TW202328354A - Resin composition, film, optical filter, solid-state imaging element, and image display device - Google Patents

Abstract

Provided are a resin composition having excellent stability over time, a film, an optical filter, a solid-state imaging element, and an image display device. The resin composition includes a coloring material, an ultraviolet absorber, and a resin, the ultraviolet absorber including an ultraviolet absorber that has a basic group, the ultraviolet absorber having a basic group being at least one compound selected from a benzophenone compound, a benzoate compound, a benzotriazole compound, a triazine compound, and a cyanoacrylate compound, and the resin including a resin that has an acid group.

Description

Resin composition, film, optical filter, solid-state imaging device, and image display device

The invention relates to a resin composition containing color material. Also, the present invention relates to a film using a resin composition, an optical filter, a solid-state imaging device, and an image display device.

In recent years, with the popularization of digital cameras and mobile phones with cameras, etc., the demand for solid-state imaging devices such as charge-coupled device (CCD) image sensors has increased significantly. As a core device of a display or an optical element, a color filter is used.

A color filter is manufactured using a resin composition containing a color material. For example, Patent Document 1 describes manufacturing a color filter using a colored photosensitive resin composition containing a dye, a pigment, a resin, a polymerizable compound, a polymerization initiator, and an ultraviolet absorber.

[Patent Document 1] Japanese Patent Laid-Open No. 2012-181505

When a film is produced using a resin composition containing a coloring material, a film may be produced using the resin composition after storage.

However, if the temporal stability of the resin composition is insufficient, the coloring material and the like will aggregate during storage of the resin composition, and the viscosity of the resin composition will tend to increase over time. Furthermore, even when a film is formed under the same film forming conditions, as the storage period of the resin composition becomes longer, the difference in thickness (film thickness difference) from the film when the newly produced resin composition is used becomes smaller. Easy to get bigger.

In recent years, higher performance has been demanded for the temporal stability of resin compositions, and further reduction in the change in viscosity over time and the above-mentioned difference in film thickness has been demanded.

Therefore, an object of the present invention is to provide a resin composition excellent in temporal stability. Also, an object of the present invention is to provide a film, an optical filter, a solid-state imaging device, and an image display device.

The present invention provides the following. <1> A resin composition containing a coloring material, an ultraviolet absorber and a resin, The above-mentioned ultraviolet absorber includes an ultraviolet absorber having a base, and the ultraviolet absorber having the above-mentioned base is selected from benzophenone compounds, benzoate compounds, benzotriazole compounds, trioxane compounds, and cyanoacrylates. at least one of the compounds, The aforementioned resins include resins having acid groups. <2> The resin composition as described in <1>, wherein The ultraviolet absorber having the above-mentioned base is an ultraviolet absorber having an amine group. <3> The resin composition as described in <1> or <2>, wherein The ultraviolet absorber having the above base is a benzotriazole compound. <4> The resin composition according to any one of <1> to <3>, wherein The molecular weight of the ultraviolet absorber which has the said base is 500 or less. <5> The resin composition according to any one of <1> to <4>, further comprising a polymerizable compound and a photopolymerization initiator. <6> The resin composition according to any one of <1> to <5>, wherein The above-mentioned color material contains a dye. <7> A film obtained using the resin composition according to any one of <1> to <6>. <8> An optical filter comprising the film described in <7>. <9> A solid-state imaging device including the film according to <7>. <10> An image display device comprising the film according to <7>. [Invention effect]

The present invention can provide a resin composition excellent in stability over time. Also, the present invention can provide a film, an optical filter, a solid-state imaging device, and an image display device.

Hereinafter, the content of the present invention will be described in detail. In this specification, "-" is used in the meaning which includes the numerical value described before and after it as a lower limit and an upper limit. In the notation of a group (atomic group) in this specification, the notation indicating substituted and unsubstituted includes a group (atomic group) without a substituent, and also includes a group (atomic group) having a substituent. For example, "alkyl" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. In addition, examples of light used for exposure include the bright line spectrum of a mercury lamp, extreme ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV light), X-rays, electron beams, and other actinic rays or radiation. In this specification, "(meth)acrylate" means both or either of acrylate and methacrylate, and "(meth)acrylic acid" means both or either of acrylic acid and methacrylic acid, "(Meth)acryl" means both or either of acryl and methacryl. In this specification, the symbols (such as A, B, and C, etc.) attached before or after the name are terms used to distinguish the constituent elements, and do not limit the types, quantities, and pros and cons of the constituent elements. . In this specification, Me in the structural formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, the weight average molecular weight and number average molecular weight are polystyrene conversion values measured by the GPC (gel permeation chromatography) method. In this specification, the total solid content refers to the total mass of components excluding solvents from all the components of the composition. In this specification, the term "step" not only includes independent steps, but also includes in this term as long as the expected function of the step is achieved even if it cannot be clearly distinguished from other steps. .

＜Resin composition＞ The resin composition of the present invention contains a coloring material, an ultraviolet absorber, and a resin, and the above-mentioned resin composition is characterized by, The above-mentioned ultraviolet absorber includes an ultraviolet absorber having a base, and the ultraviolet absorber having the above-mentioned base is selected from benzophenone compounds, benzoate compounds, benzotriazole compounds, trioxane compounds, and cyanoacrylates. at least one of the compounds, The aforementioned resins include resins having acid groups.

The resin composition of the present invention is excellent in stability over time. That is, the viscosity of the resin composition of the present invention has little change over time, and an increase in the viscosity of the resin composition can be suppressed even after long-term storage. In addition, even when a film is formed under the same film-forming conditions using the resin composition just produced and the resin composition after storage, the difference in thickness (film thickness difference) of the obtained film is small, and it is possible to suppress Variation in the thickness of the film obtained. The detailed reason for obtaining such an effect is not clear, but it is presumed that the reason is as follows: the resin composition of the present invention contains an ultraviolet absorber having the above-mentioned base group and a resin having an acid group, so it is easy to form in the resin composition. Color material-ultraviolet absorber with base-resin network with acid group can inhibit the aggregation of color material.

Moreover, by using the resin composition of this invention, the film excellent in light resistance can be formed. The reason for this is presumed to be as follows: by using a UV absorber having the above-mentioned base as the UV absorber, the UV absorber is likely to exist near the color material in the film, and the decomposition of the color material by light irradiation can be effectively suppressed. Or modification, etc.

The resin composition of the present invention can be preferably used as a resin composition for optical filters. As an optical filter, a color filter, a near-infrared ray transmission filter, a near-infrared ray cut filter, etc. are mentioned, A color filter is preferable. Moreover, the resin composition of this invention can be used suitably as the resin composition for solid-state imaging devices. More specifically, it can be preferably used as a resin composition for an optical filter used in a solid-state imaging device, and can be more preferably used as a resin composition for forming colored pixels of a color filter used in a solid-state imaging device.

As a color filter, the filter which has the colored pixel which transmits the light of a specific wavelength is mentioned. Examples of colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels. Colored pixels of the color filter can be formed using a resin composition containing a color material.

The maximum absorption wavelength of the near-infrared cut filter is preferably in a wavelength range of 700 to 1800 nm, more preferably in a wavelength range of 700 to 1300 nm, and still more preferably in a wavelength range of 700 to 1000 nm. In addition, the transmittance of the near-infrared cut filter is preferably 70% or more in the entire wavelength range of 400 to 650 nm, more preferably 80% or more, and still more preferably 90% or more. Also, the transmittance at at least one point in the wavelength range of 700 to 1800 nm is preferably 20% or less. In addition, the ratio of the absorbance Amax at the maximum absorption wavelength of the near-infrared cut filter to the absorbance A550 at a wavelength of 550 nm (absorbance Amax/absorbance A550) is preferably 20 to 500, more preferably 50 to 500, and 70 to 450. More preferably, 100-400 is especially preferable. The near-infrared cut filter can be formed using a resin composition containing a near-infrared absorbing color material.

The near-infrared transmission filter is a filter that transmits at least part of near-infrared rays. The near-infrared transmission filter may be a filter (transparent film) that transmits either visible light or near-infrared rays, or may be a filter that blocks at least part of visible light and transmits at least part of near-infrared rays. As a near-infrared ray transmission filter, it is preferable to mention that the maximum value of transmittance in the range of wavelength 400-640nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the wavelength is 1100-640nm. Filters and the like having spectral characteristics in which the minimum transmittance in the range of 1300 nm is 70% or more (preferably 75% or more, more preferably 80% or more). The near-infrared transmission filter is preferably a filter that satisfies any one of the following spectral characteristics (1) to (5). (1): The maximum value of the transmittance in the wavelength range of 400 to 640 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 800 to 1500 nm The filter is more than 70% (preferably more than 75%, more preferably more than 80%). (2): The maximum value of the transmittance in the wavelength range of 400 to 750 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 900 to 1500 nm The filter is more than 70% (preferably more than 75%, more preferably more than 80%). (3): The maximum value of the transmittance in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 1000 to 1500 nm The filter is more than 70% (preferably more than 75%, more preferably more than 80%). (4): The maximum value of the transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 1100 to 1500 nm The filter is more than 70% (preferably more than 75%, more preferably more than 80%). (5): The maximum value of the transmittance in the wavelength range of 400-1050 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 1200-1500 nm The filter is more than 70% (preferably more than 75%, more preferably more than 80%).

It is preferable that the solid content concentration of the resin composition of this invention is 5-30 mass %. The lower limit is preferably at least 7.5% by mass, more preferably at least 10% by mass. The upper limit is preferably at most 25% by mass, more preferably at most 20% by mass, and still more preferably at most 15% by mass.

Hereinafter, each component used for the resin composition of this invention is demonstrated.

＜＜Color material＞＞ The resin composition of the present invention contains a coloring material. Examples of the color material include a white color material, a black color material, a colored color material, and a near-infrared absorption color material. Furthermore, in this specification, the white color material includes not only pure white, but also light gray color materials close to white (such as off-white, thin gray, etc.).

It is preferable that the coloring material contains at least one selected from the group consisting of colored coloring material, black coloring material and near-infrared absorbing coloring material, and it is more preferable that it includes a coloring coloring material.

Moreover, it is also preferable that the color material contains two or more kinds of color color materials and near-infrared absorption color materials. Also, black may be formed by a combination of two or more color materials. In addition, it is also preferable that the color material includes a black color material and a near-infrared absorption color material. According to these aspects, the resin composition of the present invention can be preferably used as a resin composition for forming a near infrared transmission filter. For the combination of two or more color materials to form black color materials, refer to JP-A-2013-077009, JP-A-2014-130338, International Publication No. 2015/166779, and the like.

Moreover, it is also preferable that a color material is substantially only a color color material. According to this aspect, a color filter having high color value and excellent color separation ability can be formed. Furthermore, in this specification, when the color material is essentially only a color material, it means that the content of the color color material in the color material is 99 mass % or more, preferably 99.9 mass % or more, and the color material is only a color color material. The material is better.

The color material can be a pigment or a dye. The average primary particle size of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably at most 180 nm, more preferably at most 150 nm, and still more preferably at most 100 nm. In addition, in this specification, the primary particle diameter of a pigment can be calculated|required from the image photograph obtained by observing the primary particle of a pigment with a transmission electron microscope. Specifically, the projected area of the primary particle of the pigment is obtained, and the equivalent circle diameter corresponding thereto is calculated as the primary particle diameter of the pigment. Moreover, the average primary particle diameter in this specification is made into the arithmetic mean value about the primary particle diameter of the primary particle of 400 pigments. In addition, the primary particle of the pigment refers to unaggregated independent particles. Furthermore, in this specification, a pigment refers to a color material that is difficult to dissolve in a solvent. The solubility of the pigment in 100 g of water at 23°C and in 100 g of cyclohexanone at 23°C is preferably less than 1 g. Moreover, in this specification, a dye means the color material which dissolves in water or an organic solvent. The solubility of the dye in 100 g of cyclohexanone at 23° C. is preferably 1 g or more, more preferably 5 g or more. The crystallite size calculated from the half-value width of the peak originating from an arbitrary crystal plane in the X-ray diffraction spectrum when the CuKα ray of the pigment is used as the X-ray source is preferably 0.1nm to 100nm, and 0.5nm to 50nm. More preferably, 1 nm to 30 nm is still more preferable, and 5 nm to 25 nm is particularly preferable.

As a preferable aspect of the coloring material used for a resin composition, the aspect using what contains a dye as a coloring material is mentioned. By using what contains a dye as a color material, the color unevenness of a film can be suppressed further. In this aspect, the content of the dye in the color material is preferably at least 20% by mass, more preferably at least 35% by mass, and still more preferably at least 40% by mass. The upper limit can be set to 100% by mass or less. The color material can be dyes only in essence. According to this aspect, the color unevenness of a film can be suppressed further. Furthermore, in this specification, when the color material is substantially only a dye, it means that the content of the dye in the color material is 99% by mass or more, preferably 99.9% by mass or more, and more preferably the color material is only a dye. The color material may contain pigments and dyes. When using a pigment and a dye together, it is preferable that content of a dye is 10-80 mass parts with respect to 100 mass parts of pigments. The upper limit is preferably 70 parts by mass or less, more preferably 60 parts by mass or less. The lower limit is preferably at least 15 parts by mass, more preferably at least 20 parts by mass.

In addition, the color material may be substantially only a pigment. According to this aspect, the reliability of the obtained film can be further improved. Furthermore, in this specification, the case where the color material is substantially only a pigment means that the content of the pigment in the color material is 99% by mass or more, preferably 99.9% by mass or more, and more preferably the color material is only a pigment.

(color material) As a color material, the color material which has a maximum absorption wavelength in the wavelength range of 400-700 nm is mentioned. For example, a green color material, a red color material, a yellow color material, a purple color material, a blue color material, an orange color material, etc. are mentioned.

Examples of the green color material include phthalocyanine compounds and squarylium compounds, and phthalocyanine compounds are preferred. Specific examples of green color materials include green pigments such as C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, and 66. Also, as a green color material, a zinc halide phthalocyanine pigment with an average number of halogen atoms of 10 to 14, an average number of bromine atoms of 8 to 12, and an average number of chlorine atoms of 2 to 5 in one molecule can also be used. . Specific examples include compounds described in International Publication No. 2015/118720. In addition, as a green color material, the compound described in the specification of Chinese Patent Application No. 106909027, the phthalocyanine compound having a phosphoric acid ester as a ligand described in International Publication No. 2012/102395, Japanese Patent Laid-Open 2019 - Phthalocyanine compounds described in JP-A No. 008014, phthalocyanine compounds described in JP-A No. 2018-180023, compounds described in JP-A No. 2019-038958, JP-A No. 2020-070426 Aluminum phthalocyanine compounds described in JP 2020-076995 A, core-shell pigments described in JP 2020-076995 A, diarylmethane compounds described in JP 2020-504758 A, etc.

The green color materials are C.I. Pigment Green 7, 36, 58, 59, 62, 63 are better, and C.I. Pigment Green 7, 36, 58 are more preferable.

Examples of red coloring materials include diketopyrrolopyrrole compounds, anthraquinone compounds, azo compounds, naphthol compounds, methimine compounds, ketone compounds, quinacridone compounds, perylene compounds, and thioindigo compounds. A diketopyrrolopyrrole compound, an anthraquinone compound, and an azo compound are preferable, and a diketopyrrolopyrrole compound is more preferable. Also, it is preferable that the red color material is a pigment. Specific examples of red color materials include C.I. (Color Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41 , 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1 , 66, 67, 81:1, 81:2, 81:3, 81:4, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168 ,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226 , 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294, 295, 296, 297 and other red pigments. In addition, as a red coloring material, diketopyrrolopyrrole compounds in which at least one bromine atom is substituted in the structure described in JP-A-2017-201384 and in paragraphs 0016 to 0022 of JP-A-6248838 can also be used. The diketopyrrolopyrrole compound described, the diketopyrrolopyrrole compound described in International Publication No. 2012/102399, the diketopyrrolopyrrole compound described in International Publication No. 2012/117965, JP 2020 - Brominated diketopyrrolopyrrole compounds described in Gazette No. 085947, naphthol azo compounds described in JP 2012-229344 Gazette, red coloring materials described in JP 6516119 Gazette, Japan The red color material described in Patent No. 6525101, the brominated diketopyrrolopyrrole compound described in paragraph 0229 of Japanese Patent Application Laid-Open No. 2020-090632, and the brominated diketopyrrolopyrrole compound described in Korean Laid-Open Patent No. Anthraquinone compounds described in Korean Laid-Open Patent No. 10-2019-0140744, perylene compounds described in Japanese Patent Laid-Open No. 2020-079396, and Japanese Patent Laid-Open No. 2020-083982 Perylene compounds described in JP-A-2018-035345, diketopyrrolopyrrole compounds described in paragraphs 0025-0041 of JP-A-2020-066702, etc. Also, as a red coloring material, a compound having a structure in which an aromatic ring group obtained by introducing a group bonded to an oxygen atom, a sulfur atom, or a nitrogen atom into an aromatic ring is bonded to two Ketopyrrolopyrrole skeleton. As a red color material, Lumogen F Orange 240 (manufactured by BASF, red pigment, perylene pigment) can also be used.

The red color material is C.I. Pigment Red 81:4, 122, 177, 254, 264, 269, 272 is better, and C.I. Pigment Red 122, 177, 254, 264, 272 is better.

As a yellow coloring material, an azo compound, an imine compound, an isoindoline compound, a pteridine compound, a quinoline yellow compound, a perylene compound, etc. are mentioned. It is better that yellow color material is pigment, and azo pigment, methyl imine pigment, isoindoline pigment, pteridine pigment, quinoline yellow pigment or perylene pigment are better, azo pigment or isoindoline pigment are further better. Specific examples of yellow color materials include C.I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, 236, etc. yellow paint.

Moreover, the nickel azobarbiturate complex compound of the following structure can also be used as a yellow color material. [chemical formula 1]

In addition, as a yellow coloring material, compounds described in JP-A-2017-201003, compounds described in JP-A-2017-197719, compounds 0011-0062 in JP-A-2017-171912 can also be used. Paragraphs, compounds described in paragraphs 0137-0276, compounds described in paragraphs 0010-0062, 0138-0295 of JP-A-2017-171913, paragraphs 0011-0062 of JP-A-2017-171914, Compounds described in paragraphs 0139 to 0190, compounds described in paragraphs 0010 to 0065, 0142 to 0222 of JP-A-2017-171915, and paragraphs 0011-0034 of JP-A-2013-054339 The quinophthalone compound, the quinophthalone compound described in paragraphs 0013 to 0058 of JP-A-2014-026228, the isoindoline compound described in JP-A-2018-062644, JP-A-2018 -The quinophthalone compound described in Gazette No. 203798, the quinophthalone compound described in JP-A-2018-062578, the quinophthalone compound described in JP-A-6432076, JP-A-2018- The quinophthalone compound described in Gazette No. 155881, the quinophthalone compound described in JP-A No. 2018-111757, the quinophthalone compound described in JP-A No. 2018-040835, JP-A-2017 - The quinophthalone compound described in Gazette No. 197640, the quinophthalone compound described in JP-A-2016-145282, the quinophthalone compound described in JP-A-2014-085565, JP-A The quinophthalone compound described in the 2014-021139 communique, the quinophthalone compound described in the Japanese Patent Application Publication No. 2013-209614, the quinophthalone compound described in the Japanese Patent Application Publication No. The quinophthalone compound described in the publication No. 2013-181015, the quinophthalone compound described in the Japanese Patent Application Publication No. 2013-061622, the quinophthalone compound described in the Japanese Patent Application Publication No. The quinophthalone compound described in Japanese Patent Application Laid-Open No. 2012-226110, the quinophthalone compound described in Japanese Patent Application Laid-Open No. 2008-074987, the quinophthalone compound described in Japanese Patent Application Laid-Open No. 2008-081565, The quinophthalone compound described in JP-A-2008-074986, the quinophthalone compound described in JP-A-2008-074985, and the quinophthalone compound described in JP-A-2008-050420 , the quinophthalone compound described in Japanese Patent Application Laid-Open No. 2008-031281, the quinophthalone compound described in Japanese Patent Application Publication No. 48-032765, and the quinophthalone compound described in Japanese Patent Application Laid-Open No. 2019-008014 Compounds, quinophthalone compounds described in Japanese Patent No. 6607427, compounds described in Korean Laid-Open Patent No. 10-2014-0034963, compounds described in Japanese Patent Laid-Open No. 2017-095706, Taiwan patents Compounds described in Application Publication No. 201920495, compounds described in Japanese Patent No. 6607427, compounds described in Japanese Patent Laid-Open No. 2020-033525, compounds described in Japanese Patent Laid-Open No. 2020-033524 Compounds, compounds described in JP 2020-033523 A, compounds described in JP 2020-033522 A, compounds described in JP 2020-033521 A, International Publication No. 2020/045200 The compounds described in International Publication No. 2020/045199, the compounds described in International Publication No. 2020/045197, the azo compounds described in Japanese Patent Application Laid-Open No. 2020-093994, the international The perylene compound described in Publication No. 2020/105346, the quinophthalone compound described in Japanese PCT Publication No. 2020-517791, the compound represented by the following formula (QP1), and the compound represented by the following formula (QP2) compound. Moreover, from the viewpoint of improving the color value, those obtained by multimerizing these compounds can also be preferably used. [chemical formula 2]

In formula (QP1), X ¹ to X ¹⁶ each independently represent a hydrogen atom or a halogen atom, and Z ¹ represents an alkylene group having 1 to 3 carbon atoms. Specific examples of the compound represented by the formula (QP1) include compounds described in paragraph 0016 of Japanese Patent No. 6443711. [chemical formula 3]

In formula (QP2), Y ¹ to Y ³ each independently represent a halogen atom. n and m represent the integer of 0-6, and p represents the integer of 0-5. (n+m) is 1 or more. Specific examples of the compound represented by the formula (QP2) include compounds described in paragraphs 0047 to 0048 of Japanese Patent No. 6432077.

The yellow color materials are C.I. Pigment Yellow 129, 138, 139, 150, 185, 231, and 233, and C.I. Pigment Yellow 129, 139, 150, and 185 are more preferable.

Examples of orange color materials include C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61 , 62, 64, 71, 73 and other orange pigments.

Examples of the purple coloring material include star compounds, quinacridone compounds, diacid compounds, pyrromethene compounds, and the like, and star compounds, quinacridone compounds, and diacid compounds are preferred. Specific examples of purple color materials include purple pigments such as C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61. The purple color material is C.I. Pigment Violet 23, which is better.

A phthalocyanine compound is mentioned as a blue color material. Specific examples of blue color materials include C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, 88 and other blue pigments. In addition, an aluminum phthalocyanine compound having a phosphorus atom can also be used as a blue color material. Specific examples include compounds described in paragraphs 0022 to 0030 of JP-A-2012-247591 and paragraphs 0047 of JP-A-2011-157478.

The blue color material is C.I. Pigment Blue 15:3, 15:4, 15:6, 16 is better.

Dyes can also be used as coloring materials. The dye is not particularly limited, and known dyes can be used. Examples include pyrazole azo series, anilino azo series, triarylmethane series, anthraquinone series, anthrapyridone series, benzylidene series, oxonol series, pyrazolotriazole azo series, pyridine Ketoazo-based, cyanine-based, pyrrolopyrazole-based azo-based, pyrrolopyrazole-based azo-based, phthalocyanine-based, benzopyran-based, indigo-based, pyrromethene-based and other dyes.

A pigment multimer can also be used for a color material. It is preferable that the dye multimer is used as a dye dissolved in an organic solvent. Also, pigment multimers may form particles. When the pigment multimer is a particle, it is usually used in a dispersed state in a solvent. The pigment multimer in a particulate state can be obtained, for example, by emulsion polymerization, and specific examples thereof include compounds and production methods described in JP-A-2015-214682. The pigment multimer has two or more pigment structures in one molecule, preferably three or more pigment structures. The upper limit is not particularly limited, but can also be set to 100 or less. The plural pigment structures contained in one molecule may be the same pigment structure or different pigment structures. The weight average molecular weight (Mw) of the pigment multimer is preferably 2,000 to 50,000. The lower limit is more preferably 3000 or more, and more preferably 6000 or more. The upper limit is more preferably 30,000 or less, and further preferably 20,000 or less. As the pigment polymer, JP-A-2011-213925, JP-A-2013-041097, JP-A-2015-028144, JP-A-2015-030742, and International Publication No. 2016/031442 can also be used. Compounds described in et al.

The diarylmethane compound described in Japanese PCT Publication No. 2020-504758, the triarylmethane dye polymer described in Korean Laid-Open Patent No. 10-2020-0028160, and JP-A-2020 can be used as color materials. - The star compound described in Publication No. 117638, the phthalocyanine compound described in International Publication No. 2020/174991, the isoindoline compound described in Japanese Patent Application Laid-Open No. 2020-160279, or their salts , the compound represented by Formula 1 described in Korean Laid-Open Patent No. 10-2020-0069442, the compound represented by Formula 1 described in Korean Laid-Open Patent No. 10-2020-0069730, and the compound represented by Formula 1 described in Korean Laid-Open Patent No. 10 - Compounds represented by Formula 1 described in Publication No. 2020-0069070, Compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069067, Korean Patent Publication No. 10-2020-0069062 The compound represented by formula 1 described in , the zinc halide phthalocyanine pigment described in Patent No. 6809649, and the isoindoline compound described in Japanese Patent Application Laid-Open No. 2020-180176. The color material can be a rotaxane, and the pigment skeleton can be used in a cyclic structure of a rotaxane, a rod structure, or both structures.

Two or more kinds of color materials may be used in combination. Moreover, when using 2 or more types of color color materials in combination, you may form black with the combination of 2 or more types of color color materials. Examples of such combinations include the following aspects (1) to (7). (1) The form that contains red color material and blue color material. (2) Forms containing red color material, blue color material and yellow color material. (3) Forms containing red color material, blue color material, yellow color material and purple color material. (4) Forms containing red color material, blue color material, yellow color material, purple color material and green color material. (5) Forms containing red color material, blue color material, yellow color material and green color material. (6) Forms containing red color material, blue color material and green color material. (7) Forms containing yellow and purple color materials.

(white color material) Examples of white color materials include titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silicon dioxide, talc, mica, aluminum hydroxide, calcium silicate, Aluminum silicate, zinc sulfide and other inorganic pigments (white pigments). The white pigment is preferably particles having titanium atoms, more preferably titanium oxide. In addition, the white pigment is preferably particles having a refractive index of 2.10 or higher with respect to light having a wavelength of 589 nm. The aforementioned refractive index is preferably from 2.10 to 3.00, more preferably from 2.50 to 2.75.

In addition, as the white pigment, titanium oxide described in "Titanium Oxide Physical Properties and Applied Technology, Kiyono Gakushu, pp. 13-45, June 25, 1991, Gihodo Publishing" can also be used.

The white pigment is not limited to a single inorganic substance, and particles compounded with other materials may also be used. For example, particles with pores or other materials inside, particles with a plurality of inorganic particles attached to the core particle, core and core composite particles composed of a core particle including polymer particles and a shell layer including inorganic nanoparticles are used. better. As a core-core composite particle composed of a core particle including the above-mentioned polymer particles and an exinity layer including inorganic nanoparticles, for example, reference can be made to the descriptions in paragraphs 0012 to 0042 of JP-A-2015-047520, which are described in incorporated into this manual.

Hollow inorganic particles can also be used as a white pigment. The hollow inorganic particle refers to an inorganic particle having a structure of a cavity inside, and refers to an inorganic particle having a cavity surrounded by an outer shell. Examples of the hollow inorganic particles include hollow inorganic particles described in JP-A-2011-075786, International Publication No. 2013/061621, JP-A-2015-164881, etc., and these contents are incorporated in this specification. .

(black color material) It does not specifically limit as a black color material, A well-known thing can be used. It is preferable that the black color material is a pigment (black pigment). In addition, in this specification, a black color material means the color material which shows absorption in the whole range of wavelength 400-700nm. For example, carbon black, titanium black, graphite, etc. are mentioned as an inorganic black color material, Carbon black and titanium black are preferable, and titanium black is more preferable. Titanium black is black particles containing titanium atoms, preferably subvalent titanium oxide or titanium oxynitride. The surface of titanium black can be modified as needed for the purpose of improving dispersibility, suppressing coagulation, and the like. For example, the surface of titanium black can be coated with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide or zirconium oxide. In addition, treatment with a water-repellent substance as disclosed in JP-A-2007-302836 can also be performed. As a black color material, color index (C.I.) Pigment Black 1, 7 can also be used. Regarding titanium black, it is preferable that both the primary particle diameter and the average primary particle diameter of each particle are small. Specifically, the average primary particle diameter is preferably 10 to 45 nm. Titanium black can also be used as a dispersion. For example, a dispersion containing titanium black particles and silica particles and adjusting the content ratio of Si atoms to Ti atoms in the dispersion to be in the range of 0.20 to 0.50, etc. may be mentioned. Regarding the above-mentioned dispersion, the description in paragraphs 0020 to 0105 of JP-A-2012-169556 can also be referred to, and the content is incorporated in this specification. Examples of commercially available titanium black include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R-N, 13M-T (product name: manufactured by Mitsubishi Materials Corporation), Tilack D (product name: Ako Kasei Co., Ltd.), etc.

Examples of the organic black coloring material include bisbenzofuranone compounds, imine compounds, perylene compounds, and azo compounds, among which bisbenzofuranone compounds and perylene compounds are preferred. Examples of the bisbenzofuranone compound include JP 2010-534726, JP 2012-515233, JP 2012-515234, International Publication No. 2014/208348, JP 2015 - The compound described in Publication No. 525260 etc. is available as "Irgaphor Black" manufactured by BASF Corporation, for example. C.I. Pigment Black 31, 32 etc. are mentioned as a perylene compound. Examples of the methylimine compound include compounds described in JP-A-01-170601, JP-A-02-034664, etc., for example, as "CHROMOFINE" manufactured by Dainichiseika Color & Chemicals Mfg.Co., Ltd. BLACK A1103". In addition, Perylene Black (Lumogen Black FK4280, etc.) described in paragraphs 0016 to 0020 of JP-A-2017-226821 can also be used as an organic black coloring material.

(Near-infrared-absorbing color material) The near-infrared-absorbing color material is preferably a compound in which the maximum absorption wavelength exists within a wavelength range from 700 nm to 1400 nm. The maximum absorption wavelength of the near-infrared absorbing color material is preferably 1200 nm or less, more preferably 1000 nm or less, and still more preferably 950 nm or less. The near-infrared absorbing color material is a ratio of the absorbance A ₅₅₀ at a wavelength of 550nm to the absorbance A _max at the maximum absorption wavelength, that is, A ₅₅₀ /A _max is preferably 0.1 or less, more preferably 0.05 or less, and even more preferably 0.03 or less , below 0.02 is especially good. The lower limit is not particularly limited, and may be, for example, 0.0001 or more, or 0.0005 or more. The near-infrared absorbing color material can be a pigment or a dye, preferably a pigment, and more preferably an organic pigment.

The near-infrared absorbing color material is not particularly limited, and examples thereof include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, and merocyanine compounds. Chlorine compounds, crotonium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, imine compounds, anthraquinone compounds, dibenzofuranone Compounds, disulfide metal complexes, etc. Examples of the pyrrolopyrrole compound include compounds described in paragraphs 0016 to 0058 of JP-A-2009-263614 , compounds described in paragraphs 0037-0052 of JP-A-2011-068731 , International Publication No. Compounds described in paragraphs 0010 to 0033 of No. 2015/166873, etc. Examples of squarylium compounds include compounds described in paragraphs 0044 to 0049 of Japanese Patent Application Laid-Open No. 2011-208101, compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169, International Publication No. 2016/ Compounds described in Paragraph 0040 of No. 181987, compounds described in JP-A No. 2015-176046, compounds described in Paragraph 0072 of International Publication No. 2016/190162, compounds described in JP-A No. 2016-074649 Compounds described in paragraphs 0196 to 0228, compounds described in paragraph 0124 of JP-A-2017-067963, compounds described in International Publication No. 2017/135359, JP-A-2017-114956 Compounds described, compounds described in Japanese Patent No. 6197940, compounds described in International Publication No. 2016/120166, etc. Examples of cyanine compounds include compounds described in paragraphs 0044 to 0045 of JP 2009-108267 A, compounds described in paragraphs 0026 to 0030 of JP 2002-194040 A, JP 2015 - Compounds described in Publication No. 172004, Compounds described in Japanese Patent Application Laid-Open No. 2015-172102, Compounds described in Japanese Patent Application Publication No. 2008-088426, Paragraph 0090 of International Publication No. 2016/190162 Compounds described, compounds described in JP-A-2017-031394, etc. Examples of the crotonium compound include compounds described in JP-A-2017-082029. Examples of iminium compounds include compounds described in JP-A-2008-528706, compounds described in JP-A-2012-012399, and compounds described in JP-A-2007-092060 . Compounds described in paragraphs 0048 to 0063 of International Publication No. 2018/043564. Examples of the phthalocyanine compound include compounds described in paragraph 0093 of JP-A-2012-077153, phthalocyanine-titanium compounds described in JP-A-2006-343631, JP-A-2013-195480 Compounds described in paragraphs 0013 to 0029, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, and compounds described in International Publication No. 2020/071470. As a naphthalocyanine compound, the compound described in paragraph 0093 of Unexamined-Japanese-Patent No. 2012-077153 is mentioned. Examples of the dithioalkene metal complexes include compounds described in Japanese Patent No. 5733804 .

In addition, as a near-infrared absorbing coloring material, squarylium compounds described in JP-A-2017-197437, squarylium compounds described in JP-A-2017-025311, International Publication No. 2016 The squaraine compound described in /154782, the squaraine compound described in Japanese Patent No. 5884953, the squaraine compound described in Japanese Patent No. 6036689, the squaraine compound described in Japanese Patent No. 5810604 The squaraine compound described, the squaraine compound described in paragraphs 0090 to 0107 of International Publication No. 2017/213047, the compound containing a pyrrole ring described in paragraphs 0019 to 0075 of JP-A-2018-054760 , Compounds containing a pyrrole ring described in paragraphs 0078 to 0082 of JP-A-2018-040955, compounds containing a pyrrole ring described in paragraphs 0043-0069 of JP-A-2018-002773, JP-A A squarylium compound having an aromatic ring at the amide α-position described in paragraphs 0024 to 0086 of Publication No. 2018-041047, an amide-linked squarylium compound described in Japanese Patent Laid-Open Publication No. 2017-179131, Japan A compound having a pyrrole double-type squaraine skeleton or a crotonium skeleton described in JP-A-2017-141215, a dihydroxycarbazole-type squaraine compound described in JP-A-2017-082029, Asymmetric compounds described in paragraphs 0027 to 0114 of JP-A-2017-068120, pyrrole-ring-containing compounds (carbazole-type) described in JP-A-2017-067963, JP-A-6251530 Phthalocyanine compounds described in the gazette, squarylium compounds described in Japanese Patent Laid-Open No. 2020-075959, copper complexes described in Korean Laid-Open Patent No. 10-2019-0135217, etc.

It is preferable that content of the coloring material in the total solid content of a resin composition is 20-80 mass %. The lower limit is preferably at least 30% by mass, more preferably at least 40% by mass, and still more preferably at least 50% by mass. The upper limit is preferably at most 75% by mass, more preferably at most 70% by mass. The resin composition of this invention may contain only 1 type of coloring material, and may contain 2 or more types. When containing two or more kinds of color materials, it is preferable that the total amount is within the above-mentioned range.

＜＜Resin＞＞ The resin composition of the present invention contains a resin. The resin is blended, for example, for dispersing a pigment or the like in a resin composition or for a binder. In addition, the resin mainly used for dispersing a pigment is also called a dispersant. However, such use of the resin is an example, and it can also be used for purposes other than such a use.

The weight average molecular weight (Mw) of the resin is preferably 3,000 to 2,000,000. It is better if the upper limit is less than 1,000,000, and it is especially good if it is less than 500,000. The lower limit is more preferably 4,000 or more, and particularly preferably 5,000 or more.

Examples of resins include (meth)acrylic resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polyrheum resins, polyether resins, polyphenylene resins, and polyarylene resins. Ether phosphine oxide resins, polyimide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, etc. Among these resins, one type may be used alone, or two or more types may be used in combination. In addition, the resins described in paragraphs 0041 to 0060 of JP-A-2017-206689, the resins described in paragraphs 0022-0071 of JP-A-2018-010856, and the resins described in JP-A-2017-057265 can also be used. The resin described in the gazette, the resin described in JP-A-2017-032685, the resin described in JP-A-2017-075248, the resin described in JP-A-2017-066240.

(resin with acid groups) In the resin composition of this invention, what contains the resin which has an acidic group as a resin is used. A resin having an acid group may be included as a dispersant, or may be included as a binder. A resin having an acid group can be used, for example, as an alkali-soluble resin.

As the kind of the acid group which the resin which has an acid group has, a carboxyl group, a phosphoric acid group, a sulfonic acid group, a phenolic hydroxyl group etc. are mentioned, A carboxyl group is preferable.

The resin having an acidic group preferably contains repeating units having an acidic group on the side chain, and more preferably contains 5 to 70 mol % of repeating units having an acidic group on the side chain in all the repeating units of the resin. The upper limit of the content of the repeating unit having an acid group on the side chain is preferably 50 mol % or less, more preferably 30 mol % or less. The lower limit of the content of the repeating unit having an acid group in the side chain is preferably 10 mol % or more, more preferably 20 mol % or more.

The acid value of the resin with acid groups is preferably 30-500 mgKOH/g. The lower limit is more preferably 40 mgKOH/g or more, and particularly preferably 50 mgKOH/g or more. The upper limit is more preferably 400 mgKOH/g or less, further preferably 300 mgKOH/g or less, and particularly preferably 200 mgKOH/g or less. The weight average molecular weight (Mw) of the resin having an acid group is preferably from 5,000 to 100,000, more preferably from 5,000 to 50,000. Moreover, it is preferable that the number average molecular weight (Mn) of the resin which has an acid group is 1000-20000.

Resins with acid groups are derived from compounds represented by the following formula (ED1) and/or compounds represented by the following formula (ED2) (hereinafter, these compounds are sometimes also referred to as "ether dimers" .) The repeating unit of the monomer component is also preferred.

[chemical formula 4]

In formula (ED1), R ¹ and R ² each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. [chemical formula 5] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. For details of the formula (ED2), the description in JP 2010-168539 A can be referred to, and the content is incorporated in this specification.

As a specific example of the ether dimer, for example, the description in paragraph 0317 of JP-A-2013-029760 can be referred to, and the content is incorporated in this specification.

It is also preferable that the resin having an acid group contains a repeating unit derived from the compound represented by formula (X). [chemical formula 6] In the formula, ^R1 represents a hydrogen atom or a methyl group, ^R21 and ^R22 each independently represent an alkylene group, and n represents an integer of 0-15. The carbon number of the alkylene group represented by R ²¹ and R ²² is preferably 1-10, more preferably 1-5, still more preferably 1-3, particularly preferably 2 or 3. n represents an integer of 0-15, preferably an integer of 0-5, more preferably an integer of 0-4, and further preferably an integer of 0-3.

Examples of the compound represented by the formula (X) include ethylene oxide or propylene oxide modified (meth)acrylate of p-cumylphenol, and the like. As a commercial item, ARONIX M-110 (made by TOAGOSEI CO., LTD.) etc. are mentioned.

It is also preferable that the resin having an acid group contains a repeating unit having a polymerizable group. Examples of the polymerizable group include ethylenically unsaturated bond-containing groups and cyclic ether groups, and ethylenically unsaturated bond-containing groups are preferred. Examples of the ethylenically unsaturated bond-containing group include vinyl, (meth)allyl, (meth)acryl, and the like. As a cyclic ether group, an epoxy group, an oxetanyl group, etc. are mentioned.

It is also preferable that the resin with an acid group contains at least one repeating unit selected from the repeating unit represented by formula (Ep-1) and the repeating unit represented by formula (Ep-2) (hereinafter also referred to as repeating unit Ep) . Hereinafter, the resin which has repeating unit Ep is also called resin Ep. Resin Ep may only contain any one of the repeating unit represented by formula (Ep-1) and the repeating unit represented by formula (Ep-2), or may contain repeating units represented by formula (Ep-1) respectively and a repeating unit represented by formula (Ep-2). In the case of repeating units containing both, the ratio of the repeating unit represented by formula (Ep-1) to the repeating unit represented by formula (Ep-2) is calculated in molar ratio, given by formula (Ep-1 ) represented by the repeating unit: the repeating unit represented by the formula (Ep-2)=5:95～95:5 is better, 10:90～90:10 is better, 20:80～80:20 is further good. [chemical formula 7]

In formula (Ep-1) and formula (Ep-2), L ¹ represents a single bond or a divalent linking group, and R ¹ represents a hydrogen atom or a substituent. Examples of the substituent represented by ^R1 include an alkyl group and an aryl group, and an alkyl group is preferred. The carbon number of the alkyl group is preferably 1-10, more preferably 1-5, and still more preferably 1-3. R ¹ is preferably a hydrogen atom or a methyl group. As the divalent linking group represented by ^L1 , an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylylene group (preferably an arylylene group having 6 to 20 carbon atoms), -NH -, -SO-, -SO ₂ -, -CO-, -O-, -COO-, -OCO-, -S-, and groups formed by combining two or more of them. The alkylene group may be any of linear, branched and cyclic, and linear or branched is preferred. In addition, the alkylene group may have a substituent or may be unsubstituted. As a substituent, a hydroxyl group, an alkoxy group, etc. are mentioned.

The content of the repeating unit Ep in the resin Ep is preferably 1 to 90 mol% of all the repeating units in the resin Ep. The upper limit is preferably 80 mol% or less, more preferably 70 mol% or less. The lower limit is preferably at least 2 mol%, more preferably at least 3 mol%.

It is also preferable that the resin having an acid group is a graft resin having an acid group (hereinafter also referred to as an acidic graft resin). By using the graft resin which has an acid group as a resin which has an acid group, the storage stability of a resin composition can be improved further. Acidic graft resins can be preferably used as dispersants. Here, the grafted resin refers to a resin containing a repeating unit having a grafted chain. Also, the graft chain refers to a polymer chain branched and extended from the main chain of the repeating unit. In the graft chain, the number of atoms without hydrogen atoms is preferably 40 to 10,000, more preferably 50 to 2,000 atoms without hydrogen atoms, and still more preferably 60 to 500 atoms without hydrogen atoms.

It is preferable that the graft chain contains at least one repeating unit selected from polyether structure, polyester structure, poly(meth)acrylic acid structure, polystyrene structure, polyurethane structure, polyurea structure and polyamide structure , a repeating unit containing at least one structure selected from a polyether structure, a polyester structure, a poly(meth)acrylic acid structure, and a polystyrene structure is more preferable.

As a repeating unit of a polyester structure, the repeating unit of the structure represented by Formula (G-1), Formula (G-4), or Formula (G-5) is mentioned. As a repeating unit of a polyether structure, the repeating unit of the structure represented by formula (G-2) is mentioned. As a repeating unit of a poly(meth)acrylic acid structure, the repeating unit of the structure represented by formula (G-3) is mentioned. As a repeating unit of a polystyrene structure, the repeating unit of the structure represented by formula (G-6) is mentioned. [chemical formula 8]

In the above formula, R ^G1 and R ^G2 each independently represent an alkylene group. The alkylene group represented by R ^G1 and R ^G2 is not particularly limited, but a linear or branched alkylene group having 1 to 20 carbons is preferred, and a linear or branched alkylene group having 2 to 16 carbons is preferred. A branched chain alkylene group is more preferable, and a linear or branched chain alkylene group having 3 to 12 carbon atoms is still more preferable.

In the above formula, R ^G3 represents a hydrogen atom or a methyl group, Q ^G1 represents -O- or -NH-, L ^G1 represents a single bond or a divalent linking group, and R ^G4 represents a hydrogen atom or a substituent. Examples of the divalent linking group represented by L ^G1 include an alkylene group (preferably an alkylene group having 1 to 12 carbons), an alkyleneoxy group (preferably an alkylene group having 1 to 12 carbons), base), oxyalkylenecarbonyl (preferably oxyalkylenecarbonyl with 1 to 12 carbons), arylylene (preferably arylylene with 6 to 20 carbons), -NH-, -SO- , -SO ₂ -, -CO-, -O-, -COO-, OCO-, -S- and combinations of two or more of them. Examples of substituents represented by R ^G4 include hydroxyl, carboxyl, alkyl, aryl, heterocyclic, alkoxy, aryloxy, heteroepoxy, alkylsulfide, and arylsulfide. , heterocyclic thioether group, group containing ethylenically unsaturated bond, epoxy group, oxetanyl group and blocked isocyanate group, etc.

R ^G5 represents a hydrogen atom or a methyl group, and R ^G6 represents an aryl group. The carbon number of the aryl group represented by R ^G6 is preferably 6-30, more preferably 6-20, and still more preferably 6-12. The aryl group represented by R ^G6 may have a substituent. Examples of substituents include hydroxyl group, carboxyl group, alkyl group, aryl group, heterocyclic group, alkoxy group, aryloxy group, heterocyclic epoxy group, alkyl sulfide group, aryl sulfide group, heterocyclic sulfide group Groups, groups containing ethylenically unsaturated bonds, epoxy groups, oxetanyl groups and blocked isocyanate groups, etc.

The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of substituents include alkyl groups, aryl groups, heteroaryl groups, alkoxy groups, aryloxy groups, heteroaryloxy groups, alkyl sulfide groups, aryl sulfide groups, heteroaryl sulfide groups, and the like. Among them, from the viewpoint of dispersibility of color materials such as pigments, etc., a group having a steric repulsion effect is preferable, and an alkyl group or alkoxy group having 5 to 24 carbon atoms is preferable. The alkyl and alkoxy groups may be linear, branched, or cyclic, and linear or branched are preferred.

As a graft chain, a structure represented by formula (G-1a), formula (G-2a), formula (G-3a), formula (G-4a), formula (G-5a) or formula (G-6a) More preferably, the structure represented by formula (G-1a), formula (G-4a) or formula (G-5a) is more preferred. [chemical formula 9]

In the above formula, R ^G1 and R ^G2 represent an alkylene group, R ^G3 represents a hydrogen atom or a methyl group, Q ^G1 represents -O- or -NH-, L ^G1 represents a single bond or a divalent linking group, R ^G4 represents a hydrogen atom or a substituent, R ^G5 represents a hydrogen atom or a methyl group, R ^G6 represents an aryl group, ^W100 represents a hydrogen atom or a substituent, and n1 to n6 each independently represent an integer of 2 or more. Regarding R ^G1 to R ^G6 , Q ^G1 , and L ^G1 , they have the same meanings as R ^G1 to R ^G6 , Q ^G1 , and L ^G1 described in Formulas (G-1) to (G-6), and their preferred ranges are also the same .

In the formulas (G-1a) to (G-6a), W ¹⁰⁰ is preferably a substituent. Examples of substituents include alkyl groups, aryl groups, heteroaryl groups, alkoxy groups, aryloxy groups, heteroaryloxy groups, alkyl sulfide groups, aryl sulfide groups, heteroaryl sulfide groups, and the like. Among them, from the viewpoint of dispersibility of color materials such as pigments, etc., a group having a steric repulsion effect is preferable, and an alkyl group or alkoxy group having 5 to 24 carbon atoms is preferable. The alkyl and alkoxy groups may be linear, branched, or cyclic, and linear or branched are preferred.

In formulas (G-1a) to (G-6a), n1 to n6 are each preferably an integer of 2 to 100, more preferably an integer of 2 to 80, and still more preferably an integer of 8 to 60.

In formula (G-1a), when n1 is 2 or more, R ^G1 in each repeating unit may be the same as or different from each other. Also, when R ^G1 contains two or more different repeating units, the arrangement of each repeating unit is not particularly limited, and may be any of random, alternate, and end-capped. The same applies to formula (G-2a) to formula (G-6a). Also, the graft chain is preferably a structure represented by formula (G-1a), formula (G-4a) or formula (G-5a), and R ^G1 is a structure including two or more different repeating units.

As the repeating unit having a graft chain, a repeating unit represented by the formula (G-100) can be mentioned. [chemical formula 10]

In the formula, X ^G100 represents a trivalent linking group, L ^G100 represents a single bond or a divalent linking group, and W ¹⁰⁰ represents a grafted chain.

Examples of the trivalent linking group represented by X ^G100 include a poly(meth)acrylic linking group, a polyalkyleneimine linking group, a polyester linking group, a polyurethane linker, and a polyurea linker. Group, polyamide-based linking group, polyether-based linking group, polystyrene-based linking group, etc., poly(meth)acrylic acid-based linking group or polyalkyleneimine-based linking group is preferred.

As the divalent linking group represented by L ^G100 , an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylylene group (preferably an arylylene group having 6 to 20 carbon atoms), -NH -, -SO-, -SO ₂ -, -CO-, -O-, -COO-, OCO-, -S-, and combinations of two or more of these.

Examples of the graft chain represented by W ¹⁰⁰ include the above-mentioned graft chains.

The repeating unit having a grafted chain is preferably a repeating unit represented by formula (G-101) or a repeating unit represented by formula (G-102). [chemical formula 11]

In the formula (G-101), R ^G100 represents a hydrogen atom or an alkyl group, L ^G101 represents a single bond or a divalent linking group, and W ¹⁰¹ represents a graft chain. In the formula (G-102), R ^G101 and R ^G102 each independently represent a hydrogen atom or an alkyl group, L ^G102 represents a single bond or a divalent linking group, and W ¹⁰² represents a graft chain.

L ^G101 and W ¹⁰¹ in formula (G-101) have the same meanings as L ^G100 and W ¹⁰⁰ in formula (G-100). L ^G102 and W ¹⁰² in formula (G-102) have the same meanings as L ^G100 and W ¹⁰⁰ in formula (G-100). The alkyl group represented by R ^G100 of the formula (G-101), and the alkyl groups represented by R ^G101 and R ^G102 of the formula (G-102) preferably have 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, 1 to 3 are further preferred. The alkyl group may be any of straight chain, branched chain and cyclic shape, but straight chain is preferable. R ^G100 is preferably a hydrogen atom or a methyl group, more preferably a methyl group. R ^G101 and R ^G102 are each independently preferably a hydrogen atom or a methyl group, more preferably a hydrogen atom.

The weight average molecular weight of the repeating unit having a graft chain is preferably 1,000 or more, more preferably 1,000 to 10,000, and still more preferably 1,000 to 7,500. In addition, in this specification, the weight average molecular weight of the repeating unit which has a graft chain is the value calculated from the weight average molecular weight of the raw material monomer used for polymerizing the same repeating unit. For example, repeat units with grafted chains can be formed by polymerizing macromonomers. Among them, the macromonomer system refers to a polymer compound in which a polymerizable group is introduced at a polymer terminal. In the case of using a macromonomer to form the repeating unit with grafted chains, the weight average molecular weight of the macromonomer corresponds to the repeating unit with grafted chains.

As the acidic group which the acidic graft resin has, a carboxyl group, a sulfo group, and a phosphoric acid group are mentioned, and a carboxyl group is preferable from a viewpoint of the dispersibility of a pigment. The acid value of the acidic graft resin is preferably 20-150 mgKOH/g. The upper limit is preferably 130 mgKOH/g or less, more preferably 110 mgKOH/g or less. The lower limit is preferably 30 mgKOH/g or more, more preferably 40 mgKOH/g or more.

The weight average molecular weight of the acidic graft resin is preferably from 5,000 to 100,000, more preferably from 10,000 to 50,000, and still more preferably from 10,000 to 30,000. The number average molecular weight (Mn) of the acidic graft resin is preferably from 2,500 to 50,000, more preferably from 5,000 to 30,000, and still more preferably from 5,000 to 15,000.

The acidic graft resin is preferably a resin containing repeating units having graft chains and repeating units having acidic groups. In addition, the acidic graft resin contains more than 1 mol% of repeating units having graft chains among all the repeating units of the acidic grafted resin. It is more preferably 2 mol% or more, and 3 mol% or more for further improvement. The upper limit can be set to 90 mol %, can also be set to 80 mol % or less, can also be set to 70 mol % or less, can also be set to 60 mol % or less, can also be set to 50 mol % or less. In addition, the acidic graft resin contains more than 1 mol % of repeating units having acid groups in all repeating units of the acidic graft resin, it is better to contain 2 mol % or more, and it is more preferable to contain 3 mol % or more. Further better. The upper limit can be set to 90 mol %, can also be set to 80 mol % or less, can also be set to 70 mol % or less, can also be set to 60 mol % or less, can also be set to 50 mol % or less.

The acidic graft resin may further contain other repeating units other than the above. As another repeating unit, the repeating unit etc. which have a polymeric group are mentioned. Examples of the polymerizable group include ethylenically unsaturated bond-containing groups, cyclic ether groups, and the like.

Specific examples of the acidic graft resin include resins described in paragraphs 0025 to 0094 of JP-A-2012-255128 or resins having structures described in Examples described later.

It is also preferable that the resin composition of the present invention contains a resin having an aromatic carboxyl group (hereinafter also referred to as resin Ac) as a resin having an acid group. In resin Ac, the aromatic carboxyl group may be included in the main chain of the repeating unit, or may be included in the side chain of the repeating unit. The aromatic carboxyl group is preferably contained in the main chain of the repeating unit. In addition, in this specification, an aromatic carboxyl group is a group of the structure which bonded one or more carboxyl groups to an aromatic ring. Among the aromatic carboxyl groups, the number of carboxyl groups bonded to the aromatic ring is preferably 1 to 4, more preferably 1 to 2.

Resin Ac is preferably a resin containing at least one repeating unit selected from repeating units represented by formula (Ac-1) and repeating units represented by formula (Ac-2). [chemical formula 12] In formula (Ac-1), Ar ¹ represents a group containing an aromatic carboxyl group, L ¹ represents -COO- or -CONH-, and L ² represents a divalent linking group. In formula (Ac-2), Ar ¹⁰ represents a group containing an aromatic carboxyl group, L ¹¹ represents -COO- or -CONH-, L ¹² represents a trivalent linking group, and P ¹⁰ represents a polymer chain.

Examples of the aromatic carboxyl group-containing group represented by Ar ¹ in the formula (Ac-1) include a structure derived from an aromatic tricarboxylic anhydride, a structure derived from an aromatic tetracarboxylic anhydride, and the like. Examples of the aromatic tricarboxylic acid anhydride and the aromatic tetracarboxylic acid anhydride include compounds of the following structures. [chemical formula 13]

In the above formula, Q ¹ represents a single bond, -O-, -CO-, -COOCH ₂ CH ₂ OCO-, -SO ₂ -, -C(CF ₃ ) ₂ -, represented by the following formula (Q-1) or a group represented by the following formula (Q-2). [chemical formula 14]

The aromatic carboxyl group-containing group represented by Ar ¹ may have a polymerizable group. Examples of the polymerizable group include ethylenically unsaturated bond-containing groups and cyclic ether groups, and ethylenically unsaturated bond-containing groups are preferred. Specific examples of the aromatic carboxyl-containing group represented by Ar ¹ include groups represented by formula (Ar-11), groups represented by formula (Ar-12), groups represented by formula (Ar-13 ) represents the group, etc. [chemical formula 15]

In formula (Ar-11), n1 represents an integer of 1 to 4, 1 or 2 is preferable, and 2 is more preferable. In formula (Ar-12), n2 represents an integer of 1 to 8, preferably an integer of 1 to 4, more preferably 1 or 2, and still more preferably 2. In formula (Ar-13), n3 and n4 each independently represent an integer of 0 to 4, an integer of 0 to 2 is preferable, 1 or 2 is more preferable, and 1 is still more preferable. However, at least one of n3 and n4 is an integer of 1 or more. In the formula (Ar-13), Q ¹ represents a single bond, -O-, -CO-, -COOCH ₂ CH ₂ OCO-, -SO ₂ -, -C(CF ₃ ) ₂ -, from the above formula (Q- 1) The group represented by or the group represented by the above-mentioned formula (Q-2). In formulas (Ar-11) to (Ar-13), *1 represents a bonding position with L ¹ .

In the formula (Ac-1), L ¹ represents -COO- or -CONH-, preferably -COO-.

Examples of the divalent linking group represented by ^L2 in formula (Ac-1) include alkylene, arylylene, -O-, -CO-, -COO-, -OCO-, -NH-, -S- and a group formed by combining two or more of these. The number of carbon atoms in the alkylene group is preferably 1-30, more preferably 1-20, and still more preferably 1-15. The alkylene group may be any of linear, branched and cyclic. The carbon number of the arylylene group is preferably 6-30, more preferably 6-20, and still more preferably 6-10. An alkylene group and an arylylene group may have a substituent. As a substituent, a hydroxyl group etc. are mentioned. The divalent linking group represented by L ² is preferably a group represented by -L ^2a -O-. L ^2a can include an alkylene group; an arylylene group; a group formed by a combination of an alkylene group and an arylylene group; at least one selected from the group consisting of an alkylene group and an arylylene group and a group selected from -O-, -CO A combination of at least one of -, -COO-, -OCO-, -NH-, and -S-, preferably an alkylene group. The number of carbon atoms in the alkylene group is preferably 1-30, more preferably 1-20, and still more preferably 1-15. The alkylene group may be any of linear, branched and cyclic. An alkylene group and an arylylene group may have a substituent. As a substituent, a hydroxyl group etc. are mentioned.

The aromatic carboxyl group-containing group represented by Ar ¹⁰ in formula (Ac-2) has the same meaning as Ar ¹ in formula (Ac-1), and the preferred range is also the same.

In formula (Ac-2), L ¹¹ represents -COO- or -CONH-, preferably -COO-.

Examples of the trivalent linking group represented by ^L12 in the formula (Ac-2) include hydrocarbon groups, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and combinations thereof. Groups formed by more than two types. Examples of the hydrocarbon group include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1-30, more preferably 1-20, and still more preferably 1-15. The aliphatic hydrocarbon group may be any of linear, branched and cyclic. The carbon number of the aromatic hydrocarbon group is preferably 6-30, more preferably 6-20, and still more preferably 6-10. The hydrocarbon group may have a substituent. As a substituent, a hydroxyl group etc. are mentioned. The trivalent linking group represented by L ¹² is preferably a group represented by formula (L12-1), more preferably a group represented by formula (L12-2). [chemical formula 16]

In formula (L12-1), L ^12b represents a trivalent linking group, X ¹ represents S, *1 represents the bonding position with L ¹¹ of formula (Ac-2), and *2 represents the bonding position with formula (Ac-2) The bonding position of P ¹⁰ . Examples of the trivalent linking group represented by ^L12b include a hydrocarbon group; a combination of a hydrocarbon group and at least one selected from -O-, -CO-, -COO-, -OCO-, -NH-, and -S- As the resulting group, etc., a hydrocarbon group or a combination of a hydrocarbon group and -O- is preferable.

In formula (L12-2), L ^12c represents a trivalent linking group, X ¹ represents S, *1 represents the bonding position with L ¹¹ of formula (Ac-2), *2 represents the bonding position with formula (Ac-2) The bonding position of P ¹⁰ . Examples of the trivalent linking group represented by ^L12c include a hydrocarbon group; a combination of a hydrocarbon group and at least one selected from -O-, -CO-, -COO-, -OCO-, -NH-, and -S- The resulting groups, etc., are preferably hydrocarbon groups.

In the formula (Ac-2), P ¹⁰ represents a polymer chain. Examples of the polymer chain represented by ^P10 include polyether structures, polyester structures, poly(meth)acrylic acid structures, polystyrene structures, polyurethane structures, polyurea structures, and polyamide structures. A polymer chain of repeating units of at least one structure. As a repeating unit of a polyester structure, the repeating unit of the structure represented by said Formula (G-1), Formula (G-4), or Formula (G-5) is mentioned. As a repeating unit of a polyether structure, the repeating unit of the structure represented by said formula (G-2) is mentioned. As a repeating unit of a poly(meth)acrylic acid structure, the repeating unit of the structure represented by said formula (G-3) is mentioned. As a repeating unit of a polystyrene structure, the repeating unit of the structure represented by said formula (G-6) is mentioned.

The weight average molecular weight of the polymer chain ^P10 is preferably 500-20000. The lower limit is preferably 1000 or more. The upper limit is preferably 10,000 or less, more preferably 5,000 or less, and still more preferably 3,000 or less. In the case where the resin having an aromatic carboxyl group is a resin having a repeating unit represented by formula (Ac-2), the resin can be preferably used as a dispersant.

The polymer chain represented by ^P10 may have at least one group selected from the group consisting of (meth)acryl group, oxetanyl group, blocked isocyanate group and tert-butyl group (hereinafter, also referred to as "Functional Group A".). In addition, the blocked isocyanate group in this specification refers to the group which can produce an isocyanate group by heat, For example, the group which can protect an isocyanate group by reacting a blocking agent and an isocyanate group is a preferable example. Examples of the blocking agent include oxime compounds, lactam compounds, phenol compounds, alcohol compounds, amine compounds, active methylene compounds, pyrazole compounds, thiol compounds, imidazole compounds, imide compounds, and the like. Examples of the blocking agent include compounds described in paragraphs 0115 to 0117 of JP-A-2017-067930, and the contents thereof are incorporated in the present specification. Moreover, it is preferable that the blocked isocyanate group is a group capable of generating an isocyanate group by heat of 90°C to 260°C.

It is also preferable that the polymer chain represented by P ¹⁰ has a repeating unit containing an acid group. As an acidic group, a carboxyl group, a phosphoric acid group, a sulfonic acid group, a phenolic hydroxyl group etc. are mentioned. The ratio of the repeating unit including an acid group in all the repeating units constituting ^P10 is preferably 1 to 30% by mass, more preferably 2 to 20% by mass, and still more preferably 3 to 10% by mass.

The resin composition of the present invention can also use a polyimide-based dispersant containing nitrogen atoms in at least one of the main chain and the side chain as a resin having an acid group. As a polyimide-based dispersant, a resin having a main chain and a side chain and having a basic nitrogen atom in at least one of the main chain and the side chain is preferable, and the main chain includes a partial structure having a functional group of pKa14 or less , the number of atoms in the side chain is 40 to 10,000. The basic nitrogen atom is not particularly limited as long as it is a basic nitrogen atom. Regarding the polyimide-based dispersant, the description in paragraphs 0102 to 0166 of JP-A-2012-255128 can be referred to, and the content is incorporated in this specification.

The resin composition of the present invention can also use a resin having a structure in which a plurality of polymer chains are bonded to the core as a resin having an acid group. Examples of such resins include dendrimers (including star polymers). Moreover, as a specific example of a dendrimer, polymer compound C-1-C-31 etc. which are described in paragraph 0196-0209 of Unexamined-Japanese-Patent No. 2013-043962 are mentioned.

The resin composition of the present invention can also be used as a resin having an acid group using a commercially available acidic dispersant. As such specific examples, DISPERBYK series (for example, DISPERBYK-111 etc.) manufactured by BYK Chemie GmbH, SOLSPERSE series manufactured by Lubrizol Japan Limited., etc. are mentioned. Moreover, the pigment dispersing agent described in paragraph 0041-0130 of Unexamined-Japanese-Patent No. 2014-130338 can also be used, and this content is incorporated in this specification.

(resin without acid groups) The resin composition of this invention can also contain the resin which does not contain an acid group. Such resins are not particularly limited, and examples thereof include (meth)acrylic resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polyresins, polyetherresins, polyether resins, Benzene resin, polyaryl ether phosphine oxide resin, polyimide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, etc.

Moreover, the resin which has a base can also be used as resin which does not contain an acidic group. The resin with base is preferably the resin containing the repeating unit with base on the side chain, and the copolymer with the repeating unit with base on the side chain and the repeating unit without base is more preferred, with A capped copolymer having a repeating unit of a base on a side chain and a repeating unit not containing a base is further preferred. Resins with bases can also be used as dispersants. The amine value of the resin having a base is preferably 5-300 mgKOH/g. The lower limit is preferably at least 10 mgKOH/g, more preferably at least 20 mgKOH/g. The upper limit is preferably 200 mgKOH/g or less, more preferably 100 mgKOH/g or less. Examples of resins having a base include the capped copolymers (B) described in paragraphs 0063 to 0112 of JP-A-2014-219665 and paragraphs 0046-0076 of JP-A-2018-156021. The end-capped copolymer A1 described.

It is preferable that content of the resin in the total solid content of a resin composition is 5-40 mass %. The lower limit is preferably at least 10% by mass. The upper limit is preferably at most 35% by mass, more preferably at most 30% by mass.

It is preferable that content of the resin which has an acid group in the total solid content of a resin composition is 5-40 mass %. The lower limit is preferably at least 10% by mass. The upper limit is preferably at most 35% by mass, more preferably at most 30% by mass.

The resin composition of this invention may contain only 1 type of resin, and may contain 2 or more types. When containing 2 or more types of resin, it is preferable that these total amounts are in the said range.

＜＜Ultraviolet absorber＞＞ The resin composition of the present invention contains an ultraviolet absorber. The ultraviolet absorber in this specification refers to an organic compound having an ultraviolet absorbing function, and is different from a photopolymerization initiator that efficiently generates active species such as free radicals by irradiation of ultraviolet rays. The ultraviolet absorber is preferably a compound that absorbs ultraviolet rays, converts them into thermal energy, and emits them. Moreover, it is preferable that a ultraviolet absorber is a compound stable with respect to ultraviolet rays. In other words, the ultraviolet absorber is preferably a compound that does not easily undergo molecular cleavage due to reactions such as decomposition, oxidation, and reduction by ultraviolet irradiation.

The ultraviolet absorber is preferably a compound whose maximum absorption wavelength exists within the wavelength range of 300-420nm, and a compound whose maximum absorption wavelength exists within the wavelength range of 330-400nm is more preferable, and a compound whose maximum absorption wavelength exists within the wavelength range of 350-390nm Compounds within the range are further preferred. In addition, the maximum value of the molar absorption coefficient in the wavelength range of 300 to 420nm of the ultraviolet absorber is preferably 5000L･mol ^-1 ･cm ^-1 or more, more preferably 10000L･mol ^-1 ･cm ^-1 or more, and 13000L ･mol ^-1 ･cm ^-1 or more is more preferable. The upper limit is preferably, for example, 100000 L･mol ^-1 ･cm ^-1 or less.

In the ultraviolet absorber, the ratio of the absorbance _A2 at a wavelength of 410 nm to the absorbance _A1 at a wavelength of 365 nm is preferably 0.06 or less, more preferably 0.04 or less, still more preferably 0.02 or less.

The molecular weight of the ultraviolet absorber is preferably 500 or less, more preferably 400 or less, because it can be dispersed almost uniformly in the film without layer separation. The lower limit of the molecular weight of an ultraviolet absorber can be 200 or more, and can also be 300 or more.

(specific UV absorber) In the resin composition of the present invention, as the ultraviolet absorber, an ultraviolet absorber having a base can be used and is selected from benzophenone compounds, benzoate compounds, benzotriazole compounds, trioxane compounds, and cyanoacrylic acid compounds. At least one compound among ester compounds (hereinafter also referred to as a specific ultraviolet absorber).

It is preferable that the base which the said specific ultraviolet absorber has is an amine group. That is, it is preferable that the specific ultraviolet absorber is an ultraviolet absorber having an amine group. Examples of the amino group include groups represented by -NR ^a1 R ^a2 and cyclic amino groups, and groups represented by -NR ^a1 R ^a2 are preferred.

In the group represented by -NR ^a1 R ^a2 , R ^a1 and R ^a2 independently represent a hydrogen atom, an alkyl group and an aryl group, preferably an alkyl group. The carbon number of the alkyl group is preferably 1-10, more preferably 1-5, still more preferably 1-3, particularly preferably 2 or 3, and most preferably 2. The alkyl group may be any of straight chain, branched chain and cyclic shape, but straight chain or branched chain is preferable, and straight chain is more preferable. The carbon number of the aryl group is preferably 6-30, more preferably 6-20, and still more preferably 6-12.

Examples of the cyclic amino group include pyrrolidinyl, piperidinyl, piperidinyl, morpholinyl and the like. These groups may further have a substituent. As a substituent, an alkyl group, an aryl group, etc. are mentioned.

The base which the specific ultraviolet absorber has is preferably a dialkylamine group, more preferably a diethylamine group.

The reason why the specific ultraviolet absorber is at least one selected from the group consisting of benzophenone compounds, benzoate compounds, benzotriazole compounds, tristannium compounds, and cyanoacrylate compounds is good adsorption to coloring materials Considering that benzotriazole compounds are preferred.

The benzotriazole compound is preferably a compound represented by formula (UV-1). [chemical formula 17]

In formula (UV-1), R ^u1 to R ^u8 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group, an alkoxy group, an aryl group, or a group represented by formula (R-1). However, at least one of R ^u1 to R ^u8 is a group represented by formula (R-1).

-L ^a100 -(R ^a100 ) _n・・・(R-1) In the formula (R-1), L ^a100 represents a single bond or a linker with a valence of n+1, R ^a100 represents a base, and n represents 1 to 3 an integer of . However, when L ^a100 is a single bond, n is 1.

The alkyl groups represented by R ^u1 to R ^u8 have preferably 1-10 carbon atoms, more preferably 1-5 carbon atoms. The alkyl group may be any of straight chain, branched chain and cyclic shape, but straight chain or branched chain is preferable, and straight chain is more preferable. An alkyl group may have a substituent. An alkyl group may have a substituent. As a substituent, a halogen atom, an aryl group, an alkoxy group etc. are mentioned. The carbon number of the alkoxy group represented by R ^u1 -R ^u8 is preferably 1-10, more preferably 1-5. The alkoxy group is preferably a straight chain or a branched chain, more preferably a straight chain. An alkoxy group may have a substituent. As a substituent, a halogen atom, an aryl group, etc. are mentioned. The carbon number of the aryl group represented by R ^u1 to R ^u8 is preferably 6-30, more preferably 6-20, and still more preferably 6-12. The aryl group may have a substituent. As a substituent, a halogen atom, an alkyl group, an alkoxy group etc. are mentioned.

Examples of the n+1-valent linking group represented by L ^a100 in formula (R-1) include aliphatic hydrocarbon groups, aromatic hydrocarbon groups, heterocyclic groups, -O-, -S-, -CO-, -COO -, -OCO-, -SO ₂ -, -NR ^L1 -, -NR ^L1 CO-, -CONR ^L1 -, -NR ^L1 SO ₂ -, -SO ₂ NR ^L1 -, and groups consisting of combinations thereof. R ^L1 represents a hydrogen atom, an alkyl group or an aryl group. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1-10, more preferably 1-5, still more preferably 1-3, and still more preferably 2 or 3. The aliphatic hydrocarbon group may be any of linear, branched and cyclic. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6-18, more preferably 6-14, and still more preferably 6-10. As for the heterocyclic group, a monocyclic ring or a condensed ring having 2 to 4 condensed rings is preferable. The number of heteroatoms in the ring constituting the heterocyclic group is preferably 1-3. The hetero atom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. The carbon number of the ring constituting the heterocyclic group is preferably 3-30, more preferably 3-18, and still more preferably 3-12. The carbon number of the alkyl group represented by R ^L1 is preferably 1-20, more preferably 1-15, and still more preferably 1-8. The alkyl group may be any of straight chain, branched chain, and cyclic shape. Straight chain or branched chain is preferable, and straight chain is more preferable. The alkyl group represented by R ^L1 may further have a substituent. The carbon number of the aryl group represented by R ^L1 is preferably 6-30, more preferably 6-20, and still more preferably 6-12. The n+1-valent linking group represented by L ^a100 is preferably an aliphatic hydrocarbon group.

R ^a100 in the formula (R-1) represents a base, preferably an amino group. Examples of the amino group include groups represented by the above-mentioned -NR ^a1 R ^a2 and cyclic amino groups, and groups represented by -NR ^a1 R ^a2 are preferred. The preferred range of the amine group is as above.

n in formula (R-1) represents an integer of 1 to 3, 1 or 2 is preferable, and 1 is more preferable.

R ^u1 to R ^u4 , R ^u6 , and R ^u8 in the formula (UV-1) are preferably hydrogen atoms. R ^u5 of the formula (UV-1) is preferably a group represented by the formula (R-1). R ^u7 of formula (UV-1) is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group, an alkoxyl group, an aryl group or a group represented by the formula (R-1) is preferred, and a hydrogen atom or an alkyl group is more preferred. Preferably, alkyl is further preferred.

(other UV absorbers) The resin composition of the present invention may contain other ultraviolet absorbers other than the above-mentioned specific ultraviolet absorbers. Examples of other ultraviolet absorbers include conjugated diene compounds, benzotriazole compounds, dibenzoyl compounds, tristannium compounds, benzophenone compounds, salicylate compounds, coumarin compounds, and acrylonitrile Compounds, benzobithiazole compounds, cinnamic acid compounds, α-β unsaturated ketone compounds, 2-hydroxyquinoline compounds, merocyanine compounds, etc.

The content of other ultraviolet absorbers in the ultraviolet absorber used in the resin composition of the present invention is preferably at most 50% by mass, more preferably at most 40% by mass, and still more preferably at most 30% by mass. It is also preferable that the ultraviolet absorber does not contain other ultraviolet absorbers substantially. Furthermore, in this specification, the ultraviolet absorber does not substantially contain other ultraviolet absorbers means that the content of other ultraviolet absorbers in the ultraviolet absorber is 1% by mass or less, preferably 0.5% by mass or less, and 0.1% by mass or less. Most preferably, no other UV absorbers are included.

The content of the ultraviolet absorber in the total solid content of the resin composition is preferably 0.01 to 10% by mass, more preferably 0.01 to 5% by mass. Moreover, the content of the specific ultraviolet absorber in the total solid content of the resin composition is preferably 0.01 to 10% by mass, more preferably 0.01 to 5% by mass. Moreover, it is preferable that content of a specific ultraviolet absorber is 1-10 mass parts with respect to 100 mass parts of color materials. The lower limit is preferably at least 1.5 parts by mass, more preferably at least 2 parts by mass. The upper limit is preferably 9 parts by mass or less, and more preferably 8 parts by mass or less. Moreover, it is preferable that content of a specific ultraviolet absorber is 1-20 mass parts with respect to 100 mass parts of resins which have an acid group. The lower limit is preferably at least 1 part by mass, and more preferably at least 2 parts by mass. The upper limit is preferably 18 parts by mass or less, more preferably 15 parts by mass or less. Only 1 type may be used for a specific ultraviolet absorber, and 2 or more types may be used. When using 2 or more types, it is preferable that these total amounts are in the said range.

＜＜Pigment Derivatives＞＞ The resin composition of the present invention can contain a pigment derivative. When the coloring agent used in the resin composition of this invention contains a pigment, it is preferable that the resin composition of this invention contains a pigment derivative. Pigment derivatives are used, for example, as dispersing aids. Examples of pigment derivatives include compounds having a structure in which an acidic group or a basic group is bonded to a pigment skeleton. The dispersing aid refers to a material for improving the dispersibility of color materials such as pigments in the resin composition.

The molecular weight of the pigment derivative is preferably 600 or more, more preferably 650 or more. The upper limit of the molecular weight is preferably at most 2000, more preferably at most 1500, and still more preferably at most 1000.

Examples of the dye skeleton constituting the pigment derivative include quinoline dye skeleton, benzimidazolone dye skeleton, benzisoindole dye skeleton, benzothiazole dye skeleton, squarylium dye skeleton, crotonium dye skeleton, Oxonol dye skeleton, pyrrolopyrrole dye skeleton, diketopyrrolopyrrole dye skeleton, azo dye skeleton, azimine dye skeleton, phthalocyanine dye skeleton, naphthalocyanine dye skeleton, anthraquinone dye skeleton, quinacridone Pigment skeleton, di㗁𠯤 pigment skeleton, perinone (perinone) pigment skeleton, perylene pigment skeleton, thioindigo pigment skeleton, isoindoline pigment skeleton, isoindolinone pigment skeleton, quinoline yellow pigment skeleton, immonium (iminium) pigment skeleton, dithiol pigment skeleton, triarylmethane pigment skeleton, pyrromethene pigment skeleton, etc.

Examples of the acid group include a carboxyl group, a sulfonic acid group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imidic acid group, and salts thereof. The atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ^+, etc.), alkaline earth metal ions (Ca ²⁺ , Mg ^{2+ ,} etc.), ammonium ions, imidazolium ions, pyridinium ions, etc. ions, phosphonium ions, etc. As the carboxylic acid amide group, a group represented by -NHCOR ^X1 is preferable. As the sulfonamide group, a group represented by -NHSO ₂ R ^X2 is preferable. As the imidic acid group, a group represented by -SO ₂ NHSO ₂ R ^X3 , -CONHSO ₂ R ^X4 , -CONHCOR ^X5 or -SO ₂ NHCOR ^X6 is preferable, and -SO ₂ NHSO ₂ R ^X3 is more preferable. R ^X1 to R ^X6 each independently represent an alkyl group or an aryl group. The alkyl and aryl groups represented by R ^X1 to R ^X6 may have a substituent. As the substituent, a halogen atom is preferable, and a fluorine atom is more preferable.

Examples of the base include an amino group, a pyridyl group and salts thereof, ammonium group salts, and phthalimidomethyl group. Examples of the atoms or atomic groups constituting the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

Pigment derivatives can also use pigment derivatives excellent in visibility and transparency (hereinafter also referred to as transparent pigment derivatives). The maximum molar absorption coefficient (εmax) of the transparent pigment derivative in the wavelength range of 400 to 700nm is preferably 3000L･mol ^-1 ･cm ^-1 or less, more preferably 1000L･mol ^-1 ･cm ^-1 or less Preferably, 100L･mol ^-1 ･cm ^-1 or less is more preferred. The lower limit of εmax is, for example, 1 L･mol ⁻¹ ･cm ⁻¹ or more, and may be 10 L･mol ⁻¹ ･cm ⁻¹ or more.

Specific examples of pigment derivatives include the compounds described in JP-A-56-118462, the compounds described in JP-A-63-264674, and the compounds described in JP-A-01-217077. Compounds described, compounds described in JP-A-03-009961, compounds described in JP-A-03-026767, compounds described in JP-A-03-153780, JP-A Compounds described in Japanese Patent Laid-Open No. 03-045662, Compounds described in Japanese Patent Laid-Open No. 04-285669, Compounds described in Japanese Patent Laid-Open No. 06-145546, Japanese Patent Laid-Open No. 06-212088 Compounds, compounds described in JP-06-240158, compounds described in JP-10-030063, compounds described in JP-10-195326, International Publication No. 2011/ Compounds described in paragraphs 0086 to 0098 of No. 024896, compounds described in paragraphs 0063 to 0094 of International Publication No. 2012/102399, compounds described in paragraph 0082 of International Publication No. 2017/038252, Japanese Patent Laid-Open Compounds described in Paragraph 0171 of Japanese Patent Laid-Open No. 2015-151530, compounds described in Paragraphs 0162 to 0183 of Japanese Patent Laid-Open No. 2011-252065, compounds described in Japanese Patent Laid-Open No. 2003-081972, Japanese Patent No. Compounds described in JP-A No. 5299151, compounds described in JP-A No. 2015-172732, compounds described in JP-A No. 2014-199308, compounds described in JP-A No. 2014-085562 , Compounds described in JP-A No. 2014-035351, compounds described in JP-A No. 2008-081565, compounds described in JP-A No. 2019-109512, JP-A No. 2019-133154 The compound described in the gazette, the diketopyrrolopyrrole compound having a thiol linker described in International Publication No. 2020/002106, the benzimidazolone compound described in JP-A-2018-168244, or the Wait for the salt.

The content of the pigment derivative is preferably 1 to 30 parts by mass, more preferably 3 to 20 parts by mass, based on 100 parts by mass of the pigment. In addition, the total content of the pigment derivative and the colorant is preferably 35 mass % or more in the total solid content of the resin composition, more preferably 40 mass % or more, still more preferably 45 mass % or more, and 50 mass % or more For the best. The upper limit is preferably at most 80% by mass, more preferably at most 70% by mass, and still more preferably at most 65% by mass. The resin composition of the present invention may contain only one type of pigment derivative, or may contain two or more types. When containing two or more kinds of pigment derivatives, it is preferable that the total amount is within the above-mentioned range. By containing two or more kinds of pigment derivatives, the dispersion stability of the resin composition can be further improved. Moreover, by using a pigment derivative excellent in visible transparency, the color change of the film after a heat resistance test or a light resistance test can be suppressed, and heat resistance and light resistance are further excellent. In addition, by using a chromatic pigment derivative and a transparent pigment derivative in combination, it is possible to simultaneously realize dispersion stability, heat resistance, and light resistance at a higher level.

＜＜Polymer compound＞＞ It is preferable that the resin composition of this invention has a polymeric compound. As the polymerizable compound, known compounds that can be crosslinked by radicals, acids, or heat can be used. The polymerizable compound is preferably a compound having an ethylenically unsaturated bond-containing group. Examples of the ethylenically unsaturated bond-containing group include vinyl, (meth)allyl, (meth)acryl, and the like. The polymerizable compound used in the present invention is preferably a radically polymerizable compound.

The polymerizable compound may be in any chemical form such as a monomer, a prepolymer, or an oligomer, but a monomer is preferred. It is preferable that the molecular weight of a polymeric compound is 100-3000. The upper limit is more preferably 2,000 or less, and more preferably 1,500 or less. The lower limit is more preferably 150 or more, and more preferably 250 or more.

The polymeric compound is preferably a compound containing 3 or more ethylenically unsaturated bond-containing groups, more preferably a compound containing 3-15 ethylenically unsaturated bond-containing groups, and a compound containing 3-6 ethylenically unsaturated bond-containing groups A compound having an ethylenically unsaturated bond group is further preferred. Moreover, it is preferable that a polymeric compound is a 3-15 functional (meth)acrylate compound, and it is more preferable that it is a 3-6 functional (meth)acrylate compound. Specific examples of polymerizable compounds include paragraphs 0095 to 0108 of JP-A-2009-288705, paragraphs 0227 of JP-A-2013-029760, and paragraphs 0254-0257 of JP-A-2008-292970. , Paragraph 0034-0038 of JP-A-2013-253224, paragraph 0477 of JP-A-2012-208494, JP-A-2017-048367, JP-A-6057891, JP-A-6031807 The compounds described are incorporated into this specification.

As a polymerizable compound, diperythritol tri(meth)acrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), diperythritol tetra(meth)acrylate (Commercially available as KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), Dineopentaerythritol Penta(meth)acrylate (commercially available as KAYARAD D-310; Nippon Kayaku Co., Ltd. .), diperythritol hexa(meth)acrylate (commercially available as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK ESTER A-DPH-12E; Shin-Nakamura Chemical Co., Ltd. . system) and the compound (for example, SR454, SR499 commercially available from SARTOMER Company, Inc.) through ethylene glycol and/or propylene glycol residues with such (meth)acryl groups bonded is preferred . Also, as the polymerizable compound, diglycerol EO (ethylene oxide) modified (meth)acrylate (commercially available, M-460; manufactured by TOAGOSEI CO., LTD.), neopentylitol Tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., NK ESTER A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 ( Nippon Kayaku Co., Ltd.), ARONIX TO-2349 (TOAGOSEI CO., LTD.), NK OLIGO UA-7200 (Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (Nippon Kayaku Co. , Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by KYOEISHA CHEMICAL CO., LTD.), 8UH-1006, 8UH- 1012 (the above are manufactured by TAISEI FINE CHEMICAL CO,. LTD.), LIGHT ACRYLATE POB-A0 (manufactured by KYOEISHA CHEMICAL CO., LTD.), etc.

In addition, trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide modified tri(meth)acrylate, trimethylolpropane ethylene oxide modified trimethylolpropane tri(meth)acrylate, trimethylolpropane ethylene oxide modified Trifunctional (meth)acrylate compounds such as tri(meth)acrylate, ethylene oxide modified tri(meth)acrylate, and neopentylitol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M- 306, M-305, M-303, M-452, M-450 (manufactured by TOAGOSEI CO., LTD.), NK ESTER A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A -TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 ( Nippon Kayaku Co., Ltd.), etc.

Moreover, the compound which has an acidic group can also be used for a polymeric compound. By using the polymerizable compound which has an acidic group, it becomes easy to remove the polymerizable compound of an unexposed part at the time of image development, and generation|occurrence|production of image development residue can be suppressed. Examples of the acid group include a carboxyl group, a sulfonic acid group, a phosphoric acid group, and the like, and a carboxyl group is preferable. As a commercial item of the polymeric compound which has an acid group, ARONIX M-510, M-520, ARONIX TO-2349 (made by TOAGOSEI CO., LTD.) etc. are mentioned. The preferable acid value as a polymeric compound which has an acid group is 0.1-40 mgKOH/g, More preferably, it is 5-30 mgKOH/g. When the acid value of the polymerizable compound is 0.1 mgKOH/g or more, the solubility in the developer is good, and if it is 40 mgKOH/g or less, it is advantageous in terms of production or handling.

Moreover, the compound which has a caprolactone structure can also be used as a polymeric compound. As a commercial item of the polymeric compound which has a caprolactone structure, KAYARAD DPCA-20, DPCA-30, DPCA-60, DPCA-120 (the above are Nippon Kayaku Co., Ltd. make) etc. are mentioned.

Moreover, the polymeric compound which has an alkyleneoxy group can also be used as a polymeric compound. The polymerizable compound having an alkyleneoxy group is preferably a polymerizable compound having ethyleneoxy and/or propyleneoxy groups, more preferably a polymerizable compound having ethyleneoxy groups, and 3 out of 4 to 20 ethyleneoxy groups ~6 functional (meth)acrylate compounds are further preferred. Examples of commercially available polymeric compounds having an alkylene group include tetrafunctional (meth)acrylate SR-494 having four ethoxy groups manufactured by Sartomer Company, Inc., Nippon Kayaku Co., Ltd.'s trifunctional (meth)acrylate KAYARAD TPA-330 having three isobutoxyl groups, and the like.

In addition, as the polymerizable compound, a polymerizable compound having a fennel skeleton can also be used. It is preferable that the polymerizable compound having a fennel skeleton is a bifunctional polymerizable compound. Examples of the polymerizable compound having a fennel skeleton include compounds having a partial structure represented by the following formula (Fr). [chemical formula 18]

In the formula, a wavy line represents a bond, R ^f1 and R ^f2 each independently represent a substituent, and m and n each independently represent an integer of 0-5. When ^m is 2 or more, the m pieces of R ^f1 may be the same or different, and two of the m pieces of R ^f1 may be bonded to each other to form a ring. When ⁿ is 2 or more, the n pieces of R ^f2 may be the same or different, and two of the n pieces of R ^f2 may be bonded to each other to form a ring. Examples of substituents represented by R ^f1 and R ^f2 include halogen atoms, cyano groups, nitro groups, alkyl groups, aryl groups, heteroaryl groups, -OR ^f11 , -COR ^f12 , -COOR ^f13 , -OCOR ^f14 , -NR ^f15 R ^f16 , -NHCOR ^f17 , -CONR ^f18 R ^f19 , -NHCONR ^f20 R ^f21 , -NHCOOR ^f22 , -SR ^f23 , -SO ₂ R ^f24 , -SO ₂ OR ^f25 , -NHSO ₂ R ^f26 or -SO ₂ NR ^f27 R ^f28 . R ^f11 to R ^f28 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group.

Specific examples of the polymerizable compound having a fennel skeleton include compounds having the following structures. Moreover, as a commercial item of the polymerizable compound which has a fennel skeleton, OGSOL EA-0200, EA-0300 (made by Osaka Gas Chemicals Co., Ltd., the (meth)acrylate monomer which has a fennel skeleton) is mentioned wait. [chemical formula 19]

As the polymerizable compound, it is also preferable to use a compound that does not substantially contain environmentally regulated substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT, KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.), and the like.

The content of the polymerizable compound in the total solid content of the resin composition is preferably 0.1 to 50% by mass. The lower limit is preferably at least 0.5% by mass, more preferably at least 1% by mass, and still more preferably at least 5% by mass. The upper limit is preferably at most 45% by mass, more preferably at most 40% by mass, and still more preferably at most 30% by mass. A polymeric compound may use only 1 type, and may use 2 or more types. When using 2 or more types, it is preferable that these total amounts are in the said range.

＜＜Photopolymerization Initiator＞＞ It is preferable that the resin composition of this invention contains a photoinitiator. It does not specifically limit as a photoinitiator, It can select suitably from well-known photoinitiator. For example, a compound having photosensitivity to rays from the ultraviolet range to the visible range is preferable. The photopolymerization initiator is preferably a photoradical polymerization initiator.

Examples of photopolymerization initiators include halogenated hydrocarbon derivatives (for example, compounds having a trioxane skeleton, compounds having a oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic Peroxides, sulfur compounds, ketone compounds, aromatic onium salts, α-hydroxy ketone compounds, α-amino ketone compounds, and the like. From the viewpoint of exposure sensitivity, photopolymerization initiators are trihalomethyl triazine compounds, benzyl dimethyl ketal compounds, α-hydroxy ketone compounds, α-amino ketone compounds, acyl Phosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, hexaarylbisimidazole compounds, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes Compounds, halomethyl oxadiazole compounds and 3-aryl substituted coumarin compounds are preferred, and compounds selected from oxime compounds, α-hydroxy ketone compounds, α-amino ketone compounds and acyl phosphine compounds are more preferred Preferably, an oxime compound is further more preferred. Also, examples of photopolymerization initiators include compounds described in paragraphs 0065 to 0111 of JP-A-2014-130173, compounds described in JP-A-6301489, MATERIAL STAGE 37-60p, vol. .19, No.3, 2019, the peroxide-based photopolymerization initiator, the photopolymerization initiator described in International Publication No. 2018/221177, and the photopolymerization initiator described in International Publication No. 2018/110179 Photopolymerization initiator, photopolymerization initiator described in JP 2019-043864 A, photopolymerization initiator described in JP 2019-044030 A, JP 2019-167313 A The peroxide-based initiator described in JP-A-2020-055992, the aminoacetophenone-based initiator with oxazolidinyl group described in JP-A No. 2013-190459 The oxime-based photopolymerization initiators described, the polymers described in Japanese Patent Application Laid-Open No. 2020-172619, the compound represented by formula 1 described in International Publication No. 2020/152120, etc., are incorporated herein. in the manual.

Specific examples of hexaarylbisimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-bis Phenyl-1,1'-biimidazole, etc.

Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (the above are manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (the above are manufactured by BASF company), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (the above are manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (the above are BASF Corporation), etc. Examples of commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (the above are manufactured by IGM Resins B.V.), Irgacure 819, and Irgacure TPO (the above are manufactured by BASF Corporation), and the like.

Examples of the oxime compound include compounds described in JP-A-2001-233842, compounds described in JP-A-2000-080068, compounds described in JP-A-2006-342166, J.C.S. Compounds described in Perkin II (1979, pp.1653-1660), compounds described in J.C.S. Perkin II (1979, pp.156-162), Journal of Photopolymer Science and Technology (1995, pp.202) -232), compounds described in JP-A-2000-066385, compounds described in JP-A-2004-534797, compounds described in JP-A-2017-019766 , Compounds described in Japanese Patent No. 6065596, Compounds described in International Publication No. 2015/152153, Compounds described in International Publication No. 2017/051680, Japanese Patent Application Publication No. 2017-198865 Compounds described in paragraphs 0025 to 0038 of International Publication No. 2017/164127, compounds described in International Publication No. 2013/167515, compounds described in Japanese Patent No. 5430746, Japanese Patent No. 5647738 Compounds described in . Specific examples of oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetyloxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, Aminobutan-2-one, 2-Acetyloxyiminopentan-3-one, 2-Acetyloxyimino-1-phenylpropan-1-one, 2-Benzoyl Oxyimino-1-phenylpropan-1-one, 3-(4-tosyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1 -Phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), etc. Commercially available items include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04 (the above are manufactured by BASF Corporation), TR-PBG-304, TR-PBG-327 (manufactured by TRONLY Corporation), ADEKA OPTOMER N-1919 ( ADEKA Corporation make, and the photoinitiator 2) described in Unexamined-Japanese-Patent No. 2012-014052. In addition, as the oxime compound, it is also preferable to use a non-coloring compound or a compound with high transparency and low discoloration. As a commercial item, ADEKA ARKLS NCI-730, NCI-831, NCI-930 (the above are made by ADEKA CORPORATION) etc. are mentioned.

As a photopolymerization initiator, an oxime compound having an oxene ring can also be used. Specific examples of oxime compounds having a stilbene ring include compounds described in JP-A-2014-137466, compounds described in JP-A-6636081, Korean Laid-Open Patent No. 10-2016-0109444 Compounds listed in the gazette.

An oxime compound having a skeleton in which at least one benzene ring in a carbazole ring becomes a naphthalene ring can also be used as a photopolymerization initiator. Specific examples of such oxime compounds include compounds described in International Publication No. 2013/083505.

An oxime compound having a fluorine atom can also be used as a photopolymerization initiator. Specific examples of oxime compounds having a fluorine atom include compounds described in JP-A-2010-262028, compounds 24, 36-40 described in JP-A-2014-500852, JP-A Compound (C-3) described in Publication No. 2013-164471, etc.

As a photopolymerization initiator, an oxime compound having a nitro group can be used. It is also preferable to form an oxime compound having a nitro group as a dimer. Specific examples of oxime compounds having a nitro group include compounds described in paragraphs 0031 to 0047 of JP-A-2013-114249 and in paragraphs 0008-0012 and 0070-0079 of JP-A-2014-137466 , Compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION).

An oxime compound having a benzofuran skeleton can also be used as a photopolymerization initiator. Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.

An oxime compound in which a substituent having a hydroxyl group is bonded to the carbazole skeleton can also be used as a photopolymerization initiator. Examples of such photopolymerization initiators include compounds described in International Publication No. 2019/088055, and the like.

Specific examples of oxime compounds preferably used in the present invention are shown below, but the present invention is not limited thereto.

[chemical formula 20] [chemical formula 21] [chemical formula 22]

The oxime compound is preferably a compound having a maximum absorption wavelength within a wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength within a wavelength range of 360 to 480 nm. Also, from the viewpoint of sensitivity, the oxime compound preferably has a high molar absorption coefficient at a wavelength of 365 nm or 405 nm, more preferably 1,000 to 300,000, still more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorptivity of a compound can be measured using a known method. For example, it is preferable to measure at a concentration of 0.01 g/L using an ethyl acetate solvent with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).

It is also preferable to use Irgacure OXE01 (manufactured by BASF) and/or Irgacure OXE02 (manufactured by BASF) in combination with Omnirad 2959 (manufactured by IGM Resins B.V.) as a photopolymerization initiator.

As the photopolymerization initiator, a bifunctional or trifunctional or higher photoradical polymerization initiator can be used. By using such radical photopolymerization initiators, two or more radicals are generated from one molecule of the radical photopolymerization initiators, so that good sensitivity can be obtained. In addition, when a compound with an asymmetric structure is used, the crystallinity is lowered, the solubility in a solvent or the like is improved, and precipitation becomes difficult over time, thereby improving the temporal stability of the resin composition. Specific examples of difunctional or trifunctional or more photoradical polymerization initiators include JP 2010-527339, JP 2011-524436, International Publication No. 2015/004565, JP Dimers of oxime compounds described in paragraphs 0407 to 0412 of Table No. 2016-532675, paragraphs 0039 to 0055 of International Publication No. 2017/033680, compounds described in Japanese Patent Publication No. 2013-522445 (E ) and compound (G), Cmpd 1-7 described in International Publication No. 2016/034963, the oxime ester photoinitiator described in paragraph 0007 of JP 2017-523465, JP 2017- Photoinitiators described in paragraphs 0020 to 0033 of Japanese Patent Application Publication No. 167399, photopolymerization initiators (A) described in paragraphs 0017 to 0026 of Japanese Patent Application Laid-Open No. 2017-151342, and Japanese Patent Publication No. 6469669 The oxime ester photoinitiator etc. described.

It is preferable that content of the photoinitiator in the total solid content of a resin composition is 0.1-30 mass %. The lower limit is preferably at least 0.5% by mass, more preferably at least 1% by mass. The upper limit is preferably at most 20% by mass, more preferably at most 15% by mass. A photoinitiator may use only 1 type, and may use 2 or more types. When using 2 or more types, it is preferable that these total amounts are in the said range.

＜＜Solvent＞＞ It is preferable that the resin composition of this invention contains a solvent. An organic solvent is mentioned as a solvent. The type of solvent is basically not particularly limited as long as it satisfies the solubility of each component and the applicability of the composition. Examples of the organic solvent include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. Regarding such details, refer to paragraph 0223 of International Publication No. 2015/166779, which is incorporated in this specification. Also, a cyclic alkyl-substituted ester solvent and a cyclic alkyl-substituted ketone solvent can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, methylene chloride, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, and ethyl celuxoacetate. , ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methyl Cyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol Acetate, Propylene Glycol Monomethyl Ether, Propylene Glycol Monomethyl Ether Acetate, 3-Methoxy-N,N-Dimethylpropionamide, 3-Butoxy-N,N-Dimethylpropionamide , propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, γ-butyrolactone, cyclobutane, anisole, 1,4-diacetyloxybutane, diethylene glycol Alcohol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentane ketone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropanol, etc. However, sometimes it is better to reduce aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents due to environmental reasons (for example, it can be set to 50% by mass relative to the total amount of organic solvents) ppm (parts per million) or less, may be 10 mass ppm or less, may also be 1 mass ppm or less).

In the present invention, it is preferable to use an organic solvent with a low metal content, and it is preferable that the metal content of the organic solvent is, for example, 10 mass ppb (parts per billion) or less. According to needs, organic solvents of ppt (parts per trillion) level can be used, such organic solvents are provided by Toyo Gosei Co., Ltd, for example (Chemical Industry Daily, November 13, 2015).

Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter. The filter pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and still more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene or nylon.

Organic solvents may contain isomers (compounds with the same number of atoms but different structures). In addition, isomers may contain only 1 type, and may contain plural types.

The content rate of the peroxide in an organic solvent is preferably 0.8 mmol/L or less, and it is more preferable not to contain a peroxide substantially.

The content of the solvent in the resin composition is preferably from 10 to 95% by mass, more preferably from 20 to 90% by mass, and still more preferably from 30 to 90% by mass.

Moreover, it is preferable that the resin composition of this invention does not contain an environmental control substance substantially from a viewpoint of environmental control. Furthermore, in the present invention, substantially not containing environmental control substances means that the content of environmental control substances in the resin composition is 50 mass ppm or less, preferably 30 mass ppm or less, and more preferably 10 mass ppm or less. 1 mass ppm or less is particularly preferred. Examples of environmental control substances include benzene; alkylbenzenes such as toluene and xylene; and halogenated benzenes such as chlorobenzene. These are registered as environmental control substances under REACH (Registration Evaluation Authorization and Restriction of Chemicals) control, PRTR (Pollutant Release and Transfer Register) law, VOC (Volatile Organic Compounds) control, etc., and their usage and disposal methods are strictly regulated. These compounds may be used as solvents in the production of components used in resin compositions, etc., and may be mixed into resin compositions as residual solvents. From the standpoint of human safety and environmental considerations, it is preferable to reduce these substances as much as possible. As a method of reducing environmentally regulated substances, there may be mentioned a method of heating and reducing pressure in the system to a temperature equal to or higher than the boiling point of the environmentally regulated substances, and distilling the environmentally regulated substances from the system to reduce them. In addition, when distilling a small amount of environmentally controlled substances, it is also useful to make the solvent azeotrope with a solvent having the same boiling point in order to improve efficiency. In addition, when a compound having radical polymerizability is contained, a polymerization inhibitor or the like may be added for vacuum distillation in order to suppress intermolecular crosslinking due to radical polymerization during vacuum distillation. These distillation methods can be performed at any stage of raw materials, products of reacting raw materials (such as polymerized resin solutions and polyfunctional monomer solutions), or resin compositions prepared by mixing these compounds, etc. carried out in one stage.

＜＜Compounds with cyclic ether groups＞＞ The resin composition of this invention can contain the compound which has a cyclic ether group. As a cyclic ether group, an epoxy group, an oxetanyl group, etc. are mentioned. It is preferable that the compound which has a cyclic ether group is a compound which has an epoxy group (it is also called an epoxy compound hereafter).

The compound having a cyclic ether group may be a low-molecular compound (for example, a molecular weight of less than 1,000) or a macromolecule (for example, in the case of a polymer with a molecular weight of 1,000 or more, the weight-average molecular weight of 1,000 or more) . The weight average molecular weight of the cyclic ether group is preferably from 200 to 100,000, more preferably from 500 to 50,000. The upper limit of the weight average molecular weight is preferably at most 10,000, more preferably at most 5,000, and still more preferably at most 3,000.

As the compound having a cyclic ether group, compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, compounds described in paragraphs 0147-0156 of JP-A-2014-043556, Compounds described in paragraphs 0085 to 0092 of JP-A-2014-089408 and compounds described in JP-A-2017-179172.

Examples of commercially available compounds having a cyclic ether group include DENACOL EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX -850L, EX-850 (manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (manufactured by ADEKA Corporation), NC-2000, NC-3000, NC- 7300, XD-1000, EPPN-501, EPPN-502 (the above are made by ADEKA Corporation), CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2083, CELLOXIDE 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (the above are Daicel Corporation), CYCLOMER P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (the above are manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (the above are manufactured by Mitsubishi Chemical Corporation), Aron OxetaneOXT- 121、OXT -221, OX-SQ, PNOX (manufactured by TOAGOSEI CO., LTD. above), ADEKA Glycirol ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), MARPROOF G-0150M, G-0105SA, G- 0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (manufactured by NOF Corporation, epoxy group-containing polymer), OXT-101, OXT-121 . Heterocyclobutyl monomer), BATG (manufactured by SHOWA DENKO K.K.), etc.

It is preferable that content of the compound which has a cyclic ether group in the total solid content of a resin composition is 0.1-20 mass %. The lower limit is preferably at least 0.5% by mass, more preferably at least 1% by mass. The upper limit is preferably at most 15% by mass, more preferably at most 10% by mass. The compound which has a cyclic ether group may use only 1 type, and may use 2 or more types. When using 2 or more types, it is preferable that these total amounts are in the said range.

＜＜Hardening Accelerator＞＞ The resin composition of the present invention may contain a curing accelerator. Examples of the curing accelerator include thiol compounds, methylol compounds, amine compounds, phosphonium salt compounds, amidine chloride compounds, amide compounds, base generators, isocyanate compounds, alkoxysilane compounds, onium salt compounds, and the like. Specific examples of the hardening accelerator include compounds described in paragraphs 0094 to 0097 of International Publication No. 2018/056189, compounds described in paragraphs 0246 to 0253 of Japanese Patent Application Laid-Open No. 2015-034963, Japanese Patent Application Laid-Open No. Compounds described in paragraphs 0186 to 0251 of JP-A-2013-041165, ionic compounds described in JP-A-2014-055114, and paragraphs 0071-0080 of JP-A-2012-150180 Compound, an alkoxysilane compound having an epoxy group described in JP-A-2011-253054, a compound described in paragraphs 0085-0092 of JP-A No. 5765059, JP-A-2017-036379 Carboxyl-containing epoxy hardeners as described in When a hardening accelerator is contained, the content of the hardening accelerator in the total solid content of the resin composition is preferably 0.3 to 8.9% by mass, more preferably 0.8 to 6.4% by mass.

＜＜Polymerization inhibitor＞＞ The resin composition of the present invention can contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tertiary butyl-p-cresol, pyrogallol, tertiary butylcatechol, benzoquinone, 4,4' -Thiobis(3-methyl-6-tertiary butylphenol), 2,2'-methylenebis(4-methyl-6-tertiary butylphenol), N-nitrosophenyl Hydroxylamine salts (ammonium salts, primary cerium salts, etc.). Among them, p-methoxyphenol is preferred. When containing a polymerization inhibitor, it is preferable that content of the polymerization inhibitor in the total solid content of a resin composition is 0.0001-5 mass %. A polymerization inhibitor may be only 1 type, and may be 2 or more types. In the case of two or more, the total amount is preferably within the above range.

＜＜Silane coupling agent＞＞ The resin composition of the present invention can contain a silane coupling agent. In this specification, a silane coupling agent means a silane compound which has a hydrolyzable group and a functional group other than it. Also, the hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can generate a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. As a hydrolyzable group, a halogen atom, an alkoxy group, an acyloxy group etc. are mentioned, for example, An alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of functional groups other than hydrolyzable groups include vinyl groups, (meth)allyl groups, (meth)acryl groups, mercapto groups, epoxy groups, oxetanyl groups, amino groups, Urea group, thioether group, isocyanate group, phenyl group, etc., amine group, (meth)acryl group and epoxy group are preferred. Specific examples of the silane coupling agent include N-β-aminoethyl-γ-aminopropylmethyldimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-602), N-β-aminoethyl-γ-aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-603), N-β-aminoethyl-γ-amine propyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBE-602), γ-aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-903), γ-aminopropyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBE-903), 3-methacryloxypropylmethyldimethoxy 3-methacryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-502), 3-methacryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-502) 503) etc. Further, specific examples of the silane coupling agent include compounds described in paragraphs 0018 to 0036 of JP-A-2009-288703 and compounds described in paragraphs 0056-0066 of JP-A-2009-242604 , which are incorporated into this manual. The content of the silane coupling agent in the total solid content of the resin composition is preferably 0.01 to 15.0% by mass, more preferably 0.05 to 10.0% by mass. Only 1 type may be sufficient as a silane coupling agent, and 2 or more types may be sufficient as it. In the case of two or more, the total amount is preferably within the above range.

＜＜Surfactant＞＞ The resin composition of the present invention can contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and polysiloxane-based surfactants can be used. The surfactant is preferably a polysiloxane-based surfactant or a fluorine-based surfactant. Surfactants include the surfactants described in paragraphs 0238 to 0245 of International Publication No. 2015/166779, and the surfactants described in Japanese Patent Laid-Open No. 2020-008634, which are incorporated in this specification. middle.

The fluorine content in the fluorine-based surfactant is preferably from 3 to 40% by mass, more preferably from 5 to 30% by mass, and particularly preferably from 7 to 25% by mass. A fluorine-based surfactant having a fluorine content within this range is effective in terms of the uniformity of the thickness of the coating film and the liquid-saving properties, and its solubility in the resin composition is also good.

Examples of fluorine-based surfactants include those described in paragraphs 0060 to 0064 of JP 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014/017669), etc. Surfactants described in paragraphs 0117 to 0132 of Kokai Publication No. 2011-132503 are incorporated in this specification. Examples of commercially available fluorine-based surfactants include MEGAFACE F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F- 144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F- 560, F-561, F-565, F-563, F-568, F-575, F-780, EXP, MFS-330, R-01, R-40, R-40-LM, R-41, R-41-LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (the above are made by DIC CORPORATION), FLUORAD FC430, FC431, FC171 (the above are Sumitomo 3M Limited), SURFLON S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (the above are AGC INC. ), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (the above are manufactured by OMNOVA SOLUTIONS INC.), Futurgent208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, FTX-218, ( The above is NEOS), etc.

In addition, as the fluorine-based surfactant, an acrylic compound can preferably be used. The acrylic compound has a molecular structure having a functional group containing a fluorine atom, and when heat is applied, the functional group containing a fluorine atom is cut off and the fluorine atom Volatile. Examples of such fluorine-based surfactants include MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)), for example, MEGAFACE DS-21.

Also, as the fluorine-based surfactant, it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound. Examples of such fluorine-based surfactants include fluorine-based surfactants described in JP-A-2016-216602, and the content is incorporated in this specification.

As the fluorine-based surfactant, a blocked polymer can also be used. Fluorine-based surfactants can also preferably use fluorine-containing polymer compounds, which include: repeating units derived from (meth)acrylate compounds having fluorine atoms; It is preferably a repeating unit of (meth)acrylate compound of 5 or more) alkyleneoxy groups (preferably ethoxyl groups, propoxyl groups). In addition, the fluorine-containing surfactant described in paragraphs 0016 to 0037 of JP-A-2010-032698 and the following compounds are also exemplified as the fluorine-based surfactant used in the present invention. [chemical formula 23] The weight average molecular weight of the above compound is preferably 3000-50000, for example 14000. In the above-mentioned compounds, % representing the ratio of repeating units is mole %.

In addition, as the fluorine-based surfactant, a fluorine-containing polymer having an ethylenically unsaturated bond-containing group on a side chain can also be used. Specific examples include the compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of JP-A-2010-164965, MEGAFACE RS-101, RS-102, RS-718K, RS- 72-K et al. Moreover, the compound described in paragraph 0015-0158 of Unexamined-Japanese-Patent No. 2015-117327 can also be used as a fluorine-type surfactant.

Also, from the viewpoint of environmental control, it is also preferable to use the surfactant described in International Publication No. 2020/084854 as a substitute for the surfactant having a perfluoroalkyl group having 6 or more carbon atoms.

Furthermore, it is also preferable to use a fluoroimide chlorine-containing compound represented by the formula (fi-1) as a surfactant. [chemical formula 24] In the formula (fi-1), m represents 1 or 2, n represents an integer from 1 to 4, a represents 1 or 2, X ^a+ represents a-valent metal ions, primary ammonium ions, secondary ammonium ions, and tertiary ammonium ions , quaternary ammonium ion or NH ₄ ⁺ .

Examples of nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (for example, glycerol propane Oxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonyl ether Phenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF Corporation) , Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF Corporation), NCW-101, NCW-1001, NCW-1002 (manufactured by FUJIFILM Wako Pure Chemical Corporation), PIONIN D-6112, D-6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), OLFIN E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Co., Ltd.), etc.

Examples of silicone surfactants include DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH8400, SH 8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (above manufactured by Dow Toray Co., Ltd.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (the above are manufactured by Momentive Performance Materials Inc.), KP-341, KF-6000, KF-6001, KF -6002, KF-6003 (the above are manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (the above manufactured by BYK Chemie GmbH), etc. Moreover, the compound of the following structures can also be used among polysiloxane-type surfactants. [chemical formula 25]

The content of the surfactant in the total solid content of the resin composition is preferably 0.001% by mass to 5.0% by mass, more preferably 0.005% to 3.0% by mass. Surfactant may be only 1 type, and may be 2 or more types. In the case of two or more, the total amount is preferably within the above range.

＜＜Antioxidant＞＞ The resin composition of the present invention can contain an antioxidant. As an antioxidant, a phenolic compound, a phosphite compound, a thioether compound, etc. are mentioned. As the phenolic compound, any phenolic compound called a phenolic antioxidant can be used. A hindered phenol compound is mentioned as a preferable phenol compound. A compound having a substituent at a position adjacent to the phenolic hydroxyl group (ortho position) is preferred. As the aforementioned substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferable. Moreover, it is also preferable that an antioxidant is a compound which has a phenolic group and a phosphite group in the same molecule. Moreover, phosphorus antioxidant can also be used preferably as an antioxidant. The content of the antioxidant in the total solid content of the resin composition is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass. When an antioxidant is contained, only 1 type may be used for an antioxidant, and 2 or more types may be used. When using 2 or more types, it is preferable that a total amount exists in the said range.

＜＜Other ingredients＞＞ The resin composition of the present invention may contain sensitizers, hardening accelerators, fillers, thermosetting accelerators, plasticizers and other additives (such as conductive particles, defoamers, flame retardants, leveling agents, etc.) , peeling accelerators, fragrances, surface tension regulators, chain transfer agents, etc.). Properties such as film physical properties can be adjusted by appropriately containing these components. Regarding these components, for example, reference can be made to the description in paragraph 0183 and subsequent paragraphs of Japanese Patent Application Publication No. 2012-003225 (paragraph 0237 of the corresponding U.S. Patent Application Publication No. 2013/0034812 specification), and the description in Japanese Patent Application Publication No. 2008-250074. 0101-0104, 0107-0109, etc., these contents are incorporated into this specification. Moreover, the resin composition of this invention may contain a latent antioxidant as needed. As potential antioxidants, there can be mentioned compounds in which the part that acts as an antioxidant is protected by a protecting group, and the protecting group is heated at 100 to 250°C or heated at 80 to 200°C in the presence of an acid/alkali catalyst. A compound that decomposes upon heating and acts as an antioxidant. Examples of potential antioxidants include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and JP-A-2017-008219. As a commercial item of a latent antioxidant, ADEKA ARKLS GPA-5001 (manufactured by ADEKA CORPORATION) etc. are mentioned. In addition, the resin composition of the present invention may contain an aromatic group-containing phosphonium salt described in JP-A-2020-079833.

The resin composition of the present invention may contain a metal oxide in order to adjust the refractive index of the obtained film. Examples of metal oxides include TiO ₂ , ZrO ₂ , Al ₂ O ₃ , SiO ₂ and the like. The primary particle size of the metal oxide is preferably from 1 to 100 nm, more preferably from 3 to 70 nm, and still more preferably from 5 to 50 nm. Metal oxides may have a core-shell structure. Also, in this case, the core portion may be hollow.

The resin composition of the present invention may contain a light resistance improver. Examples of light resistance improving agents include compounds described in paragraphs 0036 to 0037 of JP-A-2017-198787, compounds described in paragraphs 0029-0034 of JP-A-2017-146350, compounds described in JP-A-2017-146350, JP-A Compounds described in paragraphs 0036-0037, 0049-0052 of No. 2017-129774, compounds described in paragraphs 0031-0034, 0058-0059 of JP-A No. 2017-129674, JP-A No. 2017-122803 Compounds described in paragraphs 0036 to 0037 and 0051 to 0054 of the publication, compounds described in paragraphs 0025 to 0039 of International Publication No. 2017/164127, and paragraphs 0034 to 0047 of Japanese Patent Application Laid-Open No. 2017-186546 The compounds described in paragraphs 0019 to 0041 of JP-A-2015-025116, the compounds described in paragraphs 0101-0125 of JP-A-2012-145604, and the compounds described in JP-A-2012-103475 Compounds described in paragraphs 0018 to 0021, compounds described in paragraphs 0015 to 0018 of Japanese Patent Application Laid-Open No. 2011-257591, compounds described in paragraphs 0017 to 0021 of Japanese Patent Application Laid-Open No. 2011-191483, Japanese Patent Application Laid-Open No. Compounds described in paragraphs 0108 to 0116 of Unexamined Publication No. 2011-145668, compounds described in paragraphs 0103 to 0153 of Japanese Patent Application Laid-Open No. 2011-253174, and the like.

From the viewpoint of environmental regulation, the use of perfluoroalkanesulfonic acids and their salts and perfluoroalkylcarboxylic acids and their salts are sometimes regulated. In the resin composition of the present invention, in the case of reducing the content rate of the above-mentioned compounds, perfluoroalkylsulfonic acid (especially, perfluoroalkylsulfonic acid having 6 to 8 carbon atoms in the perfluoroalkyl group) and its The content of salt and perfluoroalkylcarboxylic acid (especially perfluoroalkylcarboxylic acid with 6 to 8 carbon atoms in the perfluoroalkyl group) and its salt is 0.01ppb to 1,000 with respect to the total solid content of the resin composition The range of ppb is preferable, the range of 0.05ppb-500ppb is more preferable, and the range of 0.1ppb-300ppb is still more preferable. The resin composition of the present invention may not substantially contain perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt. For example, by using a compound that can replace perfluoroalkylsulfonic acid and its salt and a compound that can replace perfluoroalkylcarboxylic acid and its salt, it is also possible to select a compound that does not substantially contain perfluoroalkylsulfonic acid and its salt and Compositions of perfluoroalkylcarboxylic acids and their salts. Examples of compounds that can be substituted for regulated compounds include compounds that are excluded from regulated objects due to differences in the carbon number of perfluoroalkyl groups. However, the above-mentioned content does not prevent the use of perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt. The resin composition of the present invention may also contain perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt within the maximum allowable range.

The water content of the resin composition of the present invention is usually 3% by mass or less, preferably 0.01 to 1.5% by mass, more preferably 0.1 to 1.0% by mass. Moisture content can be measured by the Karl Fischer method.

The resin composition of the present invention can be used with its viscosity adjusted for adjustment of film surface shape (flatness, etc.), adjustment of film thickness, and the like. The value of the viscosity can be appropriately selected according to needs, but for example, at 25° C., it is preferably 0.3 mPa･s to 50 mPa･s, more preferably 0.5 mPa･s to 20 mPa･s. As a method of measuring the viscosity, for example, it can be measured using a cone-plate type viscometer with the temperature adjusted to 25°C.

＜Containment container＞ The container for the resin composition of the present invention is not particularly limited, and known containers can be used. Also, as a storage container, for the purpose of preventing impurities from mixing into raw materials or compositions, it is also preferable to use a multi-layer bottle whose inner wall is made of 6 types of 6-layer resins or a bottle with 6 types of resins in a 7-layer structure. As such a container, the container described in Unexamined-Japanese-Patent No. 2015-123351 is mentioned, for example.

＜Preparation method of resin composition＞ The resin composition of the present invention can be prepared by mixing the aforementioned components. When preparing the resin composition, all the components can be dissolved and/or dispersed in the solvent at the same time to prepare the resin composition, and each component can also be suitably used as two or more solutions or dispersions as needed, and when used ( At the time of coating) these are mixed to prepare a resin composition.

Also, it is preferable to include a process of dispersing the pigment when preparing the resin composition. Examples of the mechanical force used to disperse the pigment in the process of dispersing the pigment include compression, extrusion, impact, shearing, cavitation, and the like. Specific examples of these processes include bead milling, sand milling, roller milling, ball milling, paint stirring, micro jets, high-speed impellers, sand mixing, jet mixing, high-pressure wet micronization, ultrasonic dispersion, and the like. In addition, in pulverization of pigments under sand milling (bead milling), it is preferable to perform treatment under the conditions that the pulverization efficiency can be improved by using small-diameter beads and increasing the filling rate of the microbeads. Moreover, it is preferable to remove coarse particles by filtration, centrifugation, etc. after pulverization. Also, regarding the process and dispersing machine for dispersing pigments, it is preferable to use "Compendium of Dispersion Technology, published by JOHOKIKO CO., LTD., July 15, 2005" or "Use Suspension (solid/liquid dispersion system) Dispersion technology and industrial practical application comprehensive data collection centered on it, published by the publishing department of the Management Development Center, October 10, 1978", the process and dispersion machine recorded in paragraph 0022 of Japanese Patent Application Laid-Open No. 2015-157893. In addition, in the process of dispersing the pigment, it is possible to carry out the micronization treatment of the particles by the salt milling step. For materials, equipment, and processing conditions used in the salt milling step, for example, reference can be made to the descriptions in JP-A-2015-194521 and JP-A-2012-046629.

When preparing a resin composition, it is preferable to filter the resin composition with a filter in order to remove impurities or reduce defects. As a filter, if it is a filter conventionally used for a filtration use etc., it can use without limitation in particular. For example, fluorine resins such as polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF), polyamide resins such as nylon (such as nylon-6, nylon-6,6), polyethylene, polypropylene ( PP) and other polyolefin resins (including high-density, ultra-high molecular weight polyolefin resins) and other materials. Among these materials, polypropylene (including high density polypropylene) and nylon are preferred.

The pore size of the filter is preferably from 0.01 to 7.0 μm, more preferably from 0.01 to 3.0 μm, and still more preferably from 0.05 to 0.5 μm. As long as the pore size of the filter is within the above range, fine impurities can be removed more reliably. For the pore diameter value of the filter, you can refer to the nominal value of the filter manufacturer. As for the filter, various filters provided by NIHON PALL Corporation (DFA4201NXEY, DFA4201NAEY, DFA4201J006P, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (Formerly Nippon Mykrolis Corporation), KITZ MICROFILTER Corporation, etc. can be used.

Moreover, it is also preferable to use a fibrous filter material as a filter. As a fibrous filter material, a polypropylene fiber, a nylon fiber, a glass fiber etc. are mentioned, for example. Examples of commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD. When using filters, it is possible to combine different filters (for example, 1st filter and 2nd filter, etc.). In this case, the filtration by each filter may be performed only once, or may be performed two or more times. Also, filters with different pore diameters may be combined within the above range. Moreover, it is also possible to perform filtration with the 1st filter only for a dispersion liquid, and to filter with a 2nd filter after mixing other components.

＜Film＞ The film of the present invention is a film obtained by using the above-mentioned resin composition of the present invention. The film of the present invention can be used for filters such as color filters, near-infrared transmission filters, and near-infrared cut filters.

The film thickness of the film of the present invention can be appropriately adjusted depending on the purpose. For example, the film thickness is preferably 20 μm or less, more preferably 10 μm or less, and still more preferably 5 μm or less. The lower limit of the film thickness is preferably at least 0.1 μm, more preferably at least 0.2 μm, and still more preferably at least 0.3 μm.

When the film of the present invention is used as a color filter, it is preferable that the film of the present invention has a hue of green, red, blue, cyan, magenta, or yellow. Also, the film of the present invention can be preferably used as a colored pixel of a color filter. Examples of colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels.

When the film of the present invention is used as a near-infrared cut filter, it is preferable that the maximum absorption wavelength of the film of the present invention exists in a wavelength range of 700 to 1800 nm, and it is more preferably in a wavelength range of 700 to 1300 nm. , It is still more preferable to exist in the range of wavelength 700-1000nm. In addition, the transmittance of the film is preferably 70% or higher in the entire wavelength range of 400 to 650 nm, more preferably 80% or higher, and still more preferably 90% or higher. In addition, it is preferable that the transmittance of the film is 20% or less in at least one point in the wavelength range of 700 to 1800 nm. Also, the ratio of absorbance Amax at the maximum absorption wavelength to absorbance A550 at a wavelength of 550 nm, that is, absorbance Amax/absorbance A550 is preferably 20 to 500, more preferably 50 to 500, further preferably 70 to 450, and 100 to 500. 400 is the best.

When the film of the present invention is used as a near-infrared ray transmission filter, it is preferable that the film of the present invention has any one of the following spectral characteristics (i1) to (i5), for example. (i1): The maximum value of the transmittance in the wavelength range of 400 to 640 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 800 to 1500 nm The filter is more than 70% (preferably more than 75%, more preferably more than 80%). A film having such spectroscopic properties can shield light in the wavelength range of 400 to 640 nm and transmit light exceeding the wavelength of 750 nm. (i2): The maximum value of the transmittance in the wavelength range of 400 to 750 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 900 to 1500 nm The filter is more than 70% (preferably more than 75%, more preferably more than 80%). A film having such spectroscopic properties can shield light in the wavelength range of 400 to 750 nm and transmit light exceeding the wavelength of 850 nm. (i3): The maximum value of the transmittance in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 1000 to 1500 nm The filter is more than 70% (preferably more than 75%, more preferably more than 80%). A film having such spectroscopic properties can shield light in the wavelength range of 400 to 830 nm and transmit light exceeding the wavelength of 950 nm. (i4): The maximum value of the transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 1100 to 1500 nm The filter is more than 70% (preferably more than 75%, more preferably more than 80%). A film with such spectroscopic properties can shield light in the wavelength range of 400 to 950 nm and transmit light exceeding the wavelength of 1050 nm. (i5): The maximum value of the transmittance in the wavelength range of 400 to 1050 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 1200 to 1500 nm The filter is more than 70% (preferably more than 75%, more preferably more than 80%). The film with such spectroscopic properties can shield light in the wavelength range of 400-1050nm and transmit light exceeding the wavelength of 1150nm.

＜Filter＞ The optical filter of the present invention has the above-mentioned film of the present invention. As the type of optical filter, examples of the optical filter include a color filter, a near-infrared ray transmission filter, a near-infrared ray cut filter, and the like, and a color filter is preferred. As a color filter, a colored pixel having the film of the present invention as a color filter is preferable. In addition, the optical filter may have a structure in which pixels are embedded in spaces partitioned by partition walls, for example, in a grid pattern. The optical filter of the present invention can be used in optical sensors such as solid-state imaging devices, image display devices, and the like.

In the optical filter, the film thickness of the film of the present invention can be appropriately adjusted depending on the purpose. The film thickness of the pixels included in the filter is preferably 5 μm or less, more preferably 1 μm or less, and still more preferably 0.6 μm or less. The lower limit of the film thickness is preferably at least 0.1 μm, more preferably at least 0.2 μm, and still more preferably at least 0.3 μm.

The width of the pixels included in the filter is preferably 0.4 to 10.0 μm. The lower limit is preferably at least 0.4 μm, more preferably at least 0.5 μm, and still more preferably at least 0.6 μm. The upper limit is preferably 5.0 μm or less, more preferably 2.0 μm or less, still more preferably 1.0 μm or less, still more preferably 0.8 μm or less. In addition, the Young's modulus of the pixel is preferably 0.5 to 20 GPa, more preferably 2.5 to 15 GPa.

＜Membrane manufacturing method＞ The film of the present invention can be produced through the step of applying the resin composition of the present invention to a support. In the film manufacturing method, it is preferable to further include a step of forming a pattern. As a pattern forming method, photolithography and dry etching are mentioned, and photolithography is preferable.

It is preferable that the pattern formation based on photolithography includes the following steps: a step of using the resin composition of the present invention to form a resin composition layer on a support; a step of exposing the resin composition layer into a pattern; and exposing the resin composition The step of developing and removing the unexposed part of the object layer to form a pattern. If necessary, a step of baking the resin composition layer (pre-baking step) and a step of baking the developed pattern (post-baking step) may also be provided.

In the step of forming the resin composition layer, the resin composition layer of the present invention is used to form the resin composition layer on the support. The support is not particularly limited and can be appropriately selected according to the application. For example, a glass substrate, a silicon substrate, etc. are mentioned, and a silicon substrate is preferable. In addition, a charge coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, and the like may be formed on the silicon substrate. In addition, a black matrix is sometimes formed on a silicon substrate to isolate each pixel. In addition, in order to improve the adhesion with the upper layer, prevent the diffusion of substances, or planarize the surface of the substrate, a base layer may be provided on the silicon substrate.

As a coating method of the resin composition, a known method can be used. For example, there may be mentioned dropping method (drip casting); slit coating method; spray method; roll coating method; spin coating method (spin coating); , the method described in Japanese Patent Laid-Open No. 2009-145395); inkjet (such as on-demand method, piezoelectric method, thermal method), nozzle jetting and other jetting printing, flexographic printing, screen printing, gravure printing, Various printing methods such as reverse offset printing and metal mask printing; transfer printing using a mold, etc.; nanoimprinting, etc. The application method in inkjet is not particularly limited, for example, "Inkjet that can be promoted and used-infinite possibilities appearing in the patent-, issued in February 2005, Sumitbe Techon Research Co.,Ltd." The method shown (especially pages 115 to 133) or Japanese Patent Application Publication No. 2003-262716, Japanese Patent Application Publication No. 2003-185831, Japanese Patent Application Publication No. 2003-261827, Japanese Patent Application Publication No. 2012-126830, The method described in Japanese Unexamined Patent Application Publication No. 2006-169325 and the like. In addition, regarding the coating method of the composition, the descriptions of International Publication No. 2017/030174 and International Publication No. 2017/018419 can be referred to, and these contents are incorporated in this specification.

The resin composition layer formed on the support may be dried (prebaked). In the case of producing a film by a low-temperature process, pre-baking may not be performed. In the case of prebaking, the prebaking temperature is preferably 150° C. or lower, more preferably 120° C. or lower, and still more preferably 110° C. or lower. The lower limit may be, for example, 50°C or higher, or may be 80°C or higher. The prebaking time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and still more preferably 80 to 220 seconds. Prebaking can be performed with a hot plate, an oven, or the like.

Next, the resin composition layer is exposed in a pattern (exposure step). For example, the resin composition layer can be exposed in a patterned form by exposing the resin composition layer through a mask having a predetermined mask pattern using a stepper, a scanning exposure machine, or the like. Thereby, the exposed part can be cured.

Examples of radiation (light) that can be used for exposure include g-rays, i-rays, and the like. In addition, light having a wavelength of 300 nm or less (preferably light having a wavelength of 180 to 300 nm) can also be used. Examples of light having a wavelength of 300 nm or less include KrF rays (wavelength: 248 nm), ArF rays (wavelength: 193 nm), and KrF rays (wavelength: 248 nm) are preferred. In addition, a light source with a long wavelength of 300 nm or more can also be used.

In addition, at the time of exposure, exposure may be performed by continuously irradiating light, or may be performed by pulsed irradiation (pulse exposure). In addition, pulse exposure refers to an exposure method in which light irradiation and pauses are repeated in a cycle for a short time (eg, millisecond order or less) to perform exposure.

The amount of irradiation (exposure amount) is, for example, preferably 0.03 to 2.5 J/cm ² , more preferably 0.05 to 1.0 J/cm ² . The oxygen concentration at the time of exposure can be appropriately selected. In addition to performing in the atmosphere, for example, it can be performed in a low-oxygen environment with an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially no oxygen). The exposure may be performed under a high-oxygen environment (for example, 22 vol%, 30 vol%, or 50 vol%) in which the oxygen concentration exceeds 21 vol%. In addition, the exposure illuminance can be appropriately set, and usually can be selected from the range of 1000 W/m ² to 100,000 W/m ² (for example, 5,000 W/m ² , 15,000 W/m ² , or 35,000 W/m ² ). The conditions of oxygen concentration and exposure illuminance can be appropriately combined, for example, an oxygen concentration of 10 vol % and an illuminance of 10000 W/m ² , an oxygen concentration of 35 vol % and an illuminance of 20000 W/m ² , etc. can be set.

Next, unexposed portions of the resin composition layer are removed by development to form a pattern. The development and removal of the unexposed portion of the resin composition layer can be performed using a developer. Thereby, the resin composition layer of the unexposed part in the exposure step is dissolved in the developing solution, and only the photohardened part remains. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, in order to improve the residue removal performance, the step of shaking off the developing solution every 60 seconds and supplying a new developing solution may be repeated several times.

As a developing solution, an organic solvent, an alkali developing solution, etc. are mentioned, and an alkali developing solution can be used preferably. As the alkaline developing solution, an alkaline aqueous solution (alkali developing solution) obtained by diluting the alkaline agent with pure water is preferable. Examples of alkaline agents include ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylhydrogen Ammonium Oxide, Tetrapropylammonium Hydroxide, Tetrabutylammonium Hydroxide, Ethyltrimethylammonium Hydroxide, Benzyltrimethylammonium Hydroxide, Dimethylbis(2-Hydroxyethyl)ammonium Hydroxide, Choline, pyrrole, piperidine, 1,8-diazabicyclo-[5.4.0]-7-undecene and other organic basic compounds or sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, Sodium silicate, sodium metasilicate and other inorganic alkaline compounds. The alkaline agent is preferably a compound with a large molecular weight in terms of the environment and safety. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass. In addition, the developer may further contain a surfactant. From the viewpoint of convenient transportation and storage, the developer solution can be temporarily made into a concentrated solution and diluted to a desired concentration when used. The dilution ratio is not particularly limited, and can be set, for example, within a range of 1.5 to 100 times. Moreover, it is also preferable to wash (rinse) with pure water after image development. Further, it is preferable to perform rinsing by rotating the support on which the developed resin composition layer has been formed, and supplying a rinsing liquid to the developed resin composition layer. Moreover, it is also preferable to carry out by moving the nozzle which discharges a rinse liquid from the center part of a support body to the peripheral part of a support body. At this time, when moving from the central part of the support body of the nozzle to the peripheral part, the moving speed of the nozzle may be gradually reduced while moving. By performing rinsing in this manner, in-plane variation in rinsing can be suppressed. Also, the same effect can be obtained by gradually reducing the rotational speed of the support while moving the nozzle from the center portion of the support to the peripheral portion.

After image development, it is preferable to perform additional exposure processing and heat processing (post-baking) after performing drying. Additional exposure treatment and post-baking are hardening treatments after development to make fully hardened ones. The heating temperature in the post-baking is, for example, preferably 100 to 240°C, more preferably 200 to 240°C. The film after development can be post-baked continuously or intermittently using a heating mechanism such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater so as to meet the above conditions. When performing an additional exposure process, it is preferable that the light used for exposure is light of wavelength 400nm or less. In addition, the additional exposure treatment can be performed by the method described in Korean Laid-Open Patent No. 10-2017-0122130.

The pattern formation based on the dry etching method preferably includes the following steps: using the resin composition of the present invention to form a resin composition layer on a support, and curing the entire resin composition layer to form a hardened layer; A step of forming a photoresist layer on the hardened layer; a step of developing the photoresist layer after exposing the photoresist layer into a pattern; and using the resist pattern as a mask and using an etching gas to treat the hardened layer The step of performing dry etching. When forming the photoresist layer, it is also preferable to perform pre-baking treatment. In particular, as a formation process of the photoresist layer, a form in which heat treatment after exposure and heat treatment after development (post-baking treatment) are performed is preferable. Regarding the pattern formation by the dry etching method, the description in paragraphs 0010 to 0067 of JP-A-2013-064993 can be referred to, and the content is incorporated in this specification.

＜Solid state image sensor＞ The solid-state imaging device of the present invention has the above-mentioned film of the present invention. The structure of the solid-state imaging device is not particularly limited as long as it is provided with the film of the present invention and functions as a solid-state imaging device, and examples thereof include the following structures.

The structure of the solid-state imaging device is as follows: on the substrate, there are a plurality of photodiodes that constitute the light-receiving area of the solid-state imaging device (CCD (charge-coupled device) image sensor, CMOS (complementary metal oxide semiconductor) image sensor, etc.) The transmission electrode composed of polar body and polysilicon, etc., has a light-shielding film with only the light-receiving part of the photodiode on the photodiode and the transmission electrode, and has a method of covering the entire surface of the light-shielding film and the light-receiving part of the photodiode on the light-shielding film. An element protective film made of silicon nitride or the like is formed, and a color filter is provided on the element protective film. In addition, it may be a structure that has a light-condensing mechanism (for example, a microlens, etc., the same below) on the element protection film and on the lower side of the color filter (the side closer to the substrate), or one that has a light-condensing mechanism on the color filter. structure etc. In addition, the color filter may have a structure in which colored pixels are embedded in spaces partitioned by partition walls, for example, in a grid pattern. In this case, it is preferable that the partition wall has a low refractive index with respect to each colored pixel. Examples of the imaging device having such a structure include devices described in JP-A-2012-227478, JP-A-2014-179577, and WO2018/043654. In addition, as shown in Japanese Patent Laid-Open No. 2019-211559, light resistance can also be improved by providing an ultraviolet absorbing layer within the structure of the solid-state imaging device. The imaging device including the solid-state imaging device of the present invention can be used not only as a digital camera or an electronic device (mobile phone, etc.) having an imaging function, but also as a vehicle-mounted camera or a surveillance camera.

＜Image Display Device＞ The image display device of the present invention has the above-mentioned film of the present invention. As an image display device, a liquid crystal display device, an organic electroluminescent display device, etc. are mentioned. Definitions of image display devices or details of each image display device are described, for example, in "Electronic Display Components (written by Akio Sasaki, published by Kogyo Chosakai Publishing Co., Ltd., 1990)", "Display Components (by Shun Ibuki) Chapter, Sangyo Tosho Publishing Co., Ltd., issued in 1989)", etc. Also, liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Publishing Co., Ltd., 1994)". The liquid crystal display device to which the present invention can be applied is not particularly limited, and it can be applied to liquid crystal display devices of various types described in the above-mentioned "Next Generation Liquid Crystal Display Technology", for example. [Example]

Hereinafter, the present invention will be described in detail with reference to examples. Materials, usage amounts, ratios, processing contents, processing procedures, and the like shown in the following examples can be appropriately changed unless departing from the gist of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. Ph in the structural formula shown below represents a phenyl group.

<Manufacture of dispersion> Using a bead mill (zirconia beads with a diameter of 0.1 mm), the mixed solution of the materials listed in the following table was mixed and dispersed in the amount shown in the following table for 3 hours to prepare the dispersion. Thereafter, dispersion treatment was carried out at a pressure of 2000 kg/cm ² and a flow rate of 500 g/min using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. This dispersion treatment was repeated up to 10 times in total to obtain a dispersion liquid. The unit of the numerical value described in the column of the compounding quantity of the following table is a mass part. The compounding quantity of a coloring material, a pigment derivative, and a dispersing agent is the value calculated by solid content conversion.

[Table 1] color material Pigment derivatives Dispersant solvent type Blending amount type Blending amount type Blending amount type Blending amount Green dispersion 1 PG58 11.04 Syn-1 1.23 B-2 3.73 S-1 84 Green Dispersion 2 PG58 11.04 Syn-2 1.23 B-1 3.73 S-1 84 Green Dispersion 3 PG36 11.04 Syn-1 1.23 B-2 3.73 S-1 84 Green Dispersion 4 PG36 11.04 Syn-2 1.23 B-1 3.73 S-1 84 Green Dispersion 5 PG7 11.04 Syn-1 1.23 B-2 3.73 S-1 84 Green Dispersion 6 PG7 11.04 Syn-2 1.23 B-1 3.73 S-1 84 Green Dispersion 7 PG59 11.04 Syn-1 1.23 B-2 3.73 S-1 84 Green Dispersion 8 PG59 11.04 Syn-2 1.23 B-1 3.73 S-1 84 Green Dispersion 9 PG63 11.04 Syn-1 1.23 B-2 3.73 S-1 84 Green Dispersion 10 PG63 11.04 Syn-2 1.23 B-1 3.73 S-1 84 Green Dispersion 11 PG36 9.50 Syn-2 0.50 B-7/B-6=74/26 5.7 S-1/S-3=76/24 84.3 Green Dispersion 12 PG36 12.80 Syn-2 1.30 B-5/B-6=75/25 6.1 S-1/S-3=76/24 79.8

[Table 2] color material Pigment derivatives Dispersant solvent type Blending amount type Blending amount type Blending amount type Blending amount Yellow Dispersion 1 PY185 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Yellow Dispersion 2 PY185 10.67 Syn-2 1.19 B-1 4.14 S-1 84 Yellow Dispersion 3 PY150 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Yellow Dispersion 4 PY150 10.67 Syn-2 1.19 B-1 4.14 S-1 84 Yellow Dispersion 5 PY139 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Yellow Dispersion 6 PY139 10.67 Syn-2 1.19 B-1 4.14 S-1 84 Yellow Dispersion 7 PY129 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Yellow Dispersion 8 PY129 10.67 Syn-2 1.19 B-1 4.14 S-1 84 Yellow Dispersion 9 PY138 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Yellow Dispersion 10 PY138 10.67 Syn-2 1.19 B-1 4.14 S-1 84 Yellow Dispersion 11 PY231 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Yellow Dispersion 12 PY231 10.67 Syn-2 1.19 B-1 4.14 S-1 84 Yellow Dispersion 13 PY233 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Yellow Dispersion 14 PY233 10.67 Syn-2 1.19 B-1 4.14 S-1 84 Yellow Dispersion 15 PY139 10.67 Syn-1 1.19 B-2/B-3=50/50 4.14 S-1 84 Yellow Dispersion 16 PY185 10.67 Syn-1 1.19 B-4 4.14 S-1 84 Yellow Dispersion 17 PY139 11.40 Syn-1 1.60 B-2/B-3=50/50 4 S-1 84 Yellow Dispersion 18 PY150 12.80 Syn-2 1.30 B-5/B-6=75/25 6.1 S-1 79.8

[table 3] color material Pigment derivatives Dispersant solvent type Blending amount type Blending amount type Blending amount type Blending amount Red dispersion 1 PR254 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Red Dispersion 2 PR254 10.67 Syn-3 1.19 B-1 4.14 S-1 84 Red Dispersion 3 PR272 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Red Dispersion 4 PR272 10.67 Syn-3 1.19 B-1 4.14 S-1 84 Red Dispersion 5 PR177 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Red Dispersion 6 PR177 10.67 Syn-3 1.19 B-1 4.14 S-1 84 Red Dispersion 7 PR122 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Red Dispersion 8 PR122 10.67 Syn-3 1.19 B-1 4.14 S-1 84 Red Dispersion 9 PR81:4 10.67 Syn-1 1.19 B-2 4.14 S-1 84 Red Dispersion 10 PR81:4 10.67 Syn-3 1.19 B-1 4.14 S-1 84 Red Dispersion 11 PR254 10.67 Syn-1 1.19 B-3 3.56 S-1 84.58 Red Dispersion 12 PR254 11.30 Syn-1 1.70 B-3 4.5 S-1 83

[Table 4] color material Pigment derivatives Dispersant solvent type Blending amount type Blending amount type Blending amount type Blending amount Blue dispersion 1 PB15:6 10.67 Syn-4 1.19 B-2 4.14 S-1 84 Blue Dispersion 2 PB15:6 10.67 Syn-4 1.19 B-1 4.14 S-1 84 Blue Dispersion 3 PB15:4 10.67 Syn-4 1.19 B-2 4.14 S-1 84 Blue Dispersion 4 PB15:4 10.67 Syn-4 1.19 B-1 4.14 S-1 84 Blue Dispersion 5 PB16 10.67 Syn-4 1.19 B-2 4.14 S-1 84 Blue dispersion 6 PB16 10.67 Syn-4 1.19 B-1 4.14 S-1 84 Blue Dispersion 7 PB15:3 10.67 Syn-4 1.19 B-2 4.14 S-1 84 Blue Dispersion 8 PB15:3 10.67 Syn-4 1.19 B-1 4.14 S-1 84 Blue Dispersion 9 PB15:6 10.20 Syn-6 1.40 B-8 1.4 S-1 87 Blue Dispersion 10 PB15:6 12.80 Syn-6 2.00 B-2 3.2 S-1/S-2/S-3=61/36/3 82 Blue Dispersion 11 PB15:6 12.80 Syn-4/Syn-5=93/7 2.00 B-2 3.2 S-1/S-3=76/24 82 Violet Dispersion 1 PV23 10.67 Syn-5 1.19 B-2 4.14 S-1 84 Violet Dispersion 2 PV23 10.67 Syn-5 1.19 B-1 4.14 S-1 84 Violet Dispersion 3 PV23 12.80 Syn-6 2.00 B-2 3.2 S-1/S-2/S-3=61/36/3 82 IR Dispersion 1 P-1 10.67 Syn-1 1.19 B-2 4.14 S-1 84 IR Dispersion 2 P-2 10.67 Syn-1 1.19 B-1 4.14 S-1 84

Among the raw materials described in the above table, the details of the raw materials indicated by abbreviations are as follows.

(Color material) PG7: CI Pigment Green 7 (green pigment) PG36: CI Pigment Green 36 (green pigment) PG58: CI Pigment Green 58 (green pigment) PG59: CI Pigment Green 59 (green pigment) PG63: CI Pigment Green 63 (Green Pigment) PY129: CI Pigment Yellow 129 (Yellow Pigment) PY138: CI Pigment Yellow 138 (Yellow Pigment) PY139: CI Pigment Yellow 139 (Yellow Pigment) PY150: CI Pigment Yellow 150 (Yellow Pigment) PY185: CI Pigment Yellow 185 (Yellow Pigment) PY231: CI Pigment Yellow 231 (Yellow Pigment) PY233: CI Pigment Yellow 233 (Yellow Pigment) PR122: CI Pigment Red 122 (Red Pigment) PR177: CI Pigment Red 177 (Red Pigment) PR254: CI Pigment Red 254 (Red Pigment) PR272: CI Pigment Red 272 (Red Pigment) PR81:4: CI Pigment Red 81:4 (Red Pigment) PB15:3: CI Pigment Blue 15:3 (Blue Pigment) PB15:4: CI Pigment Blue 15:4 (blue pigment) PB15:6: CI pigment blue 15:6 (blue pigment) PB16: CI pigment blue 16 (blue pigment) PV23: CI pigment violet 23 (purple pigment) P-1: the following Compound of structure (near-infrared absorbing pigment) [Chemical formula 26] P-2: A compound of the following structure (near infrared absorbing pigment) [Chemical formula 27]

(Pigment derivative) Syn-1: Compound of the following structure (molecular weight 769) [Chemical formula 28] Syn-2: Compound with the following structure (molecular weight: 688) [Chemical formula 29] Syn-3: a compound of the following structure (molecular weight 863) [chemical formula 30] Syn-4: Compound of the following structure (molecular weight 768) [Chemical formula 31] Syn-5: Compound of the following structure (molecular weight 784) [Chemical formula 32] Syn-6: SOLSPERSE 20000 (manufactured by Lubrizol Japan Limited.)

(Dispersant) B-1: Resin B-1 synthesized by the following method. Resin B-1 is a resin having an acid group. 50 parts by mass of methyl methacrylate, 30 parts by mass of n-butyl methacrylate, 20 parts by mass of (3-ethyloxycyclobutane-3-yl) methyl methacrylate, propylene glycol monomethyl ether acetate (PGMEA) 45.4 parts by mass was put into the reaction container, and the ambient gas was replaced with nitrogen. The inside of the reaction container was heated to 70° C., 6 parts by mass of 3-mercapto-1,2-propanediol were added, and 0.12 parts by mass of AIBN (azobisisobutyronitrile) was added thereto, and reacted for 12 hours. It was confirmed by the measurement of the solid content that the reaction proceeded 95%. Next, add 9.7 parts by mass of pyromellitic anhydride, 70.3 parts by mass of PGMEA, and 0.20 parts by mass of DBU (1,8-diacribicyclo-[5.4.0]-7-undecene) as a catalyst, at 120 It was reacted at ℃ for 7 hours. It was confirmed by the measurement of the acid value that more than 98% of the acid anhydride was half-esterified, and the reaction was completed, and the resin B-1 with the following structure having an acid value of 43 mgKOH/g and a weight average molecular weight of 9000 was obtained. [chemical formula 33]

B-2: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio, and the value attached to the side chain is the number of repeating units. The weight average molecular weight is 24000, and the acid value is 52.5mgKOH/g ) [Chemical Formula 34]

B-3: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio, and the value attached to the side chain is the number of repeating units. The weight average molecular weight is 21000, and the acid value is 74.9mgKOH/g ) [Chemical Formula 35]

B-4: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio, and the value attached to the side chain is the number of repeating units. The weight average molecular weight is 20000, and the acid value is 66.6mgKOH/g ) [Chemical Formula 36]

B-5: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio, and the value attached to the side chain is the number of repeating units. The weight average molecular weight is 21000, and the acid value is 36.0mgKOH/g ) [Chemical Formula 37]

B-6: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio of repeating units. The weight average molecular weight is 11000, and the acid value is 69.2 mgKOH/g) [Chemical formula 38]

B-7: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio, and the value attached to the side chain is the number of repeating units. The weight average molecular weight is 10500, and the acid value is 69.2mgKOH/g ) [Chemical Formula 39]

B-8: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio of repeating units. The weight average molecular weight is 12000, and the acid value is 216.6 mgKOH/g) [Chemical formula 40]

(solvent) S-1: Propylene Glycol Monomethyl Ether Acetate (PGMEA) S-2: Propylene Glycol Monomethyl Ether (PGME) S-3: Cyclohexanone

＜Manufacture of resin composition＞ Each material described in the following table was mixed in the compounding quantity shown in the following table, and it filtered through the nylon filter (manufactured by NIHON PALL Corporation) with a pore diameter of 0.45 micrometers, and each resin composition was manufactured. The unit of the numerical value described in the column of the compounding quantity of the following table is a mass part. The compounding quantity of resin is the value calculated by solid content conversion.

[table 5] Dispersion or dye Dispersions Dispersions type Blending amount type Blending amount type Blending amount Example 1 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 2 Green Dispersion 2 57.05 Yellow Dispersion 2 25.30 Example 3 Green Dispersion 3 57.05 Yellow Dispersion 3 25.30 Example 4 Green Dispersion 4 57.05 Yellow Dispersion 4 25.30 Example 5 Green Dispersion 2 57.05 Yellow Dispersion 3 25.30 Example 6 Green Dispersion 3 57.05 Yellow Dispersion 4 25.30 Example 7 Green Dispersion 4 57.05 Yellow Dispersion 1 25.30 Example 8 Green Dispersion 5 57.05 Yellow Dispersion 2 25.30 Example 9 Green Dispersion 9 57.05 Yellow Dispersion 1 25.30 Example 10 Green Dispersion 10 57.05 Yellow Dispersion 2 25.30 Example 11 Green dispersion 1 57.05 Yellow Dispersion 7 25.30 Example 12 Green Dispersion 2 57.05 Yellow Dispersion 8 25.30 Example 13 Green Dispersion 3 57.05 Yellow Dispersion 7 25.30 Example 14 Green Dispersion 4 57.05 Yellow Dispersion 8 25.30 Example 15 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 16 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 17 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 18 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 19 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 20 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 21 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 22 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 23 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 24 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 25 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 26 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 27 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 28 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 29 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 30 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 31 Green dispersion 1 47.54 Yellow Dispersion 1 16.98 Yellow Dispersion 17 3.40 Example 32 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Example 33 Green Dispersion 11 15.76 Green Dispersion 12 18.19 Yellow Dispersion 18 15.11 Example 34 Green Dispersion 11 15.76 Green Dispersion 12 18.19 Yellow Dispersion 18 15.11 Example 35 Red dispersion 1 59.02 Yellow Dispersion 5 25.30 Example 36 Red Dispersion 2 59.02 Yellow Dispersion 6 25.30 Example 37 Red Dispersion 3 59.02 Yellow Dispersion 5 25.30 Example 38 Red Dispersion 4 59.02 Yellow Dispersion 6 25.30 Example 39 Red Dispersion 5 59.02 Yellow Dispersion 5 25.30 Example 40 Red Dispersion 6 59.02 Yellow Dispersion 6 25.30 [Table 6] polymeric compound resin Photopolymerization initiator type Blending amount type Blending amount type Blending amount Example 1 M-4 0.90 C-1 0.15 I-1 0.45 Example 2 M-4 0.90 C-3 0.15 I-1 0.45 Example 3 M-2 0.90 C-1 0.15 I-1 0.45 Example 4 M-2 0.90 C-3 0.15 I-1 0.45 Example 5 M-2 0.90 C-1 0.15 I-1 0.45 Example 6 M-2 0.90 C-3 0.15 I-1 0.45 Example 7 M-4 0.90 C-1 0.15 I-1 0.45 Example 8 M-4 0.90 C-3 0.15 I-1 0.45 Example 9 M-2 0.90 C-1 0.15 I-1 0.45 Example 10 M-2 0.90 C-3 0.15 I-1 0.45 Example 11 M-4 0.90 C-1 0.15 I-1 0.45 Example 12 M-4 0.90 C-3 0.15 I-1 0.45 Example 13 M-2 0.90 C-1 0.15 I-1 0.45 Example 14 M-2 0.90 C-3 0.15 I-1 0.45 Example 15 M-4 0.90 C-2 0.15 I-1 0.45 Example 16 M-4 0.90 C-4 0.15 I-1 0.45 Example 17 M-4 0.90 C-5 0.15 I-1 0.45 Example 18 M-4 0.90 C-6 0.15 I-1 0.45 Example 19 M-4 0.90 C-4 0.15 I-2 0.45 Example 20 M-4 0.90 C-4 0.15 I-3 0.45 Example 21 M-4 0.90 C-4 0.15 I-4 0.45 Example 22 M-4 0.90 C-4 0.15 I-5 0.45 Example 23 M-4 0.90 C-4 0.15 I-6 0.45 Example 24 M-4 0.90 C-1 0.15 I-1 0.45 Example 25 M-4 0.90 C-1 0.15 I-1 0.45 Example 26 M-4 0.90 C-1 0.15 I-1 0.45 Example 27 M-4 0.90 C-1 0.15 I-1 0.45 Example 28 M-4 0.90 C-1 0.15 I-1 0.45 Example 29 M-4 0.90 C-1 0.15 I-1 0.45 Example 30 M-4 0.90 C-1 0.15 I-1 0.45 Example 31 M-2/M-4=50/50 0.90 C-1 2.43 I-1-I-6=90/10 0.45 Example 32 M-4 0.90 C-1 0.15 I-1 0.45 Example 33 M-3 1.77 C-1 0.94 I-6 0.36 Example 34 M-3 1.09 C-1 1.60 I-7 0.75 Example 35 M-2 0.60 C-1 0.14 I-1 0.45 Example 36 M-2 0.60 C-3 0.14 I-1 0.45 Example 37 M-2 0.60 C-1 0.14 I-1 0.45 Example 38 M-2 0.60 C-3 0.14 I-1 0.45 Example 39 M-2 0.60 C-1 0.14 I-1 0.45 Example 40 M-2 0.60 C-3 0.14 I-1 0.45 [Table 7] UV absorber Surfactant polymerization inhibitor solvent type Blending amount type Blending amount type Blending amount type Blending amount Example 1 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 2 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 3 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 4 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 5 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 6 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 7 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 8 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 9 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 10 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 11 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 12 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 13 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 14 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 15 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 16 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 17 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 18 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 19 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 20 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 21 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 22 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 23 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 24 U-2 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 25 U-3 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 26 U-4 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 27 U-5 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 28 U-6 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 29 U-7 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 30 U-8 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 31 U-1 0.30 W-8 0.01 Q-1 0.01 S-1 27.98 Example 32 U-1/U-4=50/50 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Example 33 U-1/UC=50/50 0.74 W-1 0.01 Q-1 0.01 S-1 47.12 Example 34 U-1/UC=50/50 0.28 W-1 0.01 Q-1 0.01 S-1 47.20 Example 35 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 14.17 Example 36 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 14.17 Example 37 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 14.17 Example 38 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 14.17 Example 39 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 14.17 Example 40 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 14.17

[Table 8] Dispersion or dye Dispersions Dispersions type Blending amount type Blending amount type Blending amount Example 41 Red dispersion 1 59.02 Yellow Dispersion 9 25.30 Example 42 Red Dispersion 2 59.02 Yellow Dispersion 10 25.30 Example 43 Red Dispersion 11 54.10 Yellow Dispersion 15 23.19 Example 44 Red dispersion 1 59.02 Yellow Dispersion 5 25.30 Example 45 Red Dispersion 12 55.81 Yellow Dispersion 17 17.70 Example 46 Red Dispersion 12 55.81 Yellow Dispersion 17 18.91 Example 47 Red Dispersion 12 55.81 Yellow Dispersion 17 18.91 Example 48 Red Dispersion 12 55.81 Yellow Dispersion 17 18.91 Example 49 Red Dispersion 12 48.65 Yellow Dispersion 17 19.30 Example 50 Blue dispersion 1 49.18 Violet Dispersion 1 25.30 Example 51 Blue Dispersion 2 49.18 Violet Dispersion 2 25.30 Example 52 Blue dispersion 1 49.18 Violet Dispersion 1 25.30 Example 53 Blue Dispersion 11 21.99 Violet Dispersion 3 16.65 Blue Dispersion 9 8.08 Example 54 Blue Dispersion 11 21.99 Violet Dispersion 3 16.65 Blue Dispersion 9 8.08 Example 55 Blue Dispersion 10 64.98 Violet Dispersion 3 16.24 Example 56 Blue Dispersion 11 21.99 Violet Dispersion 3 16.65 Blue Dispersion 9 8.08 Example 57 Blue Dispersion 11 21.99 Violet Dispersion 3 16.65 Blue Dispersion 9 8.08 Example 58 Blue Dispersion 10 64.98 Violet Dispersion 3 16.24 Example 59 Yellow Dispersion 1 70.26 Example 60 Yellow Dispersion 2 70.26 Example 61 Yellow Dispersion 3 70.26 Example 62 Yellow Dispersion 4 70.26 Example 63 Yellow Dispersion 5 70.26 Example 64 Yellow Dispersion 6 70.26 Example 65 Yellow Dispersion 11 70.26 Example 66 Yellow Dispersion 12 70.26 Example 67 Yellow Dispersion 13 70.26 Example 68 Yellow Dispersion 14 70.26 Example 69 Yellow Dispersion 1 35.13 Yellow Dispersion 5 35.13 Example 70 Yellow Dispersion 2 35.13 Yellow Dispersion 6 35.13 Example 71 Yellow Dispersion 1 21.08 Yellow Dispersion 5 21.08 Yellow Dispersion 3 28.11 Example 72 Yellow Dispersion 2 21.08 Yellow Dispersion 6 21.08 Yellow Dispersion 4 28.11 Example 73 Yellow Dispersion 1 21.08 Yellow Dispersion 5 21.08 Yellow Dispersion 3 28.11 Example 74 Yellow Dispersion 1 21.08 Yellow Dispersion 5 21.08 Yellow Dispersion 3 28.11 Example 75 Yellow Dispersion 1 21.08 Yellow Dispersion 5 21.08 Yellow Dispersion 3 28.11 Example 76 Yellow Dispersion 1 21.08 Yellow Dispersion 5 21.08 Yellow Dispersion 3 28.11 Example 77 Yellow Dispersion 1 21.08 Yellow Dispersion 5 21.08 Yellow Dispersion 3 28.11 Example 78 Yellow Dispersion 1 21.08 Yellow Dispersion 5 21.08 Yellow Dispersion 3 28.11 Example 79 Yellow Dispersion 1 21.08 Yellow Dispersion 5 21.08 Yellow Dispersion 3 28.11 Example 80 Yellow Dispersion 1 21.08 Yellow Dispersion 5 21.08 Yellow Dispersion 3 28.11 [Table 9] polymeric compound resin Photopolymerization initiator type Blending amount type Blending amount type Blending amount Example 41 M-1 0.60 C-1 0.14 I-1 0.45 Example 42 M-1 0.60 C-3 0.14 I-1 0.45 Example 43 M-6/M-7=75/25 0.90 C-1/C-7=65/35 1.58 I-1 0.30 Example 44 M-2 0.60 C-1 0.14 I-1 0.45 Example 45 M-8 1.03 C-8 1.18 I-6 0.26 Example 46 M-6/M-7=75/25 1.16 C-1/C-7=35/65 1.09 I-6 0.29 Example 47 M-6/M-7=75/25 1.03 C-1/C-7=35/65 1.22 I-6 0.28 Example 48 M-6/M-7=75/25 0.53 C-8 0.15 I-6 0.29 Example 49 M-8 0.88 C-8 0.26 I-7 0.44 Example 50 M-3 0.90 C-1 1.41 I-1 0.45 Example 51 M-3 0.90 C-3 1.41 I-1 0.45 Example 52 M-3 0.90 C-1 1.41 I-1 0.45 Example 53 M-5 1.63 C-2 1.80 I-6 0.33 Example 54 M-7/M-5=70/30 1.49 C-2 1.80 I-6 0.33 Example 55 M-3 2.61 C-1 1.24 I-6 0.33 Example 56 M-5 0.83 C-2 1.82 I-7 1.03 Example 57 M-5 0.83 C-2 2.34 I-7 0.60 Example 58 M-3 1.82 C-1 0.98 I-7 0.97 Example 59 M-5 0.90 C-1 2.09 I-1 0.45 Example 60 M-5 0.90 C-3 2.09 I-1 0.45 Example 61 M-5 0.90 C-1 2.09 I-1 0.45 Example 62 M-5 0.90 C-3 2.09 I-1 0.45 Example 63 M-5 0.90 C-1 2.09 I-1 0.45 Example 64 M-5 0.90 C-3 2.09 I-1 0.45 Example 65 M-5 0.90 C-1 2.09 I-1 0.45 Example 66 M-5 0.90 C-3 2.09 I-1 0.45 Example 67 M-5 0.90 C-1 2.09 I-1 0.45 Example 68 M-5 0.90 C-3 2.09 I-1 0.45 Example 69 M-5 0.90 C-1 2.09 I-1 0.45 Example 70 M-5 0.90 C-3 2.09 I-1 0.45 Example 71 M-5 0.90 C-1 2.09 I-1 0.45 Example 72 M-5 0.90 C-3 2.09 I-1 0.45 Example 73 M-5 0.90 C-4 2.09 I-4 0.45 Example 74 M-5 0.90 C-4 2.09 I-4 0.45 Example 75 M-5 0.90 C-4 2.09 I-4 0.45 Example 76 M-5 0.90 C-4 2.09 I-4 0.45 Example 77 M-5 0.90 C-4 2.09 I-4 0.45 Example 78 M-5 0.90 C-4 2.09 I-4 0.45 Example 79 M-5 0.90 C-4 2.09 I-4 0.45 Example 80 M-5 0.90 C-4 2.09 I-4 0.45 [Table 10] UV absorber Surfactant polymerization inhibitor solvent type Blending amount type Blending amount type Blending amount type Blending amount Example 41 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 14.17 Example 42 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 14.17 Example 43 U-1 0.15 W-1 0.01 Q-1 0.01 S-1 19.76 Example 44 U-1/U-4=50/50 0.74 W-1 0.01 Q-1 0.01 S-1 14.17 Example 45 U-1/UC=50/50 0.74 W-1 0.01 Q-1 0.01 S-1 23.27 Example 46 U-1/UC=50/50 0.74 W-1 0.01 Q-1 0.01 S-1 21.99 Example 47 U-1/UC=50/50 0.74 W-1 0.01 Q-1 0.01 S-1 22.00 Example 48 U-1/UC=50/50 0.74 W-1 0.01 Q-1 0.01 S-1 23.56 Example 49 U-1/UC=50/50 0.15 W-1 0.01 Q-1 0.01 S-1 30.30 Example 50 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 22.44 Example 51 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 22.44 Example 52 U-1/U-4=50/50 0.30 W-1 0.01 Q-1 0.01 S-1 22.44 Example 53 U-1 0.30 W-1 0.01 Q-1 0.01 S-1/S-4=61.6/38.4 49.20 Example 54 U-1/UC=50/50 0.14 W-1 0.01 Q-1 0.01 S-1/S-4=61.6/38.4 49.51 Example 55 U-1/UC=50/50 0.31 W-1 0.01 Q-1 0.01 S-1/S-4=61.6/38.4 14.27 Example 56 U-1/UC=50/50 0.10 W-1 0.01 Q-1 0.01 S-1/S-4=61.6/38.4 49.48 Example 57 U-1 0.30 W-1 0.01 Q-1 0.01 S-1/S-4=61.6/38.4 49.19 Example 58 U-1/UC=50/50 0.68 W-1 0.01 Q-1 0.01 S-1/S-4=61.6/38.4 14.32 Example 59 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 60 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 61 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 62 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 63 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 64 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 65 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 66 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 67 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 68 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 69 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 70 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 71 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 72 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 73 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 74 U-2 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 75 U-3 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 76 U-4 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 77 U-5 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 78 U-6 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 79 U-7 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 80 U-8 0.30 W-1 0.01 Q-1 0.01 S-1 25.98

[Table 11] Dispersion or dye Dispersions Dispersions type Blending amount type Blending amount type Blending amount Example 81 Yellow Dispersion 1 21.08 Yellow Dispersion 5 21.08 Yellow Dispersion 3 28.11 Example 82 Blue Dispersion 3 70.26 Example 83 Blue Dispersion 4 70.26 Example 84 Blue Dispersion 5 70.26 Example 85 Blue dispersion 6 70.26 Example 86 Blue Dispersion 7 70.26 Example 87 Blue Dispersion 8 70.26 Example 88 Blue Dispersion 3 70.26 Example 89 Red Dispersion 7 70.26 Example 90 Red Dispersion 8 70.26 Example 91 Red Dispersion 9 70.26 Example 92 Red Dispersion 10 70.26 Example 93 Red Dispersion 7 70.26 Example 94 Red Dispersion 9 70.26 Example 95 red dye 7.50 Example 96 Red Dispersion 9 70.26 Example 97 IR Dispersion 1 56.21 Example 98 IR Dispersion 2 56.21 Comparative example 1 Green dispersion 1 57.05 Yellow Dispersion 1 25.30 Comparative example 2 Red Dispersion 9 70.26 [Table 12] polymeric compound resin Photopolymerization initiator type Blending amount type Blending amount type Blending amount Example 81 M-5 0.90 C-4 2.09 I-4 0.45 Example 82 M-3 0.90 C-1 2.09 I-1 0.45 Example 83 M-3 0.90 C-3 2.09 I-1 0.45 Example 84 M-3 0.90 C-1 2.09 I-1 0.45 Example 85 M-3 0.90 C-3 2.09 I-1 0.45 Example 86 M-3 0.90 C-1 2.09 I-1 0.45 Example 87 M-3 0.90 C-3 2.09 I-1 0.45 Example 88 M-3 0.90 C-1 2.09 I-1 0.45 Example 89 M-5 0.90 C-1 2.09 I-1 0.45 Example 90 M-5 0.90 C-3 2.09 I-1 0.45 Example 91 M-5 0.90 C-1 2.09 I-1 0.45 Example 92 M-5 0.90 C-3 2.09 I-1 0.45 Example 93 M-5 0.90 C-4 2.09 I-4 0.45 Example 94 M-5 0.90 C-4 2.09 I-4 0.45 Example 95 M-5 0.90 C-4 5.83 I-4 0.45 Example 96 M-5 0.90 C-1 2.09 I-1 0.45 Example 97 M-3 0.90 C-1 4.34 I-1 0.45 Example 98 M-3 0.90 C-3 4.34 I-1 0.45 Comparative example 1 M-4 0.90 C-1 0.15 I-1 0.45 Comparative example 2 M-5 0.90 C-1 2.09 I-1 0.45 [Table 13] UV absorber Surfactant polymerization inhibitor solvent type Blending amount type Blending amount type Blending amount type Blending amount Example 81 U-1/U-4=50/50 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 82 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 83 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 84 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 85 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 86 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 87 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 88 U-1/U-4=50/50 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 89 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 90 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 91 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 92 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 93 U-4 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 94 U-4 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 95 U-4 0.30 W-1 0.01 Q-1 0.01 S-1 85.00 Example 96 U-1/U-4=50/50 0.30 W-1 0.01 Q-1 0.01 S-1 25.98 Example 97 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 37.78 Example 98 U-1 0.30 W-1 0.01 Q-1 0.01 S-1 37.78 Comparative example 1 UA 0.30 W-1 0.01 Q-1 0.01 S-1 15.83 Comparative example 2 UB 0.30 W-1 0.01 Q-1 0.01 S-1 25.98

Among the raw materials described in the above table, the details of the raw materials indicated by abbreviations are as follows.

(Dispersions) Green Dispersion 1~12: Green Dispersion 1~12 above Yellow Dispersion 1-18: the above-mentioned Yellow Dispersion 1-18 Red Dispersion 1-12: Red Dispersion 1-12 above Blue Dispersion 1-11: Blue Dispersion 1-11 above Violet dispersions 1-3: Violet dispersions 1-3 above IR Dispersion 1, 2: IR Dispersion 1 and 2 above

(dye) Red dye: C.I.Acid red 52

(polymerizable compound) M-1: a compound of the following structure [chemical formula 41] M-2: A mixture of compounds of the following structure (compound on the left: compound on the right=7:3 (molar ratio)) [Chemical Formula 42] M-3: A compound of the following structure [Chemical Formula 43] M-4: A compound of the following structure [Chemical Formula 44] M-5: A compound of the following structure [Chemical Formula 45] M-6: A compound of the following structure [Chemical Formula 46] M-7: Mixture of compounds with the following structures (compound on the left: compound in the center: compound on the right = 44:16:40 (mass ratio)) [Chemical Formula 47] M-8: A compound of the following structure [Chemical Formula 48]

(Resin) C-1: Resin with the following structure (resin with acid groups. Values attached to the main chain are molar ratios of repeating units. Weight average molecular weight 11000, acid value 69.2 mgKOH/g) [Chemical formula 49] C-2: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio of repeating units. The weight average molecular weight is 14000, and the acid value is 70 mgKOH/g) [Chemical formula 50]

C-3: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio of repeating units. The weight average molecular weight is 21000, and the acid value is 80 mgKOH/g) [Chemical formula 51]

C-4: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio of repeating units. The weight average molecular weight is 13000, and the acid value is 100 mgKOH/g) [Chemical formula 52]

C-5: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio of repeating units. The weight average molecular weight is 30000, and the acid value is 75 mgKOH/g) [Chemical formula 53]

C-6: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio of repeating units. The weight average molecular weight is 9100, and the acid value is 120 mgKOH/g) [Chemical formula 54]

C-7: Resin with the following structure (resin with acid groups. The value attached to the main chain is the molar ratio, and the value attached to the side chain is the number of repeating units. The weight average molecular weight is 19000, and the acid value is 89.5mgKOH/g ) [Chemical Formula 55]

C-8: Resin with the following structure (resin with an acid group. The value attached to the main chain is the molar ratio of repeating units. The weight average molecular weight is 11500, and the acid value is 33.1 mgKOH/g) [Chemical formula 56]

(Photopolymerization initiator) I-1: Irgacure OXE02 (manufactured by BASF Corporation, oxime compound) I-2 to I-5, I-7: Compounds of the following structures I-6: ADEKA ARKLSNCI-831 (manufactured by ADEKA CORPORATION ) [Chemical Formula 57]

(Ultraviolet absorber) U-1: Compound of the following structure (Ultraviolet absorber having a base. Benzotriazole compound, molecular weight 310) U-2: Compound of the following structure (Ultraviolet absorber having a base. Benzotriazole compound, molecular weight 296) U-3: Compound with the following structure (ultraviolet absorber with a base. Benzotriazole compound, molecular weight 352) U-4: Compound with the following structure (with a base Ultraviolet absorber. Benzotriazole compound, molecular weight 338) U-5: Compound with the following structure (ultraviolet absorber having a base. Benzotriazole compound, molecular weight 338) U-6: Compound with the following structure ( Ultraviolet absorber with a base. Benzotriazole compound, molecular weight 339) U-7: Compound with the following structure (Ultraviolet absorber with a base. Benzotriazole compound, molecular weight 352) U-8: The following Compound of structure (ultraviolet absorber with base. Benzotriazole compound, molecular weight 322) [Chemical formula 58] UA: Sumisorb 130 (manufactured by Sumika Chemtex Company, Limited, compound of the following structure. UV absorber without base) [Chemical formula 59] UB: Sumisorb 400 (manufactured by Sumika Chemtex Company, Limited, compound of the following structure. UV absorber without base) [Chemical formula 60] UC: Compound of the following structure (conjugated diene compound) [Chemical Formula 61]

(surfactant) W-1: KF-6000 (manufactured by Shin-Etsu Chemical Co., Ltd., silicone-based surfactant) W-8: KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., silicone-based surfactant)

(polymerization inhibitor) Q-1: p-methoxyphenol

(solvent) S-1: Propylene Glycol Monomethyl Ether Acetate (PGMEA) S-4: Butyl acetate

＜Evaluation of Viscosity Stability over Time＞ The resin composition produced above was stored at 45° C. for 3 days. The viscosity of the resin composition before and after storage was measured, and the stability over time of the viscosity was evaluated using the value of the viscosity change rate calculated by the following formula. The viscosity of the resin composition was measured with a viscometer (product name "RE-85 type viscometer", manufactured by TOKI SANGYO CO., LTD.). The measurement conditions of the viscosity are a rotational speed of 20 rpm and a temperature of 25°C. Viscosity change rate=|1-(viscosity of resin composition after storage/viscosity of resin composition before storage)|×100 5: The viscosity change rate is below 5% 4: The viscosity change rate is more than 5% and less than 10% 3: The viscosity change rate is more than 10% and less than 15% 2: The viscosity change rate is more than 15% and less than 20% 1: Viscosity change rate exceeds 20%

<Evaluation of time-dependent stability of film thickness> Using the resin composition produced above, a film was formed so as to have a film thickness of 500 nm. In addition, after storing the resin composition produced above at 45° C. for 3 days, film formation was performed under the same conditions as the film formation conditions using the newly produced resin composition. The difference in film thickness before and after storage was compared, and film thickness stability was evaluated based on the following criteria. Furthermore, the substrate used for film formation is an 8-inch (20.32cm) silicon wafer. During film formation, the resin composition is coated on the substrate by spin coating, and then heated at 100°C using a heating plate. for 2 minutes. Film thickness difference=|Thickness of the film obtained by using the resin composition before storage-Thickness of the film obtained by using the resin composition after storage| 5: The film thickness difference is less than 3nm 4: The film thickness difference exceeds 3nm and is less than 5nm 3: The film thickness difference exceeds 5nm and is less than 7nm 2: The film thickness difference exceeds 7nm and is less than 10nm 1: The film thickness difference exceeds 10nm

[Table 14] Viscosity stability over time Time-dependent stability of film thickness Example 1 4 4 Example 2 4 4 Example 3 5 4 Example 4 5 4 Example 5 4 3 Example 6 4 3 Example 7 4 4 Example 8 4 4 Example 9 5 4 Example 10 5 4 Example 11 4 4 Example 12 4 4 Example 13 4 4 Example 14 4 4 Example 15 4 4 Example 16 5 4 Example 17 4 4 Example 18 5 4 Example 19 4 4 Example 20 4 4 Example 21 4 4 Example 22 4 4 Example 23 4 4 Example 24 4 3 Example 25 5 4 Example 26 5 5 Example 27 4 3 Example 28 3 3 Example 29 4 4 Example 30 4 3 Example 31 4 4 Example 32 5 5 Example 33 5 4 Example 34 5 4 Example 35 5 4 Example 36 5 4 Example 37 4 3 Example 38 4 3 Example 39 4 4 Example 40 4 4

[Table 15] Viscosity stability over time Time-dependent stability of film thickness Example 41 5 4 Example 42 5 4 Example 43 5 4 Example 44 5 5 Example 45 5 4 Example 46 5 4 Example 47 5 4 Example 48 5 4 Example 49 5 4 Example 50 5 4 Example 51 5 4 Example 52 5 5 Example 53 5 4 Example 54 5 4 Example 55 5 4 Example 56 5 4 Example 57 5 4 Example 58 5 4 Example 59 4 3 Example 60 4 3 Example 61 4 4 Example 62 4 4 Example 63 4 3 Example 64 4 3 Example 65 3 3 Example 66 3 3 Example 67 4 4 Example 68 4 4 Example 69 4 3 Example 70 4 3 Example 71 4 4 Example 72 4 4 Example 73 4 4 Example 74 4 3 Example 75 5 4 Example 76 5 5 Example 77 4 3 Example 78 3 3 Example 79 4 4 Example 80 4 3

[Table 16] Viscosity stability over time Time-dependent stability of film thickness Example 81 5 5 Example 82 4 4 Example 83 4 4 Example 84 4 3 Example 85 4 3 Example 86 4 4 Example 87 4 4 Example 88 5 5 Example 89 4 4 Example 90 4 4 Example 91 5 4 Example 92 5 4 Example 93 5 5 Example 94 5 5 Example 95 4 4 Example 96 5 5 Example 97 4 3 Example 98 4 3 Comparative example 1 2 2 Comparative example 2 2 2

As shown in the above table, the resin composition of the example is superior in the evaluation of the temporal stability of the viscosity and the temporal stability of the film thickness compared with the resin composition of the comparative example, and is excellent in the temporal stability.

In Example 1, the same effects were obtained by changing the surfactant W-1 to the surfactants W-2 to W-46 shown below. Also, the same effect can be obtained even if the polymerization inhibitor is removed. W-2: FZ-2122 (manufactured by Dow Corning Toray Co., Ltd., polysiloxane-based surfactant) W-3: BYK-322 (manufactured by BYK Chemie GmbH, polysiloxane-based surfactant) W-4 : BYK-323 (BYK Chemie GmbH, polysiloxane surfactant) W-6: BYK-3760 (BYK Chemie GmbH, polysiloxane surfactant) W-7: BYK-UV3510 (BYK Chemie GmbH Silicone-based surfactant) W-8: KF-6001 (Shin-Etsu Chemical Co., Ltd., silicone-based surfactant) W-9: MEGAFACE F-477 (DIC CORPORATION, fluorine-based Surfactant) W-10: MEGAFACE F-554 (DIC CORPORATION, fluorine-based surfactant) W-11: MEGAFACE F-555-A (DIC CORPORATION, fluorine-based surfactant) W-12: MEGAFACE F-556 (DIC CORPORATION, fluorine-based surfactant) W-13: MEGAFACE F-557 (DIC CORPORATION, fluorine-based surfactant) W-14: MEGAFACE F-558 (DIC CORPORATION, fluorine-based surfactant) W-15: MEGAFACE F-559 (DIC CORPORATION, fluorine-based surfactant) W-16: MEGAFACE F-560 (DIC CORPORATION, fluorine-based surfactant) W-17: MEGAFACE F-561 (DIC CORPORATION, fluorine-based surfactant) W-18: MEGAFACE F-563 (DIC CORPORATION, fluorine-based surfactant) W-19: MEGAFACE F-565 (DIC CORPORATION, fluorine-based surfactant) W-20: MEGAFACE F-568 (DIC CORPORATION, fluorine-based surfactant) Surfactant) W-21: MEGAFACE F-575 (DIC CORPORATION, fluorine-based surfactant) W-22: MEGAFACE R-01 (DIC CORPORATION, fluorine-based surfactant) W-23: MEGAFACE R-40 (DIC CORPORATION, fluorine-based surfactant) W-24: MEGAFACE R-40-LM (DIC CORPORATION, fluorine-based surfactant) W-25: MEGAFACE R-41 (DIC CORPORATION, fluorine-based surfactant) W-26: MEGAFACE R-41-LM (DIC CORPORATION, fluorine-based surfactant) W-27: MEGAFACE R-94 (DIC CORPORATION, fluorine-based surfactant) W-28: MEGAFACE DS-21 (DIC CORPORATION, fluorine-based surfactant agent) W-29: MEGAFACE RS-43 (DIC CORPORATION, fluorine surfactant) W-30: MEGAFACE RS-72-K (DIC CORPORATION, fluorine surfactant) W-31: MEGAFACE RS-90 (DIC CORPORATION, fluorine-based surfactant) W-32: MEGAFACE TF-1956 (DIC CORPORATION, fluorine-based surfactant) W-33: Futurgent 208G (NEOS Corporation, fluorine-based surfactant) W-34: Futurgent 215M (NEOS Corporation, fluorine-based surfactant) W-35: Futurgent 245F (NEOS Corporation, fluorine-based surfactant) W-36: Futurgent 601AD (NEOS Corporation, fluorine-based surfactant) W-37: Futurgent 601ADH2 (NEOS Corporation, Fluorinated surfactant) W-38: Futurgent 602A (NEOS Corporation, fluorinated surfactant) W-39: Futurgent 610FM (NEOS Corporation, fluorinated surfactant) W-40: Futurgent 710FL (NEOS Corporation, fluorinated surfactant) Surfactant) W-41: Futurgent 710FM (NEOS Corporation, fluorine-based surfactant) W-42: Futurgent 710FS (NEOS Corporation, fluorine-based surfactant) W-43: Futurgent FTX-218 (NEOS Corporation, fluorine-based surfactant) Surfactant) W-44: PF-6320 (manufactured by OMNOVA SOLUTIONS INC., fluorine-based surfactant) W-45: BYK-330 (manufactured by BYK Chemie GmbH, polysiloxane-based surfactant) W-46: Below Compound of structure (fluorine-based surfactant, weight average molecular weight 14,000, and the value of % representing the ratio of repeating units is mole%) [Chemical formula 62]

none

Claims (10)

A resin composition, which contains a coloring material, an ultraviolet absorber and a resin, The aforementioned ultraviolet absorber includes an ultraviolet absorber having a base, and the ultraviolet absorber having the aforementioned base is selected from the group consisting of benzophenone compounds, benzoate compounds, benzotriazole compounds, trioxane compounds, and cyanoacrylates. at least one of the compounds, The aforementioned resins include resins having acid groups. The resin composition as described in claim 1, wherein The ultraviolet absorber having the aforementioned base is an ultraviolet absorber having an amine group. The resin composition as described in claim 1, wherein The ultraviolet absorber having the aforementioned base is a benzotriazole compound. The resin composition as described in any one of claim 1 to claim 3, wherein The molecular weight of the ultraviolet absorber which has the said base is 500 or less. The resin composition according to any one of claim 1 to claim 3, further comprising a polymerizable compound and a photopolymerization initiator. The resin composition as described in any one of claim 1 to claim 3, wherein The aforementioned color material contains a dye. A film obtained by using the resin composition described in any one of claim 1 to claim 6. An optical filter comprising the film described in Claim 7. A solid-state imaging device comprising the film described in Claim 7. An image display device comprising the film described in Claim 7.