TW202349802A - Connection structure manufacturing method, film structure, and film structure manufacturing method - Google Patents

Connection structure manufacturing method, film structure, and film structure manufacturing method Download PDF

Info

Publication number
TW202349802A
TW202349802A TW112104456A TW112104456A TW202349802A TW 202349802 A TW202349802 A TW 202349802A TW 112104456 A TW112104456 A TW 112104456A TW 112104456 A TW112104456 A TW 112104456A TW 202349802 A TW202349802 A TW 202349802A
Authority
TW
Taiwan
Prior art keywords
adhesive film
base material
mentioned
solder particles
film
Prior art date
Application number
TW112104456A
Other languages
Chinese (zh)
Inventor
奥宮秀昭
林直樹
青木和久
柄木田充宏
Original Assignee
日商迪睿合股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商迪睿合股份有限公司 filed Critical 日商迪睿合股份有限公司
Publication of TW202349802A publication Critical patent/TW202349802A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R11/00Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts
    • H01R11/01Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts characterised by the form or arrangement of the conductive interconnection between the connecting locations
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits

Abstract

Provided are a connection structure manufacturing method, a film structure, and a film structure manufacturing method that enable the shortening of processing takt time. Included are: a step (A1) for preparing a substrate on which a plurality of electronic components are mounted; a step (B1) for preparing a film structure in which a plurality of singulated adhesive films, which include singulated adhesive films containing solder particles, are arranged at prescribed positions on a substrate corresponding to the substrate on which the plurality of electronic components are mounted; a step (C1) for temporarily attaching, at once, the plurality of singulated adhesive films to prescribed locations on the substrate; a step (D1) for placing electronic components on the singulated adhesive films; and a step (E1) for reflowing the substrate provided with the singulated adhesive films and the electronic components. The processing takt time can be shortened because the plurality of singulated adhesive films is temporarily attached to the substrate at once.

Description

連接結構體之製造方法、膜結構體、及膜結構體之製造方法Manufacturing method of connection structure, membrane structure, and manufacturing method of membrane structure

本技術係關於一種安裝有電子零件之連接結構體之製造方法、膜結構體、及膜結構體之製造方法。本申請案以在日本於2022年2月28日提出申請之日本專利申請案編號特願2022-030239為基礎來主張優先權,該申請係藉由參照而被引用至本申請案中。This technology relates to a manufacturing method of a connection structure mounted with electronic components, a membrane structure, and a manufacturing method of a membrane structure. This application claims priority based on Japanese Patent Application No. 2022-030239 filed in Japan on February 28, 2022, which application is incorporated by reference into this application.

向剛性基板或可撓性基板之SMT(Surface Mount Technology)零件安裝、LGA(Land Grid Array)/BGA(Ball Grid Array)安裝、連接器安裝等通常係將焊料膏印刷至基板,並利用貼片機將零件搭載於其上後,藉由回焊步驟進行安裝。SMT (Surface Mount Technology) component mounting on rigid substrates or flexible substrates, LGA (Land Grid Array)/BGA (Ball Grid Array) mounting, connector mounting, etc. usually involves printing solder paste onto the substrate and using SMT. After the machine mounts the parts on it, it is installed through the reflow step.

焊料膏之印刷必須對應於所安裝之基板之佈局來製作模具(版型、模板),且自印刷後之後續步驟(乾燥)等起縮短時間存在極限。Printing of solder paste requires making molds (patterns, templates) according to the layout of the substrate to be mounted, and there is a limit to shortening the time from subsequent steps (drying) after printing.

因此,於使用接著膜代替焊料膏之情形時,將設置焊料膏之步驟替換成膜之暫貼步驟,可期待縮短時間之效果(例如參照專利文獻1)。Therefore, when an adhesive film is used instead of solder paste, the effect of shortening the time can be expected by replacing the step of applying the solder paste with the step of temporarily applying the film (see, for example, Patent Document 1).

然而,於需要回焊步驟之安裝之情形時,會將不同種類之多種零件同時安裝於一個基板,故亦要對應地準備多種接著膜,並分開暫貼,從而會導致製程產距變長。 [習知技術文獻] [專利文獻] However, in the case of installation that requires a reflow step, multiple parts of different types will be mounted on one substrate at the same time. Therefore, a variety of adhesive films must be prepared accordingly and temporarily attached separately, which will lead to a longer manufacturing process. [Known technical documents] [Patent Document]

[專利文獻1]日本特開2019-194479號公報[Patent Document 1] Japanese Patent Application Publication No. 2019-194479

[發明所欲解決之課題][Problem to be solved by the invention]

本技術係鑒於此種習知之實際情況而提出,提供一種能夠縮短製程產距之連接結構體之製造方法、膜結構體、及膜結構體之製造方法。 [解決課題之技術手段] This technology is proposed in view of the actual situation of this conventional knowledge, and provides a manufacturing method of a connection structure, a membrane structure, and a manufacturing method of a membrane structure that can shorten the manufacturing process lead time. [Technical means to solve the problem]

本技術之連接結構體之製造方法具有以下步驟:準備供安裝複數個電子零件之基板;準備於與上述供安裝複數個電子零件之基板對應之基材上之規定位置配置有包含含有焊料粒子之單片化接著膜的複數個單片化接著膜的膜結構體;將上述複數個單片化接著膜一次性暫貼於上述基板之規定部位;將電子零件載置於上述單片化接著膜上;及對設置有上述單片化接著膜及上述電子零件之基板進行回焊。The manufacturing method of the connection structure of the present technology has the following steps: preparing a substrate for mounting a plurality of electronic components; preparing a base material containing solder particles at a predetermined position corresponding to the substrate for mounting a plurality of electronic components. A film structure of a plurality of individualized adhesive films of an individualized adhesive film; temporarily affixing the plurality of individualized adhesive films to a predetermined position of the above-mentioned substrate at one time; placing electronic components on the above-mentioned individualized adhesive film on; and reflowing the substrate provided with the above-mentioned single-piece adhesive film and the above-mentioned electronic component.

本技術之連接結構體之製造方法具有以下步驟:準備供安裝複數個電子零件之基板;準備於基材上設置有與上述複數個電子零件對應之單片化接著膜之膜結構體;使用貼片機將電子零件按壓至與該電子零件對應之單片化接著膜,使上述單片化接著膜貼合於上述電子零件,並搭載貼合有上述單片化接著膜之電子零件;及對設置有上述單片化接著膜及上述電子零件之基板進行回焊。The manufacturing method of the connection structure of the present technology has the following steps: preparing a substrate for mounting a plurality of electronic components; preparing a film structure provided with a single-piece adhesive film corresponding to the plurality of electronic components on the substrate; using a sticker The chip machine presses the electronic component against the singulated adhesive film corresponding to the electronic component, causes the singulated adhesive film to be bonded to the electronic component, and mounts the electronic component bonded with the singulated adhesive film; and The substrate provided with the above-mentioned singulated adhesive film and the above-mentioned electronic component is reflowed.

本技術之連接結構體之製造方法具有以下步驟:準備供安裝複數個電子零件之基板;準備於基材上設置有與上述複數個電子零件對應之單片化接著膜之膜結構體;使用貼片機將上述單片化接著膜搭載於上述基板之規定部位;將電子零件載置於上述單片化接著膜上;及對設置有上述單片化接著膜及上述電子零件之基板進行回焊。The manufacturing method of the connection structure of the present technology has the following steps: preparing a substrate for mounting a plurality of electronic components; preparing a film structure provided with a single-piece adhesive film corresponding to the plurality of electronic components on the substrate; using a sticker A chip machine mounts the above-mentioned singulation adhesive film on a predetermined position of the above-mentioned substrate; places electronic components on the above-mentioned singulation adhesive film; and reflows the substrate provided with the above-mentioned singulation adhesive film and the above-mentioned electronic components. .

本技術之膜結構體亦可具備基材、及設置於與複數個零件對應之上述基材上之規定位置之複數個單片化接著膜,且上述複數個單片化接著膜之1個以上含有焊料粒子。The film structure of the present technology may also include a base material, and a plurality of singulated adhesive films provided at predetermined positions on the base material corresponding to a plurality of parts, and more than one of the plurality of singulated adhesive films may be provided Contains solder particles.

本技術之膜結構體亦可具備基材、及設置於與複數個零件對應之上述基材上之規定位置之複數個單片化接著膜,且上述複數個單片化接著膜之1個以上具有含有焊料粒子之區域及不含焊料粒子之區域。The film structure of the present technology may also include a base material, and a plurality of singulated adhesive films provided at predetermined positions on the base material corresponding to a plurality of parts, and more than one of the plurality of singulated adhesive films may be provided There are areas containing solder particles and areas not containing solder particles.

本技術之膜結構體亦可具備基材、及設置於與複數個零件對應之上述基材上之規定位置之複數個單片化接著膜,且上述複數個單片化接著膜之1個以上與其他單片化接著膜厚度不同。The film structure of the present technology may also include a base material, and a plurality of singulated adhesive films provided at predetermined positions on the base material corresponding to a plurality of parts, and more than one of the plurality of singulated adhesive films may be provided Different from other single-piece adhesive film thickness.

本技術之膜結構體亦可具備:基材;具有第1厚度之單片化接著膜,其設置於與複數個零件對應之上述基材上之規定位置,並且具有含有焊料粒子之區域及不含焊料粒子之區域;及具有第2厚度之單片化接著膜,其設置於與複數個零件對應之上述基材上之規定位置,並且具有含有焊料粒子之區域及不含焊料粒子之區域。The film structure of the present technology may also include: a base material; a monolithic adhesive film having a first thickness, which is provided at a predetermined position on the base material corresponding to a plurality of parts, and has a region containing solder particles and an insulating film. A region containing solder particles; and a monolithic adhesive film having a second thickness, which is provided at a predetermined position on the above-mentioned base material corresponding to a plurality of parts, and has a region containing solder particles and a region not containing solder particles.

本技術之膜結構體之製造方法係於第1基材上設置第1單片化接著膜,於第2基材上設置第2單片化接著膜,於與複數個電子零件對應之上述第1基材、上述第2基材、或第3基材之規定位置配置上述第1單片化接著膜及上述第2單片化接著膜,上述第1單片化接著膜及上述第2單片化接著膜之1個以上含有焊料粒子。The manufacturing method of the film structure of the present technology is to provide a first singulated adhesive film on a first base material, a second singulated adhesive film on a second base material, and the above-mentioned first singulated adhesive film corresponding to a plurality of electronic components. The above-mentioned first singulated adhesive film and the above-mentioned second singulated adhesive film are arranged at predetermined positions of the 1 base material, the above-mentioned second base material, or the third base material, and the above-mentioned first singulated adhesive film and the above-mentioned second singulated adhesive film are One or more pieces of the sheeted adhesive film contain solder particles.

本技術之膜結構體之製造方法係於第1基材上設置不含焊料粒子之單片化接著膜,於第2基材上設置含有焊料粒子之單片化接著膜,於上述第1基材、上述第2基材、或第3基材之規定位置,使上述不含焊料粒子之單片化接著膜及上述含有焊料粒子之單片化接著膜靠近,來配置具有不含焊料粒子之區域及含有焊料粒子之區域之單片化接著膜。The manufacturing method of the film structure of the present technology is to provide a single-piece adhesive film containing no solder particles on a first base material, and to provide a single-piece adhesive film containing solder particles on a second base material. material, the above-mentioned second base material, or a predetermined position of the third base material, so that the above-mentioned singulated adhesive film not containing solder particles and the above-mentioned singulated adhesive film containing solder particles are brought close to each other, so as to arrange the Single-piece bonding film for areas and areas containing solder particles.

本技術之膜結構體之製造方法係於第1基材上設置具有第1厚度之單片化接著膜,於第2基材上設置具有第2厚度之單片化接著膜,於與複數個零件對應之上述第1基材、上述第2基材、或第3基材之規定位置配置上述具有第1厚度之單片化接著膜及上述具有第2厚度之單片化接著膜。The manufacturing method of the film structure of the present technology is to provide a singulated adhesive film with a first thickness on a first base material, a singulated adhesive film with a second thickness on a second base material, and a plurality of The individualized adhesive film having the first thickness and the individualized adhesive film having the second thickness are arranged at predetermined positions of the first base material, the second base material, or the third base material corresponding to the component.

本技術之膜結構體之製造方法係於第1基材上設置不含焊料粒子且具有第1厚度之單片化接著膜,於第2基材上設置不含焊料粒子且具有第2厚度之單片化接著膜,於第3基材上設置含有焊料粒子且具有上述第1厚度之單片化接著膜,於第4基材上設置含有焊料粒子且具有上述第2厚度之單片化接著膜,於上述第1基材、上述第2基材、上述第3基材、上述第4基材、或第5基材之規定位置,使上述不含焊料粒子且具有第1厚度之單片化接著膜及上述含有焊料粒子且具有第1厚度之單片化接著膜靠近,來配置具有不含焊料粒子之區域及含有焊料粒子之區域且具有第1厚度之單片化接著膜,並且使上述不含焊料粒子且具有第2厚度之單片化接著膜及上述含有焊料粒子且具有第2厚度之單片化接著膜靠近,來配置具有不含焊料粒子之區域及含有焊料粒子之區域且具有第2厚度之單片化接著膜。 [發明之效果] The manufacturing method of the film structure of the present technology is to provide a single-piece adhesive film that does not contain solder particles and has a first thickness on a first base material, and provides a second base material that does not contain solder particles and has a second thickness. A singulated adhesive film, a singulated adhesive film containing solder particles and having the above-mentioned first thickness is provided on the third base material, and a singulated adhesive film containing solder particles and having the above-mentioned second thickness is provided on the fourth base material. Film, the above-mentioned single piece containing no solder particles and having the first thickness is placed at a predetermined position on the above-mentioned first base material, the above-mentioned second base material, the above-mentioned third base material, the above-mentioned fourth base material, or the above-mentioned fifth base material. The chemical adhesive film and the above-mentioned singulated adhesive film containing solder particles and having a first thickness are brought close to each other, and the singulated adhesive film having a first thickness having a region not containing solder particles and a region containing solder particles is arranged, and The above-mentioned singulated adhesive film containing no solder particles and having a second thickness and the above-mentioned singulated adhesive film containing solder particles and having a second thickness are arranged close to each other to have a region not containing solder particles and a region containing solder particles, and A monolithic adhesive film having a second thickness. [Effects of the invention]

根據本技術,與準備多種接著膜並分開暫貼相比,能夠縮短製程產距。According to this technology, the process throughput can be shortened compared to preparing a variety of adhesive films and temporarily applying them separately.

以下,一面參照圖式,一面以下述順序針對本發明之實施形態詳細地進行說明。 1.連接結構體之製造方法 2.膜結構體、及膜結構體之製造方法 3.實施例 Hereinafter, embodiments of the present invention will be described in detail in the following order with reference to the drawings. 1. Manufacturing method of connecting structure 2. Membrane structure and manufacturing method of membrane structure 3.Examples

<1. 連接結構體之製造方法> <1-1. 第1實施形態> 第1實施形態之連接結構體之製造方法具有:步驟(A1),其係準備供安裝複數個電子零件之基板;步驟(B1),其係準備於與供安裝複數個電子零件之基板對應之基材上之規定位置配置有包含含有焊料粒子之單片化接著膜之複數個單片化接著膜的膜結構體;步驟(C1),其係將複數個單片化接著膜一次性暫貼於基板之規定部位;步驟(D1),其係將電子零件載置於單片化接著膜上;及步驟(E1),其係對設置有單片化接著膜及電子零件之基板進行回焊。根據第1實施形態之連接結構體之製造方法,由於係將複數個單片化接著膜一次性暫貼於基板,故能夠縮短製程產距。又,與將接著膜暫貼於基板整面相比,無須將接著膜暫貼於無用部位,故能夠降低成本。 <1. Manufacturing method of connected structure> <1-1. First Embodiment> The manufacturing method of the connection structure of the first embodiment includes: step (A1), which prepares a substrate for mounting a plurality of electronic components; step (B1), which prepares a substrate corresponding to the substrate for mounting the plurality of electronic components. A film structure including a plurality of individualized adhesive films containing solder particles is arranged at a predetermined position on the base material; step (C1) is to temporarily attach a plurality of individualized adhesive films at one time on a predetermined position of the substrate; step (D1), which is to place the electronic components on the singulation adhesive film; and step (E1), which is to reflow the substrate provided with the singulation adhesive film and the electronic components. . According to the manufacturing method of the connected structure of the first embodiment, a plurality of individualized adhesive films are temporarily attached to the substrate at one time, so the process throughput can be shortened. In addition, compared with temporarily affixing the adhesive film to the entire surface of the substrate, there is no need to temporarily affix the adhesive film to useless areas, so the cost can be reduced.

較佳為單片化接著膜之1個以上含有焊料粒子。藉此,可使用回焊爐安裝電子零件。又,較佳為單片化接著膜之1個以上具有含有焊料粒子之區域及不含焊料粒子之區域。藉此,例如可如插座連接器般防止焊料潤濕擴散至端子部以外之露出金屬,從而可防止焊料向端子部以外之無用部位潤濕擴散。又,較佳為單片化接著膜之1個以上厚度與其他單片化接著膜不同。藉此,於電子零件之端子高度或端子面積不同之情形、電子零件之大小或重量不同之情形、要控制連接器周圍之黏合劑潤濕之情形時等,即便所需黏合劑量不同,亦可提高接合強度。It is preferable that at least one of the individualized adhesive films contains solder particles. This allows electronic components to be mounted using a reflow oven. Moreover, it is preferable that at least one of the individualized adhesive films has a region containing solder particles and a region not containing solder particles. This can prevent solder from wetting and spreading to exposed metal outside the terminal portion, for example, like a socket connector, thereby preventing solder from wetting and spreading to useless areas outside the terminal portion. Moreover, it is preferable that one or more thicknesses of the individualized adhesive film are different from other individualized adhesive films. By this, when the terminal height or terminal area of electronic parts is different, the size or weight of electronic parts is different, the wetting of the adhesive around the connector needs to be controlled, etc., even if the required amount of adhesive is different, it can Improve joint strength.

單片化接著膜較佳為藉由半切加工、網版印刷、或噴墨印刷形成於基材上。半切加工係藉由維多利亞刀僅對接著膜進行切割而不對基材進行切割,並藉由模切加工等將無用部分去除。網版印刷係利用刮刀等所產生之壓力使接著劑通過網罩之網眼而印刷(塗佈)於基材上,並藉由例如網罩之厚度製作特定厚度之單片化接著膜。網罩係使用由聚酯等合成纖維或不鏽鋼或者各種金屬纖維織成之絲網之版。於接著劑包含焊料粒子之情形時,只要使網眼大於焊料粒子之最大直徑即可。噴墨印刷可自噴嘴射出規定之樹脂量。由於可自噴嘴將樹脂圖案化至對象(接著膜),故不需要版。例如,可藉由將樹脂點描或者線描於單片化接著膜之表面之一部分而於單片化接著膜之表面設置黏性。亦可射出至整個面之一半以上而形成層。厚度可以與下述單片化接著膜相同之方式進行測定。除賦予黏性以外,亦可利用噴墨印刷於單片化接著膜設置樹脂(可期待與通常之層形成或摻合物之添加相同之動作,但就作業工時及功能性賦予之觀點而言,具有能夠分開使用之優勢)來提高接著強度或可靠性。The monolithic adhesive film is preferably formed on the base material by half-cut processing, screen printing, or inkjet printing. Half-cut processing uses a Victoria knife to cut only the adhesive film without cutting the base material, and remove the useless parts through die-cutting processing, etc. Screen printing uses the pressure generated by a scraper to cause the adhesive to pass through the mesh of the screen to print (coat) it on the substrate, and to produce a single-piece adhesive film of a specific thickness based on, for example, the thickness of the screen. The mesh cover is made of silk mesh woven from synthetic fibers such as polyester or stainless steel or various metal fibers. When the adhesive contains solder particles, it is sufficient to make the mesh larger than the maximum diameter of the solder particles. Inkjet printing can inject a specified amount of resin from the nozzle. Since the resin can be patterned onto the object (adhesion film) from the nozzle, no plate is required. For example, viscosity can be provided on the surface of the singulated adhesive film by dots or lines of resin on a portion of the surface of the singulated adhesive film. It can also be injected to more than half of the entire surface to form a layer. The thickness can be measured in the same manner as the following singulated adhesive film. In addition to providing viscosity, inkjet printing can also be used to provide resin on the single-piece adhesive film (the same operation as normal layer formation or addition of blends can be expected, but from the viewpoint of operation time and functional provision) In other words, it has the advantage of being able to be used separately) to improve bonding strength or reliability.

圖1~圖3係用以對第1實施形態之連接結構體之製造方法進行說明之圖,圖1係表示基板之一例之俯視圖,圖2係表示膜結構體之一例之俯視圖,圖3係表示將單片化接著膜暫貼於基板上之狀態之圖。1 to 3 are diagrams for explaining the manufacturing method of the connection structure according to the first embodiment. Fig. 1 is a top view showing an example of a substrate. Fig. 2 is a top view showing an example of a membrane structure. Fig. 3 is a top view showing an example of a membrane structure. A diagram showing the state where the individualized adhesive film is temporarily attached to the substrate.

[步驟(A1)] 如圖1所示,於步驟(A1)中,準備供安裝複數個電子零件之基板10。基板10具備第1連接器安裝區域11、第2連接器安裝區域12、第1晶片安裝區域13、第2晶片安裝區域14、第3晶片安裝區域15、第4晶片安裝區域16、第5晶片安裝區域17、及第6晶片安裝區域18。於各安裝區域11~18形成有與各電子零件對應之端子。 [Step (A1)] As shown in FIG. 1 , in step (A1), a substrate 10 for mounting a plurality of electronic components is prepared. The substrate 10 includes a first connector mounting area 11, a second connector mounting area 12, a first chip mounting area 13, a second chip mounting area 14, a third chip mounting area 15, a fourth chip mounting area 16, and a fifth chip. Mounting area 17 and sixth chip mounting area 18. Terminals corresponding to the respective electronic components are formed in each of the mounting areas 11 to 18 .

基板10並無特別限定,只要為對回焊熱具有耐熱性之硬質基板或可撓性基板(FPC:Flexible Printed Circuits)即可,例如可使用玻璃環氧基板、陶瓷基板、塑膠基板、樹脂多層基板等。又,較佳為對各安裝區域11~18之端子實施金、鎳、鈀、銀、銅、錫等之鍍覆。The substrate 10 is not particularly limited, as long as it is a hard substrate or a flexible printed circuit (FPC: Flexible Printed Circuits) that is heat-resistant to reflow heat. For example, a glass epoxy substrate, a ceramic substrate, a plastic substrate, or a resin multilayer substrate can be used. substrate, etc. Furthermore, it is preferable that the terminals of each mounting area 11 to 18 are plated with gold, nickel, palladium, silver, copper, tin, or the like.

電子零件並無特別限定,只要為能夠藉由回焊而接合者即可,例如可列舉連接器、IC(Integrated Circuit)或LSI(Large Scale Integration)之封裝、LED(Light Emitting Diode)、開關等。作為連接器,例如可列舉插座連接器或插頭連接器,且可列舉插座連接器覆蓋並嵌合插頭連接器之式樣者。又,插座連接器為了避免整體外形變得過大,減小嵌合後之外形,可設為與插頭連接器相比,插座連接器之端子長度較短之式樣。若端子長度變短,則焊接面積亦會相應地減小,故有插座連接器與基板之間之焊接強度減小之傾向。因此,為了使插座連接器以相對小之焊接面積獲得充分之強度,亦可使導電接著膜之厚度大於插頭連接器之焊接中所使用之導電接著膜之厚度,且亦拓寬導電接著膜之面積。此種零件之大小與接著膜之厚度或面積之調整並不限定於插座連接器,於本技術中,其他零件亦可藉由大小或重量、焊接面積來適當調整。Electronic components are not particularly limited as long as they can be joined by reflow soldering. Examples include connectors, IC (Integrated Circuit) or LSI (Large Scale Integration) packages, LED (Light Emitting Diode), switches, etc. . Examples of the connector include a receptacle connector and a plug connector, and a receptacle connector covering and fitting into a plug connector may be used. In addition, in order to prevent the overall appearance of the receptacle connector from becoming too large and reduce the outer appearance after mating, the receptacle connector may have a shorter terminal length than the plug connector. If the terminal length is shortened, the soldering area will be correspondingly reduced, so the soldering strength between the socket connector and the substrate tends to be reduced. Therefore, in order for the socket connector to obtain sufficient strength with a relatively small soldering area, the thickness of the conductive adhesive film can also be made larger than that used in the soldering of the plug connector, and the area of the conductive adhesive film can also be widened . The adjustment of the size of such parts and the thickness or area of the adhesive film is not limited to socket connectors. In this technology, other parts can also be appropriately adjusted by size or weight, and welding area.

[步驟(B1)] 如圖2所示,於步驟(B1)中準備膜結構體,該膜結構體於與供安裝複數個電子零件之基板10對應之基材20上之規定位置配置有包含含有焊料粒子之單片化接著膜的複數個單片化接著膜21~28。 [Step (B1)] As shown in FIG. 2 , in step (B1), a film structure is prepared in which a single piece containing solder particles is arranged at a predetermined position on the base material 20 corresponding to the substrate 10 on which a plurality of electronic components are mounted. A plurality of the adhesive films are separated into individual sheets 21 to 28.

作為單片化接著膜21~28,並無特別限制,可列舉膜狀之導電性膜、由焊料粒子熔融所得之含焊料粒子之樹脂膜、各向異性導電膜(ACF:Anis otropic Conductive Film)、膜狀之接著膜(NCF:Non Conductive Film)等。其等可為單層,亦可為2層以上之層結構。組合並無特別限制,可藉由將導電性膜(含有焊料粒子)或含焊料粒子之樹脂膜之至少一者積層於接著膜(不含焊料粒子),來調整一個單片化接著膜中之膜之厚度與焊料粒子之含量。於該情形時,只要根據目的選擇將哪一個面設為基板側即可。The singulated adhesive films 21 to 28 are not particularly limited, and examples include film-shaped conductive films, solder particle-containing resin films obtained by melting solder particles, and anisotropic conductive films (ACF: Anis otropic Conductive Film). , film-like adhesive film (NCF: Non Conductive Film), etc. They can be a single layer or a layered structure of 2 or more layers. There are no particular restrictions on the combination. By laminating at least one of a conductive film (containing solder particles) or a resin film containing solder particles on an adhesive film (excluding solder particles), it is possible to adjust the composition of a single-piece adhesive film. Film thickness and solder particle content. In this case, it is only necessary to select which surface should be the substrate side according to the purpose.

膜結構體可為以與1個基板對應之方式於基材20上配置有單片化接著膜21~28之片材,亦可為於帶狀基材上將單片化接著膜21~28於長度方向上隔開單元區域連續配置並捲繞而成之卷盤。此處,「單元區域」表示於基材之長度方向上具有規定長度,例如矩形狀之區域。The film structure may be a sheet in which the individualized adhesive films 21 to 28 are arranged on the base material 20 so as to correspond to one substrate, or may be a sheet in which the individualized adhesive films 21 to 28 are arranged on a strip-shaped base material. A reel that is continuously arranged and wound with unit areas separated in the length direction. Here, the "unit area" means an area having a predetermined length in the longitudinal direction of the base material, for example, a rectangular shape.

圖2所示之膜結構體之第1單片化接著膜21~第8單片化接著膜28全部含有焊料粒子,但並不限定於此,只要第1單片化接著膜21~第8單片化接著膜28之1個以上含有焊料粒子即可。於圖2所示之膜結構體中,第1單片化接著膜21a、21b分別與第1連接器安裝區域11之端子行對應,第2單片化接著膜22a、22b分別與第2連接器安裝區域12之端子行對應。又,第3單片化接著膜23~第8單片化接著膜28分別與第1晶片安裝區域13、第2晶片安裝區域14、第3晶片安裝區域15、第4晶片安裝區域16、第5晶片安裝區域17、第6晶片安裝區域18對應。又,膜結構體於基材20上具有不存在單片化連接膜21~28之區域。In the film structure shown in FIG. 2 , all the first to eighth individualized adhesive films 21 to 28 contain solder particles, but the film structure is not limited to this as long as the first to eighth individualized adhesive films 21 to 28 It is sufficient that at least one of the individualized adhesive films 28 contains solder particles. In the film structure shown in FIG. 2, the first individualized adhesive films 21a and 21b respectively correspond to the terminal rows of the first connector mounting area 11, and the second individualized adhesive films 22a and 22b respectively correspond to the second connection Corresponds to the terminal row of device installation area 12. Moreover, the third singulation adhesive film 23 to the eighth singulation adhesive film 28 are respectively connected with the first wafer mounting area 13, the second wafer mounting area 14, the third wafer mounting area 15, the fourth wafer mounting area 16, and the third wafer mounting area 14. The fifth chip mounting area 17 and the sixth chip mounting area 18 correspond to each other. In addition, the film structure has a region on the base material 20 in which the individualized connection films 21 to 28 do not exist.

[步驟(C1)] 如圖3所示,於步驟(C1)中,將複數個單片化接著膜21~28一次性暫貼於基板10之規定部位,使複數個單片化接著膜21~28自基材20一次性轉接著至基板10。將配置有複數個單片化接著膜21~28之基材20一面對準,一面一次性暫貼(貼附)於基板10上,藉此,與將複數個單片化接著膜21~28分開暫貼相比,能夠縮短製程產距。又,藉由於基材20設置對準標記,可進一步提高定位精度。 [Step (C1)] As shown in FIG. 3 , in step (C1), a plurality of individualized adhesive films 21 to 28 are temporarily attached to a predetermined position of the substrate 10 at one time, so that the plurality of individualized adhesive films 21 to 28 are removed from the base material 20 Transferred to the substrate 10 in one go. The base material 20 on which the plurality of individualized adhesive films 21 to 28 is arranged is aligned and temporarily affixed (attached) to the substrate 10 at one time, whereby the plurality of individualized adhesive films 21 to 28 are attached. 28. Compared with temporary bonding, the production lead time can be shortened. In addition, by providing alignment marks on the base material 20, positioning accuracy can be further improved.

將第1單片化接著膜21a、21b暫貼於第1連接器安裝區域11,將第2單片化接著膜22a、22b暫貼於第2連接器安裝區域12。又,分別將第3單片化接著膜23~第8單片化接著膜28暫貼於第1晶片安裝區域13~第6晶片安裝區域18。The first singulation adhesive films 21a and 21b are temporarily affixed to the first connector mounting area 11, and the second singulation adhesive films 22a and 22b are temporarily affixed to the second connector mounting area 12. Furthermore, the third singulation adhesive film 23 to the eighth singulation adhesive film 28 are temporarily attached to the first wafer mounting area 13 to the sixth wafer mounting area 18, respectively.

[步驟(D1)] 於步驟(D1)中,將電子零件載置於單片化接著膜21~28上。於步驟(D1)中,較佳為使用貼片機拾取電子零件,並將電子零件搭載於單片化接著膜21~28上。 [Step (D1)] In step (D1), the electronic components are placed on the singulation adhesive films 21 to 28. In step (D1), it is preferable to use a chip mounter to pick up the electronic components and mount the electronic components on the single-piece adhesive films 21 to 28.

將第1連接器零件搭載於第1單片化接著膜21a、21b上,將第2連接器零件搭載於第2單片化接著膜22a、22b上。又,分別將第1晶片零件~第6晶片零件搭載於第3單片化接著膜23~第8單片化接著膜28上。再者,於圖3所示之例中,對1個連接器零件使用2個單片、及對1個晶片零件使用1個單片,但並不限定於此,亦可對1個連接器零件使用1個單片,亦可對1個晶片零件使用複數個單片。又,於在同一基板中具有凹凸或階差之情形、將電極之高度或位置不同之電子零件與基板組合之情形時,所需樹脂量不同,故單片化接著膜之厚度亦可分別不同。The first connector component is mounted on the first singulated adhesive films 21a and 21b, and the second connector component is mounted on the second singulated adhesive film 22a and 22b. Furthermore, the first to sixth wafer components are respectively mounted on the third to eighth singulation adhesive films 23 to 28 . Furthermore, in the example shown in FIG. 3 , two monolithic chips are used for one connector component and one monolithic chip is used for one chip component. However, the present invention is not limited to this, and one connector component may be used. One single chip is used for the component, and multiple single chips can be used for one chip component. In addition, when there are unevenness or steps in the same substrate, or when electronic components with different electrode heights or positions are combined with the substrate, the amount of resin required is different, so the thickness of the monolithic adhesive film can also be different. .

[步驟(E1)] 於步驟(E1)中,對設置有單片化接著膜21~28及電子零件之基板10進行回焊。回焊爐具備例如預加熱區域、正式加熱區域及冷卻區域,並使基板10依序流過,藉此使電子零件與基板10焊料接合。 [Step (E1)] In step (E1), the substrate 10 provided with the singulation adhesive films 21 to 28 and the electronic components is reflowed. The reflow furnace has, for example, a preheating area, a main heating area, and a cooling area, and allows the substrate 10 to flow through them sequentially, thereby bonding the electronic components to the substrate 10 with solder.

於回焊爐中,藉由加熱使導電性接著劑熔融,藉由焊料熔點以上之正式加熱使夾於電極間之焊料粒子於黏合劑流動等中移動、凝聚並熔融,使焊料潤濕擴散至電極,藉由冷卻將電子零件之端子行與基板10之端子行接合。回焊爐可不進行機械加壓而是無負載地將上述端子行加熱接合,故可抑制表面電子零件及基板10之損傷。作為回焊爐,可列舉大氣壓回焊、真空回焊、大氣壓烘箱、高壓釜(加壓烘箱)等,其等之中,較佳為使用可排除內包於接合部中之氣泡之真空回焊、高壓釜等。又,亦可使用利用了氮氣等惰性氣體之回焊爐。In the reflow furnace, the conductive adhesive is melted by heating. The formal heating above the melting point of the solder causes the solder particles sandwiched between the electrodes to move, condense and melt in the adhesive flow, etc., so that the solder is moistened and spreads to The electrodes join the terminal rows of the electronic components and the terminal rows of the substrate 10 by cooling. The reflow oven can heat and join the above-mentioned terminals without mechanical pressure, so it can suppress damage to the surface electronic components and the substrate 10 . Examples of the reflow oven include atmospheric pressure reflow, vacuum reflow, atmospheric pressure oven, autoclave (pressurized oven), etc. Among them, vacuum reflow that can eliminate air bubbles contained in the joint is preferably used. , autoclave, etc. In addition, a reflow furnace using inert gas such as nitrogen can also be used.

<1-1-1. 第1實施形態之變化例1> 於圖2所示之膜結構體中,對1個電子零件配置了1個單片化接著膜,但並不限定於此,亦可對2個以上之電子零件配置1個單片化接著膜。於該情形時,單片化接著膜較佳為於基板與電子零件之端子間之連接部位含有焊料粒子,連接部位以外不含焊料粒子。 <1-1-1. Modification 1 of the first embodiment> In the film structure shown in Figure 2, one single-piece adhesive film is arranged for one electronic component. However, the present invention is not limited to this. One single-piece adhesive film may be arranged for two or more electronic components. . In this case, it is preferable that the monolithic adhesive film contains solder particles at the connection part between the substrate and the terminal of the electronic component and does not contain solder particles other than the connection part.

圖4係表示膜結構體之變化例之俯視圖。圖4所示之膜結構體於基材30上配置有第1單片化接著膜30A~第4單片化接著膜30D。FIG. 4 is a plan view showing a modified example of the membrane structure. In the film structure shown in FIG. 4 , first to fourth individualized adhesive films 30A to 30D are arranged on a base material 30 .

第1單片化接著膜30A與第1連接器安裝區域11對應,具有含有焊料粒子之含有部31a、31b及不含焊料粒子之非含有部31c。含有部31a、31b相當於圖2所示之膜結構體之第1單片化接著膜21a、21b。The first singulated adhesive film 30A corresponds to the first connector mounting region 11 and has containing portions 31a and 31b containing solder particles and a non-containing portion 31c containing no solder particles. The containing portions 31a and 31b correspond to the first singulated adhesive films 21a and 21b of the film structure shown in Fig. 2 .

第2單片化接著膜30B與第2連接器安裝區域12對應,具有含有焊料粒子之含有部32a、32b及不含焊料粒子之非含有部32c。含有部32a、32b相當於圖2所示之膜結構體之第2單片化接著膜22a、22b。The second singulated adhesive film 30B corresponds to the second connector mounting area 12 and has containing portions 32a and 32b containing solder particles and a non-containing portion 32c containing no solder particles. The containing portions 32a and 32b correspond to the second singulated adhesive films 22a and 22b of the film structure shown in Fig. 2 .

第3單片化接著膜30C具有與第1晶片安裝區域13對應之含有焊料粒子之第1含有部33、與第2晶片安裝區域14對應之含有焊料粒子之第2含有部34、與第3晶片安裝區域15對應之含有焊料粒子之第3含有部35、與第4晶片安裝區域16對應之含有焊料粒子之第4含有部36、及使第1含有部33~第4含有部36一體化之不含焊料粒子之非含有部。第1含有部33~第4含有部36相當於圖2所示之膜結構體之第3單片化接著膜23~第6單片化接著膜26。The third singulation adhesive film 30C has a first containing portion 33 containing solder particles corresponding to the first chip mounting area 13, a second containing portion 34 containing solder particles corresponding to the second chip mounting area 14, and a third containing portion 33 corresponding to the first chip mounting area 13. The third containing part 35 containing solder particles corresponding to the chip mounting area 15, the fourth containing part 36 containing solder particles corresponding to the fourth chip mounting area 16, and the first containing part 33 to the fourth containing part 36 are integrated. The non-containing part does not contain solder particles. The first to fourth containing portions 33 to 36 correspond to the third to sixth individualizing adhesive films 23 to 26 of the film structure shown in FIG. 2 .

第4單片化接著膜30D具有與第5晶片安裝區域15對應之含有焊料粒子之第1含有部37、與第6晶片安裝區域16對應之含有焊料粒子之第2含有部38、及使第1含有部37~第2含有部38一體化之不含焊料粒子之非含有部。第1含有部37~第2含有部38相當於圖2所示之膜結構體之第7單片化接著膜27~第8單片化接著膜28。The fourth singulation adhesive film 30D has a first containing portion 37 containing solder particles corresponding to the fifth chip mounting area 15, a second containing portion 38 containing solder particles corresponding to the sixth chip mounting area 16, and has a first containing portion 37 containing solder particles corresponding to the sixth chip mounting area 16. The first containing part 37 to the second containing part 38 are integrated non-containing parts that do not contain solder particles. The first to second containing portions 37 to 38 correspond to the seventh to eighth individualized adhesive films 27 to 28 of the film structure shown in FIG. 2 .

圖5係表示將變化例之單片化接著膜一次性暫貼於基板上之狀態之圖。如圖5所示,於步驟(C1)中,將第1單片化接著膜30A~第4單片化接著膜30D一次性暫貼,且將第1單片化接著膜30A~第4單片化接著膜30D自基材30一次性轉印至基板10。FIG. 5 is a diagram showing a state in which a single-piece adhesive film according to the modification is temporarily attached to a substrate at one time. As shown in FIG. 5 , in step (C1), the first individualized adhesive film 30A to the fourth individualized adhesive film 30D are temporarily attached at once, and the first individualized adhesive film 30A to the fourth individualized adhesive film 30D are temporarily attached. The sheet-formed adhesive film 30D is transferred from the base material 30 to the substrate 10 at once.

將第1單片化接著膜30A暫貼於第1連接器安裝區域11,將第2單片化接著膜30B暫貼於第2連接器安裝區域12。又,將第3單片化接著膜30C暫貼於第1晶片安裝區域13~第4晶片安裝區域16,將第4單片化接著膜30D暫貼於第5晶片安裝區域17~第6晶片安裝區域18。再者,於圖5所示之例中,於在同一基板中具有凹凸或階差之情形或將電極之高度或位置不同之電子零件與基板進行組合之情形時,所需樹脂量不同,故含有焊料粒子之含有部或不含焊料粒子之非含有部之厚度亦可分別不同。The first singulation adhesive film 30A is temporarily affixed to the first connector mounting area 11 , and the second singulation adhesive film 30B is temporarily affixed to the second connector mounting area 12 . Furthermore, the third singulation adhesive film 30C is temporarily affixed to the first wafer mounting area 13 to the fourth wafer mounting area 16, and the fourth singulation adhesive film 30D is temporarily affixed to the fifth wafer mounting area 17 to the sixth wafer. Installation area 18. Furthermore, in the example shown in FIG. 5 , when the same substrate has unevenness or steps, or when electronic components with different electrode heights or positions are combined with the substrate, the amount of resin required is different, so the amount of resin required is different. The thickness of the containing part containing solder particles or the non-containing part not containing solder particles may also be different.

<1-1-2. 第1實施形態之變化例2> 於與焊料膏共用之情形時,將單片化接著膜暫貼後印刷焊料膏,其後進行貼片與回焊,藉此亦可實現與焊料膏之共用。 <1-1-2. Modification 2 of the first embodiment> In the case of sharing with solder paste, the single-piece adhesive film is temporarily attached and then printed with solder paste, and then mounted and reflowed. This can also be used with solder paste.

即,於第1實施形態中,於將單片化接著膜暫貼於基板上之步驟(C1)後進而設置於基板之規定部位設置焊料膏之步驟,並於載置零件之步驟(D1)中,將零件載置於焊料膏上,藉此,可共用單片化接著膜與焊料膏,從而亦能夠應對欲增加焊接部之焊料量之情形等。That is, in the first embodiment, after the step of temporarily attaching the singulation adhesive film to the substrate (C1), there is provided a step of applying solder paste to a predetermined portion of the substrate, and in the step of placing the components (D1) By placing the parts on the solder paste, the single-piece adhesive film and the solder paste can be shared, which can also be used when the amount of solder in the welded part is to be increased.

圖6~圖9係用以對第1實施形態之連接結構體之製造方法之變化例進行說明之圖。再者,於圖6~圖9中,為便於說明,暫貼1個單片化接著膜,但較理想為一次性暫貼複數個單片化接著膜。以下,針對暫貼單片化接著膜之暫貼步驟、印刷焊料膏之印刷步驟、載置電子零件之載置步驟、及進行回焊之回焊步驟進行說明。6 to 9 are diagrams for explaining variations of the method of manufacturing the connected structure of the first embodiment. In addition, in FIGS. 6 to 9 , for convenience of explanation, one single-piece adhesive film is temporarily attached, but it is preferable to temporarily attach a plurality of single-piece adhesive films at one time. Hereinafter, the steps of temporarily attaching the individualized adhesive film, the printing step of printing solder paste, the mounting step of mounting electronic components, and the reflow step of reflowing are explained.

[暫貼步驟] 圖6係表示將單片化接著膜暫貼於基板上之暫貼步驟之圖,圖6(A)係截面圖,圖6(B)係俯視圖。基板40具有單片化接著膜安裝區域41及焊料膏安裝區域42。於焊料膏安裝區域42具有第1電極43~第4電極46。 [Temporarily posted steps] Fig. 6 is a diagram showing the temporary attaching step of temporarily attaching the individualized adhesive film to the substrate. Fig. 6(A) is a cross-sectional view and Fig. 6(B) is a top view. The substrate 40 has a singulated adhesive film mounting area 41 and a solder paste mounting area 42 . The solder paste mounting area 42 has first to fourth electrodes 43 to 46 .

如圖6所示,於暫貼單片化接著膜之步驟中,將單片化接著膜51暫貼於基板40上之單片化接著膜安裝區域41。暫貼步驟與圖3所示之步驟(C1)相同。再者,於在同一基板中具有凹凸或階差之情形時或將電極之高度或位置不同之電子零件與基板組合之情形時,所需樹脂量不同,故單片化接著膜之厚度亦可分別不同。As shown in FIG. 6 , in the step of temporarily attaching the individualized adhesive film, the individualized adhesive film 51 is temporarily attached to the individualized adhesive film mounting area 41 on the substrate 40 . The temporary pasting steps are the same as step (C1) shown in Figure 3. Furthermore, when there are unevenness or steps in the same substrate, or when electronic components with different electrode heights or positions are combined with the substrate, the amount of resin required is different, so the thickness of the single-piece adhesive film can also be Different respectively.

[印刷步驟] 圖7係表示印刷焊料膏之步驟之圖,圖7(A)係截面圖,圖7(B)係俯視圖。如圖7所示,於印刷焊料膏之步驟中,使用金屬遮罩60及刮刀61將焊料膏63塗佈於第1電極43~第4電極46,形成第1焊料膏層63~第4焊料膏層66。較佳為於金屬遮罩60之底面,與單片化接著膜安裝區域41對應地設置凹部。藉由在金屬遮罩60之與單片化接著膜安裝區域41對應之底面設置凹部,可防止單片化接著膜51被壓扁,並且可防止單片化接著膜51貼合於金屬遮罩60。 [Printing steps] Fig. 7 is a diagram showing the steps of printing solder paste, Fig. 7(A) is a cross-sectional view, and Fig. 7(B) is a top view. As shown in FIG. 7 , in the step of printing the solder paste, the metal mask 60 and the scraper 61 are used to apply the solder paste 63 to the first to fourth electrodes 43 to 46 to form the first to fourth solder paste layers 63 to 46 . Paste layer 66. It is preferable to provide a recessed portion on the bottom surface of the metal mask 60 corresponding to the singulated adhesive film mounting area 41 . By providing a recess in the bottom surface of the metal mask 60 corresponding to the singulated adhesive film mounting area 41, the singulated adhesive film 51 can be prevented from being flattened, and the singulated adhesive film 51 can be prevented from being attached to the metal mask. 60.

[載置步驟] 圖8係表示載置零件之步驟之圖,圖8(A)係截面圖,圖8(B)係俯視圖。如圖8所示,於載置零件之步驟中,將第1晶片零件71搭載於單片化接著膜51上,將第2晶片零件72搭載於第1焊料膏層63及第2焊料膏層64上,將第3晶片零件73搭載於第3焊料膏層65及第4焊料膏層66上。於載置零件之步驟中,較佳為與步驟(D1)同樣,使用貼片機搭載第1晶片零件71~第3晶片零件73。 [Installation steps] Fig. 8 is a diagram showing the steps of placing parts, Fig. 8(A) is a cross-sectional view, and Fig. 8(B) is a top view. As shown in FIG. 8 , in the component mounting step, the first chip component 71 is mounted on the singulation adhesive film 51 , and the second chip component 72 is mounted on the first solder paste layer 63 and the second solder paste layer. 64, the third chip component 73 is mounted on the third solder paste layer 65 and the fourth solder paste layer 66. In the step of placing components, it is preferable to use a placement machine to mount the first to third chip components 71 to 73 in the same manner as step (D1).

[回焊步驟] 圖9(A)係表示回焊步驟之圖,圖9(B)係表示回焊步驟後之連接結構體之一例之圖。又,圖10係表示回焊爐之溫度條件之一例之曲線圖。 [Reflow step] FIG. 9(A) is a diagram showing the reflow step, and FIG. 9(B) is a diagram showing an example of the connection structure after the reflow step. In addition, FIG. 10 is a graph showing an example of the temperature conditions of the reflow furnace.

回焊步驟與步驟(E1)同樣,於回焊爐中,例如如圖10所示般升溫並以180℃預加熱1分30秒,進而升溫並以260℃正式加熱30秒,並進行冷卻,藉此使第1晶片零件71與基板40焊料接合,使第2晶片零件72、73與基板40焊料接合。The reflow step is the same as step (E1). In the reflow furnace, for example, as shown in Figure 10, the temperature is raised and preheated to 180°C for 1 minute and 30 seconds, then the temperature is raised and officially heated to 260°C for 30 seconds, and then cooled. Thereby, the first wafer component 71 and the substrate 40 are soldered together, and the second wafer components 72 and 73 are soldered to the substrate 40 .

<1-2 第2實施形態> 第2實施形態之連接結構體之製造方法具有:步驟(A2),其係準備供安裝複數個電子零件之基板;步驟(B2),其係準備於基材上設置有與複數個電子零件對應之單片化接著膜之膜結構體;步驟(D2),其係使用貼片機將電子零件按壓至與該電子零件對應之單片化接著膜,使單片化接著膜貼合於電子零件,並搭載貼合有單片化接著膜之電子零件;及步驟(E2),其係對設置有單片化接著膜及電子零件之基板進行回焊。根據第2實施形態之連接結構體之製造方法,由於係使用貼片機將電子零件按壓至與該電子零件對應之單片化接著膜,使單片化接著膜貼合於電子零件,並搭載貼合有單片化接著膜之電子零件,故能夠縮短製程產距。又,要準備之膜結構體未必需要與基板之佈局一致,故可緊密地裝入單片,作為膜結構體,可期待能夠節省空間之效果。 <1-2 Second Embodiment> The manufacturing method of the connection structure of the second embodiment includes: step (A2), which is to prepare a substrate for mounting a plurality of electronic components; step (B2), which is to prepare a substrate corresponding to the plurality of electronic components. The film structure of the single-piece adhesive film; step (D2), which uses a placement machine to press the electronic component to the single-piece adhesive film corresponding to the electronic component, so that the single-piece adhesive film is bonded to the electronic component , and equipped with electronic components bonded with a single-chip adhesive film; and step (E2), which is to reflow the substrate provided with the single-chip adhesive film and the electronic components. According to the manufacturing method of the connected structure of the second embodiment, the electronic component is pressed against the singulated adhesive film corresponding to the electronic component using a chip mounter, so that the singulated adhesive film is bonded to the electronic component and mounted. Since electronic components with single-chip adhesive films are laminated together, the manufacturing process lead time can be shortened. In addition, the membrane structure to be prepared does not necessarily need to be consistent with the layout of the substrate, so it can be packed tightly into a single piece. As a membrane structure, a space-saving effect can be expected.

以下,針對準備基板之步驟(A2)、準備膜結構體之步驟(B2)、搭載電子零件之步驟(D2)、及對基板進行回焊之步驟(E2)進行說明。再者,對與第1實施形態相同之結構標註相同符號,且此處省略說明。Hereinafter, the steps of preparing the substrate (A2), preparing the film structure (B2), mounting electronic components (D2), and reflowing the substrate (E2) are explained. In addition, the same structures as those in the first embodiment are denoted by the same reference numerals, and descriptions thereof are omitted here.

[步驟(A2)] 於步驟(A2)中,與第1實施形態之步驟(A1)同樣,準備供安裝複數個電子零件之基板10。 [Step (A2)] In step (A2), similarly to step (A1) of the first embodiment, a substrate 10 on which a plurality of electronic components is mounted is prepared.

[步驟(B2)] 於步驟(B2)中,準備於基材上設置有與複數個電子零件對應之單片化接著膜之膜結構體。膜結構體較佳為於帶狀基材上將單片化接著膜於長度方向上隔開特定範圍連續配置並捲繞而成之卷盤。 [Step (B2)] In step (B2), a film structure in which individualized adhesive films corresponding to a plurality of electronic components are provided on a base material is prepared. The film structure is preferably a reel in which the single-piece adhesive film is continuously arranged at a specific range in the length direction on a belt-shaped base material and wound.

圖11係表示自卷盤抽出之單片化接著膜之俯視圖。如圖11所示,較佳為準備分別將第1單片化接著膜21~第8單片化接著膜28捲繞而成之第1卷盤~第8卷盤。再者,與圖2所示之步驟(B1)同樣,亦可準備於與供安裝複數個電子零件之基板10對應之基材20上之規定位置配置有包含含有焊料粒子之單片化接著膜之複數個單片化接著膜21~28的膜結構體。Fig. 11 is a top view showing the individualized adhesive film taken out from the reel. As shown in FIG. 11 , it is preferable to prepare first to eighth reels in which the first to eighth individualized adhesive films 21 to 28 are respectively wound. Furthermore, similar to the step (B1) shown in FIG. 2 , a singulated adhesive film containing solder particles may also be prepared and arranged at a predetermined position on the base material 20 corresponding to the substrate 10 on which a plurality of electronic components are mounted. A plurality of film structures are formed into individual pieces and the films 21 to 28 are connected to each other.

[步驟(D2)] 於步驟(D2)中,使用貼片機將電子零件按壓至與該零件對應之單片化接著膜,使單片化接著膜貼合於電子零件,並搭載貼合有單片化接著膜之電子零件。再者,於在同一基板中具有凹凸或階差之情形或將電極之高度或位置不同之電子零件與基板組合之情形時,所需樹脂量不同,故單片化接著膜之厚度可針對各電子零件分別不同。 [Step (D2)] In step (D2), use a placement machine to press the electronic component onto the singulated adhesive film corresponding to the part, so that the singulated adhesive film is bonded to the electronic component, and the electronic component is mounted with the singulated adhesive film. Electronic parts. Furthermore, when there are unevenness or steps in the same substrate, or when electronic components with different electrode heights or positions are combined with the substrate, the amount of resin required is different, so the thickness of the monolithic adhesive film can be adjusted according to each. Electronic parts are individually different.

圖12~圖14係表示搭載零件之步驟之圖,圖12係表示使單片化接著膜貼合於電子零件之狀態之圖,圖13係表示將貼合於電子零件之單片化接著膜搭載於基板之狀態之圖,圖14係表示介隔單片化接著膜將電子零件搭載於基板之狀態之圖。Figures 12 to 14 are diagrams showing the steps of mounting components. Figure 12 is a diagram showing a state in which the singulated adhesive film is bonded to the electronic component. Figure 13 is a diagram showing the singulated adhesive film bonded to the electronic component. Figure 14 is a diagram showing the state of mounting an electronic component on a substrate via a singulation adhesive film.

如圖12所示,將由貼片機之吸附頭80拾取之電子零件81按壓至單片化接著膜82,使單片化接著膜82貼合於電子零件81,而將單片化接著膜82自基材83轉接著至電子零件81。繼而,如圖13及圖14所示,利用吸附頭80拾取貼合有單片化接著膜82之電子零件81,並介隔單片化接著膜82搭載於基板84。As shown in FIG. 12 , the electronic component 81 picked up by the suction head 80 of the placement machine is pressed to the singulation adhesive film 82 , so that the singulation adhesive film 82 is attached to the electronic component 81 , and the singulation adhesive film 82 is From the base material 83, it is transferred to the electronic component 81. Then, as shown in FIGS. 13 and 14 , the electronic component 81 to which the singulation adhesive film 82 is bonded is picked up using the adsorption head 80 and mounted on the substrate 84 with the singulation adhesive film 82 interposed therebetween.

藉此,與第1實施形態同樣,介隔第1單片化接著膜21a、21b將第1連接器零件搭載於第1連接器安裝區域11,介隔第2單片化接著膜22a、22b將第2連接器零件搭載於第2連接器安裝區域12。又,分別介隔第3單片化接著膜23~第8單片化接著膜28將第1晶片零件~第6晶片零件搭載於第1晶片安裝區域13~第6晶片安裝區域18。Thereby, similarly to the first embodiment, the first connector component is mounted on the first connector mounting area 11 with the first singulated adhesive films 21a and 21b interposed, and the second singulated adhesive films 22a and 22b are interposed with each other. The second connector component is mounted on the second connector mounting area 12. Furthermore, the first to sixth wafer components are mounted in the first to sixth wafer mounting areas 13 to 18 with the third to eighth singulation adhesive films 23 to 28 interposed therebetween, respectively.

[步驟(E2)] 於步驟(E2)中,與第1實施形態之步驟(E1)同樣,對設置有單片化接著膜21~28及電子零件之基板10進行回焊。 [Step (E2)] In step (E2), similarly to step (E1) of the first embodiment, the substrate 10 provided with the singulation adhesive films 21 to 28 and the electronic components is reflowed.

<1-2-1. 第2實施形態之變化例1> 於與焊料膏共用之情形時,於印刷焊料膏後,使用貼片機搭載貼合有單片化接著膜之電子零件並進行回焊,藉此亦可實現與焊料膏之共用。 <1-2-1. Modification 1 of the second embodiment> In the case of sharing with solder paste, after printing the solder paste, use a placement machine to mount the electronic components laminated with the monolithic adhesive film and reflow them, thereby realizing sharing with the solder paste.

即,於第2實施形態中,於搭載貼合有單片化接著膜之電子零件之步驟(D2)前,進而具有於基板之規定部位設置焊料膏之步驟及將電子零件載置於焊料膏上之步驟,藉此可共用單片化接著膜與焊料膏。That is, in the second embodiment, before the step (D2) of mounting the electronic components to which the singulation adhesive film is bonded, there are further steps of disposing solder paste on a predetermined portion of the substrate and placing the electronic components on the solder paste. Through the above steps, the monolithic adhesive film and solder paste can be shared.

<1-3 第3實施形態> 第3實施形態之連接結構體之製造方法具有:步驟(A3),其係準備供安裝複數個電子零件之基板;步驟(B3),其係準備於基材上設置有與複數個電子零件對應之單片化接著膜之膜結構體;步驟(C3),其係使用貼片機將單片化接著膜搭載於基板之規定部位;步驟(D3),其係將電子零件載置於單片化接著膜上;及步驟(E3),其係對設置有單片化接著膜及電子零件之基板進行回焊。根據第3實施形態之連接結構體之製造方法,使用貼片機頭將單片化接著膜搭載於基板之規定部位,藉此,暫貼製程本身消失,故能夠縮短製程產距。又,要準備之膜結構體未必必須與基板之佈局一致,故可緊密地裝入單片,作為膜結構體,可期待能夠節省空間之效果。 <1-3 Third Embodiment> The manufacturing method of the connection structure of the third embodiment includes: step (A3), which is to prepare a substrate for mounting a plurality of electronic components; step (B3), which is to prepare a substrate corresponding to the plurality of electronic components. The film structure of the single-piece adhesive film; step (C3), which uses a placement machine to mount the single-piece adhesive film on a prescribed position of the substrate; step (D3), which places the electronic components on the single chip on the adhesive film; and step (E3), which is to reflow the substrate provided with the monolithic adhesive film and the electronic components. According to the manufacturing method of the connected structure of the third embodiment, a mounting head is used to mount the singulated adhesive film on a predetermined position of the substrate. This eliminates the temporary bonding process itself, so the process throughput can be shortened. In addition, the membrane structure to be prepared does not necessarily have to match the layout of the substrate, so it can be packed tightly into a single piece. As a membrane structure, a space-saving effect can be expected.

以下,針對準備基板之步驟(A3)、準備膜結構體之步驟(B3)、搭載單片化接著膜之步驟(C3)、搭載電子零件之步驟(D3)、及對基板進行回焊之步驟(E3)進行說明。再者,對與第1實施形態及第2實施形態相同之結構標註相同符號,且此處省略說明。The following describes the steps for preparing the substrate (A3), preparing the film structure (B3), mounting the monolithic adhesive film (C3), mounting electronic components (D3), and reflowing the substrate. (E3) for explanation. In addition, the same structures as those in the first embodiment and the second embodiment are denoted by the same reference numerals, and descriptions thereof are omitted here.

[步驟(A3)] 於步驟(A3)中,與第1實施形態之步驟(A1)同樣,準備供安裝複數個電子零件之基板10。 [Step (A3)] In step (A3), similarly to step (A1) of the first embodiment, the substrate 10 on which a plurality of electronic components are mounted is prepared.

[步驟(B3)] 於步驟(B3)中,與第2實施形態之步驟(B2)同樣,準備於基材上設置有與複數個零件對應之單片化接著膜之膜結構體。膜結構體較佳為於帶狀基材上將單片化接著膜於長度方向上隔開特定範圍連續配置並捲繞而成之卷盤。 [Step (B3)] In step (B3), similarly to step (B2) of the second embodiment, a film structure in which individualized adhesive films corresponding to a plurality of parts are provided on a base material is prepared. The film structure is preferably a reel in which the single-piece adhesive film is continuously arranged at a specific range in the length direction on a belt-shaped base material and wound.

[步驟(C3))] 於步驟(C3)中,使用貼片機將單片化接著膜搭載於基板之規定部位。貼片機具備吸附單片化接著膜之吸附頭。 [Step (C3))] In step (C3), a mounting machine is used to mount the singulated adhesive film on a predetermined position of the substrate. The placement machine is equipped with an adsorption head for adsorbing the single-piece adhesive film.

圖15係表示吸附頭之結構例之圖,圖15(A)係表示吸附頭之吸附面之俯視圖,圖15(B)係表示吸附頭之側面之側視圖。如圖15所示,吸附頭90於前端具備彈性體層91,於彈性體表面具有吸附孔92。FIG. 15 is a diagram showing a structural example of the suction head. FIG. 15(A) is a top view of the suction surface of the suction head, and FIG. 15(B) is a side view of the side of the suction head. As shown in FIG. 15 , the adsorption head 90 is provided with an elastomer layer 91 at the front end and has adsorption holes 92 on the surface of the elastomer.

彈性體層91中之吸附面之橫寬x1及縱寬y1之上限較佳為30 mm以下,更佳為20 mm以下,進而較佳為15 mm以下。又,吸附面中之吸附孔92之形成區域之橫寬x2及縱寬y2之下限較佳為0.5 mm以上,更佳為1.0 mm以上,進而較佳為2.0 mm以上。又,吸附孔92之直徑之下限較佳為0.05 mm以上,更佳為0.1 mm以上,進而較佳為0.2 mm以上,吸附孔92之直徑之上限較佳為3 mm以下,更佳為1 mm以下,進而較佳為0.5 mm以下。又,亦可於一個吸附頭設置複數個吸附孔區域來吸附複數個單片化接著膜,從而將複數個單片化接著膜一起貼片。The upper limit of the horizontal width x1 and the vertical width y1 of the adsorption surface in the elastomer layer 91 is preferably 30 mm or less, more preferably 20 mm or less, and further preferably 15 mm or less. In addition, the lower limit of the horizontal width x2 and the vertical width y2 of the area where the adsorption holes 92 are formed in the adsorption surface is preferably 0.5 mm or more, more preferably 1.0 mm or more, and further preferably 2.0 mm or more. In addition, the lower limit of the diameter of the adsorption hole 92 is preferably 0.05 mm or more, more preferably 0.1 mm or more, and further preferably 0.2 mm or more. The upper limit of the diameter of the adsorption hole 92 is preferably 3 mm or less, more preferably 1 mm. or less, and more preferably 0.5 mm or less. In addition, a plurality of adsorption hole areas may be provided in one adsorption head to adsorb a plurality of individualized adhesive films, thereby bonding a plurality of individualized adhesive films together.

彈性體層91例如係由聚矽氧橡膠、氟橡膠、胺酯(Urethane)橡膠等熱硬化性彈性體構成。彈性體層91之厚度之下限較佳為50 μm以上,更佳為100 μm以上,進而較佳為150 μm以上,厚度之上限較佳為500 μm以下,更佳為300 μm以下,進而較佳為250 μm以下。藉此,即便基板存在凹凸或階差,亦可將單片化接著膜貼附至規定場所。The elastomer layer 91 is made of a thermosetting elastomer such as silicone rubber, fluororubber, or urethane rubber. The lower limit of the thickness of the elastomer layer 91 is preferably 50 μm or more, more preferably 100 μm or more, further preferably 150 μm or more, and the upper limit of the thickness is preferably 500 μm or less, more preferably 300 μm or less, and further preferably Below 250 μm. This allows the individualized adhesive films to be attached to specified locations even if the substrate has unevenness or steps.

藉由使用此種吸附頭,與第1實施形態同樣,將第1單片化接著膜21a、21b搭載於第1連接器安裝區域11,將第2單片化接著膜22a、22b搭載於第2連接器安裝區域12。又,分別將第3單片化接著膜23~第8單片化接著膜28搭載於第1晶片安裝區域13~第6晶片安裝區域18。再者,於在同一基板中具有凹凸或階差之情形或將電極之高度或位置不同之電子零件與基板組合之情形時,所需樹脂量不同,故單片化接著膜之厚度亦可分別不同。By using this suction head, like the first embodiment, the first singulation adhesive films 21a and 21b are mounted on the first connector mounting area 11, and the second singulation adhesive films 22a and 22b are mounted on the first connector mounting area 11. 2 Connector mounting area 12. Furthermore, the third singulation adhesive film 23 to the eighth singulation adhesive film 28 are respectively mounted on the first wafer mounting area 13 to the sixth wafer mounting area 18 . Furthermore, when there are unevenness or steps in the same substrate, or when electronic components with different heights or positions of electrodes are combined with the substrate, the amount of resin required is different, so the thickness of the monolithic adhesive film can also be different. different.

[步驟(D3)] 於步驟(D3)中,與第1實施形態之步驟(D3)同樣,將電子零件載置於單片化接著膜21~28上。藉此,與第1實施形態同樣,將第1連接器零件搭載於第1單片化接著膜21a、21b上,將第2連接器零件搭載於第2單片化接著膜22a、22b上。又,分別將第1晶片零件~第6晶片零件搭載於第3單片化接著膜23~第8單片化接著膜28上。 [Step (D3)] In step (D3), similarly to step (D3) of the first embodiment, the electronic components are placed on the singulation adhesive films 21 to 28. Thereby, similarly to the first embodiment, the first connector component is mounted on the first singulated adhesive films 21a and 21b, and the second connector component is mounted on the second singulated adhesive films 22a and 22b. Furthermore, the first to sixth wafer components are respectively mounted on the third to eighth singulation adhesive films 23 to 28 .

[步驟(E2)] 於步驟(E2)中,與第1實施形態之步驟(E1)同樣,對設置有單片化接著膜21~28及電子零件之基板10進行回焊。 [Step (E2)] In step (E2), similarly to step (E1) of the first embodiment, the substrate 10 provided with the singulation adhesive films 21 to 28 and the electronic components is reflowed.

<1-3-1. 第3實施形態之變化例1> 於與焊料膏共用之情形時,於印刷焊料膏後,使用貼片機搭載單片化接著膜及電子零件並進行回焊,藉此亦可實現與焊料膏之共用。 <1-3-1. Modification 1 of the third embodiment> In the case of sharing with solder paste, after printing the solder paste, use a placement machine to mount the singulated adhesive film and electronic components and perform reflow soldering. This can also be used with solder paste.

即,於第3實施形態中,於搭載單片化接著膜之步驟(C3)前,進而具有於基板之規定部位設置焊料膏之步驟及將電子零件載置於焊料膏上之步驟,藉此可共用單片化接著膜與焊料膏。That is, in the third embodiment, before the step of mounting the singulation adhesive film (C3), there are further steps of placing solder paste on a predetermined position of the substrate and placing electronic components on the solder paste. Monolithic bonding film and solder paste can be shared.

再者,本技術之連接結構體之製造方法例如可用於半導體裝置(驅動器IC、以及利用了光學元件或熱電轉換元件、光電轉換元件等半導體者全部包含在內)、顯示裝置(監視器、電視、頭戴式顯示器等)、行動裝置(平板終端、智慧型手機、可佩戴式終端等)、遊戲機、視聽設備、攝像裝置(使用相機模組等影像感測器者)、車輛(移動裝置)用電氣安裝、醫療機器、感測器設備(觸控感測器、指紋驗證、虹膜驗證等)、家電製品等使用電性連接之所有電子機器之製造方法。Furthermore, the manufacturing method of the connection structure of the present technology can be used, for example, in semiconductor devices (including driver ICs and those using semiconductors such as optical elements, thermoelectric conversion elements, and photoelectric conversion elements), display devices (monitors, televisions, etc.) , head-mounted displays, etc.), mobile devices (tablet terminals, smartphones, wearable terminals, etc.), game consoles, audio-visual equipment, camera devices (those using image sensors such as camera modules), vehicles (mobile devices ) Manufacturing method for all electronic equipment that uses electrical connections such as electrical installations, medical equipment, sensor equipment (touch sensors, fingerprint verification, iris verification, etc.), home appliances, etc.

<2. 膜結構體、及膜結構體之製造方法> <2-1. 第1實施形態> 第1實施形態之膜結構體具備基材、及配置於與複數個電子零件對應之上述基材上之規定位置的複數個單片化接著膜,上述複數個單片化接著膜之1個以上含有焊料粒子。根據第1實施形態之膜結構體,由於將單片化接著膜配置於與複數個電子零件對應之基材之規定位置,故可一次性暫貼於基板上,且可使用回焊爐安裝電子零件。 <2. Membrane structure and method of manufacturing membrane structure> <2-1. First Embodiment> The film structure of the first embodiment includes a base material, and a plurality of singulated adhesive films arranged at predetermined positions on the base material corresponding to a plurality of electronic components, and at least one of the plurality of singulated adhesive films is provided. Contains solder particles. According to the film structure of the first embodiment, since the single-piece adhesive film is arranged at a predetermined position on the base material corresponding to a plurality of electronic components, it can be temporarily attached to the substrate at once, and the electronic components can be mounted using a reflow oven. Component.

又,第1實施形態之膜結構體之製造方法於第1基材上設置第1單片化接著膜,於第2基材上設置第2單片化接著膜,於與複數個電子零件對應之第1基材、第2基材、或第3基材之規定位置配置第1單片化接著膜及第2單片化接著膜,第1單片化接著膜及第2單片化接著膜之1個以上含有焊料粒子。Furthermore, the manufacturing method of the film structure of the first embodiment provides a first singulated adhesive film on the first base material and a second singulated adhesive film on the second base material, so as to correspond to a plurality of electronic components. The first singulated adhesive film and the second singulated adhesive film are arranged at predetermined positions of the first base material, the second base material, or the third base material, and the first singulated adhesive film and the second singulated adhesive film are arranged One or more of the films contains solder particles.

基材係支持複數個單片化接著膜之支持膜。作為基材,例如可列舉PET(Poly Ethylene Terephthalate)、OPP(Oriented Polypropylene)、PMP(Poly-4-methylpentene-1)、PTFE(Polytetrafluoroethylene)等。又,基材可較佳地使用至少單片化接著膜側之面藉由例如聚矽氧樹脂進行剝離處理者。The base material is a support film that supports a plurality of single-piece adhesive films. Examples of the base material include PET (Poly Ethylene Terephthalate), OPP (Oriented Polypropylene), PMP (Poly-4-methylpentene-1), PTFE (Polytetrafluoroethylene), and the like. In addition, it is preferable to use one in which at least the surface on the single-piece adhesive film side is peeled off with, for example, polysiloxane resin.

基材之厚度並無特別限定。就剝離之觀點而言,基材之厚度之下限較佳為10 μm以上,更佳為25 μm以上,進而較佳為38 μm以上。若基材之厚度之上限過厚,則有接著膜受到過大壓力之顧慮,故較佳為200 μm以下,更佳為100 μm以下,進而較佳為75 μm以下,亦可設為50 μm以下。The thickness of the base material is not particularly limited. From the viewpoint of peeling, the lower limit of the thickness of the base material is preferably 10 μm or more, more preferably 25 μm or more, and further preferably 38 μm or more. If the upper limit of the thickness of the base material is too thick, there is a concern that the adhesive film may be subjected to excessive pressure, so it is preferably 200 μm or less, more preferably 100 μm or less, further preferably 75 μm or less, and may be 50 μm or less. .

又,基材之寬度亦並無特別限定。就捲繞之觀點而言,基材之寬度之下限較佳為1 mm以上,更佳為2 mm以上,進而較佳為4 mm以上。若基材之寬度之上限過大,則有手持及操作變得困難之顧慮,故較佳為500 mm以下,更佳為250 mm以下,進而較佳為120 mm以下。In addition, the width of the base material is not particularly limited. From the viewpoint of winding, the lower limit of the width of the base material is preferably 1 mm or more, more preferably 2 mm or more, and further preferably 4 mm or more. If the upper limit of the width of the base material is too large, it may become difficult to hold and operate, so it is preferably 500 mm or less, more preferably 250 mm or less, and still more preferably 120 mm or less.

膜結構體可為以與1個基板對應之方式於基材上配置有複數個單片化接著膜之片材,亦可為於帶狀基材上將複數個單片化接著膜於長度方向上隔開單元區域連續配置並捲繞而成之卷盤。於為卷盤之情形時,基材之寬度可為連接對象之電子零件佈局區域(矩形區域)之短邊側,亦可為場邊側。此處,「單元區域」表示於基材之長度方向上具有特定長度,例如矩形狀之區域。The film structure may be a sheet in which a plurality of individualized adhesive films are arranged on a base material in a manner corresponding to one substrate, or may be a strip-shaped base material in which a plurality of individualized adhesive films are arranged in the length direction. A reel formed by continuously arranging and winding separated unit areas. In the case of a reel, the width of the base material may be the short side of the electronic component layout area (rectangular area) of the connection object, or the width of the field side. Here, the "unit area" refers to an area having a specific length in the longitudinal direction of the substrate, for example, a rectangular shape.

單片化接著膜可藉由半切加工、網版印刷、或噴墨印刷形成於基材上。半切加工係藉由維多利亞刀僅對接著膜進行切割而不對基材進行切割,並藉由模切加工等將無用部分去除。網版印刷係利用刮刀等所產生之壓力使接著劑通過網罩之網眼而印刷(塗佈)於基材上,並藉由例如網罩之厚度製作特定厚度之單片化接著膜。網罩係使用由聚酯等合成纖維或不鏽鋼或者各種金屬纖維織成之絲網之版。於接著劑包含焊料粒子之情形時,只要使網眼大於焊料粒子之最大直徑即可。噴墨印刷不需要版而是自資料直接圖案化,例如藉由噴嘴直徑控制塗佈量來製作規定厚度之單片化接著膜。於接著劑包含焊料粒子之情形時,只要使噴嘴直徑大於焊料粒子之最大直徑即可。The monolithic adhesive film can be formed on the substrate by half-cut processing, screen printing, or inkjet printing. Half-cut processing uses a Victoria knife to cut only the adhesive film without cutting the base material, and remove the useless parts through die-cutting processing, etc. Screen printing uses the pressure generated by a scraper to cause the adhesive to pass through the mesh of the screen to print (coat) it on the substrate, and to produce a single-piece adhesive film of a specific thickness based on, for example, the thickness of the screen. The mesh cover is made of silk mesh woven from synthetic fibers such as polyester or stainless steel or various metal fibers. When the adhesive contains solder particles, it is sufficient to make the mesh larger than the maximum diameter of the solder particles. Inkjet printing does not require a plate but directly patterns the material. For example, the coating amount is controlled by the diameter of the nozzle to produce a single-piece adhesive film of a specified thickness. When the adhesive contains solder particles, it is sufficient to make the nozzle diameter larger than the maximum diameter of the solder particles.

又,單片化接著膜亦可為2層以上之結構,可為包含焊料粒子之層與不包含焊料粒子之層之2層以上之結構,亦可為包含焊料粒子之層彼此之2層以上之結構,亦可為不包含焊料粒子之層彼此之2層以上之結構。In addition, the monolithic adhesive film may have a structure of two or more layers, and may have a structure of two or more layers of a layer containing solder particles and a layer not containing solder particles, or may have a structure of two or more layers of layers containing solder particles. The structure may also be a structure of two or more layers without solder particles.

於由2層以上構成單片化接著膜之情形時,較佳為藉由塗佈或積層等形成2層以上之原片後進行半切加工。又,亦可於藉由網版印刷製作單片化接著膜後積層並成形。又,亦可利用噴嘴噴射印刷(噴墨印刷)製作單片化接著膜後積層並成形。When the single-piece adhesive film is composed of two or more layers, it is preferable to form an original sheet of two or more layers by coating or lamination, and then perform half-cut processing. Alternatively, the individualized adhesive films may be produced by screen printing and then laminated and formed. Alternatively, nozzle jet printing (inkjet printing) can be used to produce individualized adhesive films and then be laminated and formed.

於單片化接著膜係含有焊料粒子之導電性膜之情形時,接著膜之厚度相對於焊料粒子之平均粒徑之比之下限較佳為0.6以上,更佳為0.8以上,進而較佳為0.9以上。又,關於單片化接著膜之厚度,存在於在同一基板中具有凹凸或階差之情形或將電極之高度或位置不同之電子零件與基板組合之情形。於此種情形時,所需樹脂量不同,故並無特別限制,通常較佳為設為適合形成膜之200 μm以下。再者,單片化接著膜之厚度亦可分別不同,於在同一基板上設置有複數個單片化接著膜之情形時,較佳為最大厚度之單片化接著膜之厚度為200 μm以下。When the monolithic adhesive film is a conductive film containing solder particles, the lower limit of the ratio of the thickness of the adhesive film to the average particle diameter of the solder particles is preferably 0.6 or more, more preferably 0.8 or more, and still more preferably 0.9 or above. In addition, the thickness of the singulated adhesive film may exist when the same substrate has unevenness or steps, or when electronic components with different electrode heights or positions are combined with the substrate. In this case, the amount of resin required varies, so it is not particularly limited. Generally, it is preferably 200 μm or less, which is suitable for film formation. Furthermore, the thickness of the individualized adhesive films can also be different respectively. When a plurality of individualized adhesive films are provided on the same substrate, it is preferable that the thickness of the maximum thickness of the individualized adhesive films is 200 μm or less. .

單片化接著膜之厚度可使用能夠測定1 μm以下、較佳為0.1 μm以下之公知之測微計或數位厚度規(例如三洋股份有限公司:MDE-25M,最小顯示量0.0001 mm)進行測定。只要測定10個部位以上之膜厚度並加以平均後求出即可。但是,於膜厚度薄於粒徑之情形時,接觸式之厚度測定器並不合適,因此較佳為使用雷射位移計(例如基恩斯股份有限公司,分光干涉位移型SI-T系列等)。此處,膜厚度僅為黏合劑樹脂層之厚度,不包含已露出之情形時之粒徑。又,於單片化接著膜為多層之情形時,膜厚度係指多層之厚度。The thickness of the monolithic adhesive film can be measured using a well-known micrometer or digital thickness gauge (for example, Sanyo Co., Ltd.: MDE-25M, minimum display amount: 0.0001 mm) capable of measuring 1 μm or less, preferably 0.1 μm or less. . Simply measure the film thickness at more than 10 locations and average it to obtain the result. However, when the film thickness is thinner than the particle diameter, a contact-type thickness meter is not suitable, so it is better to use a laser displacement meter (such as Keynes Co., Ltd., spectroscopic interference displacement type SI-T series, etc.). Here, the film thickness is only the thickness of the adhesive resin layer and does not include the particle size when exposed. In addition, when the single-piece bonded film has multiple layers, the film thickness refers to the thickness of the multiple layers.

單片化接著膜之黏合劑可為熱硬化性,亦可為熱塑性,較佳為能夠藉由基於回焊步驟之溫度控制熔融、硬化之熱硬化性。以下,針對熱硬化性黏合劑(絕緣性黏合劑)進行說明。The adhesive of the monolithic adhesive film may be thermosetting or thermoplastic, and is preferably thermosetting that can be melted and hardened by temperature control through a reflow step. The following describes thermosetting adhesives (insulating adhesives).

[熱硬化型黏合劑] 硬化性黏合劑較佳為放熱波峰溫度高於焊料粒子之熔點,較佳為具有低於焊料粒子之熔點之熔融溫度者。此處,放熱波峰溫度可使用旋轉式流變儀(Thermo Fisher公司製造),於測定壓力1 N溫度範圍30~200℃、升溫速度10℃/分鐘、測定頻率1 Hz、測定平板直徑8 mm之條件下進行測定。藉此,藉由加熱使熱硬化性黏合劑熔融,於焊料粒子夾於端子間之狀態下使焊料熔融,故可使具備微間距之電極之電子零件接合。 [Thermosetting adhesive] The curable adhesive preferably has an exothermic peak temperature higher than the melting point of the solder particles, and preferably has a melting temperature lower than the melting point of the solder particles. Here, the exothermic peak temperature can be determined by using a rotational rheometer (manufactured by Thermo Fisher Co., Ltd.) with a measuring pressure of 1 N, a temperature range of 30 to 200°C, a temperature rise rate of 10°C/min, a measuring frequency of 1 Hz, and a measuring plate diameter of 8 mm. measured under conditions. Thereby, the thermosetting adhesive is melted by heating, and the solder is melted while the solder particles are sandwiched between the terminals, so that electronic components having fine-pitch electrodes can be joined.

作為熱硬化型黏合劑,可列舉包含(甲基)丙烯酸酯化合物與熱自由基聚合起始劑之熱自由基聚合型樹脂組成物、包含環氧化合物與熱陽離子聚合起始劑之熱陽離子聚合型樹脂組成物、包含環氧化合物與熱陰離子聚合起始劑之熱陰離子聚合型樹脂組成物等。又,亦可使用公知之黏著劑組成物。再者,(甲基)丙烯酸單體係包含丙烯酸單體、及甲基丙烯酸單體之任一者之意義。Examples of the thermosetting adhesive include a thermal radical polymerization resin composition containing a (meth)acrylate compound and a thermal radical polymerization initiator, and thermal cationic polymerization containing an epoxy compound and a thermal cationic polymerization initiator. type resin composition, a thermal anionic polymerization type resin composition containing an epoxy compound and a thermal anionic polymerization initiator, etc. Moreover, a well-known adhesive composition can also be used. In addition, the (meth)acrylic acid monomer system includes any one of an acrylic acid monomer and a methacrylic acid monomer.

以下,作為具體例,列舉含有固形環氧樹脂、液狀環氧樹脂、及環氧樹脂硬化劑之熱陰離子聚合型樹脂組成物為例進行說明。Hereinafter, a thermal anionic polymerization-type resin composition containing a solid epoxy resin, a liquid epoxy resin, and an epoxy resin hardener will be described as a specific example.

固形環氧樹脂並無特別限定,只要為於常溫下為固形且分子內具有1個以上之環氧基之環氧樹脂即可,例如亦可為雙酚A型環氧樹脂、聯苯型環氧樹脂等。藉此,可維持膜形狀。再者,常溫係由JIS Z 8703所規定之20℃±15℃(5℃~35℃)之範圍。The solid epoxy resin is not particularly limited as long as it is solid at normal temperature and has one or more epoxy groups in the molecule. For example, it can also be a bisphenol A-type epoxy resin or a biphenyl-type epoxy resin. Oxygen resin, etc. Thereby, the film shape can be maintained. In addition, the normal temperature is within the range of 20℃±15℃ (5℃~35℃) specified by JIS Z 8703.

液狀環氧樹脂並無特別限定,只要於常溫下為液狀即可,例如可為雙酚A型環氧樹脂、雙酚F型環氧樹脂等,亦可為經胺酯改質之環氧樹脂。The liquid epoxy resin is not particularly limited, as long as it is liquid at normal temperature. For example, it can be bisphenol A type epoxy resin, bisphenol F type epoxy resin, etc., or it can be urethane-modified epoxy resin. Oxygen resin.

液狀環氧樹脂之摻合量相對於固形環氧樹脂100質量份,較佳為160質量份以下,更佳為100質量份以下,進而較佳為70質量份以下。若液狀環氧樹脂之摻合量變多,則難以維持膜形狀。又,若液狀環氧樹脂之摻合量變多,則熱硬化後之硬化物性通常會變成因高交聯密度而形成之高彈性,故應力緩和能力減小。The blending amount of the liquid epoxy resin is preferably 160 parts by mass or less, more preferably 100 parts by mass or less, and still more preferably 70 parts by mass or less based on 100 parts by mass of the solid epoxy resin. If the blending amount of the liquid epoxy resin increases, it will be difficult to maintain the film shape. In addition, if the blending amount of liquid epoxy resin increases, the cured physical properties after thermal curing usually become high elasticity due to high cross-linking density, so the stress relaxation ability decreases.

環氧樹脂硬化劑並無特別限定,只要為利用熱開始硬化之熱硬化劑即可,例如可列舉胺、咪唑等陰離子系硬化劑、鋶鹽等陽離子系硬化劑。又,硬化劑亦可經微膠囊化,使得能夠對膜化時所使用之溶劑獲得耐性。The epoxy resin curing agent is not particularly limited as long as it is a thermal curing agent that starts curing by heat. Examples thereof include anionic curing agents such as amines and imidazole, and cationic curing agents such as sulfonium salts. In addition, the hardening agent may be microencapsulated so as to gain resistance to the solvent used during film formation.

[焊料粒子] 焊料粒子可根據電極材料或連接條件等,自例如JIS Z 3282-1999所規定之Sn-Pb系、Pb-Sn-Sb系、Sn-Sb系、Sn-Pb-Bi系、Bi-Sn系、Sn-Cu系、Sn-Pb-Cu系、Sn-In系、Sn-Ag系、Sn-Pb-Ag系、Pb-Ag系等中適當選擇。Bi系之焊料可緩和應力,抑制焊料於金屬結合部產生龜裂,抑制連接電阻值之上升。 [Solder particles] Solder particles can be selected from Sn-Pb series, Pb-Sn-Sb series, Sn-Sb series, Sn-Pb-Bi series, Bi-Sn series, etc. specified in JIS Z 3282-1999, depending on the electrode material and connection conditions. Select appropriately from Sn-Cu series, Sn-Pb-Cu series, Sn-In series, Sn-Ag series, Sn-Pb-Ag series, Pb-Ag series, etc. Bi-based solder can relax stress, inhibit cracks in the solder at the metal joint, and inhibit the increase in connection resistance.

焊料粒子之熔點之下限較佳為110℃以上,更佳為120℃以上,進而較佳為130℃以上。焊料粒子之熔點之上限亦可為200℃以下,較佳為180℃以下,更佳為160℃以下,進而較佳為150℃以下。又,焊料粒子為了使表面活化,亦可於表面直接間接助焊劑化合物。藉由使表面活化,可促進與電極部之金屬鍵結。The lower limit of the melting point of the solder particles is preferably 110°C or higher, more preferably 120°C or higher, and further preferably 130°C or higher. The upper limit of the melting point of the solder particles may be 200°C or lower, preferably 180°C or lower, more preferably 160°C or lower, and further preferably 150°C or lower. In addition, in order to activate the surface of the solder particles, a flux compound may be added directly or indirectly to the surface. By activating the surface, metal bonding with the electrode portion can be promoted.

焊料粒子之平均粒徑較佳為電子零件之端子行中之端子間距離(間隔間距離)之最小值之0.5倍以下,更佳為0.3倍以下,進而較佳為0.2倍以下。根據此種間隔間距離及焊料粒子之平均粒徑之關係,可使用回焊爐使電子零件之端子行與基板之端子行接合。若焊料粒子之平均粒徑大於電子零件之端子行及基板之端子行中之端子間距離之最小值之0.5倍,則產生短路之可能性變高。The average particle size of the solder particles is preferably 0.5 times or less, more preferably 0.3 times or less, and still more preferably 0.2 times or less the minimum value of the distance between terminals (distance between intervals) in the terminal row of the electronic component. Based on the relationship between the spacing distance and the average particle size of the solder particles, a reflow furnace can be used to join the terminal rows of the electronic component and the terminal rows of the substrate. If the average particle size of the solder particles is greater than 0.5 times the minimum distance between terminals in the terminal row of the electronic component and the terminal row of the substrate, the possibility of short circuit will increase.

焊料粒子之平均粒徑之下限較佳為0.5 μm以上,更佳為3 μm以上,更佳為5 μm以上。藉此,可使膜之塗佈厚度固定。若焊料粒子之平均粒徑小於0.5 μm,則無法與電極部獲得良好之焊料接合狀態,有可靠性變差之傾向。又,焊料粒子之平均粒徑之上限亦可為50 μm以下,30 μm以下,較佳為20 μm以下,進而較佳為10 μm以下。The lower limit of the average particle diameter of the solder particles is preferably 0.5 μm or more, more preferably 3 μm or more, and more preferably 5 μm or more. Thereby, the coating thickness of the film can be fixed. If the average particle size of the solder particles is less than 0.5 μm, a good solder joint state with the electrode portion cannot be obtained, and reliability tends to deteriorate. Moreover, the upper limit of the average particle diameter of the solder particles may be 50 μm or less, 30 μm or less, preferably 20 μm or less, and further preferably 10 μm or less.

平均粒徑係於使用金屬顯微鏡、光學顯微鏡、SEM(Scanning Electron Microscope)等電子顯微鏡等之觀察圖像中,例如以N=20以上、較佳為N=50以上、進而較佳為N=200以上所測得之粒子之長軸直徑之平均值,於粒子為球形之情形時,係粒子直徑之平均值。又,亦可為使用公知之圖像解析軟體(「WinROOF」:三谷商事(股),「A image kun(註冊商標)」:旭化成工程股份有限公司等)對觀察圖像進行測量所得之測定值、使用圖像型粒度分佈測定裝置(作為例子,為FPIA-3000(Malvern Instruments Ltd))測得之測定值(N=1000以上)。根據觀察圖像或圖像型粒度分佈測定裝置求出之平均粒徑可設為粒子之最大長度之平均值。再者,製作導電性接著劑時,可簡易地使用藉由雷射繞射、散射法而求出之粒度分佈中之頻度之累計成為50%之粒徑(D50)、算術平均直徑(較佳為體積基準)等製造商值。The average particle diameter is based on an observation image using an electron microscope such as a metal microscope, an optical microscope, and a SEM (Scanning Electron Microscope). For example, N=20 or more, preferably N=50 or more, and still more preferably N=200. The average of the major axis diameters of the particles measured above is the average of the particle diameters when the particles are spherical. In addition, the measured value obtained by measuring the observed image using well-known image analysis software ("WinROOF": Mitani Shoji Co., Ltd., "A image kun (registered trademark)": Asahi Kasei Engineering Co., Ltd., etc.) , measured values measured using an image-type particle size distribution measuring device (for example, FPIA-3000 (Malvern Instruments Ltd)) (N=1000 or more). The average particle diameter calculated from an observation image or an image-type particle size distribution measuring device can be set as the average value of the maximum length of the particles. Furthermore, when producing a conductive adhesive, the particle diameter (D50) at which the cumulative frequency in the particle size distribution obtained by laser diffraction and scattering methods becomes 50%, and the arithmetic mean diameter (preferably (based on volume) and other manufacturer values.

又,焊料粒子之最大直徑可設為平均粒徑之200%以下,較佳為平均粒徑之150%以下,更佳為平均粒徑之120%以下。藉由使焊料粒子之最大直徑處於上述範圍,可將焊料粒子夾於電極間,並藉由焊料粒子之熔融使電極間接合。In addition, the maximum diameter of the solder particles can be 200% or less of the average particle diameter, preferably 150% or less of the average particle diameter, and more preferably 120% or less of the average particle diameter. By setting the maximum diameter of the solder particles within the above range, the solder particles can be sandwiched between the electrodes, and the electrodes can be joined by melting the solder particles.

又,於為複數個焊料粒子凝聚而成之凝聚體之情形時,可使凝聚體之大小與上述焊料粒子之平均粒徑或最大直徑同等,亦可使焊料粒子之平均粒徑或最大直徑小於上述值。各焊料粒子之大小可藉由上述圖像觀察而求出。Furthermore, in the case of an agglomerate formed by agglomeration of a plurality of solder particles, the size of the agglomerate may be equal to the average particle diameter or the maximum diameter of the solder particles, or the average particle diameter or the maximum diameter of the solder particles may be smaller than the above values. The size of each solder particle can be determined by observing the above image.

焊料粒子較佳為分散於黏合劑中,焊料粒子可隨機配置,亦可以固定規律配置。又,焊料粒子亦可為複數個凝聚而成之凝聚體。The solder particles are preferably dispersed in the adhesive, and the solder particles can be randomly arranged or fixedly arranged. In addition, the solder particles may be an agglomerate formed by a plurality of agglomerations.

焊料粒子之摻合量之質量比範圍之下限較佳為10 wt%以上,更佳為20 wt%以上,進而較佳為30 wt%以上,質量比範圍之上限較佳為60 wt%以下,更佳為50 wt%以下,進而較佳為40 wt%以下。又,焊料粒子之摻合量之體積比範圍之下限較佳為2 vol%以上,更佳為4 vol%以上,進而較佳為6 vol%以上,體積比範圍之上限較佳為90 vol%以下,更佳為85 vol%以下,進而較佳為80 vol%以下。藉由使焊料粒子之摻合量滿足上述質量比範圍或體積比範圍,可獲得優異之導通性、散熱性、及接著性。於焊料粒子存在於黏合劑中之情形時,可使用體積比,於製造導電性接著劑之情形(焊料粒子存在於黏合劑中之前),可使用質量比。質量比可根據摻合物之比重或摻合比等轉換成體積比。若焊料粒子之摻合量過少,則無法獲得優異之導通性、散熱性、及接著性,若摻合量過多,則各向異性容易受損而難以獲得優異之導通可靠性。The lower limit of the mass ratio range of the blending amount of solder particles is preferably 10 wt% or more, more preferably 20 wt% or more, and further preferably 30 wt% or more, and the upper limit of the mass ratio range is preferably 60 wt% or less. More preferably, it is 50 wt% or less, and still more preferably, it is 40 wt% or less. In addition, the lower limit of the volume ratio range of the blending amount of solder particles is preferably 2 vol% or more, more preferably 4 vol% or more, and further preferably 6 vol% or more, and the upper limit of the volume ratio range is preferably 90 vol%. or less, more preferably 85 vol% or less, still more preferably 80 vol% or less. By making the blending amount of solder particles satisfy the above mass ratio range or volume ratio range, excellent conductivity, heat dissipation, and adhesion can be obtained. When the solder particles are present in the adhesive, the volume ratio can be used, and when the conductive adhesive is produced (before the solder particles are present in the adhesive), the mass ratio can be used. The mass ratio can be converted into a volume ratio based on the specific gravity or blending ratio of the blend. If the blending amount of the solder particles is too small, excellent conductivity, heat dissipation, and adhesion will not be obtained. If the blending amount is too much, the anisotropy will be easily damaged and it will be difficult to obtain excellent conduction reliability.

[助焊劑化合物] 助焊劑化合物去除電極表面之異物或氧化膜,防止電極表面之氧化,去除焊料粒子表面之氧化膜,降低熔融焊料之表面張力。作為助焊劑化合物,例如可列舉乙醯丙酸、順丁烯二酸、草酸、丙二酸、琥珀酸、戊二酸、己二酸、癸二酸等羧酸。其等之中,較佳為使用氧化膜之去除優異之戊二酸。 [Flux compound] The flux compound removes foreign matter or oxide film on the surface of the electrode, prevents oxidation of the electrode surface, removes the oxide film on the surface of the solder particles, and reduces the surface tension of the molten solder. Examples of the flux compound include carboxylic acids such as acetylpropionic acid, maleic acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, and sebacic acid. Among them, it is preferable to use glutaric acid which is excellent in removing the oxide film.

[其他添加劑] 單片化接著膜中,除上述黏合劑、焊料粒子及助焊劑化合物以外,亦可於無損本發明之效果之範圍內,摻合習知以來用作接著劑之各種添加劑。添加劑之粒徑較理想為小於焊料粒子之平均粒徑,但並無特別限定,只要為不阻礙電極間接合之大小即可。 [Other additives] In addition to the above-mentioned adhesive, solder particles, and flux compounds, the monolithic adhesive film may also be blended with various additives conventionally used as adhesives within a range that does not impair the effects of the present invention. The particle size of the additive is preferably smaller than the average particle size of the solder particles, but is not particularly limited as long as it is a size that does not hinder the bonding between the electrodes.

單片化接著膜例如可藉由如下方式而獲得:將絕緣性黏合劑、焊料粒子及助焊劑化合物於溶劑中進行混合,藉由棒式塗佈機將該混合物以成為規定厚度之方式塗佈於剝離處理膜上後,進行乾燥而使溶劑揮發,並進行半切加工。又,例如亦可藉由棒式塗佈機將混合物塗佈於剝離處理膜上後,藉由加壓製成規定厚度後進行半切加工。又,為了提高焊料粒子之分散性,較佳為於包含溶劑之狀態下實施高剪切。例如可使用公知之分批式行星攪拌裝置。又,導電性接著劑之剩餘溶劑量較佳為2%以下,更佳為1%以下。The monolithic adhesive film can be obtained, for example, by mixing an insulating adhesive, solder particles, and a flux compound in a solvent, and applying the mixture to a predetermined thickness with a rod coater. After it is peeled off the film, it is dried to evaporate the solvent and then half-cut. Alternatively, for example, the mixture may be applied onto the release treatment film using a bar coater, and then the mixture may be pressed to a predetermined thickness and then subjected to half-cut processing. In addition, in order to improve the dispersibility of the solder particles, it is preferable to perform high shearing in a state containing a solvent. For example, a well-known batch-type planetary stirring device can be used. In addition, the remaining solvent amount of the conductive adhesive is preferably 2% or less, more preferably 1% or less.

圖16係表示第1實施形態之膜結構體之製造方法之一例的圖,圖16(A)係表示加工前之膜結構體之俯視圖,圖16(B)係表示加工後之膜結構體之俯視圖。FIG. 16 is a diagram showing an example of the manufacturing method of the membrane structure according to the first embodiment. FIG. 16(A) is a top view of the membrane structure before processing, and FIG. 16(B) is a view of the membrane structure after processing. Top view.

如圖16(A)及圖16(B)所示,將第1基材100上之接著膜101以成為規定形狀之方式進行加工。例如藉由維多利亞刀進行半切加工,不對第1基材100進行切割,而僅對接著膜進行切割,並去除無用部分,藉此可於第1基材100上獲得規定形狀之第1單片化接著膜102、103。As shown in FIGS. 16(A) and 16(B) , the adhesive film 101 on the first base material 100 is processed into a predetermined shape. For example, a Victoria knife is used to perform half-cut processing, without cutting the first base material 100, but only cutting the adhesive film, and removing the useless portion, thereby obtaining the first single piece of a predetermined shape on the first base material 100. Films 102, 103 follow.

又,以與圖16(A)及圖16(B)所示之膜結構體之製造方法相同之方式於第2基材上製作第2單片化接著膜。接下來,於與複數個電子零件對應之基材之規定位置配置第1單片化接著膜及第2單片化接著膜。配置單片化膜之基材可使用第1基材100或第2基材,亦可使用新的第3基材。於使用第3基材之情形時,可使用貼片機。Moreover, the 2nd single piece adhesive film was produced on the 2nd base material in the same manner as the manufacturing method of the film structure shown in FIG.16(A) and FIG.16(B). Next, the first singulation adhesive film and the second singulation adhesive film are arranged at predetermined positions on the base material corresponding to the plurality of electronic components. The first base material 100 or the second base material may be used as the base material for arranging the monolithic film, or a new third base material may be used. When using the third base material, a placement machine can be used.

<2-2. 第2實施形態> 第2實施形態之膜結構體具備基材、及配置於與複數個電子零件對應之基材上之規定位置的複數個單片化接著膜,複數個單片化接著膜之1個以上具有含有焊料粒子之區域及不含焊料粒子之區域。根據第2實施形態之膜結構體,由於將單片化接著膜配置於與複數個電子零件對應之基材之規定位置,故可一次性暫貼於基板上,且可防止焊料向無用部位潤濕擴散。 <2-2. Second embodiment> The film structure of the second embodiment includes a base material and a plurality of singulated adhesive films arranged at predetermined positions on the base material corresponding to a plurality of electronic components. At least one of the plurality of singulated adhesive films has a film containing Areas with solder particles and areas without solder particles. According to the film structure of the second embodiment, since the single-piece adhesive film is arranged at a predetermined position on the base material corresponding to a plurality of electronic components, it can be temporarily attached to the substrate at once, and the solder can be prevented from being wetted into useless areas. Wet diffusion.

單片化接著膜與第1實施形態同樣,可藉由半切加工、網版印刷、或噴墨印刷形成於基材上。又,針對與第1實施形態相同之結構,此處省略說明。The monolithic adhesive film can be formed on the base material by half-cut processing, screen printing, or inkjet printing, as in the first embodiment. In addition, description of the same structure as that of the first embodiment is omitted here.

又,第2實施形態之膜結構體之製造方法於第1基材上設置不含焊料粒子之單片化接著膜,於第2基材上設置含有焊料粒子之單片化接著膜,於第1基材、第2基材、或第3基材之規定位置使不含焊料粒子之單片化接著膜及含有焊料粒子之單片化接著膜靠近,而配置具有不含焊料粒子之區域及含有焊料粒子之區域之單片化接著膜。Furthermore, in the manufacturing method of the film structure of the second embodiment, a singulated adhesive film containing no solder particles is provided on the first base material, and a singulated adhesive film containing solder particles is provided on the second base material. The predetermined position of the 1 base material, the 2nd base material, or the 3rd base material is such that the singulated adhesive film containing no solder particles and the singulated adhesive film containing solder particles are close to each other, and a region containing no solder particles is arranged. Single-piece bonding film for areas containing solder particles.

圖17係表示第2實施形態之膜結構體之製造方法之一例之圖,圖17(A)係表示第1膜結構體之俯視圖,圖17(B)係表示第2膜結構體之俯視圖,圖17(C)係表示加工後之膜結構體之俯視圖。Fig. 17 is a diagram showing an example of the manufacturing method of the membrane structure according to the second embodiment. Fig. 17(A) is a top view of the first membrane structure, and Fig. 17(B) is a top view of the second membrane structure. FIG. 17(C) is a top view showing the processed membrane structure.

圖17(A)所示之第1膜結構體及圖17(B)所示之第2膜結構體以與圖16(A)及圖16(B)所示之膜結構體之製造方法相同之方式,於第1基材上110製作第1單片化接著膜111、112,於第2基材120上製作第2單片化接著膜121a、121b、122a、122b。The first membrane structure shown in Fig. 17(A) and the second membrane structure shown in Fig. 17(B) are manufactured by the same method as the membrane structure shown in Fig. 16(A) and Fig. 16(B) In this way, the first singulated adhesive films 111 and 112 are formed on the first base material 110, and the second singulated adhesive films 121a, 121b, 122a, and 122b are formed on the second base material 120.

第1單片化接著膜111、112不含焊料粒子,於電子零件之端子行部分具有供第2單片化接著膜121a、121b、122a、122b嵌合之嵌合部111a、111b、112a、112b。嵌合部111a、111b、112a、112b例如可藉由基於維多利亞刀進行之半切並藉由模切加工而形成。The first singulated adhesive films 111 and 112 do not contain solder particles, and have fitting portions 111a, 111b, 112a for the second singulated adhesive films 121a, 121b, 122a, 122b in the terminal row portion of the electronic component. 112b. The fitting portions 111a, 111b, 112a, and 112b can be formed by half-cutting with a Victoria knife and by die-cutting, for example.

如圖17(C)所示,於與複數個電子零件對應之基材之規定位置,將第1單片化接著膜111、112與第2單片化接著膜121a、121b、122a、122b靠近配置。藉此,可製作具有不含焊料粒子之區域及含有焊料粒子之區域之經複合化而成之單片化接著膜。配置單片化膜之基材可使用第1基材110或第2基材120,亦可使用新的第3基材。於使用第3基材之情形時,可使用貼片機。As shown in FIG. 17(C) , the first singulation adhesive films 111, 112 and the second singulation adhesive films 121a, 121b, 122a, 122b are brought close to each other at predetermined positions on the substrate corresponding to the plurality of electronic components. configuration. Thereby, a composite monolithic adhesive film having a region not containing solder particles and a region containing solder particles can be produced. The first base material 110 or the second base material 120 can be used as the base material for disposing the singulated film, or a new third base material can be used. When using the third base material, a placement machine can be used.

<2-3. 第3實施形態> 第3實施形態之膜結構體具備基材、及配置於與複數個電子零件對應之基材上之規定位置的複數個單片化接著膜,複數個單片化接著膜之1個以上厚度與其他單片化接著膜不同。根據第3實施形態之膜結構體,由於將單片化接著膜配置於與複數個電子零件對應之基材之規定位置,故可一次性暫貼於基板上,且可提高接合強度。 <2-3. Third embodiment> The film structure of the third embodiment includes a base material and a plurality of singulated adhesive films arranged at predetermined positions on the base material corresponding to a plurality of electronic components. The thickness of at least one of the plurality of singulated adhesive films is equal to Other single-piece adhesive films are different. According to the film structure of the third embodiment, since the individualized adhesive films are arranged at predetermined positions on the substrate corresponding to the plurality of electronic components, they can be temporarily attached to the substrate at once, and the joint strength can be improved.

單片化接著膜與第1實施形態同樣,可藉由半切加工、網版印刷、或噴墨印刷形成於基材上。又,針對與第1實施形態及第2實施形態相同之結構,此處省略說明。The monolithic adhesive film can be formed on the base material by half-cut processing, screen printing, or inkjet printing, as in the first embodiment. In addition, description of the same structure as that of the first embodiment and the second embodiment is omitted here.

又,第3實施形態之膜結構體之製造方法於第1基材上設置具有第1厚度之單片化接著膜,於第2基材上設置具有第2厚度之單片化接著膜,並將具有第1厚度之單片化接著膜及具有第2厚度之單片化接著膜配置於與複數個零件對應之第1基材、第2基材、或第3基材之規定位置。Furthermore, the manufacturing method of the film structure according to the third embodiment provides a singulated adhesive film having a first thickness on the first base material, a singulated adhesive film having a second thickness on the second base material, and The singulated adhesive film having the first thickness and the singulated adhesive film having the second thickness are arranged at predetermined positions on the first base material, the second base material, or the third base material corresponding to the plurality of parts.

圖18係表示第3實施形態之膜結構體之製造方法之一例的圖,圖18(A)係表示第1膜結構體之俯視圖,圖18(B)係表示第2膜結構體之俯視圖,圖18(C)係表示加工後之膜結構體之俯視圖,圖18(D)係表示加工後之膜結構體之截面圖。Fig. 18 is a diagram showing an example of the manufacturing method of the membrane structure according to the third embodiment. Fig. 18(A) is a top view of the first membrane structure, and Fig. 18(B) is a top view of the second membrane structure. FIG. 18(C) is a top view of the processed membrane structure, and FIG. 18(D) is a cross-sectional view of the processed membrane structure.

圖18(A)所示之第1膜結構體及圖18(B)所示之第2膜結構體以與圖16(A)及圖16(B)所示之膜結構體之製造方法相同之方式,於第1基材130上製作第1單片化接著膜131,於第2基材140上製作第2單片化接著膜141。第1單片化接著膜131具有第1厚度,第2單片化接著膜131具有與第1厚度不同之第2厚度。The first membrane structure shown in Fig. 18(A) and the second membrane structure shown in Fig. 18(B) are manufactured by the same method as the membrane structure shown in Fig. 16(A) and Fig. 16(B) In this way, the first singulated adhesive film 131 is formed on the first base material 130, and the second singulated adhesive film 141 is formed on the second base material 140. The first singulated adhesive film 131 has a first thickness, and the second singulated adhesive film 131 has a second thickness different from the first thickness.

如圖18(C)及圖18(D)所示,於與複數個電子零件對應之基材之規定位置配置第1單片化接著膜131及第2單片化接著膜141。配置單片化膜之基材可使用第1基材130或第2基材140,亦可使用新的第3基材。於使用第3基材之情形時,可使用貼片機。As shown in FIG. 18(C) and FIG. 18(D) , the first singulation adhesive film 131 and the second singulation adhesive film 141 are arranged at predetermined positions on the base material corresponding to the plurality of electronic components. The first base material 130 or the second base material 140 can be used as the base material for disposing the singulated film, or a new third base material can be used. When using the third base material, a placement machine can be used.

<2-4. 第4實施形態> 第4實施形態之膜結構體具備:基材;具有第1厚度之單片化接著膜,其設置於與複數個零件對應之基材上之規定位置,且具有含有焊料粒子之區域及不含焊料粒子之區域;及具有第2厚度之單片化接著膜,其設置於與複數個零件對應之基材上之規定位置,且具有含有焊料粒子之區域及不含焊料粒子之區域。根據第4實施形態之膜結構體,由於將單片化接著膜配置於與複數個電子零件對應之基材之規定位置,故可一次性暫貼於基板上,可防止焊料向無用部位潤濕擴散,並且可提高接合強度。 <2-4. Fourth embodiment> The film structure of the fourth embodiment includes: a base material; a monolithic adhesive film having a first thickness, which is provided at a predetermined position on the base material corresponding to a plurality of parts, and has a region containing solder particles and a region not containing solder particles. A region of solder particles; and a monolithic adhesive film with a second thickness, which is provided at a predetermined position on a base material corresponding to a plurality of parts, and has an area containing solder particles and an area not containing solder particles. According to the film structure of the fourth embodiment, since the single-piece adhesive film is arranged at a predetermined position on the base material corresponding to a plurality of electronic components, it can be temporarily attached to the substrate at once, and the solder can be prevented from wetting to useless areas. Diffusion and improve joint strength.

單片化接著膜與第1實施形態同樣,可藉由半切加工、網版印刷、或噴墨印刷形成於基材上。又,針對與第1實施形態~第3實施形態相同之結構,此處省略說明。The monolithic adhesive film can be formed on the base material by half-cut processing, screen printing, or inkjet printing, as in the first embodiment. In addition, descriptions of the same structures as those in the first to third embodiments are omitted here.

又,第4實施形態之膜結構體之製造方法於第1基材上設置不含焊料粒子且具有第1厚度之單片化接著膜,於第2基材上設置不含焊料粒子且具有第2厚度之單片化接著膜,於第3基材上設置含有焊料粒子且具有第1厚度之單片化接著膜,於第4基材上設置含有焊料粒子且具有第2厚度之單片化接著膜,於第1基材、第2基材、第3基材、第4基材、或第5基材之規定位置,使不含焊料粒子且具有第1厚度之單片化接著膜及含有焊料粒子且具有第1厚度之單片化接著膜靠近,而配置具有不含焊料粒子之區域及含有焊料粒子之區域且具有第1厚度之單片化接著膜,並且使不含焊料粒子且具有第2厚度之單片化接著膜及含有焊料粒子且具有第2厚度之單片化接著膜靠近,配置具有不含焊料粒子之區域及含有焊料粒子之區域且具有第2厚度之單片化接著膜。Furthermore, in the manufacturing method of the film structure of the fourth embodiment, a singulated adhesive film containing no solder particles and having a first thickness is provided on the first base material, and a single-piece adhesive film containing no solder particles and having a first thickness is provided on the second base material. A 2-thickness singulated adhesive film, a singulated adhesive film containing solder particles and having a first thickness is provided on the third base material, and a singulated adhesive film containing solder particles and having a second thickness is provided on the fourth base material. After the film is formed, a single-piece adhesive film containing no solder particles and having a first thickness is formed at a predetermined position on the first base material, the second base material, the third base material, the fourth base material, or the fifth base material. The singulated adhesive film containing solder particles and having a first thickness is placed close to each other, and the singulated adhesive film having a first thickness and a region containing no solder particles and a region containing solder particles are arranged so that the solder particles are not contained and The singulated adhesive film having the second thickness and the singulated adhesive film containing the solder particles and having the second thickness are placed close to each other, and the singulated adhesive film having the second thickness is arranged to have a region not containing solder particles and a region containing solder particles. Then the membrane.

圖19係表示第4實施形態之膜結構體之製造方法之一例的圖,圖19(A)係表示第1膜結構體之俯視圖,圖19(B)係表示第2膜結構體之俯視圖,圖19(C)係表示第3膜結構體之俯視圖,圖19(D)係表示第4膜結構體之俯視圖,圖19(E)係表示加工後之膜結構體之俯視圖,圖19(F)係表示加工後之膜結構體之截面圖。Fig. 19 is a diagram showing an example of the manufacturing method of the membrane structure according to the fourth embodiment. Fig. 19(A) is a top view of the first membrane structure, and Fig. 19(B) is a top view of the second membrane structure. Figure 19(C) is a top view of the third membrane structure. Figure 19(D) is a top view of the fourth membrane structure. Figure 19(E) is a top view of the processed membrane structure. Figure 19(F) ) is a cross-sectional view of the membrane structure after processing.

圖19(A)~圖19(D)分別表示之第1膜結構體~第4膜結構體以與圖16(A)及圖16(B)所示之膜結構體之製造方法相同之方式,於第1基材150上製作第1單片化接著膜151,於第2基材160上製作第2單片化接著膜161,於第3基材170上製作第3單片化接著膜171a、171b,於第4基材180上製作第4單片化接著膜181a、181b。The first to fourth membrane structures shown in Figures 19(A) to 19(D) respectively are manufactured in the same manner as the membrane structures shown in Figures 16(A) and 16(B) , the first singulated adhesive film 151 is formed on the first base material 150, the second singulated adhesive film 161 is formed on the second base material 160, and the third singulated adhesive film is formed on the third base material 170. 171a and 171b, the fourth single-piece adhesive films 181a and 181b are produced on the fourth base material 180.

第1單片化接著膜151不含焊料粒子,且於電子零件之端子行部分具有供第3單片化接著膜171a、171b嵌合之嵌合部151a、151b。第2單片化接著膜161不含焊料粒子,且於電子零件之端子行部分具有供第4單片化接著膜181a、181b嵌合之嵌合部161a、161b。又,第1單片化接著膜151及第3單片化接著膜171具有第1厚度,第2單片化接著膜161及第4單片化接著膜181具有大於第1厚度之第2厚度。The first singulated adhesive film 151 does not contain solder particles, and has fitting portions 151a and 151b for the third singulated adhesive films 171a and 171b to be fitted in the terminal row portion of the electronic component. The second singulated adhesive film 161 does not contain solder particles, and has fitting portions 161a and 161b for the fourth singulated adhesive films 181a and 181b to be fitted in the terminal row portion of the electronic component. In addition, the first singulated adhesive film 151 and the third singulated adhesive film 171 have a first thickness, and the second singulated adhesive film 161 and the fourth singulated adhesive film 181 have a second thickness greater than the first thickness. .

如圖19(E)及圖19(F)所示,於與複數個電子零件對應之基材之規定位置,將第1單片化接著膜151與第2單片化接著膜171a、171b靠近配置,並且將第3單片化接著膜161與第4單片化接著膜181a、181b靠近配置。藉此,可於同一基材上製作具有不含焊料粒子之區域及含有焊料粒子之區域之經複合化而成且具有第1厚度之單片化接著膜、及經複合化而成且具有第2厚度之單片化接著膜。配置單片化膜之基材可使用第1基材150、第2基材160、第3基材170、第4基材180之任一者,亦可使用新的第5基材。於使用第5基材之情形時,可使用貼片機。As shown in FIGS. 19(E) and 19(F) , the first singulation adhesive film 151 and the second singulation adhesive films 171 a and 171 b are brought close to each other at predetermined positions on the substrate corresponding to the plurality of electronic components. are arranged, and the third singulated adhesive film 161 and the fourth singulated adhesive films 181a and 181b are arranged close to each other. Thereby, it is possible to produce a composite single-piece adhesive film having a first thickness having a region not containing solder particles and a region containing solder particles, and a composite composite film having a first thickness on the same base material. 2-thickness monolithic adhesive film. Any of the first base material 150, the second base material 160, the third base material 170, and the fourth base material 180 may be used as the base material on which the singulated film is disposed, or a new fifth base material may be used. When using the fifth base material, a placement machine can be used.

又,膜結構體亦可為複數個單片化接著膜之1個以上擁有具有第1厚度之區域及具有第2厚度之區域。即,亦可使具有第2厚度之第4單片化接著膜181a、181b嵌合於具有第1厚度之第1單片化接著膜151之嵌合部151a、151b,使具有第1厚度之第3單片化接著膜171a、171b嵌合於具有第2厚度之第2單片化接著膜161之嵌合部161a、161b。根據此種結構之單片化接著膜,於在基板之表面或電子零件之底面存在凹部或凸部之情形時,可追隨該凹部或凸部,防止焊料向無用部位潤濕擴散,並且可提高接合強度。 [實施例] Furthermore, the film structure may be one or more of a plurality of monolithic adhesive films having a region having a first thickness and a region having a second thickness. That is, the fourth singulated adhesive films 181a and 181b having the second thickness may be fitted into the fitting portions 151a and 151b of the first singulated adhesive film 151 having the first thickness, so that the fourth singulated adhesive films 181a and 181b having the first thickness are The third singulated adhesive films 171a and 171b are fitted into the fitting portions 161a and 161b of the second singulated adhesive film 161 having a second thickness. The monolithic adhesive film with this structure can follow the concave or convex portions on the surface of the substrate or the bottom surface of the electronic component to prevent the solder from wetting and spreading to useless areas, and can improve the quality of the solder. Joint strength. [Example]

<3. 實施例> 以下,針對使用本技術之實施例進行說明。於實施例中,製作設置有複數個單片化接著膜之膜結構體,將複數個單片化接著膜一次性暫貼於基板,將電子零件(插頭連接器、插座連接器)搭載於單片化接著膜上,並藉由回焊安裝電子零件。接下來,針對安裝電子零件後之導通性能及接合強度進行評價。又,於插座連接器之安裝中,針對焊料向插座連接器之端子以外之配線之附著進行評價。再者,本技術並不限定於該等實施例。 <3. Example> Hereinafter, embodiments using this technology will be described. In the embodiment, a film structure provided with a plurality of monolithic adhesive films is produced, the plurality of monolithic adhesive films are temporarily attached to the substrate at once, and electronic components (plug connectors, socket connectors) are mounted on the single-piece adhesive film. The chips are bonded to the film and the electronic components are mounted by reflow soldering. Next, conduction performance and joint strength after mounting electronic components are evaluated. In addition, during the installation of the socket connector, the adhesion of the solder to the wiring other than the terminals of the socket connector is evaluated. Furthermore, the present technology is not limited to these embodiments.

準備下述導電性接著膜A、導電性接著膜B、接著膜A、接著膜B、電子零件A、電子零件B、基板。又,以下述回焊條件進行回焊。The following conductive adhesive film A, conductive adhesive film B, adhesive film A, adhesive film B, electronic component A, electronic component B, and substrate were prepared. Moreover, reflow was performed under the following reflow conditions.

導電性接著膜A: 摻合固形環氧樹脂(雙酚F型環氧樹脂,三菱化學(股),JER4007P)80質量份、液狀環氧樹脂(二環戊二烯骨架環氧樹脂,ADEKA(股),EP4088L)20質量份、環氧樹脂硬化劑(咪唑系硬化劑,四國化成工業(股),Curezol 2P4MHZ-PW)5質量份、助焊劑化合物(戊二酸(1,3-丙烷二羧酸),東京化成(股))3質量份、及平均粒徑20 μm之焊料粒子(MCP-137,5N Plus inc,Sn-58Bi合金,固相線溫度138℃)300質量份,於50 μm之基底PET膜(經剝離處理加工)上製作厚度25 μm之具有各向異性之導電性接著膜A。 Conductive adhesive film A: Blended with 80 parts by mass of solid epoxy resin (bisphenol F epoxy resin, Mitsubishi Chemical Co., Ltd., JER4007P) and liquid epoxy resin (dicyclopentadiene skeleton epoxy resin, ADEKA Co., Ltd., EP4088L) 20 parts by mass, epoxy resin hardener (imidazole-based hardener, Shikoku Chemical Industry Co., Ltd., Curezol 2P4MHZ-PW), 5 parts by mass of flux compound (glutaric acid (1,3-propanedicarboxylic acid), Tokyo Kasei Co., Ltd.) 3 parts by mass, and 300 parts by mass of solder particles with an average particle size of 20 μm (MCP-137, 5N Plus inc, Sn-58Bi alloy, solidus temperature 138°C) on a 50 μm base PET An anisotropic conductive adhesive film A with a thickness of 25 μm was formed on the film (processed by peeling treatment).

導電性接著膜B: 除將厚度設為35 μm以外,以與導電性接著膜A相同之方式製作導電性接著膜B。 接著膜A: 除未摻合焊料粒子以外,以與導電性接著膜A相同之方式製作厚度25 μm之接著膜B。 接著膜B: 除未摻合焊料粒子以外,以與導電性接著膜B相同之方式製作厚度35 μm之接著膜B。 電子零件A: 單側10接腳(兩側20接腳)、0.35 mm間距插頭連接器、Hirose Electric(股)、BM23FR0.6-20DP-0.35V(895)、安裝尺寸1.5 mm×5.2 mm 電子零件B: 單側10接腳(兩側20接腳)、0.35 mm間距插座連接器、Hirose Electric(股)、BM23FR0.6-20DS-0.35V(895)、安裝尺寸2.0 mm×6.0 mm 基板: 以分別能夠安裝1個插頭連接器及插座連接器之方式對應之剛性基板(Dexerials評價用玻璃環氧基板,鍍Ni-Au) 回焊條件: 150℃~260℃-100 sec、峰頂260℃ Conductive adhesive film B: Conductive adhesive film B was produced in the same manner as conductive adhesive film A except that the thickness was 35 μm. Next membrane A: Except that solder particles were not mixed, an adhesive film B with a thickness of 25 μm was produced in the same manner as the conductive adhesive film A. Next membrane B: Except that solder particles were not blended, an adhesive film B with a thickness of 35 μm was produced in the same manner as the conductive adhesive film B. Electronic parts A: 10 pins on one side (20 pins on both sides), 0.35 mm pitch plug connector, Hirose Electric (shared), BM23FR0.6-20DP-0.35V (895), mounting size 1.5 mm × 5.2 mm Electronic parts B: 10 pins on one side (20 pins on both sides), 0.35 mm pitch socket connector, Hirose Electric (stock), BM23FR0.6-20DS-0.35V (895), installation size 2.0 mm × 6.0 mm Substrate: Rigid substrate that can mount one plug connector and one receptacle connector respectively (Glass epoxy substrate for Dexerials evaluation, Ni-Au plated) Reflow conditions: 150℃~260℃-100 sec, peak 260℃

[導通性能之評價] 針對連接器安裝後之連接結構體,使用數位萬用錶並利用四端子法測定流過電流1 mA時之電阻值,並以以下評價基準對電阻值進行評價。電子零件安裝後之連接結構體之電阻值較佳為未達100 mΩ。 A:電阻值未達100 mΩ NG:電阻值為100 mΩ以上 [Evaluation of conduction performance] For the connection structure after the connector is installed, use a digital multimeter to measure the resistance value when a current of 1 mA flows through the four-terminal method, and evaluate the resistance value based on the following evaluation standards. The resistance value of the connection structure after the electronic components are installed is preferably less than 100 mΩ. A: The resistance value does not reach 100 mΩ NG: Resistance value is 100 mΩ or more

[接合強度之評價] 針對安裝連接器後之連接結構體,使用晶片剪切強度測試機,於使連接器移動之工具之剪切速度20 μm/sec、溫度25℃之條件下測定晶片剪切強度,並以以下評價基準對晶片剪切強度進行評價。安裝連接器後之連接結構體之晶片剪切強度較理想為3 N以上。 A:晶片剪切強度為5 N以上 B:晶片剪切強度為3 N以上且未達5 N NG:晶片剪切強度未達3 N [Evaluation of joint strength] For the connected structure after the connector is installed, use a wafer shear strength testing machine to measure the wafer shear strength under the conditions of a shear speed of 20 μm/sec and a temperature of 25°C for the tool that moves the connector, and evaluate it as follows Benchmarks evaluate wafer shear strength. The chip shear strength of the connection structure after the connector is installed is ideally 3 N or more. A: Wafer shear strength is 5 N or more B: Wafer shear strength is 3 N or more and less than 5 N NG: Wafer shear strength does not reach 3 N

[焊料附著之評價] 圖20係表示插座連接器之一例之俯視圖。插座連接器具備用以與基板連接之第1接腳部191a及第2接腳部191b、及與插頭嵌合之第1嵌合部192a及第2嵌合部192b,第1接腳部191a與第1嵌合部192a經電性連接,第2接腳部191b與第2嵌合部192b經電性連接。再者,於本實施例中,該插座連接器設為覆蓋插頭連接器並與其嵌合之式樣。該插座連接器為了避免整體外形變得過大,減小嵌合後之外形,設為與插頭連接器相比插座連接器之端子長度較短之式樣。若端子長度變短,則焊接面積亦會相應地減小,故有插座連接器與基板之間之焊接強度減小之傾向。因此,為了使插座連接器以相對小之焊接面積獲得充分之強度,以使導電接著膜之厚度大於插頭連接器之焊接中所使用之導電接著膜之厚度,且亦拓寬導電接著膜之面積,藉此成為獲得充分之接著強度之樹脂量之方式進行調整。再者,本技術之插座連接器與插頭連接器之關係並不限定於上述實施例。 [Evaluation of solder adhesion] FIG. 20 is a top view showing an example of the receptacle connector. The socket connector has a first pin part 191a and a second pin part 191b for connecting to the substrate, and a first fitting part 192a and a second fitting part 192b for fitting with the plug. The first pin part 191a and The first fitting part 192a is electrically connected, and the second pin part 191b and the second fitting part 192b are electrically connected. Furthermore, in this embodiment, the socket connector is configured to cover the plug connector and mate with it. In order to prevent the overall appearance of the socket connector from becoming too large and reduce the outer appearance after mating, the socket connector has a shorter terminal length than the plug connector. If the terminal length is shortened, the soldering area will be correspondingly reduced, so the soldering strength between the socket connector and the substrate tends to be reduced. Therefore, in order for the socket connector to obtain sufficient strength with a relatively small soldering area, the thickness of the conductive adhesive film is made larger than that used in the soldering of the plug connector, and the area of the conductive adhesive film is also widened. The amount of resin is adjusted in such a way that sufficient bonding strength is obtained. Furthermore, the relationship between the socket connector and the plug connector of the present technology is not limited to the above embodiment.

針對安裝插座連接器後之連接結構體,目視確認因焊料潤濕擴散所致之焊料向第1嵌合部192a及第2嵌合部192b之附著,並以以下評價基準進行評價。較理想為焊料不會潤濕擴散至安裝插座連接器後之連接結構體之第1嵌合部192a及第2嵌合部192b。 OK:焊料未潤濕擴散至第1嵌合部及第2嵌合部。 NG:焊料潤濕擴散至第1嵌合部或第2嵌合部。 With respect to the connected structure after mounting the receptacle connector, adhesion of solder to the first fitting portion 192 a and the second fitting portion 192 b due to solder wetting and diffusion was visually confirmed, and the evaluation was performed based on the following evaluation criteria. Preferably, the solder will not wet and spread to the first fitting portion 192a and the second fitting portion 192b of the connection structure after the socket connector is installed. OK: The solder is not wetted and spreads to the first fitting part and the second fitting part. NG: The solder wets and spreads to the first fitting part or the second fitting part.

[膜結構體1] 圖21係表示膜結構體1之尺寸之俯視圖。與圖16(A)及圖16(B)所示之膜結構體之製造方法同樣,藉由維多利亞刀對厚度25 μm之導電性接著膜A進行半切加工。不對基底PET膜進行切割,而僅對導電性接著膜A進行切割,去除無用部分,如圖21所示之尺寸,製作配置有單片化接著膜之膜結構體1。 [Membrane structure 1] FIG. 21 is a plan view showing the dimensions of the membrane structure 1. In the same manner as the manufacturing method of the membrane structure shown in FIGS. 16(A) and 16(B) , the conductive adhesive film A with a thickness of 25 μm is half-cut with a Victoria knife. Instead of cutting the base PET film, only the conductive adhesive film A was cut to remove unnecessary portions, and the film structure 1 with the individualized adhesive films was produced to the size shown in FIG. 21 .

[膜結構體2] 圖22係表示膜結構體2之尺寸之俯視圖。如圖17(A)所示,使用厚度25 μm之接著膜A製作不含焊料粒子之不含焊料粒子之單片化接著膜,並且如圖17(B)所示,使用厚度25 μm之導電性接著膜A製作含有焊料粒子之含焊料粒子之單片化接著膜。接下來,將不含焊料粒子之單片化接著膜與含焊料粒子之單片化接著膜貼合,藉此使含焊料粒子之單片化接著膜嵌合於電子零件之端子行部分,如圖22所示之尺寸,製作配置有存在不含焊料粒子之部位及含有焊料粒子之部位之單片化接著膜的膜結構體2。 [Membrane structure 2] FIG. 22 is a plan view showing the dimensions of the membrane structure 2. As shown in Figure 17(A), use the adhesive film A with a thickness of 25 μm to produce a single-piece adhesive film that does not contain solder particles, and as shown in Figure 17(B), use a conductive film with a thickness of 25 μm. The adhesive film A is a solder particle-containing single-piece adhesive film containing solder particles. Next, the individualized adhesive film without solder particles is bonded to the individualized adhesive film containing solder particles, so that the individualized adhesive film containing solder particles is embedded in the terminal row part of the electronic component, such as The film structure 2 having the dimensions shown in Fig. 22 and having the individualized adhesive films including a portion that does not contain solder particles and a portion that contains solder particles is produced.

[膜結構體3] 圖23係表示膜結構體3之尺寸之俯視圖。如圖18(A)所示,使用厚度25 μm之導電性接著膜A製作厚度25 μm之單片化接著膜,並且如圖18(B)所示,使用厚度35 μm之導電性接著膜B製作厚度35 μm之單片化接著膜。接下來,如圖18(C)及圖18(D)所示,將厚度25 μm之單片化接著膜與厚度35 μm之單片化接著膜貼合,藉此,如圖23所示之尺寸,製作配置有厚度25 μm之單片化接著膜與厚度35 μm之單片化接著膜之膜結構體3。 [Membrane structure 3] FIG. 23 is a plan view showing the dimensions of the membrane structure 3. As shown in Fig. 18(A) , conductive adhesive film A with a thickness of 25 μm was used to produce a single-piece adhesive film with a thickness of 25 μm, and as shown in Fig. 18(B) , a conductive adhesive film B with a thickness of 35 μm was used. Create a single-piece adhesive film with a thickness of 35 μm. Next, as shown in FIGS. 18(C) and 18(D) , a 25 μm-thick single-piece adhesive film and a 35 μm-thick single-piece adhesive film are bonded to each other, so that as shown in FIG. 23 size, a film structure 3 including a monolithic adhesive film with a thickness of 25 μm and a monolithic adhesive film with a thickness of 35 μm was produced.

[膜結構體4] 圖24係表示膜結構體4之尺寸之俯視圖。如圖19(A)所示,使用厚度25 μm之接著膜A製作不含焊料粒子之不含焊料粒子之單片化接著膜,並且如圖19(C)所示,使用厚度25 μm之導電性接著膜A製作含有焊料粒子之含焊料粒子之單片化接著膜。又,如圖19(B)所示,使用厚度35 μm之接著膜B製作不含焊料粒子之不含焊料粒子之單片化接著膜,並且如圖19(D)所示,使用厚度35 μm之導電性接著膜A製作含有焊料粒子之含焊料粒子之單片化接著膜。 [Membrane structure 4] FIG. 24 is a plan view showing the dimensions of the membrane structure 4. As shown in Figure 19(A), use the adhesive film A with a thickness of 25 μm to produce a single-piece adhesive film that does not contain solder particles, and as shown in Figure 19(C), use a conductive film with a thickness of 25 μm. The adhesive film A is a solder particle-containing single-piece adhesive film containing solder particles. Moreover, as shown in Fig. 19(B) , the adhesive film B with a thickness of 35 μm was used to produce a single-piece adhesive film that does not contain solder particles, and as shown in Fig. 19(D) , an adhesive film with a thickness of 35 μm was used. The conductive adhesive film A is used to produce a solder particle-containing monolithic adhesive film.

接下來,如圖19(E)及圖19(F)所示,將不含焊料粒子之單片化接著膜與含焊料粒子之單片化接著膜貼合,藉此使含焊料粒子之單片化接著膜嵌合於電子零件之端子行部分,如圖24所示之尺寸,製作配置有存在不含焊料粒子之部位及含有焊料粒子之部位的厚度25 μm之單片化接著膜及厚度35 μm之單片化接著膜之膜結構體4。Next, as shown in FIGS. 19(E) and 19(F) , the singulated adhesive film containing no solder particles is bonded to the singulated adhesive film containing solder particles, thereby making the solder particle-containing singulated adhesive films The sheet bonding film is fitted to the terminal row portion of the electronic component. The size is shown in Figure 24. A sheet bonding film with a thickness of 25 μm and a thickness of 25 μm is produced and arranged with a portion that does not contain solder particles and a portion that contains solder particles. 35 μm monolithic membrane structure 4.

[膜結構體5] 藉由以下方法製作圖24所示之膜結構體作為膜結構體5。藉由使用使接著膜A溶解於PMA(丙二醇單甲醚乙酸酯)中而成之膏之網版版印刷製作圖19(A)所示之厚度25 μm之不含焊料粒子之單片化接著膜、圖19(C)所示之厚度25 μm之含有焊料粒子之含焊料粒子之單片化接著膜、圖19(B)所示之厚度35 μm之不含焊料粒子之單片化接著膜、及圖19(D)所示之厚度35 μm之含有焊料粒子之含焊料粒子之單片化接著膜。使用網版將膏印刷成規定形狀後,藉由80℃、5分鐘之條件之烘箱乾燥製作單片化接著膜。又,使用具有不同厚度之網版製作規定厚度之單片化接著膜。 [Membrane structure 5] The membrane structure shown in FIG. 24 was produced as the membrane structure 5 by the following method. By screen printing using a paste in which adhesive film A is dissolved in PMA (propylene glycol monomethyl ether acetate), a 25 μm-thick, solder-free single piece shown in Figure 19(A) is produced. Adhesion film, a solder particle-containing single-piece adhesive film with a thickness of 25 μm as shown in Figure 19(C), and a single-piece adhesive film without solder particles with a thickness of 35 μm as shown in Figure 19(B) film, and a solder particle-containing monolithic adhesive film with a thickness of 35 μm as shown in Figure 19(D). After printing the paste into a prescribed shape using a screen, it is dried in an oven at 80°C for 5 minutes to produce a single-piece adhesive film. In addition, a single-piece adhesive film of a prescribed thickness is produced using screens with different thicknesses.

接下來,如圖19(E)及圖19(F)所示,將不含焊料粒子之單片化接著膜與含焊料粒子之單片化接著膜貼合,藉此使含焊料粒子之單片化接著膜嵌合於電子零件之端子行部分,如圖24所示之尺寸,製作配置有存在不含焊料粒子之部位及含有焊料粒子之部位的有厚度25 μm之單片化接著膜及厚度35 μm之單片化接著膜之膜結構體5。Next, as shown in FIGS. 19(E) and 19(F) , the singulated adhesive film containing no solder particles is bonded to the singulated adhesive film containing solder particles, thereby making the solder particle-containing singulated adhesive films The sheet bonding film is fitted to the terminal row part of the electronic component. The size is shown in Figure 24. A sheet bonding film with a thickness of 25 μm is produced and arranged with a portion that does not contain solder particles and a portion that contains solder particles. The membrane structure 5 is a monolithic film-bonded membrane with a thickness of 35 μm.

[膜結構體6] 藉由下述方法製作圖24所示之膜結構體來作為膜結構體6。如圖19(E)及圖19(F)所示,藉由使用使接著膜A溶解於PMA中而成之膏之噴嘴噴射印刷來製作。又,使用具有不同噴嘴直徑之噴嘴控制塗佈量,如圖24所示之尺寸,製作配置有存在不含焊料粒子之部位及含有焊料粒子之部位的厚度25 μm之單片化接著膜及厚度35 μm之單片化接著膜之膜結構體6。 [Membrane structure 6] The membrane structure shown in FIG. 24 was produced as the membrane structure 6 by the following method. As shown in FIGS. 19(E) and 19(F) , it is produced by nozzle jet printing using a paste in which the adhesive film A is dissolved in PMA. In addition, nozzles with different nozzle diameters were used to control the coating amount, and the dimensions were shown in Figure 24, and a 25 μm-thick monolithic adhesive film with a thickness of 25 μm and a position where there were areas not containing solder particles and areas containing solder particles were produced. 35 μm monolithic film-bonded membrane structure 6.

於表1中示出膜結構體1~6之導通性能、接合強度、及焊料附著之評價結果。Table 1 shows the evaluation results of conductive performance, joint strength, and solder adhesion of film structures 1 to 6.

[表1]    膜結構體1 膜結構體2 膜結構體3 膜結構體4 膜結構體5 膜結構體6 均勻 存在NCF部位 存在較厚之部位 存在NCF部位 存在較厚之部位 存在NCF部位 存在較厚之部位 存在NCF部位 存在較厚之部位 維多利亞刀加工 網版印刷 加工 噴嘴印刷 加工 電子零件A (插頭) 導通性能 A A A A A A 接合強度 A A A A A A 電子零件B (插座) 導通性能 A A A A A A 接合強度 B B A A A A 焊料附著 NG OK NG OK OK OK [Table 1] Membrane structure 1 Membrane structure 2 Membrane structure 3 Membrane structure 4 Membrane structure 5 Membrane structure 6 Uniform NCF site exists There are thicker parts There are thicker areas in areas where NCF exists. There are thicker areas in areas where NCF exists. There are thicker areas in areas where NCF exists. Victoria knife processing Screen printing processing Nozzle printing processing Electronic parts A (plug) conduction performance A A A A A A Bonding strength A A A A A A Electronic parts B (socket) conduction performance A A A A A A Bonding strength B B A A A A solder adhesion NG OK NG OK OK OK

如表1所示,得知膜結構體1~6可將複數個單片化接著膜一次性暫貼於基板,從而能夠縮短製程產距。根據使用膜結構體1之情形及使用膜結構體2之情形之比較得知,藉由配置存在不含焊料粒子之部位及含有焊料粒子之部位之單片化接著膜,可防止焊料向無用部位潤濕擴散。根據使用膜結構體1之情形及使用膜結構體3之情形之比較得知,藉由使配置於插座連接器之單片化接著膜之厚度大於配置於插頭連接器之單片化接著膜之厚度,可提高插座連接器之接合強度。As shown in Table 1, it is known that the film structures 1 to 6 can temporarily affix a plurality of single-piece adhesive films to the substrate at one time, thereby shortening the process throughput. Comparing the case of using the film structure 1 and the case of using the film structure 2, it can be seen that by arranging a single-piece adhesive film with a portion that does not contain solder particles and a portion that contains solder particles, it is possible to prevent solder from flowing into useless areas. Wetting and spreading. From a comparison between the case of using the film structure 1 and the case of using the film structure 3, it can be seen that by making the thickness of the monolithic adhesive film disposed on the receptacle connector larger than that of the monolithic adhesive film disposed on the plug connector Thickness can improve the joint strength of socket connectors.

又,根據使用膜結構體1之情形、使用膜結構體2之情形、使用膜結構體3之情形及使用膜結構體4之情形之比較得知,藉由配置存在不含焊料粒子之部位及含有焊料粒子之部位之單片化接著膜,並且使配置於插座連接器之單片化接著膜之厚度大於配置於插頭連接器之單片化接著膜之厚度,可獲得插頭連接器及插座連接器之優異之接合強度及焊料接合。Furthermore, from a comparison of the case where the film structure 1 is used, the case where the film structure 2 is used, the case where the film structure 3 is used, and the case where the film structure 4 is used, it can be seen that by arranging the portions containing no solder particles and A plug connector and a receptacle connection can be obtained by forming a single-piece adhesive film on the part containing solder particles and making the thickness of the single-piece adhesive film disposed on the socket connector greater than the thickness of the single-piece adhesive film disposed on the plug connector. Excellent joint strength and solder joints.

又,根據使用膜結構體4之情形、使用膜結構體5之情形及使用膜結構體6之情形之比較得知,不論使用維多利亞刀加工、網版印刷加工、噴嘴印刷加工中之哪一種加工方法,均可配置存在不含焊料粒子之部位及含有焊料粒子之部位之單片化接著膜,並且可使配置於插座連接器之單片化接著膜之厚度大於配置於插頭連接器之單片化接著膜之厚度,從而可獲得插頭連接器及插座連接器之優異之接合強度及焊料接合。Furthermore, a comparison of the case of using the film structure 4, the case of using the film structure 5, and the case of using the film structure 6 shows that no matter which one of Victoria knife processing, screen printing processing, and nozzle printing processing is used, In both methods, a single-piece adhesive film can be disposed in areas that do not contain solder particles and areas that contain solder particles, and the thickness of the single-piece adhesive film placed in the socket connector can be made larger than that of the single-piece adhesive film placed in the plug connector. By reducing the thickness of the bonding film, excellent joint strength and solder joints of plug connectors and socket connectors can be obtained.

[藉由貼片機將單片化接著膜貼合於電子零件及電子零件之搭載] 利用貼片機之吸附頭抓住插頭連接器後,降落至與插頭連接器對應之由導電性接著膜A構成之單片化接著膜上,並將該單片化接著膜向上拉,藉此可將單片化接著膜自基底PET膜剝離,且可直接搭載於基板。針對插座連接器,亦同樣。 [Laying single-chip adhesive films onto electronic components and mounting of electronic components using a placement machine] Use the suction head of the placement machine to grab the plug connector, then drop it onto the individualized adhesive film composed of the conductive adhesive film A corresponding to the plug connector, and pull the individualized adhesive film upward. The individualized adhesive film can be peeled off from the base PET film and directly mounted on the substrate. The same goes for socket connectors.

[藉由貼片機搭載單片化接著膜] 模擬藉由貼片機搭載單片化接著膜,製作如圖15所示之附吸附孔之頭工具。於圖15所示之吸附頭中,使用厚度200 μm之聚矽氧橡膠作為彈性體層91,將吸附面之縱寬x1設為10 mm及橫寬y1設為10 mm,將吸附孔92之形成區域之縱寬x2設為2.5 mm及橫寬y2設為6 mm,將吸附孔92之直徑設為0.35 mm。對使用具備該吸附頭之貼片機將與插頭連接器對應之由導電性接著   膜A構成之單片化接著膜安裝於基板進行研究,結果可將單片化接著膜搭載於基板。針對與插座連接器對應之單片化接著膜,亦同樣。 [Single-piece adhesive film mounted on placement machine] It is simulated to install a single-chip adhesive film on a placement machine to produce a head tool with adsorption holes as shown in Figure 15. In the adsorption head shown in Figure 15, polysilicone rubber with a thickness of 200 μm is used as the elastomer layer 91, the vertical width x1 of the adsorption surface is set to 10 mm and the horizontal width y1 is set to 10 mm, and the adsorption hole 92 is formed. The vertical width x2 of the area is set to 2.5 mm, the horizontal width y2 is set to 6 mm, and the diameter of the adsorption hole 92 is set to 0.35 mm. Studies have been conducted on using a chip mounter equipped with this suction head to mount a monolithic adhesive film composed of a conductive adhesive film A corresponding to a plug connector on a substrate. As a result, the monolithic adhesive film can be mounted on the substrate. The same applies to the monolithic adhesive film corresponding to the socket connector.

10:基板 11:第1連接器安裝區域 12:第2連接器安裝區域 13:第1晶片安裝區域 14:第2晶片安裝區域 15:第3晶片安裝區域 16:第4晶片安裝區域 17:第5晶片安裝區域 18:第6晶片安裝區域 21:第1單片化接著膜 22:第2單片化接著膜 23:第3單片化接著膜 24:第4單片化接著膜 25:第5單片化接著膜 26:第6單片化接著膜 27:第7單片化接著膜 28:第8單片化接著膜 30:基材 30A:第1單片化接著膜 30B:第2單片化接著膜 30C:第3單片化接著膜 30D:第4單片化接著膜 31a,31b:含有部 31c:非含有部 32a、32b:含有部 32c:非含有部 33:第1含有部 34:第2含有部 35:第3含有部 36:第4含有部 37:第1含有部 38:第2含有部 40:基板 41:單片化接著膜安裝區域 42:焊料膏安裝區域 43:第1電極 44:第2電極 45:第3電極 46:第4電極 51:單片化接著膜 60:金屬遮罩 61:刮刀 63:焊料膏 63:第1焊料膏層 64:第2焊料膏層 65:第3焊料膏層 66:第4焊料膏層 71:第1晶片零件 72:第2晶片零件 80:吸附頭 81:電子零件 82:單片化接著膜 83:基材 84:基板 90:吸附頭 91:彈性體層 92:吸附孔 100:第1基材 101:接著膜 102,103:第1單片化接著膜 110:第1基材 111,112:第1單片化接著膜 111a,111b,112a,112b:嵌合部 120:第2基材 121a,121b,122a,122b:第2單片化接著膜 130:第1基材 131:第1單片化接著膜 140:第2基材 141:第2單片化接著膜 150:第1基材 151:第1單片化接著膜 151a,151b:嵌合部 160:第2基材 161:第2單片化接著膜 161a,161b:嵌合部 170:第3基材 171a,171b:第3單片化接著膜 180:第4基材 181a,181b:第4單片化接著膜 10:Substrate 11: 1st connector installation area 12: 2nd connector installation area 13: 1st chip mounting area 14: 2nd chip mounting area 15: The third chip mounting area 16: 4th chip mounting area 17: 5th chip mounting area 18: The 6th chip mounting area 21: The first single-piece adhesive film 22: The second single-piece adhesive film 23: The third single-piece adhesive film 24: The 4th single-piece adhesive film 25: The fifth single-piece adhesive film 26: The 6th single-piece adhesive film 27: The 7th single-piece adhesive film 28: The 8th single-piece adhesive film 30:Substrate 30A: The first single-piece adhesive film 30B: The second single-piece adhesive film 30C: The third single-piece adhesive film 30D: The 4th single-piece adhesive film 31a, 31b: contains parts 31c: non-containing parts 32a, 32b: contains parts 32c: non-containing parts 33: The first containing part 34: The second containing part 35: The third containing part 36: The fourth part contains 37: The first containing part 38: The second containing part 40:Substrate 41: Single-piece adhesive film installation area 42: Solder paste installation area 43: 1st electrode 44: 2nd electrode 45: 3rd electrode 46: 4th electrode 51:Single-piece adhesive film 60:Metal mask 61:Scraper 63:Solder paste 63: 1st solder paste layer 64: 2nd solder paste layer 65: 3rd solder paste layer 66: 4th solder paste layer 71: 1st chip parts 72: 2nd chip parts 80: Adsorption head 81:Electronic parts 82:Single-piece adhesive film 83:Substrate 84:Substrate 90:Adsorption head 91: Elastomer layer 92: Adsorption hole 100: 1st base material 101: Apply film 102,103: The first single-piece adhesive film 110: 1st base material 111,112: The first single-piece adhesive film 111a, 111b, 112a, 112b: Fitting part 120: 2nd base material 121a, 121b, 122a, 122b: 2nd single-piece adhesive film 130: 1st base material 131: The first single-piece adhesive film 140: 2nd base material 141: The second single-piece adhesive film 150: 1st base material 151: The first single-piece adhesive film 151a, 151b: chimeric part 160: 2nd base material 161: The second single-piece adhesive film 161a, 161b: chimeric part 170: 3rd base material 171a, 171b: The third single-piece adhesive film 180: 4th base material 181a, 181b: The fourth single-piece adhesive film

[圖1]係表示基板之一例之俯視圖; [圖2]係表示膜結構體之一例之俯視圖; [圖3]係表示將單片化接著膜暫貼於基板上之狀態之圖; [圖4]係表示膜結構體之變化例之俯視圖; [圖5]係表示將變化例之單片化接著膜一次性暫貼於基板上之狀態之圖; [圖6]係表示將單片化接著膜暫貼於基板上之暫貼步驟之圖; [圖7]係表示印刷焊料膏之印刷步驟之圖; [圖8]係表示載置電子零件之載置步驟之圖; [圖9](A)係表示回焊步驟之圖,(B)係表示回焊步驟後之連接結構體之一例之圖; [圖10]係表示回焊爐之溫度條件之一例之曲線圖; [圖11]係表示自卷盤抽出之單片化接著膜之俯視圖; [圖12]係表示將單片化接著膜貼合於電子零件之狀態之圖; [圖13]係表示將貼合於電子零件之單片化接著膜搭載於基板之狀態之圖; [圖14]係表示介隔單片化接著膜將電子零件搭載於基板之狀態之圖; [圖15](A)係表示吸附頭之吸附面之俯視圖,(B)係表示吸附頭之側面之側視圖; [圖16](A)係表示加工前之膜結構體之俯視圖,(B)係表示加工後之膜結構體之俯視圖; [圖17](A)係表示第1膜結構體之俯視圖,(B)係表示第2膜結構體之俯視圖,(C)係表示加工後之膜結構體之俯視圖; [圖18](A)係表示第1膜結構體之俯視圖,(B)係表示第2膜結構體之俯視圖,(C)係表示加工後之膜結構體之俯視圖,(D)係表示加工後之膜結構體之截面圖; [圖19](A)係表示第1膜結構體之俯視圖,(B)係表示第2膜結構體之俯視圖,(C)係表示第3膜結構體之俯視圖,(D)係表示第4膜結構體之俯視圖,(E)係表示加工後之膜結構體之俯視圖,(F)係表示加工後之膜結構體之截面圖; [圖20]係表示插座連接器之一例之俯視圖; [圖21]係表示膜結構體1之尺寸之俯視圖; [圖22]係表示膜結構體2之尺寸之俯視圖; [圖23]係表示膜結構體3之尺寸之俯視圖; [圖24]係表示膜結構體4之尺寸之俯視圖。 [Fig. 1] is a top view showing an example of a substrate; [Fig. 2] is a top view showing an example of a membrane structure; [Figure 3] is a diagram showing the state where the single-piece adhesive film is temporarily attached to the substrate; [Fig. 4] is a top view showing a modified example of the membrane structure; [Fig. 5] is a diagram showing a state in which a single-piece adhesive film according to the variation is temporarily attached to a substrate at one time; [Fig. 6] is a diagram showing the temporary attaching step of temporarily attaching the individualized adhesive film to the substrate; [Fig. 7] is a diagram showing the printing steps of printing solder paste; [Figure 8] is a diagram showing the steps for placing electronic components; [Fig. 9] (A) is a diagram showing the reflow step, and (B) is a diagram showing an example of the connection structure after the reflow step; [Fig. 10] is a graph showing an example of temperature conditions of a reflow furnace; [Figure 11] is a top view showing the individualized adhesive film taken out from the reel; [Figure 12] is a diagram showing the state of laminating a single-piece adhesive film to an electronic component; [Fig. 13] is a diagram showing a state in which a singulated adhesive film bonded to an electronic component is mounted on a substrate; [Fig. 14] is a diagram showing a state in which electronic components are mounted on a substrate through a singulated adhesive film; [Fig. 15] (A) is a top view showing the suction surface of the suction head, (B) is a side view showing the side of the suction head; [Fig. 16] (A) is a top view showing the membrane structure before processing, and (B) is a top view showing the membrane structure after processing; [Fig. 17] (A) is a top view showing the first membrane structure, (B) is a top view showing the second membrane structure, and (C) is a top view showing the processed membrane structure; [Fig. 18] (A) is a top view showing the first membrane structure, (B) is a top view showing the second membrane structure, (C) is a top view showing the membrane structure after processing, (D) is processing The cross-sectional view of the membrane structure shown below; [Fig. 19] (A) is a top view showing the first membrane structure, (B) is a top view showing the second membrane structure, (C) is a top view showing the third membrane structure, (D) is a top view showing the fourth membrane structure The top view of the membrane structure, (E) represents the top view of the membrane structure after processing, (F) represents the cross-sectional view of the membrane structure after processing; [Fig. 20] is a top view showing an example of a socket connector; [Fig. 21] is a top view showing the dimensions of the membrane structure 1; [Fig. 22] is a top view showing the dimensions of the membrane structure 2; [Fig. 23] is a top view showing the dimensions of the membrane structure 3; [Fig. 24] is a plan view showing the dimensions of the membrane structure 4.

20:基材 20:Substrate

21a:第1單片 化接著膜 21a: The first single piece of adhesive film

21b:第1單片 化接著膜 21b: The first single piece of adhesive film

22a:第2單片 化接著膜 22a: The second single piece of adhesive film

22b:第2單片 化接著膜 22b: The second single piece of adhesive film

23:第3單片 化接著膜 23: The third single piece of adhesive film

24:第4單片 化接著膜 24: The 4th single piece chemical adhesive film

25:第5單片 化接著膜 25: The fifth single piece of adhesive film

26:第6單片 化接著膜 26: The 6th single piece chemical adhesive film

27:第7單片 化接著膜 27: The 7th single piece chemical adhesive film

28:第8單片 化接著膜 28: The 8th single piece chemical adhesive film

Claims (19)

一種連接結構體之製造方法,其具有以下步驟: 準備供安裝複數個電子零件之基板; 準備於與上述供安裝複數個電子零件之基板對應之基材上之規定位置配置有包含含有焊料粒子之單片化接著膜之複數個單片化接著膜的膜結構體; 將上述複數個單片化接著膜一次性暫貼於上述基板之規定部位; 將電子零件載置於上述單片化接著膜上;及 對設置有上述單片化接著膜及上述電子零件之基板進行回焊。 A method of manufacturing a connected structure, which has the following steps: Prepare substrates for mounting multiple electronic components; Prepare a film structure in which a plurality of singulated adhesive films including a singulated adhesive film containing solder particles are arranged at predetermined positions on the base material corresponding to the above-mentioned substrate for mounting a plurality of electronic components; Temporarily affix the above-mentioned plurality of single-piece adhesive films to prescribed parts of the above-mentioned substrate at one time; Place electronic components on the above-mentioned single-piece adhesive film; and The substrate provided with the above-mentioned singulated adhesive film and the above-mentioned electronic component is reflowed. 一種連接結構體之製造方法,其具有以下步驟: 準備供安裝複數個電子零件之基板; 準備於基材上設置有與上述複數個電子零件對應之單片化接著膜之膜結構體; 使用貼片機將電子零件按壓至與該電子零件對應之單片化接著膜,使上述單片化接著膜貼合於上述電子零件,並搭載貼合有上述單片化接著膜之電子零件;及 對設置有上述單片化接著膜及上述電子零件之基板進行回焊。 A method of manufacturing a connected structure, which has the following steps: Prepare substrates for mounting multiple electronic components; Prepare a film structure on which a single-piece adhesive film corresponding to the plurality of electronic components is provided on a base material; Use a chip mounter to press the electronic component onto the singulated adhesive film corresponding to the electronic component, so that the singulated adhesive film is bonded to the electronic component, and the electronic component bonded with the singulated adhesive film is mounted; and The substrate provided with the above-mentioned singulated adhesive film and the above-mentioned electronic component is reflowed. 一種連接結構體之製造方法,其具有以下步驟: 準備供安裝複數個電子零件之基板; 準備於基材上設置有與上述複數個電子零件對應之單片化接著膜之膜結構體; 使用貼片機將上述單片化接著膜搭載於上述基板之規定部位; 將電子零件載置於上述單片化接著膜上;及 對設置有上述單片化接著膜及上述電子零件之基板進行回焊。 A method of manufacturing a connected structure, which has the following steps: Prepare substrates for mounting multiple electronic components; Prepare a film structure on which a single-piece adhesive film corresponding to the plurality of electronic components is provided on a base material; Use a placement machine to mount the above-mentioned single-piece adhesive film on the prescribed position of the above-mentioned substrate; Place electronic components on the above-mentioned single-piece adhesive film; and The substrate provided with the above-mentioned singulated adhesive film and the above-mentioned electronic component is reflowed. 如請求項1之連接結構體之製造方法,其於上述暫貼步驟後,進而具有於上述基板之規定部位設置焊料膏之步驟, 於載置上述零件之步驟中,將零件載置於上述焊料膏上。 The manufacturing method of the connection structure of claim 1 further includes the step of disposing solder paste on a predetermined position of the substrate after the temporary pasting step. In the step of placing the above components, the components are placed on the above solder paste. 如請求項2之連接結構體之製造方法,其於搭載貼合有上述單片化接著膜之電子零件之步驟前,進而具有以下步驟: 於上述基板之規定部位設置焊料膏;及 將電子零件載置於上述焊料膏上。 The manufacturing method of the connection structure of Claim 2 further includes the following steps before mounting the electronic components bonded with the above-mentioned single-piece adhesive film: Apply solder paste to the specified parts of the above-mentioned substrate; and Place electronic components on the above solder paste. 如請求項3之連接結構體之製造方法,其於搭載上述單片化接著膜之步驟前,進而具有於上述基板之規定部位設置焊料膏之步驟, 於搭載上述零件之步驟中,將零件載置於上述焊料膏上。 The method of manufacturing a connection structure according to Claim 3 further includes the step of disposing solder paste on a predetermined portion of the substrate before mounting the single-piece adhesive film. In the step of mounting the above components, the components are placed on the above solder paste. 如請求項1至6中任一項之連接結構體之製造方法,其中,上述單片化接著膜之1個以上含有焊料粒子。The method for manufacturing a connected structure according to any one of claims 1 to 6, wherein at least one of the individualized adhesive films contains solder particles. 如請求項1至7中任一項之連接結構體之製造方法,其中,上述單片化接著膜之1個以上具有含有焊料粒子之區域及不含焊料粒子之區域。The method for manufacturing a connected structure according to any one of claims 1 to 7, wherein at least one of the individualized adhesive films has a region containing solder particles and a region not containing solder particles. 如請求項1至8中任一項之連接結構體之製造方法,其中,上述單片化接著膜之1個以上與其他單片化接著膜厚度不同。The method for manufacturing a connected structure according to any one of claims 1 to 8, wherein at least one of the individualized adhesive films has a different thickness from the other individualized adhesive films. 如請求項1至9中任一項之連接結構體之製造方法,其中,上述單片化接著膜係藉由半切加工、網版印刷、或噴墨印刷而形成於基材上。The method for manufacturing a connected structure according to any one of claims 1 to 9, wherein the single-piece adhesive film is formed on the base material by half-cut processing, screen printing, or inkjet printing. 一種膜結構體,其具備: 基材;及 複數個單片化接著膜,其等設置於與複數個零件對應之上述基材上之規定位置; 上述複數個單片化接著膜之1個以上含有焊料粒子。 A membrane structure having: base material; and A plurality of single-piece adhesive films, which are arranged at prescribed positions on the above-mentioned base material corresponding to a plurality of parts; At least one of the plurality of individualized adhesive films contains solder particles. 一種膜結構體,其具備: 基材;及 複數個單片化接著膜,其等設置於與複數個零件對應之上述基材上之規定位置; 上述複數個單片化接著膜之1個以上具有含有焊料粒子之區域及不含焊料粒子之區域。 A membrane structure having: base material; and A plurality of single-piece adhesive films, which are arranged at prescribed positions on the above-mentioned base material corresponding to a plurality of parts; At least one of the plurality of monolithic adhesive films has a region containing solder particles and a region not containing solder particles. 一種膜結構體,其具備: 基材;及 複數個單片化接著膜,其等設置於與複數個零件對應之上述基材上之規定位置; 上述複數個單片化接著膜之1個以上與其他單片化接著膜厚度不同。 A membrane structure having: base material; and A plurality of single-piece adhesive films, which are arranged at prescribed positions on the above-mentioned base material corresponding to a plurality of parts; One or more of the plurality of individualized adhesive films has a different thickness from the other individualized adhesive films. 一種膜結構體,其具備: 基材; 具有第1厚度之單片化接著膜,其設置於與複數個零件對應之上述基材上之規定位置,具有含有焊料粒子之區域及不含焊料粒子之區域;及 具有第2厚度之單片化接著膜,其設置於與複數個零件對應之上述基材上之規定位置,具有含有焊料粒子之區域及不含焊料粒子之區域。 A membrane structure having: base material; A monolithic adhesive film having a first thickness, which is provided at a predetermined position on the above-mentioned base material corresponding to a plurality of parts, and has an area containing solder particles and an area not containing solder particles; and A monolithic adhesive film having a second thickness is provided at a predetermined position on the base material corresponding to a plurality of parts, and has a region containing solder particles and a region not containing solder particles. 如請求項11至15中任一項之膜結構體,其中,上述單片化接著膜係藉由半切加工、網版印刷、或噴墨印刷而形成於基材上。The film structure according to any one of claims 11 to 15, wherein the single-piece adhesive film is formed on the base material by half-cut processing, screen printing, or inkjet printing. 一種膜結構體之製造方法,其係於第1基材上設置第1單片化接著膜, 於第2基材上設置第2單片化接著膜, 於與複數個電子零件對應之上述第1基材、上述第2基材、或第3基材之規定位置配置上述第1單片化接著膜及上述第2單片化接著膜, 上述第1單片化接著膜及上述第2單片化接著膜之1個以上含有焊料粒子。 A method of manufacturing a film structure, which includes providing a first monolithic adhesive film on a first base material, A second single-piece adhesive film is provided on the second base material, The above-mentioned first singulation adhesive film and the above-mentioned second singulation adhesive film are arranged at predetermined positions on the above-mentioned first base material, the above-mentioned second base material, or the above-mentioned third base material corresponding to the plurality of electronic components, At least one of the first singulated adhesive film and the second singulated adhesive film contains solder particles. 一種膜結構體之製造方法,其係於第1基材上設置不含焊料粒子之單片化接著膜, 於第2基材上設置含有焊料粒子之單片化接著膜, 於上述第1基材、上述第2基材、或第3基材之規定位置,使上述不含焊料粒子之單片化接著膜及上述含有焊料粒子之單片化接著膜靠近,來配置具有不含焊料粒子之區域及含有焊料粒子之區域之單片化接著膜。 A method of manufacturing a film structure, which is to provide a single-piece adhesive film that does not contain solder particles on a first base material, A single-piece adhesive film containing solder particles is provided on the second base material, At a predetermined position of the above-mentioned first base material, the above-mentioned second base material, or the above-mentioned third base material, the above-mentioned singulated adhesive film not containing solder particles and the above-mentioned singulated adhesive film containing solder particles are brought close to each other, so as to arrange Single-piece adhesive film for areas that do not contain solder particles and areas that contain solder particles. 一種膜結構體之製造方法,其係於第1基材上設置具有第1厚度之單片化接著膜, 於第2基材上設置具有第2厚度之單片化接著膜, 於與複數個零件對應之上述第1基材、上述第2基材、或第3基材之規定位置配置上述具有第1厚度之單片化接著膜及上述具有第2厚度之單片化接著膜。 A method of manufacturing a film structure, which includes providing a monolithic adhesive film with a first thickness on a first base material, A monolithic adhesive film having a second thickness is provided on the second base material, The above-mentioned single-piece adhesive film having the first thickness and the above-mentioned single-piece adhesive film having the second thickness are arranged at predetermined positions of the above-mentioned first base material, the above-mentioned second base material, or the above-mentioned third base material corresponding to the plurality of parts. membrane. 一種膜結構體之製造方法,其係於第1基材上設置不含焊料粒子且具有第1厚度之單片化接著膜, 於第2基材上設置不含焊料粒子且具有第2厚度之單片化接著膜, 於第3基材上設置含有焊料粒子且具有上述第1厚度之單片化接著膜, 於第4基材上設置含有焊料粒子且具有上述第2厚度之單片化接著膜, 於上述第1基材、上述第2基材、上述第3基材、上述第4基材、或第5基材之規定位置,使上述不含焊料粒子且具有第1厚度之單片化接著膜及上述含有焊料粒子且具有第1厚度之單片化接著膜靠近,來配置具有不含焊料粒子之區域及含有焊料粒子之區域並且具有第1厚度之單片化接著膜,並且使上述不含焊料粒子且具有第2厚度之單片化接著膜及上述含有焊料粒子且具有第2厚度之單片化接著膜靠近,來配置具有不含焊料粒子之區域及含有焊料粒子之區域並且具有第2厚度之單片化接著膜。 A method of manufacturing a film structure, which is to provide a single-piece adhesive film that does not contain solder particles and has a first thickness on a first base material, A monolithic adhesive film containing no solder particles and having a second thickness is provided on the second base material, A singulated adhesive film containing solder particles and having the above-mentioned first thickness is provided on the third base material, A singulated adhesive film containing solder particles and having the above-mentioned second thickness is provided on the fourth base material, At predetermined positions of the above-mentioned first base material, the above-mentioned second base material, the above-mentioned third base material, the above-mentioned fourth base material, or the above-mentioned fifth base material, the above-mentioned solder particles-free and having the first thickness are individually bonded. The film and the above-mentioned singulated adhesive film containing solder particles and having a first thickness are brought close to each other, so that the singulated adhesive film having a first thickness and a region not containing solder particles and a region containing solder particles is arranged, and the above-mentioned The singulated adhesive film containing solder particles and having a second thickness and the singulated adhesive film containing solder particles and having a second thickness are arranged close to each other so as to have a region not containing solder particles and a region containing solder particles and having a third thickness. 2-thickness monolithic adhesive film.
TW112104456A 2022-02-28 2023-02-08 Connection structure manufacturing method, film structure, and film structure manufacturing method TW202349802A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022-030239 2022-02-28
JP2022030239A JP2023125888A (en) 2022-02-28 2022-02-28 Manufacturing method of connection structure, film structure, and manufacturing method of film structure

Publications (1)

Publication Number Publication Date
TW202349802A true TW202349802A (en) 2023-12-16

Family

ID=87765606

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112104456A TW202349802A (en) 2022-02-28 2023-02-08 Connection structure manufacturing method, film structure, and film structure manufacturing method

Country Status (3)

Country Link
JP (1) JP2023125888A (en)
TW (1) TW202349802A (en)
WO (1) WO2023162666A1 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11135567A (en) * 1997-10-30 1999-05-21 Toshiba Corp Anisotropic conductive film and manufacture of semiconductor device
JP3982444B2 (en) * 2003-04-07 2007-09-26 ソニーケミカル&インフォメーションデバイス株式会社 Anisotropic conductive adhesive
JP7020305B2 (en) * 2018-06-07 2022-02-16 昭和電工マテリアルズ株式会社 Adhesive sheet
KR102601787B1 (en) * 2019-03-08 2023-11-13 데쿠세리아루즈 가부시키가이샤 Method for producing a bonded structure, and a bonded structure, and a film structure, and a method for manufacturing a film structure
CN115053640A (en) * 2020-02-07 2022-09-13 迪睿合株式会社 Method for producing connected body, and connected body

Also Published As

Publication number Publication date
JP2023125888A (en) 2023-09-07
WO2023162666A1 (en) 2023-08-31

Similar Documents

Publication Publication Date Title
TWI523127B (en) Manufacturing method for electronic device
US7875496B2 (en) Flip chip mounting method, flip chip mounting apparatus and flip chip mounting body
JPWO2013133015A1 (en) Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
CN112823448B (en) Method for producing connector, anisotropic bonding film, and connector
JP6888749B1 (en) How to manufacture electronic component equipment
KR101493340B1 (en) Solder transfer base, method for producing solder transfer base, and method for transferring solder
TW202349802A (en) Connection structure manufacturing method, film structure, and film structure manufacturing method
JP2006352166A (en) Multi-chip mounting method
JP6949258B2 (en) Manufacturing method of connecting body and connecting body
CN116438269A (en) Conductive adhesive, anisotropic conductive film, connection structure, and method for producing connection structure
TW202143255A (en) Connection structure and manufucturing method therefor
CN114502685B (en) Method for producing connector, anisotropic conductive bonding material, and connector
JP5438450B2 (en) Conductive fine particles, anisotropic conductive material, and connection structure
JP2007049179A (en) Multi-chip mounting method and curing film-like adhesive used for the same
JP2007214559A (en) Inter-wiring method of connection
WO2021157490A1 (en) Method for producing connected body, and connected body
TW201212136A (en) Manufacturing method of wiring substrate having solder bump, and mask for mounting solder ball
JP4337941B2 (en) Multi-chip mounting method
JP4563362B2 (en) Chip mounting method
JP2007184653A (en) Method of mounting multichip module
WO2020090684A1 (en) Method for manufacturing connected body, anisotropic bonding film, and connected body
JP2023079630A (en) Manufacturing method for connection structure and connection structure
JP2023092710A (en) Connected structure and connected structure manufacturing method
KR20210001630A (en) Electrode - Micro device bonding method using self-assembled and aligned solder paste
JP2023079632A (en) Connection structure and method for manufacturing connection structure