KR20240134197A - 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 패턴 형성 방법, 전자 디바이스의 제조 방법, 및 화합물 - Google Patents

감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 패턴 형성 방법, 전자 디바이스의 제조 방법, 및 화합물 Download PDF

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KR20240134197A
KR20240134197A KR1020247027144A KR20247027144A KR20240134197A KR 20240134197 A KR20240134197 A KR 20240134197A KR 1020247027144 A KR1020247027144 A KR 1020247027144A KR 20247027144 A KR20247027144 A KR 20247027144A KR 20240134197 A KR20240134197 A KR 20240134197A
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group
sensitive
atom
preferable
radiation
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Korean (ko)
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미노루 우에무라
마사후미 코지마
아키요시 고토
니시키 후지마키
노부히로 히우라
카즈히로 마루모
타카히로 모리
미치히로 시라카와
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후지필름 가부시키가이샤
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    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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  • Chemical & Material Sciences (AREA)
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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020247027144A 2022-02-16 2023-02-01 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 패턴 형성 방법, 전자 디바이스의 제조 방법, 및 화합물 Ceased KR20240134197A (ko)

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JP2022022485 2022-02-16
JPJP-P-2022-022485 2022-02-16
PCT/JP2023/003132 WO2023157635A1 (ja) 2022-02-16 2023-02-01 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、及び化合物

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KR20240134197A true KR20240134197A (ko) 2024-09-06

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US (1) US20240402601A1 (https=)
EP (1) EP4481493A4 (https=)
JP (1) JPWO2023157635A1 (https=)
KR (1) KR20240134197A (https=)
CN (1) CN118679428A (https=)
TW (1) TW202340141A (https=)
WO (1) WO2023157635A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014194534A (ja) 2013-03-01 2014-10-09 Fujifilm Corp パターン形成方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜、電子デバイスの製造方法、電子デバイス、及び、化合物
JP2021165824A (ja) 2020-04-01 2021-10-14 信越化学工業株式会社 レジスト材料及びパターン形成方法

Family Cites Families (14)

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