TW202344721A - 用於清潔拉錠器設備之提拉纜線之清潔工具及方法 - Google Patents
用於清潔拉錠器設備之提拉纜線之清潔工具及方法 Download PDFInfo
- Publication number
- TW202344721A TW202344721A TW112115628A TW112115628A TW202344721A TW 202344721 A TW202344721 A TW 202344721A TW 112115628 A TW112115628 A TW 112115628A TW 112115628 A TW112115628 A TW 112115628A TW 202344721 A TW202344721 A TW 202344721A
- Authority
- TW
- Taiwan
- Prior art keywords
- cleaning tool
- cleaning
- cable
- puller
- chamber
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 107
- 238000000034 method Methods 0.000 title claims abstract description 23
- 239000012530 fluid Substances 0.000 claims abstract description 43
- 239000013078 crystal Substances 0.000 claims description 42
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 25
- 229910052710 silicon Inorganic materials 0.000 claims description 25
- 239000010703 silicon Substances 0.000 claims description 25
- 230000007246 mechanism Effects 0.000 claims description 13
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 6
- 238000004891 communication Methods 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000000155 melt Substances 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000002231 Czochralski process Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000013049 sediment Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000446313 Lamella Species 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
- B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
- B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
- B08B9/34—Arrangements of conduits or nozzles
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Mechanical Engineering (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202263335447P | 2022-04-27 | 2022-04-27 | |
| US63/335,447 | 2022-04-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202344721A true TW202344721A (zh) | 2023-11-16 |
Family
ID=86424780
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112115628A TW202344721A (zh) | 2022-04-27 | 2023-04-26 | 用於清潔拉錠器設備之提拉纜線之清潔工具及方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (5) | US12202017B2 (enExample) |
| EP (2) | EP4515025A1 (enExample) |
| JP (1) | JP2025514239A (enExample) |
| KR (1) | KR20250006212A (enExample) |
| CN (1) | CN119256124A (enExample) |
| TW (1) | TW202344721A (enExample) |
| WO (1) | WO2023211834A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12202017B2 (en) * | 2022-04-27 | 2025-01-21 | Globalwafers Co., Ltd. | Cleaning tools and methods for cleaning the pull cable of an ingot puller apparatus |
| WO2026024809A1 (en) * | 2024-07-25 | 2026-01-29 | Globalwafers Co., Ltd. | Ingot puller apparatus including in-situ cable cleaner |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2975036A (en) * | 1956-10-05 | 1961-03-14 | Motorola Inc | Crystal pulling apparatus |
| JP2001089295A (ja) * | 1999-09-16 | 2001-04-03 | Toshiba Ceramics Co Ltd | 単結晶引上げ装置 |
| JP3975649B2 (ja) * | 2000-06-06 | 2007-09-12 | 株式会社Ｓｕｍｃｏ | 単結晶引上装置 |
| JP4092859B2 (ja) * | 2000-06-06 | 2008-05-28 | 株式会社Ｓｕｍｃｏ | 単結晶引上装置のクリーニング装置 |
| JP5035144B2 (ja) | 2008-07-02 | 2012-09-26 | 株式会社Ｓｕｍｃｏ | 単結晶引き上げ用ワイヤの洗浄装置およびその洗浄方法 |
| JP5067403B2 (ja) * | 2009-08-05 | 2012-11-07 | 信越半導体株式会社 | 単結晶引き上げ装置 |
| WO2012131888A1 (ja) * | 2011-03-29 | 2012-10-04 | 株式会社Sumco | 半導体結晶製造装置用排気通路のクリーニング装置及びそのクリーニング方法 |
| JP2013147406A (ja) | 2012-01-23 | 2013-08-01 | Shin Etsu Handotai Co Ltd | シリコン単結晶の製造方法 |
| US10000863B2 (en) | 2015-02-03 | 2018-06-19 | Sumco Corporation | Method for cleaning single crystal pulling apparatus, cleaning tool for use therein, and method for manufacturing single crystal |
| JP6489004B2 (ja) * | 2015-12-14 | 2019-03-27 | 株式会社Sumco | クリーニング装置、クリーニング方法およびシリコン単結晶の製造方法 |
| WO2018142540A1 (ja) | 2017-02-02 | 2018-08-09 | 株式会社Sumco | 単結晶引上装置のクリーニング装置、クリーニング方法 |
| WO2018142541A1 (ja) | 2017-02-02 | 2018-08-09 | 株式会社Sumco | 単結晶引上装置のクリーニング装置 |
| CN209779039U (zh) | 2019-01-31 | 2019-12-13 | 常州市乐萌压力容器有限公司 | 一种单晶炉副室清洁器 |
| US12202017B2 (en) | 2022-04-27 | 2025-01-21 | Globalwafers Co., Ltd. | Cleaning tools and methods for cleaning the pull cable of an ingot puller apparatus |
-
2023
- 2023-04-14 US US18/300,850 patent/US12202017B2/en active Active
- 2023-04-24 EP EP23725017.0A patent/EP4515025A1/en active Pending
- 2023-04-24 WO PCT/US2023/019616 patent/WO2023211834A1/en not_active Ceased
- 2023-04-24 EP EP26162941.4A patent/EP4729670A2/en active Pending
- 2023-04-24 JP JP2024563437A patent/JP2025514239A/ja active Pending
- 2023-04-24 KR KR1020247038972A patent/KR20250006212A/ko active Pending
- 2023-04-24 CN CN202380042269.3A patent/CN119256124A/zh active Pending
- 2023-04-26 TW TW112115628A patent/TW202344721A/zh unknown
-
2024
- 2024-06-17 US US18/745,647 patent/US12502696B2/en active Active
- 2024-11-08 US US18/941,067 patent/US12491541B2/en active Active
- 2024-12-23 US US18/999,892 patent/US12491542B2/en active Active
-
2025
- 2025-11-12 US US19/386,537 patent/US20260070095A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US12491541B2 (en) | 2025-12-09 |
| US20260070095A1 (en) | 2026-03-12 |
| US20240335863A1 (en) | 2024-10-10 |
| US20230347388A1 (en) | 2023-11-02 |
| WO2023211834A1 (en) | 2023-11-02 |
| US12491542B2 (en) | 2025-12-09 |
| CN119256124A (zh) | 2025-01-03 |
| JP2025514239A (ja) | 2025-05-02 |
| US20250091100A1 (en) | 2025-03-20 |
| EP4515025A1 (en) | 2025-03-05 |
| US12502696B2 (en) | 2025-12-23 |
| US20250121415A1 (en) | 2025-04-17 |
| US12202017B2 (en) | 2025-01-21 |
| EP4729670A2 (en) | 2026-04-22 |
| KR20250006212A (ko) | 2025-01-10 |
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