TW202321194A - 感放射線性組成物及抗蝕劑圖案形成方法 - Google Patents
感放射線性組成物及抗蝕劑圖案形成方法 Download PDFInfo
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- TW202321194A TW202321194A TW111143660A TW111143660A TW202321194A TW 202321194 A TW202321194 A TW 202321194A TW 111143660 A TW111143660 A TW 111143660A TW 111143660 A TW111143660 A TW 111143660A TW 202321194 A TW202321194 A TW 202321194A
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021189641 | 2021-11-22 | ||
| JP2021-189641 | 2021-11-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202321194A true TW202321194A (zh) | 2023-06-01 |
Family
ID=86396746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111143660A TW202321194A (zh) | 2021-11-22 | 2022-11-16 | 感放射線性組成物及抗蝕劑圖案形成方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023090129A1 (https=) |
| TW (1) | TW202321194A (https=) |
| WO (1) | WO2023090129A1 (https=) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002006482A (ja) * | 2000-06-20 | 2002-01-09 | Fuji Photo Film Co Ltd | 感熱性組成物及びそれを用いた平版印刷版原版 |
| JP2005067041A (ja) * | 2003-08-25 | 2005-03-17 | Fuji Photo Film Co Ltd | 平版印刷方法および機上現像用平版印刷原版 |
| JP2005208134A (ja) * | 2004-01-20 | 2005-08-04 | Fuji Photo Film Co Ltd | 感光性組成物および画像記録材料並びに画像記録方法 |
| JP6031369B2 (ja) * | 2013-01-31 | 2016-11-24 | 富士フイルム株式会社 | パターン形成方法、及び電子デバイスの製造方法 |
| EP4317217A4 (en) * | 2021-03-29 | 2024-11-06 | FUJIFILM Corporation | ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE |
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2022
- 2022-10-28 WO PCT/JP2022/040451 patent/WO2023090129A1/ja not_active Ceased
- 2022-10-28 JP JP2023561505A patent/JPWO2023090129A1/ja active Pending
- 2022-11-16 TW TW111143660A patent/TW202321194A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2023090129A1 (https=) | 2023-05-25 |
| WO2023090129A1 (ja) | 2023-05-25 |
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