TW202338501A - 正型感光化射線性或感放射線性樹脂組成物、感光化射線性或感放射線性膜、正型圖案形成方法、電子器件之製造方法、及化合物 - Google Patents

正型感光化射線性或感放射線性樹脂組成物、感光化射線性或感放射線性膜、正型圖案形成方法、電子器件之製造方法、及化合物 Download PDF

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Publication number
TW202338501A
TW202338501A TW112106681A TW112106681A TW202338501A TW 202338501 A TW202338501 A TW 202338501A TW 112106681 A TW112106681 A TW 112106681A TW 112106681 A TW112106681 A TW 112106681A TW 202338501 A TW202338501 A TW 202338501A
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TW
Taiwan
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group
radiation
general formula
ring
sensitive
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TW112106681A
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English (en)
Chinese (zh)
Inventor
福﨑英治
山口修平
吉岡知昭
三好太朗
上農悠花
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日商富士軟片股份有限公司
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Publication of TW202338501A publication Critical patent/TW202338501A/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F24/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW112106681A 2022-02-24 2023-02-23 正型感光化射線性或感放射線性樹脂組成物、感光化射線性或感放射線性膜、正型圖案形成方法、電子器件之製造方法、及化合物 TW202338501A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022027346 2022-02-24
JP2022-027346 2022-02-24

Publications (1)

Publication Number Publication Date
TW202338501A true TW202338501A (zh) 2023-10-01

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ID=87765950

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TW112106681A TW202338501A (zh) 2022-02-24 2023-02-23 正型感光化射線性或感放射線性樹脂組成物、感光化射線性或感放射線性膜、正型圖案形成方法、電子器件之製造方法、及化合物

Country Status (4)

Country Link
JP (1) JPWO2023162837A1 (https=)
KR (1) KR20240137062A (https=)
TW (1) TW202338501A (https=)
WO (1) WO2023162837A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240184201A1 (en) * 2022-11-11 2024-06-06 Rohm And Haas Electronic Materials Llc Polymer, photoresist compositions including the same, and pattern formation methods
JPWO2024111511A1 (https=) * 2022-11-24 2024-05-30
JP2025086674A (ja) 2023-11-28 2025-06-09 信越化学工業株式会社 ポリマー、化学増幅レジスト組成物及びパターン形成方法
JP2025087601A (ja) 2023-11-29 2025-06-10 信越化学工業株式会社 ポジ型レジスト材料及びパターン形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01156306A (ja) * 1987-12-15 1989-06-19 Nippon Oil & Fats Co Ltd 新規な透明樹脂及び高屈折率透明光学用樹脂
KR102129745B1 (ko) 2016-02-12 2020-07-03 후지필름 가부시키가이샤 패턴 형성 방법 및 전자 디바이스의 제조 방법
KR102243197B1 (ko) 2016-09-26 2021-04-22 후지필름 가부시키가이샤 레지스트 조성물, 패턴 형성 방법 및 전자 디바이스의 제조 방법

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JPWO2023162837A1 (https=) 2023-08-31
KR20240137062A (ko) 2024-09-19
WO2023162837A1 (ja) 2023-08-31

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