TW202349478A - 搬送單元及加工裝置 - Google Patents
搬送單元及加工裝置 Download PDFInfo
- Publication number
- TW202349478A TW202349478A TW112121035A TW112121035A TW202349478A TW 202349478 A TW202349478 A TW 202349478A TW 112121035 A TW112121035 A TW 112121035A TW 112121035 A TW112121035 A TW 112121035A TW 202349478 A TW202349478 A TW 202349478A
- Authority
- TW
- Taiwan
- Prior art keywords
- workpiece
- frame unit
- holding
- holding mechanism
- work
- Prior art date
Links
- 230000007423 decrease Effects 0.000 title abstract description 8
- 238000001035 drying Methods 0.000 title abstract description 4
- 239000012530 fluid Substances 0.000 claims abstract description 22
- 238000003754 machining Methods 0.000 claims abstract description 21
- 239000007788 liquid Substances 0.000 claims abstract description 17
- 230000007246 mechanism Effects 0.000 claims description 162
- 238000004140 cleaning Methods 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 7
- 239000007921 spray Substances 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 3
- 230000032258 transport Effects 0.000 description 57
- 238000005520 cutting process Methods 0.000 description 43
- 239000000463 material Substances 0.000 description 8
- 238000003860 storage Methods 0.000 description 8
- 239000000919 ceramic Substances 0.000 description 6
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 230000006835 compression Effects 0.000 description 5
- 238000007906 compression Methods 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000005406 washing Methods 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000004575 stone Substances 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000007767 bonding agent Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- -1 polypropylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Auxiliary Devices For Machine Tools (AREA)
- Feeding Of Workpieces (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022-093843 | 2022-06-09 | ||
JP2022093843A JP2023180487A (ja) | 2022-06-09 | 2022-06-09 | 搬送ユニット及び加工装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202349478A true TW202349478A (zh) | 2023-12-16 |
Family
ID=89034012
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW112121035A TW202349478A (zh) | 2022-06-09 | 2023-06-06 | 搬送單元及加工裝置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2023180487A (ko) |
KR (1) | KR20230169847A (ko) |
CN (1) | CN117219536A (ko) |
TW (1) | TW202349478A (ko) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3349339B2 (ja) | 1996-04-24 | 2002-11-25 | シャープ株式会社 | 外観検査機能を備えたダイシング装置 |
-
2022
- 2022-06-09 JP JP2022093843A patent/JP2023180487A/ja active Pending
-
2023
- 2023-05-30 KR KR1020230069192A patent/KR20230169847A/ko unknown
- 2023-06-06 TW TW112121035A patent/TW202349478A/zh unknown
- 2023-06-08 CN CN202310675555.5A patent/CN117219536A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20230169847A (ko) | 2023-12-18 |
CN117219536A (zh) | 2023-12-12 |
JP2023180487A (ja) | 2023-12-21 |
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