TW202340141A - 感光化射線性或感放射線性樹脂組成物、感光化射線性或感放射線性膜、圖案形成方法、電子元件的製造方法及化合物 - Google Patents

感光化射線性或感放射線性樹脂組成物、感光化射線性或感放射線性膜、圖案形成方法、電子元件的製造方法及化合物 Download PDF

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TW202340141A
TW202340141A TW112104676A TW112104676A TW202340141A TW 202340141 A TW202340141 A TW 202340141A TW 112104676 A TW112104676 A TW 112104676A TW 112104676 A TW112104676 A TW 112104676A TW 202340141 A TW202340141 A TW 202340141A
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group
radiation
sensitive
compound
atom
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TW112104676A
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Chinese (zh)
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上村稔
小島雅史
後藤研由
藤巻錦
日浦暢大
丸茂和博
森貴大
白川三千紘
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日商富士軟片股份有限公司
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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW112104676A 2022-02-16 2023-02-10 感光化射線性或感放射線性樹脂組成物、感光化射線性或感放射線性膜、圖案形成方法、電子元件的製造方法及化合物 TW202340141A (zh)

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JP2022-022485 2022-02-16
JP2022022485 2022-02-16

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US (1) US20240402601A1 (https=)
EP (1) EP4481493A4 (https=)
JP (1) JPWO2023157635A1 (https=)
KR (1) KR20240134197A (https=)
CN (1) CN118679428A (https=)
TW (1) TW202340141A (https=)
WO (1) WO2023157635A1 (https=)

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JP2013061648A (ja) 2011-09-09 2013-04-04 Rohm & Haas Electronic Materials Llc フォトレジスト上塗り組成物および電子デバイスを形成する方法
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JP6518475B2 (ja) 2015-03-20 2019-05-22 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、酸発生剤及び化合物
IL270030B2 (en) 2017-04-21 2023-12-01 Fujifilm Corp A photosensitive composition for EUV light, a method for patterning and a method for producing an electronic device
KR102537251B1 (ko) 2018-06-28 2023-05-26 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 수지 조성물, 패턴 형성 방법, 전자 디바이스의 제조 방법, 수지
JP7076570B2 (ja) 2018-09-25 2022-05-27 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
WO2020158337A1 (ja) 2019-01-28 2020-08-06 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
JP7494707B2 (ja) 2020-04-01 2024-06-04 信越化学工業株式会社 レジスト材料及びパターン形成方法
WO2021251083A1 (ja) * 2020-06-10 2021-12-16 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法

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