DE102021211172B3 - Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements - Google Patents
Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements Download PDFInfo
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- DE102021211172B3 DE102021211172B3 DE102021211172.6A DE102021211172A DE102021211172B3 DE 102021211172 B3 DE102021211172 B3 DE 102021211172B3 DE 102021211172 A DE102021211172 A DE 102021211172A DE 102021211172 B3 DE102021211172 B3 DE 102021211172B3
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- 238000000034 method Methods 0.000 title claims abstract description 82
- 230000003287 optical effect Effects 0.000 title claims abstract description 45
- 238000012360 testing method Methods 0.000 claims abstract description 185
- 238000005259 measurement Methods 0.000 claims abstract description 110
- 238000011156 evaluation Methods 0.000 claims description 17
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- 238000012937 correction Methods 0.000 description 7
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Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02061—Reduction or prevention of effects of tilts or misalignment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02059—Reducing effect of parasitic reflections, e.g. cyclic errors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02087—Combining two or more images of the same region
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/005—Testing of reflective surfaces, e.g. mirrors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
- G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
- G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Geometry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Character Input (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021211172.6A DE102021211172B3 (de) | 2021-10-04 | 2021-10-04 | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
| JP2022159447A JP2023054782A (ja) | 2021-10-04 | 2022-10-03 | 光学素子の表面形状を評価する方法及び装置 |
| TW111137542A TW202323765A (zh) | 2021-10-04 | 2022-10-03 | 用於特徵化光學元件之表面形狀的方法與裝置 |
| US17/959,779 US12292281B2 (en) | 2021-10-04 | 2022-10-04 | Method and device for characterizing the surface shape of an optical element |
| NL2033224A NL2033224B1 (en) | 2021-10-04 | 2022-10-04 | Method and device for characterizing the surface shape of an optical element |
| CN202211222503.4A CN115930820A (zh) | 2021-10-04 | 2022-10-08 | 用于表征光学元件的表面形状的方法和装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021211172.6A DE102021211172B3 (de) | 2021-10-04 | 2021-10-04 | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102021211172B3 true DE102021211172B3 (de) | 2023-03-23 |
Family
ID=85383786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102021211172.6A Active DE102021211172B3 (de) | 2021-10-04 | 2021-10-04 | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12292281B2 (https=) |
| JP (1) | JP2023054782A (https=) |
| CN (1) | CN115930820A (https=) |
| DE (1) | DE102021211172B3 (https=) |
| NL (1) | NL2033224B1 (https=) |
| TW (1) | TW202323765A (https=) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5982490A (en) | 1997-02-04 | 1999-11-09 | Nikon Corporation | Apparatus and method for wavefront absolute calibration and method of synthesizing wavefronts |
| DE10058650A1 (de) | 2000-11-25 | 2002-05-29 | Zeiss Carl | Verfahren zur interferometrischen Messung von nichtrotationssymmetrischen Wellenfrontfehlern |
| US7158914B2 (en) | 2004-02-06 | 2007-01-02 | Zygo Corporation | Precision surface measurement |
| DE102017217371A1 (de) | 2017-09-29 | 2019-04-04 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7277186B2 (en) * | 2000-11-25 | 2007-10-02 | Carl Zeiss Smt Ag | Method for the interferometric measurement of non-rotationally symmetric wavefront errors |
| US7324214B2 (en) * | 2003-03-06 | 2008-01-29 | Zygo Corporation | Interferometer and method for measuring characteristics of optically unresolved surface features |
| JP5027450B2 (ja) * | 2006-06-15 | 2012-09-19 | パナソニック株式会社 | 形状測定方法 |
-
2021
- 2021-10-04 DE DE102021211172.6A patent/DE102021211172B3/de active Active
-
2022
- 2022-10-03 JP JP2022159447A patent/JP2023054782A/ja active Pending
- 2022-10-03 TW TW111137542A patent/TW202323765A/zh unknown
- 2022-10-04 NL NL2033224A patent/NL2033224B1/en active
- 2022-10-04 US US17/959,779 patent/US12292281B2/en active Active
- 2022-10-08 CN CN202211222503.4A patent/CN115930820A/zh active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5982490A (en) | 1997-02-04 | 1999-11-09 | Nikon Corporation | Apparatus and method for wavefront absolute calibration and method of synthesizing wavefronts |
| DE10058650A1 (de) | 2000-11-25 | 2002-05-29 | Zeiss Carl | Verfahren zur interferometrischen Messung von nichtrotationssymmetrischen Wellenfrontfehlern |
| US7158914B2 (en) | 2004-02-06 | 2007-01-02 | Zygo Corporation | Precision surface measurement |
| DE102017217371A1 (de) | 2017-09-29 | 2019-04-04 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202323765A (zh) | 2023-06-16 |
| JP2023054782A (ja) | 2023-04-14 |
| US12292281B2 (en) | 2025-05-06 |
| CN115930820A (zh) | 2023-04-07 |
| NL2033224B1 (en) | 2024-05-30 |
| US20230108466A1 (en) | 2023-04-06 |
| NL2033224A (en) | 2023-04-13 |
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| R020 | Patent grant now final |