TW202323765A - 用於特徵化光學元件之表面形狀的方法與裝置 - Google Patents

用於特徵化光學元件之表面形狀的方法與裝置 Download PDF

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Publication number
TW202323765A
TW202323765A TW111137542A TW111137542A TW202323765A TW 202323765 A TW202323765 A TW 202323765A TW 111137542 A TW111137542 A TW 111137542A TW 111137542 A TW111137542 A TW 111137542A TW 202323765 A TW202323765 A TW 202323765A
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TW
Taiwan
Prior art keywords
test
measurements
corrected
error
measurement
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TW111137542A
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English (en)
Chinese (zh)
Inventor
雷吉娜 克魯斯
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德商卡爾蔡司Ｓｍｔ有限公司
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Publication of TW202323765A publication Critical patent/TW202323765A/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02061—Reduction or prevention of effects of tilts or misalignment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02059—Reducing effect of parasitic reflections, e.g. cyclic errors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02087—Combining two or more images of the same region
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Geometry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Character Input (AREA)
TW111137542A 2021-10-04 2022-10-03 用於特徵化光學元件之表面形狀的方法與裝置 TW202323765A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102021211172.6A DE102021211172B3 (de) 2021-10-04 2021-10-04 Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements
DE102021211172.6 2021-10-04

Publications (1)

Publication Number Publication Date
TW202323765A true TW202323765A (zh) 2023-06-16

Family

ID=85383786

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111137542A TW202323765A (zh) 2021-10-04 2022-10-03 用於特徵化光學元件之表面形狀的方法與裝置

Country Status (6)

Country Link
US (1) US12292281B2 (https=)
JP (1) JP2023054782A (https=)
CN (1) CN115930820A (https=)
DE (1) DE102021211172B3 (https=)
NL (1) NL2033224B1 (https=)
TW (1) TW202323765A (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5982490A (en) 1997-02-04 1999-11-09 Nikon Corporation Apparatus and method for wavefront absolute calibration and method of synthesizing wavefronts
DE10058650A1 (de) 2000-11-25 2002-05-29 Zeiss Carl Verfahren zur interferometrischen Messung von nichtrotationssymmetrischen Wellenfrontfehlern
US7277186B2 (en) * 2000-11-25 2007-10-02 Carl Zeiss Smt Ag Method for the interferometric measurement of non-rotationally symmetric wavefront errors
US7324214B2 (en) * 2003-03-06 2008-01-29 Zygo Corporation Interferometer and method for measuring characteristics of optically unresolved surface features
US7158914B2 (en) 2004-02-06 2007-01-02 Zygo Corporation Precision surface measurement
JP5027450B2 (ja) * 2006-06-15 2012-09-19 パナソニック株式会社 形状測定方法
DE102017217371A1 (de) 2017-09-29 2019-04-04 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements

Also Published As

Publication number Publication date
JP2023054782A (ja) 2023-04-14
US12292281B2 (en) 2025-05-06
CN115930820A (zh) 2023-04-07
DE102021211172B3 (de) 2023-03-23
NL2033224B1 (en) 2024-05-30
US20230108466A1 (en) 2023-04-06
NL2033224A (en) 2023-04-13

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