JPWO2023162837A1 - - Google Patents
Info
- Publication number
- JPWO2023162837A1 JPWO2023162837A1 JP2024503082A JP2024503082A JPWO2023162837A1 JP WO2023162837 A1 JPWO2023162837 A1 JP WO2023162837A1 JP 2024503082 A JP2024503082 A JP 2024503082A JP 2024503082 A JP2024503082 A JP 2024503082A JP WO2023162837 A1 JPWO2023162837 A1 JP WO2023162837A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F24/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022027346 | 2022-02-24 | ||
| PCT/JP2023/005338 WO2023162837A1 (ja) | 2022-02-24 | 2023-02-15 | ポジ型感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、及び化合物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2023162837A1 true JPWO2023162837A1 (https=) | 2023-08-31 |
Family
ID=87765950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024503082A Pending JPWO2023162837A1 (https=) | 2022-02-24 | 2023-02-15 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2023162837A1 (https=) |
| KR (1) | KR20240137062A (https=) |
| TW (1) | TW202338501A (https=) |
| WO (1) | WO2023162837A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240184201A1 (en) * | 2022-11-11 | 2024-06-06 | Rohm And Haas Electronic Materials Llc | Polymer, photoresist compositions including the same, and pattern formation methods |
| JPWO2024111511A1 (https=) * | 2022-11-24 | 2024-05-30 | ||
| JP2025086674A (ja) | 2023-11-28 | 2025-06-09 | 信越化学工業株式会社 | ポリマー、化学増幅レジスト組成物及びパターン形成方法 |
| JP2025087601A (ja) | 2023-11-29 | 2025-06-10 | 信越化学工業株式会社 | ポジ型レジスト材料及びパターン形成方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01156306A (ja) * | 1987-12-15 | 1989-06-19 | Nippon Oil & Fats Co Ltd | 新規な透明樹脂及び高屈折率透明光学用樹脂 |
| KR102129745B1 (ko) | 2016-02-12 | 2020-07-03 | 후지필름 가부시키가이샤 | 패턴 형성 방법 및 전자 디바이스의 제조 방법 |
| KR102243197B1 (ko) | 2016-09-26 | 2021-04-22 | 후지필름 가부시키가이샤 | 레지스트 조성물, 패턴 형성 방법 및 전자 디바이스의 제조 방법 |
-
2023
- 2023-02-15 KR KR1020247027983A patent/KR20240137062A/ko active Pending
- 2023-02-15 WO PCT/JP2023/005338 patent/WO2023162837A1/ja not_active Ceased
- 2023-02-15 JP JP2024503082A patent/JPWO2023162837A1/ja active Pending
- 2023-02-23 TW TW112106681A patent/TW202338501A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20240137062A (ko) | 2024-09-19 |
| WO2023162837A1 (ja) | 2023-08-31 |
| TW202338501A (zh) | 2023-10-01 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20260108 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20260414 |