed by providing a heat radiating member in contact with the insulating layer.
  • FIG. 3A is a schematic configuration diagram of a conventional circuit sheet.
  • the circuit sheet 140 shown in FIG. 3A includes a circuit 31 and an insulating portion 32 provided between the circuits 31.
  • the circuit sheet 140 has a portion where many insulating members are present and no circuit is present in the central portion, and also passes through the insulating portion 32 provided between the circuits 31 with respect to the element mounting surface. It has a configuration in which the circuit 31 does not exist on at least one straight line (for example, the dotted line shown in FIG. 3A) which is parallel to each other. Therefore, there is a problem that deformation is likely to occur in a region of the insulating portion 32 where many insulating members are present, a region including a dotted line shown in FIG. 3A, and the circuit sheet 140 is likely to be warped starting from that portion. ..
  • FIG. 3B is a schematic configuration diagram of a circuit sheet according to a third embodiment of the present disclosure.
  • the circuit sheet 150 shown in FIG. 3B includes a circuit 31 and an insulating portion 32 provided between the circuits 31, and further includes another circuit 33 between the two circuits 31.
  • a circuit for example, the circuit 31 and another circuit 31
  • Circuit 33 is located.
  • FIG. 3C is a schematic configuration diagram of a circuit sheet according to a fourth embodiment of the present disclosure.
  • the circuit sheet 160 shown in FIG. 3C includes a circuit 31 and an insulating portion 32 provided between the circuits 31, and is a highly elastic member having a higher Young's modulus than the insulating portion 32 between the two circuits 31. 4 is further provided.
  • at least one of the circuit 31 and the highly elastic member 4 is located on a straight line in an arbitrary direction that passes through the insulating portion 32 provided between the two circuits 31 and is parallel to the element mounting surface. ing.
  • the circuit sheet 150 of the third embodiment and the circuit sheet 160 of the fourth embodiment passes through the insulating portion 32 provided between the two circuits 31 and is on a straight line in an arbitrary direction parallel to the element mounting surface. At least one of a circuit 31, another circuit 33, and a highly elastic member 4 is located in. Therefore, the deformation of the circuit sheet 150 and the circuit sheet 160 in the linear region of the insulating portion 32 is suppressed, and the occurrence of warpage is also suppressed.
  • the method for manufacturing the circuit sheet of the present disclosure is not particularly limited.
  • the method of manufacturing the circuit sheet of the present disclosure includes, for example, a step of filling a circuit or a space formed by the circuit and a highly elastic member arranged on a temporary base material with an insulating material, and the insulating material is a resin. If necessary, it may have a step of curing the filled insulating material.
  • Examples of the space formed by the circuit include a space between circuits
  • examples of the space formed by the circuit and the highly elastic member include, for example, the space between the highly elastic members and the space between the circuit and the highly elastic member. Space can be mentioned.
  • the circuit and the highly elastic member may be formed on the temporary base material by arranging the metal on the temporary base material and then performing etching.
  • the temporary base material means that a circuit or the like can be temporarily fixed before the space formed by the circuit or the like arranged on the temporary base material is filled with the insulating material, and the circuit or the like can be temporarily fixed after the insulating material is filled. It means something that can be removed from.
  • the fact that the circuit or the like is temporarily fixed means that the circuit or the like maintains a relative positional relationship by contact with the temporary base material, and does not necessarily mean that the circuit or the like does not move completely. It's not a thing.
  • Examples of the temporary base material include a resin film and the like.
  • Examples of the resin film that can be used as the temporary base material include a resin film having a support film and an adhesive layer formed on the support film.
  • the circuit board of the third embodiment of the present disclosure is insulated so as to be in contact with the circuit sheet of the third embodiment or the fourth embodiment of the present disclosure described above and the surface opposite to the element mounting surface of the circuit sheet.
  • a layer and a heat radiating member arranged so as to be in contact with the insulating layer are provided in this order. Since the circuit sheet of the present disclosure suppresses the occurrence of warpage, the circuit sheet, the insulating layer, and the heat radiating member can be pressure-bonded with high uniformity, and the thickness of the insulating layer of the manufactured circuit board can be increased. Excellent uniformity. As a result, the circuit board of the present disclosure tends to have high adhesive reliability and excellent heat dissipation, insulation and the like.
  • the types of the insulating layer and the heat radiating member used for the circuit board are not particularly limited, and can be selected from those generally used for the circuit board.
  • the preferred form of the insulating material used for forming the insulating layer may be the same as the preferred form of the insulating material used for forming the insulating portion.
  • the insulating layer may be provided with an adhesive layer on the surface on the circuit sheet side from the viewpoint of adhesion to the circuit sheet.
  • the material of the heat radiating member is not particularly limited, and examples thereof include copper, aluminum, tungsten copper, copper alloys such as molybdenum copper, and nickel-plated copper.
  • the type of the heat radiating member is not particularly limited, and may be a member having a heat radiating function such as a heat spreader or a heat sink, a case having an air or water flow path, a metal foil, a filler resin composite, or the like.
  • the surface of the heat radiating member may be smooth, and may be roughened to improve the adhesiveness with the insulating layer.
  • the thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board. From the viewpoint of ensuring sufficient insulating properties, the thickness of the insulating layer is preferably 50 ⁇ m or more, and from the viewpoint of ensuring sufficient adhesiveness, it is more preferably 80 ⁇ m or more, and when adhering the insulating layer. It is more preferably 120 ⁇ m or more from the viewpoint of facilitating the handleability of the above, and from the viewpoint of imparting thermal shock resistance.
  • the thickness of the insulating layer is preferably 500 ⁇ m or less, and more preferably 400 ⁇ m or less from the viewpoint of easily reducing the warp of the circuit board due to the shrinkage of the insulating layer. , 300 ⁇ m or less is more preferable.
  • the method for manufacturing the circuit board of the third embodiment of the present disclosure is the insulation arranged on the surface opposite to the element mounting surface of the circuit sheet of the third embodiment or the fourth embodiment of the present disclosure described above.
  • the laminated body in which the layers and the heat radiating member are arranged in this order, or the circuit sheet of the present disclosure provided with the above-mentioned insulating layer and the heat radiating member are provided on the insulating layer side of the circuit sheet. It has a step of pressurizing in the thickness direction of the laminated body, which is arranged so as to be located.
  • the method of pressurizing the laminate in the above method is not particularly limited, and can be selected from the methods generally performed in the circuit board manufacturing process.
  • the circuit sheet of the fifth embodiment of the present disclosure includes a circuit and an insulating portion provided between the circuits, and the insulating portion is recessed on the element mounting surface (the surface on which the element is mounted). , Circuit sheet. Since the insulating portion is recessed on the element mounting surface of the circuit sheet, the circuit is in a relatively protruding state, and the workability of element mounting is improved.
  • the shape of the recessed part of the insulating part is not particularly limited.
  • it may be a straight line in which the thickness of the insulating portion of the recessed portion is constant, or it may be curved or stepped by changing the thickness.
  • the shape of the recessed portion is preferably a straight line or a curved shape that is convex in the direction opposite to the element mounting surface.
  • FIG. 4A is a diagram schematically showing a cross section of the circuit sheet of the present disclosure.
  • the circuit sheet 170 shown in FIG. 4A includes a circuit 41 and an insulating portion 42 provided between the circuits 41, and the insulating portion 42 is recessed on the element mounting surface.
  • the degree of denting of the insulating portion on the element mounting surface is not particularly limited.
  • the ratio (d / D) of d to D is 0.0025 to 0.
  • it is 5 it is easy to secure the bending strength of the circuit sheet in the insulating portion, and when it is 0.0025 to 0.25, it is easier to secure the strength of the circuit sheet, and in a later step, the circuit board is passed through the insulating layer. There is a tendency to easily suppress damage to the circuit sheet when pressure-bonding.
  • the ratio (d / D) of d to D is 0.0025 to 0.025, it is easy to secure the strength of the circuit sheet, it is easy to secure the symmetry in the thickness direction of the circuit sheet, and the warp of the circuit sheet can be reduced. There is a tendency. Therefore, when the circuit sheet is pressure-bonded through the insulating layer in a later step, it can be adhered well.
  • the ratio of d to D (d / D) is more preferably 0.003 to 0.01.
  • the maximum value d of the height difference between the insulating portion on the element mounting surface and the adjacent circuit may be in the range of 5 ⁇ m to 50 ⁇ m.
  • the surface of the circuit sheet opposite to the element mounting surface is flatter than the element mounting surface.
  • the surface opposite to the element mounting surface is brought into contact with the insulating layer, it is easy to adhere to the insulating layer, and good insulating properties tend to be obtained. Further, when it is adhered to the heat radiating member via the insulating layer, it is easily adhered to the insulating layer, and good insulating properties tend to be obtained.
  • the surface opposite to the element mounting surface is flatter than the element mounting surface means that the maximum value of the height difference between the insulating portion and the adjacent circuit on the surface opposite to the element mounting surface is d'.
  • the maximum value d'of the height difference between the insulating portion and the adjacent circuit on the surface opposite to the device mounting surface may be in the range of -5 ⁇ m to 5 ⁇ m, and may be in the range of 0 ⁇ m to 5 ⁇ m. Is preferable.
  • the circuit sheet preferably has a portion where the circuit and the insulating portion overlap in the thickness direction on the surface opposite to the element mounting surface.
  • the circuit obtained by processing a metal plate or the like may have a portion having insufficient thickness due to wear during cutting or the like. Therefore, when the circuit is arranged on the insulating layer, a gap is generated between the circuits, and there is a possibility that the circuit cannot be sufficiently adhered. Since the insulating material enters the part where the thickness of the circuit is insufficient and overlaps with the insulating part in the thickness direction, the formation of a gap between the circuit and the insulating layer is suppressed, and the adhesiveness with the insulating layer is suppressed. Is improved. Therefore, when the circuit sheet is bonded to the insulating layer, it is important that the portion of the circuit sheet where the circuit and the insulating portion overlap in the thickness direction is provided before bonding to the insulating layer.
  • the width of the portion where the circuit and the insulating portion overlap in the thickness direction is preferably 5 ⁇ m to 100 ⁇ m, preferably 8 ⁇ m to 70 ⁇ m, from the viewpoint of adhesiveness between the circuit sheet and the insulating layer and heat dissipation when used as a circuit board. Is more preferable.
  • the portion where the circuit and the insulating portion overlap in the thickness direction may be a portion where the insulating layer is inserted on the surface side opposite to the element mounting surface.
  • FIG. 4B is a diagram schematically showing a cross section of a portion where the circuit of the circuit sheet and the insulating portion overlap in the thickness direction.
  • the circuit sheet 170 has a portion 43 in which the circuit 41 and the insulating portion 42 overlap in the thickness direction on the surface opposite to the element mounting surface.
  • the portion 43 in which the circuit 41 and the insulating portion 42 overlap in the thickness direction is also formed in a portion where the thickness of the circuit 41 is insufficient, for example, when the insulating material is filled between the circuits 41 to form the insulating portion 42. It can be formed by filling an insulating material.
  • the thickness of the circuit is not particularly limited and can be selected according to the application of the circuit sheet and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably 350 ⁇ m or more, more preferably 500 ⁇ m or more from the viewpoint of corresponding to the larger current, and 1000 ⁇ m or more from the viewpoint of heat dissipation. Is particularly preferred. From the viewpoint of reducing the weight and height of the circuit sheet, the thickness of the circuit is preferably 5000 ⁇ m or less, and more preferably 3500 ⁇ m or less from the viewpoint of processability of the circuit.
  • the thickness of the circuit is more preferably 3000 ⁇ m or less.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the thickness of the embedded part is also included in the thickness of the circuit.
  • the width of the circuit when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected depending on the application of the circuit sheet and the like.
  • the width of the circuit may be 100 ⁇ m to 100 mm.
  • the circuit may consist of one independent pattern (all circuits in the pattern are continuous) or two or more independent patterns.
  • the independent patterns may be arranged on the independent insulating layer or may be arranged on the same insulating layer.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the circuit can be obtained, for example, by processing a metal plate into a circuit state having a desired shape.
  • the processing method is not particularly limited, and can be performed by a known method such as punching, cutting, or etching.
  • the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity and heat dissipation, it is preferable to contain copper.
  • the width of the insulating portion when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like.
  • the width of the insulating portion may be 100 ⁇ m to 100 mm.
  • Examples of the insulating material used for forming the insulating portion of the circuit sheet include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, and acrylic resin.
  • the resin contained in the insulating material may be one kind or two or more kinds.
  • the insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
  • the insulating portion is recessed on the element mounting surface of the circuit sheet, it is preferable that the insulating portion is formed by using an insulating material whose volume shrinks when cured.
  • ⁇ Modification example of the circuit sheet of the fifth embodiment> As a modification of the circuit sheet of the fifth embodiment, at least a part of the element mounting surface on which the element is mounted and the element mounting in the circuit are provided between the plurality of circuits and the plurality of circuits. It has an insulating portion that holds relative positions of the plurality of circuits so that at least a part of the surface opposite to the surface is exposed, and the surface of the insulating portion on the device mounting surface side is the circuit. It is a circuit sheet that is recessed with respect to the element mounting surface of the above. Since the surface of the insulating portion on the element mounting surface side is recessed with respect to the element mounting surface of the circuit, the workability of element mounting is improved. A preferred embodiment of the above-described modification is the same as that of the circuit sheet of the fifth embodiment.
  • the method for manufacturing a circuit sheet according to a fifth embodiment of the present disclosure includes a step of filling an insulating material between the circuits with a protective film attached to one surface of the sheet-shaped circuit, and a step of curing the insulating material. It has a process of making it, and in this order,
  • the protective film is a method for manufacturing a circuit sheet, which is deformable with volume shrinkage due to curing of the insulating material.
  • an insulating material is filled between sheet-shaped circuits and cured to form an insulating portion made of a cured product of the insulating material. Further, by utilizing the phenomenon that the insulating material shrinks in volume due to curing, the cured product (insulating portion) of the insulating material is formed in a recessed state on the element mounting surface. More specifically, by using a protective film attached to the circuit that can be deformed as the insulating material shrinks due to hardening, the volume shrinkage of the insulating material is not hindered and the insulating portion in a recessed state is used. Can be formed.
  • the surface to which the protective film of the circuit is attached may be the element mounting surface of the circuit sheet.
  • the circuit and insulating material used in the above method may be the circuit and insulating material used in the circuit sheet of the present disclosure described above, respectively.
  • the method of filling the insulating material between the circuits and the method of curing are not particularly limited, and a known method can be used.
  • the protective film used in the above method is not particularly limited as long as it can be deformed by volume shrinkage due to curing of the insulating material.
  • various resin films such as PET film, polyimide film, and polyamide film can be used.
  • a polyimide film or a polyamide film is more preferable from the viewpoint of heat resistance.
  • the surface of the protective film to be attached to the circuit may have adhesiveness.
  • a layer containing an adhesive such as an acrylic adhesive, a urethane adhesive, or a silicone adhesive may be formed on the surface of the protective film to be attached to the circuit.
  • the flexural modulus of the protective film is preferably 200 MPa to 20 GPa, and more preferably 1 GPa to 15 GPa from the viewpoint of ease of controlling the volume shrinkage amount. From the viewpoint of ease of peeling of the protective film, the flexural modulus of the protective film is more preferably 3 GPa to 9.5 GPa. The flexural modulus of the protective film is measured according to JIS K7171.
  • the thickness of the protective film is not particularly limited, but the thickness of the protective film (including the thickness of the adhesive layer if it has an adhesive layer) is preferably 10 ⁇ m to 1 mm, preferably 25 ⁇ m to 500 ⁇ m from the viewpoint of handling. It is more preferable because it is easy to suppress twisting and twisting of the protective film and it is easier to handle, and it is more preferable that the thickness is 25 ⁇ m to 120 ⁇ m because it is easy to control the amount of volume shrinkage due to curing of the insulating material.
  • the insulating material is filled and cured in a state where a member that does not deform due to volume shrinkage due to the curing of the insulating material is in contact with the surface opposite to the surface to which the protective film of the circuit is attached. ..
  • the surface on the side where such a member comes into contact is less likely to have a dented state of the cured product of the insulating material, and can be made flatter than the surface to which the protective film is attached.
  • contacting a member means bringing the member into contact with the circuit so that it can be easily separated from the circuit after the step of curing the insulating material.
  • the member include a mold having a flat surface in contact with the circuit.
  • the protective film attached to one surface of the circuit has lower elasticity (easily deformed) than the member that abuts on the opposite surface.
  • the surface on the side to which the protective film is attached can be selectively made into a state in which the cured product of the insulating material is recessed.
  • the protective film and the member can be more easily removed from the obtained circuit sheet, and the occurrence of circuit breakage or the like at the time of removal can be suppressed.
  • the surface where the sheet-shaped circuit and the member are in contact may be such that the entire surface of the circuit is in contact with the member, or a part of the surface is not in contact with the member and there is a gap between them.
  • the gap is also filled with a part of the insulating material filled between the circuits.
  • the circuit board of the present disclosure is in contact with the circuit sheet of the fifth embodiment of the present disclosure described above, an insulating layer arranged so as to be in contact with a surface opposite to the element mounting surface of the circuit sheet, and the insulating layer. It has a heat radiating member to be arranged.
  • the types of the insulating layer and the heat radiating member used for the circuit board are not particularly limited, and can be selected from those generally used for the circuit board.
  • the thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board. From the viewpoint of ensuring sufficient insulating properties, the thickness of the insulating layer is preferably 50 ⁇ m or more, more preferably 100 ⁇ m or more, and further preferably 150 ⁇ m or more.
  • the thickness of the insulating layer is preferably 500 ⁇ m or less, more preferably 300 ⁇ m or less, and further preferably 250 ⁇ m or less.
  • the method for manufacturing the circuit board of the fourth embodiment of the present disclosure includes the circuit sheet of the fifth embodiment described above, an insulating layer arranged on a surface opposite to the element mounting surface of the circuit sheet, and a heat radiating member. And have a step of pressurizing the laminated body in the state of arranging in this order.
  • the pressurization is a method for manufacturing a circuit board, in which a cushioning material deformable by the pressurization is arranged on an element mounting surface of the circuit sheet.
  • the pressurization may not be performed evenly.
  • the cushion material on the element mounting surface of the circuit sheet, the pressure applied to the element mounting surface is dispersed, and the circuit sheet, the insulating layer and the heat radiating member can be sufficiently adhered.
  • the cushioning material used in the above method is not particularly limited as long as it is a cushioning material that can be deformed by pressurization, and examples thereof include rubbers such as fluororubber and silicon rubber, and thermoplastic resins or elastomers.
  • the method of pressurizing the laminate in the above method is not particularly limited, and can be selected from the methods generally performed in the circuit board manufacturing process.
  • a pressurizing method roll laminating, flat plate laminating, quick press, flat plate press and the like are used, and the pressure may be applied at normal pressure or in vacuum.
  • the pressurizing pressure is preferably 0.1 MPa to 10 MPa because it is easy to control the pressure, and 0.2 MPa to 8 MPa is preferable because it is easy to secure the adhesiveness with the adhesive layer, and 1 MPa to 8 MPa is preferable. It is more preferable because it is possible to suppress the entrainment of air bubbles and the like between the layers and it is easy to secure the insulating property.
  • the laminate When pressurizing the laminate, the laminate may be heated at the same time.
  • the heating temperature is preferably 40 ° C. to 300 ° C. from the viewpoint of ensuring the adhesiveness between the insulating layer and the circuit and the insulating layer and the heat radiating member, and 130 ° C. to 250 ° C. from the viewpoint of curing the adhesive layer. It is more preferable that the temperature is 150 ° C. to 230 ° C. from the viewpoint of allowing the cushion material to sufficiently follow the recessed portion of the circuit sheet.
  • the circuit sheet of the sixth embodiment of the present disclosure includes a circuit and an insulating portion provided between the circuits.
  • the circuit sheet having the above configuration is excellent in reliability because peeling between the circuit and the insulating part is unlikely to occur. Further, since the surface roughness of the element mounting surface is relatively small, the element mounting process can be performed satisfactorily.
  • the circuit sheet may further include an insulating layer provided on the surface opposite to the element mounting surface of the circuit.
  • the insulating portion and the insulating layer may be different members or the same member.
  • the insulating layer is formed between the circuits to form the insulating portion, or the insulating layer is formed so as to cover the lower surface of the circuit. There is a state of being.
  • FIG. 5A is a diagram schematically showing a cross section of the circuit sheet of the present disclosure.
  • the circuit sheet 180 shown in FIG. 5A includes a circuit 51, an insulating portion 52 provided in a space between the circuits 51, and an insulating layer 53 provided on a surface opposite to the element mounting surface of the circuit 51.
  • the surface (side surface) of the circuit 51 in contact with the insulating portion 52 has a larger surface roughness than the element mounting surface, and peeling from the adjacent insulating portion 52 is less likely to occur.
  • the surface (lower surface) opposite to the element mounting surface of the circuit 51 and in contact with the insulating layer 53 also has a larger surface roughness than the element mounting surface, and peeling from the insulating layer 53 is less likely to occur.
  • the insulating portion 52 and the insulating layer 53 are described as different members in FIG. 5A, the insulating portion 52 and the insulating layer 53 may be the same member as described above. Further, in FIG. 5A, the surface roughness of both the side surface and the lower surface of the circuit 51 is larger than the surface roughness of the element mounting surface, but only the surface roughness of the side surface may be larger than the surface roughness of the element mounting surface.
  • the side surface of the circuit may satisfy the condition of surface roughness A as a whole, or only a part of the side surface may satisfy the condition of surface roughness A. From the viewpoint of achieving good insulation and heat dissipation, it is preferable that the surface roughness A of at least the portion of the side surface of the circuit connected to the lower surface of the circuit is larger than the surface roughness B of the element mounting surface of the circuit. As a result, peeling between the circuit and the insulating layer is further suppressed, good insulating properties are maintained, and heat is well conducted to the heat radiating member arranged via the insulating layer. From the above viewpoint, the most preferable aspect of the circuit is that the entire side surface satisfies the condition of surface roughness A. As a result, the adhesiveness between the side surface and the insulating portion can be ensured over the entire region, so that peeling can be further suppressed.
  • the surface roughness C of the surface opposite to the element mounting surface of the circuit may be the same as or different from the surface roughness A of the circuit. From the viewpoint of suppressing peeling between the circuit and the insulating layer, the surface roughness C of the surface opposite to the element mounting surface of the circuit (the surface in contact with the insulating layer) is larger than the surface roughness B of the element mounting surface of the circuit. Is preferable.
  • the surface roughness of the circuit may be expressed by the arithmetic mean roughness (Ra) defined by JIS B 0601 (2001).
  • the surface roughness A represented by Ra is preferably 0.3 ⁇ m or more, more preferably 0.4 ⁇ m or more, and further preferably 0.6 ⁇ m or more from the viewpoint of adhesiveness. It is particularly preferable that the thickness is 0.0 ⁇ m or more.
  • the surface roughness A expressed in Ra is preferably 5.0 ⁇ m or less, and more preferably 2.5 ⁇ m or less.
  • Ra is preferably in the above range and the specific surface area is preferably 1.3 or more, more preferably 1.4 or more, and further preferably 1.6 or more. When the value of the specific surface area is large, the adhesive area per unit area becomes large, and the adhesiveness can be improved. From the viewpoint of withstand voltage characteristics, the specific surface area is preferably 5.0 or less, and more preferably 3.0 or less.
  • the "specific surface area” in the present disclosure is a value obtained by calculating the three-dimensional surface area B in the measurement area A and calculating the B / A.
  • the three-dimensional surface area B can be calculated by measuring the surface profile of a predetermined measurement area A (for example, 10000 ⁇ m 2) of the measurement surface with a commercially available laser microscope.
  • the surface roughness B represented by Ra is preferably less than 0.3 ⁇ m, more preferably 0.2 ⁇ m or less, and further preferably 0.15 ⁇ m or less from the viewpoint of device mounting.
  • the surface roughness C when expressed in Ra is preferably 0.3 ⁇ m or more, more preferably 0.4 ⁇ m or more, further preferably 0.6 ⁇ m or more, and 1.0 ⁇ m or more. Is particularly preferred. From the viewpoint of withstand voltage characteristics, the surface roughness C when expressed in Ra is preferably 5.0 ⁇ m or less, and more preferably 2.5 ⁇ m or less. Further, Ra is preferably in the above range and the specific surface area is preferably 1.3 or more, more preferably 1.4 or more, and further preferably 1.6 or more. When the value of the specific surface area is large, the adhesive area per unit area becomes large, and the adhesiveness can be improved. From the viewpoint of withstand voltage characteristics, the specific surface area is preferably 5.0 or less, and more preferably 3.0 or less.
  • the relative ratio of the surface roughness A and the surface roughness B when expressed in Ra is not particularly limited.
  • the surface roughness A may be more than 1.0 times to 100 times the surface roughness B.
  • the relative ratio of the surface roughness C and the surface roughness B when expressed in Ra is not particularly limited.
  • the surface roughness A may be more than 1.0 times to 100 times the surface roughness B.
  • the thickness of the circuit is not particularly limited and can be selected according to the application of the circuit sheet and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably 350 ⁇ m or more, and when there is a step of roughening the side surface of the circuit, 400 ⁇ m from the viewpoint of handleability and area control of the roughened portion. The above is more preferable, 500 ⁇ m or more is further preferable, and 1000 ⁇ m or more is particularly preferable from the viewpoint of heat dissipation. From the viewpoint of weight reduction and height reduction, the thickness of the circuit may be 5000 ⁇ m or less. When the thickness of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value. When a part of the circuit is embedded in the insulating layer, the thickness of the embedded part is also included in the thickness of the circuit.
  • the width of the circuit when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like.
  • the width of the circuit may be 100 ⁇ m to 100 mm.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the circuit can be obtained, for example, by processing a metal plate into a circuit state having a desired shape.
  • the processing method is not particularly limited, and can be performed by a known method such as punching, cutting, or etching.
  • the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity, it is preferable to contain copper.
  • the width of the insulating portion when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like.
  • the width of the insulating portion may be 100 ⁇ m to 100 mm.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board manufactured by using the circuit sheet. From the viewpoint of ensuring sufficient insulation, the thickness of the insulating layer is preferably 100 ⁇ m or more, more preferably 150 ⁇ m or more from the viewpoint of ensuring the strength of the insulating layer against thermal shock, and insulation during crimping. From the viewpoint of layer handleability, it is more preferably 200 ⁇ m or more.
  • the thickness of the insulating layer is preferably 500 ⁇ m or less, more preferably 300 ⁇ m or less, and further preferably 250 ⁇ m or less.
  • the insulating portion and the insulating layer are formed of a material having electrical insulating properties (insulating material).
  • insulating material include epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, acrylic resin and the like.
  • the resin contained in the insulating material may be one kind or two or more kinds.
  • the insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
  • the resin contained in the insulating material forming the insulating portion and the resin contained in the insulating material forming the insulating layer may be of the same type (for example, both are epoxy resins) or different types. From the viewpoint of the adhesiveness between the insulating portion and the insulating layer, it is preferable that the resin contained in the insulating material forming the insulating portion and the resin contained in the insulating material forming the insulating layer are the same material.
  • the circuit sheet may be in a state where the element mounting surface is covered with plated metal.
  • the surface roughness of the element mounting surface is reduced.
  • the surface roughness A of the circuit can be made larger than the surface roughness B of the circuit.
  • the element mounting surface may be coated with the plated metal, for example, after the step of roughening the surface (including the element mounting surface and the side surface) of the sheet-shaped circuit.
  • the method for manufacturing a circuit sheet according to the sixth embodiment of the present disclosure includes a step of roughening the surface of the circuit with a protective member attached to one surface of the sheet-shaped circuit. This is a method for manufacturing a circuit sheet, which comprises a step of forming an insulating portion between the circuits in this order.
  • the surface of the circuit is roughened with the protective member attached to one surface of the sheet-shaped circuit.
  • the surface of the circuit that is, the surface including the portion where the circuit is in contact with the insulating portion
  • the portion to which the protective member of the circuit is attached that is, the element mounting surface
  • the method of roughening the surface of the circuit in the above method is not particularly limited.
  • it can be selected from known methods such as chemical treatment, laser irradiation, and blast treatment. From the viewpoint of sufficiently roughening the side surface of the circuit, chemical treatment is preferable.
  • the type of the protective member attached to one surface of the circuit is not particularly limited, and can be selected depending on the method of roughening the surface of the circuit and the like.
  • a protective member having resistance to the chemical solution used may be attached to only one side of the circuit or may be attached to both sides of the circuit.
  • the insulating layer and the insulating portion are attached only to one surface of the circuit (that is, the element mounting surface).
  • the removal of the protective member affixed to one side of the circuit may be performed before the step of forming the insulation between the circuits or after the step of forming the insulation between the circuits. good.
  • the method of forming an insulating portion between the circuits is not particularly limited.
  • the insulating material used for forming the insulating portion of the circuit sheet of the present disclosure described above may be filled, and if necessary, a hardening treatment or the like may be performed to form the insulating material.
  • the above method may include a step of arranging the insulating layer on the surface opposite to the surface to which the protective member of the circuit is attached. This makes it possible to manufacture a circuit sheet in which an insulating layer is arranged on a surface opposite to the element mounting surface of the circuit.
  • the arrangement of the insulating layer is preferably performed after the step of roughening the surface of the circuit, and even if it is performed after the step of forming the insulating portion between the circuits, at the same time as the step of forming the insulating portion between the circuits. It may be done. If the placement of the insulation layer is done after the step of roughening the surface of the circuit, the placement of the insulation layer can ensure good adhesion between the circuit and the insulation layer after the step of forming the insulation between the circuits. In this case, the circuit sheet in which the insulating layer is formed between the circuits and the insulating layer can be crimped, so that the handling property is excellent.
  • the arrangement of the insulating layer is performed at the same time as the step of forming the insulating portion between the circuits, the arrangement of the insulating layer and the formation of the insulating portion can be performed at the same time, so that the work efficiency is excellent.
  • a circuit sheet in which the insulating portion and the insulating layer are different members can be manufactured.
  • a circuit sheet in which at least a part of the insulating portion and the insulating layer is the same member can be manufactured.
  • the details and preferred embodiments of the circuit, insulating portion, and insulating layer used in the above method may be the same as the details and preferred embodiments of the circuit, insulating portion, and insulating layer in the circuit sheet described above.
  • the circuit board of the fifth embodiment of the present disclosure is a circuit board having the circuit sheet of the sixth embodiment described above and a heat radiating member arranged on a surface opposite to the element mounting surface of the circuit sheet.
  • the circuit board is excellent in reliability because peeling does not easily occur between the circuit and the insulating portion.
  • an insulating layer is arranged between the circuit and the heat radiating member.
  • the details and preferred embodiments of the circuit sheet used in the circuit board are the same as the details and preferred embodiments of the circuit sheet, circuit, insulating portion and insulating layer of the present disclosure described above.
  • the type of heat radiating member used for the circuit board is not particularly limited, and can be selected from those generally used for the circuit board. For example, it may be metal, ceramics or the like, and aluminum or copper is preferable from the viewpoint of heat dissipation.
  • the details and preferred embodiments of the circuit sheet used in the method for manufacturing a circuit board are the same as the details and preferred embodiments of the circuit sheet, circuit, insulating portion and insulating layer of the present disclosure described above.
  • the type of heat radiating member used for the circuit board is not particularly limited, and can be selected from those generally used for the circuit board. For example, it may be metal, ceramics or the like, and aluminum or copper is preferable from the viewpoint of heat dissipation.
  • the method of pressurizing the laminate in the above method is not particularly limited, and can be selected from the methods generally performed in the circuit board manufacturing process.
  • the circuit sheet with a case of the seventh embodiment of the present disclosure includes a circuit sheet including a circuit and an insulating portion provided between the circuits, and a case arranged on a heating element mounting surface of the circuit sheet. ..
  • a heating element is mounted in a state where the circuit sheet is arranged on a base plate having heat dissipation property via an insulating layer.
  • the heating element can be mounted in a state where the circuit sheet is not provided with the insulating layer. Thereby, the circuit board can be manufactured regardless of the heat resistance of the insulating layer.
  • the circuit sheet with a case of the present disclosure is provided between a plurality of circuits and the plurality of circuits, and in the circuit, at least a part of a heating element mounting surface on which a heating element is mounted and the heating element mounting surface.
  • the method of manufacturing a circuit board using the circuit board with a case of the present disclosure will be described based on a comparison with a method of manufacturing a circuit board using a conventional circuit board.
  • FIG. 6A shows an example of a manufacturing process of a circuit board using the circuit sheet with a case of the present disclosure.
  • the circuit sheet 190 with a case shown in FIG. 6A (a) includes a circuit 61, a circuit sheet having an insulating portion 62 provided between the circuits 61, and a case 63 arranged on a heating element mounting surface of the circuit sheet. It has.
  • the case 63 is arranged so as to surround the area on which the heating element 64 is mounted.
  • the heating element 64 is mounted on the circuit 61 of the circuit sheet 190 with a case. At this time, heating for melting the solder used for mounting the heating element is performed at, for example, about 300 ° C. After that, as shown in FIG. 6A (c), the case 63 and the heating element 64 are connected by the bonding wire 65.
  • a sealing material is supplied to the portion of the circuit sheet 190 with a case on the heating element mounting surface surrounded by the case 63 to form the sealing portion 66.
  • the insulating layer 67 and the heat radiating member 68 are arranged on the side opposite to the heating element mounting surface of the circuit sheet 190 with a case to obtain a circuit board.
  • the step shown in FIG. 6A (e) is performed after the step shown in FIG. 6A (d), but the step shown in FIG. 6A (d) may be performed after the step shown in FIG. 6A (e).
  • FIG. 6B shows an example of a circuit board manufacturing process using a conventional circuit sheet.
  • the circuit sheet 70 shown in FIG. 6B (a) has a circuit 71 and an insulating portion 72 in common with the present disclosure, but the case 73 is provided on the base plate 80 instead of the circuit sheet 70. It differs from the present disclosure in that it is.
  • the circuit sheet 70 is mounted on the base plate 80 via the insulating layer 77. At this time, heating for melting the solder used for mounting the circuit sheet 70 is performed, for example, at about 300 ° C.
  • the heating element 74 is mounted on the circuit 71 of the circuit sheet 70. At this time, heating for melting the solder used for mounting the heating element is performed at, for example, about 300 ° C. After that, as shown in FIG. 6B (c), the case 73 and the heating element 74 are connected by the bonding wire 75.
  • the sealing material is supplied to the portion surrounded by the case 73 arranged on the base plate 80 to form the sealing portion 76.
  • the heat radiating member 78 is arranged on the surface of the base plate 80 opposite to the surface on which the circuit sheet is mounted via a heat conductive sheet 79 such as TIM (Thermal Interface Material). , The circuit board is obtained.
  • a heat conductive sheet 79 such as TIM (Thermal Interface Material).
  • the circuit board manufacturing method of the present disclosure heating is performed at the solder melting temperature with the insulating layer arranged between the base plate and the circuit sheet.
  • the insulating layer is arranged after heating at the solder melting temperature. Therefore, for example, it becomes possible to use a material that could not be used for the reason of heat resistance as an insulating layer.
  • the circuit board obtained by using the circuit sheet with a case of the present disclosure can reduce the number of members having thermal resistance such as an insulating layer and a solder layer in the thickness direction, which is also advantageous in terms of heat dissipation. Further, the base plate used for the conventional circuit board can be omitted, which is advantageous in terms of productivity.
  • the circuit constituting the circuit sheet with a case can be obtained, for example, by processing a metal plate into a circuit state having a desired shape.
  • the processing method is not particularly limited, and can be performed by a known method such as punching, cutting, or etching.
  • Examples of the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum and the like. From the viewpoint of conductivity and heat dissipation, it is preferable to contain copper.
  • the thickness of the circuit is not particularly limited and can be selected according to the application of the circuit board and the like. From the viewpoint of increasing the current of the circuit board, the thickness of the circuit is preferably 350 ⁇ m or more, more preferably 400 ⁇ m or more, further preferably 500 ⁇ m or more, and particularly preferably 1000 ⁇ m or more. .. The thickness of the circuit may be 5000 ⁇ m or less. When the thickness varies depending on the location of the circuit, the arithmetic mean value of the measured values obtained at the five arbitrarily selected locations may be used as the above value.
  • the thickness of the circuit means the thickness of the circuit itself, and when a part of the circuit is embedded in an adjacent member, the thickness of the embedded portion is also included in the thickness of the circuit.
  • the width and length of the circuit are not particularly limited and may be selected according to the application of the circuit board and the like.
  • the width and length of the circuit may be 350 ⁇ m to 70,000 ⁇ m, respectively.
  • the arithmetic mean value of the measured values obtained at the five arbitrarily selected locations may be used as the above value.
  • the insulating portion constituting the circuit sheet with a case can be formed, for example, by filling the circuit of the circuit sheet with an insulating material having fluidity and curing the insulating material.
  • the insulating material include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, acrylic resin, and polyphenylene sulfide resin.
  • the resin contained in the insulating material may be one kind or two or more kinds.
  • the insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
  • the portion connected to the heating element by the bonding wire may be made of a conductive material, and the other part may be made of an insulating material. Since the case is exposed to heating during mounting of the heating element and formation of the sealing portion, it is preferable that the case has sufficient heat resistance to these heatings.
  • the insulating material constituting the case examples include the above-mentioned resin-containing material as the insulating material for forming the insulating portion of the circuit sheet.
  • the resin contained in the insulating material may be one kind or two or more kinds.
  • the insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
  • the case may be placed on the circuit of the circuit sheet or on the insulation. In some embodiments, the case is placed on top of the circuit on the circuit sheet.
  • the manufacturing process can be simplified as compared with the case where the case is arranged on the heat radiating member under the circuit sheet, for example, and the circuit sheet and the heat radiating base material via the insulating layer can be simplified. Is easy to integrate.
  • the case may be fixed to the circuit sheet using a silicone adhesive or the like.
  • the position where the case is arranged on the heating element mounting surface of the circuit sheet is not particularly limited, and can be set according to the shape of the circuit board and the like.
  • the circuit sheet with a case may further include a heating element arranged on the heating element mounting surface.
  • the type of the heating element is not particularly limited, and may be selected from the components generally used for the circuit board.
  • the heating element is placed on the circuit using a bonding material such as solder.
  • the heating element may be the above-mentioned element.
  • the circuit package of the present disclosure includes a circuit sheet including a circuit and an insulating portion provided between the circuits, a case arranged on the heating element mounting surface of the circuit sheet, and heat generation arranged on the circuit. It includes a body and a sealing portion arranged in a portion surrounded by the case. That is, the circuit package of the present disclosure is in a state in which a sealing portion is formed in a portion of the circuit sheet with a case surrounded by a case.
  • the type of sealing material used to form the sealing portion is not particularly limited. Examples thereof include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, acrylic resin and polyphenylene sulfide resin.
  • the resin contained in the sealing material may be one kind or two or more kinds.
  • the encapsulant may contain components other than the resin, such as an inorganic filler, if necessary.
  • the circuit board of the sixth embodiment of the present disclosure includes the circuit package of the present disclosure described above, and an insulating layer and a heat radiating member arranged on a surface opposite to the heating element mounting surface of the circuit package.
  • the type of insulating layer is not particularly limited.
  • it may contain a resin.
  • the resin contained in the insulating layer may be one type or two or more types.
  • the insulating layer may contain a component other than the resin such as a filler, if necessary.
  • the thickness of the insulating layer is not particularly limited. From the viewpoint of ensuring sufficient insulating properties, the larger the thickness of the insulating layer, the more preferable.
  • the thickness of the insulating layer is preferably 60 ⁇ m or more, more preferably 90 ⁇ m or more, and further preferably 120 ⁇ m or more.
  • the thickness of the insulating layer is preferably 230 ⁇ m or less, more preferably 210 ⁇ m or less, and even more preferably 190 ⁇ m or less.
  • the type of the heat radiating member is not particularly limited, and may be selected from those generally used as the heat radiating member of the circuit board.
  • it may be a member made of a metal such as aluminum, iron, or copper, or ceramics, which has excellent heat dissipation.
  • one surface of the circuit is in contact with the heating element, and the other surface is in contact with the insulating layer. That is, the circuit communicates the heating element and the insulating layer. As a result, it is possible to obtain a structure in which the insulation between the circuits is sufficiently ensured.
  • the circuit board manufacturing method A of the present disclosure includes a step of forming a sealing portion in a portion of the circuit sheet with a case surrounded by the case described above, and a step of forming a sealing portion. It includes a step of arranging an insulating layer and a heat radiating member on the surface opposite to the heating element mounting surface of the circuit sheet with a case.
  • the order of the step of forming the sealing portion and the step of arranging the insulating layer and the heat radiating member is not particularly limited, and any of them may be carried out first.
  • the step of arranging the insulating layer and the heat radiating member is preferably performed after mounting the heating element on the circuit.
  • the circuit board manufacturing method (1) of the present disclosure includes the following steps (1) to (4). However, step (2) is performed before step (3) and step (4), and step (1) is performed before step (3). (1) Step of installing the case on the heating element mounting surface of the circuit sheet (2) Step of mounting the heating element on the circuit of the circuit sheet (3) Surrounded by the case on the heating element mounting surface of the circuit sheet Step of forming a sealing part in the portion (4) Step of arranging an insulating layer and a heat radiating member on the surface opposite to the heating element mounting surface of the circuit sheet.
  • step (2) is performed before steps (3) and (4) and step (1) is performed before step (3)
  • the order of each step is not particularly limited. ..
  • either step (1) or step (2) may be performed first, or any of steps (3) and (4) may be performed first, and the steps (1) and (4) may be performed first. Either may be done first.
  • circuit sheet, case, circuit sheet with case, sealing portion, insulating layer and heat radiating member used in the above methods are as described above. Further, the above method may be a method for manufacturing the circuit board of the present disclosure described above.
  • the method of forming the sealing portion in the portion surrounded by the case is not particularly limited.
  • a material for forming a sealing material can be supplied to a portion surrounded by a case and heated or the like as necessary to form the sealing material.
  • the sealing portion is formed by a method including a step of supplying a sealing material to a portion surrounded by a case without pressure.
  • a non-pressure molding method such a method is also referred to as a "non-pressure molding method”.
  • the sealing portion can be formed with simple equipment as compared with the method involving pressure such as the transfer molding method.
  • the formation of voids in the sealing portion can be suppressed more effectively, which is excellent in terms of reliability.
  • the non-pressurization molding method also includes the case where the encapsulant is pressurized after the encapsulant is supplied. It shall be.
  • the sealing portion is formed by a non-pressure molding method
  • the sealing material supplied to the portion surrounded by the case has fluidity.
  • it may be a fluid solid (particles or the like) or a liquid.
  • the encapsulant supplied to the portion surrounded by the case is in the form of particles, the supplied particles are melted to reduce the voids between the particles from the viewpoint of suppressing the formation of voids in the encapsulating portion. Is preferable.
  • the air existing between the particles can be removed. It is possible to suppress the formation of air bubbles remaining inside the molten encapsulant.
  • the bubbles that could not be suppressed in the depressurizing step are crushed by the pressure, and the formation of voids in the sealing portion can be further suppressed.
  • the method of carrying out the boosting step is not particularly limited. For example, a method may be used in which the opening of the mold whose inside is decompressed is opened to bring the pressure to atmospheric pressure.
  • the depressurization step is preferably performed before the step of melting the insulating material supplied to the inside of the mold (melting step), and the pressurizing step is a melting step. It is preferable to do it later.
  • the method of arranging the insulating layer and the heat radiating member on the surface opposite to the heating element mounting surface of the circuit sheet with a case is not particularly limited. For example, it can be carried out using an adhesive or a screw. Further, for example, a laminated body in which an insulating layer is arranged on a heat radiating member may be produced, and the insulating layer side of the laminated body may be arranged on the side opposite to the heating element mounting surface of the circuit sheet with a case. After arranging the insulating layer on the side opposite to the heating element mounting surface of the circuit sheet with the case, the heat radiating member may be arranged on the insulating layer.
  • the circuit board manufacturing method 1 of the seventh embodiment has a circuit, an insulating layer, and a base having an area larger than the element mounting surface of the circuit and having a surface on which the circuit is arranged via the insulating layer.
  • It has a step of pressurizing the laminated body in a state where a spacer member having substantially the same thickness as the total thickness is arranged on the base substrate so as to be in contact with at least a part of the periphery of the side surface of the circuit and the insulating layer.
  • the laminated body is pressurized without arranging the spacer member as described above, it is not possible to pressurize the element mounting surface of the circuit with high uniformity.
  • the pressure at the time of pressurization varies between the vicinity of the center of the element mounting surface and the peripheral end portion of the element mounting surface, and the pressure is applied to the peripheral end portion of the element mounting surface. Concentration may cause warpage of the manufactured circuit board or peeling of the interface due to the warp.
  • a spacer member having substantially the same thickness as the total thickness of the circuit and the insulating layer is arranged on the base substrate so as to be in contact with at least a part around the side surface of the circuit and the insulating layer. Pressurize the laminate with. As a result, the spacer member is also pressurized together with the laminated body, and the area of the pressurized surface is increased, so that the pressure is suppressed from being concentrated on the peripheral end portion of the element mounting surface, and the element mounting surface. The whole can be pressurized with high uniformity. Therefore, in the circuit board manufactured by the circuit board manufacturing method 1, the occurrence of warpage is suppressed, and the peeling of the interface due to the warp is suppressed.
  • the warp of the base board itself can be suitably suppressed by arranging the spacer member on the base board.
  • the spacer member on the base substrate so as to be in contact with at least a part of the side surface of the circuit and the insulating layer, the amount of flow of the insulating material in the insulating layer can be adjusted, and the manufactured circuit board is predetermined. It is easy to form an insulating layer having the thickness of.
  • the material of the spacer member used in the method for manufacturing the circuit board of the present disclosure is not particularly limited, and a material having heat resistance to the heating temperature when the laminate is heated as needed in the pressurizing step is preferable. ..
  • Examples of the material of the spacer member include fluorine-based rubber, fluorine-based resin such as polytetrafluoroethylene, copper, iron, alloys containing these metals as main components, stainless steel, and metals such as laminates made of these.
  • the thickness of the spacer member is not particularly limited as long as it is substantially the same as the total thickness of the circuit and the insulating layer. From the viewpoint of suitably pressurizing the element mounting surface of the circuit, the thickness of the spacer member is preferably equal to or less than the above-mentioned total thickness, and from the viewpoint of pressurizing the element mounting surface of the circuit with higher uniformity, the thickness of the spacer member.
  • the difference between the thickness and the above-mentioned total thickness is preferably 0 ⁇ m to 250 ⁇ m, more preferably 10 ⁇ m to 250 ⁇ m, and even more preferably 50 ⁇ m to 220 ⁇ m.
  • the ratio of the thickness of the spacer member to the total thickness of the circuit and the insulating layer is preferably 0.75 to 1.0, preferably 0.875 to 0.875. It is more preferably 0.995.
  • the spacer member is provided on the side surface of the circuit and the insulating layer from the viewpoint of suppressing the pressure variation at the peripheral end portion of the element mounting surface and suppressing the inter-layer deviation of the circuit and the insulating layer. It is preferably arranged so as to be in contact with at least two peripheral regions and to sandwich the circuit and the insulating layer, and more preferably to be arranged so as to be in contact with the above-mentioned surroundings.
  • "contacting" means that the circuit, the insulating layer, and the spacer member are arranged at positions where at least a part of the side surface of the circuit and the insulating layer can be in contact with the spacer member, and there is no practical problem of inter-layer deviation.
  • a clearance may be provided between the spacer member and the circuit and the insulating layer to facilitate alignment. Good alignment can be achieved by setting the clearance amount at this time to be within an allowable amount of interlaminar deviation.
  • the spacer member is arranged so as to be in contact with two opposing surfaces of the side surfaces of the circuit and the insulating layer on the base substrate. It is more preferable that the circuit is arranged so as to be in contact with the four sides of the circuit and the insulating layer on the base substrate.
  • the circuit board manufacturing method 1 further includes a step of aligning the circuit and the insulating layer on the base board using a spacer member before pressurizing the laminate.
  • a spacer member arranged so as to be in contact with at least two regions around the side surface of the circuit and the insulating layer and sandwiching the circuit and the insulating layer, preferably a spacer member arranged so as to be in contact with the periphery of the circuit and the insulating layer, and a base.
  • the circuit and the insulating layer on the base substrate may be aligned by aligning with the substrate.
  • the step of pressurizing is preferably performed in a state where a cushion material that can be deformed by pressurization is arranged on the element mounting surface of the circuit.
  • the step of pressurizing may be performed in a state where the cushion material is also arranged on the base substrate side of the laminated body. Further, by using the spacer member in the pressurizing step, it is possible to suppress the deformation of the cushioning material at the time of pressurizing the laminated body, and the number of times the cushioning material is used in manufacturing the circuit board tends to be increased. It is in.
  • cushioning material examples include fluororubber, Teflon (registered trademark), polyethylene terephthalate (PET), polyimide, polyamide, polyamideimide, polyethylene, non-woven fabric, non-woven paper, and their composite layers and laminated materials. ..
  • the method of pressurizing the laminate is not particularly limited.
  • the pressurizing pressure is not particularly limited and can be selected from, for example, the range of 0.1 MPa to 30 MPa. More preferably 0.5 MPa from the viewpoint of reducing the springback of the circuit (the peeling of the interface due to the force that causes the circuit to return to the initial flat shape when the pressure is released) and from the viewpoint of ensuring the adhesiveness. It is ⁇ 15 MPa, more preferably 0.8 MPa ⁇ 15 MPa. From the viewpoint of enhancing the adhesion between the circuit and the insulating layer, it is preferable to heat and pressurize the laminate.
  • the heating temperature of the laminate is not particularly limited and can be selected from, for example, the range of 50 ° C to 290 ° C. From the viewpoint of ensuring adhesiveness and reducing heat damage to the laminate, cushion material, spacer member, etc., the temperature is more preferably 80 ° C. to 250 ° C.
  • the heating time is not particularly limited as long as it is the time required to ensure the adhesiveness, and is preferably 30 seconds to 5 hours. Adhesion may be performed in a short time, and then heat treatment may be performed to cure the adhesive layer in a non-pressurized state. The temperature at this time may be selected from the range of the heating temperature at the time of crimping described above.
  • the device used for pressurizing is not particularly limited, and a flat plate laminator, a vacuum flat plate laminator, a quick press, a flat plate press, a vacuum flat plate press, or the like can be used.
  • the material of the circuit used in the method for manufacturing the circuit board of the present disclosure is not particularly limited as long as it is a conductor, and examples thereof include metal.
  • the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity, the metal preferably contains copper.
  • the thickness of the circuit is not particularly limited and can be selected according to the application of the circuit board and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably 350 ⁇ m or more, more preferably 400 ⁇ m or more, further preferably 500 ⁇ m or more, and 1000 ⁇ m or more from the viewpoint of heat dissipation. Is particularly preferred. From the viewpoint of small size and low profile, the thickness of the circuit may be 5000 ⁇ m or less. When the thickness of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value. When a part of the circuit is embedded in an adjacent member such as an insulating layer, the thickness of the embedded part is also included in the thickness of the circuit.
  • the circuit has a circuit unit and a space other than the circuit unit, and an insulating portion may be provided in at least a part of the space.
  • the element mounting surface can be pressurized with higher uniformity by filling the space with an insulating portion.
  • the element mounting surface and the surface opposite to the element mounting surface may be exposed. Even when the circuit has a vertically symmetrical structure in which the front and back surfaces are exposed, the warp of the manufactured circuit board can be suitably suppressed.
  • the circuit having the above-mentioned space can be obtained, for example, by processing a metal plate into a circuit state having a desired shape.
  • the processing method is not particularly limited, and can be performed by a known method such as punching, cutting, or etching. From the viewpoint of improving the accuracy in circuit fabrication, it is preferable to form the circuit by etching.
  • the etching method of the metal plate is not particularly limited. From the viewpoint of suppressing the occurrence of the tapered portion of the circuit, it is preferable to form the circuit by etching from both sides (that is, two main surfaces facing each other) of the metal plate.
  • the circuit may be roughened.
  • the surface in contact with the insulating layer is at least roughened, it is possible to obtain a state in which the circuit can be sufficiently adhered to the insulating layer while suppressing the generation of voids.
  • the adhesion due to the Van der Waals force can be improved by roughening the surface in contact with the insulating layer of the circuit to improve the pull-out force due to the anchor effect or increase the adhesion area.
  • the method of roughening the circuit is not particularly limited, and it may be performed by a physical method or a chemical method.
  • the physical method includes sanding, sandblasting, laser irradiation, milling and the like.
  • the chemical method include a magdamit treatment, a CZ treatment, a blackening treatment, an etching treatment, a plating treatment and the like.
  • the roughening treatment may be carried out by any one method or a combination of two or more. When two or more kinds are combined, the physical method and the chemical method may be combined, the chemical methods may be combined, or the physical methods may be combined.
  • the insulating materials used for forming the insulating portion include epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, and unsaturated polyester resin. , Materials containing resins such as acrylic resins.
  • the resin contained in the insulating material may be one kind or two or more kinds.
  • the insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
  • the thickness of the above-mentioned insulating portion is not particularly limited and can be selected according to the application of the circuit board and the like.
  • the thickness of the insulating portion (thickness of the insulating portion / thickness of the circuit) with respect to the thickness of the circuit is preferably 0.5 or more, more preferably 0.7 or more, and 0, from the viewpoint of ensuring sufficient insulation. 0.9 or more is more preferable.
  • the thickness of the insulating portion / the thickness of the circuit is preferably 1.0 or less, more preferably 0.99 or less, from the viewpoint of workability of element mounting.
  • the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
  • the insulating layer in the method for manufacturing a circuit board of the present disclosure is a member located between a circuit and a base board in the circuit board.
  • the preferred form of the insulating material used for forming the insulating layer may be the same as the preferred form of the insulating material used for forming the insulating portion.
  • the thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board. From the viewpoint of ensuring sufficient insulating properties, the thickness of the insulating layer is preferably 30 m or more, more preferably 80 ⁇ m or more, and further preferably 120 ⁇ m or more from the viewpoint of imparting thermal shock resistance. ..
  • the thickness of the insulating layer is preferably 500 ⁇ m or less, more preferably 260 ⁇ m or less, and further preferably 220 ⁇ m or less.
  • the base substrate used in the method for manufacturing the circuit board of the present disclosure may be any member as long as the circuit and the insulating layer can be arranged on the base substrate, and may be, for example, a heat dissipation member.
  • the material of the base substrate is not particularly limited, and examples thereof include copper, aluminum, tungsten copper, copper alloys such as molybdenum copper, and nickel-plated copper.
  • the type of the heat radiating member is not particularly limited, and may be a member having a heat radiating function such as a heat spreader or a heat sink, a case having an air or water flow path, a metal foil, a filler resin composite, or the like.
  • the surface of the heat radiating member may be smooth, and may be roughened to improve the adhesiveness with the insulating layer.
  • the circuit board manufacturing method 2 of the seventh embodiment is a method of manufacturing a circuit board that manufactures a circuit board having a circuit, an insulating layer, and a base board in this order, wherein the circuit, the insulating layer, and the base board are manufactured.
  • a laminate in which the base substrate is arranged in this order is prepared, and a spacer member having a thickness substantially equal to the total thickness of the circuit, the insulating layer, and the base substrate is formed with at least a part of the periphery of the side surface of the laminate. It has a step of pressurizing the laminated body in a state of being arranged on the same plane as the laminated body so as to be in contact with each other.
  • spacer members having substantially the same thickness as the total thickness of the circuit, the insulating layer, and the base substrate are arranged on the same plane as the laminated body so as to be in contact with at least a part around the side surface of the laminated body. Pressurize the laminate in this state. As a result, the spacer member is also pressurized together with the laminated body, and the area of the pressurized surface is increased, so that the peripheral end portion of the element mounting surface and the peripheral surface of the surface opposite to the circuit side of the base substrate are applied. The concentration of pressure on the end portion is suppressed, and the entire element mounting surface and the entire surface of the base substrate opposite to the circuit side can be pressurized with high uniformity. Therefore, in the circuit board manufactured by the circuit board manufacturing method 2 of the present disclosure, the occurrence of warpage is suppressed, and the peeling of the interface due to the warp is suppressed.
  • the thickness of the spacer member is not particularly limited as long as it is substantially the same as the total thickness of the circuit, the insulating layer, and the base board. From the viewpoint of suitably pressurizing the element mounting surface of the circuit, the thickness of the spacer member is preferably equal to or less than the above-mentioned total thickness, and from the viewpoint of pressurizing the element mounting surface of the circuit with higher uniformity, the thickness of the spacer member.
  • the difference between the thickness and the above-mentioned total thickness is preferably 0 ⁇ m to 250 ⁇ m, more preferably 10 ⁇ m to 250 ⁇ m, and even more preferably 50 ⁇ m to 220 ⁇ m.
  • the ratio of the thickness of the spacer member to the total thickness of the circuit, the insulating layer and the base substrate shall be 0.75 to 1.0. It is preferably 0.875 to 0.999, and more preferably 0.875 to 0.999.
  • the spacer member is provided around the side surface of the laminated body from the viewpoint of suppressing the pressure variation during pressurization at the peripheral end portion of the element mounting surface and from the viewpoint of suppressing the inter-layer deviation of the circuit and the insulating layer. It is preferably arranged so as to be in contact with at least two regions and sandwich the laminated body, and more preferably to be arranged so as to be in contact with the above-mentioned surroundings.
  • FIGS. 7A to 7C are cross-sectional views of each member in the thickness direction of the laminate 200 or 11 when the laminate 200 or 11 is pressurized by the pressurizing means 105 as shown by an arrow.
  • FIG. 7A is a schematic configuration diagram showing a conventional method for manufacturing a circuit board.
  • the laminate 200 including the circuit 101, the insulating layer 102, and the base substrate 103 in this order is pressurized without arranging the spacer members. Further, in a state where the cushion material 106 facing the element mounting surface side of the circuit and the base substrate side of the laminate is arranged, the pressurization of the laminate 200 by the pressurizing means 105 is performed via the cushion material 106 as shown by an arrow. Is done. At this time, the laminate 200 may be pressurized and heated.
  • FIG. 7B is a schematic configuration diagram showing an example of the circuit board manufacturing method 1.
  • the spacer member 107 having substantially the same thickness as the total thickness of the circuit 101 and the insulating layer 102 is in contact with the periphery of the side surface of the circuit 101 and the insulating layer 102.
  • the laminate 210 including the circuit 101, the insulating layer 102, and the base substrate 104 in this order is pressed while being arranged on the base substrate 104.
  • the spacer member 107 is also pressurized together with the laminated body 210, and the area of the pressurized surface is increased, so that the circumference of the element mounting surface is increased. Since the concentration of pressure on the end portion is suppressed, the occurrence of warpage is suppressed in the circuit board manufactured by the circuit board manufacturing method 1, and the peeling of the interface, springback, etc. due to the warp are suppressed. NS.
  • FIG. 7C is a schematic configuration diagram showing an example of the circuit board manufacturing method 2.
  • the spacer member 108 having substantially the same thickness as the total thickness of the circuit 101, the insulating layer 102, and the base substrate 103 is brought into contact with the periphery of the side surface of the laminated body 200.
  • the laminated body 200 is pressurized while being arranged on the same plane as the laminated body 200.
  • the spacer member 108 is also pressurized together with the laminated body 200, and the area of the pressurized surface is increased, so that the circumference of the element mounting surface is increased. Since pressure is suppressed from being concentrated on the end portion and the peripheral end portion of the surface of the base board opposite to the circuit side, the occurrence of warpage is suppressed in the circuit board manufactured by the circuit board manufacturing method 2. Therefore, peeling of the interface, springback, etc. due to warpage are suppressed.
  • ⁇ Circuit board> In the circuit board of the eighth embodiment of the present disclosure, a circuit, an insulating layer, and a heat radiating member are laminated in this order, the average thickness of the circuit is 500 ⁇ m or more, and the average thickness of the insulating layer is 120 ⁇ m or more. Is what.
  • the circuit board of the present disclosure is excellent in power cycle test. The reason is not clear, but when the circuit, the insulating layer and the heat radiating member are laminated in this order, the average thickness of the circuit is set to 500 ⁇ m or more, and the average thickness of the insulating layer is set to 120 ⁇ m or more. Even if local heat is generated in the circuit, the peeling between the circuit and the insulating layer tends to be suppressed. As a result, it is presumed that the circuit board of the present disclosure will be excellent in the power cycle test.
  • circuit board of the present disclosure will be described with reference to the drawings.
  • the circuit board of the present disclosure is not limited to the following embodiments.
  • the size of the members in the drawings is conceptual, and the relative relationship between the sizes of the members is not limited to the following embodiment.
  • FIG. 8A is a cross-sectional view of the circuit board 220, which is an embodiment of the circuit board of the present disclosure.
  • the circuit 112 in the circuit board 220, the circuit 112, the insulating layer 113, and the heat radiating member 115 are laminated in this order.
  • the cross section of the circuit 112 has a trapezoidal shape in which the side of the circuit 112 in contact with the insulating layer 113 is short and the side of the circuit 112 opposite to the side in contact with the insulating layer 113 is long.
  • the average thickness of the circuit 112 is set to 500 ⁇ m or more from the viewpoint of promoting heat diffusion using the circuit, and is preferably 1000 ⁇ m or more in order to further improve the characteristics for the power cycle test, and is preferably 1500 ⁇ m or more. It is more preferable that it is 2000 ⁇ m or more, and it is further preferable that it is 2000 ⁇ m or more.
  • the average thickness of the circuit 112 The heat is preferably 5000 ⁇ m or less, and more preferably 3000 ⁇ m or less.
  • the thickness of the circuit 112 means the thickness of the circuit 112 itself, and when a part of the circuit 112 is embedded in the insulating layer 113, the thickness of the embedded portion is also included in the thickness of the circuit 112.
  • the width and length of the circuit 112 are not particularly limited and may be selected according to the application of the circuit board and the like.
  • the width and length of the circuit 112 may be 350 ⁇ m to 70,000 ⁇ m, respectively.
  • the arithmetic mean value of the measured values obtained at the five arbitrarily selected locations may be used as the above value.
  • the surface roughness of the circuit 112 facing the insulating layer 113 should be 0.5 ⁇ m or more in order to increase the adhesive strength between the circuit 112 and the insulating layer 113 and improve the characteristics of the circuit board for further power cycle tests. It is preferably 0.6 ⁇ m or more, and more preferably 0.7 ⁇ m or more. From the viewpoint of insulation, the surface roughness of the circuit 112 on the side facing the insulating layer 113 may be 5.0 ⁇ m or less.
  • the surface roughness of the circuit 112 on the side opposite to the side facing the insulating layer 113 is preferably less than 0.2 ⁇ m, more preferably 0.18 ⁇ m or less. It is more preferably 0.15 ⁇ m or less.
  • the lower limit of the surface roughness on the side of the circuit 112 facing the insulating layer 113 is not particularly limited.
  • the surface roughness refers to the arithmetic mean roughness Ra.
  • the average roughness Ra is a value obtained based on JIS B 0601: 2013. Specifically, it is a value measured using a 3D microscope (for example, VR-3200 manufactured by KEYENCE, magnification 12 times).
  • the surface roughness of the circuit 112 facing the insulating layer 113 may be a value measured before the circuit 112 comes into contact with the insulating layer 113 or a precursor of the insulating layer 113 such as a resin composition. Alternatively, it may be a value measured for the circuit 112 obtained by removing the insulating layer 113 and the heat radiating member 115 from the circuit board 220.
  • the material of the circuit 112 is not particularly limited, and examples thereof include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite.
  • the surface of the circuit 112 may be roughened.
  • the method for roughening the surface of the circuit 112 is not particularly limited, and the surface may be roughened by a physical method or a chemical method.
  • physical methods include sanding, sandblasting, laser irradiation, and milling.
  • chemical method include a MacDermid treatment, a CZ treatment, a blackening treatment, an etching treatment, a plating treatment and the like.
  • the roughening treatment may be carried out by any one method or a combination of two or more. When two or more kinds are combined, the physical method and the chemical method may be combined, the chemical methods may be combined, or the physical methods may be combined.
  • the circuit 112 has a surface area on the side of the circuit 112 facing the insulating layer 113. It is preferable that the surface surface of the circuit 112 facing the insulating layer 113 is larger than that of the circuit 112 facing the insulating layer 113, and the surface surface of the circuit 112 facing the insulating layer 113 facing the insulating layer 113 of the circuit 112.
  • the ratio to the surface area on the side is preferably 1.001 to 10.0, more preferably 1.01 to 5.0, and even more preferably 1.02 to 4.0.
  • the surface area of the circuit 112 facing the insulating layer 113 and the surface area of the circuit 112 facing the insulating layer 113 serve as a precursor of the insulating layer 113 or the insulating layer 113 such as a resin composition.
  • the shape of each circuit surface is quantified using a length measuring device to obtain the surface area. It can be measured by the conversion method.
  • the insulating layer 113 contains a resin.
  • the resin contained in the insulating layer 113 is not particularly limited, and examples thereof include curable resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, acrylic resin, and amideimide resin.
  • the resin contained in the insulating layer 113 may be one type or two or more types.
  • the insulating layer 113 preferably contains at least one selected from the group consisting of epoxy resin, silicone resin, and urethane resin.
  • the insulating layer 113 preferably contains at least one selected from the group consisting of epoxy resin, acrylic resin, and amidimide resin.
  • the epoxy resin is preferable among the above resins.
  • the epoxy resin may be combined with a curing agent.
  • a phenol curing agent such as phenol novolac resin is preferable.
  • the mesogen structure includes, for example, a biphenyl structure, a phenylbenzoate structure, a cyclohexylbenzoate structure, an azobenzene structure, a stilbene structure, a terphenyl structure, an anthracene structure, derivatives thereof, and two or more of these mesogen structures via a linking group. Examples include combined structures.
  • the epoxy resin having a mesogen structure may contain an epoxy compound having one or more structures represented by the following general formula (I).
  • R 1 to R 4 independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
  • R 1 to R 4 are each independently preferably a hydrogen atom or an alkyl group having 1 to 2 carbon atoms, more preferably a hydrogen atom or a methyl group, and even more preferably a hydrogen atom.
  • 2 to 4 of R 1 to R 4 are hydrogen atoms, more preferably 3 or 4 are hydrogen atoms, and further, all 4 are hydrogen atoms. preferable.
  • any one of R 1 to R 4 is an alkyl group having 1 to 3 carbon atoms, it is preferable that at least one of R 1 and R 4 is an alkyl group having 1 to 3 carbon atoms.
  • Examples of the epoxy compound having the structure represented by the general formula (I) include the epoxy compound represented by the following general formula (M).
  • R 1 ⁇ R 4 in the general formula (M) is the same as the specific examples of R 1 ⁇ R 4 in formula (I), is the same preferred ranges thereof.
  • the insulating layer 113 may contain a component other than the resin such as a filler, if necessary.
  • a filler include a non-conductive filler and a conductive filler.
  • the non-conductive filler include aluminum oxide (alumina), magnesium oxide, aluminum nitride, boron nitride, silicon nitride, silica (silicon oxide), aluminum hydroxide, barium sulfate and the like.
  • the conductive filler include gold, silver, nickel, copper and the like.
  • the filler is preferably at least one selected from the group consisting of aluminum oxide (alumina), boron nitride, magnesium oxide, aluminum nitride and silica (silicon oxide), and boron nitride. It is more preferable that it is at least one selected from the group consisting of aluminum oxide (alumina) and aluminum oxide (alumina).
  • the filler one type may be used alone or two or more types may be used in combination.
  • "using two or more kinds of fillers together” means, for example, when two or more kinds of fillers having the same component but different average particle diameters are used, when two or more kinds of fillers having the same average particle size but different components are used, and when the average. There are cases where two or more types of fillers having different particle sizes and types are used.
  • the shape of the filler is not particularly limited, and examples thereof include powder, spherical, and fibrous.
  • insulating layer 113 Other components that may be contained in the insulating layer 113 include a curing accelerator, a silane coupling agent, a stress relaxant, a colorant, a flame retardant, an antifoaming agent, and the like. As for each component which may be contained in the insulating layer 113, one type may be used alone or two or more types may be used in combination.
  • the average thickness of the insulating layer 113 is 120 ⁇ m or more, preferably more than 200 ⁇ m, more preferably 210 ⁇ m or more, and further preferably 230 ⁇ m or more.
  • the average thickness of the insulating layer 113 is preferably 500 ⁇ m or less, and more preferably 310 ⁇ m or less.
  • the thermal conductivity of the insulating layer 113 is preferably 6 W / (m ⁇ K) or more, more preferably 8 W / (m ⁇ K) or more, and preferably 10 W / (m ⁇ K) or more. More preferred.
  • the upper limit of the thermal conductivity is not particularly limited, and may be, for example, 50 W / (m ⁇ K) or less.
  • the thermal conductivity of the insulating layer 113 is measured as follows. The thermal diffusivity of the insulating layer 113 is evaluated by the xenon flash method (for example, trade name: LFA447 nanoflash of NETZSCH).
  • the thermal conductivity of the insulating layer 113 is calculated from the product of this value, the density measured by the Archimedes method, and the specific heat measured by DSC (differential scanning calorimetry device; for example, a trade name of PerkinElmer: DSC Pyris1). Ask.
  • the glass transition temperature (Tg) of the insulating layer 113 is preferably 170 ° C. or higher, more preferably 180 ° C. or higher, and further preferably 250 ° C. or higher in order to further improve the characteristics for the power cycle test. preferable.
  • the Tg of the insulating layer 113 is not even limited.
  • the glass transition temperature of the insulating layer 113 refers to a value measured using a differential scanning calorimetry device (DSC). For example, a part of the insulating layer 113 is weighed in an aluminum pan, and a differential scanning calorimeter (DSC) (“DSC8500”, PerkinElmer) is used to set the temperature at which the baseline changes (secondary transition) to the glass transition temperature. May be regarded as.
  • the type of the heat radiating member 115 is not particularly limited, and examples thereof include a metal plate and a metal foil.
  • the heat radiating member 115 may be a member exhibiting a heat radiating function such as a heat spreader.
  • the material of the heat radiating member 115 is not particularly limited, and examples thereof include copper, aluminum, tungsten copper, copper alloys such as molybdenum copper, and nickel-plated copper.
  • the average thickness of the heat radiating member 115 is preferably 100 ⁇ m or more from the viewpoint of improving heat radiating property, more preferably 1000 ⁇ m or more from the viewpoint of obtaining effective heat radiating property, and the heat capacity of the heat radiating member and the thickness of the circuit. It is more preferably 1800 ⁇ m or more from the viewpoint of obtaining high heat dissipation utilizing efficient heat diffusion utilizing the heat. On the other hand, from the viewpoint of small size and low profile, the average thickness of the heat radiating member 115 is preferably 10 cm or less, and more preferably 5000 ⁇ m or less.
  • the surface roughness of the heat radiating member 115 facing the insulating layer 113 is 0 in Ra. It is preferably 5.5 ⁇ m or more, more preferably 0.6 ⁇ m or more, and further preferably 0.8 ⁇ m or more. From the viewpoint of insulation, the surface roughness of the heat radiating member 115 on the side facing the insulating layer 113 may be 5.0 ⁇ m or less.
  • the surface roughness of the heat radiating member 115 on the side opposite to the side facing the insulating layer 113 is preferably less than 0.2 ⁇ m in Ra, and preferably 0.18 ⁇ m or less. More preferably, it is 0.15 ⁇ m or less.
  • the lower limit of the surface roughness of the heat radiating member 115 on the side opposite to the side facing the insulating layer 113 is not particularly limited.
  • the surface roughness of the heat radiating member 115 facing the insulating layer 113 and the surface roughness of the heat radiating member 115 facing the insulating layer 113 are the surfaces of the circuit 112 facing the insulating layer 113.
  • the roughness and the surface roughness on the side opposite to the side facing the insulating layer 113 of the circuit 112 can be measured in the same manner.
  • the total average thickness of the circuit 112 and the heat dissipation member 115 is preferably 600 ⁇ m or more, and heat dissipation using the thickness of the circuit and heat dissipation using the heat capacity of the heat dissipation member are used. From the viewpoint of obtaining properties, it is more preferably 1200 ⁇ m or more, and further preferably 4000 ⁇ m or more from the viewpoint of obtaining more efficient heat dissipation.
  • the total average thickness of the circuit 112 and the heat radiating member 115 is preferably 10 cm or less, more preferably 10,000 ⁇ m or less, and further preferably 6000 ⁇ m or less.
  • the ratio of the average thickness of the circuit 112 to the average thickness of the heat dissipation member 115 is preferably 1.0 to 30, preferably 1.0. It is more preferably ⁇ 5.0, and even more preferably 1.0 to 3.0.
  • the coefficient of thermal expansion of the circuit 112 and the coefficient of thermal expansion of the heat radiating member 115 may be the same or different.
  • the coefficient of thermal expansion of the circuit 112 or the heat radiating member 115 means the coefficient of thermal expansion of the material constituting the circuit 112 or the heat radiating member 115.
  • the coefficient of thermal expansion of the circuit 112 or the heat radiating member 115 means the coefficient of thermal expansion of copper.
  • the ratio of the coefficient of thermal expansion of the circuit 112 to the coefficient of thermal expansion of the heat dissipation member 115 is preferably 0.5 to 2.0, more preferably 0.55 to 1.8. , 0.6 to 1.7, more preferably.
  • the breaking voltage between the circuit 112 and the heat radiating member 115 is preferably 2.5 kV or more, more preferably 3.0 kV or more, and even more preferably 3.5 kV or more.
  • the breaking voltage between the circuit 112 and the heat radiating member 115 is a value obtained by applying the breaking voltage between the circuit and the heat radiating member at 100 V / sec and measuring the potential difference when a short circuit occurs.
  • the partial discharge start voltage between the circuit 112 and the heat radiating member 115 is preferably 2.5 kV or more, more preferably 3.0 kV or more, and even more preferably 3.5 kV or more.
  • the partial discharge start voltage between the circuit 112 and the heat radiating member 115 refers to a value measured by the method of the measurement standard IEC 60664-1.
  • the method for manufacturing the circuit board of the eighth embodiment of the present disclosure is not particularly limited, and a conventionally known method can be used.
  • a resin sheet for example, a resin sheet is arranged between a pair of metal plates, and if necessary, a curing treatment is performed to form the resin sheet as an insulating layer 113, and then a circuit is formed on one of the pair of metal plates by etching or the like.
  • Examples thereof include a method of removing the body and performing a curing treatment as necessary to form the resin sheet as the insulating layer 113. Further, as a method of using the liquid resin composition, for example, the liquid resin composition is applied to the surface of the metal plate, dried to form a resin composition layer, and then the metal plate is arranged on the resin composition layer. If necessary, a curing treatment is performed to form the resin composition layer as the insulating layer 113, and then the circuit 112 is patterned on one of the pair of metal plates by etching or the like.
  • a circuit 112 formed by a known method such as punching or cutting is arranged on the surface of the resin sheet arranged on the heat radiating member 115, and curing treatment is performed as necessary.
  • a method of using the resin sheet as the insulating layer 113 may be used.
  • the method of applying the liquid resin composition to the surface of the metal plate is not particularly limited.
  • a dispense method, a spray method, a gravure method, a screen printing method, a screen printing method using a metal mask, a transfer method and the like can be used.
  • the liquid resin composition may be liquid at least at the time of application to the metal plate.
  • the viscosity of the liquid resin composition is not particularly limited, and for example, the viscosity when applied to a metal plate is preferably 10 Pa ⁇ s or less.
  • the viscosity of the liquid resin composition is determined by an E-type viscometer (for example, Toki Sangyo Co., Ltd., TV- It is a value measured at 5 rotations / minute (rpm) using 33).
  • the heating temperature is not particularly limited and can be selected from, for example, the range of 50 ° C. to 250 ° C.
  • the pressurizing pressure is not particularly limited and can be selected from, for example, the range of 0.1 MPa to 50 MPa.
  • the semiconductor device of the present disclosure includes the circuit board and the semiconductor element of the eighth embodiment of the present disclosure.
  • semiconductor elements include elements such as active elements and passive elements.
  • active elements include semiconductor chips, transistors, diodes, thyristors and the like.
  • passive element include a capacitor, a resistor, a coil and the like. It can also be applied to electronic components that are modularized by incorporating a plurality of elements such as these active elements and passive elements.
  • a power semiconductor package such as an IGBT (Insulated Gate Bipolar Transistor; Insulated Gate Bipolar Transistor) Can be suitably used for the above-mentioned applications.
  • IGBT Insulated Gate Bipolar Transistor
  • the circuit sheet of the eighth embodiment of the present disclosure is provided between a plurality of circuits and the plurality of circuits, and in the circuit, at least a part of an element mounting surface on which an element is mounted and the element mounting surface.
  • the surface of the insulating portion on the side opposite to the element mounting surface has an insulating portion that holds relative positions of the plurality of circuits so that at least a part of the surface on the opposite side is exposed.
  • the insulating layer is on the side opposite to the element mounting surface in the circuit sheet.
  • the gas between the circuit sheet and the insulating part escapes to the outside of the circuit sheet through the recessed portion, so that air bubbles are trapped at the interface between the circuit sheet and the insulating part. Is suppressed. As a result, it is possible to suppress the occurrence of partial discharge on the circuit board, deterioration of insulation resistance, and the like.
  • the maximum value of the distance between the surface of the insulating portion and the surface opposite to the element mounting surface of the circuit is preferably 20 ⁇ m or less, preferably 15 ⁇ m or less, from the viewpoint of the adhesiveness between the insulating layer and the insulating portion. Is more preferable.
  • the maximum value of the above-mentioned distance is preferably 1 ⁇ m or more from the viewpoint of preferably suppressing trapping of air bubbles at the interface between the circuit sheet and the insulating portion.
  • the maximum value of the above-mentioned distance may be adjusted by, for example, removing the surface of the circuit by etching treatment or the like, or removing the surface of the insulating portion preferentially over the surface of the circuit by blasting treatment or the like.
  • the circuit sheet 230 includes a circuit 121 and an insulating portion 122 provided between the circuits 121, and the surface of the insulating portion 122 on the side opposite to the element mounting surface is an element of the circuit 121. It is recessed toward the element mounting surface rather than the surface opposite to the mounting surface.
  • the periphery of the circuit 121 is covered with the insulating portion 122, and the insulating portion 122 is located on the outer periphery of the circuit sheet 230.
  • the gas between the circuit sheet 230 and the insulating portion 122 preferably escapes to the outside of the circuit sheet 230 through the recessed portion described above, so that air bubbles are generated at the interface between the circuit sheet 230 and the insulating portion 122. Is preferably suppressed from being trapped.
  • circuit sheet of the eighth embodiment the circuit board including the circuit sheet of the eighth embodiment, and the method of manufacturing the circuit board using the circuit sheet of the eighth embodiment are the same as those of the above-described embodiments. Therefore, the description thereof will be omitted.
  • the circuit sheet of the ninth embodiment of the present disclosure is provided between a plurality of circuits and the plurality of circuits, and in the circuit, at least a part of the heating element mounting surface and opposite to the heating element mounting surface. It has an insulating portion that holds the relative positions of the plurality of circuits so that at least a part of the side surface is exposed, and the height of the surface of the circuit opposite to the heating element mounting surface.
  • the height variation of the surface opposite to the heating element mounting surface is 40 ⁇ m or less per 10 mm in the plane direction, so that the height of the surface opposite to the heating element mounting surface in the circuit is Variations are suppressed.
  • the warp of the circuit sheet is also suppressed.
  • the circuit board and the insulating layer are bonded to each other to manufacture a circuit board, cracks due to the warp of the circuit sheet and peeling of the interface are suppressed. can do.
  • the variation in the height of the surface opposite to the heating element mounting surface in the circuit is It is preferably 30 ⁇ m or less, and more preferably 20 ⁇ m or less per 10 mm in the plane direction. From the viewpoint of the productivity of the circuit sheet, the above-mentioned height variation is preferably 5 ⁇ m or more per 10 mm in the plane direction.
  • the circuit sheet 240 of the present disclosure includes a plurality of circuits 131 and an insulating portion 132 that holds the relative positions of the plurality of circuits 131.
  • the height variation of the surface opposite to the heating element mounting surface is 40 ⁇ m or less per 10 mm in the plane direction.
  • the variation in height of the surface opposite to the heating element mounting surface satisfies H ( ⁇ m) / L (mm) ⁇ 40 ( ⁇ m) / 10 (mm) when H ⁇ m per L mm in the plane direction.
  • circuit sheet of the ninth embodiment the circuit board including the circuit sheet of the ninth embodiment, and the method of manufacturing the circuit board using the circuit sheet of the ninth embodiment are the same as those of the above-described embodiments. Therefore, the description thereof will be omitted.
  • the circuit sheet of the tenth embodiment of the present disclosure is provided between a plurality of circuits and the plurality of circuits, and in the circuit, at least a part of the heating element mounting surface and opposite to the heating element mounting surface. It has an insulating portion that holds the relative positions of the plurality of circuits so that at least a part of the side surface is exposed, and the variation in the height of the heating element mounting surface of the circuit is per 10 mm in the plane direction. It is a circuit sheet having a size of 40 ⁇ m or less.
  • the variation in the height of the heating element mounting surface of the circuit is 40 ⁇ m or less per 10 mm in the plane direction, the variation in the height of the heating element mounting surface in the circuit is suppressed. This facilitates the arrangement of the heating element, the connection between the heating element and the bonding wire, and the like, and improves the workability of element mounting.
  • the variation in the height of the heating element mounting surface in the circuit is preferably 30 ⁇ m or less, and more preferably 20 ⁇ m or less per 10 mm in the plane direction. From the viewpoint of the productivity of the circuit sheet, the above-mentioned height variation is preferably 5 ⁇ m or more per 10 mm in the plane direction.
  • the circuit sheet 250 of the present disclosure includes a plurality of circuits 141 and an insulating portion 142 that holds the relative positions of the plurality of circuits 141.
  • the variation in height of the heating element mounting surface is 40 ⁇ m or less per 10 mm in the plane direction.
  • H' ⁇ m per L'mm in the plane direction H'( ⁇ m) / L'(mm) ⁇ 40 ( ⁇ m) / 10 (mm) is satisfied.
  • circuit sheet of the tenth embodiment the circuit board including the circuit sheet of the tenth embodiment, and the method of manufacturing the circuit board using the circuit sheet of the tenth embodiment are the same as those of the above-described embodiments. Therefore, the description thereof will be omitted.
  • the circuit sheet with a case of the eleventh embodiment of the present disclosure includes a plurality of circuits, a holding unit provided on one surface side of the plurality of circuits, and a holding unit for holding the relative positions of the plurality of circuits. It has a case provided on the top and surrounds the plurality of circuits when viewed from one surface side of the circuits, and the other surface of the plurality of circuits is exposed.
  • a circuit sheet including a plurality of circuits and a holding unit (for example, a holding sheet) for holding relative positions of the plurality of circuits provided on one surface side of the plurality of circuits is easily deformed, and the plurality of circuits There is a problem that the handleability is poor when the is attached to the insulating layer or the like arranged on the heat radiating member.
  • the circuit sheet with a case of the present disclosure since a case surrounding a plurality of circuits is arranged on the heating element mounting surface of the circuit sheet, the circuit sheet is not easily deformed and an insulating layer arranged on the heat radiating member. And the circuit sheet with a case can be easily attached, and the handling property is excellent.
  • the holding portion can be peeled off from a plurality of circuits.
  • the holding portion provided on one surface side of the plurality of circuits can be peeled off from the plurality of circuits.
  • a heating element or the like may be mounted on one surface side of a plurality of circuits, wire bonding or the like may be performed, or the mounted heating element may be sealed with a sealing material.
  • the case When the holding portion provided on one surface side of a plurality of circuits is peeled off from the plurality of circuits, the case may be peeled off together with the holding portion, and the holding portion of the portion provided with the case remains on the circuit sheet with the case.
  • the holding portion provided on one surface of the plurality of circuits may be separated from the plurality of circuits.
  • At least a part of one surface of the plurality of circuits is a heating element mounting surface on which the heating element is mounted. Further, an insulating portion may be provided between the plurality of circuits, and the insulating portion may not be provided.
  • the method for manufacturing a circuit board according to a ninth embodiment of the present disclosure includes the cased circuit sheet of the eleventh embodiment of the present disclosure and the insulation arranged on the exposed other surface side of the circuit in the cased circuit sheet. It has a step of pressurizing a laminated body in which a layer and a heat radiating member are arranged in this order.
  • the method of pressurizing the above-mentioned laminate is not particularly limited, and can be selected from the methods generally performed in the manufacturing process of the circuit board, and the method described in other embodiments may be appropriately adopted.
  • the holding portion can be peeled from a plurality of circuits, and it is preferable to further have a step of peeling the holding portion from one surface of the plurality of circuits after the step of pressurizing.
  • a heating element or the like can be mounted on one surface side of a plurality of circuits, wire bonding or the like can be performed, and then the mounted heating element or the like can be sealed with a sealing material. Can be done.
  • Example 1A (Making a circuit sheet)
  • the circuit of FIG. 1 was formed by etching a copper plate (model number; C1100 1 / 4H) having a thickness of 2.0 mm with an aqueous solution of cupric chloride.
  • a step with a width of 510 ⁇ m was provided around the circuit.
  • a step (width 1.0 mm) was provided for connecting the insulating portion provided inside the circuit and the insulating portion provided outside the rotating portion. The thickness of these steps was 1 mm.
  • Ra on the side surface and the step of the circuit was 2.0 ⁇ m, respectively.
  • a 25 ⁇ m polyimide film (elastic modulus; 5 GPa) and an adhesive layer (thickness: 10 ⁇ m) are laminated on the element mounting surface of the circuit in which a step is formed, and the circuit sheet with the protective film is attached. bottom.
  • transfer molding was performed using an epoxy-based insulating material (Hitachi Kasei Co., Ltd.) under the conditions of a molding pressure of 7 MPa and a curing time of 300 seconds. The thickness of the insulating portion was 1.99 mm.
  • the circuit sheet obtained above is dried, a protective film is reattached to one surface of the circuit sheet, and a roughening solution (manufactured by MacDermid Performance Solutions, trade name; Multibond 150) is used to reattach the circuit sheet.
  • the roughening treatment was performed so that Ra on the other surface of the above was 1.0 ⁇ m.
  • the protective film was peeled off from the circuit sheet. The Ra of the surface from which the protective film was peeled off was measured and found to be 0.2 ⁇ m.
  • a 2.0 mm thick copper plate (model number; C1100 1 / 4H) was prepared as a heat radiating member, and one surface of the copper plate was subjected to the same roughening treatment as described above. After the roughening treatment, Ra on one surface of the copper plate was 1.0 ⁇ m.
  • the heat-dissipating member, the film for forming the insulating layer (manufactured by Hitachi Kasei Co., Ltd., HT1500), and the circuit sheet from which the protective film has been peeled off are removed in this order so that the surface of the heat-dissipating member that has been roughened is on the side of the film for forming the insulating layer. After laminating, pressure-bonding was performed under the conditions of 180 ° C. for 3 hours and 4 MPa to prepare a circuit board.
  • Example 2A In Example 1A, a step with a width of 1000 ⁇ m was provided around the circuit. Further, a step (width 510 ⁇ m) for connecting the insulating portion provided inside the circuit and the insulating portion provided outside the rotating portion is provided, the thickness of these steps is set to 0.5 mm, and the side surface of the circuit is set. A circuit sheet was produced in the same manner as in Example 1A except that Ra of the step was set to 1.0 ⁇ m.
  • a circuit board was prepared in the same manner as in Example 1A.
  • the element mounting could be performed well.
  • the circuit was put into water, which is a substitute for silicon gel, and heated to 80 ° C., no bubbles were generated from the boundary between the circuit and the insulating part.
  • a voltage of 1.0 kV was applied between the circuit and the heat radiating member, the insulation resistance was good without breaking the insulation.
  • a voltage of 1.0 kV was applied between adjacent circuits, the insulation resistance was good without breaking the insulation.
  • Example 1A A circuit sheet was produced in the same manner as in Example 1A except that no step was provided in Example 1A.
  • a circuit board was prepared in the same manner as in Example 1A. While the device could be mounted well on the manufactured circuit board, when the circuit was put into water, which is a substitute for silicon gel, and heated to 80 ° C, bubbles were generated from the boundary between the circuit and the insulating part. bottom. When a voltage of 1.0 kV was applied between adjacent circuits, dielectric breakdown did not occur, but partial discharge occurred at 0.8 kV. When a voltage of 1.0 kV was applied between the circuit and the heat radiating member, dielectric breakdown occurred at 0.7 kV. When the cross section of the circuit board was cut and the cut surface was observed, the insulating part near the boundary between the circuit and the insulating part was damaged.
  • Example 1C Circuit fabrication
  • a circuit was formed by etching a copper plate (model number; C1100 1 / 4H) having a thickness of 2.0 mm.
  • the circuit sheet was placed on a flat surface, and the height at the center and the heights at the four corners were measured using a height gauge. At this time, the circuit sheet is arranged so that the central portion is convex.
  • the amount of warpage was calculated by the following formula and evaluated according to the following evaluation criteria.
  • (Amount of warpage) (Height at the center)-(Average height at the four corners) [Evaluation criteria]
  • B The amount of warpage of the circuit sheet is more than 50 ⁇ m, which is defective.
  • the amount of warpage of the circuit sheet obtained in Example 1C was measured, the amount of warpage was 30 ⁇ m, and the warp evaluation was good.
  • Example 2C to 12C A circuit sheet was produced in the same manner as in Example 1C except that the thickness of the copper plate and the pattern shape of the circuit were changed as shown in Table 1. In all the examples, the variation in thickness was within ⁇ 5 ⁇ m. The results of the warp evaluation are shown in Table 1.
  • Example 1C a circuit sheet was produced in the same manner except that the pattern shape was shown in FIG. 3H. The variation in thickness was within ⁇ 5 ⁇ m. The amount of warpage of the circuit sheet was 190 ⁇ m, and the warp evaluation was poor.
  • the circuit sheet shown in FIGS. 3D to 3G is at least one on a straight line in an arbitrary direction that passes between the two circuits 31 and is parallel to the element mounting surface when viewed from the element mounting surface of the circuit 31.
  • the circuit 31 was located.
  • the circuit sheets shown in FIGS. 3H to 3J pass between the two circuits 31 and are on at least one straight line parallel to the element mounting surface when viewed from the element mounting surface of the circuit 31. Had a configuration that did not exist.
  • Examples 1C to 12C since the circuit sheet has any of the structures shown in FIGS. 3D to 3G, it was possible to suppress the occurrence of warpage of the circuit sheet.
  • Example 13C A film for forming an insulating layer (Hitachi Kasei Co., Ltd., HT1500) was placed on one surface of a 2.0 mm thick copper plate (model number; C1100 1 / 4H) as a heat radiating member, and temporarily crimped using a laminator. Further, the circuit sheet prepared in Example 1C was placed on the insulating layer and pressure-bonded under the conditions of 180 ° C. for 3 hours and 4 MPa. The circuit board was arranged so that the central portion of the circuit sheet was convex in the direction opposite to the insulating layer. When the thickness of the circuit board including the heat radiating member was measured by the same method as in Example 1C, the variation was ⁇ 5 ⁇ m. When the amount of warpage of the circuit board was measured by the same method as in Example 1C, it was 25 ⁇ m, and the warp evaluation was good.
  • Example 14C, 15C In Example 13C, a circuit board was produced in the same manner except that the pattern shape, the thickness of the circuit sheet, and the thickness of the heat radiating member were changed as shown in Table 2. In each case, the thickness variation was within ⁇ 5 ⁇ m. The amount of warpage of the circuit board was also 50 ⁇ m or less, and the warp evaluation was good.
  • Example 16C In Example 13C, a circuit board was produced by the same method except that the space between the circuits was not filled with an insulating portion. The amount of warpage of the circuit board was 22 ⁇ m, and the warp evaluation was good.
  • Example 17C In Example 16C, a circuit board was produced in the same manner except that the pattern shape, the thickness of the circuit sheet, and the thickness of the heat radiating member were changed as shown in Table 2. The warp of the circuit board was 50 ⁇ m or less, and the warp evaluation was good.
  • Example 13C a circuit board was produced in the same manner except that the pattern shape, the thickness of the circuit sheet, and the thickness of the heat radiating member were changed as shown in Table 2. In each case, the thickness variation was within ⁇ 5 ⁇ m, but the warp of the circuit board was also larger than 50 ⁇ m, and the warp evaluation was poor.
  • Example 1D Circuit fabrication
  • a circuit having a width of 3.0 mm, a length of 10 mm, and a height of 2.0 mm was formed by punching with a press using a copper plate having a thickness of 2.0 mm (model number: C1100 1 / 4H).
  • One surface (element mounting surface) of the circuit was a flat surface intersecting the cut surface of the copper plate at a right angle, and the other surface had a radius of curvature of the corner portion of 0.03 mm.
  • the adhesive layer side of the protective film in which a polyimide film (flexural modulus; 5 GPa) having a thickness of 25 ⁇ m and an adhesive layer (thickness: 10 ⁇ m) was laminated was attached to the element mounting surface side of the formed four circuits.
  • An insulating part was formed by transfer molding between the circuits to which the protective film was attached. Specifically, the circuit is sandwiched between a pair of molds A and B heated to 180 ° C. of the transfer molding machine, and epoxy-based insulation is applied so as to cover between the circuits and around the circuit while keeping the molds parallel.
  • the material manufactured by Hitachi Kasei Co., Ltd.
  • the material was filled with a molding pressure of 7 MPa and cured with a curing time of 300 seconds.
  • the protective film was peeled off to obtain a circuit sheet.
  • the protective film was in the form of a film and could be easily peeled off. The warp of the circuit sheet did not interfere with the pressure lamination.
  • Example 2D to 6D> A circuit sheet was produced in the same manner as in Example 1D except that the circuit processing method, the circuit thickness, the protective film thickness, and the flexural modulus were changed as shown in Table 3. In each of Examples 2D to 6D, the protective film could be easily peeled off. The warp of the circuit sheet did not interfere with the pressure lamination. The circuit was formed by etching by etching the copper plate with ferric chloride from both sides.
  • Example 1D A circuit sheet was produced in the same manner as in Example 1D except that the protective films used in Example 1D were not used and the molds A and B were directly contacted with each other on both sides of the circuit to form an insulating layer.
  • d 0 ⁇ m
  • d' 0 ⁇ m
  • the width of the overlapping portion on the element mounting surface side was 12 ⁇ m. Further, when the molds were released from the molds A and B, the circuit sheet was stuck to one side, and it was difficult to release the mold from the mold.
  • Example 7D Manufacturing of circuit board
  • an insulating layer of the B stage (thickness 210 ⁇ m, Hitachi Kasei Co., Ltd., product name; HT1500) and a copper plate (model number: C1100 1) as a heat dissipation member. / 4H) was arranged in this order to obtain a laminated body.
  • a fluororubber sheet having a thickness of 2.0 mm was applied as a cushioning material to the circuit sheet side of the laminated body, and pressure-laminated to prepare a circuit board.
  • the conditions for pressure laminating were pressure; 4 MPa, temperature: 180 ° C., pressurization time: 3 hours, and the process was carried out in a vacuum state.
  • the insulating material hardly protruded from the circuit on the element mounting surface, and the insulating portion had a dent, so that the elements could be easily aligned and mounted well.
  • Examples 8D to 12D A circuit board was produced in the same manner as in Example 1D except that the circuit sheets produced in Examples 2D to 6D were used.
  • Example 13D A circuit board was produced in the same manner as in Example 1D except that the cushion material was changed to a laminated body (Mitsui Chemicals Higashi Co., Ltd., trade name; Opulan, product number: CR1012MT4).
  • Example 1 A circuit board was produced in the same manner as in Example 1D except that the circuit sheet produced in Comparative Example 1D was used. As a result, although the insulating layer and the circuit sheet were well connected without peeling, there was a part where the insulating material protruded from the circuit on the element mounting surface, and there was no dent in the insulating part. Both workability were inferior to those of the examples.
  • Example 1E Circuit fabrication
  • a circuit having a width of 3.0 mm, a length of 10 mm, and a height of 2.0 mm was formed by punching with a press using a copper plate having a thickness of 2.0 mm (model number: C1100 1 / 4H).
  • a roughening liquid manufactured by MacDermid Performance Solutions Co., Ltd., trade name; Multibond 150 was used to roughen the surface to which the protective film was not attached.
  • surface roughness (Ra) of the circuit after the treatment and the lower surface was measured with a surface roughness meter, both were 1.0 ⁇ m (specific surface area; 1.9).
  • one surface of a 2.0 mm thick copper plate (model number; C1100 1 / 4H) is subjected to the same roughening treatment as above, and the surface roughness (Ra) is 1.0 ⁇ m (specific surface area; 1).
  • the copper plate of 9.9) was prepared.
  • a varnish for forming an insulating layer (manufactured by Hitachi Kasei Co., Ltd., HT1500) was applied to the surface subjected to the roughening treatment, and dried to obtain an insulating layer.
  • the roughened circuit is arranged so that the lower surface is on the insulating layer side, crimped under the conditions of 180 ° C. for 3 hours and 4 MPa, the protective film is peeled off, and the circuit is insulated on the surface opposite to the element mounting surface.
  • a circuit sheet was produced in which the layers were arranged and a part of the side surface of the circuit (up to a height of 150 ⁇ m from the lower surface) was covered with an insulating layer.
  • the thickness of the insulating layer was 210 ⁇ m.
  • the surface roughness (Ra) of the device mounting surface was 0.1 ⁇ m (specific surface area; 1.04).
  • Example 2E the circuit sheet was prepared in the same manner except that the roughening treatment was performed so that the surface roughness (Ra) of the side surface and the lower surface of the circuit was 2.0 ⁇ m (specific surface area; 2.6), respectively. Made.
  • the prepared circuit sheet was subjected to a reflow test at 290 ° C. for 10 minutes, no peeling of the insulating layer was observed from the side surface and the lower surface of the circuit. The element mounting was also done well.
  • Example 3E the circuit sheet was prepared in the same manner except that the roughening treatment was performed so that the surface roughness (Ra) of the side surface and the lower surface of the circuit was 0.65 ⁇ m (specific surface area; 1.65), respectively. Made.
  • the prepared circuit sheet was subjected to a reflow test at 290 ° C. for 10 minutes, no peeling of the insulating layer was observed from the side surface and the lower surface of the circuit. The element mounting was also done well.
  • Example 4E> After roughening treatment in the same manner as in Example 1E, an epoxy-based insulating material (manufactured by Hitachi Kasei) is filled between circuits at a molding pressure of 7 MPa and a curing time of 300 seconds using a transfer molding machine to insulate. Formed a part. Then, the protective film was peeled off. Instead of the insulating layer forming varnish used in Example 1E, a resin sheet for forming an insulating layer of the B stage (manufactured by Hitachi Kasei Co., Ltd., HT1500) was used in the same manner as the element mounting surface. A circuit sheet in which an insulating layer was arranged on the surface was produced.
  • an epoxy-based insulating material manufactured by Hitachi Kasei
  • the thickness of the finished insulating layer was 205 ⁇ m.
  • Example 5E a circuit sheet was produced by the same method except that the circuit was formed by etching with an aqueous ferric chloride solution instead of the punching process of the copper plate.
  • the surface roughness (Ra) of the side surface of the circuit is 1.5 ⁇ m (specific surface area; 2.2), and the surface roughness (Ra) of the surface opposite to the device mounting surface is 1.0 ⁇ m (specific surface area; 1.9). )Met.
  • the surface roughness (Ra) of the device mounting surface was 0.11 ⁇ m (specific surface area; 1.05).
  • Example 6E All surfaces of the circuit were roughened in the same manner as in Example 1E except that the protective film was not attached to the element mounting surface of the circuit. Then, in the same manner as in Example 1E, a protective film was attached to the element mounting surface of the circuit and crimped to the insulating layer to prepare a circuit sheet. Then, the protective film was peeled off, and electroless Ni plating was applied to the exposed circuit element mounting surface and a part of the side surface not covered with the insulating layer so as to have a thickness of 2.5 ⁇ m. The surface roughness (Ra) of the device mounting surface after plating was 0.14 ⁇ m (specific surface area; 1.1). When a reflow test at 290 ° C. for 10 minutes was carried out on the plated circuit sheet, no peeling was observed between the side surface and the lower surface of the circuit and the insulating layer. The element mounting was also done well.
  • Example 1E a circuit sheet was produced by the same method except that the circuit roughening treatment was not performed.
  • the surface roughness (Ra) of the side surface and the lower surface of the circuit is 0.11 ⁇ m (specific surface area; 1.05), respectively, and the surface roughness (Ra) of the element mounting surface is also 0.11 ⁇ m (specific surface area; 1.05).
  • the prepared circuit sheet was subjected to a reflow test at 290 ° C. for 10 minutes, the insulating layer was peeled off from the side surface and the lower surface of the circuit, and the circuit fell off from the insulating layer.
  • Example 2E ⁇ Comparative Example 2E>
  • Example 1E only the surface opposite to the element mounting surface of the circuit was roughened, and the surface roughness (Ra) of the element mounting surface and the side surface was 0.11 ⁇ m (specific surface area; 1.05), respectively.
  • a circuit sheet was produced in the same manner except that a circuit having a surface roughness (Ra) opposite to the device mounting surface of 1.0 ⁇ m (specific surface area; 1.9) was used.
  • the prepared circuit sheet was subjected to a reflow test at 290 ° C. for 10 minutes, the insulating layer was peeled off from the side surface of the circuit.
  • FIG. 7B shows a state in which a cushioning material facing the base substrate side of the body is arranged, and a spacer member is arranged on the base substrate so as to be in contact with two opposing surfaces in the side surfaces of the circuit and the insulating layer.
  • the laminate was pressurized as described above.
  • Base substrate Material: Copper, Thickness: 2000 ⁇ m, Copper plate: width: 100 mm, length: 50 mm, thickness: 2.0 mm
  • Insulation layer Material of insulation material: Hitachi Kasei Co., Ltd., trade name: HT1500, thickness: 210 ⁇ m
  • Spacer member Material: Copper, Thickness: 50 ⁇ m smaller than the total thickness of the copper plate and the insulating layer (pressurization condition) Pressure: 4 MPa Heating temperature: 100 ° C Pressurization time: 5 minutes
  • Circuit Material: Copper, Thickness: 500 ⁇ m, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side)
  • Insulation layer Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m ⁇ K, Thickness: 210 ⁇ m, Size: 30 mm ⁇ 30 mm
  • Heat dissipation member Material: Copper, Thickness: 1000 ⁇ m, Size: 30 mm x 30 mm
  • a heating element is provided on the circuit surface, the temperature is raised at 15 ° C / sec, and when the temperature of the circuit surface reaches 170 ° C, the heat generation is stopped and cooled, and when the temperature drops to 100 ° C on the circuit surface.
  • the cycle of raising the temperature under the above conditions was repeated 250 times. After that, it was confirmed by ultrasonic flaw detection inspection whether or not the insulating layer was peeled off from the circuit and the heat radiating member.
  • the evaluation criteria are as follows. As a result, in the circuit board of Example 1, the evaluation was A. Evaluation A: There is no peeling point. Evaluation B: No peeling of 0.5 mm or more at maximum. Evaluation C: Peeling of 0.5 mm or more occurs at maximum.
  • Example 2 Using the following circuit, insulating layer and heat radiating member, a circuit board in which the circuit, insulating layer and heat radiating member were laminated in this order was prepared.
  • Circuit Material: Copper, Thickness: 2000 ⁇ m, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side)
  • Insulation layer Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m ⁇ K, Thickness: 120 ⁇ m, Size: 30 mm ⁇ 30 mm
  • Heat dissipation member Material: Copper, Thickness: 2000 ⁇ m, Size: 30 mm x 30 mm
  • the evaluation was A.
  • Example 3 Using the following circuit, insulating layer and heat radiating member, a circuit board in which the circuit, insulating layer and heat radiating member were laminated in this order was prepared.
  • Circuit Material: Copper, Thickness: 750 ⁇ m, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side)
  • Insulation layer Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m ⁇ K, Thickness: 120 ⁇ m, Size: 30 mm ⁇ 30 mm
  • Heat dissipation member Material: Copper, Thickness: 500 ⁇ m, Size: 30 mm x 30 mm
  • the evaluation was A.
  • Circuit Material: Copper, Thickness: 400 ⁇ m, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side) Insulation layer: Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m ⁇ K, Thickness: 210 ⁇ m, Size: 30 mm ⁇ 30 mm Heat dissipation member: Material: Copper, Thickness: 500 ⁇ m, Size: 30 mm x 30 mm The same cycle test as above was performed. As a result, in the circuit board of Comparative Example 1, the evaluation was C.
  • Circuit Material: Copper, Thickness: 450 ⁇ m, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side) Insulation layer: Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m ⁇ K, Thickness: 105 ⁇ m, Size: 30 mm x 30 mm Heat dissipation member: Material: Copper, Thickness: 600 ⁇ m, Size: 30 mm x 30 mm The same cycle test as above was performed. As a result, in the circuit board of Comparative Example 2, the evaluation was C.
  • Circuit Material: Copper, Thickness: 1000 ⁇ m, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side) Insulation layer: Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m ⁇ K, Thickness: 105 ⁇ m, Size: 30 mm x 30 mm Heat dissipation member: Material: Copper, Thickness: 1000 ⁇ m, Size: 30 mm x 30 mm The same cycle test as above was performed. As a result, in the circuit board of Comparative Example 2, the evaluation was C.
  • Heat generator 65 75 ... Bonding wire 66, 76 ... Sealing part 67, 77 ... Insulation layer 68, 78 ... Heat dissipation member 79 ... Heat conductive sheet 80 ... Base plate 190 ... Circuit sheet with case 101 ... Circuit 102 ... Insulation layer 103, 104 ... Base board 200, 210 ... Laminated body 105 ... Pressurizing means 106 ... Cushion material 107, 108 ... Spacer member 112 Circuit 113 Insulation layer 115 Heat dissipation member 220 Circuit board 121 Circuit 122 Insulation layer 230 Circuit sheet 131 Circuit 132 Insulation layer 240 circuit Sheet 141 Circuit 142 Insulation layer 250 Circuit sheet

Abstract

Provided is a circuit sheet that is provided with a circuit (1) which is formed from a conductor and an insulating part (2) which is provided in spaces in the circuit (1), wherein a step (3) is provided to the side surface of the circuit between an element mounting surface and the reverse surface to the element mounting surface, and the step (3) is covered by the insulating part (2). The area of portions where the circuit and insulating part are in contact is increased and thus makes separation of the circuit and insulating part unlikely to occur, so as to provide a circuit sheet having excellent reliability in which separation between the side surface of the circuit and the insulating part is unlikely to occur, which prevents air bubbles being trapped in such areas of separation, and which prevents decreased insulation resistance.

Description

回路シート、回路基板及び回路基板の製造方法Circuit sheet, circuit board and circuit board manufacturing method
 本開示は、回路シート、回路基板及び回路基板の製造方法に関する。 This disclosure relates to a circuit sheet, a circuit board, and a method for manufacturing a circuit board.
 電子機器の小型化及び高機能化の進展に伴い、素子を基板上に高密度実装することが可能な回路基板としてプリント基板が広く用いられている。プリント基板は一般に、基板に金属箔を貼り付け、これをエッチングして所望の回路形状に加工することで製造されている。 With the progress of miniaturization and high functionality of electronic devices, printed circuit boards are widely used as circuit boards capable of mounting elements at high density on the boards. A printed circuit board is generally manufactured by attaching a metal foil to the substrate, etching the printed circuit board, and processing the printed circuit board into a desired circuit shape.
 一方、電子機器の使用環境の多様化に伴い、回路基板の電流容量の増大(大電流化)が求められている。回路基板の電流容量は、回路の断面積を大きくする(すなわち、回路の厚さを厚くする)することで増大させることができる。 On the other hand, with the diversification of the usage environment of electronic devices, it is required to increase the current capacity of the circuit board (increase the current). The current capacity of the circuit board can be increased by increasing the cross-sectional area of the circuit (that is, increasing the thickness of the circuit).
 大電流化に対応した回路基板を製造する方法として、金属板を加工して形成した回路を用いる方法が提案されている(例えば、特許文献1参照)。 As a method of manufacturing a circuit board corresponding to a large current, a method of using a circuit formed by processing a metal plate has been proposed (see, for example, Patent Document 1).
特開平2-137392号公報Japanese Unexamined Patent Publication No. 2-137392
 特許文献1に記載の方法では、金属板を回路に加工した後に回路間の空間を樹脂で充填して絶縁部を形成した状態のもの(回路シート)を作製し、回路上に素子を実装し、その周囲を絶縁性材料を用いて封止して回路パッケージを製造する。 In the method described in Patent Document 1, after processing a metal plate into a circuit, a state (circuit sheet) in which a space between circuits is filled with resin to form an insulating portion is produced, and an element is mounted on the circuit. , A circuit package is manufactured by sealing the periphery with an insulating material.
 上記方法で作製される回路シートでは、回路シートの熱処理、回路基板の作製工程での圧着等が実施されることで回路の側面と、絶縁部との間に剥離が生じやすく、剥離箇所にて、気泡をトラップしたり、耐絶縁性が低下したりする等によって信頼性が損なわれるおそれがある。さらに、後の工程において回路シートを、シリコンゲル等を用いて封止する場合、回路の側面における剥離箇所から気泡が発生し、耐絶縁性を低下させるおそれがある。 In the circuit sheet manufactured by the above method, heat treatment of the circuit sheet, crimping in the process of manufacturing the circuit board, etc. are performed, so that peeling is likely to occur between the side surface of the circuit and the insulating portion, and at the peeled portion. , The reliability may be impaired by trapping air bubbles or lowering the insulation resistance. Further, when the circuit sheet is sealed with a silicon gel or the like in a later step, air bubbles may be generated from the peeled portion on the side surface of the circuit, which may reduce the insulation resistance.
 上記事情にかんがみ、本開示の一態様は、信頼性に優れる回路シート、及びこの回路シートを含む回路基板及びその製造方法を提供することを課題とする。 In view of the above circumstances, one aspect of the present disclosure is to provide a circuit sheet having excellent reliability, a circuit board including the circuit sheet, and a method for manufacturing the same.
 上記課題を提供するための具体的な手段には、以下の実施態様が含まれる。
<1A> 導体からなる回路と、前記回路の間の空間に設けられる絶縁部と、を備え、前記回路における、素子実装面と、前記素子実装面と逆の面との間の側面は段差を有し、前記段差が前記絶縁部で覆われてなる回路シート。
<2A> 前記段差が前記素子実装面及び前記素子実装面と逆の面の少なくとも一方と平行な面を有する<1A>に記載の回路シート。
<3A> 前記回路は、前記回路の厚さ方向における前記回路の断面形状が略T字形状となる領域を有する<1A>又は<2A>に記載の回路シート。
<4A> 前記回路の厚さ方向に見たときに、前記段差が、前記回路の外周に設けられている<1A>~<3A>のいずれか1つに記載の回路シート。
<5A> 前記回路の厚さ方向に見たときに、前記段差が、前記回路の内部に設けられており、前記回路の内部の空間に設けられる前記絶縁部は、前記回路の外周の空間に設けられる前記絶縁部と2箇所以上で接続している<1A>~<4A>のいずれか1つに記載の回路シート。
<6A> 前記側面の表面粗さは、前記素子実装面の表面粗さ及び前記素子実装面と逆の面の表面粗さの少なくとも一方よりも大きい<1A>~<5A>のいずれか1つに記載の回路シート。
<7A> <1A>~<6A>のいずれか1つに記載の回路シートと、前記素子実装面と逆の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、をこの順に有する回路基板。
<8A> <1A>~<6A>のいずれか1つに記載の回路シートと、前記素子実装面と逆の面に配置される絶縁層と、放熱部材と、をこの順に配置した状態の積層体を厚さ方向に加圧する工程を有する回路基板の製造方法。
Specific means for providing the above tasks include the following embodiments.
<1A> A circuit made of a conductor and an insulating portion provided in a space between the circuits are provided, and the side surface between the element mounting surface and the surface opposite to the element mounting surface in the circuit has a step. A circuit sheet having the step and having the step covered with the insulating portion.
<2A> The circuit sheet according to <1A>, wherein the step has a surface parallel to at least one of the element mounting surface and the surface opposite to the element mounting surface.
<3A> The circuit sheet according to <1A> or <2A>, wherein the circuit has a region in which the cross-sectional shape of the circuit in the thickness direction of the circuit is substantially T-shaped.
<4A> The circuit sheet according to any one of <1A> to <3A>, wherein the step is provided on the outer periphery of the circuit when viewed in the thickness direction of the circuit.
<5A> When viewed in the thickness direction of the circuit, the step is provided inside the circuit, and the insulating portion provided in the space inside the circuit is located in the outer space of the circuit. The circuit sheet according to any one of <1A> to <4A>, which is connected to the insulating portion provided at two or more locations.
<6A> The surface roughness of the side surface is any one of <1A> to <5A>, which is larger than at least one of the surface roughness of the element mounting surface and the surface roughness of the surface opposite to the element mounting surface. The circuit sheet described in.
<7A> The circuit sheet according to any one of <1A> to <6A>, an insulating layer arranged so as to be in contact with a surface opposite to the element mounting surface, and an insulating layer arranged so as to be in contact with the insulating layer. A circuit board having heat-dissipating members in this order.
<8A> Lamination of the circuit sheet according to any one of <1A> to <6A>, an insulating layer arranged on the surface opposite to the element mounting surface, and a heat radiating member arranged in this order. A method for manufacturing a circuit board, which comprises a step of pressurizing a body in the thickness direction.
<1B> 導体からなり、第一の面、及び前記第一の面とは反対側に位置する第二の面を備える回路と、前記回路の前記第二の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、を厚さ方向にこの順に備え、
 前記回路側からの平面視にて、前記第一の面の外周縁部と、前記第二の面の外周縁部と、が重ならない領域が存在する回路基板。
<2B> 前記回路の厚さが、120μm超である<1B>に記載の回路基板。
<3B> 前記放熱部材の厚さが、120μm超である<1B>又は<2B>に記載の回路基板。
<4B> 前記放熱部材の厚さに対する前記回路の厚さの比(回路の厚さ/放熱部材の平均厚さ)が、0.2~25である<1B>~<3B>のいずれか1つに記載の回路基板。
<5B> 前記放熱部材の厚さに対する前記回路の厚さの比が、1~25である<4B>に記載の回路基板。
<6B> 前記絶縁層の部分放電開始電圧が1.0kV以上である<1B>~<5B>のいずれか1つに記載の回路基板。
<7B> 前記放熱部材と前記回路との間の絶縁破壊電圧が1.5kV以上である<1B>~<6B>のいずれか1つに記載の回路基板。
<8B> 前記回路側からの平面視にて、前記第一の面の外周縁部全体が、前記第二の面の外周縁部と重ならない<1B>~<7B>のいずれか1つに記載の回路基板。
<9B> 前記第一の面の外周縁部と、前記第二の面の外周縁部との最短距離が、0.01mm以上1.0mm未満である<8B>に記載の回路基板。
<10B> 前記回路の第二の面の面積よりも前記放熱部材における前記絶縁層側の面の面積が大きい<1B>~<9B>のいずれか1つに記載の回路基板。
<11B> 導体からなり、第一の面、及び前記第一の面とは反対側に位置する第二の面を備える回路と、前記回路の間の空間及び前記回路の周囲の少なくとも一方に設けられる絶縁部と、を備え、
 平面視にて、前記第一の面の外周縁部と、前記第二の面の外周縁部と、が重ならない領域が存在する回路シート。
<12B> <11B>に記載の回路シートと、前記第二の面に接するように配置される絶縁層と、放熱部材と、を厚さ方向にこの順に配置した状態の積層体を厚さ方向に加圧する工程を有する回路基板の製造方法。
<13B> <1B>~<10B>のいずれか1つに記載の回路基板を製造する回路基板の製造方法であって、
 前記回路と、前記回路の第二の面に接するように配置される前記絶縁層と、前記絶縁層に接するように配置される前記放熱部材と、を厚さ方向にこの順に配置した状態の積層体を厚さ方向に加圧する工程を有する回路基板の製造方法。
<1B> An insulation composed of a conductor and having a first surface and a second surface located on the opposite side of the first surface and an insulation arranged so as to be in contact with the second surface of the circuit. A layer and a heat radiating member arranged so as to be in contact with the insulating layer are provided in this order in the thickness direction.
A circuit board having a region in which the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface do not overlap in a plan view from the circuit side.
<2B> The circuit board according to <1B>, wherein the thickness of the circuit is more than 120 μm.
<3B> The circuit board according to <1B> or <2B>, wherein the heat radiating member has a thickness of more than 120 μm.
<4B> Any one of <1B> to <3B> in which the ratio of the thickness of the circuit to the thickness of the heat radiating member (circuit thickness / average thickness of the heat radiating member) is 0.2 to 25. The circuit board described in 1.
<5B> The circuit board according to <4B>, wherein the ratio of the thickness of the circuit to the thickness of the heat radiating member is 1 to 25.
<6B> The circuit board according to any one of <1B> to <5B>, wherein the partial discharge start voltage of the insulating layer is 1.0 kV or more.
<7B> The circuit board according to any one of <1B> to <6B>, wherein the dielectric breakdown voltage between the heat radiating member and the circuit is 1.5 kV or more.
<8B> In a plan view from the circuit side, the entire outer peripheral edge portion of the first surface does not overlap with the outer peripheral edge portion of the second surface to any one of <1B> to <7B>. The circuit board described.
<9B> The circuit board according to <8B>, wherein the shortest distance between the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface is 0.01 mm or more and less than 1.0 mm.
<10B> The circuit board according to any one of <1B> to <9B>, wherein the area of the surface of the heat radiating member on the insulating layer side is larger than the area of the second surface of the circuit.
<11B> Provided in at least one of a circuit composed of a conductor and having a first surface and a second surface located on the opposite side of the first surface, a space between the circuits, and the periphery of the circuit. With an insulating part,
A circuit sheet having a region in which the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface do not overlap in a plan view.
<12B> The laminated body in which the circuit sheet according to <11B>, the insulating layer arranged so as to be in contact with the second surface, and the heat radiating member are arranged in this order in the thickness direction is arranged in the thickness direction. A method of manufacturing a circuit board having a step of pressurizing.
<13B> A method for manufacturing a circuit board for manufacturing the circuit board according to any one of <1B> to <10B>.
The circuit, the insulating layer arranged so as to be in contact with the second surface of the circuit, and the heat radiating member arranged so as to be in contact with the insulating layer are laminated in this order in the thickness direction. A method for manufacturing a circuit board, which comprises a step of pressurizing a body in the thickness direction.
<1C> 導体からなる二つ以上の回路を備え、前記回路のうち、互いに独立し、かつ隣接した二つの回路の組み合わせの全てにおいて、前記回路の素子実装面から見て、前記互いに独立し、かつ隣接した二つの回路の間を通り、かつ前記素子実装面に対して平行である任意の方向の直線上に高弾性部材が位置する回路シート。
<2C> 前記高弾性部材が前記回路である<1C>に記載の回路シート。
<3C> 前記二つ以上の回路間の少なくとも一部に設けられる絶縁部をさらに備える<1C>又は<2C>に記載の回路シート。
<4C> 前記絶縁部は、前記回路の素子実装面及び前記素子実装面と逆の面が露出するように設けられている<3C>に記載の回路シート。
<5C> 前記回路の厚さに対する前記絶縁部の厚さは、0.9以上である<3C>又は<4C>に記載の回路シート。
<6C> 前記回路の素子実装面と逆の面側に配置され、前記二つ以上の回路の相対配置を保持する絶縁層をさらに備える<1C>~<5C>のいずれか1つに記載の回路シート。
<7C> <1C>~<5C>のいずれか1つに記載の回路シートと、前記回路シートの素子実装面と逆の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、をこの順に有する回路基板。
<8C> <6C>に記載の回路シートと、前記絶縁層に接するように配置される放熱部材と、を有する回路基板。
<9C> <1C>~<5C>のいずれか1つに記載の回路シートと、前記回路シートの素子実装面と逆の面に配置される絶縁層と、放熱部材と、をこの順に配置した状態の積層体、又は、<6C>に記載の回路シートと、放熱部材と、を前記回路シートが備える前記絶縁層側に前記放熱部材が位置するように配置した状態の積層体、を厚さ方向に加圧する工程を有する、回路基板の製造方法。
<1C> In all combinations of two or more circuits made of conductors, which are independent of each other and adjacent to each other, the circuits are independent of each other when viewed from the element mounting surface of the circuit. A circuit sheet in which a highly elastic member is located on a straight line in an arbitrary direction that passes between two adjacent circuits and is parallel to the element mounting surface.
<2C> The circuit sheet according to <1C>, wherein the highly elastic member is the circuit.
<3C> The circuit sheet according to <1C> or <2C>, further comprising an insulating portion provided at least a part between the two or more circuits.
<4C> The circuit sheet according to <3C>, wherein the insulating portion is provided so that the element mounting surface of the circuit and the surface opposite to the element mounting surface are exposed.
<5C> The circuit sheet according to <3C> or <4C>, wherein the thickness of the insulating portion with respect to the thickness of the circuit is 0.9 or more.
<6C> The method according to any one of <1C> to <5C>, which is arranged on the surface opposite to the element mounting surface of the circuit and further includes an insulating layer that holds the relative arrangement of the two or more circuits. Circuit sheet.
<7C> The circuit sheet according to any one of <1C> to <5C>, the insulating layer arranged so as to be in contact with the surface opposite to the element mounting surface of the circuit sheet, and the insulating layer so as to be in contact with the insulating layer. A circuit board having heat-dissipating members arranged in this order.
<8C> A circuit board having the circuit sheet according to <6C> and a heat radiating member arranged so as to be in contact with the insulating layer.
<9C> The circuit sheet according to any one of <1C> to <5C>, the insulating layer arranged on the surface opposite to the element mounting surface of the circuit sheet, and the heat radiating member are arranged in this order. The thickness of the laminated body in the state, or the laminated body in which the circuit sheet according to <6C> and the heat radiating member are arranged so that the heat radiating member is located on the insulating layer side of the circuit sheet. A method of manufacturing a circuit board, which comprises a step of pressurizing in a direction.
<1D> 回路と、前記回路の間の空間に設けられる絶縁部と、を備え、素子実装面において前記絶縁部が凹んでいる、回路シート。
<2D> 複数の回路と、
 前記複数の回路の間に設けられており、前記回路において、素子が搭載される素子実装面の少なくとも一部及び前記素子実装面とは反対側の面の少なくとも一部が露出するように、前記複数の回路の相対位置を保持する絶縁部と、を有し、
 前記素子実装面側における前記絶縁部の表面は、前記回路の前記素子実装面に対して凹んでいる、回路シート。
<3D> 前記素子実装面と逆の面は前記素子実装面よりも平坦である、<1D>又は<2D>に記載の回路シート。
<4D> 前記素子実装面と逆の面は絶縁層及び放熱部材が配置される面である、<1D>~<3D>のいずれか1つに記載の回路シート。
<5D> 前記素子実装面と逆の面に前記回路と前記絶縁部とが厚さ方向において重なる部分を有する、<1D>~<4D>のいずれか1つに記載の回路シート。
<6D> シート状の回路の一方の面に保護フィルムを貼り付けた状態で前記回路の間に絶縁材料を充填する工程と、前記絶縁材料を硬化させる工程と、をこの順に有し、
 前記保護フィルムは前記絶縁材料の硬化による体積収縮に伴って変形可能である、回路シートの製造方法。
<7D> 前記絶縁材料を充填する工程及び前記絶縁材料を硬化させる工程は、前記回路の前記保護フィルムを貼り付けた面と逆の面に、前記絶縁材料の硬化による体積収縮に伴って変形しない部材を当接した状態で行う、<6D>に記載の回路シートの製造方法。
<8D> 前記絶縁材料を硬化させる工程において得られる絶縁材料の硬化物は、前記回路の前記保護フィルムを貼り付けた面において凹んだ状態になる、<6D>又は<7D>に記載の回路シートの製造方法。
<9D> <1D>~<5D>のいずれか1つに記載の回路シートと、前記回路シートの素子実装面と逆の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、を有する回路基板。
<10D> <1D>~<5D>のいずれか1つに記載の回路シートと、前記回路シートの素子実装面と逆の面に配置される絶縁層と、放熱部材と、をこの順に配置した状態の積層体を加圧する工程を有し、
 前記加圧は前記回路シートの素子実装面上に、前記加圧により変形可能なクッション材を配置した状態で行われる、回路基板の製造方法。
<1D> A circuit sheet comprising a circuit and an insulating portion provided in a space between the circuits, and the insulating portion is recessed on an element mounting surface.
<2D> With multiple circuits
The circuit is provided between the plurality of circuits so that at least a part of the element mounting surface on which the element is mounted and at least a part of the surface opposite to the element mounting surface are exposed. It has an insulating part that holds the relative positions of a plurality of circuits, and has.
A circuit sheet in which the surface of the insulating portion on the element mounting surface side is recessed with respect to the element mounting surface of the circuit.
<3D> The circuit sheet according to <1D> or <2D>, wherein the surface opposite to the element mounting surface is flatter than the element mounting surface.
<4D> The circuit sheet according to any one of <1D> to <3D>, wherein the surface opposite to the element mounting surface is a surface on which an insulating layer and a heat radiating member are arranged.
<5D> The circuit sheet according to any one of <1D> to <4D>, which has a portion where the circuit and the insulating portion overlap in the thickness direction on a surface opposite to the element mounting surface.
<6D> A step of filling an insulating material between the circuits with a protective film attached to one surface of the sheet-shaped circuit and a step of curing the insulating material are provided in this order.
A method for manufacturing a circuit sheet, wherein the protective film is deformable with volume shrinkage due to curing of the insulating material.
<7D> The step of filling the insulating material and the step of curing the insulating material do not deform on the surface of the circuit opposite to the surface to which the protective film is attached due to volume shrinkage due to the curing of the insulating material. The method for manufacturing a circuit sheet according to <6D>, which is performed in a state where the members are in contact with each other.
<8D> The circuit sheet according to <6D> or <7D>, wherein the cured product of the insulating material obtained in the step of curing the insulating material is in a recessed state on the surface of the circuit to which the protective film is attached. Manufacturing method.
<9D> The circuit sheet according to any one of <1D> to <5D>, the insulating layer arranged so as to be in contact with the surface opposite to the element mounting surface of the circuit sheet, and the insulating layer so as to be in contact with the insulating layer. A circuit board having a heat radiating member arranged in.
<10D> The circuit sheet according to any one of <1D> to <5D>, the insulating layer arranged on the surface opposite to the element mounting surface of the circuit sheet, and the heat radiating member are arranged in this order. It has a step of pressurizing the laminated body in the state,
A method for manufacturing a circuit board, wherein the pressurization is performed in a state where a cushion material deformable by the pressurization is arranged on an element mounting surface of the circuit sheet.
<1E> 回路と、前記回路の間に設けられる絶縁部と、を備え、前記回路の前記絶縁部と接する面の少なくとも一部の表面粗さAが前記回路の素子実装面の表面粗さBよりも大きい、回路シート。
<2E> 前記回路の前記絶縁部と接する面のうち、少なくとも前記回路の素子実装面と逆の面と繋がる部分の表面粗さAが前記回路の素子実装面の表面粗さBよりも大きい、<1E>に記載の回路シート。
<3E> 前記回路の素子実装面と逆の面の表面粗さCは、前記回路の素子実装面の表面粗さBよりも大きい、<1E>又は<2E>に記載の回路シート。
<4E> 前記回路の素子実装面と逆の面に設けられる絶縁層をさらに備える、<1E>~<3E>のいずれか1つに記載の回路シート。
<5E> 前記絶縁部と前記絶縁層とは異なる部材である、<4E>に記載の回路シート。
<6E> 前記絶縁部と前記絶縁層とは同じ部材である、<4E>に記載の回路シート。
<7E> 前記回路の素子実装面がめっき金属で被覆されている、<1E>~<6E>のいずれか1つに記載の回路シート。
<8E> 算術平均粗さRaで表したときの表面粗さAが0.3μm以上であり、算術平均粗さRaで表したときの表面粗さBが0.3μm未満である、<1E>~<7E>のいずれか1つに記載の回路シート。
<9E> 算術平均粗さRaで表したときの表面粗さAが0.6μm以上である、<1E>~<8E>のいずれか1つに記載の回路シート。
<10E> シート状の回路の一方の面に保護部材を貼り付けた状態で前記回路の表面を粗化する工程と、前記回路の間に絶縁部を形成する工程と、をこの順に有する、<1E>~<9E>のいずれか1つに記載の回路シートの製造方法。
<11E> 前記粗化は前記回路の前記絶縁部と接する部分と、前記回路の前記保護部材が貼り付けられた面と逆の面とに対して行われる、<10E>に記載の回路シートの製造方法。
<12E> 前記回路の前記保護部材が貼り付けられた面と逆の面に絶縁層を配置する工程をさらに有する、<10E>又は<11E>に記載の回路シートの製造方法。
<13E> 前記絶縁部を形成する工程の後に前記絶縁層を配置する工程を行う、<12E>に記載の回路シートの製造方法。
<14E> 前記絶縁部を形成する工程と同時に前記絶縁層を配置する工程を行う、<12E>に記載の回路シートの製造方法。
<15E> <1E>~<9E>のいずれか1つに記載の回路シートと、前記回路シートの素子実装面と逆の面に配置される放熱部材と、を有する回路基板。
<16E> <1E>~<9E>のいずれか1つに記載の回路シートと、前記回路シートの素子実装面と逆の面に配置される放熱部材と、をこの順に配置した状態の積層体を加圧する工程を有する、回路基板の製造方法。
<1E> A circuit and an insulating portion provided between the circuits are provided, and the surface roughness A of at least a part of the surface of the circuit in contact with the insulating portion is the surface roughness B of the element mounting surface of the circuit. Larger, circuit sheet.
<2E> Of the surfaces in contact with the insulating portion of the circuit, the surface roughness A of at least the portion connected to the surface opposite to the element mounting surface of the circuit is larger than the surface roughness B of the element mounting surface of the circuit. The circuit sheet according to <1E>.
<3E> The circuit sheet according to <1E> or <2E>, wherein the surface roughness C of the surface opposite to the element mounting surface of the circuit is larger than the surface roughness B of the element mounting surface of the circuit.
<4E> The circuit sheet according to any one of <1E> to <3E>, further comprising an insulating layer provided on a surface opposite to the element mounting surface of the circuit.
<5E> The circuit sheet according to <4E>, wherein the insulating portion and the insulating layer are different members.
<6E> The circuit sheet according to <4E>, wherein the insulating portion and the insulating layer are the same member.
<7E> The circuit sheet according to any one of <1E> to <6E>, wherein the element mounting surface of the circuit is coated with a plated metal.
<8E> The surface roughness A expressed by the arithmetic mean roughness Ra is 0.3 μm or more, and the surface roughness B expressed by the arithmetic average roughness Ra is less than 0.3 μm, <1E>. The circuit sheet according to any one of <7E>.
<9E> The circuit sheet according to any one of <1E> to <8E>, wherein the surface roughness A expressed by the arithmetic mean roughness Ra is 0.6 μm or more.
<10E> A step of roughening the surface of the circuit with a protective member attached to one surface of the sheet-shaped circuit and a step of forming an insulating portion between the circuits are included in this order. The method for manufacturing a circuit sheet according to any one of 1E> to <9E>.
<11E> The circuit sheet according to <10E>, wherein the roughening is performed on a portion of the circuit in contact with the insulating portion and a surface of the circuit opposite to the surface to which the protective member is attached. Production method.
<12E> The method for manufacturing a circuit sheet according to <10E> or <11E>, further comprising a step of arranging an insulating layer on a surface opposite to the surface to which the protective member of the circuit is attached.
<13E> The method for manufacturing a circuit sheet according to <12E>, wherein the step of arranging the insulating layer is performed after the step of forming the insulating portion.
<14E> The method for manufacturing a circuit sheet according to <12E>, wherein the step of arranging the insulating layer is performed at the same time as the step of forming the insulating portion.
<15E> A circuit board having the circuit sheet according to any one of <1E> to <9E> and a heat radiating member arranged on a surface opposite to the element mounting surface of the circuit sheet.
<16E> A laminated body in which the circuit sheet according to any one of <1E> to <9E> and the heat radiating member arranged on the surface opposite to the element mounting surface of the circuit sheet are arranged in this order. A method of manufacturing a circuit board, which comprises a step of pressurizing.
<1F> 回路と前記回路の間に設けられる絶縁部とを備える回路シートと、前記回路シートの発熱体搭載面上に配置されるケースと、を備えるケース付き回路シート。
<2F> 前記発熱体搭載面の前記回路の上に配置される発熱体をさらに備える<1F>に記載のケース付き回路シート。
<3F> 複数の回路を備え、前記絶縁部は、前記複数の回路の間に設けられており、前記回路において、発熱体が搭載される発熱体搭載面の少なくとも一部及び前記発熱体搭載面とは反対側の面の少なくとも一部が露出するように、前記複数の回路の相対位置を保持する<1F>又は<2F>に記載のケース付き回路シート。
<4F> 回路と前記回路の間に設けられる絶縁部とを備える回路シートと、前記回路シートの発熱体搭載面上に配置されるケースと、前記回路の上に配置される発熱体と、前記ケースで囲まれた部分に配置される封止部と、を備える回路パッケージ。
<5F> <4F>に記載の回路パッケージと、前記回路シートの発熱体搭載面と逆の面側に配置される絶縁層及び放熱部材と、を有する回路基板。
<6F> 前記回路の一方の面が前記発熱体と接しており、他方の面が前記絶縁層と接している、<5F>に記載の回路基板。
<7F> <1F>~<3F>のいずれか1つに記載のケース付き回路シートの前記ケースで囲まれた部分に封止部を形成する工程と、
 前記ケース付き回路シートの発熱体搭載面と逆の面側に絶縁層及び放熱部材を配置する工程と、を有する回路基板の製造方法。
<8F> 下記(1)~(4)の工程を含む、回路基板の製造方法。ただし、工程(2)は工程(3)及び工程(4)の前に行われ、工程(1)は工程(3)の前に行われる。
(1)回路シートの発熱体搭載面上にケースを設置する工程
(2)回路シートの回路の上に発熱体を搭載する工程
(3)回路シートの発熱体搭載面上のケースで囲まれた部分に封止部を形成する工程
(4)回路シートの発熱体搭載面と逆の面側に絶縁層及び放熱部材を配置する工程
<1F> A circuit sheet with a case including a circuit sheet including a circuit and an insulating portion provided between the circuits, and a case arranged on a heating element mounting surface of the circuit sheet.
<2F> The circuit sheet with a case according to <1F>, further comprising a heating element arranged on the circuit on the heating element mounting surface.
<3F> A plurality of circuits are provided, and the insulating portion is provided between the plurality of circuits. In the circuit, at least a part of a heating element mounting surface on which a heating element is mounted and the heating element mounting surface. The circuit sheet with a case according to <1F> or <2F>, which holds the relative positions of the plurality of circuits so that at least a part of the surface opposite to the one is exposed.
<4F> A circuit sheet including a circuit and an insulating portion provided between the circuits, a case arranged on the heating element mounting surface of the circuit sheet, a heating element arranged on the circuit, and the above. A circuit package that includes a sealing part that is placed in a portion surrounded by a case.
<5F> A circuit board having the circuit package according to <4F>, an insulating layer and a heat radiating member arranged on the side opposite to the heating element mounting surface of the circuit sheet.
<6F> The circuit board according to <5F>, wherein one surface of the circuit is in contact with the heating element and the other surface is in contact with the insulating layer.
<7F> The step of forming a sealing portion in the portion of the circuit sheet with a case described in any one of <1F> to <3F> surrounded by the case.
A method for manufacturing a circuit board, comprising a step of arranging an insulating layer and a heat radiating member on the surface opposite to the heating element mounting surface of the circuit sheet with a case.
<8F> A method for manufacturing a circuit board, which includes the following steps (1) to (4). However, step (2) is performed before step (3) and step (4), and step (1) is performed before step (3).
(1) Step of installing the case on the heating element mounting surface of the circuit sheet (2) Step of mounting the heating element on the circuit of the circuit sheet (3) Surrounded by the case on the heating element mounting surface of the circuit sheet Step of forming a sealing part in the portion (4) Step of arranging an insulating layer and a heat radiating member on the surface opposite to the heating element mounting surface of the circuit sheet.
<1G> 回路と、絶縁層と、前記回路の素子実装面よりも大きい面積を有し、前記絶縁層を介して前記回路が配置される面を備えるベース基板と、をこの順に有する回路基板を製造する回路基板の製造方法であって、
 前記回路と前記絶縁層と前記ベース基板とをこの順に配置した積層体を準備し、前記回路及び前記絶縁層の合計厚さと略同じ厚さを有するスペーサ部材を、前記回路及び前記絶縁層における側面の周囲の少なくとも一部と接するように前記ベース基板上に配置した状態で前記積層体を加圧する工程を有する回路基板の製造方法。
<2G> 回路と、絶縁層と、ベース基板と、をこの順に有する回路基板を製造する回路基板の製造方法であって、
 前記回路と前記絶縁層と前記ベース基板とをこの順に配置した積層体を準備し、前記回路、前記絶縁層及び前記ベース基板の合計厚さと略同じ厚さを有するスペーサ部材を、前記積層体における側面の周囲の少なくとも一部と接するように前記積層体と同一平面上に配置した状態で前記積層体を加圧する工程を有する回路基板の製造方法。
<3G> 前記積層体を加圧する前に、前記スペーサ部材を用いて前記ベース基板上の前記回路及び前記絶縁層の位置合わせを行う工程をさらに有する<1G>に記載の回路基板の製造方法。
<4G> 前記加圧する工程では、前記スペーサ部材は、前記周囲の少なくとも2つの領域と接し、かつ前記回路及び前記絶縁層を挟むように配置されている<1G>又は<3G>に記載の回路基板の製造方法。
<5G> 前記加圧する工程では、前記スペーサ部材は、前記周囲の少なくとも2つの領域と接し、かつ前記積層体を挟むように配置されている<2G>に記載の回路基板の製造方法。
<6G> 前記スペーサ部材の厚さが前記合計厚さ以下であり、前記スペーサ部材の厚さと前記合計厚さとの差が0μm~250μmである<1G>~<5G>のいずれか1つに記載の回路基板の製造方法。
<7G> 前記回路は回路部と、前記回路部以外の空間と、を有し、前記空間の少なくとも一部に絶縁部が設けられており、前記絶縁層及び前記ベース基板上に配置される前の前記回路は、素子実装面及び前記素子実装面と逆の面が露出している<1G>~<5G>のいずれか1つに記載の回路基板の製造方法。
<1G> A circuit board having a circuit, an insulating layer, and a base substrate having a surface larger than the element mounting surface of the circuit and having a surface on which the circuit is arranged via the insulating layer in this order. It is a manufacturing method of the circuit board to be manufactured.
A laminate in which the circuit, the insulating layer, and the base substrate are arranged in this order is prepared, and a spacer member having substantially the same thickness as the total thickness of the circuit and the insulating layer is provided on the side surface of the circuit and the insulating layer. A method for manufacturing a circuit board, which comprises a step of pressurizing the laminate in a state of being arranged on the base substrate so as to be in contact with at least a part of the periphery of the circuit board.
<2G> A method for manufacturing a circuit board that manufactures a circuit board having a circuit, an insulating layer, and a base board in this order.
A laminate in which the circuit, the insulating layer, and the base substrate are arranged in this order is prepared, and a spacer member having substantially the same thickness as the total thickness of the circuit, the insulating layer, and the base substrate is provided in the laminate. A method for manufacturing a circuit board, which comprises a step of pressurizing the laminated body in a state of being arranged on the same plane as the laminated body so as to be in contact with at least a part of the periphery of a side surface.
<3G> The method for manufacturing a circuit board according to <1G>, further comprising a step of aligning the circuit and the insulating layer on the base substrate using the spacer member before pressurizing the laminate.
<4G> The circuit according to <1G> or <3G>, wherein in the pressurizing step, the spacer member is in contact with at least two regions around the spacer and is arranged so as to sandwich the circuit and the insulating layer. Substrate manufacturing method.
<5G> The method for manufacturing a circuit board according to <2G>, wherein in the pressurizing step, the spacer member is in contact with at least two regions around the spacer and is arranged so as to sandwich the laminate.
<6G> Described in any one of <1G> to <5G>, wherein the thickness of the spacer member is equal to or less than the total thickness, and the difference between the thickness of the spacer member and the total thickness is 0 μm to 250 μm. Circuit board manufacturing method.
<7G> The circuit has a circuit portion and a space other than the circuit portion, and an insulating portion is provided in at least a part of the space before being arranged on the insulating layer and the base substrate. The method for manufacturing a circuit board according to any one of <1G> to <5G>, wherein the circuit is exposed on the element mounting surface and the surface opposite to the element mounting surface.
<1H> 回路、絶縁層及び放熱部材がこの順で積層されており、
 前記回路の平均厚さが、500μm以上であり、
 前記絶縁層の平均厚さが、120μm以上である回路基板。
<2H> 前記絶縁層の平均厚さが、200μmを超える<1H>に記載の回路基板。
<3H> 前記放熱部材の平均厚さが、100μm以上である<1H>又は<2H>に記載の回路基板。
<4H> 前記絶縁層の熱伝導率が、6W/(m・K)以上である<1H>~<3H>のいずれか1つに記載の回路基板。
<5H> 前記絶縁樹脂層のガラス転移温度が、170℃以上である<1H>~<4H>のいずれか1つに記載の回路基板。
<6H> 前記回路及び前記放熱部材の平均厚さの合計が、600μm以上である<1H>~<5H>のいずれか1つに記載の回路基板。
<7H> 前記回路の平均厚さの前記放熱部材の平均厚さに対する比(回路/放熱部材)が、1.0~30である<1H>~<6H>のいずれか1つに記載の回路基板。
<8H> 前記回路の前記絶縁樹脂層に面する側の表面粗さ(Ra)が、0.5μm以上である<1H>~<7H>のいずれか1つに記載の回路基板。
<9H> 前記回路の前記絶縁樹脂層に面する側と反対側の表面粗さ(Ra)が、0.2μm未満である<1H>~<8H>のいずれか1つに記載の回路基板。
<10H> 前記放熱部材の前記絶縁樹脂層に面する側の表面粗さ(Ra)が、0.5μm以上である<1H>~<9H>のいずれか1つに記載の回路基板。
<11H> 前記放熱部材の前記絶縁樹脂層に面する側と反対側の表面粗さ(Ra)が、0.2μm未満である<1H>~<10H>のいずれか1つに記載の回路基板。
<12H> 前記回路の前記絶縁樹脂層に面する側の表面積よりも、前記回路の前記絶縁樹脂層に面する側と反対側の表面積が大きい<1H>~<11H>のいずれか1つに記載の回路基板。
<13H> 前記回路の熱膨張率と前記放熱部材の熱膨張率とが、異なる<1H>~<12H>のいずれか1つに記載の回路基板。
<14H> 前記回路の熱膨張率と前記放熱部材の熱膨張率とが、同じである<1H>~<12H>のいずれか1つに記載の回路基板。
<15H> 前記回路と前記放熱部材との間の破壊電圧が、2.5kV以上である<1H>~<14H>のいずれか1つに記載の回路基板。
<16H> 前記回路と前記放熱部材との間の部分放電開始電圧が、2.5kV以上である<1H>~<15H>のいずれか1つに記載の回路基板。
<17H> <1H>~<16H>のいずれか1つに記載の回路基板と、半導体素子と、を備える半導体装置。
<1H> The circuit, the insulating layer, and the heat radiating member are laminated in this order.
The average thickness of the circuit is 500 μm or more.
A circuit board having an average thickness of the insulating layer of 120 μm or more.
<2H> The circuit board according to <1H>, wherein the average thickness of the insulating layer exceeds 200 μm.
<3H> The circuit board according to <1H> or <2H>, wherein the heat dissipation member has an average thickness of 100 μm or more.
<4H> The circuit board according to any one of <1H> to <3H>, wherein the thermal conductivity of the insulating layer is 6 W / (m · K) or more.
<5H> The circuit board according to any one of <1H> to <4H>, wherein the glass transition temperature of the insulating resin layer is 170 ° C. or higher.
<6H> The circuit board according to any one of <1H> to <5H>, wherein the total average thickness of the circuit and the heat radiating member is 600 μm or more.
<7H> The circuit according to any one of <1H> to <6H>, wherein the ratio of the average thickness of the circuit to the average thickness of the heat radiating member (circuit / heat radiating member) is 1.0 to 30. substrate.
<8H> The circuit board according to any one of <1H> to <7H>, wherein the surface roughness (Ra) of the circuit on the side facing the insulating resin layer is 0.5 μm or more.
<9H> The circuit board according to any one of <1H> to <8H>, wherein the surface roughness (Ra) of the circuit on the side opposite to the side facing the insulating resin layer is less than 0.2 μm.
<10H> The circuit board according to any one of <1H> to <9H>, wherein the surface roughness (Ra) of the heat radiating member on the side facing the insulating resin layer is 0.5 μm or more.
<11H> The circuit board according to any one of <1H> to <10H>, wherein the surface roughness (Ra) of the heat radiating member on the side opposite to the side facing the insulating resin layer is less than 0.2 μm. ..
<12H> One of <1H> to <11H> in which the surface area of the circuit opposite to the side facing the insulating resin layer is larger than the surface area of the circuit facing the insulating resin layer. The circuit board described.
<13H> The circuit board according to any one of <1H> to <12H>, wherein the coefficient of thermal expansion of the circuit and the coefficient of thermal expansion of the heat radiating member are different.
<14H> The circuit board according to any one of <1H> to <12H>, wherein the coefficient of thermal expansion of the circuit and the coefficient of thermal expansion of the heat radiating member are the same.
<15H> The circuit board according to any one of <1H> to <14H>, wherein the breaking voltage between the circuit and the heat radiating member is 2.5 kV or more.
<16H> The circuit board according to any one of <1H> to <15H>, wherein the partial discharge start voltage between the circuit and the heat radiating member is 2.5 kV or more.
<17H> A semiconductor device including the circuit board according to any one of <1H> to <16H> and a semiconductor element.
<1I> 複数の回路と、
 前記複数の回路の間に設けられており、前記回路において、素子が搭載される素子実装面の少なくとも一部及び前記素子実装面とは反対側の面の少なくとも一部が露出するように、前記複数の回路の相対位置を保持する絶縁部と、を有し、
 前記素子実装面とは反対側における前記絶縁部の表面は、前記回路の前記素子実装面とは反対側の面よりも前記素子実装面側に凹んでいる回路シート。
<2I> 前記絶縁部の表面と、前記回路の前記素子実装面とは反対側の面との距離の最大値は、20μm以下である<1I>に記載の回路シート。
<3I> <1I>又は<2I>に記載の回路シートと、前記素子実装面とは反対側における前記絶縁部の表面及び前記回路の前記素子実装面とは反対側の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、を有する回路基板。
<4I> <1I>~<3I>のいずれか1つに記載の回路シートと、前記接続面側に配置される絶縁層と、放熱部材と、をこの順に配置した状態の積層体を加圧する工程を有する回路基板の製造方法。
<1J> 複数の回路と、
 前記複数の回路の間に設けられており、前記回路において、発熱体搭載面の少なくとも一部及び前記発熱体搭載面とは反対側の面の少なくとも一部が露出するように、前記複数の回路の相対位置を保持する絶縁部と、を有し、
 前記回路において、前記発熱体搭載面とは反対側の面の高さのばらつきが、平面方向10mmあたり40μm以下である回路シート。
<2J> <1J>に記載の回路シートと、前記素子実装面とは反対側における前記絶縁部の表面及び前記回路の前記素子実装面とは反対側の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、を有する回路基板。
<3J> <1J>又は<2J>に記載の回路シートと、前記素子実装面とは反対側に配置される絶縁層と、放熱部材と、をこの順に配置した状態の積層体を加圧する工程を有する回路基板の製造方法。
<1K> 複数の回路と、
 前記複数の回路の間に設けられており、前記回路において、発熱体搭載面の少なくとも一部及び前記発熱体搭載面とは反対側の面の少なくとも一部が露出するように、前記複数の回路の相対位置を保持する絶縁部と、を有し、
 前記回路の前記発熱体搭載面の高さのばらつきが、平面方向10mmあたり40μm以下である回路シート。
<2K> <1K>に記載の回路シートと、前記素子実装面とは反対側における前記絶縁部の表面及び前記回路の前記素子実装面とは反対側の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、を有する回路基板。
<3K> <1K>又は<2K>に記載の回路シートと、前記素子実装面とは反対側に配置される絶縁層と、放熱部材と、をこの順に配置した状態の積層体を加圧する工程を有する回路基板の製造方法。
<1I> With multiple circuits
The circuit is provided between the plurality of circuits so that at least a part of the element mounting surface on which the element is mounted and at least a part of the surface opposite to the element mounting surface are exposed. It has an insulating part that holds the relative positions of a plurality of circuits, and has.
A circuit sheet in which the surface of the insulating portion on the side opposite to the element mounting surface is recessed toward the element mounting surface side with respect to the surface of the circuit opposite to the element mounting surface.
<2I> The circuit sheet according to <1I>, wherein the maximum value of the distance between the surface of the insulating portion and the surface of the circuit opposite to the element mounting surface is 20 μm or less.
<3I> Arranged so as to be in contact with the circuit sheet according to <1I> or <2I>, the surface of the insulating portion on the side opposite to the element mounting surface, and the surface of the circuit opposite to the element mounting surface. A circuit board having an insulating layer to be formed and a heat radiating member arranged so as to be in contact with the insulating layer.
<4I> Pressurize the laminated body in which the circuit sheet according to any one of <1I> to <3I>, the insulating layer arranged on the connection surface side, and the heat radiating member are arranged in this order. A method of manufacturing a circuit board having a process.
<1J> With multiple circuits
The plurality of circuits are provided between the plurality of circuits so that at least a part of the heating element mounting surface and at least a part of the surface opposite to the heating element mounting surface are exposed in the circuit. Has an insulating part that holds the relative position of
A circuit sheet in which the height variation of the surface opposite to the heating element mounting surface in the circuit is 40 μm or less per 10 mm in the plane direction.
<2J> An insulating layer arranged so as to be in contact with the circuit sheet according to <1J>, the surface of the insulating portion on the side opposite to the element mounting surface, and the surface of the circuit opposite to the element mounting surface. A circuit board having a heat-dissipating member arranged so as to be in contact with the insulating layer.
<3J> A step of pressurizing a laminate in which the circuit sheet according to <1J> or <2J>, the insulating layer arranged on the side opposite to the element mounting surface, and the heat radiating member are arranged in this order. A method of manufacturing a circuit board having.
<1K> With multiple circuits
The plurality of circuits are provided between the plurality of circuits so that at least a part of the heating element mounting surface and at least a part of the surface opposite to the heating element mounting surface are exposed in the circuit. Has an insulating part that holds the relative position of
A circuit sheet in which the variation in height of the heating element mounting surface of the circuit is 40 μm or less per 10 mm in the plane direction.
<2K> An insulating layer arranged so as to be in contact with the circuit sheet according to <1K>, the surface of the insulating portion on the side opposite to the element mounting surface, and the surface of the circuit opposite to the element mounting surface. A circuit board having a heat-dissipating member arranged so as to be in contact with the insulating layer.
<3K> A step of pressurizing a laminate in which the circuit sheet according to <1K> or <2K>, the insulating layer arranged on the side opposite to the element mounting surface, and the heat radiating member are arranged in this order. A method of manufacturing a circuit board having.
<1L> 複数の回路と、
 前記複数の回路の一方の面側に設けられた、前記複数の回路の相対位置を保持する保持部と、
 保持部上に設けられ、前記回路の一方の面側から見て、前記複数の回路を囲むケースと、
 を有し、
 前記複数の回路の他方の面は露出している、ケース付き回路シート。
<2L> 前記保持部は、前記複数の回路から剥離可能である<1L>に記載のケース付き回路シート。
<3L> 前記複数の回路の一方の面の少なくとも一部は、発熱体が搭載される発熱体搭載面である<2L>に記載のケース付き回路シート。
<4L> <1L>~<3L>のいずれか1つに記載のケース付き回路シートと、前記ケース付き回路シートにおける前記回路の露出した他方の面側に配置された絶縁層と、放熱部材と、をこの順に配置した状態の積層体を加圧する工程を有する回路基板の製造方法。
<5L> 前記保持部は、前記複数の回路から剥離可能であり、
 前記加圧する工程の後、前記複数の回路の一方の面から前記保持部を剥離する工程をさらに有する<4L>に記載の回路基板の製造方法。
<1L> With multiple circuits
A holding portion provided on one surface side of the plurality of circuits for holding relative positions of the plurality of circuits, and a holding portion.
A case provided on the holding portion and surrounding the plurality of circuits when viewed from one surface side of the circuit, and a case.
Have,
A circuit sheet with a case in which the other side of the plurality of circuits is exposed.
<2L> The circuit sheet with a case according to <1L>, wherein the holding portion is detachable from the plurality of circuits.
<3L> The circuit sheet with a case according to <2L>, wherein at least a part of one surface of the plurality of circuits is a heating element mounting surface on which a heating element is mounted.
<4L> The circuit sheet with a case according to any one of <1L> to <3L>, the insulating layer arranged on the exposed other surface side of the circuit in the circuit sheet with a case, and the heat radiating member. A method for manufacturing a circuit board, which comprises a step of pressurizing a laminate in a state where the above are arranged in this order.
<5L> The holding portion can be separated from the plurality of circuits.
The method for manufacturing a circuit board according to <4L>, further comprising a step of peeling the holding portion from one surface of the plurality of circuits after the step of pressurizing.
 本開示の一態様によれば、信頼性に優れる回路シート、及びこの回路シートを含む回路基板及びその製造方法を提供される。 According to one aspect of the present disclosure, a circuit sheet having excellent reliability, a circuit board including the circuit sheet, and a method for manufacturing the same are provided.
素子実装面から見たときの本開示の回路シートの具体例の概略平面図である。It is a schematic plan view of the specific example of the circuit sheet of this disclosure when viewed from the element mounting surface. 図1AのA-A線断面図である。FIG. 1A is a cross-sectional view taken along the line AA of FIG. 1A. 図1Bの拡大図である。It is an enlarged view of FIG. 1B. 素子実装面から見たときの従来の回路シートの具体例の概略平面図である。It is a schematic plan view of the specific example of the conventional circuit sheet when viewed from the element mounting surface. 図1DのA-A線断面図である。FIG. 5 is a cross-sectional view taken along the line AA of FIG. 1D. 本開示の回路基板の具体例1の概略構成を示す断面図である。It is sectional drawing which shows the schematic structure of the specific example 1 of the circuit board of this disclosure. 本開示の回路基板の具体例1の概略構成を示す、回路側からの平面図である。It is a top view from the circuit side which shows the schematic structure of the specific example 1 of the circuit board of this disclosure. 本開示の回路基板の具体例2の概略構成を示す断面図である。It is sectional drawing which shows the schematic structure of the specific example 2 of the circuit board of this disclosure. 従来の回路基板の具体例の概略構成を示す断面図である。It is sectional drawing which shows the schematic structure of the specific example of the conventional circuit board. 従来の回路シートの概略構成図である。It is a schematic block diagram of the conventional circuit sheet. 本開示の第三実施形態の回路シートの概略構成図である。It is a schematic block diagram of the circuit sheet of the 3rd Embodiment of this disclosure. 本開示の第四実施形態の回路シートの概略構成図である。It is a schematic block diagram of the circuit sheet of the 4th Embodiment of this disclosure. 実施例1C~3Cの回路シートの構成図である。It is a block diagram of the circuit sheet of Examples 1C-3C. 実施例4C~6Cの回路シートの構成図である。It is a block diagram of the circuit sheet of Examples 4C to 6C. 実施例7C~9Cの回路シートの構成図である。It is a block diagram of the circuit sheet of Examples 7C-9C. 実施例10C~12Cの回路シートの構成図である。It is a block diagram of the circuit sheet of Examples 10C-12C. 比較例1C~3Cの回路シートの構成図である。It is a block diagram of the circuit sheet of Comparative Examples 1C to 3C. 比較例4C~6Cの回路シートの構成図である。It is a block diagram of the circuit sheet of Comparative Examples 4C to 6C. 比較例7C~9Cの回路シートの構成図である。It is a block diagram of the circuit sheet of Comparative Examples 7C-9C. 回路シートの断面を概略的に示す図である。It is a figure which shows schematic cross section of a circuit sheet. 回路と絶縁部とが厚さ方向において重なる部分を概略的に示す図である。It is a figure which shows roughly the part where the circuit and the insulating part overlap in the thickness direction. 回路シートの構成を概略的に示す断面図である。It is sectional drawing which shows the structure of the circuit sheet schematicly. 本開示のケース付き回路シートを用いる回路基板の製造工程の一例を示す図である。It is a figure which shows an example of the manufacturing process of the circuit board which uses the circuit sheet with a case of this disclosure. 従来の回路シートを用いる回路基板の製造工程の一例を示す図である。It is a figure which shows an example of the manufacturing process of the circuit board which uses the conventional circuit sheet. 従来の回路基板の製造方法を示す概略構成図である。It is a schematic block diagram which shows the manufacturing method of the conventional circuit board. 回路基板の製造方法1の一例を示す概略構成図である。It is a schematic block diagram which shows an example of the manufacturing method 1 of a circuit board. 回路基板の製造方法2の一例を示す概略構成図である。It is a schematic block diagram which shows an example of the manufacturing method 2 of a circuit board. 本開示の回路基板の一実施形態である回路基板220の断面図である。It is sectional drawing of the circuit board 220 which is one Embodiment of the circuit board of this disclosure. 本開示の回路シートの概略構成図である。It is a schematic block diagram of the circuit sheet of this disclosure. 本開示の回路シートの概略構成図である。It is a schematic block diagram of the circuit sheet of this disclosure. 本開示の回路シートの概略構成図である。It is a schematic block diagram of the circuit sheet of this disclosure.
 以下、本発明を実施するための形態について詳細に説明する。但し、本発明は以下の実施形態に限定されるものではない。各実施形態に記載の構成は、適宜組み合わせてもよい。
 以下の実施形態において、その構成要素(要素ステップ等も含む)は、特に明示した場合を除き、必須ではない。数値及びその範囲についても同様であり、本発明を制限するものではない。
 本開示において「工程」との語には、他の工程から独立した工程に加え、他の工程と明確に区別できない場合であってもその工程の目的が達成されれば、当該工程も含まれる。
 本開示において「~」を用いて示された数値範囲には、「~」の前後に記載される数値がそれぞれ最小値及び最大値として含まれる。
 本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
 本開示において各成分は該当する物質を複数種含んでいてもよい。組成物中に各成分に該当する物質が複数種存在する場合、各成分の含有率又は含有量は、特に断らない限り、組成物中に存在する当該複数種の物質の合計の含有率又は含有量を意味する。
 本開示において「層」との語には、当該層が存在する領域を観察したときに、当該領域の全体に形成されている場合に加え、当該領域の一部にのみ形成されている場合も含まれる。
 本開示において「積層」との語は、層又は部材を積み重ねることを示し、二以上の層又は部材が結合されていてもよく、二以上の層又は部材が着脱可能であってもよい。
 本開示において、層又は部材の平均厚さは、対象となる層又は部材の5点の厚さを測定し、その算術平均値として与えられる値とする。
 層又は部材の厚さは、マイクロメーター等を用いて測定することができる。
 本開示において実施形態を図面を参照して説明する場合、当該実施形態の構成は図面に示された構成に限定されない。また、各図における部材の大きさは概念的なものであり、部材間の大きさの相対的な関係はこれに限定されない。
 本開示において、「回路の厚さ方向に見たとき」とは、素子実装面から回路の厚さ方向に見たとき、及び、素子実装面と逆の面から回路の厚さ方向に見たときの少なくとも一方を意味する。
 本開示において、「回路間」は、特定の回路と、特定の回路以外の別の回路との間、及び、1つの特定の回路における隙間を包含する。
Hereinafter, embodiments for carrying out the present invention will be described in detail. However, the present invention is not limited to the following embodiments. The configurations described in each embodiment may be combined as appropriate.
In the following embodiments, the components (including element steps and the like) are not essential unless otherwise specified. The same applies to the numerical values and their ranges, and does not limit the present invention.
In the present disclosure, the term "process" includes not only a process independent of other processes but also the process if the purpose of the process is achieved even if the process cannot be clearly distinguished from the other process. ..
The numerical range indicated by using "-" in the present disclosure includes the numerical values before and after "-" as the minimum value and the maximum value, respectively.
In the numerical range described stepwise in the present disclosure, the upper limit value or the lower limit value described in one numerical range may be replaced with the upper limit value or the lower limit value of another numerical range described stepwise. .. Further, in the numerical range described in the present disclosure, the upper limit value or the lower limit value of the numerical range may be replaced with the value shown in the examples.
In the present disclosure, each component may contain a plurality of applicable substances. When a plurality of substances corresponding to each component are present in the composition, the content or content of each component is the total content or content of the plurality of substances present in the composition unless otherwise specified. Means quantity.
In the present disclosure, the term "layer" is used not only when the area where the layer exists is observed, but also when it is formed only in a part of the area. included.
In the present disclosure, the term "laminated" means stacking layers or members, and two or more layers or members may be combined, or two or more layers or members may be removable.
In the present disclosure, the average thickness of the layer or member is a value given as an arithmetic mean value obtained by measuring the thickness of five points of the target layer or member.
The thickness of the layer or member can be measured using a micrometer or the like.
When the embodiment is described in the present disclosure with reference to the drawings, the configuration of the embodiment is not limited to the configuration shown in the drawings. Further, the size of the members in each figure is conceptual, and the relative relationship between the sizes of the members is not limited to this.
In the present disclosure, "when viewed in the thickness direction of the circuit" means when viewed in the thickness direction of the circuit from the element mounting surface and in the thickness direction of the circuit from the surface opposite to the element mounting surface. Means at least one of the times.
In the present disclosure, "inter-circuit" includes a gap between a specific circuit and another circuit other than the specific circuit, and in one specific circuit.
<第一実施形態の回路シート>
 本開示の第一実施形態の回路シートは、導体からなる回路と、前記回路の間の空間に設けられる絶縁部と、を備え、前記回路における、素子実装面と、前記素子実装面と逆の面との間の側面は段差を有し、前記段差が前記絶縁部で覆われてなる。
<Circuit sheet of the first embodiment>
The circuit sheet of the first embodiment of the present disclosure includes a circuit made of a conductor and an insulating portion provided in a space between the circuits, and the element mounting surface in the circuit is opposite to the element mounting surface. The side surface between the surface and the surface has a step, and the step is covered with the insulating portion.
 本開示の回路シートは、回路の側面が段差を有し、段差が絶縁部で覆われているため、回路と絶縁部とが接している部分の面積が大きくなり、回路と絶縁部との剥離が生じにくくなる。そのため、本開示の回路シートは、回路シートの熱処理、回路基板の作製工程での圧着等が実施された際に、回路の側面と、絶縁部との間に剥離が生じにくく、剥離箇所にて、気泡をトラップしたり、耐絶縁性が低下したりすることが抑制され、信頼性に優れる。 In the circuit sheet of the present disclosure, since the side surface of the circuit has a step and the step is covered with an insulating portion, the area of the portion where the circuit and the insulating portion are in contact with each other becomes large, and the circuit and the insulating portion are separated from each other. Is less likely to occur. Therefore, in the circuit sheet of the present disclosure, when heat treatment of the circuit sheet, crimping in the process of manufacturing the circuit board, etc. are performed, peeling is unlikely to occur between the side surface of the circuit and the insulating portion, and the peeling portion is present. , Trapping of air bubbles and deterioration of insulation resistance are suppressed, and the reliability is excellent.
 特に回路が複数存在し、隣接する回路間に電位差が生じる場合、回路の側面及びその近傍に、気泡、空隙等が生じていると回路シートの耐絶縁性が低下することから、回路の側面と、絶縁部との間の剥離の抑制は肝要である。本開示の回路シートは、このような場合であっても耐絶縁性の低下を好適に抑制でき、信頼性に優れる。 In particular, when there are a plurality of circuits and a potential difference occurs between adjacent circuits, the insulation resistance of the circuit sheet deteriorates if air bubbles, voids, etc. are generated on or near the side surface of the circuit. , It is important to suppress the peeling from the insulating part. Even in such a case, the circuit sheet of the present disclosure can suitably suppress a decrease in insulation resistance and is excellent in reliability.
 回路シートが、厚さが大きい回路、例えば厚銅回路を備える場合、回路の自重によって回路と絶縁部との剥離が生じやすくなっている。一方、本開示の回路シートでは、回路の厚さが大きい場合であっても、回路と絶縁部とが接している部分の面積が大きくなり、回路と絶縁部との剥離が生じにくい。 When the circuit sheet is provided with a circuit having a large thickness, for example, a thick copper circuit, the circuit and the insulating portion are likely to be separated due to the weight of the circuit itself. On the other hand, in the circuit sheet of the present disclosure, even when the thickness of the circuit is large, the area of the portion where the circuit and the insulating portion are in contact with each other is large, and the circuit and the insulating portion are unlikely to be separated from each other.
 本開示の回路シートは、導体からなる回路を少なくとも一つ備える。回路の材質としては、導体であれば特に限定されず、例えば、金属が挙げられる。金属としては、銅、銀、クロム銅、タングステン銅、ニッケル、ニッケルメッキ銅、アルミニウム、アルマイトに表面修飾したアルミニウム等が挙げられる。導電性の観点から、金属は銅を含むことが好ましい。 The circuit sheet of the present disclosure includes at least one circuit composed of conductors. The material of the circuit is not particularly limited as long as it is a conductor, and examples thereof include metal. Examples of the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity, the metal preferably contains copper.
 回路の厚さは特に制限されず、回路シートの用途等に応じて選択できる。回路の大電流化の観点から、回路の厚さは350μm以上であることが好ましく、回路に段差を設けやすい観点から、400μm以上であることがより好ましく、回路に段差を設けても回路の強度を保持しやすい観点から、500μm以上であることがさらに好ましく、回路と絶縁部との接着面積を広く確保して剥離を抑制しやすい観点から、1000μm以上であることが特に好ましい。軽量化及び低背化の観点からは、回路の厚さは5000μm以下であってもよい。回路に段差を設けやすい観点から、3000μm以下であることが好ましい。回路の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
 絶縁層等の回路シートに隣接する部材に回路の一部が埋め込まれている場合は、埋め込まれている部分の厚さも回路の厚さに含まれる。
The thickness of the circuit is not particularly limited and can be selected according to the application of the circuit sheet and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably 350 μm or more, and from the viewpoint of easily providing a step in the circuit, it is more preferably 400 μm or more. It is more preferably 500 μm or more from the viewpoint of easy holding, and particularly preferably 1000 μm or more from the viewpoint of securing a wide adhesive area between the circuit and the insulating portion and easily suppressing peeling. From the viewpoint of weight reduction and height reduction, the thickness of the circuit may be 5000 μm or less. It is preferably 3000 μm or less from the viewpoint that a step is easily provided in the circuit. When the thickness of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
When a part of the circuit is embedded in a member adjacent to the circuit sheet such as an insulating layer, the thickness of the embedded part is also included in the thickness of the circuit.
 回路シートの素子実装面を観察したときの回路の幅は特に制限されず、回路シートの用途等に応じて選択してよい。例えば、回路の幅は100μm~100mmであってもよい。回路の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。 The width of the circuit when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like. For example, the width of the circuit may be 100 μm to 100 mm. When the width of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 回路は、例えば、金属板を所望の形状の回路の状態に加工することで得ることができる。加工の方法は特に制限されず、打抜き、切削、エッチング、それらを組み合わせた加工等の公知の方法によって行うことができる。回路作製における精度の向上の観点、段差を加工することが容易である観点等から、切削、エッチング加工等にて回路を形成することが好ましい。段差形成時に加工応力によって回路を変形させにくい観点からエッチング加工がより好ましい。 The circuit can be obtained, for example, by processing a metal plate into a circuit state having a desired shape. The processing method is not particularly limited, and can be performed by a known method such as punching, cutting, etching, and processing in which they are combined. It is preferable to form the circuit by cutting, etching, or the like from the viewpoint of improving the accuracy in circuit fabrication, the viewpoint that it is easy to process the step, and the like. Etching is more preferable from the viewpoint that the circuit is not easily deformed by machining stress when forming a step.
 回路をエッチング加工にて作製する場合、金属板のエッチング方法は特に制限されない。本開示の回路シートの作製が容易である観点から、金属板の両面(すなわち向かい合う2つの主面)からエッチングすることにより回路を形成することが好ましい。両面から加工することによって段差を形成しやすく、作業効率が高い。金属板の両面からエッチングする場合、両面同時にエッチングしてもよく、両面を交互にエッチングしてもよい。 When the circuit is manufactured by etching, the etching method of the metal plate is not particularly limited. From the viewpoint of facilitating the production of the circuit sheet of the present disclosure, it is preferable to form the circuit by etching from both sides (that is, two main surfaces facing each other) of the metal plate. By processing from both sides, it is easy to form a step, and work efficiency is high. When etching from both sides of the metal plate, both sides may be etched at the same time, or both sides may be etched alternately.
 回路は、粗化処理されていてもよい。例えば、回路が後述の絶縁層と接する場合、当該絶縁層と接する面が少なくとも粗化処理されていると、ボイドの発生を抑制しながら、絶縁層と十分に接着できる状態とすることができる。具体的には、回路の絶縁層と接する面を粗化し、アンカー効果による引き抜き力を向上させるか密着面積を増大させることで、ファンデルワールス力による密着性を向上することができると考えられる。 The circuit may be roughened. For example, when the circuit is in contact with an insulating layer described later, if the surface in contact with the insulating layer is at least roughened, it is possible to obtain a state in which the circuit can be sufficiently adhered to the insulating layer while suppressing the generation of voids. Specifically, it is considered that the adhesion due to the Van der Waals force can be improved by roughening the surface in contact with the insulating layer of the circuit to improve the pull-out force due to the anchor effect or increase the adhesion area.
 回路を粗化処理する方法は特に制限されず、物理的な方法で行っても、化学的な方法で行ってもよい。例えば、回路の材質が銅であれば、物理的な方法としては、やすりがけ、サンドブラスト処理、レーザー照射、フライス加工等が挙げられる。化学的な方法としては、マグダミット処理、CZ処理、黒化処理、エッチング処理、メッキ処理等が挙げられる。粗化処理は、いずれか1種の方法により行っても、2種以上を組み合わせてもよい。2種以上を組み合わせる場合は、物理的な方法と化学的な方法を組み合わせて行っても、化学的な方法同士を組み合わせて行っても、物理的な方法同士を組み合わせて行ってもよい。 The method of roughening the circuit is not particularly limited, and it may be performed by a physical method or a chemical method. For example, when the material of the circuit is copper, the physical method includes sanding, sandblasting, laser irradiation, milling and the like. Examples of the chemical method include a magdamit treatment, a CZ treatment, a blackening treatment, an etching treatment, a plating treatment and the like. The roughening treatment may be carried out by any one method or a combination of two or more. When two or more kinds are combined, the physical method and the chemical method may be combined, the chemical methods may be combined, or the physical methods may be combined.
 本開示の回路シートは、回路の間の空間の少なくとも一部に設けられる絶縁部を備える。回路シートの絶縁部の形成に用いる絶縁材料としては、エポキシ樹脂、フェノール樹脂、ユリア樹脂、メラミン樹脂、ウレタン樹脂、シリコーン樹脂、不飽和ポリエステル樹脂、アクリル樹脂等の樹脂を含む材料が挙げられる。絶縁材料に含まれる樹脂は、1種であっても2種以上であってもよい。絶縁材料は、必要に応じて、無機フィラー等の樹脂以外の成分を含んでもよい。 The circuit sheet of the present disclosure includes an insulating portion provided in at least a part of the space between circuits. Examples of the insulating material used for forming the insulating portion of the circuit sheet include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, and acrylic resin. The resin contained in the insulating material may be one kind or two or more kinds. The insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
 回路シートの素子実装面を観察したときの絶縁部の幅は特に制限されず、回路シートの用途等に応じて選択してよい。例えば、絶縁部の幅は100μm~100mmであってもよい。絶縁部の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。 The width of the insulating portion when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like. For example, the width of the insulating portion may be 100 μm to 100 mm. When the width of the insulating portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 絶縁部の厚さは特に限定されず、回路シートの用途等に応じて選択できる。回路の厚さに対する絶縁部の厚さ(絶縁部の厚さ/回路の厚さ)は、充分な絶縁性の確保の観点から、0.5以上が好ましく、複数の回路の位置を絶縁部が好適に保持する観点から、0.7以上がより好ましく、回路基板の作製工程での圧着時に回路と絶縁部との間の圧力の差を低減できる観点から、0.9以上がさらに好ましい。また、絶縁部の厚さ/回路の厚さは、素子実装の作業性の観点から、1.0以下が好ましく、0.99以下がより好ましい。
 絶縁部の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
The thickness of the insulating portion is not particularly limited and can be selected according to the application of the circuit sheet and the like. The thickness of the insulating portion (thickness of the insulating portion / thickness of the circuit) with respect to the thickness of the circuit is preferably 0.5 or more from the viewpoint of ensuring sufficient insulating properties, and the insulating portion positions a plurality of circuits. From the viewpoint of preferably holding, 0.7 or more is more preferable, and from the viewpoint of reducing the pressure difference between the circuit and the insulating portion at the time of crimping in the process of manufacturing the circuit board, 0.9 or more is further preferable. Further, the thickness of the insulating portion / the thickness of the circuit is preferably 1.0 or less, more preferably 0.99 or less, from the viewpoint of workability of element mounting.
When the thickness of the insulating portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 本開示の回路シートは、回路の側面における段差が素子実装面及び素子実装面と逆の面の少なくとも一方と平行な面を有することが好ましい。これにより、回路と絶縁部とが接している部分の面積が大きくなることによる回路と絶縁部との剥離の抑制、及び、段差付近に生じるせん断力による回路の側面における剥離を抑制することができる。 The circuit sheet of the present disclosure preferably has a surface in which a step on the side surface of the circuit is parallel to at least one of the element mounting surface and the surface opposite to the element mounting surface. As a result, it is possible to suppress peeling between the circuit and the insulating portion due to an increase in the area of the portion where the circuit and the insulating portion are in contact with each other, and to suppress peeling on the side surface of the circuit due to a shearing force generated near the step. ..
 本開示の回路シートは回路の側面における段差が素子実装面及び素子実装面と逆の面の少なくとも一方と平行な面を有する場合、前述の面の幅は、回路と絶縁部との剥離を抑制する観点から、100μm以上であることが好ましく、回路と絶縁部との接着面積を充分に確保する観点から、500μm以上であることがより好ましく、せん断力による回路の側面における剥離を充分に抑制する観点から、500μm超であることがさらに好ましい。前述の面の幅は、素子実装面の面積よりも素子実装面と逆の面の面積が小さくなるような段差の場合、素子実装と放熱性とのバランスを確保する観点から、5000μm以下であることが好ましく、絶縁層と回路との接着面積を広げて放熱面積を確保する観点から、3000μm以下であることがより好ましい。素子実装面と逆の面の面積よりも素子実装面の面積が小さくなるような段差の場合、素子実装面積を確保できれば、できるだけ前述の幅を大きくすることによって放熱面積を確保することができる。
 前述の面の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
In the circuit sheet of the present disclosure, when the step on the side surface of the circuit has a surface parallel to at least one of the element mounting surface and the surface opposite to the element mounting surface, the width of the above-mentioned surface suppresses the separation between the circuit and the insulating portion. From the viewpoint of From the viewpoint, it is more preferably more than 500 μm. The width of the above-mentioned surface is 5000 μm or less from the viewpoint of ensuring a balance between element mounting and heat dissipation in the case of a step in which the area of the surface opposite to the element mounting surface is smaller than the area of the element mounting surface. It is preferable, and it is more preferably 3000 μm or less from the viewpoint of widening the bonding area between the insulating layer and the circuit to secure the heat radiation area. In the case of a step in which the area of the element mounting surface is smaller than the area of the surface opposite to the element mounting surface, if the element mounting area can be secured, the heat dissipation area can be secured by increasing the width as described above as much as possible.
When the width of the above-mentioned surface is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above-mentioned value.
 本開示の回路シートでは、回路は、回路の厚さ方向における回路の断面形状は、略凸形状、略十字形状、略T字形状等となる領域を有していてもよく、回路の厚さ方向における両端部に発生するせん断力を抑制する観点から、略T字形状となる領域を有することが好ましい。回路の厚さ方向における回路の断面形状が、略凸形状、略十字形状等となる領域を有する場合、回路のその断面は、回路シートの長さ方向と平行な方向の断面であってもよく、回路シートの幅方向と平行な断面であってもよい。また、回路シートが、回路の断面形状が略T字形状となる領域を有する場合、素子実装面側の断面の幅がより大きくてもよく、素子実装面と逆の面側の断面の幅がより大きくてもよい。 In the circuit sheet of the present disclosure, the circuit may have a region in which the cross-sectional shape of the circuit in the thickness direction of the circuit is a substantially convex shape, a substantially cross shape, a substantially T shape, or the like, and the thickness of the circuit. From the viewpoint of suppressing the shearing force generated at both ends in the direction, it is preferable to have a region having a substantially T-shape. When the cross-sectional shape of the circuit in the thickness direction of the circuit has a region having a substantially convex shape, a substantially cross shape, or the like, the cross section of the circuit may be a cross section in a direction parallel to the length direction of the circuit sheet. , The cross section may be parallel to the width direction of the circuit sheet. Further, when the circuit sheet has a region in which the cross-sectional shape of the circuit is substantially T-shaped, the width of the cross section on the element mounting surface side may be larger, and the width of the cross section on the surface side opposite to the element mounting surface may be larger. It may be larger.
 回路シートが、回路の断面形状が略凸形状又は略T字形状となる領域を有する場合、素子実装面側及び素子実装面と逆の面側の内、断面の幅がより小さい方の幅(幅1)に対する断面の幅がより大きい方の幅(幅2)の比(幅2/幅1)は、0.2~1未満であることが好ましく、0.5~1未満であることがより好ましい。 When the circuit sheet has a region in which the cross-sectional shape of the circuit is substantially convex or substantially T-shaped, the width of the element mounting surface side and the surface side opposite to the element mounting surface, whichever has the smaller cross-sectional width ( The ratio (width 2 / width 1) of the width (width 2) having a larger cross-sectional width to the width 1) is preferably 0.2 to less than 1, and preferably 0.5 to less than 1. More preferred.
 本開示の回路シートは、回路の厚さ方向に見たときに、段差が、回路の外周に設けられていることが好ましく、回路の外周全体に設けられていることがより好ましい。段差が回路の外周全体に設けられていることによって、剥離が発生しやすい箇所がなくなり、回路の側面における剥離を好適に抑制できる。また、本開示の回路シートは、回路の厚さ方向に見たときに、段差が、前記回路の内周に設けられていてもよく、前記回路の内周の全体に設けられていてもよい。段差が回路の内周全体に設けられることによって、回路の側面における剥離を好適に抑制できる。 When viewed in the thickness direction of the circuit, the circuit sheet of the present disclosure preferably has a step on the outer circumference of the circuit, and more preferably on the entire outer circumference of the circuit. By providing the step on the entire outer circumference of the circuit, there are no places where peeling is likely to occur, and peeling on the side surface of the circuit can be suitably suppressed. Further, in the circuit sheet of the present disclosure, when viewed in the thickness direction of the circuit, a step may be provided on the inner circumference of the circuit, or may be provided on the entire inner circumference of the circuit. .. By providing the step on the entire inner circumference of the circuit, peeling on the side surface of the circuit can be suitably suppressed.
 本開示の回路シートは、回路の厚さ方向に見たときに、段差が、前記回路の内部に設けられており、前記回路の内部の空間に設けられる絶縁部は、前記回路の外周の空間に設けられる絶縁部と2箇所以上で接続していることが好ましい。回路の内部に設けられる絶縁部と、前記回路の外部に設けられる絶縁部とが2箇所以上で接続していることで、回路と絶縁部とが接している部分の面積が好適に大きくなり、回路と絶縁部との剥離が好適に生じにくくなる。特に回路の内部に設けられる絶縁部について、回路との剥離が好適に生じにくくなる。さらに、回路と絶縁部とが接している部分の2箇所以上の内、2箇所の回路と絶縁部とが接している部分は、互いに対向していることが好ましい。前述の部分が互いに対向していることによって回路にせん断力が生じた場合、回路が傾いて絶縁部と剥離することを好適に抑制できる。 In the circuit sheet of the present disclosure, when viewed in the thickness direction of the circuit, a step is provided inside the circuit, and the insulating portion provided in the space inside the circuit is the space around the circuit. It is preferable to connect to the insulating portion provided in the above at two or more places. By connecting the insulating portion provided inside the circuit and the insulating portion provided outside the circuit at two or more points, the area of the portion where the circuit and the insulating portion are in contact with each other is preferably increased. Peeling between the circuit and the insulating portion is less likely to occur. In particular, the insulating portion provided inside the circuit is less likely to be separated from the circuit. Further, it is preferable that the portions where the circuit and the insulating portion are in contact with each other are opposed to each other among the two or more portions where the circuit and the insulating portion are in contact with each other. When a shearing force is generated in the circuit due to the above-mentioned portions facing each other, it is possible to preferably prevent the circuit from tilting and peeling from the insulating portion.
 回路の内部に設けられる絶縁部と、前記回路の外部に設けられる絶縁部とが接続している部分における絶縁部の幅は、回路と絶縁部との剥離を抑制する観点から、500μm以上であることが好ましく、前述の接続している部分における絶縁部の強度を確保しやすい観点から、1000μm以上であることがより好ましい。前述の部分における絶縁部の幅は、放熱面積、素子実装面積等を確保しやすい観点から、5000μm以下であることが好ましく、絶縁部をトランスファー成型で形成する場合に絶縁部が形成しやすい観点から、3000μm以下であることがより好ましい。
 前述の部分における絶縁部の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
The width of the insulating portion in the portion where the insulating portion provided inside the circuit and the insulating portion provided outside the circuit are connected is 500 μm or more from the viewpoint of suppressing separation between the circuit and the insulating portion. It is preferable, and it is more preferably 1000 μm or more from the viewpoint of easily securing the strength of the insulating portion in the above-mentioned connected portion. The width of the insulating portion in the above-mentioned portion is preferably 5000 μm or less from the viewpoint of easily securing the heat dissipation area, the element mounting area, etc., and from the viewpoint of easily forming the insulating portion when the insulating portion is formed by transfer molding. It is more preferably 3000 μm or less.
When the width of the insulating portion in the above-mentioned portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above-mentioned value.
 回路の内部に設けられる絶縁部と、前記回路の外部に設けられる絶縁部とが接続している部分における絶縁部の厚さは、絶縁部の厚さに対して、回路と絶縁部との剥離を抑制する観点から、10%以上であることが好ましく、前述の接続している部分における絶縁部の強度を確保する観点から、40%以上であることがより好ましい。前述の部分における絶縁部の厚さは、絶縁部の厚さに対して、回路の強度を確保する観点から、90%以下であることが好ましく、回路における、前述の接続している部分と接着している部分(回路の薄肉部)の変形を抑制する観点から、60%以下であることがより好ましい。
 前述の部分における絶縁部の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
The thickness of the insulating portion at the portion where the insulating portion provided inside the circuit and the insulating portion provided outside the circuit are connected is the separation between the circuit and the insulating portion with respect to the thickness of the insulating portion. It is preferably 10% or more from the viewpoint of suppressing the above, and more preferably 40% or more from the viewpoint of ensuring the strength of the insulating portion in the above-mentioned connected portion. The thickness of the insulating portion in the above-mentioned portion is preferably 90% or less with respect to the thickness of the insulating portion from the viewpoint of ensuring the strength of the circuit, and is adhered to the above-mentioned connecting portion in the circuit. From the viewpoint of suppressing deformation of the formed portion (thin-walled portion of the circuit), it is more preferably 60% or less.
If the thickness of the insulating portion in the above-mentioned portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected locations may be used as the above-mentioned value.
 回路の内部に設けられる絶縁部と、前記回路の外部に設けられる絶縁部とが接続している部分は、素子実装面側に設けられていてもよく、素子実装面と逆の面側に設けられていてもよい。 The portion where the insulating portion provided inside the circuit and the insulating portion provided outside the circuit are connected may be provided on the element mounting surface side, and may be provided on the surface side opposite to the element mounting surface. It may have been.
 本開示の回路シートでは、側面の表面粗さ(以下、「表面粗さA」ともいう)は、素子実装面の表面粗さ(以下、「表面粗さB」ともいう)及び素子実装面と逆の面の表面粗さ(以下、「表面粗さC」ともいう)の少なくとも一方よりも大きいことが好ましく、素子実装面の表面粗さよりも大きいことがより好ましい。 In the circuit sheet of the present disclosure, the surface roughness of the side surface (hereinafter, also referred to as "surface roughness A") is the surface roughness of the element mounting surface (hereinafter, also referred to as "surface roughness B") and the element mounting surface. It is preferably larger than at least one of the surface roughness of the opposite surface (hereinafter, also referred to as "surface roughness C"), and more preferably larger than the surface roughness of the element mounting surface.
 素子実装面の表面粗さと、素子実装面と逆の面(例えば、絶縁層と接する面)の表面粗さとは、同じであってもよく、異なっていてもよい。回路と絶縁層との剥離を抑制する観点からは、素子実装面と逆の面の表面粗さは、回路の素子実装面の表面粗さよりも大きいことが好ましい。 The surface roughness of the element mounting surface and the surface roughness of the surface opposite to the element mounting surface (for example, the surface in contact with the insulating layer) may be the same or different. From the viewpoint of suppressing peeling between the circuit and the insulating layer, the surface roughness of the surface opposite to the element mounting surface is preferably larger than the surface roughness of the element mounting surface of the circuit.
 本開示において回路の表面粗さは、JIS B 0601(2001)で規定される算術平均粗さ(Ra)で表してもよい。
 Raで表したときの表面粗さAは、0.2μm以上であることが好ましく、回路と絶縁部との接着力を安定的に確保する観点から、0.5μm以上であることがより好ましく、回路と絶縁部との強固な接着力を得る観点から、1.0μm以上であることがさらに好ましい。高電圧をかけたときに局所的な電界集中を避ける観点から、Raで表したときの表面粗さAは、10μm以下であってもよい。
In the present disclosure, the surface roughness of the circuit may be expressed by the arithmetic mean roughness (Ra) defined by JIS B 0601 (2001).
The surface roughness A expressed in Ra is preferably 0.2 μm or more, and more preferably 0.5 μm or more from the viewpoint of stably ensuring the adhesive force between the circuit and the insulating portion. From the viewpoint of obtaining a strong adhesive force between the circuit and the insulating portion, it is more preferably 1.0 μm or more. From the viewpoint of avoiding local electric field concentration when a high voltage is applied, the surface roughness A expressed in Ra may be 10 μm or less.
 Raで表したときの表面粗さBは、0.4μm未満であることが好ましく、0.3μm以下であることがより好ましく、0.2μm以下であることがさらに好ましい。 The surface roughness B represented by Ra is preferably less than 0.4 μm, more preferably 0.3 μm or less, and further preferably 0.2 μm or less.
 Raで表したときの表面粗さCは、0.2μm以上であることが好ましく、0.5μm以上であることがより好ましく、1.0μm以上であることがさらに好ましい。高電圧をかけたときに局所的な電界集中を避ける観点から、Raで表したときの表面粗さCは、10μm以下であってもよい。 The surface roughness C when represented by Ra is preferably 0.2 μm or more, more preferably 0.5 μm or more, and further preferably 1.0 μm or more. From the viewpoint of avoiding local electric field concentration when a high voltage is applied, the surface roughness C expressed in Ra may be 10 μm or less.
 Raで表したときの表面粗さAと表面粗さBとの相対比は特に制限されない。例えば、表面粗さAは表面粗さBの1倍超~100倍であってもよい。 The relative ratio of the surface roughness A and the surface roughness B when expressed in Ra is not particularly limited. For example, the surface roughness A may be more than 1 time to 100 times the surface roughness B.
 以下、従来の回路シート及び本開示の回路シートの具体例について、図1A~図1Eを参照して説明する。 Hereinafter, specific examples of the conventional circuit sheet and the circuit sheet of the present disclosure will be described with reference to FIGS. 1A to 1E.
 図1Dは、素子実装面から見たときの従来の回路シートの具体例の概略平面図であり、図1Eは、図1DのA-A線断面図である。図1D及び図1Eに示す回路シート20は、回路1と、回路1の間に設けられる絶縁部2と、を備える。図1D及び図1Eに示すように、回路1における、素子実装面と、素子実装面と逆の面との間の側面は段差を有していない。そのため、回路シート20の熱処理、回路基板の作製工程での圧着等が実施されることで回路1の側面と、絶縁部2との間に剥離が生じやすく、剥離箇所にて、気泡をトラップしたり、耐絶縁性が低下したりする等によって回路シート20の信頼性が損なわれるおそれがある。 FIG. 1D is a schematic plan view of a specific example of a conventional circuit sheet when viewed from the element mounting surface, and FIG. 1E is a cross-sectional view taken along the line AA of FIG. 1D. The circuit sheet 20 shown in FIGS. 1D and 1E includes a circuit 1 and an insulating portion 2 provided between the circuits 1. As shown in FIGS. 1D and 1E, the side surface of the circuit 1 between the element mounting surface and the surface opposite to the element mounting surface does not have a step. Therefore, heat treatment of the circuit sheet 20, crimping in the process of manufacturing the circuit board, and the like are likely to cause peeling between the side surface of the circuit 1 and the insulating portion 2, and air bubbles are trapped at the peeled portion. In addition, the reliability of the circuit sheet 20 may be impaired due to a decrease in insulation resistance or the like.
 図1Aは、本開示の回路シートの具体例の概略平面図であり、図1Bは、図1AのA-A線断面図であり、図1Cは、図1Bの拡大図である。図1A及び図1Bに示す回路シート10は、回路1と回路1の間に設けられる絶縁部2と、を備え、回路1における、素子実装面と、素子実装面と逆の面との間の側面は段差3を有している。したがって、回路1と絶縁部2とが接している部分の面積が大きくなり、回路1と絶縁部2との剥離が生じにくくなる。そのため、回路シート10の熱処理、回路基板の作製工程での圧着等が実施された際に、回路1の側面と、絶縁部2との間に剥離が生じにくく、剥離箇所にて、気泡をトラップしたり、耐絶縁性が低下したりすることが抑制され、回路シート10の信頼性に優れる。 1A is a schematic plan view of a specific example of the circuit sheet of the present disclosure, FIG. 1B is a sectional view taken along line AA of FIG. 1A, and FIG. 1C is an enlarged view of FIG. 1B. The circuit sheet 10 shown in FIGS. 1A and 1B includes an insulating portion 2 provided between the circuit 1 and the circuit 1, and is located between the element mounting surface and the surface opposite to the element mounting surface in the circuit 1. The side surface has a step 3. Therefore, the area of the portion where the circuit 1 and the insulating portion 2 are in contact with each other becomes large, and the circuit 1 and the insulating portion 2 are less likely to be separated from each other. Therefore, when the circuit sheet 10 is heat-treated or crimped in the process of manufacturing the circuit board, peeling is unlikely to occur between the side surface of the circuit 1 and the insulating portion 2, and air bubbles are trapped at the peeled portion. The circuit sheet 10 is excellent in reliability because it is suppressed from being damaged or the insulation resistance is lowered.
 回路シート10では、素子実装面から回路1の厚さ方向に見たときに、段差3が回路1の内周全体及び回路1の外周全体に設けられている。また、図1Aに示すように、素子実装面と平行かつA-A線と直交する方向において、回路1の内部の空間に設けられる絶縁部2は、回路1の外周の空間に設けられる絶縁部2と2箇所で接続している。また、図1B及び図1Cに示すように、段差3は、素子実装面及び素子実装面と逆の面に平行な面3Aを有する。 In the circuit sheet 10, when viewed from the element mounting surface in the thickness direction of the circuit 1, the step 3 is provided on the entire inner circumference of the circuit 1 and the entire outer circumference of the circuit 1. Further, as shown in FIG. 1A, the insulating portion 2 provided in the space inside the circuit 1 in the direction parallel to the element mounting surface and orthogonal to the line AA is an insulating portion provided in the space around the circuit 1. It is connected at 2 and 2 places. Further, as shown in FIGS. 1B and 1C, the step 3 has a surface 3A parallel to the element mounting surface and the surface opposite to the element mounting surface.
 本開示の回路シートを製造する方法は特に限定されない。本開示の回路シートを製造する方法は、例えば、仮基材上に配置された、回路によって形成された空間に絶縁材料を充填する工程を有し、絶縁材料が樹脂等である場合、必要に応じて、充填させた絶縁材料を硬化させる工程を有していてもよい。回路によって形成された空間としては、例えば、回路間の空間が挙げられる。 The method for manufacturing the circuit sheet of the present disclosure is not particularly limited. The method for manufacturing the circuit sheet of the present disclosure includes, for example, a step of filling a space formed by the circuit, which is arranged on a temporary base material, with an insulating material, and is necessary when the insulating material is a resin or the like. Accordingly, it may have a step of curing the filled insulating material. Examples of the space formed by the circuits include spaces between circuits.
 回路は、金属を仮基材上に配置し、次いでエッチングを行うことによって仮基材上に形成されたものであってもよく、金属板の両面(すなわち向かい合う2つの主面)からエッチングすることにより回路を形成することが好ましい。 The circuit may be formed on the temporary substrate by arranging the metal on the temporary substrate and then performing etching, and etching from both sides of the metal plate (that is, two facing main surfaces). It is preferable to form a circuit by etching.
 本開示において仮基材とは、仮基材上に配置された回路によって形成された空間に絶縁材料を充填する前に回路を仮固定することができ、絶縁材料を充填した後に回路から除去できるものをいう。ここで、回路が仮固定されているとは、回路が仮基材との接触によって相対的な位置関係を維持していることをいい、必ずしも回路が完全に動かないことを意味するものではない。 In the present disclosure, the temporary base material can temporarily fix the circuit before filling the space formed by the circuit arranged on the temporary base material with the insulating material, and can be removed from the circuit after filling with the insulating material. Say something. Here, the fact that the circuit is temporarily fixed means that the circuit maintains a relative positional relationship due to contact with the temporary base material, and does not necessarily mean that the circuit does not move completely. ..
 仮基材としては、樹脂フィルム等が挙げられる。仮基材に使用できる樹脂フィムルとしては、支持フィルムと支持フィルム上に形成される接着層とを有する樹脂フィルム等が挙げられる。 Examples of the temporary base material include a resin film and the like. Examples of the resin film that can be used as the temporary base material include a resin film having a support film and an adhesive layer formed on the support film.
<第一実施形態の回路基板>
 本開示の第一実施形態の回路基板は、上述した本開示の第一実施形態の回路シートと、前記回路シートの素子実装面と逆の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、をこの順に有する。本開示の回路シートは、回路が絶縁部とはがれて傾いたり、回路と絶縁部との間に隙間が生じたりすることで、絶縁層に対して均一な圧力がかからない状況を低減することができる。また、製造された回路基板の絶縁層の厚さの均一性に優れる。その結果、本開示の回路基板は、接着信頼性が高く、放熱性、絶縁性等に優れる傾向にある。
<Circuit board of the first embodiment>
The circuit board of the first embodiment of the present disclosure includes the circuit sheet of the first embodiment of the present disclosure described above, an insulating layer arranged so as to be in contact with a surface opposite to the element mounting surface of the circuit sheet, and the insulation. A heat radiating member arranged so as to be in contact with the layer is provided in this order. The circuit sheet of the present disclosure can reduce the situation where a uniform pressure is not applied to the insulating layer because the circuit is peeled off from the insulating portion and tilted, or a gap is generated between the circuit and the insulating portion. .. In addition, the thickness of the insulating layer of the manufactured circuit board is excellent in uniformity. As a result, the circuit board of the present disclosure tends to have high adhesive reliability and excellent heat dissipation, insulation and the like.
 回路基板に用いられる絶縁層及び放熱部材の種類は特に制限されず、回路基板に一般的に使用されるものから選択できる。絶縁層の形成に用いる絶縁材料の好ましい形態は、絶縁部の形成に用いる絶縁材料の好ましい形態と同様であってもよい。放熱部材の材質は特に制限されず、銅、アルミニウム、タングステン銅、モリブデン銅等の銅合金、ニッケルめっき銅などが挙げられる。放熱部材の種類は特に制限されず、ヒートスプレッダ、ヒートシンク等の放熱機能を有する部材、空気又は水の流路を持ったケース、金属箔、フィラー樹脂コンポジットなどであってもよい。放熱部材の表面は平滑であってもよく、絶縁層との接着性を向上させるための粗化処理が施されていてもよい The types of the insulating layer and the heat radiating member used for the circuit board are not particularly limited, and can be selected from those generally used for the circuit board. The preferred form of the insulating material used for forming the insulating layer may be the same as the preferred form of the insulating material used for forming the insulating portion. The material of the heat radiating member is not particularly limited, and examples thereof include copper, aluminum, tungsten copper, copper alloys such as molybdenum copper, and nickel-plated copper. The type of the heat radiating member is not particularly limited, and may be a member having a heat radiating function such as a heat spreader or a heat sink, a case having an air or water flow path, a metal foil, a filler resin composite, or the like. The surface of the heat radiating member may be smooth, and may be roughened to improve the adhesiveness with the insulating layer.
 絶縁層の厚さは特に制限されず、回路基板の用途等に応じて選択できる。充分な絶縁性を確保する観点からは、絶縁層の厚さは50μm以上であることが好ましく、回路シートに凹凸がある場合の、凹凸追従性の観点から、100μm以上であることがより好ましく、圧力によるせん断力を吸収する観点から、150μm以上であることがさらに好ましい。 The thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board. From the viewpoint of ensuring sufficient insulating properties, the thickness of the insulating layer is preferably 50 μm or more, and more preferably 100 μm or more from the viewpoint of unevenness followability when the circuit sheet has irregularities. From the viewpoint of absorbing the shearing force due to pressure, it is more preferably 150 μm or more.
 充分な放熱性を確保する観点からは、絶縁層の厚さは400μm以下であることが好ましく、圧力によるせん断力を生じさせにくい観点から、300μm以下であることがより好ましく、250μm以下であることがさらに好ましい。 From the viewpoint of ensuring sufficient heat dissipation, the thickness of the insulating layer is preferably 400 μm or less, and from the viewpoint of less likely to generate shearing force due to pressure, it is more preferably 300 μm or less, and more preferably 250 μm or less. Is even more preferable.
<第一実施形態の回路基板の製造方法>
 本開示の第一実施形態の回路基板の製造方法は、上述した本開示の第一実施形態の回路シートと、前記回路シートの素子実装面と逆の面に配置される絶縁層と、放熱部材と、をこの順に配置した状態の積層体を厚さ方向に加圧する工程を有する。
<Manufacturing method of circuit board of the first embodiment>
The method for manufacturing the circuit board of the first embodiment of the present disclosure includes the circuit sheet of the first embodiment of the present disclosure described above, an insulating layer arranged on a surface opposite to the element mounting surface of the circuit sheet, and a heat radiating member. And, there is a step of pressurizing the laminated body in the state which arranged in this order in the thickness direction.
 上記方法において積層体を加圧する方法は特に制限されず、回路基板の製造工程において一般的に行われる方法から選択できる。 The method of pressurizing the laminate in the above method is not particularly limited, and can be selected from the methods generally performed in the circuit board manufacturing process.
<第二実施形態の回路基板>
 本開示の第二実施形態の回路基板は、導体からなり、第一の面、及び前記第一の面とは反対側に位置する第二の面を備える回路と、前記回路の前記第二の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、を厚さ方向にこの順に備え、前記回路側からの平面視にて、前記第一の面の外周縁部と、前記第二の面の外周縁部と、が重ならない領域が存在する。
<Circuit board of the second embodiment>
The circuit board of the second embodiment of the present disclosure comprises a circuit composed of a conductor and having a first surface and a second surface located on a side opposite to the first surface, and the second surface of the circuit. An insulating layer arranged so as to be in contact with a surface and a heat radiating member arranged so as to be in contact with the insulating layer are provided in this order in the thickness direction, and the first surface is viewed from the circuit side in a plan view. There is a region where the outer peripheral edge portion of the second surface and the outer peripheral edge portion of the second surface do not overlap.
 本開示の回路基板は、回路側からの平面視にて、第一の面の外周縁部と、第二の面の外周縁部と、が重ならない領域が存在する。これにより、回路の第一の面が加圧された場合に、回路の第一の面の外周縁部での第二の面への圧力が分散される。そのため、回路基板の作製工程後に回路基板の加圧を解除することで、回路の外周縁部にて加圧による圧縮から元に戻ろうとする現象(スプリングバック)が抑制され、回路の外周縁部と絶縁層との間に剥離が生じにくくなる。回路の外周縁部と絶縁層との間に剥離が生じにくくなることにより、剥離箇所にて気泡をトラップしたり、耐絶縁性が低下したりする等によって信頼性が損なわれることが抑制されるため、本開示の回路基板は信頼性に優れる。 The circuit board of the present disclosure has a region in which the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface do not overlap in a plan view from the circuit side. As a result, when the first surface of the circuit is pressurized, the pressure on the second surface at the outer peripheral edge of the first surface of the circuit is distributed. Therefore, by releasing the pressurization of the circuit board after the process of manufacturing the circuit board, the phenomenon (springback) of trying to return from the compression due to the pressurization at the outer peripheral edge of the circuit is suppressed, and the outer peripheral edge of the circuit is suppressed. Peeling is less likely to occur between the and the insulating layer. Since peeling is less likely to occur between the outer peripheral edge of the circuit and the insulating layer, it is possible to prevent the reliability from being impaired due to trapping air bubbles at the peeling point or deterioration of insulation resistance. Therefore, the circuit board of the present disclosure is excellent in reliability.
 特に回路が複数存在し、隣接する回路間に電位差が生じる場合、回路の外周縁部に、気泡、空隙等が生じていると回路基板の耐絶縁性が低下することから、回路の外周縁部と、絶縁層との間の剥離の抑制は肝要である。本開示の回路基板は、このような場合であっても耐絶縁性の低下を好適に抑制でき、信頼性に優れる。 In particular, when there are a plurality of circuits and a potential difference occurs between adjacent circuits, the insulation resistance of the circuit board deteriorates if air bubbles, voids, etc. are generated in the outer peripheral edge of the circuit. It is important to suppress the peeling between the and the insulating layer. Even in such a case, the circuit board of the present disclosure can suitably suppress a decrease in insulation resistance and is excellent in reliability.
 回路の第一の面が加圧された場合に、回路の第一の面の外周縁部での第二の面への圧力が分散されると、回路の第一の面の外周縁部への圧力の集中が抑制されるため、第一の面の外周縁部付近にて、回路の変形が抑制されるとともに、絶縁層の破損も抑制される。 When the first surface of the circuit is pressurized and the pressure on the second surface at the outer edge of the first surface of the circuit is distributed, it goes to the outer edge of the first surface of the circuit. Since the concentration of pressure is suppressed, the deformation of the circuit is suppressed in the vicinity of the outer peripheral edge portion of the first surface, and the damage of the insulating layer is also suppressed.
 特に、回路基板が、厚さが大きい回路、例えば厚銅回路を備える場合、回路基板の加圧を解除した際の回路の外周縁部におけるスプリングバックの力が大きく、スプリングバックによって回路の外周縁部と絶縁層との間に剥離が生じやすくなる。一方、本開示の回路基板では、回路の厚さが大きい場合であっても、スプリングバックの力が抑制されているため、回路と絶縁層との剥離が生じにくく、回路基板は信頼性に優れる。 In particular, when the circuit board includes a circuit having a large thickness, for example, a thick copper circuit, the springback force at the outer peripheral edge of the circuit when the pressurization of the circuit board is released is large, and the springback causes the outer peripheral edge of the circuit. Peeling is likely to occur between the portion and the insulating layer. On the other hand, in the circuit board of the present disclosure, even when the thickness of the circuit is large, the springback force is suppressed, so that the circuit and the insulating layer are less likely to be separated, and the circuit board is excellent in reliability. ..
 本開示の回路基板は、回路と、絶縁層と、放熱部材とが厚さ方向に圧着された回路基板であってもよい。 The circuit board of the present disclosure may be a circuit board in which a circuit, an insulating layer, and a heat radiating member are crimped in the thickness direction.
 本開示の回路基板は、導体からなり、第一の面、及び第一の面とは反対側に位置する第二の面を備える回路を備える。回路の材質としては、導体であれば特に限定されず、例えば、金属が挙げられる。金属としては、銅、銀、クロム銅、タングステン銅、ニッケル、ニッケルメッキ銅、アルミニウム、アルマイトに表面修飾したアルミニウム等が挙げられる。導電性の観点から、金属は銅を含むことが好ましい。回路基板は、複数の回路を備えていてもよい。 The circuit board of the present disclosure comprises a circuit composed of a conductor and having a first surface and a second surface located on the opposite side of the first surface. The material of the circuit is not particularly limited as long as it is a conductor, and examples thereof include metal. Examples of the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity, the metal preferably contains copper. The circuit board may include a plurality of circuits.
 回路の厚さは特に制限されず、回路基板の用途等に応じて選択できる。回路の大電流化の観点から、回路の厚さは、120μm超であることが好ましく、450μm超であることがより好ましく、700μm以上であることがさらに好ましく、1000μm以上であることが特に好ましい。軽量化及び低背化の観点からは、回路の厚さは5000μm以下であってもよく、3000μm以下であってもよい。回路の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
 絶縁層等に回路の一部が埋め込まれている場合は、埋め込まれている部分の厚さも回路の厚さに含まれる。
The thickness of the circuit is not particularly limited and can be selected according to the application of the circuit board and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably more than 120 μm, more preferably more than 450 μm, further preferably 700 μm or more, and particularly preferably 1000 μm or more. From the viewpoint of weight reduction and height reduction, the thickness of the circuit may be 5000 μm or less, or 3000 μm or less. When the thickness of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
When a part of the circuit is embedded in the insulating layer or the like, the thickness of the embedded part is also included in the thickness of the circuit.
 回路の第一の面を観察したときの回路の幅は特に制限されず、回路基板の用途等に応じて選択してよい。例えば、回路の幅は100μm~100mmであってもよい。回路の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。また、回路の第一の面は、素子が実装される素子実装面であってもよい。 The width of the circuit when observing the first surface of the circuit is not particularly limited, and may be selected according to the application of the circuit board and the like. For example, the width of the circuit may be 100 μm to 100 mm. When the width of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value. Further, the first surface of the circuit may be an element mounting surface on which the element is mounted.
 回路は、例えば、金属板を所望の形状の回路の状態に加工することで得ることができる。加工の方法は特に制限されず、打抜き、切削、エッチング、それらを組み合わせた加工等の公知の方法によって行うことができる。回路をエッチング加工にて作製する場合、金属板の両面(すなわち向かい合う2つの主面)からエッチングすることにより回路を形成してもよい。金属板の両面からエッチングする場合、両面同時にエッチングしてもよく、両面を交互にエッチングしてもよい。 The circuit can be obtained, for example, by processing a metal plate into a circuit state having a desired shape. The processing method is not particularly limited, and can be performed by a known method such as punching, cutting, etching, and processing in which they are combined. When the circuit is manufactured by etching, the circuit may be formed by etching from both sides (that is, two main surfaces facing each other) of the metal plate. When etching from both sides of the metal plate, both sides may be etched at the same time, or both sides may be etched alternately.
 回路は、粗化処理されていてもよい。回路基板の製造工程時に回路が後述の絶縁層と接する際、当該絶縁層と接する面が少なくとも粗化処理されていると、ボイドの発生を抑制しながら、絶縁層と十分に接着できる状態とすることができる。具体的には、回路の絶縁層と接する面を粗化し、アンカー効果による引き抜き力を向上させるか密着面積を増大させることで、ファンデルワールス力による密着性を向上することができると考えられる。 The circuit may be roughened. When a circuit comes into contact with an insulating layer, which will be described later, during the manufacturing process of a circuit board, if the surface in contact with the insulating layer is at least roughened, it is in a state where it can be sufficiently adhered to the insulating layer while suppressing the generation of voids. be able to. Specifically, it is considered that the adhesion due to the Van der Waals force can be improved by roughening the surface in contact with the insulating layer of the circuit to improve the pull-out force due to the anchor effect or increase the adhesion area.
 回路を粗化処理する方法は特に制限されず、物理的な方法で行っても、化学的な方法で行ってもよい。例えば、回路の材質が銅であれば、物理的な方法としては、やすりがけ、サンドブラスト処理、レーザー照射、フライス加工等が挙げられる。化学的な方法としては、マグダミット処理、CZ処理、黒化処理、エッチング処理、メッキ処理等が挙げられる。粗化処理は、いずれか1種の方法により行っても、2種以上を組み合わせてもよい。2種以上を組み合わせる場合は、物理的な方法と化学的な方法を組み合わせて行っても、化学的な方法同士を組み合わせて行っても、物理的な方法同士を組み合わせて行ってもよい。 The method of roughening the circuit is not particularly limited, and it may be performed by a physical method or a chemical method. For example, when the material of the circuit is copper, the physical method includes sanding, sandblasting, laser irradiation, milling and the like. Examples of the chemical method include a magdamit treatment, a CZ treatment, a blackening treatment, an etching treatment, a plating treatment and the like. The roughening treatment may be carried out by any one method or a combination of two or more. When two or more kinds are combined, the physical method and the chemical method may be combined, the chemical methods may be combined, or the physical methods may be combined.
 本開示の回路基板は、回路の間の空間及び前記回路の周囲の少なくとも一方に絶縁部を備えていてもよく、回路が複数存在する場合、複数の回路の間に絶縁部を備えていてもよい。絶縁部の形成に用いる絶縁材料としては、エポキシ樹脂、フェノール樹脂、ユリア樹脂、メラミン樹脂、ウレタン樹脂、シリコーン樹脂、不飽和ポリエステル樹脂、アクリル樹脂等の樹脂を含む材料が挙げられる。絶縁材料に含まれる樹脂は、1種であっても2種以上であってもよい。絶縁材料は、必要に応じて、無機フィラー等の樹脂以外の成分を含んでもよい。 The circuit board of the present disclosure may be provided with an insulating portion in at least one of the space between the circuits and the periphery of the circuit, and when a plurality of circuits are present, the insulating portion may be provided between the plurality of circuits. good. Examples of the insulating material used for forming the insulating portion include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, and acrylic resin. The resin contained in the insulating material may be one kind or two or more kinds. The insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
 回路の第一の面を観察したときの絶縁部の幅は特に制限されず、回路基板の用途等に応じて選択してよい。例えば、絶縁部の幅は100μm~100mmであってもよい。絶縁部の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。 The width of the insulating portion when observing the first surface of the circuit is not particularly limited, and may be selected according to the application of the circuit board and the like. For example, the width of the insulating portion may be 100 μm to 100 mm. When the width of the insulating portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 絶縁部の厚さは特に限定されず、回路基板の用途等に応じて選択できる。回路の厚さに対する絶縁部の厚さ(絶縁部の厚さ/回路の厚さ)は、充分な絶縁性の確保の観点から、0.5以上が好ましく、複数の回路の位置を絶縁部が好適に保持する観点から、0.7以上がより好ましく、回路基板の作製工程での圧着時に回路と絶縁部との間の圧力の差を低減できる観点から、0.9以上がさらに好ましい。また、絶縁部の厚さ/回路の厚さは、素子実装の作業性の観点から、1.0以下が好ましく、0.99以下がより好ましい。
 絶縁部の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
The thickness of the insulating portion is not particularly limited and can be selected according to the application of the circuit board and the like. The thickness of the insulating portion (thickness of the insulating portion / thickness of the circuit) with respect to the thickness of the circuit is preferably 0.5 or more from the viewpoint of ensuring sufficient insulating properties, and the insulating portion positions a plurality of circuits. From the viewpoint of preferably holding, 0.7 or more is more preferable, and from the viewpoint of reducing the pressure difference between the circuit and the insulating portion at the time of crimping in the process of manufacturing the circuit board, 0.9 or more is further preferable. Further, the thickness of the insulating portion / the thickness of the circuit is preferably 1.0 or less, more preferably 0.99 or less, from the viewpoint of workability of element mounting.
When the thickness of the insulating portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 また、回路の厚さが絶縁部の厚さよりも大きい場合、すなわち、絶縁部の厚さ/回路の厚さが1未満の場合、回路の厚さが絶縁部の厚さと等しい場合と比較して、回路の第一の面が加圧されたときに、第一の面の外周縁部での第二の面への圧力が集中しやすい。そのため、回路基板の作製工程での加圧時、スプリングバックの発生時等に回路の側面と、絶縁部との間に剥離が生じやすく、その結果、回路基板の耐絶縁性が低下したり、回路基板の厚さ方向における回路と絶縁部との位置ズレが生じたりするおそれがある。
 なお、本開示において、回路の側面は、回路の第一の面及び第二の面以外の面を指す。
Further, when the thickness of the circuit is larger than the thickness of the insulating portion, that is, when the thickness of the insulating portion / the thickness of the circuit is less than 1, the thickness of the circuit is equal to the thickness of the insulating portion. When the first surface of the circuit is pressurized, the pressure on the second surface at the outer peripheral edge of the first surface tends to be concentrated. Therefore, when pressurization is performed in the process of manufacturing the circuit board, when springback occurs, peeling is likely to occur between the side surface of the circuit and the insulating portion, and as a result, the insulation resistance of the circuit board is lowered. There is a risk that the circuit and the insulating part may be misaligned in the thickness direction of the circuit board.
In the present disclosure, the side surface of the circuit refers to a surface other than the first surface and the second surface of the circuit.
 一方、本開示の回路基板では、回路の第一の面が加圧された場合に、第一の面の外周縁部での第二の面への圧力が分散されるため、回路基板の作製工程での加圧時、スプリングバックの発生時等に回路の側面と、絶縁部との間に剥離が生じにくい。そのため、回路の側面と、絶縁部との間に剥離が発生することに起因する耐絶縁性の低下、及び回路基板の厚さ方向における回路と絶縁部との位置ズレを抑制することができる。 On the other hand, in the circuit board of the present disclosure, when the first surface of the circuit is pressurized, the pressure on the second surface at the outer peripheral edge of the first surface is dispersed, so that the circuit board is manufactured. Peeling is unlikely to occur between the side surface of the circuit and the insulating portion when pressurization is performed in the process or when springback occurs. Therefore, it is possible to suppress a decrease in insulation resistance due to peeling between the side surface of the circuit and the insulating portion, and a positional deviation between the circuit and the insulating portion in the thickness direction of the circuit board.
 回路の側面と、第一の面又は第二の面との接続箇所は、角張っていてもよく、丸みを帯びていてもよい。 The connection point between the side surface of the circuit and the first surface or the second surface may be angular or rounded.
 また、回路の側面は、回路基板の厚さ方向と平行であってもよく、回路基板の厚さ方向と交差するように傾斜していてもよい。 Further, the side surface of the circuit may be parallel to the thickness direction of the circuit board, or may be inclined so as to intersect the thickness direction of the circuit board.
 本開示の回路基板では、回路側からの平面視にて、第一の面の外周縁部と、第二の面の外周縁部と、が重ならない領域が存在すればよい。前述の第一の面の外周縁部全体に対して、第二の面の外周縁部が重なっている領域の割合は、0%~50%であることが好ましく、0%、すなわち、回路側からの平面視にて、第一の面の外周縁部全体が、第二の面の外周縁部と重ならないことがより好ましい。 In the circuit board of the present disclosure, it is sufficient that there is a region in which the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface do not overlap in a plan view from the circuit side. The ratio of the region where the outer peripheral edge portion of the second surface overlaps with respect to the entire outer peripheral edge portion of the first surface is preferably 0% to 50%, that is, 0%, that is, the circuit side. It is more preferable that the entire outer peripheral edge portion of the first surface does not overlap with the outer peripheral edge portion of the second surface in a plan view from the above.
 本開示の回路基板にて、第一の面の外周縁部と、第二の面の外周縁部との最短距離は、
0.01mm以上1.0mm未満であることが好ましく、0.02mm~0.5mmであることがより好ましく、スプリングバックを効率的に抑制し、スプリングバックが起こった場合でもその変化量を少なくする観点から、0.03mm以上0.5mm未満であることがさらに好ましい。
In the circuit board of the present disclosure, the shortest distance between the outer peripheral edge of the first surface and the outer peripheral edge of the second surface is
It is preferably 0.01 mm or more and less than 1.0 mm, more preferably 0.02 mm to 0.5 mm, effectively suppresses springback, and reduces the amount of change even when springback occurs. From the viewpoint, it is more preferably 0.03 mm or more and less than 0.5 mm.
 本開示の回路基板では、回路の間の空間及び前記回路の周囲の少なくとも一方に絶縁部を備える場合、側面の表面粗さ(以下、「表面粗さA」ともいう)は、素子実装面となり得る第一の面の表面粗さ(以下、「表面粗さB」ともいう)及び第二の面の表面粗さ(以下、「表面粗さC」ともいう)の少なくとも一方よりも大きいことが好ましく、第一の面の表面粗さよりも大きいことがより好ましい。 In the circuit board of the present disclosure, when an insulating portion is provided in at least one of the space between the circuits and the periphery of the circuit, the surface roughness of the side surface (hereinafter, also referred to as “surface roughness A”) becomes the element mounting surface. It may be larger than at least one of the surface roughness of the first surface (hereinafter, also referred to as "surface roughness B") and the surface roughness of the second surface (hereinafter, also referred to as "surface roughness C"). It is preferably larger than the surface roughness of the first surface.
 第一の面の表面粗さと、第二の面の表面粗さとは、同じであってもよく、異なっていてもよい。回路と絶縁層との剥離を抑制する観点からは、第二の面の表面粗さは、第一の面の表面粗さよりも大きいことが好ましい。 The surface roughness of the first surface and the surface roughness of the second surface may be the same or different. From the viewpoint of suppressing peeling between the circuit and the insulating layer, the surface roughness of the second surface is preferably larger than the surface roughness of the first surface.
 本開示において回路の表面粗さは、JIS B 0601(2001)で規定される算術平均粗さ(Ra)で表してもよい。
 Raで表したときの表面粗さAは、0.2μm以上であることが好ましく、絶縁部が存在する場合に、回路の側面と絶縁部との接着力を安定的に確保する観点から、0.4μm以上であることがより好ましく、絶縁部が存在する場合に、回路の側面と絶縁部との強固な接着力を得る観点から、0.6μm以上であることがさらに好ましい。高電圧をかけたときに局所的な電界集中を避ける観点から、Raで表したときの表面粗さAは、10μm以下であってもよい。
In the present disclosure, the surface roughness of the circuit may be expressed by the arithmetic mean roughness (Ra) defined by JIS B 0601 (2001).
The surface roughness A when expressed in Ra is preferably 0.2 μm or more, and is 0 from the viewpoint of stably ensuring the adhesive force between the side surface of the circuit and the insulating portion when the insulating portion is present. It is more preferably 0.4 μm or more, and further preferably 0.6 μm or more from the viewpoint of obtaining a strong adhesive force between the side surface of the circuit and the insulating portion when the insulating portion is present. From the viewpoint of avoiding local electric field concentration when a high voltage is applied, the surface roughness A expressed in Ra may be 10 μm or less.
 Raで表したときの表面粗さBは、0.4μm未満であることが好ましく、0.3μm以下であることがより好ましく、0.2μm以下であることがさらに好ましい。 The surface roughness B represented by Ra is preferably less than 0.4 μm, more preferably 0.3 μm or less, and further preferably 0.2 μm or less.
 Raで表したときの表面粗さCは、0.2μm以上であることが好ましく、0.4μm以上であることがより好ましく0.6μm以上であることがさらに好ましい。高電圧をかけたときに局所的な電界集中を避ける観点から、Raで表したときの表面粗さCは、10μm以下であってもよい。 The surface roughness C when represented by Ra is preferably 0.2 μm or more, more preferably 0.4 μm or more, and further preferably 0.6 μm or more. From the viewpoint of avoiding local electric field concentration when a high voltage is applied, the surface roughness C expressed in Ra may be 10 μm or less.
 Raで表したときの表面粗さAと表面粗さBとの相対比は特に制限されない。例えば、表面粗さAは表面粗さBの1倍超~100倍であってもよい。 The relative ratio of the surface roughness A and the surface roughness B when expressed in Ra is not particularly limited. For example, the surface roughness A may be more than 1 time to 100 times the surface roughness B.
 本開示の回路基板は、回路、並びに回路の間の空間及び前記回路の周囲の少なくとも一方に絶縁部を備える回路シートと、回路の第二の面に接するように配置される絶縁層と、絶縁層に接するように配置される放熱部材と、を厚さ方向にこの順に備えていてもよい。 The circuit board of the present disclosure is insulated from a circuit, a circuit sheet having an insulating portion in a space between the circuits and at least one of the periphery of the circuit, and an insulating layer arranged so as to be in contact with a second surface of the circuit. A heat radiating member arranged so as to be in contact with the layer may be provided in this order in the thickness direction.
 回路シートを製造する方法は特に限定されない。回路シートを製造する方法は、例えば、仮基材上に配置された、回路によって形成された空間に絶縁材料を充填する工程を有し、絶縁材料が樹脂等である場合、必要に応じて、充填させた絶縁材料を硬化させる工程を有していてもよい。回路によって形成された空間としては、例えば、回路間の空間が挙げられる。 The method of manufacturing the circuit sheet is not particularly limited. The method for manufacturing a circuit sheet includes, for example, a step of filling a space formed by the circuit, which is arranged on a temporary base material, with an insulating material, and when the insulating material is a resin or the like, if necessary, It may have a step of curing the filled insulating material. Examples of the space formed by the circuits include spaces between circuits.
 回路は、金属を仮基材上に配置し、次いでエッチングを行うことによって仮基材上に形成されたものであってもよく、金属板の両面(すなわち向かい合う2つの主面)からエッチングすることにより回路を形成することが好ましい。 The circuit may be formed on the temporary substrate by arranging the metal on the temporary substrate and then performing etching, and etching from both sides of the metal plate (that is, two facing main surfaces). It is preferable to form a circuit by etching.
 本開示において仮基材とは、仮基材上に配置された回路によって形成された空間に絶縁材料を充填する前に回路を仮固定することができ、絶縁材料を充填した後に回路から除去できるものをいう。ここで、回路が仮固定されているとは、回路が仮基材との接触によって相対的な位置関係を維持していることをいい、必ずしも回路が完全に動かないことを意味するものではない。 In the present disclosure, the temporary base material can temporarily fix the circuit before filling the space formed by the circuit arranged on the temporary base material with the insulating material, and can be removed from the circuit after filling with the insulating material. Say something. Here, the fact that the circuit is temporarily fixed means that the circuit maintains a relative positional relationship due to contact with the temporary base material, and does not necessarily mean that the circuit does not move completely. ..
 仮基材としては、樹脂フィルム等が挙げられる。仮基材に使用できる樹脂フィムルとしては、支持フィルムと支持フィルム上に形成される接着層とを有する樹脂フィルム等が挙げられる。 Examples of the temporary base material include a resin film and the like. Examples of the resin film that can be used as the temporary base material include a resin film having a support film and an adhesive layer formed on the support film.
 本開示の回路基板は、回路の第二の面に接するように配置される絶縁層を備える。回路基板に用いられる絶縁層の種類は特に制限されず、回路基板に一般的に使用されるものから選択できる。絶縁層の形成に用いる絶縁材料の好ましい形態は、絶縁部の形成に用いる絶縁材料の好ましい形態と同様であってもよい。 The circuit board of the present disclosure includes an insulating layer arranged so as to be in contact with the second surface of the circuit. The type of the insulating layer used for the circuit board is not particularly limited, and can be selected from those generally used for the circuit board. The preferred form of the insulating material used for forming the insulating layer may be the same as the preferred form of the insulating material used for forming the insulating portion.
 絶縁層の厚さは特に制限されず、回路基板の用途等に応じて選択できる。充分な絶縁性を確保する観点からは、絶縁層の厚さは50μm以上であることが好ましく、回路、絶縁部等に凹凸がある場合の、凹凸追従性の観点から、100μm以上であることがより好ましく、圧力によるせん断力を吸収する観点から、150μm以上であることがさらに好ましい。 The thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board. From the viewpoint of ensuring sufficient insulation, the thickness of the insulating layer is preferably 50 μm or more, and when there are irregularities in the circuit, insulating portion, etc., it is 100 μm or more from the viewpoint of unevenness followability. More preferably, it is 150 μm or more from the viewpoint of absorbing the shearing force due to pressure.
 充分な放熱性を確保する観点からは、絶縁層の厚さは400μm以下であることが好ましく、圧力によるせん断力を生じさせにくい観点から、300μm以下であることがより好ましく、250μm以下であることがさらに好ましい。 From the viewpoint of ensuring sufficient heat dissipation, the thickness of the insulating layer is preferably 400 μm or less, and from the viewpoint of less likely to generate shearing force due to pressure, it is more preferably 300 μm or less, and more preferably 250 μm or less. Is even more preferable.
 本開示の回路基板は、絶縁層に接するように配置される放熱部材を備える。回路基板に用いられる放熱部材の種類は特に制限されず、回路基板に一般的に使用されるものから選択できる。放熱部材の材質は特に制限されず、銅、アルミニウム、タングステン銅、モリブデン銅等の銅合金、ニッケルめっき銅などが挙げられる。放熱部材の種類は特に制限されず、ヒートスプレッダ、ヒートシンク等の放熱機能を有する部材、空気又は水の流路を持ったケース、金属箔、フィラー樹脂コンポジットなどであってもよい。放熱部材の表面は平滑であってもよく、絶縁層との接着性を向上させるための粗化処理が施されていてもよい The circuit board of the present disclosure includes a heat radiating member arranged so as to be in contact with the insulating layer. The type of heat radiating member used for the circuit board is not particularly limited, and can be selected from those generally used for the circuit board. The material of the heat radiating member is not particularly limited, and examples thereof include copper, aluminum, tungsten copper, copper alloys such as molybdenum copper, and nickel-plated copper. The type of the heat radiating member is not particularly limited, and may be a member having a heat radiating function such as a heat spreader or a heat sink, a case having an air or water flow path, a metal foil, a filler resin composite, or the like. The surface of the heat radiating member may be smooth, and may be roughened to improve the adhesiveness with the insulating layer.
 放熱部材の厚さは特に制限されず、回路基板の用途等に応じて選択できる。放熱性の観点から、放熱部材の厚さは、120μm超であることが好ましく、1000μmであることがより好ましく、熱拡散のための体積を確保してより放熱性を向上させる観点から、1500μm以上であることがさらに好ましい。回路基板の小型化及び低背化の観点からは、放熱部材の厚さは10000μm以下であることが好ましく、3000μm以下であることがより好ましい。
 放熱部材の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
The thickness of the heat radiating member is not particularly limited and can be selected according to the application of the circuit board and the like. From the viewpoint of heat dissipation, the thickness of the heat dissipation member is preferably more than 120 μm, more preferably 1000 μm, and 1500 μm or more from the viewpoint of securing a volume for heat diffusion and further improving heat dissipation. Is more preferable. From the viewpoint of miniaturization and low profile of the circuit board, the thickness of the heat radiating member is preferably 10,000 μm or less, and more preferably 3000 μm or less.
When the thickness of the heat radiating member is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 放熱部材の厚さに対する回路の厚さの比(回路の厚さ/放熱部材の平均厚さ)は、0.2~25であることが好ましく、1~25であることがより好ましい。 The ratio of the thickness of the circuit to the thickness of the heat radiating member (circuit thickness / average thickness of the heat radiating member) is preferably 0.2 to 25, and more preferably 1 to 25.
 本開示の回路基板では、回路基板の放熱性の観点から、回路の第二の面の面積(面積A)よりも放熱部材における絶縁層側の面の面積(面積B)が大きいことが好ましい。例えば、回路の面積Aに対する放熱部材の面積Bの比率は、1超え30以下であってもよく、2~10であることが好ましい。 In the circuit board of the present disclosure, from the viewpoint of heat dissipation of the circuit board, it is preferable that the area (area B) of the surface of the heat radiating member on the insulating layer side is larger than the area (area A) of the second surface of the circuit. For example, the ratio of the area B of the heat radiating member to the area A of the circuit may be more than 1 and 30 or less, and is preferably 2 to 10.
 本開示の回路基板では、耐絶縁性の観点から、絶縁層の部分放電開始電圧は、1.0kV以上であることが好ましく、2.5kV以上であることがより好ましい。
 部分放電開始電圧の測定は、測定規格IEC60664-1に準拠して行えばよい。
 具体的には、回路及び放熱部材を電源にそれぞれ接続した後、回路基板の全体をフロリナートに入れて部分放電開始電圧の測定を行う。測定条件は、測定開始電圧を0(V)とし、100(V)ずつ段階的に電圧を上げて1秒保持することを繰り返し、電荷量が10(pC)を超えたときの電圧を部分放電開始電圧(kV)とする。
In the circuit board of the present disclosure, the partial discharge start voltage of the insulating layer is preferably 1.0 kV or more, and more preferably 2.5 kV or more, from the viewpoint of insulation resistance.
The measurement of the partial discharge start voltage may be performed in accordance with the measurement standard IEC60664-1.
Specifically, after connecting the circuit and the heat radiating member to the power supply, the entire circuit board is put into Fluorinert to measure the partial discharge start voltage. The measurement conditions are that the measurement start voltage is set to 0 (V), the voltage is gradually increased by 100 (V) and held for 1 second repeatedly, and the voltage when the amount of charge exceeds 10 (pC) is partially discharged. Let it be the starting voltage (kV).
 本開示の回路基板では、放熱部材と回路との間の絶縁破壊電圧は、1.5kV以上であることが好ましく、2.5kV以上であることがより好ましく、4kV以上であることがさらに好ましい。
 放熱部材と回路との間の絶縁破壊電圧は、例えば、以下のようにして測定すればよい。回路及び放熱部材を電源にそれぞれ接続した後、回路基板の全体をフロリナートに入れて絶縁破壊電圧の測定を行う。測定条件は、測定開始電圧を0(V)とし、100(V)ずつ段階的に電圧を上げて1秒保持することを繰り返し、電流値が0.2(mA)を超えたときの電圧を絶縁破壊電圧(kV)とする。
In the circuit board of the present disclosure, the dielectric breakdown voltage between the heat radiating member and the circuit is preferably 1.5 kV or more, more preferably 2.5 kV or more, and further preferably 4 kV or more.
The dielectric breakdown voltage between the heat radiating member and the circuit may be measured as follows, for example. After connecting the circuit and the heat dissipation member to the power supply, the entire circuit board is placed in Fluorinert to measure the breakdown voltage. The measurement conditions are that the measurement start voltage is set to 0 (V), the voltage is gradually increased by 100 (V) and held for 1 second repeatedly, and the voltage when the current value exceeds 0.2 (mA) is set. It is assumed to be a breakdown voltage (kV).
<第二実施形態の回路シート>
 本開示の第二実施形態の回路シートは、導体からなり、第一の面、及び前記第一の面とは反対側に位置する第二の面を備える回路と、前記回路の間の空間及び前記回路の周囲の少なくとも一方に設けられる絶縁部と、を備え、平面視にて、前記第一の面の外周縁部と、前記第二の面の外周縁部と、が重ならない領域が存在する。本開示の回路シートを用いることで前述の本開示の回路基板を製造することができる。本開示の回路シートにおける各構成の好ましい形態は、前述の本開示の第二実施形態の回路基板における各構成の好ましい形態と同様である。
<Circuit sheet of the second embodiment>
The circuit sheet of the second embodiment of the present disclosure comprises a conductor, a first surface, and a space between the circuit and a circuit having a second surface located on the opposite side of the first surface. An insulating portion provided on at least one of the periphery of the circuit is provided, and there is a region in which the outer peripheral edge portion of the first surface and the outer peripheral edge portion of the second surface do not overlap in a plan view. do. By using the circuit sheet of the present disclosure, the circuit board of the present disclosure described above can be manufactured. The preferred form of each configuration in the circuit sheet of the present disclosure is the same as the preferred form of each configuration in the circuit board of the second embodiment of the present disclosure described above.
<第二実施形態の回路基板の製造方法1>
 本開示の第二実施形態の回路基板の製造方法1は、上述した本開示の第二実施形態の回路シートと、前記第二の面に接するように配置される絶縁層と、放熱部材と、を厚さ方向にこの順に配置した状態の積層体を厚さ方向に加圧する工程を有する。
<Manufacturing method 1 of the circuit board of the second embodiment>
The method 1 for manufacturing a circuit board of the second embodiment of the present disclosure includes the circuit sheet of the second embodiment of the present disclosure described above, an insulating layer arranged so as to be in contact with the second surface, a heat radiating member, and the like. It has a step of pressurizing the laminated body in the state which arranged in this order in the thickness direction in the thickness direction.
 上記製造方法1において積層体を加圧する方法は特に制限されず、回路基板の製造工程において一般的に行われる方法から選択できる。 The method of pressurizing the laminate in the above manufacturing method 1 is not particularly limited, and can be selected from the methods generally performed in the circuit board manufacturing process.
 加圧する工程は、回路の第一の面上に、加圧により変形可能なクッション材を配置した状態で行われることが好ましい。回路の第一の面にクッション材を配置することで第一の面にかかる圧力が分散され、回路、絶縁層及び放熱部材を充分に密着させることができる傾向にある。加圧する工程は、積層体の放熱部材側にもクッション材を配置した状態で行われてもよい。 The pressurizing step is preferably performed with a cushioning material that can be deformed by pressurization arranged on the first surface of the circuit. By arranging the cushion material on the first surface of the circuit, the pressure applied to the first surface is dispersed, and the circuit, the insulating layer, and the heat radiating member tend to be sufficiently brought into close contact with each other. The step of pressurizing may be performed in a state where the cushion material is also arranged on the heat radiating member side of the laminated body.
 使用されるクッション材としては、フッ素ゴム、テフロン(登録商標)、ポリエチレンテレフタレート(PET)、ポリイミド、ポリアミド、ポリアミドイミド、ポリエチレン、不織布、不織紙等、それらの複合層、積層材料などが挙げられる。 Examples of the cushioning material used include fluororubber, Teflon (registered trademark), polyethylene terephthalate (PET), polyimide, polyamide, polyamideimide, polyethylene, non-woven fabric, non-woven paper, and their composite layers and laminated materials. ..
<第二実施形態の回路基板の製造方法2>
 本開示の第二実施形態の回路基板の製造方法2は、上述した本開示の第二実施形態の回路基板を製造する回路基板の製造方法であって、前記回路と、前記回路の第二の面に接するように配置される前記絶縁層と、前記絶縁層に接するように配置される前記放熱部材と、を厚さ方向にこの順に配置した状態の積層体を厚さ方向に加圧する工程を有する。本開示の回路基板の製造方法1は、回路シートの替わりに回路を用いている点で前述の回路基板の製造方法1と相違する。
<Manufacturing method 2 of the circuit board of the second embodiment>
The method 2 for manufacturing a circuit board according to the second embodiment of the present disclosure is the method for manufacturing a circuit board for manufacturing the circuit board according to the second embodiment of the present disclosure described above, wherein the circuit and the second of the circuits are used. A step of pressurizing a laminated body in a state where the insulating layer arranged so as to be in contact with a surface and the heat radiating member arranged so as to be in contact with the insulating layer are arranged in this order in the thickness direction. Have. The circuit board manufacturing method 1 of the present disclosure differs from the circuit board manufacturing method 1 described above in that a circuit is used instead of the circuit sheet.
 以下、従来の回路基板、及び本開示の回路基板の具体例1、2について、図2A~図2Dを参照して説明する。 Hereinafter, the conventional circuit board and specific examples 1 and 2 of the circuit board of the present disclosure will be described with reference to FIGS. 2A to 2D.
(従来の回路基板の具体例)
 図2Dは、従来の回路基板の具体例の概略構成を示す断面図である。図2Dに示すように、回路基板130は、回路21及び絶縁部24を備える回路シート26と、絶縁層12と、放熱部材13と、を厚さ方向にこの順に備える。絶縁部24は、回路21の間の空間及び回路21の周囲に設けられている。回路基板130では、回路21側からの平面視にて、第一の面の外周縁部Aと、第二の面の外周縁部Bと、が重ならない領域が存在しない。
(Specific example of conventional circuit board)
FIG. 2D is a cross-sectional view showing a schematic configuration of a specific example of a conventional circuit board. As shown in FIG. 2D, the circuit board 130 includes a circuit sheet 26 including a circuit 21 and an insulating portion 24, an insulating layer 12, and a heat radiating member 13 in this order in the thickness direction. The insulating portion 24 is provided in the space between the circuits 21 and around the circuits 21. In the circuit board 130, there is no region in which the outer peripheral edge portion A of the first surface and the outer peripheral edge portion B of the second surface do not overlap in a plan view from the circuit 21 side.
 回路基板130では、回路21の第一の面が加圧された場合に、回路21の第一の面の外周縁部Aから第二の面の外周縁部Bへの圧力が分散されず、回路基板130の加圧を解除した際に、第二の面の外周縁部Bにおけるスプリングバックによって回路21の外周縁部Bと絶縁層12との間に剥離が生じやすく、剥離箇所にて、気泡をトラップしたり、耐絶縁性が低下したりする等によって回路基板130の信頼性が損なわれるおそれがある。 In the circuit board 130, when the first surface of the circuit 21 is pressurized, the pressure from the outer peripheral edge portion A of the first surface of the circuit 21 to the outer peripheral edge portion B of the second surface is not dispersed. When the pressurization of the circuit board 130 is released, the springback at the outer peripheral edge portion B of the second surface tends to cause peeling between the outer peripheral edge portion B of the circuit 21 and the insulating layer 12, and at the peeled portion, peeling occurs. The reliability of the circuit board 130 may be impaired by trapping air bubbles or lowering the insulation resistance.
(回路基板の具体例1)
 図2Aは、本開示の回路基板の具体例1の概略構成を示す断面図であり、図2Bは、本開示の回路基板の具体例1の概略構成を示す、回路側からの平面図である。図2Aでは、クッション材15を用い、矢印Y方向から回路11と、絶縁層12と、放熱部材13とを備える積層体を加圧することでこれらを備える回路基板110を製造していることを示している。図2Bでは放熱部材13を省略している。
(Specific Example 1 of Circuit Board)
FIG. 2A is a cross-sectional view showing a schematic configuration of a specific example 1 of the circuit board of the present disclosure, and FIG. 2B is a plan view from the circuit side showing the schematic configuration of the specific example 1 of the circuit board of the present disclosure. .. FIG. 2A shows that the circuit board 110 including the circuit 11, the insulating layer 12, and the heat radiating member 13 is manufactured by pressurizing the laminated body including the circuit 11 and the heat radiating member 13 from the direction of the arrow Y using the cushion material 15. ing. In FIG. 2B, the heat radiating member 13 is omitted.
 回路基板110は、回路11と、絶縁層12と、放熱部材13とを厚さ方向(すなわち、矢印X方向)にてこの順に備える。回路基板110では、回路11側からの平面視にて、第一の面の外周縁部Aの全体が、第二の面の外周縁部Bと重ならない。 The circuit board 110 includes the circuit 11, the insulating layer 12, and the heat radiating member 13 in this order in the thickness direction (that is, the arrow X direction). In the circuit board 110, the entire outer peripheral edge portion A of the first surface does not overlap with the outer peripheral edge portion B of the second surface in a plan view from the circuit 11 side.
 回路基板110では、回路11の第一の面が加圧された場合に、回路11の第一の面の外周縁部Aから第二の面への圧力が分散される。そのため、回路基板110の加圧を解除した際に、第二の面の外周縁部Bにおけるスプリングバックが抑制されて外周縁部Bと絶縁層12との間に剥離が生じにくく、その結果、剥離箇所にて気泡をトラップしたり、耐絶縁性が低下したりする等によって信頼性が損なわれることが抑制されるため、回路基板110は信頼性に優れる。 In the circuit board 110, when the first surface of the circuit 11 is pressurized, the pressure from the outer peripheral edge portion A of the first surface of the circuit 11 to the second surface is dispersed. Therefore, when the pressurization of the circuit board 110 is released, springback at the outer peripheral edge portion B of the second surface is suppressed, and peeling between the outer peripheral edge portion B and the insulating layer 12 is unlikely to occur, and as a result, the result is The circuit board 110 is excellent in reliability because it is possible to prevent the reliability from being impaired due to trapping air bubbles at the peeled portion or deterioration of the insulation resistance.
 なお、図2Aにおいて、回路11の側面と、第一の面との接続箇所は、丸みを帯びているが、角張っていてもよい。また、回路基板110は、後述する回路基板の具体例2のように、回路11の周囲に絶縁部が設けられていてもよい。 In FIG. 2A, the connection point between the side surface of the circuit 11 and the first surface is rounded, but may be angular. Further, the circuit board 110 may be provided with an insulating portion around the circuit 11 as in the specific example 2 of the circuit board described later.
(回路基板の具体例2)
 図2Cは、本開示の回路基板の具体例2の概略構成を示す断面図である。図2Cに示すように、回路基板120は、回路11′及び絶縁部14を備える回路シート16と、絶縁層12と、放熱部材13とを厚さ方向にこの順に備える。回路基板の具体例2では、回路の断面形状が下に凸形状となっている点、及び、回路の周囲に絶縁部が設けられている点で回路基板の具体例1と相違する。
(Specific example 2 of circuit board)
FIG. 2C is a cross-sectional view showing a schematic configuration of a specific example 2 of the circuit board of the present disclosure. As shown in FIG. 2C, the circuit board 120 includes a circuit sheet 16 including a circuit 11'and an insulating portion 14, an insulating layer 12, and a heat radiating member 13 in this order in the thickness direction. Specific Example 2 of the circuit board is different from Specific Example 1 of the circuit board in that the cross-sectional shape of the circuit is convex downward and an insulating portion is provided around the circuit.
 回路基板120では、回路11´側からの平面視にて、第一の面の外周縁部Aの全体が、第二の面の外周縁部Bと重ならない。これにより、回路基板110と同様に、回路11′の外周縁部と絶縁層12との間に剥離が生じにくく、その結果、剥離箇所にて気泡をトラップしたり、耐絶縁性が低下したりする等によって信頼性が損なわれることが抑制されるため、回路基板120は信頼性に優れる。 In the circuit board 120, the entire outer peripheral edge portion A of the first surface does not overlap with the outer peripheral edge portion B of the second surface in a plan view from the circuit 11'side. As a result, as with the circuit board 110, peeling is unlikely to occur between the outer peripheral edge of the circuit 11'and the insulating layer 12, and as a result, air bubbles are trapped at the peeled portion and the insulation resistance is lowered. The circuit board 120 is excellent in reliability because it is suppressed that the reliability is impaired by the above.
<第三実施形態の回路シート>
 本開示の第三実施形態の回路シートは、導体からなる二つ以上の回路を備え、前記回路のうち、互いに独立し、かつ隣接した二つの回路の組み合わせの全てにおいて、前記回路の素子実装面から見て、前記互いに独立し、かつ隣接した二つの回路の間を通り、かつ前記素子実装面に対して平行である任意の方向の直線上に高弾性部材が位置する。
<Circuit sheet of the third embodiment>
The circuit sheet of the third embodiment of the present disclosure includes two or more circuits composed of conductors, and in all combinations of two circuits that are independent of each other and are adjacent to each other, the element mounting surface of the circuit. The highly elastic member is located on a straight line in an arbitrary direction that is independent of each other, passes between two adjacent circuits, and is parallel to the element mounting surface.
 本実施形態の回路シートでは、回路の素子実装面から見て、互いに独立し、かつ隣接した二つの回路の間を通り、かつ前記素子実装面に対して平行である任意の方向の直線上に高弾性部材が位置する。これにより、隣接した二つの回路の間を通り、かつ素子実装面に対して平行である少なくとも一つの直線上に高弾性部材が存在しない回路シートと比較して、回路及び高弾性部材が配置されていない直線状の領域での回路シートの変形が抑制され、反りの発生も抑制される。 In the circuit sheet of the present embodiment, when viewed from the element mounting surface of the circuit, they are independent of each other, pass between two adjacent circuits, and are on a straight line in an arbitrary direction parallel to the element mounting surface. Highly elastic member is located. As a result, the circuit and the highly elastic member are arranged as compared with the circuit sheet in which the highly elastic member does not exist on at least one straight line passing between two adjacent circuits and parallel to the element mounting surface. Deformation of the circuit sheet in the non-linear region is suppressed, and the occurrence of warpage is also suppressed.
 高弾性部材は、回路であってもよく、後述の第四実施形態に記載の高弾性部材であってもよい。 The highly elastic member may be a circuit or may be the highly elastic member described in the fourth embodiment described later.
 本実施形態の回路シートは、導体からなる回路を二つ以上備える。回路の材質としては、導体であれば特に限定されず、例えば、金属が挙げられる。金属としては、銅、銀、クロム銅、タングステン銅、ニッケル、ニッケルメッキ銅、アルミニウム、アルマイトに表面修飾したアルミニウム等が挙げられる。導電性の観点から、金属は銅を含むことが好ましい。 The circuit sheet of this embodiment includes two or more circuits made of conductors. The material of the circuit is not particularly limited as long as it is a conductor, and examples thereof include metal. Examples of the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity, the metal preferably contains copper.
 回路の厚さは特に制限されず、回路シートの用途等に応じて選択できる。回路の大電流化の観点から、回路の厚さは350μm以上であることが好ましく、回路自体を用いた放熱性の観点から、500μm以上であることがより好ましく、特に回路を高弾性部材として用いる場合に回路シート、回路基板等の反りを効果的に抑制する観点から、1000μm以上であることがさらに好ましい。軽量化、低背化等の観点からは、回路の厚さは5000μm以下であってもよい。回路の加工性の観点から、3000μm以下であることが好ましい。回路の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
 絶縁層等の隣接する部材に回路の一部が埋め込まれている場合は、埋め込まれている部分の厚さも回路の厚さに含まれる。
The thickness of the circuit is not particularly limited and can be selected according to the application of the circuit sheet and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably 350 μm or more, and from the viewpoint of heat dissipation using the circuit itself, it is more preferably 500 μm or more, and the circuit is particularly used as a highly elastic member. In some cases, it is more preferably 1000 μm or more from the viewpoint of effectively suppressing the warp of the circuit sheet, the circuit board, and the like. From the viewpoint of weight reduction, height reduction, etc., the thickness of the circuit may be 5000 μm or less. From the viewpoint of circuit workability, it is preferably 3000 μm or less. When the thickness of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
When a part of the circuit is embedded in an adjacent member such as an insulating layer, the thickness of the embedded part is also included in the thickness of the circuit.
 回路シートの素子実装面を観察したときの回路の幅は特に制限されず、回路シートの用途等に応じて選択してよい。例えば、回路の幅は100μm~100mmであってもよい。回路の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。 The width of the circuit when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like. For example, the width of the circuit may be 100 μm to 100 mm. When the width of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 回路は、例えば、金属板を所望の形状の回路の状態に加工することで得ることができる。加工の方法は特に制限されず、打抜き、切削、エッチング、それらの組み合わせ等の公知の方法によって行うことができる。回路作製における精度の向上の観点からは、エッチング加工にて回路を形成することが好ましい。 The circuit can be obtained, for example, by processing a metal plate into a circuit state having a desired shape. The processing method is not particularly limited, and can be performed by a known method such as punching, cutting, etching, or a combination thereof. From the viewpoint of improving the accuracy in circuit fabrication, it is preferable to form the circuit by etching.
 回路をエッチング加工にて作製する場合、金属板のエッチング方法は特に制限されない。回路のテーパー部分の発生を抑制する観点からは、金属板の両面(すなわち向かい合う2つの主面)からエッチングすることにより回路を形成することが好ましい。 When the circuit is manufactured by etching, the etching method of the metal plate is not particularly limited. From the viewpoint of suppressing the occurrence of the tapered portion of the circuit, it is preferable to form the circuit by etching from both sides (that is, two main surfaces facing each other) of the metal plate.
 回路は、粗化処理されていてもよい。例えば、回路が後述の絶縁層と接する場合、当該絶縁層と接する面が少なくとも粗化処理されていると、ボイドの発生を抑制しながら、絶縁層と十分に接着できる状態とすることができる。具体的には、回路の絶縁層と接する面を粗化し、アンカー効果による引き抜き力を向上させるか密着面積を増大させることで、ファンデルワールス力による密着性を向上することができると考えられる。 The circuit may be roughened. For example, when the circuit is in contact with an insulating layer described later, if the surface in contact with the insulating layer is at least roughened, it is possible to obtain a state in which the circuit can be sufficiently adhered to the insulating layer while suppressing the generation of voids. Specifically, it is considered that the adhesion due to the Van der Waals force can be improved by roughening the surface in contact with the insulating layer of the circuit to improve the pull-out force due to the anchor effect or increase the adhesion area.
 回路を粗化処理する方法は特に制限されず、物理的な方法で行っても、化学的な方法で行ってもよい。例えば、回路の材質が銅であれば、物理的な方法としては、やすりがけ、サンドブラスト処理、レーザー照射、フライス加工等が挙げられる。化学的な方法としては、マグダミット処理、CZ処理、黒化処理、エッチング処理、メッキ処理等が挙げられる。粗化処理は、いずれか1種の方法により行っても、2種以上を組み合わせてもよい。2種以上を組み合わせる場合は、物理的な方法と化学的な方法を組み合わせて行っても、化学的な方法同士を組み合わせて行っても、物理的な方法同士を組み合わせて行ってもよい。 The method of roughening the circuit is not particularly limited, and it may be performed by a physical method or a chemical method. For example, when the material of the circuit is copper, the physical method includes sanding, sandblasting, laser irradiation, milling and the like. Examples of the chemical method include a magdamit treatment, a CZ treatment, a blackening treatment, an etching treatment, a plating treatment and the like. The roughening treatment may be carried out by any one method or a combination of two or more. When two or more kinds are combined, the physical method and the chemical method may be combined, the chemical methods may be combined, or the physical methods may be combined.
 本実施形態の回路シートは、二つ以上の回路間の少なくとも一部に設けられる絶縁部を備えていてもよい。また、回路シートが絶縁部を備える場合、回路の素子実装面から見て、二つ以上の回路間に設けられる絶縁部を通り、かつ素子実装面に対して平行である任意の方向の直線上に高弾性部材が位置していてもよい。 The circuit sheet of the present embodiment may include an insulating portion provided at least a part between two or more circuits. When the circuit sheet is provided with an insulating portion, it passes through the insulating portion provided between two or more circuits and is on a straight line in an arbitrary direction parallel to the element mounting surface when viewed from the element mounting surface of the circuit. A highly elastic member may be located in.
 絶縁部の形成に用いる絶縁材料としては、エポキシ樹脂、フェノール樹脂、ユリア樹脂、メラミン樹脂、ウレタン樹脂、シリコーン樹脂、不飽和ポリエステル樹脂、アクリル樹脂等の樹脂を含む材料が挙げられる。絶縁材料に含まれる樹脂は、1種であっても2種以上であってもよい。絶縁材料は、必要に応じて、無機フィラー等の樹脂以外の成分を含んでもよい。 Examples of the insulating material used for forming the insulating portion include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, and acrylic resin. The resin contained in the insulating material may be one kind or two or more kinds. The insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
 回路シートの素子実装面を観察したときの絶縁部の幅は特に制限されず、回路シートの用途等に応じて選択してよい。例えば、絶縁部の幅は100μm~100mmであってもよい。絶縁部の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。 The width of the insulating portion when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like. For example, the width of the insulating portion may be 100 μm to 100 mm. When the width of the insulating portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 絶縁部の厚さは特に限定されず、回路シートの用途等に応じて選択できる。回路の厚さに対する絶縁部の厚さ(絶縁部の厚さ/回路の厚さ)は、複数の回路の位置関係を保持する観点から、0.05以上が好ましく、回路シートの強度を確保しやすいという観点から、0.7以上がより好ましく、回路シートの厚さ方向の対称性を確保して反りを低減しやすいという観点から、0.9以上がさらに好ましい。また、絶縁部の厚さ/回路の厚さは、素子実装の作業性の観点から、1.0以下が好ましく、0.99以下がより好ましい。
 絶縁部の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
The thickness of the insulating portion is not particularly limited and can be selected according to the application of the circuit sheet and the like. The thickness of the insulating portion (thickness of the insulating portion / thickness of the circuit) with respect to the thickness of the circuit is preferably 0.05 or more from the viewpoint of maintaining the positional relationship of a plurality of circuits, and secures the strength of the circuit sheet. From the viewpoint of ease, 0.7 or more is more preferable, and from the viewpoint of ensuring symmetry in the thickness direction of the circuit sheet and easily reducing warpage, 0.9 or more is further preferable. Further, the thickness of the insulating portion / the thickness of the circuit is preferably 1.0 or less, more preferably 0.99 or less, from the viewpoint of workability of element mounting.
When the thickness of the insulating portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 回路シートが絶縁部を備える場合、絶縁部は、回路の素子実装面及び素子実装面と逆の面が露出するように設けられていることが好ましい。特に、回路の表裏面が露出した上下対称構造である場合、回路シートの反りを好適に抑制できる。 When the circuit sheet includes an insulating portion, it is preferable that the insulating portion is provided so that the element mounting surface of the circuit and the surface opposite to the element mounting surface are exposed. In particular, when the front and back surfaces of the circuit have an exposed vertically symmetrical structure, the warp of the circuit sheet can be suitably suppressed.
 本実施形態の回路シートでは、回路シート、回路基板等の反りを好適に抑制する観点から、特定の回路と、特定の回路以外の別の回路又は回路以外の高弾性部材との側面間の最短距離は、10mm以下であることが好ましく、回路シートの小型化の観点から、5mm以下であることがより好ましい。 In the circuit sheet of the present embodiment, the shortest distance between the side surface of a specific circuit and another circuit other than the specific circuit or a highly elastic member other than the circuit from the viewpoint of suitably suppressing the warp of the circuit sheet, the circuit board, or the like. The distance is preferably 10 mm or less, and more preferably 5 mm or less from the viewpoint of miniaturization of the circuit sheet.
 本実施形態の回路シートは、回路間の絶縁性の観点から、特定の回路と、特定の回路以外の別の回路又は回路以外の高弾性部材との側面間の最短距離は、500μm以上であることが好ましく、高電圧にも対応する観点から、1000μm以上であることがより好ましい。 In the circuit sheet of the present embodiment, from the viewpoint of insulation between circuits, the shortest distance between a specific circuit and a side surface of another circuit other than the specific circuit or a highly elastic member other than the circuit is 500 μm or more. It is preferable, and it is more preferable that it is 1000 μm or more from the viewpoint of corresponding to a high voltage.
<第四実施形態の回路シート>
 本開示の第四実施形態の回路シートは、導体からなる少なくとも一つの回路と、絶縁部と、前記絶縁部よりもヤング率の高い部材と、を備え、前記回路及び前記ヤング率の高い部材が配置されることにより形成された空間の少なくとも一部に前記絶縁部が設けられており、前記回路の素子実装面から見て、前記空間の少なくとも一部に設けられる前記絶縁部を通り、かつ前記素子実装面に対して平行である任意の方向の直線上に前記回路及び前記ヤング率の高い部材(以下、「高弾性部材」とも称する。)の少なくともいずれか一方が少なくとも一つ位置する。
<Circuit sheet of the fourth embodiment>
The circuit sheet of the fourth embodiment of the present disclosure includes at least one circuit made of a conductor, an insulating portion, and a member having a higher Young ratio than the insulating portion, and the circuit and the member having a higher Young ratio are included. The insulating portion is provided in at least a part of the space formed by the arrangement, passes through the insulating portion provided in at least a part of the space when viewed from the element mounting surface of the circuit, and said. At least one of the circuit and the member having a high young ratio (hereinafter, also referred to as “highly elastic member”) is located on a straight line in an arbitrary direction parallel to the element mounting surface.
 本実施形態の回路シートでは、回路の素子実装面から見て、空間の少なくとも一部に設けられる絶縁部を通り、かつ素子実装面に対して平行である任意の方向の直線上に回路及び高弾性部材の少なくともいずれか一方が少なくとも一つ位置する。これにより、空間の少なくとも一部に設けられる絶縁部を通り、かつ素子実装面に対して平行である少なくとも一つの直線上に回路及び高弾性部材が存在しない回路シートと比較して、絶縁部における直線状の領域での回路シートの変形が抑制され、反りの発生も抑制される。 In the circuit sheet of the present embodiment, the circuit and the height are on a straight line in an arbitrary direction that passes through an insulating portion provided in at least a part of the space and is parallel to the element mounting surface when viewed from the element mounting surface of the circuit. At least one of the elastic members is located. As a result, in the insulating portion, as compared with a circuit sheet in which the circuit and the highly elastic member do not exist on at least one straight line that passes through the insulating portion provided in at least a part of the space and is parallel to the element mounting surface. Deformation of the circuit sheet in the linear region is suppressed, and the occurrence of warpage is also suppressed.
 本実施形態の回路シートは、絶縁部よりも高弾性部材を備える。回路シートは、1つの高弾性部材のみを備えていてもよく、2つ以上の高弾性部材を備えていてもよい。 The circuit sheet of this embodiment includes a highly elastic member rather than an insulating portion. The circuit sheet may include only one highly elastic member, or may include two or more highly elastic members.
 高弾性部材の材質は、絶縁材料よりもヤング率が高ければ特に限定されず、例えば、金属が挙げられる。金属としては、銅、銀、クロム銅、タングステン銅、ニッケル、ニッケルメッキ銅、アルミニウム、アルマイトに表面修飾したアルミニウム等が挙げられる。 The material of the highly elastic member is not particularly limited as long as it has a higher Young's modulus than the insulating material, and examples thereof include metal. Examples of the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite.
 高弾性部材の材質は、回路の材質と同じであってもよい。また、高弾性部材は、回路間に配置される別の回路であってもよい。別の回路は、1つであってもよく、2つ以上であってもよい。 The material of the highly elastic member may be the same as the material of the circuit. Further, the highly elastic member may be another circuit arranged between the circuits. There may be one or more different circuits.
 高弾性部材の形状は特に限定されず、矩形状、多角形状、不規則形状、円状、十字形状、X形状等が挙げられる。 The shape of the highly elastic member is not particularly limited, and examples thereof include a rectangular shape, a polygonal shape, an irregular shape, a circular shape, a cross shape, and an X shape.
 高弾性部材は、2つ以上の線状部を備え、かつ2つ以上の線状部が交差した構造を有していてもよく、具体的には、十字形状の構造、X形状の構造等を有していてもよい。高弾性部材がこの構造を有することにより、回路シートにおける絶縁部の占める体積が比較的大きい場合であっても、回路シートの反りを好適に抑制できる。 The highly elastic member may have a structure in which two or more linear portions are provided and two or more linear portions intersect, specifically, a cross-shaped structure, an X-shaped structure, or the like. May have. Since the highly elastic member has this structure, the warp of the circuit sheet can be suitably suppressed even when the volume occupied by the insulating portion in the circuit sheet is relatively large.
 本実施形態の回路シートが複数の回路を備える場合、回路シートや回路基板の反りを好適に抑制する観点から、特定の回路と、特定の回路以外の別の回路又は高弾性部材との側面間の最短距離は、10mm以下であることが好ましく、回路シートの小型化の観点から、5mm以下であることがより好ましい。 When the circuit sheet of the present embodiment includes a plurality of circuits, between the side surface of the specific circuit and another circuit other than the specific circuit or a highly elastic member from the viewpoint of suitably suppressing the warp of the circuit sheet or the circuit board. The shortest distance is preferably 10 mm or less, and more preferably 5 mm or less from the viewpoint of miniaturization of the circuit sheet.
 本実施形態の回路シートは、回路間の絶縁性の観点から、特定の回路と、特定の回路以外の別の回路又は高弾性部材との側面間の最短距離は、500μm以上であることが好ましく、高電圧にも対応する観点から、1000μm以上であることがより好ましい。 In the circuit sheet of the present embodiment, from the viewpoint of insulation between circuits, the shortest distance between a specific circuit and a side surface of another circuit other than the specific circuit or a highly elastic member is preferably 500 μm or more. From the viewpoint of supporting high voltage, it is more preferably 1000 μm or more.
 本実施形態の回路シートは、回路の素子実装面と逆の面側に配置され、二つ以上の回路の相対配置を保持する絶縁層をさらに備えていてもよい。絶縁層の好ましい構成としては、後述の回路基板の項目にて説明する絶縁層と同様である。絶縁層は、回路との密着性を確保する観点及び二つ以上の回路の相対配置を好適に保持する観点から、回路側の面に粘着層を備えていてもよい。
 本実施形態の回路シートが絶縁層を備える場合、この回路シートは二つ以上の回路間に設けられる絶縁部をさらに備えていてもよく、備えていなくてもよい。
The circuit sheet of the present embodiment may be further provided with an insulating layer which is arranged on the surface side opposite to the element mounting surface of the circuit and holds the relative arrangement of two or more circuits. The preferable configuration of the insulating layer is the same as that described in the section of the circuit board described later. The insulating layer may be provided with an adhesive layer on the surface on the circuit side from the viewpoint of ensuring adhesion to the circuit and preferably maintaining the relative arrangement of two or more circuits.
When the circuit sheet of the present embodiment includes an insulating layer, the circuit sheet may or may not further include an insulating portion provided between two or more circuits.
 本実施形態の回路シートが絶縁層を備える場合、この絶縁層に接するように放熱部材を設けることによって後述の回路基板を形成してもよい。 When the circuit sheet of the present embodiment includes an insulating layer, a circuit board described later may be formed by providing a heat radiating member in contact with the insulating layer.
 以下、従来の回路シート、並びに第三実施形態の回路シート及び第四実施形態の回路シートの具体例について、図3A~図3Cを参照して説明する。 Hereinafter, specific examples of the conventional circuit sheet, the circuit sheet of the third embodiment, and the circuit sheet of the fourth embodiment will be described with reference to FIGS. 3A to 3C.
 図3Aは、従来の回路シートの概略構成図である。図3Aに示す回路シート140は、回路31と、回路31の間に設けられる絶縁部32と、を備える。図3Aに示すように、回路シート140は、中央部に絶縁部材が多く存在して回路が存在しない箇所があり、また、回路31の間に設けられる絶縁部32を通り、素子実装面に対して平行である少なくとも一つの直線(例えば、図3Aに示す点線)上に回路31が存在しない構成を有する。そのため、絶縁部32における絶縁部材が多く存在している領域、図3Aに示す点線を含む領域等にて変形が生じやすく、その部分を起点に回路シート140に反りが発生しやすいという問題がある。 FIG. 3A is a schematic configuration diagram of a conventional circuit sheet. The circuit sheet 140 shown in FIG. 3A includes a circuit 31 and an insulating portion 32 provided between the circuits 31. As shown in FIG. 3A, the circuit sheet 140 has a portion where many insulating members are present and no circuit is present in the central portion, and also passes through the insulating portion 32 provided between the circuits 31 with respect to the element mounting surface. It has a configuration in which the circuit 31 does not exist on at least one straight line (for example, the dotted line shown in FIG. 3A) which is parallel to each other. Therefore, there is a problem that deformation is likely to occur in a region of the insulating portion 32 where many insulating members are present, a region including a dotted line shown in FIG. 3A, and the circuit sheet 140 is likely to be warped starting from that portion. ..
 図3Bは、本開示の第三実施形態の回路シートの概略構成図である。図3Bに示す回路シート150は、回路31と、回路31の間に設けられる絶縁部32と、を備え、二つの回路31の間に、別の回路33をさらに備えている。回路シート150では、隣接する回路31及び別の回路33の間に設けられる絶縁部32を通り、かつ素子実装面に対して平行である任意の方向の直線上に回路(例えば、回路31及び別の回路33)が位置している。 FIG. 3B is a schematic configuration diagram of a circuit sheet according to a third embodiment of the present disclosure. The circuit sheet 150 shown in FIG. 3B includes a circuit 31 and an insulating portion 32 provided between the circuits 31, and further includes another circuit 33 between the two circuits 31. In the circuit sheet 150, a circuit (for example, the circuit 31 and another circuit 31) passes through an insulating portion 32 provided between an adjacent circuit 31 and another circuit 33 and is on a straight line in an arbitrary direction parallel to the element mounting surface. Circuit 33) is located.
 図3Cは、本開示の第四実施形態の回路シートの概略構成図である。図3Cに示す回路シート160は、回路31と、回路31の間に設けられる絶縁部32と、を備え、二つの回路31の間に絶縁部32よりもヤング率が高い部材である高弾性部材4をさらに備えている。回路シート160では、二つの回路31の間に設けられる絶縁部32を通り、かつ素子実装面に対して平行である任意の方向の直線上に回路31及び高弾性部材4の少なくとも一方が位置している。 FIG. 3C is a schematic configuration diagram of a circuit sheet according to a fourth embodiment of the present disclosure. The circuit sheet 160 shown in FIG. 3C includes a circuit 31 and an insulating portion 32 provided between the circuits 31, and is a highly elastic member having a higher Young's modulus than the insulating portion 32 between the two circuits 31. 4 is further provided. In the circuit sheet 160, at least one of the circuit 31 and the highly elastic member 4 is located on a straight line in an arbitrary direction that passes through the insulating portion 32 provided between the two circuits 31 and is parallel to the element mounting surface. ing.
 第三実施形態の回路シート150及び第四実施形態の回路シート160では、二つの回路31の間に設けられる絶縁部32を通り、かつ素子実装面に対して平行である任意の方向の直線上に回路31、別の回路33及び高弾性部材4の少なくともいずれかが位置している。したがって、絶縁部32における直線状の領域での回路シート150及び回路シート160の変形が抑制され、反りの発生も抑制される In the circuit sheet 150 of the third embodiment and the circuit sheet 160 of the fourth embodiment, the circuit sheet 150 passes through the insulating portion 32 provided between the two circuits 31 and is on a straight line in an arbitrary direction parallel to the element mounting surface. At least one of a circuit 31, another circuit 33, and a highly elastic member 4 is located in. Therefore, the deformation of the circuit sheet 150 and the circuit sheet 160 in the linear region of the insulating portion 32 is suppressed, and the occurrence of warpage is also suppressed.
 本開示の回路シートを製造する方法は特に限定されない。本開示の回路シートを製造する方法は、例えば、仮基材上に配置された、回路、又は回路及び高弾性部材によって形成された空間に絶縁材料を充填する工程を有し、絶縁材料が樹脂等である場合、必要に応じて、充填させた絶縁材料を硬化させる工程を有していてもよい。回路によって形成された空間としては、例えば、回路間の空間が挙げられ、回路及び高弾性部材によって形成された空間としては、例えば、高弾性部材間の空間及び回路と高弾性部材との間の空間が挙げられる。 The method for manufacturing the circuit sheet of the present disclosure is not particularly limited. The method of manufacturing the circuit sheet of the present disclosure includes, for example, a step of filling a circuit or a space formed by the circuit and a highly elastic member arranged on a temporary base material with an insulating material, and the insulating material is a resin. If necessary, it may have a step of curing the filled insulating material. Examples of the space formed by the circuit include a space between circuits, and examples of the space formed by the circuit and the highly elastic member include, for example, the space between the highly elastic members and the space between the circuit and the highly elastic member. Space can be mentioned.
 回路及び高弾性部材は、金属を仮基材上に配置し、次いでエッチングを行うことによって仮基材上に形成されたものであってもよい。 The circuit and the highly elastic member may be formed on the temporary base material by arranging the metal on the temporary base material and then performing etching.
 本開示において仮基材とは、仮基材上に配置された回路等によって形成された空間に絶縁材料を充填する前に回路等を仮固定することができ、絶縁材料を充填した後に回路等から除去できるものをいう。ここで、回路等が仮固定されているとは、回路等が仮基材との接触によって相対的な位置関係を維持していることをいい、必ずしも回路等が完全に動かないことを意味するものではない。 In the present disclosure, the temporary base material means that a circuit or the like can be temporarily fixed before the space formed by the circuit or the like arranged on the temporary base material is filled with the insulating material, and the circuit or the like can be temporarily fixed after the insulating material is filled. It means something that can be removed from. Here, the fact that the circuit or the like is temporarily fixed means that the circuit or the like maintains a relative positional relationship by contact with the temporary base material, and does not necessarily mean that the circuit or the like does not move completely. It's not a thing.
 仮基材としては、樹脂フィルム等が挙げられる。仮基材に使用できる樹脂フィムルとしては、支持フィルムと支持フィルム上に形成される接着層とを有する樹脂フィルム等が挙げられる。 Examples of the temporary base material include a resin film and the like. Examples of the resin film that can be used as the temporary base material include a resin film having a support film and an adhesive layer formed on the support film.
<第三実施形態の回路基板>
 本開示の第三実施形態の回路基板は、上述した本開示の第三実施形態又は第四実施形態の回路シートと、前記回路シートの素子実装面と逆の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、をこの順に有する。本開示の回路シートは、反りの発生が抑制されているため、回路シートと、絶縁層と、放熱部材とを均一性高く圧着することができ、製造された回路基板の絶縁層の厚さの均一性に優れる。その結果、本開示の回路基板は、接着信頼性が高く、放熱性、絶縁性等に優れる傾向にある。
<Circuit board of the third embodiment>
The circuit board of the third embodiment of the present disclosure is insulated so as to be in contact with the circuit sheet of the third embodiment or the fourth embodiment of the present disclosure described above and the surface opposite to the element mounting surface of the circuit sheet. A layer and a heat radiating member arranged so as to be in contact with the insulating layer are provided in this order. Since the circuit sheet of the present disclosure suppresses the occurrence of warpage, the circuit sheet, the insulating layer, and the heat radiating member can be pressure-bonded with high uniformity, and the thickness of the insulating layer of the manufactured circuit board can be increased. Excellent uniformity. As a result, the circuit board of the present disclosure tends to have high adhesive reliability and excellent heat dissipation, insulation and the like.
 回路基板に用いられる絶縁層及び放熱部材の種類は特に制限されず、回路基板に一般的に使用されるものから選択できる。絶縁層の形成に用いる絶縁材料の好ましい形態は、絶縁部の形成に用いる絶縁材料の好ましい形態と同様であってもよい。絶縁層は、回路シートとの密着性の観点から、回路シート側の面に粘着層を備えていてもよい。放熱部材の材質は特に制限されず、銅、アルミニウム、タングステン銅、モリブデン銅等の銅合金、ニッケルめっき銅などが挙げられる。放熱部材の種類は特に制限されず、ヒートスプレッダ、ヒートシンク等の放熱機能を有する部材、空気又は水の流路を持ったケース、金属箔、フィラー樹脂コンポジットなどであってもよい。放熱部材の表面は平滑であってもよく、絶縁層との接着性を向上させるための粗化処理が施されていてもよい The types of the insulating layer and the heat radiating member used for the circuit board are not particularly limited, and can be selected from those generally used for the circuit board. The preferred form of the insulating material used for forming the insulating layer may be the same as the preferred form of the insulating material used for forming the insulating portion. The insulating layer may be provided with an adhesive layer on the surface on the circuit sheet side from the viewpoint of adhesion to the circuit sheet. The material of the heat radiating member is not particularly limited, and examples thereof include copper, aluminum, tungsten copper, copper alloys such as molybdenum copper, and nickel-plated copper. The type of the heat radiating member is not particularly limited, and may be a member having a heat radiating function such as a heat spreader or a heat sink, a case having an air or water flow path, a metal foil, a filler resin composite, or the like. The surface of the heat radiating member may be smooth, and may be roughened to improve the adhesiveness with the insulating layer.
 絶縁層の厚さは特に制限されず、回路基板の用途等に応じて選択できる。充分な絶縁性を確保する観点からは、絶縁層の厚さは50μm以上であることが好ましく、充分な接着性を確保する観点から、80μm以上であることがより好ましく、絶縁層を接着する際のハンドリング性がより容易になる観点、熱衝撃耐性を付与する観点等から、120μm以上であることがさらに好ましい。 The thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board. From the viewpoint of ensuring sufficient insulating properties, the thickness of the insulating layer is preferably 50 μm or more, and from the viewpoint of ensuring sufficient adhesiveness, it is more preferably 80 μm or more, and when adhering the insulating layer. It is more preferably 120 μm or more from the viewpoint of facilitating the handleability of the above, and from the viewpoint of imparting thermal shock resistance.
 充分な放熱性を確保する観点からは、絶縁層の厚さは500μm以下であることが好ましく、絶縁層の収縮による回路基板の反りを低減しやすいという観点から、400μm以下であることがより好ましく、300μm以下であることがさらに好ましい。 From the viewpoint of ensuring sufficient heat dissipation, the thickness of the insulating layer is preferably 500 μm or less, and more preferably 400 μm or less from the viewpoint of easily reducing the warp of the circuit board due to the shrinkage of the insulating layer. , 300 μm or less is more preferable.
<第三実施形態の回路基板の製造方法>
 本開示の第三実施形態の回路基板の製造方法は、上述した本開示の第三実施形態又は第四実施形態の回路シートと、前記回路シートの素子実装面と逆の面に配置される絶縁層と、放熱部材と、をこの順に配置した状態の積層体、又は、上述した絶縁層を備える本開示の回路シートと、放熱部材と、を前記回路シートが備える前記絶縁層側に前記放熱部材が位置するように配置した状態の積層体、を厚さ方向に加圧する工程を有する。
<Manufacturing method of circuit board of the third embodiment>
The method for manufacturing the circuit board of the third embodiment of the present disclosure is the insulation arranged on the surface opposite to the element mounting surface of the circuit sheet of the third embodiment or the fourth embodiment of the present disclosure described above. The laminated body in which the layers and the heat radiating member are arranged in this order, or the circuit sheet of the present disclosure provided with the above-mentioned insulating layer and the heat radiating member are provided on the insulating layer side of the circuit sheet. It has a step of pressurizing in the thickness direction of the laminated body, which is arranged so as to be located.
 上記方法において積層体を加圧する方法は特に制限されず、回路基板の製造工程において一般的に行われる方法から選択できる。 The method of pressurizing the laminate in the above method is not particularly limited, and can be selected from the methods generally performed in the circuit board manufacturing process.
<第五実施形態の回路シート>
 本開示の第五実施形態の回路シートは、回路と、前記回路の間に設けられる絶縁部と、を備え、素子実装面(素子が実装される側の面)において前記絶縁部が凹んでいる、回路シートである。
 回路シートの素子実装面において絶縁部が凹んだ状態であることで、回路が相対的に突出した状態となり、素子実装の作業性が向上する。
<Circuit sheet of the fifth embodiment>
The circuit sheet of the fifth embodiment of the present disclosure includes a circuit and an insulating portion provided between the circuits, and the insulating portion is recessed on the element mounting surface (the surface on which the element is mounted). , Circuit sheet.
Since the insulating portion is recessed on the element mounting surface of the circuit sheet, the circuit is in a relatively protruding state, and the workability of element mounting is improved.
 絶縁部が凹んでいる部分の形状は、特に制限されない。例えば、凹んでいる部分の絶縁部の厚さが一定である直線状であっても、厚さが変化して曲線又は段差状になっていてもよい。回路シートの強度確保の観点からは、凹んでいる部分の形状は直線状又は素子実装面と逆の面方向に凸の曲線状であることが好ましい。 The shape of the recessed part of the insulating part is not particularly limited. For example, it may be a straight line in which the thickness of the insulating portion of the recessed portion is constant, or it may be curved or stepped by changing the thickness. From the viewpoint of ensuring the strength of the circuit sheet, the shape of the recessed portion is preferably a straight line or a curved shape that is convex in the direction opposite to the element mounting surface.
 本開示の回路シートの構成の一例について、図面を参照して説明する。
 図4Aは本開示の回路シートの断面を概略的に示す図である。図4Aに示す回路シート170は、回路41と、回路41の間に設けられる絶縁部42と、を備え、素子実装面において絶縁部42が凹んだ状態である。
An example of the configuration of the circuit sheet of the present disclosure will be described with reference to the drawings.
FIG. 4A is a diagram schematically showing a cross section of the circuit sheet of the present disclosure. The circuit sheet 170 shown in FIG. 4A includes a circuit 41 and an insulating portion 42 provided between the circuits 41, and the insulating portion 42 is recessed on the element mounting surface.
 素子実装面における絶縁部の凹みの度合いは、特に制限されない。例えば、素子実装面における絶縁部と隣接する回路との高低差の最大値をdとし、回路の厚さをDとしたとき、dのDに対する比(d/D)が0.0025~0.5であると、絶縁部における回路シートの曲げ強度を確保しやすく、0.0025~0.25であると回路シートの強度をより確保しやすく、後の工程において回路基板を、絶縁層を介して加圧圧着する場合に回路シートの破損を抑制しやすい傾向にある。
 dのDに対する比(d/D)が0.0025~0.025であると回路シートの強度をさらに確保しやすく、回路シート厚さ方向の対称性が確保しやすく回路シートの反りも低減できる傾向にある。このため後の工程において回路シートを、絶縁層を介して加圧圧着する際に、良好に接着できる。
 dのDに対する比(d/D)は、0.003~0.01であることがより好ましい。
 ある実施態様では、素子実装面における絶縁部と隣接する回路との高低差の最大値dは5μm~50μmの範囲内であってもよい。
The degree of denting of the insulating portion on the element mounting surface is not particularly limited. For example, when the maximum value of the height difference between the insulating portion on the element mounting surface and the adjacent circuit is d and the thickness of the circuit is D, the ratio (d / D) of d to D is 0.0025 to 0. When it is 5, it is easy to secure the bending strength of the circuit sheet in the insulating portion, and when it is 0.0025 to 0.25, it is easier to secure the strength of the circuit sheet, and in a later step, the circuit board is passed through the insulating layer. There is a tendency to easily suppress damage to the circuit sheet when pressure-bonding.
When the ratio (d / D) of d to D is 0.0025 to 0.025, it is easy to secure the strength of the circuit sheet, it is easy to secure the symmetry in the thickness direction of the circuit sheet, and the warp of the circuit sheet can be reduced. There is a tendency. Therefore, when the circuit sheet is pressure-bonded through the insulating layer in a later step, it can be adhered well.
The ratio of d to D (d / D) is more preferably 0.003 to 0.01.
In some embodiments, the maximum value d of the height difference between the insulating portion on the element mounting surface and the adjacent circuit may be in the range of 5 μm to 50 μm.
 回路シートは、素子実装面と逆の面が、素子実装面よりも平坦であることが好ましい。これにより、素子実装面と逆の面を絶縁層と接触させる場合に絶縁層と接着させやすく、良好な絶縁性が得られる傾向にある。さらに、絶縁層を介して放熱部材と接着する場合に絶縁層と接着させやすく、良好な絶縁性が得られる傾向にある。
 本発明において、「素子実装面と逆の面が、素子実装面よりも平坦である」とは、素子実装面と逆の面における絶縁部と隣接する回路との高低差の最大値をd’(プラスは回路表面より凹んでいることを意味し、マイナスは突出していることを表す)とし、回路の厚さをDとしたとき、d’のDに対する比(d’/D)が、(d/D)>(d’/D)の条件を満たすことを言う。
 具体的には、(d’/D)が、(d/D)以上にならない範囲で-0.005~0.005であると、回路シートと絶縁層の接着性を確保しやすいため好ましい。-0.0025~0.0025となる範囲であると、回路シートと絶縁層との圧着時に気泡等を巻き込むことが低減できるためより好ましい。なお、素子実装面と逆の面が、素子実装面よりも平坦であることによって回路シートの表裏の判別も可能であるという利点もある。
 ある実施態様では、素子実装面と逆の面における絶縁部と隣接する回路との高低差の最大値d’は-5μm~5μmの範囲内であってもよく、0μm~5μmの範囲内であることが好ましい。
It is preferable that the surface of the circuit sheet opposite to the element mounting surface is flatter than the element mounting surface. As a result, when the surface opposite to the element mounting surface is brought into contact with the insulating layer, it is easy to adhere to the insulating layer, and good insulating properties tend to be obtained. Further, when it is adhered to the heat radiating member via the insulating layer, it is easily adhered to the insulating layer, and good insulating properties tend to be obtained.
In the present invention, "the surface opposite to the element mounting surface is flatter than the element mounting surface" means that the maximum value of the height difference between the insulating portion and the adjacent circuit on the surface opposite to the element mounting surface is d'. (Plus means that it is recessed from the circuit surface, minus means that it is protruding), and when the thickness of the circuit is D, the ratio of d'to D (d'/ D) is ( It means that the condition of d / D)>(d'/ D) is satisfied.
Specifically, when (d'/ D) is −0.005 to 0.005 within a range not exceeding (d / D), it is preferable because it is easy to secure the adhesiveness between the circuit sheet and the insulating layer. The range of −0.0025 to 0.0025 is more preferable because it is possible to reduce the entrainment of air bubbles and the like during crimping between the circuit sheet and the insulating layer. In addition, since the surface opposite to the element mounting surface is flatter than the element mounting surface, there is an advantage that the front and back surfaces of the circuit sheet can be discriminated.
In some embodiments, the maximum value d'of the height difference between the insulating portion and the adjacent circuit on the surface opposite to the device mounting surface may be in the range of -5 μm to 5 μm, and may be in the range of 0 μm to 5 μm. Is preferable.
 回路シートは、素子実装面と逆の面に、回路と絶縁部とが厚さ方向において重なる部分を有することが好ましい。
 金属板等を加工して得られる回路は、切削時の摩耗等により、厚さが足りない部分を有する場合がある。このため、回路を絶縁層の上に配置すると間に空隙が生じ、十分に接着できないおそれがある。
 回路の厚さが足りない部分に絶縁材料が入り込み、絶縁部と厚さ方向において重なる状態であることで、回路と絶縁層との間に空隙が生じるのが抑制され、絶縁層との接着性が向上する。よって回路シートを絶縁層と接着する場合は、回路シートにおいて、回路と絶縁部とが厚さ方向において重なる部分は絶縁層との接着前に設けられていることが肝要である。
The circuit sheet preferably has a portion where the circuit and the insulating portion overlap in the thickness direction on the surface opposite to the element mounting surface.
The circuit obtained by processing a metal plate or the like may have a portion having insufficient thickness due to wear during cutting or the like. Therefore, when the circuit is arranged on the insulating layer, a gap is generated between the circuits, and there is a possibility that the circuit cannot be sufficiently adhered.
Since the insulating material enters the part where the thickness of the circuit is insufficient and overlaps with the insulating part in the thickness direction, the formation of a gap between the circuit and the insulating layer is suppressed, and the adhesiveness with the insulating layer is suppressed. Is improved. Therefore, when the circuit sheet is bonded to the insulating layer, it is important that the portion of the circuit sheet where the circuit and the insulating portion overlap in the thickness direction is provided before bonding to the insulating layer.
 回路と絶縁部とが厚さ方向において重なる部分の幅は、回路シートと絶縁層との接着性及び回路基板としたときの放熱性の観点から、5μm~100μmであることが好ましく、8μm~70μmであることがより好ましい。回路と絶縁部とが厚さ方向において重なる部分は、素子実装面と逆の面側に前記絶縁層が入り込んだ部分であってもよい。 The width of the portion where the circuit and the insulating portion overlap in the thickness direction is preferably 5 μm to 100 μm, preferably 8 μm to 70 μm, from the viewpoint of adhesiveness between the circuit sheet and the insulating layer and heat dissipation when used as a circuit board. Is more preferable. The portion where the circuit and the insulating portion overlap in the thickness direction may be a portion where the insulating layer is inserted on the surface side opposite to the element mounting surface.
 図4Bは回路シートの回路と絶縁部とが厚さ方向において重なる部分の断面を概略的に示す図である。図4Bに示すように、回路シート170は、素子実装面と逆の面に、回路41と絶縁部42とが厚さ方向において重なる部分43を有している。 FIG. 4B is a diagram schematically showing a cross section of a portion where the circuit of the circuit sheet and the insulating portion overlap in the thickness direction. As shown in FIG. 4B, the circuit sheet 170 has a portion 43 in which the circuit 41 and the insulating portion 42 overlap in the thickness direction on the surface opposite to the element mounting surface.
 回路41と絶縁部42とが厚さ方向において重なる部分43は、例えば、回路41の間に絶縁材料を充填して絶縁部42を形成する際に、回路41の厚さの足りない部分にも絶縁材料を充填して形成することができる。 The portion 43 in which the circuit 41 and the insulating portion 42 overlap in the thickness direction is also formed in a portion where the thickness of the circuit 41 is insufficient, for example, when the insulating material is filled between the circuits 41 to form the insulating portion 42. It can be formed by filling an insulating material.
 回路は、少なくとも一部が素子実装面側と絶縁層側において露出した状態となっている。回路の厚さは特に制限されず、回路シートの用途等に応じて選択できる。回路の大電流化の観点からは、回路の厚さは350μm以上であることが好ましく、より大電流化に対応する観点から500μm以上であることがより好ましく、放熱性の観点から1000μm以上であることが特に好ましい。回路シートの軽量化や、低背化の観点からは、回路の厚さは5000μm以下であることが好ましく、回路の加工性の観点から3500μm以下であることがより好ましい。回路シートの圧着の観点からは、回路の厚さは3000μm以下であることがさらに好ましい。回路の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
 絶縁層等の隣接する部材に回路の一部が埋め込まれている場合は、埋め込まれている部分の厚さも回路の厚さに含まれる。
At least a part of the circuit is exposed on the element mounting surface side and the insulating layer side. The thickness of the circuit is not particularly limited and can be selected according to the application of the circuit sheet and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably 350 μm or more, more preferably 500 μm or more from the viewpoint of corresponding to the larger current, and 1000 μm or more from the viewpoint of heat dissipation. Is particularly preferred. From the viewpoint of reducing the weight and height of the circuit sheet, the thickness of the circuit is preferably 5000 μm or less, and more preferably 3500 μm or less from the viewpoint of processability of the circuit. From the viewpoint of crimping the circuit sheet, the thickness of the circuit is more preferably 3000 μm or less. When the thickness of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
When a part of the circuit is embedded in an adjacent member such as an insulating layer, the thickness of the embedded part is also included in the thickness of the circuit.
 回路シートの素子実装面を観察したときの回路の幅は特に制限されず、回路シートの用途等に応じて選択してよい。例えば、回路の幅は100μm~100mmであってもよい。回路が曲線状や段差状で幅が一定でない場合には、最も幅が狭い位置の測定値を上記の値とする。
 回路は1つの独立したパターン(パターン中のすべての回路が連続した状態)からなっても、2つ以上の独立したパターンからなってもよい。回路シートを絶縁層上に配置する際には、独立したパターンがそれぞれ独立した絶縁層上に配置されても、同一の絶縁層上に配置されてもよい。回路の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
The width of the circuit when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected depending on the application of the circuit sheet and the like. For example, the width of the circuit may be 100 μm to 100 mm. When the circuit is curved or stepped and the width is not constant, the measured value at the narrowest position is taken as the above value.
The circuit may consist of one independent pattern (all circuits in the pattern are continuous) or two or more independent patterns. When the circuit sheet is arranged on the insulating layer, the independent patterns may be arranged on the independent insulating layer or may be arranged on the same insulating layer. When the width of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 回路は、例えば、金属板を所望の形状の回路の状態に加工することで得ることができる。加工の方法は特に制限されず、打抜き、切削、エッチング等の公知の方法によって行うことができる。
 金属としては、銅、銀、クロム銅、タングステン銅、ニッケル、ニッケルメッキ銅、アルミニウム、アルマイトに表面修飾したアルミニウム等が挙げられる。導電性及び放熱性の観点からは、銅を含むことが好ましい。
The circuit can be obtained, for example, by processing a metal plate into a circuit state having a desired shape. The processing method is not particularly limited, and can be performed by a known method such as punching, cutting, or etching.
Examples of the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity and heat dissipation, it is preferable to contain copper.
 回路シートの素子実装面を観察したときの絶縁部の幅は特に制限されず、回路シートの用途等に応じて選択してよい。例えば、絶縁部の幅は100μm~100mmであってもよい。絶縁部が曲線状や段差状で幅が一定でない場合には、最も幅が狭い位置の測定値を上記の値とする。 The width of the insulating portion when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like. For example, the width of the insulating portion may be 100 μm to 100 mm. When the insulating portion is curved or stepped and the width is not constant, the measured value at the narrowest position is taken as the above value.
 回路シートの絶縁部の形成に用いる絶縁材料としては、エポキシ樹脂、フェノール樹脂、ユリア樹脂、メラミン樹脂、ウレタン樹脂、シリコーン樹脂、不飽和ポリエステル樹脂、アクリル樹脂等の樹脂を含む材料が挙げられる。絶縁材料に含まれる樹脂は、1種であっても2種以上であってもよい。絶縁材料は、必要に応じて、無機フィラー等の樹脂以外の成分を含んでもよい。 Examples of the insulating material used for forming the insulating portion of the circuit sheet include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, and acrylic resin. The resin contained in the insulating material may be one kind or two or more kinds. The insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
 回路シートの素子実装面において絶縁部が凹んだ状態とする観点からは、絶縁部は硬化時に体積が収縮する絶縁材料を用いて形成されることが好ましい。 From the viewpoint that the insulating portion is recessed on the element mounting surface of the circuit sheet, it is preferable that the insulating portion is formed by using an insulating material whose volume shrinks when cured.
<第五実施形態の回路シートの変形例>
 第五実施形態の回路シートの変形例としては、複数の回路と、前記複数の回路の間に設けられており、前記回路において、素子が搭載される素子実装面の少なくとも一部及び前記素子実装面とは反対側の面の少なくとも一部が露出するように、前記複数の回路の相対位置を保持する絶縁部と、を有し、前記素子実装面側における前記絶縁部の表面は、前記回路の前記素子実装面に対して凹んでいる、回路シートである。
 素子実装面側における絶縁部の表面は、回路の素子実装面に対して凹んでいる状態であるため、素子実装の作業性が向上する。前述の変形例の好ましい形態としては、第五実施形態の回路シートと同様である。
<Modification example of the circuit sheet of the fifth embodiment>
As a modification of the circuit sheet of the fifth embodiment, at least a part of the element mounting surface on which the element is mounted and the element mounting in the circuit are provided between the plurality of circuits and the plurality of circuits. It has an insulating portion that holds relative positions of the plurality of circuits so that at least a part of the surface opposite to the surface is exposed, and the surface of the insulating portion on the device mounting surface side is the circuit. It is a circuit sheet that is recessed with respect to the element mounting surface of the above.
Since the surface of the insulating portion on the element mounting surface side is recessed with respect to the element mounting surface of the circuit, the workability of element mounting is improved. A preferred embodiment of the above-described modification is the same as that of the circuit sheet of the fifth embodiment.
<第五実施形態の回路シートの製造方法>
 本開示の第五実施形態の回路シートの製造方法は、シート状の回路の一方の面に保護フィルムを貼り付けた状態で前記回路の間に絶縁材料を充填する工程と、前記絶縁材料を硬化させる工程と、をこの順に有し、
 前記保護フィルムは前記絶縁材料の硬化による体積収縮に伴って変形可能である、回路シートの製造方法である。
<Manufacturing method of circuit sheet of the fifth embodiment>
The method for manufacturing a circuit sheet according to a fifth embodiment of the present disclosure includes a step of filling an insulating material between the circuits with a protective film attached to one surface of the sheet-shaped circuit, and a step of curing the insulating material. It has a process of making it, and in this order,
The protective film is a method for manufacturing a circuit sheet, which is deformable with volume shrinkage due to curing of the insulating material.
 上記方法では、シート状の回路の間に絶縁材料を充填し、硬化させることで絶縁材料の硬化物からなる絶縁部を形成する。さらに、絶縁材料が硬化により体積収縮する現象を利用して、素子実装面において絶縁材料の硬化物(絶縁部)が凹んだ状態を形成する。より具体的には、回路に貼り付けられる保護フィルムとして絶縁材料の硬化による体積収縮に伴って変形可能なものを使用することで、絶縁材料の体積収縮が妨げられず、凹んだ状態の絶縁部を形成することができる。 In the above method, an insulating material is filled between sheet-shaped circuits and cured to form an insulating portion made of a cured product of the insulating material. Further, by utilizing the phenomenon that the insulating material shrinks in volume due to curing, the cured product (insulating portion) of the insulating material is formed in a recessed state on the element mounting surface. More specifically, by using a protective film attached to the circuit that can be deformed as the insulating material shrinks due to hardening, the volume shrinkage of the insulating material is not hindered and the insulating portion in a recessed state is used. Can be formed.
 上記方法において回路の保護フィルムが貼り付けられる面は、回路シートの素子実装面であってもよい。
 上記方法で使用する回路及び絶縁材料は、それぞれ上述した本開示の回路シートに使用する回路及び絶縁材料であってもよい。
 回路の間に絶縁材料を充填する方法及び硬化する方法は特に制限されず、公知の方法で実施することができる。
In the above method, the surface to which the protective film of the circuit is attached may be the element mounting surface of the circuit sheet.
The circuit and insulating material used in the above method may be the circuit and insulating material used in the circuit sheet of the present disclosure described above, respectively.
The method of filling the insulating material between the circuits and the method of curing are not particularly limited, and a known method can be used.
 上記方法で使用する保護フィルムは、絶縁材料の硬化による体積収縮に伴って変形可能なものであれば特に制限されない。具体的には、PETフィルム、ポリイミドフィルム、ポリアミドフィルム等、種々の樹脂フィルムを用いることができる。後の工程で加熱を必要とする場合は、耐熱性の観点からポリイミドフィルム又はポリアミドフィルムがより好ましい。 The protective film used in the above method is not particularly limited as long as it can be deformed by volume shrinkage due to curing of the insulating material. Specifically, various resin films such as PET film, polyimide film, and polyamide film can be used. When heating is required in a later step, a polyimide film or a polyamide film is more preferable from the viewpoint of heat resistance.
 絶縁材料の充填及び硬化の際に保護フィルムが回路から剥離するのを防ぐ観点からは、保護フィルムの回路に貼り付けられる面は粘着性を有していてもよい。例えば、保護フィルムの回路に貼り付けられる面にアクリル系接着剤、ウレタン接着剤、シリコーン系接着剤等の粘着剤を含む層が形成されていてもよい。粘着剤を有することによって絶縁材料が、回路と粘着剤間に浸入することを抑制でき、素子実装を良好な状態で行うことができる。 From the viewpoint of preventing the protective film from peeling off from the circuit during filling and curing of the insulating material, the surface of the protective film to be attached to the circuit may have adhesiveness. For example, a layer containing an adhesive such as an acrylic adhesive, a urethane adhesive, or a silicone adhesive may be formed on the surface of the protective film to be attached to the circuit. By having the pressure-sensitive adhesive, the insulating material can be suppressed from entering between the circuit and the pressure-sensitive adhesive, and the element can be mounted in a good state.
 絶縁材料の硬化による体積収縮に降伏させる観点から、保護フィルムの曲げ弾性率は200MPa~20GPaであることが好ましく、体積収縮量の制御しやすさの観点から1GPa~15GPaであることがより好ましい。保護フィルムの剥離しやすさの観点からは、保護フィルムの曲げ弾性率は3GPa~9.5GPaであることがさらに好ましい。
 保護フィルムの曲げ弾性率は、JIS K7171にしたがって測定される。
From the viewpoint of yielding to volume shrinkage due to curing of the insulating material, the flexural modulus of the protective film is preferably 200 MPa to 20 GPa, and more preferably 1 GPa to 15 GPa from the viewpoint of ease of controlling the volume shrinkage amount. From the viewpoint of ease of peeling of the protective film, the flexural modulus of the protective film is more preferably 3 GPa to 9.5 GPa.
The flexural modulus of the protective film is measured according to JIS K7171.
 保護フィルムの厚さは特に限定されないが、保護フィルムの厚さ(粘着層を有する場合はその厚さを含む)が、10μm~1mmであると、ハンドリングの観点から好ましく、25μm~500μmであると、保護フィルムのよれやねじれを抑制しやすく、かつよりハンドリングを容易とすることができるためより好ましく、25μm~120μmであると絶縁材料の硬化による体積収縮量を制御しやすいため更に好ましい。 The thickness of the protective film is not particularly limited, but the thickness of the protective film (including the thickness of the adhesive layer if it has an adhesive layer) is preferably 10 μm to 1 mm, preferably 25 μm to 500 μm from the viewpoint of handling. It is more preferable because it is easy to suppress twisting and twisting of the protective film and it is easier to handle, and it is more preferable that the thickness is 25 μm to 120 μm because it is easy to control the amount of volume shrinkage due to curing of the insulating material.
 上記方法において絶縁材料の充填及び硬化は、回路の保護フィルムが貼り付けられた面と逆の面に、絶縁材料の硬化による体積収縮に伴って変形しない部材を当接した状態で行うことが好ましい。このような部材が当接した側の面は、絶縁材料の硬化物が凹んだ状態になりにくく、保護フィルムが貼り付けられた面よりも平坦な状態にすることができる。 In the above method, it is preferable that the insulating material is filled and cured in a state where a member that does not deform due to volume shrinkage due to the curing of the insulating material is in contact with the surface opposite to the surface to which the protective film of the circuit is attached. .. The surface on the side where such a member comes into contact is less likely to have a dented state of the cured product of the insulating material, and can be made flatter than the surface to which the protective film is attached.
 本開示において「部材を当接する」とは、絶縁材料を硬化させる工程の後に回路から容易に分離できるように部材を回路に接触させることを意味する。上記部材としては、回路と接する面が平坦である金型等が挙げられる。 In the present disclosure, "contacting a member" means bringing the member into contact with the circuit so that it can be easily separated from the circuit after the step of curing the insulating material. Examples of the member include a mold having a flat surface in contact with the circuit.
 回路の一方の面に貼り付けられる保護フィルムは、逆側の面に当接する部材よりも低弾性(変形しやすい)であることが好ましい。このようにすることで、保護フィルムが貼り付けられた側の面を選択的に絶縁材料の硬化物が凹んだ状態とすることができる。また、得られた回路シートから保護フィルム及び部材をより容易に除去することができ、除去時の回路の破損等の発生を抑制できる。 It is preferable that the protective film attached to one surface of the circuit has lower elasticity (easily deformed) than the member that abuts on the opposite surface. By doing so, the surface on the side to which the protective film is attached can be selectively made into a state in which the cured product of the insulating material is recessed. Further, the protective film and the member can be more easily removed from the obtained circuit sheet, and the occurrence of circuit breakage or the like at the time of removal can be suppressed.
 シート状の回路と部材とが接する面は、回路の全面が部材と接していても、一部が接しておらず間に空隙が存在していてもよい。回路と部材との間に空隙が存在する場合は、回路間に充填される絶縁材料の一部で当該空隙も充填されることが好ましい。これにより、図4Bに示したように、回路シートの厚さ方向において回路と絶縁材料とが重なる部分が形成されて、得られる回路シートの表面がより平坦化される。 The surface where the sheet-shaped circuit and the member are in contact may be such that the entire surface of the circuit is in contact with the member, or a part of the surface is not in contact with the member and there is a gap between them. When there is a gap between the circuit and the member, it is preferable that the gap is also filled with a part of the insulating material filled between the circuits. As a result, as shown in FIG. 4B, a portion where the circuit and the insulating material overlap in the thickness direction of the circuit sheet is formed, and the surface of the obtained circuit sheet is further flattened.
<第四実施形態の回路基板>
 本開示の回路基板は、上述した本開示の第五実施形態の回路シートと、前記回路シートの素子実装面と逆の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、を有する。
<Circuit board of the fourth embodiment>
The circuit board of the present disclosure is in contact with the circuit sheet of the fifth embodiment of the present disclosure described above, an insulating layer arranged so as to be in contact with a surface opposite to the element mounting surface of the circuit sheet, and the insulating layer. It has a heat radiating member to be arranged.
 回路基板に用いられる絶縁層及び放熱部材の種類は特に制限されず、回路基板に一般的に使用されるものから選択できる。 The types of the insulating layer and the heat radiating member used for the circuit board are not particularly limited, and can be selected from those generally used for the circuit board.
 絶縁層の厚さは特に制限されず、回路基板の用途等に応じて選択できる。充分な絶縁性を確保する観点からは、絶縁層の厚さは50μm以上であることが好ましく、100μm以上であることがより好ましく、150μm以上であることがさらに好ましい。 The thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board. From the viewpoint of ensuring sufficient insulating properties, the thickness of the insulating layer is preferably 50 μm or more, more preferably 100 μm or more, and further preferably 150 μm or more.
 充分な放熱性を確保する観点からは、絶縁層の厚さは500μm以下であることが好ましく、300μm以下であることがより好ましく、250μm以下であることがさらに好ましい。 From the viewpoint of ensuring sufficient heat dissipation, the thickness of the insulating layer is preferably 500 μm or less, more preferably 300 μm or less, and further preferably 250 μm or less.
<第四実施形態の回路基板の製造方法>
 本開示の第四実施形態の回路基板の製造方法は、上述した第五実施形態の本開示の回路シートと、前記回路シートの素子実装面と逆の面に配置される絶縁層と、放熱部材と、をこの順に配置した状態の積層体を加圧する工程を有し、
 前記加圧は前記回路シートの素子実装面上に、前記加圧により変形可能なクッション材を配置した状態で行われる、回路基板の製造方法である。
<Manufacturing method of circuit board of the fourth embodiment>
The method for manufacturing the circuit board of the fourth embodiment of the present disclosure includes the circuit sheet of the fifth embodiment described above, an insulating layer arranged on a surface opposite to the element mounting surface of the circuit sheet, and a heat radiating member. And have a step of pressurizing the laminated body in the state of arranging in this order.
The pressurization is a method for manufacturing a circuit board, in which a cushioning material deformable by the pressurization is arranged on an element mounting surface of the circuit sheet.
 上記方法で使用される回路シートは、素子実装面において絶縁部が凹んだ状態であるため、加圧が均等に行われないおそれがある。
 上記方法では、回路シートの素子実装面にクッション材を配置することで素子実装面にかかる圧力が分散され、回路シート、絶縁層及び放熱部材を充分に接着させることができる。
In the circuit sheet used in the above method, since the insulating portion is recessed on the element mounting surface, the pressurization may not be performed evenly.
In the above method, by arranging the cushion material on the element mounting surface of the circuit sheet, the pressure applied to the element mounting surface is dispersed, and the circuit sheet, the insulating layer and the heat radiating member can be sufficiently adhered.
 上記方法において使用されるクッション材としては、加圧により変形し得るクッション材であれば特に限定はないが、フッ素ゴム、シリコンゴム等のゴム、熱可塑性の樹脂又はエラストマーを含むものが挙げられる。 The cushioning material used in the above method is not particularly limited as long as it is a cushioning material that can be deformed by pressurization, and examples thereof include rubbers such as fluororubber and silicon rubber, and thermoplastic resins or elastomers.
 上記方法において積層体を加圧する方法は特に制限されず、回路基板の製造工程において一般的に行われる方法から選択できる。加圧方法としてはロールラミネート、平板ラミネート、クイックプレス、平板プレス等が用いられ、常圧で加圧しても真空中で加圧してもよい。加圧の圧力は0.1MPa~10MPaであると圧力を制御しやすいため好ましく、0.2MPa~8MPaであると接着層との接着性を確保しやすいため好ましく、1MPa~8MPaであると、各層間における気泡等の巻き込みを抑制でき、絶縁性を確保しやすいため更に好ましい。 The method of pressurizing the laminate in the above method is not particularly limited, and can be selected from the methods generally performed in the circuit board manufacturing process. As a pressurizing method, roll laminating, flat plate laminating, quick press, flat plate press and the like are used, and the pressure may be applied at normal pressure or in vacuum. The pressurizing pressure is preferably 0.1 MPa to 10 MPa because it is easy to control the pressure, and 0.2 MPa to 8 MPa is preferable because it is easy to secure the adhesiveness with the adhesive layer, and 1 MPa to 8 MPa is preferable. It is more preferable because it is possible to suppress the entrainment of air bubbles and the like between the layers and it is easy to secure the insulating property.
 積層体を加圧する際には、同時に積層体を加熱してもよい。加熱温度は、絶縁層と回路および、絶縁層と放熱部材との接着性を確保する観点から、40℃~300℃であることが好ましく、接着層の硬化を行う観点から130℃~250℃であることがより好ましく、クッション材を回路シートの凹んだ部分に充分に追従させる観点から、150℃~230℃であることがさらに好ましい。 When pressurizing the laminate, the laminate may be heated at the same time. The heating temperature is preferably 40 ° C. to 300 ° C. from the viewpoint of ensuring the adhesiveness between the insulating layer and the circuit and the insulating layer and the heat radiating member, and 130 ° C. to 250 ° C. from the viewpoint of curing the adhesive layer. It is more preferable that the temperature is 150 ° C. to 230 ° C. from the viewpoint of allowing the cushion material to sufficiently follow the recessed portion of the circuit sheet.
<第六実施形態の回路シート>
 本開示の第六実施形態の回路シートは、回路と、前記回路の間に設けられる絶縁部と、を備え、
 前記回路の前記絶縁部と接する面の少なくとも一部の表面粗さAが前記回路の素子実装面の表面粗さBよりも大きい、回路シートである。
<Circuit sheet of the sixth embodiment>
The circuit sheet of the sixth embodiment of the present disclosure includes a circuit and an insulating portion provided between the circuits.
A circuit sheet in which the surface roughness A of at least a part of the surface of the circuit in contact with the insulating portion is larger than the surface roughness B of the element mounting surface of the circuit.
 上記構成を有する回路シートは、回路と絶縁部との剥離が生じにくく、信頼性に優れている。さらに、素子実装面の表面粗さが相対的に小さいことで、素子の実装工程を良好に行うことができる。 The circuit sheet having the above configuration is excellent in reliability because peeling between the circuit and the insulating part is unlikely to occur. Further, since the surface roughness of the element mounting surface is relatively small, the element mounting process can be performed satisfactorily.
 回路シートは、回路の素子実装面と逆の面に設けられる絶縁層をさらに備えてもよい。
 回路シートが絶縁層を有している場合、絶縁部と絶縁層とは異なる部材であっても、同じ部材であってもよい。絶縁部及び絶縁層が同じ部材である場合の例としては、絶縁層が回路の間に入り込んで絶縁部を形成している状態または絶縁部が回路の下面を覆うように絶縁層を形成している状態が挙げられる。
The circuit sheet may further include an insulating layer provided on the surface opposite to the element mounting surface of the circuit.
When the circuit sheet has an insulating layer, the insulating portion and the insulating layer may be different members or the same member. As an example of the case where the insulating portion and the insulating layer are the same member, the insulating layer is formed between the circuits to form the insulating portion, or the insulating layer is formed so as to cover the lower surface of the circuit. There is a state of being.
 本開示の回路シートの構成の一例について、図面を参照して説明する。
 図5Aは本開示の回路シートの断面を概略的に示す図である。図5Aに示す回路シート180は、回路51と、回路51の間の空間に設けられる絶縁部52と、回路51の素子実装面と逆の面に設けられる絶縁層53と、を備えている。回路51の絶縁部52と接する面(側面)は素子実装面よりも表面粗さが大きく、隣接する絶縁部52との剥離が生じにくくなっている。さらに、回路51の素子実装面と逆の面であって絶縁層53と接する面(下面)も素子実装面より表面粗さが大きく、絶縁層53との剥離が生じにくくなっている。
An example of the configuration of the circuit sheet of the present disclosure will be described with reference to the drawings.
FIG. 5A is a diagram schematically showing a cross section of the circuit sheet of the present disclosure. The circuit sheet 180 shown in FIG. 5A includes a circuit 51, an insulating portion 52 provided in a space between the circuits 51, and an insulating layer 53 provided on a surface opposite to the element mounting surface of the circuit 51. The surface (side surface) of the circuit 51 in contact with the insulating portion 52 has a larger surface roughness than the element mounting surface, and peeling from the adjacent insulating portion 52 is less likely to occur. Further, the surface (lower surface) opposite to the element mounting surface of the circuit 51 and in contact with the insulating layer 53 also has a larger surface roughness than the element mounting surface, and peeling from the insulating layer 53 is less likely to occur.
 図5Aでは絶縁部52と絶縁層53とが異なる部材として記載されているが、上述したように絶縁部52と絶縁層53とは同じ部材であってもよい。また、図5Aでは回路51の側面と下面の両方の表面粗さが素子実装面の表面粗さより大きいが、側面の表面粗さのみが素子実装面の表面粗さより大きくてもよい。 Although the insulating portion 52 and the insulating layer 53 are described as different members in FIG. 5A, the insulating portion 52 and the insulating layer 53 may be the same member as described above. Further, in FIG. 5A, the surface roughness of both the side surface and the lower surface of the circuit 51 is larger than the surface roughness of the element mounting surface, but only the surface roughness of the side surface may be larger than the surface roughness of the element mounting surface.
 回路の側面は、その全体が表面粗さAの条件を満たしていても、一部のみが表面粗さAの条件を満たしていてもよい。良好な絶縁性及び放熱性を達成する観点からは、回路の側面のうち、少なくとも回路の下面と繋がる部分の表面粗さAが回路の素子実装面の表面粗さBよりも大きいことが好ましい。これにより、回路と絶縁層との剥離がより抑制され、良好な絶縁性が維持されるとともに、絶縁層を介して配置される放熱部材に対する熱の伝導が良好に行われる。
 以上の観点から、回路の最も好ましい態様は、側面の全体が表面粗さAの条件を満たしていることである。これにより側面と絶縁部との接着性を全領域に渡って確保することができるため、剥離をさらに抑制できる。
The side surface of the circuit may satisfy the condition of surface roughness A as a whole, or only a part of the side surface may satisfy the condition of surface roughness A. From the viewpoint of achieving good insulation and heat dissipation, it is preferable that the surface roughness A of at least the portion of the side surface of the circuit connected to the lower surface of the circuit is larger than the surface roughness B of the element mounting surface of the circuit. As a result, peeling between the circuit and the insulating layer is further suppressed, good insulating properties are maintained, and heat is well conducted to the heat radiating member arranged via the insulating layer.
From the above viewpoint, the most preferable aspect of the circuit is that the entire side surface satisfies the condition of surface roughness A. As a result, the adhesiveness between the side surface and the insulating portion can be ensured over the entire region, so that peeling can be further suppressed.
 回路の素子実装面と逆の面(絶縁層と接する面)の表面粗さCは、回路の表面粗さAと同じであってもよく、異なっていてもよい。回路と絶縁層との剥離を抑制する観点からは、回路の素子実装面と逆の面(絶縁層と接する面)の表面粗さCは、回路の素子実装面の表面粗さBよりも大きいことが好ましい。 The surface roughness C of the surface opposite to the element mounting surface of the circuit (the surface in contact with the insulating layer) may be the same as or different from the surface roughness A of the circuit. From the viewpoint of suppressing peeling between the circuit and the insulating layer, the surface roughness C of the surface opposite to the element mounting surface of the circuit (the surface in contact with the insulating layer) is larger than the surface roughness B of the element mounting surface of the circuit. Is preferable.
 本開示において回路の表面粗さは、JIS B 0601(2001)で規定される算術平均粗さ(Ra)で表してもよい。
 Raで表したときの表面粗さAは、0.3μm以上であることが好ましく、接着性の観点から0.4μm以上であることがより好ましく、0.6μm以上であることがさらに好ましく、1.0μm以上であることが特に好ましい。耐電圧特性の観点からは、Raで表したときの表面粗さAは、5.0μm以下であるとよく、2.5μm以下であるとよりよい。さらにRaが上記の範囲で比表面積が、1.3以上であるとよく、1.4以上であるとより好ましく、1.6以上であるとさらに好ましい。比表面積の値が大きいと単位面積当たりの接着面積が大きくなり、接着性が向上できる。耐電圧特性の観点からは、比表面積が5.0以下であるとよく、3.0以下であるとよりよい。
In the present disclosure, the surface roughness of the circuit may be expressed by the arithmetic mean roughness (Ra) defined by JIS B 0601 (2001).
The surface roughness A represented by Ra is preferably 0.3 μm or more, more preferably 0.4 μm or more, and further preferably 0.6 μm or more from the viewpoint of adhesiveness. It is particularly preferable that the thickness is 0.0 μm or more. From the viewpoint of withstand voltage characteristics, the surface roughness A expressed in Ra is preferably 5.0 μm or less, and more preferably 2.5 μm or less. Further, Ra is preferably in the above range and the specific surface area is preferably 1.3 or more, more preferably 1.4 or more, and further preferably 1.6 or more. When the value of the specific surface area is large, the adhesive area per unit area becomes large, and the adhesiveness can be improved. From the viewpoint of withstand voltage characteristics, the specific surface area is preferably 5.0 or less, and more preferably 3.0 or less.
 本開示における「比表面積」は、測定面積Aにおける三次元表面積Bを算出し、B/Aで求められる値である。三次元表面積Bは、測定表面の所定の測定面積A(例えば、10000μm)の表面プロファイルを市販のレーザー顕微鏡で測定することにより算出することができる。 The "specific surface area" in the present disclosure is a value obtained by calculating the three-dimensional surface area B in the measurement area A and calculating the B / A. The three-dimensional surface area B can be calculated by measuring the surface profile of a predetermined measurement area A (for example, 10000 μm 2) of the measurement surface with a commercially available laser microscope.
 Raで表したときの表面粗さBは、素子実装の観点から0.3μm未満であることが好ましく、0.2μm以下であることがより好ましく、0.15μm以下であることがさらに好ましい。 The surface roughness B represented by Ra is preferably less than 0.3 μm, more preferably 0.2 μm or less, and further preferably 0.15 μm or less from the viewpoint of device mounting.
 Raで表したときの表面粗さCは、0.3μm以上であることが好ましく、0.4μm以上であることがより好ましく、0.6μm以上であることがさらに好ましく、1.0μm以上であることが特に好ましい。耐電圧特性の観点からは、Raで表したときの表面粗さCは、5.0μm以下であるとよく、2.5μm以下であるとよりよい。さらにRaが上記の範囲で比表面積が、1.3以上であるとよく、1.4以上であるとより好ましく、1.6以上であるとさらに好ましい。比表面積の値が大きいと単位面積当たりの接着面積が大きくなり、接着性が向上できる。耐電圧特性の観点からは、比表面積が5.0以下であるとよく、3.0以下であるとよりよい。 The surface roughness C when expressed in Ra is preferably 0.3 μm or more, more preferably 0.4 μm or more, further preferably 0.6 μm or more, and 1.0 μm or more. Is particularly preferred. From the viewpoint of withstand voltage characteristics, the surface roughness C when expressed in Ra is preferably 5.0 μm or less, and more preferably 2.5 μm or less. Further, Ra is preferably in the above range and the specific surface area is preferably 1.3 or more, more preferably 1.4 or more, and further preferably 1.6 or more. When the value of the specific surface area is large, the adhesive area per unit area becomes large, and the adhesiveness can be improved. From the viewpoint of withstand voltage characteristics, the specific surface area is preferably 5.0 or less, and more preferably 3.0 or less.
 Raで表したときの表面粗さAと表面粗さBとの相対比は特に制限されない。例えば、表面粗さAは表面粗さBの1.0倍超~100倍であってもよい。
 Raで表したときの表面粗さCと表面粗さBとの相対比は特に制限されない。例えば、表面粗さAは表面粗さBの1.0倍超~100倍であってもよい。
The relative ratio of the surface roughness A and the surface roughness B when expressed in Ra is not particularly limited. For example, the surface roughness A may be more than 1.0 times to 100 times the surface roughness B.
The relative ratio of the surface roughness C and the surface roughness B when expressed in Ra is not particularly limited. For example, the surface roughness A may be more than 1.0 times to 100 times the surface roughness B.
 回路の厚さは特に制限されず、回路シートの用途等に応じて選択できる。回路の大電流化の観点からは、回路の厚さは350μm以上であることが好ましく、回路の側面を粗化する工程を有する場合には、ハンドリング性や粗化部分の面積制御の観点から400μm以上であることがより好ましく、500μm以上であることがさらに好ましく、放熱性の観点から1000μm以上であることが特に好ましい。軽量化及び低背化の観点からは、回路の厚さは5000μm以下であってよい。回路の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
 絶縁層に回路の一部が埋め込まれている場合は、埋め込まれている部分の厚さも回路の厚さに含まれる。
The thickness of the circuit is not particularly limited and can be selected according to the application of the circuit sheet and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably 350 μm or more, and when there is a step of roughening the side surface of the circuit, 400 μm from the viewpoint of handleability and area control of the roughened portion. The above is more preferable, 500 μm or more is further preferable, and 1000 μm or more is particularly preferable from the viewpoint of heat dissipation. From the viewpoint of weight reduction and height reduction, the thickness of the circuit may be 5000 μm or less. When the thickness of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
When a part of the circuit is embedded in the insulating layer, the thickness of the embedded part is also included in the thickness of the circuit.
 回路シートの素子実装面を観察したときの回路の幅は特に制限されず、回路シートの用途等に応じて選択してよい。例えば、回路の幅は100μm~100mmであってもよい。回路の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。 The width of the circuit when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like. For example, the width of the circuit may be 100 μm to 100 mm. When the width of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 回路は、例えば、金属板を所望の形状の回路の状態に加工することで得ることができる。加工の方法は特に制限されず、打抜き、切削、エッチング等の公知の方法によって行うことができる。
 金属としては、銅、銀、クロム銅、タングステン銅、ニッケル、ニッケルメッキ銅、アルミニウム、アルマイトに表面修飾したアルミニウム等が挙げられる。導電性の観点からは、銅を含むことが好ましい。
The circuit can be obtained, for example, by processing a metal plate into a circuit state having a desired shape. The processing method is not particularly limited, and can be performed by a known method such as punching, cutting, or etching.
Examples of the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity, it is preferable to contain copper.
 回路シートの素子実装面を観察したときの絶縁部の幅は特に制限されず、回路シートの用途等に応じて選択してよい。例えば、絶縁部の幅は100μm~100mmであってもよい。絶縁部の幅が一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。 The width of the insulating portion when observing the element mounting surface of the circuit sheet is not particularly limited, and may be selected according to the application of the circuit sheet and the like. For example, the width of the insulating portion may be 100 μm to 100 mm. When the width of the insulating portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
 絶縁層の厚さは特に制限されず、回路シートを用いて製造される回路基板の用途等に応じて選択できる。充分な絶縁性を確保する観点からは、絶縁層の厚さは100μm以上であることが好ましく、熱衝撃に対する絶縁層の強度を確保する観点から150μm以上であることがより好ましく、圧着時の絶縁層のハンドリング性の観点から200μm以上であることがさらに好ましい。 The thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board manufactured by using the circuit sheet. From the viewpoint of ensuring sufficient insulation, the thickness of the insulating layer is preferably 100 μm or more, more preferably 150 μm or more from the viewpoint of ensuring the strength of the insulating layer against thermal shock, and insulation during crimping. From the viewpoint of layer handleability, it is more preferably 200 μm or more.
 充分な放熱性を確保する観点からは、絶縁層の厚さは500μm以下であることが好ましく、300μm以下であることがより好ましく、250μm以下であることがさらに好ましい。 From the viewpoint of ensuring sufficient heat dissipation, the thickness of the insulating layer is preferably 500 μm or less, more preferably 300 μm or less, and further preferably 250 μm or less.
 絶縁部及び絶縁層は、電気絶縁性を有する材料(絶縁材料)から形成される。
 絶縁材料としては、エポキシ樹脂、フェノール樹脂、ユリア樹脂、メラミン樹脂、ウレタン樹脂、シリコーン樹脂、不飽和ポリエステル樹脂、アクリル樹脂等が挙げられる。絶縁材料に含まれる樹脂は、1種であっても2種以上であってもよい。絶縁材料は、必要に応じて、無機フィラー等の樹脂以外の成分を含んでもよい。
The insulating portion and the insulating layer are formed of a material having electrical insulating properties (insulating material).
Examples of the insulating material include epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, acrylic resin and the like. The resin contained in the insulating material may be one kind or two or more kinds. The insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
 絶縁部を形成する絶縁材料に含まれる樹脂と絶縁層を形成する絶縁材料に含まれる樹脂とは、同じ種類(例えば、ともにエポキシ樹脂である)であっても異なる種類であってもよい。絶縁部と絶縁層との接着性の観点からは、絶縁部を形成する絶縁材料に含まれる樹脂と絶縁層を形成する絶縁材料に含まれる樹脂とが同じ材料であることが好ましい。 The resin contained in the insulating material forming the insulating portion and the resin contained in the insulating material forming the insulating layer may be of the same type (for example, both are epoxy resins) or different types. From the viewpoint of the adhesiveness between the insulating portion and the insulating layer, it is preferable that the resin contained in the insulating material forming the insulating portion and the resin contained in the insulating material forming the insulating layer are the same material.
 回路シートは、素子実装面がめっき金属で被覆された状態であってもよい。回路シートの素子実装面をめっき金属で被覆することで、素子実装面の表面粗さが低減される。その結果、回路の表面粗さAが回路の表面粗さBよりも大きい状態とすることができる。 The circuit sheet may be in a state where the element mounting surface is covered with plated metal. By coating the element mounting surface of the circuit sheet with plated metal, the surface roughness of the element mounting surface is reduced. As a result, the surface roughness A of the circuit can be made larger than the surface roughness B of the circuit.
 素子実装面のめっき金属による被覆は、例えば、シート状の回路の表面(素子実装面及び側面を含む)を粗化する工程の後に行ってもよい。 The element mounting surface may be coated with the plated metal, for example, after the step of roughening the surface (including the element mounting surface and the side surface) of the sheet-shaped circuit.
<第六実施形態の回路シートの製造方法>
 本開示の第六実施形態の回路シートの製造方法は、シート状の回路の一方の面に保護部材を貼り付けた状態で前記回路の表面を粗化する工程と、
 前記回路の間に絶縁部を形成する工程と、をこの順に有する、回路シートの製造方法である。
<Manufacturing method of circuit sheet of the sixth embodiment>
The method for manufacturing a circuit sheet according to the sixth embodiment of the present disclosure includes a step of roughening the surface of the circuit with a protective member attached to one surface of the sheet-shaped circuit.
This is a method for manufacturing a circuit sheet, which comprises a step of forming an insulating portion between the circuits in this order.
 上記方法では、シート状の回路の一方の面に保護部材を貼り付けた状態で前記回路の表面を粗化する。これにより、回路の保護部材を貼り付けた部分(すなわち、素子実装面)を除いた回路の表面(すなわち、回路が絶縁部と接する部分を含む表面)が粗化される。その結果、回路の前記絶縁部と接する面(回路の側面)の少なくとも一部の表面粗さAが、前記回路の素子実装面の表面粗さBよりも大きい回路シートを得ることができる。 In the above method, the surface of the circuit is roughened with the protective member attached to one surface of the sheet-shaped circuit. As a result, the surface of the circuit (that is, the surface including the portion where the circuit is in contact with the insulating portion) excluding the portion to which the protective member of the circuit is attached (that is, the element mounting surface) is roughened. As a result, it is possible to obtain a circuit sheet in which the surface roughness A of at least a part of the surface (side surface of the circuit) in contact with the insulating portion of the circuit is larger than the surface roughness B of the element mounting surface of the circuit.
 上記方法において回路の表面を粗化する方法は、特に制限されない。例えば、薬液処理、レーザー照射、ブラスト処理等の公知の方法から選択できる。回路の側面を充分に粗化する観点からは、薬液処理が好ましい。 The method of roughening the surface of the circuit in the above method is not particularly limited. For example, it can be selected from known methods such as chemical treatment, laser irradiation, and blast treatment. From the viewpoint of sufficiently roughening the side surface of the circuit, chemical treatment is preferable.
 上記方法において回路の一方の面に貼り付けられる保護部材の種類は特に制限されず、回路の表面を粗化する方法等に応じて選択できる。回路の表面を薬液に接触させて粗化する場合、使用する薬液に耐性を有する保護部材を用いることが好ましい。
 保護部材は、回路の一方の面にのみ貼り付けられても、回路の両面に貼り付けられてもよい。絶縁層及び絶縁部の回路に対する接着性を向上する観点からは、回路の一方の面(すなわち、素子実装面)にのみ貼り付けられることが好ましい。これにより、回路の側面に加えて回路の絶縁層と接する面も粗化されて、絶縁層の回路に対する接着性に加えて絶縁部に対する接着性を向上させることができる。
In the above method, the type of the protective member attached to one surface of the circuit is not particularly limited, and can be selected depending on the method of roughening the surface of the circuit and the like. When the surface of the circuit is brought into contact with a chemical solution to roughen it, it is preferable to use a protective member having resistance to the chemical solution used.
The protective member may be attached to only one side of the circuit or may be attached to both sides of the circuit. From the viewpoint of improving the adhesiveness of the insulating layer and the insulating portion to the circuit, it is preferable that the insulating layer and the insulating portion are attached only to one surface of the circuit (that is, the element mounting surface). As a result, in addition to the side surface of the circuit, the surface in contact with the insulating layer of the circuit is also roughened, and the adhesiveness of the insulating layer to the circuit as well as the adhesiveness to the insulating portion can be improved.
 回路の一方の面に貼り付けられた保護部材の除去は、回路の間に絶縁部を形成する工程の前に行われても、回路の間に絶縁部を形成する工程の後に行われてもよい。 The removal of the protective member affixed to one side of the circuit may be performed before the step of forming the insulation between the circuits or after the step of forming the insulation between the circuits. good.
 上記方法において回路の間に絶縁部を形成する方法は、特に制限されない。例えば、上述した本開示の回路シートの絶縁部の形成に用いられる絶縁材料を充填し、必要に応じて硬化処理等を行って形成してもよい。 In the above method, the method of forming an insulating portion between the circuits is not particularly limited. For example, the insulating material used for forming the insulating portion of the circuit sheet of the present disclosure described above may be filled, and if necessary, a hardening treatment or the like may be performed to form the insulating material.
 上記方法は、回路の保護部材が貼り付けられた面と逆の面に絶縁層を配置する工程を有してもよい。これにより、回路の素子実装面と逆の面に絶縁層が配置された回路シートを製造することができる。 The above method may include a step of arranging the insulating layer on the surface opposite to the surface to which the protective member of the circuit is attached. This makes it possible to manufacture a circuit sheet in which an insulating layer is arranged on a surface opposite to the element mounting surface of the circuit.
 絶縁層の配置は、回路の表面を粗化する工程の後に行われることが好ましく、回路の間に絶縁部を形成する工程の後に行われても回路の間に絶縁部を形成する工程と同時に行われてもよい。
 絶縁層の配置が回路の表面を粗化する工程の後に行われる場合、回路と絶縁層との良好な接着性を確保できる
 絶縁層の配置が回路の間に絶縁部を形成する工程の後に行われる場合、回路の間に絶縁層が形成された状態の回路シートと絶縁層とを圧着することができるため、ハンドリング性に優れている。
 絶縁層の配置が回路の間に絶縁部を形成する工程と同時に行われる場合、絶縁層の配置と絶縁部の形成とを一括して行うことができるため、作業効率に優れている。
The arrangement of the insulating layer is preferably performed after the step of roughening the surface of the circuit, and even if it is performed after the step of forming the insulating portion between the circuits, at the same time as the step of forming the insulating portion between the circuits. It may be done.
If the placement of the insulation layer is done after the step of roughening the surface of the circuit, the placement of the insulation layer can ensure good adhesion between the circuit and the insulation layer after the step of forming the insulation between the circuits. In this case, the circuit sheet in which the insulating layer is formed between the circuits and the insulating layer can be crimped, so that the handling property is excellent.
When the arrangement of the insulating layer is performed at the same time as the step of forming the insulating portion between the circuits, the arrangement of the insulating layer and the formation of the insulating portion can be performed at the same time, so that the work efficiency is excellent.
 回路の間に絶縁部を形成する工程の後に絶縁層を配置する工程を行うことで、たとえば、絶縁部と絶縁層が異なる部材である回路シートを製造することができる。
 回路の間に絶縁部を形成する工程と同時に絶縁層を配置する工程を行うことで、たとえば、絶縁部及び絶縁層の少なくとも一部が同じ部材である回路シートを製造することができる。
By performing the step of arranging the insulating layer after the step of forming the insulating portion between the circuits, for example, a circuit sheet in which the insulating portion and the insulating layer are different members can be manufactured.
By performing the step of arranging the insulating layer at the same time as the step of forming the insulating portion between the circuits, for example, a circuit sheet in which at least a part of the insulating portion and the insulating layer is the same member can be manufactured.
 上記方法で使用される回路、絶縁部、及び絶縁層の詳細及び好ましい態様は、上述した回路シートにおける回路、絶縁部、及び絶縁層の詳細及び好ましい態様と同様であってもよい。 The details and preferred embodiments of the circuit, insulating portion, and insulating layer used in the above method may be the same as the details and preferred embodiments of the circuit, insulating portion, and insulating layer in the circuit sheet described above.
<第五実施形態の回路基板>
 本開示の第五実施形態の回路基板は、上述した第六実施形態の回路シートと、前記回路シートの素子実装面と逆の面に配置される放熱部材と、を有する回路基板である。
<Circuit board of the fifth embodiment>
The circuit board of the fifth embodiment of the present disclosure is a circuit board having the circuit sheet of the sixth embodiment described above and a heat radiating member arranged on a surface opposite to the element mounting surface of the circuit sheet.
 上記回路基板は、回路と絶縁部との間に剥離が生じにくく、信頼性に優れている。
 上記回路基板は、回路と放熱部材との間に絶縁層が配置されていることが好ましい。
 回路基板に用いられる回路シートの詳細及び好ましい態様は、上述した本開示の回路シート、回路、絶縁部及び絶縁層の詳細及び好ましい態様と同様である。
 回路基板に用いられる放熱部材の種類は特に制限されず、回路基板に一般的に使用されるものから選択できる。例えば、金属、セラミックス等であってもよく、放熱性の観点からはアルミニウム又は銅が好ましい。
The circuit board is excellent in reliability because peeling does not easily occur between the circuit and the insulating portion.
In the circuit board, it is preferable that an insulating layer is arranged between the circuit and the heat radiating member.
The details and preferred embodiments of the circuit sheet used in the circuit board are the same as the details and preferred embodiments of the circuit sheet, circuit, insulating portion and insulating layer of the present disclosure described above.
The type of heat radiating member used for the circuit board is not particularly limited, and can be selected from those generally used for the circuit board. For example, it may be metal, ceramics or the like, and aluminum or copper is preferable from the viewpoint of heat dissipation.
<第五実施形態の回路基板の製造方法>
 本開示の第五実施形態の回路基板の製造方法は、上述した第六実施形態の回路シートと、前記回路シートの素子実装面と逆の面に配置される放熱部材と、をこの順に配置した状態の積層体を加圧する工程を有する、回路基板の製造方法である。
<Manufacturing method of circuit board of the fifth embodiment>
In the method for manufacturing the circuit board of the fifth embodiment of the present disclosure, the circuit sheet of the sixth embodiment described above and the heat radiating member arranged on the surface opposite to the element mounting surface of the circuit sheet are arranged in this order. It is a method of manufacturing a circuit board, which comprises a step of pressurizing a laminated body in a state.
 上記方法によれば、回路と絶縁部との間に剥離が生じにくく、信頼性に優れる回路基板を製造することができる。
 回路基板の製造方法に用いられる回路シートの詳細及び好ましい態様は、上述した本開示の回路シート、回路、絶縁部及び絶縁層の詳細及び好ましい態様と同様である。
 回路基板に用いられる放熱部材の種類は特に制限されず、回路基板に一般的に使用されるものから選択できる。例えば、金属、セラミックス等であってもよく、放熱性の観点からはアルミニウム又は銅が好ましい。
According to the above method, it is possible to manufacture a circuit board having excellent reliability because peeling is unlikely to occur between the circuit and the insulating portion.
The details and preferred embodiments of the circuit sheet used in the method for manufacturing a circuit board are the same as the details and preferred embodiments of the circuit sheet, circuit, insulating portion and insulating layer of the present disclosure described above.
The type of heat radiating member used for the circuit board is not particularly limited, and can be selected from those generally used for the circuit board. For example, it may be metal, ceramics or the like, and aluminum or copper is preferable from the viewpoint of heat dissipation.
 上記方法において積層体を加圧する方法は特に制限されず、回路基板の製造工程において一般的に行われる方法から選択できる。 The method of pressurizing the laminate in the above method is not particularly limited, and can be selected from the methods generally performed in the circuit board manufacturing process.
<第七実施形態のケース付き回路シート>
 本開示の第七実施形態のケース付き回路シートは、回路と前記回路の間に設けられる絶縁部とを備える回路シートと、前記回路シートの発熱体搭載面上に配置されるケースと、を備える。
<Circuit sheet with case of the seventh embodiment>
The circuit sheet with a case of the seventh embodiment of the present disclosure includes a circuit sheet including a circuit and an insulating portion provided between the circuits, and a case arranged on a heating element mounting surface of the circuit sheet. ..
 従来の回路シートを用いる回路基板の製造方法では、回路シートを絶縁層を介して放熱性を有するベース板の上に配置した状態で発熱体の搭載の形成が行われる。これに対して本開示のケース付き回路シートを用いる回路基板の製造方法では、回路シートに絶縁層が設けられていない状態で発熱体の搭載を行うことができる。これにより、絶縁層の耐熱性に関わらず回路基板を製造することができる。 In the conventional method of manufacturing a circuit board using a circuit sheet, a heating element is mounted in a state where the circuit sheet is arranged on a base plate having heat dissipation property via an insulating layer. On the other hand, in the method of manufacturing a circuit board using the circuit sheet with a case of the present disclosure, the heating element can be mounted in a state where the circuit sheet is not provided with the insulating layer. Thereby, the circuit board can be manufactured regardless of the heat resistance of the insulating layer.
 本開示のケース付き回路シートは、複数の回路と、前記複数の回路の間に設けられており、前記回路において、発熱体が搭載される発熱体搭載面の少なくとも一部及び前記発熱体搭載面とは反対側の面の少なくとも一部が露出するように、前記複数の回路の相対位置を保持する絶縁部とを備える回路シートと、前記回路シートの前記発熱体搭載面上に配置されるケースと、を備える構成であってもよい。 The circuit sheet with a case of the present disclosure is provided between a plurality of circuits and the plurality of circuits, and in the circuit, at least a part of a heating element mounting surface on which a heating element is mounted and the heating element mounting surface. A circuit sheet including an insulating portion that holds relative positions of the plurality of circuits so that at least a part of the surface on the opposite side is exposed, and a case arranged on the heating element mounting surface of the circuit sheet. And may be configured.
 本開示のケース付き回路シートを用いる回路基板の製造方法について、従来の回路シートを用いる回路基板の製造方法との比較に基づき説明する。 The method of manufacturing a circuit board using the circuit board with a case of the present disclosure will be described based on a comparison with a method of manufacturing a circuit board using a conventional circuit board.
 図6Aに本開示のケース付き回路シートを用いる回路基板の製造工程の一例を示す。
 図6A(a)に示すケース付き回路シート190は、回路61と、回路61の間に設けられる絶縁部62とを有する回路シートと、回路シートの発熱体搭載面に配置されるケース63と、を備えている。ケース63は、発熱体64が搭載される領域を囲むように配置される。
FIG. 6A shows an example of a manufacturing process of a circuit board using the circuit sheet with a case of the present disclosure.
The circuit sheet 190 with a case shown in FIG. 6A (a) includes a circuit 61, a circuit sheet having an insulating portion 62 provided between the circuits 61, and a case 63 arranged on a heating element mounting surface of the circuit sheet. It has. The case 63 is arranged so as to surround the area on which the heating element 64 is mounted.
 次いで図6A(b)に示すように、ケース付き回路シート190の回路61の上に発熱体64が搭載される。このとき、発熱体の搭載に用いるはんだを溶融させるための加熱が、例えば300℃程度で行われる。その後図6A(c)に示すように、ケース63と発熱体64とがボンディングワイヤ65で接続される。 Next, as shown in FIG. 6A (b), the heating element 64 is mounted on the circuit 61 of the circuit sheet 190 with a case. At this time, heating for melting the solder used for mounting the heating element is performed at, for example, about 300 ° C. After that, as shown in FIG. 6A (c), the case 63 and the heating element 64 are connected by the bonding wire 65.
 次いで図6A(d)に示すように、ケース付き回路シート190の発熱体搭載面のケース63で囲まれた部分に封止材を供給して封止部66を形成する。 Next, as shown in FIG. 6A (d), a sealing material is supplied to the portion of the circuit sheet 190 with a case on the heating element mounting surface surrounded by the case 63 to form the sealing portion 66.
 次いで図6A(e)に示すように、ケース付き回路シート190の発熱体搭載面と逆の面側に絶縁層67と放熱部材68とが配置されて、回路基板が得られる。 Next, as shown in FIG. 6A (e), the insulating layer 67 and the heat radiating member 68 are arranged on the side opposite to the heating element mounting surface of the circuit sheet 190 with a case to obtain a circuit board.
 図6Aでは図6A(d)に示す工程の後に図6A(e)に示す工程が行われるが、図6A(e)に示す工程の後に図6A(d)に示す工程を行ってもよい。 In FIG. 6A, the step shown in FIG. 6A (e) is performed after the step shown in FIG. 6A (d), but the step shown in FIG. 6A (d) may be performed after the step shown in FIG. 6A (e).
 図6Bに従来の回路シートを用いる回路基板の製造工程の一例を示す。
 図6B(a)に示す回路シート70は、回路71と絶縁部72とを有している点が本開示と共通するが、ケース73が回路シート70ではなくベース板80の上に設けられている点で本開示と相違する。
FIG. 6B shows an example of a circuit board manufacturing process using a conventional circuit sheet.
The circuit sheet 70 shown in FIG. 6B (a) has a circuit 71 and an insulating portion 72 in common with the present disclosure, but the case 73 is provided on the base plate 80 instead of the circuit sheet 70. It differs from the present disclosure in that it is.
 図6B(a)に示すように、回路シート70は、絶縁層77を介してベース板80の上に搭載される。このとき、回路シート70の搭載に用いるはんだを溶融させるための加熱が、例えば300℃程度で行われる。 As shown in FIG. 6B (a), the circuit sheet 70 is mounted on the base plate 80 via the insulating layer 77. At this time, heating for melting the solder used for mounting the circuit sheet 70 is performed, for example, at about 300 ° C.
 次いで図6B(b)に示すように、回路シート70の回路71の上に発熱体74が搭載される。このとき、発熱体の搭載に用いるはんだを溶融させるための加熱が、例えば300℃程度で行われる。その後図6B(c)に示すように、ケース73と発熱体74とがボンディングワイヤ75で接続される。 Next, as shown in FIG. 6B (b), the heating element 74 is mounted on the circuit 71 of the circuit sheet 70. At this time, heating for melting the solder used for mounting the heating element is performed at, for example, about 300 ° C. After that, as shown in FIG. 6B (c), the case 73 and the heating element 74 are connected by the bonding wire 75.
 次いで図6B(d)に示すように、ベース板80の上に配置されたケース73で囲まれた部分に封止材を供給して封止部76を形成する。 Next, as shown in FIG. 6B (d), the sealing material is supplied to the portion surrounded by the case 73 arranged on the base plate 80 to form the sealing portion 76.
 次いで図6B(e)に示すように、ベース板80の回路シートが搭載された面と逆の面に、TIM(Thermal Interface Material)等の熱伝導シート79を介して放熱部材78が配置されて、回路基板が得られる。 Next, as shown in FIG. 6B (e), the heat radiating member 78 is arranged on the surface of the base plate 80 opposite to the surface on which the circuit sheet is mounted via a heat conductive sheet 79 such as TIM (Thermal Interface Material). , The circuit board is obtained.
 上記のように、従来の回路基板の製造方法では、ベース板と回路シートとの間に絶縁層が配置された状態ではんだ溶融温度での加熱が行われる。これに対して本開示の回路基板の製造方法では、はんだ溶融温度での加熱が行われた後に絶縁層が配置される。このため、例えば、これまでは耐熱性の理由から使用できなかった材料を絶縁層として用いることが可能になる。 As described above, in the conventional circuit board manufacturing method, heating is performed at the solder melting temperature with the insulating layer arranged between the base plate and the circuit sheet. On the other hand, in the circuit board manufacturing method of the present disclosure, the insulating layer is arranged after heating at the solder melting temperature. Therefore, for example, it becomes possible to use a material that could not be used for the reason of heat resistance as an insulating layer.
 さらに本開示のケース付き回路シートを用いて得られる回路基板は、絶縁層、はんだ層等の熱抵抗となる部材の厚さ方向における数を低減できるため、放熱性の点でも有利である。さらに、従来の回路基板に用いられるベース板を省略することができ、生産性の点でも有利である。 Further, the circuit board obtained by using the circuit sheet with a case of the present disclosure can reduce the number of members having thermal resistance such as an insulating layer and a solder layer in the thickness direction, which is also advantageous in terms of heat dissipation. Further, the base plate used for the conventional circuit board can be omitted, which is advantageous in terms of productivity.
 ケース付き回路シートを構成する回路は、例えば、金属板を所望の形状の回路の状態に加工することで得ることができる。加工の方法は特に制限されず、打抜き、切削、エッチング等の公知の方法によって行うことができる。 The circuit constituting the circuit sheet with a case can be obtained, for example, by processing a metal plate into a circuit state having a desired shape. The processing method is not particularly limited, and can be performed by a known method such as punching, cutting, or etching.
 金属としては、銅、銀、クロム銅、タングステン銅、ニッケル、ニッケルメッキ銅、アルミニウム等が挙げられる。導電性及び放熱性の観点からは、銅を含むことが好ましい。 Examples of the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum and the like. From the viewpoint of conductivity and heat dissipation, it is preferable to contain copper.
 回路の厚さは特に制限されず、回路基板の用途等に応じて選択できる。回路基板の大電流化の観点からは、回路の厚さは350μm以上であることが好ましく、400μm以上であることがより好ましく、500μm以上であることがさらに好ましく、1000μm以上であることが特に好ましい。回路の厚さは、5000μm以下であってもよい。
 回路の場所によって厚さが異なる場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。上記回路の厚さは回路自体の厚さを意味し、隣接する部材に回路の一部が埋め込まれている場合は埋め込まれている部分の厚さも回路の厚さに含まれる。
The thickness of the circuit is not particularly limited and can be selected according to the application of the circuit board and the like. From the viewpoint of increasing the current of the circuit board, the thickness of the circuit is preferably 350 μm or more, more preferably 400 μm or more, further preferably 500 μm or more, and particularly preferably 1000 μm or more. .. The thickness of the circuit may be 5000 μm or less.
When the thickness varies depending on the location of the circuit, the arithmetic mean value of the measured values obtained at the five arbitrarily selected locations may be used as the above value. The thickness of the circuit means the thickness of the circuit itself, and when a part of the circuit is embedded in an adjacent member, the thickness of the embedded portion is also included in the thickness of the circuit.
 回路の幅及び長さは特に制限されず、回路基板の用途等に応じて選択してよい。例えば、回路の幅及び長さはそれぞれ350μm~70000μmであってもよい。回路の場所によって幅又は長さが異なる場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。 The width and length of the circuit are not particularly limited and may be selected according to the application of the circuit board and the like. For example, the width and length of the circuit may be 350 μm to 70,000 μm, respectively. When the width or length differs depending on the location of the circuit, the arithmetic mean value of the measured values obtained at the five arbitrarily selected locations may be used as the above value.
 ケース付き回路シートを構成する絶縁部は、例えば、回路シートの回路の間に流動性を有する絶縁性の材料を充填し、硬化させて形成することができる。絶縁材料としては、エポキシ樹脂、フェノール樹脂、ユリア樹脂、メラミン樹脂、ウレタン樹脂、シリコーン樹脂、不飽和ポリエステル樹脂、アクリル樹脂、ポリフェニレンサルファイド樹脂等の樹脂を含む材料が挙げられる。絶縁材料に含まれる樹脂は、1種であっても2種以上であってもよい。絶縁材料は、必要に応じて、無機フィラー等の樹脂以外の成分を含んでもよい。 The insulating portion constituting the circuit sheet with a case can be formed, for example, by filling the circuit of the circuit sheet with an insulating material having fluidity and curing the insulating material. Examples of the insulating material include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, acrylic resin, and polyphenylene sulfide resin. The resin contained in the insulating material may be one kind or two or more kinds. The insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
 ケース付き回路シートを構成するケースは、例えば、発熱体とボンディングワイヤで接続される部分が導電性材料からなり、その他の部分が絶縁材料からなっていてもよい。ケースは発熱体の搭載及び封止部の形成の際の加熱にさらされるため、これらの加熱に対して充分な耐熱性を有することが好ましい。 In the case constituting the circuit sheet with a case, for example, the portion connected to the heating element by the bonding wire may be made of a conductive material, and the other part may be made of an insulating material. Since the case is exposed to heating during mounting of the heating element and formation of the sealing portion, it is preferable that the case has sufficient heat resistance to these heatings.
 ケースを構成する絶縁材料としては、回路シートの絶縁部を形成する絶縁材料として上述した樹脂を含む材料が挙げられる。絶縁材料に含まれる樹脂は、1種であっても2種以上であってもよい。絶縁材料は、必要に応じて、無機フィラー等の樹脂以外の成分を含んでもよい。 Examples of the insulating material constituting the case include the above-mentioned resin-containing material as the insulating material for forming the insulating portion of the circuit sheet. The resin contained in the insulating material may be one kind or two or more kinds. The insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
 ケースは、回路シートの回路の上に配置されても、絶縁部の上に配置されてもよい。ある実施態様では、ケースは回路シートの回路の上に配置される。
 ケースが回路シートの上に配置されていることで、例えば、回路シート下側の放熱部材にケースを配置する場合に比べて製造工程を簡素化でき、絶縁層を介した回路シートと放熱基材の一体化を行いやすい。あるいは、回路シート下側の絶縁層にケースを配置する場合に比べて作業中に変形しにくく、回路基板の形状を維持しやすい。
 ケースは、シリコーン接着剤等を用いて回路シートに固定してもよい。回路シートの発熱体搭載面におけるケースが配置される位置は特に制限されず、回路基板の形状等に応じて設定できる。
The case may be placed on the circuit of the circuit sheet or on the insulation. In some embodiments, the case is placed on top of the circuit on the circuit sheet.
By arranging the case on the circuit sheet, the manufacturing process can be simplified as compared with the case where the case is arranged on the heat radiating member under the circuit sheet, for example, and the circuit sheet and the heat radiating base material via the insulating layer can be simplified. Is easy to integrate. Alternatively, as compared with the case where the case is arranged in the insulating layer on the lower side of the circuit sheet, it is less likely to be deformed during the work, and the shape of the circuit board can be easily maintained.
The case may be fixed to the circuit sheet using a silicone adhesive or the like. The position where the case is arranged on the heating element mounting surface of the circuit sheet is not particularly limited, and can be set according to the shape of the circuit board and the like.
 ケース付き回路シートは、発熱体搭載面に配置される発熱体をさらに備えてもよい。発熱体の種類は特に制限されず、回路基板に一般に用いられる部品から選択してもよい。ある実施態様では、発熱体は、はんだ等の接合材料を用いて回路の上に配置される。
 発熱体としては、前述の素子であってもよい。
The circuit sheet with a case may further include a heating element arranged on the heating element mounting surface. The type of the heating element is not particularly limited, and may be selected from the components generally used for the circuit board. In some embodiments, the heating element is placed on the circuit using a bonding material such as solder.
The heating element may be the above-mentioned element.
<回路パッケージ>
 本開示の回路パッケージは、回路と前記回路の間に設けられる絶縁部とを備える回路シートと、前記回路シートの発熱体搭載面上に配置されるケースと、前記回路の上に配置される発熱体と、前記ケースで囲まれた部分に配置される封止部と、を備える。
 すなわち、本開示の回路パッケージは、上述したケース付き回路シートのケースで囲まれた部分に封止部が形成された状態である。
<Circuit package>
The circuit package of the present disclosure includes a circuit sheet including a circuit and an insulating portion provided between the circuits, a case arranged on the heating element mounting surface of the circuit sheet, and heat generation arranged on the circuit. It includes a body and a sealing portion arranged in a portion surrounded by the case.
That is, the circuit package of the present disclosure is in a state in which a sealing portion is formed in a portion of the circuit sheet with a case surrounded by a case.
 封止部の形成に用いる封止材の種類は、特に制限されない。例えば、エポキシ樹脂、フェノール樹脂、ユリア樹脂、メラミン樹脂、ウレタン樹脂、シリコーン樹脂、不飽和ポリエステル樹脂、アクリル樹脂、ポリフェニレンサルファイド樹脂等の樹脂を含む材料が挙げられる。封止材に含まれる樹脂は、1種であっても2種以上であってもよい。封止材は、必要に応じて、無機フィラー等の樹脂以外の成分を含んでもよい。 The type of sealing material used to form the sealing portion is not particularly limited. Examples thereof include materials containing resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, acrylic resin and polyphenylene sulfide resin. The resin contained in the sealing material may be one kind or two or more kinds. The encapsulant may contain components other than the resin, such as an inorganic filler, if necessary.
<第六実施形態の回路基板>
 本開示の第六実施形態の回路基板は、上述した本開示の回路パッケージと、前記回路パッケージの発熱体搭載面と逆の面に配置される絶縁層及び放熱部材と、を有する。
<Circuit board of the sixth embodiment>
The circuit board of the sixth embodiment of the present disclosure includes the circuit package of the present disclosure described above, and an insulating layer and a heat radiating member arranged on a surface opposite to the heating element mounting surface of the circuit package.
 絶縁層の種類は、特に制限されない。例えば、樹脂を含むものであってよい。絶縁層に含まれる樹脂は、1種であっても2種以上であってもよい。絶縁層は、必要に応じて、フィラー等の樹脂以外の成分を含んでもよい。 The type of insulating layer is not particularly limited. For example, it may contain a resin. The resin contained in the insulating layer may be one type or two or more types. The insulating layer may contain a component other than the resin such as a filler, if necessary.
 絶縁層の厚さは、特に制限されない。充分な絶縁性を確保する観点からは、絶縁層の厚さは大きいほど好ましい。例えば、絶縁層の厚さは60μm以上であることが好ましく、90μm以上であることがより好ましく、120μm以上であることがさらに好ましい。 The thickness of the insulating layer is not particularly limited. From the viewpoint of ensuring sufficient insulating properties, the larger the thickness of the insulating layer, the more preferable. For example, the thickness of the insulating layer is preferably 60 μm or more, more preferably 90 μm or more, and further preferably 120 μm or more.
 充分な放熱性を確保する観点からは、絶縁層の厚さは小さいほど好ましい。例えば、絶縁層の厚さは230μm以下であることが好ましく、210μm以下であることがより好ましく、190μm以下であることがさらに好ましい。 From the viewpoint of ensuring sufficient heat dissipation, the smaller the thickness of the insulating layer, the more preferable. For example, the thickness of the insulating layer is preferably 230 μm or less, more preferably 210 μm or less, and even more preferably 190 μm or less.
 放熱部材の種類は特に制限されず、回路基板の放熱部材として一般的に用いられるものから選択してもよい。例えば、放熱性に優れるアルミニウム、鉄、銅等の金属、セラミックスなどからなる部材であってもよい。 The type of the heat radiating member is not particularly limited, and may be selected from those generally used as the heat radiating member of the circuit board. For example, it may be a member made of a metal such as aluminum, iron, or copper, or ceramics, which has excellent heat dissipation.
 回路基板は、回路の一方の面が発熱体と接しており、他方の面が絶縁層と接している。すなわち、回路が発熱体と絶縁層とを連通している。これにより、回路間の絶縁性が充分に確保された構造を得ることができる。 On the circuit board, one surface of the circuit is in contact with the heating element, and the other surface is in contact with the insulating layer. That is, the circuit communicates the heating element and the insulating layer. As a result, it is possible to obtain a structure in which the insulation between the circuits is sufficiently ensured.
<回路基板の製造方法A>
 本開示の回路基板の製造方法Aは、上述したケース付き回路シートの前記ケースで囲まれた部分に封止部を形成する工程と、
 前記ケース付き回路シートの発熱体搭載面と逆の面側に絶縁層及び放熱部材を配置する工程と、を有する。
<Circuit board manufacturing method A>
The circuit board manufacturing method A of the present disclosure includes a step of forming a sealing portion in a portion of the circuit sheet with a case surrounded by the case described above, and a step of forming a sealing portion.
It includes a step of arranging an insulating layer and a heat radiating member on the surface opposite to the heating element mounting surface of the circuit sheet with a case.
 上記方法において、封止部を形成する工程と絶縁層及び放熱部材を配置する工程の順序は特に制限されず、いずれを先に実施してもよい。絶縁層及び放熱部材を配置する工程は、回路の上に発熱体を搭載した後に行うことが好ましい。 In the above method, the order of the step of forming the sealing portion and the step of arranging the insulating layer and the heat radiating member is not particularly limited, and any of them may be carried out first. The step of arranging the insulating layer and the heat radiating member is preferably performed after mounting the heating element on the circuit.
<回路基板の製造方法B>
 本開示の回路基板の製造方法(1)は、下記(1)~(4)の工程を含む。ただし、工程(2)は工程(3)及び工程(4)の前に行われ、工程(1)は工程(3)の前に行われる。
(1)回路シートの発熱体搭載面上にケースを設置する工程
(2)回路シートの回路の上に発熱体を搭載する工程
(3)回路シートの発熱体搭載面上のケースで囲まれた部分に封止部を形成する工程
(4)回路シートの発熱体搭載面と逆の面側に絶縁層及び放熱部材を配置する工程
<Circuit board manufacturing method B>
The circuit board manufacturing method (1) of the present disclosure includes the following steps (1) to (4). However, step (2) is performed before step (3) and step (4), and step (1) is performed before step (3).
(1) Step of installing the case on the heating element mounting surface of the circuit sheet (2) Step of mounting the heating element on the circuit of the circuit sheet (3) Surrounded by the case on the heating element mounting surface of the circuit sheet Step of forming a sealing part in the portion (4) Step of arranging an insulating layer and a heat radiating member on the surface opposite to the heating element mounting surface of the circuit sheet.
 上記方法では、工程(2)が工程(3)及び工程(4)の前に行われ、工程(1)が工程(3)の前に行われるのであれば、各工程の順序は特に制限されない。例えば、工程(1)と工程(2)のいずれを先に行ってもよく、工程(3)と工程(4)のいずれを先に行ってもよく、工程(1)と工程(4)のいずれを先に行ってもよい。 In the above method, if step (2) is performed before steps (3) and (4) and step (1) is performed before step (3), the order of each step is not particularly limited. .. For example, either step (1) or step (2) may be performed first, or any of steps (3) and (4) may be performed first, and the steps (1) and (4) may be performed first. Either may be done first.
 上記方法(製造方法A及び製造方法B)で使用する回路シート、ケース、ケース付き回路シート、封止部、絶縁層及び放熱部材の詳細及び好ましい態様は上述したとおりである。また上記方法は、上述した本開示の回路基板を製造する方法であってもよい。 Details and preferred embodiments of the circuit sheet, case, circuit sheet with case, sealing portion, insulating layer and heat radiating member used in the above methods (manufacturing method A and manufacturing method B) are as described above. Further, the above method may be a method for manufacturing the circuit board of the present disclosure described above.
 上記方法においてケースで囲まれた部分に封止部を形成する方法は、特に制限されない。例えば、封止材を形成するための材料(封止材)をケースで囲まれた部分に供給し、必要に応じて加熱等を行って形成することができる。 In the above method, the method of forming the sealing portion in the portion surrounded by the case is not particularly limited. For example, a material for forming a sealing material (sealing material) can be supplied to a portion surrounded by a case and heated or the like as necessary to form the sealing material.
 ある実施態様では、封止部の形成は、ケースで囲まれた部分に封止材を非加圧で供給する工程を含む方法によって行う。以下、このような方法を「非加圧成形法」ともいう。 In one embodiment, the sealing portion is formed by a method including a step of supplying a sealing material to a portion surrounded by a case without pressure. Hereinafter, such a method is also referred to as a "non-pressure molding method".
 非加圧成形法では、トランスファー成形法等の加圧を伴う方法に比べ、簡便な設備で封止部を形成することができる。また、封止部中のボイドの生成をより効果的に抑制することができ、信頼性の点で優れている。 In the non-pressure molding method, the sealing portion can be formed with simple equipment as compared with the method involving pressure such as the transfer molding method. In addition, the formation of voids in the sealing portion can be suppressed more effectively, which is excellent in terms of reliability.
 本開示では、ケースで囲まれた部分への封止材の供給が加圧を伴わずに行われるのであれば、封止材を供給した後に加圧を行う場合も非加圧成形法に含まれるものとする。 In the present disclosure, if the encapsulant is supplied to the portion surrounded by the case without pressurization, the non-pressurization molding method also includes the case where the encapsulant is pressurized after the encapsulant is supplied. It shall be.
 封止部の形成を非加圧成形法で行う場合、ケースで囲まれた部分に供給される封止材は、流動性を有していることが好ましい。例えば、流動性を有する固体(粒子等)であっても、液体であってもよい。 When the sealing portion is formed by a non-pressure molding method, it is preferable that the sealing material supplied to the portion surrounded by the case has fluidity. For example, it may be a fluid solid (particles or the like) or a liquid.
 ケースで囲まれた部分に供給される封止材が粒子状である場合、封止部中におけるボイドの生成を抑制する観点からは、供給された粒子を溶融させて粒子間の空隙を低減することが好ましい。 When the encapsulant supplied to the portion surrounded by the case is in the form of particles, the supplied particles are melted to reduce the voids between the particles from the viewpoint of suppressing the formation of voids in the encapsulating portion. Is preferable.
 封止部中におけるボイドの生成をより抑制する観点からは、封止材をケースで囲まれた部分に供給した後、ケースで囲まれた部分を減圧する工程(減圧工程)を実施することが好ましい。 From the viewpoint of further suppressing the formation of voids in the sealing portion, it is possible to carry out a step (decompression step) of supplying the sealing material to the portion surrounded by the case and then depressurizing the portion surrounded by the case. preferable.
 封止材をケースで囲まれた部分に供給した後にケースで囲まれた部分を減圧することで、例えば、供給された封止材が粒子状である場合、粒子間に存在していた空気が溶融した封止材の内部に残存して気泡が形成されるのを抑制することができる。 By supplying the encapsulant to the portion enclosed by the case and then depressurizing the portion enclosed by the case, for example, when the supplied encapsulant is in the form of particles, the air existing between the particles can be removed. It is possible to suppress the formation of air bubbles remaining inside the molten encapsulant.
 封止部中のボイドの生成をより抑制する観点からは、上記方法において減圧工程を実施した後に、ケースで囲まれた部分を大気圧に近づける工程(昇圧工程)を実施することが好ましい。 From the viewpoint of further suppressing the formation of voids in the sealing portion, it is preferable to carry out the step of bringing the portion surrounded by the case closer to atmospheric pressure (pressurizing step) after performing the depressurizing step in the above method.
 減圧工程の後に昇圧工程を実施することで、減圧工程で生成を抑制できなかった気泡が圧力によって潰され、封止部中のボイドの生成をさらに抑制することができる。昇圧工程を実施する方法は、特に制限されない。例えば、内部が減圧された型の開口部を開放して大気圧にする方法であってもよい。 By carrying out the pressurizing step after the depressurizing step, the bubbles that could not be suppressed in the depressurizing step are crushed by the pressure, and the formation of voids in the sealing portion can be further suppressed. The method of carrying out the boosting step is not particularly limited. For example, a method may be used in which the opening of the mold whose inside is decompressed is opened to bring the pressure to atmospheric pressure.
 封止部の形成を非加圧成形法で行う場合、減圧工程は型の内部に供給された絶縁性材料を溶融させる工程(溶融工程)の前に行うことが好ましく、昇圧工程は溶融工程の後に行うことが好ましい。 When the sealing portion is formed by a non-pressure molding method, the depressurization step is preferably performed before the step of melting the insulating material supplied to the inside of the mold (melting step), and the pressurizing step is a melting step. It is preferable to do it later.
 ケース付き回路シートの発熱体搭載面と逆の面側に絶縁層及び放熱部材を配置する方法は、特に制限されない。例えば、接着剤、ねじを用いて行うことができる。
 さらには、例えば、放熱部材の上に絶縁層を配置した状態の積層体を作製し、この積層体の絶縁層側をケース付き回路シートの発熱体搭載面と逆の側に配置してもよく、ケース付き回路シートの発熱体搭載面と逆の側に絶縁層を配置した後、絶縁層の上に放熱部材を配置してもよい。
The method of arranging the insulating layer and the heat radiating member on the surface opposite to the heating element mounting surface of the circuit sheet with a case is not particularly limited. For example, it can be carried out using an adhesive or a screw.
Further, for example, a laminated body in which an insulating layer is arranged on a heat radiating member may be produced, and the insulating layer side of the laminated body may be arranged on the side opposite to the heating element mounting surface of the circuit sheet with a case. After arranging the insulating layer on the side opposite to the heating element mounting surface of the circuit sheet with the case, the heat radiating member may be arranged on the insulating layer.
<第七実施形態の回路基板の製造方法1>
 第七実施形態の回路基板の製造方法1は、回路と、絶縁層と、前記回路の素子実装面よりも大きい面積を有し、前記絶縁層を介して前記回路が配置される面を備えるベース基板と、をこの順に有する回路基板を製造する回路基板の製造方法であって、前記回路と前記絶縁層と前記ベース基板とをこの順に配置した積層体を準備し、前記回路及び前記絶縁層の合計厚さと略同じ厚さを有するスペーサ部材を、前記回路及び前記絶縁層における側面の周囲の少なくとも一部と接するように前記ベース基板上に配置した状態で前記積層体を加圧する工程を有する。
<Manufacturing method 1 of the circuit board of the seventh embodiment>
The circuit board manufacturing method 1 of the seventh embodiment has a circuit, an insulating layer, and a base having an area larger than the element mounting surface of the circuit and having a surface on which the circuit is arranged via the insulating layer. A method for manufacturing a circuit board for manufacturing a circuit board having a substrate in this order, wherein a laminate in which the circuit, the insulating layer, and the base substrate are arranged in this order is prepared, and the circuit and the insulating layer are provided. It has a step of pressurizing the laminated body in a state where a spacer member having substantially the same thickness as the total thickness is arranged on the base substrate so as to be in contact with at least a part of the periphery of the side surface of the circuit and the insulating layer.
 従来の回路基板の製造方法では、前述のようなスペーサ部材を配置することなく、積層体を加圧するため、回路の素子実装面を均一性高く加圧することができない。従来の回路基板の製造方法では、例えば、素子実装面の中央付近と、素子実装面の周端部分とでは加圧時の圧力にばらつきが生じてしまい、素子実装面の周端部分に圧力が集中することで製造された回路基板に反りが発生したり、反りに起因した界面の剥離が発生したりするおそれがある。 In the conventional method of manufacturing a circuit board, since the laminated body is pressurized without arranging the spacer member as described above, it is not possible to pressurize the element mounting surface of the circuit with high uniformity. In the conventional circuit board manufacturing method, for example, the pressure at the time of pressurization varies between the vicinity of the center of the element mounting surface and the peripheral end portion of the element mounting surface, and the pressure is applied to the peripheral end portion of the element mounting surface. Concentration may cause warpage of the manufactured circuit board or peeling of the interface due to the warp.
 一方、回路基板の製造方法1では、回路及び絶縁層の合計厚さと略同じ厚さを有するスペーサ部材を回路及び絶縁層における側面の周囲の少なくとも一部と接するようにベース基板上に配置した状態で積層体を加圧する。これにより、積層体とともにスペーサ部材も加圧されることになり、加圧される面の面積が大きくなることで素子実装面の周端部分に圧力が集中することが抑制され、素子実装面の全体を均一性高く加圧することができる。従って、回路基板の製造方法1にて製造された回路基板では、反りの発生が抑制され、反りに起因した界面の剥離が抑制される。 On the other hand, in the circuit board manufacturing method 1, a spacer member having substantially the same thickness as the total thickness of the circuit and the insulating layer is arranged on the base substrate so as to be in contact with at least a part around the side surface of the circuit and the insulating layer. Pressurize the laminate with. As a result, the spacer member is also pressurized together with the laminated body, and the area of the pressurized surface is increased, so that the pressure is suppressed from being concentrated on the peripheral end portion of the element mounting surface, and the element mounting surface. The whole can be pressurized with high uniformity. Therefore, in the circuit board manufactured by the circuit board manufacturing method 1, the occurrence of warpage is suppressed, and the peeling of the interface due to the warp is suppressed.
 さらに、回路基板の製造方法1では、スペーサ部材をベース基板上に配置することでベース基板自体の反りも好適に抑制することができる。 Further, in the circuit board manufacturing method 1, the warp of the base board itself can be suitably suppressed by arranging the spacer member on the base board.
 また、スペーサ部材を回路及び絶縁層における側面の周囲の少なくとも一部と接するようにベース基板上に配置することにより、絶縁層における絶縁材料の流動量を調節でき、製造された回路基板にて所定の厚さを有する絶縁層を形成しやすい。 Further, by arranging the spacer member on the base substrate so as to be in contact with at least a part of the side surface of the circuit and the insulating layer, the amount of flow of the insulating material in the insulating layer can be adjusted, and the manufactured circuit board is predetermined. It is easy to form an insulating layer having the thickness of.
(スペーサ部材)
 本開示の回路基板の製造方法で用いるスペーサ部材の材質としては特に限定されず、加圧する工程にて必要に応じて積層体が加熱される際の加熱温度に対して耐熱性を有する材質が好ましい。スペーサ部材の材質としては、フッ素系ゴム、ポリテトラフルオロエチレン等のフッ素系樹脂、銅、鉄、これら金属を主成分とした合金、ステンレス、これらからなる積層体等の金属などが挙げられる。
(Spacer member)
The material of the spacer member used in the method for manufacturing the circuit board of the present disclosure is not particularly limited, and a material having heat resistance to the heating temperature when the laminate is heated as needed in the pressurizing step is preferable. .. Examples of the material of the spacer member include fluorine-based rubber, fluorine-based resin such as polytetrafluoroethylene, copper, iron, alloys containing these metals as main components, stainless steel, and metals such as laminates made of these.
 回路基板の製造方法1では、スペーサ部材の厚さは回路及び絶縁層の合計厚さと略同じ厚さであれば特に限定されない。回路の素子実装面を好適に加圧する観点から、スペーサ部材の厚さが前述の合計厚さ以下であることが好ましく、回路の素子実装面をより均一性高く加圧する観点から、スペーサ部材の厚さと前述の合計厚さとの差が0μm~250μmであることが好ましく、10μm~250μmであることがより好ましく、50μm~220μmであることがさらに好ましい。 In the circuit board manufacturing method 1, the thickness of the spacer member is not particularly limited as long as it is substantially the same as the total thickness of the circuit and the insulating layer. From the viewpoint of suitably pressurizing the element mounting surface of the circuit, the thickness of the spacer member is preferably equal to or less than the above-mentioned total thickness, and from the viewpoint of pressurizing the element mounting surface of the circuit with higher uniformity, the thickness of the spacer member. The difference between the thickness and the above-mentioned total thickness is preferably 0 μm to 250 μm, more preferably 10 μm to 250 μm, and even more preferably 50 μm to 220 μm.
 回路及び絶縁層の合計厚さに対するスペーサ部材の厚さの比率(スペーサ部材の厚さ/回路及び絶縁層の合計厚さ)は、0.75~1.0であること好ましく、0.875~0.995であることがより好ましい。 The ratio of the thickness of the spacer member to the total thickness of the circuit and the insulating layer (thickness of the spacer member / total thickness of the circuit and the insulating layer) is preferably 0.75 to 1.0, preferably 0.875 to 0.875. It is more preferably 0.995.
 加圧する工程では、素子実装面の周端部分での加圧時の圧力のバラつきを抑制する観点及び回路及び絶縁層の層間ズレを抑制する観点から、スペーサ部材は、回路及び絶縁層における側面の周囲の少なくとも2つの領域と接し、かつ回路及び絶縁層を挟むように配置されていることが好ましく、前述の周囲と接するように配置されていることがより好ましい。
 本開示における「接する」とは、回路及び絶縁層における側面の周囲の少なくとも一部とスペーサ部材とが接しうる位置に、回路及び絶縁層並びにスペーサ部材が配置され、層間ズレを実用上問題のないレベルで抑制するために位置合わせできることを意味する。
 また、スペーサ部材と回路及び絶縁層との間に位置合わせを容易にするためのクリアランスを設けてもよい。この時のクリアランス量は許容できる層間ズレ量以内にすることで良好に位置合わせをすることができる。
In the pressurizing step, the spacer member is provided on the side surface of the circuit and the insulating layer from the viewpoint of suppressing the pressure variation at the peripheral end portion of the element mounting surface and suppressing the inter-layer deviation of the circuit and the insulating layer. It is preferably arranged so as to be in contact with at least two peripheral regions and to sandwich the circuit and the insulating layer, and more preferably to be arranged so as to be in contact with the above-mentioned surroundings.
In the present disclosure, "contacting" means that the circuit, the insulating layer, and the spacer member are arranged at positions where at least a part of the side surface of the circuit and the insulating layer can be in contact with the spacer member, and there is no practical problem of inter-layer deviation. It means that it can be aligned to suppress at the level.
Further, a clearance may be provided between the spacer member and the circuit and the insulating layer to facilitate alignment. Good alignment can be achieved by setting the clearance amount at this time to be within an allowable amount of interlaminar deviation.
 例えば、回路の素子実装面の形状が正方形状、長方形状等の四角形状である場合、スペーサ部材は、ベース基板上の回路及び絶縁層の側面の内、対向する2つの面と接するように配置されていることが好ましく、ベース基板上の回路及び絶縁層の4つの側面と接するように配置されていることがより好ましい。 For example, when the shape of the element mounting surface of the circuit is a square shape such as a square shape or a rectangular shape, the spacer member is arranged so as to be in contact with two opposing surfaces of the side surfaces of the circuit and the insulating layer on the base substrate. It is more preferable that the circuit is arranged so as to be in contact with the four sides of the circuit and the insulating layer on the base substrate.
 回路基板の製造方法1は、積層体を加圧する前に、スペーサ部材を用いてベース基板上の回路及び絶縁層の位置合わせを行う工程をさらに有することが好ましい。例えば、回路及び絶縁層における側面の周囲の少なくとも2つの領域と接し、回路及び絶縁層を挟むように配置したスペーサ部材、好ましくは回路及び絶縁層の周囲と接するように配置したスペーサ部材と、ベース基板との位置合わせを行うことにより、ベース基板上の回路及び絶縁層の位置合わせを行ってもよい。 It is preferable that the circuit board manufacturing method 1 further includes a step of aligning the circuit and the insulating layer on the base board using a spacer member before pressurizing the laminate. For example, a spacer member arranged so as to be in contact with at least two regions around the side surface of the circuit and the insulating layer and sandwiching the circuit and the insulating layer, preferably a spacer member arranged so as to be in contact with the periphery of the circuit and the insulating layer, and a base. The circuit and the insulating layer on the base substrate may be aligned by aligning with the substrate.
 加圧する工程は、回路の素子実装面上に、加圧により変形可能なクッション材を配置した状態で行われることが好ましい。回路の素子実装面にクッション材を配置することで素子実装面にかかる圧力が分散され、回路、絶縁層及びベース基板を充分に密着させることができる傾向にある。加圧する工程は、積層体のベース基板側にもクッション材を配置した状態で行われてもよい。また、加圧する工程にてスペーサ部材を用いることにより、積層体の加圧時におけるクッション材の変形を抑制することができ、回路基板を製造する際のクッション材の使用回数を増やすことができる傾向にある。 The step of pressurizing is preferably performed in a state where a cushion material that can be deformed by pressurization is arranged on the element mounting surface of the circuit. By arranging the cushion material on the element mounting surface of the circuit, the pressure applied to the element mounting surface is dispersed, and the circuit, the insulating layer, and the base substrate tend to be sufficiently adhered to each other. The step of pressurizing may be performed in a state where the cushion material is also arranged on the base substrate side of the laminated body. Further, by using the spacer member in the pressurizing step, it is possible to suppress the deformation of the cushioning material at the time of pressurizing the laminated body, and the number of times the cushioning material is used in manufacturing the circuit board tends to be increased. It is in.
 使用されるクッション材としては、フッ素ゴム、テフロン(登録商標)、ポリエチレンテレフタレート(PET)、ポリイミド、ポリアミド、ポリアミドイミド、ポリエチレン、不織布、不織紙等、それらの複合層、積層材料等が挙げられる。 Examples of the cushioning material used include fluororubber, Teflon (registered trademark), polyethylene terephthalate (PET), polyimide, polyamide, polyamideimide, polyethylene, non-woven fabric, non-woven paper, and their composite layers and laminated materials. ..
 加圧する工程にて、積層体を加圧する方法は特に制限されない。加圧の圧力は特に制限されず、例えば、0.1MPa~30MPaの範囲から選択することができる。回路のスプリングバック(圧力を開放したときに回路が初期の平坦な形状に戻ろうとする力に起因した界面の剥離)を低減する観点、及び接着性を確保する観点から、より好ましくは0.5MPa~15MPaであり、さらに好ましくは0.8MPa~15MPaである。回路と絶縁層との密着性を高める観点からは、積層体を加熱及び加圧することが好ましい。積層体を加熱及び加圧する場合、積層体の加熱温度は特に制限されず、例えば、50℃~290℃の範囲から選択することができる。接着性を確保する観点及び積層体、クッション材、スペーサ部材等の熱ダメージを低減する観点から、80℃~250℃であることがより好ましい。加熱時間は、接着性を担保するために必要な時間であれば特に制限はなく30秒~5時間であることが好ましい。短時間で接着を行いその後無加圧状態で接着層を硬化するための熱処理を行ってもよい。このときの温度は上述した圧着時の加熱温度の範囲から選択してもよい。加圧するために用いる装置については特に制限はなく、平板ラミネータ、真空平板ラミネータ、クイックプレス、平板プレス機、真空平板プレス機等を用いることができる。 In the pressurizing step, the method of pressurizing the laminate is not particularly limited. The pressurizing pressure is not particularly limited and can be selected from, for example, the range of 0.1 MPa to 30 MPa. More preferably 0.5 MPa from the viewpoint of reducing the springback of the circuit (the peeling of the interface due to the force that causes the circuit to return to the initial flat shape when the pressure is released) and from the viewpoint of ensuring the adhesiveness. It is ~ 15 MPa, more preferably 0.8 MPa ~ 15 MPa. From the viewpoint of enhancing the adhesion between the circuit and the insulating layer, it is preferable to heat and pressurize the laminate. When the laminate is heated and pressurized, the heating temperature of the laminate is not particularly limited and can be selected from, for example, the range of 50 ° C to 290 ° C. From the viewpoint of ensuring adhesiveness and reducing heat damage to the laminate, cushion material, spacer member, etc., the temperature is more preferably 80 ° C. to 250 ° C. The heating time is not particularly limited as long as it is the time required to ensure the adhesiveness, and is preferably 30 seconds to 5 hours. Adhesion may be performed in a short time, and then heat treatment may be performed to cure the adhesive layer in a non-pressurized state. The temperature at this time may be selected from the range of the heating temperature at the time of crimping described above. The device used for pressurizing is not particularly limited, and a flat plate laminator, a vacuum flat plate laminator, a quick press, a flat plate press, a vacuum flat plate press, or the like can be used.
 以下、本開示の回路基板の製造方法で用いる回路、絶縁層及びベース基板の具体的構成について説明する。 Hereinafter, specific configurations of the circuit, the insulating layer, and the base substrate used in the circuit board manufacturing method of the present disclosure will be described.
(回路)
 本開示の回路基板の製造方法で用いる回路の材質としては、導体であれば特に限定されず、例えば、金属が挙げられる。金属としては、銅、銀、クロム銅、タングステン銅、ニッケル、ニッケルメッキ銅、アルミニウム、アルマイトに表面修飾したアルミニウム等が挙げられる。導電性の観点から、金属は銅を含むことが好ましい。
(circuit)
The material of the circuit used in the method for manufacturing the circuit board of the present disclosure is not particularly limited as long as it is a conductor, and examples thereof include metal. Examples of the metal include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite. From the viewpoint of conductivity, the metal preferably contains copper.
 回路の厚さは特に制限されず、回路基板の用途等に応じて選択できる。回路の大電流化の観点から、回路の厚さは350μm以上であることが好ましく、400μm以上であることがより好ましく、500μm以上であることがさらに好ましく、放熱性の観点から、1000μm以上であることが特に好ましい。小型、低背化の観点からは、回路の厚さは5000μm以下であってよい。回路の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
 絶縁層等の隣接する部材に回路の一部が埋め込まれている場合は、埋め込まれている部分の厚さも回路の厚さに含まれる。
The thickness of the circuit is not particularly limited and can be selected according to the application of the circuit board and the like. From the viewpoint of increasing the current of the circuit, the thickness of the circuit is preferably 350 μm or more, more preferably 400 μm or more, further preferably 500 μm or more, and 1000 μm or more from the viewpoint of heat dissipation. Is particularly preferred. From the viewpoint of small size and low profile, the thickness of the circuit may be 5000 μm or less. When the thickness of the circuit is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
When a part of the circuit is embedded in an adjacent member such as an insulating layer, the thickness of the embedded part is also included in the thickness of the circuit.
 回路は回路部と、回路部以外の空間と、を有し、空間の少なくとも一部に絶縁部が設けられていてもよい。回路が回路部及び空間を有する場合、空間を絶縁部で埋めることにより、素子実装面をより均一性高く加圧することができる。また、絶縁層及びベース基板上に配置される前の回路は、素子実装面及び素子実装面と逆の面が露出していてもよい。回路において、表裏面が露出した上下対称構造である場合であっても、製造された回路基板の反りを好適に抑制することができる。 The circuit has a circuit unit and a space other than the circuit unit, and an insulating portion may be provided in at least a part of the space. When the circuit has a circuit portion and a space, the element mounting surface can be pressurized with higher uniformity by filling the space with an insulating portion. Further, in the circuit before being arranged on the insulating layer and the base substrate, the element mounting surface and the surface opposite to the element mounting surface may be exposed. Even when the circuit has a vertically symmetrical structure in which the front and back surfaces are exposed, the warp of the manufactured circuit board can be suitably suppressed.
 前述の空間を有する回路は、例えば、金属板を所望の形状の回路の状態に加工することで得られる。加工の方法は特に制限されず、打抜き、切削、エッチング等の公知の方法によって行うことができる。回路作製における精度の向上の観点からは、エッチング加工にて回路を形成することが好ましい。 The circuit having the above-mentioned space can be obtained, for example, by processing a metal plate into a circuit state having a desired shape. The processing method is not particularly limited, and can be performed by a known method such as punching, cutting, or etching. From the viewpoint of improving the accuracy in circuit fabrication, it is preferable to form the circuit by etching.
 回路をエッチング加工にて作製する場合、金属板のエッチング方法は特に制限されない。回路のテーパー部分の発生を抑制する観点からは、金属板の両面(すなわち向かい合う2つの主面)からエッチングすることにより回路を形成することが好ましい。 When the circuit is manufactured by etching, the etching method of the metal plate is not particularly limited. From the viewpoint of suppressing the occurrence of the tapered portion of the circuit, it is preferable to form the circuit by etching from both sides (that is, two main surfaces facing each other) of the metal plate.
 回路は、粗化処理されていてもよい。例えば、回路が後述の絶縁層と接する場合、当該絶縁層と接する面が少なくとも粗化処理されていると、ボイドの発生を抑制しながら、絶縁層と十分に接着できる状態とすることができる。具体的には、回路の絶縁層と接する面を粗化し、アンカー効果による引き抜き力を向上させるか密着面積を増大させることで、ファンデルワールス力による密着性を向上することができると考えられる。 The circuit may be roughened. For example, when the circuit is in contact with an insulating layer described later, if the surface in contact with the insulating layer is at least roughened, it is possible to obtain a state in which the circuit can be sufficiently adhered to the insulating layer while suppressing the generation of voids. Specifically, it is considered that the adhesion due to the Van der Waals force can be improved by roughening the surface in contact with the insulating layer of the circuit to improve the pull-out force due to the anchor effect or increase the adhesion area.
 回路を粗化処理する方法は特に制限されず、物理的な方法で行っても、化学的な方法で行ってもよい。例えば、回路の材質が銅であれば、物理的な方法としては、やすりがけ、サンドブラスト処理、レーザー照射、フライス加工等が挙げられる。化学的な方法としては、マグダミット処理、CZ処理、黒化処理、エッチング処理、メッキ処理等が挙げられる。粗化処理は、いずれか1種の方法により行っても、2種以上を組み合わせてもよい。2種以上を組み合わせる場合は、物理的な方法と化学的な方法を組み合わせて行っても、化学的な方法同士を組み合わせて行っても、物理的な方法同士を組み合わせて行ってもよい。 The method of roughening the circuit is not particularly limited, and it may be performed by a physical method or a chemical method. For example, when the material of the circuit is copper, the physical method includes sanding, sandblasting, laser irradiation, milling and the like. Examples of the chemical method include a magdamit treatment, a CZ treatment, a blackening treatment, an etching treatment, a plating treatment and the like. The roughening treatment may be carried out by any one method or a combination of two or more. When two or more kinds are combined, the physical method and the chemical method may be combined, the chemical methods may be combined, or the physical methods may be combined.
 回路が回路部と、回路部以外の空間と、を有する場合、絶縁部の形成に用いる絶縁材料としては、エポキシ樹脂、フェノール樹脂、ユリア樹脂、メラミン樹脂、ウレタン樹脂、シリコーン樹脂、不飽和ポリエステル樹脂、アクリル樹脂等の樹脂を含む材料が挙げられる。絶縁材料に含まれる樹脂は、1種であっても2種以上であってもよい。絶縁材料は、必要に応じて、無機フィラー等の樹脂以外の成分を含んでもよい。 When the circuit has a circuit portion and a space other than the circuit portion, the insulating materials used for forming the insulating portion include epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, and unsaturated polyester resin. , Materials containing resins such as acrylic resins. The resin contained in the insulating material may be one kind or two or more kinds. The insulating material may contain components other than the resin, such as an inorganic filler, if necessary.
 前述の絶縁部の厚さは特に限定されず、回路基板の用途等に応じて選択できる。回路の厚さに対する絶縁部の厚さ(絶縁部の厚さ/回路の厚さ)は、充分な絶縁性の確保の観点から、0.5以上が好ましく、0.7以上がより好ましく、0.9以上がさらに好ましい。また、絶縁部の厚さ/回路の厚さは、素子実装の作業性の観点から、1.0以下が好ましく、0.99以下がより好ましい。
 絶縁部の厚さが一定でない場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。
The thickness of the above-mentioned insulating portion is not particularly limited and can be selected according to the application of the circuit board and the like. The thickness of the insulating portion (thickness of the insulating portion / thickness of the circuit) with respect to the thickness of the circuit is preferably 0.5 or more, more preferably 0.7 or more, and 0, from the viewpoint of ensuring sufficient insulation. 0.9 or more is more preferable. Further, the thickness of the insulating portion / the thickness of the circuit is preferably 1.0 or less, more preferably 0.99 or less, from the viewpoint of workability of element mounting.
When the thickness of the insulating portion is not constant, the arithmetic mean value of the measured values obtained at five arbitrarily selected points may be used as the above value.
(絶縁層)
 本開示の回路基板の製造方法における絶縁層は、回路基板における回路とベース基板との間に位置する部材である。絶縁層の形成に用いる絶縁材料の好ましい形態は、絶縁部の形成に用いる絶縁材料の好ましい形態と同様であってもよい。
(Insulation layer)
The insulating layer in the method for manufacturing a circuit board of the present disclosure is a member located between a circuit and a base board in the circuit board. The preferred form of the insulating material used for forming the insulating layer may be the same as the preferred form of the insulating material used for forming the insulating portion.
 絶縁層の厚さは特に制限されず、回路基板の用途等に応じて選択できる。充分な絶縁性を確保する観点からは、絶縁層の厚さは30m以上であることが好ましく、80μm以上であることがより好ましく、熱衝撃耐性を付与する観点から120μm以上であることがさらに好ましい。 The thickness of the insulating layer is not particularly limited and can be selected according to the application of the circuit board. From the viewpoint of ensuring sufficient insulating properties, the thickness of the insulating layer is preferably 30 m or more, more preferably 80 μm or more, and further preferably 120 μm or more from the viewpoint of imparting thermal shock resistance. ..
 充分な放熱性を確保する観点からは、絶縁層の厚さは500μm以下であることが好ましく、260μm以下であることがより好ましく、220μm以下であることがさらに好ましい。 From the viewpoint of ensuring sufficient heat dissipation, the thickness of the insulating layer is preferably 500 μm or less, more preferably 260 μm or less, and further preferably 220 μm or less.
(ベース基板)
 本開示の回路基板の製造方法に用いるベース基板は、回路及び絶縁層をベース基板上に配置可能な部材であればよく、例えば、放熱部材であってもよい。ベース基板の材質は特に制限されず、銅、アルミニウム、タングステン銅、モリブデン銅等の銅合金、ニッケルめっき銅などが挙げられる。放熱部材の種類は特に制限されず、ヒートスプレッダ、ヒートシンク等の放熱機能を有する部材、空気又は水の流路を持ったケース、金属箔、フィラー樹脂コンポジットなどであってもよい。放熱部材の表面は平滑であってもよく、絶縁層との接着性を向上させるための粗化処理が施されていてもよい。
(Base board)
The base substrate used in the method for manufacturing the circuit board of the present disclosure may be any member as long as the circuit and the insulating layer can be arranged on the base substrate, and may be, for example, a heat dissipation member. The material of the base substrate is not particularly limited, and examples thereof include copper, aluminum, tungsten copper, copper alloys such as molybdenum copper, and nickel-plated copper. The type of the heat radiating member is not particularly limited, and may be a member having a heat radiating function such as a heat spreader or a heat sink, a case having an air or water flow path, a metal foil, a filler resin composite, or the like. The surface of the heat radiating member may be smooth, and may be roughened to improve the adhesiveness with the insulating layer.
<第七実施形態の回路基板の製造方法2>
 第七実施形態の回路基板の製造方法2は、回路と、絶縁層と、ベース基板と、をこの順に有する回路基板を製造する回路基板の製造方法であって、前記回路と前記絶縁層と前記ベース基板とをこの順に配置した積層体を準備し、前記回路、前記絶縁層及び前記ベース基板の合計厚さと略同じ厚さを有するスペーサ部材を、前記積層体における側面の周囲の少なくとも一部と接するように前記積層体と同一平面上に配置した状態で前記積層体を加圧する工程を有する。回路基板の製造方法2の好ましい形態について、前述の回路基板の製造方法1の好ましい形態と共通する事項についてはその説明を省略する。
<Manufacturing method 2 of the circuit board of the seventh embodiment>
The circuit board manufacturing method 2 of the seventh embodiment is a method of manufacturing a circuit board that manufactures a circuit board having a circuit, an insulating layer, and a base board in this order, wherein the circuit, the insulating layer, and the base board are manufactured. A laminate in which the base substrate is arranged in this order is prepared, and a spacer member having a thickness substantially equal to the total thickness of the circuit, the insulating layer, and the base substrate is formed with at least a part of the periphery of the side surface of the laminate. It has a step of pressurizing the laminated body in a state of being arranged on the same plane as the laminated body so as to be in contact with each other. The description of the preferred form of the circuit board manufacturing method 2 and the matters common to the preferred form of the circuit board manufacturing method 1 described above will be omitted.
 回路基板の製造方法2では、回路、絶縁層及びベース基板の合計厚さと略同じ厚さを有するスペーサ部材を積層体における側面の周囲の少なくとも一部と接するように積層体と同一平面上に配置した状態で積層体を加圧する。これにより、積層体とともにスペーサ部材も加圧されることになり、加圧される面の面積が大きくなることで素子実装面の周端部分及びベース基板の回路側とは反対側の面の周端部分に圧力が集中することが抑制され、素子実装面の全体、及びベース基板の回路側とは反対側の面全体を均一性高く加圧することができる。従って、本開示の回路基板の製造方法2にて製造された回路基板では、反りの発生が抑制され、反りに起因した界面の剥離が抑制される。 In the circuit board manufacturing method 2, spacer members having substantially the same thickness as the total thickness of the circuit, the insulating layer, and the base substrate are arranged on the same plane as the laminated body so as to be in contact with at least a part around the side surface of the laminated body. Pressurize the laminate in this state. As a result, the spacer member is also pressurized together with the laminated body, and the area of the pressurized surface is increased, so that the peripheral end portion of the element mounting surface and the peripheral surface of the surface opposite to the circuit side of the base substrate are applied. The concentration of pressure on the end portion is suppressed, and the entire element mounting surface and the entire surface of the base substrate opposite to the circuit side can be pressurized with high uniformity. Therefore, in the circuit board manufactured by the circuit board manufacturing method 2 of the present disclosure, the occurrence of warpage is suppressed, and the peeling of the interface due to the warp is suppressed.
 回路基板の製造方法2では、スペーサ部材の厚さは回路、絶縁層及びベース基板の合計厚さと略同じ厚さであれば特に限定されない。回路の素子実装面を好適に加圧する観点から、スペーサ部材の厚さは前述の合計厚さ以下であることが好ましく、回路の素子実装面をより均一性高く加圧する観点から、スペーサ部材の厚さと前述の合計厚さとの差が0μm~250μmであることが好ましく、10μm~250μmであることがより好ましく、50μm~220μmであることがさらに好ましい。 In the circuit board manufacturing method 2, the thickness of the spacer member is not particularly limited as long as it is substantially the same as the total thickness of the circuit, the insulating layer, and the base board. From the viewpoint of suitably pressurizing the element mounting surface of the circuit, the thickness of the spacer member is preferably equal to or less than the above-mentioned total thickness, and from the viewpoint of pressurizing the element mounting surface of the circuit with higher uniformity, the thickness of the spacer member. The difference between the thickness and the above-mentioned total thickness is preferably 0 μm to 250 μm, more preferably 10 μm to 250 μm, and even more preferably 50 μm to 220 μm.
 回路、絶縁層及びベース基板の合計厚さに対するスペーサ部材の厚さの比率(スペーサ部材の厚さ/回路、絶縁層及びベース基板の合計厚さ)は、0.75~1.0であること好ましく、0.875~0.999であることがより好ましい。 The ratio of the thickness of the spacer member to the total thickness of the circuit, the insulating layer and the base substrate (thickness of the spacer member / the total thickness of the circuit, the insulating layer and the base substrate) shall be 0.75 to 1.0. It is preferably 0.875 to 0.999, and more preferably 0.875 to 0.999.
 加圧する工程では、素子実装面の周端部分での加圧時の圧力のバラつきを抑制する観点及び回路及び絶縁層の層間ズレを抑制する観点から、スペーサ部材は、積層体における側面の周囲の少なくとも2つの領域と接し、かつ積層体を挟むように配置されていることが好ましく、前述の周囲と接するように配置されていることがより好ましい。 In the pressurizing step, the spacer member is provided around the side surface of the laminated body from the viewpoint of suppressing the pressure variation during pressurization at the peripheral end portion of the element mounting surface and from the viewpoint of suppressing the inter-layer deviation of the circuit and the insulating layer. It is preferably arranged so as to be in contact with at least two regions and sandwich the laminated body, and more preferably to be arranged so as to be in contact with the above-mentioned surroundings.
 以下、従来の回路基板の製造方法、回路基板の製造方法1の一例及び回路基板の製造方法2の一例について、図7A~図7Cを参照して説明する。図7A~図7Cは、矢印で示すように加圧手段105により積層体200又は11を加圧しているときの、積層体200又は11の厚さ方向における各部材の断面図である。 Hereinafter, an example of a conventional circuit board manufacturing method, a circuit board manufacturing method 1, and a circuit board manufacturing method 2 will be described with reference to FIGS. 7A to 7C. 7A to 7C are cross-sectional views of each member in the thickness direction of the laminate 200 or 11 when the laminate 200 or 11 is pressurized by the pressurizing means 105 as shown by an arrow.
 図7Aは、従来の回路基板の製造方法を示す概略構成図である。図7Aに示すように、スペーサ部材を配置することなく、回路101と絶縁層102とベース基板103とをこの順に備える積層体200を加圧する。また、回路の素子実装面側及び積層体のベース基板側に相対するクッション材106が配置された状態で、矢印で示すように加圧手段105による積層体200の加圧がクッション材106を介して行われる。このとき、積層体200は加圧及び加熱されてもよい。 FIG. 7A is a schematic configuration diagram showing a conventional method for manufacturing a circuit board. As shown in FIG. 7A, the laminate 200 including the circuit 101, the insulating layer 102, and the base substrate 103 in this order is pressurized without arranging the spacer members. Further, in a state where the cushion material 106 facing the element mounting surface side of the circuit and the base substrate side of the laminate is arranged, the pressurization of the laminate 200 by the pressurizing means 105 is performed via the cushion material 106 as shown by an arrow. Is done. At this time, the laminate 200 may be pressurized and heated.
 図7Aに示すような従来の回路基板の製造方法では、積層体200の加圧時に素子実装面の周端部分に圧力が集中することで製造された回路基板に反りが発生したり、反りに起因した界面の剥離が発生したり、スプリングバックが発生するおそれがある。 In the conventional method for manufacturing a circuit board as shown in FIG. 7A, when the laminate 200 is pressurized, the pressure is concentrated on the peripheral end portion of the element mounting surface, so that the manufactured circuit board is warped or warped. The resulting interface peeling may occur or springback may occur.
 図7Bは、回路基板の製造方法1の一例を示す概略構成図である。図7Bに示すように、回路基板の製造方法1では、回路101及び絶縁層102の合計厚さと略同じ厚さを有するスペーサ部材107を、回路101及び絶縁層102における側面の周囲と接するようにベース基板104上に配置した状態で回路101と絶縁層102とベース基板104とをこの順に備える積層体210を加圧する。 FIG. 7B is a schematic configuration diagram showing an example of the circuit board manufacturing method 1. As shown in FIG. 7B, in the circuit board manufacturing method 1, the spacer member 107 having substantially the same thickness as the total thickness of the circuit 101 and the insulating layer 102 is in contact with the periphery of the side surface of the circuit 101 and the insulating layer 102. The laminate 210 including the circuit 101, the insulating layer 102, and the base substrate 104 in this order is pressed while being arranged on the base substrate 104.
 図7Bに示すように、回路基板の製造方法1の一例では、積層体210とともにスペーサ部材107も加圧されることになり、加圧される面の面積が大きくなることで素子実装面の周端部分に圧力が集中することが抑制されるため、回路基板の製造方法1にて製造された回路基板では、反りの発生が抑制され、反りに起因した界面の剥離、スプリングバック等が抑制される。 As shown in FIG. 7B, in an example of the circuit board manufacturing method 1, the spacer member 107 is also pressurized together with the laminated body 210, and the area of the pressurized surface is increased, so that the circumference of the element mounting surface is increased. Since the concentration of pressure on the end portion is suppressed, the occurrence of warpage is suppressed in the circuit board manufactured by the circuit board manufacturing method 1, and the peeling of the interface, springback, etc. due to the warp are suppressed. NS.
 図7Cは、回路基板の製造方法2の一例を示す概略構成図である。図7Cに示すように、回路基板の製造方法2では、回路101、絶縁層102及びベース基板103の合計厚さと略同じ厚さを有するスペーサ部材108を、積層体200における側面の周囲と接するように積層体200と同一平面上に配置した状態で積層体200を加圧する。 FIG. 7C is a schematic configuration diagram showing an example of the circuit board manufacturing method 2. As shown in FIG. 7C, in the circuit board manufacturing method 2, the spacer member 108 having substantially the same thickness as the total thickness of the circuit 101, the insulating layer 102, and the base substrate 103 is brought into contact with the periphery of the side surface of the laminated body 200. The laminated body 200 is pressurized while being arranged on the same plane as the laminated body 200.
 図7Cに示すように、回路基板の製造方法2の一例では、積層体200とともにスペーサ部材108も加圧されることになり、加圧される面の面積が大きくなることで素子実装面の周端部分及びベース基板の回路側とは反対側の面の周端部分に圧力が集中することが抑制されるため、回路基板の製造方法2にて製造された回路基板では、反りの発生が抑制され、反りに起因した界面の剥離、スプリングバック等が抑制される。 As shown in FIG. 7C, in an example of the circuit board manufacturing method 2, the spacer member 108 is also pressurized together with the laminated body 200, and the area of the pressurized surface is increased, so that the circumference of the element mounting surface is increased. Since pressure is suppressed from being concentrated on the end portion and the peripheral end portion of the surface of the base board opposite to the circuit side, the occurrence of warpage is suppressed in the circuit board manufactured by the circuit board manufacturing method 2. Therefore, peeling of the interface, springback, etc. due to warpage are suppressed.
<回路基板>
 本開示の第八実施形態の回路基板は、回路、絶縁層及び放熱部材がこの順で積層されており、前記回路の平均厚さが500μm以上であり、前記絶縁層の平均厚さが120μm以上であるものである。
 本開示の回路基板は、パワーサイクルテストに優れる。その理由は明確ではないが、回路、絶縁層及び放熱部材がこの順で積層された場合に、回路の平均厚さを500μm以上とし、絶縁層の平均厚さを120μm以上とすることで、回路に局所的な発熱が生じても、回路と絶縁層との間の剥離が抑制される傾向にある。その結果、本開示の回路基板はパワーサイクルテストに優れるようになると推察される。
<Circuit board>
In the circuit board of the eighth embodiment of the present disclosure, a circuit, an insulating layer, and a heat radiating member are laminated in this order, the average thickness of the circuit is 500 μm or more, and the average thickness of the insulating layer is 120 μm or more. Is what.
The circuit board of the present disclosure is excellent in power cycle test. The reason is not clear, but when the circuit, the insulating layer and the heat radiating member are laminated in this order, the average thickness of the circuit is set to 500 μm or more, and the average thickness of the insulating layer is set to 120 μm or more. Even if local heat is generated in the circuit, the peeling between the circuit and the insulating layer tends to be suppressed. As a result, it is presumed that the circuit board of the present disclosure will be excellent in the power cycle test.
 以下、本開示の回路基板を、図面に基づいて説明する。なお、本開示の回路基板は下記実施形態に限定されるものではない。また、図面における部材の大きさは概念的なものであり、部材間の大きさの相対的な関係は下記実施形態に限定されない。 Hereinafter, the circuit board of the present disclosure will be described with reference to the drawings. The circuit board of the present disclosure is not limited to the following embodiments. Further, the size of the members in the drawings is conceptual, and the relative relationship between the sizes of the members is not limited to the following embodiment.
 図8Aは、本開示の回路基板の一実施形態である回路基板220の断面図である。
 図8Aに示すように、回路基板220は、回路112と絶縁層113と放熱部材115とがこの順で積層されている。
 回路112の断面は、回路112の絶縁層113と接する側の辺が短く、回路112の絶縁層113と接する側とは反対側の辺が長い台形とされている。
FIG. 8A is a cross-sectional view of the circuit board 220, which is an embodiment of the circuit board of the present disclosure.
As shown in FIG. 8A, in the circuit board 220, the circuit 112, the insulating layer 113, and the heat radiating member 115 are laminated in this order.
The cross section of the circuit 112 has a trapezoidal shape in which the side of the circuit 112 in contact with the insulating layer 113 is short and the side of the circuit 112 opposite to the side in contact with the insulating layer 113 is long.
 本開示において、回路112の平均厚さは、回路を用いて熱の拡散を促す観点から、500μm以上とされ、さらなるパワーサイクルテストに対する特性を向上するため、1000μm以上であることが好ましく、1500μm以上であることがより好ましく、2000μm以上であることがさらに好ましい。一方、小型及び低背化の観点及び回路表面の発熱体、素子等の発した熱について、熱拡散面積を広げること及び絶縁層側に伝えることを効果的に行う観点から、回路112の平均厚さは5000μm以下であることが好ましく、3000μm以下であることがより好ましい。
 回路112の厚さは、回路112自体の厚さを意味し、絶縁層113に回路112の一部が埋め込まれている場合、埋め込まれている部分の厚さも回路112の厚さに含まれる。
In the present disclosure, the average thickness of the circuit 112 is set to 500 μm or more from the viewpoint of promoting heat diffusion using the circuit, and is preferably 1000 μm or more in order to further improve the characteristics for the power cycle test, and is preferably 1500 μm or more. It is more preferable that it is 2000 μm or more, and it is further preferable that it is 2000 μm or more. On the other hand, from the viewpoint of miniaturization and low profile, and from the viewpoint of effectively transmitting the heat generated by the heating element, element, etc. on the circuit surface to the insulating layer side and expanding the heat diffusion area, the average thickness of the circuit 112 The heat is preferably 5000 μm or less, and more preferably 3000 μm or less.
The thickness of the circuit 112 means the thickness of the circuit 112 itself, and when a part of the circuit 112 is embedded in the insulating layer 113, the thickness of the embedded portion is also included in the thickness of the circuit 112.
 回路112の幅及び長さは特に制限されず、回路基板の用途等に応じて選択してよい。例えば、回路112の幅及び長さはそれぞれ350μm~70000μmであってもよい。回路112の場所によって幅又は長さが異なる場合は、任意に選択した5箇所で得られた測定値の算術平均値を上記の値としてもよい。 The width and length of the circuit 112 are not particularly limited and may be selected according to the application of the circuit board and the like. For example, the width and length of the circuit 112 may be 350 μm to 70,000 μm, respectively. When the width or length differs depending on the location of the circuit 112, the arithmetic mean value of the measured values obtained at the five arbitrarily selected locations may be used as the above value.
 回路112と絶縁層113との間の接着強度を高めて回路基板のさらなるパワーサイクルテストに対する特性を向上するため、回路112の絶縁層113に面する側の表面粗さは、0.5μm以上であることが好ましく、0.6μm以上であることがより好ましく、0.7μm以上であることがさらに好ましい。絶縁性の観点から、回路112の絶縁層113に面する側の表面粗さは、5.0μm以下であってもよい。 The surface roughness of the circuit 112 facing the insulating layer 113 should be 0.5 μm or more in order to increase the adhesive strength between the circuit 112 and the insulating layer 113 and improve the characteristics of the circuit board for further power cycle tests. It is preferably 0.6 μm or more, and more preferably 0.7 μm or more. From the viewpoint of insulation, the surface roughness of the circuit 112 on the side facing the insulating layer 113 may be 5.0 μm or less.
 素子実装、ワイヤボンディング等の観点から、回路112の絶縁層113に面する側と反対側の表面粗さは、0.2μm未満であることが好ましく、0.18μm以下であることがより好ましく、0.15μm以下であることがさらに好ましい。回路112の絶縁層113に面する側の表面粗さの下限は、特に限定されない。 From the viewpoint of element mounting, wire bonding, etc., the surface roughness of the circuit 112 on the side opposite to the side facing the insulating layer 113 is preferably less than 0.2 μm, more preferably 0.18 μm or less. It is more preferably 0.15 μm or less. The lower limit of the surface roughness on the side of the circuit 112 facing the insulating layer 113 is not particularly limited.
 本開示において、表面粗さは、算術平均粗さRaをいう。平均粗さRaは、JIS B 0601:2013に基づいて求めた値とする。具体的には、3D顕微鏡(例えば、キーエンス製VR-3200、倍率12倍)を用いて測定される値とする。
 回路112の絶縁層113に面する側の表面粗さは、回路112が絶縁層113又は樹脂組成物等の絶縁層113の前駆体となるものと接触する前に測定された値であってもよいし、回路基板220から絶縁層113と放熱部材115とを除去して得られた回路112について測定された値であってもよい。
In the present disclosure, the surface roughness refers to the arithmetic mean roughness Ra. The average roughness Ra is a value obtained based on JIS B 0601: 2013. Specifically, it is a value measured using a 3D microscope (for example, VR-3200 manufactured by KEYENCE, magnification 12 times).
The surface roughness of the circuit 112 facing the insulating layer 113 may be a value measured before the circuit 112 comes into contact with the insulating layer 113 or a precursor of the insulating layer 113 such as a resin composition. Alternatively, it may be a value measured for the circuit 112 obtained by removing the insulating layer 113 and the heat radiating member 115 from the circuit board 220.
 回路112の材質は特に制限されず、銅、銀、クロム銅、タングステン銅、ニッケル、ニッケルメッキ銅、アルミニウム、アルマイトに表面修飾したアルミニウム等が挙げられる。 The material of the circuit 112 is not particularly limited, and examples thereof include copper, silver, chromium copper, tungsten copper, nickel, nickel-plated copper, aluminum, and aluminum whose surface is modified to alumite.
 回路112の表面粗さを所定の値とするため、回路112の表面に対して粗面化処理を施してもよい。
 回路112の表面を粗化処理する方法は特に制限されず、物理的な方法で行っても、化学的な方法で行ってもよい。例えば、回路112の材質が銅であれば、物理的な方法としては、やすりがけ、サンドブラスト処理、レーザー照射、フライス加工等が挙げられる。化学的な方法としては、マグダミット(MacDermid)処理、CZ処理、黒化処理、エッチング処理、メッキ処理等が挙げられる。粗化処理は、いずれか1種の方法により行っても、2種以上を組み合わせてもよい。2種以上を組み合わせる場合は、物理的な方法と化学的な方法を組み合わせて行っても、化学的な方法同士を組み合わせて行っても、物理的な方法同士を組み合わせて行ってもよい。
In order to set the surface roughness of the circuit 112 to a predetermined value, the surface of the circuit 112 may be roughened.
The method for roughening the surface of the circuit 112 is not particularly limited, and the surface may be roughened by a physical method or a chemical method. For example, when the material of the circuit 112 is copper, physical methods include sanding, sandblasting, laser irradiation, and milling. Examples of the chemical method include a MacDermid treatment, a CZ treatment, a blackening treatment, an etching treatment, a plating treatment and the like. The roughening treatment may be carried out by any one method or a combination of two or more. When two or more kinds are combined, the physical method and the chemical method may be combined, the chemical methods may be combined, or the physical methods may be combined.
 回路を積層する際の回路と絶縁層との間の剥離抑制、回路間に充填する絶縁材料と回路との密着性の観点から、回路112は、回路112の絶縁層113に面する側の表面積よりも、回路112の絶縁層113に面する側と反対側の表面積が大きいことが好ましく、回路112の絶縁層113に面する側と反対側の表面積の、回路112の絶縁層113に面する側の表面積に対する比は、1.001~10.0であることが好ましく、1.01~5.0であることがより好ましく、1.02~4.0であることがさらに好ましい。
 回路112の絶縁層113に面する側の表面積、及び、回路112の絶縁層113に面する側と反対側の表面積は、絶縁層113又は樹脂組成物等の絶縁層113の前駆体となるものと接触する前の回路112か、又は、回路基板220から絶縁層113と放熱部材115とを除去して得られた回路112について、測長機を用いて各回路表面の形状を数値化し面積に換算する方法で測定することができる。
From the viewpoint of suppressing peeling between the circuit and the insulating layer when stacking the circuits and the adhesion between the insulating material filled between the circuits and the circuit, the circuit 112 has a surface area on the side of the circuit 112 facing the insulating layer 113. It is preferable that the surface surface of the circuit 112 facing the insulating layer 113 is larger than that of the circuit 112 facing the insulating layer 113, and the surface surface of the circuit 112 facing the insulating layer 113 facing the insulating layer 113 of the circuit 112. The ratio to the surface area on the side is preferably 1.001 to 10.0, more preferably 1.01 to 5.0, and even more preferably 1.02 to 4.0.
The surface area of the circuit 112 facing the insulating layer 113 and the surface area of the circuit 112 facing the insulating layer 113 serve as a precursor of the insulating layer 113 or the insulating layer 113 such as a resin composition. For the circuit 112 before contact with the circuit 112, or the circuit 112 obtained by removing the insulating layer 113 and the heat radiating member 115 from the circuit board 220, the shape of each circuit surface is quantified using a length measuring device to obtain the surface area. It can be measured by the conversion method.
 絶縁層113は、樹脂を含む。絶縁層113に含まれる樹脂は特に制限されず、エポキシ樹脂、フェノール樹脂、ユリア樹脂、メラミン樹脂、ウレタン樹脂、シリコーン樹脂、不飽和ポリエステル樹脂、アクリル樹脂、アミドイミド樹脂等の硬化性樹脂が挙げられる。絶縁層113に含まれる樹脂は、1種であっても2種以上であってもよい。電気絶縁性と回路112又は放熱部材115に対する接着性の観点からは、絶縁層113はエポキシ樹脂、シリコーン樹脂、及びウレタン樹脂からなる群より選択される少なくとも1種を含むことが好ましい。耐湿性の観点からは、絶縁層113は、エポキシ樹脂、アクリル樹脂、及びアミドイミド樹脂からなる群から選択される少なくとも1種を含むことが好ましい。 The insulating layer 113 contains a resin. The resin contained in the insulating layer 113 is not particularly limited, and examples thereof include curable resins such as epoxy resin, phenol resin, urea resin, melamine resin, urethane resin, silicone resin, unsaturated polyester resin, acrylic resin, and amideimide resin. The resin contained in the insulating layer 113 may be one type or two or more types. From the viewpoint of electrical insulation and adhesiveness to the circuit 112 or the heat radiating member 115, the insulating layer 113 preferably contains at least one selected from the group consisting of epoxy resin, silicone resin, and urethane resin. From the viewpoint of moisture resistance, the insulating layer 113 preferably contains at least one selected from the group consisting of epoxy resin, acrylic resin, and amidimide resin.
 絶縁層113に求められる諸特性のバランスの観点からは、上記樹脂の中でもエポキシ樹脂が好ましい。エポキシ樹脂は、硬化剤と組み合わせてもよい。硬化剤としては、フェノールノボラック樹脂等のフェノール硬化剤が好ましい。 From the viewpoint of the balance of various properties required for the insulating layer 113, the epoxy resin is preferable among the above resins. The epoxy resin may be combined with a curing agent. As the curing agent, a phenol curing agent such as phenol novolac resin is preferable.
 エポキシ樹脂としてメソゲン構造を有するエポキシ樹脂を用いてもよい。メソゲン構造としては、例えば、ビフェニル構造、フェニルベンゾエート構造、シクロヘキシルベンゾエート構造、アゾベンゼン構造、スチルベン構造、ターフェニル構造、アントラセン構造、これらの誘導体、及びこれらのメソゲン構造の2つ以上が結合基を介して結合した構造が挙げられる。 An epoxy resin having a mesogen structure may be used as the epoxy resin. The mesogen structure includes, for example, a biphenyl structure, a phenylbenzoate structure, a cyclohexylbenzoate structure, an azobenzene structure, a stilbene structure, a terphenyl structure, an anthracene structure, derivatives thereof, and two or more of these mesogen structures via a linking group. Examples include combined structures.
 メソゲン構造を有するエポキシ樹脂は、下記一般式(I)で表される構造を1つ以上有するエポキシ化合物を含むものであってもよい。
Figure JPOXMLDOC01-appb-C000001
The epoxy resin having a mesogen structure may contain an epoxy compound having one or more structures represented by the following general formula (I).
Figure JPOXMLDOC01-appb-C000001
 一般式(I)において、R~Rはそれぞれ独立に、水素原子又は炭素数1~3のアルキル基を示す。R~Rはそれぞれ独立に、水素原子又は炭素数1~2のアルキル基であることが好ましく、水素原子又はメチル基であることがより好ましく、水素原子であることがさらに好ましい。また、R~Rのうちの2個~4個が水素原子であることが好ましく、3個又は4個が水素原子であることがより好ましく、4個すべてが水素原子であることがさらに好ましい。R~Rのいずれかが炭素数1~3のアルキル基である場合、R及びRの少なくとも一方が炭素数1~3のアルキル基であることが好ましい。 In the general formula (I), R 1 to R 4 independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. R 1 to R 4 are each independently preferably a hydrogen atom or an alkyl group having 1 to 2 carbon atoms, more preferably a hydrogen atom or a methyl group, and even more preferably a hydrogen atom. Further, it is preferable that 2 to 4 of R 1 to R 4 are hydrogen atoms, more preferably 3 or 4 are hydrogen atoms, and further, all 4 are hydrogen atoms. preferable. When any one of R 1 to R 4 is an alkyl group having 1 to 3 carbon atoms, it is preferable that at least one of R 1 and R 4 is an alkyl group having 1 to 3 carbon atoms.
 一般式(I)で表される構造を有するエポキシ化合物としては、下記一般式(M)で表されるエポキシ化合物が挙げられる。 Examples of the epoxy compound having the structure represented by the general formula (I) include the epoxy compound represented by the following general formula (M).
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
 一般式(M)中におけるR~Rの具体例は、一般式(I)におけるR~Rの具体例と同様であり、その好ましい範囲も同様である。 Specific examples of R 1 ~ R 4 in the general formula (M) is the same as the specific examples of R 1 ~ R 4 in formula (I), is the same preferred ranges thereof.
 絶縁層113は、必要に応じて、フィラー等の樹脂以外の成分を含んでもよい。
 フィラーとしては、例えば、非導電性のフィラー及び導電性のフィラーが挙げられる。
 非導電性のフィラーとしては、酸化アルミニウム(アルミナ)、酸化マグネシウム、窒化アルミニウム、窒化ホウ素、窒化ケイ素、シリカ(酸化ケイ素)、水酸化アルミニウム、硫酸バリウム等が挙げられる。
 また、導電性のフィラーとしては、金、銀、ニッケル、銅等が挙げられる。なかでも熱伝導率の観点から、フィラーは、酸化アルミニウム(アルミナ)、窒化ホウ素、酸化マグネシウム、窒化アルミニウム及びシリカ(酸化ケイ素)からなる群より選択される少なくとも1種であることが好ましく、窒化ホウ素及び酸化アルミニウム(アルミナ)からなる群より選択される少なくとも1種であることがより好ましい。フィラーは、1種を単独で用いても2種以上を併用してもよい。なお、「フィラーを2種類以上併用する」とは、例えば、同じ成分で平均粒子径が異なるフィラーを2種類以上用いる場合、平均粒子径が同じで成分の異なるフィラーを2種類以上用いる場合並びに平均粒子径及び種類の異なるフィラーを2種類以上用いる場合が挙げられる。
The insulating layer 113 may contain a component other than the resin such as a filler, if necessary.
Examples of the filler include a non-conductive filler and a conductive filler.
Examples of the non-conductive filler include aluminum oxide (alumina), magnesium oxide, aluminum nitride, boron nitride, silicon nitride, silica (silicon oxide), aluminum hydroxide, barium sulfate and the like.
Examples of the conductive filler include gold, silver, nickel, copper and the like. Among them, from the viewpoint of thermal conductivity, the filler is preferably at least one selected from the group consisting of aluminum oxide (alumina), boron nitride, magnesium oxide, aluminum nitride and silica (silicon oxide), and boron nitride. It is more preferable that it is at least one selected from the group consisting of aluminum oxide (alumina) and aluminum oxide (alumina). As the filler, one type may be used alone or two or more types may be used in combination. In addition, "using two or more kinds of fillers together" means, for example, when two or more kinds of fillers having the same component but different average particle diameters are used, when two or more kinds of fillers having the same average particle size but different components are used, and when the average. There are cases where two or more types of fillers having different particle sizes and types are used.
 フィラーの形状は特に限定されず、粉状、球状、繊維状等が挙げられる。 The shape of the filler is not particularly limited, and examples thereof include powder, spherical, and fibrous.
 絶縁層113に含まれてもよいその他の成分としては、硬化促進剤、シランカップリング剤、応力緩和剤、着色剤、難燃剤、消泡剤等が挙げられる。絶縁層113に含まれてもよい各成分は、それぞれ、1種を単独で用いても2種以上を併用してもよい。 Other components that may be contained in the insulating layer 113 include a curing accelerator, a silane coupling agent, a stress relaxant, a colorant, a flame retardant, an antifoaming agent, and the like. As for each component which may be contained in the insulating layer 113, one type may be used alone or two or more types may be used in combination.
 絶縁層113の平均厚さは、120μm以上であり、200μmを超えることが好ましく、210μm以上であることがより好ましく、230μm以上であることがさらに好ましい。一方、充分な放熱性を確保する観点からは、絶縁層113の平均厚さは500μm以下であることが好ましく、310μm以下であることがより好ましい。 The average thickness of the insulating layer 113 is 120 μm or more, preferably more than 200 μm, more preferably 210 μm or more, and further preferably 230 μm or more. On the other hand, from the viewpoint of ensuring sufficient heat dissipation, the average thickness of the insulating layer 113 is preferably 500 μm or less, and more preferably 310 μm or less.
 絶縁層113の熱伝導率は、6W/(m・K)以上であることが好ましく、8W/(m・K)以上であることがより好ましく、10W/(m・K)以上であることがさらに好ましい。熱伝導率の上限は特に限定されず、例えば50W/(m・K)以下であってもよい。
 絶縁層113の熱伝導率は以下のように測定される。キセノンフラッシュ法(例えば、NETZSCH社の商品名:LFA447 nanoflash)にて絶縁層113の熱拡散率を評価する。この値と、アルキメデス法で測定した密度と、DSC(示差走査熱量測定装置;例えば、Perkin Elmer社の商品名:DSC Pyris1)にて測定した比熱との積から、絶縁層113の熱伝導率を求める。
The thermal conductivity of the insulating layer 113 is preferably 6 W / (m · K) or more, more preferably 8 W / (m · K) or more, and preferably 10 W / (m · K) or more. More preferred. The upper limit of the thermal conductivity is not particularly limited, and may be, for example, 50 W / (m · K) or less.
The thermal conductivity of the insulating layer 113 is measured as follows. The thermal diffusivity of the insulating layer 113 is evaluated by the xenon flash method (for example, trade name: LFA447 nanoflash of NETZSCH). The thermal conductivity of the insulating layer 113 is calculated from the product of this value, the density measured by the Archimedes method, and the specific heat measured by DSC (differential scanning calorimetry device; for example, a trade name of PerkinElmer: DSC Pyris1). Ask.
 絶縁層113のガラス転移温度(Tg)は、さらなるパワーサイクルテストに対する特性を向上するため、170℃以上であることが好ましく、180℃以上であることがより好ましく、250℃以上であることがさらに好ましい。絶縁層113のTgは特に限定さえない。
 絶縁層113のガラス転移温度は、示差走査熱量装置(DSC)を用いて測定された値をいう。例えば、絶縁層113の一部をアルミパンに量り取り、示差走査熱量計(DSC)(「DSC8500」、パーキンエルマー社)を用いて、ベースラインが変化する(2次転移)温度をガラス転移温度と見なしてもよい。
The glass transition temperature (Tg) of the insulating layer 113 is preferably 170 ° C. or higher, more preferably 180 ° C. or higher, and further preferably 250 ° C. or higher in order to further improve the characteristics for the power cycle test. preferable. The Tg of the insulating layer 113 is not even limited.
The glass transition temperature of the insulating layer 113 refers to a value measured using a differential scanning calorimetry device (DSC). For example, a part of the insulating layer 113 is weighed in an aluminum pan, and a differential scanning calorimeter (DSC) (“DSC8500”, PerkinElmer) is used to set the temperature at which the baseline changes (secondary transition) to the glass transition temperature. May be regarded as.
 放熱部材115の種類は特に制限されず、金属板、金属箔等が挙げられる。放熱部材115は、ヒートスプレッダ等の放熱機能を呈する部材であってもよい。
 放熱部材115の材質は特に制限されず、銅、アルミニウム、タングステン銅、モリブデン銅等の銅合金、ニッケルめっき銅などが挙げられる。
The type of the heat radiating member 115 is not particularly limited, and examples thereof include a metal plate and a metal foil. The heat radiating member 115 may be a member exhibiting a heat radiating function such as a heat spreader.
The material of the heat radiating member 115 is not particularly limited, and examples thereof include copper, aluminum, tungsten copper, copper alloys such as molybdenum copper, and nickel-plated copper.
 放熱部材115の平均厚さは、放熱性の向上の観点から100μm以上であることが好ましく、効果的な放熱性を得る観点から1000μm以上であることがより好ましく、放熱部材の熱容量及び回路の厚さを利用する効率的な熱拡散を活かした高い放熱性を得る観点から、1800μm以上であることがさらに好ましい。一方、小型及び低背化の観点から、放熱部材115の平均厚さは10cm以下であることが好ましく、5000μm以下であることがより好ましい。 The average thickness of the heat radiating member 115 is preferably 100 μm or more from the viewpoint of improving heat radiating property, more preferably 1000 μm or more from the viewpoint of obtaining effective heat radiating property, and the heat capacity of the heat radiating member and the thickness of the circuit. It is more preferably 1800 μm or more from the viewpoint of obtaining high heat dissipation utilizing efficient heat diffusion utilizing the heat. On the other hand, from the viewpoint of small size and low profile, the average thickness of the heat radiating member 115 is preferably 10 cm or less, and more preferably 5000 μm or less.
 放熱部材115と絶縁層113との間の接着強度を高めて回路基板のさらなるパワーサイクルテストに対する特性を向上するため、放熱部材115の絶縁層113に面する側の表面粗さは、Raで0.5μm以上であることが好ましく、0.6μm以上であることがより好ましく、0.8μm以上であることがさらに好ましい。絶縁性の観点から、放熱部材115の絶縁層113に面する側の表面粗さは、5.0μm以下であってもよい。 In order to increase the adhesive strength between the heat radiating member 115 and the insulating layer 113 and improve the characteristics of the circuit board for further power cycle tests, the surface roughness of the heat radiating member 115 facing the insulating layer 113 is 0 in Ra. It is preferably 5.5 μm or more, more preferably 0.6 μm or more, and further preferably 0.8 μm or more. From the viewpoint of insulation, the surface roughness of the heat radiating member 115 on the side facing the insulating layer 113 may be 5.0 μm or less.
 素子実装、ワイヤボンディング等の観点から、放熱部材115の絶縁層113に面する側と反対側の表面粗さは、Raで0.2μm未満であることが好ましく、0.18μm以下であることがより好ましく、0.15μm以下であることがさらに好ましい。放熱部材115の絶縁層113に面する側と反対側の表面粗さの下限は、特に限定されない。
 放熱部材115の絶縁層113に面する側の表面粗さ、及び、放熱部材115の絶縁層113に面する側と反対側の表面粗さは、回路112の絶縁層113に面する側の表面粗さ、及び、回路112の絶縁層113に面する側と反対側の表面粗さと同様にして測定することができる。
From the viewpoint of element mounting, wire bonding, etc., the surface roughness of the heat radiating member 115 on the side opposite to the side facing the insulating layer 113 is preferably less than 0.2 μm in Ra, and preferably 0.18 μm or less. More preferably, it is 0.15 μm or less. The lower limit of the surface roughness of the heat radiating member 115 on the side opposite to the side facing the insulating layer 113 is not particularly limited.
The surface roughness of the heat radiating member 115 facing the insulating layer 113 and the surface roughness of the heat radiating member 115 facing the insulating layer 113 are the surfaces of the circuit 112 facing the insulating layer 113. The roughness and the surface roughness on the side opposite to the side facing the insulating layer 113 of the circuit 112 can be measured in the same manner.
 回路基板としての放熱性の観点から、回路112及び放熱部材115の平均厚さの合計は、600μm以上であることが好ましく、回路の厚さを利用した放熱性及び放熱部材の熱容量を利用した放熱性を得る観点から、1200μm以上であることがより好ましく、より効率の良い放熱性を得る観点から、4000μm以上であることがさらに好ましい。一方、小型及び低背化の観点から、回路112及び放熱部材115の平均厚さの合計は10cm以下であることが好ましく、10000μm以下であることがより好ましく、6000μm以下であることがさらに好ましい。 From the viewpoint of heat dissipation as a circuit board, the total average thickness of the circuit 112 and the heat dissipation member 115 is preferably 600 μm or more, and heat dissipation using the thickness of the circuit and heat dissipation using the heat capacity of the heat dissipation member are used. From the viewpoint of obtaining properties, it is more preferably 1200 μm or more, and further preferably 4000 μm or more from the viewpoint of obtaining more efficient heat dissipation. On the other hand, from the viewpoint of miniaturization and reduction in height, the total average thickness of the circuit 112 and the heat radiating member 115 is preferably 10 cm or less, more preferably 10,000 μm or less, and further preferably 6000 μm or less.
 放熱性をより効率的に実現する観点から、回路112の平均厚さの放熱部材115の平均厚さに対する比(回路/放熱部材)は、1.0~30であることが好ましく、1.0~5.0であることがより好ましく、1.0~3.0であることがさらに好ましい。 From the viewpoint of more efficiently realizing heat dissipation, the ratio of the average thickness of the circuit 112 to the average thickness of the heat dissipation member 115 (circuit / heat dissipation member) is preferably 1.0 to 30, preferably 1.0. It is more preferably ~ 5.0, and even more preferably 1.0 to 3.0.
 回路112の熱膨張率と放熱部材115の熱膨張率とは、同じであってもよいし異なっていてもよい。
 なお、回路112又は放熱部材115の熱膨張率とは、回路112又は放熱部材115を構成する材質の熱膨張率をいう。回路112又は放熱部材115が銅で構成されている場合、回路112又は放熱部材115の熱膨張率とは、銅の熱膨張率をいう。
 回路112の熱膨張率の放熱部材115の熱膨張率に対する比(回路/放熱部材)は、0.5~2.0であることが好ましく、0.55~1.8であることがより好ましく、0.6~1.7であることがさらに好ましい。
The coefficient of thermal expansion of the circuit 112 and the coefficient of thermal expansion of the heat radiating member 115 may be the same or different.
The coefficient of thermal expansion of the circuit 112 or the heat radiating member 115 means the coefficient of thermal expansion of the material constituting the circuit 112 or the heat radiating member 115. When the circuit 112 or the heat radiating member 115 is made of copper, the coefficient of thermal expansion of the circuit 112 or the heat radiating member 115 means the coefficient of thermal expansion of copper.
The ratio of the coefficient of thermal expansion of the circuit 112 to the coefficient of thermal expansion of the heat dissipation member 115 (circuit / heat dissipation member) is preferably 0.5 to 2.0, more preferably 0.55 to 1.8. , 0.6 to 1.7, more preferably.
 回路112と放熱部材115との間の破壊電圧は、2.5kV以上であることが好ましく、3.0kV以上であることがより好ましく、3.5kV以上であることがさらに好ましい。
 回路112と放熱部材115との間の破壊電圧は、回路と放熱部材との間に100V/秒で印加して行き、短絡したときの電位差を測定することによって得られる値である。
The breaking voltage between the circuit 112 and the heat radiating member 115 is preferably 2.5 kV or more, more preferably 3.0 kV or more, and even more preferably 3.5 kV or more.
The breaking voltage between the circuit 112 and the heat radiating member 115 is a value obtained by applying the breaking voltage between the circuit and the heat radiating member at 100 V / sec and measuring the potential difference when a short circuit occurs.
 回路112と放熱部材115との間の部分放電開始電圧は、2.5kV以上であることが好ましく、3.0kV以上であることがより好ましく、3.5kV以上であることがさらに好ましい。
 回路112と放熱部材115との間の部分放電開始電圧は、測定規格 IEC 60664-1の方法により測定された値をいう。
The partial discharge start voltage between the circuit 112 and the heat radiating member 115 is preferably 2.5 kV or more, more preferably 3.0 kV or more, and even more preferably 3.5 kV or more.
The partial discharge start voltage between the circuit 112 and the heat radiating member 115 refers to a value measured by the method of the measurement standard IEC 60664-1.
 本開示の第八実施形態の回路基板の製造方法は、特に限定されるものではなく、従来から公知の方法を用いることができる。
 樹脂シートを用いる方法として、例えば、一対の金属板の間に樹脂シートを配置し、必要に応じて硬化処理を行って樹脂シートを絶縁層113とし、次いで、エッチング等により一対の金属板の一方に回路112をパターニングする方法;仮支持体上に配置した金属板をエッチング等によりパターニングして回路112とし、この回路112と放熱部材115を構成する金属板との間に樹脂シートを配置し、仮支持体を除去し、必要に応じて硬化処理を行って樹脂シートを絶縁層113とする方法等が挙げられる。
 また、液状樹脂組成物を用いる方法としては、例えば、金属板の表面に液状樹脂組成物を付与し、乾燥して樹脂組成物層とした後、樹脂組成物層上に金属板を配置し、必要に応じて硬化処理を行って樹脂組成物層を絶縁層113とし、次いで、エッチング等により一対の金属板の一方に回路112をパターニングする方法等が挙げられる。
 さらには、樹脂シートを用いる方法として、放熱部材115上に配置された樹脂シートの表面に、打抜き、切削等の公知の方法によって形成された回路112を配置し、必要に応じて硬化処理を行って樹脂シートを絶縁層113とする方法を用いてもよい。
The method for manufacturing the circuit board of the eighth embodiment of the present disclosure is not particularly limited, and a conventionally known method can be used.
As a method of using a resin sheet, for example, a resin sheet is arranged between a pair of metal plates, and if necessary, a curing treatment is performed to form the resin sheet as an insulating layer 113, and then a circuit is formed on one of the pair of metal plates by etching or the like. Method of patterning 112; A metal plate arranged on a temporary support is patterned by etching or the like to form a circuit 112, and a resin sheet is arranged between the circuit 112 and a metal plate constituting the heat radiating member 115 to temporarily support the circuit 112. Examples thereof include a method of removing the body and performing a curing treatment as necessary to form the resin sheet as the insulating layer 113.
Further, as a method of using the liquid resin composition, for example, the liquid resin composition is applied to the surface of the metal plate, dried to form a resin composition layer, and then the metal plate is arranged on the resin composition layer. If necessary, a curing treatment is performed to form the resin composition layer as the insulating layer 113, and then the circuit 112 is patterned on one of the pair of metal plates by etching or the like.
Further, as a method using a resin sheet, a circuit 112 formed by a known method such as punching or cutting is arranged on the surface of the resin sheet arranged on the heat radiating member 115, and curing treatment is performed as necessary. A method of using the resin sheet as the insulating layer 113 may be used.
 液状樹脂組成物を金属板の表面に付与する方法は特に制限されない。例えば、ディスペンス方式、スプレー方式、グラビア方式、スクリーン印刷方式、メタルマスクを用いたスクリーン印刷方式、転写方式等を用いることができる。 The method of applying the liquid resin composition to the surface of the metal plate is not particularly limited. For example, a dispense method, a spray method, a gravure method, a screen printing method, a screen printing method using a metal mask, a transfer method and the like can be used.
 液状樹脂組成物は、少なくとも金属板に付与する時点において液状であればよい。液状樹脂組成物の粘度は特に制限されず、例えば、金属板に付与する際の粘度が10Pa・s以下であることが好ましい。液状樹脂組成物の粘度は、液状樹脂組成物を金属板に付与する際の温度(例えば、18℃~23℃のいずれか)において、E型粘度計(例えば、東機産業株式会社、TV-33)を用いて5回転/分(rpm)で測定される値とする。 The liquid resin composition may be liquid at least at the time of application to the metal plate. The viscosity of the liquid resin composition is not particularly limited, and for example, the viscosity when applied to a metal plate is preferably 10 Pa · s or less. The viscosity of the liquid resin composition is determined by an E-type viscometer (for example, Toki Sangyo Co., Ltd., TV- It is a value measured at 5 rotations / minute (rpm) using 33).
 金属板と樹脂シートとの密着性を高める観点からは、一対の金属板の間に樹脂シートを配置する際に加熱及び加圧の少なくとも一方を行うことが好ましく、双方を行うことがより好ましい。加熱の温度は特に制限されず、例えば、50℃~250℃の範囲から選択することができる。加圧の圧力は特に制限されず、例えば、0.1MPa~50MPaの範囲から選択することができる。 From the viewpoint of enhancing the adhesion between the metal plate and the resin sheet, it is preferable to perform at least one of heating and pressurization when arranging the resin sheet between the pair of metal plates, and it is more preferable to perform both. The heating temperature is not particularly limited and can be selected from, for example, the range of 50 ° C. to 250 ° C. The pressurizing pressure is not particularly limited and can be selected from, for example, the range of 0.1 MPa to 50 MPa.
<半導体装置>
 本開示の半導体装置は、本開示の第八実施形態の回路基板と半導体素子とを備える。
 半導体素子としては、能動素子、受動素子等の素子が挙げられる。能動素子としては、半導体チップ、トランジスタ、ダイオード、サイリスタ等が挙げられる。受動素子としては、コンデンサ、抵抗体、コイル等が挙げられる。また、これらの能動素子、受動素子等の素子を複数個内蔵しモジュール化した電子部品にも適用できる。
<Semiconductor device>
The semiconductor device of the present disclosure includes the circuit board and the semiconductor element of the eighth embodiment of the present disclosure.
Examples of semiconductor elements include elements such as active elements and passive elements. Examples of active elements include semiconductor chips, transistors, diodes, thyristors and the like. Examples of the passive element include a capacitor, a resistor, a coil and the like. It can also be applied to electronic components that are modularized by incorporating a plurality of elements such as these active elements and passive elements.
 本実施形態における回路基板及び半導体装置は、大電流化に適しており、絶縁信頼性及び放熱性に優れる傾向にあることから、IGBT(Insulated Gate Bipolar Transistor;絶縁ゲートバイポーラトランジスタ)等のパワー半導体パッケージの用途に好適に用いることができる。 Since the circuit board and the semiconductor device in this embodiment are suitable for increasing the current and tend to be excellent in insulation reliability and heat dissipation, a power semiconductor package such as an IGBT (Insulated Gate Bipolar Transistor; Insulated Gate Bipolar Transistor) Can be suitably used for the above-mentioned applications.
<第八実施形態の回路シート>
 本開示の第八実施形態の回路シートは、複数の回路と、前記複数の回路の間に設けられており、前記回路において、素子が搭載される素子実装面の少なくとも一部及び前記素子実装面とは反対側の面の少なくとも一部が露出するように、前記複数の回路の相対位置を保持する絶縁部と、を有し、前記素子実装面とは反対側における前記絶縁部の表面は、前記回路の前記素子実装面とは反対側の面よりも前記素子実装面側に凹んでいる、回路シートである。
 素子実装面とは反対側における絶縁部の表面は、回路の素子実装面とは反対側の面よりも素子実装面側に凹んでいるため、回路シートにおける素子実装面とは反対側に絶縁層を接着させる際に、回路シートと絶縁部との間の気体が前述の凹んでいる部分を介して回路シートの外側に逃げていくため、回路シートと絶縁部との界面に気泡がトラップされることが抑制される。これにより、回路基板における部分放電の発生、耐絶縁性の低下等を抑制できる。
<Circuit sheet of the eighth embodiment>
The circuit sheet of the eighth embodiment of the present disclosure is provided between a plurality of circuits and the plurality of circuits, and in the circuit, at least a part of an element mounting surface on which an element is mounted and the element mounting surface. The surface of the insulating portion on the side opposite to the element mounting surface has an insulating portion that holds relative positions of the plurality of circuits so that at least a part of the surface on the opposite side is exposed. A circuit sheet that is recessed toward the element mounting surface side of the circuit on the side opposite to the element mounting surface.
Since the surface of the insulating portion on the side opposite to the element mounting surface is recessed toward the element mounting surface rather than the surface opposite to the element mounting surface of the circuit, the insulating layer is on the side opposite to the element mounting surface in the circuit sheet. The gas between the circuit sheet and the insulating part escapes to the outside of the circuit sheet through the recessed portion, so that air bubbles are trapped at the interface between the circuit sheet and the insulating part. Is suppressed. As a result, it is possible to suppress the occurrence of partial discharge on the circuit board, deterioration of insulation resistance, and the like.
 絶縁部の表面と、回路の素子実装面とは反対側の面との距離の最大値は、絶縁層と絶縁部との接着性の観点から、20μm以下であることが好ましく、15μm以下であることがより好ましい。
 前述の距離の最大値は、回路シートと絶縁部との界面に気泡がトラップされることを好適に抑制する観点から、1μm以上であることが好ましい。
 前述の距離の最大値は、例えば、エッチング処理等により回路の表面を除去したり、ブラスト処理等により回路の表面よりも絶縁部の表面を優先的に除去したりことで調節してもよい。
The maximum value of the distance between the surface of the insulating portion and the surface opposite to the element mounting surface of the circuit is preferably 20 μm or less, preferably 15 μm or less, from the viewpoint of the adhesiveness between the insulating layer and the insulating portion. Is more preferable.
The maximum value of the above-mentioned distance is preferably 1 μm or more from the viewpoint of preferably suppressing trapping of air bubbles at the interface between the circuit sheet and the insulating portion.
The maximum value of the above-mentioned distance may be adjusted by, for example, removing the surface of the circuit by etching treatment or the like, or removing the surface of the insulating portion preferentially over the surface of the circuit by blasting treatment or the like.
 本開示の回路シートの構成の一例について、図面を参照して説明する。
 図9Aに示すように、回路シート230は、回路121と、回路121の間に設けられる絶縁部122と、を備え、素子実装面とは反対側における絶縁部122の表面は、回路121の素子実装面とは反対側の面よりも素子実装面側に凹んでいる。
An example of the configuration of the circuit sheet of the present disclosure will be described with reference to the drawings.
As shown in FIG. 9A, the circuit sheet 230 includes a circuit 121 and an insulating portion 122 provided between the circuits 121, and the surface of the insulating portion 122 on the side opposite to the element mounting surface is an element of the circuit 121. It is recessed toward the element mounting surface rather than the surface opposite to the mounting surface.
 回路シート230は、回路121の周囲が絶縁部122に覆われており、回路シート230の外周に絶縁部122が位置している。これにより、回路シート230と絶縁部122との間の気体が前述の凹んでいる部分を介して回路シート230の外側に好適に逃げていくため、回路シート230と絶縁部122との界面に気泡がトラップされることが好適に抑制される。 In the circuit sheet 230, the periphery of the circuit 121 is covered with the insulating portion 122, and the insulating portion 122 is located on the outer periphery of the circuit sheet 230. As a result, the gas between the circuit sheet 230 and the insulating portion 122 preferably escapes to the outside of the circuit sheet 230 through the recessed portion described above, so that air bubbles are generated at the interface between the circuit sheet 230 and the insulating portion 122. Is preferably suppressed from being trapped.
 第八実施形態の回路シートの好ましい形態、第八実施形態の回路シートを含む回路基板、及び第八実施形態の回路シートを用いた回路基板の製造方法については、前述の各実施形態と同様であるため、その説明を省略する。 The preferred embodiment of the circuit sheet of the eighth embodiment, the circuit board including the circuit sheet of the eighth embodiment, and the method of manufacturing the circuit board using the circuit sheet of the eighth embodiment are the same as those of the above-described embodiments. Therefore, the description thereof will be omitted.
<第九実施形態の回路シート>
 本開示の第九実施形態の回路シートは、複数の回路と、前記複数の回路の間に設けられており、前記回路において、発熱体搭載面の少なくとも一部及び前記発熱体搭載面とは反対側の面の少なくとも一部が露出するように、前記複数の回路の相対位置を保持する絶縁部と、を有し、前記回路において、前記発熱体搭載面とは反対側の面の高さのばらつきが、平面方向10mmあたり40μm以下である、回路シートである。
 本開示の回路シートは、発熱体搭載面とは反対側の面の高さのばらつきが、平面方向10mmあたり40μm以下であるため、回路における発熱体搭載面とは反対側の面の高さのバラつきが抑制されている。これにより、回路シートの反りも抑制されており、例えば、回路シートと絶縁層とを接着して回路基板を製造する際に、回路シートの反りに起因した割れの発生、界面の剥離等を抑制することができる。
<Circuit sheet of the ninth embodiment>
The circuit sheet of the ninth embodiment of the present disclosure is provided between a plurality of circuits and the plurality of circuits, and in the circuit, at least a part of the heating element mounting surface and opposite to the heating element mounting surface. It has an insulating portion that holds the relative positions of the plurality of circuits so that at least a part of the side surface is exposed, and the height of the surface of the circuit opposite to the heating element mounting surface. A circuit sheet having a variation of 40 μm or less per 10 mm in the plane direction.
In the circuit sheet of the present disclosure, the height variation of the surface opposite to the heating element mounting surface is 40 μm or less per 10 mm in the plane direction, so that the height of the surface opposite to the heating element mounting surface in the circuit is Variations are suppressed. As a result, the warp of the circuit sheet is also suppressed. For example, when the circuit board and the insulating layer are bonded to each other to manufacture a circuit board, cracks due to the warp of the circuit sheet and peeling of the interface are suppressed. can do.
 回路基板を製造する際における回路シートの反りに起因した割れの発生、界面の剥離等を好適に抑制する観点から、回路において、発熱体搭載面とは反対側の面の高さのばらつきは、平面方向10mmあたり、30μm以下であることが好ましく、20μm以下であることがより好ましい。回路シートの生産性の観点から、前述の高さのばらつきは、平面方向10mmあたり、5μm以上であることが好ましい。 From the viewpoint of suitably suppressing the occurrence of cracks due to the warp of the circuit sheet, peeling of the interface, etc. in the manufacture of the circuit board, the variation in the height of the surface opposite to the heating element mounting surface in the circuit is It is preferably 30 μm or less, and more preferably 20 μm or less per 10 mm in the plane direction. From the viewpoint of the productivity of the circuit sheet, the above-mentioned height variation is preferably 5 μm or more per 10 mm in the plane direction.
 本開示の回路シートの構成の一例について、図面を参照して説明する。
 図10Aに示すように、本開示の回路シート240は、複数の回路131と、複数の回路131の相対位置を保持する絶縁部132と、を有する。さらに、回路131において、発熱体搭載面とは反対側の面(すなわち、図10Aの鉛直下側の面)の高さのばらつきは、平面方向10mmあたり40μm以下である。例えば、発熱体搭載面とは反対側の面の高さのばらつきは、平面方向LmmあたりHμmである場合、H(μm)/L(mm)≦40(μm)/10(mm)を満たす。
An example of the configuration of the circuit sheet of the present disclosure will be described with reference to the drawings.
As shown in FIG. 10A, the circuit sheet 240 of the present disclosure includes a plurality of circuits 131 and an insulating portion 132 that holds the relative positions of the plurality of circuits 131. Further, in the circuit 131, the height variation of the surface opposite to the heating element mounting surface (that is, the surface on the vertically lower side in FIG. 10A) is 40 μm or less per 10 mm in the plane direction. For example, the variation in height of the surface opposite to the heating element mounting surface satisfies H (μm) / L (mm) ≦ 40 (μm) / 10 (mm) when H μm per L mm in the plane direction.
 第九実施形態の回路シートの好ましい形態、第九実施形態の回路シートを含む回路基板、及び第九実施形態の回路シートを用いた回路基板の製造方法については、前述の各実施形態と同様であるため、その説明を省略する。 The preferred embodiment of the circuit sheet of the ninth embodiment, the circuit board including the circuit sheet of the ninth embodiment, and the method of manufacturing the circuit board using the circuit sheet of the ninth embodiment are the same as those of the above-described embodiments. Therefore, the description thereof will be omitted.
<第十実施形態の回路シート>
 本開示の第十実施形態の回路シートは、複数の回路と、前記複数の回路の間に設けられており、前記回路において、発熱体搭載面の少なくとも一部及び前記発熱体搭載面とは反対側の面の少なくとも一部が露出するように、前記複数の回路の相対位置を保持する絶縁部と、を有し、前記回路の前記発熱体搭載面の高さのばらつきが、平面方向10mmあたり40μm以下である、回路シートである。
 本開示の回路シートは、回路の発熱体搭載面の高さのばらつきが、平面方向10mmあたり40μm以下であるため、回路における発熱体搭載面の高さのバラつきが抑制されている。これにより、発熱体の配置、発熱体とボンディングワイヤとの接続等が容易となり、素子実装の作業性が向上する。
<Circuit sheet of the tenth embodiment>
The circuit sheet of the tenth embodiment of the present disclosure is provided between a plurality of circuits and the plurality of circuits, and in the circuit, at least a part of the heating element mounting surface and opposite to the heating element mounting surface. It has an insulating portion that holds the relative positions of the plurality of circuits so that at least a part of the side surface is exposed, and the variation in the height of the heating element mounting surface of the circuit is per 10 mm in the plane direction. It is a circuit sheet having a size of 40 μm or less.
In the circuit sheet of the present disclosure, since the variation in the height of the heating element mounting surface of the circuit is 40 μm or less per 10 mm in the plane direction, the variation in the height of the heating element mounting surface in the circuit is suppressed. This facilitates the arrangement of the heating element, the connection between the heating element and the bonding wire, and the like, and improves the workability of element mounting.
 素子実装の作業性を好適に抑制する観点から、回路において、発熱体搭載面の高さのばらつきは、平面方向10mmあたり、30μm以下であることが好ましく、20μm以下であることがより好ましい。回路シートの生産性の観点から、前述の高さのばらつきは、平面方向10mmあたり、5μm以上であることが好ましい。 From the viewpoint of preferably suppressing the workability of element mounting, the variation in the height of the heating element mounting surface in the circuit is preferably 30 μm or less, and more preferably 20 μm or less per 10 mm in the plane direction. From the viewpoint of the productivity of the circuit sheet, the above-mentioned height variation is preferably 5 μm or more per 10 mm in the plane direction.
 本開示の回路シートの構成の一例について、図面を参照して説明する。
 図11Aに示すように、本開示の回路シート250は、複数の回路141と、複数の回路141の相対位置を保持する絶縁部142と、を有する。さらに、回路141において、発熱体搭載面(すなわち、図11Aの鉛直上側の面)の高さのばらつきは、平面方向10mmあたり40μm以下である。例えば、発熱体搭載面の高さのばらつきは、平面方向L’mmあたりH’μmである場合、H’(μm)/L’(mm)≦40(μm)/10(mm)を満たす。
An example of the configuration of the circuit sheet of the present disclosure will be described with reference to the drawings.
As shown in FIG. 11A, the circuit sheet 250 of the present disclosure includes a plurality of circuits 141 and an insulating portion 142 that holds the relative positions of the plurality of circuits 141. Further, in the circuit 141, the variation in height of the heating element mounting surface (that is, the vertically upper surface in FIG. 11A) is 40 μm or less per 10 mm in the plane direction. For example, when the height variation of the heating element mounting surface is H'μm per L'mm in the plane direction, H'(μm) / L'(mm) ≦ 40 (μm) / 10 (mm) is satisfied.
 第十実施形態の回路シートの好ましい形態、第十実施形態の回路シートを含む回路基板、及び第十実施形態の回路シートを用いた回路基板の製造方法については、前述の各実施形態と同様であるため、その説明を省略する。 The preferred embodiment of the circuit sheet of the tenth embodiment, the circuit board including the circuit sheet of the tenth embodiment, and the method of manufacturing the circuit board using the circuit sheet of the tenth embodiment are the same as those of the above-described embodiments. Therefore, the description thereof will be omitted.
<第十一実施形態のケース付き回路シート>
 本開示の第十一実施形態のケース付き回路シートは、複数の回路と、前記複数の回路の一方の面側に設けられた、前記複数の回路の相対位置を保持する保持部と、保持部上に設けられ、前記回路の一方の面側から見て、前記複数の回路を囲むケースと、を有し、前記複数の回路の他方の面は露出している。
<Circuit sheet with case of the eleventh embodiment>
The circuit sheet with a case of the eleventh embodiment of the present disclosure includes a plurality of circuits, a holding unit provided on one surface side of the plurality of circuits, and a holding unit for holding the relative positions of the plurality of circuits. It has a case provided on the top and surrounds the plurality of circuits when viewed from one surface side of the circuits, and the other surface of the plurality of circuits is exposed.
 複数の回路と、複数の回路の一方の面側に設けられた、複数の回路の相対位置を保持する保持部(例えば、保持シート)と、を備える回路シートは、変形しやすく、複数の回路を放熱部材上に配置された絶縁層等と貼り付ける際のハンドリング性が悪いという問題がある。一方、本開示のケース付き回路シートは、回路シートの発熱体搭載面上に複数の回路を囲むケースが配置されていることで、回路シートが変形しにくく、放熱部材上に配置された絶縁層と、ケース付き回路シートとを容易に貼り付けることができ、ハンドリング性に優れる。 A circuit sheet including a plurality of circuits and a holding unit (for example, a holding sheet) for holding relative positions of the plurality of circuits provided on one surface side of the plurality of circuits is easily deformed, and the plurality of circuits There is a problem that the handleability is poor when the is attached to the insulating layer or the like arranged on the heat radiating member. On the other hand, in the circuit sheet with a case of the present disclosure, since a case surrounding a plurality of circuits is arranged on the heating element mounting surface of the circuit sheet, the circuit sheet is not easily deformed and an insulating layer arranged on the heat radiating member. And the circuit sheet with a case can be easily attached, and the handling property is excellent.
 本開示のケース付き回路シートについて、保持部は複数の回路から剥離可能であることが好ましい。これにより、ケース付き回路シートを放熱部材上に配置された絶縁層に貼り付けた後で、複数の回路の一方の面側に設けられた保持部を複数の回路から剥離することができ、次いで、複数の回路の一方の面側に発熱体等を搭載したり、ワイヤボンディング等を行ったり、搭載させた発熱体を封止材料で封止したりしてもよい。 Regarding the circuit sheet with a case of the present disclosure, it is preferable that the holding portion can be peeled off from a plurality of circuits. As a result, after the circuit sheet with the case is attached to the insulating layer arranged on the heat radiating member, the holding portion provided on one surface side of the plurality of circuits can be peeled off from the plurality of circuits. , A heating element or the like may be mounted on one surface side of a plurality of circuits, wire bonding or the like may be performed, or the mounted heating element may be sealed with a sealing material.
 複数の回路の一方の面側に設けられた保持部を複数の回路から剥離する場合、保持部とともにケースも剥離してもよく、ケースが設けられた部分の保持部をケース付き回路シートに残存させて複数の回路の一方の面上に設けられた保持部を複数の回路から剥離してもよい。 When the holding portion provided on one surface side of a plurality of circuits is peeled off from the plurality of circuits, the case may be peeled off together with the holding portion, and the holding portion of the portion provided with the case remains on the circuit sheet with the case. The holding portion provided on one surface of the plurality of circuits may be separated from the plurality of circuits.
 複数の回路の一方の面の少なくとも一部は、発熱体が搭載される発熱体搭載面であることが好ましい。また、複数の回路の間には絶縁部が設けられていてもよく、絶縁部が設けられていなくてもよい。 It is preferable that at least a part of one surface of the plurality of circuits is a heating element mounting surface on which the heating element is mounted. Further, an insulating portion may be provided between the plurality of circuits, and the insulating portion may not be provided.
<第九実施形態の回路基板の製造方法>
 本開示の第九実施形態の回路基板の製造方法は、本開示の第十一実施形態のケース付き回路シートと、前記ケース付き回路シートにおける前記回路の露出した他方の面側に配置された絶縁層と、放熱部材と、をこの順に配置した状態の積層体を加圧する工程を有する。前述の積層体を加圧する方法は特に制限されず、回路基板の製造工程において一般的に行われる方法から選択でき、他の実施形態に記載の方法を適宜採用してもよい。
<Manufacturing method of circuit board of the ninth embodiment>
The method for manufacturing a circuit board according to a ninth embodiment of the present disclosure includes the cased circuit sheet of the eleventh embodiment of the present disclosure and the insulation arranged on the exposed other surface side of the circuit in the cased circuit sheet. It has a step of pressurizing a laminated body in which a layer and a heat radiating member are arranged in this order. The method of pressurizing the above-mentioned laminate is not particularly limited, and can be selected from the methods generally performed in the manufacturing process of the circuit board, and the method described in other embodiments may be appropriately adopted.
 本開示の回路基板の製造方法では、保持部は、複数の回路から剥離可能であり、加圧する工程の後、複数の回路の一方の面から保持部を剥離する工程をさらに有することが好ましい。これにより、複数の回路の一方の面側に発熱体等を搭載したり、ワイヤボンディング等を行ったりすることができ、その後、搭載させた発熱体等を封止材料で封止したりすることができる。 In the method for manufacturing a circuit board of the present disclosure, the holding portion can be peeled from a plurality of circuits, and it is preferable to further have a step of peeling the holding portion from one surface of the plurality of circuits after the step of pressurizing. As a result, a heating element or the like can be mounted on one surface side of a plurality of circuits, wire bonding or the like can be performed, and then the mounted heating element or the like can be sealed with a sealing material. Can be done.
 次に、実施例によって本発明を具体的に説明するが、本発明の範囲は実施例に限定されるものではない。 Next, the present invention will be specifically described with reference to Examples, but the scope of the present invention is not limited to Examples.
[実施例1A]
(回路シートの作製)
 厚さ2.0mmの銅板(型番;C1100 1/4H)を、塩化第二銅水溶液を用いたエッチング加工によって図1の回路を形成した。回路の周囲には幅510μmの段差を設けた。回路の内部に設けられた絶縁部と回部の外部に設けられた絶縁部とを接続させるための段差(幅1.0mm)を設けた。これら段差の厚さは1mmであった。回路の側面及び段差のRaはそれぞれ2.0μmであった。
 段差が形成された回路の素子実装面に25μmのポリイミドフィルム(弾性率;5GPa)と粘着層(厚さ;10μm)とが積層された保護フィルムを用いて貼り付け、保護フィルム付きの回路シートとした。
 次いで、トランスファー成型機を用いて、エポキシ系の絶縁材料(日立化成株式会社)を用いて成型圧力7MPa、硬化時間300秒の条件でトランスファー成型を行った。絶縁部の厚さは1.99mmであった。
[Example 1A]
(Making a circuit sheet)
The circuit of FIG. 1 was formed by etching a copper plate (model number; C1100 1 / 4H) having a thickness of 2.0 mm with an aqueous solution of cupric chloride. A step with a width of 510 μm was provided around the circuit. A step (width 1.0 mm) was provided for connecting the insulating portion provided inside the circuit and the insulating portion provided outside the rotating portion. The thickness of these steps was 1 mm. Ra on the side surface and the step of the circuit was 2.0 μm, respectively.
A 25 μm polyimide film (elastic modulus; 5 GPa) and an adhesive layer (thickness: 10 μm) are laminated on the element mounting surface of the circuit in which a step is formed, and the circuit sheet with the protective film is attached. bottom.
Next, using a transfer molding machine, transfer molding was performed using an epoxy-based insulating material (Hitachi Kasei Co., Ltd.) under the conditions of a molding pressure of 7 MPa and a curing time of 300 seconds. The thickness of the insulating portion was 1.99 mm.
(評価)
 得られた回路シートの回路と絶縁部との境界を400倍の顕微鏡で観察したところ良好に接着していた。回路シートを封止するシリコンゲルの代替として水を用い、回路と絶縁部との境界から気泡が発生するか否か評価した。具体的には、回路を水中に投入した後、水を80℃に加熱したところ、回路と絶縁部との境界から気泡は発生しなかった。
(evaluation)
When the boundary between the circuit of the obtained circuit sheet and the insulating portion was observed with a microscope of 400 times, it adhered well. Water was used as a substitute for the silicon gel that seals the circuit sheet, and it was evaluated whether or not bubbles were generated from the boundary between the circuit and the insulating part. Specifically, when the circuit was put into water and then the water was heated to 80 ° C., no bubbles were generated from the boundary between the circuit and the insulating portion.
(回路基板の作製)
 上記で得られた回路シートを乾燥させ、回路シートの一方の面に保護フィルムを再度貼り付け、粗化液(マクダーミッド・パフォーマンス・ソリューションズ社製、商品名;マルチボンド150)を用いて、回路シートの他方の面のRaが1.0μmになるように粗化処理を行った。その後、保護フィルムを回路シートから剥離した。保護フィルムが剥離された面のRaを測定したところ、0.2μmであった。
 次に、放熱部材として厚さ2.0mmの銅板(型番;C1100 1/4H)を準備し、この銅板の一方の面に対して上記と同様の粗化処理を施した。粗化処理後にて、銅板の一方の面のRaは1.0μmであった。
 放熱部材、絶縁層形成用フィルム(日立化成株式会社製、HT1500)、保護フィルムを剥離除去した回路シートを、放熱部材における粗化処理した面が絶縁層形成用フィルム側になるようにこの順で積層した後、180℃、3時間、4MPaの条件で加圧圧着し、回路基板を作製した。
(Manufacturing of circuit board)
The circuit sheet obtained above is dried, a protective film is reattached to one surface of the circuit sheet, and a roughening solution (manufactured by MacDermid Performance Solutions, trade name; Multibond 150) is used to reattach the circuit sheet. The roughening treatment was performed so that Ra on the other surface of the above was 1.0 μm. Then, the protective film was peeled off from the circuit sheet. The Ra of the surface from which the protective film was peeled off was measured and found to be 0.2 μm.
Next, a 2.0 mm thick copper plate (model number; C1100 1 / 4H) was prepared as a heat radiating member, and one surface of the copper plate was subjected to the same roughening treatment as described above. After the roughening treatment, Ra on one surface of the copper plate was 1.0 μm.
The heat-dissipating member, the film for forming the insulating layer (manufactured by Hitachi Kasei Co., Ltd., HT1500), and the circuit sheet from which the protective film has been peeled off are removed in this order so that the surface of the heat-dissipating member that has been roughened is on the side of the film for forming the insulating layer. After laminating, pressure-bonding was performed under the conditions of 180 ° C. for 3 hours and 4 MPa to prepare a circuit board.
(評価)
 作製した回路基板を290℃10分のリフロー試験を実施したところ、回路と絶縁部との剥離、及び、回路の底面と絶縁層との剥離はともに見られなかった。作製した回路基板では素子実装も良好に行うことができた。回路をシリコンゲルの代替である水の中に投入し、80℃に加熱したところ、回路と絶縁部との境界から気泡は発生しなかった。
 回路と放熱部材との間に1.0kVの電圧をかけたところ、絶縁破壊することなく耐絶縁性が良好であった。隣接する回路間に1.0kVの電圧をかけたところ、絶縁破壊することなく耐絶縁性が良好であった。
(evaluation)
When the produced circuit board was subjected to a reflow test at 290 ° C. for 10 minutes, neither peeling between the circuit and the insulating portion and peeling between the bottom surface of the circuit and the insulating layer were observed. In the manufactured circuit board, the element mounting could be performed well. When the circuit was put into water, which is a substitute for silicon gel, and heated to 80 ° C., no bubbles were generated from the boundary between the circuit and the insulating part.
When a voltage of 1.0 kV was applied between the circuit and the heat radiating member, the insulation resistance was good without breaking the insulation. When a voltage of 1.0 kV was applied between adjacent circuits, the insulation resistance was good without breaking the insulation.
[実施例2A]
 実施例1Aにおいて回路の周囲には幅1000μmの段差を設けた。さらに、回路の内部に設けられた絶縁部と回部の外部に設けられた絶縁部とを接続させるための段差(幅510μm)を設け、これら段差の厚さを0.5mmとし、回路の側面及び段差のRaをそれぞれ1.0μmとした以外は実施例1Aと同様の方法で回路シートを作製した。
[Example 2A]
In Example 1A, a step with a width of 1000 μm was provided around the circuit. Further, a step (width 510 μm) for connecting the insulating portion provided inside the circuit and the insulating portion provided outside the rotating portion is provided, the thickness of these steps is set to 0.5 mm, and the side surface of the circuit is set. A circuit sheet was produced in the same manner as in Example 1A except that Ra of the step was set to 1.0 μm.
(評価)
 得られた回路シートの回路と絶縁部との境界を400倍の顕微鏡で観察したところ良好に接続していた。回路をシリコンゲルの代替である水の中に投入し、80℃に加熱したところ、回路と絶縁部との境界から気泡が発生しなかった。
(evaluation)
When the boundary between the circuit of the obtained circuit sheet and the insulating part was observed with a microscope of 400 times, it was found to be well connected. When the circuit was put into water, which is a substitute for silicon gel, and heated to 80 ° C., no bubbles were generated from the boundary between the circuit and the insulating part.
(回路基板の作製及び評価)
 作製した回路シートを用い実施例1Aと同様の方法で回路基板を作製した。作製した回路基板では素子実装も良好に行うことができた。回路をシリコンゲルの代替である水の中に投入し、80℃に加熱したところ、回路と絶縁部との境界から気泡は発生しなかった。
 回路と放熱部材との間に1.0kVの電圧をかけたところ、絶縁破壊することなく耐絶縁性が良好であった。隣接する回路間に1.0kVの電圧をかけたところ、絶縁破壊することなく耐絶縁性が良好であった。
(Manufacturing and evaluation of circuit boards)
Using the prepared circuit sheet, a circuit board was prepared in the same manner as in Example 1A. In the manufactured circuit board, the element mounting could be performed well. When the circuit was put into water, which is a substitute for silicon gel, and heated to 80 ° C., no bubbles were generated from the boundary between the circuit and the insulating part.
When a voltage of 1.0 kV was applied between the circuit and the heat radiating member, the insulation resistance was good without breaking the insulation. When a voltage of 1.0 kV was applied between adjacent circuits, the insulation resistance was good without breaking the insulation.
[比較例1A]
 実施例1Aにおいて段差を設けなかった以外は実施例1Aと同様の方法で回路シートを作製した。
[Comparative Example 1A]
A circuit sheet was produced in the same manner as in Example 1A except that no step was provided in Example 1A.
(評価)
 得られた回路シートの回路と絶縁部との境界を400倍の顕微鏡で観察したところ回路と絶縁部との境界に剥離が生じていた。回路をシリコンゲルの代替である水の中に投入し、80℃に加熱したところ、回路と絶縁部との境界から気泡が発生した。
(evaluation)
When the boundary between the circuit and the insulating part of the obtained circuit sheet was observed with a microscope of 400 times, peeling occurred at the boundary between the circuit and the insulating part. When the circuit was put into water, which is a substitute for silicon gel, and heated to 80 ° C., bubbles were generated from the boundary between the circuit and the insulating part.
(回路基板の作製及び評価)
 作製した回路シートを用い実施例1Aと同様の方法で回路基板を作製した。作製した回路基板では素子実装を良好に行うことができた一方、回路をシリコンゲルの代替である水の中に投入し、80℃に加熱したところ、回路と絶縁部との境界から気泡が発生した。
 隣接する回路間に1.0kVの電圧をかけたところ、絶縁破壊することはなかったが、0.8kVで部分放電が発生した。回路と放熱部材との間に1.0kVの電圧をかけたところ、0.7kVで絶縁破壊した。回路基板の断面を切断し、切断面を観察したところ、回路と絶縁部との境界付近の絶縁部が破損していた。
(Manufacturing and evaluation of circuit boards)
Using the prepared circuit sheet, a circuit board was prepared in the same manner as in Example 1A. While the device could be mounted well on the manufactured circuit board, when the circuit was put into water, which is a substitute for silicon gel, and heated to 80 ° C, bubbles were generated from the boundary between the circuit and the insulating part. bottom.
When a voltage of 1.0 kV was applied between adjacent circuits, dielectric breakdown did not occur, but partial discharge occurred at 0.8 kV. When a voltage of 1.0 kV was applied between the circuit and the heat radiating member, dielectric breakdown occurred at 0.7 kV. When the cross section of the circuit board was cut and the cut surface was observed, the insulating part near the boundary between the circuit and the insulating part was damaged.
[実施例1C]
(回路の作製)
 厚さ2.0mmの銅板(型番;C1100 1/4H)に対してエッチング加工によって回路を形成した。
 回路の素子実装面に25μmのポリイミドフィルム(弾性率;5GPa)と粘着層(厚さ;10μm)とが積層された保護フィルムを用いて図3Dの配置で貼り付け、回路を仮固定した。
[Example 1C]
(Circuit fabrication)
A circuit was formed by etching a copper plate (model number; C1100 1 / 4H) having a thickness of 2.0 mm.
A protective film in which a 25 μm polyimide film (elastic modulus; 5 GPa) and an adhesive layer (thickness: 10 μm) were laminated was attached to the element mounting surface of the circuit in the arrangement shown in FIG. 3D, and the circuit was temporarily fixed.
(回路シートの作製)
 トランスファー成型機を用いて、成型圧力7MPa、硬化時間300秒の条件にてエポキシ系の絶縁材料(日立化成株式会社)で回路間を充填するようにトランスファー成型を行った。その後、保護フィルムを剥離し長さ80mm、幅40mmの回路シートを得た。マイクロゲージを用いて4隅及び中央の厚さを測定したところ厚さのばらつきは±5μmであった。
(Making a circuit sheet)
Using a transfer molding machine, transfer molding was performed so as to fill the gaps between circuits with an epoxy-based insulating material (Hitachi Kasei Co., Ltd.) under the conditions of a molding pressure of 7 MPa and a curing time of 300 seconds. Then, the protective film was peeled off to obtain a circuit sheet having a length of 80 mm and a width of 40 mm. When the thicknesses at the four corners and the center were measured using a microgauge, the variation in thickness was ± 5 μm.
(反り量の測定)
 回路シートを平坦面に静置し、高さゲージを用いて、中央の高さと4隅の高さを測定した。この時回路シートは中央部が凸になるような向きで配置している。
 反り量は以下の式にて求め、以下の評価基準にて評価した。
 (反り量)=(中央の高さ)-(4隅の高さ平均)
[評価基準]
A:回路シートの反り量が50μm以下であり、良好
B:回路シートの反り量が50μm超であり、不良
(Measurement of warpage amount)
The circuit sheet was placed on a flat surface, and the height at the center and the heights at the four corners were measured using a height gauge. At this time, the circuit sheet is arranged so that the central portion is convex.
The amount of warpage was calculated by the following formula and evaluated according to the following evaluation criteria.
(Amount of warpage) = (Height at the center)-(Average height at the four corners)
[Evaluation criteria]
A: The amount of warpage of the circuit sheet is 50 μm or less, which is good. B: The amount of warpage of the circuit sheet is more than 50 μm, which is defective.
 実施例1Cにて得られた回路シートの反り量を測定したところ、反り量は30μmであり、反り評価は良好であった。 When the amount of warpage of the circuit sheet obtained in Example 1C was measured, the amount of warpage was 30 μm, and the warp evaluation was good.
[実施例2C~12C]
 実施例1Cにおいて銅板の厚さと回路のパターン形状を表1に示す通りに変更した以外は同様の方法で回路シートを作製した。いずれの実施例においても厚さのばらつきは±5μm以内であった。
 反り評価の結果を表1に示す。
[Examples 2C to 12C]
A circuit sheet was produced in the same manner as in Example 1C except that the thickness of the copper plate and the pattern shape of the circuit were changed as shown in Table 1. In all the examples, the variation in thickness was within ± 5 μm.
The results of the warp evaluation are shown in Table 1.
[比較例1C]
 実施例1Cにおいて、パターン形状を図3Hにした以外は同様の方法で回路シートを作製した。厚さのばらつきは±5μm以内であった。回路シートの反り量は190μmであり、反り評価は不良であった。
[Comparative Example 1C]
In Example 1C, a circuit sheet was produced in the same manner except that the pattern shape was shown in FIG. 3H. The variation in thickness was within ± 5 μm. The amount of warpage of the circuit sheet was 190 μm, and the warp evaluation was poor.
[比較例2C~9C]
 実施例1Cにおいて銅板の厚さと回路のパターン形状を表1に示す通りに変更した以外は同様の方法で回路シートを作製した。いずれの比較例においても厚さのばらつきは±5μm以内であった。
 結果を表1に示す。
[Comparative Examples 2C-9C]
A circuit sheet was produced in the same manner as in Example 1C except that the thickness of the copper plate and the pattern shape of the circuit were changed as shown in Table 1. In all the comparative examples, the variation in thickness was within ± 5 μm.
The results are shown in Table 1.
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
 図3D~図3Gに示す回路シートは、回路31の素子実装面から見て、二つの回路31の間を通り、かつ素子実装面に対して平行である任意の方向の直線上に少なくとも一つの回路31が位置していた。一方、図3H~図3Jに示す回路シートは、回路31の素子実装面から見て、二つの回路31の間を通り、かつ素子実装面に対して平行である少なくとも一つの直線上に回路31が存在しない構成を有していた。
 実施例1C~12Cでは、回路シートが図3D~図3Gに示される何れかの構造を有するため、回路シートの反りの発生を抑制することができた。
The circuit sheet shown in FIGS. 3D to 3G is at least one on a straight line in an arbitrary direction that passes between the two circuits 31 and is parallel to the element mounting surface when viewed from the element mounting surface of the circuit 31. The circuit 31 was located. On the other hand, the circuit sheets shown in FIGS. 3H to 3J pass between the two circuits 31 and are on at least one straight line parallel to the element mounting surface when viewed from the element mounting surface of the circuit 31. Had a configuration that did not exist.
In Examples 1C to 12C, since the circuit sheet has any of the structures shown in FIGS. 3D to 3G, it was possible to suppress the occurrence of warpage of the circuit sheet.
[実施例13C]
 放熱部材として厚さ2.0mmの銅板(型番;C1100 1/4H)の一方面に、絶縁層形成用フィルム(日立化成株式会社、HT1500)を配置し、ラミネータを用いて仮圧着した。さらに絶縁層上に実施例1Cで作製した回路シートを配置し、180℃、3時間、4MPaの条件で加圧圧着した。回路シートの中央部が絶縁層と反対方向に凸になるように回路基板を配置した。
 実施例1Cと同様の方法で放熱部材を含む回路基板の厚さを測定したところばらつきは±5μmであった。実施例1Cと同様の方法で回路基板の反り量を測定したところ、25μmであり、反り評価は良好であった。
[Example 13C]
A film for forming an insulating layer (Hitachi Kasei Co., Ltd., HT1500) was placed on one surface of a 2.0 mm thick copper plate (model number; C1100 1 / 4H) as a heat radiating member, and temporarily crimped using a laminator. Further, the circuit sheet prepared in Example 1C was placed on the insulating layer and pressure-bonded under the conditions of 180 ° C. for 3 hours and 4 MPa. The circuit board was arranged so that the central portion of the circuit sheet was convex in the direction opposite to the insulating layer.
When the thickness of the circuit board including the heat radiating member was measured by the same method as in Example 1C, the variation was ± 5 μm. When the amount of warpage of the circuit board was measured by the same method as in Example 1C, it was 25 μm, and the warp evaluation was good.
[実施例14C、15C]
 実施例13Cにおいて、パターン形状、回路シートの厚さ、及び放熱部材の厚さを表2に示す通りに変更した以外は同様の方法で回路基板を作製した。いずれも厚さばらつきは±5μm以内であった。回路基板の反り量も50μm以下であり、反り評価は良好であった。
[Examples 14C, 15C]
In Example 13C, a circuit board was produced in the same manner except that the pattern shape, the thickness of the circuit sheet, and the thickness of the heat radiating member were changed as shown in Table 2. In each case, the thickness variation was within ± 5 μm. The amount of warpage of the circuit board was also 50 μm or less, and the warp evaluation was good.
[実施例16C]
 実施例13Cにおいて、回路間を絶縁部で充填しなかった以外は同様の方法で回路基板を作製した。回路基板の反り量は22μmであり、反り評価は良好であった。
[Example 16C]
In Example 13C, a circuit board was produced by the same method except that the space between the circuits was not filled with an insulating portion. The amount of warpage of the circuit board was 22 μm, and the warp evaluation was good.
[実施例17C]
 実施例16Cにおいて、パターン形状、回路シートの厚さ、及び放熱部材の厚さを表2に示す通りに変更した以外は同様の方法で回路基板を作製した。回路基板の反りは50μm以下であり、反り評価は良好であった。
[Example 17C]
In Example 16C, a circuit board was produced in the same manner except that the pattern shape, the thickness of the circuit sheet, and the thickness of the heat radiating member were changed as shown in Table 2. The warp of the circuit board was 50 μm or less, and the warp evaluation was good.
[比較例10C~12C]
 実施例13Cにおいて、パターン形状、回路シートの厚さ、及び放熱部材の厚さを表2に示す通りに変更した以外は同様の方法で回路基板を作製した。いずれも厚さばらつきは±5μm以内であったが、回路基板の反りも50μmより大きく、反り評価は不良であった。
[Comparative Examples 10C to 12C]
In Example 13C, a circuit board was produced in the same manner except that the pattern shape, the thickness of the circuit sheet, and the thickness of the heat radiating member were changed as shown in Table 2. In each case, the thickness variation was within ± 5 μm, but the warp of the circuit board was also larger than 50 μm, and the warp evaluation was poor.
[比較例13~15]
 比較例10~12において、回路間を絶縁部で充填しなかった以外は同様の方法で回路基板を作製した。回路基板の反りは50μmより大きく、反り評価は不良であった。さらに、圧着時の圧力による放熱部材の変形も発生していた。なお、絶縁部を設けた比較例では放熱部材の変形は見られなかった。
[Comparative Examples 13 to 15]
In Comparative Examples 10 to 12, circuit boards were produced in the same manner except that the spaces between the circuits were not filled with insulating portions. The warp of the circuit board was larger than 50 μm, and the warp evaluation was poor. Further, the heat radiating member was also deformed due to the pressure during crimping. In the comparative example in which the insulating portion was provided, no deformation of the heat radiating member was observed.
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
 実施例13C~18Cでは、回路シートが図3D~図3Fに示される何れかの構造を有するため、回路基板の反りの発生を抑制することができた。 In Examples 13C to 18C, since the circuit sheet has any of the structures shown in FIGS. 3D to 3F, it was possible to suppress the occurrence of warpage of the circuit board.
<実施例1D>
(回路の作製)
 厚さ2.0mmの銅板(型番;C1100 1/4H)を用いて、プレスによる打ち抜き加工によって幅3.0mm×長さ10mm×高さ2.0mmの回路を形成した。回路の一方の面(素子実装面)は、銅板の切断面に対して直角に交差する平坦面であり、もう一方の面は、コーナー部分の曲率半径が0.03mmであった。
 形成した4つの回路の素子実装面側に、厚さ25μmのポリイミドフィルム(曲げ弾性率;5GPa)と粘着層(厚さ;10μm)とが積層された保護フィルムの粘着層側を貼り付けた。
<Example 1D>
(Circuit fabrication)
A circuit having a width of 3.0 mm, a length of 10 mm, and a height of 2.0 mm was formed by punching with a press using a copper plate having a thickness of 2.0 mm (model number: C1100 1 / 4H). One surface (element mounting surface) of the circuit was a flat surface intersecting the cut surface of the copper plate at a right angle, and the other surface had a radius of curvature of the corner portion of 0.03 mm.
The adhesive layer side of the protective film in which a polyimide film (flexural modulus; 5 GPa) having a thickness of 25 μm and an adhesive layer (thickness: 10 μm) was laminated was attached to the element mounting surface side of the formed four circuits.
(回路シートの作製)
 保護フィルムが貼り付けられた回路の間に絶縁部をトランスファー成型により形成した。具体的には、トランスファー成型機の180℃に加熱した一対の金型A、Bで回路を挟み、金型を平行に保ったまま、回路間および回路の周囲を覆うように、エポキシ系の絶縁材料(日立化成株式会社製)を成型圧力7MPaで充填し、硬化時間300秒で硬化した。その後、保護フィルムを剥離し回路シートを得た。保護フィルムはフィルム状であり、剥離は容易に行えた。回路シートの反りも加圧積層に支障のない程度であった。
(Making a circuit sheet)
An insulating part was formed by transfer molding between the circuits to which the protective film was attached. Specifically, the circuit is sandwiched between a pair of molds A and B heated to 180 ° C. of the transfer molding machine, and epoxy-based insulation is applied so as to cover between the circuits and around the circuit while keeping the molds parallel. The material (manufactured by Hitachi Kasei Co., Ltd.) was filled with a molding pressure of 7 MPa and cured with a curing time of 300 seconds. Then, the protective film was peeled off to obtain a circuit sheet. The protective film was in the form of a film and could be easily peeled off. The warp of the circuit sheet did not interfere with the pressure lamination.
 回路シートの絶縁部と隣接する回路との高低差の最大値d及びd’を高さ測定器で測定し、回路と絶縁部とが厚さ方向において重なる部分の幅を平面測長機で測定した。結果を表3に示す。なお、素子実装面側の重なる部分の幅はほとんど観測できなかったため<1μmとしている。 Measure the maximum values d and d'of the height difference between the insulating part of the circuit sheet and the adjacent circuit with a height measuring device, and measure the width of the part where the circuit and the insulating part overlap in the thickness direction with a plane length measuring machine. bottom. The results are shown in Table 3. Since the width of the overlapping portion on the element mounting surface side could hardly be observed, it is set to <1 μm.
<実施例2D~6D>
 回路の加工方法、回路の厚さ、保護フィルムの厚さおよび曲げ弾性率を表3に記載の通りに変更したこと以外は実施例1Dと同様の方法で回路シートを作製した。実施例2D~6Dのいずれも保護フィルムの剥離は容易に行えた。回路シートの反りも加圧積層に支障のない程度であった。なお、エッチングでの回路形成は、銅板を塩化第二鉄で両面からエッチングすることによって行った。
<Examples 2D to 6D>
A circuit sheet was produced in the same manner as in Example 1D except that the circuit processing method, the circuit thickness, the protective film thickness, and the flexural modulus were changed as shown in Table 3. In each of Examples 2D to 6D, the protective film could be easily peeled off. The warp of the circuit sheet did not interfere with the pressure lamination. The circuit was formed by etching by etching the copper plate with ferric chloride from both sides.
<比較例1D>
 実施例1Dで使用した保護フィルムを用いずに回路の両面に金型A、Bをそれぞれ直接当接して絶縁層を形成したこと以外は実施例1Dと同様にして回路シートを作製した。その結果、d=0μm、d’=0μm、素子実装面側の重なる部分の幅が12μmであった。また、金型A、Bとの離型の際に、回路シートが一方に貼り付き、金型からの離型が困難であった。
<Comparative Example 1D>
A circuit sheet was produced in the same manner as in Example 1D except that the protective films used in Example 1D were not used and the molds A and B were directly contacted with each other on both sides of the circuit to form an insulating layer. As a result, d = 0 μm, d'= 0 μm, and the width of the overlapping portion on the element mounting surface side was 12 μm. Further, when the molds were released from the molds A and B, the circuit sheet was stuck to one side, and it was difficult to release the mold from the mold.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
<実施例7D>
(回路基板の作製)
 実施例1Dで作製した回路シートの素子実装面と逆の面側に、Bステージの絶縁層(厚さ210μm、日立化成株式会社、製品名;HT1500)と、放熱部材として銅板(型番;C1100 1/4H)をこの順で配置して積層体を得た。この積層体の回路シート側にクッション材として厚さ2.0mmのフッ素ゴムシートをあてがって、加圧積層して回路基板を作製した。加圧積層時の条件は、圧力;4MPa、温度;180℃、加圧時間;3時間とし、真空状態で実施した。
 積層後の回路基板は、素子実装面の回路に絶縁材料がほとんどはみ出しておらず、かつ絶縁部に凹みがあるため、素子の位置合わせが容易に行えるとともに良好に搭載することができた。また、回路と絶縁層間、および放熱部材と絶縁層間には剥離がなく、良好に接着できた。
<Example 7D>
(Manufacturing of circuit board)
On the side opposite to the element mounting surface of the circuit sheet produced in Example 1D, an insulating layer of the B stage (thickness 210 μm, Hitachi Kasei Co., Ltd., product name; HT1500) and a copper plate (model number: C1100 1) as a heat dissipation member. / 4H) was arranged in this order to obtain a laminated body. A fluororubber sheet having a thickness of 2.0 mm was applied as a cushioning material to the circuit sheet side of the laminated body, and pressure-laminated to prepare a circuit board. The conditions for pressure laminating were pressure; 4 MPa, temperature: 180 ° C., pressurization time: 3 hours, and the process was carried out in a vacuum state.
In the laminated circuit board, the insulating material hardly protruded from the circuit on the element mounting surface, and the insulating portion had a dent, so that the elements could be easily aligned and mounted well. In addition, there was no peeling between the circuit and the insulating layer, and between the heat radiating member and the insulating layer, and good adhesion was possible.
<実施例8D~12D>
 実施例2D~6Dで作製した回路シートを用いたこと以外は実施例1Dと同様にして回路基板を作製した。
<Examples 8D to 12D>
A circuit board was produced in the same manner as in Example 1D except that the circuit sheets produced in Examples 2D to 6D were used.
<実施例13D>
 クッション材を積層体(三井化学東株式会社、商品名;オピュラン、品番;CR1012MT4)に変更したこと以外は実施例1Dと同様にして回路基板を作製した。
<Example 13D>
A circuit board was produced in the same manner as in Example 1D except that the cushion material was changed to a laminated body (Mitsui Chemicals Higashi Co., Ltd., trade name; Opulan, product number: CR1012MT4).
<実験例1>
 比較例1Dで作製した回路シートを用いたこと以外は実施例1Dと同様にして回路基板を作製した。その結果、絶縁層と回路シート間は剥離なく良好に接続されていたものの、素子実装面の回路に絶縁材料がはみ出した部分があること、および絶縁部に凹みがないことから素子の接続性および作業性ともに実施例に劣っていた。
<Experimental example 1>
A circuit board was produced in the same manner as in Example 1D except that the circuit sheet produced in Comparative Example 1D was used. As a result, although the insulating layer and the circuit sheet were well connected without peeling, there was a part where the insulating material protruded from the circuit on the element mounting surface, and there was no dent in the insulating part. Both workability were inferior to those of the examples.
<実施例1E>
(回路の作製)
 厚さ2.0mmの銅板(型番;C1100 1/4H)を用いて、プレスによる打ち抜き加工によって、幅3.0mm×長さ10mm×高さ2.0mmの回路を形成した。
 形成した4つの回路の素子実装面に25μmのポリイミドフィルム(弾性率;5GPa)と粘着層(厚さ;10μm)とが積層された保護フィルムを貼り付けた。
<Example 1E>
(Circuit fabrication)
A circuit having a width of 3.0 mm, a length of 10 mm, and a height of 2.0 mm was formed by punching with a press using a copper plate having a thickness of 2.0 mm (model number: C1100 1 / 4H).
A protective film in which a 25 μm polyimide film (elastic modulus; 5 GPa) and an adhesive layer (thickness: 10 μm) were laminated was attached to the element mounting surfaces of the formed four circuits.
(粗化形状の作製)
 粗化液(マクダーミッド・パフォーマンス・ソリューションズ社製、商品名;マルチボンド150)を用いて、保護フィルムを貼り付けていない面の粗化処理を行った。処理後の回路と下面の表面粗さ(Ra)を表面粗さ計で測定したところ、どちらも1.0μm(比表面積;1.9)であった。
(Making roughened shape)
A roughening liquid (manufactured by MacDermid Performance Solutions Co., Ltd., trade name; Multibond 150) was used to roughen the surface to which the protective film was not attached. When the surface roughness (Ra) of the circuit after the treatment and the lower surface was measured with a surface roughness meter, both were 1.0 μm (specific surface area; 1.9).
 次に、厚さ2.0mmの銅板(型番;C1100 1/4H)の一方の面に対して上記と同様の粗化処理を施し、表面粗さ(Ra)が1.0μm(比表面積;1.9)の銅板を準備した。粗化処理を施した面に絶縁層形成用ワニス(日立化成株式会社製、HT1500)を塗布し、乾燥して絶縁層とした。 Next, one surface of a 2.0 mm thick copper plate (model number; C1100 1 / 4H) is subjected to the same roughening treatment as above, and the surface roughness (Ra) is 1.0 μm (specific surface area; 1). The copper plate of 9.9) was prepared. A varnish for forming an insulating layer (manufactured by Hitachi Kasei Co., Ltd., HT1500) was applied to the surface subjected to the roughening treatment, and dried to obtain an insulating layer.
 粗化処理を施した回路を、下面が絶縁層側になるように配置し、180℃、3時間、4MPaの条件で圧着し、保護フィルムを剥離して、素子実装面と逆の面に絶縁層が配置され、かつ回路の側面の一部(下面からの高さが150μmまで)が絶縁層で覆われた
状態の回路シートを作製した。絶縁層の厚さは210μmであった。素子実装面の表面粗さ(Ra)は0.1μm(比表面積;1.04)であった。
The roughened circuit is arranged so that the lower surface is on the insulating layer side, crimped under the conditions of 180 ° C. for 3 hours and 4 MPa, the protective film is peeled off, and the circuit is insulated on the surface opposite to the element mounting surface. A circuit sheet was produced in which the layers were arranged and a part of the side surface of the circuit (up to a height of 150 μm from the lower surface) was covered with an insulating layer. The thickness of the insulating layer was 210 μm. The surface roughness (Ra) of the device mounting surface was 0.1 μm (specific surface area; 1.04).
 作製した回路シートに対し、290℃、10分のリフロー試験を実施したところ、回路の側面及び下面からの絶縁層の剥離は見られなかった。素子実装も良好に行えた。 When a reflow test at 290 ° C. for 10 minutes was carried out on the prepared circuit sheet, no peeling of the insulating layer was observed from the side surface and the lower surface of the circuit. The element mounting was also done well.
<実施例2E>
 実施例1Eにおいて、回路の側面及び下面の表面粗さ(Ra)がそれぞれ2.0μm(比表面積;2.6)になるように粗化処理を行ったこと以外は同様の方法で回路シートを作製した。
 作製した回路シートに対し、290℃、10分のリフロー試験を実施したところ、回路の側面及び下面からの絶縁層の剥離は見られなかった。素子実装も良好に行えた。
<Example 2E>
In Example 1E, the circuit sheet was prepared in the same manner except that the roughening treatment was performed so that the surface roughness (Ra) of the side surface and the lower surface of the circuit was 2.0 μm (specific surface area; 2.6), respectively. Made.
When the prepared circuit sheet was subjected to a reflow test at 290 ° C. for 10 minutes, no peeling of the insulating layer was observed from the side surface and the lower surface of the circuit. The element mounting was also done well.
<実施例3E>
 実施例1Eにおいて、回路の側面及び下面の表面粗さ(Ra)がそれぞれ0.65μm(比表面積;1.65)になるように粗化処理を行ったこと以外は同様の方法で回路シートを作製した。
 作製した回路シートに対し、290℃、10分のリフロー試験を実施したところ、回路の側面及び下面からの絶縁層の剥離は見られなかった。素子実装も良好に行えた。
<Example 3E>
In Example 1E, the circuit sheet was prepared in the same manner except that the roughening treatment was performed so that the surface roughness (Ra) of the side surface and the lower surface of the circuit was 0.65 μm (specific surface area; 1.65), respectively. Made.
When the prepared circuit sheet was subjected to a reflow test at 290 ° C. for 10 minutes, no peeling of the insulating layer was observed from the side surface and the lower surface of the circuit. The element mounting was also done well.
<実施例4E>
 実施例1Eと同様にして粗化処理を行った後、トランスファー成型機を用いて、エポキシ系の絶縁材料(日立化成製)を成型圧力7MPa、硬化時間300秒で回路の間に充填して絶縁部を形成した。その後、保護フィルムを剥離した。
 実施例1Eで使用した絶縁層形成用ワニスに代えて、Bステージの絶縁層形成用樹脂シート(日立化成株式会社製、HT1500)を用いたこと以外は同様の方法で、素子実装面と逆の面に絶縁層が配置された回路シートを作製した。仕上がりの絶縁層の厚さは205μmであった。
 作製した回路シートに対し、290℃、10分のリフロー試験を実施したところ、回路からの絶縁層の剥離、および回路からの絶縁部との剥離は見られなかった。素子実装も良好に行えた。
<Example 4E>
After roughening treatment in the same manner as in Example 1E, an epoxy-based insulating material (manufactured by Hitachi Kasei) is filled between circuits at a molding pressure of 7 MPa and a curing time of 300 seconds using a transfer molding machine to insulate. Formed a part. Then, the protective film was peeled off.
Instead of the insulating layer forming varnish used in Example 1E, a resin sheet for forming an insulating layer of the B stage (manufactured by Hitachi Kasei Co., Ltd., HT1500) was used in the same manner as the element mounting surface. A circuit sheet in which an insulating layer was arranged on the surface was produced. The thickness of the finished insulating layer was 205 μm.
When the prepared circuit sheet was subjected to a reflow test at 290 ° C. for 10 minutes, no peeling of the insulating layer from the circuit and peeling from the insulating portion from the circuit were observed. The element mounting was also done well.
<実施例5E>
 実施例4Eにおいて、銅板の打ち抜き加工に代えて塩化第二鉄水溶液を用いたエッチングによって回路を形成した以外は同様の方法で回路シートを作製した。
 回路の側面の表面粗さ(Ra)は1.5μm(比表面積;2.2)であり、素子実装面と逆の面の表面粗さ(Ra)は1.0μm(比表面積;1.9)であった。素子実装面の表面粗さ(Ra)は0.11μm(比表面積;1.05)であった。
 作製した回路シートに対し、290℃、10分のリフロー試験を実施したところ、回路からの絶縁層の剥離、および回路からの絶縁部との剥離は見られなかった。素子実装も良好に行えた。
<Example 5E>
In Example 4E, a circuit sheet was produced by the same method except that the circuit was formed by etching with an aqueous ferric chloride solution instead of the punching process of the copper plate.
The surface roughness (Ra) of the side surface of the circuit is 1.5 μm (specific surface area; 2.2), and the surface roughness (Ra) of the surface opposite to the device mounting surface is 1.0 μm (specific surface area; 1.9). )Met. The surface roughness (Ra) of the device mounting surface was 0.11 μm (specific surface area; 1.05).
When the prepared circuit sheet was subjected to a reflow test at 290 ° C. for 10 minutes, no peeling of the insulating layer from the circuit and peeling from the insulating portion from the circuit were observed. The element mounting was also done well.
<実施例6E>
 回路の素子実装面に保護フィルムを貼り付けないこと以外は実施例1Eと同様の方法で、回路のすべての面を粗化処理した。その後、実施例1Eと同様にして回路の素子実装面に保護フィルムを貼り付け、絶縁層に圧着して回路シートを作製した。その後、保護フィルムを剥離し、露出した回路の素子実装面と絶縁層で覆われていない側面の一部に無電解Niめっきを2.5μm厚さになるように行った。めっき後の素子実装面の表面粗さ(Ra)は0.14μm(比表面積;1.1)であった。
 めっき後の回路シートに対し、290℃、10分のリフロー試験を実施したところ、回路の側面及び下面と絶縁層の剥離は見られなかった。素子実装も良好に行えた。
<Example 6E>
All surfaces of the circuit were roughened in the same manner as in Example 1E except that the protective film was not attached to the element mounting surface of the circuit. Then, in the same manner as in Example 1E, a protective film was attached to the element mounting surface of the circuit and crimped to the insulating layer to prepare a circuit sheet. Then, the protective film was peeled off, and electroless Ni plating was applied to the exposed circuit element mounting surface and a part of the side surface not covered with the insulating layer so as to have a thickness of 2.5 μm. The surface roughness (Ra) of the device mounting surface after plating was 0.14 μm (specific surface area; 1.1).
When a reflow test at 290 ° C. for 10 minutes was carried out on the plated circuit sheet, no peeling was observed between the side surface and the lower surface of the circuit and the insulating layer. The element mounting was also done well.
<比較例1E>
 実施例1Eにおいて、回路の粗化処理を行わなかったこと以外は同様の方法で回路シートを作製した。回路の側面と下面の表面粗さ(Ra)はそれぞれ0.11μm(比表面積;1.05)であり、素子実装面の表面粗さ(Ra)も0.11μm(比表面積;1.05)であった。
 作製した回路シートに対し、290℃、10分のリフロー試験を実施したところ、回路の側面及び下面から絶縁層が剥離し、回路が絶縁層から脱落した。
<Comparative Example 1E>
In Example 1E, a circuit sheet was produced by the same method except that the circuit roughening treatment was not performed. The surface roughness (Ra) of the side surface and the lower surface of the circuit is 0.11 μm (specific surface area; 1.05), respectively, and the surface roughness (Ra) of the element mounting surface is also 0.11 μm (specific surface area; 1.05). Met.
When the prepared circuit sheet was subjected to a reflow test at 290 ° C. for 10 minutes, the insulating layer was peeled off from the side surface and the lower surface of the circuit, and the circuit fell off from the insulating layer.
<比較例2E>
 実施例1Eにおいて、回路の素子実装面と逆の面のみに粗化処理を施し、素子実装面と側面の表面粗さ(Ra)がそれぞれ0.11μm(比表面積;1.05)であり、素子実装面と逆の面の表面粗さ(Ra)が1.0μm(比表面積;1.9)である回路を用いたこと以外は同様にして回路シートを作製した。
 作製した回路シートに対し、290℃、10分のリフロー試験を実施したところ、回路の側面から絶縁層が剥離した。
<Comparative Example 2E>
In Example 1E, only the surface opposite to the element mounting surface of the circuit was roughened, and the surface roughness (Ra) of the element mounting surface and the side surface was 0.11 μm (specific surface area; 1.05), respectively. A circuit sheet was produced in the same manner except that a circuit having a surface roughness (Ra) opposite to the device mounting surface of 1.0 μm (specific surface area; 1.9) was used.
When the prepared circuit sheet was subjected to a reflow test at 290 ° C. for 10 minutes, the insulating layer was peeled off from the side surface of the circuit.
[参考例1]
 ベース基板上に、絶縁層と、ベース基板側とは反対側における直方形状の面に感圧紙を設けた銅板と、がこの順に積層された積層体を準備し、回路の素子実装面側及び積層体のベース基板側に相対するクッション材を配置し、さらに、回路及び絶縁層の側面の内、対向する2つの面と接するようにスペーサ部材をベース基板上に配置した状態で、図7Bに示すように積層体を加圧した。
[Reference example 1]
A laminate in which an insulating layer and a copper plate having a pressure-sensitive paper provided on a rectangular surface opposite to the base substrate side are laminated in this order on the base substrate is prepared, and the element mounting surface side of the circuit and the laminate are laminated. FIG. 7B shows a state in which a cushioning material facing the base substrate side of the body is arranged, and a spacer member is arranged on the base substrate so as to be in contact with two opposing surfaces in the side surfaces of the circuit and the insulating layer. The laminate was pressurized as described above.
 各部材の条件及び加圧条件は以下の通りである。
(各部材の条件)
 ベース基板・・・材質:銅、厚さ:2000μm、
 銅板・・・幅:100mm、長さ:50mm、厚さ:2.0mm
 絶縁層・・・絶縁材料の材質:日立化成株式会社、商品名;HT1500、厚さ:210μm
 スペーサ部材・・・材質:銅、厚さ:銅板及び絶縁層の合計厚さよりも50μm小さい
(加圧条件)
 圧力・・・4MPa
 加熱温度・・・100℃
 加圧時間・・・5分
The conditions and pressurization conditions for each member are as follows.
(Conditions for each member)
Base substrate: Material: Copper, Thickness: 2000 μm,
Copper plate: width: 100 mm, length: 50 mm, thickness: 2.0 mm
Insulation layer: Material of insulation material: Hitachi Kasei Co., Ltd., trade name: HT1500, thickness: 210 μm
Spacer member: Material: Copper, Thickness: 50 μm smaller than the total thickness of the copper plate and the insulating layer (pressurization condition)
Pressure: 4 MPa
Heating temperature: 100 ° C
Pressurization time: 5 minutes
 加圧した後の積層体について、加圧時の圧力分布、反りの発生及び層間剥離の発生を以下のようにして評価した。評価基準は以下の通りであり、各評価の結果を表4に示す。 For the laminated body after pressurization, the pressure distribution during pressurization, the occurrence of warpage, and the occurrence of delamination were evaluated as follows. The evaluation criteria are as follows, and the results of each evaluation are shown in Table 4.
(加圧時の圧力分布)
 加圧した後の積層体における感圧紙の着色状況から銅板における圧力分布を確認した。評価基準は以下の通りである。
評価A・・・(最低圧力箇所の圧力)/(最大圧力箇所の圧力)>0.8
評価B・・・0.5<(最低圧力箇所の圧力)/(最大圧力箇所の圧力)≦0.8
評価C・・・(最低圧力箇所の圧力)/(最大圧力箇所の圧力)≦0.5
(Pressure distribution during pressurization)
The pressure distribution on the copper plate was confirmed from the colored state of the pressure-sensitive paper in the laminated body after pressurization. The evaluation criteria are as follows.
Evaluation A ... (Pressure at the lowest pressure point) / (Pressure at the maximum pressure point)> 0.8
Evaluation B: 0.5 <(pressure at the lowest pressure point) / (pressure at the maximum pressure point) ≤ 0.8
Evaluation C ... (pressure at the lowest pressure point) / (pressure at the maximum pressure point) ≤ 0.5
(反りの発生)
 加圧した後の積層体について、平面に積層体を静置し、厚さゲージにて積層体の浮き量を測定することにより反りの発生を評価した。評価基準は以下の通りである。
評価A・・・50μm未満
評価B・・・50μm以上70μm未満
評価C・・・70μm以上
(Occurrence of warpage)
With respect to the laminated body after pressurization, the occurrence of warpage was evaluated by allowing the laminated body to stand on a flat surface and measuring the amount of floating of the laminated body with a thickness gauge. The evaluation criteria are as follows.
Evaluation A: Less than 50 μm Evaluation B: 50 μm or more and less than 70 μm Evaluation C: 70 μm or more
(層間剥離の発生)
 加圧した後の積層体について、超音波探傷法(プローブ:25MHz)により層間剥離の発生を評価した。評価基準は以下の通りである。
評価A・・・剥離箇所がない
評価B・・・剥離が発生しているが、最大0.5mm以上の剥離がない
評価C・・・最大0.5mm以上の剥離が発生
(Occurrence of delamination)
The laminated body after pressurization was evaluated for the occurrence of delamination by an ultrasonic flaw detection method (probe: 25 MHz). The evaluation criteria are as follows.
Evaluation A: No peeling point Evaluation B: Peeling has occurred, but there is no peeling of 0.5 mm or more at maximum Evaluation C: Peeling of 0.5 mm or more has occurred at maximum
[参考例2]
 参考例1にて回路及び絶縁層の側面の内、対向する2つの面と接するようにベース基板上に配置したスペーサ部材について、その厚さを銅板及び絶縁層の合計厚さよりも250μm小さいスペーサ部材に変更した以外は参考例1と同様の操作を行った。結果を表4に示す。
[Reference example 2]
Regarding the spacer member arranged on the base substrate so as to be in contact with two opposing surfaces of the side surfaces of the circuit and the insulating layer in Reference Example 1, the thickness of the spacer member is 250 μm smaller than the total thickness of the copper plate and the insulating layer. The same operation as in Reference Example 1 was performed except that it was changed to. The results are shown in Table 4.
[参考例3]
 参考例1にてスペーサ部材を配置しなかった以外は参考例1と同様の操作を行った。結果を表4に示す。
[Reference example 3]
The same operation as in Reference Example 1 was performed except that the spacer member was not arranged in Reference Example 1. The results are shown in Table 4.
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
 表4に示すように、スペーサ部材を用いた参考例1及び参考例2では、スペーサ部材を用いなかった参考例3と比較して加圧時の圧力分布のバラつきが小さく、加圧した後の積層体について、反りの発生及び層間剥離の発生が抑制されていた。 As shown in Table 4, in Reference Example 1 and Reference Example 2 in which the spacer member was used, the variation in the pressure distribution during pressurization was smaller than that in Reference Example 3 in which the spacer member was not used, and the pressure distribution after pressurization was reduced. With respect to the laminated body, the occurrence of warpage and the occurrence of delamination were suppressed.
[実施例1]
 以下の回路、絶縁層及び放熱部材を用い、回路、絶縁層及び放熱部材がこの順で積層された回路基板を準備した。
 回路…材質;銅、厚さ;500μm、サイズ;20mm×20mm(絶縁層と反対面の面積)、19.2mm×19.2mm(絶縁層側の面積)
 絶縁層…材質;HT1500(日立化成株式会社)、熱伝導率;10W/m・K、厚さ;210μm、サイズ;30mm×30mm
 放熱部材…材質;銅、厚さ;1000μm、サイズ;30mm×30mm
[Example 1]
Using the following circuit, insulating layer and heat radiating member, a circuit board in which the circuit, insulating layer and heat radiating member were laminated in this order was prepared.
Circuit: Material: Copper, Thickness: 500 μm, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side)
Insulation layer: Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m · K, Thickness: 210 μm, Size: 30 mm × 30 mm
Heat dissipation member: Material: Copper, Thickness: 1000 μm, Size: 30 mm x 30 mm
 上記の回路表面に発熱体を設け、15℃/秒で昇温し、回路表面の温度が170℃に到達した段階で、発熱を停止して冷却し、回路表面の100℃まで下がった段階で再度上記の条件で昇温するサイクルを250回繰り返した。
 その後、超音波探傷検査によって絶縁層と、回路及び放熱部材との剥離の有無を確認した。評価基準は以下の通りである。その結果、実施例1の回路基板では、評価はAであった。
評価A・・・剥離箇所がない。
評価B・・・最大0.5mm以上の剥離がない。
評価C・・・最大0.5mm以上の剥離が発生。
A heating element is provided on the circuit surface, the temperature is raised at 15 ° C / sec, and when the temperature of the circuit surface reaches 170 ° C, the heat generation is stopped and cooled, and when the temperature drops to 100 ° C on the circuit surface. The cycle of raising the temperature under the above conditions was repeated 250 times.
After that, it was confirmed by ultrasonic flaw detection inspection whether or not the insulating layer was peeled off from the circuit and the heat radiating member. The evaluation criteria are as follows. As a result, in the circuit board of Example 1, the evaluation was A.
Evaluation A: There is no peeling point.
Evaluation B: No peeling of 0.5 mm or more at maximum.
Evaluation C: Peeling of 0.5 mm or more occurs at maximum.
[実施例2]
 以下の回路、絶縁層及び放熱部材を用い、回路、絶縁層及び放熱部材がこの順で積層された回路基板を準備した。
 回路…材質;銅、厚さ;2000μm、サイズ;20mm×20mm(絶縁層と反対面の面積)、19.2mm×19.2mm(絶縁層側の面積)
 絶縁層…材質;HT1500(日立化成株式会社)、熱伝導率;10W/m・K、厚さ;120μm、サイズ;30mm×30mm
 放熱部材…材質;銅、厚さ;2000μm、サイズ;30mm×30mm
 上記と同じサイクル試験を実施した。その結果、実施例2の回路基板では、評価はAであった。
[Example 2]
Using the following circuit, insulating layer and heat radiating member, a circuit board in which the circuit, insulating layer and heat radiating member were laminated in this order was prepared.
Circuit: Material: Copper, Thickness: 2000 μm, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side)
Insulation layer: Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m · K, Thickness: 120 μm, Size: 30 mm × 30 mm
Heat dissipation member: Material: Copper, Thickness: 2000 μm, Size: 30 mm x 30 mm
The same cycle test as above was performed. As a result, in the circuit board of Example 2, the evaluation was A.
[実施例3]
 以下の回路、絶縁層及び放熱部材を用い、回路、絶縁層及び放熱部材がこの順で積層された回路基板を準備した。
 回路…材質;銅、厚さ;750μm、サイズ;20mm×20mm(絶縁層と反対面の面積)、19.2mm×19.2mm(絶縁層側の面積)
 絶縁層…材質;HT1500(日立化成株式会社)、熱伝導率;10W/m・K、厚さ;120μm、サイズ;30mm×30mm
 放熱部材…材質;銅、厚さ;500μm、サイズ;30mm×30mm
 上記と同じサイクル試験を実施した。その結果、実施例3の回路基板では、評価はAであった。
[Example 3]
Using the following circuit, insulating layer and heat radiating member, a circuit board in which the circuit, insulating layer and heat radiating member were laminated in this order was prepared.
Circuit: Material: Copper, Thickness: 750 μm, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side)
Insulation layer: Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m · K, Thickness: 120 μm, Size: 30 mm × 30 mm
Heat dissipation member: Material: Copper, Thickness: 500 μm, Size: 30 mm x 30 mm
The same cycle test as above was performed. As a result, in the circuit board of Example 3, the evaluation was A.
[比較例1]
 以下の回路、絶縁層及び放熱部材を用い、回路、絶縁層及び放熱部材がこの順で積層された回路基板を準備した。
 回路…材質;銅、厚さ;400μm、サイズ;20mm×20mm(絶縁層と反対面の面積)、19.2mm×19.2mm(絶縁層側の面積)
 絶縁層…材質;HT1500(日立化成株式会社)、熱伝導率;10W/m・K、厚さ;210μm、サイズ;30mm×30mm
 放熱部材…材質;銅、厚さ;500μm、サイズ;30mm×30mm
 上記と同じサイクル試験を実施した。その結果、比較例1の回路基板では、評価はCであった。
[Comparative Example 1]
Using the following circuit, insulating layer and heat radiating member, a circuit board in which the circuit, insulating layer and heat radiating member were laminated in this order was prepared.
Circuit: Material: Copper, Thickness: 400 μm, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side)
Insulation layer: Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m · K, Thickness: 210 μm, Size: 30 mm × 30 mm
Heat dissipation member: Material: Copper, Thickness: 500 μm, Size: 30 mm x 30 mm
The same cycle test as above was performed. As a result, in the circuit board of Comparative Example 1, the evaluation was C.
[比較例2]
 以下の回路、絶縁層及び放熱部材を用い、回路、絶縁層及び放熱部材がこの順で積層された回路基板を準備した。
 回路…材質;銅、厚さ;450μm、サイズ;20mm×20mm(絶縁層と反対面の面積)、19.2mm×19.2mm(絶縁層側の面積)
 絶縁層…材質;HT1500(日立化成株式会社)、熱伝導率;10W/m・K、厚さ;105μm、サイズ;30mm×30mm
 放熱部材…材質;銅、厚さ;600μm、サイズ;30mm×30mm
 上記と同じサイクル試験を実施した。その結果、比較例2の回路基板では、評価はCであった。
[Comparative Example 2]
Using the following circuit, insulating layer and heat radiating member, a circuit board in which the circuit, insulating layer and heat radiating member were laminated in this order was prepared.
Circuit: Material: Copper, Thickness: 450 μm, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side)
Insulation layer: Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m · K, Thickness: 105 μm, Size: 30 mm x 30 mm
Heat dissipation member: Material: Copper, Thickness: 600 μm, Size: 30 mm x 30 mm
The same cycle test as above was performed. As a result, in the circuit board of Comparative Example 2, the evaluation was C.
[比較例3]
 以下の回路、絶縁層及び放熱部材を用い、回路、絶縁層及び放熱部材がこの順で積層された回路基板を準備した。
 回路…材質;銅、厚さ;1000μm、サイズ;20mm×20mm(絶縁層と反対面の面積)、19.2mm×19.2mm(絶縁層側の面積)
 絶縁層…材質;HT1500(日立化成株式会社)、熱伝導率;10W/m・K、厚さ;105μm、サイズ;30mm×30mm
 放熱部材…材質;銅、厚さ;1000μm、サイズ;30mm×30mm
 上記と同じサイクル試験を実施した。その結果、比較例2の回路基板では、評価はCであった。
[Comparative Example 3]
Using the following circuit, insulating layer and heat radiating member, a circuit board in which the circuit, insulating layer and heat radiating member were laminated in this order was prepared.
Circuit: Material: Copper, Thickness: 1000 μm, Size: 20 mm x 20 mm (area opposite to the insulating layer), 19.2 mm x 19.2 mm (area on the insulating layer side)
Insulation layer: Material: HT1500 (Hitachi Kasei Co., Ltd.), Thermal conductivity: 10 W / m · K, Thickness: 105 μm, Size: 30 mm x 30 mm
Heat dissipation member: Material: Copper, Thickness: 1000 μm, Size: 30 mm x 30 mm
The same cycle test as above was performed. As a result, in the circuit board of Comparative Example 2, the evaluation was C.
 1…回路
 2…絶縁部
 3…段差
 10、20…回路シート
 11、11′、21…回路
 12…絶縁層
 13…放熱部材
 14、24…絶縁部
 15…クッション材
 16、26…回路シート
 110、120、130…回路基板
 A、B…外周縁部
 31…回路
 32…絶縁部
 33…別の回路
 34…高弾性部材
 140、150、160…回路シート
 41…回路
 42…絶縁部
 43…回路と絶縁部とが重なる部分
 170…回路シート
 51…回路
 52…絶縁部
 53…絶縁層
 180…回路シート
 70…回路シート
 61、71…回路
 62、72…絶縁部
 63、73…ケース
 64、74…発熱体
 65、75…ボンディングワイヤ
 66、76…封止部
 67、77…絶縁層
 68、78…放熱部材
 79…熱伝導シート
 80…ベース板
 190…ケース付き回路シート
 101…回路
 102…絶縁層
 103、104…ベース基板
 200、210…積層体
 105…加圧手段
 106…クッション材
 107、108…スペーサ部材
 112 回路
 113 絶縁層
 115 放熱部材
 220 回路基板
 121 回路
 122 絶縁層
 230 回路シート
 131 回路
 132 絶縁層
 240 回路シート
 141 回路
 142 絶縁層
 250 回路シート
1 ... Circuit 2 ... Insulation part 3 ... Step 10, 20 ... Circuit sheet 11, 11', 21 ... Circuit 12 ... Insulation layer 13 ... Heat dissipation member 14, 24 ... Insulation part 15 ... Cushion material 16, 26 ... Circuit sheet 110, 120, 130 ... Circuit board A, B ... Outer peripheral edge 31 ... Circuit 32 ... Insulation 33 ... Another circuit 34 ... Highly elastic member 140, 150, 160 ... Circuit sheet 41 ... Circuit 42 ... Insulation 43 ... Circuit and insulation Part where the parts overlap 170 ... Circuit sheet 51 ... Circuit 52 ... Insulation part 53 ... Insulation layer 180 ... Circuit sheet 70 ... Circuit sheet 61, 71 ... Circuit 62, 72 ... Insulation part 63, 73 ... Case 64, 74 ... Heat generator 65, 75 ... Bonding wire 66, 76 ... Sealing part 67, 77 ... Insulation layer 68, 78 ... Heat dissipation member 79 ... Heat conductive sheet 80 ... Base plate 190 ... Circuit sheet with case 101 ... Circuit 102 ... Insulation layer 103, 104 ... Base board 200, 210 ... Laminated body 105 ... Pressurizing means 106 ... Cushion material 107, 108 ... Spacer member 112 Circuit 113 Insulation layer 115 Heat dissipation member 220 Circuit board 121 Circuit 122 Insulation layer 230 Circuit sheet 131 Circuit 132 Insulation layer 240 circuit Sheet 141 Circuit 142 Insulation layer 250 Circuit sheet

Claims (8)

  1.  導体からなる回路と、前記回路の間の空間に設けられる絶縁部と、を備え、前記回路における、素子実装面と、前記素子実装面と逆の面との間の側面は段差を有し、前記段差が前記絶縁部で覆われてなる回路シート。 A circuit made of a conductor and an insulating portion provided in a space between the circuits are provided, and the side surface between the element mounting surface and the surface opposite to the element mounting surface in the circuit has a step. A circuit sheet in which the step is covered with the insulating portion.
  2.  前記段差が前記素子実装面及び前記素子実装面と逆の面の少なくとも一方と平行な面を有する請求項1に記載の回路シート。 The circuit sheet according to claim 1, wherein the step has a surface parallel to at least one of the element mounting surface and the surface opposite to the element mounting surface.
  3.  前記回路は、前記回路の厚さ方向における前記回路の断面形状が略T字形状となる領域を有する請求項1又は請求項2に記載の回路シート。 The circuit sheet according to claim 1 or 2, wherein the circuit has a region in which the cross-sectional shape of the circuit in the thickness direction of the circuit is substantially T-shaped.
  4.  前記回路の厚さ方向に見たときに、前記段差が、前記回路の外周に設けられている請求項1~請求項3のいずれか1項に記載の回路シート。 The circuit sheet according to any one of claims 1 to 3, wherein the step is provided on the outer periphery of the circuit when viewed in the thickness direction of the circuit.
  5.  前記回路の厚さ方向に見たときに、前記段差が、前記回路の内部に設けられており、前記回路の内部の空間に設けられる前記絶縁部は、前記回路の外周の空間に設けられる前記絶縁部と2箇所以上で接続している請求項1~請求項4のいずれか1項に記載の回路シート。 When viewed in the thickness direction of the circuit, the step is provided inside the circuit, and the insulating portion provided in the space inside the circuit is provided in the space around the circuit. The circuit sheet according to any one of claims 1 to 4, which is connected to the insulating portion at two or more places.
  6.  前記側面の表面粗さは、前記素子実装面の表面粗さ及び前記素子実装面と逆の面の表面粗さの少なくとも一方よりも大きい請求項1~請求項5のいずれか1項に記載の回路シート。 The surface roughness of the side surface is larger than at least one of the surface roughness of the element mounting surface and the surface roughness of the surface opposite to the element mounting surface, according to any one of claims 1 to 5. Circuit sheet.
  7.  請求項1~請求項6のいずれか1項に記載の回路シートと、前記素子実装面と逆の面に接するように配置される絶縁層と、前記絶縁層に接するように配置される放熱部材と、をこの順に有する回路基板。 The circuit sheet according to any one of claims 1 to 6, an insulating layer arranged so as to be in contact with a surface opposite to the element mounting surface, and a heat radiating member arranged so as to be in contact with the insulating layer. And, a circuit board having in this order.
  8.  請求項1~請求項6のいずれか1項に記載の回路シートと、前記素子実装面と逆の面に配置される絶縁層と、放熱部材と、をこの順に配置した状態の積層体を厚さ方向に加圧する工程を有する回路基板の製造方法。 The thickness of the laminated body in which the circuit sheet according to any one of claims 1 to 6, the insulating layer arranged on the surface opposite to the element mounting surface, and the heat radiating member are arranged in this order. A method of manufacturing a circuit board having a step of pressurizing in the longitudinal direction.
PCT/JP2020/012054 2020-03-18 2020-03-18 Circuit sheet, circuit board, and method for manufacturing circuit board WO2021186629A1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI822223B (en) * 2022-07-27 2023-11-11 大陸商宏啟勝精密電子(秦皇島)有限公司 Printed circuit and method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014192323A (en) * 2013-03-27 2014-10-06 Furukawa Electric Co Ltd:The Substrate and method of manufacturing substrate
WO2018189797A1 (en) * 2017-04-10 2018-10-18 日立化成株式会社 Circuit board production method, circuit sheet and circuit board

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014192323A (en) * 2013-03-27 2014-10-06 Furukawa Electric Co Ltd:The Substrate and method of manufacturing substrate
WO2018189797A1 (en) * 2017-04-10 2018-10-18 日立化成株式会社 Circuit board production method, circuit sheet and circuit board

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI822223B (en) * 2022-07-27 2023-11-11 大陸商宏啟勝精密電子(秦皇島)有限公司 Printed circuit and method thereof

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