TW202341240A - Substrate processing module and substrate processing apparatus, and substrate processing unit - Google Patents

Abstract

A substrate processing module (7) is equipped with: a housing (20) and a collection groove (47) accommodating two treatment grooves (32 and 34) that can be respectively provided with a substrate (4) aligned along a first direction; wherein the collection groove (47) is arranged in the housing (20); the collection groove (47) and the treatment grooves (32 and 34) are separated from the housing (20).

Description

Substrate processing module, substrate processing device and substrate processing unit

The invention relates to a substrate processing module, a substrate processing device and a substrate processing unit for processing a substrate.

As for the substrate processing device, there is a cleaning device that processes various substrates such as semiconductors (hereinafter also referred to as "substrates") with a predetermined chemical solution, and then washes them with a cleaning solution such as pure water to remove any residues attached to the surface of the substrate. foreign body. As for the cleaning device, there is a wet cleaning device that immerses the substrate in a chemical solution and a cleaning solution to perform cleaning processing.

Patent Document 1 discloses a substrate processing apparatus in which a plurality of pairs of chemical solution tanks and cleaning tanks are arranged along the longitudinal direction of the apparatus, and has a main conveyance mechanism and a auxiliary conveyance mechanism. The main transport mechanism moves a plurality of substrates from one end side of the device to the other end side in the longitudinal direction. The auxiliary transport mechanism moves a plurality of substrates in the longitudinal direction and the up-down direction within the range of a pair of chemical solution tanks and cleaning tanks.

[Prior technical literature]

[Patent Document]

Patent document 1: Japanese Patent Publication No. 2018-56158

In Patent Document 1, since a plurality of pairs of chemical liquid tanks and cleaning tanks are adjacent to each other along the longitudinal direction of the device, other chemical liquid tanks and cleaning tanks at adjacent positions may be affected by certain chemicals accumulated in a certain chemical liquid tank. A situation of gaseous environmental pollution of medicinal liquid (that is, pollution caused by medicinal liquid). In addition, since the main conveying mechanism and the auxiliary conveying mechanism face the chemical solution tank and the washing tank, contamination due to particulates occurs. In addition, since multiple pairs of chemical solution tanks and cleaning tanks are arranged along the longitudinal direction, the length of the device becomes longer. In addition, since the plurality of pairs of chemical solution tanks and cleaning tanks are fixedly installed in the device, it is impossible to Flexible response to changing needs of the handler may also cause difficulties during maintenance.

Therefore, it is highly desired to achieve a structure that can suppress contamination caused by chemicals, particles, etc., reduce the size of the device, respond flexibly and with high scalability, and improve maintainability.

In this regard, an object of the present invention is to provide a substrate processing module, a substrate processing device, and a substrate processing unit that can improve maintainability.

In order to solve the above problems, a substrate processing module according to one aspect of the present invention includes: a housing; two processing tanks arranged along a first direction in the housing, and capable of disposing substrates respectively; and a leveling mechanism. It is used to level the aforementioned treatment tank; wherein, the aforementioned leveling mechanism The system has: a contact portion provided in the processing tank; a support portion that is in contact with the contact portion and supports the contact portion; and at least two height changing portions for changing the height of the processing tank.

Furthermore, a substrate processing apparatus according to one aspect of the present invention includes the above-mentioned substrate processing module and the above-mentioned other module.

In addition, a substrate processing unit according to one aspect of the present invention is provided with: two processing tanks in which substrates can be respectively arranged; a collection tank that accommodates the processing tanks in a state of being arranged along the first direction; and a leveling mechanism that uses To perform leveling of the treatment tank; the leveling mechanism has: a contact portion provided in the treatment tank, a support portion in contact with the contact portion and supporting the contact portion, and at least one for changing the height of the treatment tank. Two height changing sections.

According to the present invention, maintainability can be improved.

1:Substrate processing device

2:Vehicle

3: Flange part

4,4A,4B,4C:Substrate

5: Import the module

6: Drying module

7,7A,7B,7C,7a,7b,7c,7d: Chemical module (substrate processing module)

8:Move out the module

9: Second transport mechanism

11: First transportation department (transportation department)

12: First actuator (actuator)

13: Upper and lower conveying section (conveying section)

14: Up and down actuator (actuator)

16: arm

18: Bracket

18A: Upper section

18B: Lower section

20: Shell

22: Loading platform

24:Fan filter unit

26:Moving in department

27:Moving out department

29: Common exhaust pipe

31:Drying chamber

32: Chemical liquid tank (processing tank, second tank)

32A, 32B, 32C: Second slot

32a,32b: Corner

34: Washing tank (processing tank, first tank)

34A, 34B, 34C: first slot

36: Side exhaust pipe (exhaust pipe)

36a: Side exhaust port (exhaust port)

37:Side wall

37a: Gap

38:Rear wall

38a:Open your mouth

39: Rear exhaust pipe (exhaust pipe)

39a: Rear exhaust port (exhaust port)

40:Second Transportation and Containment Department

41: Second actuator (actuator)

41A: Actuator body part

41B:Track

42: Rotary actuator (actuator)

43: Rotating arm

44: Fixture Department

45:Substrate processing unit

46: Connecting rod part

47: Collection tank

47A, 47B: Inner wall surface

48: Second transport department (transportation department)

49:Opening part

50:Bottom wall

51:Open your mouth

51C: Bottom

52: Movable wall

54:Panel

56,57:Piping

58:front

60:Open your mouth

62:Opening part

64:Panel

66,68: Groove opening

70,72:Opening part

74,76:Panel

78:Back

82:Exhaust pipe

84:Exhaust port

85:Connect piping

86:Connector

87:Itabu

88:Orbit

88A, 88B, 88C: Track

90: Leveling mechanism (second leveling mechanism)

91: Leveling agency (first leveling agency)

92,92A,92B,95,95A,95B:Height change part

93,96: Contact part (ball part)

94,97: Support part (ball bearing part)

100: Bearing platform

102:Adjustment screw

103:Head

104: Guidance Department

106:Through hole

107:Installation Department

108: Spherical surface

110: Spherical surface

112:Contact part

114,116: Rod-shaped part

210:Polyhedral shape

303,306:Contact Department

304,307:Support Department

393,396:Contact Department

432:Medicine tank

434: Washing tank

490: Leveling mechanism

492, 492A, 492B: Height change department

493:Contact Department

494:Support Department

500,501:Height change department

A: Processing space

B1: First drive space

B2: Second drive space

H1: middle position

H2: ascending position

H3: Descending position

L1,L2,M1,M2,M3,M4,M5,M6,M7,M8,M9,M10,M11,M12,M13,M14,R,Z1: Arrow

D1, D2: radius of curvature

N1: Front side

N2: Back side

S1: The first containment space

S2: Second Containment Space

X1,X2: center line

FIG. 1 is a perspective view illustrating a substrate processing apparatus according to an embodiment.

FIG. 2 is a perspective view illustrating components of the substrate processing apparatus shown in FIG. 1 .

FIG. 3 is a perspective view illustrating a chemical module in the substrate processing apparatus shown in FIG. 1 .

FIG. 4 is a perspective view illustrating a second transport mechanism in the substrate processing apparatus shown in FIG. 1 .

FIG. 5 is a perspective view illustrating the main parts of the chemical module shown in FIG. 3 .

FIG. 6 is a perspective view illustrating the unloading module in the substrate processing apparatus shown in FIG. 1 .

FIG. 7 is a perspective view illustrating a loading module in the substrate processing apparatus shown in FIG. 1 .

FIG. 8 is a diagram illustrating the operation of the vertical conveyance unit in the chemical module shown in FIG. 3 .

FIG. 9 is a diagram illustrating the operation of the first transport unit in the chemical module shown in FIG. 3 .

FIG. 10 is a diagram illustrating a carrier holding a substrate.

FIG. 11 is a perspective view illustrating the drying module in the substrate processing apparatus shown in FIG. 1 .

FIG. 12 is a schematic plan view of the second transport mechanism.

Figure 13 is a schematic perspective view showing the chemical module.

FIG. 14 is a diagram illustrating the operation of the first transport unit in the chemical module.

FIG. 15 is a schematic plan view showing a processing space of a modified example.

FIG. 16A is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16B is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16C is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16D is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16E is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16F is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16G is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16H is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16I is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16J is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16K is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 16L is a schematic diagram for explaining an example of the operation of the substrate processing apparatus.

FIG. 17 is a schematic plan view showing an operation example when processing a batch of substrates.

FIG. 18 is a schematic plan view showing an operation example when processing multiple lots of substrates.

FIG. 19 is a schematic plan view showing a modified example of the first groove and the second groove.

FIG. 20 is a perspective view of a plurality of chemical modules viewed from the front side of the housing.

FIG. 21 is a perspective view of a plurality of chemical modules when viewed from the back side of the casing (the collecting tank is drawn out toward the front side).

FIG. 22 is a perspective view of a plurality of chemical modules when viewed from the back side of the casing (the collecting tank is drawn out toward the rear view side).

FIG. 23 is a schematic view of the substrate processing unit including the leveling mechanism when viewed from the side.

FIG. 24A is a schematic view of the chemical solution tank viewed from the front.

FIG. 24B is a schematic view of the washing tank when viewed from the front.

Fig. 25 is a schematic enlarged view of the height changing portion when viewed from the side.

Fig. 26 is a schematic enlarged view showing a longitudinal section of the ball portion and the ball receiving portion.

Fig. 27 is a schematic plan view of the collecting tank (a state in which a chemical tank and a washing tank are arranged).

Fig. 28 is a schematic plan view of the collecting tank (in a state where the chemical tank and the washing tank are not arranged).

FIG. 29 is a schematic enlarged view showing a vertical cross-section of a ball portion and a ball receiving portion according to a modified example.

FIG. 30 is a schematic view of a substrate processing unit including a leveling mechanism according to a modified example when viewed from the side.

31 is a schematic view of a substrate processing unit including a leveling mechanism according to a modified example when viewed from the side.

32A is a schematic view of a substrate processing unit including a leveling mechanism according to a modified example when viewed from the side.

FIG. 32B is a schematic view of a substrate processing unit including a leveling mechanism according to a modified example when viewed from the front.

Fig. 33 is a schematic plan view of a collection tank according to a modified example.

Hereinafter, an embodiment of the substrate processing apparatus 1 of the present invention will be described with reference to the drawings.

Here, in this specification, the so-called "module" refers to a standardized component that is detachable (interchangeable) and that is operated as an integrated unit during use. In addition, the so-called “first direction” refers to the arrangement direction of a pair of chemical solution tanks and cleaning tanks, that is, the short-side direction (for example, the front-rear direction, the longitudinal direction) of the substrate processing apparatus 1 . In addition, the so-called "second direction" refers to the direction that intersects the first direction and the up-down direction, and is the direction in which a plurality of modules are connected, that is, the long-side direction (for example, the left-right direction, the transverse direction) of the substrate processing apparatus 1 . The first direction can also be called TD (Transverse Direction, transverse direction), and the second direction can also be called MD (Machine Direction, machine direction) direction. In the figure, the "first direction" is shown as the Y-axis direction, the "second direction" is shown as the X-axis direction, and the "up-and-down direction" is shown as the Z-axis direction. The first direction, the second direction and the up-down direction cross each other (eg, are orthogonal).

[Implementation type]

Referring to FIGS. 1 to 10 , a substrate processing apparatus 1 according to an embodiment will be described. FIG. 1 is a perspective view illustrating a substrate processing apparatus 1 according to an embodiment. FIG. 2 is a perspective view illustrating the components of the substrate processing apparatus 1 shown in FIG. 1 . FIG. 3 is a perspective view illustrating the chemical module 7 in the substrate processing apparatus 1 shown in FIG. 1 . FIG. 4 is a perspective view illustrating the second transport mechanism 9 in the substrate processing apparatus 1 shown in FIG. 1 . FIG. 5 is a perspective view illustrating the main part of the chemical module 7 shown in FIG. 3 . FIG. 6 is a perspective view illustrating the unloading module 8 in the substrate processing apparatus 1 shown in FIG. 1 . FIG. 7 is a perspective view illustrating the loading module 5 in the substrate processing apparatus 1 shown in FIG. 1 . FIG. 8 is a diagram illustrating the operation of the vertical conveyance unit 13 in the chemical module 7 shown in FIG. 3 . Figure 9 illustrates what is shown in Figure 3 The operation diagram of the first conveying part 11 in the chemical module 7. FIG. 10 is a diagram illustrating the carrier 2 holding the substrate 4 . FIG. 11 is a perspective view illustrating the drying module 6 in the substrate processing apparatus 1 shown in FIG. 1 .

The substrate processing apparatus 1 is provided with at least one module for performing various processes on the plurality of substrates 4 held on the carrier 2 . Specifically, the substrate 4 is, for example, a semiconductor substrate, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, an optical disc substrate, a Micro Electro Mechanical Systems (MEMS) sensor substrate, a solar cell panel, etc. The module has a standardized housing 20, and the module is configured to be attachable and detachable along the second direction (X-axis direction, that is, the long side direction of the substrate processing apparatus 1, also referred to as the "second direction" below) exchange). The upper part of the module is equipped with a fan filter unit 24. The fan filter unit 24 is equipped with a fan and a filter, and the fan and filter are used to introduce the air in the clean room and send it to the module. The fan filter unit 24 forms a downward airflow of clean air in the processing space within the module. Instead of providing the fan filter unit 24, other structures for introducing clean air into the clean room may be provided.

As shown in FIGS. 1 and 2 , the substrate processing apparatus 1 includes, for example, a loading module 5 , a drying module 6 , a chemical module 7 (substrate processing module), an unloading module 8 , and a second transport mechanism 9 . The loading module 5, the chemical module 7, the drying module 6, and the carrying module 8 are arranged adjacent to each other along the second direction. The loading module 5, the chemical module 7, the drying module 6, and the carrying module 8 are configured to be removably connected in the second direction. This makes it possible to flexibly respond to changes in processing procedures and improve scalability.

The second conveying mechanism 9 extends along the second direction, and conveys the carrier 2 holding the plurality of substrates 4 shown in FIG. 10 along the second direction. The second conveying mechanism 9 is arranged in the loading module 5, The upper part on the rear side of the chemical module 7 , the drying module 6 , and the unloading module 8 in the first direction (the Y-axis direction, the short side direction of the substrate processing apparatus 1 , also referred to as the “first direction” below).

The substrate processing apparatus 1 has a control unit (not shown). The control unit performs, for example, operation control and data calculation of each element of the substrate processing apparatus 1 . The control unit includes, for example, a CPU (Central Processing Unit), a RAM (Random Access Memory), and a ROM (Read Only Memory). The CPU executes control (for example, control of the transportation operation of the carrier 2 by the first transportation part 11, the up-and-down transportation part 13, and the second transportation part 48) based on the program stored in the ROM.

In the loading module 5, the substrate 4 before processing is loaded into the apparatus with the carrier 2 as a unit. In the drying module 6 , the substrate 4 is vapor-dried using, for example, IPA (isopropyl alcohol), with the carrier 2 as a unit. In the chemical module 7 , the cleaning process of the substrate 4 is performed with the carrier 2 as a unit. In the unloading module 8, the cleaned substrate 4 is carried out of the device with the carrier 2 as a unit.

The load-in module 5 is also called a loader, and is disposed on the upstream side of the substrate processing apparatus 1 in the second direction. As shown in FIG. 7 , the load-in module 5 has a load-in portion 26 configured to be openable and closable on the side surface of the housing 20 on the upstream side in the second direction. The carrier 2 is loaded into the inside of the loading module 5 via the loading part 26 . The carrier 2 loaded into the loading module 5 is placed on the mounting table 22 . Inside the loading module 5 , the carrier 2 is transported in the first direction by the arm 16 of the first transport unit 11 , and the carrier 2 is transported in the vertical direction by the arm 16 of the vertical transport unit 13 . . The first actuator 12 of the first conveyance unit 11 is arranged laterally and lower than the mounting surface of the mounting table 22 . The vertical actuator 14 of the vertical conveyance part 13 is also arranged laterally lower than the mounting surface of the mounting table 22 . That is, due to the downward airflow from the fan filter unit 24 and the arm 16 The arm length of the carrier 2 placed on the mounting table 22 is isolated from the influence of the first actuator 12 and the up and down actuator 14 . Thereby, contamination of the carrier 2 carried into the module 5 due to particles generated by the first actuator 12 and the up-and-down actuator 14 can be suppressed.

The unloading module 8 is also called an unloading unit, and is arranged on the downstream side of the substrate processing apparatus 1 in the second direction. As shown in FIG. 6 , the carrier 2 carried into the unloading module 8 is placed on the mounting table 22 . Inside the unloading module 8 , the carrier 2 is transported in the first direction by the arm 16 of the first transport unit 11 , and the carrier 2 is transported in the vertical direction by the arm 16 of the vertical transport unit 13 . . The first actuator 12 of the first conveyance unit 11 is arranged laterally and lower than the mounting surface of the mounting table 22 . The vertical actuator 14 of the vertical conveyance part 13 is also arranged laterally lower than the mounting surface of the mounting table 22 . That is, due to the downward airflow from the fan filter unit 24 and the arm length of the arm 16 , the carrier 2 placed on the mounting table 22 is isolated from the influence of the first actuator 12 and the up and down actuator 14 . This can prevent the carrier 2 in the unloading module 8 from being contaminated by particles generated by the first actuator 12 and the upper and lower actuators 14 . The unloading module 8 has an unloading portion 27 configured to be openable and closable on the side surface of the housing 20 on the downstream side in the second direction. The carrier 2 is carried out to the outside of the carry-out module 8 via the carry-out part 27 , that is, out of the substrate processing apparatus 1 .

In addition, in the above aspect, the carrier 2 is transported in one direction from the loading module 5 to the carrying out module 8 along the second direction, but other aspects are also possible. For example, the substrate processing apparatus 1 may have only either the loading module 5 or the carrying module 8, and the loading module 5 may have both loading and unloading functions, or the carrying module 8 may have both loading and unloading functions. Function. At this time, the carrier 2 is conveyed in both directions, one direction and the other, along the second direction (that is, reciprocated along the second direction).

The substrate processing device 1 has at least one drying module 6 . As shown in FIG. 1 , the drying module 6 is provided between the chemical module 7 and the unloading module 8 , for example.

As shown in FIG. 11 , for example, the drying module 6 has a first conveying part 11 for conveying the carrier 2 in the first direction and an upper and lower portion for conveying the carrier 2 in the up and down direction, like the other modules 5 , 7 , and 8 . Transport Department 13. The first conveying part 11 has a first actuator 12 , and the up-and-down conveying part 13 has an up-and-down actuator 14 .

The drying module 6 has a drying cavity 31 . The drying chamber 31 is, for example, disposed on the front side in the first direction of the drying module 6 . After various chemical liquid treatments such as chemical cleaning, etching, and resist stripping are performed by the chemical module 7 , a drying process is performed to dry the substrate 4 in the drying chamber 31 . In the drying module 6 , the carrier 2 holding the substrate 4 is transported in the vertical direction with respect to the drying chamber 31 by the arm 16 via the vertical transport part 13 . The first actuator 12 and the upper and lower actuators 14 are located at the lower side of the drying chamber 31 and are arranged separately from the drying chamber 31 . Therefore, the drying chamber 31 is isolated from the influence of the first actuator 12 and the upper and lower actuators 14 .

A commonly known drying method can be used for the above-mentioned drying treatment. Specifically, for example, a drying method called IMD (IPA Mist Dryer) utilizing the Marangoni effect can be used. In this drying method, the carrier 2 holding the substrate 4 is immersed in a pure water tank provided in the drying chamber 31, and the fine particle mist of IPA or vaporized IPA is continuously supplied to the water surface, and the substrate is When the substrate 4 is raised or lowered or the water surface is raised or lowered, the difference in surface tension generated on the surface of the substrate 4 passing through the water surface is used for drying.

In addition, as another drying method, for example, a drying method called Spin Dryer that performs drying by centrifugal force can be used. This drying method is to hold the carrier 2 of the substrate 4 A rotor is installed in the drying chamber 31, and after the carrier 2 and the substrate 4 are fixed by a retainer or other holding device, the centrifugal force generated by the rotation of the rotor is used for drying.

In addition, as another drying method, for example, a drying method called Vapor Dryer that performs drying by steam cleaning can be used. This drying method is to fill the drying chamber 31 with saturated vapor that is heated from a solvent with a small latent heat of evaporation (for example, IPA), and to place the carrier 2 of the substrate 4 whose temperature is lower than its vapor temperature in the drying chamber 31 , by condensing the liquefied IPA on the surface of the substrate 4 to clean the surfaces of the carrier 2 and the substrate 4, and when the temperature of the carrier 2 and the substrate 4 becomes the same temperature as the IPA vapor, condense on the carrier 2 and the substrate The condensation and liquefaction of the IPA on the surface of 4 stops, and the carrier 2 and the substrate 4 are dried.

Furthermore, for other drying methods, N ₂ blow drying using N ₂ can also be used. Regardless of the drying method, the drying chamber 31 is isolated so as not to be affected by the upper and lower actuators 14 , the first actuator 12 , etc. of the carrier 2 that transports and holds the substrate 4 . Thereby, contamination in the drying module 6 caused by particles generated by the upper and lower actuators 14, the first actuator 12, etc. can be suppressed. In addition, the first actuator 12 and the up-and-down actuator 14 may be arranged separately from the drying chamber 31 at a lower portion of the drying chamber 31 on the rear side in the first direction. In addition, if only the vertical transportation is performed, the drying module 6 does not need to include the first transportation part 11 .

Chemistry Module 7 series has at least one module. As shown in FIGS. 1 and 2 , the chemical module 7 includes, for example, a first chemical module 7a, a second chemical module 7b, a third chemical module 7c, and a fourth chemical module 7d. In the chemical module 7, APM (ammonium hydroxide-hydrogen peroxide mixture, ammonia water, hydrogen peroxide mixture) cleaning, SPM (sulfuric acid-hydrogen peroxide mixture, sulfuric acid, hydrogen peroxide water mixture) cleaning, HPM (hydrochloric water mixture) are performed. acid-hydrogen peroxide mixture, hydrochloric acid, hydrogen peroxide mixture), Various chemical liquid cleaning such as DHF (dilute hydrofluoric acid) cleaning, etching, resist stripping and other chemical liquid treatments. These chemical liquid treatments can be arbitrarily combined depending on the type of chemical liquid treatment to be performed on the substrate 4 . Each of the chemical modules 7a, 7b, 7c, and 7d is configured to be detachably connected in the second direction. This makes it possible to flexibly respond to changes in processing procedures and improve scalability.

As shown in FIGS. 3 , 5 and 9 , the chemical module 7 has a chemical solution tank 32 (second tank) for cleaning the chemical solution and a washing tank 34 (first tank) for cleaning (cleaning) with pure water. groove). The chemical solution tank 32 is arranged on the rear side in the first direction, and the cleaning tank 34 is arranged on the front side in the first direction. That is, the chemical solution tank 32 and the cleaning tank 34 are arranged along the first direction. Thereby, the width of the chemical module 7 in the second direction can be narrowed, and the substrate processing apparatus 1 can be miniaturized. Here, the chemical solution tank 32 may be arranged on the front side in the first direction, and the cleaning tank 34 may be arranged on the rear side in the first direction. In addition, since the common exhaust duct 29 for discharging the chemical solution vapor generated in the chemical solution tank 32 can be arranged on the rear side in the first direction, maintenance of the substrate processing apparatus 1 becomes easy. The chemical liquid tank 32 is used to store the various chemical liquids mentioned above. The washing tank 34 is used to store pure water. The chemical solution tank 32 has, for example, an inner tank for immersing the carrier 2 in the chemical solution and an outer tank for recovering the chemical solution that overflows from the upper end of the inner tank. The opening of the chemical solution tank 32 is closed by a lid at a timing independent of the transport operation of the carrier 2 .

Two side walls 37, 37 are provided on the sides of the chemical liquid tank 32 in the second direction. That is, the sides of the chemical solution tank 32 in the second direction are separated by the side walls 37 . Thereby, the contamination caused by the gaseous environment of the chemical solution accumulated in the chemical solution tank 32 of the chemical module 7 located nearby can be suppressed. Furthermore, a rear wall 38 is provided behind the chemical solution tank 32 in the first direction. When viewed from the up and down direction, the chemical solution tank 32 is surrounded by two side walls 37 and 37 and a rear wall 38 to form a U shape.

For example, two side exhaust pipes 36 and 36 each having a side exhaust port 36a may be provided on the upper side of the chemical tank 32 . The two side exhaust ports 36a, 36a are slightly lower than the opening of the chemical tank 32 but located at approximately the same height. The rear wall 38 is provided with a rear exhaust port 39a of a rear exhaust duct 39 (shown in FIG. 9). The two side exhaust ducts 36 and 36 and the rear exhaust duct 39 are branched from the common exhaust duct 29 and connected to the common exhaust duct 29 . The rear exhaust port 39a is located above the opening of the chemical tank 32 . In this way, side exhaust ports 36 a and rear exhaust ports 39 a for discharging the chemical vapor evaporated from the chemical solution tank 32 are provided around the chemical solution tank 32 . Thereby, the chemical solution vapor generated in the chemical solution tank 32 can be suppressed from diffusing into the processing space in the chemical module 7 , and contamination of the substrate 4 to be transported in the processing space in the chemical module 7 can be suppressed.

Each chemical module 7 has a first conveyance part 11 that conveys the carrier 2 in the first direction, and an up-and-down conveyance part 13 that conveys the carrier 2 in the up-and-down direction. The vertical conveyance part 13 has a vertical actuator 14. The carrier 2 is supported by a bracket 18 provided on one end side of the inverted U-shaped arm 16 . In addition, the upper portion of the carrier 2 has a flange portion 3, and as will be described later, the carrier 2 can freely clamp the flange portion 3 by the clamp portion 44 of the second conveyance portion 48. In addition, the flange portion 3 of the carrier 2 may be supported by the bracket 18 . In addition, the arm 16 may have a D-shape.

The other end of the arm 16 is mounted on the upper and lower actuators 14 . The vertical actuator 14 is an electric linear actuator and has, for example, a screw shaft that moves the arm 16, a motor that rotates the screw shaft, a power source, and a control unit that controls the motor. With the carrier 2 positioned directly above the chemical solution tank 32 or the cleaning tank 34, when the arm 16 is moved downward by the up and down actuator 14, the carrier 2 holding the plurality of substrates 4 will be immersed in the chemical solution. The chemical solution in the tank 32 or the cleaning fluid in the cleaning tank 34. When the carrier 2 is immersed in the chemical solution or cleaning fluid, the arm 16 is moved upward by the up and down actuator 14 When moving, the carrier 2 holding a plurality of substrates 4 will be lifted up from the chemical solution or cleaning solution. Therefore, when the arm 16 is moved in the up and down direction by the up and down actuator 14 in a state where the carrier 2 is located directly above the chemical tank 32 or the cleaning tank 34, the carrier 2 holding the plurality of substrates 4 faces each other. The chemical liquid in the chemical liquid tank 32 or the cleaning liquid in the cleaning tank 34 is lifted up or immersed in the chemical liquid in the chemical liquid tank 32 or the cleaning liquid in the cleaning tank 34 .

The first conveyance part 11 has a first actuator 12 . The upper and lower actuators 14 are installed on the first actuator 12 . The first actuator 12 is an electric linear actuator and has, for example, a screw shaft that moves the vertical actuator 14 , a motor that rotates the screw shaft, a power source, and a control unit that controls the motor. In a state where the arm 16 has moved upward, when the first actuator 12 moves the arm 16 toward the rear side in the first direction, the carrier 2 holding the plurality of substrates 4 is transported to the front of the chemical solution tank 32 above. With the arm 16 positioned at the pulled-up position, when the first actuator 12 moves the arm 16 toward the front side in the first direction, the carrier 2 holding the plurality of substrates 4 is transported to the cleaning tank 34 Directly above. Therefore, when the arm 16 is positioned in the pulled-up position and the first actuator 12 moves the arm 16 in the first direction, the carrier 2 holding the plurality of substrates 4 is transported to the chemical solution tank 32 Between directly above and directly above the washing tank 34.

The first actuator 12 and the up-and-down actuator 14 are arranged on the outside of the opening of the chemical tank 32 and on the lower side of the side exhaust duct 36 . That is, by the downward airflow from the fan filter unit 24 and the exhaust from the side exhaust duct 36 , the chemical tank 32 and the washing tank 34 are isolated from the first actuator 12 and the upper and lower actuators 14 influence. Thereby, a larger separation distance can be ensured between the first actuator 12 and the upper and lower actuators 14 and the opening of the liquid tank 32 , thereby suppressing the generation of the first actuator 12 and the upper and lower actuators 14 . caused by particles Learn about pollution in Module 7. Alternatively, the two side exhaust ducts 36 and 36 may not be provided and only the rear exhaust duct 39 may be used for exhaust.

Next, the second conveyance mechanism 9 will be described with reference to FIGS. 1 , 2 , 4 , 8 and 9 .

As shown in FIG. 1 , the second transport mechanism 9 is disposed above the rear side of the import module 5 , the chemical module 7 , the drying module 6 , and the unload module 8 in the first direction. As shown in FIG. 4 , for example, the second conveyance mechanism 9 has a structure in which a plurality of second conveyance accommodating parts 40 and second actuators 41 are connected in the second direction. The second transport accommodating part 40 constitutes, for example, a part of each housing 20 of the loading module 5 , the chemical module 7 , the drying module 6 , and the unloading module 8 . That is, the second transportation and accommodating part 40 is configured integrally with the casing 20 . In addition, the second transportation and accommodating part 40 may be configured as an independent box-shaped member. In FIGS. 2 and 4 , in order to facilitate understanding of the structure of the second transportation and accommodating part 40 , the second transportation and accommodating part 40 is shown in a state of being separated from the housing 20 . However, the second transportation and accommodating part 40 may also constitute a shell. It may be an integrally formed part of the body 20 or constitute an independent component. The second transport accommodating part 40 and the second actuator 41 are configured to be detachably connected in the second direction.

As shown in FIG. 4 , the second conveyance mechanism 9 has a plurality of second conveyance receiving parts 40 and at least one second conveyance part 48 . The number of second conveyance parts 48 provided in the second conveyance mechanism 9 can be appropriately increased or decreased in accordance with the number of second conveyance accommodating parts 40 to be connected. The second conveying part 48 has a second actuator 41 . The second actuator 41 is accommodated in the second transport accommodating part 40 . The first actuator 12 and the up and down actuator 14 are accommodated in the chemical module 7 , and the second actuator 41 is accommodated in the second transport accommodation part 40 . Thereby, since the first actuator 12 , the up-and-down actuator 14 and the second actuator 41 are housed separately, contamination in the chemical module 7 can be suppressed.

The second actuator 41 is, for example, an electric linear actuator. The second actuator 41 is, for example, a combination of a rack and a pinion, and has a flat guide portion of the rack in which teeth are engraved, a circular gear called a pinion, a motor for rotating the circular gear, and a power supply. , and a control unit that controls the motor. The flat guide portion has a plurality of guide pieces, and the plurality of guide pieces can be configured to be detachably connected in the second direction.

As shown in FIG. 9 , the second conveyance part 48 has a rotation actuator 42 connected to the second actuator 41 via a link part 46 . The rotation actuator 42 is, for example, an electric rotation actuator, and includes a motor for rotating the two rotation arms 43 and 43, a power source, and a control unit for controlling the motor. The rotary actuator 42 may also be an actuator driven by oil pressure or air pressure. The second actuator 41 and the chemical tank 32 are separated by the rear wall 38 . Thereby, contamination in the chemical module 7 caused by the second actuator 41 can be suppressed.

The swing arm 43 extends in the first direction through the opening 38 a formed in the rear wall 38 . The swing arm 43 is movable in the second direction through the gap 37 a formed in the side wall 37 . A clamp portion 44 is provided on the front side of the swing arm portion 43 . The clamp portion 44 is located directly above the washing tank 34 . Thereby, contamination in the chemical module 7 caused by the carrier 2 clamped by the clamp portion 44 being transported on different types of chemical solution tanks 32 can be suppressed.

When viewed from the side (that is, viewed from the second direction), the clamp portion 44 has a U-shape. The two clamp parts 44 and 44 clamp the flange part 3 of the carrier 2 from both sides due to the rotation of the swing arm part 43, thereby clamping the flange part 3 of the carrier 2. The two clamp parts 44 and 44 are rotated in directions away from each other to release the clamping of the flange part 3 of the carrier 2 . Therefore, the two clamp parts 44 and 44 can clamp the flange part 3 of the carrier 2 .

The second actuator 41 is accommodated in the second transport accommodating part 40, so the chemical tank 32 and the washing tank 34 are isolated from the influence of the second actuator 41. That is, the second actuator 41 is isolated from the chemical solution tank 32 and the cleaning tank 34 . Thereby, contamination caused by particles generated by the second actuator 41 can be suppressed.

The specific embodiments, numerical values, etc. of the present invention have been described above. However, the present invention is not limited to the above-described embodiments and can be implemented with various changes within the scope of the present invention.

For example, in the above-mentioned embodiment, the first actuator 12 and the up-and-down actuator 14 are disposed at the lower part of the side (the lower part in the second direction), but they may also be disposed on the first direction side as needed.

The number and combination of modules of the substrate processing apparatus 1 can be appropriately designed according to needs. For example, the chemical module 7 and the drying module 6 can be arranged alternately.

The present invention and its embodiments are summarized as follows.

A substrate processing apparatus 1 according to one aspect of the present invention is provided with a chemical module 7. The chemical module 7 has a chemical solution tank 32 and a cleaning tank 34. The chemical solution tank 32 is held on a carrier 2 for chemical solution processing. The cleaning tank 34 cleans the substrate 4 held on the carrier 2;

The aforementioned chemical module 7 series has:

The first transport part 11 transports the carrier 2 along the first direction in which the chemical solution tank 32 and the washing tank 34 are arranged;

The up-and-down conveyance part 13 conveys the aforementioned carrier 2 in the up-and-down direction intersecting the aforementioned first direction; and

The second transport part 48 transports the carrier 2 in a second direction intersecting the first direction and the up-down direction;

The first conveying part 11, the second conveying part 48 and the upper and lower conveying parts 13 are driven by the first actuator 12, the second actuator 41 and the up and down actuator 14 respectively;

The first actuator 12 , the second actuator 41 and the up-down actuator 14 are isolated from the chemical solution tank 32 and the cleaning tank 34 .

According to the above-mentioned structure, by the conveyance in the first direction by the first conveyance part 11 and the conveyance in the second direction by the second conveyance part 48, the other chemical solution tanks 32 and the washing tank 34 in the adjacent positions are isolated and become inseparable. It is affected by the chemical solution attached to the carrier 2, so contamination caused by the chemical solution can be suppressed. In addition, the actuators used to drive the conveying parts 11, 48, and 13 of the conveying carrier 2 are isolated so as not to be affected by the chemical tank 32 and the cleaning tank 34, so the carriers in the chemical module 7 can be restrained. 2. Pollution caused by particulates. In addition, since the chemical tank 32 and the cleaning tank 34 are arranged along the first direction, the width of the chemical module 7 in the second direction is narrowed, and the substrate processing apparatus 1 can be miniaturized. Furthermore, since the apparatus for processing each step is modularized, other modules 5, 6, and 8 can be connected to the chemical module 7 to respond flexibly to changing requirements.

In addition, in the substrate processing apparatus 1 of one embodiment,

The chemical module 7 is detachably connected in the second direction.

According to the above implementation type, it is possible to flexibly respond to changing requirements of the processing program, thereby improving scalability.

In addition, in the substrate processing apparatus 1 of one embodiment,

The first actuator 12 and the up-and-down actuator 14 are arranged below each opening of the chemical solution tank 32 and the washing tank 34 .

According to the above embodiment, contamination in the chemical module 7 caused by particles generated by the first actuator 12 and the upper and lower actuators 14 can be suppressed.

In addition, the substrate processing apparatus 1 of one embodiment further includes a loading module 5 , a drying module 6 , or an unloading module 8 . The loading module 5 is used to carry in the aforementioned carrier 2 holding the aforementioned substrate 4; the drying module 6 is used to dry the aforementioned substrate 4 held on the aforementioned carrier 2; and the unloading module 8 is used to carry out the holding of the aforementioned substrate 4. The aforementioned carrier 2 of the aforementioned substrate 4 is carried out;

The said loading module 5, the said drying module 6, and the said carrying out module 8 are comprised so that it can be connected removably in the said 2nd direction.

According to the above implementation type, it is possible to flexibly respond to changing requirements of the processing program, thereby improving scalability.

In addition, in the substrate processing apparatus 1 of one embodiment,

The second actuator 41 and the chemical tank 32 are separated by a rear wall 38 .

According to the above embodiment, contamination in the chemical module 7 caused by particles generated by the second actuator 41 can be suppressed.

In addition, in the substrate processing apparatus 1 of one embodiment,

The sides of the chemical solution tank 32 in the second direction are separated by side walls 37 .

According to the above embodiment, contamination caused by the gaseous environment of the chemical solution accumulated in the chemical solution tank 32 of the adjacent chemical module 7 can be suppressed.

In addition, in the substrate processing apparatus 1 of one embodiment,

The chemical solution tank 32 is arranged on the rear side in the first direction, and the cleaning tank 34 is arranged on the front side in the first direction.

According to the above-described embodiment, the exhaust duct 39 for discharging the chemical solution vapor generated by the chemical solution tank 32 can be disposed on the rear side in the first direction, so that the maintenance of the substrate processing apparatus 1 becomes easy.

In addition, the above-mentioned embodiment describes the case where a plurality of substrates 4 are held by the carrier 2. However, the present invention is not limited to this case, and the carrier 2 may not be used. For example, the plurality of substrates 4 may be directly held by the clamp part 44, the bracket 18, or the like.

Here, the second actuator 41 shown in FIG. 4 will be described using FIG. 12 . FIG. 12 is a schematic plan view of the second conveyance mechanism 9 . In FIG. 12 , the second transport and accommodating unit 40 is not shown.

As shown in FIG. 12 , the second actuator 41 includes an actuator body 41A and a plurality of rails 41B. The actuator body portion 41A is a driving portion that moves in the left-right direction (second direction) along the rail 41B. The rail 41B supports the actuator body part 41A as a movable member and is provided in each module. The plurality of modules are connected because the plurality of rails 41B are arranged along the second direction to form a continuous traveling path.

When the second actuator 41 is a combination of a rack and a pinion, the actuator body part 41A has a driving part such as a motor, a reduction part, and a pinion, and the track 41B is a rack.

As shown in FIG. 12 , only one actuator body part 41A is provided for the plurality of rails 41B and is common among the plurality of modules. This can reduce the cost of connecting multiple modules. In addition, the actuator body part 41A is not limited to the case where only one is provided. For example, when the loading module 5 (loading) and the carrying module 8 (unloading) are arranged on the left and right as shown in the embodiment, a plurality of actuator body parts 41A may be provided. an actuator body part 41A.

In FIG. 4 , symbol 41 indicates a plurality of rails 41B of the second actuator 41 .

Next, the relationship between the drive space in which the actuators 12, 14, 41, and 42 are arranged and the processing space in which the substrate 4 is processed will be explained using FIGS. 13 and 14 .

FIG. 13 is a perspective view showing the chemical module 7 , and FIG. 14 is a diagram explaining the operation of the first conveyance unit 11 of the chemical module 7 .

As shown in FIGS. 13 and 14 , the housing 20 forms a processing space A for processing the substrate 4 . The processing space A is a space including the chemical solution tank 32 and the cleaning tank 34 inside, and a plurality of substrates 4 are transported in the front-rear direction (first direction) and the transverse direction (second direction) inside the processing space A. The processing space A is surrounded by a pair of side walls 37 and a rear wall 38 .

As shown in FIGS. 13 and 14 , the housing 20 forms a first drive space B1. The first drive space B1 is a space for arranging the first actuator 12 and the up and down actuators 14 . The first drive space B1 is formed laterally in the second direction and below the openings of the chemical solution tank 32 and the cleaning tank 34 .

As shown in FIG. 14 , the housing 20 forms a second driving space B2. The second drive space B2 is a space for arranging the second actuator 41 and the rotation actuator 42 . The second drive space B2 is formed behind the processing space A in the first direction, that is, behind the rear wall 38 .

Since the actuators 12, 14, 41, and 42 are arranged in the drive spaces B1 and B2, the actuators 12, 14, 41, and 42 can be isolated from the processing space A. Thereby, foreign matter generated by the actuators 12, 14, 41, and 42 can be prevented from entering the processing space A and contamination in the chemical module 7 can be suppressed.

As shown in FIGS. 13 and 14 , the second driving space B2 and the processing space A are separated by the rear wall 38 . On the other hand, as shown in FIG. 13 , the first driving space B1 and the processing space A are separated by the side wall 38 . The exhaust pipe 36 is isolated. Not only this, but for example, a wall that separates the first driving space B1 and the processing space A may also be provided to isolate the first driving space B1 and the processing space A. This example will be described here using FIG. 15 .

FIG. 15 is a schematic plan view showing the processing space A of the modified example. As shown in FIG. 15 , a bottom wall 50 is provided surrounding the chemical solution tank 32 and the cleaning tank 34 . The bottom wall 50 is a wall portion constituting the bottom of the processing space A. An opening 51 is formed in a part of the bottom wall 50 , and a movable wall 52 is provided below the opening 51 . The movable wall 52 is configured to cover the opening 51 and moves in the front-rear direction integrally with the arm 16 supporting the bracket 18 (arrows L1, L2). The movable wall 52 has a long shape extending in the front-rear direction, and has a length that constantly covers the entire opening 51 in the range in which the arm 16 moves. The arm 16 extends downward through the movable wall 52 and is connected to the upper and lower actuators 14 . The through hole of the movable wall 52 through which the arm 16 passes is arranged in close contact with the arm 16 . In the example shown in Fig. 15, a side exhaust duct 36 may also be provided.

According to the structure shown in FIG. 15 , since the movable wall 52 through which the arm 16 is inserted is provided, the arm 16 can be moved in the front-rear direction and the processing space A and the first drive space B1 can be physically isolated. Thereby, contamination in the chemical module 7 can be suppressed more reliably.

In addition, the rear wall 38 may also be provided with a movable wall through which the swing arm 43 is inserted.

In addition, in the example shown in FIG. 15 , the bracket 18 is a shell part configured as a space for accommodating the carrier 2 , and has an upper section 18A and a lower section 18B. The upper stage portion 18A is a portion that protrudes upward than the lower stage portion 18B, and has a function of supporting the flange portion 3 of the carrier 2 from below. The lower portion 18B is a portion located below the upper portion 18A, and forms a gap for disposing the front end of the clamp portion 44 (claw shape) of the second conveyance portion 48 . Since the lower portion 18B is provided, even when the flange portion 3 of the carrier 2 is supported by the upper portion 18A, the clamp portion 44 of the second conveying portion 48 can support the flange of the carrier 2 at a different position from the upper portion 18A. Edge 3. Thereby, the clamp part 44 and the bracket 18 can hold the carrier 2 without interfering with each other, and the carrier 2 can be easily transferred between the clamp part 44 and the bracket 18 .

Next, an example of the operation of the substrate processing apparatus 1 will be described using FIGS. 16A to 16L .

16A to 16L are schematic diagrams for explaining an example of the operation of the substrate processing apparatus 1. (a) in each figure shows a top view of the processing space A, and (b) shows the peripheral structure of the bracket 18 and the substrate 4. side view.

As shown in FIG. 16A , first, in the processing space A, the carriage 18 waits above the washing tank 34 . As shown in FIG. 16A(b) , the bracket 18 is disposed above the washing tank 34 and is disposed at an intermediate position H1 between the height positions of the clamp portion 44 of the second conveyance portion 48 . While the carriage 18 is in a standby state, as shown in FIG. 16A(a) , the second transport unit 48 moves the carrier 2 holding the plurality of substrates 4 laterally (arrow M1).

As shown in FIG. 16B , the second transport unit 48 moves the carrier 2 holding the substrate 4 above the bracket 18 . Thereafter, the bracket 18 is raised from the intermediate position H1 (arrow M2), and the carrier 2 is held by the bracket 18.

As shown in FIG. 16C , the upper portion 18A of the bracket 18 is brought into contact with the flange portion 3 of the carrier 2 to be supported from below. As explained using FIG. 15 , the clamp portion 44 supports the flange portion 3 of the carrier 2 at a position different from the upper portion 18A of the bracket 18 without interfering with the bracket 18 . Thereafter, the clamp portion 44 is rotated in the opening direction (arrow M3 ) to release the clamping of the substrate 4 . Thereby, as shown in FIG. 16D , the carrier 2 is transferred from the clamp part 44 to the bracket 18 .

The bracket 18 holds the carrier 2 at a raised position H2 that is higher than the intermediate position H1. In this state, the bracket 18 holding the carrier 2 is moved rearward toward the chemical tank 32 (arrow M4). Since the clamp part 44 is opened in the direction away from the bracket 18, it does not interfere with the movement of the carrier 2 and the bracket 18.

As shown in FIG. 16E , the carrier 2 and the bracket 18 move above the chemical solution tank 32 and stop. In this state, the carrier 2 and the bracket 18 are lowered (arrow M5 ), and the substrate 4 is immersed in the chemical solution accumulated in the chemical solution tank 32 . At this time, the clamp part 44 of the second transport part 48 is located above the washing tank 34 and does not interfere with the carrier 2 and the bracket 18, so it can be evacuated laterally (arrow M6). In addition, the second transport unit 48 may not be retracted and may continue to wait above the washing tank 34 .

As shown in FIG. 16F , the carriage 18 is lowered to a lowered position H3 at a height where the plurality of substrates 4 are immersed in the chemical solution. By immersing the substrate 4 in the chemical solution, the surface of the substrate 4 can be etched or otherwise processed.

As the chemical solution in the chemical solution tank 32 , any liquid can be used as long as it can process the surface of the substrate 4 . For example, in the case of organic chemicals, NMP, amine solutions such as monoethanolamine, acetone, etc. can be used, and in the case of inorganic chemicals, SC1 (APM), SC2 (HPM), SPM, HF (hydrofluoric acid), BHF, etc. can be used. (buffered hydrofluoric acid) etc. In addition, one liquid may be used alone or two or more liquids may be combined.

When the chemical solution treatment of the substrate 4 is completed, the carrier 2 and the bracket 18 are raised (arrow M7 ) to lift up the substrate 4 . As shown in Figure 16G, the bracket 18 is raised to the intermediate position H1. In this state, the carrier 2 and the bracket 18 are moved forward toward the washing tank 34 (arrow M8).

As shown in FIG. 16H , the carrier 2 and the bracket 18 move above the washing tank 34 and stop. Thereafter, the carrier 2 and the bracket 18 are lowered (arrow M9 ), and the substrate 4 is arranged inside the cleaning tank 34 .

As shown in FIG. 16I , the substrate 4 is immersed in washing water such as pure water accumulated in the washing tank 34 while the carriage 18 is lowered to the lowering position H3. Thereby, the surface of the substrate 4 to which the chemical solution is attached can be cleaned. Not limited to the case of immersing in clean water, the substrate 4 can also be Spray clean water. For the cleaning process, any liquid or method can be used as long as the chemical liquid adhering to the surface of the substrate 4 can be replaced to a state that will not cause problems in the next process. For example, protic solvents, alcohols such as water, IPA, and ethanol, NMP, and amine solutions such as monoethanolamine can also be used. In addition, one liquid may be used alone or two or more liquids may be combined.

During the cleaning process of the substrate 4 , the second conveying part 48 that was originally retracted may be returned to the upper side of the cleaning tank 34 (arrow M10 ). After the clamp part 44 of the second transport part 48 is positioned above the cleaning tank 34, the carrier 2 and the bracket 18 holding the substrate 4 whose cleaning process has been completed are raised (arrow M11).

As shown in FIG. 16J , the bracket 18 rises to the rising position H2 for transferring the carrier 2 to the clamp part 44 . In this state, the clamp portion 44 is rotated in the closing direction (arrow M12 ), and the plurality of substrates 4 are clamped by the clamp portion 44 . The clamp portion 44 is inserted into the gap between the lower portion 18B of the bracket 18 and the flange portion 3 of the carrier 2 to support the flange portion 3 from below.

Thereafter, as shown in FIG. 16K , with the carrier 2 held by the clamp portion 44 , the bracket 18 is lowered (arrow M13 ). Thereby, the carrier 2 is released from being held by the bracket 18 , and the carrier 2 is transferred from the bracket 18 to the clamp unit 44 .

As shown in FIG. 16L , the bracket 18 is retracted to the intermediate position H1 where it does not interfere with the carrier 2 and the clamp part 44 . Therefore, the second conveying part 48 having the clamp part 44 holding the carrier 2 can move toward the next chemical module 7 (arrow M14).

According to the operations shown in FIGS. 16A to 16L , in the processing space A of the chemical module 7 , the chemical solution tank 32 and the cleaning tank 34 arranged in the front-rear direction (first direction) are used to convey the substrate 4 in the front-rear direction (first direction). (a transport step), perform chemical solution treatment and cleaning process on the substrate 4. After the two processes are completed, the substrate 4 can be transported laterally (second direction) toward the next chemical module 7 (second transport step). steps). By performing the first transfer step and the second transfer step, the substrate 4 processed by etching or the like can be manufactured.

When processing the substrates 4 in a batch, the operations shown in FIGS. 16A to 16L can be performed on each module of the batch of substrates 4 . As shown in the schematic top view of FIG. 17 , after the chemical module 7A performs processing of the substrate 4 (action (1)), the substrate 4 can be transferred to the next chemical module 7B to perform other processing (action (2)). Then, the substrate 4 is transported to the next chemical module 7C and other processes are performed (action (3)). Here, the order of actions (1) to (3) is not specifically limited and may also be in a random order. That is, it is not necessary to transport the substrate 4 in the order in which the chemical modules 7A, 7B, and 7C are arranged, and to perform processing using each module.

When the substrate 4 is processed in a plurality of batches, as shown in the schematic plan view of FIG. 18 , while the chemical module 7A is processing the substrate 4A (action (4)), another chemical module 7B can process other substrates. 4B performs processing (action (5)), and another substrate 4C is processed in another chemical module 7C (action (6)). Since the modules 7A, 7B, and 7C are respectively provided with the first conveying part 11 and the upper and lower conveying parts 13, the respective modules 7A, 7B, and 7C can carry out substrate conveying and processing in parallel. In addition, the order of actions (4) to (6) is not specifically limited and may also be in a random order. For example, the substrate 4C may be transported to the chemical module 7C, then the substrate 4A may be transported to the chemical module 7A, and then the substrate 4B may be transported to the chemical module 7B, and the substrates 4A, 7B, and 7C may be processed respectively. 4B, 4C.

As shown in FIG. 18 , when the substrates 4A and 4B are located far away from the upper part of the washing tank 34 , the clamp part 44 (not shown) of the second conveying part 48 does not interfere with the substrates 4A, 4B and the carrier 2 ( FIG. 17 , FIG. 18), the bracket 18 can be moved laterally by the chemical modules 7A and 7B (action (7)). The second transport unit 48 moved to the chemical module 7C receives the processed substrate 4C, And move to the next chemical module 7 (action (8)). After the substrate 4C is handed over to the next chemical module 7, it can be moved to the module in which the processing of the substrates 4A and 4B has been completed among the chemical modules 7A and 7B (action (9)), and the processed substrate can be received, and then Move to next chemistry module 7.

According to the above operation, multiple batches of substrates 4A, 4B, and 4C can be processed in parallel by each module, and the second conveying portion 48 spanning between the modules can be laterally moved during the processing. This makes it possible to achieve operations that were not possible with conventional substrate processing apparatuses in which a plurality of slots are arranged in a row in a transverse direction, thereby greatly improving processing efficiency.

(Function, efficacy 1)

As described above, the chemical module 7 (substrate processing module) of the embodiment is provided with the cleaning tank 34 (first tank), the chemical tank 32 (second tank), the first conveyance part 11 and the second conveyance unit. Department 48. The cleaning tank 34 (first tank) and the chemical tank 32 (second tank) are arranged along the first direction, and the substrate 4 can be disposed. The first conveying unit 11 moves the substrate 4 along the first direction. The second conveyance unit 48 moves the substrate 4 along the second direction intersecting the first direction.

According to such a structure, the cleaning tank 34 and the chemical tank 32 are arranged along the first direction, and the first conveying part 11 for conveying the substrate 4 along the first direction and the second conveying part 11 for conveying the substrate 4 along the second direction are provided. The conveying unit 48 can therefore convey the substrate 4 in different directions (MD direction and TD direction). Therefore, compared with the conventional substrate processing apparatus that only arranges a plurality of slots in one direction, the overall installation area of the apparatus can be reduced. In addition, since the first conveying part 11 and the second conveying part 48 are respectively provided, the first conveying part 11 and the second conveying part 48 can be used to convey and process the respective substrates 4 and the like, thereby improving the processing efficiency.

In addition, the chemical module 7 of the embodiment further includes an up-and-down conveyance part 13 that moves the substrate 4 up and down, and the up-and-down conveyance part 13 is connected to the first conveyance part 11. The first conveying part 11 moves the vertical conveying part 13 along the first direction. According to such a structure, the second conveyance unit 48 can omit the function of moving the substrate 4 up and down, the function of moving the substrate 4 in the first direction, and the like, thereby simplifying the movement of the substrate 4 .

In addition, the chemical module 7 of the embodiment can be connected to other modules (import module 5, drying module 6, chemical module 7, or unload module 8) in the second direction. Thereby, the second conveying part 48 can be used to convey the substrate 4 between a plurality of modules.

In addition, in the chemical module 7 of the embodiment, the second actuator 41 of the second conveyance part 48 is used in common with other modules. According to such a structure, the cost when the chemical module 7 is connected with other modules can be reduced.

In addition, in the chemical module 7 of the embodiment, the second transport part 48 is provided with a rail 41B extending along the second direction, and the rail 41B is arranged to be aligned with the rails 41B of other modules along the second direction. With such a configuration, modules can be connected to each other using a simple structure.

In addition, the chemical module 7 of the embodiment is further provided with a pair of side walls 37 that surround the cleaning tank 34 and the chemical solution tank 32 in the second direction, and the side walls 37 A gap 37a is formed through which the second conveyance part 48 passes. According to such a structure, the movement between modules by the second conveyance part 48 can be realized with a simple structure. In addition, since the size of the gap 37a is limited to a size that allows only the second conveyance unit 48 to pass, contamination between modules can be suppressed.

In addition, in the chemical module 7 of the embodiment, the cleaning tank 34 is arranged on the front side in the first direction, the chemical solution tank 32 is arranged on the rear side in the first direction, and the second conveying part 48 moves the substrate 4 in the first direction. The upper part of the washing tank 34 moves. With this configuration, the amount of chemical solution between modules can be reduced. Contamination of tanks 32 with each other. In addition, when the operator wants to check the inside of the chemical module 7 from the front, the operator can easily check the substrate 4 transported by the second transport unit 48 .

In addition, in the chemical module 7 of the embodiment, the other module connected to the chemical module 7 in the second direction is any one of the import module 5, the export module 8, the drying module 6, and the chemical module 7. By. With this configuration, modules with various functions can be connected as other modules.

In addition, the substrate processing apparatus 1 of the embodiment is equipped with the chemical module 7 and other modules (loading module 5, drying module 6, chemical module 7, or other modules connected to the chemical module 7 in the second direction). Move out module 8). According to such a configuration, the installation area can be reduced and the substrate processing apparatus 1 with high processing efficiency can be realized.

In addition, the substrate manufacturing method (substrate processing method) of the embodiment includes: a first transportation step in which the substrate 4 is transported along the first direction in the chemical module 7 (substrate processing module), so that the substrate 4 is moved along the first direction. moving between the cleaning tank 34 (first tank) and the chemical tank 32 (second tank) arranged in the first direction; and the second transport step is to transport the substrate 4 along the second direction intersecting the first direction. .

According to this method, the substrate 4 can be transported in different directions (MD direction and TD direction) in the chemical module 7 . Therefore, compared with the conventional substrate processing apparatus that only arranges a plurality of slots in one direction, the overall installation area of the apparatus can be reduced and the processing efficiency can be improved. In addition, the second transport step can also be performed manually by the operator.

(Function, efficacy 2)

As described above, the chemical module 7 (substrate processing module) of the embodiment is provided with the cleaning tank 34 (first tank), the chemical solution tank 32 (second tank), the first conveyance part 11, the second conveyance part 11 and the second conveyance part 11 . part 48 and the up and down conveying part 13; wherein, the cleaning tank 34 (first tank) and the chemical liquid tank 32 (second tank) are along the The substrates 4 are arranged in one direction and can be arranged; the first conveying part 11 moves the substrates 4 along the first direction; the second conveying part 48 moves the substrates 4 along the second direction intersecting the first direction; The vertical conveying part 13 is connected to the first conveying part 11 and moves the substrate 4 up and down. In addition, the first actuator 12 of the first conveying part 11 and the second actuator 41 of the second conveying part 48 are respectively arranged in the driving spaces B1 and B2 isolated from the processing space A, and the processing space A is accessible. (access) the space of the washing tank 34 and the chemical solution tank 32 .

According to such a structure, the cleaning tank 34 and the chemical tank 32 are arranged along the first direction, and the first conveying part 11 for conveying the substrate 4 along the first direction and the second conveying part 11 for conveying the substrate 4 along the second direction are provided. The conveying unit can therefore convey the substrate 4 in different directions (MD direction and TD direction). Therefore, compared with the conventional substrate processing apparatus that only arranges a plurality of slots in one direction, the overall installation area of the apparatus can be reduced. In addition, since the two actuators 12 and 41 are arranged in the driving spaces B1 and B2 that are isolated from the processing space A, foreign matter generated by the actuators 12 and 41 is difficult to invade the processing space A, and the chemical module 7 can be suppressed. pollution.

In addition, in the chemical module 7 of the embodiment, the first actuator 12 is arranged in the first drive space B1, and the second actuator 41 is arranged in the second drive space B2. According to such a structure, since the first actuator 12 and the second actuator 41 are respectively arranged in the driving spaces B1 and B2, the space within the module can be effectively utilized.

In addition, in the chemical module 7 of the embodiment, the first drive space B1 is provided to the side and below the openings of the cleaning tank 34 and the chemical solution tank 32, and the second drive space B2 is opposite to the processing Space A is located behind the first direction. According to such a structure, the space in the chemical module 7 can be effectively utilized.

In addition, the chemical module 7 of the embodiment further includes a rear wall 38 provided behind the processing space A, and the second drive space B2 is provided behind the rear wall 38 . According to such a structure, since the processing space A and the first driving space B1 are separated by the rear wall 38, foreign matter generated by the first actuator arranged in the first driving space B1 is difficult to enter the processing space A, and contamination can be suppressed. .

In addition, in the chemical module 7 of the embodiment, the rear wall 38 forms an exhaust port 39a for discharging the gaseous environment of the processing space A to the outside. According to such a configuration, even if foreign matter enters the processing space A, it can be discharged to the outside through the exhaust port 39a.

In addition, in the chemical module 7 of the embodiment, the second conveyance part 48 includes a swing arm part 43 (arm) and a clamp part 44. The swing arm portion 43 (arm) extends forward from the second drive space B2 and passes through the opening 38a provided in the rear wall 38 . The clamp part 44 is connected to the rotating arm part 43 and is arranged above the washing tank 34 . According to such a structure, the second conveying part 48 can be realized with a simple structure. In addition, the area of the opening 38a of the rear wall 38 is sufficient for the swing arm 43 to pass through. Therefore, when the area of the opening 38a is limited to the minimum, it is difficult for foreign matter generated by the second actuator 41 to enter the processing space A. .

In addition, in the chemical module 7 of the embodiment, the second drive space B2 can be connected to other modules. According to such a structure, since the second driving space B2 can be connected, the modules can be easily connected to each other.

In addition, in the chemical module 7 of the embodiment, the second transport part 48 further includes a rotation actuator 42 used to rotate the clamp part 44 of the substrate 4, and the rotation actuator 42 is Arranged in the second drive space B2. According to such a constitution, due to the rotation Both the actuator 42 and the second actuator 41 are disposed in the second driving space B2, which makes it difficult for foreign matter generated by the rotating actuator 42 to enter the processing space A, thereby suppressing contamination.

In addition, in the chemical module 7 of the embodiment, the vertical actuator 14 of the vertical conveyance unit 13 is arranged in the first drive space B1. According to such a structure, since both the upper and lower actuators 14 and the first actuator 12 are arranged in the first drive space B1, it is difficult for foreign matter generated by the upper and lower actuators 14 to enter the processing space A and contamination can be suppressed.

In addition, in the embodiment, the case where two tanks (the first tank and the second tank) of the cleaning tank 34 and the chemical solution tank 32 are provided has been described, but the invention is not limited to this case. For example, as shown in the schematic plan view of FIG. 19 , different combinations of tanks may be used in each of the chemical modules 7A, 7B, and 7C. In the example shown in Figure 19, the first tank 34A of the chemical module 7A is a cleaning tank, the second tank 32A is a chemical liquid tank, and the first tank 34B and the second tank 32B of the chemical module 7B are both chemical liquids. The first tank 34C and the second tank 32C of the chemical module 7C are single-bath treatment tanks. A single-bath treatment tank refers to a tank that has the functions of both chemical liquid treatment and cleaning treatment. It has the functions of supplying and draining the chemical liquid and supplying and draining the cleaning liquid.

The chemical liquids used in the first tank 34B and the second tank 32B of the chemical module 7B can be of the same type or different types. The chemical liquids used in the first tank 34C and the second tank 32C of the chemical module 7C can also be of the same type. kind or different kind.

As shown in the layout shown in FIG. 19 , the combination of the first tank and the second tank is not limited to the cleaning tank 34 and the chemical tank 32 and various combinations can be used. The first tank and the second tank can be any one of a chemical tank, a washing tank, and a single-bath treatment tank, or any combination thereof.

As described above, in the chemical module 7 of the embodiment, the first tank and the second tank are each of the following tanks: a chemical solution tank for processing the substrate 4 with a chemical solution, or a cleaning tank for cleaning the substrate 4 . tank, and a single-bath type processing tank that has both the function of chemical liquid treatment and the function of cleaning the substrate 4 . According to such a structure, various combinations of the first groove and the second groove can be adopted.

(Tank extraction)

In order to improve the maintainability of the chemical solution tank 32, the cleaning tank 34 and their surrounding components, the chemical module 7 of the embodiment is provided with a substrate processing unit 45 that can extract the casing 20. The structure of the substrate processing unit 45 will be described using FIGS. 20 to 22 .

FIG. 20 is a perspective view of the plurality of chemical modules 7A, 7B, and 7C viewed from the front side of the housing 20 . 21 and 22 are perspective views of the plurality of chemical modules 7A, 7B, and 7C when viewed from the back side of the housing 20.

As shown in FIG. 20 , the chemical module 7 has a substrate processing unit 45 that can be extracted from the casing 20 as a separate structure from the casing 20 . The substrate processing unit 45 has a collecting tank 47 for accommodating the chemical tank 32 and the cleaning tank 34 . The collecting tank 47, including the chemical tank 32 and the cleaning tank 34, is separated from the casing 20 and can be extracted integrally. The substrate processing unit 45 of this embodiment can be drawn out toward the front side N1 of the casing 20 and retracted toward the back side N2 through the opening 49 provided on the front side N1 of the casing 20 .

In addition to the chemical solution tank 32 and the washing tank 34, the collecting tank 47 is also provided with a plurality of pipes 56, 57 (Fig. 21, Fig. 22), and other pipe-related components (pumps, filters, heaters, valves, and concentration meters). etc.), these components can also be extracted integrally with the collecting tank 47. Thereby, with the collecting tank 47 being pulled out of the casing 20 , the chemical tank 32 , the cleaning tank 34 and the surrounding components can be maintained. In addition, other piping-related members are unitized and can be extracted integrally with the collecting tank 47, and can be extracted as a single unit independently of the collecting tank 47. That is, it is also possible to extract only the other unitized pipe-related members.

According to the above structure, unlike the conventional structure in which the chemical solution tank and the cleaning tank are fixed to the casing, the operator does not need to enter the casing 20 to perform maintenance operations, and can perform maintenance operations outside the casing 20. High maintainability is therefore achieved. Furthermore, even if the processing program of the chemical module 7 is changed, the substrate processing unit 45 of the chemical module 7 can be replaced with another unit to cope with the change of the processing program flexibly and quickly.

In the example shown in FIG. 20 , among the three chemical modules 7A, 7B, and 7C, the collecting tank 47 of the central chemical module 7B is pulled out toward the front side N1, and the chemical modules 7A and 7C on both sides are closed by the panel 54. the state of the opening 49. The panel 54 can be attached and detached from the casing 20. If the chemical modules 7A and 7C disassemble the panel 54, the internal collecting tank 47 can also be pulled out.

The collecting tank 47 further has a first receiving space S1 and a second receiving space S2 as spaces for accommodating various components.

The first accommodation space S1 is a space for accommodating the chemical solution tank 32, the washing tank 34, and the like. The first storage space S1 is provided at the upper part of the collection tank 47 and is open upward and surrounded by walls on all four sides.

The second storage space S2 is a space for accommodating the pipes 56 and the like. The second receiving space S2 is located below the first receiving space S1 and extends along the Y-axis direction (first direction), and extends from the front 58 to the back 78 of the collection tank 47 (Fig. 21, Fig. 22). The piping 56 is a piping for supplying or discharging the cleaning liquid (for example, pure water) used in the cleaning tank 34 . The pipe 56 is inserted into the opening 60 provided in the front surface 58 of the collection tank 47 and is connected to the washing tank 34 . The pipe 56 extending from the washing tank 34 and accommodated in the second storage space S2 extends toward the back side N2 of the collection tank 47 .

An opening 62 different from the opening 49 is provided above the opening 49 . The opening 62 is an opening through which the cleaning tank 34 and the chemical solution tank 32 arranged inside the housing 20 can be viewed, checked, and accessed, and is closed by the panel 64 . In the example shown in FIG. 20 , the opening 62 of the chemical module 7A is closed by the panel 64 , while the openings 62 of the chemical modules 7B and 7C are open.

As shown in FIG. 20 , the two groove openings 66 and 68 provided inside the housing 20 can be visually confirmed and approached through the opening 62 . The tank openings 66 and 68 are openings that are fixedly formed in the housing 20 and expose the aforementioned chemical tank 32 and cleaning tank 34 respectively. For example, in the chemical module 7C, when the collecting tank 47 for accommodating the chemical tank 32 and the cleaning tank 34 is disposed in the casing 20 , the chemical tank 32 is exposed at the tank opening 66 and the tank opening 68 is exposed. Wash tank 34.

The chemical solution tank 32, the cleaning tank 34, and the housing 20 are separated from each other via the tank openings 66 and 68. By separating the chemical tank 32 and the cleaning tank 34 from the casing 20, and by separating the collection tank 47 from the casing 20, the substrate processing unit 45 can be configured to be able to extract the casing 20. In addition, by separating the substrate processing unit 45 from the casing 20, the chemical liquid and cleaning liquid generated in the chemical liquid tank 32 and the cleaning tank 34 are less likely to adhere to the casing 20, thereby suppressing corrosion of the casing 20. Improves the durability of Chemistry Module 7.

As shown in FIGS. 21 and 22 , two types of openings 70 and 72 and two types of panels 74 and 76 are provided on the back side N2 of the housing 20 .

The upper opening 70 is an opening through which the aforementioned groove openings 66 , 68 and the like can be viewed and accessed, and can be opened and closed by the panel 74 . Lower opening 72 It is an opening through which the aforementioned collection tank 47 and the like can be viewed and accessed, and can be opened and closed by the panel 76 .

In the examples shown in FIGS. 21 and 22 , the upper section illustrates a state in which the openings 70 of the chemical modules 7A and 7B are open, and the opening 70 of the chemical module 7C is closed by the panel 74 ; the lower section illustrates: the chemical The opening 72 of the module 7B is opened, and the openings 72 of the chemical modules 7A and 7C are closed by the panel 76 .

A pipe 57 is provided on the back surface 78 of the collecting tank 47 . The piping 57 is another piping different from the aforementioned piping 56 , and is connected to the chemical solution tank 32 . The pipe 57 is a pipe for supplying or discharging the chemical solution used in the chemical solution tank 32 , and is inserted into the opening 80 provided on the back surface 78 of the collecting tank 47 to be connected to the chemical solution tank 32 . The pipe 57 is not arranged in the second storage space S2, but extends from the back surface 78 of the collection tank 47 toward the back surface side N2.

The exhaust pipe 82 is also connected to the back surface 78 of the collecting tank 47 . The exhaust duct 82 is a duct for discharging the gas generated inside the collecting tank 47 to the outside of the casing 20 . The exhaust pipe 82 may be installed in an exhaust port 84 fixedly provided on the housing 20 . The exhaust port 84 is connected to a connection pipe 85 for connecting the exhaust duct 82 to the outside.

A plurality of connectors 86 are also provided on the back side N2 of the housing 20 . The connector 86 is a connection part (for example, a one-touch connector) for connecting pipes such as the pipes 56 and 57 to the outside. The plurality of connectors 86 are mounted on the plate portion 87 fixed to the housing 20 .

FIG. 21 shows a state in which the collecting tank 47 is drawn out toward the front side N1, and FIG. 22 shows a state in which the collecting tank 47 is retracted toward the back side N2 (that is, a state in which the collecting tank 47 is installed inside the housing 20).

As shown in Fig. 22, when the collecting tank 47 is retracted toward the back side N2, the pipes 56 and 57 are in a position to reach the connector 86. The operator installs the ends of the pipes 56 and 57 to the connector 86, Thereby, the pipes 56 and 57 are connected to an external supply source, a discharge port, etc. Likewise for the exhaust duct 82, the operator installs the exhaust duct 82 to the exhaust port 84, thereby connecting the exhaust duct 82 to the outside.

The interior of the housing 20 is also provided with a track 88 for extracting the collecting tank 47 . The rail 88 is a member extending along the Y-axis direction (first direction), and in this embodiment is composed of three rails 88A, 88B, and 88C. The rails 88A and 88B at both ends have, for example, an L-shaped shape sandwiching the left and right corners of the collection trough 47, and move while positioning the collection trough 47 in the X-axis direction (second direction).

In the above structure, in order to switch from the operating state shown in Fig. 22 to the maintenance state shown in Fig. 21, the operator only needs to manually remove the pipes 56 and 57 from the connector 86 and remove the exhaust pipe 82 from the exhaust pipe. Just remove the air port 84. After the operator also releases the connections between necessary parts of other parts, he pushes the collecting trough 47 toward the front side N1 so that the collecting trough 47 moves along the rail 88 . Thereby, the substrate processing unit 45 including the collection tank 47 can be drawn out of the casing 20 . In this way, the substrate processing unit 45 can be easily extracted.

According to the above structure, by separating the chemical tank 32, the cleaning tank 34, and the collecting tank 47 from the casing 20, and configuring the collecting tank 47 to be able to extract the casing 20, the operator can easily perform maintenance. , and can realize the chemical module 7 and the substrate processing unit 45 that improve maintainability.

Furthermore, by configuring the chemical solution tank 32 and the cleaning tank 34 to be arranged along the Y-axis direction (the first direction), the collection tank 47 can also be drawn out along the Y-axis direction (the first direction). This makes it possible to reduce the size (horizontal width) of the chemical module 7 in the X-axis direction while ensuring high maintainability. Thereby, even when a plurality of chemical modules 7 are connected along the X-axis direction, the substrate processing apparatus 1 is less likely to become large, and space saving of the substrate processing apparatus 1 can be achieved.

(function, efficacy)

As described above, the chemical module 7 (substrate processing module) of the embodiment is provided with: the housing 20; and the collection tank 47. Among them, the collection tank 47 is arranged in the Y-axis direction (the first direction). Accommodating two chemical liquid tanks 32 and cleaning tanks 34 (processing tanks) that can be respectively configured with the substrate 4, and the collecting tank 47 is arranged inside the housing 20, and the collecting tank 47, the chemical liquid tank 32 and the cleaning tank 34 The system is separated from the housing 20.

With such a configuration, the collecting tank 47 can be configured to be retractable from the casing 20 , and other components such as the chemical solution tank 32 and the washing tank 34 accommodated in the collecting tank 47 can be retracted from the casing 20 . Perform maintenance under the condition. This enables high maintainability. In addition, in this specification, including the chemical solution tank 32 and the cleaning tank 34, any tank that performs any processing (including chemical solution processing and cleaning processing) on the substrate 4 is called a "processing tank."

In addition, in the chemical module 7 of the embodiment, the collection tank 47 can be extracted along the Y-axis direction (first direction) from the housing 20 . According to such a structure, the size of the chemical module 7 in the X-axis direction can be reduced, thereby achieving space saving.

In addition, in the chemical module 7 of the embodiment, the collecting tank 47 can be drawn out toward the front side N1 of the housing 20 . According to such a structure, maintenance work can be performed on the front side N1 of the collection tank 47, and other work (including attachment and detachment work of the pipes 56, 57 and the exhaust duct 82) can be performed on the back side N2 of the casing 20.

In addition, the chemical module 7 of the embodiment also has a pipe 56 connected to the washing tank 34 (processing tank), and the collecting tank 47 forms: a first accommodation space S1 for accommodating the washing tank 34, and an accommodating slave washing tank. The second accommodation space S2 of the pipe 56 extends from the clean tank 34 . According to such a structure, other components including the chemical solution tank 32 and the cleaning tank 34, such as the pipe 56, can be extracted integrally for maintenance.

In addition, in the chemical module 7 of the embodiment, the second storage space S2 is provided below the first storage space S1. According to such a structure, the upper and lower spaces in the collecting tank 47 can be effectively utilized, and the size of the collecting tank 47 in the X-axis direction can be reduced to achieve space saving.

In addition, the chemical module 7 of the embodiment further includes a connector 86 for detachably connecting the pipe 56 extending from the second storage space S2. According to such a structure, the collecting tank 47 can be easily drawn out simply by detaching the pipe 56 from the connector 86 .

In addition, in the chemical module 7 of the embodiment, the housing 20 has the rail 88 for moving the collection tank 47 . According to such a structure, the collection tank 47 can be made withdrawable using a simple mechanism.

In addition, the chemical module 7 of the embodiment further includes a first conveyance part 11 and a second conveyance part 48; the first conveyance part 11 can move in the X-axis direction intersecting the Y-axis direction (first direction). (Second direction) The other chemical modules 7 are connected and the substrate 4 is moved along the Y-axis direction; the second conveying part 48 moves the substrate 4 along the X-axis direction. According to such a structure, the chemical modules 7 can be connected in the X-axis direction, and the collecting tank 47 can be made withdrawable in each chemical module 7 .

In addition, the substrate processing apparatus 1 of the embodiment includes a chemical module 7 (substrate processing module), and an X-axis direction (second direction) intersecting the Y-axis direction (first direction) and a chemical module 7 (substrate processing module). Learn Module 7 is linked to other Chemistry Module 7. According to such a structure, a plurality of chemical modules 7 can be connected, and a substrate processing apparatus 1 with high maintainability can be realized.

In addition, the substrate processing unit 45 of the embodiment is equipped with a chemical tank 32 and a cleaning tank 34 (two processing tanks) in which the substrate 4 can be separately arranged and arranged in a state along the Y-axis direction (the first direction). The collection tank 47 accommodates the chemical solution tank 32 and the cleaning tank 34; the collection tank 47, the chemical solution tank 32 and the cleaning tank 34 are separated from the housing 20 of the chemical module 7 in which the collecting tank 47 is arranged. According to such a structure, the same effect as that of the chemical module 7 of the embodiment can be achieved (see paragraph 0157).

In addition, in the substrate processing unit 45 of the embodiment, the collecting tank 47 is extractable relative to the housing 20 of the chemical module 7 along the Y-axis direction (the first direction). According to such a structure, the size of the substrate processing unit 45 in the X-axis direction can be reduced, and space can be saved.

(leveling agency)

The chemical module 7 of the embodiment is also provided with a leveling mechanism for leveling the chemical solution tank 32 and the cleaning tank 34 so that the raising process in the chemical solution tank 32 and the cleaning tank 34 can be carried out. efficiency. The leveling mechanism will be described using Figures 23 to 28.

23 is a schematic view of the substrate processing unit 45 including the leveling mechanisms 90 and 91 when viewed from the side, and FIGS. 24A and 24B are schematic views of the chemical solution tank 32 and the cleaning tank 34 when viewed from the front, respectively.

As shown in FIG. 23 , leveling mechanisms 90 and 91 are provided inside the collection tank 47 of the substrate processing unit 45 . The leveling mechanism 90 is a mechanism used for leveling the chemical solution tank 32 , and the leveling mechanism 91 is a mechanism used for leveling the washing tank 34 .

The leveling mechanism 90 includes a height changing part 92, a contact part 93, and a supporting part 94. Similarly, the leveling mechanism 91 is provided with a height changing part 95, a contact part 96, and a support part 97. Each component of the leveling mechanisms 90 and 91 has the same structure. The leveling mechanism 90 will be mainly described below.

The height changing portion 92 of the leveling mechanism 90 is a member for changing the height of a specific portion of the chemical solution tank 32 . The height changing part 92 of this embodiment is provided on the back side N2 of the chemical solution tank 32 .

As shown in FIG. 24A , the height changing part 92 has two height changing parts 92A and 92B spaced apart in the X-axis direction. The height change portion 92A is in contact with the corner portion 32a of the chemical solution tank 32 on the left side in the figure, and the height change portion 92B is in contact with the corner portion 32b of the chemical solution tank 32 on the right side in the figure. The height changing part 92A is provided on the inner wall surface 47A on one side of the collecting tank 47 , and the height changing part 92B is provided on the inner wall surface 47A on the other side of the collecting tank 47 . The height changing parts 92A and 92B can change the height independently.

The contact portion 93 is a member provided in the chemical solution tank 32 and is in contact with the support portion 94 . The contact portion 93 of this embodiment has a convex spherical surface, which is also called a "ball portion". The support portion 94 is a member that contacts the contact portion 93 and supports the contact portion 93 . The support portion 94 of this embodiment has a concave spherical surface that supports the contact portion 93 belonging to the ball portion, which is also called a "ball bearing portion."

The support portion 94 is used to carry and support the contact portion 93 provided in the chemical solution tank 32, whereby the posture of the chemical solution tank 32 can be freely adjusted. By using the aforementioned height changing portions 92A and 92B to change the heights of two parts of the chemical solution tank 32, the posture of the chemical solution tank 32 can be adjusted in any direction, and the parallelism of the chemical solution tank 32 can be maintained with high accuracy. . Thereby, when the chemical liquid tank 32 is When the chemical liquid rises to process the substrate 4 , it is easy for the chemical liquid to rise evenly from the four sides of the chemical liquid tank 32 , thereby improving the processing efficiency of the substrate 4 .

Furthermore, compared with the case where height changing portions are respectively provided at the corners of the four locations of the chemical solution tank 32, only the heights of the corners of two locations need to be changed. Therefore, the leveling operation can be performed easily and in a short time. , achieving high maintainability.

Similarly, the height change part 95 of the leveling mechanism 91 also has the same structure as the height change part 92 , the contact part 96 also has the same structure (ball part) as the contact part 93 , and the support part 97 also has the same structure as the support part 94 Same structure (ball bearing part). As shown in FIG. 24B , the contact portion 96 provided in the washing tank 34 is supported and supported by the support portion 97 , and the height of the washing tank 34 can be freely changed by using the two height changing portions 95A and 95B. Adjust the position of the washing tank 34 accordingly. This makes it easier for the chemical liquid to rise evenly from the four sides of the cleaning tank 34 , thereby improving the processing efficiency of the substrate 4 .

As shown in FIG. 23 , in the leveling mechanism 90 of the chemical tank 32 , the height changing part 92 is provided on the back side N2 , and the contact part 93 and the supporting part 94 are provided on the front side N1 . On the other hand, in the leveling mechanism 91 of the washing tank 34, the height change part 95 is provided on the front side N1, and the contact part 96 and the support part 97 are provided on the back side N2.

According to the above arrangement, when leveling the chemical solution tank 32, the operator only needs to approach the height changing portion 92 from the back 78 of the collecting tank 47. When leveling the washing tank 34, the operator only needs to approach the height changing portion 92 from the front side of the collecting tank 47. 58 to approach the height changing part 95. Therefore, it is not necessary to approach the central part of the collecting tank 47, but the height changing parts 92 and 95 can be easily accessed from the outside of the collecting tank 47, and the leveling operation can be easily performed.

Here, the specific structure of the height changing parts 92 and 95 is demonstrated using FIG. 25. Fig. 25 is a schematic enlarged view of the height changing portion 92 (95) when viewed from the side.

As shown in FIG. 25 , the height change portion 92 (95) includes a mounting base 100, an adjustment bolt 102, and a guide portion 104.

The supporting platform 100 is a plate-shaped portion for supporting the corner portions 32 a and 32 b of the chemical solution tank 32 . The mounting base 100 is supported from the lower side by adjusting bolts 102 . The adjustment bolt 102 is a member for raising and lowering the stage 100, and is arranged with the head 103 facing downward. When the operator rotates the head 103 of the adjusting bolt 102 (arrow R), the adjusting bolt 102 and the platform 100 supported by the adjusting bolt 102 move up and down together (arrow Z1). Thereby, the heights of the corner portions 32a and 32b of the chemical solution tank 32 can be changed respectively.

The adjusting bolt 102 is threaded with the guide portion 104 . The guide part 104 supports the adjusting bolt 102 in a state where the adjusting bolt 102 is screwed together, and guides the up and down movement of the platform 100 . The guide portion 104 has a substantially L-shaped cross-sectional shape and is inserted into the through hole 106 formed in the mounting base 100 . The platform 100 supported by the adjusting bolt 102 moves up and down while maintaining an engagement relationship with the vertically erected portion of the guide portion 104, thereby moving up and down while maintaining a substantially horizontal state.

The guide part 104 is fixed to the inner wall surfaces 47A, 47B of the collecting tank 47 (Fig. 24A). In contrast, the platform 100 and the adjusting bolt 102 are separated from the inner wall surfaces 47A and 47B, and the platform 100 on which the chemical tank 32 is placed can relatively move up and down relative to the guide portion 104 and the collecting tank 47 .

Next, the specific structure of the contact part 93 and the support part 94 is demonstrated using FIG. 26. FIG. 26 is a schematic enlarged view showing a longitudinal section of the contact portion 93 (96) and the support portion 94 (97).

As shown in FIG. 26 , the chemical solution tank 32 is provided with a mounting portion 107 for mounting the contact portion 93 . The contact portion 93 is mounted on the lower surface of the mounting portion 107 .

The contact portion 93 is a ball portion with a convex spherical surface 108 , and the support portion 94 carrying the contact portion 93 is a ball bearing portion with a concave spherical surface 110 . In this embodiment, the radii of curvature of the spherical surfaces 108 and 110 are different. Specifically, the radius of curvature D1 of the spherical surface 108 is set shorter than the radius of curvature D2 of the spherical surface 110 . If the radius of curvature is set in this manner, when the convex spherical surface 108 contacts the concave spherical surface 110, a substantially one-point contact portion 112 is formed, which is a so-called point contact. The contact portion 93 and the support portion 94 are in point contact, whereby the spherical surface 108 can move smoothly along the spherical surface 110 and the posture of the chemical solution tank 32 can be easily adjusted. In addition, if the contact portion 93 and the support portion 94 are in point contact, the curvature radii D1 and D2 may be any length, including, for example, the case where the tip of a rod or a hammer forms a minute spherical surface.

The arrangement relationship, etc. of the leveling mechanisms 90 and 91 having the above-mentioned structure will be described using FIGS. 27 and 28 . 27 and 28 are schematic top views of the chemical solution tank 32 and the cleaning tank 34, and are a schematic top view of the collection tank 47 including the leveling mechanisms 90 and 91. FIG. 27 shows the state in which the chemical solution tank 32 and the cleaning tank 34 are arranged in the collecting tank 47 . FIG. 28 shows the state in which the chemical solution tank 32 and the cleaning tank 34 are removed from the collecting tank 47 .

As shown in FIG. 27 , the chemical solution tank 32 also has two rod-shaped parts 114 . The rod-shaped portion 114 is a member fixed to the side surface of the chemical solution tank 32 and extending in a rod-like shape along the Y-axis direction. One end of each rod-shaped portion 114 is supported by the supporting platform 100 of the height changing portions 92A and 92B. The supporting platform 100 supports one end of the rod-shaped portion 114, thereby changing the height of the supporting platform 100, thereby adjusting the posture of the chemical solution tank 32.

Similarly, the washing tank 34 has two rod-shaped parts 116 . The rod-shaped parts 116 are each carried by the mounting base 100 of the height changing parts 95A and 95B. By changing the height of the mounting base 100, the posture of the washing tank 34 can be adjusted.

As shown in FIG. 27 , the mounting portion 107 that integrally mounts the contact portions 93 and 96 is mounted on the front side N1 of the chemical solution tank 32 and is mounted on the back side N2 of the cleaning tank 34 . Thereby, the mounting part 107 of the chemical solution tank 32 and the mounting part 107 of the washing tank 34 are arrange|positioned adjacent to the center part of the collecting tank 47. The two mounting parts 107 are arranged together at the center of the collecting tank 47. This allows the height to be changed at the end of the collecting tank 47 without approaching the central part of the collecting tank 47, thereby effectively utilizing the space of the collecting tank 47, and Posture adjustments can be made easily.

As shown in FIG. 28 , in a state where the chemical solution tank 32 and the cleaning tank 34 are removed from the collecting tank 47 , the supporting parts 94 and 97 are provided on the bottom surface 51C of the collecting tank 47 , and the guide part 104 is provided on the bottom surface 51C of the collecting tank 47 . Inner wall surfaces 47A and 47B of the collecting tank 47 . Although illustration is omitted, the mounting base 100 and the adjusting bolt 102 are both engaged with the guide portion 104 , and the height changing portions 92A, 92B, 95A, and 95B are all provided in the collecting groove 47 .

In this embodiment, the support parts 94 and 97 and the height changing parts 92 and 95 belonging to the ball bearing part are provided in the collecting tank 47, and the contact parts 93 and 96 belonging to the ball part are provided in the chemical tank 32 and the washing machine. Clean tank 34 (processing tank). In this way, the leveling mechanisms 90 and 91 can be easily disposed at the contact portions of the chemical solution tank 32 and the cleaning tank 34 and the collecting tank 47 .

According to the above structure, the leveling mechanism 90 for leveling the chemical solution tank 32 has two height changing parts 92, the contact part 93 and the supporting part 94, and is used for leveling the washing tank 34. The mechanism 91 also has two height changing parts 95, a contact part 96 and a supporting part. 97. Thereby, compared with the case where the height of the treatment tank is changed at the four corners of the conventional structure, the leveling operation of the chemical tank 32 and the washing tank 34 can be easily performed, and high maintainability can be achieved.

(function, efficacy)

As described above, the chemical module 7 (substrate processing module) of the embodiment is provided with the housing 20 , which is arranged along the Y-axis direction (the first direction) in the housing 20 and can be separately arranged for cleaning the substrate 4 The tank 34 and the chemical liquid tank 32 (processing tank), and the leveling mechanisms 91 and 90 used to level the cleaning tank 34 and the chemical liquid tank 32; wherein the leveling mechanisms 91 and 90 respectively have: The contact parts 96 and 93 of the clean tank 34 and the chemical solution tank 32; the support parts 97 and 94 that are in contact with the contact parts 96 and 93 and carry the contact parts 96 and 93; and the parts used to change the cleaning tank 34 and the chemical solution tank 32. The height of at least two height changing parts 95A, 95B, 92A, 92B.

According to such a configuration, in the chemical module 7 in which two processing tanks are arranged, the processing tanks can be easily leveled using a simple configuration, and the chemical module 7 with high maintainability can be realized. In addition, the contact portions 96 and 93 only need to be spherical at least partially, for example, the entire contact portion 96 and 93 may be spherical. In addition, the size of the spherical shape is not specifically limited.

In addition, in the chemical module 7 of the embodiment, the treatment tank is equipped with a cleaning tank 34 (first tank) and a chemical tank 32 (second tank); and the leveling mechanisms 91 and 90 are equipped with: for cleaning. A leveling mechanism 91 (first leveling mechanism) for leveling the clean tank 34, and a leveling mechanism 90 (second leveling mechanism) for leveling the chemical tank 32. In addition, the leveling mechanism 91 has a contact part 96, a support part 97, and two height changing parts 95A and 95B for changing the height of the washing tank 34; the leveling mechanism 90 has a contact part 93, a support part 94, and two height changing portions 92A and 92B for changing the height of the chemical solution tank 32 . According to such a structure, each cleaning tank 34 and the chemical solution tank 32 can be leveled with high precision.

In addition, in the chemical module 7 of the embodiment, the cleaning tank 34 is arranged on the front side N1 of the housing 20 relative to the chemical solution tank 32 , and the height changing portion 95 of the leveling mechanism 91 is provided on the cleaning tank 34 The front side N1 of the leveling mechanism 90 is provided on the back side N2 of the chemical solution tank 32 . According to such a structure, the leveling adjustment of the washing tank 34 can be performed by approaching from the front side N1 of the housing 20, and the leveling adjustment of the chemical solution tank 32 can be performed by approaching from the back side N2 of the housing 20. Thereby, while achieving high maintainability, the size (horizontal width) of the chemical module 7 in the X-axis direction is shortened, thereby saving space.

In addition, the chemical module 7 in the embodiment further includes a first conveyance part 11 and a second conveyance part 48; the first conveyance part 11 can move in the X-axis direction (first direction) intersecting the Y-axis direction (first direction). second direction) to connect other chemical modules 7 and move the substrate 4 along the Y-axis direction; the second transport part 48 moves the substrate 4 along the X-axis direction. According to such a structure, the chemical modules 7 can be connected in the X-axis direction, and the leveling mechanisms 90 and 91 in each chemical module 7 can be used to easily level the treatment tank.

In addition, the chemical module 7 of the embodiment further includes a collection tank 47 that accommodates the cleaning tank 34 and the chemical solution tank 32 and is configured to be separated from the housing 20 and moveable along the Y-axis relative to the housing 20 direction (first direction) to extract. According to such a structure, the collecting tank 47 can be extracted, thereby further improving maintainability.

In addition, in the chemical module 7 of the embodiment, the leveling mechanisms 91 and 90 are provided at the contact portions of the collection tank 47 and the cleaning tank 34 and the chemical solution tank 32 (processing tank). With such a configuration, the leveling mechanisms 91 and 90 can be easily installed.

In addition, in the chemical module 7 of the embodiment, the support parts 97 and 94 and the height changing parts 95 and 92 are provided in the collection tank 47, and the contact parts 96 and 93 are provided in the cleaning tank 34 and the chemical solution tank 32 (processing tank). With such a configuration, the leveling mechanisms 91 and 90 can be easily installed.

Furthermore, in the chemical module 7 of the embodiment, the contact portions 96 and 93 are partially spherical ball portions, and the support portions 97 and 94 are ball receiving portions that support the contact portions 96 and 93 . With such a configuration, the leveling mechanisms 91 and 90 can be easily installed.

In addition, the substrate processing apparatus 1 of the embodiment includes a chemical module 7 (substrate processing module), and the chemical module 7 is connected to the X-axis direction (second direction) crossing the Y-axis direction (first direction). Other Chemistry Mods 7. According to such a structure, a plurality of chemical modules 7 can be connected, and a substrate processing apparatus 1 with high maintainability can be realized.

In addition, the substrate processing unit 45 of the embodiment is equipped with a cleaning tank 34 and a chemical tank 32 (processing tank) that can separately arrange the substrate 4 and accommodate the cleaning tank in a state of being arranged along the Y-axis direction (first direction). The collecting tank 47 of the tank 34 and the chemical liquid tank 32, and the leveling mechanisms 91 and 90 used to level the cleaning tank 34 and the chemical liquid tank 32; among them, the leveling mechanisms 91 and 90 have: The contact parts 96 and 93 of the tank 34 and the chemical solution tank 32; the support parts 97 and 94 that are in contact with the contact parts 96 and 93 and carry the contact parts 96 and 93; and used to change the height of the cleaning tank 34 and the chemical solution tank 32 At least two height changing parts 95A, 95B, 92A, 92B. According to such a structure, the same effect as that of the chemical module 7 of the embodiment can be achieved (see paragraph 0196).

In addition, in the substrate processing unit 45 of the embodiment, the collection tank 47 can be separated from the housing 20 of the chemical module 7 and extracted relative to the housing 20 . This configuration contributes to realizing a highly maintainable substrate processing module.

In addition, in the embodiment, although the case where the supporting parts 94 and 97 have the concave spherical surface 110 is explained as shown in FIG. 26, the shape of the supporting parts 94 and 97 is not limited to this, as long as it is a convex shape capable of carrying The shape of the spherical surface 108 can be any shape. For example, as shown in the modification of FIG. 29 , a concave polyhedron shape 210 may be used instead of a concave spherical surface. The polyhedral shape 210 is composed of a plurality of straight lines and forms a longitudinal section as shown in FIG. 29 .

In addition, in the embodiment, the case where the support portions 94 and 97 provided in the collection tank 47 are concave ball receiving portions and the contact portions 93 and 96 provided in the processing tank are convex ball portions will be described. However, it is not limited to the above situation, and the relationship between the ball bearing part and the ball part can also be reversed. For example, as shown in the modification of FIG. 30 , the supporting parts 304 and 307 provided in the collecting tank 47 may be convex ball parts, and the contact parts 303 and 306 provided in the processing tank may be concave ball receiving parts. . In the example shown in FIG. 30 , the support part 304 is supported by the contact part 303 provided in the chemical solution tank 32 , and the support part 307 is supported by the contact part 306 provided in the washing tank 34 . In this way, as long as either one of the contact portion and the supporting portion is at least a partially spherical ball portion, the other one is a ball bearing portion that supports the ball portion.

In the example shown in FIG. 30 , the above-mentioned mounting portion 107 is omitted and the mounting portion 107 is also provided by the contact portions 303 and 306 . It is not limited to this, and the mounting part 107 may be provided similarly to the embodiment, and the contact parts 303 and 306 may be mounted on the mounting part 107.

FIG. 31 shows another modification example in which the mounting portion 107 is omitted. In the example shown in FIG. 31 , the contact portion 393 is directly installed on the lower surface of the chemical solution tank 32 , and the contact portion 396 is directly installed on the lower surface of the cleaning tank 34 .

In addition, although in the embodiment, the case where two leveling mechanisms 91 and 90 are provided is described, it is not limited to this case. As shown in the modifications of Fig. 32A and Fig. 32B, The chemical solution tank 432 and the cleaning tank 434 may be integrally formed, and the two treatment tanks may be leveled simultaneously by one leveling mechanism 490 . In the example shown in FIGS. 32A and 32B , the chemical solution tank 432 and the cleaning tank 434 are integrally configured, and the leveling mechanism 490 includes a height changing part 492 , a contact part 493 , and a supporting part 494 . The height change part 492 is provided on the back side N2 of the chemical solution tank 432 to support one corner of the chemical solution tank 432 , while the contact part 493 and the support part 494 are provided on the front side N1 of the cleaning tank 434 . As shown in FIG. 32B , two height changing portions 492 (height changing portions 492A and 492B) are provided to support the two corner portions of the chemical solution tank 432 .

According to the structure shown in FIGS. 32A and 32B , by changing the height using the two height change parts 492A and 492B, the chemical solution tank 432 and the cleaning tank 434 belonging to the two treatment tanks can be leveled simultaneously. It is only necessary to approach from the back surface 78 of the collecting tank 47 , and there is no need to approach from the front surface 58 of the collecting tank 47 . Thereby, the leveling operation can be easily performed using a simple structure.

In addition, it is not limited to the case where the height changing part 492 is provided in the chemical solution tank 432, and the contact part 493 and the support part 494 are provided in the washing tank 434. The arrangement relationship may also be reversed, and the contact part and the support part may be arranged. It is provided in the chemical solution tank 432, and two height changing parts are provided in the washing tank 434.

In addition, in the embodiment, as shown in FIG. 27 , the height changing portions 92A and 92B are provided at one end of the chemical solution tank 32 in the Y-axis direction (opposite to the contact portion 93 ), and the Although the case where the height change parts 95A and 95B are provided in the end part on one side of the Y-axis direction of the washing tank 34 (the side opposite to the contact part 96) is demonstrated, it is not limited to this case. For example, as shown in FIG. 33 , the height changing parts 500 may also be provided at both ends of the chemical solution tank 32 in the Y-axis direction. The height changing part 501 is provided at a position between both ends of the washing tank 34 in the Y-axis direction. In the example shown in FIG. 33 , height changing portions 500 are provided at one end and the other end of the chemical solution tank 32 in the X-axis direction, and height changing portions are provided at one end and the other end of the washing tank 34 in the X-axis direction. 501. The height changing part 500 only needs to be arranged on the opposite side (upper side of the paper) of the contact part 93 with respect to the center line The center line X2 at the center position in the Y-axis direction only needs to be arranged on the opposite side (lower side of the paper) of the contact portion 96 . Even in this case, the height changing part 500 can be used to change the height of the two parts of the chemical solution tank 32 to adjust the posture of the chemical solution tank 32, and the height changing part 501 can be used to change the two parts of the cleaning tank 34. The height of the part thereby adjusts the posture of the washing tank 34.

7A, 7B, 7C: Chemical module (substrate processing module)

20: Shell

32: Chemical liquid tank (processing tank, second tank)

34: Washing tank (processing tank, first tank)

37:Side wall

43: Rotating arm

45:Substrate processing unit

47: Collection tank

49:Opening part

54:Panel

56:Piping

58:front

60:Open your mouth

62:Opening part

64:Panel

66,68: Groove opening

N1: Front side

N2: Back side

S1: The first containment space

S2: Second Containment Space

Claims (11)

A substrate processing module having; housing; and The collection tank is arranged in a first direction to accommodate two processing tanks that can respectively arrange the substrates; wherein The aforementioned collecting tank is arranged inside the aforementioned housing; The aforementioned collection tank and the aforementioned treatment tank are separated from the aforementioned housing. In the substrate processing module of claim 1, the collecting tank can be extracted along the first direction relative to the housing. The substrate processing module according to claim 1 or 2, wherein the collecting tank is retractable toward the front side of the housing. The substrate processing module according to claim 1 or 2, further has a pipe connected to the aforementioned processing tank; The collecting tank forms a first accommodation space for accommodating the treatment tank, and a second accommodation space for accommodating the piping extending from the treatment tank. The substrate processing module according to claim 4, wherein the second accommodation space is provided below the first accommodation space. The substrate processing module according to claim 4 further includes a connector that is removably connected to the pipe extending from the second accommodation space. The substrate processing module according to claim 1 or 2, wherein the frame system has a track for advancing the collection tank. The substrate processing module as described in claim 1 or 2 is configured to be connected to another module in a second direction crossing the aforementioned first direction; the substrate processing module further has: The first conveying part moves the substrate in the first direction; and The second conveying unit moves the substrate in the second direction. A substrate processing device having: The aforementioned substrate processing module according to claim 1 or 2, and other modules connected to the aforementioned substrate processing module in the second direction that intersects with the aforementioned first direction. A substrate processing unit is provided with: Two processing tanks that can be configured separately for substrates; and The collection tank is for accommodating the aforementioned treatment tank in a state arranged along the first direction; The collecting tank and the processing tank are separated from the casing of the substrate processing module, and the substrate processing module has the collecting tank disposed inside. The substrate processing unit according to claim 10, wherein the collecting tank is extractable along the first direction relative to the housing.

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